JP3868038B2 - Styrenic resin composition - Google Patents
Styrenic resin composition Download PDFInfo
- Publication number
- JP3868038B2 JP3868038B2 JP25001396A JP25001396A JP3868038B2 JP 3868038 B2 JP3868038 B2 JP 3868038B2 JP 25001396 A JP25001396 A JP 25001396A JP 25001396 A JP25001396 A JP 25001396A JP 3868038 B2 JP3868038 B2 JP 3868038B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- ethylene
- styrene
- vinyl compound
- aromatic vinyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011342 resin composition Substances 0.000 title claims description 27
- 229920001890 Novodur Polymers 0.000 title claims description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 104
- 229920001577 copolymer Polymers 0.000 claims description 42
- 229920002554 vinyl polymer Polymers 0.000 claims description 28
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- -1 aromatic vinyl compound Chemical class 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 16
- 238000006116 polymerization reaction Methods 0.000 claims description 15
- 239000000178 monomer Substances 0.000 claims description 14
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 13
- 239000005977 Ethylene Substances 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000001424 substituent group Chemical group 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 6
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 claims description 6
- 150000003623 transition metal compounds Chemical class 0.000 claims description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 4
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 3
- 239000003205 fragrance Substances 0.000 claims description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000000126 substance Substances 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000004793 Polystyrene Substances 0.000 description 6
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- 229920003048 styrene butadiene rubber Polymers 0.000 description 6
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 5
- 150000001639 boron compounds Chemical class 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229910052723 transition metal Inorganic materials 0.000 description 5
- 150000003624 transition metals Chemical class 0.000 description 5
- AQZWEFBJYQSQEH-UHFFFAOYSA-N 2-methyloxaluminane Chemical compound C[Al]1CCCCO1 AQZWEFBJYQSQEH-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 4
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 3
- PBKONEOXTCPAFI-UHFFFAOYSA-N 1,2,4-trichlorobenzene Chemical compound ClC1=CC=C(Cl)C(Cl)=C1 PBKONEOXTCPAFI-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920005604 random copolymer Polymers 0.000 description 3
- 239000004711 α-olefin Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920007962 Styrene Methyl Methacrylate Polymers 0.000 description 2
- 239000002174 Styrene-butadiene Substances 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 125000005234 alkyl aluminium group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 150000004696 coordination complex Chemical group 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- BXOUVIIITJXIKB-UHFFFAOYSA-N ethene;styrene Chemical compound C=C.C=CC1=CC=CC=C1 BXOUVIIITJXIKB-UHFFFAOYSA-N 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229920005669 high impact polystyrene Polymers 0.000 description 2
- 239000004797 high-impact polystyrene Substances 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- ADFPJHOAARPYLP-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;styrene Chemical compound COC(=O)C(C)=C.C=CC1=CC=CC=C1 ADFPJHOAARPYLP-UHFFFAOYSA-N 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000011115 styrene butadiene Substances 0.000 description 2
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 2
- QPFMBZIOSGYJDE-ZDOIIHCHSA-N 1,1,2,2-tetrachloroethane Chemical class Cl[13CH](Cl)[13CH](Cl)Cl QPFMBZIOSGYJDE-ZDOIIHCHSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 1
- YVSMQHYREUQGRX-UHFFFAOYSA-N 2-ethyloxaluminane Chemical compound CC[Al]1CCCCO1 YVSMQHYREUQGRX-UHFFFAOYSA-N 0.000 description 1
- JQXYBDVZAUEPDL-UHFFFAOYSA-N 2-methylidene-5-phenylpent-4-enoic acid Chemical compound OC(=O)C(=C)CC=CC1=CC=CC=C1 JQXYBDVZAUEPDL-UHFFFAOYSA-N 0.000 description 1
- DXIJHCSGLOHNES-UHFFFAOYSA-N 3,3-dimethylbut-1-enylbenzene Chemical compound CC(C)(C)C=CC1=CC=CC=C1 DXIJHCSGLOHNES-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- NWBSMOHZFZYBLB-UHFFFAOYSA-L [Cl-].[Cl-].C1=CC2=CC=CC=C2C1[Zr+2](=C(C)C)C1C2=CC=CC=C2C=C1 Chemical compound [Cl-].[Cl-].C1=CC2=CC=CC=C2C1[Zr+2](=C(C)C)C1C2=CC=CC=C2C=C1 NWBSMOHZFZYBLB-UHFFFAOYSA-L 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-O dimethyl(phenyl)azanium Chemical compound C[NH+](C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-O 0.000 description 1
- JGHYBJVUQGTEEB-UHFFFAOYSA-M dimethylalumanylium;chloride Chemical compound C[Al](C)Cl JGHYBJVUQGTEEB-UHFFFAOYSA-M 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- FUKUFMFMCZIRNT-UHFFFAOYSA-N hydron;methanol;chloride Chemical compound Cl.OC FUKUFMFMCZIRNT-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000001225 nuclear magnetic resonance method Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 239000004597 plastic additive Substances 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- ANEFWEBMQHRDLH-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl) borate Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1OB(OC=1C(=C(F)C(F)=C(F)C=1F)F)OC1=C(F)C(F)=C(F)C(F)=C1F ANEFWEBMQHRDLH-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
Description
【0001】
【発明の属する技術分野】
本発明はスチレン系樹脂及び/またはゴム強化スチレン系樹脂と新規なエチレン−芳香族ビニル化合物共重合体とからなるスチレン系樹脂組成物に関する。
【0002】
さらに詳しくは、本発明は、機械的特性、特に靭性に優れ、同時に射出、押出成形性の改良された射出成形品、押出成形品等の用途に好適に用いられる新規なスチレン系樹脂組成物に関する。
【0003】
【従来の技術】
スチレン系樹脂及び/またはゴム強化スチレン系樹脂は、形状安定性に優れた材料であるが、機械的特性、特に靭性に劣る欠点があった。かかる欠点を改良する目的で用いられるスチレン−ブタジエンランダム共重合体、スチレン−ブタジエンブロック共重合体、スチレン−イソプレンブロック共重合体、水添スチレン−ブタジエンブロック共重合体、エチレン−α−オレフィン共重合体などとスチレン系樹脂またはゴム強化スチレン系樹脂とからなる樹脂組成物では、スチレン系樹脂組成物の機械的特性、特に靭性が改良されており、射出成形品及び押出成形品の用途に広く使用されている。
【0004】
しかしながら、スチレン−ブタジエンランダム共重合体、スチレン−ブタジエンブロック共重合体、スチレン−イソプレンブロック共重合体ではブタジエンあるいはイソプレンに起因する二重結合のため射出、押出成形時に樹脂が熱劣化を起こすという欠点があった。また水添スチレン−ブタジエンブロック共重合体では、樹脂組成物の剛性が大幅に低下する問題があった。またエチレン−α−オレフィン共重合体との樹脂組成物は、相溶性が十分でなく成形物の表面が剥離する等の欠点があった。
【0005】
【発明が解決しようとする課題】
本発明の目的は、このような従来のスチレン系樹脂組成物の欠点を改良し、機械特性、特に靭性に優れ、射出、押出成形時の熱劣化も少なく、すなわち成形性に優れ、かつ相溶性も良好な新規なスチレン系樹脂組成物を提供することにある。
【0006】
【課題を解決するための手段】
本発明は、スチレン系樹脂及び/またはゴム強化スチレン系樹脂と特定の組成及び構造を有する新規なエチレン−芳香族ビニル化合物共重合体とからなる組成物により上記の課題を解決するものである。
【0007】
即ち本発明は、(A)スチレン単量体単位を40重量%以上含むスチレン系樹脂及び/またはスチレン単量体単位を40重量%以上含むゴム強化スチレン系樹脂1〜99重量部と、下記の(B)エチレン−芳香族ビニル化合物共重合体99〜1重量部を含有するスチレン系樹脂組成物である。(B)は、芳香族ビニル化合物単量体単位含量が1〜55モル%であるエチレン−芳香族ビニル化合物共重合体であって、下記の一般式(1)で示される構造を主とし、その構造中に含まれる下記の一般式(2)で示されるエチレンと芳香族ビニル化合物の交互構造のフェニル基の立体規則性がアイソタクティクダイアッド分率mで0.95以上のエチレン−芳香族ビニル化合物共重合体である。
【化5】
【化6】
【0008】
【化5】
【0009】
(式中、Phはフェニル基等の芳香族基、xは繰り返し単位数を示す2以上の整数、yは1以上の整数であって、各繰り返し単位において同一でも異なっていてもよい。zは0または1であって、各繰り返し単位において同一でも異なっていてもよい。)
【0010】
【化6】
【0011】
(式中、Phはフェニル基等の芳香族基、x’は繰り返し単位数を示し2以上の整数を表す。)
【0012】
また本発明は、(A)成分を30〜99重量部と、(B)成分を70〜1重量部含有するスチレン系樹脂組成物である。
更に本発明は、(B)成分のエチレン−芳香族ビニル化合物共重合体が、エチレンと芳香族ビニル化合物単量体とを上記の一般式(3)または(4)で示される遷移金属化合物と、助触媒とを用いて重合して製造されるエチレン−芳香族ビニル化合物共重合体であるスチレン系樹脂組成物である。
【0013】
以下、本発明の内容を詳細に説明する。なお、下記の説明で、化学式中のPhはフェニル基等の芳香族基を、Meはメチル基を表す。本発明の(B)成分であるエチレン−芳香族ビニル化合物共重合体とは、上記の一般式(1)で示される構造を主として有する共重合体において、上記の一般式(2)で示されるエチレンと芳香族ビニル化合物の交互構造のフェニル基の立体規則性がアイソタクティクダイアッド分率mで0.95以上であり、共重合体の芳香族ビニル化合物単量体単位含量が1〜55モル%の共重合体である。その構造は、核磁気共鳴法(NMR法)によって決定される。
【0014】
以下に、本発明の(B)成分の代表例であるエチレン−スチレン共重合体を例に取り、(B)成分について更に詳細に説明する。
スチレン含量が1〜55モル%であるこの共重合体の13C−NMRスペクトルは、主に以下に示す位置にピークを示す。
即ち、主鎖メチレン及びメチン炭素に由来するピークを25ppm付近、27ppm付近、30ppm付近、36ppm付近、及び45ppm付近に、また、フェニル基のうちポリマー主鎖に結合していない5個の炭素に由来するピークを126ppm付近及び128ppm付近に、フェニル基のうち共重合体の主鎖に結合している1個の炭素に由来するピークを146ppm付近に示す。
特開平3−163088号公報に記載されている共重合体の13C−NMRスペクトルとの比較により、これはヘッド−テイル構造のスチレン連鎖を有しない、いわゆる擬似ランダム共重合体である。
【0015】
本発明の(B)成分である、一般式(1)で表される共重合体は、下式(i)で与えられる指数θが、スチレン含量が1〜45モル%未満の場合70より大きく、44〜55モル%の場合30より大きいことを特徴とする。
θ=Al/A2×100 式(i)
ここで、AlはTMSを基準とした13C−NMRによって25〜50ppmの範囲に見い出される、下記一般式(1’)中のα〜εのメチン、メチレン炭素に帰属されるピーク面積の総和である。また、A2はTMSを基準にした13C−NMRによる25〜50ppmの範囲のピークの面積の総和である。
【0016】
【化7】
【0017】
(式中、xは繰り返し単位数を示す2以上の整数、yは1以上の整数であって、各繰り返し単位において互いに同一でも異なっていてもよい。zは0または1であって、各繰り返し単位において互いに同一でも異なっていてもよい。zが0の場合は、ポリマー内においてエチレンに対するスチレンの結合方向が一様である場合を示し、1の場合は、エチレンに対するスチレンの結合方向が一様でない場合、即ち異種結合を含む場合を示している。)
【0018】
一般式(1)で表される共重合体中に含まれるエチレン−スチレン交互構造の割合を示す指数λを下式(ii)で定義する。
λ=A3/A2×100 式(ii)
ここで、A3はTMSを基準とした13C−NMRによって25〜50ppmの範囲に見い出されるエチレン−スチレン交互構造由来の、下記の一般式(2’)中のa、b、c3種類のメチン、メチレン炭素に帰属されるピークの面積の総和である。また、A2はTMSを基準にした13C−NMRによる25〜50ppmの範囲のピークの面積の総和である。
【0019】
【化8】
【0020】
(式中、x’は繰り返し単位数を示し2以上の整数を表す。)
【0021】
本発明の(B)成分であるエチレン−スチレン共重合体は、交互構造指数λが70より小さく0.1より大きい、好ましくは70より小さく5より大きい、特に好ましくは70より小さく10より大きいことを特徴とする。
また、本発明のエチレン−スチレン共重合体では、重合条件等により、下記の一般式(5)で示される、スチレンに由来する異種結合構造を含む場合がある。
【0022】
【化9】
【0023】
(式中、nは0または1以上の整数を表す。)
【0024】
また、スチレン含量が30モル%以上の場合には、下記の一般式(6)で表される限定的なスチレンの連鎖構造を含むことができる。
【0025】
【化10】
【0026】
しかし、いずれにせよ、本発明の(B)成分であるエチレン−スチレン共重合体は、いずれのスチレン含量においても、TMSを基準とした13C−NMRスペクトルにおいて、40.8〜41.0ppmのシンジオタクティクポリスチレン、40.5〜41.0ppmのアタクティクポリスチレン、及びアイソタクティクポリスチレンの明確なピークが見られない。すなわち、これらのピークで特徴づけられる、以下の一般式(7)で示されるような、ヘッド−テイル構造のアタクティク、シンジオタクティク、またはアイソタクティクポリスチレンの連鎖が実質的に存在しないことが特徴である。
【0027】
【化11】
【0028】
(式中、qは3以上の整数を表す。)
【0029】
本発明のエチレン−スチレン共重合体において、エチレンとスチレンの交互共重合構造のフェニル基の立体規則性がアイソタクティク構造であるとは、アイソタクティクダイアッド分率mが0.95以上を示す構造をいう。ここで、アイソタクティクダイアッド分率mは、25ppm付近に現れるメチレン炭素ピークにおいて、ラセミダイアッド構造に由来する25.4〜25.5ppm付近のピーク面積Arと、メソダイアッド構造に由来する25.2〜25.3ppm付近のピーク面積Amとから、下式(iii)によって求めることができる。なお、13C−NMRスペクトルは、共に重クロロホルムを溶媒とし、TMSを基準として求めた。
m=Am/(Ar+Am) 式(iii)
【0030】
以上、芳香族ビニル化合物単量体の代表例としてスチレンを例にとり、本発明の(B)成分であるエチレン−芳香族ビニル化合物共重合体を説明したが、(B)成分に用いられる芳香族ビニル化合物単量体の具体例には、スチレン、各種の置換スチレン、例えばp−メチルスチレン、m−メチルスチレン、o−メチルスチレン、o−t−ブチルスチレン、m−t−ブチルスチレン、p−t−ブチルスチレン、p−クロロスチレン、o−クロロスチレン、α−メチルスチレン等があり、またジビニルベンゼン等の一分子中に複数個のビニル基を有する単量体があり、これらを単独で、あるい2種以上を併用して用いる。
【0031】
本発明の(B)成分は重量平均分子量1000以上であるが、スチレン系樹脂組成物としての要求特性を満足するために、好ましくは1万以上、特に好ましくは3万以上である。
【0032】
本発明の(B)成分は、必ずしもそれが純粋な共重合体である必要はなく、構造及び立体規則性が本発明の範囲にあれば、他の構造が含まれていても良く、また、他の単量体が共重合されていても差し支えない。共重合される他の単量体としては、プロピレン、1−ヘキセン、1−オクテン等の炭素数3以上のα−オレフィン、ブタジエン、イソプレン等の共役ジエン単量体、シクロペンテン、シクロペンタジエン、シクロヘキセン等の環状オレフィン等が挙げられる。
【0033】
また、重合条件等によっては、芳香族ビニル化合物単量体が熱重合あるいはラジカル重合したアタクティクホモポリマーが少量含まれる場合があるが、その量は全体の10重量%以下であることが好ましい。このようなホモポリマーは溶媒抽出等の手段により除去できるが、物性上特に問題がなければ、これを含んだまま使用することもできる。
【0034】
本発明の(B)成分の製法は特に制限はないが、好ましくは、エチレンと芳香族ビニル化合物単量体とを、非置換または置換インデニル基を少なくとも1個以上含有する遷移金属化合物または、非置換または置換シクロペンタジエニル基及び非置換または置換インデニル基を含有する遷移金属化合物と助触媒とを用いて重合することにより製造される。当該遷移金属化合物は、下記の一般式(3)または一般式(4)で示される遷移金属化合物である。
【0035】
【化12】
【0036】
(ここで、Ind1、Ind2は、非置換または置換インデニル基である。Ind1とInd2は互いに同一であっても、異なっていてもよい。
Yは、Ind1、Ind2と結合を有し、他の置換基を有する炭素、珪素、ゲルマニウムまたはほう素であり、他の置換基には水素、ハロゲン、アルキル基好ましくは炭素数1〜15のアルキル基、アリール基好ましくは炭素数6〜10のアリール基、アルキルアリール基好ましくは炭素数7〜40のアルキルアリール基等がある。この置換基は同一であっても、互いに異なっていても、またはシクロヘキシル基、シクロペンチル基等の環状構造を有していてもよい。Yの構造を例示すると、−CH2 −、−CMe2 −、−CPh2 −、−SiH2 −、−SiMe2 −、−SiPh2 −等がある。
【0037】
X1、X2としては、水素、塩素あるいは臭素等のハロゲン、メチル基あるいはエチル基等のアルキル基、フェニル基等のアリール基、トリメチルシリル基等のシリル基、メトキシ基、エトキシ基あるいはイソプロポキシ基等のアルコキシ基等がある。また、X1、X2は互いに同一でも異なっていてもよい。Mは、Zr、Hf、Tiである。)
【0038】
Ind1及び/またはInd2の例としては、1−インデニル、2−アルキル−1−インデニル、2−アルキル−4−アリール−1−インデニル、2,4−ジアルキル−1−インデニル、2,4−ジアリール−1−インデニル、2,4,6−トリアルキル−1−インデニル、1−アルキル−4,5−ベンゾ−1−インデニル、2,5−ジアルキル−1−インデニル、2,5,6−トリアルキル−1−インデニル、2,4,5−トリアルキル−1−インデニル、2−アリール−1−インデニル、2,6−ジアルキル−4−アリール−1−インデニル、2−アルキル−5−アリール−1−インデニル、2−アルキル−5,6−ジアリール−1−インデニル、2−アルキル−4,5−ジアリール−1−インデニル、2−アルキル−4,6−ジアリール−1−インデニル等が挙げられる。
【0039】
【化13】
【0040】
(ここで、Indは、非置換または置換インデニル基である。
Cpは、非置換または置換シクロペンタジエニル基である。
Yは、Ind、Cpと結合を有し、他の置換基を有する炭素、珪素、ゲルマニウムまたはほう素であり、他の置換基とは水素、ハロゲン、アルキル基好ましくは炭素数1〜15のアルキル基、アリール基好ましくは炭素数6〜10のアリール基、アルキルアリール基好ましくは炭素数7〜40のアルキルアリール基等がある。この置換基は同一であっても、互いに異なっていても、またはシクロヘキシル基、シクロペンチル基等の環状構造を有していてもよい。Yの構造を例示すると、−CH2 −、−CMe2 −、−CPh2 −、−SiH2 −、−SiMe2 −、−SiPh2 −等がある。
【0041】
X1、X2としては、水素、塩素あるいは臭素等のハロゲン、メチル基あるいはエチル基等のアルキル基、フェニル基等のアリール基、トリメチルシリル基等のシリル基、メトキシ基、エトキシ基あるいはイソプロポキシ基等のアルコキシ基等がある。また、X1、X2は互いに同一でも異なっていてもよい。Mは、Zr、Hf、Tiである。)
【0042】
Indは一般式(3)のInd1、Ind2に使用できるものを例示できる。Cpの例としては、シクロペンタジエニル、2−アルキル−1−シクロペンタジエニル、2,4−ジアルキル−1−シクロペンタジエニル、2,4,5−トリアルキル−1−シクロペンタジエニル、2−トリアルキルシリル−1−シクロペンタジエニル、2−トリアルキルシリル−4−アルキル−1−シクロペンタジエニル、2−トリアルキルシリル−4,5−ジアルキル−1−シクロペンタジエニル、2−アルキル−4−アリール−1−シクロペンタジエニル、2−アルキル−4,5−ジアリール−1−シクロペンタジエニル、2,5−ジアルキル−4−アリール−1−シクロペンタジエニル、2,4−ジアルキル−5−アリール−1−シクロペンタジエニル、2−アリール−1−シクロペンタジエニル、2−アリール−4−アルキル−1−シクロペンタジエニル、2−アリール−4,5−ジアルキル−1−シクロペンタジエニル、2,3,4,5−テトラアルキルシクロペンタジエニル、2,3,4,5−テトラアリールシクロペンタジエニル等がある。
【0043】
本発明の(B)成分の製造に際しては、上記の遷移金属錯体と共に助触媒として有機アルミニウム化合物及び/またはほう素化合物を用いることが好ましい。助触媒として用いる有機アルミニウム化合物としては、メチルアルモキサン、エチルアルモキサン、トリイソブチルアルモキサン等のアルモキサンが好適に用いられるが、特にメチルアルモキサンが好ましい。必要に応じ、これら種類の異なるアルモキサンの混合物を用いてもよい。また、これらアルモキサンとアルキルアルミニウム、例えば、トリメチルアルミニウム、トリエチルアルミニウム、トリイソブチルアルミニウムやハロゲンを含むアルキルアルミニウム、例えばジメチルアルミニウムクロライド等を併用してもよい。
【0044】
助触媒として用いるほう素化合物は、N,N−ジメチルアニリニウムテトラ(ペンタフルオロフェニル)ボレート、トリチルテトラ(ペンタフルオロフェニル)ボレート、リチウムテトラ(ペンタフルオロフェニル)ボレート、トリ(ペンタフルオロフェニル)ボレート等である。また、これらほう素化合物と上記有機アルミニウム化合物を同時に用いても差し支えない。
特に、ほう素化合物を助触媒として用いる場合、重合系内に含まれる水等の重合に悪影響を与える不純物の除去にトリイソブチルアルミニウム等のアルキルアルミ化合物の添加は有効である。
【0045】
本発明の(B)成分の製造では、適当な溶媒の存在下あるいは不存在下で、所望の単量体を遷移金属錯体および助触媒と混合して重合することができる。用いられる溶媒にはペンタン、ヘキサン、ヘプタン、シクロヘキサン等の脂肪族炭化水素、ベンゼン、トルエン、キシレン、クロロ置換ベンゼン、クロロ置換トルエン等の芳香族炭化水素、塩化メチレン、クロロホルム等のハロゲン化炭化水素等があり、単独または混合溶媒として用いることが出来る。
【0046】
(B)成分の製造にあたり、重合温度は、−78℃から200℃が適当であり、好ましくは0℃〜160℃である。−78℃より低い重合温度は工業的に不利であり、200℃を超えると金属錯体の分解が起こるので適当ではない。
助触媒として有機アルミニウム化合物を用いる場合には、錯体の遷移金属に対し、アルミニウム原子/錯体金属原子比で好ましくは0.1〜100000、特に好ましくは10〜10000の範囲で用いる。0.1より小さいと遷移金属錯体の活性化が不十分であり、100000を超えると経済的に不利となる。
助触媒としてほう素化合物を用いる場合には、ほう素原子/錯体金属原子比で0.01〜100の範囲で用いることが適当であるが、好ましくは0.1〜10、特に好ましくは1で用いられる。0.01より小さいと遷移金属錯体の活性化が不十分であり、100を超えると経済的に不利となる。
第IV族金属錯体と助触媒は、重合槽外で混合、調製しても、重合時に槽内で混合してもよい。
【0047】
本発明の(A)成分として用いるスチレン単量体単位を40重量%以上含むスチレン系樹脂としては、スチレン重合体、スチレン−メチルメタクリレート共重合体、スチレン−メチルアクリレート共重合体、スチレン−メタクリル酸共重合体、スチレン−アクリル酸共重合体、スチレン−アクリロニトリル共重合体、スチレン−N−フェニルマレイミド共重合体等がある。
また、スチレン単量体単位を40重量%以上含むゴム強化スチレン系樹脂としては、ハイインパクトポリスチレン、アクリロニトリル−ブタジエン−スチレン共重合体、メチルメタクリレート−ブタジエン−スチレン共重合体等がある。また、本発明で用いる(A)成分は、スチレン系樹脂及びゴム強化スチレン系樹脂の混合物であっても良い。
【0048】
本発明のスチレン系樹脂組成物は、(A)スチレン系樹脂及び/またはゴム強化スチレン系樹脂1〜99重量部と、(B)エチレン−芳香族ビニル化合物共重合体99〜1重量部を含有する。
(A)に(B)が添加された場合には、機械的特性、特に靭性に優れ、成形性の改良されたスチレン系樹脂組成物が得られ、(B)に(A)が添加された場合には、特に剛性が改良され、機械的特性、成形性の良好な樹脂組成物が得られるので両者の配合比は上記の範囲において特別限定されるものではなく、広範囲な比率で使用可能である。
また、(B)エチレン−芳香族ビニル化合物共重合体が(A)スチレン系樹脂及び/またはゴム強化スチレン系樹脂の改質材として用いられる場合には、(A)30〜99重量部、(B)70〜1重量部の割合で含有することが好ましく、(A)を50〜95重量部、(B)を50〜5重量部の割合で含有することが更に好ましい。
【0049】
本発明のスチレン系樹脂組成物は、用途に応じ、従来の樹脂組成物に用いられる可塑剤、滑剤、安定剤、着色剤、ガラスファイバー、セラミックファイバー、シリカ、タルク等の無機添加剤等を混合して使用することができる。また必要ならば他の樹脂、例えばポリエチレン、ポリプロピレン、ナイロン、ポリエステル、ポリカーボネート、ポリフェニレンエーテル等を混ぜることも可能である。
【0050】
本発明のスチレン系樹脂組成物は、(A)成分のスチレン系樹脂及び/またはゴム強化スチレン系樹脂と(B)成分のエチレン−芳香族ビニル化合物共重合体とを溶融混合して製造されるが、溶融混合は公知の方法によればよく、通常160〜280℃の温度で行い、溶融混合にあたっては押出機、ニーダー、バンバリーミキサーなどのいずれの装置を使用してもよい。
【0051】
【実施例】
以下、実施例により、本発明を説明するが、これらの実施例は本発明を限定するものではない。
【0052】
各実施例で得られたポリマーの分析は以下の手段によって実施した。
13C−NMR測定は、装置は日本電子社製JNMGX−270またはα−500を用い、溶媒は重クロロホルムまたは重1,1,2,2−テトラクロロエタンを用い、TMSを基準として測定した。
ポリマー中のスチレン含量の決定は、1H−NMRで行い、装置は日本電子社製JNMGX−270またはα−500を用い、溶媒は重クロロホルムまたは1,1,2, 2−テトラクロロエタンを用い、TMSを基準として、フェニル基プロトン由来のピークとアルキル基由来のプロトンピークの強度比較で行った。
分子量はGPC(ゲルパーミエーションクロマトグラフィー)を用いて標準ポリスチレン換算の分子量を求めた。溶媒はTHFまたは1,2,4−トリクロロベンゼンを用い、カラムは東ソー社製HLC−8020またはセンシュウ科学社製GPC−7100を用いた。
【0053】
スチレン系樹脂組成物の物性評価は以下の方法で行った。
靭性は、落錘強度をJIS K−7211に準じて測定し、50%非破壊をその値とした。
曲げ弾性率はJIS K−7203に準じて測定した。
成形表面特性はJIS K−7113の引張りダンベルの表面剥離状態を目視で判定した。
成形性としての熱安定性は射出成形機中に300℃で5分間滞留した後、ダンベルを成形し、その表面の色調変化を目視で判定した。
【0054】
参考例1
窒素置換後、エチレンで置換された容量1Lの攪拌機付きオートクレーブに、スチレン340ml、トルエン40mlを加え、さらにメチルアルモキサン(東ソーアクゾ社製、MMAO−3A)をAl原子基準で25mmol加えた。次いで、室温でエチレンを導入して9kg/cm2 Gに昇圧した後、オートクレーブを加熱し内温を50℃で安定させた。オートクレーブ上部に設置した耐圧タンクから、ラセミ体のイソプロピリデンビス(1−インデニル)ジルコニウムジクロリド25μmolをトルエン100mlに溶解した触媒液をオートクレーブ中に注入した。エチレン圧を2kg/cm2 Gに維持しながら1時間重合を行った。重合終了後、内容液を大過剰の塩酸酸性メタノール液中に投入してポリマーを回収した。これを減圧下にて60℃で10時間以上乾燥したところ、64gのエチレン−スチレン共重合体(P1)を得た。
【0055】
参考例2
参考例1に使用したものと同じ錯体42μmolをトルエン150mlに溶解した触媒液を用い、メチルアルモキサン量を42mmol、スチレン、トルエンの仕込み量をそれぞれ200ml、130mlに、エチレン圧を10kg/cm2 Gに変更した以外は参考例1と同様に重合を実施したところ、88gのエチレン−スチレン共重合体(P2)を得た。
【0056】
参考例3
スチレン、トルエンの仕込み量を120ml、210mlに変更した以外は参考例2と同様に重合を実施したところ、96gのエチレン−スチレン共重合体(P3)を得た。
得られたエチレン−スチレン共重合体P1、P2及びP3の分析値を表1に示した。
【0057】
【表1】
【0058】
実施例1〜3
表2のように、表1のエチレン−スチレン共重合体(P1、P2、P3)それぞれ20重量部とハイインパクトポリスチレン(電気化学工業社製デンカHI−RQ)80重量部を20mmφ2軸押出機で230℃で溶融混練した。得られたスチレン系樹脂組成物の物性評価を行い、その結果を表2に示した。
【0059】
実施例4
表1のエチレン−スチレン共重合体(P1)40重量部とポリスチレン(電気化学工業社製デンカMW−1)60重量部を実施例1と同様に溶融混練した。得られたスチレン系樹脂組成物の物性評価を行い、その結果を表2に示した。
【0060】
実施例5
表1のエチレン−スチレン共重合体(P2)25重量部とスチレン−メチルメタクリレート共重合体(電気化学工業社製デンカTP)75重量部を実施例1と同様に溶融混練した。得られたスチレン系樹脂組成物の物性評価を行い、その結果を表2に示した。
【0061】
【表2】
【0062】
【発明の効果】
本発明のスチレン系樹脂組成物は、機械的特性、特に靭性に優れ、また熱安定性も良好で、成形性にも優れ、かつ相溶性が良いため成形品の表面特性も優れている。そのため電気・電子部品、OA筐体部品等の射出成形品、シート、フィルム及びパイプ等の用途に好適に用いられる。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a styrene resin composition comprising a styrene resin and / or a rubber-reinforced styrene resin and a novel ethylene-aromatic vinyl compound copolymer.
[0002]
More specifically, the present invention relates to a novel styrenic resin composition that is excellent in mechanical properties, particularly toughness, and at the same time used for applications such as injection molded articles and extruded molded articles with improved injection moldability. .
[0003]
[Prior art]
Styrenic resin and / or rubber-reinforced styrene resin is a material excellent in shape stability, but has a drawback of poor mechanical properties, particularly toughness. Styrene-butadiene random copolymer, styrene-butadiene block copolymer, styrene-isoprene block copolymer, hydrogenated styrene-butadiene block copolymer, ethylene-α-olefin copolymer used for the purpose of improving such defects Resin compositions consisting of coalesced styrene resin or rubber reinforced styrene resin have improved mechanical properties, especially toughness of styrene resin compositions, and are widely used for injection molding and extrusion molding applications. Has been.
[0004]
However, in the case of styrene-butadiene random copolymer, styrene-butadiene block copolymer, and styrene-isoprene block copolymer, the resin causes thermal deterioration during injection and extrusion because of double bonds caused by butadiene or isoprene. was there. In addition, the hydrogenated styrene-butadiene block copolymer has a problem that the rigidity of the resin composition is significantly reduced. Further, the resin composition with the ethylene-α-olefin copolymer has a drawback that the compatibility is not sufficient and the surface of the molded product is peeled off.
[0005]
[Problems to be solved by the invention]
The object of the present invention is to improve the disadvantages of such a conventional styrene resin composition, excellent mechanical properties, particularly toughness, little thermal deterioration during injection and extrusion molding, that is, excellent moldability and compatibility. Another object of the present invention is to provide a novel styrenic resin composition.
[0006]
[Means for Solving the Problems]
The present invention solves the above problems by a composition comprising a styrene resin and / or a rubber-reinforced styrene resin and a novel ethylene-aromatic vinyl compound copolymer having a specific composition and structure.
[0007]
That is, the present invention includes (A) 1 to 99 parts by weight of a styrene resin containing 40% by weight or more of a styrene monomer unit and / or a rubber-reinforced styrene resin containing 40% by weight or more of a styrene monomer unit, (B) A styrene resin composition containing 99 to 1 part by weight of an ethylene-aromatic vinyl compound copolymer. (B) is an ethylene-aromatic vinyl compound copolymer having an aromatic vinyl compound monomer unit content of 1 to 55 mol%, mainly having a structure represented by the following general formula (1), Ethylene-fragrance in which the stereoregularity of the phenyl group of the alternating structure of ethylene and aromatic vinyl compound represented by the following general formula (2) contained in the structure is 0.95 or more in terms of isotactic diad fraction m Group vinyl compound copolymer.
[Chemical formula 5]
[Chemical 6]
[0008]
[Chemical formula 5]
[0009]
(Wherein Ph is an aromatic group such as a phenyl group, x is an integer of 2 or more indicating the number of repeating units, y is an integer of 1 or more, and each repeating unit may be the same or different. Z is 0 or 1 and each repeating unit may be the same or different.)
[0010]
[Chemical 6]
[0011]
(In the formula, Ph represents an aromatic group such as a phenyl group, and x ′ represents the number of repeating units and represents an integer of 2 or more.)
[0012]
Moreover, this invention is a styrene resin composition containing 30-99 weight part of (A) component, and 70-1 weight part of (B) component.
Furthermore, the present invention provides an ethylene-aromatic vinyl compound copolymer as component (B) wherein ethylene and an aromatic vinyl compound monomer are a transition metal compound represented by the above general formula (3) or (4) , A styrene resin composition which is an ethylene-aromatic vinyl compound copolymer produced by polymerization using a cocatalyst.
[0013]
Hereinafter, the contents of the present invention will be described in detail. In the following description, Ph in the chemical formula represents an aromatic group such as a phenyl group, and Me represents a methyl group. The ethylene-aromatic vinyl compound copolymer which is the component (B) of the present invention is a copolymer mainly having the structure represented by the above general formula (1) and represented by the above general formula (2). The stereoregularity of the phenyl group having an alternating structure of ethylene and aromatic vinyl compound is 0.95 or more in terms of isotactic diad fraction m, and the aromatic vinyl compound monomer unit content of the copolymer is 1 to 55. It is a mol% copolymer. Its structure is determined by a nuclear magnetic resonance method (NMR method).
[0014]
Hereinafter, the ethylene-styrene copolymer which is a representative example of the component (B) of the present invention will be described as an example, and the component (B) will be described in more detail.
The 13C-NMR spectrum of this copolymer having a styrene content of 1 to 55 mol% mainly shows peaks at the following positions.
That is, peaks derived from main chain methylene and methine carbon are derived from around 25 ppm, around 27 ppm, around 30 ppm, around 36 ppm, and around 45 ppm, and from 5 carbons that are not bonded to the polymer main chain in the phenyl group. The peaks derived from one carbon bonded to the main chain of the copolymer among the phenyl groups are shown near 126 ppm and 128 ppm.
According to a comparison with the 13C-NMR spectrum of the copolymer described in JP-A-3-163088, this is a so-called pseudo-random copolymer having no head-tail structure styrene chain.
[0015]
The copolymer represented by the general formula (1), which is the component (B) of the present invention, has an index θ given by the following formula (i) greater than 70 when the styrene content is less than 1 to 45 mol%. 44 to 55 mol%, it is characterized by being larger than 30.
θ = Al / A2 × 100 Formula (i)
Here, Al is the sum total of peak areas attributed to methine and methylene carbon of α to ε in the following general formula (1 ′), found in a range of 25 to 50 ppm by 13C-NMR based on TMS. . Moreover, A2 is the sum total of the area of the peak of the range of 25-50 ppm by 13C-NMR on the basis of TMS.
[0016]
[Chemical 7]
[0017]
(In the formula, x is an integer of 2 or more indicating the number of repeating units, y is an integer of 1 or more, and each repeating unit may be the same as or different from each other. The units may be the same or different from each other, when z is 0, the direction of bonding of styrene to ethylene is uniform in the polymer, and in the case of 1, the direction of bonding of styrene to ethylene is uniform. The case where it is not, ie, the case containing a heterogeneous bond is shown.)
[0018]
The index λ indicating the ratio of the ethylene-styrene alternating structure contained in the copolymer represented by the general formula (1) is defined by the following formula (ii).
λ = A3 / A2 × 100 Formula (ii)
Here, A3 is derived from an ethylene-styrene alternating structure found in a range of 25 to 50 ppm by 13C-NMR based on TMS, and a, b, and c3 types of methine and methylene in the following general formula (2 ′) This is the sum of the areas of peaks attributed to carbon. Moreover, A2 is the sum total of the area of the peak of the range of 25-50 ppm by 13C-NMR on the basis of TMS.
[0019]
[Chemical 8]
[0020]
(In the formula, x ′ represents the number of repeating units and represents an integer of 2 or more.)
[0021]
The ethylene-styrene copolymer as component (B) of the present invention has an alternating structure index λ of less than 70 and greater than 0.1, preferably less than 70 and greater than 5, particularly preferably less than 70 and greater than 10. It is characterized by.
Further, the ethylene-styrene copolymer of the present invention may contain a heterogeneous bond structure derived from styrene represented by the following general formula (5) depending on the polymerization conditions and the like.
[0022]
[Chemical 9]
[0023]
(In the formula, n represents 0 or an integer of 1 or more.)
[0024]
Moreover, when the styrene content is 30 mol% or more, a limited styrene chain structure represented by the following general formula (6) can be included.
[0025]
[Chemical Formula 10]
[0026]
However, in any case, the ethylene-styrene copolymer which is the component (B) of the present invention is 40.8 to 41.0 ppm of Shinji in 13C-NMR spectrum based on TMS at any styrene content. Clear peaks of tactic polystyrene, 40.5-41.0 ppm tactic polystyrene, and isotactic polystyrene are not seen. That is, it is characterized in that there is substantially no tactic, syndiotactic, or isotactic polystyrene chain of the head-tail structure as shown by the following general formula (7), which is characterized by these peaks. It is.
[0027]
Embedded image
[0028]
(In the formula, q represents an integer of 3 or more.)
[0029]
In the ethylene-styrene copolymer of the present invention, the stereoregularity of the phenyl group of the alternating copolymer structure of ethylene and styrene is an isotactic structure. The isotactic dyad fraction m is 0.95 or more. Refers to the structure shown. Here, the isotactic dyad fraction m is a methylene carbon peak appearing in the vicinity of 25 ppm, a peak area Ar in the vicinity of 25.4 to 25.5 ppm derived from the racemic dyad structure, and a 25. From the peak area Am in the vicinity of 2 to 25.3 ppm, it can be obtained by the following formula (iii). The 13C-NMR spectrum was obtained with deuterated chloroform as a solvent and TMS as a reference.
m = Am / (Ar + Am) Formula (iii)
[0030]
As mentioned above, taking styrene as an example of the aromatic vinyl compound monomer, the ethylene-aromatic vinyl compound copolymer which is the component (B) of the present invention has been described. The aromatic used for the component (B) Specific examples of the vinyl compound monomer include styrene, various substituted styrenes such as p-methylstyrene, m-methylstyrene, o-methylstyrene, ot-butylstyrene, mt-butylstyrene, p- There are t-butylstyrene, p-chlorostyrene, o-chlorostyrene, α-methylstyrene and the like, and there are monomers having a plurality of vinyl groups in one molecule such as divinylbenzene, Or two or more types are used in combination.
[0031]
The component (B) of the present invention has a weight average molecular weight of 1000 or more, but is preferably 10,000 or more, particularly preferably 30,000 or more, in order to satisfy the required characteristics as a styrene-based resin composition.
[0032]
The component (B) of the present invention does not necessarily need to be a pure copolymer, and may contain other structures as long as the structure and stereoregularity are within the scope of the present invention. Other monomers may be copolymerized. Other monomers to be copolymerized include α-olefins having 3 or more carbon atoms such as propylene, 1-hexene and 1-octene, conjugated diene monomers such as butadiene and isoprene, cyclopentene, cyclopentadiene, cyclohexene and the like. And cyclic olefins.
[0033]
Depending on the polymerization conditions and the like, a small amount of the tactic homopolymer obtained by thermal polymerization or radical polymerization of the aromatic vinyl compound monomer may be contained, but the amount is preferably 10% by weight or less. Such a homopolymer can be removed by means such as solvent extraction. However, if there is no particular problem in physical properties, it can be used as it is.
[0034]
The production method of the component (B) of the present invention is not particularly limited, but preferably, a transition metal compound containing at least one unsubstituted or substituted indenyl group containing ethylene and an aromatic vinyl compound monomer, or non- It is produced by polymerization using a transition metal compound containing a substituted or substituted cyclopentadienyl group and an unsubstituted or substituted indenyl group and a promoter. The transition metal compound is a transition metal compound represented by the following general formula (3) or general formula (4).
[0035]
Embedded image
[0036]
(Ind1 and Ind2 are unsubstituted or substituted indenyl groups. Ind1 and Ind2 may be the same as or different from each other.
Y is carbon, silicon, germanium or boron having a bond with Ind1 and Ind2 and having other substituents. The other substituents are hydrogen, halogen, alkyl groups, preferably alkyl having 1 to 15 carbon atoms. Group, an aryl group, preferably an aryl group having 6 to 10 carbon atoms, an alkylaryl group, preferably an alkylaryl group having 7 to 40 carbon atoms. These substituents may be the same or different from each other, or may have a cyclic structure such as a cyclohexyl group or a cyclopentyl group. To illustrate the structure of Y, -CH 2 -, - CMe 2 -, - CPh 2 -, - SiH 2 -, - SiMe 2 -, - SiPh 2 - and the like.
[0037]
X1, X2 include hydrogen, halogen such as chlorine or bromine, alkyl group such as methyl or ethyl group, aryl group such as phenyl group, silyl group such as trimethylsilyl group, methoxy group, ethoxy group or isopropoxy group There are alkoxy groups and the like. X1 and X2 may be the same as or different from each other. M is, Zr, Hf, Ru Oh in Ti. )
[0038]
Examples of Ind1 and / or Ind2 include 1-indenyl, 2-alkyl-1-indenyl, 2-alkyl-4-aryl-1-indenyl, 2,4-dialkyl-1-indenyl, 2,4-diaryl- 1-indenyl, 2,4,6-trialkyl-1-indenyl, 1-alkyl-4,5-benzo-1-indenyl, 2,5-dialkyl-1-indenyl, 2,5,6-trialkyl- 1-indenyl, 2,4,5-trialkyl-1-indenyl, 2-aryl-1-indenyl, 2,6-dialkyl-4-aryl-1-indenyl, 2-alkyl-5-aryl-1-indenyl 2-alkyl-5,6-diaryl-1-indenyl, 2-alkyl-4,5-diaryl-1-indenyl, 2-alkyl-4,6-diary 1-indenyl and the like.
[0039]
Embedded image
[0040]
(Here, Ind is an unsubstituted or substituted indenyl group.
Cp is an unsubstituted or substituted cyclopentadienyl group.
Y is carbon, silicon, germanium or boron having a bond with Ind and Cp and having other substituents, and the other substituents are hydrogen, halogen, alkyl group, preferably alkyl having 1 to 15 carbon atoms. Group, an aryl group, preferably an aryl group having 6 to 10 carbon atoms, an alkylaryl group, preferably an alkylaryl group having 7 to 40 carbon atoms. These substituents may be the same or different from each other, or may have a cyclic structure such as a cyclohexyl group or a cyclopentyl group. To illustrate the structure of Y, -CH 2 -, - CMe 2 -, - CPh 2 -, - SiH 2 -, - SiMe 2 -, - SiPh 2 - and the like.
[0041]
X1, X2 include hydrogen, halogen such as chlorine or bromine, alkyl group such as methyl or ethyl group, aryl group such as phenyl group, silyl group such as trimethylsilyl group, methoxy group, ethoxy group or isopropoxy group There are alkoxy groups and the like. X1 and X2 may be the same as or different from each other. M is, Zr, Hf, Ru Oh in Ti. )
[0042]
Examples of Ind include those that can be used for Ind1 and Ind2 in the general formula (3). Examples of Cp include cyclopentadienyl, 2-alkyl-1-cyclopentadienyl, 2,4-dialkyl-1-cyclopentadienyl, 2,4,5-trialkyl-1-cyclopentadienyl. 2-trialkylsilyl-1-cyclopentadienyl, 2-trialkylsilyl-4-alkyl-1-cyclopentadienyl, 2-trialkylsilyl-4,5-dialkyl-1-cyclopentadienyl, 2-alkyl-4-aryl-1-cyclopentadienyl, 2-alkyl-4,5-diaryl-1-cyclopentadienyl, 2,5-dialkyl-4-aryl-1-cyclopentadienyl, 2 , 4-Dialkyl-5-aryl-1-cyclopentadienyl, 2-aryl-1-cyclopentadienyl, 2-aryl-4-alkyl-1 Cyclopentadienyl, 2-aryl-4,5-dialkyl-1-cyclopentadienyl, 2,3,4,5-tetraalkylcyclopentadienyl, 2,3,4,5-tetraarylcyclopentadi Enil etc.
[0043]
In producing the component (B) of the present invention, it is preferable to use an organoaluminum compound and / or a boron compound as a promoter together with the above transition metal complex. As the organoaluminum compound used as a cocatalyst, alumoxane such as methylalumoxane, ethylalumoxane, triisobutylalumoxane is preferably used, and methylalumoxane is particularly preferable. If necessary, a mixture of these different alumoxanes may be used. These alumoxanes and alkylaluminums such as trimethylaluminum, triethylaluminum, triisobutylaluminum and halogen-containing alkylaluminums such as dimethylaluminum chloride may be used in combination.
[0044]
Boron compounds used as promoters include N, N-dimethylanilinium tetra (pentafluorophenyl) borate, trityltetra (pentafluorophenyl) borate, lithium tetra (pentafluorophenyl) borate, tri (pentafluorophenyl) borate and the like. It is. Further, these boron compounds and the organoaluminum compound may be used at the same time.
In particular, when a boron compound is used as a cocatalyst, the addition of an alkylaluminum compound such as triisobutylaluminum is effective for removing impurities that adversely affect the polymerization such as water contained in the polymerization system.
[0045]
In the production of the component (B) of the present invention, a desired monomer can be mixed and polymerized with a transition metal complex and a cocatalyst in the presence or absence of a suitable solvent. Solvents used include aliphatic hydrocarbons such as pentane, hexane, heptane and cyclohexane, aromatic hydrocarbons such as benzene, toluene, xylene, chloro-substituted benzene and chloro-substituted toluene, and halogenated hydrocarbons such as methylene chloride and chloroform. And can be used alone or as a mixed solvent.
[0046]
In the production of the component (B), the polymerization temperature is suitably from -78 ° C to 200 ° C, preferably from 0 ° C to 160 ° C. A polymerization temperature lower than −78 ° C. is industrially disadvantageous, and if it exceeds 200 ° C., decomposition of the metal complex occurs, which is not suitable.
When an organoaluminum compound is used as a co-catalyst, the aluminum atom / complex metal atom ratio is preferably 0.1 to 100,000, particularly preferably 10 to 10,000, relative to the transition metal of the complex. If it is less than 0.1, the activation of the transition metal complex is insufficient, and if it exceeds 100,000, it is economically disadvantageous.
When a boron compound is used as a cocatalyst, the boron atom / complex metal atom ratio is suitably used in the range of 0.01 to 100, preferably 0.1 to 10, particularly preferably 1. Used. If it is less than 0.01, activation of the transition metal complex is insufficient, and if it exceeds 100, it is economically disadvantageous.
The Group IV metal complex and the cocatalyst may be mixed and prepared outside the polymerization tank, or may be mixed in the tank during polymerization.
[0047]
Examples of the styrene resin containing 40% by weight or more of the styrene monomer unit used as the component (A) of the present invention include styrene polymer, styrene-methyl methacrylate copolymer, styrene-methyl acrylate copolymer, styrene-methacrylic acid. Examples include copolymers, styrene-acrylic acid copolymers, styrene-acrylonitrile copolymers, and styrene-N-phenylmaleimide copolymers.
Examples of the rubber-reinforced styrene resin containing 40% by weight or more of styrene monomer units include high impact polystyrene, acrylonitrile-butadiene-styrene copolymer, methyl methacrylate-butadiene-styrene copolymer, and the like. The component (A) used in the present invention may be a mixture of a styrene resin and a rubber-reinforced styrene resin.
[0048]
The styrene resin composition of the present invention contains (A) 1 to 99 parts by weight of a styrene resin and / or rubber-reinforced styrene resin, and (B) 99 to 1 part by weight of an ethylene-aromatic vinyl compound copolymer. To do.
When (B) was added to (A), a styrenic resin composition having excellent mechanical properties, particularly toughness and improved moldability was obtained, and (A) was added to (B). In particular, the rigidity is improved, and a resin composition with good mechanical properties and moldability is obtained. Therefore, the mixing ratio of the two is not particularly limited in the above range, and can be used in a wide range of ratios. is there.
When (B) the ethylene-aromatic vinyl compound copolymer is used as a modifier for (A) styrene resin and / or rubber-reinforced styrene resin, (A) 30 to 99 parts by weight, ( B) It is preferably contained in a proportion of 70 to 1 part by weight, more preferably (A) in a proportion of 50 to 95 parts by weight and (B) in a proportion of 50 to 5 parts by weight.
[0049]
The styrenic resin composition of the present invention is mixed with plastic additives, lubricants, stabilizers, colorants, glass fibers, ceramic fibers, silica, inorganic additives such as talc, etc. used in conventional resin compositions depending on the application. Can be used. If necessary, other resins such as polyethylene, polypropylene, nylon, polyester, polycarbonate, polyphenylene ether and the like can be mixed.
[0050]
The styrene resin composition of the present invention is produced by melt-mixing the (A) component styrene resin and / or rubber-reinforced styrene resin and the (B) component ethylene-aromatic vinyl compound copolymer. However, the melt mixing may be performed by a known method, and usually performed at a temperature of 160 to 280 ° C., and any apparatus such as an extruder, a kneader, or a Banbury mixer may be used for the melt mixing.
[0051]
【Example】
EXAMPLES Hereinafter, although an Example demonstrates this invention, these Examples do not limit this invention.
[0052]
Analysis of the polymer obtained in each example was carried out by the following means.
For 13C-NMR measurement, JNMGX-270 or α-500 manufactured by JEOL Ltd. was used as the apparatus, deuterated chloroform or deuterated 1,1,2,2-tetrachloroethane was used, and TMS was used as a reference.
Determination of the styrene content in the polymer is carried out by 1H-NMR, the apparatus is JNMGX-270 or α-500 manufactured by JEOL Ltd., the solvent is deuterated chloroform or 1,1,2,2-tetrachloroethane, TMS. As a standard, the intensity of the peak derived from the phenyl group proton and the proton peak derived from the alkyl group were compared.
The molecular weight was determined by standard polystyrene conversion using GPC (gel permeation chromatography). The solvent used was THF or 1,2,4-trichlorobenzene, and the column used was Tosoh HLC-8020 or Senshu Kagaku GPC-7100.
[0053]
The physical properties of the styrene resin composition were evaluated by the following methods.
As for toughness, falling weight strength was measured according to JIS K-7221, and 50% non-destructive was taken as the value.
The flexural modulus was measured according to JIS K-7203.
The molding surface characteristics were determined by visual observation of the surface peeling state of the tensile dumbbell of JIS K-7113.
The thermal stability as the moldability was determined by visually determining the color tone change of the surface after molding a dumbbell after staying in an injection molding machine at 300 ° C. for 5 minutes.
[0054]
Reference example 1
After nitrogen substitution, styrene (340 ml) and toluene (40 ml) were added to a 1 L autoclave substituted with ethylene, and 25 mmol of methylalumoxane (manufactured by Tosoh Akzo, MMAO-3A) was added based on Al atoms. Next, ethylene was introduced at room temperature to increase the pressure to 9 kg / cm 2 G, and then the autoclave was heated to stabilize the internal temperature at 50 ° C. From a pressure-resistant tank installed at the top of the autoclave, a catalyst solution in which 25 μmol of racemic isopropylidenebis (1-indenyl) zirconium dichloride was dissolved in 100 ml of toluene was poured into the autoclave. Polymerization was carried out for 1 hour while maintaining the ethylene pressure at 2 kg / cm 2 G. After completion of the polymerization, the content solution was put into a large excess of hydrochloric acid methanol solution to recover the polymer. When this was dried at 60 ° C. for 10 hours or more under reduced pressure, 64 g of ethylene-styrene copolymer (P1) was obtained.
[0055]
Reference example 2
Using a catalyst solution in which 42 μmol of the same complex used in Reference Example 1 was dissolved in 150 ml of toluene, the amount of methylalumoxane was 42 mmol, the amounts of styrene and toluene were 200 ml and 130 ml, respectively, and the ethylene pressure was 10 kg / cm 2 G. Polymerization was carried out in the same manner as in Reference Example 1 except that the content was changed to, and 88 g of ethylene-styrene copolymer (P2) was obtained.
[0056]
Reference example 3
Polymerization was carried out in the same manner as in Reference Example 2 except that the amounts of styrene and toluene charged were changed to 120 ml and 210 ml, whereby 96 g of an ethylene-styrene copolymer (P3) was obtained.
The analytical values of the obtained ethylene-styrene copolymers P1, P2 and P3 are shown in Table 1.
[0057]
[Table 1]
[0058]
Examples 1-3
As shown in Table 2, 20 parts by weight of each of the ethylene-styrene copolymers (P1, P2, and P3) in Table 1 and 80 parts by weight of high impact polystyrene (DENKA HI-RQ manufactured by Denki Kagaku Kogyo Co., Ltd.) were used in a 20 mmφ twin screw extruder. Melt kneading was performed at 230 ° C. The physical properties of the obtained styrene resin composition were evaluated, and the results are shown in Table 2.
[0059]
Example 4
In the same manner as in Example 1, 40 parts by weight of ethylene-styrene copolymer (P1) and 60 parts by weight of polystyrene (Denka MW-1 manufactured by Denki Kagaku Kogyo Co., Ltd.) were melt-kneaded. The physical properties of the obtained styrene resin composition were evaluated, and the results are shown in Table 2.
[0060]
Example 5
25 parts by weight of ethylene-styrene copolymer (P2) and 75 parts by weight of styrene-methyl methacrylate copolymer (Denka TP manufactured by Denki Kagaku Kogyo Co., Ltd.) shown in Table 1 were melt-kneaded in the same manner as in Example 1. The physical properties of the obtained styrene resin composition were evaluated, and the results are shown in Table 2.
[0061]
[Table 2]
[0062]
【The invention's effect】
The styrenic resin composition of the present invention has excellent mechanical properties, particularly toughness, good thermal stability, good moldability, and good compatibility, and thus has excellent surface properties of the molded product. Therefore, it is suitably used for applications such as injection molded products such as electric / electronic parts and OA casing parts, sheets, films and pipes.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25001396A JP3868038B2 (en) | 1996-09-20 | 1996-09-20 | Styrenic resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25001396A JP3868038B2 (en) | 1996-09-20 | 1996-09-20 | Styrenic resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1087925A JPH1087925A (en) | 1998-04-07 |
| JP3868038B2 true JP3868038B2 (en) | 2007-01-17 |
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| JP25001396A Expired - Fee Related JP3868038B2 (en) | 1996-09-20 | 1996-09-20 | Styrenic resin composition |
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| JP4489864B2 (en) * | 1999-03-04 | 2010-06-23 | 電気化学工業株式会社 | Antistatic resin composition |
| WO2007138936A1 (en) * | 2006-05-26 | 2007-12-06 | Denki Kagaku Kogyo Kabushiki Kaisha | Tape base and adhesive tape |
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