JP4334339B2 - 処理ゲル表面処理方法および処理ゲル - Google Patents
処理ゲル表面処理方法および処理ゲル Download PDFInfo
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- JP4334339B2 JP4334339B2 JP2003514073A JP2003514073A JP4334339B2 JP 4334339 B2 JP4334339 B2 JP 4334339B2 JP 2003514073 A JP2003514073 A JP 2003514073A JP 2003514073 A JP2003514073 A JP 2003514073A JP 4334339 B2 JP4334339 B2 JP 4334339B2
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical group [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 8
- 229910017604 nitric acid Inorganic materials 0.000 claims description 8
- 238000011109 contamination Methods 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 230000001680 brushing effect Effects 0.000 claims description 5
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- 238000009423 ventilation Methods 0.000 claims description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 4
- 238000005238 degreasing Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 4
- 229910000667 (NH4)2Ce(NO3)6 Inorganic materials 0.000 claims description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 2
- 150000007522 mineralic acids Chemical class 0.000 claims 6
- 150000007529 inorganic bases Chemical class 0.000 claims 4
- 229910000029 sodium carbonate Inorganic materials 0.000 claims 1
- 239000002253 acid Substances 0.000 abstract description 11
- 150000007513 acids Chemical class 0.000 abstract description 4
- 239000000499 gel Substances 0.000 description 118
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- 238000002474 experimental method Methods 0.000 description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 229910052500 inorganic mineral Inorganic materials 0.000 description 7
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
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- 239000011248 coating agent Substances 0.000 description 3
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- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
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- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
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- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- 239000010964 304L stainless steel Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 206010044038 Tooth erosion Diseases 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- LQCIDLXXSFUYSA-UHFFFAOYSA-N cerium(4+);tetranitrate Chemical compound [Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O LQCIDLXXSFUYSA-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
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- 230000003628 erosive effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
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- 230000007062 hydrolysis Effects 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011824 nuclear material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 244000045947 parasite Species 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
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- 238000012958 reprocessing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
- G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
- C11D17/003—Colloidal solutions, e.g. gels; Thixotropic solutions or pastes
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/042—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/046—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/12—Water-insoluble compounds
- C11D3/124—Silicon containing, e.g. silica, silex, quartz or glass beads
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/025—Cleaning or pickling metallic material with solutions or molten salts with acid solutions acidic pickling pastes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Dispersion Chemistry (AREA)
- Electrochemistry (AREA)
- Food Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Silicon Compounds (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Cleaning In General (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
処理は、例えば、エッチングや表面脱脂処理などの放射性または有機汚染除去処理であってもよい。
本方法は、金属表面、プラスチック表面、ガラス質の材料表面などのような処理される全ての種類の表面に使用できる。
特許文献1、特許文献2、特許文献3には、表面汚染除去のためのゲルが開示されている。これらのゲルは、シリカまたはアルミナを主成分としている。これらの文書には、乾燥時間、表面からの乾燥ゲル残留物の剥離およびこれら残留物のサイズが制御されるいかなるゲルも記述されていない。
− 処理すべき表面上に処理ゲルを塗布する段階
− ゲルが乾燥し、かつ乾燥した固形残留物を形成する前に表面を処理する時間を有するような温度と相対湿度とで、処理ゲルを処理すべき表面上に保持する段階、および
− 処理された表面から乾燥した固形残留物を取り除く段階
を有することを特徴とする。
− ゲルの重量に基づいて5〜25重量%の無機粘性剤または無機粘性剤の混合物、
− 0.1〜7mol/リットル、好ましくは0.5〜4mol/リットルの活性処理剤、および
− 随意で、強酸性媒体において1.4Vより大きい標準酸化還元電位E0を有する0.05〜1mol/リットルの酸化剤またはこの酸化剤の還元体
を含む。
これら添付図面において、Teは開始時の溶媒の量の割合として示された蒸発率を、tsは分単位で時間を、Tは各曲線について℃で示された温度を、およびHrは異なる実験中の相対湿度をパーセントで、それぞれ表す。
3種類の温度、30℃、25℃および20℃について、相対湿度のいくつかの値に対して図1ないし図3に表すグラフを作成した。
20℃での全乾燥時間については、実験結果を考慮し、35%の相対湿度で約7時間、42%の相対湿度で約8時間と推定された。
添付図4は、20℃および42%の相対湿度でのゲルの3つの堆積量に対して達成された曲線をまとめたものである。
湿度の影響を評価するため、一定温度で実施された前述の実験の間に観測された、ゲルの定速乾燥段階の特徴点から曲線を描いた。これらの曲線を添付図5に示す。この図において、「L」は、対応する複数の曲線の平均値から作成された、30℃で120分間の乾燥線を表している。この線は、方程式y=−1.6039x+110.27を有し、xは相対湿度(%)、yは蒸発率(溶媒の初期量の%)である。
42%の相対湿度で実行された実験では、異なる温度で動力学を比較した。その結果を図6に示す。
Claims (18)
- 処理ゲルによる表面を浄化、汚染除去、エッチング又は脱脂する処理方法であって、順に、
− 処理すべき表面上に、ゲルの重量を基準として、5〜25重量%の焼成シリカと沈降シリカの混合物と、0.5〜4mol/リットルの無機酸、無機酸の混合物又は無機塩基から選択される活性処理剤と、随意で、強酸性媒体にCe(IV)、Co(III)またはAg(II)から選択される1.4Vより大きい標準酸化還元電位E0を有する0.05〜1mol/リットルの酸化剤またはこの酸化剤の還元体とを含むコロイド溶液からなる処理ゲルを塗布するステップ、
− 乾燥した固形残留物が形成されるまで、20〜30℃の間の乾燥温度および20〜70%の間の相対湿度において、処理ゲルを処理すべき表面上に維持するステップ、および
− 処理表面から乾燥した固形残留物を除去するステップ
を含む処理方法。 - 前記焼成シリカと沈降シリカの混合物がゲルの5〜15重量%である、請求項1に記載の処理方法。
- 前記焼成シリカと沈降シリカの混合物がゲルの5〜10重量%である、請求項1に記載の処理方法。
- 前記沈降シリカがゲルの0.5重量%であり、前記焼成シリカがゲルの8重量%である、請求項1に記載の処理方法。
- 前記無機酸が、塩酸、硝酸、硫酸、リン酸、またはそれらの混合物の中から選択される、請求項1に記載の処理方法。
- 前記処理ゲルが、ゲル1リットル当たり0.5〜2molの濃度を有する無機塩基である活性処理剤からなる、請求項1ないし5のいずれか1項に記載の処理方法。
- 前記無機塩基が、炭酸ナトリウム、炭酸カリウム、またはそれらの混合物から選択される、請求項6に記載の処理方法。
- 前記処理ゲルが、ゲル1リットル当たり、5〜15重量%の焼成シリカと沈降シリカの混合物、0.5〜2mol/リットルの硝酸、および0.1〜0.5molのCe(NO3)4または(NH4)2Ce(NO3)6からなる、請求項1に記載の処理方法。
- 前記処理ゲルを、表面1平方メートル当たり100〜2000gの重量で、処理すべき表面上に塗布する、請求項1に記載の処理方法。
- 前記乾燥した固形残留物を、ブラッシングおよび/または吸引によって処理表面から除去する、請求項1に記載の処理方法。
- 金属面から酸化物層を除去するための、請求項1ないし10のいずれか1項に記載の処理方法。
- 処理すべき設備からの粉塵を除去した後に、請求項1ないし10のいずれか1項に記載の方法による設備の処理を行う、設備汚染除去方法。
- 前記設備が核施設の換気シャフトである、請求項12に記載の方法。
- ゲルの重量に基づき、5〜25重量%の焼成シリカと沈降シリカとの混合物と、0.5〜4mol/リットルの無機酸、無機酸の混合物又は無機塩基から選択される活性処理剤と、随意で強酸性媒体にCe(IV)、Co(III)またはAg(II)から選択される1.4Vより大きい標準酸化還元電位E0を有する0.05〜1mol/リットルの酸化剤またはこの酸化剤の還元体とを含むコロイド溶液からなる、表面を処理するための処理ゲル。
- 前記焼成シリカと沈降シリカの混合物が、ゲルの5〜15重量%である、請求項14に記載の処理ゲル。
- 前記焼成シリカと沈降シリカの混合物が、ゲルの5〜10重量%である、請求項14に記載の処理ゲル。
- 前記沈降シリカがゲルの0.5重量%であり、前記焼成シリカがゲルの8重量%である、請求項14に記載の処理ゲル。
- 前記無機酸が、塩酸、硝酸、硫酸、リン酸またはそれらの混合物から選択される、請求項14に記載の処理ゲル。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0109520A FR2827530B1 (fr) | 2001-07-17 | 2001-07-17 | Procede de traitement d'une surface par un gel de traitement, et gel de traitement |
| PCT/FR2002/002509 WO2003008529A1 (fr) | 2001-07-17 | 2002-07-15 | Procede de traitement d'une surface par un gel de traitement, et gel de traitement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004535510A JP2004535510A (ja) | 2004-11-25 |
| JP2004535510A5 JP2004535510A5 (ja) | 2009-05-07 |
| JP4334339B2 true JP4334339B2 (ja) | 2009-09-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003514073A Expired - Lifetime JP4334339B2 (ja) | 2001-07-17 | 2002-07-15 | 処理ゲル表面処理方法および処理ゲル |
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| Country | Link |
|---|---|
| US (2) | US7713357B2 (ja) |
| EP (1) | EP1421165B1 (ja) |
| JP (1) | JP4334339B2 (ja) |
| CN (1) | CN1273578C (ja) |
| AT (1) | ATE338806T1 (ja) |
| DE (1) | DE60214567T2 (ja) |
| ES (1) | ES2271318T3 (ja) |
| FR (1) | FR2827530B1 (ja) |
| RU (1) | RU2291895C2 (ja) |
| UA (1) | UA82465C2 (ja) |
| WO (1) | WO2003008529A1 (ja) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3914721B2 (ja) * | 2001-06-25 | 2007-05-16 | 株式会社平間理化研究所 | 非水系レジスト剥離液管理装置及び非水系レジスト剥離液管理方法 |
| FR2827530B1 (fr) * | 2001-07-17 | 2004-05-21 | Commissariat Energie Atomique | Procede de traitement d'une surface par un gel de traitement, et gel de traitement |
| US8009696B2 (en) * | 2004-08-06 | 2011-08-30 | Ipeak Networks Incorporated | System and method for achieving accelerated throughput |
| CN1332398C (zh) * | 2004-10-15 | 2007-08-15 | 中国人民解放军总参谋部工程兵科研三所 | 剥离型压制去污剂 |
| US20060151434A1 (en) * | 2005-01-07 | 2006-07-13 | The Boc Group, Inc. | Selective surface texturing through the use of random application of thixotropic etching agents |
| FR2891470B1 (fr) * | 2005-10-05 | 2007-11-23 | Commissariat Energie Atomique | Gel aspirable pour la decontamination de surfaces et utilisation |
| FR2962046B1 (fr) * | 2010-07-02 | 2012-08-17 | Commissariat Energie Atomique | Gel de decontamination biologique et procede de decontamination de surfaces utilisant ce gel. |
| FR2984170B1 (fr) * | 2011-12-19 | 2014-01-17 | Commissariat Energie Atomique | Gel de decontamination et procede de decontamination de surfaces par trempage utilisant ce gel. |
| JP5846997B2 (ja) * | 2012-03-30 | 2016-01-20 | 鹿島建設株式会社 | 膜形成用組成物、表面洗浄方法、放射性物質除去方法、表面保護方法、及び膜 |
| FR2990364B1 (fr) | 2012-05-11 | 2014-06-13 | Commissariat Energie Atomique | Procede de decontamination radioactive d'une terre par mousse de flottation a air disperse et ladite mousse |
| FR3003869B1 (fr) | 2013-03-29 | 2015-05-01 | Commissariat Energie Atomique | Gel de decontamination pigmente et procede de decontamination de surfaces utilisant ce gel. |
| FR3003763B1 (fr) | 2013-03-29 | 2015-05-15 | Commissariat Energie Atomique | Gel alcalin oxydant de decontamination biologique et procede de decontamination biologique de surfaces utilisant ce gel. |
| CN103695205B (zh) * | 2013-12-03 | 2016-01-20 | 中国人民解放军总参谋部工程兵科研三所 | 一种自碎式消污液 |
| FR3014336B1 (fr) | 2013-12-05 | 2016-01-22 | Commissariat Energie Atomique | Utilisation d'un gel alcalin oxydant pour eliminer un biofilm sur une surface d'un substrat solide. |
| US9969549B2 (en) | 2014-03-24 | 2018-05-15 | The Boeing Company | Systems and methods for controlling a fuel tank environment |
| FR3027310B1 (fr) * | 2014-10-15 | 2017-12-15 | Commissariat Energie Atomique | Gel pour eliminer les graffitis et procede pour eliminer les graffitis utilisant ce gel. |
| FR3053897B1 (fr) | 2016-07-13 | 2022-05-20 | Commissariat Energie Atomique | Gel de decontamination adsorbant et photocatalytique et procede de decontamination de surfaces utilisant ce gel |
| FR3054839B1 (fr) | 2016-08-05 | 2020-06-26 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Gel aspirable et procede pour eliminer une contamination radioactive contenue dans une couche organique en surface d'un substrat solide. |
| US20180094217A1 (en) * | 2016-09-30 | 2018-04-05 | General Electric Company | Method and material for cleaning metal surfaces |
| RU2655525C2 (ru) * | 2016-10-05 | 2018-05-28 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Волгоградский государственный медицинский университет" Министерства здравоохранения Российской Федерации ГБОУ ВПО ВолгГМУ МЗ РФ | Неводный способ очистки для удаления поверхностных загрязнений с ортопедических конструкций |
| RU2662531C1 (ru) * | 2017-05-31 | 2018-07-26 | Кирилл Игоревич Мыльников | Камера для обработки изделий из пластика |
| FR3083712B1 (fr) | 2018-07-11 | 2022-01-21 | Commissariat Energie Atomique | Procede de decontamination d'un milieu gazeux contamine par des especes contaminantes en suspension. |
| RU187811U1 (ru) * | 2018-11-14 | 2019-03-19 | Александр Николаевич Костин | Устройство для финишной обработки поверхности изделий из пластика |
| RU189421U1 (ru) * | 2019-02-11 | 2019-05-22 | Александр Николаевич Костин | Портативное устройство для финишной обработки поверхности изделий из пластика |
| US12357185B2 (en) | 2019-06-20 | 2025-07-15 | Hb Innovations, Inc. | System and method for monitoring/detecting and responding to infant breathing |
| US11712180B2 (en) * | 2019-06-20 | 2023-08-01 | Hb Innovations, Inc. | System and method for monitoring/detecting and responding to infant breathing |
| CN112760659B (zh) * | 2020-12-02 | 2022-09-27 | 中国辐射防护研究院 | 一种氧化去污凝胶及其制备方法与用途 |
| CN114672816B (zh) * | 2022-01-07 | 2024-04-05 | 航天科工防御技术研究试验中心 | 一种用于清除铝合金表面腐蚀的组合物及其制备方法和应用 |
| CN115261860B (zh) * | 2022-06-10 | 2024-04-16 | 航天科工防御技术研究试验中心 | 一种铝合金表面腐蚀清除剂及其制备方法和应用 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3578499A (en) * | 1968-08-02 | 1971-05-11 | Grace W R & Co | Gelling composition for general purpose cleaning and sanitizing |
| FR2380624A1 (fr) * | 1977-02-09 | 1978-09-08 | Commissariat Energie Atomique | Procede de decontamination radioactive d'une piece |
| US4365516A (en) * | 1978-01-06 | 1982-12-28 | Rockwell International Corporation | Ultrasonic couplant gel compositions and method for employing same |
| SU825674A1 (ru) * | 1978-01-31 | 1981-04-30 | Предприятие П/Я Р-6476 | Паста для удаления окалины с поверхности углеродистых сталей 1 |
| JPS5939511B2 (ja) * | 1982-08-05 | 1984-09-25 | 正己 小林 | ゲル状脱錆剤 |
| FR2656949B1 (fr) * | 1990-01-09 | 1994-03-25 | Commissariat A Energie Atomique | Gel decontaminant et son utilisation pour la decontamination radioactive de surfaces. |
| US5264010A (en) * | 1992-04-27 | 1993-11-23 | Rodel, Inc. | Compositions and methods for polishing and planarizing surfaces |
| FR2695839B1 (fr) * | 1992-09-23 | 1994-10-14 | Commissariat Energie Atomique | Gel décontaminant réducteur et son utilisation pour la décontamination de surface notamment d'installations nucléaires. |
| US5782940A (en) * | 1996-03-15 | 1998-07-21 | Carborundum Universal Limited | Process for the preparation of alumina abrasives |
| FR2746328B1 (fr) * | 1996-03-21 | 1998-05-29 | Stmi Soc Tech Milieu Ionisant | Gel organomineral de decontamination et son utilisation pour la decontamination de surfaces |
| FR2781809B1 (fr) * | 1998-07-31 | 2002-06-07 | Commissariat Energie Atomique | Composition de degraissage et procedes utilisant cette composition |
| US6455751B1 (en) * | 1999-03-03 | 2002-09-24 | The Regents Of The University Of California | Oxidizer gels for detoxification of chemical and biological agents |
| FR2798603B1 (fr) * | 1999-09-20 | 2002-03-01 | Tech En Milieu Ionisant Stmi S | Gel organique de decontamination et son utilisation pour la decontamination de surfaces |
| US6616910B2 (en) * | 2000-05-05 | 2003-09-09 | Institut Francais Du Petrole | Process for preparation of an EUO-structural-type zeolite, the zeolite that is obtained and its use as catalyst for isomerization of C8-aromatic compounds |
| FR2827530B1 (fr) * | 2001-07-17 | 2004-05-21 | Commissariat Energie Atomique | Procede de traitement d'une surface par un gel de traitement, et gel de traitement |
| US6605158B1 (en) * | 2001-10-12 | 2003-08-12 | Bobolink, Inc. | Radioactive decontamination and translocation method |
-
2001
- 2001-07-17 FR FR0109520A patent/FR2827530B1/fr not_active Expired - Lifetime
-
2002
- 2002-07-15 UA UA2004010352A patent/UA82465C2/uk unknown
- 2002-07-15 EP EP02760387A patent/EP1421165B1/fr not_active Expired - Lifetime
- 2002-07-15 AT AT02760387T patent/ATE338806T1/de not_active IP Right Cessation
- 2002-07-15 CN CNB028181379A patent/CN1273578C/zh not_active Expired - Lifetime
- 2002-07-15 JP JP2003514073A patent/JP4334339B2/ja not_active Expired - Lifetime
- 2002-07-15 DE DE60214567T patent/DE60214567T2/de not_active Expired - Lifetime
- 2002-07-15 ES ES02760387T patent/ES2271318T3/es not_active Expired - Lifetime
- 2002-07-15 RU RU2004104467/15A patent/RU2291895C2/ru not_active IP Right Cessation
- 2002-07-15 WO PCT/FR2002/002509 patent/WO2003008529A1/fr not_active Ceased
- 2002-07-15 US US10/483,839 patent/US7713357B2/en not_active Expired - Fee Related
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2005
- 2005-08-09 US US11/200,700 patent/US7718010B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7713357B2 (en) | 2010-05-11 |
| CN1273578C (zh) | 2006-09-06 |
| UA82465C2 (uk) | 2008-04-25 |
| ATE338806T1 (de) | 2006-09-15 |
| FR2827530B1 (fr) | 2004-05-21 |
| WO2003008529A1 (fr) | 2003-01-30 |
| US7718010B2 (en) | 2010-05-18 |
| EP1421165B1 (fr) | 2006-09-06 |
| DE60214567D1 (de) | 2006-10-19 |
| US20060032518A1 (en) | 2006-02-16 |
| EP1421165A1 (fr) | 2004-05-26 |
| JP2004535510A (ja) | 2004-11-25 |
| RU2291895C2 (ru) | 2007-01-20 |
| CN1592778A (zh) | 2005-03-09 |
| RU2004104467A (ru) | 2005-05-10 |
| FR2827530A1 (fr) | 2003-01-24 |
| US20040175505A1 (en) | 2004-09-09 |
| DE60214567T2 (de) | 2007-09-13 |
| ES2271318T3 (es) | 2007-04-16 |
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