JP6966337B2 - Chemical analyzer and sonic stirring mechanism used in the chemical analyzer - Google Patents

Description

The present invention relates to a chemical analyzer and a sonic stirring mechanism used in the chemical analyzer.

In the field of chemical and medical analysis, the amount of liquids such as samples and reagents is becoming smaller. In relation to this, as a technique for stirring and mixing a small amount of sample and reagent, Patent Document 1 describes ultrasonic waves from below the container containing the sample and reagent toward the opening of the container without using a spatula or a screw. A technique for non-contact stirring and mixing of a sample and a reagent by irradiating with an ultrasonic wave is described. The device according to this technology is configured to irradiate ultrasonic waves from below the container toward the opening of the container. Further, Patent Document 1 also describes a technique of irradiating a container with ultrasonic waves from below the container and from the side of the container to stir and mix the sample and the reagent in a non-contact manner. The device according to this technology is configured to irradiate ultrasonic waves toward the container from below the container and from the side of the container.

Further, in Patent Document 2, a sound source and a reflector are provided outside the reaction vessel, and a reaction vessel is arranged between the sound source and the reflector, and sound waves are intermittently emitted from a plurality of directions toward the reaction vessel. A technique for efficiently stirring and mixing the liquid in the reaction vessel by irradiating it is described. The device related to this technology utilizes an acoustic flow, which is a flow in which acoustic radiation pressure is dominant near the gas-liquid interface that is not affected by wall friction, and swirls in the reaction vessel in the direction perpendicular to the water surface. It is configured to generate a stirring flow).

Further, Patent Document 3 describes a technique of immersing a sound wave generator in a sample and stirring the sample and a reagent. Further, Patent Document 1 also describes a technique of bringing a sound wave generator into contact with a reaction vessel to stir the sample and the reagent. The device related to these techniques uses a sound wave generator in which a comb-shaped electrode is formed on a piezoelectric substrate. Further, in Patent Document 3, in order to improve the stirring performance, the comb-shaped electrode is provided with a driving frequency of 1.5 to 2.5 times the fundamental frequency f0 defined by the pitch of the comb-shaped electrode. Techniques for using the harmonic frequency given are also described. However, although Patent Document 3 describes the generation direction of the acoustic flow, it does not explain the relationship between the generation timing of the fundamental frequency and the harmonic frequency and the stirring action by the acoustic flow, and is unclear. ing.

Japanese Unexamined Patent Publication No. 8-146007 Japanese Unexamined Patent Publication No. 2006-234839 Japanese Unexamined Patent Publication No. 2009-2918

However, in the prior art described in Patent Document 1, when the amount of liquid such as a sample or a reagent is small, when a strong ultrasonic wave is irradiated from a lower sound wave generating means in an attempt to obtain a strong stirring force, the liquid level of the sample is obtained. There was a possibility that the sample liquid and the like would scatter due to the swelling. Further, in the conventional technique described in Patent Document 1, when the amount of liquid such as a sample or a reagent is small, if the ultrasonic wave emitted from the lower sound wave generating means is too weak, sufficient stirring may not be possible. was there.

Further, the conventional technique described in Patent Document 2 can obtain a strong stirring force. However, even so, the prior art described in Patent Document 2 may not be able to obtain a sufficient swirling flow when the amount of liquid such as a sample or a reagent is small, and may not be able to sufficiently stir. Therefore, improvement in stirring performance has been desired.

Further, in the prior art described in Patent Document 3, when the sound wave generator is immersed in the sample, carryover (mixing phenomenon) to another sample may occur. Further, in the prior art described in Patent Document 3, when the sound wave generator is brought into contact with the reaction vessel, as many sound wave generators as the number of reaction vessels are prepared, or the sound wave is generated in the reaction vessel. The process of contacting the body increases. Therefore, the conventional technique described in Patent Document 3 has low work efficiency. Further, the prior art described in Patent Document 3 has a configuration in which a driving frequency 1.5 to 2.5 times the fundamental frequency f0 is given to the comb-shaped electrode to utilize the harmonic frequency. In some cases, the relationship between the timing of fundamental frequency and harmonic frequency generation and the stirring action of the acoustic flow is unclear. Therefore, the prior art described in Patent Document 3 has room for improving the stirring performance.

The present invention has been made to solve the above-mentioned problems, and includes a chemical analyzer that satisfactorily stirs a sample or a reagent having a small amount of liquid, and a sonic stirring mechanism used in the chemical analyzer. The main purpose is to provide.

In order to achieve the above object, the present invention is a chemical analyzer, which is a sonic stirring mechanism that irradiates a reaction vessel into which a sample and a reagent to be analyzed are injected with a sound wave to stir the analysis target, and the analysis. A measuring instrument for measuring the physical properties of the object is provided, and the sonic stirring mechanism has a piezoelectric element that irradiates a side surface of the reaction vessel with a sound beam, and a thickness vibration waveform of the piezoelectric element becomes a vibration waveform of a basic frequency. The first waveform generator that drives the piezoelectric element and the second waveform that drives the piezoelectric element so that the thickness vibration waveform of the piezoelectric element becomes a vibration waveform having a harmonic frequency that is higher than the fundamental frequency. a waveform generator, wherein the switching device for switching the drive of the piezoelectric element on either one of the waveform generator of the first waveform generator and the second waveform generator, possess, near the gas-liquid interface of the reaction vessel The output intensity is controlled by temporally separating the generation timing of the fundamental frequency sound wave and the harmonic frequency sound wave according to the position of the recess near the gas-liquid interface. By oscillating a sound wave while doing so, the position where the acoustic flow is generated is controlled .
Other means will be described later.

According to the present invention, it is possible to satisfactorily stir a sample, a reagent, or the like having a small amount of liquid.

It is a block diagram which shows schematic the whole structure of the chemical analyzer which concerns on Embodiment 1. FIG. It is a vertical sectional view schematically showing the structure of the sound wave stirring mechanism which concerns on Embodiment 1. FIG. It is a schematic diagram schematically showing the structure of the drive circuit of the sound wave stirring mechanism which concerns on Embodiment 1. FIG. It is a schematic diagram schematically showing the structure of the switch of the sound wave stirring mechanism which concerns on Embodiment 1. FIG. It is a top view which shows the operation example of the sound wave stirring mechanism which concerns on Embodiment 1. It is a graph which shows the relationship between the generation distance of the acoustic flow by the sound wave agitation mechanism which concerns on Embodiment 1 and a resonance frequency. It is explanatory drawing of the operation example of the sound wave stirring mechanism which concerns on Embodiment 2. It is explanatory drawing of the operation example of the sound wave stirring mechanism which concerns on Embodiment 3.

Hereinafter, embodiments of the present invention (hereinafter referred to as “the present embodiments”) will be described in detail with reference to the drawings. It should be noted that each figure is merely shown schematically to the extent that the present invention can be fully understood. Therefore, the present invention is not limited to the illustrated examples. Further, in each figure, common components and similar components are designated by the same reference numerals, and duplicate description thereof will be omitted.

[Embodiment 1]
<Structure of chemical analyzer>
Hereinafter, the configuration of the chemical analyzer 1 according to the first embodiment will be described with reference to FIG. 1. FIG. 1 is a configuration diagram schematically showing the overall configuration of the chemical analyzer 1 according to the first embodiment.

In the example shown in FIG. 1, the chemical analyzer 1 according to the first embodiment includes a reaction disk 3, a constant temperature bath 4, a reaction disk turntable 5, a sample turntable 7, and a reagent turntable 9. A sampling dispensing mechanism 10, a reagent dispensing mechanism 11, a sonic stirring mechanism 12, a photometric mechanism 13, a cleaning mechanism 14, a console 15, and a controller 16 are provided.

The reaction disk 3 is a storage unit for storing the reaction vessel 2. The reaction vessel 2 is a vessel into which a sample, a reagent, or the like to be analyzed (stirring target) is injected.
The constant temperature bath 4 is a water tank that keeps the reaction vessel 2 stored in the reaction disk 3 in a constant temperature state. The reaction disk 3 is installed inside the constant temperature bath 4.
The reaction disk turntable 5 is a storage unit for rotatably storing the reaction disk 3. The reaction disk turntable 5 changes the arrangement position of the reaction vessel 2 by rotating the reaction disk 3.

The sample turntable 7 is a storage unit for storing the sample cup 6. The sample cup 6 is a container in which a sample is housed.
The reagent turntable 9 is a storage unit for storing the reagent bottle 8. The reagent bottle 8 is a container in which the reagent is stored.

The sampling dispensing mechanism 10 is a mechanism for dispensing (supplying) a sample to the reaction vessel 2.
The reagent dispensing mechanism 11 is a mechanism for dispensing (supplying) the reagent to the reaction vessel 2.
The sonic stirring mechanism 12 is a mechanism for stirring a mixture of the sample and the reagent dispensed in the reaction vessel 2. The sound wave stirring mechanism 12 can stir the mixture of the sample and the reagent dispensed in the reaction vessel 2 in a non-contact manner by irradiating the reaction vessel 2 with sound waves. The mixture of the sample and the reagent dispensed into the reaction vessel 2 is not only an object of stirring but also an object of analysis.

The mixture of the sample and the reagent dispensed in the reaction vessel 2 is in a liquid state. Both the sample and the reagent may be in liquid form, or one or both of them may be in powder form, which may be mixed in the liquid solvent.

The photometric mechanism 13 is a measuring instrument that measures the absorbance of a mixture (analysis target) of a sample and a reagent in the reaction vessel 2 as a physical property of a sample or a reagent. The photometric mechanism 13 measures the absorbance of the sample and the reagent during the reaction process and the absorbance after the reaction. However, the chemical analyzer 1 may be configured to include, in place of the photometric mechanism 13, or in addition to the photometric mechanism 13, another measuring instrument for measuring the physical properties of a sample, a reagent, or the like.

The cleaning mechanism 14 is a mechanism for cleaning the reaction vessel 2 after the measurement (analysis) is completed.
The console 15 is a setting unit for setting information such as analysis items and the amount of liquid to be analyzed.
The controller 16 is a control unit that controls the operation of each component.

On the console 15, information such as analysis items and the amount of liquid to be analyzed is set before starting measurement (analysis). The controller 16 controls the operation of each component according to a control program prepared in advance based on the set information.

<Operation of chemical analyzer>
In such a configuration, the chemical analyzer 1 operates as follows. Here, it is assumed that the sample is contained in the sample cup 6 and the reagent is contained in the reagent bottle 8.

First, the sampling dispensing mechanism 10 dispenses the sample contained in the sample cup 6 into the reaction vessel 2.
Next, the reaction disk turntable 5 rotates the reaction disk 3 to place the reaction vessel 2 into which the sample has been dispensed at the reagent dispensing position.
Next, the reagent dispensing mechanism 11 dispenses the reagent contained in the reagent bottle 8 into the reaction vessel 2.

Next, the reaction disk turntable 5 rotates the reaction disk 3 and arranges the reaction vessel 2 into which the sample and the reagent are dispensed at the installation position of the sonic stirring mechanism 12.
Next, the sound wave stirring mechanism 12 irradiates the reaction vessel 2 with sound waves to stir and mix the sample and the reagent in the reaction vessel 2.

Next, the reaction disk turntable 5 rotates the reaction disk 3 and arranges the reaction vessel 2 in which the sample and the reagent are stirred and mixed at the installation position of the photometric mechanism 13.
Next, the photometric mechanism 13 measures the absorbance of the mixture (analysis target) of the sample and the reagent in the reaction vessel 2. The measurement is started from the time when the stirring is completed and is continued until the reaction between the sample and the reagent is completed.

Next, the reaction disk turntable 5 rotates the reaction disk 3 to arrange the reaction vessel 2 containing the mixture of the sample and the reagent (analysis target) at the installation position of the cleaning mechanism 14.
Next, the cleaning mechanism 14 sucks the mixture (analysis target) of the sample and the reagent in the reaction vessel 2 to perform the cleaning treatment of the reaction vessel 2.

The chemical analyzer 1 performs such a series of processes for a plurality of samples in batch processing one by one under the control of the controller 16.

<Structure of sonic stirring mechanism>
The chemical analyzer 1 is characterized by including a sound wave stirring mechanism 12 described below. Hereinafter, the configuration of the sound wave stirring mechanism 12 will be described with reference to FIGS. 2 to 4. FIG. 2 is a vertical sectional view schematically showing the configuration of the sound wave stirring mechanism 12. FIG. 3 is a schematic diagram schematically showing the configuration of the drive circuit 25 of the sound wave stirring mechanism 12. FIG. 4 is a schematic view schematically showing the configuration of the switch 35 of the sonic stirring mechanism 12.

As shown in FIG. 2, the sound wave stirring mechanism 12 includes a constant temperature bath 4, a sound wave generating means 20, and a sound wave reflecting means 41.

The constant temperature bath 4 is a water tank in which the constant temperature water 18 is filled. A part of the reaction vessel 2 is submerged in the constant temperature water 18. The constant temperature bath 4 keeps the reaction vessel 2 in a constant temperature state with the constant temperature water 18.
The sound wave generating means 20 is a mechanism for generating a sound wave to be applied to the reaction vessel 2.
The sound wave reflecting means 41 is a member that reflects sound waves.

The sound wave generating means 20 includes a stirring element 21 and a drive circuit 25.
The stirring element 21 is an element that functions as a sound source for irradiating the reaction vessel 2 with sound waves. The stirring element 21 has its side surface 21f as a radiation surface of sound waves, and emits sound waves from the side surface 21f.
The drive circuit 25 is a circuit for driving the stirring element 21. The drive circuit 25 is arranged outside the constant temperature bath 4 and is connected to the stirring element 21 via wiring.

The stirring element 21 has a piezoelectric element 22, a ground side electrode 23, and a segment electrode 24.
The piezoelectric element 22 is an element that causes a stress change (thickness vibration phenomenon) when a voltage is applied and converts electric vibration into mechanical vibration. The stirring element 21 generates sound waves by utilizing the thickness vibration phenomenon of the piezoelectric element 22.
The ground side electrode 23 is an electrode on the side connected to the ground.
The segment electrode 24 is an electrode that is divided into a plurality of electrodes and arranged in an array. The segment electrodes 24 can be driven independently of each other.

In the first embodiment, the ground side electrode 23 is configured as a single electrode and is arranged on the surface of the piezoelectric element 22 facing the reaction vessel 2. On the other hand, the segment electrode 24 is configured as a plurality of divided electrodes, and is arranged in an array on the surface of the piezoelectric element 22 on the side not facing the reaction vessel 2. Therefore, the stirring element 21 has a configuration in which one side electrode is divided.

The stirring element 21 and the sound wave reflecting means 41 are provided along the inner wall of the constant temperature bath 4 filled with the constant temperature water 18 so as to face each other via the reaction vessel 2.

In the first embodiment, the sound wave stirring mechanism 12 generates sound waves by the piezoelectric element 22 of the stirring element 21, irradiates the sound waves from the side surface 21f of the stirring element 21 toward the reaction vessel 2, and passes through the reaction vessel 2. The sound wave is reflected by the sound wave reflecting means 41 and the reaction vessel 2 is irradiated again.

The sound wave reflecting means 41 has a structure in which the reflecting surface is inclined so that the traveling direction of the sound wave reflected by the sound wave reflecting means 41 is a direction without a liquid surface.

The sound wave emitted from the stirring element 21 is emitted toward the side surface of the reaction vessel 2. The sound wave propagates inside the constant temperature water 18 in the constant temperature bath 4, is transmitted to the reaction vessel 2, and is incident on the reaction vessel 2. Further, the sound wave that has passed through the reaction vessel 2 propagates inside the constant temperature water 18 in the constant temperature bath 4, reaches the sound wave reflecting means 41, and is reflected by the sound wave reflecting means 41. Then, the reflected sound wave is again applied to the reaction vessel 2. At this time, the reflected sound wave is irradiated toward the lower side of the side surface of the reaction vessel 2. At that time, the reflected sound wave propagates inside the constant temperature water 18 in the constant temperature bath 4, is transmitted to the reaction vessel 2, and is incident on the reaction vessel 2.

The sound wave incident on the reaction vessel 2 propagates inside the liquid to be measured 17 filled in the reaction vessel 2 to generate an acoustic flow 61 (acoustic straight flow) at the gas-liquid interface. The liquid to be measured 17 is a liquid of a mixture of a sample and a reagent to be agitated (analyzed). The acoustic flow 61 presses the liquid 17 to be measured in the direction of the white arrow to generate a stirring flow 62 at the position 62s. The stirring flow 62 stirs the sample and the reagent in the liquid to be measured 17 by pressing the liquid 17 to be measured in the direction of the solid arrow.

In the first embodiment, the sound wave generated by the piezoelectric element 22 is an ultrasonic wave of 16,000 Hz or more, and the sound wave stirring mechanism 12 uses the ultrasonic wave to mix (stir) the sample and the reagent in the reaction vessel 2. The subject) will be described as being agitated. However, the sound wave stirring mechanism 12 can use not only ultrasonic waves but also sound waves of less than 16,000 Hz as long as the stirring target can be sufficiently stirred. Therefore, the present invention includes the case where the stirring target is stirred using a sound wave of less than 16,000 Hz.

FIG. 3 shows a specific configuration of the drive circuit 25 of the sound wave stirring mechanism 12. As shown in FIG. 3, the drive circuit 25 includes a controller 31, a fundamental frequency waveform generator 32, a harmonic frequency waveform generator 33, an amplifier 34, and a switch 35.

The controller 31 is a functional means for controlling the overall operation of the drive circuit 25. The controller 31 is connected to the controller 16 (see FIG. 1).

The fundamental frequency waveform generator 32 is a functional means for generating a voltage signal having a fundamental frequency waveform.
The harmonic frequency waveform generator 33 is a functional means for generating a voltage signal having a waveform having a harmonic frequency higher than the fundamental frequency.
The amplifier 34 is a functional means for amplifying the voltage signal output from the fundamental frequency waveform generator 32 or the harmonic frequency waveform generator 33.
The switch 35 is a functional means for switching the drive of the piezoelectric element 22 to the waveform generator of either the fundamental frequency waveform generator 32 or the harmonic frequency waveform generator 33.

The fundamental frequency waveform generator 32 functions as a first waveform generator that drives the piezoelectric element 22 so that the thickness vibration waveform of the piezoelectric element 22 becomes the vibration waveform of the fundamental frequency.
Further, the harmonic frequency waveform generator 33 serves as a second waveform generator that drives the piezoelectric element 22 so that the thickness vibration waveform of the piezoelectric element 22 becomes a vibration waveform having a harmonic frequency having a frequency higher than the fundamental frequency. Function.

FIG. 4 shows a specific configuration of the switch 35. As shown in FIG. 4, the switch 35 has a plurality of wirings 35a, switches 35b, and wirings 35c, respectively. The wirings 35a and 35c and the switch 35b each correspond to each of the segment electrodes 24 of the stirring element 21 and are arranged in parallel. The wiring 35a is connected to the amplifier 34 and the switch 35b. It is connected to the wiring 35c, the switch 35b, and the segment electrode 24.

The switch 35 switches ON / OFF of each switch 35b by inputting a switching signal from the controller 31 via wiring (not shown). As a result, a voltage signal is output (applied) to the segment electrode 24 at an arbitrary position of the stirring element 21. A transistor such as a MOSFET is used for the switch 35b.

In such a configuration, the controller 31 of the drive circuit 25 receives control information 101 (see FIG. 2) from the controller 16 (see FIG. 1). Information 101 (see FIG. 2) includes, for example, the amount of liquid of the stirring target (analysis target) in the reaction vessel 2 (that is, the amount of the sample and the reagent dispensed in the reaction vessel 2) and the stirring target (analysis). Information such as the timing of stirring the target).

The controller 31 (see FIGS. 3 and 4) is the liquid level of the liquid to be measured 17 (see FIG. 2) which is the stirring target (analysis target) filled in the reaction vessel 2 from the information 101 (see FIG. 2). The height is calculated, and the optimum irradiation area 52 of the sound wave 51 including the liquid level is determined.

When the controller 31 determines the irradiation region 52, the controller 31 selects the segment electrode 24 corresponding to the irradiation region 52 from the plurality of segment electrodes 24. The selected segment electrode 24 is an electrode at a site where a sound wave is output. The controller 31 intensively drives the portion of the selected segment electrode 24 with respect to the piezoelectric element 22 of the stirring element 21.

When the segment electrode 24 corresponding to the irradiation region 52 is selected, the controller 31 controls the fundamental frequency waveform generator 32 to generate a voltage signal of the fundamental frequency at a desired timing and output it to the amplifier 34. Further, the controller 31 controls the harmonic frequency waveform generator 33 to generate a voltage signal of the harmonic frequency at a desired timing and output it to the amplifier 34.

The amplifier 34 amplifies the voltage signal output from the fundamental frequency waveform generator 32 or the harmonic frequency waveform generator 33 and outputs it to the switch 35. The controller 31 controls the switch 35 to output (apply) the voltage signal output from the amplifier 34 to the segment electrode 24 corresponding to the irradiation region 52. The piezoelectric element 22 of the stirring element 21 vibrates at the location where the segment electrode 24 to which the voltage signal is input (applied) is arranged due to the thickness vibration phenomenon. As a result, the stirring element 21 irradiates the reaction vessel 2 (particularly, the irradiation region 52) with sound waves.

When the fundamental frequency voltage signal output from the fundamental frequency waveform generator 32 and amplified by the amplifier 34 is input (applied), the stirring element 21 irradiates a sound wave having a waveform corresponding to the amplitude of the fundamental frequency voltage signal. .. Hereinafter, the period of irradiating a sound wave having a waveform corresponding to the amplitude of a voltage signal having a fundamental frequency is referred to as a “basic mode”.

Further, when the harmonic frequency voltage signal output from the harmonic frequency waveform generator 33 and amplified by the amplifier 34 is input (applied), the stirring element 21 has a waveform corresponding to the amplitude of the harmonic frequency voltage signal. Irradiate the sound of. Hereinafter, the period of irradiating the sound wave of the waveform corresponding to the amplitude of the voltage signal of the harmonic frequency is referred to as “harmonic mode”.

The voltage signal input (applied) from the drive circuit 25 to the piezoelectric element 22 has an amplitude-modulated waveform in the basic mode and the harmonic mode. Therefore, the waveform of the irradiated sound wave changes in the basic mode and the harmonic mode according to the change in the amplitude of the voltage signal.

As described above, the sound wave irradiated from the stirring element 21 propagates inside the constant temperature water 18 in the constant temperature bath 4, is transmitted to the reaction vessel 2, and is incident on the reaction vessel 2. Further, the sound wave that has passed through the reaction vessel 2 propagates inside the constant temperature water 18 in the constant temperature bath 4, reaches the sound wave reflecting means 41, and is reflected by the sound wave reflecting means 41. Then, the reflected sound wave is again applied to the reaction vessel 2. At that time, the reflected sound wave propagates inside the constant temperature water 18 in the constant temperature bath 4, is transmitted to the reaction vessel 2, and is incident on the reaction vessel 2.

By the way, as shown in FIGS. 2 to 4, the sound wave stirring mechanism 12 is configured to use a stirring element 21 in which a plurality of segment electrodes 24 are arranged in an array with respect to one piezoelectric element 22 as a sound source. There is.

Then, as shown in FIGS. 3 and 4, the sound wave stirring mechanism 12 selectively applies a voltage signal (generated waveform) to the segment electrode 24 corresponding to the desired irradiation region 52 by using the switch 35. It is possible to selectively vibrate any part of the piezoelectric element 22.

Such a sound wave stirring mechanism 12 is a single stirring element 21 and realizes a sound source functionally equivalent to a sound source having a configuration in which a plurality of piezoelectric elements 22 are arranged in an array. Further, the stirring element 21 of the first embodiment can be easily mass-produced, and the manufacturing time can be shortened by molding the electrode pattern by screen printing or the like. Therefore, the sound wave stirring mechanism 12 can realize cost reduction.

Further, since the stirring element 21 has an extremely simple structure, the reliability of the sound wave stirring mechanism 12 can be improved. Further, since the size of the stirring element 21 is significantly smaller than that of the stirring mechanism for moving a stirring rod such as a conventional spatula with a robot arm, the size of the entire sonic stirring mechanism 12 can be reduced. ..

<Principle of generating acoustic flow>
Here, the principle that the acoustic flow 61 is generated in the reaction vessel 2 will be described.
As shown in FIG. 2, when a sound wave is incident on the reaction vessel 2, the sound wave propagates inside the liquid to be measured 17 filled in the reaction vessel 2 and reaches the gas-liquid interface (free liquid surface). Reach. Generally, when a sound wave propagating in a liquid reaches the free liquid surface, a force (acoustic radiation pressure is the main factor) that causes the liquid to jump out to the gas side acts on the liquid. As a result, the acoustic flow 61 is generated at the gas-liquid interface (free liquid surface). The acoustic flow 61 further generates a stirring flow 62 at the position 62s.

The sound wave stirring mechanism 12 according to the present embodiment can control the force of ejecting the liquid to the gas side by switching between the basic mode and the harmonic mode and changing the waveform of the sound wave.

To generate the acoustic flow 61, the voltage signals generated in the basic mode and the harmonic mode are excited with a large amplitude, and the harmonics are generated so that the distortion of the waveform at the gas-liquid interface caused by the nonlinear phenomenon in the sound wave propagation process becomes large. It is necessary to increase the energy ratio of the wave mode.

Here, the generation distance Xs of the acoustic flow 61 is given by the following equation (1). The generation distance Xs of the acoustic flow 61 is the distance from the side surface 21f of the stirring element 21, which is the radiation surface of the sound wave, to the generation position of the acoustic flow 61. The distance generated by Xs will be described later with reference to FIGS. 5 and 6.
Xs = C0 / (βωM)… (1)
Here, C0 is the speed of sound of the propagation medium. Also, β is a non-linear coefficient. Further, ω is an angular frequency (where ω = 2πf: f is the resonance frequency of the sound wave). Further, M is a Mach number (acoustic Mach number).

As can be seen from the equation (1), the generation distance Xs of the acoustic flow 61 can be changed by changing the angular frequency ω (that is, the resonance frequency f of the sound wave).

Hereinafter, the relationship between the generation distance Xs of the acoustic flow 61 and the resonance frequency f of the sound wave will be described with reference to FIGS. 5 and 6. FIG. 5 is a top view schematically showing an operation example of the sound wave stirring mechanism 12 according to the first embodiment. FIG. 6 is a graph showing the relationship between the generation distance Xs of the acoustic flow 61 by the sound wave stirring mechanism 12 and the resonance frequency f of the sound wave.

FIG. 5 shows the operating state of the sound wave stirring mechanism 12 as seen from above. The rectangle shown in FIG. 5 schematically shows the reaction vessel 2. Here, the stirring element 21 will be described as having a piezoelectric element 22 having a uniform thickness. Further, the x direction will be described as the propagation direction of the sound wave, and the y direction will be described as the extending direction of the side surface 21f (radiating surface of the sound wave) of the stirring element 21 (piezoelectric element 22).

Here, as a sonic stirring mechanism of a virtual comparative example, it is assumed that a sonic stirring mechanism having a configuration in which only one type of voltage signal having a fundamental frequency f1 can be applied from the drive circuit 25 to the piezoelectric element 22.

The sound wave stirring mechanism of such a virtual comparative example oscillates a sound wave 51 having a waveform corresponding to the fundamental frequency f1 by applying a voltage signal having a fundamental frequency f1 from the drive circuit 25 to the piezoelectric element 22. The sound wave 51 irradiates the reaction vessel 2 with the same phase and the same wavelength in the x direction.

At this time, in the comparative example, the position where the acoustic flow 61 is generated inside the reaction vessel 2 is a constant position x2 in the x direction from the position y1 in the y direction to the position y2. Therefore, in the comparative example, the distance Mold from the side surface 21f of the stirring element 21 to the generation position x2 of the acoustic flow 61 is the generation distance Xs of the acoustic flow 61.

On the other hand, the sound wave stirring mechanism 12 according to the first embodiment has a configuration in which two types of voltage signals having a fundamental frequency f1 and a harmonic frequency f2 can be applied from the drive circuit 25 to the piezoelectric element 22. ..

Such a sound wave stirring mechanism 12 according to the first embodiment applies a voltage signal having a fundamental frequency f1 from the drive circuit 25 to the piezoelectric element 22 in the basic mode to generate a sound wave 51 having a waveform corresponding to the fundamental frequency f1. It oscillates. The sound wave 51 having a waveform corresponding to the fundamental frequency f1 irradiates the reaction vessel 2 with the same phase and the same wavelength in the x direction. Further, the sound wave stirring mechanism 12 according to the first embodiment applies a voltage signal having a harmonic frequency f2 from the drive circuit 25 to the piezoelectric element 22 in the harmonic mode, so that the sound wave has a waveform corresponding to the harmonic frequency f2. Oscillate 51. The sound wave 51 having a waveform corresponding to the harmonic frequency f2 irradiates the reaction vessel 2 with the same phase and the same wavelength in the x direction.

In the first embodiment, in the basic mode, the position where the acoustic flow 61 is generated inside the reaction vessel 2 is a constant position in the x direction from the position y1 in the y direction to the position y2, as in the comparative example. It becomes x2. Therefore, in the comparative example, the distance Mold from the side surface 21f of the stirring element 21 to the generation position x2 of the acoustic flow 61 is the generation distance Xs of the acoustic flow 61.

As described above, the generation distance Xs of the acoustic flow 61 can be changed by changing the angular frequency ω (that is, the resonance frequency f of the sound wave). The relationship between the generation distance Xs of the acoustic flow 61 and the resonance frequency f of the sound wave is as shown in FIG. That is, the higher the resonance frequency f of the sound wave, the shorter the generation distance Xs of the acoustic flow 61.

Therefore, in the first embodiment, in the harmonic mode, the position where the acoustic flow 61 is generated inside the reaction vessel 2 is agitated in the x direction from the position y1 in the y direction to the position y2, rather than the position x2. It is a fixed position x1 close to the element 21 (piezoelectric element 22). Therefore, in the first embodiment, the distance Lnew from the side surface 21f of the stirring element 21 to the generation position x1 of the acoustic flow 61 is the generation distance Xs of the acoustic flow 61.

Therefore, as shown in FIG. 5, in the first embodiment, the generation distance Xs of the acoustic flow 61 becomes closer to the stirring element 21 (piezoelectric element 22) as the resonance frequency f of the sound wave becomes higher. That is, the sound wave stirring mechanism 12 according to the first embodiment can shorten the generation distance Xs of the acoustic flow 61 in the harmonic mode as compared with the basic mode. As a result, the sound wave stirring mechanism 12 according to the first embodiment brings the position where the acoustic flow 61 is generated inside the reaction vessel 2 closer to the stirring element 21 (piezoelectric element 22) in the harmonic mode than in the basic mode. Can be done.

Such a sound wave stirring mechanism 12 according to the first embodiment changes the frequency of the sound wave applied from the drive circuit 25 to the piezoelectric element 22 to either the fundamental frequency f1 or the harmonic frequency f2. Thereby, the sound wave stirring mechanism 12 can properly use the basic mode and the harmonic mode. Then, the sound wave stirring mechanism 12 can set the generation position of the acoustic flow 61 to the position x2 on the side far from the stirring element 21 (piezoelectric element 22) in the basic mode. Further, the sound wave stirring mechanism 12 can set the generation position of the acoustic flow 61 to the position x1 on the far side close to the stirring element 21 (piezoelectric element 22) in the harmonic mode.

The sound wave stirring mechanism 12 according to the first embodiment can have a range in the generation distance Xs of the acoustic flow 61 by properly using the basic mode and the harmonic mode. For example, when the side surface 21f of the stirring element 21 is the origin, the position x1 from the side surface 21f is about 7 mm, and the position x2 from the side surface 21f is about 12 mm, the sound wave stirring mechanism 12 is the acoustic flow 61. With respect to the generation distance Xs, a width of about 5 mm can be provided by "(x2-x1)".

In the first embodiment, it is desirable that the waveform of the voltage signal applied from the drive circuit 25 to the piezoelectric element 22 is a waveform of a single frequency f1 and f2 in the basic mode and the harmonic mode, respectively. Further, it is desirable that the harmonic frequency is an integral multiple (for example, twice) of the fundamental frequency. As a result, the sonic stirring mechanism 12 can efficiently control the amount of change in the sonic energy used for stirring, and can improve the stirring force.

Such a sound wave stirring mechanism 12 according to the first embodiment changes the generation distance Xs of the acoustic flow 61 by properly using the basic mode and the harmonic mode, and the acoustic flow 61 inside the reaction vessel 2. The position of occurrence can be changed. As a result, the sonic stirring mechanism 12 can obtain a sufficient swirling flow inside the reaction vessel 2. As a result, the sonic stirring mechanism 12 can satisfactorily stir a sample, a reagent, or the like having a small amount of liquid. Further, the chemical analyzer 1 according to the first embodiment can satisfactorily stir a sample or a reagent having a small amount of liquid by using the sonic stirring mechanism 12.

The sound wave stirring mechanism 12 can be configured to alternately execute the basic mode and the harmonic mode depending on the operation. Further, the sonic stirring mechanism 12 may be configured to intermittently and continuously execute the basic mode with a stop period in between. Further, the sonic stirring mechanism 12 may be configured to intermittently and continuously execute the harmonic mode with a stop period in between.

As described above, according to the sonic stirring mechanism 12 according to the first embodiment and the chemical analyzer 1 using the sonic stirring mechanism 12, it is possible to satisfactorily stir a sample or a reagent having a small amount of liquid.

[Embodiment 2]
In the second embodiment, sound wave stirring is performed by intensively irradiating the vicinity of the gas-liquid interface 17t with sound waves in accordance with the height of the gas-liquid interface 17t (see FIG. 7) of the liquid to be measured 17 housed in the reaction vessel 2. It provides the mechanism 12A.

Hereinafter, the details of the sound wave stirring mechanism 12A according to the second embodiment will be described with reference to FIG. 7. FIG. 7 is an explanatory diagram of an operation example of the sound wave stirring mechanism 12A according to the second embodiment. Here, the x direction is the propagation direction of the sound wave, and the z direction is the vertical direction (the height direction of the gas-liquid interface 17t).

The sonic stirring mechanism 12A according to the second embodiment has the same configuration as the sonic stirring mechanism 12 (see FIGS. 1 to 4) of the first embodiment.

However, unlike the sound wave stirring mechanism 12 of the first embodiment, the sound wave stirring mechanism 12A according to the second embodiment can limit the direction in which the sound wave is oscillated from the stirring element 21. Then, as shown in FIG. 7, the sonic stirring mechanism 12A according to the second embodiment is in the vicinity of the gas-liquid interface 17t in accordance with the height of the gas-liquid interface 17t of the liquid to be measured 17 housed in the reaction vessel 2. The stirring element 21 is driven so as to irradiate the sound wave intensively. Hereinafter, the portion of the stirring element 21 that is intensively driven is referred to as a “centralized drive unit 21Co”.

As shown in FIG. 7, the sound wave stirring mechanism 12A according to the second embodiment irradiates the sound wave 51 from the stirring element 21 of the centralized drive unit 21Co toward the reaction vessel 2. When the irradiated sound wave 51 reaches the reaction vessel 2, it is incident on the reaction vessel 2. The sound wave incident on the reaction vessel 2 propagates inside the liquid to be measured 17 filled in the reaction vessel 2 toward the position xb in the x direction and the position z1 in the z direction. Then, the sound wave 51 collides with the gas-liquid interface 17t of the liquid to be measured 17, and an acoustic flow 61 is generated at the gas-liquid interface 17t.

At this time, the sound wave 51 that collides with the gas-liquid interface 17t of the liquid to be measured 17 presses the gas-liquid interface 17t of the liquid to be measured 17 in the direction of the solid arrow to efficiently compress the liquid to be measured 17. As a result, the liquid to be measured 17 is in a compressed state near the gas-liquid interface 17t and is in an uncompressed state in other parts. As a result, the acoustic flow 61 flows from the vicinity of the gas-liquid interface 17t in the compressed state toward the vicinity of the bottom surface of the reaction vessel 2 in the uncompressed state. As a result, the stirring force of the acoustic flow 61 is increased.

That is, the sound wave stirring mechanism 12A according to the second embodiment can efficiently shake the gas-liquid interface 17t by intensively irradiating the vicinity of the gas-liquid interface 17t of the liquid to be measured 17 with sound waves. Therefore, the sonic stirring mechanism 12A according to the second embodiment can improve the stirring power as compared with the sonic stirring mechanism 12 of the first embodiment. As a result, the sonic stirring mechanism 12A according to the second embodiment can stir the sample or reagent having a small amount of liquid more satisfactorily than the sonic stirring mechanism 12 according to the first embodiment.

As described above, according to the sonic stirring mechanism 12A according to the second embodiment, it is possible to stir the sample or reagent having a small amount of liquid more satisfactorily than the sonic stirring mechanism 12 of the first embodiment.

[Embodiment 3]
In the third embodiment, the sound wave that generates the acoustic flow 61 at different positions according to the position of the recess Bt (see FIG. 8) formed at the gas-liquid interface 17t of the liquid to be measured 17 housed in the reaction vessel 2. It provides a stirring mechanism 12B.

Hereinafter, the details of the sound wave stirring mechanism 12B according to the third embodiment will be described with reference to FIG. FIG. 8 is an explanatory diagram of an operation example of the sound wave stirring mechanism 12B according to the third embodiment. Here, the x direction is the propagation direction of the sound wave, and the z direction is the vertical direction (the height direction of the gas-liquid interface 17t).

The sonic stirring mechanism 12B according to the third embodiment has the same configuration as the sonic stirring mechanism 12A of the second embodiment.

However, unlike the sonic stirring mechanism 12A of the second embodiment, the sonic stirring mechanism 12B according to the third embodiment has the position of the recess Bt formed at the gas-liquid interface 17t of the liquid to be measured 17 housed in the reaction vessel 2. The structure is such that the acoustic flow 61 is generated at different positions according to the above.

That is, in the sound wave stirring mechanism 12B according to the third embodiment, the generation timing of the sound wave of the fundamental frequency f1 and the sound wave of the harmonic frequency f2 is matched with the position of the recess Bt formed at the gas-liquid interface 17t of the liquid to be measured 17. Is separated in time. The sound wave stirring mechanism 12B according to the third embodiment is configured to control the generation position of the acoustic flow 61 by oscillating the sound wave while controlling the output intensity of the sound wave.

For example, as shown in FIG. 8A, the gas-liquid interface 17t of the liquid to be measured 17 housed in the reaction vessel 2 sways, and the recess Bt of the gas-liquid interface 17t is located at the position xa in the x direction and in the z direction. It is assumed that it occurs at the position z1. The position xa in the x direction and the position z1 in the z direction are positions close to the stirring element 21. In this case, the sound wave stirring mechanism 12B sets the mode to the harmonic mode and generates a sound wave having a harmonic frequency f2. Then, the sound wave stirring mechanism 12B controls the sound wave generation timing and the output intensity so that the acoustic flow 61 is generated at the position xa in the x direction and the position z1 in the z direction.

Here, the sound wave stirring mechanism 12B controls the generation position of the acoustic flow 61 by setting the frequency of the sound wave to the harmonic frequency f2 and controlling the generation timing of the sound wave. However, the sound wave stirring mechanism 12B can also control the generation position of the acoustic flow 61 by increasing the sound pressure of the sound wave in accordance with the sound wave generation timing.

Further, for example, as shown in FIG. 8 (b), the gas-liquid interface 17t of the liquid to be measured 17 housed in the reaction vessel 2 shakes, and the recess Bt of the gas-liquid interface 17t is positioned at the x direction xc and z. It is assumed that it occurs at the position z1 in the direction. The position xc in the x direction and the position z1 in the z direction are positions far from the stirring element 21. In this case, the sound wave stirring mechanism 12B sets the mode as the basic mode and generates a sound wave having a fundamental frequency f1. Then, the sound wave stirring mechanism 12B controls the sound wave generation timing and the output intensity so that the acoustic flow 61 is generated at the position xc in the x direction and the position z1 in the z direction.

Here, the sound wave stirring mechanism 12B controls the generation position of the acoustic flow 61 by setting the frequency of the sound wave to the fundamental frequency f1 and controlling the generation timing of the sound wave. However, the sound wave stirring mechanism 12B can also control the generation position of the acoustic flow 61 by reducing the sound pressure of the sound wave in accordance with the sound wave generation timing.

The sound wave stirring mechanism 12B according to the third embodiment controls the generation position of the acoustic flow 61 according to the position of the recess Bt of the gas-liquid interface 17t (that is, the shape of the liquid surface of the liquid 17 to be measured). .. As a result, the sonic stirring mechanism 12B according to the third embodiment can further improve the stirring power as compared with the sonic stirring mechanism 12A of the second embodiment. Therefore, the sonic stirring mechanism 12B according to the third embodiment can stir the sample or reagent having a small amount of liquid more satisfactorily than the sonic stirring mechanism 12A of the second embodiment.

The device described in Patent Document 2 described above utilizes an acoustic flow in which the acoustic radiation pressure is dominant in the vicinity of the gas-liquid interface which is not affected by the wall surface friction, and the gas-liquid interface has an acoustic flow. It is configured to irradiate sound waves when it is within the generation position.

On the other hand, the sound wave stirring mechanism 12B according to the third embodiment changes the resonance frequency f of the sound wave in time according to the flow of the gas-liquid interface 17t. As a result, the sonic stirring mechanism 12B according to the third embodiment can increase the sonic energy used for stirring as compared with the apparatus described in Patent Document 2 described above. Therefore, the sonic stirring mechanism 12B according to the third embodiment can improve the stirring power as compared with the apparatus described in Patent Document 2 described above.

The flow characteristics of the gas-liquid interface 17t are determined by the size and shape of the reaction vessel 2, the sound velocity and viscosity of the liquid to be measured 17, the amount of reagents, and the like. Therefore, in the third embodiment, it is assumed that the stirring specification information such as the frequency of the sound wave and the irradiation timing is input to the console 15 (see FIG. 1) in advance according to these factors. Then, at the time of stirring, the controller 16 (see FIG. 1) appropriately reads the stirring specification information from the console 15 (see FIG. 1), and based on the read stirring specification information, the sonic stirring mechanism 12B performs desired stirring control. It is advisable to configure it so that

Alternatively, the sonic stirring mechanism 12B according to the third embodiment is provided with a detection mechanism (not shown) for detecting the liquid level of the liquid to be measured 17 in the reaction vessel 2 with a high-speed camera or the like, and the liquid read by this detection mechanism. The surface information may be processed by the controller 31 and fed back to the oscillation control of the sound wave.

The sound wave stirring mechanism 12B according to the third embodiment monitors the position of bubbles in the reaction vessel 2 with, for example, a high-speed camera, and when the stirring is completed, the position of the bubbles in the reaction vessel 2 is reached. It is preferable to irradiate a sound wave having a fundamental frequency f1 or a sound wave having a harmonic frequency f2 at the end of stirring.

For example, the sound wave stirring mechanism 12B according to the third embodiment is piezoelectric to the fundamental frequency waveform generator 32 when bubbles are generated in the reaction vessel 2 on the side far from the piezoelectric element 22 at the end of stirring. It is preferable to temporarily drive the element 22 and then stop the drive.

That is, in the sound wave stirring mechanism 12B according to the third embodiment, when the air bubbles are generated in the reaction vessel 2 on the side far from the piezoelectric element 22 at the end of stirring, the piezoelectric element is finally generated at the fundamental frequency f1. It is preferable to make the 22 vibrate.

Further, the sound wave stirring mechanism 12B according to the third embodiment is used in the harmonic frequency waveform generator 33 when bubbles are generated in the reaction vessel 2 on the side close to the piezoelectric element 22 at the end of stirring. It is preferable to temporarily drive the piezoelectric element 22 and then stop the drive.

That is, the sound wave stirring mechanism 12B according to the third embodiment is finally piezoelectric at the harmonic frequency f2 when bubbles are generated in the reaction vessel 2 on the side close to the piezoelectric element 22 at the end of stirring. The element 22 may be vibrated.

In the case of these configurations, the sound wave stirring mechanism 12B according to the third embodiment adjusts to the position of the bubbles in the reaction vessel 2 at the end of the stirring, and at the end of the stirring, the sound wave of the fundamental frequency f1 or A sound wave having a harmonic frequency f2 can be irradiated. As a result, in the case of these configurations, the sound wave stirring mechanism 12B can intensively apply vibration to the liquid surface in the vicinity of the bubbles, so that the bubbles can be efficiently removed.

As described above, according to the sonic stirring mechanism 12B according to the third embodiment, it is possible to stir the sample or reagent having a small amount of liquid more satisfactorily than the sonic stirring mechanism 12A of the second embodiment.

The present invention is not limited to the above-described embodiment, and includes various modifications. For example, the above-described embodiment has been described in detail in order to explain the present invention in an easy-to-understand manner, and is not necessarily limited to the one including all the described configurations. Further, it is possible to replace a part of the configuration of the embodiment with another configuration, and it is also possible to add another configuration to the configuration of the embodiment. In addition, it is possible to add / delete / replace a part of each configuration with another configuration.

Further, for example, the sonic stirring mechanism 12 can be used for an apparatus other than the chemical analyzer 1.
Further, for example, in the above-described embodiment, in the stirring element 21, the ground side electrode 23 is arranged on the surface of the voltage element 22 on the side close to the reaction vessel 2, and the stirring element 21 is segmented on the surface of the voltage element 22 on the side far from the reaction vessel 2. The electrode 24 is arranged. However, in the stirring element 21, the ground side electrode (single electrode) and the segment electrode can be arranged in reverse as long as they can be sufficiently waterproofed. That is, the stirring element 21 is configured such that the segment electrode 24 is arranged on the surface of the voltage element 22 near the reaction vessel 2 and the ground side electrode 23 is arranged on the surface of the voltage element 22 far from the reaction vessel 2. Can be done.

1 Chemical analyzer 2 Reaction vessel 3 Reaction disk 4 Constant temperature bath (water tank)
5 Turntable for reaction disk 6 Sample cup 7 Turntable for sample 8 Reagent bottle 9 Turntable for reagent 10 Sampling dispensing mechanism 11 Reagent dispensing mechanism 12 Sonic stirring mechanism 13 Photometric mechanism (measuring instrument)
14 Cleaning mechanism 15 Console 16 Controller 17 Liquid to be measured 17t Air-liquid interface 18 Constant temperature water 20 Sound wave generating means 21 Stirring element (sound source)
21co Centralized drive unit 21f Side of sound source 22 Piezoelectric element 23 Ground side electrode (single electrode)
24 segment electrodes 25 drive circuit 31 controller 32 fundamental frequency waveform generator (first waveform generator)
33 Harmonic frequency waveform generator (second waveform generator)
34 Amplifier 35 Switch 35a Wiring 35b Switch 35c Wiring 41 Sound wave reflecting means 51 Sound wave 52 Irradiation area 61 Acoustic flow 62 Stirring flow 62s Stirring flow generation position 101 Information Bt Recessed Mold Sound wave generation distance Lnew Sound wave generation distance

Claims (4)

A sound wave stirring mechanism that agitates the analysis target by irradiating the reaction vessel into which the sample to be analyzed and the reagent are injected with sound waves.
A measuring instrument for measuring the physical properties of the analysis target is provided.
The sonic stirring mechanism is
A piezoelectric element that irradiates the side surface of the reaction vessel with sound waves,
A first waveform generator that drives the piezoelectric element so that the thickness vibration waveform of the piezoelectric element becomes a vibration waveform of a fundamental frequency.
A second waveform generator that drives the piezoelectric element so that the thickness vibration waveform of the piezoelectric element becomes a vibration waveform having a harmonic frequency that is higher than the fundamental frequency.
Have a, a switch for switching the driving of the piezoelectric element on either one of the waveform generator of the first waveform generator and the second waveform generator,
Sound waves can be intensively applied to the vicinity of the gas-liquid interface in the reaction vessel, and the timing of generation of the fundamental frequency sound wave and the harmonic frequency sound wave is set according to the position of the recess near the gas-liquid interface. A chemical analyzer characterized in that the position where an acoustic flow is generated is controlled by oscillating sound waves while controlling the output intensity by separating them. In the chemical analyzer according to claim 1,
The sonic stirring mechanism temporarily causes the first waveform generator to temporarily drive the piezoelectric element when bubbles are generated in the reaction vessel on the side far from the piezoelectric element at the end of stirring. A chemical analyzer characterized by stopping the drive after the operation. In the chemical analyzer according to claim 1 or 2.
The sonic stirring mechanism temporarily causes the second waveform generator to temporarily drive the piezoelectric element when bubbles are generated in the reaction vessel on the side close to the piezoelectric element at the end of stirring. A chemical analyzer characterized by stopping the drive after the operation. A piezoelectric element that irradiates the side surface of the reaction vessel containing the object to be agitated with sound waves,
A first waveform generator that drives the piezoelectric element so that the thickness vibration waveform of the piezoelectric element becomes a vibration waveform of a fundamental frequency.
A second waveform generator that drives the piezoelectric element so that the thickness vibration waveform of the piezoelectric element becomes a vibration waveform having a harmonic frequency that is higher than the fundamental frequency.
Have a, a switch for switching the driving of the piezoelectric element on either one of the waveform generator of the first waveform generator and the second waveform generator,
Sound waves can be intensively applied to the vicinity of the gas-liquid interface in the reaction vessel, and the timing of generation of the fundamental frequency sound wave and the harmonic frequency sound wave is set according to the position of the recess near the gas-liquid interface. A sound wave stirring mechanism characterized in that the position where an acoustic flow is generated is controlled by oscillating a sound wave while controlling the output intensity by separating the sound waves.

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