JP4256902B2 - 荷電粒子用モノクロメータ - Google Patents
荷電粒子用モノクロメータ Download PDFInfo
- Publication number
- JP4256902B2 JP4256902B2 JP2007330812A JP2007330812A JP4256902B2 JP 4256902 B2 JP4256902 B2 JP 4256902B2 JP 2007330812 A JP2007330812 A JP 2007330812A JP 2007330812 A JP2007330812 A JP 2007330812A JP 4256902 B2 JP4256902 B2 JP 4256902B2
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- JP
- Japan
- Prior art keywords
- monochromator
- wien
- magnetic
- wien filter
- filters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 title claims description 11
- 230000005291 magnetic effect Effects 0.000 claims description 41
- 230000003287 optical effect Effects 0.000 claims description 26
- 239000000696 magnetic material Substances 0.000 claims description 4
- 239000006185 dispersion Substances 0.000 description 14
- 230000004075 alteration Effects 0.000 description 10
- 238000003384 imaging method Methods 0.000 description 10
- 201000009310 astigmatism Diseases 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000005686 electrostatic field Effects 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000000615 nonconductor Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005421 electrostatic potential Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000619 electron energy-loss spectrum Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 229910000595 mu-metal Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
- H01J49/284—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer
- H01J49/286—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter
- H01J49/288—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter using crossed electric and magnetic fields perpendicular to the beam, e.g. Wien filter
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
Description
Journal of Physicsの論文E: Scienfique Instruments Volume 3 (1970)、第121頁以下 Tanaka, Institute of Physics Conferences寄稿論文 シリーズ番号165,シンポジウム6,第217〜218頁 Tanaka, Institute of Physics Conferences寄稿論文 シリーズ番号165,シンポジウム6,第211および212頁
Claims (4)
- 少なくとも1つのウィーンフィルタを有する荷電粒子用モノクロメータにおいて、
該ウィーンフィルタは、光軸周りの90°の回動に対して相互に対称な位置に構成される4つの磁極片セグメントを含み、該磁極片セグメントには、それぞれ磁気コイルおよび電気的コンタクト部が設けられ、電流を流す前記磁気コイルを選択しまた電圧を加える前記電気的コンタクト部を選択することにより、前記ウィーンフィルタの磁気双極子を規定する磁極片と、電気双極子を規定する電極とを前記光軸の周りに90°ステップで回転可能であるように構成したことを特徴とするモノクロメータ。 - 前記磁極片と前記電極とが、軟磁性材料からなる請求項1に記載のモノクロメータ。
- 電気的な絶縁部が、各々の前記磁極片セグメントの間に設けられている請求項1または2に記載のモノクロメータ。
- 前記磁極片および前記電極は、それぞれ相互に対向する同心の部分球面または同軸の部分円筒面として構成される面を有する請求項1〜3のいずれか1項に記載のモノクロメータ。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10061798A DE10061798A1 (de) | 2000-12-12 | 2000-12-12 | Monochromator für geladene Teilchen |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001378406A Division JP4089774B2 (ja) | 2000-12-12 | 2001-12-12 | 荷電粒子用モノクロメータ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008098184A JP2008098184A (ja) | 2008-04-24 |
| JP4256902B2 true JP4256902B2 (ja) | 2009-04-22 |
Family
ID=7666780
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001378406A Expired - Fee Related JP4089774B2 (ja) | 2000-12-12 | 2001-12-12 | 荷電粒子用モノクロメータ |
| JP2007330812A Expired - Fee Related JP4256902B2 (ja) | 2000-12-12 | 2007-12-21 | 荷電粒子用モノクロメータ |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001378406A Expired - Fee Related JP4089774B2 (ja) | 2000-12-12 | 2001-12-12 | 荷電粒子用モノクロメータ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6580073B2 (ja) |
| EP (1) | EP1220292B1 (ja) |
| JP (2) | JP4089774B2 (ja) |
| CZ (1) | CZ302133B6 (ja) |
| DE (2) | DE10061798A1 (ja) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0662819U (ja) * | 1993-02-16 | 1994-09-06 | 三栄源エフ・エフ・アイ株式会社 | カードホルダー |
| JP4074185B2 (ja) * | 2002-12-17 | 2008-04-09 | 日本電子株式会社 | エネルギーフィルタ及び電子顕微鏡 |
| CN101006541B (zh) * | 2003-06-02 | 2010-07-07 | 福克斯·彻斯癌症中心 | 高能多能离子选择系统、离子束治疗系统及离子束治疗中心 |
| EP1517353B1 (en) * | 2003-09-11 | 2008-06-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam energy width reduction system for charged particle beam system |
| EP1517354B1 (en) * | 2003-09-11 | 2008-05-21 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Double stage charged particle beam energy width reduction system for charged particle beam system |
| GB2406704B (en) * | 2003-09-30 | 2007-02-07 | Ims Nanofabrication Gmbh | Particle-optic electrostatic lens |
| DE602004016131D1 (de) * | 2004-06-21 | 2008-10-09 | Integrated Circuit Testing | Dispositif de correction d'aberration et methode de mise en oeuvre |
| DE102004048496B4 (de) | 2004-10-05 | 2008-04-30 | Bruker Daltonik Gmbh | Ionenführung mit HF-Blendenstapeln |
| US7164139B1 (en) * | 2005-02-01 | 2007-01-16 | Kla-Tencor Technologies Corporation | Wien filter with reduced chromatic aberration |
| TWI415162B (zh) * | 2005-03-03 | 2013-11-11 | Toshiba Kk | 映像投影型電子線裝置及使用該裝置之缺陷檢查系統 |
| EP1739714B1 (en) * | 2005-03-08 | 2012-04-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Imaging apparatus for high probe currents |
| US20090014649A1 (en) * | 2005-03-22 | 2009-01-15 | Ebara Corporation | Electron beam apparatus |
| US8067732B2 (en) * | 2005-07-26 | 2011-11-29 | Ebara Corporation | Electron beam apparatus |
| JP2007242490A (ja) * | 2006-03-10 | 2007-09-20 | Ebara Corp | 荷電粒子線光学系用の収差補正光学装置及び光学系 |
| JP4795847B2 (ja) * | 2006-05-17 | 2011-10-19 | 株式会社日立ハイテクノロジーズ | 電子レンズ及びそれを用いた荷電粒子線装置 |
| JP2007335125A (ja) * | 2006-06-13 | 2007-12-27 | Ebara Corp | 電子線装置 |
| JP4920385B2 (ja) * | 2006-11-29 | 2012-04-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置、走査型電子顕微鏡、及び試料観察方法 |
| DE102007024353B4 (de) * | 2007-05-24 | 2009-04-16 | Ceos Corrected Electron Optical Systems Gmbh | Monochromator und Strahlquelle mit Monochromator |
| EP2385542B1 (en) * | 2010-05-07 | 2013-01-02 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam device with dispersion compensation, and method of operating same |
| US8294093B1 (en) | 2011-04-15 | 2012-10-23 | Fei Company | Wide aperature wien ExB mass filter |
| US8283629B1 (en) * | 2011-04-15 | 2012-10-09 | Fei Company | Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam |
| US8274046B1 (en) | 2011-05-19 | 2012-09-25 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
| US8592761B2 (en) | 2011-05-19 | 2013-11-26 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
| US8835866B2 (en) | 2011-05-19 | 2014-09-16 | Fei Company | Method and structure for controlling magnetic field distributions in an ExB Wien filter |
| US9053900B2 (en) * | 2012-04-03 | 2015-06-09 | Kla-Tencor Corporation | Apparatus and methods for high-resolution electron beam imaging |
| US9443696B2 (en) | 2014-05-25 | 2016-09-13 | Kla-Tencor Corporation | Electron beam imaging with dual Wien-filter monochromator |
| KR101633978B1 (ko) | 2014-06-20 | 2016-06-28 | 한국표준과학연구원 | 모노크로메이터 및 이를 구비한 하전입자빔 장치 |
| TWI506666B (zh) * | 2014-08-08 | 2015-11-01 | Nat Univ Tsing Hua | 桌上型電子顯微鏡及其複合多極-聚焦可調式磁透鏡 |
| US10090131B2 (en) * | 2016-12-07 | 2018-10-02 | Kla-Tencor Corporation | Method and system for aberration correction in an electron beam system |
| JP6964531B2 (ja) * | 2018-02-14 | 2021-11-10 | 株式会社荏原製作所 | ウィーンフィルタ、電子光学装置 |
| JP6914993B2 (ja) * | 2019-06-25 | 2021-08-04 | 日本電子株式会社 | モノクロメーターおよび荷電粒子線装置 |
| GB202410707D0 (en) * | 2024-07-22 | 2024-09-04 | Nu Instruments Ltd | Beam filter arrangements in mass spectrometers |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69027602T2 (de) * | 1990-08-08 | 1997-01-23 | Philips Electronics Nv | Energiefilter für Ladungsträgervorrichtung |
| US5097126A (en) * | 1990-09-25 | 1992-03-17 | Gatan, Inc. | High resolution electron energy loss spectrometer |
| US6111253A (en) * | 1997-09-01 | 2000-08-29 | Jeol Ltd. | Transmission electron microscope |
| JP2002507045A (ja) * | 1998-03-10 | 2002-03-05 | エッサーズ、エリック | 走査型電子顕微鏡 |
-
2000
- 2000-12-12 DE DE10061798A patent/DE10061798A1/de not_active Withdrawn
-
2001
- 2001-11-14 EP EP01126990A patent/EP1220292B1/de not_active Expired - Lifetime
- 2001-11-14 DE DE50113859T patent/DE50113859D1/de not_active Expired - Lifetime
- 2001-12-07 CZ CZ20014398A patent/CZ302133B6/cs not_active IP Right Cessation
- 2001-12-12 JP JP2001378406A patent/JP4089774B2/ja not_active Expired - Fee Related
- 2001-12-12 US US10/012,512 patent/US6580073B2/en not_active Expired - Lifetime
-
2007
- 2007-12-21 JP JP2007330812A patent/JP4256902B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008098184A (ja) | 2008-04-24 |
| DE50113859D1 (de) | 2008-05-29 |
| JP4089774B2 (ja) | 2008-05-28 |
| CZ302133B6 (cs) | 2010-11-03 |
| EP1220292A2 (de) | 2002-07-03 |
| EP1220292B1 (de) | 2008-04-16 |
| CZ20014398A3 (cs) | 2002-07-17 |
| JP2002214396A (ja) | 2002-07-31 |
| EP1220292A3 (de) | 2005-03-16 |
| US20020104966A1 (en) | 2002-08-08 |
| US6580073B2 (en) | 2003-06-17 |
| DE10061798A1 (de) | 2002-06-13 |
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