JP3675520B2 - Method for producing oxide single crystal - Google Patents
Method for producing oxide single crystal Download PDFInfo
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- JP3675520B2 JP3675520B2 JP18483695A JP18483695A JP3675520B2 JP 3675520 B2 JP3675520 B2 JP 3675520B2 JP 18483695 A JP18483695 A JP 18483695A JP 18483695 A JP18483695 A JP 18483695A JP 3675520 B2 JP3675520 B2 JP 3675520B2
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Description
【0001】
【産業上の利用分野】
本発明は、チョクラルスキー法による酸化物単結晶の製造方法に関し、特に表面弾性波素子に用いられるタンタル酸リチウム単結晶やニオブ酸リチウム単結晶の製造に好適な酸化物単結晶の製造方法に関する。
【0002】
【従来の技術及び発明が解決しようとする課題】
タンタル酸リチウム、ニオブ酸リチウムなどの酸化物単結晶はチョクラルスキー法で製造することが一般的に行われており、これは貴金属ルツボの回りを耐火物で囲み、原料を加熱・溶融した後に、種結晶を融液につけ、種結晶を回転引き上げすることで行われる。
【0003】
この場合、結晶の肩部は円錐状となり、この肩円錐部の角度θは45°位が最も歪みが少なくかつ転位等の欠陥も少なく良いとされていることより、過去においては通常θは30〜60°の範囲で作られていた。
【0004】
しかし、結晶製造での生産性を上げる目的で特開昭61−266395号公報で開示されているように結晶の肩の部分の円錐部をできるだけ少なくするという製造方法、すなわち、融液の過冷却状態の温度を調整して引上げ結晶の肩部の肩角度を10°以下になるように単結晶を成長させる方法が開示されている。
【0005】
また、特開昭62−260792号公報では肩部開き角度を45°以上110°以下とすること、つまり、肩角度θを35〜67.5°とすることで肩部形成時に発生する異常成長稜を抑えることができることが開示されている。
【0006】
以上のように、生産性の面からは肩角度は小さい値(10°以下)が好ましく、結晶欠陥の抑制の面からは肩角度は35〜67.5°とある程度大きい方が好ましいとされている。
【0007】
このような点から、結晶欠陥の抑制が期待できるとされる特開昭62−260792号公報の方法では肩部を形成する時間が長いことより生産性が悪いという欠点があり、生産性がよい特開昭61−266395号公報の方法では歩留まりが悪いという欠点がある。
【0008】
これは、肩角度が特開昭62−260792号公報と比較して小さいためと言うよりは、肩部から結晶径が一定となるボディー部へ移行するとき、発振機出力を上げすぎることより、融液温度が上昇し、肩部での結晶の広がりが止まるとともに、育成結晶も加熱されることにより、熱歪みが結晶中に残留し、結晶のクラックが生じやすくなるためと考えられる。
【0009】
本発明は上記事情に鑑みなされたもので、生産性と歩留まりの両者を満足し、クラックの生じ難い酸化物単結晶の製造方法を提供することを目的とする。
【0010】
【課題を解決するための手段及び作用】
本発明者は、上記した酸化物結晶育成中、特に肩部形成中での課題の解決方法について検討し、特には、タンタル酸リチウム単結晶、ニオブ酸リチウム単結晶といった結晶成長中の熱歪みによりクラックが生じやすい結晶を生産性が良く、歩留まり良く製造する方法について鋭意検討を行った結果、引上げ法により酸化物単結晶を製造するに当り、結晶の成長方向をX軸、結晶の直径f(X)をY軸、結晶径が増加しはじめる点を原点とした時、肩部の形成初期において上記直径f(X)の二次微分f″(X)の値を0から正の方向に単調に増加させ、肩部の形成中期においてf″(X)の値を0を横切って負の方向に単調に減少させ、肩部の形成後期においてf″(X)の値を0に向けて単調に増加させて、かつ3インチ径単結晶を製造する場合、Xの値が16〜18.5mmの範囲にあるとき、f(X)の一次微分f′(X)の値が0.2〜0.08の範囲となるように、4インチ径単結晶を製造する場合、Xの値が18.5〜22.5mmの範囲にあるとき、f′(X)の値が1.0〜0.22の範囲となるように肩部を形成することにより、生産性と歩留まりの両方がよい酸化物単結晶が得られることを知見した。
【0011】
即ち、肩部を含めて結晶の形状制御は目標とする形状と実際の形状との差を結晶成長の制御因子である加熱部の出力、結晶引上げ速度、種結晶回転速度にフィードバックすることで行われるが、通常はこの3つの因子の中で加熱部の出力のみにフィードバックすることが行われる。
【0012】
結晶成長はある過冷却度を融液に与えるとほぼ同じ速度で進行する。このため、ネック部の形成終了後に加熱部の出力を融液を過冷却状態となるようなある値まで下げると、ルツボ周囲の熱容量の大きさに依存する時間が経過した後に、結晶径が一定の速度で広がり始める。融液の径方向温度勾配は融液中心からルツボ方向に単調に増加しており、結晶径が増加するに従い、この温度勾配による径方向の温度上昇を打ち消すように一定の速度で加熱部の出力を下げる。結晶径の広がり速度を一定とするには、結晶成長部の過冷却度を一定となるように制御すればよく、このようにして一定の肩角度が得られる。肩部から結晶の径が一定となるボディー部へ移行するには過冷却度を急激に小さくし、結晶の広がりを抑える必要がある。このような点から、時間に対する加熱部の出力は、特開昭61−266395号公報の第2図に示されるように肩部形成中は出力を下げ、肩部からボディー部へ移行するときは加熱部の出力を上げてやる必要がある。
【0013】
しかし、出力の上昇は融液及び育成結晶の温度上昇につながり、育成結晶中に熱歪みが残留するという不利益が生じる。
【0014】
以上の加熱部の出力と結晶の形状との関係を整理すると、融液がΔTという過冷却では、結晶径の1次微分であるf′(X)、つまり結晶径の成長速度は一定の値となる。ΔTが大きければ成長速度が大きくなり肩角度が小さくなり、ΔTが小さければ成長速度が小さくなり肩角度が大きくなるものである。
【0015】
次に、加熱部の出力を変化させΔT/dtという変化量を融液に与えるとする。この結果、結晶形状の2次微分、つまり成長速度が変化する。
【0016】
本発明者は、上記の点を考慮し、肩部の形状とクラックの発生率について最新の自動制御装置を備えた単結晶引上げ機を用いて種々検討を重ね、肩部の形状と結晶欠陥との関係について検討した結果、結晶中に残留歪みを与えないようにするにはこの2次微分の値を単調に変化させることが重要であることを見い出したものである。
【0017】
つまり、特開昭61−266395号公報で開示されているようなネック部から肩部、肩部からボディー部にかけて折れ線的に形状を変化させると、形状の結晶長さに対する一次微分は階段関数的な変化を示し、また、2次微分は階段関数の立ち上がり、下がりの所でデルタ関数的に急激な変化を示す。つまり、折れ線的な形状は仮想的な形状ではあるが、これを実現するには加熱部の出力をデルタ関数的に、つまり急激な変化を与える必要があり、この様な急激な変化は結晶に熱歪みを与えクラックの原因となることより好ましくない。
【0018】
これに対し、酸化物単結晶の肩部を形成するに際し、結晶の成長方向をX軸、結晶の直径f(X)をY軸、結晶径が増加しはじめる点を原点とした時、肩部の形成初期において上記直径f(X)の二次微分f″(X)の値を0から正の方向に単調に増加させ、肩部の形成中期においてf″(X)の値を0を横切って負の方向に単調に減少させ、肩部の形成後期においてf″(X)の値を0に向けて単調に増加させ、かつ3インチ径単結晶を製造する場合、Xの値が16〜18.5mmの範囲にあるとき、f(X)の一次微分f′(X)の値が0.2〜0.08の範囲となるように、4インチ径単結晶を製造する場合、Xの値が18.5〜22.5mmの範囲にあるとき、f′(X)の値が1.0〜0.22の範囲となるようにするという肩部形成方法を採用することにより、ニオブ酸リチウム単結晶、タンタル酸リチウム単結晶等の酸化物単結晶を熱歪みを可及的に防止して歩留まりよく製造し得るものである。
【0019】
以下、本発明につき更に詳しく説明すると、本発明の酸化物単結晶の製造方法は、チョクラルスキー法による引上げ法によって行われるもので、特にニオブ酸リチウム、タンタル酸リチウム単結晶の引上げに有効に採用し得るものであるが、本発明は肩部の形成に特徴を有するものである。
【0021】
本発明の肩部の形状としてはネック部から次第に肩角度を小さくするように形状を決め、最大の肩角度でも10°を越えるようにし、肩部からボディー部にかけては結晶径の広がりを急に抑えるのではなく、なだらかな角度で、つまり肩角度を次第に大きくするような形状とすばよい。また、結晶長に対する形状の2次微分を単調に変化させるということは肩部の形状を上記のようにスムーズに変化させるということであり、この結果、加熱部出力の変動が抑えられることより、肩部での段差、及び熱歪みによるクラックが防止できるものである。また、肩部からボディー部への移行が滑らかになされることより、形状的に無理なく自然な形での結晶成長がおきることより、肩部付近での歪が少なくなり、この形状からくる歪によるクラックも防止できる。
【0022】
ここで、上記のような肩部形成の制御は、具体的に加熱部出力による温度制御によって行うことができる。
【0023】
なお、肩部形成後のボディー部の引上げなど、上記肩部形成以外は通常の酸化物単結晶の引上げ、製造法を採用し、常法に従って行うことができる。
【0024】
【発明の効果】
本発明の酸化物単結晶の製造方法によれば、クラックを可及的に防止して生産性及び歩留まり良く酸化物単結晶を製造することができる。
【0025】
【実施例】
以下、実施例と比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。
【0026】
〔実施例1〕
直径180mmφ、高さ180mmφのイリジウム製ルツボに外径185mmφ、内径130mmφ、厚さ2mmのドーナツ板状のイリジウム製リフレクターを配置し、さらにこの上に直径180mmφ、高さ180mmφの円筒状のイリジウム製アフターヒータを配置した。
【0027】
このルツボ内に組成比がLi/Ta=0.943(モル比)の焼成原料6,500gと結晶塊8,500gの合計15,000gを最初に12,000g入れ、追加チャージで残りの3,000gをいれ、溶融後、チョクラルスキー法によりX軸方位で表1及び図1に示すネック、肩部の形状の4インチ径の重さ10,500gのタンタル酸リチウム単結晶を連続して30本引き上げた。その結果、クラックの発生はなく、歩留まりは92%となった。
【0028】
【表1】
【0029】
〔実施例2〕
直径150mmφ、高さ150mmφのイリジウム製ルツボに外径160mmφ、内径105mmφ、厚さ2mmのドーナツ板状のイリジウム製リフレクターを配置し、更にこの上に直径150mmφ、高さ180mmφの円筒状のイリジウム製アフターヒータを配置した。
【0030】
このルツボ内に組成比がLi/Ta=0.943(モル比)の焼成原料4,500gと結晶塊5,500gの合計10,000gを最初に7,000g入れ、追加チャージで残りの3,000gをいれ、溶融後チョクラルスキー法によりX軸方位で表2及び図2に示すネック部・肩部の形状を持つ3インチ径の重さ6,500gのタンタル酸リチウム単結晶を連続して30本引き上げた。その結果、クラックは1本のみの発生となり、歩留まりは89%となった。
【0031】
【表2】
【0032】
〔比較例〕
直径150mmφ、高さ150mmφのイリジウム製ルツボに外径160mmφ、内径105mmφ、厚さ2mmのドーナツ板状のイリジウム製リフレクターを配置し、更にこの上に直径150mmφ、高さ180mmφの円筒状のイリジウム製アフターヒータを配置した。
【0033】
このルツボ内に組成比がLi/Ta=0.943(モル比)の焼成原料4,500gと結晶塊5,500gの合計10,000gを最初に7,000g入れ、追加チャージで残りの3,000gをいれ、溶融後チョクラルスキー法によりX軸方位で表3及び図3に示すネック、肩部の形状の3インチ径のタンタル酸リチウム単結晶を連続して30本引き上げた。その結果、クラックは5本発生し、歩留まりは71%となった。
【0034】
【表3】
【図面の簡単な説明】
【図1】実施例1の結晶成長距離とf″(X)との関係を示すグラフである。
【図2】実施例2の結晶成長距離とf″(X)との関係を示すグラフである。
【図3】比較例の結晶成長距離とf″(X)との関係を示すグラフである。[0001]
[Industrial application fields]
The present invention relates to a method for producing an oxide single crystal by the Czochralski method, and more particularly to a method for producing an oxide single crystal suitable for producing a lithium tantalate single crystal or a lithium niobate single crystal used in a surface acoustic wave device. .
[0002]
[Prior art and problems to be solved by the invention]
Oxide single crystals such as lithium tantalate and lithium niobate are generally manufactured by the Czochralski method. This is done by surrounding the noble metal crucible with a refractory and heating and melting the raw material. The seed crystal is put on the melt and the seed crystal is rotated up.
[0003]
In this case, the shoulder portion of the crystal has a conical shape, and the angle θ of the shoulder cone portion is about 45 ° so that the distortion is the least and the defects such as dislocations are few. It was made in a range of ˜60 °.
[0004]
However, as disclosed in Japanese Patent Application Laid-Open No. 61-266395 for the purpose of increasing the productivity in crystal production, the production method of reducing the cone portion of the shoulder portion of the crystal as much as possible, that is, the supercooling of the melt A method of growing a single crystal by adjusting the temperature of the state so that the shoulder angle of the shoulder of the pulled crystal is 10 ° or less is disclosed.
[0005]
JP-A-62-260792 discloses abnormal growth that occurs during shoulder formation when the shoulder opening angle is 45 ° to 110 °, that is, the shoulder angle θ is 35 to 67.5 °. It is disclosed that the ridge can be suppressed.
[0006]
As described above, the shoulder angle is preferably a small value (10 ° or less) from the viewpoint of productivity, and the shoulder angle is preferably somewhat large as 35 to 67.5 ° from the viewpoint of suppressing crystal defects. Yes.
[0007]
In view of this, the method disclosed in Japanese Patent Laid-Open No. Sho 62-260792, which is expected to suppress crystal defects, has the disadvantage that the productivity is poor because the time for forming the shoulder is long, and the productivity is good. The method disclosed in Japanese Patent Laid-Open No. 61-266395 has a disadvantage that the yield is poor.
[0008]
This is because the shoulder angle is smaller than that of JP-A-62-260792, and when the transition from the shoulder portion to the body portion where the crystal diameter is constant, the oscillator output is increased too much. This is probably because the melt temperature rises, the crystal stops spreading at the shoulder, and the grown crystal is also heated, so that thermal strain remains in the crystal and the crystal tends to crack.
[0009]
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for producing an oxide single crystal which satisfies both productivity and yield and hardly causes cracks.
[0010]
[Means and Actions for Solving the Problems]
The present inventor examined a solution to the problem during the above-described oxide crystal growth, particularly during shoulder formation, and in particular, due to thermal strain during crystal growth such as lithium tantalate single crystal and lithium niobate single crystal. As a result of intensive studies on a method for producing a crystal that is prone to cracking with good productivity and high yield, in producing an oxide single crystal by the pulling method, the crystal growth direction is the X axis, the crystal diameter f ( When X) is the Y axis and the point where the crystal diameter starts to increase is the origin, the value of the second derivative f ″ (X) of the diameter f (X) is monotonously from 0 to the positive direction at the initial stage of shoulder formation. In the middle stage of shoulder formation, the value of f ″ (X) is monotonously decreased in a negative direction across 0, and in the latter stage of shoulder formation, the value of f ″ (X) is monotonously set to 0. to produce increasing, and 3 inches diameter single crystal If, when the value of X is in the range of. 16 to 18.5 mm, such that the value of the first derivative f '(X) of f (X) is in a range of 0.2 to 0.08, diameter of 4 inches When producing a single crystal, when the value of X is in the range of 18.5 to 22.5 mm, the shoulder is formed so that the value of f ′ (X) is in the range of 1.0 to 0.22. As a result, it has been found that an oxide single crystal with good productivity and yield can be obtained.
[0011]
In other words, the shape control of the crystal including the shoulder is performed by feeding back the difference between the target shape and the actual shape to the output of the heating unit, the crystal pulling speed, and the seed crystal rotation speed, which are control factors for crystal growth. However, usually, feedback to only the output of the heating unit is performed among these three factors.
[0012]
Crystal growth proceeds at approximately the same rate when a certain degree of supercooling is applied to the melt. For this reason, if the output of the heating part is lowered to a certain value at which the melt becomes supercooled after the formation of the neck part, the crystal diameter remains constant after the time depending on the heat capacity around the crucible has elapsed. Begins to spread at a speed of. The radial temperature gradient of the melt monotonously increases from the melt center to the crucible direction, and as the crystal diameter increases, the output of the heating unit is output at a constant rate so as to cancel the temperature rise in the radial direction due to this temperature gradient. Lower. In order to keep the crystal diameter spreading rate constant, the degree of supercooling in the crystal growth portion may be controlled to be constant, and a constant shoulder angle is obtained in this way. In order to shift from the shoulder portion to the body portion where the crystal diameter is constant, it is necessary to rapidly reduce the degree of supercooling to suppress the spread of the crystal. From this point, the output of the heating unit with respect to time is reduced when the shoulder is formed and the output is reduced from the shoulder to the body as shown in FIG. 2 of Japanese Patent Application Laid-Open No. 61-266395. It is necessary to increase the output of the heating unit.
[0013]
However, an increase in output leads to an increase in the temperature of the melt and the grown crystal, and there is a disadvantage that thermal strain remains in the grown crystal.
[0014]
When the relationship between the output of the heating unit and the crystal shape is arranged, f ′ (X) which is the first derivative of the crystal diameter, that is, the growth rate of the crystal diameter is a constant value when the melt is ΔT. It becomes. If ΔT is large, the growth rate increases and the shoulder angle decreases, and if ΔT is small, the growth rate decreases and the shoulder angle increases.
[0015]
Next, it is assumed that the output of the heating unit is changed and a change amount ΔT / dt is given to the melt. As a result, the second derivative of the crystal shape, that is, the growth rate changes.
[0016]
In consideration of the above points, the present inventor conducted various studies on the shoulder shape and the rate of occurrence of cracks using a single crystal pulling machine equipped with the latest automatic control device. As a result of examining the relationship, it has been found that it is important to monotonously change the value of the second derivative so as not to give residual strain in the crystal.
[0017]
That is, when the shape is changed in a polygonal line from the neck portion to the shoulder portion and from the shoulder portion to the body portion as disclosed in JP-A-61-266395, the first derivative with respect to the crystal length of the shape is a step function. In addition, the second derivative shows a drastic change in a delta function at the rise and fall of the step function. In other words, the polygonal shape is a virtual shape, but to achieve this, the output of the heating section must be given a delta function, that is, a sudden change, and such a sudden change is applied to the crystal. This is less preferable because it causes thermal distortion and causes cracks.
[0018]
On the other hand, when forming the shoulder portion of the oxide single crystal, when the crystal growth direction is the X axis, the crystal diameter f (X) is the Y axis, and the point where the crystal diameter begins to increase is the origin, the shoulder portion The value of the second derivative f ″ (X) of the diameter f (X) is monotonously increased in the positive direction from 0 in the early stage of formation of the shoulder, and the value of f ″ (X) crosses 0 in the middle stage of the shoulder formation. When the monotonic decrease in the negative direction, the f ″ (X) value is monotonously increased toward 0 in the later stage of shoulder formation, and a 3-inch diameter single crystal is manufactured, the value of X is 16 to When manufacturing a 4-inch diameter single crystal so that the value of the first derivative f ′ (X) of f (X) is in the range of 0.2 to 0.08 when it is in the range of 18.5 mm , Should the value of f ′ (X) be in the range of 1.0 to 0.22 when the value of 1 is in the range of 18.5 to 22.5 mm By adopting the part forming method, oxide single crystals such as lithium niobate single crystal and lithium tantalate single crystal can be manufactured with high yield by preventing thermal distortion as much as possible.
[0019]
Hereinafter, the present invention will be described in more detail. The method for producing an oxide single crystal of the present invention is carried out by a pulling method by the Czochralski method, and is particularly effective for pulling lithium niobate and lithium tantalate single crystals. Although it can be employed, the present invention is characterized by the formation of the shoulder.
[0021]
The shape of the shoulder portion of the present invention is determined so that the shoulder angle gradually decreases from the neck portion, so that the maximum shoulder angle exceeds 10 °, and the crystal diameter suddenly expands from the shoulder portion to the body portion. Instead of restraining, the shape should be a gentle angle, that is, the shoulder angle gradually increases. Further, monotonically changing the second derivative of the shape with respect to the crystal length means changing the shape of the shoulder smoothly as described above, and as a result, fluctuations in the heating unit output can be suppressed. A step at the shoulder and cracking due to thermal strain can be prevented. In addition, since the transition from the shoulder portion to the body portion is made smooth, the crystal growth in a natural shape is not unreasonable, resulting in less strain near the shoulder portion, and the strain coming from this shape. Can also prevent cracks.
[0022]
Here, the shoulder formation control as described above can be specifically performed by temperature control based on the heating unit output.
[0023]
Other than the above shoulder formation, such as pulling up the body after the shoulder is formed, a normal oxide single crystal pulling and manufacturing method can be adopted, and can be performed according to a conventional method.
[0024]
【The invention's effect】
According to the method for producing an oxide single crystal of the present invention, an oxide single crystal can be produced with good productivity and yield by preventing cracks as much as possible.
[0025]
【Example】
EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
[0026]
[Example 1]
A iridium crucible having a diameter of 180 mmφ and a height of 180 mmφ is provided with a iridium reflector having an outer diameter of 185 mmφ, an inner diameter of 130 mmφ and a thickness of 2 mm, and a cylindrical iridium aftermarket having a diameter of 180 mmφ and a height of 180 mmφ. A heater was placed.
[0027]
In this crucible, 15,000 g of a total of 15,000 g of 6,500 g of a calcined raw material having a composition ratio of Li / Ta = 0.944 (molar ratio) and 8,500 g of crystal lump is first put, and the remaining 3, After melting, 000 g was melted, and 30 cm of a lithium tantalate single crystal having a 4-inch diameter weight of 10,500 g and a neck and shoulder shape shown in Table 1 and FIG. Raised the book. As a result, no crack was generated and the yield was 92%.
[0028]
[Table 1]
[0029]
[Example 2]
An iridium crucible with a diameter of 150 mmφ and a height of 150 mmφ is provided with a iridium reflector having an outer diameter of 160 mmφ, an inner diameter of 105 mmφ and a thickness of 2 mm, and a cylindrical iridium aftermarket having a diameter of 150 mmφ and a height of 180 mmφ. A heater was placed.
[0030]
In this crucible, a total of 10,000 g of 4,500 g of the calcined raw material having a composition ratio of Li / Ta = 0.944 (molar ratio) and a crystal mass of 5,500 g is first put, and the remaining 3, 000 g is added, and after melting, a 3-inch diameter lithium tantalate single crystal having a neck and shoulder shape shown in Table 2 and FIG. 2 is continuously formed in the X-axis direction by the Czochralski method. Raised 30. As a result, only one crack was generated, and the yield was 89%.
[0031]
[Table 2]
[0032]
[Comparative example]
An iridium crucible with a diameter of 150 mmφ and a height of 150 mmφ is provided with a iridium reflector having an outer diameter of 160 mmφ, an inner diameter of 105 mmφ and a thickness of 2 mm, and a cylindrical iridium aftermarket having a diameter of 150 mmφ and a height of 180 mmφ. A heater was placed.
[0033]
In this crucible, a total of 10,000 g of 4,500 g of the calcined raw material having a composition ratio of Li / Ta = 0.944 (molar ratio) and a crystal mass of 5,500 g is first put, and the remaining 3, put 000 g, neck shown in Table 3 and Figure 3 in the X-axis direction, a tantalum single crystal of lithium of 3 inch diameter shape of the shoulder portion was 30 present pulled continuously by melt after the Czochralski method. As a result, five cracks occurred and the yield was 71%.
[0034]
[Table 3]
[Brief description of the drawings]
1 is a graph showing the relationship between the crystal growth distance and f ″ (X) in Example 1. FIG.
2 is a graph showing the relationship between the crystal growth distance and f ″ (X) in Example 2. FIG.
FIG. 3 is a graph showing a relationship between a crystal growth distance and f ″ (X) in a comparative example.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18483695A JP3675520B2 (en) | 1995-06-28 | 1995-06-28 | Method for producing oxide single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18483695A JP3675520B2 (en) | 1995-06-28 | 1995-06-28 | Method for producing oxide single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0912393A JPH0912393A (en) | 1997-01-14 |
| JP3675520B2 true JP3675520B2 (en) | 2005-07-27 |
Family
ID=16160165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18483695A Expired - Fee Related JP3675520B2 (en) | 1995-06-28 | 1995-06-28 | Method for producing oxide single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3675520B2 (en) |
-
1995
- 1995-06-28 JP JP18483695A patent/JP3675520B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0912393A (en) | 1997-01-14 |
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