JP3727597B2 - Surface-treated film, metal-deposited film using the surface-treated film, and method for producing metal-deposited film - Google Patents

Description

【００２６】
上記図に示されるとおり、酸素プラズマであってプラズマ放電の強度が２２０Ｗ・ｍｉｎ／ｍ ^２ 以上７００Ｗ・ｍｉｎ／ｍ ^２ 以下の範囲にある場合は密着強度は高い数値を示すが、それ以外の場合における密着強度は低い数値しか示さないことがわかる。
【００２７】
【発明の効果】
以上のように、本願発明の請求項１に記載のフィルムによれば、シクロオレフィン系フィルムの片面若しくは両面に対して、プラズマ放電処理を施したので、シクロオレフィンの構造の一部が切断されてシクロオレフィン系フィルムの表面に官能基の腕が出ることになり、この腕を用いることで、金属蒸着層を設けると密着力の増強したものとすることが出来る。
【００２８】
また、本願発明によれば、プラズマ放電処理における放電ガスを酸素ガスとした直流グロー放電であることし、かつプラズマ放電の強度が２２０Ｗ・ｍｉｎ／ｍ ^２ 以上７００Ｗ・ｍｉｎ／ｍ ^２ 以下であることとしたので、官能基の腕として酸素原子の腕を利用できるようになり、より一層密着力を向上させることが可能となり、また表面に脆弱層を形成しなくなるのである。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a surface-treated film, a metal vapor-deposited film using the surface-treated film, and a method for producing the metal vapor-deposited film, and in particular, a film surface when forming a metal vapor-deposited layer on the film surface The present invention relates to a surface-treated film capable of increasing the adhesion force generated between the metal-deposited layer, a metal-deposited film using the surface-treated film, and a method for producing the metal-deposited film.
[0002]
[Prior art]
Conventionally, when forming a metal vapor deposition layer on various types of film surfaces, in order to facilitate the adhesion of the metal vapor deposition layer to the film surface, that is, to increase the adhesion between the film surface and the metal vapor deposition layer. A method is used in which a metal deposition layer is provided on the treated surface after the film surface has been subjected to a surface treatment in advance. In particular, when a metal vapor-deposited layer is provided on a cycloolefin film excellent in low water absorption, etc., it can be used as a semi-transmissive / semi-reflective film used in liquid crystal display devices and the like that have recently become popular. It is desired to improve the adhesion generated between the metal and the metal vapor deposition layer.
[0003]
In order to provide a metal vapor deposition layer by depositing a metal such as aluminum on the surface of the cycloolefin film excellent in low water absorption, etc., conventionally, surface modification is performed using discharge in the atmosphere. The film surface is subjected to corona discharge treatment or glow discharge treatment, which is similarly modified by using discharge in a vacuum, to make the film surface easy to adhere, and then the above-mentioned film surface is processed. A metal vapor-deposited layer is provided on the surface.
[0004]
[Problems to be solved by the invention]
However, after surface modification of a cycloolefin film by corona discharge treatment or glow discharge treatment as described above, even if an attempt is made to provide a metal vapor deposition layer on the surface, the cycloolefin film surface and the metal vapor deposition layer In the meantime, the desired sufficient adhesion was not always produced. In the case of a cycloolefin-based film, there is no polar group due to its structure. Therefore, even if corona discharge or glow discharge treatment is performed, the adhesion cannot be easily improved.
[0005]
Therefore, from the viewpoint of enhancing the adhesion, JP-A-8-267645 discloses an invention in which the adhesion is increased by providing an anchor vapor deposition layer having a specific thickness under glow discharge. However, this method has a problem that it is necessary to perform glow discharge and metal vapor deposition at the same time, so that the work process is difficult and, consequently, the manufacturing cost is increased.
[0006]
In addition, even in the case of performing plasma treatment by direct current glow discharge using oxygen gas, there has been conventionally presented a method that requires further nucleation metal deposition. Since there was an extra step of vapor deposition, the entire work process became more difficult, which was also a problem.
[0007]
The present invention has been made in view of such problems, and the object thereof is to make the adhesion between the cycloolefin film surface and the metal vapor deposition layer sufficient by a simple method. The present invention provides a cycloolefin-based film subjected to surface treatment, a metal vapor-deposited film using the film, and a method for producing the metal vapor-deposited film.
[0008]
[Means for Solving the Problems]
In order to solve the above problems, the invention according to claim 1 of the present invention is a surface-treated film obtained by performing plasma discharge treatment on one or both sides of a cycloolefin-based film, wherein the plasma discharge is performed. The treatment is a direct current glow discharge using an oxygen gas as a discharge gas, and the intensity of the plasma discharge treatment is 220 W · min / m ² or more and 700 W · min / m ² or less .
[0009]
The invention according to claim 2 of the present invention is characterized in that the surface-treated film according to claim 1 is provided with a metal vapor deposition layer directly on the surface subjected to plasma treatment.
[0010]
Invention of Claim 3 of this invention is a plasma processing process formed by performing plasma discharge processing with respect to the single side | surface or both surfaces of a cycloolefin type film, and the plasma of the cycloolefin type film which finished the said plasma processing process A vapor deposition step in which a metal vapor deposition layer is provided directly on the treatment surface, and the plasma discharge treatment in the plasma treatment step is a direct current glow discharge using oxygen gas as a discharge gas, and The intensity of the plasma discharge treatment is 220 W · min / m ² or more and 700 W · min / m ² or less .
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below. It should be noted that the embodiment shown here is merely an example, and is not necessarily limited to this embodiment. (Embodiment 1)
A surface-treated film according to the present invention will be described as a first embodiment.
The film used here is a cycloolefin film, and the surface-treated film is assumed to have been subjected to plasma discharge treatment on the surface of the cycloolefin film, but is not necessarily limited thereto. Other films can also be considered. Moreover, although both surfaces may be sufficient as the film surface, in the following description, it demonstrates supposing the state which processed the film single side | surface.
[0016]
The plasma discharge treatment may be performed by a known method, but in particular, if a direct current glow discharge using oxygen gas as the discharge gas is obtained, a very good effect is obtained with respect to the adhesion, and the intensity of the discharge at that time is 220 W · If it is set to min / m ² or more and 700 W · min / m ² or less , a more preferable effect is obtained. In other words, the film surface is cleaned by performing plasma treatment on the surface of the cycloolefin-based film, and as a result, the surface is modified to form a functional group. By using this functional group, the adhesion is very suitable. It improves. And it becomes difficult to form a weak layer on the surface by making the intensity | strength of discharge into the said range.
[0017]
The metal vapor deposition film using the surface-treated film thus formed will be described.
As the cycloolefin film, for example, a film mainly comprising a cycloolefin resin obtained by polymerizing dicyclopentadiene as a raw material is preferable. Since decomposition or the like does not occur, it is preferable because a very favorable property can be obtained in that it does not cause environmental problems during disposal and combustion. In addition, when this film is used as a base material, it is possible to produce a semi-transmissive / semi-reflective film having a very good performance. However, with the recent spread of liquid crystal display devices, needs for such films have increased rapidly. It is what. Although not described in detail, as the resin used for the cycloolefin-based film, in addition to the above, for example, polyethylene (PE), polypropylene (PP), or both polyolefins, and a fat in the molecular skeleton. It is also conceivable to use a cycloolefin resin having a ring structure. The thickness of the cycloolefin-based film is preferably 4 μm to 200 μm. This is because if it is within this range, the handling property is suitable.
[0018]
By the way, since this cycloolefin-type film does not have polarity, there is almost no adhesive force if it is the same as it is. Therefore, in this embodiment, in order to increase the adhesion force, surface modification is performed by performing plasma treatment on the film surface, and a cycloolefin-based film and a layer deposited thereon, for example, a metal deposition layer, It improves the adhesive strength of the.
[0019]
Therefore, the plasma processing will be specifically described.
In the present embodiment, a direct current glow discharge is used in which the discharge gas is oxygen gas. By subjecting the surface of the cycloolefin-based film to plasma discharge treatment using oxygen gas, a part of the group possessed by the cycloolefin is cut, and the oxygen atom arms appear on the surface. By using this arm of oxygen atoms, the adhesion between the plasma-treated surface of the cycloolefin film according to the present embodiment and the metal vapor deposition layer can be made sufficient. That is, the arms of oxygen atoms and the arms of metal molecules constituting the metal vapor deposition layer cause chemical bonds, which can improve the adhesion, and are the reason for using oxygen gas as the discharge gas.
As the material constituting the metal deposition layer to come into close contact with the cycloolefin-based film according to the present embodiment, aluminum, chromium, indium, tin, nickel and the like are considered, SiO _2, ITO further a metal oxide However, the present embodiment is not limited to these.
[0020]
The surface-treated film according to the present embodiment is as described above, but as a method for producing this film, a plasma treatment step of performing plasma discharge treatment on one side or both sides of the cycloolefin film, It is conceivable that the manufacturing method includes a vapor deposition step in which a metal vapor deposition layer is directly provided on the plasma treatment surface of the cycloolefin-based film after the plasma treatment step. However, the film according to the present embodiment may be manufactured by a manufacturing method other than the above.
[0021]
Further, the plasma discharge treatment is a direct current glow discharge using oxygen gas as a discharge gas, and the intensity of the plasma discharge is more preferably 220 W · min / m ² or more and 700 W · min / m ² or less. A film for vapor deposition can be produced. About a vapor deposition process, a well-known vapor deposition method can be used.
[0022]
As described above, if the surface-treated film according to the present embodiment is used, a cycloolefin-based film with improved surface adhesion can be obtained, and a metal vapor deposition layer can be obtained by using the cycloolefin-based film. It is possible to obtain a metal vapor-deposited film with improved adhesion.
[0023]
【Example】
EXAMPLES Hereinafter, although an Example demonstrates this invention more concretely, this invention is not necessarily limited to these Examples. The laminate strength was evaluated as follows.
[0024]
(Evaluation method of laminate strength)
The surface of the metal vapor-deposited layer is coated with a vinyl chloride / vinyl acetate copolymer adhesive corresponding to a solid content of 3 μm, and this vinyl chloride / vinyl acetate copolymer adhesive is overlaid with a 200 μm-thick soft PVC film. . Then, a pressure of 2.0 kg / cm ² is applied at 125 ° C. for 2 seconds, and aging is performed in an atmosphere at 25 ° C. for 24 hours. After aging, this was cut out to a size of 15 mm × 200 mm, and a tensile speed of 200 mm / g between the Al vapor-deposited layer and the adhesive layer was measured with a desktop precision universal testing machine (Shimadzu Autograph AGS-100, manufactured by Shimadzu Corporation). Peel 90 ° in min. The strength at the time of peeling was evaluated and measured as adhesion strength (hereinafter referred to as “dry adhesion strength”). In addition, when two to three drops of distilled water were dropped on the peeled surface when starting to pull in the same manner as described above, the strength at the time of peeling was evaluated and measured as the adhesion strength (hereinafter referred to as “wet adhesion strength”). ).
[0025]
(Examples and Comparative Examples)
Plasma treatment was performed on the surface of a cycloolefin film (Nippon Zeon Corporation “ZEONOR” film thickness 50 μm), and an aluminum layer was formed as a metal layer on the plasma treated surface. Specifically, the working gas pressure is set to 0.1 Pa to 10 Pa, a plasma treatment is performed by a direct current glow discharge of oxygen using a roll-to-roll vacuum deposition machine, and a resistance is applied to the plasma treatment surface. Aluminum was deposited by heating to form a metal layer. The results are shown below. When the plasma treatment was not performed, the discharge gas was nitrogen, the discharge gas was argon, or the discharge gas was oxygen, but the plasma intensity was 220 W · min / m ² or more and 700 W · min / m ^2. The same test was also conducted for cases outside the following ranges. The result is also shown below as a comparative example.
[Table 1]

[0026]
As shown in the above figure, when the intensity of plasma discharge is in the range of 220 W · min / m ² or more and 700 W · min / m ² or less , the adhesion strength shows a high value, but in other cases It can be seen that the adhesion strength at is only low.
[0027]
【The invention's effect】
As described above, according to the film according to claim 1 of the present invention, since the plasma discharge treatment is performed on one side or both sides of the cycloolefin-based film, a part of the structure of the cycloolefin is cut. The arm of the functional group appears on the surface of the cycloolefin film, and by using this arm, the adhesion can be enhanced when a metal vapor deposition layer is provided.
[0028]
Further, according to the present invention, it is a direct current glow discharge in which the discharge gas in the plasma discharge treatment is oxygen gas, and the intensity of the plasma discharge is 220 W · min / m ² or more and 700 W · min / m ² or less. As a result, the arm of oxygen atoms can be used as the arm of the functional group, the adhesion can be further improved, and the fragile layer is not formed on the surface.

Claims (3)

  A surface-treated film obtained by subjecting one or both sides of a cycloolefin-based film to plasma discharge treatment,
  The plasma discharge treatment is a direct current glow discharge using oxygen gas as a discharge gas,
  And the intensity of the plasma discharge treatment is 220 W · min / m ² 700 W · min / m ² That
  Surface-treated film characterized by   The surface-treated film according to claim 1,
  A metal-deposited layer is directly provided on the plasma-treated surface;
  A metal vapor deposited film characterized by   A plasma treatment process, which is performed by performing plasma discharge treatment on one side or both sides of the cycloolefin film,
  A vapor deposition step, in which a metal vapor deposition layer is provided directly on the plasma treatment surface of the cycloolefin-based film after the plasma treatment step;
  A process comprising:
  The plasma discharge treatment in the plasma treatment step is a direct current glow discharge using an oxygen gas as a discharge gas,
  And the intensity of the plasma discharge treatment is 220 W · min / m ² 700 W · min / m ² That
  The manufacturing method of a metal vapor deposition film characterized by these.