JP4249608B2 - 深紫外波長での複屈折測定 - Google Patents
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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Description
本出願は、光学素子の複屈折特性の正確な測定に関する。前記光学素子として、深紫外(DUV)波長を用いる装置の構成部分である光学素子が含まれる。
多くの重要な光学材料は複屈折を示す。複屈折は、異なる直線偏光は前記光学材料を通って異なる速度で進むことを意味する。非常に多くの場合、これらの異なる直線偏光は偏光の2つの成分であって互いに直交する2つの成分であるとみなされる。
本発明は、光学素子、特にDUVの応用において用いられる光学素子の複屈折特性を正確に測定するための装置および方法を提供することを目的とする。
複屈折を測定するための一つの装置は、国際特許出願公開第WO99/42796号および米国特許出願第09/308,747号で説明されており、これにより、これらの出願は本願に参考文献として組み入れられる。この装置は、試料を通って指向される偏光を変調するために光弾性変調器(PEM)を用いる。試料から伝播するビームは2つの部分に分離される。これらの分離ビーム部分は、異なる偏光方向で分析され、検知され、別個の経路として処理される。各経路に関係づけられた検知機構は、前記ビームの2つの部分のそれぞれに対応する光強度を検知する。この情報は、試料によって誘発されたリターダンスと試料の速い軸線に対する複屈折の角度方向とについての正確かつ明瞭な測定値を計算するためのアルゴリズムに用いられる。深紫外波長(DUV)でのリターダンス測定のために必要な光源の性質のような考慮すべき事項により、DUV環境における複屈折測定についてやや異なった手法の必要性が生じる。
Claims (17)
- 試料の複屈折特性を決定する方法であって、
第1の波長を有する偏光変調された光の第1のビームおよび第2の波長を有する偏光変調された光の第2のビームであって前記第1の波長と前記第2の波長とが異なる第1のビーム及び第2のビームを前記試料に通して別々に指向させるステップと、
前記第1および第2のビームが前記試料を通過した後に前記第1および第2のビームの偏光を変調するステップと、
前記第1および第2のビームを分析するステップと、
前記第1および第2のビームの強度を検知するステップと、
前記検知された強度に基づいて前記試料の実際の複屈折特性を計算するステップとを含み、
前記計算するステップは、前記第1の波長および前記第2の波長の各々に対して2以上の測定された複屈折特性を特定するステップと、前記測定された複屈折特性から前記実際の複屈折特性を決定するステップとを含む、試料の複屈折特性を決定する方法。 - 前記決定するステップは、前記第1の波長と第2の波長との相違と比較された前記測定された複屈折特性間の相違に基づいて前記実際の複屈折特性を前記特定された前記測定された複屈折特性から選択することを含む、請求項1に記載の方法。
- 前記決定するステップは、前記測定された1つの複屈折特性が前記測定された他の複屈折特性に等しいとき、前記実際の複屈折特性が前記測定された複屈折特性の一つであるように前記実際の複屈折特性を選択することを含む、請求項1に記載の方法。
- 前記実際の複屈折特性をこれが大きさを含むように決定するステップを含む、請求項1に記載の方法。
- 前記実際の複屈折特性をこれが角度方向を含むように決定するステップを含む、請求項1に記載の方法。
- 前記実際の複屈折特性をこれが大きさおよび角度方向の両方を含むように決定するステップを含む、請求項1に記載の方法。
- 前記第1および第2の波長をこれらが約157ナノメートルであるように準備するステップを含む、請求項1に記載の方法。
- 前記決定するステップは、前記特定された複屈折特性の一つの大きさが前記第1の波長の4分の1の増分にどの程度近いかに基づいて前記実際の複屈折特性を前記特定された複屈折特性から選択することを含む、請求項2に記載の方法。
- 前記第2の波長をこれが前記第1の波長の約20%であるように選択するステップを含む、請求項8に記載の方法。
- 前記第1および第2のビームが前記試料の複数の位置を通って指向されるように前記試料を周期的に運動させるステップと、
前記試料の各位置での実際のリターダンス特性を計算するステップとを含む、請求項1に記載の方法。 - 実質的にすべての前記位置のリターダンスの大きさおよび角度方向を同時に図絵的に表示するステップを含む、請求項10に記載の方法。
- 試料の複屈折特性を測定するための装置であって、
互いに異なる波長を有する光の1以上のビームの源と、
前記光のビームの偏光を変調するための手段と、
前記ビームを前記試料に通して別々に指向させるための手段と、
前記ビームが前記試料を通過した後に前記ビームを分析するための手段と、
前記ビームの強度を検知し、これにより、前記検知された強度に基づいて前記試料の実際の複屈折特性を計算するのに適した情報を準備するための検知手段とを含み、
前記情報は、前記互いに異なる波長に対する2以上の測定された複屈折特性を含む、試料の複屈折特性を決定するための装置。 - 前記別々に指向させるための手段は重水素ランプと単色光器とを含む、請求項12に記載の装置。
- 前記試料は約270ミリメートルまでの厚さを有するフッ化カルシウムを含む、請求項12に記載の装置。
- 前記源の光の波長は約157ナノメートルである、請求項12に記載の装置。
- 前記ビームの偏光を変調するための手段は一対の光弾性変調器を含む、請求項12に記載の装置。
- 前記源は調整可能なレーザを含む、請求項12に記載の装置。
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29931601P | 2001-06-18 | 2001-06-18 | |
| US33621901P | 2001-10-31 | 2001-10-31 | |
| US34076001P | 2001-12-11 | 2001-12-11 | |
| PCT/US2002/019343 WO2002103310A1 (en) | 2001-06-18 | 2002-06-17 | Birefringence measurement at deep-ultraviolet wavelengths |
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| Publication Number | Publication Date |
|---|---|
| JP2004530892A JP2004530892A (ja) | 2004-10-07 |
| JP4249608B2 true JP4249608B2 (ja) | 2009-04-02 |
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| JP2003505578A Expired - Fee Related JP4249608B2 (ja) | 2001-06-18 | 2002-06-17 | 深紫外波長での複屈折測定 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6985227B2 (ja) |
| EP (1) | EP1397651B1 (ja) |
| JP (1) | JP4249608B2 (ja) |
| DE (1) | DE60220521T2 (ja) |
| WO (1) | WO2002103310A1 (ja) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2320431A3 (en) * | 2000-12-08 | 2012-09-05 | Loma Linda University Medical Center | Proton beam therapy control system |
| US6822244B2 (en) * | 2003-01-02 | 2004-11-23 | Loma Linda University Medical Center | Configuration management and retrieval system for proton beam therapy system |
| GB0302378D0 (en) * | 2003-02-01 | 2003-03-05 | Council Cent Lab Res Councils | Detection system |
| JP3971363B2 (ja) * | 2003-10-07 | 2007-09-05 | 株式会社東芝 | 露光装置及び露光装置の光学系のミュラー行列を測定する方法 |
| JP3746287B2 (ja) * | 2004-01-15 | 2006-02-15 | 学校法人東京電機大学 | 応力測定方法とその装置 |
| US7274440B1 (en) * | 2004-09-08 | 2007-09-25 | Kla-Tencor Technologies Corp. | Systems and methods for measuring stress in a specimen |
| CN101076714B (zh) | 2004-10-25 | 2012-01-11 | 海因兹仪器公司 | 聚合物薄膜等的双折射测量 |
| US7298492B2 (en) * | 2004-12-29 | 2007-11-20 | Honeywell International Inc. | Method and system for on-line measurement of thickness and birefringence of thin plastic films |
| WO2006103953A1 (ja) * | 2005-03-28 | 2006-10-05 | National University Corporation Tokyo University Of Agriculture And Technology | 光学特性計測装置及び光学特性計測方法 |
| JP2009047685A (ja) * | 2007-07-25 | 2009-03-05 | Keio Gijuku | 光弾性測定方法およびその装置 |
| KR20110059701A (ko) * | 2008-07-08 | 2011-06-03 | 하인즈 인스트루먼츠 인코포레이티드 | 높은 처리능력의 브리프링겐스 측정 |
| US8773662B2 (en) * | 2010-07-22 | 2014-07-08 | Vuv Analytics, Inc. | Methods and apparatus for vacuum ultraviolet (VUV) or shorter wavelength circular dichroism spectroscopy |
| US9097647B2 (en) * | 2012-08-08 | 2015-08-04 | Ut-Battelle, Llc | Method for using polarization gating to measure a scattering sample |
| US9228936B2 (en) | 2013-12-03 | 2016-01-05 | Hinds Instruments, Inc. | Birefringence measurement of polycrystalline silicon samples or the like |
| JP2016053478A (ja) * | 2014-09-02 | 2016-04-14 | 株式会社東芝 | 相分離観測方法、相分離観測装置、及びアニール装置 |
| US9841372B2 (en) * | 2014-09-25 | 2017-12-12 | Hinds Instruments, Inc. | Unambiguous retardance measurement |
| CN105136681B (zh) * | 2015-08-31 | 2017-07-25 | 中北大学 | 一种弹光调制和电光调制级联测微小线性双折射的装置 |
| TW202138788A (zh) * | 2019-11-26 | 2021-10-16 | 美商康寧公司 | 具有波長不同的多個光源的棱鏡耦合系統及方法 |
| WO2022212627A1 (en) | 2021-04-01 | 2022-10-06 | Corning Incorporated | Light source intensity control systems and methods for improved light scattering polarimetry measurements |
| CN115683563A (zh) * | 2022-09-27 | 2023-02-03 | 中北大学 | 一种双pem偏振态分析精确修正装置及方法 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3902805A (en) | 1973-09-17 | 1975-09-02 | Vishay Intertechnology Inc | Automatic birefringence measuring apparatus |
| US4400062A (en) | 1979-09-11 | 1983-08-23 | Sony Corporation | Wave plate retarder |
| US4480916A (en) | 1982-07-06 | 1984-11-06 | The United States Of America As Represented By The Secretary Of The Navy | Phase-modulated polarizing interferometer |
| US4668086A (en) | 1985-05-20 | 1987-05-26 | Salomon Redner | Stress and strain measuring apparatus and method |
| US4681450A (en) | 1985-06-21 | 1987-07-21 | Research Corporation | Photodetector arrangement for measuring the state of polarization of light |
| JPS6382345A (ja) | 1986-09-26 | 1988-04-13 | Orc Mfg Co Ltd | 複屈折測定表示方法 |
| US4801798A (en) | 1987-12-14 | 1989-01-31 | Eastman Kodak Company | Method and apparatus for measuring optical retardation in transparent materials |
| US4904931A (en) | 1988-09-28 | 1990-02-27 | Westinghouse Electric Corp. | Electro-optical voltage measuring system incorporating a method and apparatus to derive the measured voltage waveform from two phase shifted electrical signals |
| US4973163A (en) | 1988-10-08 | 1990-11-27 | Kanzaki Paper Manufacturing Co., Ltd. | Method for measuring birefringence |
| US5072111A (en) | 1990-09-04 | 1991-12-10 | The United States Of America As Represented By The Secretary Of The Army | Optical time domain reflectometer calibration system |
| JPH0518858A (ja) | 1991-07-12 | 1993-01-26 | Casio Comput Co Ltd | 薄膜の光学特性測定方法 |
| US5268741A (en) | 1992-01-31 | 1993-12-07 | Hewlett-Packard Company | Method and apparatus for calibrating a polarization independent optical coherence domain reflectometer |
| JP2792315B2 (ja) * | 1992-03-10 | 1998-09-03 | 松下電器産業株式会社 | 複屈折測定装置 |
| US5532823A (en) | 1993-03-08 | 1996-07-02 | Matsushita Electric Industrial Co., Ltd. | Method of measuring optical characteristics of liquid crystal cells, measurement equipment therefor and method for manufacturing liquid crystal devices |
| FR2714970B1 (fr) | 1994-01-12 | 1996-03-29 | Centre Nat Rech Scient | Ellipsomètre spectroscopique modulé. |
| US5457536A (en) | 1994-04-04 | 1995-10-10 | California Institute Of Technology | Polarization modulation laser scanning microscopy |
| US5521705A (en) * | 1994-05-12 | 1996-05-28 | Oldenbourg; Rudolf | Polarized light microscopy |
| US5652673A (en) | 1994-06-24 | 1997-07-29 | Hinds Instruments, Inc. | Elimination of modulated interference effects in photoelastic modulators |
| GB9518100D0 (en) | 1995-09-05 | 1995-11-08 | Infrared Eng | Calibration standard for infrared absorption gauge |
| US5744721A (en) | 1995-10-25 | 1998-04-28 | Hinds Instruments, Inc. | Electronic control system for an optical assembly |
| US5825492A (en) | 1996-04-26 | 1998-10-20 | Jaton Systems Incorporated | Method and apparatus for measuring retardation and birefringence |
| SE506286C2 (sv) | 1996-05-09 | 1997-12-01 | Ifunga Test Equipment Bv | Anordning för mätning av dubbelbrytning i en optisk databärare |
| US5956146A (en) | 1997-01-29 | 1999-09-21 | Victor Company Of Japan, Ltd. | Birefringence measuring apparatus for optical disc substrate |
| US6055053A (en) | 1997-06-02 | 2000-04-25 | Stress Photonics, Inc. | Full field photoelastic stress analysis |
| US5956147A (en) * | 1997-06-13 | 1999-09-21 | Lockheed Martin Energy Research Corporation | Two modulator generalized ellipsometer for complete mueller matrix measurement |
| US6473181B1 (en) | 1997-07-28 | 2002-10-29 | Hinds Instruments, Inc. | Measurement of waveplate retardation using a photoelastic modulator |
| JP4629869B2 (ja) | 1998-02-20 | 2011-02-09 | ハインズ インスツルメンツ インコーポレイテッド | 複屈折特性測定方法および装置 |
| US5864403A (en) | 1998-02-23 | 1999-01-26 | National Research Council Of Canada | Method and apparatus for measurement of absolute biaxial birefringence in monolayer and multilayer films, sheets and shapes |
| US6697157B2 (en) | 1999-05-24 | 2004-02-24 | Hinds Instruments | Birefringence measurement |
| US6268914B1 (en) | 2000-01-14 | 2001-07-31 | Hinds Instruments, Inc. | Calibration Process For Birefringence Measurement System |
| JP2001272273A (ja) | 2000-03-24 | 2001-10-05 | Komatsu Ltd | 真空紫外光の測定方法、真空紫外光の測定装置、デバイス製造方法及び光露光装置 |
| JP2002372777A (ja) | 2001-06-18 | 2002-12-26 | Canon Inc | ガス置換方法および露光装置 |
-
2002
- 2002-06-17 JP JP2003505578A patent/JP4249608B2/ja not_active Expired - Fee Related
- 2002-06-17 WO PCT/US2002/019343 patent/WO2002103310A1/en not_active Ceased
- 2002-06-17 EP EP02744424A patent/EP1397651B1/en not_active Expired - Lifetime
- 2002-06-17 DE DE60220521T patent/DE60220521T2/de not_active Expired - Lifetime
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2003
- 2003-12-08 US US10/730,583 patent/US6985227B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002103310A1 (en) | 2002-12-27 |
| DE60220521T2 (de) | 2007-09-27 |
| EP1397651B1 (en) | 2007-06-06 |
| EP1397651A4 (en) | 2005-06-22 |
| EP1397651A1 (en) | 2004-03-17 |
| US20040114142A1 (en) | 2004-06-17 |
| DE60220521D1 (de) | 2007-07-19 |
| JP2004530892A (ja) | 2004-10-07 |
| US6985227B2 (en) | 2006-01-10 |
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