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JP4024239B2 - Pellicle - Google Patents
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JP4024239B2 - Pellicle - Google Patents

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JP4024239B2
JP4024239B2 JP2004281062A JP2004281062A JP4024239B2 JP 4024239 B2 JP4024239 B2 JP 4024239B2 JP 2004281062 A JP2004281062 A JP 2004281062A JP 2004281062 A JP2004281062 A JP 2004281062A JP 4024239 B2 JP4024239 B2 JP 4024239B2
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point
pellicle
pellicle film
frame
straight line
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JP2005128512A (en
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芳真 栗山
一郎 脇元
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Asahi Kasei Microdevices Corp
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Asahi Kasei EMD Corp
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1313Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Tents Or Canopies (AREA)
  • Measurement Of Radiation (AREA)

Description

本発明は、TFT−LCD(薄膜トランジスタ−液晶ディスプレイ)等を製造する際のリソグラフィー工程で使用されるフォトマスクに異物が付着することを防止するために用いられる大型のペリクルに関するものである。   The present invention relates to a large pellicle used for preventing foreign matter from adhering to a photomask used in a lithography process when manufacturing a TFT-LCD (thin film transistor-liquid crystal display) or the like.

従来、TFT−LCD(薄膜トランジスタ−液晶ディスプレイ)等の製造においては、フォトマスクの両面側にペリクルと称する防塵手段を配置して該フォトマスクへの異物の付着を防止することが行われている。ペリクルは、フォトマスクの形状に合わせた形状を有する厚さ数ミリ程度の枠体の一方の縁面に厚さ10μm以下のニトロセルロース或いはセルロース誘導体やフッ素ポリマー等の透明な高分子膜からなるペリクル膜を貼着し、且つ該枠体の他方の縁面に粘着材を介してフォトマスクの表面に貼着される。   Conventionally, in the manufacture of TFT-LCD (Thin Film Transistor-Liquid Crystal Display) or the like, dust prevention means called a pellicle is disposed on both sides of a photomask to prevent foreign matter from adhering to the photomask. The pellicle is a pellicle made of a transparent polymer film such as nitrocellulose or a cellulose derivative or a fluoropolymer having a thickness of about 10 μm or less on one edge surface of a frame of about several millimeters thick having a shape matched to the shape of a photomask. A film is attached, and the other edge surface of the frame is attached to the surface of the photomask via an adhesive material.

フォトマスクの表面に異物が付着した場合、その異物がTFT−LCD(薄膜トランジスタ−液晶ディスプレイ)用マザーガラス上に形成されたフォトレジスト上に結像して回路パターン欠陥の原因となる。そこで、フォトマスクの両面側にペリクルを配置した場合、ペリクルの表面に付着した異物はフォーカス位置のずれによってTFT−LCD用マザーガラスに形成されたフォトレジスト上に結像することなく回路パターンに欠陥を生じさせないようにすることができる。   When foreign matter adheres to the surface of the photomask, the foreign matter forms an image on a photoresist formed on a TFT-LCD (thin film transistor-liquid crystal display) mother glass, causing a circuit pattern defect. Therefore, when pellicles are arranged on both sides of the photomask, the foreign matter adhering to the surface of the pellicle is defective in the circuit pattern without forming an image on the photoresist formed on the TFT-LCD mother glass due to the shift of the focus position. Can be prevented.

近年では、各種のマルチメディアの普及により、高画質、高精細表示が可能な大型のカラーTFT−LCDのフォトリソグラフィ工程で使用される大型のフォトマスクに適用できる大型ペリクルが要望されている。   In recent years, with the widespread use of various types of multimedia, a large pellicle applicable to a large photomask used in the photolithography process of a large color TFT-LCD capable of high-quality and high-definition display has been demanded.

大型のTFT−LCD等のフォトリソグラフィ工程で使用される大型のフォトマスクに適用できる大型ペリクルの枠体としては、長辺と短辺を有する方形状ものが一般である。また、ペリクルの枠体幅は以下のことを理由に極力細く設計されている。マスク材質の石英ガラスは高価であり、極力面積が小さいことが要求されているため、ペリクルの外形も小さいことが要求されている。また、大きなマスクの有効露光領域を確保するため、ペリクルの内径は大きいことが望まれている。   As a frame of a large pellicle applicable to a large photomask used in a photolithography process such as a large TFT-LCD, a rectangular shape having a long side and a short side is generally used. The frame width of the pellicle is designed to be as thin as possible for the following reasons. Quartz glass as a mask material is expensive and is required to have as small an area as possible, so that the pellicle must also have a small outer shape. In addition, it is desired that the inner diameter of the pellicle is large in order to ensure an effective exposure area of a large mask.

この細い枠体にペリクル膜を貼り付けると、該ペリクル膜の張力により、特に枠体の長辺が撓み易く、この撓みによってフォトマスクの有効露光領域が小さくなってしまうという問題があり、大型ペリクル膜の貼張面積が大きくなるにつれてその現象が顕著になる。   When a pellicle film is affixed to this thin frame, there is a problem that the long side of the frame tends to bend easily due to the tension of the pellicle film, and the effective exposure area of the photomask becomes small due to this bending. This phenomenon becomes more prominent as the area of the film is increased.

このため、前記枠体の一対の長辺を該枠体の外側に向かって突出するように形成し、大型ペリクル膜の張力による該長辺の枠体の内側に向かう撓みを抑制してフォトマスク等の有効露光領域を確保する大型ペリクル(例えば、特許文献1参照)が知られている。   For this reason, a pair of long sides of the frame body are formed so as to protrude toward the outside of the frame body, and the photomask is controlled by suppressing bending toward the inside of the long side frame body due to the tension of the large pellicle film. A large pellicle (see, for example, Patent Document 1) that secures an effective exposure area such as the above is known.

特開2001−42507号公報JP 2001-42507 A

しかしながら、上記特許文献1においては、図5(a)に示すように、大型ペリクル51の外側に突出した枠体にペリクル膜を貼り付けることによって、図5(b)に示すように、枠体はほぼ直線になるが、少し凸形状を残している。この状態でジグ50に枠体をセットしてペリクル膜にシワPが生じると、ペリクル膜上に異物が付着しているか否かの検査時に、シワPの発生箇所の検査を十分に行うことができない。また、シワPが発生した状態でペリクル膜をフォトマスク等に貼り付けてしまうと、TFTパターン等を露光する場合に露光光路が曲がる場合がある。   However, in the above-mentioned Patent Document 1, as shown in FIG. 5A, by attaching a pellicle film to a frame protruding outside the large pellicle 51, as shown in FIG. Is almost straight, but has a slightly convex shape. In this state, when the frame is set on the jig 50 and wrinkles P are generated on the pellicle film, it is possible to sufficiently inspect the occurrence of wrinkles P when inspecting whether or not foreign matter has adhered to the pellicle film. Can not. Further, if the pellicle film is attached to a photomask or the like with wrinkles P generated, the exposure optical path may be bent when the TFT pattern or the like is exposed.

このシワPの発生という問題は、ペリクルの大きさが大きくなり、その重量が重くなったり辺の長さが長くなったりすると、更に顕著になる。   The problem of the occurrence of the wrinkles P becomes more prominent when the size of the pellicle increases and the weight of the pellicle increases or the length of the side increases.

本発明は前記課題を解決するものであり、その目的とするところは、枠体に貼張される面積が1,000cm以上の大型ペリクル膜をフォトマスクに貼り付ける際に、前記大型ペリクル膜のシワの発生を防止すると共にペリクル膜の有効露光領域の減少を抑制するペリクルを提供せんとするものである。 The present invention solves the above-mentioned problems, and an object of the present invention is to provide a large pellicle film when a large pellicle film having an area of 1,000 cm 2 or more pasted on a frame is pasted on a photomask. Therefore, it is an object of the present invention to provide a pellicle that prevents the generation of wrinkles and suppresses the reduction of the effective exposure area of the pellicle film.

前記目的を達成するための本発明に係るペリクルの第1の構成は、ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)と、を有するペリクルであって、前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの外周縁辺の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの外周縁辺の対とを有し、前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に長い二つの外周縁辺の少なくとも一方の外周縁辺が、予め外側に凸となるように湾曲しており、前記相対的に長い外周縁辺の両端部である第一地点及び第二地点を直線でんだ仮想直線と、前記第一地点と、前記第二地点との間に位置し、前記相対的に長い外周縁辺上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に長い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする。 In order to achieve the above object, the first configuration of the pellicle according to the present invention includes a pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a pellicle on the pellicle film A pellicle having a frame (1) in which the film (2) is stretched with a tensile stress, and the frame (1) is one direction as viewed in the thickness direction of the pellicle film (2). In the other direction perpendicular to the one direction when viewed in the thickness direction of the pellicle film (2) A pair of outer peripheral edges, and before extending the pellicle film (2) on the frame (1) , at least one outer peripheral edge of the two relatively long outer peripheral edges protrudes outward in advance. Both ends of the relatively long outer peripheral edge A virtual straight line I formation in a straight line first and second locations is, the a first point located between the second point, a third point located on the relatively long outer peripheral edge on relationship with the said by tensioning the pellicle membrane (2) with a tensile stress to the frame (1) on the relatively long outer peripheral edge is the virtual straight line the third point is across the imaginary straight line characterized Rukoto such is deformed to concave at the inside than.

また、本発明に係るペリクルの第2の構成は、前記第1の構成において、前記変形が、前記相対的に長い二つの外周縁辺の何れにもなされることを特徴とする。 The second configuration of the pellicle according to the present invention, in the first configuration, the deformation, characterized in that the name is in any of the relatively long two outer peripheral edge.

また、本発明に係るペリクルの第3の構成は、前記第1、第2の構成において、更に前記相対的に短い二つの外周縁辺の少なくとも一方の外周縁辺も、予め外側に凸となるように湾曲しており、前記相対的に短い外周縁辺の両端部である第一地点及び第四地点を直線で結んだ第2の仮想直線と、前記第一地点と、前記第四地点との間に位置し、前記相対的に短い外周縁辺上に位置する第五地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第五地点が前記第2の仮想直線を横切って前記相対的に短い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする。 The third configuration of the pellicle according to the present invention is such that, in the first and second configurations, at least one outer peripheral edge of the two relatively short outer peripheral edges is convex outward in advance. Between the second virtual straight line that is curved and connects the first point and the fourth point, which are both ends of the relatively short outer peripheral edge, with the straight line, the first point, and the fourth point position is, the relationship between the fifth point located at the relatively short outer peripheral edge on the, by tensioning the pellicle membrane (2) with a tensile stress on the frame (1), the fifth point is the second the relatively short outer peripheral edge across a virtual straight line is characterized deformed by such Rukoto so that concave inside than the virtual straight line.

また、本発明に係るペリクルの第4の構成は、前記第の構成において、前記変形が、前記相対的に短い二つの外周縁辺の何れにもなされることを特徴とする。 The fourth structure of the pellicle according to the present invention, in the third configuration, the deformation, characterized in that the name is in any of the relatively short two outer peripheral edge.

また、本発明に係るペリクルの第5の構成は、ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)とを有するペリクルであって、前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの外周縁辺の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの外周縁辺の対とを有し、前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に短い二つの外周縁辺の少なくとも一方の外周縁辺が、予め外側に凸となるように湾曲しており、前記外周縁辺の両端部である第一地点及び第二地点を直線でんだ仮想直線と、前記第一地点と、前記第二地点との間に位置し、前記相対的に短い外周縁辺上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に短い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする。 Further, the fifth configuration of the pellicle according to the present invention is such that a pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a pellicle film (2) thereon A pellicle having a frame (1) stretched with a tensile stress, wherein the frame (1) is relatively opposed to each other in one direction when viewed in the thickness direction of the pellicle film (2). short and two of the outer peripheral edge pairs, wherein when viewed in the thickness direction of the pellicle membrane (2), in another direction perpendicular to said one direction, and a relatively long two outer peripheral edge of the pair facing each other And before stretching the pellicle film (2) on the frame (1) , at least one outer peripheral edge of the two relatively short outer peripheral edges is curved in advance to be convex outward. The first point and the second point that are both ends of the outer peripheral edge are straight lines A virtual straight line I binding in, said first point located between the second point, the relationship between the third point located at the relatively short outer peripheral edge on the pellicle membrane (2) Is stretched on the frame (1) with a tensile stress, so that the third point crosses the virtual straight line and the relatively short outer peripheral edge is recessed inside the virtual straight line. and wherein the Rukoto such Te.

また、本発明に係るペリクルの第6の構成は、前記第5の構成において、前記変形が、前記相対的に短い二つの外周縁辺の何れにもなされることを特徴とする。 The sixth structure of the pellicle according to the present invention, in the configuration of the fifth, the deformation, characterized in that the name is in any of the relatively short two outer peripheral edge.

また、本発明に係るペリクルの第7の構成は、前記第1〜第6の構成において、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることによる変形によって、前記外周縁辺の両端の間の中央地点を第三地点、或いは第五地点とした場合、該第三地点、或いは第五地点から前記仮想直線に対して垂線を下ろした際の該垂線の長さが0.2mm以上、且つ6mm以下であることを特徴とする。 Further, a seventh structure of the pellicle according to the present invention, in the configuration of the first to sixth, the I that deform the pellicle membrane (2) that stretched with a tensile stress to the frame (1) on the outer peripheral edge of the central point of the third point between the two ends, or when the fifth point, the length of said third point, or said vertical line when a perpendicular line is drawn from the fifth point for the imaginary straight line Saga 0.2mm or more, and is characterized in der Rukoto below 6 mm.

また、本発明に係るペリクルの第8の構成は、前記第1〜第6の構成において、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることによる変形によって、前記外周縁辺の両端の間の中央地点を第三地点、或いは第五地点とした場合、該第三地点、或いは第五地点から前記仮想直線に対して垂線を下ろした際の該垂線の長さが0.2mm以上、且つ3mm以下であることを特徴とする。 Further, an eighth structure of the pellicle according to the present invention, in the configuration of the first to sixth, the I that deform the pellicle membrane (2) that stretched with a tensile stress to the frame (1) on the outer peripheral edge of the central point of the third point between the two ends, or when the fifth point, the length of said third point, or said vertical line when a perpendicular line is drawn from the fifth point for the imaginary straight line Saga 0.2mm or more, and is characterized in der Rukoto below 3 mm.

また、本発明に係るペリクルの第9の構成は、ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)とを有するペリクルであって、前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの梁(1b)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に短い二つの梁(1b)の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの梁(1a)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に長い二つの梁(1a)の対とを有し、前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に長い二つの梁(1a)の少なくとも一方の梁(1a)が、予め外側に凸となるように湾曲しており、前記梁(1a)の幅方向の中立軸の両端部である第一地点と第二地点とを結ぶ仮想直線と、前記第一地点と前記第二地点との間で且つ前記梁(1a)の幅方向の中立軸上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に長い梁(1a)の中立軸が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする。 The ninth configuration of the pellicle according to the present invention is such that a pellicle film (2) having an area of 1,000 cm 2 or more as viewed in the thickness direction of the pellicle film (2), and a pellicle film (2) thereon A pellicle having a frame (1) stretched with a tensile stress, wherein the frame (1) is relatively opposed to each other in one direction when viewed in the thickness direction of the pellicle film (2). A pair of two short beams (1b) on which a peripheral portion of the pellicle film (2) is fixed and a pair of relatively short beams (1b), and a thickness of the pellicle film (2) When viewed in the vertical direction, it is a pair of two relatively long beams (1a) facing each other in another direction perpendicular to the one direction, on which the periphery of the pellicle film (2) is fixed. And a pair of two relatively long beams (1a), the pellicle membrane (2) Before the frame (1) is stretched , at least one beam (1a) of the two relatively long beams (1a) is curved in advance to be convex outward, and the beam ( a virtual straight line connecting the first point and the second point is the opposite ends of the neutral axis of the width direction of 1a), the width direction of and the beam between said second point and said first point (1a) The relationship between the third point located on the neutral axis is that the pellicle film (2) is stretched on the frame (1) with a tensile stress, so that the third point crosses the virtual straight line and the relative point. neutral axis of the long beam (1a) is characterized by deformed by such Rukoto so that concave inside than the virtual straight line.

ここで、中立軸とは、材料力学で使用される用語であり、図心を通る線のことを意味するものである。   Here, the neutral axis is a term used in material mechanics and means a line passing through the centroid.

また、本発明に係るペリクルの第10の構成は、前記第9の構成において、前記変形が、前記相対的に長い二つの梁(1a)の何れにもなされることを特徴とする。 Further, a tenth structure of the pellicle according to the present invention, in the configuration of the ninth, the deformation, also made in any said relatively long two beams (1a), characterized in Rukoto.

また、本発明に係るペリクルの第11の構成は、前記第9、第10の構成において、更に前記相対的に短い二つの梁(1b)の少なくとも一方の梁(1b)も、予め外側に凸となるように湾曲しており、前記相対的に短い梁(1b)の幅方向の中立軸上の両端部である第一地点及び第四地点を直線で結んだ第2の仮想直線と、前記第一地点と、前記第四地点との間に位置し、前記相対的に短い梁(1b)の中立軸上に位置する第五地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第五地点が前記第2の仮想直線を横切って前記相対的に短い梁(1b)の中立軸が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする。 Further, according to an eleventh configuration of the pellicle according to the present invention, in the ninth and tenth configurations, at least one beam (1b) of the two relatively short beams (1b) also protrudes outward in advance. A second virtual straight line connecting the first point and the fourth point, which are both ends on the neutral axis in the width direction of the relatively short beam (1b), with a straight line, The relationship between the first point and the fifth point located between the fourth point and the neutral axis of the relatively short beam (1b) is that the pellicle membrane (2) is attached to the frame ( 1) By tensioning upward with a tensile stress, the neutral point of the relatively short beam (1b) becomes concave inside the imaginary straight line, with the fifth point crossing the second imaginary straight line. wherein the deformed in such Rukoto as.

また、本発明に係るペリクルの第12の構成は、前記第11の構成において、前記変形が、前記相対的に短い二つの梁(1b)の何れにもなされることを特徴とする。 Further, a twelfth structure of the pellicle according to the present invention, in the configuration of the eleventh, the deformation, also made in any said relatively short two beams (1b), characterized in Rukoto.

また、本発明に係るペリクルの第13の構成は、ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)と、を有するペリクルであって、前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの梁(1b)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に短い二つの梁(1b)の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの梁(1a)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に長い二つの梁(1a)の対とを有し、前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に短い二つの梁(1b)の少なくとも一方の梁(1b)が、予め外側に凸となるように湾曲しており、前記相対的に短い梁(1b)の幅方向の中立軸の両端部である第一地点と第二地点とを結ぶ仮想直線と、前記第一地点と前記第二地点との間で且つ前記相対的に短い梁(1b)の幅方向の中立軸上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に短い梁(1b)が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする。 Further, the thirteenth configuration of the pellicle according to the present invention includes a pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a pellicle film (2) on the pellicle film (2). A pellicle having a frame (1) stretched with a tensile stress, wherein the frame (1) is relative to each other in one direction when viewed in the thickness direction of the pellicle film (2). A pair of two relatively short beams (1b) on which a peripheral portion of the pellicle film (2) is fixed, and a pair of the pellicle film (2). A pair of two relatively long beams (1a) facing each other in another direction perpendicular to the one direction when viewed in the thickness direction, on which the peripheral portion of the pellicle film (2) is A pair of two relatively long beams (1a) to be fixed, and the pellicle membrane ( Before extending 2) onto the frame (1) , at least one beam (1b) of the two relatively short beams (1b) is curved in advance to be convex outwardly, a virtual straight line connecting the first point and the second point is the opposite ends of the neutral axis of the width direction of the relatively short beams (1b), and the relative between said second location and said first location In relation to the third point located on the neutral axis in the width direction of the short beam (1b), the third pellicle film (2) is stretched on the frame (1) with a tensile stress . point is the shorter the across the virtual straight line relatively beams (1b) is characterized deformed by such Rukoto so that concave inside than the virtual straight line.

また、本発明に係るペリクルの第14の構成は、前記第13の構成において、前記変形が、前記相対的に短い二つの梁(1b)の何れにもなされることを特徴とする。 Further, a fourteenth structure of the pellicle according to the present invention, in the configuration of the thirteenth, the deformation, also made in any said relatively short two beams (1b), characterized in Rukoto.

本発明に係るペリクルの第1の構成によれば、ペリクル膜を枠上に張る前には、相対的に長い二つの外周縁辺の少なくとも一方の外周縁辺が、予め外側に凸となるように湾曲しており、前記相対的に長い外周縁辺の両端部である第一地点及び第二地点を直線でんだ仮想直線と、前記第一地点と、前記第二地点との間に位置し、前記相対的に長い外周縁辺上に位置する第三地点との関係が、前記ペリクル膜(2)前記(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に長い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなるので、相対的に長い二つの外周縁辺の少なくとも一方をジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to the first configuration of the pellicle of the present invention, before the pellicle film is stretched on the frame , at least one outer peripheral edge of the relatively long outer peripheral edges is curved in advance so as to protrude outward. and is a virtual straight line I formation in a straight line first and second locations is the relatively long outer peripheral edge of the end portions, said first point located between said second point, relationship between the third point located on the relatively long outer peripheral edge on the, by tensioning the pellicle membrane (2) with a tensile stress to the frame (1) on, said third point is the imaginary straight line the relatively long outer peripheral edge is deformed to a concave shape in the inner side than the virtual straight line across the a Runode, be set on the jig at least one relatively long two outer peripheral edge pellicle Wrinkles are prevented from occurring in the film.

本発明に係るペリクルの第2の構成によれば、前記変形が、前記相対的に長い二つの外周縁辺の何れにもなされるならば、相対的に長い二つの外周縁辺の何れをジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to a second configuration of the pellicle according to the present invention, the deformation, the if the name is either relatively long two outer peripheral edge, a relatively long two outer peripheral edge of either the on jig Even if set to, wrinkles are prevented from occurring in the pellicle film.

本発明に係るペリクルの第3の構成によれば、ペリクル膜を枠上に張る前には、更に前記相対的に短い二つの外周縁辺の少なくとも一方の外周縁辺も、予め外側に凸となるように湾曲しており、前記相対的に短い外周縁辺の両端部である第一地点及び第四地点を直線で結んだ第2の仮想直線と、前記第一地点と、前記第四地点との間に位置し、前記相対的に短い外周縁辺上に位置する第五地点との関係が、前記ペリクル膜(2)前記(1)上に引張応力を伴って張ることにより、前記第五地点が前記第2の仮想直線を横切って前記相対的に短い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなるので、相対的に短い二つの外周縁辺の少なくとも一方をジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to the third configuration of the pellicle according to the present invention, before the pellicle film is stretched on the frame , at least one outer peripheral edge of the two relatively short outer peripheral edges is projected outward in advance. A second virtual straight line connecting the first point and the fourth point, which are both ends of the relatively short outer peripheral edge, with a straight line, and between the first point and the fourth point located in the relationship between the fifth point located at the relatively short outer peripheral edge on the, by tensioning the pellicle membrane (2) with a tensile stress on the frame (1), the fifth point jig but the second of the relatively short outer peripheral edge across a virtual straight line such is deformed to concave inside than the virtual straight line Runode, at least one of the relatively short two outer peripheral edge Even when set on the top, wrinkles are prevented from occurring on the pellicle film.

本発明に係るペリクルの第4の構成によれば、前記変形が、前記相対的に短い二つの外周縁辺の何れにもなされるならば、相対的に短い二つの外周縁辺のいずれをジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to a fourth aspect of the pellicle according to the present invention, the deformation, the if the name is either a relatively short two outer peripheral edge, relatively short two outer peripheral edge of either the on jig Even if set to, wrinkles are prevented from occurring in the pellicle film.

本発明に係るペリクルの第5の構成によれば、ペリクル膜を枠上に張る前には、相対的に短い二つの外周縁辺の少なくとも一方の外周縁辺が、予め外側に凸となるように湾曲しており、前記外周縁辺の両端部である第一地点及び第二地点を直線でんだ仮想直線と、前記第一地点と、前記第二地点との間に位置し、前記相対的に短い外周縁辺上に位置する第三地点との関係が、前記ペリクル膜(2)前記(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に短い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなるので、相対的にい二つの外周縁辺の少なくとも一方をジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to the fifth configuration of the pellicle of the present invention, before the pellicle film is stretched on the frame , at least one outer peripheral edge of the two relatively short outer peripheral edges is curved in advance so as to protrude outward. and is a virtual straight line I formation do a straight line first and second locations are two ends of the outer peripheral edge, said first point located between the second point, the relatively relationship between the third point which is located a short outer peripheral edge on the said by tensioning the pellicle membrane (2) with a tensile stress to the frame (1) on, said third point is across the imaginary straight line relatively short outer peripheral edge is such is deformed to concave inside than the virtual straight line Runode, wrinkles at least one of the two outer peripheral edge has a relatively short in pellicle film be set on the jig Is prevented from occurring.

本発明に係るペリクルの第6の構成によれば、前記変形が、相対的に短い二つの外周縁辺の何れにもなされるので、相対的にい二つの外周縁辺の少なくとも一方をジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to the sixth structure of the pellicle according to the present invention, the deformation, since the name of either the relatively short two outer peripheral edge, relatively not short of the two outer peripheral edge at least one of the jig Even if set to, wrinkles are prevented from occurring in the pellicle film.

本発明に係るペリクルの第7、第8の構成によれば、ペリクル膜(2)前記(1)上に引張応力を伴って張ることによる変形によって、前記外周縁辺の両端の間の中央地点を第三地点、或いは第五地点とした場合、該第三地点、或いは第五地点から前記仮想直線に対して垂線を下ろした際の該垂線の長さが0.2mm以上、且つ6mm(或いは3mm)以下であるならば、第三地点或いは第五地点附近の領域において、ペリクル膜に適正な引張応力を加えつつ、ペリクルの有効露光領域の減少を最小に抑制することが達成される。 Seventh pellicle according to the present invention, according to the configuration of the eighth, the by that deformation in tensioning the pellicle membrane (2) with a tensile stress to the frame (1) on, between the peripheral edge at both ends central point of the third point, or when the fifth point, said third point, or the length of said vertical lines when a perpendicular line is drawn from the fifth point for the imaginary straight line 0.2mm or more, and if Ru der 6 mm (or 3mm) or less, achieved that in the third point or region of the fifth point vicinity, while applying an appropriate tensile stress in the pellicle membrane and minimum inhibiting reduction of the effective exposure area of the pellicle Is done.

本発明に係る大型ペリクルは、上述のように、前記枠体の長辺中央部が長辺端部よりも内側に窪んでいるため外側に突出することがない。このため、例えば、前記長辺端部を固定して枠体を押さえつけても、前記長辺中央部が撓むことがない。このように、枠体が撓むことを防止することによってペリクル膜上にシワが発生することを防止することが出来る。   As described above, the large pellicle according to the present invention does not protrude outward because the central portion of the long side of the frame body is recessed inward from the end portion of the long side. For this reason, for example, even if the long side end portion is fixed and the frame body is pressed, the long side center portion does not bend. Thus, wrinkles can be prevented from occurring on the pellicle film by preventing the frame from bending.

また、窪み量を6mm以下に抑えることで、上記の効果に加えて、フォトマスクの有効露光領域が小さくなるといった問題を最小限にすることが出来る。   In addition to the above effect, by suppressing the amount of depression to 6 mm or less, it is possible to minimize the problem that the effective exposure area of the photomask becomes small.

本発明に係るペリクルの第9の構成によれば、ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に長い二つの梁(1a)の少なくとも一方の梁(1a)が、予め外側に凸となるように湾曲しており、前記梁(1a)の幅方向の中立軸の両端部である第一地点と第二地点とを結ぶ仮想直線と、前記第一地点と前記第二地点との間で且つ前記梁(1a)の幅方向の中立軸(材料力学で使用される用語で図心を通る線)上に位置する第三地点との関係が前記ペリクル膜(2)前記(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に長い梁(1a)の中立軸が該仮想直線よりも内側で凹となるように変形されてなることにより、ペリクル膜を枠上に引張応力を伴って張られる際に、第三地点付近の領域においても、ペリクル膜に十分な引張応力を与えることが可能となり、ペリクル膜の安定支持が達成される。 According to the ninth configuration of the pellicle of the present invention, before the pellicle film (2) is stretched on the frame (1), at least one beam (1a) of the two relatively long beams (1a) is formed. ) Is curved so as to be convex outward in advance, and a virtual straight line connecting the first point and the second point which are both ends of the neutral axis in the width direction of the beam (1a), and the first point wherein and the relationship between the third point located on the width direction of the neutral axis of the beam (1a) (line passing through the centroid a term used in mechanics of materials) that between the second point is, the pellicle and by tensioning film (2) with a tensile stress to the frame (1) on, the neutral axis is the imaginary straight line of the third point is the longer the across the virtual straight line relatively beams (1a) the deformed by such Rukoto so that concave inside, the pellicle film when spanned with a tensile stress on the frame, Also in the near region with three locations, points, it is possible to give sufficient tensile stress to the pellicle membrane, stability support is achieved for the pellicle film.

本発明に係るペリクルの第10の構成によれば、前記変形が、前記相対的に長い二つの梁(1a)の何れにもなされるならば、相対的に長い二つの梁の何れをジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to the tenth structure of the pellicle according to the present invention, the deformation, if any to also lack of the relatively long two beams (1a), any relatively long two beams jig Even when set on the top, wrinkles are prevented from occurring on the pellicle film.

本発明に係るペリクルの第11の構成によれば、更に前記相対的に短い二つの梁(1b)の少なくとも一方の梁(1b)も、予め外側に凸となるように湾曲しており、前記相対的に短い梁(1b)の幅方向の中立軸上の両端部である第一地点及び第四地点を直線で結んだ第2の仮想直線と、前記第一地点と、前記第四地点との間に位置し、前記相対的に短い梁(1b)の中立軸上に位置する第五地点との関係が、前記ペリクル膜(2)前記(1)上に引張応力を伴って張ることにより、前記第五地点が前記第2の仮想直線を横切って前記相対的に短い梁(1b)の中立軸が該仮想直線よりも内側で凹となるように変形されてなるので、相対的に短い二つの梁の少なくとも一方をジグ上にセットしてもペリクル膜にシワが発生することが防止される。 According to the eleventh configuration of the pellicle of the present invention, at least one of the two relatively short beams (1b) (1b) is also curved in advance to be convex outwardly, A second virtual straight line connecting the first point and the fourth point, which are both ends on the neutral axis in the width direction of the relatively short beam (1b), with the straight line, the first point, and the fourth point, located between the relationship between the fifth point located on the neutral axis of the relatively short beam (1b) is, put the pellicle membrane (2) with a tensile stress on the frame (1) it allows the fifth point is the second such neutral axis of the virtual straight line across and the relatively short beam (1b) is deformed so as to be concave on the inside than the virtual straight line Runode, relative To prevent the pellicle film from wrinkling even if at least one of the two short beams is set on the jig. It is.

本発明に係るペリクルの第12の構成によれば、前記変形が、前記相対的に短い二つの梁(1b)の何れにもなされるならば、第点付近の領域においても、ペリクル膜に十分な引張応力を与えることが可能となり、ペリクル膜のより一層の安定支持が達成される。 According to the twelfth structure of the pellicle according to the present invention, the deformation, the if Ru been made in any of the relatively short two beams (1b), even in the near area with the fifth land point, pellicle A sufficient tensile stress can be applied to the membrane, and a more stable support of the pellicle membrane is achieved.

本発明に係るペリクルの第13の構成によれば、ペリクル膜を枠上に張る前には、前記相対的に短い二つの梁(1b)の少なくとも一方の梁(1b)が、予め外側に凸となるように湾曲しており、前記相対的に短い梁(1b)の幅方向の中立軸の両端部である第一地点と第二地点とを結ぶ仮想直線と、前記第一地点と前記第二地点との間で且つ前記相対的に短い梁(1b)の幅方向の中立軸上に位置する第三地点との関係が前記ペリクル膜(2)前記(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に短い梁(1b)が該仮想直線よりも内側で凹となるように変形されてなるならば、第三地点付近の領域においても、ペリクル膜に十分な引張応力を与えることが可能となり、ペリクル膜の安定支持が達成される。 According to the thirteenth configuration of the pellicle according to the present invention, before the pellicle film is stretched on the frame , at least one beam (1b) of the two relatively short beams (1b) is projected outward in advance. and it is curved so that a virtual straight line connecting the first and second location which is both end portions in the width direction of the neutral axis of the relatively short beams (1b), the said first point first and the relationship between the third point located at the relatively short beam (1b) the width direction of the neutral axis on between the point-to-point is, tensile stress of the pellicle membrane (2) to the frame (1) on the by tensioning with, if the third point is the the relatively short beam across a virtual straight line (1b) is ing is deformed to concave inside than the virtual straight line, the third even in the near of the area with ground point, it is possible to give sufficient tensile stress to the pellicle film, a pellicle film Stable support is achieved.

本発明に係るペリクルの第14の構成によれば、前記変形が、前記相対的に短い二つの梁(1b)の何れにもなされるならば、第三地点付近の領域においても、ペリクル膜に十分な引張応力を与えることが可能となり、ペリクル膜のより一層の安定支持が達成される。 According to the fourteenth structure of the pellicle according to the present invention, the deformation, the if all the Ru also made of relatively short two beams (1b), even in a region of the near-dated third ground point, pellicle A sufficient tensile stress can be applied to the membrane, and a more stable support of the pellicle membrane is achieved.

図を用いて本発明を実施するための最良の形態について説明する。図1は大型ペリクル用枠体の構成を示す斜視図であり、図2(a)は大型ペリクル用枠体の構成を示す平面図、図2(b)は大型ペリクル用枠体にペリクル膜が貼着されて大型ペリクル用枠体の長辺が内側に窪んだ状態を示す平面図、図3は大型ペリクルをジグにより保持したときの状態を示す図、図4は枠体にペリクル膜を張る前と、枠体にペリクル膜が貼着された後の、図2に示される大型ペリクル用枠体の寸法の変化値を示す表である。   The best mode for carrying out the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing the structure of a large pellicle frame, FIG. 2 (a) is a plan view showing the structure of the large pellicle frame, and FIG. 2 (b) shows a pellicle film on the large pellicle frame. FIG. 3 is a plan view showing a state in which the long side of the frame for the large pellicle is depressed inwardly, FIG. 3 is a diagram showing the state when the large pellicle is held by a jig, and FIG. 4 is a pellicle film stretched on the frame It is a table | surface which shows the change value of the dimension of the frame for large pellicles shown in FIG. 2 before and after a pellicle film was stuck to the frame.

図1〜図2において、1は厚さ10μm以下のニトロセルロースやセルロース誘導体や非晶質フッ素ポリマー(例えば、旭硝子株式会社製のサイトップ(商品名)やデュポン株式会社製のテフロンAF(登録商標;商品名)等)等の透明な高分子膜で構成される大型ペリクル膜(以下、単に「ペリクル膜」という)2を貼張して支持するアルミニウムやその合金、或いは鉄や鉄系の合金等により構成される大型ペリクル用枠体(以下、単に「枠体」という)である。 1 and 2, reference numeral 1 denotes a nitrocellulose having a thickness of 10 μm or less, a cellulose derivative, or an amorphous fluoropolymer (for example, Cytop (trade name) manufactured by Asahi Glass Co., Ltd. or Teflon AF ( registered trademark ) manufactured by DuPont Co., Ltd.). ; Aluminum) and its alloys, or iron and iron alloys that support a large pellicle film (hereinafter simply referred to as “pellicle film”) 2 composed of a transparent polymer film such as a trade name) A large pellicle frame (hereinafter simply referred to as “frame”).

枠体1は、ペリクル膜2の厚さ方向(図2(b)の紙面方向)に見て一つの方向(図2(b)の左右方向)において、互いに向き合う相対的に長い二つの外周縁辺であり梁からなる一対の長辺1aと、ペリクル膜2の厚さ方向(図2(b)の紙面方向)に見て前記一つの方向(図2(b)の左右方向)に直角なもう一つの方向(図2(b)の上下方向)において、互いに向き合う相対的に短い二つの外周縁辺であり梁からなる一対の短辺1bを有しており、長辺1a及び短辺1bは所定の幅寸法と、互いに等しい所定の高さ寸法をそれぞれ有して構成されている。枠体1の長辺1a及び短辺1bの一方の面には、枠体1の全体に亘って平坦面で構成され、ペリクル膜2を貼着するための貼着面1a1、1b1が形成されている。   The frame 1 has two relatively long outer peripheral edges facing each other in one direction (left and right direction in FIG. 2B) when viewed in the thickness direction of the pellicle film 2 (paper surface direction in FIG. 2B). A pair of long sides 1a made of beams and a direction perpendicular to the one direction (left and right direction in FIG. 2B) when viewed in the thickness direction of the pellicle film 2 (the paper surface direction in FIG. 2B) In one direction (vertical direction in FIG. 2B), there are two relatively short outer peripheral edges facing each other and a pair of short sides 1b made of a beam, and the long side 1a and the short side 1b are predetermined. And a predetermined height dimension equal to each other. On one surface of the long side 1a and the short side 1b of the frame 1, there are formed bonding surfaces 1a1, 1b1 that are flat surfaces over the entire frame 1, and for bonding the pellicle film 2. ing.

枠体1のペリクル膜2を貼張した後の面積は、ペリクル膜2の厚さ方向に見て面積が1,000cm以上で構成され、該枠体1の一対の長辺1aは枠体1の外側に向かって突出するように形成されている。尚、本実施形態では、枠体1の一対の長辺1aは所定の曲率を有して外側に向かって湾曲突出したものであるが、楕円形状や放物線形状、或いは他の各種形状で突出させてもよい。 The area of the frame body 1 after the pellicle film 2 is pasted is configured to have an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film 2, and the pair of long sides 1 a of the frame body 1 is a frame body. 1 is formed so as to protrude outward. In the present embodiment, the pair of long sides 1a of the frame body 1 has a predetermined curvature and protrudes in a curved manner toward the outside, but is projected in an elliptical shape, a parabolic shape, or other various shapes. May be.

また図示しない他の実施形態としては、一対の短辺1bを所定の曲率を有して外側に向かって湾曲突出したものであっても良いし、一対の長辺1a及び一対の短辺1bの4辺全てを所定の曲率を有して外側に向かって湾曲突出したものであっても良い。また一方の長辺1a或いは一方の短辺1bを所定の曲率を有して外側に向かって湾曲突出したものであっても良いし、これ等の種々の組み合わせで適宜長辺1a、短辺1bを選択的に所定の曲率を有して外側に向かって湾曲突出したものであっても良い。   Moreover, as other embodiment which is not shown in figure, a pair of short sides 1b may have a predetermined curvature and bend and protrude outward, or a pair of long sides 1a and a pair of short sides 1b. All four sides may have a predetermined curvature and bend and project outward. Further, one long side 1a or one short side 1b may have a predetermined curvature and bend and protrude outward, or the long side 1a and the short side 1b may be appropriately combined with various combinations thereof. Alternatively, the projection may be curved and protruded outward with a predetermined curvature.

このようにペリクル膜2を貼張する面積が1,000cm以上であることから、大型のTFT−LCD(薄膜トランジスタ−液晶ディスプレイ)のフォトリソグラフィ工程で使用される大型のフォトマスクやレティクルに適用できる大型ペリクルとして利用することができる。 Thus, since the area where the pellicle film 2 is pasted is 1,000 cm 2 or more, it can be applied to a large photomask or reticle used in a photolithography process of a large TFT-LCD (Thin Film Transistor-Liquid Crystal Display). It can be used as a large pellicle.

図2(b)に示すように、枠体1の長辺1a及び短辺1bの貼着面1a1、1b1には接着剤が塗布され、ペリクル膜2の周辺部が所定の引張応力を伴って貼張されて固定される。   As shown in FIG. 2B, an adhesive is applied to the sticking surfaces 1a1 and 1b1 of the long side 1a and the short side 1b of the frame 1, and the peripheral part of the pellicle film 2 is accompanied by a predetermined tensile stress. Affixed and fixed.

ペリクル膜2を枠体1上に張る前には、図2(a)に示すように、長辺1aを湾曲して、ペリクル膜2の厚さ方向に見てその上の第一地点(例えば長辺1aの左端部)と第二地点(例えば長辺1aの右端部)とを結ぶ図示しない仮想直線が第一地点と第二地点との間のその上の第三地点(例えば長辺1aの中間部或いは中立軸)に対して、湾曲した長辺1aの内側を通過した相対的に長い二つの外周縁辺であって梁となる長辺1aは、図2(b)に示すように、ペリクル膜2を枠体1上に引張応力を伴って張ることにより、ペリクル膜2の厚さ方向に見て第一地点(例えば長辺1aの左端部)と第二地点(例えば長辺1aの右端部)とを結ぶ図示しない仮想直線が該第一地点と第二地点との間の第三地点(例えば長辺1aの中間部或いは中立軸)に対して、湾曲した長辺1aの外側を通過するよう変形される。 Before the pellicle film 2 is stretched on the frame 1, as shown in FIG. 2 (a), the long side 1a is curved, and the first point (for example, A virtual straight line (not shown) that connects the second point (for example, the right end of the long side 1a) and a second point (for example, the long side 1a) between the first point and the second point is connected to the second point (for example, the long end 1a). respect of the intermediate portion or the neutral axis), the long side 1a of relatively a long two outer peripheral edge the beam inner side has passed the curved long sides 1a, as shown in FIG. 2 (b) By stretching the pellicle film 2 on the frame body 1 with a tensile stress, the first point (for example, the left end portion of the long side 1a) and the second point (for example, the long side 1a) are viewed in the thickness direction of the pellicle film 2. A virtual straight line (not shown) connecting the right end of the third point between the first point and the second point (for example, the middle part of the long side 1a or neutral) ) Relative to, is deformed so as to pass through the outer side of the curved long sides 1a.

尚、図示しない他の実施形態として、短辺1bを所定の曲率を有して外側に向かって湾曲突出した場合も同様で、短辺1bを湾曲して、ペリクル膜2の厚さ方向に見てその上の第一地点(例えば短辺1bの上端部)と第二地点(例えば短辺1bの下端部)とを結ぶ図示しない仮想直線が第一地点と第二地点との間のその上の第三地点(例えば短辺1bの中間部或いは中立軸)に対して、湾曲した短辺1bの内側を通過した相対的に短い二つの外周縁辺であって梁となる短辺1bは、ペリクル膜2を枠体1上に引張応力を伴って張ることにより、ペリクル膜2の厚さ方向に見て第一地点(例えば短辺1bの上端部)と第二地点(例えば短辺1bの下端部)とを結ぶ図示しない仮想直線が該第一地点と第二地点との間の第三地点(例えば短辺1bの中間部或いは中立軸)に対して、湾曲した短辺1bの外側を通過するよう変形される。 As another embodiment (not shown), the same applies to a case where the short side 1b has a predetermined curvature and protrudes outward, and the short side 1b is bent to be seen in the thickness direction of the pellicle film 2. A virtual straight line (not shown) connecting the first point (for example, the upper end portion of the short side 1b) and the second point (for example, the lower end portion of the short side 1b) above the lever is located between the first point and the second point. the third point (e.g., an intermediate portion or a neutral axis of the short sides 1b) with respect to a short side 1b which the outer peripheral edge at a by beams relatively short two which has passed through the inner side of the short side 1b which is curved, By stretching the pellicle film 2 on the frame 1 with a tensile stress, the first point (for example, the upper end of the short side 1b) and the second point (for example, the short side 1b) are viewed in the thickness direction of the pellicle film 2. A virtual straight line (not shown) connecting the lower end) is a third point (for example, short side 1b) between the first point and the second point. The intermediate portion or the neutral axis), is deformed so as to pass through the outer side of the short sides 1b curved.

枠体1の貼着面1a1、1b1に貼着されたペリクル膜2の張力は、枠体1の全周に均一に作用するが、必ずしも断面形状が全周にわたり等しい必要はないが、断面形状が等しい場合には、辺が長い方が撓みが大きくなる。   Although the tension of the pellicle film 2 attached to the attachment surfaces 1a1 and 1b1 of the frame body 1 acts uniformly on the entire circumference of the frame body 1, the sectional shape is not necessarily equal over the entire circumference, but the sectional shape Are equal, the longer the side, the greater the deflection.

このため、図2(b)に示すように、特に長辺1aが枠体1の内側に向かって大きな撓みが発生するように作用し、ペリクル膜2が展張されて枠体1に貼着された後は、枠体1の向かい合う長辺1aは共に内側に凹んでいる。ペリクル膜2を枠体1に貼り付けるには、ペリクル膜2の張力を維持したまま枠体1に貼り付けても良いし、ジグ3等を使用してペリクル膜2の張力を所定の張力にコントロールした後、枠体1に貼り付けても良い。   For this reason, as shown in FIG. 2 (b), the long side 1 a particularly acts so as to generate a large deflection toward the inside of the frame 1, and the pellicle film 2 is stretched and adhered to the frame 1. After that, the opposing long sides 1a of the frame 1 are both recessed inward. In order to attach the pellicle film 2 to the frame body 1, the pellicle film 2 may be attached to the frame body 1 while maintaining the tension of the pellicle film 2, or the tension of the pellicle film 2 is set to a predetermined tension using a jig 3 or the like. You may affix on the frame 1 after controlling.

本実施形態においては、枠体1の一対の長辺1aを枠体1の外側に向かって突出するように形成したことで、長辺1aの枠体1の内側に向かう撓みが抑制される。このため、大型ペリクルが取り付けられる図示しないフォトマスクやレティクル等の有効露光領域を確保することができる。   In the present embodiment, by forming the pair of long sides 1a of the frame body 1 so as to protrude toward the outside of the frame body 1, bending of the long side 1a toward the inside of the frame body 1 is suppressed. Therefore, it is possible to secure an effective exposure region such as a photomask or a reticle (not shown) to which a large pellicle is attached.

ここで、本実施形態においては、枠体1にペリクル膜2を所定の引張応力を伴って貼着展張すると、ペリクル膜2の厚さ方向に見て相対的に長い二つの外周縁辺であって梁からなる長辺1aの両端地点を結ぶ図示しない仮想直線は、該両端地点の間の中央地点に対して該両端地点を結ぶ仮想直線に直角な方向において、長辺1aの中央部が長辺1aの端部よりも内側に窪み量dだけ離れて窪むように形成する。ここで、窪み量dは、0.2mm以上、且つ6mm以下が好ましく、更に好ましい窪み量dは、0.2mm以上、且つ3mm以下である。このように、ペリクル膜2を貼り付けた状態で、長辺1aの一部が突出することがない。   Here, in the present embodiment, when the pellicle film 2 is stuck to the frame body 1 with a predetermined tensile stress, the two outer peripheral edges are relatively long when viewed in the thickness direction of the pellicle film 2. A virtual straight line (not shown) that connects both end points of the long side 1a made of a beam has a long side at the center of the long side 1a in a direction perpendicular to the virtual straight line connecting the two end points with respect to the central point between the two end points. It is formed so as to be recessed away from the end portion of 1a by a recess amount d. Here, the depression amount d is preferably 0.2 mm or more and 6 mm or less, and more preferably the depression amount d is 0.2 mm or more and 3 mm or less. Thus, a part of the long side 1a does not protrude in a state where the pellicle film 2 is attached.

このため、図3に示すように、枠体1の端部をジグ3にセットしてマウンターにて押さえる際、ジグ3が突出した部分を押圧することはない。この結果、枠体1に展張されたペリクル膜2に不要な力が加わることがなく、シワが寄るというおそれがない。   For this reason, as shown in FIG. 3, when the edge part of the frame 1 is set to the jig 3, and it presses with a mounter, the part which the jig 3 protrudes is not pressed. As a result, unnecessary force is not applied to the pellicle film 2 stretched on the frame 1, and there is no fear of wrinkles.

また、窪み量dを3mm以下にすることにより、上記の作用に加えて、枠体1の長辺1aが撓むことによってフォトマスクの有効露光領域が小さくなるといった問題を最小限にすることができる。   Further, by setting the depression amount d to 3 mm or less, in addition to the above-described action, the problem that the effective exposure area of the photomask is reduced by bending the long side 1a of the frame 1 is minimized. it can.

以下に、上記実施形態に基いて形成した枠体1の一実施例を説明する。窪み量dは、以下の数1式により概略求められる。ここで、d:窪み量、ω:張力、L:長辺1aの長さ、E:弾性率、h:枠体1の高さ、b:枠体1の幅とする。   Below, one Example of the frame 1 formed based on the said embodiment is described. The amount d of depressions is roughly determined by the following equation (1). Here, d: dent amount, ω: tension, L: length of the long side 1a, E: elastic modulus, h: height of the frame 1, and b: width of the frame 1.

Figure 0004024239
Figure 0004024239

本実施例においては、L=777.7mm、E=70560×10Pa(7200kgf/mm)、h=4.3mm、b=9mm、ω=2.9×10−2MPa/mm(3×10−3kgf/mm)と構成した結果、d=1.5mmを得た。 In this example, L = 777.7 mm, E = 70560 × 10 6 Pa (7200 kgf / mm 2 ), h = 4.3 mm, b = 9 mm, ω = 2.9 × 10 −2 MPa / mm (3 × 10 −3 kgf / mm) As a result, d = 1.5 mm was obtained.

尚、本実施例においては窪み量dを1.5mmとしたが、窪み量dが3mm(或いは6mm)以下になる範囲内において、他の数値をどのように変更してもよい。   In this embodiment, the dent amount d is set to 1.5 mm, but other numerical values may be changed as long as the dent amount d is 3 mm (or 6 mm) or less.

図4は枠体1にペリクル膜2を張る前と、枠体1にペリクル膜2が貼着された後の、図2(a),(b)に示される大型ペリクル用枠体1の寸法の変化値を示す表であり、uは短辺1b側梁の幅、Wは長辺1a側梁の幅、Vは短辺1b側梁の長手方向中央部における短辺1b側梁の外縁長さ、Xは長辺1a側梁の長手方向中央部における長辺1a側梁の外縁長さ、Yは短辺1b側梁の長手方向長さ、Zは長辺1a側梁の長手方向長さを示す。   4 shows dimensions of the large pellicle frame body 1 shown in FIGS. 2A and 2B before the pellicle film 2 is applied to the frame body 1 and after the pellicle film 2 is attached to the frame body 1. FIG. Is the width of the short side 1b side beam, W is the width of the long side 1a side beam, V is the outer edge length of the short side 1b side beam at the longitudinal center of the short side 1b side beam. X is the outer edge length of the long side 1a beam at the longitudinal center of the long side 1a beam, Y is the longitudinal length of the short side 1b beam, and Z is the longitudinal length of the long side 1a beam. Indicates.

本発明の活用例として、大型ペリクル、即ち、より大きなフォトマスクに装着するためのペリクルとして用いられる。   As an application example of the present invention, it is used as a large pellicle, that is, a pellicle for mounting on a larger photomask.

大型ペリクル用枠体の構成を示す斜視図である。It is a perspective view which shows the structure of the frame for large pellicles. (a)はペリクル膜を張る前の大型ペリクル用枠体の状態を示す平面図であり、(b)は大型ペリクル用枠体にペリクル膜が貼着されて大型ペリクル用枠体の長辺が内側に窪んだ状態を示す平面図である。(A) is a plan view showing a state of a large pellicle frame body before the pellicle film is stretched, and (b) is a diagram showing that the long side of the large pellicle frame body is bonded to the large pellicle frame body. It is a top view which shows the state hollowed inside. 大型ペリクルをジグにより保持したときの状態を示す図である。It is a figure which shows a state when holding a large pellicle with a jig. 枠体にペリクル膜を張る前と、枠体にペリクル膜が貼着された後の、図2に示される大型ペリクル用枠体の寸法の変化値を示す表である。It is a table | surface which shows the change value of the dimension of the frame for large pellicles shown in FIG. 2 before sticking a pellicle film | membrane on a frame, and after a pellicle film was affixed on a frame. 従来の大型ペリクルの構成を示す平面図である。It is a top view which shows the structure of the conventional large pellicle.

符号の説明Explanation of symbols

1…枠体
1a…長辺
1a1…貼着面
1b…短辺
1b1…貼着面
2…ペリクル膜
3…ジグ
DESCRIPTION OF SYMBOLS 1 ... Frame 1a ... Long side 1a1 ... Adhering surface 1b ... Short side 1b1 ... Adhering surface 2 ... Pellicle film 3 ... Jig

Claims (14)

ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)と、を有するペリクルであって、
前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの外周縁辺の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの外周縁辺の対と、を有し、
前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に長い二つの外周縁辺の少なくとも一方の外周縁辺が、予め外側に凸となるように湾曲しており、前記相対的に長い外周縁辺の両端部である第一地点及び第二地点を直線でんだ仮想直線と、前記第一地点と、前記第二地点との間に位置し、前記相対的に長い外周縁辺上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に長い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなることを特徴とするペリクル。
A pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a frame (1) on which the pellicle film (2) is stretched with a tensile stress, A pellicle having
The frame (1) is seen in the thickness direction of the pellicle film (2), and a pair of two relatively short outer peripheral edges facing each other in one direction, and in the thickness direction of the pellicle film (2). Seeing, in another direction perpendicular to the one direction, two relatively long pairs of outer peripheral edges facing each other, and
Before stretching the pellicle film (2) on the frame (1) , at least one outer peripheral edge of the two relatively long outer peripheral edges is curved so as to be convex outward in advance, a virtual straight line I formation do at the first location and the straight line a second location which is a relatively long outer peripheral edge of the end portions, said first point located between the second point, a long the relatively The relationship with the third point located on the outer peripheral edge is that the pellicle film (2) is stretched on the frame (1) with a tensile stress, so that the third point crosses the virtual straight line and the relative point. pellicle is to long outer peripheral edge and said Rukoto such is deformed to concave inside than the virtual straight line.
請求項1に記載の変形が、前記相対的に長い二つの外周縁辺の何れにもなされることを特徴とする請求項1に記載のペリクル。 The pellicle according to claim 1 variant according to claim 1, also made in any of the relatively long two outer peripheral edge, characterized in Rukoto. 更に前記相対的に短い二つの外周縁辺の少なくとも一方の外周縁辺も、予め外側に凸となるように湾曲しており、前記相対的に短い外周縁辺の両端部である第一地点及び第四地点を直線で結んだ第2の仮想直線と、前記第一地点と、前記第四地点との間に位置し、前記相対的に短い外周縁辺上に位置する第五地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第五地点が前記第2の仮想直線を横切って前記相対的に短い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする請求項1または請求項2に記載のペリクル。 Further, at least one outer peripheral edge of the two relatively short outer peripheral edges is curved in advance so as to protrude outward, and the first point and the fourth point are both ends of the relatively short outer peripheral edge. Between the second virtual straight line connecting the two straight lines, the first point, and the fifth point located between the first point and the fourth point, and located on the relatively short outer peripheral edge. By stretching the membrane (2) on the frame (1) with a tensile stress, the fifth short point crosses the second imaginary straight line and the relatively short outer peripheral edge is inside the imaginary straight line. the pellicle according to claim 1 or claim 2, wherein a modified in such Rukoto so that concave. 請求項3に記載の変形が、前記相対的に短い二つの外周縁辺の何れにもなされることを特徴とする請求項に記載のペリクル。 The pellicle according to claim 3 variant according to claim 3, also made in any of the relatively short two outer peripheral edge, characterized in Rukoto. ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)と、を有するペリクルであって、
前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの外周縁辺の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの外周縁辺の対と、を有し、
前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に短い二つの外周縁辺の少なくとも一方の外周縁辺が、予め外側に凸となるように湾曲しており、前記外周縁辺の両端部である第一地点及び第二地点を直線でんだ仮想直線と、前記第一地点と、前記第二地点との間に位置し、前記相対的に短い外周縁辺上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に短い外周縁辺が該仮想直線よりも内側で凹となるように変形されてなることを特徴とするペリクル。
A pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a frame (1) on which the pellicle film (2) is stretched with a tensile stress, A pellicle having
The frame (1) is seen in the thickness direction of the pellicle film (2), and a pair of two relatively short outer peripheral edges facing each other in one direction, and in the thickness direction of the pellicle film (2). Seeing, in another direction perpendicular to the one direction, two relatively long pairs of outer peripheral edges facing each other, and
Before stretching the pellicle film (2) on the frame (1) , at least one outer peripheral edge of the two relatively short outer peripheral edges is curved in advance so as to protrude outwardly, a virtual straight line I formation do at the first location and the straight line a second location which is both end portions of the outer peripheral edge, said first point located between the second point, the relatively short outer peripheral edge on relationship between the third point to position the by tensioning the pellicle membrane (2) with a tensile stress to the frame (1) on the relatively short outer periphery the third point is across the imaginary straight line pellicle edge is characterized by deformed by such Rukoto so that concave inside than the virtual straight line.
請求項5に記載の変形が、前記相対的に短い二つの外周縁辺の何れにもなされることを特徴とする請求項5に記載のペリクル。 6. The pellicle according to claim 5, wherein the deformation according to claim 5 is performed on any of the two relatively short outer peripheral edges . 前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることによる変形によって、前記外周縁辺の両端の間の中央地点を第三地点、或いは第五地点とした場合、該第三地点、或いは第五地点から前記仮想直線に対して垂線を下ろした際の該垂線の長さが0.2mm以上、且つ6mm以下であることを特徴とする請求項1〜6のいずれか1項に記載のペリクル。 Wherein the pellicle film (2) that due to tensioning with a tensile stress on the frame (1) a modification, the central point of the third point between the peripheral edge at both ends, or when the fifth point, said third point, or of claims 1 to 6 the length of the fifth point said vertical line when a perpendicular line is dropped for the imaginary straight line from the characterized above 0.2 mm, and 6mm below der Rukoto The pellicle according to any one of the above. 前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることによる変形によって、前記外周縁辺の両端の間の中央地点を第三地点、或いは第五地点とした場合、該第三地点、或いは第五地点から前記仮想直線に対して垂線を下ろした際の該垂線の長さが0.2mm以上、且つ3mm以下であることを特徴とする請求項1〜6のいずれか1項に記載のペリクル。 Wherein the pellicle film (2) that due to tensioning with a tensile stress on the frame (1) a modification, the central point of the third point between the peripheral edge at both ends, or when the fifth point, said third point, or of claims 1 to 6 the length of the fifth point said vertical line when a perpendicular line is dropped for the imaginary straight line from the characterized above 0.2 mm, and 3mm below der Rukoto The pellicle according to any one of the above. ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)と、を有するペリクルであって、
前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの梁(1b)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に短い二つの梁(1b)の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの梁(1a)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に長い二つの梁(1a)の対と、を有し、
前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に長い二つの梁(1a)の少なくとも一方の梁(1a)が、予め外側に凸となるように湾曲しており、前記梁(1a)の幅方向の中立軸の両端部である第一地点と第二地点とを結ぶ仮想直線と、前記第一地点と前記第二地点との間で且つ前記梁(1a)の幅方向の中立軸上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に長い梁(1a)の中立軸が該仮想直線よりも内側で凹となるように変形されてなることを特徴とするペリクル。
A pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a frame (1) on which the pellicle film (2) is stretched with a tensile stress, A pellicle having
The frame (1) is a pair of two relatively short beams (1b) facing each other in one direction when viewed in the thickness direction of the pellicle film (2), on which the pellicle film (2 ) In the other direction perpendicular to the one direction as viewed in the thickness direction of the pellicle film (2) A pair of two relatively long beams (1a) facing each other, and a pair of two relatively long beams (1a) on which the periphery of the pellicle film (2) is fixed,
Before the pellicle film (2) is stretched on the frame (1 ), at least one of the relatively long beams (1a) is curved in advance so as to be convex outward. and a virtual straight line connecting the first point and the second point is the opposite ends of the neutral axis in the width direction of the beam (1a), and the beam between said second point and said first point ( The relationship with the third point located on the neutral axis in the width direction of 1a) is that the pellicle film (2) is stretched on the frame (1) with a tensile stress, so that the third point becomes the virtual point. pellicle, wherein Rukoto neutral axis such is deformed to concave inside than the virtual straight line of the relatively long beams (1a) across a straight line.
請求項9に記載の変形が、前記相対的に長い二つの梁(1a)の何れにもなされることを特徴とする請求項9に記載のペリクル。 The pellicle according to claim 9 deformation of claim 9, also made in any of the relatively long two beams (1a), characterized in Rukoto. 更に前記相対的に短い二つの梁(1b)の少なくとも一方の梁(1b)も、予め外側に凸となるように湾曲しており、前記相対的に短い梁(1b)の幅方向の中立軸上の両端部である第一地点及び第四地点を直線で結んだ第2の仮想直線と、前記第一地点と、前記第四地点との間に位置し、前記相対的に短い梁(1b)の中立軸上に位置する第五地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第五地点が前記第2の仮想直線を横切って前記相対的に短い梁(1b)の中立軸が該仮想直線よりも内側で凹となるように変形されてなることを特徴とする請求項9または請求項10に記載のペリクル。 Further, at least one beam (1b) of the two relatively short beams (1b) is also curved in advance so as to be convex outward, and the neutral axis in the width direction of the relatively short beam (1b). The relatively short beam (1b) is located between the second virtual straight line connecting the first point and the fourth point, which are the upper ends, and the first point and the fourth point. ) When the relationship between the fifth point and the fifth point located on the neutral axis is that the pellicle film (2) is stretched on the frame (1) with a tensile stress, the fifth point becomes the second virtual straight line. the pellicle according to claim 9 or claim 10 neutral axis and said deformed in such Rukoto so that concave inside than the virtual straight line of the relatively short beam across the (1b). 請求項11に記載の変形が、前記相対的に短い二つの梁(1b)の何れにもなされることを特徴とする請求項11に記載のペリクル。 The pellicle according to claim 11 modified according to claim 11, also made in any of the relatively short two beams (1b), characterized in Rukoto. ペリクル膜(2)の厚さ方向に見て面積が1,000cm以上のペリクル膜(2)と、その上にペリクル膜(2)が引張応力を伴って張られた枠(1)と、を有するペリクルであって、
前記枠(1)は、前記ペリクル膜(2)の厚さ方向に見て、一つの方向において互いに向き合う相対的に短い二つの梁(1b)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に短い二つの梁(1b)の対と、前記ペリクル膜(2)の厚さ方向に見て、前記一つの方向に直角なもう一つの方向において、互いに向き合う相対的に長い二つの梁(1a)の対であり、その上に前記ペリクル膜(2)の周辺部が固定される相対的に長い二つの梁(1a)の対と、を有し、
前記ペリクル膜(2)を前記枠(1)上に張る前には、前記相対的に短い二つの梁(1b)の少なくとも一方の梁(1b)が、予め外側に凸となるように湾曲しており、前記相対的に短い梁(1b)の幅方向の中立軸の両端部である第一地点と第二地点とを結ぶ仮想直線と、前記第一地点と前記第二地点との間で且つ前記相対的に短い梁(1b)の幅方向の中立軸上に位置する第三地点との関係が、前記ペリクル膜(2)を前記枠(1)上に引張応力を伴って張ることにより、前記第三地点が前記仮想直線を横切って前記相対的に短い梁(1b)が該仮想直線よりも内側で凹となるように変形されてなることを特徴とするペリクル。
A pellicle film (2) having an area of 1,000 cm 2 or more when viewed in the thickness direction of the pellicle film (2), and a frame (1) on which the pellicle film (2) is stretched with a tensile stress, A pellicle having
The frame (1) is a pair of two relatively short beams (1b) facing each other in one direction when viewed in the thickness direction of the pellicle film (2), on which the pellicle film (2 ) In the other direction perpendicular to the one direction as viewed in the thickness direction of the pellicle film (2) A pair of two relatively long beams (1a) facing each other, and a pair of two relatively long beams (1a) on which the periphery of the pellicle film (2) is fixed,
Before the pellicle film (2) is stretched on the frame (1 ), at least one of the two relatively short beams (1b) is curved so as to be convex outward in advance. and has a virtual straight line connecting the first point and the second point is the opposite end portions in the width direction of the neutral axis of relatively short beams (1b), between said second location and said first location And the relationship with the third point located on the neutral axis in the width direction of the relatively short beam (1b) is that the pellicle film (2) is stretched on the frame (1) with a tensile stress. the pellicle third point is the relatively short beam across said imaginary straight line (1b) is characterized deformed by such Rukoto so that concave inside than the virtual straight line.
請求項13に記載の変形が、前記相対的に短い二つの梁(1b)の何れにもなされることを特徴とする請求項13に記載のペリクル。 The pellicle according to claim 13 modified according to claim 13, also made in any of the relatively short two beams (1b), characterized in Rukoto.
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JP2011158585A (en) * 2010-01-29 2011-08-18 Shin-Etsu Chemical Co Ltd Pellicle and method for manufacturing the same
JP5512340B2 (en) * 2010-03-17 2014-06-04 旭化成イーマテリアルズ株式会社 Large pellicle
JP6018391B2 (en) * 2012-03-21 2016-11-02 旭化成株式会社 Pellicle
JP6156998B2 (en) * 2013-10-22 2017-07-05 信越化学工業株式会社 Pellicle
TWI658321B (en) * 2013-12-05 2019-05-01 荷蘭商Asml荷蘭公司 Apparatus and method for manufacturing a pellicle, and a pellicle
KR101603788B1 (en) 2014-05-23 2016-03-15 주식회사 에프에스티 Pellicle for large size photomask
CN106048520B (en) * 2016-05-27 2017-11-17 京东方科技集团股份有限公司 Mask plate framework and main body, mask plate and preparation method, substrate and display panel
CN106048521B (en) * 2016-06-12 2018-09-18 鄂尔多斯市源盛光电有限责任公司 A kind of preparation method and metal mask plate of metal mask plate
CN108123671A (en) * 2017-11-29 2018-06-05 北京创昱科技有限公司 A kind of frame compression set and film drawing process
CN120370617B (en) * 2025-06-09 2025-10-24 浙江众凌科技有限公司 A method for controlling the non-tensile deformation of a mask and a metal mask

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Publication number Priority date Publication date Assignee Title
JPH0968793A (en) * 1995-08-30 1997-03-11 Shin Etsu Chem Co Ltd Pellicle
JP4007752B2 (en) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 Large pellicle frame and large pellicle
JP4004188B2 (en) * 1999-07-30 2007-11-07 旭化成エレクトロニクス株式会社 Large pellicle frame
JP4007750B2 (en) * 2000-06-02 2007-11-14 旭化成エレクトロニクス株式会社 Pellicle
JP4043232B2 (en) * 2001-01-26 2008-02-06 旭化成エレクトロニクス株式会社 Large pellicle
JP4601204B2 (en) * 2001-05-11 2010-12-22 旭化成イーマテリアルズ株式会社 Pellicle frame
JP4027085B2 (en) * 2001-12-04 2007-12-26 キヤノン株式会社 Device manufacturing related apparatus and device manufacturing method

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CN100378577C (en) 2008-04-02
JP2005128512A (en) 2005-05-19

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