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JP3778194B2 - Failure detection method and failure detection apparatus for semiconductor device - Google Patents
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JP3778194B2 - Failure detection method and failure detection apparatus for semiconductor device - Google Patents

Failure detection method and failure detection apparatus for semiconductor device Download PDF

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JP3778194B2
JP3778194B2 JP2003335261A JP2003335261A JP3778194B2 JP 3778194 B2 JP3778194 B2 JP 3778194B2 JP 2003335261 A JP2003335261 A JP 2003335261A JP 2003335261 A JP2003335261 A JP 2003335261A JP 3778194 B2 JP3778194 B2 JP 3778194B2
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power supply
frequency
supply current
iddq
measurement
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JP2005098925A (en
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潤一 平瀬
智之 佐々木
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Panasonic Corp
Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Description

本発明は、半導体装置に関し、半導体装置の故障検出及び評価を効率よく行える故障検出方法及びその装置に関わる。   The present invention relates to a semiconductor device, and relates to a failure detection method and apparatus capable of efficiently detecting and evaluating a failure of a semiconductor device.

近年、半導体集積回路には、微細化に伴う低電圧化、低消費電流化、高速化と共に大規模化、高集積化、多機能・複合機能化などの技術変化が急激に起こっている。それと共に、半導体大規模集積回路のテストはますます重要となる一方で、テスト開発を一層難しくしている。   2. Description of the Related Art In recent years, semiconductor integrated circuits have undergone rapid technological changes such as downsizing, low current consumption, and high speed as well as miniaturization, as well as large scale, high integration, and multifunctional / composite functions. At the same time, testing of semiconductor large scale integrated circuits becomes increasingly important, but makes test development more difficult.

従来の半導体故障検出手法として、半導体集積回路内の開放故障、短絡故障や縮退故障に効果的であるとする静止電源電流測定(以下、IDDQ測定と記す)を用いるものがあった。   As a conventional semiconductor failure detection method, there has been a method using quiescent power supply current measurement (hereinafter referred to as IDDQ measurement) that is effective for an open fault, a short-circuit fault, and a stuck-at fault in a semiconductor integrated circuit.

図6は従来の故障検出手法のIDDQ測定の手順を示すフロー図である。図6において、半導体集積回路動作条件設定101は、半導体集積回路が動作するための電源電圧、入力信号電圧レベル、周波数、入力信号ロジックパターン(IDDQ測定用入力ロジックパターンは半導体集積回路の特定ノードのトグルを終了後、静止状態とする)の設定を示す、半導体集積回路動作スタート102は半導体集積回路動作条件設定101をもとに半導体集積回路の動作をスタートさせる。半導体集積回路動作ストップ103は半導体集積回路動作条件設定101をもとに半導体集積回路動作をストップさせる。半導体集積回路動作ストップ103は半導体集積回路の特定ノードのトグル終了を意味し、トグル終了ノードは任意に設定できる。   FIG. 6 is a flowchart showing the IDDQ measurement procedure of the conventional failure detection method. 6, the semiconductor integrated circuit operating condition setting 101 includes a power supply voltage, an input signal voltage level, a frequency, an input signal logic pattern for operating the semiconductor integrated circuit (an input logic pattern for IDDQ measurement is a specific node of the semiconductor integrated circuit). The semiconductor integrated circuit operation start 102, which indicates the setting of the resting state after the toggle is finished, starts the operation of the semiconductor integrated circuit based on the semiconductor integrated circuit operation condition setting 101. The semiconductor integrated circuit operation stop 103 stops the semiconductor integrated circuit operation based on the semiconductor integrated circuit operation condition setting 101. The semiconductor integrated circuit operation stop 103 means a toggle end of a specific node of the semiconductor integrated circuit, and the toggle end node can be arbitrarily set.

また、この時、トグルが終了しても電源は切らない。電源電流測定待ち時間104は半導体集積回路動作終了後、半導体集積回路の電源電流変化の終了を待つ時間を示している。電源電流測定105は半導体集積回路の電源電流測定を示す。   At this time, the power is not turned off even when the toggle is completed. The power supply current measurement waiting time 104 indicates a time for waiting for the end of the change in power supply current of the semiconductor integrated circuit after the operation of the semiconductor integrated circuit is completed. A power supply current measurement 105 indicates a power supply current measurement of the semiconductor integrated circuit.

従来のIDDQ測定は、半導体集積回路の動作条件設定101の後、半導体集積回路動作スタート102し、その後、半導体集積回路動作ストップ103し、その後、電源電流測定待ち時間104を待ち、その後、電源電流測定105をするものであった。   In the conventional IDDQ measurement, after the semiconductor integrated circuit operation condition setting 101, the semiconductor integrated circuit operation start 102 is performed, then the semiconductor integrated circuit operation stop 103 is performed, and then the power supply current measurement waiting time 104 is waited. Measurement 105 was taken.

なお、半導体集積回路動作ストップ103するポイントを変更し、複数のIDDQ測定を測定することもある。   Note that a point at which the semiconductor integrated circuit operation stop 103 is changed may be changed to measure a plurality of IDDQ measurements.

以上、図6に示した従来のIDDQ測定手順は半導体集積回路中の論理LSIのダイナミック電流、すなわちトランジスタのスイッチング時に発生する電源電流変化の期間が終了した後の半導体集積回路の静止状態での微少な電流を測定する、また、IDDQ測定により得られた電流の大小から故障があるか無いかを判定するものであった(例えば、特許文献1〜3参照)。   As described above, the conventional IDDQ measurement procedure shown in FIG. 6 is a small amount of the dynamic current of the logic LSI in the semiconductor integrated circuit, that is, a small amount of the semiconductor integrated circuit in the stationary state after the period of the power supply current change that occurs at the time of transistor switching ends. A current is measured, and whether there is a failure or not is determined from the magnitude of the current obtained by IDDQ measurement (see, for example, Patent Documents 1 to 3).

従来の検出故障方法に関連した下記に示すような種々の手法が考え出されている。   Various methods related to the conventional detection failure method have been devised as shown below.

1、Delta IDDQ法:IDDQを多点測定した場合、絶対値の分散σより差分の分散が小さいことを利用して、隣接良品ダイのIDDQ値との差分を取る方法。   1. Delta IDDQ method: A method of taking the difference from the IDDQ value of the adjacent good die by utilizing the fact that the variance of the difference is smaller than the variance σ of the absolute value when IDDQ is measured at multiple points.

2、Current Ratio法:IDDQの標準分布を求め、例えば平均値+3σ、あるいは平均値+6σ以上の測定値のあるダイを不良とする方法。   2. Current Ratio method: A method in which a standard distribution of IDDQ is obtained and, for example, a die having a measured value of an average value + 3σ or an average value + 6σ is determined as defective.

3、DECOUPLE法:良品ダイすべてについて、回帰分析を行い、寄与率を求め、この寄与率がある値(例えば、0.95)以下のものを不良とする方法。
特開2000−230962号公報 特開2000−241492号公報 特開2001−13200号公報
3. DECOUPLE method: A method in which regression analysis is performed for all good dies to obtain a contribution rate, and those having a contribution rate less than a certain value (for example, 0.95) are determined to be defective.
JP 2000-230962 A JP 2000-241492 A JP 2001-13200 A

しかし、半導体集積回路の高集積化、微細化に伴い、IDDQ値を最悪値にする動作条件設定101が複雑化し、その条件設定を実施する時間が増大し、ダイナミック電流の期間が終了するまで電源電流測定待ち時間104が増大し、電源電流測定105の測定値が微少値であるため、微少電流を測定するため、測定に時間がかかり過ぎるなどの問題点があった。   However, with the high integration and miniaturization of the semiconductor integrated circuit, the operation condition setting 101 that makes the IDDQ value worst becomes complicated, the time for performing the condition setting increases, and the power supply until the dynamic current period ends. Since the current measurement waiting time 104 is increased and the measurement value of the power supply current measurement 105 is a minute value, there is a problem that the measurement takes too much time because the minute current is measured.

また、リモコンや携帯電話に代表される最終製品が携帯用機器に組み込まれるSoC(System on Chip)では、IDDQの絶対値そのものが性能指標となる。動作電源電流IDDもさることながら、待ち時間、スタンバイ状態の電流が小さければ小さいほど、乾電池やバッテリーの寿命を長くする。このようなデバイスについては、IDDQを正確(SoC内部がIDDQ値を最悪にする状態で測定されることと、値そのものが精度良く測定できること)に短時間で測定することが課題となっている。   In addition, in an SoC (System on Chip) in which a final product typified by a remote controller or a mobile phone is incorporated in a portable device, the absolute value of the IDDQ itself is a performance index. In addition to the operating power supply current IDD, the smaller the waiting time and standby current, the longer the life of the dry cell or battery. For such a device, it is a problem to measure IDDQ accurately in a short time (because the inside of the SoC is measured in a state where the IDDQ value is worst, and the value itself can be measured with high accuracy).

本発明は、前記従来の問題点を解決するために半導体集積回路の新たなIDDQ測定方法、故障検出方法、故障検出装置を提供することを目的とする。   An object of the present invention is to provide a new IDDQ measurement method, failure detection method, and failure detection apparatus for a semiconductor integrated circuit in order to solve the conventional problems.

前記従来の課題を解決するために、本発明の半導体装置の新たなIDDQ測定方法は同一電源電圧条件下で、半導体装置内のほぼすべてのノードがトグルする状態で半導体装置の動作周波数Fをf、f/L、f/M、f/N、・・・とし(L、M、N、Oは整数)、同時に、前記半導体装置に入力するすべての入力信号もfin、fin/L、fin/M、fin/N、・・・とし、各周波数の動作電源電流を、前記半導体装置を動作させた後、同一時間待ったのちに測定を行なう。前記条件で各周波数毎に測定した電源電流値を、周波数を変数とした近似線を作成する。前記近似線より、周波数が0の場合の静止電源電流値(IDDQ値)を外挿して求める、その電源電流値を新たなIDDQ値とするものである。なお、周波数が0の場合の電源電流値は外挿の近似式により計算をして求めることもできる。   In order to solve the above-described conventional problems, a new IDDQ measurement method for a semiconductor device according to the present invention sets the operating frequency F of the semiconductor device to f under the same power supply voltage condition while almost all nodes in the semiconductor device are toggled. , F / L, f / M, f / N,... (L, M, N, and O are integers), and at the same time, all input signals input to the semiconductor device are fin, fin / L, fin / M, fin / N,..., And the operating power supply current of each frequency is measured after waiting the same time after operating the semiconductor device. An approximate line with the frequency as a variable is created from the power supply current value measured for each frequency under the above conditions. From the approximation line, the power supply current value obtained by extrapolating the static power supply current value (IDDQ value) when the frequency is 0 is used as a new IDDQ value. The power supply current value when the frequency is 0 can also be obtained by calculation using an extrapolated approximate expression.

本構成によって、従来のIDDQ測定に比べ、短時間で半導体装置の新たなIDDQを求めることができる。   With this configuration, a new IDDQ of the semiconductor device can be obtained in a shorter time than conventional IDDQ measurement.

また、この構成によって求めた新たなIDDQ値を用いて半導体装置の故障判定をすることが可能となる。   Further, it becomes possible to determine a failure of a semiconductor device using a new IDDQ value obtained by this configuration.

また、本発明の半導体装置の故障検出装置は 半導体装置の電源電流測定において、電源電圧を同一とし、動作周波数Fをf、f/L、f/M、f/N、・・・とする手段と、前記半導体装置の動作周波数に同期して半導体装置への入力信号も同時にfin、fin/L、fin/M、fin/N、・・・とする手段と、各周波数下での電源電流測定において、動作スタートからの測定待ち時間を一定とし測定する手段と、測定した各周波数の電源電流を用いて周波数を関数とした近似線を求める手段と、前記近似線より周波数0の電源電流を外挿し、静止電源電流値を求める手段と、前記静止電源電流値により半導体装置の良否を判定する手段とを備えている。本構成により、半導体装置の新たなIDDQ値を測定することが可能となる。   Further, the failure detection apparatus for a semiconductor device according to the present invention provides means for setting the same power supply voltage and operating frequencies F to f, f / L, f / M, f / N,. And means for simultaneously inputting fin, fin / L, fin / M, fin / N,... To the input signal to the semiconductor device in synchronism with the operating frequency of the semiconductor device, and measuring the power supply current under each frequency , Means for measuring with a constant measurement waiting time from the start of operation, means for obtaining an approximate line as a function of frequency using the measured power supply current of each frequency, and removing the power supply current of frequency 0 from the approximate line. And means for obtaining a quiescent power supply current value and means for determining the quality of the semiconductor device based on the quiescent power supply current value. With this configuration, a new IDDQ value of the semiconductor device can be measured.

従来のIDDQを測定する場合、半導体集積回路の内部ノードの充電・放電が納まるまでに非常に長い時間を要する。また、従来のIDDQ測定のテストパターンの1ポイントでIDDQを測定する時間に対し、動作電源電流は4から5回は測定できる、それ故に新たなIDDQ測定は、短い時間で測定可能となる。また、本発明の新たなIDDQ測定方法では、半導体集積回路が実際に使用される機器での電源電流との差異を極力なくす様に、半導体集積回路内部のほぼすべてのノードがトグルするようなパターンを走らせて測定する。それ故に、故障検出の確度の高い新たなIDDQ値が得られる。   When measuring the conventional IDDQ, it takes a very long time until charging / discharging of the internal node of the semiconductor integrated circuit is settled. In addition, the operating power supply current can be measured 4 to 5 times with respect to the time for measuring IDDQ at one point of the conventional IDDQ measurement test pattern. Therefore, the new IDDQ measurement can be measured in a short time. Further, in the new IDDQ measurement method of the present invention, a pattern in which almost all the nodes inside the semiconductor integrated circuit are toggled so as to minimize the difference from the power supply current in the device in which the semiconductor integrated circuit is actually used. Run and measure. Therefore, a new IDDQ value with high failure detection accuracy can be obtained.

以下、本発明の実施の形態を、図面を用いて詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

(実施形態1)
図1は本発明の実施の形態1における半導体集積回路の故障検出方法の新たなIDDQ測定の手順を示すフロー図である。
(Embodiment 1)
FIG. 1 is a flowchart showing a new IDDQ measurement procedure of the failure detection method for a semiconductor integrated circuit according to the first embodiment of the present invention.

図1において、10は半導体集積回路動作条件設定で、半導体集積回路が動作するための電源電圧、入力信号電圧レベル、動作周波数F、入力信号周波数fin、入力信号ロジックパターン(半導体集積回路内のほぼすべてのノードがトグルする動作の繰り返し)を設定する。11は半導体集積回路動作スタートで、半導体集積回路動作条件設定10の後、半導体集積回路の動作をスタートさせる。12は測定待ち時間で、半導体集積回路動作スタート11の後、一定時間を待つ。13は電源電流測定で、測定待ち時間12の後、半導体集積回路の電源電流測定をし、その値を記憶する。14は半導体集積回路動作ストップで、電源電流測定13の後、半導体集積回路の動作をストップさせる。15は周波数変更判断で、半導体集積回路動作ストップ14の後、動作周波数切り替えを判断し、切り替えが必要な場合16に切り替え、不要な場合17に移る。16は周波数変更設定で周波数変更判断15で周波数変更が必要な場合、半導体集積回路動作条件設定10で設定した動作周波数Fをf/Lに変更するとともに入力信号の周波数finもfin/Lに設定変更する。その後、半導体集積回路動作スタート11に移る。以降、周波数は周波数変更設定16に移る毎に動作周波数をf/M、同時に入力信号の周波数をfin/M、その後、動作周波数をf/N、同時に入力信号の周波数fin/N、・ ・ ・に順次設定変更する(L、M、N、Oは整数)。17は近似線作成および近似関数当てはめで、各手順11〜16を繰り返す毎に電源電流測定13で得られた電源電流値を基に動作周波数を変数とした近似線作成および近似関数当てはめを行なう。ここで、電源電流値の近似線は一般的に次式であらわす。   In FIG. 1, reference numeral 10 denotes a semiconductor integrated circuit operating condition setting. The power supply voltage, the input signal voltage level, the operating frequency F, the input signal frequency fin, and the input signal logic pattern for operating the semiconductor integrated circuit (almost in the semiconductor integrated circuit). (Repeat operation that all nodes toggle). Reference numeral 11 denotes a semiconductor integrated circuit operation start. After the semiconductor integrated circuit operation condition setting 10, the operation of the semiconductor integrated circuit is started. Reference numeral 12 denotes a measurement waiting time, and waits for a certain time after the semiconductor integrated circuit operation start 11. 13 is a power supply current measurement. After a measurement waiting time 12, the power supply current of the semiconductor integrated circuit is measured and the value is stored. Reference numeral 14 denotes a semiconductor integrated circuit operation stop. After the power supply current measurement 13, the operation of the semiconductor integrated circuit is stopped. Reference numeral 15 denotes a frequency change determination. After the semiconductor integrated circuit operation stop 14, the operation frequency switching is determined. If the switching is necessary, the operation is switched to 16, and the operation is shifted to 17 if not necessary. Reference numeral 16 denotes a frequency change setting. When the frequency change determination 15 requires a frequency change, the operating frequency F set in the semiconductor integrated circuit operating condition setting 10 is changed to f / L and the frequency fin of the input signal is also set to fin / L. change. Thereafter, the semiconductor integrated circuit operation start 11 is started. Thereafter, every time the frequency shifts to the frequency change setting 16, the operating frequency is f / M, the input signal frequency is fin / M, the operating frequency is f / N, and the input signal frequency fin / N at the same time. (L, M, N, and O are integers). Reference numeral 17 denotes approximate line creation and approximation function fitting, and each time steps 11 to 16 are repeated, approximation line creation and approximation function fitting using the operating frequency as a variable are performed based on the power supply current value obtained in the power supply current measurement 13. Here, the approximate line of the power supply current value is generally expressed by the following equation.

IDDa=af+IDDX
ここで 、IDDaは電源電流値 、a及びIDDXは定数、fは動作周波数であり、aおよびIDDXが近似線により求められる。
IDDa = af + IDDX
Here, IDDa is a power supply current value, a and IDDX are constants, f is an operating frequency, and a and IDDX are obtained from approximate lines.

図2は近似線作成および近似関数当てはめを行なった特性図で、本発明の実施形態1の図1の近似線作成当てはめ17を実施した特性図を示す。21、22、23、24は電源電流値で、前記各手順11から16の手順で測定し、得られた電源電流値を各電源電流測定時の動作周波数を横軸にとり、プロットした。25は近似線で、電源電流値21、22、23、24を近似的に結ぶ線、26は新たなIDDQ値で近似線25を延ばし、Y軸と交わる点であり、すなわち周波数0の電源電流値である。   FIG. 2 is a characteristic diagram in which approximate line creation and approximate function fitting are performed, and shows a characteristic diagram in which the approximate line creation fitting 17 in FIG. 1 of Embodiment 1 of the present invention is performed. 21, 22, 23, and 24 are power supply current values, which were measured according to the procedures 11 to 16, and the obtained power supply current values were plotted with the operating frequency at the time of each power supply current measurement taken on the horizontal axis. 25 is an approximate line, a line that approximately connects the power source current values 21, 22, 23, and 24, and 26 is a point that extends the approximate line 25 with a new IDDQ value and intersects the Y axis, that is, a power source current having a frequency of 0 Value.

図3は、本発明の第1の実施形態によって求めた実際の新たなIDDQ値と、従来のIDDQ値の関係を示した特性図である。図3では、従来のIDDQ値と区別するため、新たなIDDQ値をIDDXと記述してある。本発明の第1の実施形態を適用した半導体集積回路は0.18μmルールプロセス品でチップ面積が35.14mm2、端子数209ピンの半導体集積回路で、その動作電流のIDD規格は、動作周波数26MHzで動作させ、1.80V印加で32.55mA以上を不良とする。電源電流を求めるまでの待ち時間は10msである。IDDQ測定は、1.95V印加で16μA以上を不良とする。IDDQ測定は、IDDQ用テストパターンの8ポイントで測定し、全体のトグル率は89.06%であり、IDDQ値が安定するまでの待ち時間は50ms取ってある。動作周波数は26MHzの1/1、1/2、1/4を適用し、本発明の第1の実施形態により新たなIDDQ値を求めた。図3に示すように、従来のIDDQ値と新たなIDDQ値が良く一致している。従来のIDDQが10μA程度の時、新たなIDDQ値(図中はIDDX)が40μAから50μA程度と大きく、バイアスがかかった値となっているが、従来のIDDQ値が1000μA以上のところではまったく一致している。 FIG. 3 is a characteristic diagram showing a relationship between an actual new IDDQ value obtained by the first embodiment of the present invention and a conventional IDDQ value. In FIG. 3, the new IDDQ value is described as IDDX in order to distinguish it from the conventional IDDQ value. The semiconductor integrated circuit to which the first embodiment of the present invention is applied is a 0.18 μm rule process product, a chip area of 35.14 mm 2 , a semiconductor integrated circuit with 209 pins, and the operating current IDD standard is the operating frequency. Operate at 26 MHz, and with 2.80 V applied, 32.55 mA or more is regarded as defective. The waiting time until the power supply current is obtained is 10 ms. In IDDQ measurement, 16 μA or more is regarded as defective when 1.95 V is applied. The IDDQ measurement is performed at 8 points of the IDDQ test pattern, the overall toggle rate is 89.06%, and the waiting time until the IDDQ value stabilizes is 50 ms. The operating frequency was 1/1, 1/2, or 1/4 of 26 MHz, and a new IDDQ value was obtained according to the first embodiment of the present invention. As shown in FIG. 3, the conventional IDDQ value and the new IDDQ value are in good agreement. When the conventional IDDQ is about 10 μA, the new IDDQ value (IDDX in the figure) is as large as about 40 μA to 50 μA and is biased. However, when the conventional IDDQ value is 1000 μA or more, it is exactly one. I'm doing it.

以上の構成によれば、従来のIDDQ測定方法での電源電流変化期間の終了までの時間を待つことなく、短時間の待ち時間の後、電源電流測定をすることや、従来のIDDQ測定方法での測定値が100μA以下であることに比べ、新たなIDDQ測定方法では1mA以上で、電流値が大きいことにより、短時間で測定が完了できる効果が得られる。   According to the above configuration, the power supply current measurement can be performed after a short waiting time without waiting for the time until the end of the power supply current change period in the conventional IDDQ measurement method, or the conventional IDDQ measurement method. Compared to the measured value of 100 μA or less, the new IDDQ measurement method has an effect that the measurement can be completed in a short time because the current value is 1 mA or more and large.

なお、新たなIDDQ値26は、測定結果を基に作図で求めたが、測定値から近似計算で求めることも可能である。また、動作周波数の設定はここではf、f/L、f/M、f/N、f/O(L、M、N、Oは整数)としたがその他の設定も可能である。   The new IDDQ value 26 is obtained by plotting based on the measurement result, but can be obtained by approximate calculation from the measurement value. The operating frequency is set here as f, f / L, f / M, f / N, and f / O (L, M, N, and O are integers), but other settings are possible.

(実施形態2)
図4は、本発明の第2の実施の形態の故障検出手法の検出の手順を示すフロー図である。図4においては、図1と同じ構成要素については同じ符号を用い、説明を省略する。
(Embodiment 2)
FIG. 4 is a flowchart showing a detection procedure of the failure detection method according to the second embodiment of this invention. In FIG. 4, the same components as those in FIG.

図4において、50はIDDQ判定で、本発明の第1の実施形態で求めた新たなIDDQ値の基準電流値に対し、大きいか又は小さいかによって半導体集積回路の故障の有無を判定する。IDDQ値の判定に使用する基準電流値は、半導体集積回路の設計段階で、シミュレーションで求めた値を使用することや実際の半導体集積回路を用い、本発明の第1の実施形態により新たなIDDQ値を複数個の半導体集積回路より求めた値の分布をとり、分布から外れるものを除外する値を用いることができる。   In FIG. 4, reference numeral 50 denotes IDDQ determination, which determines whether or not there is a failure in the semiconductor integrated circuit depending on whether it is larger or smaller than the reference current value of the new IDDQ value obtained in the first embodiment of the present invention. The reference current value used for the determination of the IDDQ value is a value obtained by simulation at the design stage of the semiconductor integrated circuit or an actual semiconductor integrated circuit, and a new IDDQ according to the first embodiment of the present invention is used. It is possible to use a value distribution in which values are obtained from a plurality of semiconductor integrated circuits and to exclude values that are out of the distribution.

51は不良処理で、IDDQ判定50で故障有りと判定した場合の不良処理をする、52は良品処理で、IDDQ判定50で故障なしと判定した場合の良品処理をする。   Reference numeral 51 denotes a defect process, which performs a defect process when it is determined that there is a failure in the IDDQ determination 50, and 52 is a non-defective process, which performs a non-defective process when the IDDQ determination 50 determines that there is no failure.

図5は故障判定比較で、従来のIDDQ値の故障判定結果と、新たなIDDQ値の故障判定結果の比較であり、本発明の第2の実施形態を適用した結果を示す。ここの図5では従来のIDDQ値の判定は150μA以上を不良とし、新たなIDDQ値(図中では区別のためIDDXとした)は150μA以上の値を不良とした場合(図5(b))と、従来のIDDQ値の判定は16μA以上を不良とし、新たなIDDQ値(図中では区別のためIDDXとした)は75μA以上の値を不良とした場合(図5(a))とを示している。発明を適用した半導体集積回路は本発明の第1の実施形態で示した図3と同一半導体集積回路のものである。   FIG. 5 is a comparison of a failure determination result of a conventional IDDQ value and a failure determination result of a new IDDQ value in failure determination comparison, and shows a result of applying the second embodiment of the present invention. In FIG. 5, when the conventional IDDQ value is determined to be 150 μA or more as a failure, and a new IDDQ value (IDDX for distinction in the figure) is determined to be a value of 150 μA or more as a failure (FIG. 5B). In the conventional IDDQ value determination, 16 μA or more is determined to be defective, and a new IDDQ value (IDDX in the figure is IDDX) indicates that a value of 75 μA or more is determined to be defective (FIG. 5A). ing. The semiconductor integrated circuit to which the invention is applied is the same as the semiconductor integrated circuit shown in FIG. 3 shown in the first embodiment of the present invention.

図5の故障判定比較に示すように故障判定電流値の小さい場合でも80%以上、故障判定電流値が大きくなればほぼ100%が新たなIDDQ値で故障判定することができることを示している。   As shown in the failure determination comparison of FIG. 5, even when the failure determination current value is small, 80% or more, and when the failure determination current value increases, almost 100% can be determined as a failure with a new IDDQ value.

以上の構成によれば、本発明の第1の実施形態で求められた新たなIDDQ値によって半導体集積回路の故障判定を行なうことが可能となる。   According to the above configuration, it is possible to determine the failure of the semiconductor integrated circuit based on the new IDDQ value obtained in the first embodiment of the present invention.

本発明のIDDQ測定を用いた半導体装置の故障検出手法及びその装置は、半導体装置が、微細化に伴う低電圧化、低消費電流化、高速化と共に大規模化、高集積化、多機能・複合機能化しても利用可能である。   The semiconductor device failure detection method using IDDQ measurement according to the present invention and the device thereof are provided with a large-scale, high-integration, multi-functional It can be used even if it has multiple functions.

本発明の実施の形態1における半導体集積回路の故障検出方法の新たなIDDQ測定の手順を示すフロー図The flowchart which shows the procedure of the new IDDQ measurement of the failure detection method of the semiconductor integrated circuit in Embodiment 1 of this invention 本発明の近似線作成および近似関数当てはめを行なった特性図Characteristic diagram of approximation line creation and approximation function fitting of the present invention 本発明のIDDQ測定値と従来のIDDQ測定値の関係を示した特性図The characteristic figure which showed the relationship between the IDDQ measured value of this invention, and the conventional IDDQ measured value 本発明の第2の実施の形態の故障検出手法の検出の手順を示すフロー図The flowchart which shows the detection procedure of the failure detection method of the 2nd Embodiment of this invention 本発明のIDDQ測定値と従来のIDDQ測定値の故障判定結果を比較した特性図The characteristic figure which compared the failure determination result of IDDQ measurement value of this invention and the conventional IDDQ measurement value 従来の故障検出手法のIDDQ測定の手順を示すフロー図Flow chart showing IDDQ measurement procedure of conventional failure detection method

符号の説明Explanation of symbols

10 半導体集積回路動作条件設定
11 半導体集積回路動作スタート
12 測定待ち時間
13 電源電流測定
14 半導体集積回路動作ストップ
15 周波数変更判断
16 周波数変更設定
17 近似線作成、近似関数当てはめ
25 近似線
26 新たなIDDQ値
50 IDDQ判定
51 不良処理
52 良品処理
DESCRIPTION OF SYMBOLS 10 Semiconductor integrated circuit operation condition setting 11 Semiconductor integrated circuit operation start 12 Measurement waiting time 13 Power supply current measurement 14 Semiconductor integrated circuit operation stop 15 Frequency change judgment 16 Frequency change setting 17 Approximation line creation, approximation function fitting 25 Approximation line 26 New IDDQ Value 50 IDDQ judgment 51 Defect processing 52 Good product processing

Claims (2)

半導体装置の電源電流測定において、電源電圧を同一とし、動作周波数Fをf、f/L、f/M、f/N、・・・とし(fは動作周波数、L、M、Nは整数)、同時に、前記半導体装置への入力信号の周波数も同時にfin、fin/L、fin/M、fin/N、・・・(finは動作周波数)とし、各周波数下での電源電流測定において動作スタートからの測定待ち時間を一定で測定し、測定した各周波数の電源電流を用いて周波数を関数とした近似線を引き、前記近似線より周波数0の電源電流を外挿し、静止電源電流値(IDDQ値)を求め、前記静止電源電流値により半導体装置の良否を判定することを特徴とする半導体装置の故障検出方法。 In power supply current measurement of a semiconductor device, the power supply voltage is the same, and the operating frequency F is f, f / L, f / M, f / N,... (F is the operating frequency, L, M, and N are integers) At the same time, the frequency of the input signal to the semiconductor device is set to fin, fin / L, fin / M, fin / N,... (Fin is the operating frequency), and the operation starts in the measurement of the power supply current under each frequency. The measurement waiting time is measured at a constant, and an approximate line as a function of frequency is drawn using the measured power supply current of each frequency, and the power supply current of frequency 0 is extrapolated from the approximate line to obtain a static power supply current value (IDDQ And determining whether the semiconductor device is good or bad based on the static power supply current value. 半導体装置の電源電流測定において、電源電圧を同一とし、動作周波数Fをf、f/L、f/M、f/N、…とする手段と、前記半導体装置の動作周波数に同期して前記半導体装置への入力信号の周波数も同時にfin、fin/L、fin/M、fin/N、・・・とする手段と、各周波数下での電源電流測定において動作スタートからの測定待ち時間を一定とし測定する手段と、測定した各周波数の電源電流を用いて周波数を関数とした近似線を求める手段と、前記近似線より周波数0の電源電流を外挿し、静止電源電流値を求める手段と、前記静止電源電流値により半導体装置の良否を判定する手段とを備えたことを特徴とする半導体装置の故障検出装置。 In the measurement of the power supply current of the semiconductor device, the power supply voltage is the same and the operating frequency F is f, f / L, f / M, f / N,..., And the semiconductor in synchronism with the operating frequency of the semiconductor device. The frequency of the input signal to the device is also set to fin, fin / L, fin / M, fin / N, etc., and the measurement waiting time from the start of operation is constant in the power supply current measurement under each frequency. Means for measuring, means for obtaining an approximate line as a function of frequency using the power supply current of each frequency measured, means for extrapolating a power supply current of frequency 0 from the approximate line to obtain a static power supply current value, A failure detection apparatus for a semiconductor device, comprising: means for determining whether the semiconductor device is good or bad based on a quiescent power supply current value.
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