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JP3914838B2 - Automatic analyzer - Google Patents
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JP3914838B2 - Automatic analyzer - Google Patents

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JP3914838B2
JP3914838B2 JP2002200725A JP2002200725A JP3914838B2 JP 3914838 B2 JP3914838 B2 JP 3914838B2 JP 2002200725 A JP2002200725 A JP 2002200725A JP 2002200725 A JP2002200725 A JP 2002200725A JP 3914838 B2 JP3914838 B2 JP 3914838B2
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sound wave
reaction vessel
automatic analyzer
reaction
wave irradiation
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JP2004045113A (en
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武徳 大草
裕康 内田
克宏 神原
宗 加藤
重範 亘
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、試薬と試料の混合液が入っている反応容器に測定光を照射することで試料中の目的成分の濃度等を測定する自動分析装置に係り、特に測定精度を向上することができる自動分析装置に関するものである。
【0002】
【従来の技術】
自動分析装置では、反応容器へ試料と試薬とを分注して試料と試薬を反応させた後、反応容器へ測定光を照射することにより、反応容器中の反応液の反応を測定する。
【0003】
この反応容器中での反応を均一に起こさせ、かつ反応を促進するため反応液の攪拌を行うのが一般的である。攪拌方法としては、ヘラやスクリューを反応液中で回転させる機械的な攪拌方法が現在のところ主流であるが、ヘラやスクリューを介して異なる試料,試薬が混ざってしまう、いわゆるキャリーオーバの発生が問題となる場合があり、被攪拌液に物理的に接触しないように、音波を反応容器へ照射して攪拌する方法も提案(例えば特開2000−146986号公報等)されている。
【0004】
【発明が解決しようとする課題】
いずれの攪拌方法においても、試料,試薬を反応容器に分注した際に生じた液面付近の気泡が、攪拌時に反応液中に巻きこまれ、反応容器の内壁と測定光とが交差する領域に付着することがある。反応容器の内壁と測定光との交差領域に付着した気泡は測定光を遮り、あるいは、乱反射して、正常な測定を妨げる可能性がある。測定に使用する試薬,試料の微量化が今後進んでいくが、この場合に特に気泡の付着が問題となる可能性がある。
【0005】
本発明は、自動分析装置において、反応容器の内壁と測定光との交差領域に付着した気泡を測定光の経路から除去することにより、より信頼性の高い測定結果を得られる自動分析装置を提供することを目的とする。
【0006】
【課題を解決するための手段】
上記目的は、試薬と試料とを反応させる反応容器と、前記反応容器に光を照射することにより前記反応容器中での反応液の反応を光学的に測定する測定手段と、を備えた自動分析装置において、前記反応容器の内壁と前記測定手段の測定光との交差領域を含む部分に、音波を照射する音波照射機構を備えることによって達成される。
【0007】
【発明の実施の形態】
本発明の実施形態に係る自動分析装置の概略構成を表す斜視図を図1に示す。図1を用いて、本発明の実施例を説明する。
【0008】
図1に示す自動分析装置は、試料が入れられた複数の試料容器101を収納するサンプルディスク102,試料と混合して反応させるための試薬が入れられた複数の試薬ボトル103を収容する試薬ディスク104,試料および試薬を反応させる場である反応容器105を保持した反応容器ホルダ106が複数取付けられている反応ディスク107,試料と試薬との反応を促進するために、反応容器105内の反応液の温度を一定温度に制御する反応槽108,試料容器101内の試料を反応容器105に供給する試料分注機構109,試薬ボトル103内の試薬を反応容器105に供給する試薬分注機構110,反応容器105に供給された試料と試薬とを攪拌して混合する攪拌機構111,反応容器105の内壁に付着した気泡を除去する気泡除去機構112,反応容器105内の反応液に光を照射し、その光の特性を測定することで反応液の反応を測定する測光機構113,反応容器105を洗浄する洗浄機構114,分析項目や分析結果等の各種画面表示を行う表示部115,分析項目等の各種情報の入力を行う入力部116,分析項目等の各種情報と各機構を制御するためのシーケンス(プログラム)とを記憶している記憶部117,記憶部117に記憶されているシーケンスに従って各構成要素を制御する制御部118を備える。
【0009】
続いて、自動分析装置の分析動作について、以下に説明する。
【0010】
まず、試料分注機構109が設置されている位置で、試料分注機構109によって反応容器105へ試料が分注される。試料を分注された反応容器105は、反応ディスク107の駆動によって試薬分注機構110が設置されている位置まで移送され、そこで、試薬分注機構110によって試薬を分注される。次に、反応ディスク107の駆動によって反応容器105は攪拌機構111が設置されている位置へ移送され、攪拌機構111により反応容器105に分注されている試料と試薬とが攪拌される。攪拌機構はヘラを反応容器に挿入して回転させる機構,音波を照射してその音圧で攪拌する方法、その他のいずれの攪拌機構であっても良い。その後、反応ディスク107の駆動によって反応容器105は気泡除去機構112が設置されている位置へ移送され、気泡除去機構112によって反応容器105の内壁と測光機構113から反応容器105に照射される測定光との交差領域に付着した気泡が除去される。気泡除去が終了した後、反応容器105は測光機構113の位置へ移送され、反応容器105内の反応液の反応が、測光機構113により測定される。測定終了後、反応容器105は反応ディスク107の駆動によって洗浄機構114が設置された位置へ移送され、洗浄機構114により洗浄される。一連の分析動作は、記憶部117に記憶されているシーケンスに従って、制御部118により制御されて実行される。このような一連の分析動作が、各反応容器105に対して実行され、本発明の実施形態に係る自動分析装置による分析が行われる。
【0011】
次に、気泡除去機構112の縦断面図である図2を用いて、本発明の実施形態1を説明する。図2に示す気泡除去機構112は、音源となる圧電素子201と圧電素子ドライバ202とから構成される。圧電素子ドライバ202は、制御部118につながっている。圧電素子ドライバ202の駆動により圧電素子201で生成された音波203は、反応槽108を満たしている恒温水204を伝達して反応容器105へ到達する。なお、本実施形態では音波203は恒温水204を伝達しているが、恒温水204の代わりに音波203を伝達する他の媒体を用いることもできる。反応容器105の内壁に付着している気泡205は、音波の主に音響放射圧の作用により、音波203の進行方向へ反応容器105の内壁から乖離される。反応容器105から乖離した気泡206は、気泡206の比重と反応液207の比重との差によって生じる浮力により、重力方向直上方向へ移動し、音波の照射による反応容器の内壁に付着した気泡の除去が行われる。
【0012】
音波203は、反応容器105の測定光208と反応容器105の内壁との交差領域を含む部分に照射される。気泡209のように測定光208が交差しない領域と前記交差領域との境界上に位置する気泡を除去するために、音波203を前記交差領域よりも1〜2mm広い領域に照射するのが有効である。もちろん、これよりも広い領域に音波を照射しても気泡を除去できる。
【0013】
なお、図2では音波203と測定光208とを重ねて描いているが、これは音波203が照射される位置と測定光208が照射される位置との位置関係を示すためである。自動分析装置上では、測定光208は反応容器105が図1の測光機構113の位置に来た時に照射され、また、音波203は反応容器105が図1の気泡除去機構112の位置に来た時に照射される。
【0014】
音波203を照射する時間は音波203を生成するために圧電素子201に印加する電圧の波形や、圧電素子201から反応容器105までの距離などによって異なるが、たとえば、圧電素子201から反応容器105までの距離が3〜15mm程度で、圧電素子201に印加する電圧をステップ波上にすると、10〜100ms間、音波203を照射すると気泡を除去できる。
【0015】
また、照射する音波203の強度や照射時間などのパラメータは、反応液207の粘性や反応液207と反応容器105の内壁との間の濡れ性などによって異なってくる。予め反応液207の種類ごとに気泡除去に必要な音波203の強度や照射時間などをパラメータとして記憶部117に記憶しておき、反応液207の種類に合わせて音波の強度や照射時間などを調整する。
【0016】
もちろん、反応液207の種類に合わせて音波203の強度と照射時間などのパラメータを調整するのではなく、気泡が最も除去しにくい反応液207に対する音波203のパラメータを、すべての反応液207に対するパラメータに用いても気泡除去できる。その際も、気泡が最も除去しにくい反応液207に対する音波203の強度と照射時間などのパラメータを記憶部117に予め記憶しておく必要がある。
【0017】
図3に実施形態2を示す。実施形態2は音波の少なくとも一部を反射する反射板301を有する。反射板301を用いて音波303を反射させることで、反応容器105の複数の内壁に異なる方向から音波302,303を照射し、反応容器105の複数の内壁に付着した気泡を除去する。圧電素子304の表面には複数の電極305が形成されており、音波の照射位置は電圧を印加される電極305の位置で決まる。圧電素子304上の、電圧が印加された電極305に対応する部分が加振され、音波302,303が生成される。電圧を印加する電極の選択は、たとえば、圧電素子ドライバ202と電極305との間に設置したリレー306を用いて行う。
【0018】
反応容器105の複数の壁に付着した気泡を除去するために反応容器105の相対する複数の内壁に音波を照射する場合、反応容器105の内壁と相対する内壁との間の距離が音響放射圧による気泡の水平方向の移動距離に対して短いと、一度乖離した気泡が相対する内壁に到達し、相対する内壁と測定光との交差領域内に再び付着すること(再付着)がある。音波302と303とを同時に照射すると、相対する内壁に気泡が再付着するのを防止できるが、気泡307は音波302から内壁から乖離させる力を受けるのと同時に、相対する内壁に照射された音波303から内壁へ押し付ける力を受けるため、反応容器105の内壁から乖離しない。図3(b)に示すように音波302,303を照射するタイミングをずらすことにより、気泡307は音波302により反応容器105の内壁から乖離されて反応容器の相対する内壁に向かって行くが、反応容器の相対する内壁に到達する前に、音波303により進行方向と逆方向の力が働き、相対する内壁に再付着しない。また、音波303により相対する内壁に付着している気泡308も除去される。交互に照射する回数は、照射する音波の強度や反応容器の相対する内壁間の距離などによって異なってくるが、たとえば、反応容器の相対する内壁間の距離が5mm程度の場合、音波302を10〜100ms間、照射した直後に、反応容器の相対する内壁へ10〜100ms間、音波303を1回照射することで、相対する内壁への気泡の再付着を防止できる。
【0019】
また、実施形態2では、圧電素子304と反射板301とを筐体309で一体にして、反応槽108に着脱可能に取付けられている。組立時に構成要素の寸法公差などにより反応容器105と圧電素子304や反射板301との位置関係を調整する必要が出てきた場合、一体構造にすることによって筐体309を動かすことで圧電素子304や反射板301の位置調整を同時にでき、調整時間を短縮できる。
【0020】
本実施形態2では、反射板301と複数の電極305を有する圧電素子304とを用いて反応容器105の複数の内壁に音波を照射しているが、反射板301を用いることなく反応容器の複数方向に圧電素子を設置する、もしくは、複数の電極305を有する圧電素子304の代わりに複数の圧電素子を配置し、それらから照射される音波を反射板301で反射することでも反応容器105の複数の内壁に音波を照射できる。
【0021】
また、本実施形態2では、2方向から音波を照射しているが、もちろん、反射板や圧電素子,電極を増やせば、3方向以上から音波を照射することも可能である。
【0022】
図4に実施形態3を示す。本実施形態3は、反応容器105の下方より音波404を照射する構成を有する。たとえば、反応容器下方に圧電素子405を有する。気泡401を反応容器105の内壁から乖離させるために照射する音波402に加えて、反応容器105の内壁から乖離した気泡403に下方から音波404を照射することにより、浮力に加えて音響放射圧による重力方向上方向への力を気泡403に作用させ、気泡403を測定光208との上方へより早く移動できる。
【0023】
図5に実施形態4を示す。本実施形態4は、反応容器105の内壁と測定光208との交差領域に対して、斜め上方へ向けて音波501を照射する構成を有する。気泡を上方へ移動させる力のベクトル成分は図4の実施形態3に比べ減少するものの、ひとつの圧電素子で気泡を反応容器内壁から乖離させる音響放射圧と、乖離した気泡を上方へ移動させる音響放射圧を得られる。
【0024】
音波501と反応容器105の相対する内壁とが交差する部分が、測定光208と反応容器105の相対する内壁との交差領域と重ならない方向に音波501を照射すると、照射された音波501が相対する反応容器105の内壁に付着している気泡を内壁に押し付けないため、反応容器105の相対する内壁に音波501と同時に音波502を照射できる。
【0025】
また、反応液207の量が少ない場合、測定光208と反応容器105の底との間の距離が気泡の大きさに対して短くなり、測定光208と反応容器105の内壁との交差領域内に、反応容器105の内壁と底との両方に付着した気泡503が生じることがある。反応容器105の底と内壁との両方を含む領域に重力方向斜め上方に向けて音波501を照射する構成を有することにより、気泡503を反応容器105の底と内壁との両方から乖離でき除去できる。
【0026】
図6に実施形態5を示す。本実施形態5は、反応液207を攪拌するために照射する音波601を生成する音波生成機構と、気泡除去を行うために照射する音波602を生成する音波生成機構とを同一筐体603に有する。攪拌用の音波生成機構と気泡除去用の音波生成機構とを一体にすることにより、反応液207の攪拌とその後に行う気泡除去とを同一箇所で行える。攪拌と気泡除去とを同一箇所で行うことにより、攪拌を行う位置から気泡除去を行う位置へ反応容器105を移送する必要がなくなり分析動作に必要な時間を短縮できるため、単位時間あたりの測定数を増やせる。
【0027】
また、攪拌に使用する音波601のうち少なくとも一部を反射する反射板と、気泡除去に使用する音波602のうち少なくとも一部を反射する反射板とを一体の構造(例えば604のような)にすることで、部品点数を削減でき、製造コストの削減に寄与する。なお、音波を照射する順番は、攪拌用の音波602を照射した後、気泡除去用の音波602を照射する。音波602は複数の音波から構成されているが、図3に示す実施形態2のようにタイミングをずらして照射する。
【0028】
【発明の効果】
以上説明したように、本発明の気泡除去機構により反応容器に付着した気泡を除去でき、信頼性の高い測定結果を得られる自動分析装置を実現できる。
【図面の簡単な説明】
【図1】本発明に係る気泡除去機構を適用した自動分析装置の構成を示す斜視図。
【図2】本発明の実施形態1に係る気泡除去機構周辺の縦断面図。
【図3】本発明の実施形態2に係る気泡除去機構周辺の縦断面図。
【図4】本発明の実施形態3に係る気泡除去機構周辺の縦断面図。
【図5】本発明の実施形態4に係る気泡除去機構周辺の縦断面図。
【図6】本発明の実施形態5に係る気泡除去機構周辺の縦断面図。
【符号の説明】
101…試料容器、102…サンプルディスク、103…試薬ボトル、104…試薬ディスク、105…反応容器、106…反応容器ホルダ、107…反応ディスク、108…反応槽、109…試料分注機構、110…試薬分注機構、111…攪拌機構、112…気泡除去機構、113…測光機構、114…洗浄機構、115…表示部、116…入力部、117…記憶部、118…制御部、201,304,405…圧電素子、202…圧電素子ドライバ、203,302,303,402,404,501,502,601,602…音波、204…恒温水、205,206,209,307,308,401,403,503…気泡、207…反応液、208…測定光、301,604…反射板、305…電極、306…リレー、309,603…筐体。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an automatic analyzer that measures the concentration and the like of a target component in a sample by irradiating measurement light onto a reaction vessel containing a mixed solution of the reagent and the sample, and can particularly improve measurement accuracy. The present invention relates to an automatic analyzer.
[0002]
[Prior art]
In an automatic analyzer, a sample and a reagent are dispensed into a reaction container, the sample and the reagent are reacted, and then the reaction of the reaction solution in the reaction container is measured by irradiating the reaction container with measurement light.
[0003]
In general, the reaction liquid is stirred to cause the reaction in the reaction vessel to uniformly occur and to accelerate the reaction. As a stirring method, a mechanical stirring method in which a spatula or a screw is rotated in a reaction solution is currently mainstream, but so-called carry-over occurs in which different samples and reagents are mixed through the spatula and the screw. There has been proposed a method (for example, Japanese Patent Laid-Open No. 2000-146986) that irradiates the reaction vessel with a sound wave so as to avoid physical contact with the liquid to be stirred.
[0004]
[Problems to be solved by the invention]
In any of the stirring methods, bubbles near the liquid level generated when the sample and reagent are dispensed into the reaction vessel are trapped in the reaction solution during the stirring, and in the region where the inner wall of the reaction vessel intersects the measurement light. May adhere. Bubbles adhering to the intersecting region between the inner wall of the reaction vessel and the measurement light may block the measurement light or diffusely reflect and interfere with normal measurement. In the future, the amount of reagents and samples used for measurement will be reduced, but in this case, the adhesion of bubbles may be a problem.
[0005]
The present invention provides an automatic analyzer capable of obtaining a more reliable measurement result by removing bubbles adhering to the intersecting region between the inner wall of the reaction vessel and the measurement light from the measurement light path in the automatic analyzer. The purpose is to do.
[0006]
[Means for Solving the Problems]
The object is to provide an automatic analysis comprising a reaction vessel for reacting a reagent and a sample, and a measuring means for optically measuring the reaction of the reaction solution in the reaction vessel by irradiating the reaction vessel with light. In the apparatus, this is achieved by providing a sound wave irradiation mechanism for irradiating a sound wave to a portion including an intersecting region between the inner wall of the reaction vessel and the measurement light of the measurement means.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a perspective view showing a schematic configuration of an automatic analyzer according to an embodiment of the present invention. An embodiment of the present invention will be described with reference to FIG.
[0008]
The automatic analyzer shown in FIG. 1 includes a sample disk 102 that houses a plurality of sample containers 101 containing samples, and a reagent disk that contains a plurality of reagent bottles 103 containing reagents for mixing and reacting with the sample. 104, a reaction disk 107 to which a plurality of reaction vessel holders 106 holding reaction vessels 105, which are places where the sample and the reagent are reacted, and a reaction solution in the reaction vessel 105 in order to promote the reaction between the sample and the reagents. A reaction tank 108 for controlling the temperature of the sample container 101 to a constant temperature, a sample dispensing mechanism 109 for supplying the sample in the sample container 101 to the reaction container 105, a reagent dispensing mechanism 110 for supplying the reagent in the reagent bottle 103 to the reaction container 105, A stirring mechanism 111 that stirs and mixes the sample and reagent supplied to the reaction vessel 105, and bubbles attached to the inner wall of the reaction vessel 105 are removed. The bubble removal mechanism 112, the photometric mechanism 113 that measures the reaction of the reaction liquid by irradiating the reaction liquid in the reaction container 105 with light and measuring the characteristics of the light, the cleaning mechanism 114 that cleans the reaction container 105, and the analysis item And a display unit 115 for displaying various screens such as analysis results, an input unit 116 for inputting various information such as analysis items, various information such as analysis items, and a sequence (program) for controlling each mechanism. Storage unit 117, and a control unit 118 that controls each component according to the sequence stored in storage unit 117.
[0009]
Next, the analysis operation of the automatic analyzer will be described below.
[0010]
First, a sample is dispensed into the reaction vessel 105 by the sample dispensing mechanism 109 at a position where the sample dispensing mechanism 109 is installed. The reaction container 105 into which the sample has been dispensed is transferred to a position where the reagent dispensing mechanism 110 is installed by driving the reaction disk 107, where the reagent dispensing mechanism 110 dispenses the reagent. Next, the reaction vessel 105 is moved to a position where the stirring mechanism 111 is installed by driving the reaction disk 107, and the sample and the reagent dispensed into the reaction vessel 105 are stirred by the stirring mechanism 111. The stirring mechanism may be a mechanism for inserting a spatula into a reaction vessel and rotating it, a method of irradiating a sound wave and stirring with the sound pressure, or any other stirring mechanism. Thereafter, the reaction vessel 105 is moved to a position where the bubble removal mechanism 112 is installed by driving the reaction disk 107, and the measurement light irradiated to the reaction vessel 105 from the inner wall of the reaction vessel 105 and the photometric mechanism 113 by the bubble removal mechanism 112. Bubbles adhering to the intersecting area with the are removed. After the bubble removal is completed, the reaction vessel 105 is transferred to the position of the photometric mechanism 113, and the reaction of the reaction liquid in the reaction vessel 105 is measured by the photometric mechanism 113. After completion of the measurement, the reaction vessel 105 is transferred to the position where the cleaning mechanism 114 is installed by driving the reaction disk 107 and is cleaned by the cleaning mechanism 114. A series of analysis operations are controlled and executed by the control unit 118 according to the sequence stored in the storage unit 117. Such a series of analysis operations is performed on each reaction vessel 105, and analysis is performed by the automatic analyzer according to the embodiment of the present invention.
[0011]
Next, Embodiment 1 of the present invention will be described with reference to FIG. 2 which is a longitudinal sectional view of the bubble removing mechanism 112. The bubble removing mechanism 112 shown in FIG. 2 includes a piezoelectric element 201 that serves as a sound source and a piezoelectric element driver 202. The piezoelectric element driver 202 is connected to the control unit 118. The sound wave 203 generated by the piezoelectric element 201 by driving the piezoelectric element driver 202 is transmitted to the constant temperature water 204 filling the reaction tank 108 and reaches the reaction vessel 105. In the present embodiment, the sound wave 203 transmits the constant temperature water 204, but another medium that transmits the sound wave 203 can be used instead of the constant temperature water 204. The bubbles 205 attached to the inner wall of the reaction vessel 105 are separated from the inner wall of the reaction vessel 105 in the traveling direction of the sound wave 203 mainly due to the action of acoustic radiation pressure of the sound wave. The bubbles 206 separated from the reaction vessel 105 move upward in the gravitational direction due to the buoyancy generated by the difference between the specific gravity of the bubbles 206 and the specific gravity of the reaction solution 207, and the bubbles attached to the inner wall of the reaction vessel are removed by irradiation with sound waves. Is done.
[0012]
The sound wave 203 is applied to a portion including an intersecting region between the measurement light 208 of the reaction vessel 105 and the inner wall of the reaction vessel 105. In order to remove bubbles located on the boundary between the region where the measurement light 208 does not intersect, such as the bubble 209, and the intersecting region, it is effective to irradiate the region 203 to 1 mm wider than the intersecting region. is there. Of course, the bubbles can be removed even if a sound wave is irradiated to a wider area.
[0013]
In FIG. 2, the sound wave 203 and the measurement light 208 are drawn so as to overlap, and this is for showing the positional relationship between the position where the sound wave 203 is irradiated and the position where the measurement light 208 is irradiated. On the automatic analyzer, the measurement light 208 is irradiated when the reaction vessel 105 reaches the position of the photometric mechanism 113 in FIG. 1, and the sound wave 203 comes to the position of the bubble removal mechanism 112 in the reaction vessel 105 in FIG. Sometimes irradiated.
[0014]
The irradiation time of the sound wave 203 varies depending on the waveform of the voltage applied to the piezoelectric element 201 to generate the sound wave 203, the distance from the piezoelectric element 201 to the reaction vessel 105, and the like. For example, from the piezoelectric element 201 to the reaction vessel 105 When the voltage applied to the piezoelectric element 201 is on a step wave, the bubbles can be removed by irradiating the sound wave 203 for 10 to 100 ms.
[0015]
Also, parameters such as the intensity of the sound wave 203 to be irradiated and the irradiation time vary depending on the viscosity of the reaction liquid 207 and the wettability between the reaction liquid 207 and the inner wall of the reaction vessel 105. For each type of reaction solution 207, the intensity and irradiation time of the sound wave 203 necessary for removing bubbles are stored in the storage unit 117 as parameters, and the intensity and irradiation time of the sound wave are adjusted according to the type of the reaction solution 207. To do.
[0016]
Of course, parameters such as the intensity of the sound wave 203 and the irradiation time are not adjusted in accordance with the type of the reaction liquid 207, but the parameters of the sound wave 203 for the reaction liquid 207 where bubbles are most difficult to be removed are the parameters for all the reaction liquids 207. Bubbles can be removed even when used in Also in this case, parameters such as the intensity of the sound wave 203 and the irradiation time for the reaction liquid 207 where bubbles are most difficult to remove must be stored in the storage unit 117 in advance.
[0017]
A second embodiment is shown in FIG. The second embodiment includes a reflector 301 that reflects at least a part of sound waves. By reflecting the sound wave 303 using the reflection plate 301, the sound waves 302 and 303 are irradiated to the plurality of inner walls of the reaction container 105 from different directions, and bubbles attached to the plurality of inner walls of the reaction container 105 are removed. A plurality of electrodes 305 are formed on the surface of the piezoelectric element 304, and the irradiation position of the sound wave is determined by the position of the electrode 305 to which a voltage is applied. A portion corresponding to the electrode 305 to which a voltage is applied on the piezoelectric element 304 is vibrated, and sound waves 302 and 303 are generated. The selection of the electrode to which the voltage is applied is performed, for example, using a relay 306 installed between the piezoelectric element driver 202 and the electrode 305.
[0018]
When irradiating sound waves to a plurality of opposing inner walls of the reaction vessel 105 in order to remove bubbles adhering to the plurality of walls of the reaction vessel 105, the distance between the inner wall of the reaction vessel 105 and the opposite inner wall is the acoustic radiation pressure. When the bubble is short relative to the horizontal movement distance, the bubble once separated may reach the opposing inner wall and reattach (reattach) to the intersecting region between the opposing inner wall and the measuring light. When the sound waves 302 and 303 are irradiated at the same time, it is possible to prevent the bubbles from reattaching to the opposing inner walls. However, the bubbles 307 receive a force for separating from the inner walls from the sound waves 302, and at the same time, the sound waves applied to the opposing inner walls. Since a force pressing from 303 to the inner wall is received, it does not deviate from the inner wall of the reaction vessel 105. As shown in FIG. 3B, by shifting the timing of irradiating the sound waves 302 and 303, the bubble 307 is separated from the inner wall of the reaction vessel 105 by the sound wave 302 and moves toward the opposite inner wall of the reaction vessel. Before reaching the opposing inner wall of the container, a force in the direction opposite to the traveling direction acts by the sound wave 303 and does not reattach to the opposing inner wall. Further, the bubbles 308 adhering to the opposite inner walls are also removed by the sound wave 303. The number of times of alternately irradiating differs depending on the intensity of the radiated sound wave and the distance between the inner walls facing each other. For example, when the distance between the inner walls facing each other is about 5 mm, Immediately after irradiating for -100 ms, the sound wave 303 is irradiated once to the opposing inner wall of the reaction vessel for 10 to 100 ms, thereby preventing reattachment of bubbles to the opposing inner wall.
[0019]
In the second embodiment, the piezoelectric element 304 and the reflection plate 301 are integrated with a housing 309 and are detachably attached to the reaction vessel 108. When it is necessary to adjust the positional relationship between the reaction vessel 105 and the piezoelectric element 304 or the reflecting plate 301 due to dimensional tolerances of components at the time of assembly, the piezoelectric element 304 is moved by moving the housing 309 to an integrated structure. The position of the reflector 301 can be adjusted at the same time, and the adjustment time can be shortened.
[0020]
In the second embodiment, sound waves are applied to the plurality of inner walls of the reaction vessel 105 using the reflection plate 301 and the piezoelectric elements 304 having the plurality of electrodes 305, but a plurality of reaction vessels are used without using the reflection plate 301. A plurality of reaction vessels 105 can also be installed by arranging piezoelectric elements in the direction or arranging a plurality of piezoelectric elements instead of the piezoelectric elements 304 having a plurality of electrodes 305 and reflecting sound waves radiated from them by the reflector 301. Can irradiate the inner wall of the sound wave.
[0021]
In the second embodiment, sound waves are emitted from two directions. Of course, if the number of reflectors, piezoelectric elements, and electrodes is increased, sound waves can be emitted from three or more directions.
[0022]
FIG. 4 shows a third embodiment. The third embodiment has a configuration in which sound waves 404 are irradiated from below the reaction vessel 105. For example, the piezoelectric element 405 is provided below the reaction vessel. In addition to the acoustic wave 402 that is emitted to diverge the bubble 401 from the inner wall of the reaction vessel 105, the acoustic wave 404 is emitted from the lower side to the bubble 403 that is separated from the inner wall of the reaction vessel 105, so An upward force in the direction of gravity is applied to the bubble 403 so that the bubble 403 can move faster above the measurement light 208.
[0023]
FIG. 5 shows a fourth embodiment. The fourth embodiment has a configuration in which the sound wave 501 is irradiated obliquely upward with respect to the intersection region between the inner wall of the reaction vessel 105 and the measurement light 208. Although the vector component of the force that moves the bubbles upward is reduced compared to the third embodiment of FIG. 4, the acoustic radiation pressure that causes the bubbles to be separated from the inner wall of the reaction vessel with one piezoelectric element and the acoustic that causes the separated bubbles to move upward Radiation pressure can be obtained.
[0024]
When the sound wave 501 irradiates the sound wave 501 in a direction in which the portion where the sound wave 501 and the inner wall facing the reaction container 105 intersect does not overlap the intersecting region between the measurement light 208 and the inner wall facing the reaction container 105, the irradiated sound wave 501 is relatively Since the bubbles adhering to the inner wall of the reaction container 105 are not pressed against the inner wall, the sound waves 502 can be irradiated simultaneously with the sound waves 501 to the opposing inner walls of the reaction container 105.
[0025]
Further, when the amount of the reaction solution 207 is small, the distance between the measurement light 208 and the bottom of the reaction container 105 becomes shorter than the size of the bubbles, and the distance between the measurement light 208 and the inner wall of the reaction container 105 is reduced. In addition, bubbles 503 attached to both the inner wall and the bottom of the reaction vessel 105 may be generated. By having a configuration in which the sound wave 501 is irradiated obliquely upward in the direction of gravity in a region including both the bottom and the inner wall of the reaction vessel 105, the bubbles 503 can be separated from both the bottom and the inner wall of the reaction vessel 105 and removed. .
[0026]
FIG. 6 shows a fifth embodiment. In the fifth embodiment, the same housing 603 includes a sound wave generation mechanism that generates a sound wave 601 that is irradiated to stir the reaction solution 207 and a sound wave generation mechanism that generates a sound wave 602 that is irradiated to remove bubbles. . By integrating the sound generation mechanism for stirring and the sound generation mechanism for removing bubbles, stirring of the reaction liquid 207 and subsequent bubble removal can be performed at the same location. By performing stirring and bubble removal at the same location, it is not necessary to transfer the reaction vessel 105 from the position where stirring is performed to the position where bubbles are removed, and the time required for the analysis operation can be shortened. Can be increased.
[0027]
In addition, a reflecting plate that reflects at least a part of the sound wave 601 used for stirring and a reflecting plate that reflects at least a part of the sound wave 602 used for bubble removal have an integrated structure (such as 604). By doing so, the number of parts can be reduced and the manufacturing cost can be reduced. Note that, in order to irradiate the sound wave, after the sound wave 602 for stirring is irradiated, the sound wave 602 for removing bubbles is irradiated. Although the sound wave 602 is composed of a plurality of sound waves, irradiation is performed at different timings as in the second embodiment shown in FIG.
[0028]
【The invention's effect】
As described above, it is possible to realize an automatic analyzer capable of removing bubbles adhering to the reaction vessel by the bubble removing mechanism of the present invention and obtaining a highly reliable measurement result.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a configuration of an automatic analyzer to which a bubble removing mechanism according to the present invention is applied.
FIG. 2 is a longitudinal sectional view around a bubble removing mechanism according to Embodiment 1 of the present invention.
FIG. 3 is a longitudinal sectional view around a bubble removing mechanism according to a second embodiment of the present invention.
FIG. 4 is a longitudinal sectional view around a bubble removal mechanism according to a third embodiment of the present invention.
FIG. 5 is a longitudinal sectional view around a bubble removing mechanism according to a fourth embodiment of the present invention.
FIG. 6 is a longitudinal sectional view around a bubble removing mechanism according to a fifth embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 101 ... Sample container, 102 ... Sample disk, 103 ... Reagent bottle, 104 ... Reagent disk, 105 ... Reaction container, 106 ... Reaction container holder, 107 ... Reaction disk, 108 ... Reaction tank, 109 ... Sample dispensing mechanism, 110 ... Reagent dispensing mechanism, 111 ... stirring mechanism, 112 ... bubble removing mechanism, 113 ... photometric mechanism, 114 ... cleaning mechanism, 115 ... display unit, 116 ... input unit, 117 ... storage unit, 118 ... control unit, 201, 304, 405: Piezoelectric element 202: Piezoelectric element driver 203, 302, 303, 402, 404, 501, 502, 601, 602 ... Sound wave, 204: Constant temperature water, 205, 206, 209, 307, 308, 401, 403, 503 ... Air bubbles, 207 ... Reaction liquid, 208 ... Measuring light, 301, 604 ... Reflector, 305 ... Electrode, 306 ... Relay, 309, 60 ... housing.

Claims (8)

試薬と試料とを混合する反応容器と、
該反応容器に光を照射することにより反応容器中の混合液の反応を光学的に測定する測定手段、とを備えた自動分析装置において、
前記反応容器を構成する壁と前記測定手段の測定光との交差領域を含む部分に、音波を照射する第1の音波照射機構と、
該第1の音波照射機構から照射された音波の少なくとも一部を反射し、前記反応容器に前記第1の音波照射機構の音波照射方向とは異なる方向から音波を照射するための音波反射板を備えた第2の音波照射機構と、
を備え、
更に前記第1の音波照射機構から音波を照射した後に、前記第2の音波照射機構から音波を照射するように該第1の音波照射機構、第2の音波照射機構を制御する制御機構を備えたことを特徴とする自動分析装置。
A reaction vessel for mixing the reagent and the sample;
In an automatic analyzer equipped with a measuring means for optically measuring the reaction of the mixed liquid in the reaction container by irradiating the reaction container with light,
A first sound wave irradiation mechanism for irradiating a sound wave to a portion including an intersecting region between the wall constituting the reaction container and the measurement light of the measurement unit;
A sound wave reflecting plate for reflecting at least a part of the sound wave irradiated from the first sound wave irradiation mechanism and irradiating the reaction container with the sound wave from a direction different from the sound wave irradiation direction of the first sound wave irradiation mechanism. A second sound wave irradiation mechanism provided;
With
And a control mechanism for controlling the first sound wave irradiation mechanism and the second sound wave irradiation mechanism so that sound waves are emitted from the second sound wave irradiation mechanism after the sound waves are emitted from the first sound wave irradiation mechanism. An automatic analyzer characterized by that.
請求項1記載の自動分析装置において、
前記第1の音波照射機構と前記音波反射板が一体構造であることを特徴とする自動分析装置。
The automatic analyzer according to claim 1,
The automatic analyzer is characterized in that the first sound wave irradiation mechanism and the sound wave reflection plate have an integral structure.
請求項1記載の自動分析装置において、
更に、前記第2の音波照射機構は反応容器の下方から前記反応容器に向けて音波を照射するものであることを特徴とする自動分析装置。
The automatic analyzer according to claim 1,
Furthermore, the second sound wave irradiation mechanism emits sound waves from below the reaction vessel toward the reaction vessel.
請求項1記載の自動分析装置において、
前記第2の音波照射機構が、音波の進行方向に重力方向上方向のベクトル成分を有する音波を照射するものであることを特徴とする自動分析装置。
The automatic analyzer according to claim 1,
2. The automatic analyzer according to claim 2, wherein the second sound wave irradiation mechanism emits a sound wave having a vector component upward in the direction of gravity in the traveling direction of the sound wave.
請求項1記載の自動分析装置において、
前記反応容器中の試薬と試料の混合液の攪拌が音波を使用した攪拌機構によりなされることを特徴とする自動分析装置。
The automatic analyzer according to claim 1,
An automatic analyzer characterized in that stirring of a mixed solution of a reagent and a sample in the reaction vessel is performed by a stirring mechanism using sound waves.
請求項5記載の自動分析装置において、
前記音波照射機構と前記攪拌機構とが一体構造であることを特徴とする自動分析装置。
The automatic analyzer according to claim 5, wherein
The automatic analyzer is characterized in that the sound wave irradiation mechanism and the stirring mechanism are integrated.
請求項1〜5のいずれかに記載の自動分析装置において、
前記反応容器中の混合液を攪拌する攪拌機構と、
前記複数の反応容器の位置を移動させる機構と、
を備え、
更に、前記攪拌機構が反応容器中の混合液を攪拌する反応容器の位置と、
前記音波照射機構が音波を照射する反応容器の位置が異なることを特徴とする自動分析装置。
In the automatic analyzer according to any one of claims 1 to 5,
A stirring mechanism for stirring the mixed solution in the reaction vessel;
A mechanism for moving the positions of the plurality of reaction vessels;
With
Furthermore, the position of the reaction vessel in which the stirring mechanism agitates the mixed solution in the reaction vessel,
An automatic analyzer characterized in that a position of a reaction vessel to which the sound wave irradiation mechanism emits sound waves is different.
請求項1〜5のいずれかに記載の自動分析装置において、
前記反応容器中の混合液を攪拌する攪拌機構と、
前記複数の反応容器の位置を移動させる機構と、
を備え、
更に、前記攪拌機構が反応容器中の混合液を攪拌する反応容器の位置と、
前記音波照射機構が音波を照射する反応容器の位置が同一であることを特徴とする自動分析装置。
In the automatic analyzer according to any one of claims 1 to 5,
A stirring mechanism for stirring the mixed solution in the reaction vessel;
A mechanism for moving the positions of the plurality of reaction vessels;
With
Furthermore, the position of the reaction vessel in which the stirring mechanism agitates the mixed solution in the reaction vessel,
The automatic analyzer is characterized in that the positions of reaction vessels to which the sound wave irradiation mechanism emits sound waves are the same.
JP2002200725A 2002-07-10 2002-07-10 Automatic analyzer Expired - Lifetime JP3914838B2 (en)

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