JP4322331B2 - Hydrophilic and hydrophobic conversion method on the surface of a photocatalytic functional material, hydrophilic / hydrophobic conversion element for using the method, and printing apparatus using the method - Google Patents
Hydrophilic and hydrophobic conversion method on the surface of a photocatalytic functional material, hydrophilic / hydrophobic conversion element for using the method, and printing apparatus using the method Download PDFInfo
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- JP4322331B2 JP4322331B2 JP29932398A JP29932398A JP4322331B2 JP 4322331 B2 JP4322331 B2 JP 4322331B2 JP 29932398 A JP29932398 A JP 29932398A JP 29932398 A JP29932398 A JP 29932398A JP 4322331 B2 JP4322331 B2 JP 4322331B2
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- 239000000463 material Substances 0.000 title claims description 26
- 230000001699 photocatalysis Effects 0.000 title claims description 19
- 238000000034 method Methods 0.000 title claims description 18
- 230000002209 hydrophobic effect Effects 0.000 title claims description 9
- 238000007639 printing Methods 0.000 title claims description 9
- 238000006243 chemical reaction Methods 0.000 title claims description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 19
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 17
- 238000005468 ion implantation Methods 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 239000011941 photocatalyst Substances 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000003373 anti-fouling effect Effects 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000005284 excitation Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- -1 and as a result Substances 0.000 description 2
- 229910001430 chromium ion Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910001456 vanadium ion Inorganic materials 0.000 description 1
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- Catalysts (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、光触媒に金属を複合することにより、照射する光の波長によって表面における親水性と疎水性の変換が可能であることを特徴とする光触媒機能材の表面における親水性と疎水性の変換方法、該方法を用いるための親水性・疎水性変換素子および該方法を用いる印刷機器に関する。
【0002】
【従来技術】
酸化チタンなどの光触媒は表面に紫外線を照射すると水を全くはじかなくなるといった光誘起超親水性が見出された。光触媒表面の光誘起親水化のメカニズムは、現在は以下のように考えられている。
1.光触媒表面にバンドギャップ以上のエネルギーに相当する波長の光を照射することによって光触媒自身が還元されて表面に酸素欠陥を形成する。
2.光触媒表面の酸素欠陥部分に雰囲気中の水分が結合して安定化する。
3.光触媒表面に薄い水の層を形成することになり、結果として水をはじかなくなる。
【0003】
光誘起超親水化現象は酸化チタン等の酸化物半導体で現われるが、励起光として400nm以下の紫外光が必要であり、400nm以上の可視光線を酸化チタンの表面に照射した場合には親水化が起こらない。つまり、酸化チタンの表面の濡れ性は可視光線には応答がなかった。
【0004】
光触媒の可視光化の試みは、水の電気分解や空気の浄化の分野において光触媒に金属をドープする検討が重ねられてきた。光触媒に金属を複合することによって光触媒のバンドギャップ内に不純物準位が形成され、紫外光よりも長波長である可視光での励起が可能になる。例えば、最近ではイオン注入法によって酸化チタンにクロムまたはバナジウムイオンをドープすることによって、可視光線による窒素酸化物分解の検討がなされた(触媒、Vol.39, No.2, 1997, p.146-149)。しかし、この技術における酸化チタン光触媒の構造は粉体のため、水との接触角を評価することが構造的に困難であった。
【0005】
励起光として紫外光を利用した光触媒超親水性技術は、防汚、防曇材料としてタイル、車のサイドミラー等に実用化されている。例えば、WO96/29375号には基材の表面を光触媒的に親水化させる方法、超親水性の光触媒性表面を備えた基材及びその製造方法が開示されている。また、WO97/45502号には防汚性部材及び防汚性コーティング組成物が開示されている。いずれの場合でも、防曇、防汚機能を向上させるために、表面の超親水状態を維持させることを主眼として検討がなされてきた。ところが、光を照射することによって疎水化する材料について検討された例はない。また、光照射によって表面の親水性と疎水性が変換できる材料についての報告例は全く無く、表面の親水性と疎水性が短時間で可逆的にスイッチする材料は、印刷機器などのパターニング技術への応用として望まれていた。
【0006】
【発明が解決しようとする課題】
本発明は前記の事実に鑑みてなされたもので、その目的とするところは、光の照射波長によって表面の親水性と疎水性を可逆的にスイッチングすることが可能な光触媒機能材及びこの光触媒機能材を備えた印刷機器を提供することにある。
【0007】
【課題を解決するための手段】
本発明の請求項1に係る光触媒機能材は、酸化チタンに、クロム、バナジウム、ニオブ、鉄、銅、コバルト、ニッケル、マンガンからなる群より選択される少なくとも一種類の金属をイオン注入法によって複合したもので、照射する光の波長によって表面における親水性と疎水性の変換が可能であることを特徴とする。本発明の請求項3に係る印刷機器は、前記光触媒機能材を利用することを特徴とする。
【0008】
【発明の実施の形態】
本発明に係る機能性被膜は、酸化チタンに、クロム、バナジウム、ニオブ、鉄、銅、コバルト、ニッケル、マンガンからなる群より選択される少なくとも一種類の金属をイオン注入法によって複合したものを含んでなる。
【0009】
酸化チタンの合成方法は例えば、CVD法、熱CVD法、スパッタ法、ゾルゲル法、粉末成形体の焼成、真空蒸着法からなる群より少なくとも一種類を利用する。酸化チタンが膜構造の場合、酸化チタンの膜厚が20nm以上であることが好ましい。また、いずれの場合でも酸化チタンは表面に水分が浸透しない程度に緻密であることが好ましい。
【0010】
酸化チタンに、クロム、バナジウム、ニオブ、鉄、銅、コバルト、ニッケル、マンガンからなる群より選択される少なくとも一種類の金属をイオン注入法によって複合する。このとき、イオン注入の加速電圧は50keV〜2MeVの範囲であることが好ましい。
【0011】
光励起に用いる光源としては、蛍光灯、白熱電灯、水銀ランプ、キセノンランプ、水銀−キセノンランプ、ハロゲンランプ、メタルハライドランプ、レーザー光、太陽光からなる群より選択される少なくとも一種類を利用したもの、または前記光源からの光を低損失のファイバーで誘導した光源等が好適に利用できる。照射する光の波長の設定は、色ガラスフィルター、分光器などを用いて前記光源から照射される光のうち必要のない波長を遮断して所望の波長を得る。驚くべきことに、前記光触媒機能材の表面に紫外光を照射することによって親水化、可視光を照射することによって疎水化し、この現象を繰り返し誘起させることが可能である非常に特徴的な素子を得ることができる。結果として、親水化に必要な光の波長範囲は400nm以下、疎水化に必要な光の波長範囲は430nm〜800nmであった。
【0012】
前記光触媒機能材が紫外光照射時に親水化するメカニズムは以下のように考えられている。
1.光触媒表面にバンドギャップ以上のエネルギーに相当する波長の光を照射することによって光触媒自身が還元されて表面に酸素欠陥を形成する。
2.酸素欠陥部分に雰囲気中の水分が結合して安定化する。
3.光触媒表面に薄い水の層を形成することになり、結果として水をはじかなくなる。
一方、可視光照射によって疎水化するメカニズムは、光触媒に複合した金属によって光触媒のバンドギャップ内に不純物準位が生じて可視光によって励起が可能になり、可視光励起で生じた正孔、ラジカル等によって光触媒表面が酸化されるため、結果的に表面の水が脱離して疎水化すると考えられている。
【0013】
前記光触媒機能材と光源を備えることにより印刷機器となる。前記光触媒機能材の表面に紫外光及び可視光を照射することによって、表面の親水性及び疎水性のパターニングをおこなう。この表面に親水性または疎水性の色素、トナー、インク等の有色材を塗布、スプレー、浸漬等の方法で付着させたものを、被印刷物に密着させて印刷物を得る。前記光触媒機能材は、照射する波長によって親水性と疎水性が可逆的に変化するので、前記光触媒を備えた印刷機器は何度でも使用に耐えうる。
【0014】
【実施例】
実施例1.
1cm角のSrTiO3基板にCVD法にてc軸配向のアナターゼ膜を作製した。作製した膜にイオン注入法にてクロムイオンを酸化チタンに複合化した。イオン注入の加速電圧は500keVで、注入量は1016ions/cm2とした。注入後の膜を電気炉で450℃×5時間焼成して光触媒機能材を得た。
この試料の表面に可視光→紫外光の照射を繰り返し3回おこない、照射時間に対する水との接触角の変化を測定した。紫外光の光源は200Wの水銀−キセノンランプ(林時計工業、LA-210UV)を用い、色ガラスフィルター(東芝硝子、UV-D36B)を介して波長を360nmとした。
また、可視光の光源は150Wのキセノンランプ(林時計工業、LA-150Xe)を用い、紫外光カットフィルター(東芝硝子、Y-43)と熱線カットカットフィルター(東芝硝子、IRA-25S)を介して照射波長を430nm〜800nmとした。水との接触角の測定は接触角測定器(協和界面科学、CA-X150)により、マイクロシリンジから水滴を滴下して求めた。その結果、図1に示すように、紫外光を照射した場合は水との接触角が約10°まで親水化し、可視光を照射した場合は約110°まで疎水化し、この現象を繰り返し起こすことが可能であった。
【0015】
比較例1.
実施例1で作製したC軸配向のアナターゼ膜をそのまま(イオン注入をおこなわずに)電気炉で450℃×5時間焼成して酸化チタン光触媒を得た。この試料の表面に紫外光→可視光照射をおこない、照射時間に対する水との接触角を測定した。その結果を図2に示す。紫外線を照射した場合は水との接触角が約0°まで親水化し、可視光を照射した場合は約40°となり、実施例1のような親水→疎水の大きなスイッチング現象は見られなかった。
【0016】
【発明の効果】
本発明によれば、酸化チタンに少なくともクロムをイオン注入法によって複合した光触媒機能材は、照射する光の波長によって表面における親水性と疎水性が短時間で変換可能となり、この光触媒機能材と光源を組み合わせることによって印刷機器を提供することができる。
【図面の簡単な説明】
【図1】 本発明の実施例1に係る紫外光と可視光を繰り返し照射した場合の試料表面の水との接触角と光照射時間の関係
【図2】 本発明の比較例1に係る紫外光照射後に可視光を照射した場合の試料表面の水との接触角と光照射時間の関係[0001]
BACKGROUND OF THE INVENTION
The present invention relates to the conversion of hydrophilicity and hydrophobicity on the surface of a photocatalytic functional material, wherein the surface can be converted into hydrophilicity and hydrophobicity by compounding a metal with a photocatalyst according to the wavelength of light to be irradiated. The present invention relates to a method, a hydrophilic / hydrophobic conversion element for using the method, and a printing apparatus using the method.
[0002]
[Prior art]
The photocatalyst such as titanium oxide was found to have photo-induced superhydrophilicity such that water was not repelled at all when the surface was irradiated with ultraviolet rays. The mechanism of photoinduced hydrophilization of the photocatalyst surface is currently considered as follows.
1. By irradiating the surface of the photocatalyst with light having a wavelength corresponding to energy greater than the band gap, the photocatalyst itself is reduced to form oxygen defects on the surface.
2. Moisture in the atmosphere binds to and stabilizes oxygen deficient portions on the surface of the photocatalyst.
3. A thin water layer is formed on the surface of the photocatalyst, and as a result, water is not repelled.
[0003]
The photo-induced superhydrophilization phenomenon appears in oxide semiconductors such as titanium oxide, but it requires ultraviolet light of 400 nm or less as excitation light, and hydrophilicity is not present when the surface of titanium oxide is irradiated with visible light of 400 nm or more. Does not happen. That is, the wettability of the surface of titanium oxide did not respond to visible light.
[0004]
Attempts to make the photocatalyst visible light have been repeated in the fields of water electrolysis and air purification. By compounding a metal with the photocatalyst, an impurity level is formed in the band gap of the photocatalyst, and excitation with visible light having a longer wavelength than ultraviolet light becomes possible. For example, recently, nitrogen oxide decomposition by visible light has been studied by doping titanium oxide with chromium or vanadium ions by ion implantation (catalyst, Vol.39, No.2, 1997, p.146-). 149). However, since the structure of the titanium oxide photocatalyst in this technique is powder, it is structurally difficult to evaluate the contact angle with water.
[0005]
The photocatalytic superhydrophilic technology using ultraviolet light as excitation light has been put to practical use in tiles, car side mirrors, etc. as antifouling and antifogging materials. For example, WO96 / 29375 discloses a method for photocatalytically hydrophilizing the surface of a substrate, a substrate having a superhydrophilic photocatalytic surface, and a method for producing the same. WO97 / 45502 discloses an antifouling member and an antifouling coating composition. In any case, in order to improve the antifogging and antifouling functions, studies have been made mainly on maintaining the superhydrophilic state of the surface. However, there have been no studies on materials that become hydrophobic when irradiated with light. In addition, there are no reports on materials that can convert the hydrophilicity and hydrophobicity of the surface by light irradiation, and materials that reversibly switch the hydrophilicity and hydrophobicity of the surface in a short time can be applied to patterning technology such as printing equipment. It was desired as an application of.
[0006]
[Problems to be solved by the invention]
The present invention has been made in view of the above-mentioned facts, and its object is to provide a photocatalytic functional material capable of reversibly switching the hydrophilicity and hydrophobicity of the surface depending on the irradiation wavelength of light, and the photocatalytic function. It is to provide a printing device provided with a material.
[0007]
[Means for Solving the Problems]
The photocatalytic functional material according to claim 1 of the present invention is a composite of titanium oxide and at least one metal selected from the group consisting of chromium, vanadium, niobium, iron, copper, cobalt, nickel, and manganese by ion implantation. Thus, hydrophilicity and hydrophobicity conversion on the surface is possible depending on the wavelength of light to be irradiated. A printing apparatus according to claim 3 of the present invention is characterized in that the photocatalytic functional material is used.
[0008]
DETAILED DESCRIPTION OF THE INVENTION
Functional coating according to the present invention, include titanium oxide, chromium, vanadium, niobium, iron, copper, cobalt, nickel, at least one kind of metal selected from the group consisting of manganese those composite by ion implantation It becomes .
[0009]
As the titanium oxide synthesis method, for example, at least one selected from the group consisting of a CVD method, a thermal CVD method, a sputtering method, a sol-gel method, firing of a powder compact, and a vacuum deposition method is used. When titanium oxide has a film structure, the thickness of titanium oxide is preferably 20 nm or more. In any case, the titanium oxide is preferably dense enough to prevent moisture from penetrating the surface.
[0010]
At least one metal selected from the group consisting of chromium, vanadium, niobium, iron, copper, cobalt, nickel, and manganese is combined with titanium oxide by an ion implantation method. At this time, the acceleration voltage for ion implantation is preferably in the range of 50 keV to 2 MeV.
[0011]
As a light source used for photoexcitation, a lamp using at least one selected from the group consisting of a fluorescent lamp, an incandescent lamp, a mercury lamp, a xenon lamp, a mercury-xenon lamp, a halogen lamp, a metal halide lamp, laser light, and sunlight, Alternatively, a light source in which light from the light source is guided by a low-loss fiber can be suitably used. The wavelength of the light to be irradiated is set to obtain a desired wavelength by blocking unnecessary wavelengths among the light irradiated from the light source using a color glass filter, a spectroscope, or the like. Surprisingly, a very characteristic element that can be hydrophilized by irradiating the surface of the photocatalytic functional material with ultraviolet light, hydrophobized by irradiating visible light, and repeatedly inducing this phenomenon. Obtainable. As a result, the wavelength range of light required for hydrophilization was 400 nm or less, and the wavelength range of light required for hydrophobization was 430 nm to 800 nm.
[0012]
The mechanism by which the photocatalytic functional material becomes hydrophilic upon irradiation with ultraviolet light is considered as follows.
1. By irradiating the surface of the photocatalyst with light having a wavelength corresponding to energy greater than the band gap, the photocatalyst itself is reduced to form oxygen defects on the surface.
2. Moisture in the atmosphere is bonded to the oxygen defect portion and stabilized.
3. A thin water layer is formed on the surface of the photocatalyst, and as a result, water is not repelled.
On the other hand, the mechanism of hydrophobization by visible light irradiation is that the metal complexed with the photocatalyst generates an impurity level in the band gap of the photocatalyst and can be excited by visible light, and by holes, radicals, etc. generated by visible light excitation Since the surface of the photocatalyst is oxidized, it is thought that the water on the surface is desorbed as a result.
[0013]
By providing the photocatalytic functional material and a light source, a printing device is obtained. By irradiating the surface of the photocatalytic functional material with ultraviolet light and visible light, hydrophilic and hydrophobic patterning of the surface is performed. A printed material is obtained by adhering a colored material such as a hydrophilic or hydrophobic coloring matter, toner, ink, or the like to the surface by a method such as coating, spraying, or dipping, in close contact with the substrate. Since the hydrophilicity and hydrophobicity of the photocatalyst functional material reversibly change depending on the wavelength of irradiation, the printing apparatus equipped with the photocatalyst can withstand use any number of times.
[0014]
【Example】
Example 1.
A c-axis oriented anatase film was fabricated on a 1 cm square SrTiO3 substrate by CVD. Chromium ions were compounded into titanium oxide by ion implantation in the produced film. The acceleration voltage of ion implantation was 500 keV, and the implantation amount was 1016 ions / cm2. The injected film was baked in an electric furnace at 450 ° C. for 5 hours to obtain a photocatalytic functional material.
The surface of this sample was repeatedly irradiated with visible light → ultraviolet light three times, and the change in contact angle with water with respect to the irradiation time was measured. The ultraviolet light source was a 200 W mercury-xenon lamp (Hayashi Watch Industries, LA-210UV), and the wavelength was set to 360 nm through a colored glass filter (Toshiba Glass, UV-D36B).
The visible light source uses a 150W xenon lamp (Hayashi Watch Industry, LA-150Xe), and passes through an ultraviolet light cut filter (Toshiba Glass, Y-43) and a heat ray cut filter (Toshiba Glass, IRA-25S). The irradiation wavelength was set to 430 nm to 800 nm. The contact angle with water was determined by dropping water droplets from a microsyringe using a contact angle measuring device (Kyowa Interface Science, CA-X150). As a result, as shown in Fig. 1, the contact angle with water becomes hydrophilic to about 10 ° when irradiated with ultraviolet light, and it becomes hydrophobic to about 110 ° when irradiated with visible light, causing this phenomenon repeatedly. Was possible.
[0015]
Comparative Example 1
The C-axis oriented anatase film produced in Example 1 was calcined as it was (without ion implantation) in an electric furnace at 450 ° C. for 5 hours to obtain a titanium oxide photocatalyst. The surface of this sample was irradiated with ultraviolet light → visible light, and the contact angle with water with respect to the irradiation time was measured. The result is shown in FIG. When irradiated with ultraviolet rays, the contact angle with water became hydrophilic to about 0 °, and when irradiated with visible light, the contact angle became about 40 °, and the large hydrophilic → hydrophobic switching phenomenon as in Example 1 was not observed.
[0016]
【The invention's effect】
According to the present invention, the photocatalytic functional material in which at least chromium is combined with titanium oxide by the ion implantation method can convert the hydrophilicity and hydrophobicity on the surface in a short time depending on the wavelength of the irradiated light. By combining these, a printing device can be provided.
[Brief description of the drawings]
FIG. 1 shows the relationship between the contact angle between water on the sample surface and light irradiation time when ultraviolet light and visible light are repeatedly irradiated according to Example 1 of the present invention. FIG. 2 shows ultraviolet light according to Comparative Example 1 of the present invention. Relationship between contact angle with water on sample surface and light irradiation time when visible light is irradiated after light irradiation
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29932398A JP4322331B2 (en) | 1998-10-21 | 1998-10-21 | Hydrophilic and hydrophobic conversion method on the surface of a photocatalytic functional material, hydrophilic / hydrophobic conversion element for using the method, and printing apparatus using the method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29932398A JP4322331B2 (en) | 1998-10-21 | 1998-10-21 | Hydrophilic and hydrophobic conversion method on the surface of a photocatalytic functional material, hydrophilic / hydrophobic conversion element for using the method, and printing apparatus using the method |
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| Publication Number | Publication Date |
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| JP2000126606A JP2000126606A (en) | 2000-05-09 |
| JP4322331B2 true JP4322331B2 (en) | 2009-08-26 |
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| JP4565170B2 (en) * | 2000-05-31 | 2010-10-20 | 独立行政法人 日本原子力研究開発機構 | Method for producing anatase TiO2 single crystal thin film |
| US6958132B2 (en) | 2002-05-31 | 2005-10-25 | The Regents Of The University Of California | Systems and methods for optical actuation of microfluidics based on opto-electrowetting |
| WO2013042360A1 (en) * | 2011-09-20 | 2013-03-28 | 株式会社クラレ | Adherent cell culture method |
| CN110029349B (en) * | 2019-04-08 | 2020-12-04 | 青岛大学 | A method for preparation and regulation of superhydrophobic/superhydrophilic reversible metal surfaces |
| CN110961128A (en) * | 2019-10-24 | 2020-04-07 | 武汉大学苏州研究院 | Metal-carbon nitrogen composite electrocatalytic material and preparation method thereof |
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