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JP4589779B2 - Generation method of hydrogen gas - Google Patents
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JP4589779B2 - Generation method of hydrogen gas - Google Patents

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JP4589779B2
JP4589779B2 JP2005093957A JP2005093957A JP4589779B2 JP 4589779 B2 JP4589779 B2 JP 4589779B2 JP 2005093957 A JP2005093957 A JP 2005093957A JP 2005093957 A JP2005093957 A JP 2005093957A JP 4589779 B2 JP4589779 B2 JP 4589779B2
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譲 金子
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

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Description

本発明は、水素ガスの発生方法に関し、さらに詳細には、銅粉を含むケイ素粉から水素ガスを発生させる方法に関する。さらに本発明は、それとともに、シリカ微粉末および/またはケイ酸アルカリ金属塩もしくはその水溶液を回収する方法に関する。   The present invention relates to a method for generating hydrogen gas, and more particularly to a method for generating hydrogen gas from silicon powder containing copper powder. The present invention further relates to a method for recovering silica fine powder and / or alkali metal silicate or an aqueous solution thereof.

水素ガスは、アンモニア、メタノールなどの合成、油脂の水素添加、酸水素炎溶接などに広く用いられるほか、無公害の燃料電池の燃料として注目されている。水素は、水や食塩水の電解、石油や天然ガスの水蒸気改質などの方法によって工業的に製造されている。しかし、前者はエネルギーコストが高価で、後者は純度が低いためにさらに精製を要し、その簡単で安価な発生法が求められている。   Hydrogen gas is widely used for synthesis of ammonia, methanol, etc., hydrogenation of fats and oils, oxyhydrogen flame welding, and the like, and has attracted attention as a fuel for pollution-free fuel cells. Hydrogen is industrially produced by methods such as electrolysis of water and brine, and steam reforming of petroleum and natural gas. However, the former is expensive in energy cost, and the latter is low in purity, so further purification is required, and a simple and inexpensive generation method is required.

ケイ素が水と反応して水素ガスを発生させることは、知られている。特許文献1には、
半導体のウエハ製造工程において多量に発生するケイ素屑を、炭酸ナトリウム水溶液や、同様に半導体デバイス製造工程において生じるアルカリ性廃液などのアルカリ性水溶液と、50℃以上の温度で反応させて、高純度の水素を発生させることが開示されている。上記の反応中にケイ酸イオンによりゲルが形成して、水素の発生を妨げることを防ぐために、特許文献2には、ケイ素粉を水とスラリー状にして用いることが提案されている。特許文献3には、発生する水素を、水素吸蔵合金で貯蔵することが開示されている。しかしながら、これらの方法で用いられるケイ素は、半導体用の高純度のものであり、屑とはいえ、その原価は高い。
It is known that silicon reacts with water to generate hydrogen gas. In Patent Document 1,
High-purity hydrogen is produced by reacting silicon scrap generated in large quantities in the semiconductor wafer manufacturing process with an aqueous sodium carbonate solution or an alkaline aqueous solution such as an alkaline waste liquid generated in the semiconductor device manufacturing process at a temperature of 50 ° C. or higher. Generating is disclosed. In order to prevent the formation of a gel by silicate ions during the above reaction and hindering the generation of hydrogen, Patent Document 2 proposes using silicon powder in a slurry form with water. Patent Document 3 discloses storing generated hydrogen as a hydrogen storage alloy. However, silicon used in these methods is of high purity for semiconductors, and although it is scrap, its cost is high.

特許文献4には、水、ホウ砂、リン酸およびホウ酸を混合して得られる溶液に、水酸化カリウム、炭酸ナトリウム、ケイ素および水を反応させて得られるアルカリ性水溶液を加えて耐火液を調製し、塗料化して各種基材に処理することが開示されている。原料としてケイ素については、メタルシリコンと記載された以外に記載はなく、実施例では市販のケイ素塊が用いられているが、投入したケイ素塊の大部分は、溶解しないで残存する。   Patent Document 4 prepares a refractory solution by adding an alkaline aqueous solution obtained by reacting potassium hydroxide, sodium carbonate, silicon and water to a solution obtained by mixing water, borax, phosphoric acid and boric acid. However, it is disclosed that the coating material is processed into various substrates. Regarding silicon as a raw material, there is no description other than that described as metal silicon, and in the examples, commercially available silicon lumps are used, but most of the charged silicon lumps remain without being dissolved.

一方、シリコーンや有機ケイ素化合物の中間原料として、メチルクロロシランのようなオルガノクロロシラン類が合成されている。メチルクロロシランを例にとると、ケイ素粉に、触媒として銅および/または銅化合物の粉体(以下、銅触媒という)を混合した触体を反応器に充填し、塩化メチルを通してケイ素と反応させて、粗メチルクロロシランを合成し、精留によって各種メチルクロロシランを得る。反応によって消費されたケイ素粉を補充しつつ連続的に塩化メチルを供給して反応を続け、銅触媒が劣化すると、反応を止めて触体を反応器から取り出す。また、反応中に塩化メチル流に同伴して搬出される微粒のケイ素粉や触体を、サイクロンで回収することも行われる。   On the other hand, organochlorosilanes such as methylchlorosilane have been synthesized as intermediate raw materials for silicone and organosilicon compounds. Taking methylchlorosilane as an example, a contact body obtained by mixing silicon powder with copper and / or copper compound powder (hereinafter referred to as copper catalyst) as a catalyst is charged into a reactor and reacted with silicon through methyl chloride. The crude methylchlorosilane is synthesized and various methylchlorosilanes are obtained by rectification. The reaction is continued by supplying methyl chloride continuously while replenishing the silicon powder consumed by the reaction. When the copper catalyst is deteriorated, the reaction is stopped and the contact body is taken out from the reactor. In addition, it is also possible to collect fine silicon powder and a contact body, which are carried along with the methyl chloride flow during the reaction, with a cyclone.

同様に銅触媒を用いるシラン化合物の合成反応は、ケイ素と塩化水素から、半導体用の高純度ケイ素を得る中間体として有用なトリクロロシランを合成する反応;ケイ素とメタノールから、メトキシシラン類を合成する反応でも用いられる例があり、同様に、ケイ素と銅を含む廃触体を生じる。   Similarly, the synthesis reaction of a silane compound using a copper catalyst is a reaction of synthesizing trichlorosilane useful as an intermediate for obtaining high-purity silicon for semiconductors from silicon and hydrogen chloride; synthesizing methoxysilanes from silicon and methanol. There are examples used in the reaction as well, resulting in waste contacts containing silicon and copper.

このようにして副生する廃触体は、空気中で発火するような活性がまだ残っている。そのため、シラン化合物の製造業者は、これを熱処理などの方法により安定化した後、処分している。特許文献5には、廃触体に含まれるケイ素および銅触媒の再利用方法として、廃触体を希塩酸に分散させ、20〜100℃で塩素と接触させることにより銅を塩化銅(II)に変えて分離し、還元して触媒として再利用するとともに、ケイ素粒子を沈殿として回収することが開示されている。特許文献6には、廃触体を塩化水素または塩素と500〜1,200℃で接触させて、塩化ケイ素および金属塩化物として回収することが開示されている。   The waste contact body by-produced in this way still has an activity that ignites in the air. For this reason, manufacturers of silane compounds stabilize it by a method such as heat treatment and then dispose of it. In Patent Document 5, as a method for reusing silicon and copper catalysts contained in waste contact bodies, the waste contact bodies are dispersed in dilute hydrochloric acid, and contacted with chlorine at 20 to 100 ° C. to convert copper into copper (II) chloride. It is disclosed that it is changed and separated, reduced and reused as a catalyst, and silicon particles are recovered as a precipitate. Patent Document 6 discloses that a waste contact body is brought into contact with hydrogen chloride or chlorine at 500 to 1,200 ° C. and recovered as silicon chloride and metal chloride.

しかしながら、これらの方法は煩雑であり、装置を耐食性にすることを考慮するとコスト高になる。特に、特許文献6で得られる四塩化ケイ素は、他のシラン化合物に比べて利用価値が低い。したがって、これらの方法は、廃触体の有効な利用方法とはいえない。   However, these methods are cumbersome and costly when considering making the apparatus corrosion resistant. In particular, silicon tetrachloride obtained in Patent Document 6 has a lower utility value than other silane compounds. Therefore, these methods cannot be said to be effective utilization methods of the waste contact body.

特許文献7には、ポリアルキレンエーテル系界面活性剤の存在下に、廃触体を温度20〜100℃において、酸性領域で水と接触させて水素を発生させ、ついで結合剤を添加し、さらに脱水することにより、廃触体を不活性にすることが開示されている。   In Patent Document 7, in the presence of a polyalkylene ether surfactant, the waste contactor is brought into contact with water in an acidic region at a temperature of 20 to 100 ° C. to generate hydrogen, and then a binder is added. It is disclosed that the waste contact body is made inactive by dehydration.

以上に述べた方法を、廃触体のように、銅および/または銅化合物の粉体を含み、活性を有するケイ素粉に適用しようとすると、水との接触による水素発生反応が発熱反応であることに加えて、廃触体に残存する活性により激しい反応を生じて、安全かつ安定に水素を発生させることは困難である。   When the above-described method is applied to silicon powder having copper and / or copper compound powder and having an activity like a waste contact body, the hydrogen generation reaction by contact with water is an exothermic reaction. In addition, it is difficult to generate hydrogen violently by the activity remaining in the waste contact body and to generate hydrogen safely and stably.

特開2000−191303号公報JP 2000-191303 A 特開2001−213609号公報Japanese Patent Laid-Open No. 2001-213609 特開2004−213609号公報JP-A-2004-213609 特開2002−121424号公報JP 2002-121424 A 米国特許第2,803,521号明細書US Pat. No. 2,803,521 特開平9−110411号公報Japanese Patent Laid-Open No. 9-110411 特開平7−145176号公報Japanese Patent Laid-Open No. 7-145176

本発明の課題は、銅および/または銅化合物の粉体を含むケイ素粉から、安全かつ安定に水素を発生させる方法を提供することである。本発明のもう一つの課題は、そのように水素を発生させた後に残る残留物を、シリカ微粉末および/またはケイ酸アルカリ金属塩もしくはその水溶液として、有効に活用する方法を提供することである。   An object of the present invention is to provide a method of generating hydrogen safely and stably from silicon powder containing copper and / or copper compound powder. Another object of the present invention is to provide a method for effectively utilizing the residue remaining after the generation of hydrogen as silica fine powder and / or alkali metal silicate or an aqueous solution thereof. .

本発明者は、上記の課題を解決するために検討を重ねた結果、水素発生反応を、20℃未満に冷却しつつ進行させることにより、その目的を達成できることを見出して、本発明を完成させるに至った。   As a result of repeated studies to solve the above problems, the present inventor has found that the object can be achieved by allowing the hydrogen generation reaction to proceed while cooling to less than 20 ° C., thereby completing the present invention. It came to.

すなわち、本発明は、銅触媒の粉体を含み、平均粒子径が500μm以下のケイ素粉を水と反応させて、水素を発生させる方法であって、反応を20℃未満の温度で行うことを特徴とする方法に関し、さらに、上記水素とともに、シリカ微粉末および/またはケイ酸アルカリ金属塩もしくはその水溶液を回収する方法に関する。   That is, the present invention is a method of generating hydrogen by reacting silicon powder containing copper catalyst powder and having an average particle size of 500 μm or less with water, and performing the reaction at a temperature of less than 20 ° C. The present invention relates to a characteristic method, and further relates to a method for recovering silica fine powder and / or alkali metal silicate or an aqueous solution thereof together with the hydrogen.

本発明によって、銅触媒の粉体を含むケイ素粉から、安全かつ安定に水素を発生させることができる。また、それとともにケイ素資源として、シリカ微粉末および/またはケイ酸アルカリ金属塩もしくはそれを主成分とする結合剤などとして利用することができる。   According to the present invention, hydrogen can be generated safely and stably from silicon powder containing copper catalyst powder. In addition, it can be used as a silicon resource as a silica fine powder and / or an alkali metal silicate salt or a binder containing the same as a main component.

本発明に用いられるケイ素粉は、銅触媒の粉体を含む。ケイ素粉は、触媒配合前の純度が95〜99重量%の工業用のものでよく、純度は特に限定されない。このような銅触媒の粉体を含むケイ素粉は、ケイ素とハロゲン化炭化水素との直接法によるオルガノクロロシラン類の合成、たとえばケイ素と塩化メチルからメチルクロロシラン類の合成をはじめとして;ケイ素と塩化水素からトリクロロシランを合成する反応;ケイ素とメタノールからメトキシシラン類を合成する反応など、シラン化合物を合成する際に、廃触体として多量に副生する。   The silicon powder used in the present invention includes a copper catalyst powder. The silicon powder may be for industrial use with a purity of 95 to 99% by weight before blending the catalyst, and the purity is not particularly limited. Silicon powder containing such copper catalyst powder is used for the synthesis of organochlorosilanes by direct method of silicon and halogenated hydrocarbons, such as the synthesis of methylchlorosilanes from silicon and methyl chloride; silicon and hydrogen chloride. When a silane compound is synthesized, such as a reaction for synthesizing trichlorosilane from silicon; a reaction for synthesizing methoxysilanes from silicon and methanol.

銅触媒は、前述のように、銅および/または銅化合物である。銅触媒としては、銅のほか、亜酸化銅、酸化銅、塩化銅(I)のような銅化合物が例示される。また、助触媒として銅以外の金属、たとえば亜鉛、スズ、鉄、ニッケル、銀などを、銅と併用してもよい。これらは銅触媒との混合粉として用いても、銅との合金粉の形で用いてもよい。さらに、これら銅などの触媒は、反応前の予備処理により、または反応中に、その少なくとも一部がケイ素との金属間化合物を形成することがある。本発明において、銅触媒とは、これらすべての形態の触媒を包含する。   The copper catalyst is copper and / or a copper compound as described above. Examples of the copper catalyst include copper, and copper compounds such as cuprous oxide, copper oxide, and copper (I) chloride. Moreover, you may use metals other than copper, for example, zinc, tin, iron, nickel, silver etc., together with copper as a promoter. These may be used as mixed powder with a copper catalyst or in the form of alloy powder with copper. Furthermore, these catalysts such as copper may at least partially form an intermetallic compound with silicon by pretreatment before the reaction or during the reaction. In the present invention, the copper catalyst includes all these forms of catalyst.

銅触媒は、シラン合成反応を円滑に進め、目的とする有用なシラン化合物、たとえばメチルクロロシラン類の場合はジメチルジクロロシランを選択率よく合成するために、ケイ素粉に対して銅原子換算で通常0.5〜10重量%、好ましくは1〜6重量%の範囲になるように反応器に挿入されるが、反応の進行とともにケイ素が消費されるので、取り出された廃触体中の銅触媒の量は、5〜60重量%に達することもある。助触媒は添加されないこともあり、亜鉛の場合、通常、銅1重量部に対して好ましくは0.01〜0.5重量部である。   The copper catalyst smoothly advances the silane synthesis reaction and, in the case of methylchlorosilanes, in order to synthesize dimethyldichlorosilane with a high selectivity, usually 0 in terms of copper atoms relative to silicon powder. It is inserted into the reactor so as to be in the range of 5 to 10% by weight, preferably 1 to 6% by weight, but since silicon is consumed as the reaction proceeds, the copper catalyst in the removed waste catalyst The amount can reach 5-60% by weight. The cocatalyst may not be added. In the case of zinc, the amount is usually 0.01 to 0.5 parts by weight with respect to 1 part by weight of copper.

ケイ素粉は、シラン化合物を合成する流動反応を円滑に進めるために、平均粒子径が500μm以下、好ましくは1〜200μm、さらに好ましくは20〜100μmで供給されるが、反応の進行とともにケイ素が消費されて粒子径が小さくなり、廃触体として回収されるケイ素粉の平均粒子径は、反応時間にもよるが一般に0.5〜200μmである。特に反応器からガスに同伴して搬出され、サイクロンで回収されたものは、平均粒子径が0.1〜5μm程度の場合もある。また、オルガノクロロシラン類の合成では、回収された廃触体には、副反応によって生じたジシラン化合物やシルメチレン化合物のような高沸点有機ケイ素化合物、ならびに/または反応中に熱分解によってケイ素粉および銅触媒の表面に堆積した炭素を含むことがある。廃触体に残存する活性は、シラン化合物合成の最終段階の状況、廃触体中の銅の含有量、ケイ素粉の平均粒子径と粒子径分布、取り出した後の保存状態や保存期間などによっても異なる。   The silicon powder is supplied with an average particle size of 500 μm or less, preferably 1 to 200 μm, more preferably 20 to 100 μm, in order to smoothly advance the flow reaction for synthesizing the silane compound, but silicon is consumed as the reaction proceeds. Thus, the average particle size of the silicon powder recovered as a waste contact body is generally 0.5 to 200 μm although it depends on the reaction time. In particular, what is carried out from the reactor with the gas and recovered by the cyclone may have an average particle diameter of about 0.1 to 5 μm. In the synthesis of organochlorosilanes, the recovered waste contact body includes high boiling point organosilicon compounds such as disilane compounds and silmethylene compounds generated by side reactions, and / or silicon powder and copper by thermal decomposition during the reaction. May contain carbon deposited on the surface of the catalyst. The activity remaining in the waste contact body depends on the final stage of silane compound synthesis, the copper content in the waste contact body, the average particle size and particle size distribution of the silicon powder, the storage state and storage period after removal, etc. Is also different.

本発明において、ケイ素粉と反応させるために用いる水は、下記の水素発生反応が発熱反応であるため、必要な反応温度を維持するための冷却剤を兼ねることから、通常、化学量論的量よりはるかに過剰であって、ケイ素粉に対して重量比で通常3〜200倍量、好ましくは5〜100倍量である。水の量は、目的物が微粉末シリカの場合、5〜50倍量で充分であるが、ケイ酸ナトリウムなどの場合、反応をより緩やかに進行させるために、20〜100倍量がさらに好ましい。   In the present invention, the water used for reacting with the silicon powder is usually a stoichiometric amount because the following hydrogen generation reaction is an exothermic reaction and also serves as a coolant for maintaining the required reaction temperature. It is much more excessive and is usually 3 to 200 times, preferably 5 to 100 times the weight of silicon powder. As for the amount of water, 5 to 50 times the amount is sufficient when the target product is fine silica, but in the case of sodium silicate or the like, the amount is more preferably 20 to 100 times in order to allow the reaction to proceed more slowly. .

Si + 2HO → SiO + 2H Si + 2H 2 O → SiO 2 + 2H 2

水は、純水や市水でもよく、反応を0℃未満で行う場合など、塩化ナトリウム、塩化マグネシウム、塩化カルシウムのような氷点降下剤を含むブライン水であってもよい。また、系中に存在する、ケイ素原子に結合した塩素原子を有する有機ケイ素化合物から加水分解によって生成する塩化水素を中和し、および/または生成した二酸化ケイ素をケイ酸ナトリウムに転換するために、水酸化ナトリウム、炭酸ナトリウム、炭酸水素ナトリウムのような塩基性ナトリウム化合物;および/またはそれらに相当する塩基性カリウム化合物もしくは塩基性リチウム化合物を含む水溶液でもよい。塩基性アルカリ金属化合物が氷点降下剤を兼ねてもよく、塩基性アルカリ金属化合物を他の氷点降下剤と併用してもよい。得られるケイ酸塩の水への溶解性が必要な場合は、水酸化ナトリウムのような塩基性ナトリウム化合物が好ましい。得られるケイ酸アルカリ金属塩を精製する工程を省略するために、目的物のケイ酸塩と同じ水溶性ケイ酸塩を、氷点降下剤の一部として用いてもよい。   The water may be pure water or city water, and may be brine water containing a freezing point depressant such as sodium chloride, magnesium chloride or calcium chloride, for example, when the reaction is conducted at less than 0 ° C. In order to neutralize hydrogen chloride produced by hydrolysis from an organosilicon compound having a chlorine atom bonded to a silicon atom present in the system and / or to convert the produced silicon dioxide to sodium silicate, An aqueous solution containing a basic sodium compound such as sodium hydroxide, sodium carbonate, sodium hydrogen carbonate; and / or a basic potassium compound or a basic lithium compound corresponding to them may be used. A basic alkali metal compound may also serve as a freezing point depressant, and a basic alkali metal compound may be used in combination with another freezing point depressant. When solubility of the resulting silicate in water is required, a basic sodium compound such as sodium hydroxide is preferred. In order to omit the step of purifying the obtained alkali metal silicate, the same water-soluble silicate as the target silicate may be used as a part of the freezing point depressant.

廃触体のように銅触媒を含むケイ素化合物が活性を有し、かつその活性を容易に測定できず、ケイ素が微粉末状態なので、反応の爆発的な進行を抑制するために、ケイ素粉の導入速度を制御するなどの方法で、温度を20℃未満、好ましくは0℃未満に保つようにして反応を行う。実際上、好ましい反応温度の下限は−15℃程度である。系を低温に保つため、反応液は、上述のように氷点降下剤を含む水が好ましい。また、さらに反応器の外周を同様の冷媒で冷却し、または潜熱などの他の冷却手段を用いることが好ましい。なお、上記の温度で反応を行った後、反応を完結させるために、室温程度まで温度を上げてもよい。   A silicon compound containing a copper catalyst, such as a waste catalyst, has activity, and its activity cannot be easily measured. Since silicon is in a fine powder state, in order to suppress the explosive progress of the reaction, The reaction is carried out by keeping the temperature below 20 ° C., preferably below 0 ° C., by controlling the introduction rate. In practice, the lower limit of the preferred reaction temperature is about -15 ° C. In order to keep the system at a low temperature, the reaction solution is preferably water containing a freezing point depressant as described above. Further, it is preferable to cool the outer periphery of the reactor with the same refrigerant or use other cooling means such as latent heat. In addition, after performing reaction at said temperature, in order to complete reaction, you may raise temperature to about room temperature.

反応の進行を容易に制御するために、反応は、pH6〜8の中性領域で行ってもよく、廃触体の活性が低い場合は、pHが8を越えるアルカリ領域で行ってもよい。系をアルカリ性にするために、上記の塩基性ナトリウム化合物および/または塩基性カリウム化合物のような塩基性アルカリ金属化合物、場合によっては対応する塩基性リチウム化合物などを用いてもよい。   In order to easily control the progress of the reaction, the reaction may be performed in a neutral region of pH 6 to 8, and may be performed in an alkaline region where the pH exceeds 8 when the activity of the waste contactor is low. In order to make the system alkaline, a basic alkali metal compound such as the above basic sodium compound and / or basic potassium compound, or a corresponding basic lithium compound may be used in some cases.

発生する水素は、加圧容器のような水素貯蔵装置に捕集し、または水素吸蔵合金に吸着させることができる。   The generated hydrogen can be collected in a hydrogen storage device such as a pressurized container, or adsorbed on a hydrogen storage alloy.

水素発生反応を中性領域で行うことにより、シリカ微粉末の沈殿を生じる。シリカ微粉末には、廃触体中の反応にあずからない成分、たとえば銅、助触媒として用いられた金属、シラン化合物合成の反応装置から混入した鉄、炭素および有機化合物などが混入している。これらの不純物を、酸処理などの方法によって除去することにより、精製された微粉末シリカを得ることができる。   By performing the hydrogen generation reaction in a neutral region, precipitation of fine silica powder occurs. Silica fine powder contains components that are not involved in the reaction in the waste contact body, such as copper, metals used as promoters, iron, carbon, and organic compounds mixed from the reactor for synthesizing silane compounds. . By removing these impurities by a method such as acid treatment, purified fine powder silica can be obtained.

また、塩基性アルカリ金属化合物、たとえば塩基性ナトリウム化合物の存在下に水素発生反応を行って、ケイ酸アルカリ金属塩、たとえばメタケイ酸ナトリウムのようなケイ酸ナトリウムを含む水溶液を得ることもできる。用いる塩基性アルカリ金属化合物の量は、理論量でもよく、反応を完結させるために過剰量、たとえば10%までの過剰量を用いてもよい。ただし、水溶液中の塩基性アルカリ金属化合物の濃度は、急激な反応を起こさないように、1N未満にすることが好ましく、0.5N以下がさらに好ましい。その場合、必要に応じて他の氷点降下剤を使用する。該化合物は、反応を開始する際に全量を存在させてもよく、反応速度を制御するために、水溶液として逐次添加してもよい。ケイ酸ナトリウムは水溶液として得られるので、前述のような廃触体に由来する不純物は、ろ過によって除くことができる。ケイ酸ナトリウムは、得られた水溶液をそのまま各種の用途に用いても、減圧加熱などの方法によって濃縮して用いてもよい。   Alternatively, a hydrogen generation reaction may be performed in the presence of a basic alkali metal compound such as a basic sodium compound to obtain an aqueous solution containing an alkali metal silicate salt such as sodium silicate such as sodium metasilicate. The amount of the basic alkali metal compound used may be a theoretical amount or an excess amount, for example, an excess amount of up to 10%, may be used to complete the reaction. However, the concentration of the basic alkali metal compound in the aqueous solution is preferably less than 1N so as not to cause a rapid reaction, and more preferably 0.5N or less. In that case, use another freezing point depressant if necessary. The compound may be present in its entirety when starting the reaction, or may be added sequentially as an aqueous solution to control the reaction rate. Since sodium silicate is obtained as an aqueous solution, impurities derived from the waste contact body as described above can be removed by filtration. Sodium silicate may be used as it is for various applications as it is, or may be used after being concentrated by a method such as heating under reduced pressure.

廃触体の活性が高い場合や、そのおそれのある場合は、塩基性アルカリ金属化合物なしに、またはその量を最小限に抑えてシリカ微粉末を形成させ、ついで、たとえば水酸化ナトリウムのような塩基性アルカリ金属化合物との反応によって、ケイ酸アルカリ金属塩、たとえばケイ酸ナトリウムを形成させてもよい。逆に、塩基性アルカリ金属化合物の存在下に得られたケイ酸ナトリウムを含む水溶液に、塩酸のような無機酸を加えるなどの方法により、沈殿シリカまたはシリカヒドロゲルを得ることができる。   When the activity of the waste contactor is high or possibly, the silica fine powder is formed without a basic alkali metal compound or with a minimum amount thereof, and then, for example, sodium hydroxide. An alkali metal silicate salt such as sodium silicate may be formed by reaction with a basic alkali metal compound. Conversely, precipitated silica or silica hydrogel can be obtained by adding an inorganic acid such as hydrochloric acid to an aqueous solution containing sodium silicate obtained in the presence of a basic alkali metal compound.

以下、本発明を、実施例によってさらに詳細に説明する。本発明は、これらの実施例によって限定されるものではない。以下の実施例および比較例において、特にことわらない限り、部は重量部を表し、濃度の%は重量%を表す。   Hereinafter, the present invention will be described in more detail by way of examples. The present invention is not limited by these examples. In the following examples and comparative examples, unless otherwise specified, parts represent parts by weight, and% of concentration represents weight%.

実施例および比較例に用いられた廃触体は、メチルクロロシラン類の合成に用いられた後、反応器から取り出されたもので、蛍光X線分析によると、ケイ素82%、銅12%および炭素1.5%を含み、平均粒子径が10μmの、まだかなり活性が残っているものである。   The waste contact materials used in Examples and Comparative Examples were taken out of the reactor after being used for the synthesis of methylchlorosilanes. According to X-ray fluorescence analysis, 82% silicon, 12% copper and carbon It contains 1.5%, has an average particle size of 10 μm, and still has considerable activity.

実施例1
撹拌装置、固体挿入装置、水素排出孔とそれに連結した耐圧貯槽、および温度計を備え、ブライン浴で囲んだ耐圧・耐食性の反応容器に、窒素雰囲気中で、塩化ナトリウム15%水溶液352部を仕込んだ。ブライン浴に塩化カルシウム18%を含む冷ブライン水を循環させて、容器内の液温を−5℃に保ち、撹拌している塩化ナトリウム水溶液に廃触体68.3部を、液温が−5℃を越えないように、80分かけて少量ずつ投入して水と接触させ、反応によって発生した水素を貯槽に導入した。反応の進行とともに、反応容器にシリカ微粉末が析出した。投入終了後、撹拌を1時間続けた後、ブライン浴を水浴に換えて、容器内の液温を20分かけて15℃まで上昇させ、液温15℃でさらに撹拌を30分続けて、反応を完結させた。反応は安定して緩やかに進行し、理論量(8部)の91%に相当する水素を得た。容器に堆積した固体をろ過によって採取し、分級して、シリカ微粉末105.6部を回収した。
Example 1
Stirring device, solid insertion device, hydrogen discharge hole and pressure-resistant storage tank connected to it, and thermometer, and charged with 352 parts of sodium chloride 15% aqueous solution in nitrogen atmosphere in pressure-resistant and corrosion-resistant reaction vessel surrounded by brine bath It is. Chilled brine containing 18% calcium chloride is circulated in the brine bath to maintain the liquid temperature in the container at -5 ° C., and 68.3 parts of waste contactor is added to the stirring sodium chloride aqueous solution. In order not to exceed 5 ° C., it was added in small portions over 80 minutes and brought into contact with water, and hydrogen generated by the reaction was introduced into the storage tank. As the reaction progressed, fine silica powder precipitated in the reaction vessel. After completion of the addition, stirring was continued for 1 hour, the brine bath was changed to a water bath, the temperature of the liquid in the container was raised to 15 ° C. over 20 minutes, and stirring was further continued for 30 minutes at the liquid temperature of 15 ° C. Was completed. The reaction proceeded slowly and stably, and hydrogen corresponding to 91% of the theoretical amount (8 parts) was obtained. The solid deposited in the container was collected by filtration and classified to recover 105.6 parts of silica fine powder.

実施例2
反応剤として、水酸化ナトリウム2%およびメタケイ酸ナトリウム5%を含む水溶液1,200部を用い、容器内の液温を反応出発時に−2℃として、反応中の液温を0℃未満に制御し、最終段階の液温を10℃としたほかは実施例1と同様にして、廃触体20.5部を投入して反応させた。反応は安定して緩やかに進行し、理論量の87%に相当する水素を得た。液中で水酸化ナトリウムが反応に関与して、反応剤の氷点降下剤として投入した分と、反応で得られた分の合計量のメタケイ酸ナトリウムを含む水溶液を得た。生成液から粉末状固体をろ別し、液を減圧加熱により濃縮して、メタケイ酸ナトリウム20%を含む水溶液778部を得た。
Example 2
As a reactant, 1,200 parts of an aqueous solution containing 2% sodium hydroxide and 5% sodium metasilicate was used. The liquid temperature in the container was set to −2 ° C. at the start of the reaction, and the liquid temperature during the reaction was controlled to below 0 ° C. Then, except that the liquid temperature at the final stage was set to 10 ° C., 20.5 parts of the waste contact body was added and reacted in the same manner as in Example 1. The reaction proceeded slowly and stably, and hydrogen corresponding to 87% of the theoretical amount was obtained. An aqueous solution containing sodium metasilicate in a total amount of sodium hydroxide involved in the reaction and charged as a freezing point depressant of the reactant and the amount obtained by the reaction was obtained. The powdered solid was filtered off from the product solution, and the solution was concentrated by heating under reduced pressure to obtain 778 parts of an aqueous solution containing 20% sodium metasilicate.

比較例1
ブライン浴の代わりに水浴を用い、反応開始温度を30℃としたほかは実施例1と同様にして反応を行った。温度が上昇して、反応は激しく進行し、反応の制御が困難であった。
Comparative Example 1
The reaction was conducted in the same manner as in Example 1 except that a water bath was used instead of the brine bath and the reaction start temperature was 30 ° C. As the temperature rose, the reaction proceeded violently and it was difficult to control the reaction.

比較例2
ブライン浴の代わりに水浴を用い、反応開始温度を30℃としたほかは実施例2と同様にして反応を行った。温度が急激に上昇して、反応は爆発的に進行し、反応の制御が困難であった。
Comparative Example 2
The reaction was performed in the same manner as in Example 2 except that a water bath was used instead of the brine bath and the reaction start temperature was 30 ° C. The temperature rose rapidly and the reaction proceeded explosively, making it difficult to control the reaction.

本発明によって、シラン類の合成の際に副生し、費用をかけて廃棄していた銅触媒を含むケイ素粉などから、水素ガス、ならびに必要に応じてシリカ微粉末および/またはケイ酸ナトリウムを得ることができる。水素ガスは、酸水素炎溶接、燃料電池の燃料など、水素ガスの小規模の用途に有用である。シリカ微粉末は、充填剤、体質顔料などの用途がある。ケイ酸ナトリウムまたはその水溶液は、水ガラスとして結合剤、接着剤などに用いられるほか、耐火セメント、合成ケイ酸塩、塗料などの原料として用いられる。さらに、分岐状もしくは網状ポリオルガノシロキサンの四官能性シロキサン単位の原料として、シリコーン工業に有用である。   According to the present invention, hydrogen gas and, if necessary, fine silica powder and / or sodium silicate are obtained from silicon powder containing a copper catalyst, which is by-produced during the synthesis of silanes and is costly discarded. Obtainable. Hydrogen gas is useful for small-scale applications of hydrogen gas, such as oxyhydrogen flame welding and fuel cell fuel. Silica fine powder has uses such as fillers and extender pigments. Sodium silicate or an aqueous solution thereof is used as a water glass for binders, adhesives, and the like, and is also used as a raw material for fireproof cement, synthetic silicate, paint, and the like. Furthermore, it is useful in the silicone industry as a raw material for tetrafunctional siloxane units of branched or reticulated polyorganosiloxane.

Claims (7)

銅および/または銅化合物の粉体を含み、平均粒子径が500μm以下の、シラン化合物合成の廃触体であるケイ素粉を水と反応させて、水素を発生させる方法であって、反応を20℃未満の温度で行うことを特徴とする方法。 A method of generating hydrogen by reacting silicon powder, which is a waste contact body for synthesizing a silane compound, containing copper and / or copper compound powder and having an average particle diameter of 500 μm or less with water. A method characterized in that it is carried out at a temperature of less than ° C. 反応を0℃未満の温度で行う、請求項1に記載の方法。 The process according to claim 1, wherein the reaction is carried out at a temperature below 0 ° C. 反応をpH6〜8で行う、請求項1または2に記載の方法。 The process according to claim 1 or 2 , wherein the reaction is carried out at pH 6-8. シリカ微粉末を回収する、請求項1〜のいずれか一項に記載の方法。 The method as described in any one of Claims 1-3 which collect | recovers a silica fine powder. 反応を、塩基性アルカリ金属化合物を含む水溶液中で行い、ケイ酸アルカリ金属塩もしくはその水溶液を回収する、請求項1または2に記載の方法。 The method according to claim 1 or 2 , wherein the reaction is carried out in an aqueous solution containing a basic alkali metal compound, and an alkali metal silicate salt or an aqueous solution thereof is recovered. 水溶液中の塩基性アルカリ金属化合物の濃度が0.5N以下である、請求項に記載の方法。 The method according to claim 5 , wherein the concentration of the basic alkali metal compound in the aqueous solution is 0.5 N or less. ケイ酸アルカリ金属塩がケイ酸ナトリウムである、請求項またはに記載の方法。 The method according to claim 5 or 6 , wherein the alkali metal silicate is sodium silicate.
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