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JP4079370B2 - Barrel polishing method and barrel polishing apparatus - Google Patents
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JP4079370B2 - Barrel polishing method and barrel polishing apparatus - Google Patents

Barrel polishing method and barrel polishing apparatus Download PDF

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JP4079370B2
JP4079370B2 JP2003329578A JP2003329578A JP4079370B2 JP 4079370 B2 JP4079370 B2 JP 4079370B2 JP 2003329578 A JP2003329578 A JP 2003329578A JP 2003329578 A JP2003329578 A JP 2003329578A JP 4079370 B2 JP4079370 B2 JP 4079370B2
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polishing
mass
load
tank
movable means
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JP2004188583A (en
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一敏 西村
喬男 石田
吉浩 増田
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新東ブレーター株式会社
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Description

本発明は、ワークとメディアとからなるマスを研磨槽内で遠心流動させながら、ワークを研磨する流動型のバレル研磨方法及びバレル研磨装置に関するものである。   The present invention relates to a fluid-type barrel polishing method and barrel polishing apparatus for polishing a workpiece while centrifugally flowing a mass composed of a workpiece and a medium in a polishing tank.

流動型のバレル研磨は、研磨対象物であるワークと研磨材であるメディアとからなるマスを研磨槽内に投入し、研磨槽の底部に設けた回転盤によりマスを遠心流動させながらワークを研磨する方法であり、その一例は特許文献1に示されている。この流動型のバレル研磨方法では、図1に示すようにマスは回転盤の回転方向に沿って流動する水平旋回流動と、遠心力により研磨槽の内壁面を上昇して最上部で中心方向に向けて流下する垂直旋回流動とが組み合わされてトロイダル状に流動する間に、ワークとメディアとが相互に摩擦されてワークの表面が研磨される。   In fluid barrel polishing, a mass consisting of a workpiece, which is an object to be polished, and a media, which is an abrasive material, is put into a polishing tank, and the workpiece is polished while the mass is centrifugally fluidized by a rotating disk provided at the bottom of the polishing tank. One example is shown in Patent Document 1. In this fluid type barrel polishing method, as shown in FIG. 1, the mass moves horizontally along the rotating direction of the rotating disk, and the inner wall of the polishing tank is lifted by the centrifugal force, and in the central direction at the top. While the vertical swirl flow that flows downward is combined and flows in a toroidal shape, the workpiece and the media are rubbed against each other, and the surface of the workpiece is polished.

しかし従来の流動バレル研磨においては、研磨の進行とともにメディアが次第に磨耗し、マス量が減少したり、ワークとメディアとの摩擦力が減少することによる研磨能力の低下を避け難いという問題があった。これらの問題は特に乾式の流動バレル研磨において顕著であった。
特開平8−11057号公報
However, in the conventional fluid barrel polishing, the media gradually wears as the polishing progresses, and there is a problem that it is difficult to avoid a decrease in polishing ability due to a decrease in mass amount or a decrease in frictional force between the workpiece and the media. . These problems are particularly noticeable in dry fluid barrel polishing.
JP-A-8-11057

本発明は上記した従来の問題点を解決し、研磨の進行による研磨能力の低下をなくし、研磨能力を従来よりも大幅に向上させることできる流動型のバレル研磨方法及びバレル研磨装置を提供することを目的とするものである。   The present invention provides a fluidized barrel polishing method and barrel polishing apparatus capable of solving the above-described conventional problems, eliminating a decrease in polishing ability due to progress of polishing, and greatly improving the polishing ability as compared with the conventional one. It is intended.

本発明者らは上記の課題を解決するために鋭意研究を重ねた結果、マスの自然な流動を妨げると流動型バレル研磨の研磨能力が低下するという従来の常識に反して、研磨槽の内壁を上昇するマスの流動を適切な手段で制御することにより、研磨能力を従来よりも大幅に上昇できることを見出した。また流動型バレル研磨装置の研磨能力の変化は、回転盤からマスへ伝達される仕事量の変化であり、言い換えれば回転盤の回転抵抗の変化として現れるので、回転盤の駆動モータの負荷として外部から把握することができる。従って回転盤の駆動モータの負荷を一定に保持するようにマスの流動制御を行えば、研磨の進行により低下する研磨能力を一定に維持できることを見出した。   As a result of intensive studies to solve the above problems, the present inventors have found that the inner wall of the polishing tank is contrary to the conventional common sense that the polishing ability of fluidized barrel polishing is reduced if the natural flow of the mass is hindered. It has been found that the polishing ability can be greatly increased by controlling the flow of the mass that rises by a suitable means. In addition, the change in the polishing ability of the fluidized barrel polishing apparatus is a change in the amount of work transmitted from the rotating disk to the mass, in other words, it appears as a change in the rotational resistance of the rotating disk. Can be grasped from. Therefore, it has been found that if the mass flow control is performed so as to keep the load of the drive motor of the rotating disk constant, the polishing ability that decreases with the progress of polishing can be maintained constant.

上記の知見に基づいてなされた本発明のバレル研磨方法は、研磨槽の底部に設けた回転盤によりマスを旋回流動させながら研磨を行うバレル研磨方法において、回転盤の駆動モータの負荷を予め設定しておき、研磨槽内のマスの流動を、研磨槽の内壁に沿って上昇するマスの上端を押さえる力を加減することにより制御し、該駆動モータの負荷を設定範囲内に維持しつつ研磨することを特徴とするものである。この場合、駆動モータの負荷として例えば駆動モータの負荷電流値を用いることが好ましい。 The barrel polishing method of the present invention made based on the above knowledge is a barrel polishing method in which polishing is performed while swirling the mass with a rotating disk provided at the bottom of the polishing tank. In addition, the flow of the mass in the polishing tank is controlled by adjusting the force that presses the upper end of the mass rising along the inner wall of the polishing tank , and polishing is performed while maintaining the load of the drive motor within the set range. It is characterized by doing. In this case, for example, the load current value of the drive motor is preferably used as the load of the drive motor.

また、研磨槽内のマスの流動制御を間欠的に行うことにより、マスの流動を制御しつつ行う研磨とマスの流動を制御しない自由研磨とを交互に繰り返すこともできる。 Further, by intermittently controlling the flow of the mass in the polishing tank, it is possible to alternately repeat the polishing performed while controlling the flow of the mass and the free polishing without controlling the flow of the mass.

また本発明のバレル研磨装置は、ワークとメディアが投入される研磨槽と、研磨槽の底部に設けられマスを旋回流動させる回転盤と、回転盤の駆動モータの負荷を設定する手段と、研磨槽の上部で昇降し、研磨槽の内壁に沿って上昇するマスの上端を押さえる力を加減することにより、該駆動モータの負荷が設定範囲内に維持されるように制御する可動手段とからなることを特徴とするものである。 The barrel polishing apparatus of the present invention, means for setting the polishing bath workpiece and the media is turned, the turntable for turning flow mass provided at the bottom of the polishing vessel, the load of the rotating disk of the drive motor, grinding It consists of movable means that controls the load of the drive motor to be maintained within a set range by adjusting the force that moves up and down at the upper part of the tank and presses the upper end of the mass rising along the inner wall of the polishing tank. It is characterized by this.

本発明によれば、回転盤の駆動モータの負荷を負荷電流値などにより予め設定しておき、研磨槽内のマスの流動を制御することにより、該負荷の設定範囲内で研磨を行う。研磨の進行に伴う研磨能力の低下は回転盤の駆動モータの負荷減少として検出できるので、負荷が低下してきたときには研磨槽の内壁に沿って上昇するマスの上端を押さえる力を加減することにより研磨槽内のマスの流動制御を行い、負荷を常に設定範囲内に維持させることによって、研磨能力を一定に維持しながらバレル研磨を行うことができる。しかも研磨槽内のマスの流動制御を行うことによって、ワークとメディアとの摩擦力を従来よりも飛躍的に高めることができる。このような本発明の効果は乾式バレル研磨において特に顕著であるが、湿式バレル研磨においても同様に発揮されるものである。 According to the present invention, polishing is performed within a set range of the load by setting the load of the drive motor of the rotating disk in advance by the load current value and controlling the mass flow in the polishing tank. A decrease in the polishing ability accompanying the progress of polishing can be detected as a decrease in the load on the drive motor of the rotating disk, so when the load decreases, polishing is performed by adjusting the force that holds the upper end of the mass rising along the inner wall of the polishing tank. By controlling the flow of the mass in the tank and maintaining the load within the set range, barrel polishing can be performed while maintaining the polishing ability constant. Moreover, by controlling the flow of the mass in the polishing tank, the frictional force between the workpiece and the medium can be dramatically increased as compared with the prior art. Such an effect of the present invention is particularly remarkable in dry barrel polishing, but is also exhibited in wet barrel polishing.

(第1の実施形態:可動手段と昇降機構)
図2は本発明の乾式における第1の実施形態を示すもので、1はワークとメディアとからなるマスMが投入される研磨槽、2は研磨槽の底部に設けられた皿状の回転盤である。回転盤2はその周縁部が上方に湾曲されていてマスMを上方に流動させ易くしてある。研磨槽1と回転盤2のマスMが接触する部分には、耐磨耗用のウレタンゴム等によるライニングが施されている。3は研磨槽1の上部開口13を塞ぐゴムなどの可撓性材料からなる可動手段である。この実施形態では可動手段3は蓋板状のものであり、その周辺部は研磨槽1の上端に固定されている。図2に示すように、この可動手段3の周縁部は研磨槽1の内壁と接するように湾曲させておくことが好ましい。なお、研磨槽1の高さはマスMが自由に遠心流動する場合の最大高さよりも低くし、遠心流動するマスMの上端を可動手段3により抑制できるようにしておく。
(First embodiment: movable means and lifting mechanism)
FIG. 2 shows a first embodiment of the dry type of the present invention, wherein 1 is a polishing tank into which a mass M composed of a workpiece and a medium is charged, and 2 is a dish-like rotating disk provided at the bottom of the polishing tank. It is. The turntable 2 has a peripheral edge curved upward so that the mass M can easily flow upward. The part where the polishing tank 1 and the mass M of the turntable 2 are in contact with each other is lined with an abrasion-resistant urethane rubber or the like. Reference numeral 3 denotes movable means made of a flexible material such as rubber that closes the upper opening 13 of the polishing tank 1. In this embodiment, the movable means 3 has a lid plate shape, and its peripheral portion is fixed to the upper end of the polishing tank 1. As shown in FIG. 2, it is preferable that the peripheral portion of the movable means 3 is curved so as to be in contact with the inner wall of the polishing tank 1. The height of the polishing tank 1 is set to be lower than the maximum height when the mass M freely flows in a centrifugal manner so that the upper end of the mass M that is centrifugally flowed can be suppressed by the movable means 3.

回転盤2は研磨槽1の底板10より僅か上方に配設されていて、研磨槽1の内壁12と摺接部隙間4を残して摺接しながら駆動モータ20により減速機5を介して回転される。駆動モータ20の回転速度は制御手段50により制御されている。   The turntable 2 is disposed slightly above the bottom plate 10 of the polishing tank 1 and is rotated via the speed reducer 5 by the drive motor 20 while being in sliding contact with the inner wall 12 of the polishing tank 1 leaving the sliding contact portion gap 4. The The rotational speed of the drive motor 20 is controlled by the control means 50.

回転盤2には小孔6が設けられ、回転盤2と研磨槽1の底板10との間には空隙14が形成されている。空隙14の下部に設けられた集塵管11には図示しない集塵機を接続し、研磨により発生した粉塵が小孔6及び摺接部隙間4を経由して空隙14を通過し、さらにこの空隙14より集塵管11を経由して集塵されるようになっている。   A small hole 6 is provided in the turntable 2, and a gap 14 is formed between the turntable 2 and the bottom plate 10 of the polishing tank 1. A dust collector (not shown) is connected to the dust collection pipe 11 provided at the lower part of the gap 14, and dust generated by polishing passes through the gap 14 via the small hole 6 and the sliding contact gap 4. More dust is collected via the dust collection tube 11.

回転盤2の駆動モータ20の負荷は、制御手段50に内蔵された負荷検出手段により常に検出されている。駆動モータ20の負荷の検出は負荷電流を利用するのが実用的であるが、必ずしもこれに限定されるものではなく、例えば負荷電力を検出してもよい。本発明では負荷設定手段70により負荷電流値などを予め設定しておくことができるようにしておき、以下に詳述するように各種の流動制御手段により研磨槽1内のマスMの流動を制御することにより、常に駆動モータ20の設定負荷の範囲内で研磨を行わせるようにする。   The load of the drive motor 20 of the turntable 2 is always detected by a load detection unit built in the control unit 50. Although it is practical to use the load current for detecting the load of the drive motor 20, it is not necessarily limited to this. For example, the load power may be detected. In the present invention, the load current value can be set in advance by the load setting means 70, and the flow of the mass M in the polishing tank 1 is controlled by various flow control means as described in detail below. Thus, the polishing is always performed within the set load range of the drive motor 20.

可動手段3の中心には、研磨槽1内にマスMが充満されてその流動が円滑でない場合に、マスMの一部を逃がして流動を円滑にするための開口8が形成されているが、この実施形態では開口8を跨いで支持部材31が固定されている。可動手段3の上方には、この可動手段3を上下動するための昇降機構60が配設されている。昇降機構60は支柱61に水平回動自在に軸着されたアーム62と、該アーム62の先端に取付けられて可動手段3の支持部材31上方に突設された作動棒63を介して可動手段3を上下動する駆動部64と、速度制御手段50に内蔵された負荷電流値検出手段からの信号を受け入れて前記駆動部64を駆動する制御部65とからなるものである。駆動部64は例えば油圧シリンダー式やボールねじ式などの適宜の方式を採用することができる。この実施形態では、可動手段3とその昇降機構60とによって研磨槽1内のマスの流動制御手段を構成している。   An opening 8 is formed in the center of the movable means 3 for allowing the mass M to be filled in the polishing tank 1 so that the flow is not smooth, so that a part of the mass M is released to make the flow smooth. In this embodiment, the support member 31 is fixed across the opening 8. An elevating mechanism 60 for moving the movable means 3 up and down is disposed above the movable means 3. The elevating mechanism 60 is movable means through an arm 62 pivotally mounted on a support 61 and a working rod 63 attached to the tip of the arm 62 and projecting above the support member 31 of the movable means 3. 3 includes a drive unit 64 that moves up and down 3 and a control unit 65 that receives a signal from a load current value detection unit built in the speed control unit 50 and drives the drive unit 64. The drive unit 64 may employ an appropriate method such as a hydraulic cylinder type or a ball screw type. In this embodiment, the movable means 3 and its elevating mechanism 60 constitute mass flow control means in the polishing tank 1.

さて研磨槽1内にワークとメディアとからなるマスMを投入し、駆動モータ20により回転盤2を回転させると、前記したようにマスMは遠心力により研磨槽1の内壁12を上昇する。本発明では上昇したマスMは可動手段3により流動領域を制限されて流動方向を研磨槽1中心方向に変更しつつ、トロイダル状に流動することになる。マスの自然な流動を妨げると流動型バレル研磨の研磨能力が低下するというのが従来の常識であったが、本発明ではこのような常識に反して、研磨槽の内壁を上昇するマスの流動を適切な手段で制御することにより、ワークとメディアとの間の摩擦力を大幅に増大させ、研磨能力を従来よりも飛躍的に向上させる。   When a mass M made of a workpiece and a medium is put into the polishing tank 1 and the rotating disk 2 is rotated by the drive motor 20, the mass M ascends the inner wall 12 of the polishing tank 1 by centrifugal force as described above. In the present invention, the raised mass M flows in a toroidal shape while the flow region is limited by the movable means 3 and the flow direction is changed to the center direction of the polishing tank 1. The conventional common sense is that if the natural flow of the mass is hindered, the polishing ability of the fluidized barrel polishing is lowered, but in the present invention, contrary to such common sense, the flow of the mass rising on the inner wall of the polishing tank By controlling this with an appropriate means, the frictional force between the workpiece and the medium is greatly increased, and the polishing ability is remarkably improved as compared with the prior art.

また前記したように、研磨の進行とともにメディアは角部(凸部)が磨耗するとともにワークも研磨されるので両者間の摩擦力が減少し、研磨能力が徐々に低下する。しかしこの実施形態では、駆動モータ20の負荷が設定手段70により予め設定された範囲を保つように、マスの流動制御手段である昇降機構60が可動手段3を下降させる。   Further, as described above, as the polishing progresses, the corner portion (convex portion) of the media wears and the work is also polished. Therefore, the frictional force between the two decreases, and the polishing ability gradually decreases. However, in this embodiment, the elevating mechanism 60, which is a mass flow control means, lowers the movable means 3 so that the load of the drive motor 20 is maintained in a range preset by the setting means 70.

すなわち、研磨能力が低下するに連れて駆動モータ20の負荷、例えば負荷電流値が低下するので、制御手段50に内蔵された負荷検出手段からの信号を受けて昇降機構60の制御部65が図3に示すように作動棒63を降下させる。このように可動手段3の中央部を下方に撓ませることによって旋回流動するマスMの上部を押さえ込んで流動領域を減少させ、マスMの上昇力を加圧力に変換してマスMに加わる圧力を増大させる。この結果、ワークとメディアとの間の摩擦力が増加し、研磨の進行によって低下した研磨能力を回復させることができる。またこれと同時に駆動モータ20の負荷も回復する。そして、作動棒63の降下により駆動モータ20の負荷が予め設定した上限値に達した時に制御手段50は制御部65に作動棒63の降下停止の信号を発するので、駆動モータ20の負荷を最適な値にまで回復させることができる。   That is, since the load of the drive motor 20, for example, the load current value decreases as the polishing ability decreases, the control unit 65 of the elevating mechanism 60 receives the signal from the load detection means built in the control means 50. The operating rod 63 is lowered as shown in FIG. In this way, by bending the central part of the movable means 3 downward, the upper part of the mass M that is swirling and flowing is pressed down to reduce the flow region, and the pressure applied to the mass M is converted by converting the ascending force of the mass M into the applied pressure. Increase. As a result, the frictional force between the workpiece and the medium increases, and the polishing ability that has been lowered by the progress of polishing can be recovered. At the same time, the load of the drive motor 20 is recovered. When the load of the drive motor 20 reaches a preset upper limit due to the lowering of the operating rod 63, the control means 50 issues a signal to stop the lowering of the operating rod 63 to the control unit 65, so that the load of the drive motor 20 is optimized. It can be recovered to a proper value.

以上のように、この実施形態では駆動モータ20の負荷をパラメーターとして可動手段3の高さを最適に調整することにより、ワークとメディアとの摩擦力を常に一定の範囲内に制御しながら研磨を行うので、研磨が進行したときにも研磨能力を低下させることなくバレル研磨を続行することができる。   As described above, in this embodiment, the height of the movable means 3 is optimally adjusted using the load of the drive motor 20 as a parameter, so that the friction force between the workpiece and the medium is always controlled within a certain range. Thus, barrel polishing can be continued without degrading the polishing ability even when polishing progresses.

なお、研磨の終了後は可動手段3を昇降機構60により研磨槽1の上方に持ち上げたのち、アーム62が支柱61を軸として水平方向に回動される。次いで、研磨槽1を立てるように回動させて回転盤2を垂直乃至それ以上に回転させることによって、研磨の終了したマスMを容易に研磨槽1内から取り出すことができる。   After the polishing is completed, the movable means 3 is lifted above the polishing tank 1 by the lifting mechanism 60, and then the arm 62 is rotated in the horizontal direction around the support column 61. Next, by rotating the polishing tank 1 so as to stand up and rotating the turntable 2 vertically or more, the polished mass M can be easily taken out from the polishing tank 1.

(第2の実施形態:可動手段と昇降機構の変形例)
上記した第1の実施形態では、可撓性の可動手段3の周縁を研磨槽1の上端に固定したが、図4に示すように可動手段3を金属などの剛体として、この可動手段3を駆動モータ20の負荷と連動させて昇降機構60により研磨槽1内で上下にスライドできるように設けてもよい。この場合には可動手段3の外径は研磨槽1の内径よりもやや小さくしておく。なお図4の左半部には、可動手段3のない従来の場合のマスMの自由流動経路を破線で示した。この第2の実施形態においても、旋回流動するマスMの上部を可動手段3で抑制することにより、低下した研磨力を向上できることは第1の実施形態と同様である。
(Second embodiment: modification of movable means and elevating mechanism)
In the first embodiment described above, the periphery of the flexible movable means 3 is fixed to the upper end of the polishing tank 1, but the movable means 3 is a rigid body such as metal as shown in FIG. You may provide so that it can slide up and down in the polishing tank 1 by the raising / lowering mechanism 60 in conjunction with the load of the drive motor 20. In this case, the outer diameter of the movable means 3 is made slightly smaller than the inner diameter of the polishing tank 1. In the left half of FIG. 4, the free flow path of the mass M in the conventional case without the movable means 3 is indicated by a broken line. In the second embodiment as well, the reduced polishing force can be improved by suppressing the upper part of the mass M that swirls and flow with the movable means 3, as in the first embodiment.

(第3の実施形態:可動手段とその加圧機構)
図5は本発明の第3の実施形態を示すもので、中央に開口筒32を備えた可動手段3を研磨槽1内にスライド可能に設けるとともに、研磨槽1の上蓋15にもこの開口筒32をスライド可能に嵌合できる外筒16を設けたものである。そして上蓋15と可動手段3との間に環状の加圧室17を形成し、上蓋15に設けた圧力流体供給口18から圧縮空気などの圧力流体を供給して可動手段3を下向きに加圧する。
(Third embodiment: movable means and its pressurizing mechanism)
FIG. 5 shows a third embodiment of the present invention. A movable means 3 having an opening cylinder 32 in the center is slidably provided in the polishing tank 1, and the opening cylinder is also provided on the upper lid 15 of the polishing tank 1. 32 is provided with an outer cylinder 16 that can be slidably fitted. An annular pressurizing chamber 17 is formed between the upper lid 15 and the movable means 3, and pressurized fluid such as compressed air is supplied from a pressurized fluid supply port 18 provided in the upper lid 15 to pressurize the movable means 3 downward. .

この実施形態においては、駆動モータ20の負荷が減少してきたときには圧力流体供給口18から供給される圧力流体の圧力を高め、ピストンのように可動手段3を下方に押し付けることによってマスMの流動領域を制御する。このようにしてワークとメディアの摩擦力を増加させ、常に駆動モータ20の負荷の設定範囲内でバレル研磨を行わせることができる。   In this embodiment, when the load of the drive motor 20 decreases, the pressure of the pressure fluid supplied from the pressure fluid supply port 18 is increased, and the movable means 3 is pressed downward like a piston to flow the mass M. To control. In this way, the friction force between the workpiece and the medium can be increased, and barrel polishing can always be performed within the set range of the load of the drive motor 20.

なお、図6のように研磨槽1の上部にゴムのような弾性材料からなる膨張収縮可能な可動手段3を設け、上蓋15に設けた圧力流体供給口18を通じて図示しない加減圧機構から、圧縮空気などの圧力流体をその上部の加圧室17に供給することによって、可動手段3を風船のように膨張収縮させることもできる。このような構造によってマスMの流動領域を制御し、常に駆動モータ20の負荷の設定範囲内でバレル研磨を行わせることもできる。   As shown in FIG. 6, the movable means 3 that can be expanded and contracted made of an elastic material such as rubber is provided on the upper portion of the polishing tank 1, and the compression / decompression mechanism (not shown) is compressed through a pressure fluid supply port 18 provided in the upper lid 15. By supplying a pressure fluid such as air to the pressurizing chamber 17 on the upper side, the movable means 3 can be expanded and contracted like a balloon. With such a structure, the flow region of the mass M can be controlled, and barrel polishing can always be performed within the set range of the load of the drive motor 20.

第4の実施形態:間欠制御)
さらに制御手段50をマスMが可動手段3により流動方向が変更されてワークが拘束状態で研磨される拘束研磨時間と、マスMが可動手段3により流動方向が変更されることなく自由流動しつつ研磨される非拘束研磨時間とを設定可能なものとして、マスMの流動を間欠的に制御することによっても、バレル研磨を効率的に行うことができる(後記する実施例3の図9、図10を参照)。
( Fourth embodiment: intermittent control)
Further, the control means 50 allows the mass M to move in a restrained state when the flow direction is changed by the movable means 3 and the workpiece is polished in a restricted state, and the mass M is free flowing without the flow direction being changed by the movable means 3. The barrel polishing can also be efficiently performed by intermittently controlling the flow of the mass M, assuming that the unconstrained polishing time to be polished can be set ( FIGS. 9 and 9 of Example 3 described later) . 10 ).

すなわちこの実施形態の方法は、ワークを拘束研磨する時間が所定時間に達したとき、又は負荷が設定した下限値を下回ったとき、可動手段3をマスMが接触しない高さにまで上昇させるか、又は可動手段3の高さはそのままでマスMが可動手段3に接触しない状態にまで回転盤2の回転数を減少させることによりワークを非拘束状態とする方法である。拘束研磨中にはメディアとワークの混合状態が片寄ることにより研磨効率の低下をもたらす場合がある。しかし、間欠的にその拘束を解除してマスMをフリーな状態として旋回流動させることにより、ワークとメディアが再び均一に混合されるので、さらに研磨効率の向上を図ることができる。   That is, in the method of this embodiment, when the time for constrained polishing of a workpiece reaches a predetermined time or when the load falls below a set lower limit value, the movable means 3 is raised to a height at which the mass M does not contact. Alternatively, the work is brought into an unconstrained state by reducing the number of rotations of the rotating disk 2 until the mass M remains in contact with the movable means 3 while the height of the movable means 3 remains unchanged. During constrained polishing, the mixing state of the media and the workpiece may be shifted, resulting in a decrease in polishing efficiency. However, by intermittently releasing the restraint and swirling and flowing the mass M in a free state, the work and the medium are mixed uniformly again, so that the polishing efficiency can be further improved.

(実施例1:可動手段の昇降)
図4に示した内径440mmの研磨槽1を備えたバレル研磨装置を用いて、研磨槽1内に三角柱状メディアと1)のワークとしてのテストピース(SS400,直径15mm,長さ20mmの円柱)との混合物であるマスMを、研磨槽1の内容積に対して95%投入して、このマスMを可動手段3により流動方向を変更しながら拘束してバレル研磨を行った。研磨に当って回転盤2の回転数は350min−1、駆動モータ20の負荷電流値の上限を5.2A、下限値を5.0Aとして、負荷電流値がこの設定範囲内に保たれるように可動手段3の高さを制御した。研磨時間の経過による負荷電流値の変化を、可動手段3を一定に保った比較例とともに図7に示す。すなわち、実施例1においては、研磨の抵抗が減少して電流値が5.0Aに低下した時に可動手段3を降下させたので電流値が繰り返し5.2Aに高められているが、比較例1においては可動手段3を初期の位置に一定に留めて研磨を続行したので、電流値が漸減している。
(Example 1: Elevating and lowering movable means)
Using a barrel polishing apparatus equipped with a polishing tank 1 having an inner diameter of 440 mm shown in FIG. 4, a test piece (SS400, a cylinder having a diameter of 15 mm and a length of 20 mm) as a work of a triangular prism medium and 1) in the polishing tank 1 The mass M, which is a mixture of the above, was thrown into 95% of the internal volume of the polishing tank 1, and the mass M was restrained by the movable means 3 while changing the flow direction to perform barrel polishing. In polishing, the rotation speed of the turntable 2 is 350 min −1 , the upper limit of the load current value of the drive motor 20 is set to 5.2 A, and the lower limit value is set to 5.0 A so that the load current value is kept within this setting range. The height of the movable means 3 was controlled. FIG. 7 shows a change in the load current value with the lapse of the polishing time together with a comparative example in which the movable means 3 is kept constant. In other words, in Example 1, the current value was repeatedly increased to 5.2 A because the movable means 3 was lowered when the polishing resistance decreased and the current value decreased to 5.0 A. However, Comparative Example 1 Since the polishing was continued with the movable means 3 kept constant at the initial position, the current value gradually decreased.

このときのワーク1個当りの研磨量は、図8に1)として示すように115mg/hrであった。これに対して可動手段3を一定に保ったままの比較例では、ワーク1個当りの研磨量は13mg/hrであり、研磨量の差は8.8倍に達した。また、図8中には他のワークを用いた場合も併記した。白で示したのが可動手段3を一定に保ったまま研磨を行った場合のデータ、ハッチングで示したのが実施例1の方法で研磨を行った場合のデータである。他のワークの材質と寸法は次の通りである。
2):ステンレス,直径3mm、長さ21mmの円柱
3):鋼鉄,外径14mm,内径13mm、厚さ12mmのリング
4):バネ鋼,縦54mm,横27mm,厚さ4・5mmの板
本発明の方法と従来法とのワーク1個当りの研磨量の比は、2)では9.9倍、3)では14.3倍、4)では18.6倍であり、どのワークの場合においても本発明の方法により研磨能力が大きく増加することが確認された。
The polishing amount per workpiece at this time was 115 mg / hr as shown as 1) in FIG . On the other hand, in the comparative example with the movable means 3 kept constant, the polishing amount per work was 13 mg / hr, and the difference in the polishing amount reached 8.8 times. Further, FIG. 8 also shows the case where another work is used. The white data shows data when polishing is performed while the movable means 3 is kept constant, and the hatched data shows data when polishing is performed by the method of the first embodiment. The materials and dimensions of other workpieces are as follows.
2): Stainless steel, 3mm diameter, 21mm long cylinder
3) Ring with steel, outer diameter 14mm, inner diameter 13mm, thickness 12mm
4): Spring steel, 54 mm long, 27 mm wide, 4.5 mm thick plate The ratio of the polishing amount per workpiece between the method of the present invention and the conventional method is 9.9 times in 2), and in 3) 14.3 times and 18.6 times in 4), and it was confirmed that the polishing ability was greatly increased by the method of the present invention in any work.

実施例2:間欠制御)
本実施例では実施例1と同様の研磨条件において、負荷電流値の上限値を5.2A、下限値を5.0Aと設定し、図9に示すように10分を研磨の1サイクルとして、9分45秒間マスMを拘束状態で研磨した後、15秒間非拘束状態で研磨することを繰り返してバレル研磨を行った。その結果、図10に示すようにこの実施例2においては前記した実施例1よりもさらに研磨の能率を向上させることができた。またこのように間欠制御を行うことにより、ワークとメディアが非拘束研磨中に再び均一に混合されるので、ワークの表面に打痕の形成や偏磨耗を起こすことなく、均一に研磨することができた。
( Example 2 : intermittent control)
In this example, under the same polishing conditions as in Example 1, the upper limit value of the load current value was set to 5.2 A, the lower limit value was set to 5.0 A, and 10 minutes was set as one polishing cycle as shown in FIG. After polishing the mass M for 9 minutes and 45 seconds in a constrained state, barrel polishing was performed by repeatedly polishing in the unrestrained state for 15 seconds. As a result, it was possible to improve the efficiency of further polishing than in Example 1 described above in this second embodiment, as shown in FIG. 10. Also, by performing intermittent control in this way, the workpiece and media are mixed uniformly again during unconstrained polishing, so that polishing can be performed uniformly without forming dents or uneven wear on the surface of the workpiece. did it.

従来の流動型バレル研磨におけるマスの流動を示す斜視図である。It is a perspective view which shows the mass flow in the conventional fluid type barrel polishing. 本発明の第1の実施形態を示す部分断面図である。It is a fragmentary sectional view showing the 1st embodiment of the present invention. 第1の実施形態において可動手段を降下させた状態を示す部分断面図である。It is a fragmentary sectional view which shows the state which lowered | hung the movable means in 1st Embodiment. 本発明の第2の実施形態を示す部分断面図である。It is a fragmentary sectional view showing the 2nd embodiment of the present invention. 本発明の第3の実施形態を示す部分断面図である。It is a fragmentary sectional view showing the 3rd embodiment of the present invention. 本発明の第3の実施形態の変形例を示す部分断面図である。It is a fragmentary sectional view showing the modification of the 3rd embodiment of the present invention. 実施例1における負荷電流値の変化を示すグラフである。6 is a graph showing a change in load current value in Example 1. 実施例1におけるワークの研磨効果を示すグラフである。3 is a graph showing a workpiece polishing effect in Example 1. FIG. 実施例2における負荷電流値の制御状態を示すグラフである。6 is a graph showing a control state of a load current value in Example 2. 実施例2におけるワークの研磨効果を示すグラフである。10 is a graph showing the workpiece polishing effect in Example 2.

符号の説明Explanation of symbols

M マス
1 研磨槽
2 回転盤
3 可動手段
4 摺接部隙間
5 減速機
6 小孔
8 開口
10 底板
11 集塵管
12 内壁
14 空隙
15 上蓋
16 外筒
17 加圧室
18 圧力気体供給口
19 目盛
20 駆動モータ
21 レベルセンサー
31 支持部材
32 開口筒
50 制御手段
60 昇降機構
61 支柱
62 アーム
63 作動棒
64 駆動部
65 制御部
70 負荷設定手段
M Mass 1 Polishing tank 2 Turntable 3 Movable means 4 Sliding contact gap 5 Reduction gear 6 Small hole 8 Opening 10 Bottom plate 11 Dust collection pipe 12 Inner wall 14 Gap 15 Top lid 16 Outer cylinder 17 Pressurization chamber 18 Pressure gas supply port 19 Scale Reference Signs List 20 drive motor 21 level sensor 31 support member 32 open cylinder 50 control means 60 lifting mechanism 61 support 62 arm 63 actuating rod 64 drive part 65 control part 70 load setting means

Claims (4)

研磨槽の底部に設けた回転盤によりマスを旋回流動させながら研磨を行うバレル研磨方法において、回転盤の駆動モータの負荷を予め設定しておき、研磨槽内のマスの流動を、研磨槽の内壁に沿って上昇するマスの上端を押さえる力を加減することにより制御し、該駆動モータの負荷を設定範囲内に維持しつつ研磨することを特徴とするバレル研磨方法。 In the barrel polishing method in which polishing is performed while the mass is swirled and flowed by a rotating disk provided at the bottom of the polishing tank, the load of the driving motor of the rotating disk is set in advance, and the flow of the mass in the polishing tank is determined by A barrel polishing method characterized in that polishing is performed while controlling a force for pressing an upper end of a mass rising along an inner wall and maintaining a load of the drive motor within a set range. 駆動モータの負荷として、負荷電流値を用いることを特徴とする請求項1に記載のバレル研磨方法。   The barrel polishing method according to claim 1, wherein a load current value is used as a load of the drive motor. 研磨槽内のマスの流動制御を、間欠的に行うことを特徴とする請求項1に記載のバレル研磨方法。 The barrel polishing method according to claim 1, wherein the flow control of the mass in the polishing tank is intermittently performed. ワークとメディアが投入される研磨槽と、研磨槽の底部に設けられマスを旋回流動させる回転盤と、回転盤の駆動モータの負荷を設定する手段と、研磨槽の上部で昇降し、研磨槽の内壁に沿って上昇するマスの上端を押さえる力を加減することにより、該駆動モータの負荷が設定範囲内に維持されるように制御する可動手段とからなることを特徴とするバレル研磨装置。A polishing tank into which workpieces and media are put in, a rotating disk provided at the bottom of the polishing tank to rotate and flow the mass, a means for setting a load of a driving motor for the rotating disk, and a polishing tank that moves up and down at the upper part of the polishing tank A barrel polishing apparatus comprising: movable means for controlling the load of the drive motor so as to be maintained within a set range by adjusting a force that presses the upper end of the mass rising along the inner wall.
JP2003329578A 2002-11-29 2003-09-22 Barrel polishing method and barrel polishing apparatus Expired - Fee Related JP4079370B2 (en)

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JP2003329578A JP4079370B2 (en) 2002-11-29 2003-09-22 Barrel polishing method and barrel polishing apparatus

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