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JP3797582B2 - Cylinder inner surface plating method - Google Patents
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JP3797582B2 - Cylinder inner surface plating method - Google Patents

Cylinder inner surface plating method Download PDF

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JP3797582B2
JP3797582B2 JP04296298A JP4296298A JP3797582B2 JP 3797582 B2 JP3797582 B2 JP 3797582B2 JP 04296298 A JP04296298 A JP 04296298A JP 4296298 A JP4296298 A JP 4296298A JP 3797582 B2 JP3797582 B2 JP 3797582B2
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Prior art keywords
plating
cylindrical body
electrode
plating solution
temperature
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JP04296298A
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Japanese (ja)
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JPH11229181A (en
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毅 三浦
稔 吉田
英雄 大藪
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Japan Steel Works Ltd
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Japan Steel Works Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、兵器砲の砲身や反応筒などのような円筒体の内面にめっきを施す方法に関するもので、特に、その軸線方向に膜厚が変化するめっき層を形成することが求められる円筒体内面のめっき方法に関するものである。
【0002】
【従来の技術】
兵器砲身においては、その寿命を向上させるために、内面に保護層が設けられる。その場合の保護層としては、電解によって形成されるクロム層が最も適していることが知られている。そして、特開平7−167590号公報には、大口径(例えば口径155mm)の兵器砲身において、熱的負荷から保護するために、熱的に大きな負荷を受ける装填室及びその装填室に連なる口径部の領域に、めっき処理によって厚さ100〜200μmの厚い電解クロム層を形成する方法が開示されている。その方法は、電解クロム層を設けるべき領域に相当する長さの電極を砲身の軸心部に配置し、それら電極及び砲身をめっき液中に浸漬して、それらの間に通電することにより砲身内面の目標領域にめっきをする、というものである。その場合のめっき厚さは均一とされている。
【0003】
ところで、兵器砲身の場合には、上述のような熱的負荷のほかにも、弾丸の弾帯との摺動摩擦加わり、さらに使用環境による腐食も生ずるので、それらからの保護のために、その内面の全域にわたって保護層を設けることが求められる。しかしながら、砲身内面の全域にわたって厚さ100〜200μmの厚いクロムめっき膜を設けると、そのめっき膜は、砲身の砲口側の前部領域において機械的衝撃力によりしばしば剥離し、破壊される。そして、その後、その箇所からガス抜けや乱流が生じ、砲身の腐食や弾帯の摩耗が加速されてしまう。
一方、実験の結果、めっき膜の剥離に対する抵抗は、膜厚を薄くした方が大きくなることが確かめられている。
そこで、砲身の中でも特に大きな熱的負荷を受ける部分、すなわち装填室及びその装填室に隣接する口径部領域のクロム層は厚く、機械的な衝撃力を受ける砲口側の前部領域のクロム層は薄くする、ということが行われている。
【0004】
そのように砲身などの円筒体の内面にその軸線方向の位置によって膜厚の異なるめっき層を形成する場合、従来は、まず、砲身の全長に相当する長さの電極を用いて砲身内面の全域を薄くめっきし、次いで、厚いめっき層を必要とする部位に対応する長さの電極を用いてその部位の内面を厚くめっきするようにしていた。
【0005】
【発明が解決しようとする課題】
しかしながら、そのような方法では、めっき液に二度浸漬されることになるので、最初のめっき時に、他の部位がめっき液によって腐食されることのないようにするために、めっきしようとする部位以外をラッカーなどによって覆うことが必要となる。また、めっきされる部位とされない部位との境界に電流が集中し、その境界領域にめっき金属が異常析出するので、めっき後、機械加工などによって平坦化することが必要となる。さらに、最初に形成されためっき層の上に重ねてめっき層が形成されるので、その重ね合わせ面がしばしば剥離するという問題がある。
【0006】
本発明は、このような実情に鑑みてなされたものであって、その目的は、一度のめっき処理によって円筒体の内面に軸線方向に膜厚が変化するめっき層を形成することのできる円筒体内面のめっき方法を提供することである。
【0007】
【課題を解決するための手段】
この目的を達成するために、本発明では、被めっき体である円筒体の内面とその軸心部に配置されるめっき処理用の電極の外周面との間に位置するめっき液の温度を、あるいは温度及び流速を、軸線方向に沿って変化させ、その状態でめっき処理するようにしている。
そのようにめっき液の温度を、あるいは温度及び流速軸線方向に沿って変化させるためには、めっき処理用の電極として、内部にめっき液を流通させる軸線方向の流通孔と、その流通孔を外周面に連通させる半径方向の吐出孔とを有する孔付き電極を用い、外部からその孔付き電極の流通孔にめっき液を供給するようにすればよい。その場合、外部から温度の異なるめっき液を供給するようにすれば、吐出孔より下流側におけるめっき液の温度を、それより上流側におけるめっき液の温度とは異ならせることができる。また、外部から供給されるめっき液をポンプなどによって圧送するようにすれば、半径方向の吐出孔より下流側に流速の大きい流れが形成される。
【0008】
【作用】
同じ電流密度では、めっき液の温度が上昇すると、電着速度、すなわちめっき析出速度が低下する。したがって、上述のように軸線方向に沿ってめっき液の温度を変化させるようにすると、軸線方向に膜厚が変化するめっき層が形成される。
また、めっき析出面の電流密度が増すと、電着速度も増大する。そして、その電流密度は、めっき液の流速によって変化することが知られている。したがって、上述のように被めっき体である円筒体とその円筒体にめっき処理を施す電極との間に位置するめっき液の温度及び流速を軸線方向に沿って変化させると、そのときのめっき処理により円筒体の内 面に形成されるめっき層の膜厚が軸線方向において変化することになる。
このようにして、めっき液の温度を、あるいは温度及び流速を、軸線方向に沿って異ならせることにより、円筒体の内面に軸線方向に膜厚が変化するめっき層を一度のめっき処理によって形成することが可能となる。
【0009】
【発明の実施の形態】
以下、図面を用いて本発明の実施の形態を説明する。
図中、図1は本発明による円筒体内面のめっき方法の一例を示す概略断面図である。
この図から明らかなように、めっきを施そうとする円筒体1の内面2には、先端側(図で左端側)に小径部3が、また、基端側(図で右端側)に大径部4がそれぞれ設けられている。その小径部3と大径部4との間は、めっき処理時にその部分に電流が集中することのないように、滑らかにつながれている。小径部3は、その内面に薄いめっき層5を形成する部分であり、大径部4は、その内面に厚いめっき層6を形成する部分である。
【0010】
円筒体1の内面2に、そのように軸線方向に厚さが変化するめっき層5,6を形成しようとするときには、円筒体1の全長よりもやや長い図示されているような孔付き電極7を用いる。その電極7には、先端側の中心部に、軸線方向に延びる流通孔8が設けられている。その流通孔8の長さは、薄いめっき層5を形成する部位の長さ、すなわち円筒体1の小径部3の長さよりもやや長い長さとされている。そして、その流通孔8は、基端側の底部において、半径方向に形成された複数の吐出孔9,9,…により、電極7の外周面と連通するようにされている。その吐出孔9は、電極7の基端側に向かってわずかに傾斜するものとされている。
【0011】
そのように形成された孔付き電極7を、その吐出孔9が円筒体1の小径部3と大径部4との間の境界部に対向するようにして円筒体1の軸心部に配置し、それらをめっき槽10内のめっき液中に浸漬する。その場合、円筒体1はあらかじめ脱脂しておく。また、めっき槽10の外部には、ポンプ11と、めっき槽10内のめっき液と同じめっき液を貯えた温度調節装置付きタンク12とを設け、そのポンプ11の吸入口とタンク12内とをパイプ13によって接続しておく。通常どおり、そのめっき槽10の外部には、めっき用電源装置である直流電源14も設けられている。
【0012】
そして、めっき液中に浸漬した電極7の流通孔8の先端とポンプ11の吐出口とをパイプ15によって接続し、ポンプ11を作動させる。すると、タンク12内のめっき液が電極7の流通孔8に圧送され、吐出口9,9,…から噴出する。上述のように、その吐出口9,9,…は円筒体1の基端側に向かって傾斜している。したがって、吐出口9,9,…から噴出しためっき液は、円筒体1の大径部4内周面と電極7の外周面との間を基端側に向かって流れる。こうして、電極7の吐出孔9より下流側に、流速の大きいめっき液の流れが形成される。そのときには、その流れに伴って、円筒体1の小径部3側に位置するめっき液にも基端側に向かう流れが生ずるが、その流速は小さい。
【0013】
その状態で、導線16を介して電極7を直流電源14の正極に接続するとともに、導線17を介して円筒体1をその電源14の負極に接続し、それら電極7と円筒体1との間に通電する。すると、めっき液中の金属イオンが円筒体1の内面2に析出する。したがって、めっき液として例えばクロムめっき浴の基本をなすサージェント液を用いれば、そのめっき液中のクロムイオンが析出して、円筒体1の内面2に電解クロム層が形成される。
【0014】
その場合、上述のようにして円筒体1の大径部4の部位には小径部3側よりも流速の大きいめっき液の流れが形成されている。そのようにめっき液が流れるときの電流密度は、層流の場合は流速vの平方根に比例し、乱流の場合はv2/3〜vに比例することが知られている(川崎元雄ら著「実用電気めっき」、日刊工業新聞社、1980年発行、p.177)。したがって、円筒体1の内面2と電極7との間に生ずる電流密度は、大径部4における電流密度の方が小径部3における電流密度よりも大きくなる。すなわち、円筒体1の小径部3は小さい電流密度でめっきされ、大径部4は大きい電流密度でめっきされることになる。そして、図2から明らかなように、クロムめっきの普通浴における電流密度と電着速度(めっき速度)との関係は、同じめっき浴温度では、電流密度が大きいほどめっき速度も大きくなる、という関係にある。したがって、その電流密度の差により、円筒体1の小径部3の内面には薄いめっき層5が形成され、大径部4の内面には厚いめっき層6が形成される。
【0015】
このように、孔付き電極7を用いてその電極7の中間部からめっき液を噴出させ、めっき液の流速を円筒体1の軸線方向に沿って変化させることにより、円筒体1の内面2に膜厚の異なるめっき層5,6を一度のめっき処理で形成することが可能となる。そして、その場合、円筒体1の内面2に設ける小径部3と大径部4との径をあらかじめ適切に設定しておけば、それらのめっき層5,6の内面を均一の径とすることができる。
【0016】
また、タンク12に設けられている温度調節装置を用いてそのタンク12内のめっき液の温度をめっき槽10内のめっき液の温度よりも低くしておき、その低温めっき液を電極7の吐出孔9から吐出させるようにすれば、円筒体1の大径部4側に位置するめっき液の温度は小径部3側に位置するめっき液の温度よりも低くなる。
そして、図2に示されているように、同じ電流密度では、めっき液の温度が低いほどめっき速度は大きくなる。したがって、上述のようにして円筒体1の小径部3側に位置するめっき液の温度と大径部4側に位置するめっき液の温度とを異ならせれば、めっき液温度の高い部位である円筒体1の小径部3の内面には薄いめっき層5が形成され、めっき液温度の低い部位である大径部4の内面には厚いめっき層6が形成される。
【0017】
このような原理からして、めっき液の温度及び流速のいずれか一方に差を持たせるのみでも、薄いめっき層5と厚いめっき層6とを同時に形成することができる。そして、主としてめっき液の温度を異ならせることとすれば、ポンプ11としては電極7の吐出孔9からめっき液を供給することができるものでありさえすればよいことになるので、小型のものを用いることが可能となる。しかしながら、特にめっき層5,6の膜厚比を大きくすることが求められる場合には、それぞれの部位におけるめっき液の温度及び流速の両方を異ならせるようにすることが望ましい。上述の例のように、孔付き電極7を用い、ポンプ11によりその電極7の流通孔8に低温のめっき液を圧送して吐出孔9,9,…から噴出させるようにすれば、めっき液の温度及び流速の両方を円筒体1の軸線方向に沿って変化させることも容易であり、膜厚比の大きいめっき層5,6を一度のめっき処理によって形成することが可能となる。
【0018】
なお、上述の実施形態においては、円筒体1の軸線方向に2段階に膜厚が変化するめっき層5,6を形成する場合について説明したが、電極7に長さの異なる複数の流通孔8とそれらの流通孔8を軸線方向の異なる位置においてそれぞれ電極7の外周面に連通させる吐出孔9,9,…とを設け、それらの流通孔8にそれぞれ温度の異なるめっき液を圧送するようにすれば、その膜厚を更に多段に変化させるようにすることもできる。
【0019】
【発明の効果】
以上の説明から明らかなように、本発明によれば、軸線方向に膜厚が変化するめっき層を一度のめっき処理によって形成することが可能となるので、従来のよう最初のめっき処理時における防食作業やめっき処理後の機械加工などが不要となり、その処理作業を大幅に簡易化することができる。また、めっき層を重ね合わせることなく、そのように膜厚の異なるめっき層を形成することができるので、剥離に極めて強いめっき層とすることができる。
【図面の簡単な説明】
【図1】 本発明による円筒体内面のめっき方法の一例を示す概略断面図である。
【図2】 そのめっき方法の原理を説明するための、電流密度に応じためっき液温度とめっき速度との関係を示す特性図である。
【符号の説明】
1 円筒体
2 円筒体内面
5 薄いめっき層
6 厚いめっき層
7 孔付き電極
8 流通孔
9 吐出孔
10 めっき槽
11 ポンプ
12 温度調節装置付きタンク
14 直流電源(めっき用電源装置)
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method of plating an inner surface of a cylindrical body such as a barrel of a weapon gun or a reaction cylinder, and in particular, a cylindrical body that is required to form a plating layer whose film thickness varies in the axial direction thereof. The present invention relates to a surface plating method .
[0002]
[Prior art]
In the gun barrel, a protective layer is provided on the inner surface in order to improve its life. As a protective layer in that case, it is known that a chromium layer formed by electrolysis is most suitable. Japanese Patent Application Laid-Open No. 7-167590 discloses a loading chamber that receives a large thermal load and a bore portion connected to the loading chamber in order to protect it from a thermal load in a large-bore (for example, 155 mm) gun barrel. In this region, a method of forming a thick electrolytic chromium layer having a thickness of 100 to 200 μm by plating is disclosed. In this method, an electrode having a length corresponding to the region where the electrolytic chromium layer is to be provided is disposed in the axial center of the gun barrel, the electrode and the gun barrel are immersed in a plating solution, and an electric current is passed between them. The target area on the inner surface is plated. In this case, the plating thickness is uniform.
[0003]
By the way, in the case of a gun barrel, in addition to the thermal load as described above, sliding friction with the bullet band is added, and further corrosion due to the use environment occurs. It is required to provide a protective layer over the entire inner surface. However, when a thick chromium plating film having a thickness of 100 to 200 μm is provided over the entire inner surface of the gun barrel, the plating film is often peeled and broken by a mechanical impact force in the front region on the muzzle side of the gun barrel. After that, gas escape and turbulent flow occur from the location, and the corrosion of the gun barrel and the wear of the bullet band are accelerated.
On the other hand, as a result of experiments, it has been confirmed that the resistance to peeling of the plating film increases as the film thickness decreases.
Therefore, the portion of the gun barrel that receives a particularly large thermal load, that is, the chromium layer in the loading chamber and the aperture region adjacent to the loading chamber is thick, and the chromium layer in the front region on the muzzle side that receives mechanical impact force. It is done to make it thinner.
[0004]
When forming a plating layer with a different film thickness depending on the position in the axial direction on the inner surface of a cylindrical body such as a gun barrel, conventionally, first, the entire area of the inner surface of the gun barrel is first formed using an electrode having a length corresponding to the entire length of the gun barrel. Was then thinly plated, and then the inner surface of the part was thickly plated using an electrode having a length corresponding to the part requiring a thick plating layer.
[0005]
[Problems to be solved by the invention]
However, in such a method, since it is immersed twice in the plating solution, in order to prevent other parts from being corroded by the plating solution during the initial plating, the part to be plated is used. It is necessary to cover other than with lacquer. Further, current concentrates on the boundary between the part to be plated and the part not to be plated, and the plated metal is abnormally deposited in the boundary region. Therefore, it is necessary to flatten by plating after the plating. Furthermore, since the plating layer is formed on the plating layer formed first, there is a problem that the overlapping surface often peels off.
[0006]
The present invention has been made in view of such circumstances, and its purpose is to form a cylindrical body in which a plating layer whose thickness changes in the axial direction can be formed on the inner surface of the cylindrical body by a single plating process. It is to provide a surface plating method .
[0007]
[Means for Solving the Problems]
In order to achieve this object, in the present invention, the temperature of the plating solution positioned between the inner surface of the cylindrical body, which is the object to be plated, and the outer peripheral surface of the electrode for plating disposed at the axial center thereof , Alternatively, the temperature and flow rate are changed along the axial direction, and plating is performed in that state.
In order to change the temperature of the plating solution , or the temperature and the flow velocity along the axial direction as described above, as the electrode for plating treatment, an axial flow hole through which the plating solution flows, and the flow hole A plating solution may be supplied from the outside to the flow hole of the holed electrode using a holed electrode having a radial discharge hole communicating with the outer peripheral surface. In this case, if plating solutions having different temperatures are supplied from the outside, the temperature of the plating solution on the downstream side from the discharge hole can be made different from the temperature of the plating solution on the upstream side. Further , if the plating solution supplied from the outside is pumped by a pump or the like, a flow having a high flow velocity is formed downstream of the radial discharge holes.
[0008]
[Action]
At the same current density, when the temperature of the plating solution increases, the electrodeposition rate, that is, the plating deposition rate decreases. Therefore, when the temperature of the plating solution is changed along the axial direction as described above, a plating layer whose film thickness changes in the axial direction is formed.
Further, as the current density on the plated surface increases, the electrodeposition rate also increases. The current density is known to change depending on the flow rate of the plating solution. Therefore, when the temperature and flow rate of the plating solution located between the cylindrical body that is the object to be plated and the electrode that performs the plating process on the cylindrical body are changed along the axial direction as described above, the plating process at that time the thickness of the plated layer formed on the inner surface of the cylindrical body will vary in the axial direction by.
In this way, by changing the temperature of the plating solution , or the temperature and flow rate along the axial direction, a plating layer whose thickness changes in the axial direction is formed on the inner surface of the cylindrical body by a single plating process. It becomes possible.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
In the figure, FIG. 1 is a schematic sectional view showing an example of a method for plating an inner surface of a cylindrical body according to the present invention.
As is apparent from this figure, the inner surface 2 of the cylindrical body 1 to be plated has a small diameter portion 3 on the distal end side (left end side in the figure) and a large diameter on the base end side (right end side in the figure). Each of the diameter portions 4 is provided. The small-diameter portion 3 and the large-diameter portion 4 are smoothly connected so that current does not concentrate on the portion during the plating process. The small diameter portion 3 is a portion where a thin plating layer 5 is formed on the inner surface, and the large diameter portion 4 is a portion where a thick plating layer 6 is formed on the inner surface.
[0010]
When the plating layers 5 and 6 whose thickness varies in the axial direction are formed on the inner surface 2 of the cylindrical body 1, the electrode 7 with a hole as shown in the drawing is slightly longer than the entire length of the cylindrical body 1. Is used. The electrode 7 is provided with a flow hole 8 extending in the axial direction at the center on the tip side. The length of the flow hole 8 is set to be slightly longer than the length of the portion where the thin plating layer 5 is formed, that is, the length of the small diameter portion 3 of the cylindrical body 1. The flow hole 8 communicates with the outer peripheral surface of the electrode 7 by a plurality of discharge holes 9, 9,... Formed in the radial direction at the bottom on the base end side. The discharge hole 9 is slightly inclined toward the base end side of the electrode 7.
[0011]
The holed electrode 7 thus formed is arranged at the axial center of the cylindrical body 1 such that the discharge hole 9 faces the boundary between the small diameter portion 3 and the large diameter portion 4 of the cylindrical body 1. Then, they are immersed in the plating solution in the plating tank 10. In that case, the cylindrical body 1 is degreased in advance. In addition, a pump 11 and a tank 12 with a temperature control device that stores the same plating solution as the plating solution in the plating tank 10 are provided outside the plating tank 10, and the suction port of the pump 11 and the tank 12 are connected to each other. It is connected by a pipe 13. As usual, a DC power supply 14 which is a power supply device for plating is also provided outside the plating tank 10.
[0012]
And the front-end | tip of the flow hole 8 of the electrode 7 immersed in plating solution and the discharge port of the pump 11 are connected by the pipe 15, and the pump 11 is operated. Then, the plating solution in the tank 12 is pumped to the flow hole 8 of the electrode 7 and ejected from the discharge ports 9, 9. As described above, the discharge ports 9, 9,... Are inclined toward the base end side of the cylindrical body 1. Therefore, the plating solution ejected from the discharge ports 9, 9... Flows between the inner peripheral surface of the large diameter portion 4 of the cylindrical body 1 and the outer peripheral surface of the electrode 7 toward the base end side. Thus, a plating solution flow having a high flow velocity is formed on the downstream side of the discharge hole 9 of the electrode 7. At that time, along with the flow, a flow toward the base end also occurs in the plating solution located on the small diameter portion 3 side of the cylindrical body 1, but the flow velocity is small.
[0013]
In this state, the electrode 7 is connected to the positive electrode of the DC power supply 14 via the conductive wire 16, and the cylindrical body 1 is connected to the negative electrode of the power supply 14 via the conductive wire 17, and between the electrode 7 and the cylindrical body 1. Energize to. Then, metal ions in the plating solution are deposited on the inner surface 2 of the cylindrical body 1. Accordingly, when a Sargent solution that forms the basis of a chromium plating bath, for example, is used as the plating solution, chromium ions in the plating solution are deposited, and an electrolytic chromium layer is formed on the inner surface 2 of the cylindrical body 1.
[0014]
In that case, the flow of the plating solution having a larger flow velocity than the small diameter portion 3 side is formed in the portion of the large diameter portion 4 of the cylindrical body 1 as described above. It is known that the current density when the plating solution flows is proportional to the square root of the flow velocity v in the case of laminar flow and proportional to v 2/3 to v in the case of turbulent flow (Motoo Kawasaki). "Practical electroplating", Nikkan Kogyo Shimbun, 1980, p. 177). Therefore, the current density generated between the inner surface 2 of the cylindrical body 1 and the electrode 7 is larger in the current density in the large diameter portion 4 than in the small diameter portion 3. That is, the small diameter portion 3 of the cylindrical body 1 is plated with a small current density, and the large diameter portion 4 is plated with a large current density. As is apparent from FIG. 2, the relationship between the current density and the electrodeposition rate (plating rate) in the normal bath of chrome plating is that the plating rate increases as the current density increases at the same plating bath temperature. It is in. Therefore, due to the difference in current density, a thin plating layer 5 is formed on the inner surface of the small diameter portion 3 of the cylindrical body 1, and a thick plating layer 6 is formed on the inner surface of the large diameter portion 4.
[0015]
In this way, the plating solution is ejected from the intermediate portion of the electrode 7 using the holed electrode 7, and the flow rate of the plating solution is changed along the axial direction of the cylindrical body 1, whereby the inner surface 2 of the cylindrical body 1 is changed. The plating layers 5 and 6 having different film thicknesses can be formed by a single plating process. In this case, if the diameters of the small diameter portion 3 and the large diameter portion 4 provided on the inner surface 2 of the cylindrical body 1 are appropriately set in advance, the inner surfaces of the plating layers 5 and 6 are made to have a uniform diameter. Can do.
[0016]
Further, the temperature of the plating solution in the tank 12 is made lower than the temperature of the plating solution in the plating tank 10 using a temperature control device provided in the tank 12, and the low-temperature plating solution is discharged from the electrode 7. If it is made to discharge from the hole 9, the temperature of the plating solution located in the large diameter part 4 side of the cylindrical body 1 will become lower than the temperature of the plating solution located in the small diameter part 3 side.
As shown in FIG. 2, at the same current density, the lower the plating solution temperature, the higher the plating rate. Therefore, if the temperature of the plating solution located on the small diameter portion 3 side of the cylindrical body 1 and the temperature of the plating solution located on the large diameter portion 4 side are made different from each other as described above, the cylinder that is the portion where the plating solution temperature is high. A thin plating layer 5 is formed on the inner surface of the small-diameter portion 3 of the body 1, and a thick plating layer 6 is formed on the inner surface of the large-diameter portion 4, which is a portion having a low plating solution temperature.
[0017]
Based on such a principle, the thin plating layer 5 and the thick plating layer 6 can be formed at the same time only by making a difference in either the temperature or the flow rate of the plating solution. If the temperature of the plating solution is mainly varied, the pump 11 only needs to be able to supply the plating solution from the discharge hole 9 of the electrode 7, so that a small-sized one can be used. It can be used. However, in particular, when it is required to increase the film thickness ratio of the plating layers 5 and 6, it is desirable to make both the temperature and the flow rate of the plating solution different from each other. If the electrode 7 with a hole is used and the low temperature plating solution is pumped to the flow hole 8 of the electrode 7 by the pump 11 and ejected from the discharge holes 9, 9,. It is also easy to change both the temperature and the flow rate along the axial direction of the cylindrical body 1, and the plating layers 5 and 6 having a large thickness ratio can be formed by a single plating process.
[0018]
In the above-described embodiment, the case where the plating layers 5 and 6 whose film thickness changes in two stages in the axial direction of the cylindrical body 1 has been described. However, the electrode 7 has a plurality of flow holes 8 having different lengths. , And discharge holes 9, 9,... That communicate with the outer peripheral surface of the electrode 7 at different positions in the axial direction, respectively, so that plating solutions having different temperatures are pumped to the flow holes 8, respectively. If so, the film thickness can be changed in multiple stages.
[0019]
【The invention's effect】
As apparent from the above description, according to the present invention, it becomes possible to be formed by a single plating process the plating layer having a thickness varying in the axial direction, at the first time of plating, such as in the prior art No anticorrosion work or machining after plating is required, and the treatment work can be greatly simplified. In addition, since plating layers having different film thicknesses can be formed without overlapping the plating layers, a plating layer that is extremely resistant to peeling can be obtained.
[Brief description of the drawings]
FIG. 1 is a schematic sectional view showing an example of a method for plating an inner surface of a cylindrical body according to the present invention.
FIG. 2 is a characteristic diagram showing the relationship between the plating solution temperature and the plating rate in accordance with the current density for explaining the principle of the plating method.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Cylindrical body 2 Cylindrical inner surface 5 Thin plating layer 6 Thick plating layer 7 Electrode with a hole 8 Flow hole 9 Discharge hole 10 Plating tank 11 Pump 12 Tank 14 with a temperature control apparatus DC power supply (power supply apparatus for plating)

Claims (4)

円筒体の軸心部にその円筒体の軸線方向に延びる電極を配置し、その電極と前記円筒体とをめっき液中に浸漬して、それら電極及び円筒体間に通電することにより、前記円筒体の内面にめっきを施す方法において;
前記円筒体の内面と前記電極の外周面との間に位置するめっき液の温度を、軸線方向に沿って変化させ、その状態でめっき処理することにより、一度のめっき処理によって前記円筒体の内面に軸線方向に膜厚が変化するめっき層を形成することを特徴とする、
円筒体内面のめっき方法。
An electrode that extends in the axial direction of the cylindrical body is disposed at the axial center of the cylindrical body, the electrode and the cylindrical body are immersed in a plating solution, and a current is passed between the electrodes and the cylindrical body, whereby the cylinder In the method of plating the inner surface of the body;
By changing the temperature of the plating solution located between the inner surface of the cylindrical body and the outer peripheral surface of the electrode along the axial direction and performing plating in that state, the inner surface of the cylindrical body can be obtained by a single plating process. It is characterized by forming a plating layer whose film thickness changes in the axial direction.
A plating method for the inner surface of a cylindrical body.
前記電極として、内部にめっき液を流通させる軸線方向の流通孔と、その流通孔を外周面に連通させる半径方向の吐出孔とを有する孔付き電極を用い、外部からその孔付き電極の流通孔に温度の異なるめっき液を供給することにより、前記半径方向の吐出孔より下流側におけるめっき液の温度を変化させることを特徴とする、
請求項記載の円筒体内面のめっき方法。
As the electrode, a holed electrode having an axial flow hole through which a plating solution flows inside and a radial discharge hole communicating with the outer peripheral surface of the flow hole is used, and the flow hole of the holed electrode from the outside By supplying a plating solution having a different temperature to the temperature, the temperature of the plating solution on the downstream side of the radial discharge hole is changed,
The method for plating an inner surface of a cylindrical body according to claim 1 .
円筒体の軸心部にその円筒体の軸線方向に延びる電極を配置し、その電極と前記円筒体とをめっき液中に浸漬して、それら電極及び円筒体間に通電することにより、前記円筒体の内面にめっきを施す方法において;
前記円筒体の内面と前記電極の外周面との間に位置するめっき液に、軸線方向に沿い温度及び流速が変化する流れを形成し、その状態でめっき処理することにより、一度のめっき処理によって前記円筒体の内面に軸線方向に膜厚が変化するめっき層を形成することを特徴とする、
円筒体内面のめっき方法。
An electrode that extends in the axial direction of the cylindrical body is disposed at the axial center of the cylindrical body, the electrode and the cylindrical body are immersed in a plating solution, and a current is passed between the electrodes and the cylindrical body, whereby the cylinder In the method of plating the inner surface of the body;
In the plating solution located between the inner surface of the cylindrical body and the outer peripheral surface of the electrode, a flow in which the temperature and the flow velocity change along the axial direction is formed, and in this state, the plating process is performed. Forming a plating layer whose thickness changes in the axial direction on the inner surface of the cylindrical body,
A plating method for the inner surface of a cylindrical body.
前記電極として、内部にめっき液を流通させる軸線方向の流通孔と、その流通孔を外周面に連通させる半径方向の吐出孔とを有する孔付き電極を用い、外部からその孔付き電極の流通孔に温度の低いめっき液を圧送することにより、前記半径方向の吐出孔より下流側に、温度が低く流速の大きいめっき液の流れを形成することを特徴とする、
請求項記載の円筒体内面のめっき方法。
As the electrode, a holed electrode having an axial flow hole through which a plating solution flows inside and a radial discharge hole communicating with the outer peripheral surface of the flow hole is used, and the flow hole of the holed electrode from the outside The flow of the plating solution having a low temperature and a high flow rate is formed downstream of the radial discharge holes by pumping a plating solution having a low temperature to
The method for plating an inner surface of a cylindrical body according to claim 3 .
JP04296298A 1998-02-10 1998-02-10 Cylinder inner surface plating method Expired - Fee Related JP3797582B2 (en)

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