JP3978050B2 - Surface treatment layer for turbo molecular pump - Google Patents
Surface treatment layer for turbo molecular pump Download PDFInfo
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- JP3978050B2 JP3978050B2 JP2002053871A JP2002053871A JP3978050B2 JP 3978050 B2 JP3978050 B2 JP 3978050B2 JP 2002053871 A JP2002053871 A JP 2002053871A JP 2002053871 A JP2002053871 A JP 2002053871A JP 3978050 B2 JP3978050 B2 JP 3978050B2
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- molecular pump
- surface treatment
- turbo molecular
- electroless
- treatment layer
- Prior art date
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- 239000002335 surface treatment layer Substances 0.000 title claims description 23
- 229910000838 Al alloy Inorganic materials 0.000 claims description 15
- 150000002222 fluorine compounds Chemical class 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 11
- 229940070337 ammonium silicofluoride Drugs 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 39
- 238000007747 plating Methods 0.000 description 31
- 239000010408 film Substances 0.000 description 23
- 238000005260 corrosion Methods 0.000 description 19
- 230000007797 corrosion Effects 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 238000007872 degassing Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- IBZGBXXTIGCACK-UHFFFAOYSA-N 6,7,9,11-tetrahydroxy-9-(2-hydroxyacetyl)-4-methoxy-8,10-dihydro-7h-tetracene-5,12-dione Chemical compound C1C(O)(C(=O)CO)CC(O)C2=C1C(O)=C1C(=O)C(C=CC=C3OC)=C3C(=O)C1=C2O IBZGBXXTIGCACK-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- -1 magnesium fluorosilicate Chemical compound 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
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- Chemical Treatment Of Metals (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、半導体製造設備の排気ラインなどにおいて使用されるターボ分子ポンプ用表面処理層に関する。
【0002】
【従来の技術】
この種のターボ分子ポンプの概略構造を図3に示す。ターボ分子ポンプは、ケーシング1の上部に吸気口2、ケーシング1の下部に排気口3を設け、ロータ4に設けた動翼5をケーシング1に設けた静翼6間の空間内で高速回転させることにより、排気作用を発揮させて吸気口2側を高真空にするものである。7は駆動用のモータである。
【0003】
このターボ分子ポンプでは通常、翼材として、軽量、低コスト、強度などの面からアルミニウム合金が用いられている。しかし、アルミニウム合金は、半導体製造工程で排出される塩素ガスなど腐食性ガス環境下では著しく腐食するため、優れた耐食処理を表面に施す必要がある。また、翼材に不可欠なもう一つの条件として、熱放射性(放射率)が高いことが挙げられる。その理由は、通常の対流による熱放散を期待できない高真空下で、ロータの高速回転により発生する大量の熱を放射で逃がす必要があるからである。
【0004】
従来、アルミニウム合金よりなるターボ分子ポンプ用の内部部品の表面処理技術として、以下に示すような種々のものが知られている。
【0005】
(1)基材表面に陽極酸化処理により酸化皮膜を形成するもの。
(2)基材表面に無電解Niめっき層を形成するもの。
(3)基材表面に無電解Niめっき層を形成し、その上にエポキシ層を形成するもの。
(4)基材表面にセラミック等の微粒子を分散させた無電解Ni分散めっき層を形成するもの。
(5)基材表面に無電解黒色Niめっき層を形成するもの。
【0006】
【発明が解決しようとする課題】
しかし、上述した(1)〜(5)の技術のうち、(1)は、安価で放射率が高いものの、空孔が無数にあるため脱ガスが多く耐食性が弱い欠点がある。
(2)は、耐食性は高いものの、放射率が低い欠点がある。
(3)は、エポキシ層の付加により、放射率及び耐食性は高くできるものの、プラズマ環境に弱い欠点がある。
(4)は、放射率及び耐食性は高いものの、コストがかかる欠点がある。
(5)は、放射率は高いものの、耐食性が劣る欠点がある。
【0007】
このように、上述した従来の技術は一長一短あり、ターボ分子ポンプ用の内部部品の材料として、最適な条件を充分満足するまでには至っていなかった。
【0008】
本発明は、上記事情を考慮し、高い耐食性・熱放射性を持つと共に耐プラズマ性も高く、しかも安価に実現し得るターボ分子ポンプ用表面処理層を提供することを目的とする。
【0009】
【課題を解決するための手段】
請求項1の発明のターボ分子ポンプ用表面処理層は、ターボ分子ポンプの内部部品である動翼または静翼に形成された表面処理層であって、フッ素化合物及びケイフッ化アンモニウムを含む処理液に、アルミニウムまたはアルミニウム合金よりなる基材を浸漬して、70〜100℃の温度範囲で処理することにより、前記基材表面にフッ素化合物の皮膜を形成してなり、放射率εを0.7〜0.8程度に設定したことを特徴とする。
【0010】
ターボ分子ポンプの内部部品に形成された表面処理層には、高い耐食性と高い熱放射性を持たせることが必要であるが、アルミニウムまたはアルミニウム合金よりなる基材の表面に、上記の処理によってフッ素化合物の皮膜を形成することにより、耐食性と放射率とを共に高めたターボ分子ポンプ用表面処理層を得ることができる。因みに、放射率εは0.7〜0.8程度に設定することができる。また、上記の皮膜は、厚さを非常に薄く(約3μm)することが可能であり、部品の寸法変化を少なくできる。従って、予め皮膜厚さを考慮して基材の寸法設計をする必要がなくなる。また、上記の皮膜は、ポーラスではないので、反応性ガスに接しても脱ガスの心配がない。また、酸素プラズマに対する耐久度も高いし、前述の処理液に浸漬するだけで皮膜形成できるから、極めて簡単且つ安価に実現し得る。
【0011】
参考例に係るターボ分子ポンプ用表面処理層は、ターボ分子ポンプの内部部品に形成された表面処理層であって、アルミニウムまたはアルミニウム合金よりなる基材の表面に、無電解Niめっき層と無電解黒色Niめっき層の2層重ねの皮膜を形成してなることを特徴とする。
【0012】
ターボ分子ポンプの内部部品に形成された表面処理層には、高い耐食性と高い熱放射性を持たせることが必要であるが、アルミニウムまたはアルミニウム合金よりなる基材の表面に、無電解Niめっき層と無電解黒色Niめっき層の2層重ねの皮膜を形成することにより、耐食性と放射率とを共に高めたターボ分子ポンプ用表面処理層を得ることができる。この場合は、耐食性は主に無電解Niめっき層で受け持ち、熱放射性は無電解黒色Niめっき層で受け持つ。即ち、無電解Niめっき層の熱放射率の低さを無電解黒色Niめっき層が補い、無電解黒色Niめっき層の耐食性の低さを無電解Niめっき層が補うことになり、両者の長所を生かすことができる。また、両層とも金属めっき層であるから、従来のようにエポキシ樹脂をコーティングした場合と違い、酸素プラズマ等のプラズマ環境にも強くなる上、安価なコーティングが可能である。
【0013】
【発明の実施の形態】
以下、本発明の実施形態を図面に基づいて説明する。実施形態として示す表面処理層は、半導体製造システムで使用するターボ分子ポンプの動翼あるいは静翼を構成するものである。
【0014】
本発明の実施形態として示す表面処理層は、フッ素化合物及びケイフッ化アンモニウムを含む処理液(加熱水溶液)に、アルミニウムまたはアルミニウム合金よりなる基材を浸漬して、70〜100℃の温度範囲で処理することにより、図1に示すように、アルミニウムまたはアルミニウム合金よりなる基材11の表面にフッ素化合物の皮膜12を形成してなるものである。
【0015】
ここで使用する処理液(加熱水溶液)としては、水100重量部に対し、フッ素化合物0.1〜20重量部(好ましくは0.2〜15重量部)、及び、ケイフッ化アンモニウム0.05〜15重量部(好ましくは0.1〜10重量部)を含むものを使用するのがよい。また、フッ素化合物としては、ケイフッ化アンモニウム((NH4)2SiF6)を除くフッ素化合物を使用するものとし、ケイフッ化塩、特にケイフッ化マグネシウムMgSiF6・6H2Oを用いるのが好ましい。その他には、ケイフッ化亜鉛(ZnSiF6・6H2O)、ケイフッ化カリウム(K2SiF6),ケイフッ化ソーダ(Na2SiF6),ケイフッ化マンガン(MnSiF6・6H2O)等のケイフッ化塩、ホウフッ化塩、フッ化ジルコニウム塩またはフッ化チタン塩などが挙げられる。これらのフッ素化合物の中でも、ケイフッ化塩が好ましく用いられ、特にケイフッ化マグネシウム、ケイフッ化マンガン等が好ましく用いられる。
【0016】
このような処理液を用いることによって、アルミニウムまたはアルミニウム合金の表面に、均一な薄さの耐食性及び熱放射性に優れた皮膜を形成することができる。因みに、放射率εは0.7〜0.8程度に設定することができる。また、上記の皮膜は、厚さを非常に薄く(約3μm)することが可能であり、部品の寸法変化を少なくできる。従って、予め皮膜厚さを考慮して基材の寸法設計をする必要がなくなる。また、上記の皮膜は、ポーラスではない(空孔を持たない)ので、反応性ガスに接しても脱ガスの心配がない。また、酸素プラズマに対する耐久度も高いし、前述の処理液に浸漬するだけで皮膜形成できるから、極めて簡単且つ安価にターボ分子ポンプ用として優れた表面処理層を提供し得る。
【0017】
なお、前記処理液において、フッ素化合物が0.1重量部未満の場合、あるいはケイフッ化アンモニウムが0.05重量部未満の場合には、反応が遅くなり、処理時間が長くなってしまうので好ましくない。一方、フッ素化合物が20重量部を超える場合、あるいはケイフッ化アンモニウムが15重量部を超える場合には、溶解が困難となるため好ましくない。
【0018】
また、アルミニウムまたはアルミニウム合金よりなる基材を浸漬する際の処理液の温度は、通常70℃〜100℃の範囲内であり、好ましくは75℃〜99℃の範囲内、より好ましくは80℃〜98℃の範囲内に設定するのが望ましい。処理液の温度が70℃未満であるような温度の低い場合には、反応が遅くなり、処理時間が長くなってしまうので好ましくない。一方、処理液の温度が100℃を超えてしまうような高い温度の場合には、処理液の蒸発が多くなってしまうので好ましくない。処理時間については、成膜反応は約1分間程度で終了するため、2分間程度の浸漬を行えば、表面処理としては十分である。但し、この皮膜は保護作用があるので、一旦成膜した後は30分以上浸漬しておいても何ら問題は生じない。
【0019】
参考例として示す表面処理層は、図2に示すように、アルミニウムまたはアルミニウム合金よりなる基材21の表面に、無電解Niめっき層22と無電解黒色Niめっき層23の2層重ねの皮膜24を形成してなるものである。この表面処理層においては、下地に無電解Niめっき層22を形成し、その上に無電解黒色Niめっき層23を形成する。
【0020】
このようにアルミニウム基材21の表面に、無電解Niめっき層22と無電解黒色Niめっき層23の2層重ねの皮膜24を形成することにより、耐食性と放射率とを共に高めた表面処理層を提供することができる。この場合、無電解Niめっき層22の熱放射率の低さを無電解黒色Niめっき層23が補い、無電解黒色Niめっき層23の耐食性の低さを無電解Niめっき層22が補うことができるので、両者の長所を生かした、耐食性と放射率の高いターボ分子ポンプ用の材料を得ることができる。また、両層とも金属めっき層であるから、従来のようにエポキシ樹脂をコーティングした場合と違い、酸素プラズマ等のプラズマ環境にも強くなる上、安価なコーティングが可能である。
【0021】
【発明の効果】
以上説明したように、請求項1の発明のターボ分子ポンプ用表面処理層は、フッ素化合物及びケイフッ化アンモニウムを含む処理液に、アルミニウムまたはアルミニウム合金よりなる基材を浸漬して、70〜100℃の温度範囲で処理することにより、前記基材表面にフッ素化合物の皮膜を形成してなるものであるため、耐食性と放射率とを共に高めることができる。しかも、前記の皮膜を薄くできるので、部品の寸法変化を少なくでき、予め皮膜厚さを考慮して基材の寸法設計をする必要がなくなる。また、前記の皮膜はポーラスではないので、反応性ガスに接しても脱ガスの心配がない。また、酸素プラズマに対する耐久度も高いし、前述の処理液に浸漬するだけで皮膜形成できるから、極めて簡単且つ安価に実現し得る利点がある。
【0022】
参考例のターボ分子ポンプ用表面処理層は、アルミニウムまたはアルミニウム合金よりなる基材の表面に、無電解Niめっき層と無電解黒色Niめっき層の2層重ねの皮膜を形成してなるものであるため、耐食性と放射率とを共に高めることができる。また、両層とも金属めっき層であるから、酸素プラズマ等のプラズマ環境にも強くなる上、安価なコーティングが可能である。
【図面の簡単な説明】
【図1】 本発明の実施形態の表面処理層の拡大断面図である。
【図2】 参考例の表面処理層の拡大断面図である。
【図3】 ターボ分子ポンプの概略構成図である。
【符号の説明】
11,21 アルミニウムまたはアルミニウム合金よりなる基材
12 フッ素化合物の皮膜
22 無電解Niめっき層
23 無電解黒色Niめっき層
24 2層重ねの皮膜[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a surface treatment layer for a turbo molecular pump used in an exhaust line of a semiconductor manufacturing facility.
[0002]
[Prior art]
A schematic structure of this type of turbomolecular pump is shown in FIG. The turbo molecular pump is provided with an intake port 2 in the upper part of the casing 1 and an
[0003]
In this turbo molecular pump, an aluminum alloy is usually used as a blade material from the viewpoints of light weight, low cost, strength, and the like. However, since aluminum alloys corrode significantly in a corrosive gas environment such as chlorine gas discharged in the semiconductor manufacturing process, it is necessary to perform excellent corrosion resistance treatment on the surface. In addition, another requirement indispensable for the wing material is high thermal radiation (emissivity). The reason is that a large amount of heat generated by high-speed rotation of the rotor needs to be released by radiation under a high vacuum where heat dissipation due to normal convection cannot be expected.
[0004]
Conventionally, various types of surface treatment techniques for internal parts of turbomolecular pumps made of an aluminum alloy are known as shown below.
[0005]
(1) An oxide film is formed on the surface of a base material by anodization.
(2) An electroless Ni plating layer is formed on the substrate surface.
(3) An electroless Ni plating layer is formed on the substrate surface, and an epoxy layer is formed thereon.
(4) Forming an electroless Ni-dispersed plating layer in which fine particles such as ceramic are dispersed on the surface of a substrate.
(5) An electroless black Ni plating layer is formed on the substrate surface.
[0006]
[Problems to be solved by the invention]
However, among the above-described techniques (1) to (5), although (1) is inexpensive and has high emissivity, there are a number of voids, and therefore there is a drawback in that degassing is large and corrosion resistance is weak.
Although (2) has high corrosion resistance, it has a drawback of low emissivity.
Although (3) can increase emissivity and corrosion resistance by adding an epoxy layer, it has a disadvantage that it is weak in the plasma environment.
Although (4) has high emissivity and corrosion resistance, it has a drawback of cost.
Although (5) has a high emissivity, it has a drawback of poor corrosion resistance.
[0007]
As described above, the above-described conventional technique has advantages and disadvantages, and has not yet fully satisfied the optimum conditions as a material for internal parts for a turbo molecular pump.
[0008]
In view of the above circumstances, an object of the present invention is to provide a surface treatment layer for a turbo molecular pump that has high corrosion resistance and thermal radiation, high plasma resistance, and can be realized at low cost.
[0009]
[Means for Solving the Problems]
The surface treatment layer for a turbo molecular pump according to the invention of claim 1 is a surface treatment layer formed on a moving blade or a stationary blade that is an internal component of the turbo molecular pump, and is a treatment liquid containing a fluorine compound and ammonium silicofluoride. , by immersing the aluminum or made of an aluminum alloy substrate, by treatment in a temperature range of 70 to 100 ° C., Ri Na to form a film of the fluorine compound to the substrate surface, the emissivity epsilon 0.7 It is set to about 0.8 .
[0010]
The surface treatment layer formed on the internal part of the turbo molecular pump needs to have high corrosion resistance and high heat radiation. By forming this film, it is possible to obtain a surface treatment layer for a turbo molecular pump that has both improved corrosion resistance and emissivity. Incidentally, the emissivity ε can be set to about 0.7 to 0.8. Further, the above-mentioned film can be made very thin (about 3 μm), and the dimensional change of the parts can be reduced. Therefore, it is not necessary to design the dimensions of the substrate in consideration of the film thickness in advance. Further, since the above film is not porous, there is no fear of degassing even when it comes into contact with the reactive gas. Moreover, since the durability against oxygen plasma is high, and a film can be formed only by immersing in the above-mentioned treatment solution, it can be realized extremely easily and inexpensively.
[0011]
A surface treatment layer for a turbo molecular pump according to a reference example is a surface treatment layer formed on an internal part of a turbo molecular pump, and an electroless Ni plating layer and an electroless layer are formed on the surface of a substrate made of aluminum or an aluminum alloy. It is characterized by forming a two-layered film of black Ni plating layers.
[0012]
The surface treatment layer formed on the internal parts of the turbo molecular pump needs to have high corrosion resistance and high heat radiation, but the electroless Ni plating layer is formed on the surface of the substrate made of aluminum or aluminum alloy. By forming a two-layered film of the electroless black Ni plating layer, a surface treatment layer for a turbo molecular pump with improved corrosion resistance and emissivity can be obtained. In this case, corrosion resistance is mainly handled by the electroless Ni plating layer, and thermal radiation is handled by the electroless black Ni plating layer. That is, the electroless Ni plating layer compensates for the low thermal emissivity of the electroless Ni plating layer, and the electroless Ni plating layer compensates for the low corrosion resistance of the electroless black Ni plating layer. Can be used. In addition, since both layers are metal plating layers, unlike the conventional case of coating with an epoxy resin, it is resistant to a plasma environment such as oxygen plasma and inexpensive coating is possible.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. The surface treatment layer shown as an embodiment constitutes a moving blade or a stationary blade of a turbo molecular pump used in a semiconductor manufacturing system.
[0014]
The surface treatment layer shown as an embodiment of the present invention is a treatment in a temperature range of 70 to 100 ° C. by immersing a base material made of aluminum or an aluminum alloy in a treatment liquid (heating aqueous solution) containing a fluorine compound and ammonium silicofluoride. By doing so, as shown in FIG. 1, the film | membrane 12 of a fluorine compound is formed in the surface of the base material 11 which consists of aluminum or an aluminum alloy.
[0015]
As the treatment liquid (heating aqueous solution) used here, 0.1 to 20 parts by weight (preferably 0.2 to 15 parts by weight) of a fluorine compound and 0.05 to 0.05 part of ammonium silicofluoride with respect to 100 parts by weight of water. It is good to use what contains 15 weight part (preferably 0.1-10 weight part). Further, as the fluorine compound, a fluorine compound other than ammonium silicofluoride ((NH 4 ) 2 SiF 6 ) is used, and it is preferable to use a silicofluoride salt, particularly magnesium fluorosilicate MgSiF 6 · 6H 2 O. Other examples include silicon fluoride such as zinc silicofluoride (ZnSiF 6 .6H 2 O), potassium silicofluoride (K 2 SiF 6 ), sodium silicofluoride (Na 2 SiF 6 ), manganese silicofluoride (MnSiF 6 · 6H 2 O), and the like. Salt, borofluoride, zirconium fluoride, titanium fluoride, and the like. Among these fluorine compounds, silicofluoride salts are preferably used, and magnesium silicofluoride, manganese silicofluoride, and the like are particularly preferably used.
[0016]
By using such a treatment liquid, a uniform thin film having excellent corrosion resistance and thermal radiation can be formed on the surface of aluminum or an aluminum alloy. Incidentally, the emissivity ε can be set to about 0.7 to 0.8. Further, the above-mentioned film can be made very thin (about 3 μm), and the dimensional change of the parts can be reduced. Therefore, it is not necessary to design the dimensions of the substrate in consideration of the film thickness in advance. Further, since the above film is not porous (has no pores), there is no fear of degassing even when it comes into contact with the reactive gas. Moreover, since the durability against oxygen plasma is high, and a film can be formed just by immersing in the above-mentioned treatment solution, an excellent surface treatment layer for a turbo molecular pump can be provided very easily and inexpensively.
[0017]
In the treatment liquid, when the fluorine compound is less than 0.1 parts by weight, or when the ammonium silicofluoride is less than 0.05 parts by weight, the reaction becomes slow and the treatment time becomes long. . On the other hand, when the fluorine compound exceeds 20 parts by weight, or when the ammonium silicofluoride exceeds 15 parts by weight, dissolution becomes difficult, which is not preferable.
[0018]
In addition, the temperature of the treatment liquid when dipping a substrate made of aluminum or an aluminum alloy is usually within a range of 70 ° C to 100 ° C, preferably within a range of 75 ° C to 99 ° C, more preferably 80 ° C to It is desirable to set within the range of 98 ° C. When the temperature of the treatment liquid is low such that it is less than 70 ° C., the reaction becomes slow and the treatment time becomes long. On the other hand, when the temperature of the processing liquid is high such that it exceeds 100 ° C., evaporation of the processing liquid increases, which is not preferable. Regarding the processing time, since the film formation reaction is completed in about 1 minute, soaking for about 2 minutes is sufficient for the surface treatment. However, since this film has a protective action, no problem arises even if it is immersed for 30 minutes or more after it is once formed.
[0019]
As shown in FIG. 2, the surface treatment layer shown as a reference example is a two-
[0020]
Thus, by forming the two-layered
[0021]
【The invention's effect】
As described above, the surface treatment layer for the turbo molecular pump according to the first aspect of the present invention is obtained by immersing a base material made of aluminum or an aluminum alloy in a treatment liquid containing a fluorine compound and ammonium silicofluoride, and having a temperature of 70 to 100 ° C. By treating in the above temperature range, a film of a fluorine compound is formed on the surface of the substrate, so that both corrosion resistance and emissivity can be improved. In addition, since the film can be thinned, the dimensional change of the parts can be reduced, and it is not necessary to design the dimensions of the base material in advance by considering the film thickness. Moreover, since the said film | membrane is not porous, there is no worry of degassing even if it contacts with reactive gas. Moreover, since the durability against oxygen plasma is high and a film can be formed only by immersing in the above-described processing solution, there are advantages that can be realized extremely easily and inexpensively.
[0022]
The surface treatment layer for the turbo molecular pump of the reference example is formed by forming a two-layered film of an electroless Ni plating layer and an electroless black Ni plating layer on the surface of a substrate made of aluminum or an aluminum alloy. Therefore, both corrosion resistance and emissivity can be improved. In addition, since both layers are metal plating layers, they are resistant to a plasma environment such as oxygen plasma and can be coated inexpensively.
[Brief description of the drawings]
1 is an enlarged cross-sectional view of the surface treatment layer of the implementation of the invention.
FIG. 2 is an enlarged cross-sectional view of a surface treatment layer of a reference example .
FIG. 3 is a schematic configuration diagram of a turbo molecular pump.
[Explanation of symbols]
11, 21 Base material made of aluminum or aluminum alloy 12 Fluorine compound coating 22 Electroless Ni plating layer 23 Electroless black
Claims (1)
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| JP2002053871A JP3978050B2 (en) | 2002-02-28 | 2002-02-28 | Surface treatment layer for turbo molecular pump |
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| JP2002053871A JP3978050B2 (en) | 2002-02-28 | 2002-02-28 | Surface treatment layer for turbo molecular pump |
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| JP2007120846A Division JP4508208B2 (en) | 2007-05-01 | 2007-05-01 | Surface treatment layer for turbo molecular pump |
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| JP3978050B2 true JP3978050B2 (en) | 2007-09-19 |
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| RU2278073C1 (en) * | 2004-10-11 | 2006-06-20 | Институт химии Дальневосточного отделения Российской академии наук (статус государственного учреждения) (Институт химии ДВО РАН) | Method for synthesis of inorganic fluorine-containing compounds |
| CN112710406B (en) * | 2021-01-19 | 2022-07-08 | 核工业理化工程研究院 | Method for measuring temperature of inner surface of molecular pump |
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