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JP4072985B2 - Hydrogen production method and apparatus - Google Patents
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JP4072985B2 - Hydrogen production method and apparatus - Google Patents

Hydrogen production method and apparatus Download PDF

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JP4072985B2
JP4072985B2 JP2000020026A JP2000020026A JP4072985B2 JP 4072985 B2 JP4072985 B2 JP 4072985B2 JP 2000020026 A JP2000020026 A JP 2000020026A JP 2000020026 A JP2000020026 A JP 2000020026A JP 4072985 B2 JP4072985 B2 JP 4072985B2
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hydrogen
reaction vessel
pressure
reaction
silicon
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JP2001213609A (en
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太加良 杉野
良司 村椿
義昭 高沢
多可美 清水
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Sugino Machine Ltd
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Sugino Machine Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

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Description

【0001】
【発明の属する技術分野】
本発明は、シリコンを原料とする水素の製造方法および製造装置に関するものである。
【0002】
【従来の技術】
我が国に消費されている水素の大半は、石油や天然ガスから水蒸気改質法や部分酸化法によって得られたものが、アンモニア合成やメタノール製造用としてコンビナート内で自家消費されている。しかし、これらの水素は純度が低いため、外販用の水素には、水の電気分解や食塩電解の副生水素や、石油精製プロセスからの副生水素を工業用に精製したものが利用されているのが現状である。
【0003】
しかしながら、このような従来の方法で得られる水素は、数十〜数百気圧、数百℃という高温高圧の環境下で生成され、製造に大きなエネルギーを必要とし、コスト高である。そこで、純度の高い水素を低コストで得られる製造方法が望まれている。
【0004】
一方、ケイ素をアルカリ液に入れて加熱すると水素が発生することは以前から知られている事実であるが、半導体装置の製造分野において、水素源となり得るシリコンが多量に廃棄されている事実もある。このようなシリコン屑など、低コストで豊富な原料の供給の可能性や、ケイ素とアルカリ液との水素発生反応が大気圧、百℃以下という容易に設定できる環境下で充分行えることからも、ケイ素を用いた水素製造方法は有望なものと言える。
【0005】
【発明が解決しようとする課題】
しかしながら、上記の如きケイ素を原料とした水素製造方法についても、水素を効率的に且つ安定に供給できるような工業化に当たって実用に適したものにする必要がある。
【0006】
例えば、ケイ素とアルカリ性水溶液との混合による水素発生反応においては、溶液中に水素ガス以外にケイ酸イオンが生成されるが、水素ガスを多量に生成しようとして単に過剰の高濃度アルカリ液を使用したりケイ素を多量に供給したりすると、ケイ酸イオンがゲル状となって水素ガスの生成が阻害されるという問題が生じる。
【0007】
また、ケイ素とアルカリ性水溶液との反応は両者の接触後直ちに激しく開始され、その数分後には生成可能な水素ガス量の大半が発生してしまい、その後は僅かな反応が持続するだけである。即ち、反応開始から終了までの間に水素生成速度が大きく変化するため発生した水素ガスをそのまま取り出すだけでは定量的な水素の供給は困難である。
【0008】
さらに、原料のケイ素は前述の如くシリコン屑等の粉体として供給されることが考えられるが、このような場合、アルカリ性水溶液を加温する反応系で粉体を投入することは、水蒸気の立ちこめる容器付近での配管内目詰まりや反応系への不純物ガス混入の原因となる可能性がある。
【0009】
本発明の目的は、上記問題点に鑑み、ケイ素とアルカリ液との混合により水素を発生させる水素製造方法において、水素ガスの生成を阻害する原因となるケイ酸イオンのゲル化を回避して効率よく水素を製造できる方法および装置を提供することにある。また本発明は、連続的に水素の定量供給ができる実用に適した水素の製造方法および装置を提供することを目的とする。
【0010】
【課題を解決するための手段】
上記目的を達成するため、請求項1に記載の発明に係る水素製造方法は、粉体ケイ素とアルカリ液とを反応容器に供給して反応容器内で加温下に接触反応させることにより水素を発生させる水素製造方法において、予め粉体ケイ素を水と混合してスラリー状態とし、このケイ素スラリーを反応容器に供給し、
反応容器内からの水素の導出流量に応じて反応容器内圧が予め定められた圧力範囲内に保たれるようにケイ素スラリー及び/又はアルカリ液の供給を制御するものである。
【0012】
請求項に記載の発明に係る水素製造装置は、耐圧構造の反応容器と、該反応容器を加温して反応温度を維持するための恒温加熱装置と、粉体ケイ素を水と混合してスラリー状態で貯留する第1タンクと、アルカリ液を貯留する第2タンクと、前記第1タンク内のケイ素スラリー及び前記第2タンク内のアルカリ液を反応容器内に送り込む液体供給装置と、前記反応容器内で発生した水素を外部へ導出するための気体導出装置と、を備え、
前記気体導出装置が、前記反応容器内の気体圧力を計測する圧力測定手段と水素の導出流量を制御する気体流量制御手段とを備え、
前記液体供給装置が、前記圧力測定手段で計測された圧力値および前記気体流量制御手段で制御された流量値に基づいて反応容器内からの水素の導出流量に応じて反応容器内圧が予め定められた圧力範囲内に保たれるようにケイ素スラリー及び/又はアルカリ液の供給を制御する液体供給制御手段を備えたものである。
【0014】
さらに、請求項に記載の発明に係る水素製造装置は、請求項に記載の水素製造装置において、前記気体流量制御手段が予め定められた流量で水素を導出するための凝縮器およびマスフローコントローラーを備えているものである。
【0015】
また、請求項に記載の発明に係る水素製造装置は、請求項に記載の水素製造装置において、前記液体供給制御手段がポンプを備え、該ポンプの吐出流路が反応容器に接続されると共に吸入流路がそれぞれ選択的に開閉可能な開閉弁を介して前記第1タンクと第2タンクに並列接続され、前記圧力測定手段で計測された圧力値に基づいて前記ポンプの起動と停止及び各開閉弁の開閉を行うようにしたことを特徴とするものである。
【0016】
請求項1に記載の発明による水素製造方法は、粉体ケイ素とアルカリ液との混合により水素を発生させる水素製造方法において原料の粉体ケイ素を予め水と混合してスラリー状態にして供給するものであるため、ケイ素を粉体のまま供給する場合に比べて混合する水の介在で反応容器内の液量が増加して溶液中のケイ酸イオン濃度が抑えられ、水素ガス発生を阻害する原因となるゲル状副生成物の発生も抑えられる。またスラリー状態でケイ素を供給すると、ケイ素とアルカリ液との接触直後の激しい反応も抑えられるため、アルカリ液もより高濃度のものが使用でき、ケイ素の高効率利用、即ち水素ガス生成量の増加も図れる。
【0017】
また、水素生成反応が進むと発生する水素ガスによって反応容器内圧は高くなっていくため、単に反応容器内に原料を追加供給して水素生成反応を継続させていこうとしても、いずれ反応容器内に圧力上限値まで水素ガスが満たされてしまい、水素ガスを導出して容器内圧を下げなければそれ以上水素生成反応を継続できない。そこで、反応容器内に満たされていく水素ガスを導出しながら適宜原料を追加供給していけば、水素生成反応を継続させることが容易にできる。
【0018】
その際に水素ガスの導出流量に応じて反応容器内圧が予め定められた圧力範囲内に保たれるようにケイ素スラリーやアルカリ液の追加供給を制御すれば、水素発生反応を効率的に継続でき、連続的に且つ定量的に水素を得ることができる。
【0019】
請求項に記載の発明による水素製造装置は、第1タンクに粉体ケイ素を水と混合してスラリー状態で貯留し、第2タンクにアルカリ液を貯留し、液体供給装置によって第1タンク内のケイ素スラリーと第2タンク内のアルカリ液を耐圧構造の反応容器内に送り込み、恒温加熱装置で反応容器を加温して反応温度を維持しつつ水素発生反応を行い、反応容器内で発生した水素を気体導出装置により反応容器外へ導出し回収するものである。
【0020】
上記の如き構成を備えた装置によれば、液体供給装置による反応容器内への原料ケイ素の供給を第1タンクからのスラリー状態で行うため、配管の目詰まりや不純物ガスの混入もなく、第2タンクからのアルカリ液と共にケイ素の供給がスムーズで容易に制御できるだけでなく、反応の進行に伴うゲル状副生成物の発生も抑えられるので、水素ガス発生も良好に進行するものである。従って、本装置によれば、機械的な原料の追加供給の継続および連続反応が可能であり、効率よく連続的な水素製造が実現できる。
【0021】
さらに気体導出装置に、反応容器内の気体圧力を計測する圧力測定手段と水素導出流量を制御する気体流量制御手段を備え、液体供給装置の液体供給制御手段によって圧力測定装置で計測された圧力値及び気体流量制御手段で制御された流量値に基づいて反応容器内からの水素の導出流量に応じて反応容器内圧が予め定められた圧力範囲内に保たれるようにケイ素スラリー及びまたはアルカリ液の追加供給を制御すれば、自動的に水素生成反応を継続でき、連続して定量的に水素を製造することが可能となる。
【0022】
反応容器内からの水素の導出流量を制御する気体流量制御手段としては、凝縮器およびマスフローコントローラーを備えたものが簡便である。この構成によって予め定められた流量で水素を反応容器内から導出することができる。
【0023】
また本発明の水素製造装置におけ液体供給装置の具体的構成としては、原料ケイ素がスラリー状態であるため、ポンプを利用したものが原料供給の制御の上で簡便で容易である。例えばポンプを介して第1タンク及び第2タンクからケイ素スラリーおよびアルカリ液を反応容器へ送り込む構成とした場合、ポンプの吐出流路を反応容器に接続し、吸入流路がそれぞれ選択的に開閉可能な開閉弁を介して第1タンクと第2タンクに並列に接続し、前記圧力測定手段で計測された圧力値に基づいてポンプの起動、停止、各開閉弁の開閉を行う構成を液体供給制御手段とすれば、定量的な水素の導出・回収が連続して行えるように水素生成反応を継続させるような原料の追加供給を容易に制御できる。
【0024】
【発明の実施の形態】
本発明の一実施の形態としての水素製造装置を図1の概略構成図に示す。本装置は、耐圧構造の実容積12Lの反応容器1と、反応容器内1内の溶液温度を確認する熱電対からなる温度センサー8の測定結果に基づいて反応容器1を加温し反応温度を維持する恒加熱装置としての恒温水循環装置2とを備え、また液体供給装置として、粉体ケイ素と水とを混合してスラリー状態で貯留する第1タンク3と、アルカリ液を貯留する第2タンク4と、これら第1タンク3と第2タンク4とにそれぞれ開閉可能な開閉弁(11,12)を介して吸入流路が並列に接続されていると共に吐出流路が反応容器1に接続されているポンプ5とを備えている。
【0025】
さらに、反応容器内で発生した水素ガスを外部へ導出するための気体導出装置として、所定流量で水素ガスを導出するためのコンデンサ6およびマスフローコントローラー7を備えている。
【0026】
なお、本装置においては、反応容器1内の気体圧力を測定する圧力センサー(圧力測定手段)9を備えており、この圧力センサー9で測定された圧力値および前記水素ガスの流量値に基づいて、液体供給装置側のポンプ5の起動,停止および各開閉弁(11,12)の開閉を制御する制御装置(不図示)を備えている。
【0027】
この制御装置によって、装置駆動中は反応容器1内からの水素の導出に応じて反応容器内圧が所定の圧力範囲内に保たれるように第1タンク3および第2タンク4からのケイ素スラリーおよびアルカリ液の供給、追加が制御され、定量的な水素導出・回収が連続して行えるように水素生成反応が継続される。
【0028】
なお、原料の追加供給が或る程度繰り返され、反応容器1内の溶液が所定量に達した時点で、ドレンバルブ13を開けば、溶液は反応容器1からドレンタンク10へ排出され、ドレンバルブ13を閉じた後、再び原料供給を開始して水素生成反応を継続することができる。
【0029】
【実施例】
本発明の第1の参考例として、図1に示した水素製造装置を用いて水素生成反応を行い、原料の追加供給による反応の継続で連続的な水素製造を行った場合を以下に説明する。初期状態として、まず0.5規定水酸化ナトリウム水溶液1Lを反応容器1内に収容し、恒温加熱装置2により加熱して液温を80℃に維持すると共に、第1タンク3内に粉末ケイ素と水とを撹拌混合しながら10wt%ケイ素スラリー状態で貯留しておき、第2タンク4内に1規定水酸化ナトリウム水溶液を貯留しておく。
【0030】
制御装置によってポンプ5を起動させると同時に各開閉弁(11,12)を順次開いて第1タンク3から10wt%ケイ素スラリー0.1Lを、第2タンク4から1規定水酸化ナトリウム水溶液0.1Lをそれぞれ反応容器1内へ導入し、水素生成反応を開始する。なお、1規定水酸化ナトリウム水溶液の追加は、スラリーの水分によるアルカリ水溶液の希釈に抗するためである。
【0031】
反応開始以降、10分毎に水素ガス発生量の測定および10wt%ケイ素スラリー0.1Lと1規定水酸化ナトリウム水溶液0.1Lの追加供給を繰り返し行い、水素生成反応を継続した。本参考例では、当所の原料供給後、9回の原料追加供給操作を繰り返した。途中、反応容器1内の溶液量がある量に達したら、ドレンバルブ13を開けて溶液をドレンタンク10へ排出して1Lまで減少させてから原料追加供給を再開する。
【0032】
10分毎に測定した水素ガス発生量(L)を棒グラフで、投入ケイ素に対する消費率(%)を折れ線グラフでそれぞれ図2に示した。結果として、まずケイ素をスラリー状態で追加供給することにより、水素ガス発生を阻害するゲル状副生成物を生じることなく、原料供給毎にそれぞれ同程度の水素発生反応が継続でき、所定間隔毎の連続的な水素製造が可能であることが確認された。また、各間隔毎の反応でのケイ素消費率は全て80%程度であり、水素生成反応は非常に高効率で行われていた。
【0033】
次に、第2の参考例として、上記第1の参考例で行った継続反応を長時間に亘って続けた場合、原料(10wt%ケイ素スラリー0.1Lおよび1規定水酸化ナトリウム水溶液0.1L)の追加供給時からの水素発生過程に変化が生じるかを検討した。即ち、反応開始直後と、反応開始から長時間、ここでは8時間に亘って継続反応を続けた時点における原料追加供給時から10分間に発生する水素量の積算値を経時的に各場合で求めた。
【0034】
結果を図3の折れ線図(横軸:原料供給時からの経過時間(分),縦軸:発生する水素量の積算値(L.0℃換算))に示す。図3からわかるように、反応開始直後における原料追加供給時からの水素生成は、供給後2,3分で生成される水素のほとんどが発生しており、反応開始8時間後における原料追加供給時からの水素生成は、供給後6,7分経過してからようやく水素の発生がみられ、その生成反応の進行速度も緩やかであった。
【0035】
従って、原料追加供給時からの水素生成は、反応の継続状態によって一様ではなく、継続時間が長時間に亘って反応溶液の量や成分等の変化に伴って水素生成反応の進行が遅くなる傾向があることが確認できた。
【0036】
そこで、長時間に亘る水素生成反応の継続において、反応容器からの水素の定量導出を連続的に行うための原料追加供給のタイミングを、反応継続が繰り返されるのに伴って水素生成状況が変化するのに対応してどのように制御するかを検討した。
【0037】
理論的には、当初の反応で生成された水素ガスで反応容器内が満たされた時点で水素の容器外への定量的導出をはじめ、反応容器内の水素ガスの減少中に原料の追加供給を行って、全水素が導出しきらないうちに反応容器内に再び水素が満たされる状態を得るようにすれば、水素導出が途切れることなく、長時間に亘る定量的な水素導出が行える。
【0038】
従って、反応容器の水素ガスの減少に伴う内圧変化に基づいて、原料追加供給を制御すれば、水素の定量導出を連続的に維持することが可能である。即ち、水素導出流量に応じて、反応容器内が所定の圧力範囲内に保たれるように水素ガスが発生するように原料供給を制御すれば良い。
【0039】
そこで、まず上記圧力範囲として予め決定した上限値および下限値に基づき、図1の反応容器1について最大および最小の水素導出速度について、水素導出に伴って減少する反応容器の内圧が、どの程度の時点で原料を追加供給すればよいのかをある条件においてシミュレーションを行って求めた。
【0040】
シミュレーション条件として、前記範囲圧力の上限値を装置耐圧より0.245MPa、下限値をマスフローコントローラー7による安定制御が可能な下限圧力である0.049MPaとし、まず反応容器内が水素ガスで満たされている状態から最大水素導出速度1L/minおよび最小水素導出速度0.1L/minでそれぞれ水素導出を行った場合の反応容器内圧力の変化を測定した。結果はそれぞれ図4の(a)および(b)のグラフに示した通り、水素の導出に応じてほぼ直線的に反応容器内圧は減少する。
【0041】
このような最大、最小導出速度における反応容器内圧変化に対応して、長時間(ここでは8時間程度)に亘る反応継続の全工程で反応容器内圧が前記圧力範囲の上下限を満たすように水素生成を行うには、各容器内圧変化に図3に示した水素生成状況を組み合わせた場合の上下限が前記圧力範囲内に保たれれば良いこととなる。
【0042】
このような状態をシミュレートすると、最大、最小導出速度において、それぞれ図5(a)および(b)のグラフに示す結果となる。この結果から最大水素導出速度1L/minでは反応容器内圧が0.108MPaに達した時点で、最小水素導出速度0.1L/minでは反応容器内圧が0.059MPaに達した時点で原料を追加供給すれば、反応容器からの水素導出が途切れることなく、長時間の反応継続状態に亘って、一定量の水素導出が維持できる。
【0043】
以上の結果から、水素導出速度に応じた原料供給を行うべき反応容器内圧力値を予め求めておけば、水素生成反応の長期継続において、反応容器内の圧力値を測定するだけで、適したタイミングで原料追加供給を行うように制御することができ、連続的な水素の定量導出が容易に維持できる。
【0044】
次に、本発明の実施例として、上記シミュレーション結果を踏まえた条件設定で図1の装置を用いて原料追加供給制御による反応の継続で水素の定量製造を行った。本実施例では、水素の導出速度を1L/minとし、原料追加供給を行うタイミングとなる反応容器内圧力を0.108MPaとした。
【0045】
装置の基本操作は第1の参考例と同様の手順とする。まず、初期状態として0.5規定水酸化ナトリウム水溶液1Lを反応容器1内に収容し、恒温加熱装置2により加熱して液温を80℃に維持し、反応容器1内を窒素ガスでパージする。
【0046】
制御装置によってポンプ5を起動させると同時に各開閉弁(11,12)を順次開いて第1タンク3から10wt%ケイ素スラリー0.1Lを、第2タンク4から1規定水酸化ナトリウム水溶液0.1Lをそれぞれ反応容器1内へ導入し、所定量の原料が導入されたら各開閉弁(11,12)は閉じ、ポンプ5を停止する。これら原料の反応容器1内への導入と同時に水素生成反応が開始するが、同時に、圧力センサー9による反応容器1内の圧力の測定も始める。
【0047】
測定圧力値が装置耐圧値に基づく上限である0.196MPaに達したら、マスフローコントローラー7により水素ガスを1L/minの速度で反応容器外へ導出し回収する。圧力センサー9による測定値が0.108MPaに達したら、ポンプ5および各開閉弁(11,12)を駆動制御して第1タンク3および第2タンク4からそれぞれ原料(10wt%ケイ素スラリー0.1Lおよび1規定水酸化ナトリウム水溶液0.1L)の追加供給を行う。以上の圧力センサー9による測定値に基づいた原料の追加供給を繰り返す。
【0048】
なお、反応容器1内の溶液が所定量に達したら、水素の導出をとめてドレンバルブ13を開いて溶液をドレンタンク10へ排出し、反応容器内液量を1Lまで減らす。その後再び原料供給を行い、容器内圧が0.196MPaに達したら、前記所定速度で水素導出をはじめ、同様に圧力センサー9による測定値に基づいた原料の追加供給を繰り返す。
【0049】
以上の水素製造工程における原料追加供給タイミングおよび容器内圧力(MPa)の変化と水素ガス導出量(L/min)を経時的に折れ線図として図6に示した。以上により、反応容器内の圧力値に基づく原料追加供給の制御だけで、定量的な水素の連続製造が行えた。
【0050】
なお、本発明における原料となるケイ素スラリーは、粉末ケイ素を水と混合するものであるが、ケイ素の供給源は限定されるものではないが、例えば、半導体製造ラインから発生するシリコン屑を用いても良い。この場合、廃棄物利用であるため、水素の製造コストは大幅に軽減される。また、アルカリ液もアルカリ廃液の利用が可能である。
【0051】
【発明の効果】
以上説明したとおり、本発明の水素製造方法によれば、原料ケイ素を水と混合したスラリー状態で供給するため、水素ガス発生を阻害する原因となるゲル状副生成物の発生も抑えられると共に、ケイ素とアルカリ液との接触直後の激しい反応も抑えられるため、アルカリ液もより高濃度のものが使用でき、ケイ素の高効率利用が可能となるだけでなく、ケイ素原料の供給も容易になるため原料の追加供給による水素生成反応の継続で水素ガスの連続生成も可能となる。
【0052】
また、本発明の水素製造装置によれば、原料供給および生成水素の回収が容易に制御でき、水素の機械的製造が簡便に行えるという効果がある。さらに、反応容器内の圧力値に基づいて原料の追加供給が容易に制御でき、反応の継続を維持して水素の定量製造を連続して行える。
【図面の簡単な説明】
【図1】本発明の一実施の形態としての水素製造装置の概略構成図である。
【図2】 本発明の第1の参考例として図1の装置を用いたの水素製造工程における水素生成量とケイ素消費率の時間変化を示す棒グラフ(横軸:経過時間(分),縦軸:10分毎の水素ガス発生量(L))および折れ線図(横軸:経過時間(分),縦軸:投入ケイ素に対する消費率(%))。
【図3】 本発明の第2の参考例として原料供給時から10分間に発生する水素量の積算値を示す折れ線図(横軸:経過時間(分),縦軸:0℃換算の水素積算値(L))であり、反応開始直後での原料供給(◆:黒菱形)の場合と反応開始8時間後での原料供給(■;黒四角形)の場合とを示す。
【図4】図1の水素製造装置における反応容器からの水素導出に伴う反応容器内圧力の時間変化を示す線図(横軸:時間(分),縦軸:容器内圧力(MPa))であり、(a)は最大水素導出速度1L/minの場合、(b)は最小水素導出速度0.1L/minの場合をそれぞれ示す。
【図5】図4と図3の結果に基づいて、反応開始直後(◆:黒菱形)の場合および反応開始8時間後(■;黒四角形)の場合で原料追加供給を行った際の反応容器内圧力の時間変化のシミュレーション結果を示す線図(横軸:時間(分),縦軸:容器内圧力(MPa))であり、(a)は最大水素導出速度1L/minの場合、(b)は最小水素導出速度0.1L/minの場合をそれぞれ示す。
【図6】 本発明の実施例として、図1の水素製造装置を用いて反応容器内の圧力値に基づいて原料の追加供給を制御して水素の連続定量製造を行った場合の容器内圧力の変化と水素ガス導出量を原料供給タイミングと共に経時的に示した折れ線図(横軸:水素導出時間(分),縦軸:容器内圧力(MPa)および水素ガス導出量(L))である。
【符号の説明】
1:反応容器
2:恒温加熱装置
3:第1タンク
4:第2タンク
5:ポンプ
6:コンデンサー
7:マスフローコントローラー
8:温度センサー
9:圧力センサー
10:ドレンタンク
11,12:開閉弁
13:ドレンバルブ
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method and apparatus for producing hydrogen using silicon as a raw material.
[0002]
[Prior art]
Most of the hydrogen consumed in Japan is obtained from petroleum or natural gas by steam reforming or partial oxidation, and is self-consumed in the complex for ammonia synthesis and methanol production. However, because these hydrogens are of low purity, hydrogen produced by electrolysis of water and salt electrolysis, or by-product hydrogen from the petroleum refining process, is used for external sales. The current situation is.
[0003]
However, hydrogen obtained by such a conventional method is generated in a high-temperature and high-pressure environment of several tens to several hundreds of atmospheres and several hundreds of degrees Celsius, requires large energy for production, and is expensive. Therefore, a production method capable of obtaining high purity hydrogen at a low cost is desired.
[0004]
On the other hand, it is a known fact that hydrogen is generated when silicon is heated in an alkaline solution, but there is also a fact that a large amount of silicon that can be a hydrogen source is discarded in the field of semiconductor device manufacturing. . Because it is possible to supply abundant raw materials at low cost such as silicon scrap, and because it can be sufficiently performed in an environment where hydrogen generation reaction between silicon and an alkaline liquid can be easily set at atmospheric pressure, 100 ° C. or less, It can be said that the hydrogen production method using silicon is promising.
[0005]
[Problems to be solved by the invention]
However, the hydrogen production method using silicon as a raw material as described above needs to be suitable for practical use in industrialization in which hydrogen can be supplied efficiently and stably.
[0006]
For example, in a hydrogen generation reaction by mixing silicon and an alkaline aqueous solution, silicate ions are generated in addition to hydrogen gas in the solution, but an excessive high-concentration alkaline solution is simply used to generate a large amount of hydrogen gas. When a large amount of silicon is supplied, silicate ions become gelled, which causes a problem that production of hydrogen gas is inhibited.
[0007]
Also, the reaction between silicon and the aqueous alkaline solution starts vigorously immediately after the contact between the two, and after a few minutes, most of the hydrogen gas that can be generated is generated, and thereafter only a slight reaction continues. That is, since the hydrogen generation rate changes greatly from the start to the end of the reaction, it is difficult to supply quantitative hydrogen simply by taking out the generated hydrogen gas as it is.
[0008]
Furthermore, it is conceivable that silicon as a raw material is supplied as a powder such as silicon scrap as described above. In such a case, it is possible to introduce water vapor in a reaction system that warms an alkaline aqueous solution. There is a possibility of clogging in the piping near the container and mixing of impurity gas into the reaction system.
[0009]
In view of the above problems, an object of the present invention is to avoid the gelation of silicate ions that cause the inhibition of hydrogen gas generation in a hydrogen production method in which hydrogen is generated by mixing silicon and an alkali solution. The object is to provide a method and an apparatus capable of producing hydrogen well. Another object of the present invention is to provide a hydrogen production method and apparatus suitable for practical use capable of continuously supplying hydrogen in a constant amount.
[0010]
[Means for Solving the Problems]
In order to achieve the above-mentioned object, the hydrogen production method according to the first aspect of the present invention provides hydrogen by supplying powder silicon and an alkaline liquid to a reaction vessel and causing contact reaction under heating in the reaction vessel. In the hydrogen production method to be generated, powder silicon is previously mixed with water to form a slurry, and this silicon slurry is supplied to a reaction vessel ,
The supply of the silicon slurry and / or the alkali liquid is controlled so that the internal pressure of the reaction container is maintained within a predetermined pressure range in accordance with the flow rate of hydrogen from the reaction container .
[0012]
A hydrogen production apparatus according to a second aspect of the present invention includes a pressure-resistant structure reaction vessel, a constant temperature heating device for heating the reaction vessel to maintain the reaction temperature, and mixing powder silicon with water. A first tank for storing the slurry in a slurry state; a second tank for storing an alkaline liquid; a liquid supply device for feeding the silicon slurry in the first tank and the alkaline liquid in the second tank into a reaction vessel; and the reaction A gas deriving device for deriving hydrogen generated in the container to the outside,
The gas deriving device comprises pressure measuring means for measuring the gas pressure in the reaction vessel and gas flow rate controlling means for controlling the hydrogen deriving flow rate;
The liquid supply device has a reaction vessel internal pressure determined in advance according to the flow rate of hydrogen from the reaction vessel based on the pressure value measured by the pressure measurement unit and the flow rate value controlled by the gas flow rate control unit. Liquid supply control means for controlling the supply of the silicon slurry and / or the alkali liquid so as to be kept within the above pressure range.
[0014]
Furthermore, the hydrogen production apparatus according to the invention described in claim 3 is the hydrogen production apparatus according to claim 2 , wherein the gas flow rate control means derives hydrogen at a predetermined flow rate and a mass flow controller. It is equipped with.
[0015]
The hydrogen production apparatus according to claim 4 is the hydrogen production apparatus according to claim 2 , wherein the liquid supply control means includes a pump, and a discharge flow path of the pump is connected to the reaction vessel. In addition, the suction flow path is connected in parallel to the first tank and the second tank via open / close valves that can be selectively opened and closed, and the pump is started and stopped based on the pressure value measured by the pressure measuring means, and Each on-off valve is opened and closed.
[0016]
The hydrogen production method according to the first aspect of the present invention is a hydrogen production method in which hydrogen is generated by mixing powder silicon and an alkaline liquid, and raw material powder silicon is mixed with water in advance and supplied in a slurry state. As a result, the amount of liquid in the reaction vessel increases due to the presence of mixed water compared to the case where silicon is supplied in powder form, and the silicate ion concentration in the solution is suppressed, causing the hydrogen gas generation to be inhibited. The generation of gel-like by-products is also suppressed. In addition, if silicon is supplied in a slurry state, the vigorous reaction immediately after the contact between silicon and the alkali liquid can be suppressed, so that the alkali liquid can be used at a higher concentration, and the silicon can be used efficiently, that is, the amount of hydrogen gas generated can be increased. Can also be planned.
[0017]
Also, as the hydrogen generation reaction proceeds, the pressure inside the reaction vessel increases due to the generated hydrogen gas, so even if you continue to supply the raw material into the reaction vessel and continue the hydrogen generation reaction, it will eventually remain in the reaction vessel. The hydrogen gas is filled up to the upper limit of pressure, and the hydrogen generation reaction cannot be continued without deriving the hydrogen gas and lowering the internal pressure of the container. Therefore, if the raw material is additionally supplied as appropriate while deriving the hydrogen gas filled in the reaction vessel, the hydrogen generation reaction can be easily continued.
[0018]
At this time, by controlling the additional supply of silicon slurry and an alkaline solution as a reaction vessel internal pressure depending on the derived flow rate of hydrogen gas is maintained within a pressure range set in advance, efficiently continue the hydrogen generation reaction Hydrogen can be obtained continuously and quantitatively.
[0019]
According to a second aspect of the present invention, there is provided a hydrogen production apparatus in which powder silicon is mixed with water in a first tank and stored in a slurry state, an alkali liquid is stored in a second tank, and the liquid supply device stores the first tank. The silicon slurry and the alkaline liquid in the second tank were sent into a pressure-resistant reaction vessel, and the reaction vessel was heated with a constant temperature heating device to perform a hydrogen generation reaction while maintaining the reaction temperature, and was generated in the reaction vessel. Hydrogen is led out of the reaction vessel by a gas lead-out device and recovered.
[0020]
According to the apparatus having the above-described configuration, the supply of the raw material silicon into the reaction vessel by the liquid supply apparatus is performed in a slurry state from the first tank. The supply of silicon together with the alkali solution from the two tanks can be controlled smoothly and easily, and the generation of gel by-products accompanying the progress of the reaction can be suppressed, so that the generation of hydrogen gas proceeds well. Therefore, according to this apparatus, the continuous supply of the mechanical raw material and the continuous reaction can be performed, and efficient and continuous hydrogen production can be realized.
[0021]
Further , the gas deriving device includes a pressure measuring unit for measuring the gas pressure in the reaction vessel and a gas flow rate controlling unit for controlling the hydrogen deriving flow rate, and the pressure measured by the liquid measuring unit of the liquid supplying device with the pressure measuring unit. Silicon slurry and / or alkali liquid so that the internal pressure of the reaction vessel is maintained within a predetermined pressure range according to the flow rate of hydrogen from the reaction vessel based on the value and the flow rate value controlled by the gas flow rate control means If the additional supply is controlled, the hydrogen generation reaction can be automatically continued, and hydrogen can be produced quantitatively continuously.
[0022]
As the gas flow rate control means for controlling the flow rate of hydrogen out of the reaction vessel, a device equipped with a condenser and a mass flow controller is simple. With this configuration, hydrogen can be led out from the reaction vessel at a predetermined flow rate.
[0023]
Further, as a specific configuration of the liquid supply apparatus in the hydrogen production apparatus of the present invention, since the raw material silicon is in a slurry state, using a pump is simple and easy in terms of control of the raw material supply. For example, when silicon slurry and alkali liquid are sent from the first tank and the second tank to the reaction vessel via the pump, the discharge channel of the pump is connected to the reaction vessel, and the suction channel can be selectively opened and closed. The liquid supply control is configured such that the first tank and the second tank are connected in parallel through a simple on-off valve and the pump is started and stopped and the on-off valve is opened and closed based on the pressure value measured by the pressure measuring means. As a means, it is possible to easily control the additional supply of raw materials to continue the hydrogen generation reaction so that quantitative hydrogen derivation and recovery can be continuously performed.
[0024]
DETAILED DESCRIPTION OF THE INVENTION
A hydrogen production apparatus as an embodiment of the present invention is shown in a schematic configuration diagram of FIG. This apparatus warms the reaction vessel 1 based on the measurement result of the temperature sensor 8 consisting of a reaction vessel 1 having a pressure capacity of 12 L actual volume and a thermocouple for confirming the solution temperature in the reaction vessel 1. A constant temperature water circulation device 2 as a constant heating device to be maintained, and as a liquid supply device, a first tank 3 in which powder silicon and water are mixed and stored in a slurry state, and a second tank in which alkaline liquid is stored 4 and the first tank 3 and the second tank 4 are connected in parallel to each other through openable / closable valves (11, 12), and the discharge flow path is connected to the reaction vessel 1. The pump 5 is provided.
[0025]
Furthermore, a condenser 6 and a mass flow controller 7 for deriving hydrogen gas at a predetermined flow rate are provided as a gas deriving device for deriving hydrogen gas generated in the reaction vessel to the outside.
[0026]
In addition, in this apparatus, the pressure sensor (pressure measurement means) 9 which measures the gas pressure in the reaction container 1 is provided, Based on the pressure value measured by this pressure sensor 9, and the flow rate value of the said hydrogen gas. And a control device (not shown) for controlling the start and stop of the pump 5 on the liquid supply device side and the opening and closing of the on-off valves (11, 12).
[0027]
With this control device, the silicon slurry from the first tank 3 and the second tank 4 and the reaction vessel internal pressure are maintained within a predetermined pressure range in accordance with the derivation of hydrogen from the reaction vessel 1 while the device is being driven. The supply and addition of the alkaline liquid is controlled, and the hydrogen generation reaction is continued so that quantitative hydrogen derivation and recovery can be continuously performed.
[0028]
When the additional supply of the raw material is repeated to some extent and the drain valve 13 is opened when the solution in the reaction vessel 1 reaches a predetermined amount, the solution is discharged from the reaction vessel 1 to the drain tank 10, and the drain valve After closing 13, the raw material supply can be started again to continue the hydrogen generation reaction.
[0029]
【Example】
As a first reference example of the present invention, a case where a hydrogen production reaction is performed using the hydrogen production apparatus shown in FIG. 1 and continuous hydrogen production is performed by continuing the reaction by additional supply of raw materials will be described below. . As an initial state, first, 1 L of 0.5 N sodium hydroxide aqueous solution is accommodated in the reaction vessel 1 and heated by the constant temperature heating device 2 to maintain the liquid temperature at 80 ° C. While stirring and mixing with water, it is stored in a 10 wt% silicon slurry state, and a 1 N sodium hydroxide aqueous solution is stored in the second tank 4.
[0030]
At the same time as the pump 5 is started by the control device, the respective open / close valves (11, 12) are opened sequentially to give 0.1 L of 10 wt% silicon slurry from the first tank 3 and 0.1 L of 1 N sodium hydroxide aqueous solution from the second tank 4. Are introduced into the reaction vessel 1 to start a hydrogen production reaction. The addition of the 1N sodium hydroxide aqueous solution is for resisting the dilution of the alkaline aqueous solution with the moisture of the slurry.
[0031]
After the start of the reaction, measurement of the amount of hydrogen gas generated and the additional supply of 0.1 L of 10 wt% silicon slurry and 0.1 L of 1N sodium hydroxide aqueous solution were repeated every 10 minutes to continue the hydrogen generation reaction. In this reference example , after the raw material supply at this station, nine additional raw material supply operations were repeated. On the way, when the amount of the solution in the reaction vessel 1 reaches a certain amount, the drain valve 13 is opened, the solution is discharged to the drain tank 10 and reduced to 1 L, and then the additional raw material supply is resumed.
[0032]
The hydrogen gas generation amount (L) measured every 10 minutes is shown by a bar graph, and the consumption rate (%) relative to the input silicon is shown by a line graph in FIG. As a result, first, by adding silicon in a slurry state, the same amount of hydrogen generation reaction can be continued each time the raw material is supplied without generating a gel-like by-product that inhibits hydrogen gas generation. It was confirmed that continuous hydrogen production was possible. In addition, the silicon consumption rate in the reaction at each interval was about 80%, and the hydrogen generation reaction was performed with very high efficiency.
[0033]
Next, as a second reference example, when the continuous reaction performed in the first reference example is continued for a long time, the raw materials (10 wt% silicon slurry 0.1 L and 1 N sodium hydroxide aqueous solution 0.1 L) are used. ) Was examined to see if there was a change in the hydrogen generation process from the additional supply. That is, the integrated value of the amount of hydrogen generated in 10 minutes from the time of additional supply of raw materials immediately after the start of the reaction and at the time when the continuous reaction is continued for a long time from the start of the reaction, here 8 hours, is obtained in each case over time. It was.
[0034]
The results are shown in the line graph of FIG. 3 (horizontal axis: elapsed time (minutes) since supply of raw material, vertical axis: integrated value of generated hydrogen amount (converted to L. 0 ° C.)). As can be seen from FIG. 3, most of the hydrogen produced in the second and third minutes after the start of the feed is immediately after the start of the reaction. As for hydrogen production from the hydrogen, generation of hydrogen was observed only after 6 or 7 minutes had passed from the supply, and the rate of progress of the production reaction was slow.
[0035]
Accordingly, the hydrogen generation from the additional supply of the raw material is not uniform depending on the continuation state of the reaction, and the progress of the hydrogen generation reaction is slowed with a change in the amount of the reaction solution, components, etc. over a long period of time. It was confirmed that there was a tendency.
[0036]
Therefore, in the continuation of the hydrogen generation reaction over a long period of time, the timing of additional supply of raw materials for continuously performing quantitative derivation of hydrogen from the reaction vessel changes as the reaction continues and the hydrogen generation status changes. We examined how to control in response to the above.
[0037]
Theoretically, when the reaction vessel is filled with the hydrogen gas generated in the initial reaction, quantitative derivation of hydrogen to the outside of the vessel is started, and additional supply of raw materials is performed while the hydrogen gas in the reaction vessel is decreasing. If a state in which the reaction vessel is filled with hydrogen before all the hydrogen has been derived is obtained, quantitative hydrogen derivation over a long period of time can be performed without interruption of hydrogen derivation.
[0038]
Therefore, if the additional supply of the raw material is controlled based on the change in the internal pressure accompanying the decrease in the hydrogen gas in the reaction vessel, it is possible to continuously maintain the quantitative derivation of hydrogen. That is, the supply of the raw material may be controlled so that hydrogen gas is generated in accordance with the hydrogen discharge flow rate so that the inside of the reaction vessel is maintained within a predetermined pressure range.
[0039]
Therefore, first, based on the upper limit value and the lower limit value determined in advance as the pressure range, what is the internal pressure of the reaction vessel that decreases with hydrogen derivation for the maximum and minimum hydrogen derivation rates for the reaction vessel 1 in FIG. It was determined by simulation under certain conditions whether or not the raw material should be additionally supplied at that time.
[0040]
As simulation conditions, the upper limit value of the range pressure is set to 0.245 MPa from the pressure resistance of the apparatus, and the lower limit value is set to 0.049 MPa, which is a lower limit pressure that can be stably controlled by the mass flow controller 7. First, the reaction vessel is filled with hydrogen gas. The change in the pressure in the reaction vessel was measured when hydrogen was led out at a maximum hydrogen lead speed of 1 L / min and a minimum hydrogen lead speed of 0.1 L / min. The results are shown in the graphs of FIGS. 4A and 4B, respectively, and the pressure in the reaction vessel decreases almost linearly as hydrogen is derived.
[0041]
In response to such changes in the reaction vessel internal pressure at the maximum and minimum derivation speeds, the hydrogen in the reaction vessel so that the internal pressure of the reaction vessel satisfies the upper and lower limits of the pressure range in the entire reaction continuation process for a long time (about 8 hours in this case). In order to perform the generation, it is only necessary to maintain the upper and lower limits in the pressure range when the hydrogen generation state shown in FIG.
[0042]
When such a state is simulated, the results shown in the graphs of FIGS. 5A and 5B are obtained at the maximum and minimum derivation speeds, respectively. From this result, additional raw materials are supplied when the internal pressure of the reaction vessel reaches 0.108 MPa at the maximum hydrogen lead-out speed of 1 L / min, and when the internal pressure of the reaction vessel reaches 0.059 MPa at the minimum hydrogen lead-out speed of 0.1 L / min. By doing so, the deriving of hydrogen from the reaction vessel is not interrupted, and a certain amount of deriving of hydrogen can be maintained over a prolonged reaction state.
[0043]
From the above results, if the pressure value in the reaction vessel to be supplied in accordance with the hydrogen derivation speed is obtained in advance, it is suitable only by measuring the pressure value in the reaction vessel in the long-term continuation of the hydrogen generation reaction. It can be controlled to perform additional supply of raw materials at the timing, and continuous quantitative derivation of hydrogen can be easily maintained.
[0044]
Next, as an example of the present invention , hydrogen was quantitatively manufactured by continuing the reaction by the raw material additional supply control using the apparatus of FIG. 1 under the condition setting based on the simulation result. In this example, the hydrogen derivation speed was 1 L / min, and the pressure in the reaction vessel, which is the timing for performing additional raw material supply, was 0.108 MPa.
[0045]
The basic operation of the apparatus is the same procedure as in the first reference example . First, as an initial state, 1 L of 0.5 N sodium hydroxide aqueous solution is accommodated in the reaction vessel 1, heated by the constant temperature heating device 2 to maintain the liquid temperature at 80 ° C., and the reaction vessel 1 is purged with nitrogen gas. .
[0046]
At the same time as the pump 5 is started by the control device, the respective open / close valves (11, 12) are opened sequentially to give 0.1 L of 10 wt% silicon slurry from the first tank 3 and 0.1 L of 1 N sodium hydroxide aqueous solution from the second tank 4. Are introduced into the reaction vessel 1, and when a predetermined amount of raw material is introduced, the on-off valves (11, 12) are closed and the pump 5 is stopped. At the same time as the introduction of these raw materials into the reaction vessel 1, the hydrogen generation reaction starts. At the same time, measurement of the pressure in the reaction vessel 1 by the pressure sensor 9 is also started.
[0047]
When the measured pressure value reaches 0.196 MPa, which is the upper limit based on the apparatus pressure resistance value, hydrogen gas is led out of the reaction vessel at a rate of 1 L / min and collected by the mass flow controller 7. When the measured value by the pressure sensor 9 reaches 0.108 MPa, the pump 5 and the on-off valves (11, 12) are driven and controlled, and the raw material (10 wt% silicon slurry 0.1 L is supplied from the first tank 3 and the second tank 4 respectively. And 1N aqueous sodium hydroxide solution (0.1 L). The additional supply of the raw material based on the measurement value by the pressure sensor 9 is repeated.
[0048]
When the amount of the solution in the reaction vessel 1 reaches a predetermined amount, the derivation of hydrogen is stopped, the drain valve 13 is opened, the solution is discharged to the drain tank 10, and the amount of liquid in the reaction vessel is reduced to 1L. Thereafter, the raw material is supplied again, and when the internal pressure of the container reaches 0.196 MPa, hydrogen is led out at the predetermined speed, and the additional supply of the raw material based on the measured value by the pressure sensor 9 is repeated.
[0049]
The raw material additional supply timing, the change in the pressure in the vessel (MPa), and the hydrogen gas lead-out amount (L / min) in the hydrogen production process described above are shown in FIG. As described above, quantitative quantitative production of hydrogen could be performed only by controlling the additional supply of raw materials based on the pressure value in the reaction vessel.
[0050]
In addition, although the silicon slurry used as the raw material in the present invention is a mixture of powdered silicon and water, the silicon supply source is not limited. For example, silicon scrap generated from a semiconductor production line is used. Also good. In this case, since the waste is used, the production cost of hydrogen is greatly reduced. In addition, alkaline waste liquid can be used as the alkaline liquid.
[0051]
【The invention's effect】
As described above, according to the hydrogen production method of the present invention, since raw material silicon is supplied in a slurry state mixed with water, it is possible to suppress the generation of gel-like by-products that inhibit hydrogen gas generation, Since vigorous reaction immediately after the contact between silicon and the alkaline solution is also suppressed, the alkaline solution can be used at a higher concentration, which not only enables high-efficiency utilization of silicon but also facilitates the supply of silicon raw materials. Hydrogen gas can be continuously generated by continuing the hydrogen generation reaction by supplying additional raw materials.
[0052]
Moreover, according to the hydrogen production apparatus of the present invention, it is possible to easily control the supply of raw materials and the recovery of produced hydrogen, and there is an effect that the mechanical production of hydrogen can be performed easily. Furthermore, the additional supply of the raw material can be easily controlled based on the pressure value in the reaction vessel, and the quantitative reaction of hydrogen can be continuously performed while maintaining the reaction.
[Brief description of the drawings]
FIG. 1 is a schematic configuration diagram of a hydrogen production apparatus as an embodiment of the present invention.
FIG. 2 is a bar graph showing changes over time in hydrogen production and silicon consumption rate in the hydrogen production process using the apparatus of FIG. 1 as a first reference example of the present invention (horizontal axis: elapsed time (minutes), vertical axis : Hydrogen gas generation amount (L) every 10 minutes) and a line diagram (horizontal axis: elapsed time (minutes), vertical axis: consumption rate (%) relative to input silicon).
FIG. 3 is a line diagram showing the integrated value of the amount of hydrogen generated in 10 minutes from the time of raw material supply as a second reference example of the present invention (horizontal axis: elapsed time (minutes), vertical axis: integrated hydrogen at 0 ° C. Value (L)), which shows the case of raw material supply immediately after the start of reaction (♦: black diamond) and the case of raw material supply 8 hours after the start of reaction (■; black square).
4 is a diagram (horizontal axis: time (minutes), vertical axis: pressure in the container (MPa)) showing the time change of the pressure in the reaction container with the derivation of hydrogen from the reaction container in the hydrogen production apparatus of FIG. Yes, (a) shows the case where the maximum hydrogen derivation speed is 1 L / min, and (b) shows the case where the minimum hydrogen derivation speed is 0.1 L / min.
FIG. 5 is a reaction based on the results shown in FIGS. 4 and 3 when raw materials are additionally supplied immediately after the start of the reaction (♦: black rhombus) and 8 hours after the start of the reaction (■; black square). It is a diagram (horizontal axis: time (minutes), vertical axis: pressure in the container (MPa)) showing the simulation result of the time change of the pressure in the container, and (a) is the maximum hydrogen derivation speed of 1 L / min. b) shows the case where the minimum hydrogen derivation speed is 0.1 L / min.
6 shows an example of the present invention, in which the internal pressure of the container when hydrogen is continuously quantitatively manufactured by controlling the additional supply of the raw material based on the pressure value in the reaction container using the hydrogen production apparatus of FIG. Is a polygonal graph (horizontal axis: hydrogen derivation time (minutes), vertical axis: pressure in the vessel (MPa) and hydrogen gas derivation amount (L)) showing the change of the gas and the hydrogen gas derivation amount along with the raw material supply timing. .
[Explanation of symbols]
1: Reaction vessel 2: Constant temperature heating device 3: First tank 4: Second tank 5: Pump 6: Condenser 7: Mass flow controller 8: Temperature sensor 9: Pressure sensor 10: Drain tank 11, 12: Open / close valve 13: Drain valve

Claims (4)

粉体ケイ素とアルカリ液とを反応容器に供給して反応容器内で加温下に接触反応させることにより水素を発生させる水素製造方法において、
予め粉体ケイ素を水と混合してスラリー状態とし、このケイ素スラリーを反応容器に供給し、
反応容器内からの水素の導出流量に応じて反応容器内圧が予め定められた圧力範囲内に保たれるようにケイ素スラリー及び/又はアルカリ液の供給を制御することを特徴とする水素製造方法。
In a hydrogen production method for generating hydrogen by supplying powder silicon and an alkaline liquid to a reaction vessel and causing contact reaction under heating in the reaction vessel,
Powder silicon is previously mixed with water to form a slurry, and this silicon slurry is supplied to the reaction vessel ,
A method for producing hydrogen, characterized in that the supply of silicon slurry and / or alkali liquid is controlled so that the internal pressure of the reaction vessel is maintained within a predetermined pressure range in accordance with the flow rate of hydrogen from the reaction vessel .
耐圧構造の反応容器と、
該反応容器を加温して反応温度を維持するための恒温加熱装置と、
粉体ケイ素を水と混合してスラリー状態で貯留する第1タンクと、
アルカリ液を貯留する第2タンクと、
前記第1タンク内のケイ素スラリー及び前記第2タンク内のアルカリ液を反応容器内に送り込む液体供給装置と、
前記反応容器内で発生した水素を外部へ導出するための気体導出装置と、を備え
前記気体導出装置が、前記反応容器内の気体圧力を計測する圧力測定手段と水素の導出流量を制御する気体流量制御手段とを備え、
前記液体供給装置が、前記圧力測定手段で計測された圧力値および前記気体流量制御手段で制御された流量値に基づいて反応容器内からの水素の導出流量に応じて反応容器内圧が予め定められた圧力範囲内に保たれるようにケイ素スラリー及び/又はアルカリ液の供給を制御する液体供給制御手段を備えていることを特徴とする水素製造装置。
A pressure-resistant reaction vessel,
A constant temperature heating device for heating the reaction vessel to maintain the reaction temperature;
A first tank that mixes powdered silicon with water and stores it in a slurry state;
A second tank for storing alkaline liquid;
A liquid supply device for feeding the silicon slurry in the first tank and the alkaline liquid in the second tank into a reaction vessel;
A gas deriving device for deriving hydrogen generated in the reaction vessel to the outside ,
The gas deriving device comprises pressure measuring means for measuring the gas pressure in the reaction vessel and gas flow rate controlling means for controlling the hydrogen deriving flow rate;
The liquid supply device has a reaction vessel internal pressure determined in advance according to the flow rate of hydrogen from the reaction vessel based on the pressure value measured by the pressure measurement unit and the flow rate value controlled by the gas flow rate control unit. A hydrogen production apparatus comprising liquid supply control means for controlling the supply of silicon slurry and / or alkali liquid so as to be maintained within a predetermined pressure range .
前記気体流量制御手段が予め定められた流量で水素を導出するための凝縮器およびマスフローコントローラーを備えていることを特徴とする請求項に記載の水素製造装置。The hydrogen production apparatus according to claim 2 , wherein the gas flow rate control unit includes a condenser and a mass flow controller for deriving hydrogen at a predetermined flow rate. 前記液体供給制御手段がポンプを備え、該ポンプの吐出流路が反応容器に接続されると共に吸入流路がそれぞれ選択的に開閉可能な開閉弁を介して前記第1タンクと第2タンクに並列接続され、前記圧力測定手段で計測された圧力値に基づいて前記ポンプの起動と停止及び各開閉弁の開閉を行うようにしたことを特徴とする請求項に記載の水素製造装置。The liquid supply control means includes a pump, and a discharge flow path of the pump is connected to the reaction vessel, and an intake flow path can be selectively opened and closed in parallel with the first tank and the second tank. 3. The hydrogen production apparatus according to claim 2 , wherein the apparatus is connected and configured to start and stop the pump and open and close each on-off valve based on a pressure value measured by the pressure measuring means.
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