JP4010994B2 - Method for producing laminate of oxygen radical-containing calcium aluminate film - Google Patents
Method for producing laminate of oxygen radical-containing calcium aluminate film Download PDFInfo
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- 229910052760 oxygen Inorganic materials 0.000 title claims description 67
- 239000001301 oxygen Substances 0.000 title claims description 67
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 title claims description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- -1 oxygen ion Chemical class 0.000 claims description 59
- 239000000843 powder Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 25
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 13
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 13
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 claims description 10
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 6
- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 claims description 6
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 6
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 claims description 6
- 229910001938 gadolinium oxide Inorganic materials 0.000 claims description 5
- 229940075613 gadolinium oxide Drugs 0.000 claims description 5
- 229910001954 samarium oxide Inorganic materials 0.000 claims description 5
- 229940075630 samarium oxide Drugs 0.000 claims description 5
- 238000000034 method Methods 0.000 description 22
- 239000000463 material Substances 0.000 description 17
- 239000002994 raw material Substances 0.000 description 13
- 230000003647 oxidation Effects 0.000 description 11
- 238000007254 oxidation reaction Methods 0.000 description 11
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 10
- 238000007751 thermal spraying Methods 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 239000011575 calcium Substances 0.000 description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 8
- 239000000292 calcium oxide Substances 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- 238000005507 spraying Methods 0.000 description 8
- 239000010416 ion conductor Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 229910052791 calcium Inorganic materials 0.000 description 6
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000010304 firing Methods 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- 238000007750 plasma spraying Methods 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 238000003746 solid phase reaction Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 235000012255 calcium oxide Nutrition 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 235000019738 Limestone Nutrition 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- 241001125862 Tinca tinca Species 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910001570 bauxite Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229940043430 calcium compound Drugs 0.000 description 1
- 150000001674 calcium compounds Chemical class 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 235000011116 calcium hydroxide Nutrition 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009694 cold isostatic pressing Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000001362 electron spin resonance spectrum Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000006028 limestone Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000005837 radical ions Chemical class 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000007582 slurry-cast process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229940043774 zirconium oxide Drugs 0.000 description 1
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- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Description
本発明は、酸化触媒、イオン伝導体などの用途展開が期待されている、活性酸素種であるO2 −やO−の酸素ラジカルを高濃度に含み、これらのラジカルイオンの高いイオン伝導性を示すカルシウムアルミネート膜の積層体の製造方法に関する。 The present invention is an oxidation catalyst, applications expand, such as an ion conductor is expected, O 2 is active oxygen species - and O - includes oxygen radicals in high concentrations, high ionic conductivity of these radical ions The present invention relates to a method for manufacturing a laminate of calcium aluminate films.
O2 −やO−の酸素ラジカルは、活性酸素の1種であり、有機物や無機物の酸化過程で重要な役割を果たすことが知られている。酸化物化合物の固体表面上に吸着したO2 −については、広範な研究が行われている(非特許文献1参照)。
この研究では、γ線などの高エネルギーの放射線を酸化物化合物表面に照射することでO2 −を作成している。 In this research, O 2 − is created by irradiating the surface of an oxide compound with high-energy radiation such as γ rays.
O2 −を構成アニオンとする結晶はRO2(R=アルカリ金属)が知られているが、これらの化合物はいずれも300℃以下の低温で容易に分解してしまうため、酸化触媒、イオン伝導体などの用途には使用できない。 RO 2 (R = alkali metal) is known as a crystal having O 2 − as a constituent anion. However, since these compounds are easily decomposed at a low temperature of 300 ° C. or lower, an oxidation catalyst, ion conduction It cannot be used for purposes such as body.
1970年にH.B.Bartlらは、12CaO・7Al2O3(以下、C12A7という)結晶においては、2分子を含む単位胞にある66個の酸素のうち、2個はネットワークに含まれず、結晶の中に存在するケージ内の空間に「フリー酸素」として存在すると主張している(非特許文献2参照)。
また、細野らは、CaCO3とAl2O3またはAl(OH)3を原料として空気中で1200℃の温度で固相反応により合成したC12A7結晶中に1×1019/cm3程度のO2 −が包接されていることを電子スピン共鳴の測定から発見し、フリー酸素の一部がO2 −の形でゲージ内に存在するというモデルを提案している(非特許文献3参照)。
C12A7は、融点1415℃の安定な酸化物であり、包接されるO2 −の量を増加させ、連続的な取り込み、放出が可能となれば、酸化触媒、イオン伝導体などとしての用途が開けるものと期待できる。 C 12 A 7 is a stable oxide with a melting point of 1415 ° C. If the amount of O 2 — included is increased and continuous uptake and release are possible, it can be used as an oxidation catalyst, ion conductor, etc. Can be expected to open up applications.
細野らは更に、前記O2 −を包接するC12A7について検討を行い、CaCO3、Ca(OH)2又はCaOと、Al2O3又はAl(OH)3とを原料に用い、酸素分圧104Pa以上、水蒸気分圧102Pa以下の乾燥酸化雰囲気下、1200℃以上1415℃未満に焼成し、固相反応させることで、活性酸素種であるO2 −及びO−を1020/cm3以上の高濃度で包接するC12A7を得ている(特許文献1参照)。
しかし、細野らの見いだした高濃度に活性酸素種を含有するC12A7を産業上利用する場合、更に解決するべき課題がある。 However, when C 12 A 7 containing active oxygen species at a high concentration found by Hosono et al. Is used industrially, there is a problem to be further solved.
すなわち、高濃度の酸素ラジカルを含有するC12A7を、酸化触媒、イオン伝導体用途に適用する場合、当該用途に応じた機能を充分発揮させるためには、それぞれの用途に適合した様々な形態とする必要がある。 That is, when C 12 A 7 containing a high concentration of oxygen radicals is applied to an oxidation catalyst or an ion conductor, various functions suitable for each application can be used in order to fully exhibit the function corresponding to the use. It needs to be in form.
C12A7を粉末形態で使用する場合以外は、形態の付与はC12A7を焼結させることによってなされるのが一般的である。焼結体は、原料となるC12A7粉末またはカルシウム化合物とアルミニウム化合物との混合粉末を、金型等を用いて所定の形状に成形した後に焼成することによって、製造することができる。しかし、大面積の板状品等の大型品を製造する際には大規模な成形機や焼成炉が必要になるため、高価なものとなってしまう。 Except when C 12 A 7 is used in powder form, the form is generally imparted by sintering C 12 A 7 . The sintered body can be produced by firing a C 12 A 7 powder or a mixed powder of a calcium compound and an aluminum compound as a raw material into a predetermined shape using a mold or the like and then firing. However, when a large-sized product such as a plate-shaped product with a large area is manufactured, a large-scale molding machine and a firing furnace are required, which is expensive.
この対策として、大面積化が比較的容易なC12A7の膜を、酸素イオン導電性を有する基材上に形成させて積層体を作製することが考えられる。膜形成の具体的な方法として、スパッタ法やレーザーアブレイシブ法などの物理気相蒸着(PVD)法、ゾルゲル法あるいは化学気相蒸着(CVD)法等が挙げられるが、それぞれに問題点があった。 As a countermeasure, it is conceivable to form a laminate by forming a C 12 A 7 film, which is relatively easy to increase in area, on a base material having oxygen ion conductivity. Specific methods of film formation include physical vapor deposition (PVD) methods such as sputtering and laser abrasive methods, sol-gel methods, and chemical vapor deposition (CVD) methods. there were.
つまり、PVD法やゾルゲル法で得られるC12A7膜は非晶質であり、そのままでは酸素ラジカルを包接することができない。酸素ラジカルを高濃度に包接できる結晶質のC12A7とするためには、成膜後さらに1000℃以上の高温で熱処理する必要がある。 That is, the C 12 A 7 film obtained by the PVD method or the sol-gel method is amorphous and cannot include oxygen radicals as it is. In order to obtain crystalline C 12 A 7 that can include oxygen radicals at a high concentration, it is necessary to further heat-treat at a high temperature of 1000 ° C. or higher after film formation.
CVD法によれば結晶質のC12A7を直接成膜することが可能であるが、基材は1000℃以上の高温に保持せねばならない。従ってC12A7膜と基材との熱膨張係数が一致しないと、冷却時に膜が基材から剥離したり、膜にクラックが発生したりする。 Although it is possible to directly form crystalline C 12 A 7 by the CVD method, the substrate must be kept at a high temperature of 1000 ° C. or higher. Accordingly, if the thermal expansion coefficients of the C 12 A 7 film and the substrate do not match, the film peels off from the substrate during cooling or cracks occur in the film.
以上のように、前記の方法では、酸素ラジカルを高濃度に包接できる結晶質のC12A7膜を得るための基材は、1000℃以上の高温に耐え、高温でC12A7と反応せず、さらにC12A7と熱膨張係数が一致するものでなければならず、基材の材質が大幅に制限されている。 As described above, in the above-described method, the substrate for obtaining a crystalline C 12 A 7 film that can include oxygen radicals at a high concentration can withstand a high temperature of 1000 ° C. or higher, and C 12 A 7 It must not react and must have a coefficient of thermal expansion that matches C 12 A 7 , which greatly limits the material of the substrate.
C12A7膜の有する前記の問題点に対しては、溶射法と呼ばれる膜形成法を用いる場合に解決できるが、かかる場合においても基材として、酸化触媒やイオン伝導体の作動に適する高温下での酸素イオン導電性が大なるものを用いなければ、O2 −やO−などの酸素ラジカルイオンを速やかにC12A7膜に供給することができず、酸素ラジカルの連続的な取り込みや放出が不充分な積層体になるので、酸化触媒やイオン伝導体に用いることが困難になってしまう。 The above problems of the C 12 A 7 film can be solved by using a film forming method called a thermal spraying method, but even in such a case, the substrate is used as a substrate at a high temperature suitable for the operation of an oxidation catalyst or an ion conductor. Without using a material having a large oxygen ion conductivity below, oxygen radical ions such as O 2 − and O − cannot be rapidly supplied to the C 12 A 7 film, and oxygen radicals are continuously taken up. In other words, it becomes difficult to use it as an oxidation catalyst or an ion conductor.
酸素イオン導電性を有する基材としては、酸化イットリウムで安定化した酸化ジルコニウム(YSZ)が一般的であるが、これとC12A7膜との積層体の酸素イオン伝導度は、700℃において1×10−2S・cm−1程度に過ぎず、充分なものとは言えない。 As a base material having oxygen ion conductivity, zirconium oxide (YSZ) stabilized with yttrium oxide is generally used. The oxygen ion conductivity of a laminate of this and a C 12 A 7 film is 700 ° C. It is only about 1 × 10 −2 S · cm −1 and cannot be said to be sufficient.
本発明者らは、基材とC12A7膜との積層体の有する前記の問題点に対し、特定の材質の基材を用いたときにのみ解決でき、酸素イオン導電性に優れる積層体が容易に再現性高く得られること見出し、本発明に至ったものである。 The present inventors can solve the above-mentioned problems of the laminate of the base material and the C 12 A 7 film only when a base material of a specific material is used, and a laminate excellent in oxygen ion conductivity. Is easily obtained with high reproducibility, and the present invention has been achieved.
即ち、本発明は、基材上に酸素ラジカル含有カルシウムアルミネート膜を形成してなる積層体であって、前記基材が酸化スカンジウムで安定化した酸化ジルコニウム又は酸化サマリウム若しくは酸化ガドリニウムを添加した酸化セリウムの何れかの焼結体であり、しかも前記焼結体のかさ密度が5.5〜7.0g/cm 3 であって、前記酸素ラジカル含有カルシウムアルミネート膜が酸素ラジカル含有カルシウムアルミネート粉末を用いて溶射して成ることを特徴とする積層体の製造方法である。 That is, the present invention is a laminate formed by forming an oxygen radical-containing calcium aluminate film on a substrate, wherein the substrate is oxidized by adding zirconium oxide, samarium oxide or gadolinium oxide stabilized with scandium oxide. any of the sintered body der cerium is, moreover bulk density of the sintered body is a 5.5~7.0g / cm 3, wherein the oxygen radical-containing calcium aluminate film is an oxygen radical containing calcium aluminate A method for producing a laminate, which is obtained by thermal spraying using powder.
さらに、本発明は、700℃における酸素イオン伝導度が、5×10−2S・cm−1以上であることを特徴とする前記の酸素ラジカル含有カルシウムアルミネート膜の積層体の製造方法である。 Furthermore, the present invention is the above-described method for producing a laminate of oxygen radical-containing calcium aluminate films, wherein the oxygen ion conductivity at 700 ° C. is 5 × 10 −2 S · cm −1 or more. .
本発明によれば、所望の形状、高温下で高い酸素イオン伝導性を有する基材表面に、高濃度に酸素ラジカルを含有するカルシウムアルミネート膜を形成し、酸素ラジカルの連続的な取り込みや放出が可能な、しかも酸素イオン伝導度が5×10−2S・cm−1以上と高い、積層体が提供できるので、例えば、酸化触媒、イオン伝導体用途に好適である。 According to the present invention, a calcium aluminate film containing oxygen radicals at a high concentration is formed on the surface of a substrate having a desired shape and high oxygen ion conductivity at a high temperature, and continuous uptake and release of oxygen radicals. In addition, a laminated body having a high oxygen ion conductivity of 5 × 10 −2 S · cm −1 or higher can be provided, which is suitable for, for example, oxidation catalysts and ion conductor applications.
本発明は、本発明者が酸素ラジカル含有カルシウムアルミネート膜の基材として、酸化スカンジウムで安定化した酸化ジルコニウム又は酸化サマリウム若しくは酸化ガドリニウムを添加した酸化セリウムの何れかの焼結体を用いることによって、酸素イオン伝導度の高い酸素ラジカル含有カルシウムアルミネート膜の積層体が得られることを見出したことに基づいている。 In the present invention, the present inventor uses a sintered body of either zirconium oxide stabilized with scandium oxide or cerium oxide added with samarium oxide or gadolinium oxide as the base material of the oxygen radical-containing calcium aluminate film. This is based on the finding that a laminated body of oxygen radical-containing calcium aluminate films having high oxygen ion conductivity can be obtained.
本発明はまた、本発明者が酸素ラジカル含有カルシウムアルミネート膜を得る方法を実験的にいろいろ検討した結果、カルシウムアルミネート粉末を原料粉末としてこれを溶射するときにカルシウムアルミネート膜が得られ、このときにカルシウムアルミネート粉末の結晶性がほぼ保たれることから、この性質を利用して、カルシウムアルミネート粉末に予め酸素ラジカルを含有させる処理を施しておくだけで、酸素ラジカル含有カルシウムアルミネート膜を得ることができ、従来技術の問題が解消できることを見出したことに基づいている。 As a result of the present inventors experimentally examining various methods for obtaining an oxygen radical-containing calcium aluminate film, the present inventors obtained a calcium aluminate film when spraying calcium aluminate powder as a raw material powder, At this time, since the crystallinity of the calcium aluminate powder is almost maintained, by using this property, the calcium aluminate powder is simply pretreated by containing oxygen radicals. This is based on the finding that a film can be obtained and the problems of the prior art can be solved.
本発明における酸化スカンジウム(Sc2O3)で安定化した酸化ジルコニウム(ZrO2)は、酸化ジルコニウムの高温安定相である立方晶を室温付近の低温まで安定化させるための安定化剤として、通常用いられる酸化イットリウム(Y2O3)や酸化カルシウム(CaO)の代わりに酸化スカンジウム(Sc2O3)を用いたものである。理由は定かではないが、Sc2O3を用いることによってY2O3やCaOを用いた場合よりも、安定化ZrO2の酸素イオン伝導度が向上する。 Zirconium oxide (ZrO 2 ) stabilized with scandium oxide (Sc 2 O 3 ) in the present invention is usually used as a stabilizer for stabilizing the cubic crystal, which is a high-temperature stable phase of zirconium oxide, to a low temperature around room temperature. Instead of yttrium oxide (Y 2 O 3 ) and calcium oxide (CaO) used, scandium oxide (Sc 2 O 3 ) is used. Although the reason is not certain, the oxygen ion conductivity of stabilized ZrO 2 is improved by using Sc 2 O 3 as compared with the case of using Y 2 O 3 or CaO.
Sc2O3の安定化剤としての好適な添加量は、モル%でSc2O3:ZrO2=8:92〜12:88、好ましくは9:91〜11:89の範囲である。また、結晶相をさらに安定化させるため第二の安定化剤として上記組成物に、必要に応じて酸化セリウム(CeO2)、酸化アルミニウム(Al2O3)又はY2O3等を1〜2モル%程度の少量を添加しても良い。 A suitable addition amount of Sc 2 O 3 as a stabilizer is Sc 2 O 3 : ZrO 2 = 8: 92 to 12:88, preferably 9:91 to 11:89 in mol%. Further, in order to further stabilize the crystal phase, as a second stabilizer, cerium oxide (CeO 2 ), aluminum oxide (Al 2 O 3 ), Y 2 O 3 or the like is added to the above composition as necessary. A small amount of about 2 mol% may be added.
一方、本発明における酸化サマリウム(Sm2O3)又は酸化ガドリニウム(Gd2O3)を添加したCeO2は、Sc2O3で安定化したZrO2と同様に高い酸素イオン伝導度を有する。Sm2O3又はGd2O3のCeO2に対する好適な添加量は、モル%でSm2O3(又はGd2O3):CeO2=5:95〜15:85、好ましくは8:92〜12:88の範囲である。 On the other hand, CeO 2 to which samarium oxide (Sm 2 O 3 ) or gadolinium oxide (Gd 2 O 3 ) in the present invention is added has high oxygen ion conductivity like ZrO 2 stabilized with Sc 2 O 3 . A suitable addition amount of Sm 2 O 3 or Gd 2 O 3 to CeO 2 is Sm 2 O 3 (or Gd 2 O 3 ): CeO 2 = 5: 95 to 15:85, preferably 8:92 in mol%. It is in the range of ~ 12: 88.
Sc2O3で安定化したZrO2又はSm2O3若しくはGd2O3を添加したCeO2は、これらの粉末を金型成型、冷間静水圧(CIP)成型、押出成型、射出成型又は泥漿鋳込み成型等の方法によって所定の形状に成型した後、大気中、温度1300〜1700℃に加熱することによって、焼結体が得られる。焼結体の形状は必要に応じ、平板、曲板、皿状又は管状などの中から適宜選択される。 For CeO 2 to which ZrO 2 stabilized with Sc 2 O 3 or Sm 2 O 3 or Gd 2 O 3 is added, these powders are molded by die molding, cold isostatic pressing (CIP) molding, extrusion molding, injection molding or After forming into a predetermined shape by a method such as slurry casting, a sintered body is obtained by heating to 1300 to 1700 ° C. in the atmosphere. The shape of the sintered body is appropriately selected from a flat plate, a curved plate, a dish shape, a tubular shape, and the like as necessary.
本発明におけるカルシウムアルミネートは、主たる元素がCa、Al、酸素(O)で構成され、さらに主たる鉱物相が結晶性の12CaO・7Al2O3(C12A7)である。カルシウムアルミネートとしては、他に、3CaO・Al2O3(C3A)、CaO・Al2O3(CA)、CaO・2Al2O3(CA2)、CaO・6Al2O3(CA6)などの鉱物相を含有できるが、結晶質のC12A7だけが酸素ラジカルを1020/cm3以上の高濃度で包接する性質を有する。 The calcium aluminate in the present invention is composed of Ca, Al, and oxygen (O) as main elements, and crystalline 12CaO.7Al 2 O 3 (C 12 A 7 ) whose main mineral phase is crystalline. Other calcium aluminates include 3CaO · Al 2 O 3 (C 3 A), CaO · Al 2 O 3 (CA), CaO · 2Al 2 O 3 (CA 2 ), CaO · 6Al 2 O 3 (CA 6 )), but only crystalline C 12 A 7 has the property of including oxygen radicals at a high concentration of 10 20 / cm 3 or more.
カルシウムアルミネートの主たる成分をC12A7にするためには、原料中に含まれるCaとAlのモル比を、0.77〜0.96とすれば良い。CaとAlのモル比が上記以外の範囲では、C12A7以外のカルシウムアルミネートであるC3AやCAの生成量が多くなり、酸素ラジカルを包接する性質が損なわれる。このため本発明には適さない。 In order to make the main component of calcium aluminate C 12 A 7 , the molar ratio of Ca and Al contained in the raw material may be 0.77 to 0.96. When the molar ratio of Ca and Al is in a range other than the above, the amount of C 3 A and CA, which are calcium aluminates other than C 12 A 7 , increases, and the property of including oxygen radicals is impaired. For this reason, it is not suitable for the present invention.
本発明に用いられるカルシウムアルミネート粉末は、前述の配合となるように、いろいろな原料から得ることができる。その原料として用いられるCa源の物質としては、例えば石灰石(CaCO3)、消石灰(Ca(OH)2)または生石灰(CaO)などがあげられる。またAl源の物質としてはアルミナ(Al2O3)、水酸化アルミニウム(Al(OH)3)、ボーキサイトまたはアルミ残灰などがあげられる。これらのうち、入手が容易であり安全性が高い事から、特にCaCO3及びAl2O3を好適に使用することができる。 The calcium aluminate powder used in the present invention can be obtained from various raw materials so as to have the aforementioned composition. Examples of the Ca source material used as the raw material include limestone (CaCO 3 ), slaked lime (Ca (OH) 2 ), and quick lime (CaO). Examples of the Al source material include alumina (Al 2 O 3 ), aluminum hydroxide (Al (OH) 3 ), bauxite, and aluminum residual ash. Of these, CaCO 3 and Al 2 O 3 can be particularly preferably used because they are easily available and highly safe.
前記の原料を混合後、雰囲気と温度を制御した条件下で直接固相反応させることによって、あるいは固相反応後に雰囲気と温度を制御した条件下で保持することによって酸素ラジカルを1020/cm3以上の高濃度で包接するカルシウムアルミネートが得られる。雰囲気と温度を制御した条件の具体例は、例えば酸素分圧104Pa以上、水蒸気分圧102Pa以下の乾燥酸化雰囲気、1200℃以上1415℃未満の温度である。 After mixing the raw materials, the oxygen radicals can be 10 20 / cm 3 by directly causing a solid phase reaction under controlled conditions of atmosphere and temperature, or by maintaining the conditions of controlled atmosphere and temperature after the solid phase reaction. Calcium aluminate can be obtained which can be included at the above high concentration. A specific example of the conditions for controlling the atmosphere and temperature is, for example, a dry oxidation atmosphere having an oxygen partial pressure of 10 4 Pa or more and a water vapor partial pressure of 10 2 Pa or less, and a temperature of 1200 ° C. or more and less than 1415 ° C.
前記操作で得た高濃度の酸素ラジカルを包接したカルシウムアルミネートは、粉砕や篩い分けなどの方法で10〜100μm好ましくは10〜50μmに粒径を調整して、溶射用の原料に適した粉末とされる。 The calcium aluminate clathrated with the high concentration oxygen radicals obtained by the above operation is adjusted to a particle size of 10 to 100 μm, preferably 10 to 50 μm by a method such as pulverization or sieving, and is suitable as a raw material for thermal spraying. Powdered.
本発明における溶射法としては、プラズマ溶射法、フレーム溶射法、爆発溶射法あるいはレーザー溶射法等であればいずれでも良いが、膜の均一性や膜と基材の密着性が良好であり、安全性や経済性にも優れたプラズマ溶射法が特に好ましい。 The thermal spraying method in the present invention may be any of plasma spraying method, flame spraying method, explosive spraying method or laser spraying method, etc., but the uniformity of the film and the adhesion between the film and the substrate are good, and it is safe. A plasma spraying method that is excellent in properties and economy is particularly preferable.
本発明に於いて溶射法が選択される理由については、明らかでないが、本発明者は次の通りに考えている。即ち、溶射法に用いる一般的な溶射装置においては、粉末等の原料が溶射ガンと呼ばれる部位に搬送されると同時に、プラズマやフレームによって高温に加熱されて少なくとも表面が液状になり、これが溶射ガンの先端から連続的に噴射されて基材表面に付着した後、凝固することによって膜が形成されると言われている。 The reason why the thermal spraying method is selected in the present invention is not clear, but the present inventor considers as follows. That is, in a general thermal spraying apparatus used for a thermal spraying method, raw materials such as powder are conveyed to a part called a thermal spray gun, and at the same time, heated at a high temperature by a plasma or a flame, and at least the surface becomes liquid. It is said that a film is formed by continuously spraying from the tip of the material and adhering to the surface of the substrate and then solidifying.
溶射法で得られるカルシウムアルミネート膜は、PVD法、ゾルゲル法あるいはCVD法で得られる膜とは異なり、基材を加熱せずに成膜されるにも関わらず結晶質である。これは、溶射法における原料がPVD法、ゾルゲル法あるいはCVD法とは異なり、気化あるいは化学反応等による著しい状態変化を起こさずに、単に表面あるいはその近傍が高温で融解した後に基材上で凝固するに過ぎず、原料の組成や結晶構造がそのまま膜に反映されやすいためである。 Unlike the film obtained by the PVD method, the sol-gel method or the CVD method, the calcium aluminate film obtained by the thermal spraying method is crystalline despite being formed without heating the substrate. This is because, unlike PVD, sol-gel, or CVD, the raw material in the thermal spraying method does not cause a significant change in state due to vaporization or chemical reaction, and simply solidifies on the substrate after the surface or its vicinity melts at a high temperature. This is because the composition and crystal structure of the raw material are easily reflected in the film as they are.
本発明は、基材上に酸素ラジカル含有カルシウムアルミネート膜を形成してなる積層体であって、前記基材が酸化スカンジウムで安定化した酸化ジルコニウム又は酸化サマリウム若しくは酸化ガドリニウムを添加した酸化セリウムの何れかの焼結体であって、前記酸素ラジカル含有カルシウムアルミネート膜が酸素ラジカル含有カルシウムアルミネート粉末を用いて溶射して成ることを特徴とする積層体の製造方法である。
The present invention is a laminate formed by forming an oxygen radical-containing calcium aluminate film on a base material, the base material being made of zirconium oxide stabilized with scandium oxide, samarium oxide or cerium oxide added with gadolinium oxide. be any of the sintered body, the oxygen radical-containing calcium aluminate film is method for producing a laminate, characterized in that formed by thermal spraying using oxygen radicals containing calcium aluminate powder.
上述した通りに、本発明により、結晶質のカルシウムアルミネート膜が得られ、しかも溶射法を採用しているので、溶射の際に溶射ガンを移動させれば、大面積の基材や、曲面を有する基材上への成膜も容易にできる。基材は必要に応じ、膜との密着性を向上させるため表面粗化の前処理が施される場合がある。 As described above, according to the present invention, a crystalline calcium aluminate film is obtained, and since the spraying method is adopted, if the spray gun is moved during spraying, a large-area substrate or curved surface is obtained. It is also possible to easily form a film on a substrate having If necessary, the base material may be subjected to a surface roughening pretreatment in order to improve adhesion to the film.
本発明の積層体は特に高温(700℃以上)で酸素イオンの移動度が大きいため酸素イオン伝導度が5×10−2S・cm−1以上と高い材料である、酸化スカンジウムで安定化した酸化ジルコニウム又は酸化サマリウム若しくは酸化ガドリニウムを添加した酸化セリウムの、何れかの焼結体表面に高酸素ラジカル含有のカルシウムアルミネート膜が形成されているので、酸素ラジカル或いは酸素イオンを提供するイオン源として特に好適に用いられる。 The laminate of the present invention is stabilized with scandium oxide, which is a material having a high oxygen ion conductivity of 5 × 10 −2 S · cm −1 or more because the mobility of oxygen ions is particularly high at a high temperature (700 ° C. or higher). As a calcium aluminate film containing high oxygen radicals is formed on the surface of any sintered body of zirconium oxide or cerium oxide to which samarium oxide or gadolinium oxide is added, as an ion source for providing oxygen radicals or oxygen ions Particularly preferably used.
炭酸カルシウム(CaCO3)粉末と、アルミナ(γ−Al2O3)粉末を、CaとAlのモル比が0.82:1になるように混合した後、大気中、1300℃で3時間焼成して白色粉末を得た。冷却後X線回折測定を行い、この粉末がC12A7であることを確認した。 Calcium carbonate (CaCO 3 ) powder and alumina (γ-Al 2 O 3 ) powder were mixed so that the molar ratio of Ca and Al was 0.82: 1, and then fired at 1300 ° C. for 3 hours in the air. A white powder was obtained. After cooling, X-ray diffraction measurement was performed to confirm that the powder was C 12 A 7 .
さらに前記粉末を酸素分圧4×104Pa、水蒸気分圧102Paの乾燥酸化雰囲気下、1250℃で2時間焼成した。冷却後室温及び77KでのESRスペクトルを測定し、それぞれの吸収バンドの強度からO2 −イオンラジカル及びO−イオンラジカルの濃度を求めたところ、それぞれ5×1020cm−3であった(以下、この粉末を「酸素ラジカル含有C12A7粉」という)。 Further, the powder was fired at 1250 ° C. for 2 hours in a dry oxidizing atmosphere having an oxygen partial pressure of 4 × 10 4 Pa and a water vapor partial pressure of 10 2 Pa. The ESR spectrum after cooling at room temperature and 77K were measured, from the intensity of each of the absorption bands O 2 - ion radical and O - was determined the concentration of ions radicals were respectively 5 × 10 20 cm -3 (hereinafter This powder is referred to as “oxygen radical-containing C 12 A 7 powder”).
酸化スカンジウム粉末10モル%と酸化ジルコニウム90モル%の混合粉末(比表面積12.2m2/g)を、金型を用いて圧力10MPaで成型後、圧力200MPaでCIPを行い直径28mm、厚さ5mmの円板形状に成型した。これを大気中1450℃で3時間焼成して、かさ密度5.8g/cm3の焼結体を得た。この焼結体を、直径20mm、厚さ2mmの円板に加工した後、片面を#54のAl2O3ブラスト材でブラスト処理して基材を作製した。 A mixed powder of scandium oxide powder 10 mol% and zirconium oxide 90 mol% (specific surface area 12.2 m 2 / g) was molded at a pressure of 10 MPa using a mold, and then CIPed at a pressure of 200 MPa to provide a diameter of 28 mm and a thickness of 5 mm. It was molded into a disc shape. This was fired at 1450 ° C. for 3 hours in the atmosphere to obtain a sintered body having a bulk density of 5.8 g / cm 3 . After processing this sintered body into a disk having a diameter of 20 mm and a thickness of 2 mm, one side was blasted with an Al 2 O 3 blast material of # 54 to prepare a base material.
前記の酸素ラジカル含有C12A7粉を、粉砕、篩い分けして10〜50μmの粉末を調製し、プラズマ溶射機に装填後、プラズマガスとしてアルゴンと水素の混合ガスを用い、電流値500アンペア、電圧値64ボルト、溶射距離100mmの条件で、前記の基材面上に、溶射を行い、積層体を作製した。 The oxygen radical-containing C 12 A 7 powder is pulverized and sieved to prepare a powder of 10 to 50 μm, loaded into a plasma spraying machine, and then a mixed gas of argon and hydrogen is used as a plasma gas, and a current value of 500 amperes. Then, spraying was performed on the substrate surface under the conditions of a voltage value of 64 volts and a spraying distance of 100 mm to prepare a laminate.
得られた積層体の溶射膜は、厚さ約100μmで基材に隙間無く密着していること、結晶質のC12A7であること、O2 −イオンラジカル及びO−イオンラジカルの濃度が、それぞれ3×1020cm−3であることを確認した。また、積層体の700℃における厚さ方向の酸素イオン伝導度を測定したところ6×10−2S・cm−1であった。またこのものは750℃において、連続的に酸素イオンを供給するイオン源として動作可能であった。 The resulting sprayed film of the laminate, it is in close contact without gaps to the substrate in a thickness of about 100 [mu] m, it is C 12 A 7 crystalline, O 2 - is the concentration of ion radical - ion radical and O , Each confirmed to be 3 × 10 20 cm −3 . Moreover, it was 6 * 10 <-2> S * cm < -1 > when the oxygen ion conductivity of the thickness direction in 700 degreeC of a laminated body was measured. Further, it was operable at 750 ° C. as an ion source for continuously supplying oxygen ions.
(実施例2〜6)実施例1の酸化スカンジウムと酸化ジルコニウムの混合粉末の代わりに表1に示す原料粉末を用い、実施例1と同様に成型後、表1に示す条件にて焼結体を作製した。その後実施例1と同様に円板加工及びブラスト処理を行って基材を作製した。酸素ラジカル含有C12A7粉を、実施例1と同様に調製し、ブラスト処理した基材面上に実施例1と同様に溶射を行い、積層体を作製した。 (Examples 2 to 6) In place of the mixed powder of scandium oxide and zirconium oxide of Example 1, the raw material powder shown in Table 1 was used. After molding in the same manner as in Example 1, the sintered body was subjected to the conditions shown in Table 1. Was made. Thereafter, disk processing and blasting were performed in the same manner as in Example 1 to prepare a substrate. An oxygen radical-containing C 12 A 7 powder was prepared in the same manner as in Example 1, and sprayed on the blasted substrate surface in the same manner as in Example 1 to produce a laminate.
得られた積層体の溶射膜の、厚さ、結晶相、O2 −イオンラジカル及びO−イオンラジカルの濃度、積層体の700℃における厚さ方向の酸素イオン伝導度を実施例1と同様に測定し、表2に示した。 The sprayed film of the resulting laminate, thickness, crystalline phase, O 2 - ion radical and O - concentration of ion radicals, as the oxygen ion conductivity in the thickness direction at 700 ° C. of the laminate of Example 1 Measured and shown in Table 2.
(比較例1〜2)実施例1の酸化スカンジウム粉末と酸化ジルコニウム90の混合粉末の代わりに酸化イットリウム又は酸化カルシウムと酸化ジルコニウムを表1に示す条件で混合した原料粉末を用い、表1に示す条件にて焼結体を作製した後、実施例1と同様に円板加工及びブラスト処理を行って基材を作製した。酸素ラジカル含有C12A7粉を、実施例1と同様に調製し、ブラスト処理した基材面上に実施例1と同様に溶射を行い、積層体を作製した。 (Comparative Examples 1-2) In place of the mixed powder of scandium oxide powder and zirconium oxide 90 of Example 1, a raw material powder obtained by mixing yttrium oxide or calcium oxide and zirconium oxide under the conditions shown in Table 1 is shown in Table 1. After producing a sintered body under conditions, disk processing and blasting were performed in the same manner as in Example 1 to produce a substrate. An oxygen radical-containing C 12 A 7 powder was prepared in the same manner as in Example 1, and sprayed on the blasted substrate surface in the same manner as in Example 1 to produce a laminate.
得られた積層体の溶射膜の、厚さ、結晶相、O2 −イオンラジカル及びO−イオンラジカルの濃度、積層体の700℃における厚さ方向の酸素イオン伝導度を実施例1と同様に測定し、表2に示した。 The sprayed film of the resulting laminate, thickness, crystalline phase, O 2 - ion radical and O - concentration of ion radicals, as the oxygen ion conductivity in the thickness direction at 700 ° C. of the laminate of Example 1 Measured and shown in Table 2.
本発明によれば、所望の形状、高温下で高い酸素イオン伝導性を有する基材表面に、高濃度に酸素ラジカルを含有するカルシウムアルミネート膜を形成し、酸素ラジカルの連続的な取り込みや放出が可能な積層体が得られ、例えば、酸化触媒、イオン伝導体用途に好適であり、産業上有用である。 According to the present invention, a calcium aluminate film containing oxygen radicals at a high concentration is formed on the surface of a substrate having a desired shape and high oxygen ion conductivity at a high temperature, and continuous uptake and release of oxygen radicals. Is suitable for use as, for example, an oxidation catalyst or an ion conductor, and is industrially useful.
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| US7324118B2 (en) | 2001-08-31 | 2008-01-29 | Ricoh Company, Ltd. | Super imposed image display color selection system and method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US7324118B2 (en) | 2001-08-31 | 2008-01-29 | Ricoh Company, Ltd. | Super imposed image display color selection system and method |
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