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JP3695769B2 - Method for manufacturing thick film circuit board - Google Patents
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JP3695769B2 - Method for manufacturing thick film circuit board - Google Patents

Method for manufacturing thick film circuit board Download PDF

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Publication number
JP3695769B2
JP3695769B2 JP33502993A JP33502993A JP3695769B2 JP 3695769 B2 JP3695769 B2 JP 3695769B2 JP 33502993 A JP33502993 A JP 33502993A JP 33502993 A JP33502993 A JP 33502993A JP 3695769 B2 JP3695769 B2 JP 3695769B2
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JP
Japan
Prior art keywords
conductor wiring
hole
insulating layer
circuit board
thick film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP33502993A
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Japanese (ja)
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JPH07202420A (en
Inventor
理香 築地
裕 入間川
宏敏 押川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
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Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP33502993A priority Critical patent/JP3695769B2/en
Publication of JPH07202420A publication Critical patent/JPH07202420A/en
Application granted granted Critical
Publication of JP3695769B2 publication Critical patent/JP3695769B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Description

【0001】
【産業上の利用分野】
本発明は、厚膜回路基板の製造方法、特に、絶縁層に形成された貫通孔を通じて連結される第1及び第2導体配線を備えた厚膜回路基板の製造方法に関する。
【0002】
【従来の技術】
電子部品が搭載される厚膜回路基板は、近年においては高密度化が要求されており、多層化が進んでいる。
多層化された厚膜回路基板は、たとえば、絶縁基板と、絶縁基板の一面に形成された下部導体配線と、下部導体配線を覆うように絶縁基板の一面上に形成された絶縁層と、絶縁層上に形成された第2導体配線とを備えている。絶縁層には、直径300〜700μmの貫通孔が形成されており、その貫通孔内に下部導体配線と上部導体配線とを接続するビアホール導体が形成されている。
【0003】
前記厚膜回路基板を形成するには、始めに絶縁基板上に下部導体配線となる銅ペーストを塗布する。続いて、絶縁層となるペーストを絶縁基板上に塗布する。このとき、絶縁層には所定位置に貫通孔が形成される。さらに100〜150℃で絶縁層を乾燥し、900℃で焼成する。次に、ビアホール導体を印刷・焼成し、上部導体配線となる銅ペーストを絶縁層上に塗布する。このとき、上部導体配線は絶縁層に形成された貫通孔を通じて第1導体配線に接続される。基板全体を約900℃の高温で焼成する。
【0004】
【発明が解決しようとする課題】
前記従来の厚膜回路基板の製造方法では、絶縁層になるペースト材料を塗布した後に、乾燥前のペースト材料が貫通孔の内側にたれて貫通孔を塞いでしまうことがある。この場合は、上部導体と下部導体との間の導通不良が生じる。
本発明の目的は、導体間の導通不良を減らすことにある。
【0005】
【課題を解決するための手段】
本発明に係る厚膜回路基板の製造方法は、絶縁基板と、絶縁基板の一面に形成された第1導体配線と、第1導体配線を覆うように絶縁基板の一面上に形成されかつ所定位置に貫通孔を有する絶縁層と、絶縁層上に形成されかつ貫通孔を通じて第1導体配線に接続された第2導体配線とを備えた厚膜回路基板の製造方法である。この製造方法は、第1導体配線形成工程と連結導体部形成工程と絶縁層形成工程と第2導体配線形成工程とを含んでいる。
【0006】
第1導体配線形成工程は、絶縁基板の前記一面に第1導体配線を形成する。連結導体部形成工程は、第1導体配線上において前記所定位置に連結導体部を形成する。絶縁層形成工程は、絶縁体ペーストをスクリーン印刷により複数回にわたって塗布することにより、連結導体部が貫通孔内に位置し、且つ前記貫通孔の径が上方の層にしたがって大きくなるように、前記絶縁層を前記絶縁基板の前記一面上に形成する。第2導体配線形成工程は、貫通孔を通じて連結導体部に接続されるよう絶縁層上に前記第2導体配線を形成する。
【0007】
【作用】
本発明に係る厚膜回路基板の製造方法では、連結導体部を絶縁層より先に第1導体配線上に形成し、絶縁層を連結導体部が貫通孔に嵌合するように絶縁基板上に形成する。したがって、連結導体部が遮断されるのを防止でき、第1導体配線と第2導体配線との導通不良が減る。
【0008】
【実施例】
図1に示す厚膜回路基板1は電子部品が搭載されるものであり、絶縁基板2と、絶縁基板2の上面に形成された下部導体配線3と、絶縁基板2の上面において下部導体配線3を覆うように形成された絶縁層4と、絶縁層4上に形成された上部導体配線5とから形成されている。絶縁層4の複数の所定位置には、貫通孔4a(径300〜500μm)が形成されており、貫通孔4a内に充填されたビアホール導体6が下部導体配線3と上部導体配線5とを接続している。なお、貫通孔4aの径は、上方にいくにしたがって大きくなっている。
【0009】
なお、絶縁基板2は、たとえばアルミナ、AlN、ムライト等からなる矩形状の基板である。下部導体配線3、上部導体配線5及びビアホール導体6は、銅ペースト(たとえばデュポン社製のDP9153)を焼成して形成されている。また、絶縁層4は、ペースト材料(たとえば旭硝子社製の誘電体ペーストAP5815)を乾燥して得られる。
【0010】
次に、厚膜回路基板1の製造方法について説明する。
始めに、図2に示すように、たとえばアルミナ、AlN、ムライト等から構成され絶縁基板2を用意する。次に、図3に示すように、絶縁基板2上に、スクリーン印刷によって下部導体配線3となる銅ペーストを塗布する。そして、図4に示すように、下部導体配線3上に、スクリーン印刷を複数回行うことにより、ビアホール導体6となる銅ペースト(径300〜500μm)を形成する。ビアホール導体6の位置は、完成時に絶縁層4の貫通孔4aが形成される位置に一致して複数形成されている。各ビアホール導体6は図の上方向に延びている。
【0011】
さらに、図5に示すように、絶縁層4となる絶縁体ペーストをスクリーン印刷によって絶縁基板2の上面に塗布する。絶縁体ペーストの塗布は複数回にわたって行われ、図6に示すように、下部導体配線3上には第1層4A、第2層4B及び第3層4Cが形成されている。絶縁層4は下部導体配線3を覆っているが、ビアホール導体6に対応する位置に貫通孔4aが形成されており、貫通孔4a内にビアホール導体6が嵌合する。
【0012】
以上に説明したように、ビアホール導体6が絶縁層4より先に形成されているので、たとえペースト材料が貫通孔4aの内側にたれ下がってきても貫通孔4aを塞ぎにくい。さらに、貫通孔4aの径は、上方の層にしたがって大きくなるように設定されているので、貫通孔4aの上部が内側に垂れ下がりにくくなっている。
【0013】
次に、絶縁基板2を乾燥炉の中に入れ、100〜150℃で絶縁層4を乾燥する。
乾燥後の絶縁層4上に、上部導体配線5となる銅ペーストをスクリーン印刷によって塗布する。このとき、上部導体配線5は、貫通孔4aを通じてビアホール導体6に接続される。ここでは、貫通孔4aはペースト材料のたれによって塞がれていないので、上部導体配線5と下部導体配線3との導通不良が減る。
【0014】
最後に、絶縁基板2を非酸化性雰囲気中で約900℃の高温で焼成する。これにより、厚膜回路基板1が完成する。
〔実験例〕
厚膜回路基板を従来の製造方法と本発明による製造方法とでそれぞれ製造し、両者の導体不良率を比較した。この実験では、径が300μmのビアホール導体を下部導体配線上に100ヶ所形成した。導通の有無は絶縁抵抗計で計測し、109 Ω以上が導通良好であるとした。従来製造方法では導通不良率は6%であり、本発明による製造方法では導通不良率は0%になった。
〔他の実施例〕
なお、前記実施例では絶縁層4は3層に形成されているが、本発明は4層以上でも採用できる。
【0015】
【発明の効果】
本発明に係る厚膜回路基板の製造方法では、連結導体部を絶縁層より先に第1導体配線上に形成するので、連結導体部が遮断されにくくなり、第1導体配線と第2導体配線との導通不良が減る。
【図面の簡単な説明】
【図1】本発明の一実施例により製造された厚膜回路基板の縦断面概略図。
【図2】厚膜回路基板の製造工程の一段階を示す図。
【図3】厚膜回路基板の製造工程の一段階を示す図。
【図4】厚膜回路基板の製造工程の一段階を示す図。
【図5】厚膜回路基板の製造工程の一段階を示す図。
【図6】厚膜回路基板の製造工程の一段階を示す図。
【符号の説明】
1 厚膜回路基板
2 絶縁基板
3 下部導体配線
4 絶縁層
4a 貫通孔
5 上部導体配線
6 ビアホール導体
[0001]
[Industrial application fields]
The present invention relates to a method for manufacturing a thick film circuit board, and more particularly, to a method for manufacturing a thick film circuit board including first and second conductor wirings connected through through holes formed in an insulating layer.
[0002]
[Prior art]
In recent years, a thick film circuit board on which electronic components are mounted is required to have a high density, and the number of layers is increasing.
The multilayered thick film circuit board includes, for example, an insulating substrate, a lower conductor wiring formed on one surface of the insulating substrate, an insulating layer formed on one surface of the insulating substrate so as to cover the lower conductor wiring, And a second conductor wiring formed on the layer. A through-hole having a diameter of 300 to 700 μm is formed in the insulating layer, and a via-hole conductor that connects the lower conductor wiring and the upper conductor wiring is formed in the through-hole.
[0003]
In order to form the thick film circuit board, first, a copper paste to be a lower conductor wiring is applied on an insulating substrate. Subsequently, a paste to be an insulating layer is applied on the insulating substrate. At this time, a through hole is formed at a predetermined position in the insulating layer. Further, the insulating layer is dried at 100 to 150 ° C. and fired at 900 ° C. Next, the via-hole conductor is printed and fired, and a copper paste to be the upper conductor wiring is applied on the insulating layer. At this time, the upper conductor wiring is connected to the first conductor wiring through a through hole formed in the insulating layer. The entire substrate is baked at a high temperature of about 900 ° C.
[0004]
[Problems to be solved by the invention]
In the conventional method for manufacturing a thick film circuit board, after applying a paste material to be an insulating layer, the paste material before drying may fall inside the through hole and close the through hole. In this case, poor conduction occurs between the upper conductor and the lower conductor.
An object of the present invention is to reduce poor conduction between conductors.
[0005]
[Means for Solving the Problems]
A method of manufacturing a thick film circuit board according to the present invention includes an insulating substrate, a first conductor wiring formed on one surface of the insulating substrate, and a predetermined position formed on one surface of the insulating substrate so as to cover the first conductor wiring. And a second conductor wiring that is formed on the insulating layer and connected to the first conductor wiring through the through hole. This manufacturing method includes a first conductor wiring forming step, a connecting conductor portion forming step, an insulating layer forming step, and a second conductor wiring forming step.
[0006]
In the first conductor wiring forming step, a first conductor wiring is formed on the one surface of the insulating substrate. In the connecting conductor portion forming step, the connecting conductor portion is formed at the predetermined position on the first conductor wiring. The insulating layer forming step is performed by applying the insulating paste a plurality of times by screen printing so that the connecting conductor portion is located in the through hole and the diameter of the through hole is increased according to the upper layer. An insulating layer is formed on the one surface of the insulating substrate. In the second conductor wiring forming step, the second conductor wiring is formed on the insulating layer so as to be connected to the connecting conductor portion through the through hole.
[0007]
[Action]
In the method of manufacturing a thick film circuit board according to the present invention, the connecting conductor portion is formed on the first conductor wiring before the insulating layer, and the insulating layer is formed on the insulating substrate so that the connecting conductor portion fits into the through hole. Form. Accordingly, the connection conductor portion can be prevented from being cut off, and the conduction failure between the first conductor wiring and the second conductor wiring is reduced.
[0008]
【Example】
A thick film circuit board 1 shown in FIG. 1 has electronic components mounted thereon, an insulating substrate 2, a lower conductor wiring 3 formed on the upper surface of the insulating substrate 2, and a lower conductor wiring 3 on the upper surface of the insulating substrate 2. The insulating layer 4 is formed so as to cover the upper surface, and the upper conductor wiring 5 is formed on the insulating layer 4. Through holes 4 a (diameter 300 to 500 μm) are formed at a plurality of predetermined positions of the insulating layer 4, and via-hole conductors 6 filled in the through holes 4 a connect the lower conductor wiring 3 and the upper conductor wiring 5. are doing. The diameter of the through hole 4a increases as it goes upward.
[0009]
The insulating substrate 2 is a rectangular substrate made of alumina, AlN, mullite, or the like. The lower conductor wiring 3, the upper conductor wiring 5, and the via-hole conductor 6 are formed by firing a copper paste (for example, DP9153 manufactured by DuPont). The insulating layer 4 is obtained by drying a paste material (for example, dielectric paste AP5815 manufactured by Asahi Glass Co., Ltd.).
[0010]
Next, a method for manufacturing the thick film circuit board 1 will be described.
First, as shown in FIG. 2, an insulating substrate 2 made of, for example, alumina, AlN, mullite or the like is prepared. Next, as shown in FIG. 3, a copper paste to be the lower conductor wiring 3 is applied on the insulating substrate 2 by screen printing. And as shown in FIG. 4, the copper paste (diameter 300-500 micrometers) used as the via-hole conductor 6 is formed on the lower conductor wiring 3 by performing screen printing several times. A plurality of via hole conductors 6 are formed so as to coincide with the positions where the through holes 4a of the insulating layer 4 are formed when completed. Each via-hole conductor 6 extends upward in the figure.
[0011]
Further, as shown in FIG. 5, an insulating paste to be the insulating layer 4 is applied to the upper surface of the insulating substrate 2 by screen printing. The insulating paste is applied a plurality of times. As shown in FIG. 6, the first layer 4 </ b> A, the second layer 4 </ b> B, and the third layer 4 </ b> C are formed on the lower conductor wiring 3. The insulating layer 4 covers the lower conductor wiring 3, but a through hole 4 a is formed at a position corresponding to the via hole conductor 6, and the via hole conductor 6 is fitted into the through hole 4 a.
[0012]
As described above, since the via-hole conductor 6 is formed before the insulating layer 4, it is difficult to block the through-hole 4a even if the paste material hangs down inside the through-hole 4a. Furthermore, since the diameter of the through hole 4a is set so as to increase according to the upper layer, the upper part of the through hole 4a is unlikely to hang down inward.
[0013]
Next, the insulating substrate 2 is put in a drying furnace, and the insulating layer 4 is dried at 100 to 150 ° C.
On the insulating layer 4 after drying, a copper paste to be the upper conductor wiring 5 is applied by screen printing. At this time, the upper conductor wiring 5 is connected to the via-hole conductor 6 through the through hole 4a. Here, since the through-hole 4a is not blocked by the dripping of the paste material, the conduction failure between the upper conductor wiring 5 and the lower conductor wiring 3 is reduced.
[0014]
Finally, the insulating substrate 2 is baked at a high temperature of about 900 ° C. in a non-oxidizing atmosphere. Thereby, the thick film circuit board 1 is completed.
[Experimental example]
Thick film circuit boards were manufactured by the conventional manufacturing method and the manufacturing method according to the present invention, and the conductor defect rates of the two were compared. In this experiment, 100 via hole conductors having a diameter of 300 μm were formed on the lower conductor wiring. The presence / absence of conduction was measured with an insulation resistance meter, and 10 9 Ω or more was considered to be good conduction. In the conventional manufacturing method, the conduction failure rate is 6%, and in the production method according to the present invention, the conduction failure rate is 0%.
[Other Examples]
In the above embodiment, the insulating layer 4 is formed in three layers, but the present invention can also be adopted in four or more layers.
[0015]
【The invention's effect】
In the method of manufacturing the thick film circuit board according to the present invention, the connecting conductor portion is formed on the first conductor wiring before the insulating layer, so that the connecting conductor portion is not easily cut off, and the first conductor wiring and the second conductor wiring are formed. Reduces the continuity of electrical connection.
[Brief description of the drawings]
FIG. 1 is a schematic vertical sectional view of a thick film circuit board manufactured according to an embodiment of the present invention.
FIG. 2 is a view showing one stage of a manufacturing process of a thick film circuit board.
FIG. 3 is a view showing one stage of a manufacturing process of a thick film circuit board.
FIG. 4 is a view showing one stage of a manufacturing process of a thick film circuit board.
FIG. 5 is a view showing one stage of a manufacturing process of a thick film circuit board.
FIG. 6 is a view showing one stage of a manufacturing process of a thick film circuit board.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Thick film circuit board 2 Insulating board 3 Lower conductor wiring 4 Insulating layer 4a Through-hole 5 Upper conductor wiring 6 Via-hole conductor

Claims (1)

絶縁基板と、前記絶縁基板の一面に形成された第1導体配線と、前記第1導体配線を覆うように前記絶縁基板の前記一面上に形成されかつ所定位置に貫通孔を有する絶縁層と、前記絶縁層上に形成されかつ前記貫通孔を通じて前記第1導体配線に接続された第2導体配線とを備えた厚膜回路基板の製造方法であって、
前記絶縁基板の前記一面に前記第1導体配線を形成する第1導体配線形成工程と、
前記第1導体配線上において前記所定位置に連結導体部を形成する連結導体部形成工程と、
絶縁体ペーストをスクリーン印刷により複数回にわたって塗布することにより、前記連結導体部が前記貫通孔内に位置し、且つ前記貫通孔の径が上方の層にしたがって大きくなるように、前記絶縁層を前記絶縁基板の前記一面上に形成する絶縁層形成工程と、
前記貫通孔を通じて前記連結導体部に接続されるよう前記絶縁層上に前記第2導体配線を形成する第2導体配線形成工程と、
を含む厚膜回路基板の製造方法。
An insulating substrate; a first conductor wiring formed on one surface of the insulating substrate; an insulating layer formed on the one surface of the insulating substrate so as to cover the first conductor wiring and having a through hole at a predetermined position; A method of manufacturing a thick film circuit board comprising a second conductor wiring formed on the insulating layer and connected to the first conductor wiring through the through-hole,
A first conductor wiring forming step of forming the first conductor wiring on the one surface of the insulating substrate;
A connecting conductor portion forming step of forming a connecting conductor portion at the predetermined position on the first conductor wiring;
By applying the insulator paste a plurality of times by screen printing, the connecting conductor portion is positioned in the through hole, and the diameter of the through hole is increased according to the upper layer, the insulating layer is Forming an insulating layer on the one surface of the insulating substrate;
A second conductor wiring forming step of forming the second conductor wiring on the insulating layer so as to be connected to the connecting conductor portion through the through hole;
Of manufacturing a thick film circuit board.
JP33502993A 1993-12-28 1993-12-28 Method for manufacturing thick film circuit board Expired - Fee Related JP3695769B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33502993A JP3695769B2 (en) 1993-12-28 1993-12-28 Method for manufacturing thick film circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33502993A JP3695769B2 (en) 1993-12-28 1993-12-28 Method for manufacturing thick film circuit board

Publications (2)

Publication Number Publication Date
JPH07202420A JPH07202420A (en) 1995-08-04
JP3695769B2 true JP3695769B2 (en) 2005-09-14

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Application Number Title Priority Date Filing Date
JP33502993A Expired - Fee Related JP3695769B2 (en) 1993-12-28 1993-12-28 Method for manufacturing thick film circuit board

Country Status (1)

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Also Published As

Publication number Publication date
JPH07202420A (en) 1995-08-04

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