JP3895664B2

JP3895664B2 - Photosensitive material processing equipment

Info

Publication number: JP3895664B2
Application number: JP2002315408A
Authority: JP
Inventors: 彰国弘; 正義大塚
Original assignee: Mitsubishi Paper Mills Ltd
Current assignee: Mitsubishi Paper Mills Ltd
Priority date: 2002-10-30
Filing date: 2002-10-30
Publication date: 2007-03-22
Anticipated expiration: 2022-10-30
Also published as: JP2004151287A

Description

【０００１】
【発明の属する技術分野】
本発明は、感光材料の処理装置に関する。詳しくは、スロットダイを用いて処理液を塗布する処理装置に関する。
【０００２】
【従来の技術】
フィルム、印画紙、印刷版等の感光材料は画像が記録された後に、現像液、定着液、安定化液、水洗水等の処理液によって処理される。このような処理を行なう感光材料の処理装置としては、複数の搬送ローラー対等により構成される搬送手段により、処理液を貯留した処理槽中に感光材料を搬送し、感光材料を処理液中に浸漬することにより処理を行なう浸漬型の処理装置が知られている。
【０００３】
このような浸漬型の処理装置においては、感光材料の処理に伴う処理疲労、あるいは大気中の炭酸ガスや酸素による経時疲労等により処理液が劣化するため、処理液に補充液を補充することにより処理液の劣化を回復させている。このため、処理開始時の処理液の成分と、その後も処理を継続した場合の処理液の成分とは異なることになり、厳密に均一な処理を行なうことは不可能である。また、このような浸漬型の処理装置は、処理液の使用量および廃液量が多くランニングコストが高い、また、装置のメンテナンス性が悪いという問題もある。
【０００４】
このような問題点を解消するための感光材料処理装置として、例えば、特開昭６２−２３７４５５号公報、実開平６−８９５６号公報、特開平６−２７６７７号公報、特開２００１−１７４９７０号公報及び特開２００１−３１２０３６号公報に記載されているように、感光材料を処理液中に浸漬するかわりに、感光材料の処理に必要なだけの処理液を感光材料の感光面に塗布して処理を行なう塗布方式の処理装置が知られている。
【０００５】
特に上記特開２００１−１７４９７０号公報に開示されているスロットダイを用いた処理装置は少ない処理液量でも安定に均一に塗布でき、さらに実質的に廃液が生じないという利点がある。しかしながら、感光材料のなかには、端部から均一な現像処理が要求されるものがあり、特に極先端部（例えば先端１ｃｍ以内）の処理むらが問題になる場合があった。この現象は特に塗布量を少なくすると起こりやすかった。
【０００６】
この問題を改善すべく特開２００１−３１２０３６号公報に、少なくともスリットとマニホールドからなるスロットダイを用いて、前記スリットの先端部と対向し離間する位置に塗布幅以上の平面部材（以下、感光材料支持部材という）を設けて、感光材料が前記スリットに到達するに先立ち、前記スリット先端部と前記部材の間に処理液の膜を形成させる処理装置が開示されている。（特許文献１）この処理装置によって感光材料先端部の塗布開始部分における塗布不均一と処理むらは解消された。
【０００７】
しかしながら、現像処理を行う処理液のなかには、現像処理を行わない期間において、前記スリットの先端部及び対向する感光材料支持部材の間で処理液の成分が固着結晶化する問題があった。特に前記スリットの先端部に対向する部分が平面からなる感光材料支持部材を用いた処理装置の場合、平面であるゆえ感光材料処理後の処理液が比較的多く残留しやすくなる。残留した処理液は乾燥することで固着結晶物に変わる。このような状態で感光材料を現像処理すると、前記スリット先端部と感光材料支持部材の間で固着結晶物が感光材料表面に付着し現像不良や傷を発生させてしまい、固着状態によっては２版目、３版目にわたり悪影響を与える場合もあった。このため、前記スリット先端部及び前記感光材料支持部材を定期的に拭いたり、多量の洗浄液を流し込んだりする必要があり、結果的に装置のメンテナンス性の低下、廃液量の増加を発生させていた。
【０００８】
また別の問題として、感光材料の支持体にアルミニウム等の金属板を用いる場合、前記スリットの先端と対向する感光材料支持部材で、感光材料が擦れることによって感光材料に傷が付く問題があった。このため、感光材料支持部材として樹脂を用いるのが好ましいが、大きなサイズの感光材料を処理するには感光材料支持部材の塗布幅方向の長さを長くする必要があり、樹脂単体では強度面及び直線性維持に問題があることが判った。従って、樹脂部材とそれを補強するための金属部材とを上下に組合せ、更に両者の環境温度変化における熱膨張の違いから生じる歪みを考慮し、両者を引き付けながらも両者の横方向に対するずれを許容したネジによる接合方法を用いた。しかしながら、上記接合方法では接着剤による完全固着と異なり接合面が完全に一体化されていないため、前記樹脂部材から処理液が下方に流れ落ちる際に、上下に組み合わされた前記樹脂部材と前記金属部材の接合面に前記処理液が進入し、徐々に蓄積し乾燥されることで結晶物となり、前記樹脂部材を前記結晶物で押し上げることにより、感光材料支持部材の直線性が得られないという問題があった。スリットの先端部と、スリット先端部に対向する感光材料支持部材の平面との間隙は幅方向一定に保持する必要があり、処理液を感光材料に幅方向均一に塗布するため最も重要な要素である。
【０００９】
【特許文献１】
特開２００１−３１２０３６号公報（第１頁〜第３頁、図１）
【００１０】
【発明が解決しようとする課題】
本発明の目的は、スロットダイを用いた処理装置の更なる改良を行なうもので、処理液塗布部の処理液の固着結晶化を防止した感光材料の処理装置を提供することである。また、別の目的は、スリットの先端部と、スリット先端部に対向する感光材料支持部材の平面との間隙を常に幅方向一定に保つことで、長期に渡って安定した処理液塗布を行う感光材料の処理装置を提供することである。
【００１１】
【課題を解決するための手段】
本発明の上記目的は、下記の発明によって達成された。
（１）少なくともスリットとマニホールドからなるスロットダイを用いて、前記スリットより落下する処理液を感光材料に塗布する処理装置であって、前記スリットの先端部と対向し離間する位置に感光材料支持部材を有し、該感光材料支持部材の前記スリットの先端部に対向する部分が平面からなり、該平面の両側端にそれぞれ感光材料の搬送方向と同じ方向に溝が設けられたことを特徴とする感光材料処理装置。
（２）少なくともスリットとマニホールドからなるスロットダイを用いて、前記スリットより落下する処理液を感光材料に塗布する処理装置であって、
前記スリットの先端部と対向し離間する位置に、前記処理液のスリット幅より長い感光材料支持部材を有し、該感光材料支持部材は、前記スリットの先端部に対向する部分が平面からなる樹脂部材と、該樹脂部材を補強するための金属部材とをネジで接合したものであり、前記樹脂部材と前記金属部材との接合面に前記スリットより落下した処理液が前記樹脂部材を伝わって進入しないような構造を有することを特徴とする感光材料処理装置。
【００１２】
【発明の実施の形態】
以下、本発明の感光材料処理装置について図面を用いて詳細に説明をする。図１は本発明の一実施様態である感光材料の処理装置の概略断面図である。また、図２はスロットダイと感光材料支持部材の斜視図であり、図３はその正面図を示す。
【００１３】
１２はスロットダイである。材質は特に限定されるものではないが、処理液に対する耐食性と機械的精度を満足できればよく、例えばステンレス鋼が好ましい。その他にも一般構造鋼にクロムメッキしたものやプラスチック類等が使用可能である。なお、金属で製作する場合は機械加工時の応力歪を排除するため、予め焼鈍処理を施してもよい。
【００１４】
スロットダイ１２の構造を説明する。１３は処理液供給口でマニホールド１４と連結されている。該マニホールド１４は流入した処理液を幅方向に広げるためのものであり、スロットダイ１２の幅方向にわたって設けられている。該マニホールド１４で処理液を一旦幅方向に充満させた後、スリット部１５に供給する作用を行なう結果、スリット部１５からの流出流量を幅方向に均一化させることが可能となる。処理液供給口１３は通常スロットダイ１の幅方向の中心に１箇所設けることでよいが、スロットダイ１２の幅方向の複数箇所に設けてもよい。マニホールド１４の断面形状は、本態様では円形となっているがこれに限らず任意の形状でよい。またマニホールド１４の断面積はスロットダイ１２の幅方向に亘り一定でなくてもよく、例えば流出する処理液の幅方向の流量均一性をさらに向上せしめるために端部に至るに従って断面積を漸減させてもよい。
【００１５】
図１には便宜上図示しないが、スロットダイ１２のマニホールド１４の塗布幅方向両端部とスリット部１５の同両端部は、処理液が流出しないように栓をして用いる。この場合、処理しようとする感光材料の塗布幅に対しスリット部１５の幅方向の長さが同じか多少大きくなるように前述の栓を施す。
【００１６】
Ｐは感光材料で、図示しない駆動装置により図の左から右方向に搬送される。搬送中の感光材料Ｐの先頭端部を感材検出器等で検出し、その信号によりポンプ１８を駆動しバルブ１９を開にしてスロットダイ１２に処理液１７を供給し、感光材料の終端部を検出してポンプ１８を停止しバルブ１９を閉止する。このような制御をすることで、感光材料Ｐにある一定量の処理液を均一に塗布することができる。
【００１７】
感光材料への塗布量に極めて精度を要する場合は、処理液配管の道中に流量計を配置して該流量計の信号を基準にして前述のポンプや定量バルブをフィードバック制御する構成をとることができる。
【００１８】
処理液のスロットダイ１２への供給流量は、所望する処理液の湿潤塗布量と感光材料の塗布幅と感光材料の搬送速度をそれぞれ乗ずることにより決定することができる。
【００１９】
本発明の特徴である感光材料支持部材１は、塗布幅方向にはスロットダイ１２のスリット幅以上とし、スロットダイ１２のスリット部１５の先端部と対向し離間した位置に設ける。スリット部１５の先端部に対向する部分は水平面３からなる。水平面３の感光材料の搬送方向における長さＬ４は３ｍｍ以上が好ましく、更に好ましくは５ｍｍ以上とし、上限３０ｍｍ程度とする。また、感光材料Ｐが搬送し易いように、搬送方向上流側に傾斜面４を設けることが好ましい。更に、該水平面３の両側端にそれぞれ感光材料の搬送方向と同じ方向に溝２ａ、溝２ｂを設ける。
【００２０】
感光材料支持部材１の水平面３とスリット部１５の先端部（スロットダイ１２の先端部）の距離Ｈは、３ｍｍ以内が好ましく、より好ましくは２ｍｍ以内で、更に好ましくは１．５ｍｍ以内で、特に好ましくは１．０ｍｍ以内である。距離Ｈの下限は、感光材料Ｐの感光面がスリット部１５の先端部（スロットダイ１２の先端部）に接触しない距離である。
【００２１】
図３に示すように感光材料支持部材１の溝２ａと溝２ｂの間の距離Ｌ２は、スロットダイ１２のスリット部１５の幅方向の長さＬ１と同じか多少短くなるようにし、少なくとも処理しようとする感光材料の塗布幅より長くする。また、溝２ａ、溝２ｂの位置はＬ１の中央から左右両側同じ距離になるように設ける。但し、溝２ａ及び溝２ｂは、水平面３に残留した処理液を排出する経路を確保するため、少なくともそれぞれの溝２ａ及び溝２ｂの上部まで処理液の液膜２６が形成されるように、溝２ａ及び溝２ｂの少なくとも一部がスリット部１５の先端部の両側の延長線部分Ｌ８及びＬ９にかかる位置に設ける。溝２ａ、２ｂのそれぞれの幅Ｌ３は２ｍｍ〜１０ｍｍ程度が好ましく、より好ましくは３ｍｍ〜６ｍｍ程度である。
【００２２】
溝２ａ及び溝２ｂは、図１及び図２に示すように上部水平面３から連続した各面に平行に掘り下げるのが好ましいが、図４（ａ）に示すように、上部水平面３のみに溝を設けてもよい。また別の態様として、図４（ｂ）のように溝の底面を１つの傾斜する面にしてもよい。
【００２３】
本発明における処理液の塗布量は１平方メートル当たり１００ミリリットル以下が好ましい。このように塗布量を少なくし、特に未使用の処理液を感光材料１版毎に必要最小量のみを供給する場合においては、処理を行わない間または停機時に、スリット部１５の先端部及び対向する感光材料支持部材１の水平面３に処理液が残留し、空気に触れることで結晶化しやすい。結晶の成長度合いによってはスリット部１５より供給された処理液自身による洗浄効果も難しくなる。この問題を改善するために本発明は感光材料支持部材１の両側面に溝２ａ、２ｂを設ける。
【００２４】
まず、感光材料が塗布されるに先立ちスリット部１５の先端部から処理液１７を流し、対向する感光材料支持部材１の上部水平面３とスリット部１５の先端部の間隙Ｈに液膜２６を形成する。液膜２６は塗布幅方向に途切れることなく形成され、液膜２６の両端は溝２ａ、溝２ｂまで到達し、処理液１７の供給と共に塗布幅方向に拡がった液膜２６の両端は、溝２ａ及び溝２ｂのみを伝って下方へ流れ落ちるようになる。また感光材料に処理液１７を塗布する時も同様に、塗布に使用されなかった処理液１７を溝２ａ、２ｂによって積極的に流し落とす。感光材料の塗布が終了し処理液１７の供給が停止された時も液膜２６は形成されているが、既にこの時点で、前述したように溝２ａ及び溝２ｂまでの処理液１７の流出経路が出来ているため、液膜２６が途切れない限り塗布幅方向両側に導かれ、溝２ａ、溝２ｂによって下方に流れ落ちる。
【００２５】
溝２ａ及び溝２ｂの目的は、感光材料支持部材１の水平面３の処理液１７を局所的に流出させることで、処理液１７の流れを作ることである。このため、感光材料支持部材１の水平面３に残留する処理液１７を極めて少量に抑えることができる。従って、このような結果感光材料支持部材１の水平面３で処理液１７が結晶化したとしても極少量のため結晶膜が薄く、次の処理のための処理液１７がスリット部１５の先端より吐出することで容易に洗浄することができる。また、本発明において処理待機中及び処理を行わない間にある一定の間隔でスリット部１５の先端よりごく僅かな処理液を全塗布幅方向に定期的に吐出することが好ましく、常にスリット部１５の先端部と感光材料支持部材１に潤いを与え、処理液結晶化防止により大きい効果が得られる。
【００２６】
このように、感光材料支持部材１の上部水平面３から局所的に処理液を下方に排出するための溝であれば形状は特に限定されるものではない。感光材料支持部材１の材質は処理液に対する耐食性があれば特に制限されず、例えばプラスチック類、フッ素系樹脂（テフロン（Ｒ）等）またはステンレス鋼などを用いることができる。
【００２７】
しかしながら、前述したように特に感光材料の支持体にアルミニウム等の金属板を用いる場合、または、感光材料の塗布幅が広くなった場合は、樹脂部材とそれを補強するための金属部材とを上下にネジで接合された感光材料支持部材が好適に用いられる。
【００２８】
次に、本発明の別の目的であるスリットの先端部に対向する部分が平面となる樹脂部材と、該樹脂部材を補強するための金属部材とをネジで接合した感光材料支持部材を用いた感光材料処理装置について、図面を用いて詳細に説明をする。図５は本発明の一実施様態である感光材料の処理装置の概略断面図である。また、図６はスロットダイと感光材料支持部材の斜視図である。
【００２９】
本発明の特徴である感光材料支持部材１は、スロットダイ１２のスリット部１５の先端部と対向し離間した位置に設ける。感光材料支持部材１は、上部に平面３を有する樹脂部材Ａとそれを補強する金属部材Ｂで構成される。
【００３０】
樹脂部材Ａの材質は、処理液に対する耐食性及び感光材料を傷つけないものであれば特に制限されず、例えば塩化ビニル、ポリエチレン、ナイロン、ポリアセタール及びフッ素等を用いることができる。金属部材Ｂは、ステンレス鋼が好ましいが一般構造鋼にクロムメッキしたものを用いることも出来る。
【００３１】
材質の異なる２つの部材、すなわち樹脂部材Ａと金属部材Ｂの接合方法は、単にネジで固定するのみでは両者の熱膨張係数の違いから環境温度の変化等で歪みが発生するため、例えば圧縮バネを介在してネジで固定する方法を用いることが好ましい。
【００３２】
図９は感光材料支持部材１の樹脂部材Ａ及び金属部材Ｂの接合方法の一例を示した側面図であり、図中のＺはその一部を拡大した断面図である。図９に示すように固定する箇所は部材ＡとＢが接合する面の、少なくとも２つ以上とするのが好ましい。図９において点線部は内部を透視したときの構造を示すもので、ネジ２４及びネジ穴２１、２２を表す。
【００３３】
部材Ａ及び部材Ｂの厚みは特に限定されるものではないが、少なくとも直線性の精度が要求される面及び部材Ａ、Ｂが接する面は平面であることが好ましく、金属部材Ｂは、少なくとも要求される直線精度の部材であることが好ましい。
【００３４】
図９で示すように、本発明の感光材料支持部材１の固定方法は樹脂部材Ａ、金属部材Ｂ、圧縮ばね２３の順に重ね合わせ、それらの穴にネジ２４を差し込み、締め込むことによって部材Ａ、Ｂが固定される。樹脂部材Ａのネジ溝を有するネジ穴２１は、貫通しない程度に少なくとも樹脂部材Ａの厚みの１／２以上の深さのネジ穴２１を設ける。金属部材Ｂのネジ溝を有さないネジ穴２２は貫通させ、ネジ２４の外径より大きいネジ穴２２を設ける。ネジ穴２２の径は、すなわち部材Ａ、Ｂの異なる伸縮による最大較差分をネジ２４の外径に付加した寸法以上であり、部材Ａ、Ｂの熱膨張係数及び環境温度との関係により決定することができる。
【００３５】
圧縮バネ２３は金属部材Ｂとネジ２４の間に介在し、ネジ２４を締め込むことで圧縮される。従って、圧縮バネ２３の外径は金属部材Ｂのネジ穴２２の内径より大きく且つ、ネジ２４の頭の外径より小さくする必要があるが、この条件に該当しない場合でも座金等を挟み込むことで圧縮バネ２３を介在することができる。また、圧縮バネ２３の材質はステンレス等の金属を用いるのが好ましく、圧縮バネ２３の線径、外径、長さ及びバネ定数については用いる部材によって必要な荷重を設定し、選定することができる。
【００３６】
ネジ２４の外径は樹脂部材Ａの厚み及び材質によって決定し、ネジ２４の長さはそれぞれのネジ穴の長さに圧縮バネ２３を必要な荷重分縮めた時の長さをそれぞれ足した長さとする。またネジ２４の材質はステンレス等の金属であることが好ましい。
【００３７】
図９におけるネジとネジとの間隔は任意に決定することができる。
【００３８】
上述のように、樹脂部材Ａと金属部材Ｂとの固定に圧縮バネ２３を用いることで、部材Ａ、Ｂを適度な力で締め付けつつ強固に固定していないため、環境温度が変化しても伸縮の違いによる部材Ａ、Ｂの横方向の接合面２５におけるずれに対応することができる。また、この環境温度の変化で発生した伸縮の違いによる部材Ａ、Ｂの横方向の寸法の狂いは、予め計算して大きさを決定した金属部材Ｂのネジ穴２２（ネジ２４との隙間分）によって補うことで歪みの発生を抑えることができる。
【００３９】
本発明の特徴である感光材料支持部材１は、塗布幅方向にはスロットダイ１２のスリット幅以上とし、スロットダイ１２のスリット部１５の先端部と対向し離間した位置に設ける。スリット部１５の先端部に対向する部分は水平面３からなる。水平面３の感光材料の搬送方向における長さＬ４は３ｍｍ以上が好ましく、更に好ましくは５ｍｍ以上とし、上限３０ｍｍ程度とする。また、感光材料Ｐが搬送し易いように、搬送方向上流側に傾斜面４を設けることが好ましい。更に、該平面３の両側端にそれぞれ感光材料の搬送方向と同じ方向に溝２ａ、溝２ｂを設ける。そして更に、樹脂部材Ａの裏面に塗布幅方向と同じ方向に溝５を設ける。
【００４０】
感光材料支持部材１の上部水平面３とスリット部１５の先端部（スロットダイ１２の先端部）の距離Ｈは、３ｍｍ以内が好ましく、より好ましくは２ｍｍ以内で、更に好ましくは１．５ｍｍ以内で、特に好ましくは１．０ｍｍ以内である。距離Ｈの下限は、感光材料Ｐの感光面がスリット部１５の先端部（スロットダイ１２の先端部）に接触しない距離である。
【００４１】
感光材料支持部材１の溝２ａ及び溝２ｂの形状、寸法及び位置については、前述の説明に準じる。
【００４２】
感光材料支持部材１の溝５は、樹脂部材Ａと金属部材Ｂの接合面２５の樹脂部材Ａ側の面に、感光材料支持部材１の塗布幅方向の全域に連続して設ける。溝５の搬送方向における長さは、金属部材Ｂの搬送方向の長さより長くして、少なくとも金属部材Ｂの側面からの距離Ｌ６はそれぞれ２ｍｍ〜６ｍｍ程度とする。また溝５の深さの距離Ｌ５も同様に２ｍｍ〜６ｍｍ程度とする。
【００４３】
感光材料支持部材１は前述したように樹脂部材Ａと金属部材Ｂで構成され、環境温度の変化で感光材料支持部材１の水平面３に歪みが生じないように、樹脂部材Ａと金属部材Ｂの接合面２５で互いのずれを許容することができるネジの接合方法を施してある。このような感光材料支持部材１を用いる場合、樹脂部材から処理液がスリットより下方に流れ落ちる際に、前記樹脂部材と前記金属部材の接合面２５が完全に一体化されてないため、接合面２５に前記処理液が進入してしまう。更に進入した処理液が徐々に蓄積し乾燥されることで結晶物となり、前記樹脂を前記結晶物で押し上げることにより、感光材料支持部材１の直線性が得られなくなる。この問題を改善するために本発明は、前記樹脂部材と前記金属部材との接合面に前記スリットより落下した処理液が前記樹脂部材を伝わって進入しないような構造にする。
【００４４】
まず、感光材料を処理する際、スリット部１５の先端部から処理液１７を流し、対向する感光材料支持部材１の上部水平面３とスリット部１５の先端部の間隙Ｈに液膜２６を形成する。液膜２６は塗布幅方向に途切れることなく形成され、液膜２６の両端は溝２ａ、溝２ｂまで到達し、処理液１７の供給と共に塗布幅方向に拡がった液膜２６の両端は、溝２ａ及び溝２ｂを伝って下方へ流れ落ちる。この時、溝２ａ及び溝２ｂで局所的な処理液の流れが出来るため、溝２ａ及び溝２ｂより塗布幅方向の外側には処理液は流れ落ない。溝２ａ及び溝２ｂから流れた処理液及び液膜の途中から搬送方向に流れ落ちた処理液は、樹脂部材Ａの搬送方向側面に伝わり、更に裏面に伝わるが樹脂部材Ａに溝５を設けているため、処理液は金属部材Ｂ上方へは伝わらず下方へ落下し、接合面２５に処理液が進入することはない。すなわち、感光材料支持部材１の塗布幅方向の処理液の流れは、溝２ａ及び溝２ｂで遮断し、搬送方向の処理液の流れは溝５で遮断し、いずれの方向においても接合面２５に処理液が進入するのを完全に防止することが出来る。
【００４５】
感光材料支持部材１の塗布幅方向の処理液の進入を遮断する溝２ａ及び溝２ｂは、図５及び図６に示すように上部水平面３から連続した各面に平行に掘り下げるのが好ましいが、図４（ａ）に示すように、上部水平面３のみに溝を設けてもよい。また別の態様として、図４（ｂ）のように溝の底面を１つの傾斜する面にしてもよい。
【００４６】
また、感光材料支持部材１の搬送方向の処理液の進入を遮断する溝及び構造は、図７の（ａ）、（ｂ）、（ｃ）に示すような溝及び構造にすることもできる。図７（ａ）は樹脂部材Ａの裏面に金属部材Ｂをはさみ、搬送方向両側に３１ａ及び３１ｂの凸部を塗布幅方向全幅に渡って設けることで接合面２５への処理液の進入を防止する。図７（ｂ）は樹脂部材Ａの裏面に金属部材Ｂをはさみ、搬送方向両側に３２ａ及び３２ｂの溝（凹部）を塗布幅方向全幅に渡って設ける。また、図７（ｃ）のように、樹脂部材Ａの搬送方向両側面に処理液を下方に導くための例えばフィルム等からなる薄板３３ａ及び３３ｂを設けてもよい。このように感光材料支持部材１の搬送方向の処理液の進入を遮断する構造は、樹脂部材Ａの裏面または搬送方向側面に、接合面２５に処理液が伝わらないような塗布幅方向全域に渡って凸部または凹部を設ける。尚、図７のＬ５、Ｌ６及びＬ７の距離は２ｍｍ〜６ｍｍ程度とするのが好ましい。
【００４７】
また更に処理液を接合面に進入させない別の態様としては、感光材料支持部材１の水平面３の両側端に溝を設ける代わりに、図８に示すように金属部材Ｂの塗布幅方向の長さを樹脂部材Ａの塗布幅方向の長さより短くし、樹脂部材Ａの裏面に樹脂部材Ｂの上面を覆うような大きな凹部６を設けて、塗布幅方向及び搬送方向の両方向からの処理液の進入を防止することもできる。尚、図８のＬ５、Ｌ６及びＬ８の距離は２ｍｍ〜６ｍｍ程度が好ましい。
【００４８】
本発明者らは、少なくともスリットとマニホールドからなるスロットダイを用いて、前記スリットより落下する処理液を感光材料に塗布する処理装置であって、前記スリットの先端部と対向し離間する位置に感光材料支持部材を有し、該感光材料支持部材の前記スリットの先端部に対向する部分が平面からなり、該平面の両側端にそれぞれ感光材料の搬送方向と同じ方向に溝が設けられたことにより、前記感光材料支持部材１に処理液が多く残留し、固着結晶化しやすという従来の懸案点を解消できることを見いだした。また、少なくともスリットとマニホールドからなるスロットダイを用いて、前記スリットより落下する処理液を感光材料に塗布する処理装置であって、前記スリットの先端部と対向し離間する位置に、前記処理液のスリット幅より長い感光材料支持部材を有し、該感光材料支持部材は、前記スリットの先端部に対向する部分が平面からなる樹脂部材と、該樹脂部材を補強するための金属部材とをネジで接合したものであり、前記樹脂部材と前記金属部材との接合面に前記スリットより落下した処理液が前記樹脂部材を伝わって進入しないような構造を有することにより、前記感光材料支持部材１を構成する２つの部材の接合面に処理液が進入し結晶化することにより感光材料支持部材１の直線性が得られないという従来の懸案点を解消できることを見出した。
【００４９】
【発明の効果】
本発明により、処理を行わない間の処理液塗布部での処理液による固着結晶化を防止し、処理開始時においても安定した処理液塗布が行える。また、別の目的は、スリットの先端部と、スリット先端部に対向する感光材料支持部材の平面との間隙を常に幅方向一定に保つことで、長期に渡って安定した処理液塗布を行える。
【図面の簡単な説明】
【図１】本発明の一例を示す処理装置断面図
【図２】本発明の一例を示す感光材料支持部材とスロットダイの斜視図
【図３】本発明の一例を示す感光材料支持部材とスロットダイの正面図
【図４】感光材料支持部材の側面図
【図５】本発明の一例を示す処理装置断面図
【図６】本発明の一例を示す感光材料支持部材とスロットダイの斜視図
【図７】感光材料支持部材の側面図
【図８】感光材料支持部材の正面図（図８ａ）及び側面図（図８ｂ）
【図９】本発明の樹脂部材Ａと金属部材Ｂの接合方法を示す正面図
【符号の説明】
１感光材料支持部材
２ａ、２ｂ溝
３水平面
４傾斜面
５凹部（溝）[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a light-sensitive material processing apparatus. Specifically, the present invention relates to a processing apparatus that applies a processing liquid using a slot die.
[0002]
[Prior art]
Photosensitive materials such as films, photographic papers, and printing plates are processed with a processing solution such as a developer, a fixing solution, a stabilizing solution, and washing water after an image is recorded. As a processing apparatus for a photosensitive material that performs such processing, the photosensitive material is transported into a processing tank in which a processing liquid is stored by a transporting means constituted by a plurality of pairs of transporting rollers, and the photosensitive material is immersed in the processing liquid. An immersion type processing apparatus that performs processing by doing so is known.
[0003]
In such an immersion type processing apparatus, the processing solution deteriorates due to processing fatigue associated with the processing of the photosensitive material or fatigue with time due to carbon dioxide or oxygen in the atmosphere. The deterioration of the processing solution is restored. For this reason, the components of the treatment liquid at the start of the treatment are different from the components of the treatment liquid when the treatment is continued thereafter, and it is impossible to perform a strictly uniform treatment. In addition, such an immersion type processing apparatus has a problem that the amount of processing liquid used and the amount of waste liquid are large, the running cost is high, and the maintainability of the apparatus is poor.
[0004]
As a photosensitive material processing apparatus for solving such problems, for example, JP-A-62-237455, JP-A-6-8956, JP-A-6-27677, JP-A-2001-174970. As described in JP-A-2001-312036, instead of immersing the photosensitive material in the processing solution, a processing solution necessary for processing the photosensitive material is applied to the photosensitive surface of the photosensitive material. 2. Description of the Related Art A coating type processing apparatus that performs the above-described process is known.
[0005]
In particular, the processing apparatus using a slot die disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 2001-174970 has an advantage that it can be applied stably and uniformly even with a small amount of processing liquid, and further, no waste liquid is generated. However, some photosensitive materials require uniform development processing from the end, and in particular, processing unevenness at the extreme tip (for example, within 1 cm of the tip) may be a problem. This phenomenon was particularly likely to occur when the coating amount was reduced.
[0006]
In order to solve this problem, Japanese Patent Laid-Open No. 2001-312036 discloses a planar member (hereinafter referred to as a photosensitive material) having a coating width or larger at a position facing and separating from the tip of the slit using a slot die comprising at least a slit and a manifold. A processing apparatus is disclosed in which a processing solution film is formed between the slit tip and the member before the photosensitive material reaches the slit. (Patent Document 1) With this processing apparatus, uneven coating and uneven processing at the coating start portion at the front end of the photosensitive material are eliminated.
[0007]
However, among the processing liquids that perform the development processing, there is a problem that the components of the processing liquid are fixed and crystallized between the front end portion of the slit and the opposing photosensitive material support member during the period when the development processing is not performed. In particular, in the case of a processing apparatus using a photosensitive material support member in which the portion facing the tip of the slit is a flat surface, a relatively large amount of processing liquid after the photosensitive material processing tends to remain because the surface is flat. The remaining treatment liquid is changed to a fixed crystal by drying. When the photosensitive material is developed in such a state, a fixed crystal is adhered to the surface of the photosensitive material between the slit tip and the photosensitive material supporting member, causing development failure or scratches. In some cases, the third and third editions were adversely affected. For this reason, it is necessary to periodically wipe the slit tip and the photosensitive material support member or to pour a large amount of cleaning liquid, resulting in a decrease in maintainability of the apparatus and an increase in the amount of waste liquid. .
[0008]
As another problem, when a metal plate such as aluminum is used for the support of the photosensitive material, the photosensitive material is rubbed by the photosensitive material support member facing the tip of the slit, and the photosensitive material is damaged. . Therefore, it is preferable to use a resin as the photosensitive material support member. However, in order to process a large-sized photosensitive material, it is necessary to increase the length of the photosensitive material support member in the coating width direction. It was found that there was a problem in maintaining linearity. Therefore, the resin member and the metal member that reinforces it are combined vertically, and the distortion caused by the difference in thermal expansion due to changes in the environmental temperature of both is taken into account, and both are allowed to shift in the lateral direction while attracting them. The joining method using screws was used. However, since the bonding surface is not completely integrated in the bonding method, unlike the case where the adhesive is completely fixed, the resin member and the metal member combined up and down when the processing liquid flows downward from the resin member. The processing solution enters the joint surface of the substrate, gradually accumulates and dries, and becomes a crystalline material. By pushing up the resin member with the crystalline material, the linearity of the photosensitive material support member cannot be obtained. there were. The gap between the slit tip and the plane of the photosensitive material support member facing the slit tip must be kept constant in the width direction, which is the most important factor for applying the processing solution to the photosensitive material uniformly in the width direction. is there.
[0009]
[Patent Document 1]
Japanese Patent Laid-Open No. 2001-312036 (first to third pages, FIG. 1)
[0010]
[Problems to be solved by the invention]
SUMMARY OF THE INVENTION An object of the present invention is to further improve a processing apparatus using a slot die, and to provide a photosensitive material processing apparatus which prevents the processing liquid from being fixed and crystallized in a processing liquid coating part. Another object is to keep the gap between the slit tip and the plane of the photosensitive material support member facing the slit tip constant at a constant width in the width direction. It is to provide a material processing apparatus.
[0011]
[Means for Solving the Problems]
The above object of the present invention has been achieved by the following invention.
(1) A processing apparatus for applying a processing solution falling from the slit to a photosensitive material using a slot die comprising at least a slit and a manifold, wherein the photosensitive material supporting member is located at a position facing and separating from the tip of the slit. The portion of the photosensitive material supporting member that faces the tip of the slit is a flat surface, and grooves are formed in both sides of the flat surface in the same direction as the photosensitive material conveyance direction. Photosensitive material processing equipment.
(2) A processing apparatus for applying a processing solution falling from the slit to a photosensitive material using a slot die including at least a slit and a manifold,
A photosensitive material support member that is longer than the slit width of the processing solution is provided at a position facing and separating from the front end portion of the slit, and the photosensitive material support member is a resin whose portion facing the front end portion of the slit is a flat surface. A member and a metal member for reinforcing the resin member are joined with screws, and the treatment liquid dropped from the slit enters the joining surface between the resin member and the metal member and enters the resin member. A photosensitive material processing apparatus having a structure that does not.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the photosensitive material processing apparatus of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic sectional view of a photosensitive material processing apparatus according to one embodiment of the present invention. 2 is a perspective view of the slot die and the photosensitive material supporting member, and FIG. 3 is a front view thereof.
[0013]
12 is a slot die. The material is not particularly limited as long as the corrosion resistance and mechanical accuracy with respect to the treatment liquid can be satisfied. For example, stainless steel is preferable. In addition, chrome-plated general plastics and plastics can be used. In addition, when manufacturing with a metal, in order to exclude the stress distortion at the time of machining, you may anneal beforehand.
[0014]
The structure of the slot die 12 will be described. A processing liquid supply port 13 is connected to the manifold 14. The manifold 14 is for extending the inflowing processing solution in the width direction, and is provided across the width direction of the slot die 12. After the processing liquid is once filled in the width direction with the manifold 14 and supplied to the slit portion 15, the outflow flow rate from the slit portion 15 can be made uniform in the width direction. The treatment liquid supply port 13 may be normally provided at one center in the width direction of the slot die 1, but may be provided at a plurality of locations in the width direction of the slot die 12. The cross-sectional shape of the manifold 14 is circular in this embodiment, but is not limited to this and may be any shape. Further, the cross-sectional area of the manifold 14 does not have to be constant in the width direction of the slot die 12. For example, in order to further improve the flow rate uniformity in the width direction of the outflowing processing liquid, the cross-sectional area is gradually decreased toward the end. May be.
[0015]
Although not shown in FIG. 1 for convenience, both ends of the manifold 14 of the slot die 12 in the coating width direction and the same ends of the slit portion 15 are plugged so that the processing liquid does not flow out. In this case, the stopper is applied so that the length of the slit portion 15 in the width direction is the same as or slightly larger than the coating width of the photosensitive material to be processed.
[0016]
P is a photosensitive material and is conveyed from the left to the right in the drawing by a driving device (not shown). The leading end of the photosensitive material P being conveyed is detected by a photosensitive material detector or the like, the pump 18 is driven by the signal, the valve 19 is opened, and the processing solution 17 is supplied to the slot die 12, and the end portion of the photosensitive material Is detected, the pump 18 is stopped, and the valve 19 is closed. By performing such control, a certain amount of processing solution can be uniformly applied to the photosensitive material P.
[0017]
When the application amount to the photosensitive material requires extremely high accuracy, a flow meter may be arranged in the processing solution pipe and the above pump and metering valve may be feedback controlled based on the flow meter signal. it can.
[0018]
The supply flow rate of the processing liquid to the slot die 12 can be determined by multiplying the desired wet coating amount of the processing liquid, the photosensitive material coating width, and the photosensitive material conveyance speed, respectively.
[0019]
The photosensitive material supporting member 1 which is a feature of the present invention is set to be equal to or larger than the slit width of the slot die 12 in the coating width direction, and is provided at a position facing and spaced apart from the tip of the slit portion 15 of the slot die 12. A portion facing the tip of the slit portion 15 is composed of a horizontal surface 3. The length L4 in the conveyance direction of the photosensitive material on the horizontal surface 3 is preferably 3 mm or more, more preferably 5 mm or more, and the upper limit is about 30 mm. Further, it is preferable to provide the inclined surface 4 on the upstream side in the conveyance direction so that the photosensitive material P can be easily conveyed. Further, grooves 2a and 2b are provided at both ends of the horizontal surface 3 in the same direction as the conveying direction of the photosensitive material.
[0020]
The distance H between the horizontal surface 3 of the photosensitive material supporting member 1 and the tip of the slit portion 15 (tip of the slot die 12) is preferably within 3 mm, more preferably within 2 mm, even more preferably within 1.5 mm. Preferably, it is within 1.0 mm. The lower limit of the distance H is a distance at which the photosensitive surface of the photosensitive material P does not contact the tip portion of the slit portion 15 (tip portion of the slot die 12).
[0021]
As shown in FIG. 3, the distance L2 between the groove 2a and the groove 2b of the photosensitive material supporting member 1 is set to be the same as or slightly shorter than the length L1 of the slit portion 15 of the slot die 12 in the width direction, and at least the processing is performed. Longer than the coating width of the photosensitive material. Further, the groove 2a and the groove 2b are provided at the same distance from the center of L1 on both the left and right sides. However, the groove 2a and the groove 2b are formed so that a liquid film 26 of the processing liquid is formed at least above the respective grooves 2a and 2b in order to secure a path for discharging the processing liquid remaining on the horizontal surface 3. At least a part of 2a and the groove 2b is provided at a position over the extended line portions L8 and L9 on both sides of the tip of the slit portion 15. The width L3 of each of the grooves 2a and 2b is preferably about 2 mm to 10 mm, more preferably about 3 mm to 6 mm.
[0022]
The grooves 2a and 2b are preferably dug in parallel to each surface continuous from the upper horizontal plane 3 as shown in FIGS. 1 and 2, but as shown in FIG. 4 (a), the grooves are formed only in the upper horizontal plane 3. It may be provided. As another aspect, the bottom surface of the groove may be one inclined surface as shown in FIG.
[0023]
The coating amount of the treatment liquid in the present invention is preferably 100 ml or less per square meter. In this way, when the application amount is reduced, and in particular, when only a necessary minimum amount of unused processing solution is supplied for each photosensitive material plate, the front end portion of the slit portion 15 and the facing portion are opposed to each other while the processing is not performed or when the processing is stopped. The processing solution remains on the horizontal surface 3 of the photosensitive material supporting member 1 and is easily crystallized by contact with air. Depending on the degree of crystal growth, the cleaning effect of the treatment liquid supplied from the slit portion 15 becomes difficult. In order to improve this problem, the present invention provides grooves 2a and 2b on both side surfaces of the photosensitive material supporting member 1.
[0024]
First, before the photosensitive material is applied, the processing solution 17 is flowed from the tip of the slit portion 15, and a liquid film 26 is formed in the gap H between the upper horizontal surface 3 of the opposing photosensitive material support member 1 and the tip of the slit portion 15. To do. The liquid film 26 is formed without interruption in the coating width direction, both ends of the liquid film 26 reach the grooves 2a and 2b, and both ends of the liquid film 26 that expands in the coating width direction along with the supply of the treatment liquid 17 are formed in the grooves 2a. And it flows down only along the groove 2b. Similarly, when the processing solution 17 is applied to the photosensitive material, the processing solution 17 that has not been used for the application is actively washed off by the grooves 2a and 2b. Even when the application of the photosensitive material is completed and the supply of the processing liquid 17 is stopped, the liquid film 26 is formed. At this time, the outflow path of the processing liquid 17 to the grooves 2a and 2b as described above. Therefore, unless the liquid film 26 is interrupted, the liquid film 26 is guided to both sides in the coating width direction and flows down by the grooves 2a and 2b.
[0025]
The purpose of the grooves 2a and 2b is to create a flow of the processing solution 17 by causing the processing solution 17 on the horizontal surface 3 of the photosensitive material supporting member 1 to flow out locally. For this reason, the processing liquid 17 remaining on the horizontal surface 3 of the photosensitive material supporting member 1 can be suppressed to a very small amount. Therefore, even if the processing solution 17 is crystallized on the horizontal surface 3 of the photosensitive material supporting member 1 as a result, the crystal film is thin because of the very small amount, and the processing solution 17 for the next processing is discharged from the tip of the slit portion 15. By doing so, it can be easily washed. Further, in the present invention, it is preferable that a very small amount of processing liquid is regularly discharged in the entire coating width direction at regular intervals while waiting for processing and not performing processing. Moisturizes the front end of the photosensitive member and the photosensitive material supporting member 1, and a greater effect is obtained in preventing crystallization of the processing solution.
[0026]
As described above, the shape is not particularly limited as long as it is a groove for locally discharging the processing solution downward from the upper horizontal surface 3 of the photosensitive material supporting member 1. The material of the photosensitive material supporting member 1 is not particularly limited as long as it has corrosion resistance to the processing solution. For example, plastics, fluorine-based resin (Teflon (R), etc.), stainless steel, or the like can be used.
[0027]
However, as described above, particularly when a metal plate such as aluminum is used for the support of the photosensitive material, or when the photosensitive material is widened, the resin member and the metal member for reinforcing the resin member are moved up and down. A photosensitive material support member bonded to the substrate by screws is preferably used.
[0028]
Next, a photosensitive material support member is used in which a resin member having a flat portion facing the tip of the slit, which is another object of the present invention, and a metal member for reinforcing the resin member are joined with screws. The photosensitive material processing apparatus will be described in detail with reference to the drawings. FIG. 5 is a schematic sectional view of a photosensitive material processing apparatus according to an embodiment of the present invention. FIG. 6 is a perspective view of the slot die and the photosensitive material support member.
[0029]
The photosensitive material supporting member 1 which is a feature of the present invention is provided at a position facing and spaced from the tip of the slit portion 15 of the slot die 12. The photosensitive material support member 1 is composed of a resin member A having a flat surface 3 on the top and a metal member B that reinforces it.
[0030]
The material of the resin member A is not particularly limited as long as it is corrosion resistant to the processing solution and does not damage the photosensitive material. For example, vinyl chloride, polyethylene, nylon, polyacetal, fluorine, and the like can be used. As the metal member B, stainless steel is preferable, but chrome-plated general structural steel can also be used.
[0031]
The joining method of two members of different materials, that is, the resin member A and the metal member B, is simply caused to be distorted due to a change in environmental temperature or the like due to a difference in thermal expansion coefficient between them. It is preferable to use a method of fixing with a screw with a gap interposed therebetween.
[0032]
FIG. 9 is a side view showing an example of a method of joining the resin member A and the metal member B of the photosensitive material supporting member 1, and Z in the drawing is a cross-sectional view in which a part thereof is enlarged. As shown in FIG. 9, it is preferable to fix at least two locations on the surface where the members A and B are joined. In FIG. 9, the dotted line portion shows the structure when the inside is seen through, and represents the screw 24 and the screw holes 21 and 22.
[0033]
The thicknesses of the member A and the member B are not particularly limited, but at least the surface where accuracy of linearity is required and the surface where the members A and B are in contact are preferably flat, and the metal member B is at least required. It is preferable that the member is a linear accuracy member.
[0034]
As shown in FIG. 9, the method of fixing the photosensitive material support member 1 according to the present invention is a method in which the resin member A, the metal member B, and the compression spring 23 are superposed in this order, and screws 24 are inserted into these holes and tightened. , B are fixed. The screw hole 21 having the screw groove of the resin member A is provided with a screw hole 21 having a depth of at least 1/2 of the thickness of the resin member A so as not to penetrate. The screw hole 22 which does not have the screw groove of the metal member B is penetrated, and the screw hole 22 larger than the outer diameter of the screw 24 is provided. The diameter of the screw hole 22 is equal to or larger than the dimension obtained by adding the maximum difference due to different expansion / contraction of the members A and B to the outer diameter of the screw 24, and is determined by the relationship between the thermal expansion coefficient of the members A and B and the environmental temperature. be able to.
[0035]
The compression spring 23 is interposed between the metal member B and the screw 24 and is compressed by tightening the screw 24. Therefore, the outer diameter of the compression spring 23 needs to be larger than the inner diameter of the screw hole 22 of the metal member B and smaller than the outer diameter of the head of the screw 24. However, even if this condition is not met, a washer or the like is sandwiched. A compression spring 23 can be interposed. The material of the compression spring 23 is preferably a metal such as stainless steel, and the wire diameter, outer diameter, length, and spring constant of the compression spring 23 can be selected by setting a necessary load depending on the member to be used. .
[0036]
The outer diameter of the screw 24 is determined by the thickness and material of the resin member A, and the length of the screw 24 is a length obtained by adding the length when the compression spring 23 is contracted by a necessary load to the length of each screw hole. Say it. The material of the screw 24 is preferably a metal such as stainless steel.
[0037]
The distance between the screws in FIG. 9 can be arbitrarily determined.
[0038]
As described above, since the compression spring 23 is used to fix the resin member A and the metal member B, the members A and B are not firmly fixed while being tightened with an appropriate force. It is possible to cope with a shift in the lateral joining surface 25 of the members A and B due to a difference in expansion and contraction. Further, the deviation in the lateral dimension of the members A and B due to the difference in expansion and contraction caused by the change in the environmental temperature is caused by the screw hole 22 (the gap between the screw 24 and the screw 24) of the metal member B that has been calculated and determined in advance. ) Can suppress the occurrence of distortion.
[0039]
The photosensitive material supporting member 1 which is a feature of the present invention is set to be equal to or larger than the slit width of the slot die 12 in the coating width direction, and is provided at a position facing and spaced apart from the tip of the slit portion 15 of the slot die 12. A portion facing the tip of the slit portion 15 is composed of a horizontal surface 3. The length L4 in the conveyance direction of the photosensitive material on the horizontal surface 3 is preferably 3 mm or more, more preferably 5 mm or more, and the upper limit is about 30 mm. Further, it is preferable to provide the inclined surface 4 on the upstream side in the conveyance direction so that the photosensitive material P can be easily conveyed. Further, grooves 2a and 2b are provided on both sides of the plane 3 in the same direction as the photosensitive material transport direction. Further, a groove 5 is provided on the back surface of the resin member A in the same direction as the coating width direction.
[0040]
The distance H between the upper horizontal surface 3 of the photosensitive material supporting member 1 and the tip of the slit portion 15 (tip of the slot die 12) is preferably within 3 mm, more preferably within 2 mm, and even more preferably within 1.5 mm. Particularly preferably, it is within 1.0 mm. The lower limit of the distance H is a distance at which the photosensitive surface of the photosensitive material P does not contact the tip portion of the slit portion 15 (tip portion of the slot die 12).
[0041]
The shape, size, and position of the grooves 2a and 2b of the photosensitive material support member 1 are the same as described above.
[0042]
The groove 5 of the photosensitive material supporting member 1 is continuously provided on the surface of the joining surface 25 of the resin member A and the metal member B on the resin member A side in the entire coating width direction of the photosensitive material supporting member 1. The length of the groove 5 in the transport direction is longer than the length of the metal member B in the transport direction, and at least the distance L6 from the side surface of the metal member B is about 2 mm to 6 mm. Similarly, the distance L5 of the depth of the groove 5 is set to about 2 mm to 6 mm.
[0043]
The photosensitive material support member 1 is composed of the resin member A and the metal member B as described above, and the resin member A and the metal member B are arranged so that the horizontal surface 3 of the photosensitive material support member 1 is not distorted due to a change in environmental temperature. The joining method of the screw | thread which can accept | permit a mutual shift | offset | difference with the joining surface 25 is given. When such a photosensitive material support member 1 is used, when the processing solution flows down from the resin member below the slit, the joint surface 25 of the resin member and the metal member is not completely integrated. The treatment liquid enters the area. Further, the processing solution that has entered further gradually accumulates and is dried to form a crystalline material. By pushing up the resin with the crystalline material, the linearity of the photosensitive material supporting member 1 cannot be obtained. In order to improve this problem, the present invention has a structure in which the treatment liquid dropped from the slit does not enter the joint surface between the resin member and the metal member through the resin member.
[0044]
First, when processing the photosensitive material, a processing solution 17 is flowed from the tip of the slit portion 15 to form a liquid film 26 in the gap H between the upper horizontal surface 3 of the opposing photosensitive material support member 1 and the tip of the slit portion 15. . The liquid film 26 is formed without interruption in the coating width direction, both ends of the liquid film 26 reach the grooves 2a and 2b, and both ends of the liquid film 26 that expands in the coating width direction along with the supply of the treatment liquid 17 are formed in the grooves 2a. And it flows down through the groove 2b. At this time, since the treatment liquid can locally flow in the groove 2a and the groove 2b, the treatment liquid does not flow outside the groove 2a and the groove 2b in the coating width direction. The processing liquid that has flowed from the grooves 2a and 2b and the processing liquid that has flowed down in the transport direction from the middle of the liquid film are transmitted to the side surface of the resin member A in the transport direction and further to the back surface, but the groove 5 is provided in the resin member A. Therefore, the processing liquid does not propagate upward to the metal member B but falls downward, and the processing liquid does not enter the bonding surface 25. That is, the flow of the processing liquid in the coating width direction of the photosensitive material support member 1 is blocked by the grooves 2a and 2b, and the flow of the processing liquid in the transport direction is blocked by the grooves 5, and the bonding surface 25 is formed in either direction. It is possible to completely prevent the processing liquid from entering.
[0045]
The grooves 2a and 2b for blocking the processing solution in the coating width direction of the photosensitive material support member 1 are preferably dug down in parallel to each surface continuous from the upper horizontal surface 3 as shown in FIGS. As shown in FIG. 4A, a groove may be provided only in the upper horizontal surface 3. As another aspect, the bottom surface of the groove may be one inclined surface as shown in FIG.
[0046]
Further, the groove and structure for blocking the entrance of the processing solution in the transport direction of the photosensitive material support member 1 may be a groove and structure as shown in FIGS. 7 (a), 7 (b), and 7 (c). In FIG. 7A, the metal member B is sandwiched on the back surface of the resin member A, and the protrusions 31a and 31b are provided over the entire width in the coating width direction on both sides in the transport direction to prevent the processing liquid from entering the bonding surface 25. To do. In FIG. 7B, the metal member B is sandwiched on the back surface of the resin member A, and grooves (concave portions) 32a and 32b are provided across the entire width in the coating width direction on both sides in the transport direction. Further, as shown in FIG. 7C, thin plates 33a and 33b made of, for example, a film for guiding the processing liquid downward may be provided on both side surfaces of the resin member A in the transport direction. In this way, the structure that blocks the processing liquid in the transport direction of the photosensitive material support member 1 covers the entire back surface of the resin member A or the side surface in the transport direction over the entire coating width direction so that the processing liquid is not transmitted to the bonding surface 25. To provide convex portions or concave portions. In addition, it is preferable that the distance of L5, L6, and L7 of FIG. 7 shall be about 2 mm-6 mm.
[0047]
Further, as another aspect in which the processing solution does not enter the bonding surface, the length of the metal member B in the coating width direction is shown in FIG. 8 instead of providing grooves on both side edges of the horizontal surface 3 of the photosensitive material support member 1. Is made shorter than the length of the resin member A in the application width direction, and a large recess 6 is provided on the back surface of the resin member A so as to cover the upper surface of the resin member B, so that the processing liquid enters from both the application width direction and the conveyance direction. Can also be prevented. In addition, the distance of L5, L6, and L8 in FIG. 8 is preferably about 2 mm to 6 mm.
[0048]
The present inventors are a processing apparatus for applying a processing solution falling from the slit to a photosensitive material using a slot die comprising at least a slit and a manifold, and exposing the photosensitive solution to a position facing and separating from the tip of the slit. A portion having a material support member, the portion of the photosensitive material support member facing the tip of the slit is a flat surface, and grooves are provided in both sides of the flat surface in the same direction as the photosensitive material transport direction. The inventors have found that a large amount of processing solution remains on the photosensitive material supporting member 1 and can solve the conventional problem of easy fixation and crystallization. Also, a processing apparatus for applying a processing solution falling from the slit to a photosensitive material using a slot die comprising at least a slit and a manifold, wherein the processing solution is disposed at a position facing and separating from the tip of the slit. The photosensitive material support member has a photosensitive material support member longer than the slit width, and the photosensitive material support member is formed by screwing a resin member having a flat portion facing the tip of the slit and a metal member for reinforcing the resin member. The photosensitive material support member 1 is constructed by having a structure in which the processing liquid dropped from the slit does not enter the joint surface between the resin member and the metal member through the resin member. The conventional concern that the linearity of the photosensitive material supporting member 1 cannot be obtained by the processing liquid entering and crystallizing into the joint surface of the two members is eliminated. I found the door.
[0049]
【The invention's effect】
According to the present invention, it is possible to prevent sticking crystallization by the treatment liquid in the treatment liquid application section while the treatment is not performed, and it is possible to stably apply the treatment liquid even at the start of the treatment. Another object is to keep the gap between the slit tip and the plane of the photosensitive material support member facing the slit tip constant at all times, so that the treatment liquid can be stably applied over a long period of time.
[Brief description of the drawings]
FIG. 1 is a sectional view of a processing apparatus showing an example of the present invention. FIG. 2 is a perspective view of a photosensitive material supporting member and a slot die showing an example of the present invention. FIG. 4 is a side view of a photosensitive material support member. FIG. 5 is a sectional view of a processing apparatus showing an example of the present invention. FIG. 6 is a perspective view of a photosensitive material support member and a slot die. 7 is a side view of the photosensitive material support member. FIG. 8 is a front view (FIG. 8a) and a side view (FIG. 8b) of the photosensitive material support member.
FIG. 9 is a front view showing a method for joining the resin member A and the metal member B according to the present invention.
DESCRIPTION OF SYMBOLS 1 Photosensitive material support member 2a, 2b Groove 3 Horizontal surface 4 Inclined surface 5 Recessed part (groove)

Claims

A processing apparatus for applying a processing solution falling from the slit to a photosensitive material using a slot die comprising at least a slit and a manifold, and having a photosensitive material support member at a position facing and separating from the tip of the slit. The photosensitive material processing member is characterized in that a portion of the photosensitive material support member facing the tip end portion of the slit is a flat surface, and grooves are provided in both sides of the flat surface in the same direction as the conveyance direction of the photosensitive material. apparatus.

A processing apparatus for applying a processing solution falling from the slit to a photosensitive material using a slot die comprising at least a slit and a manifold, wherein the processing solution has a slit width at a position facing and separating from the tip of the slit. The photosensitive material support member has a longer photosensitive material support member, and the photosensitive material support member is formed by joining a resin member having a flat portion facing the tip of the slit and a metal member for reinforcing the resin member with a screw. An apparatus for processing a photosensitive material, characterized in that the processing liquid dropped from the slit does not enter the joint surface between the resin member and the metal member through the resin member.