JP4448792B2 - Metal oxynitride oxygen reduction electrode catalyst and method for producing the same - Google Patents
Metal oxynitride oxygen reduction electrode catalyst and method for producing the same Download PDFInfo
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Description
本発明は、水電解、有機電解、燃料電池などの分野において酸性電解質中で用いられる電
気化学システム用の酸素還元電極触媒及びその製造方法に関する。
The present invention, water electrolysis, organic electrolysis, to the oxygen reduction electrode catalyst and its method of manufacturing for electrochemical systems used in an acidic electrolyte in the field, such as fuel cells.
貴金属、特に、白金は高い電位で安定であり、各種の反応に対して触媒能が高いため、各
種電気化学システムの電極触媒として用いられている。しかしながら、白金の価格が高い
ことや資源量が限られていること、燃料電池用の電極触媒としては更に高活性の電極触媒
が要求されることから、白金触媒の代替材料が望まれている。
例えば、WO3、TiO2、ZrO2、PtO、Sb2O4、Sb2O3などの金属酸化物(特許文献1)、酸化ル
テニウムなどの酸化物や窒化モリブデンなどの窒化物(特許文献2)を用いた電極触媒に
係わる発明の出願がなされている。
Precious metals, particularly platinum, are stable at high potentials and have high catalytic ability for various reactions, and thus are used as electrode catalysts for various electrochemical systems. However, since the price of platinum is high, the amount of resources is limited, and a highly active electrode catalyst is required as an electrode catalyst for fuel cells, an alternative material for the platinum catalyst is desired.
For example, metal oxides such as WO 3, TiO 2, ZrO 2, PtO, Sb 2 O 4 and Sb 2 O 3 (Patent Document 1), oxides such as ruthenium oxide and nitrides such as molybdenum nitride (Patent Document 2) The invention relating to the electrocatalyst using) has been filed.
金属オキシナイトライドは水を可視光で分解する光触媒として開発されてきた(例えば、
非特許文献1、特許文献3〜5)が、これまで電極触媒としての利用は試みられてこなか
った。
Metal oxynitrides have been developed as photocatalysts that decompose water with visible light (eg,
一般に、酸性電解質中で0.4V以上の電極電位が高い状態では、炭化物を始めとする多くの
非白金系化合物は活性溶解し、安定に存在することができないことが報告されており(米
山宏ら、電気化学、41,719(1973))、電極触媒としての適用範囲は電極電位が低い場合に
限定されており、このような条件下において触媒能を維持して安定性を向上した電極触媒
を開発する必要があった。
In general, it has been reported that many non-platinum compounds such as carbides are actively dissolved and cannot exist stably when the electrode potential is higher than 0.4 V in an acidic electrolyte (Hiroshima Yoneyama et al. , Electrochemistry, 41,719 (1973)), the scope of application as an electrode catalyst is limited to the case where the electrode potential is low, and an electrode catalyst that maintains its catalytic ability and improves stability under such conditions is developed. There was a need.
遷移金属の酸化物や窒化物の中で、モリブデンや鉄、ニッケル系の4族又は5族元素以外
の酸化物や窒化物は酸性電解質中では活性溶解し安定に存在できない。貴金属系の酸化物
は酸素還元反応の活性点が、酸化物を形成することにより激減してしまうので、安定では
あるが、酸素還元触媒能が急激に低下してしまう。Ta,Nb,Ti,Zrからなる弁金属は酸素
との結合力が強く、酸化物が酸性電解質中でも安定に存在できる。
Among oxides and nitrides of transition metals, oxides and nitrides other than molybdenum, iron, and nickel-based
しかしながら、例えば、図11に、ジルコニウム酸化物の電流−電位曲線、図12に、チ
タン窒化物の電流−電位曲線を示すように、弁金属の酸化物や窒化物は酸素還元触媒能が
ない。なお、図11、図12は、0.1mol/dm3硫酸溶液中、30℃、窒素雰囲気及び酸素雰囲
気における5mV/sの電位走査速度で分極し、電流−電位曲線を測定して得られたものであ
る。参照電極として同濃度の硫酸溶液中での可逆水素電極を用いた。
However, as shown in FIG. 11 for example, the current-potential curve of zirconium oxide and the current-potential curve of titanium nitride in FIG. 12, the oxide and nitride of the valve metal have no oxygen reduction catalytic ability. 11 and 12 are obtained by measuring a current-potential curve after polarization at a potential scanning speed of 5 mV / s in a 0.1 mol / dm 3 sulfuric acid solution at 30 ° C. in a nitrogen atmosphere and an oxygen atmosphere. It is. A reversible hydrogen electrode in a sulfuric acid solution with the same concentration was used as a reference electrode.
酸化物中の酸素の一部を窒素で置換した遷移金属のオキシナイトライドは、光触媒機能を
有するものがあることが知られており、酸性電解質中で安定に存在することができる。し
かしながら、これらの遷移金属のオキシナイトライドは還元電流が小さく、触媒活性が低
く、これまで、酸性電解質中において可逆水素電極電位に対して0.4V以上の電位で使用さ
れるような遷移金属オキシナイトライドは見出されていなかった。
It is known that some transition metal oxynitrides obtained by substituting part of oxygen in an oxide with nitrogen have a photocatalytic function, and can exist stably in an acidic electrolyte. However, these transition metal oxynitrides have low reduction currents and low catalytic activity, and transition metal oxynitrides that have been used in acidic electrolytes at a potential of 0.4 V or higher with respect to the reversible hydrogen electrode potential. Ride was not found.
本発明は、Ta,Nb,Ti、Zrからなる弁金属の群から選択される少なくとも1つの金属を含
むオキシナイトライドからなる電極触媒を提供する。本発明者らは、電極触媒担体材料に
Ta,Nb,Ti、Zrからなる弁金属の群から選択される少なくとも一つの金属元素のオキ
シナイトライドをスパッタリング法により付着させる際に、担体材料を高温に加熱するこ
とによって得られた金属オキシナイトライド薄膜は、優れた触媒活性を示し、酸性電解質
中において可逆水素電極電位に対して0.4V以上の電位で使用しても溶解しない耐食性が得
られることを見出した。
The present invention provides an electrocatalyst comprising an oxynitride containing at least one metal selected from the group of valve metals comprising Ta, Nb, Ti, and Zr. When the present inventors deposit an oxynitride of at least one metal element selected from the group of valve metals consisting of Ta, Nb, Ti, and Zr on an electrode catalyst support material by a sputtering method, the support material is heated at a high temperature. The metal oxynitride thin film obtained by heating to a high temperature exhibits excellent catalytic activity and provides corrosion resistance that does not dissolve even when used at a potential of 0.4 V or higher relative to the reversible hydrogen electrode potential in an acidic electrolyte. I found.
すなわち、本発明は、(1)酸性電解質中において可逆水素電極電位に対して0.4V以
上の電位で使用される酸素還元電極触媒であって、該電極触媒は、担体材料表面にスパッ
タリング法により担体材料を200℃〜600℃に加熱した状態で付着させた厚み20n
m〜50nmのTa,Nb,Ti,Zrからなる弁金属の群から選択される少なくとも一
つの遷移金属元素のオキシナイトライド薄膜を有することを特徴とする酸素還元電極触媒
、である。
また、本発明は、(2)原子数比で遷移金属元素と酸素と窒素の比が、1±0.1:1±
0.1:1±0.1であることを特徴とする上記の酸素還元電極触媒、である。
That is, the present invention is (1) an oxygen reduction electrode catalyst used in an acidic electrolyte at a potential of 0.4 V or more with respect to the reversible hydrogen electrode potential, and the electrode catalyst is formed on the surface of the support material by a sputtering method. A thickness of 20n adhered to the carrier material while heated to 200 ° C to 600 ° C.
An oxygen reduction electrocatalyst having an oxynitride thin film of at least one transition metal element selected from the group of valve metals consisting of Ta, Nb, Ti, and Zr of m to 50 nm.
In the present invention, (2) the ratio of the transition metal element, oxygen, and nitrogen in the atomic ratio is 1 ± 0.1: 1 ±.
The oxygen-reducing electrocatalyst described above, wherein 0.1: 1 ± 0.1.
また、本発明は、(3)電極触媒担体が電子伝導性微粒子であることを特徴とする請求項
1記載の酸素還元電極触媒、である。
また、本発明は、(4)酸性電解質を用いる燃料電池用電極触媒として用いられることを
特徴とする上記の酸素還元電極触媒、である。
The present invention is also characterized in that (3) the electrode catalyst carrier is electron conductive fine particles.
1. The oxygen reduction electrode catalyst according to 1 .
Further, the present invention is (4) used as an electrode catalyst for a fuel cell using an acidic electrolyte.
The oxygen reduction electrode catalyst as described above.
また、本発明は、(5)電極触媒担体材料を200℃以上〜600℃に加熱した状態でT
a,Nb,Ti,Zrからなる弁金属の群から選択される少なくとも一つの遷移金属元素
のオキシナイトライドの厚み20nm〜50nmの薄膜をスパッタリング法により該担体
材料表面に付着させることを特徴とする上記の酸素還元電極触媒の製造方法、である。
In addition, the present invention provides (5) T in a state where the electrode catalyst support material is heated to 200 ° C. to 600 ° C.
at least one transition metal element selected from the group of valve metals consisting of a, Nb, Ti, Zr
A thin film of oxynitride of 20 nm to 50 nm in thickness is formed by sputtering.
A method for producing the oxygen reduction electrode catalyst as described above, wherein the oxygen reduction electrode catalyst is attached to a material surface .
従来知られている遷移金属のオキシナイトライドの粉末試料では電子伝導性が確保されず
、触媒活性は確認できなかった。本発明者は、スパッタリング法を用いて薄膜を作製する
ことにより、金属オキシナイトライドの電気抵抗の影響を低減でき、その結果、優れた触
媒活性を初めて見出した。金属オキシナイトライドの合成法には、金属酸化物と尿素の混
合物の加熱による方法、酸化物を高温のガス状窒素やアンモニア雰囲気中で処理する方法
などが知られているが、本発明によれば、酸素と窒素雰囲気を制御できるスパッタリング
法を用いた製膜によって、還元状態から酸化状態まで、金属の酸化状態を広範囲に制御す
ることができ、触媒活性を持つ酸化状態を実現することができた。
In the conventionally known transition metal oxynitride powder samples, the electron conductivity was not ensured, and the catalytic activity could not be confirmed. The present inventor has found that by producing a thin film by sputtering, it is possible to reduce the effects of electrical resistance of the metal oxynitride, a result was Heading first superior catalyst <br/> medium activity. Known methods for synthesizing metal oxynitrides include a method of heating a mixture of a metal oxide and urea, and a method of treating the oxide in a high-temperature gaseous nitrogen or ammonia atmosphere. For example, film formation using a sputtering method capable of controlling oxygen and nitrogen atmospheres can control a wide range of metal oxidation states from a reduced state to an oxidized state, thereby realizing an oxidized state having catalytic activity. It was.
本発明の製造方法で得られるTa,Nb,Ti、Zrからなる弁金属の群から選択される少なくと
も一つの金属元素のオキシナイトライド電極触媒は、酸性電解質中において高い電極電位
において高い耐食性を持ち、かつ優れた酸素還元触媒能を有する。
The oxynitride electrocatalyst of at least one metal element selected from the group of valve metals consisting of Ta, Nb, Ti and Zr obtained by the production method of the present invention has high corrosion resistance at high electrode potential in an acidic electrolyte. And has an excellent oxygen reduction catalytic ability.
本発明の製造方法で得られる電極触媒は、Ta,Nb,Ti、Zrからなる弁金属の群から選択さ
れる少なくとも一つの金属元素のオキシナイトライドからなり、酸性電解質中において可
逆水素電極電位に対して0.4V以上の電位で使用されるものである。
The electrode catalyst obtained by the production method of the present invention comprises oxynitride of at least one metal element selected from the group of valve metals consisting of Ta, Nb, Ti, and Zr, and has a reversible hydrogen electrode potential in an acidic electrolyte. On the other hand, it is used at a potential of 0.4V or more.
弁金属のTa,Nb,Ti、Zrは、いずれも酸化物が酸性電解質中、高電位で腐食せず、安定で
あり、これらの酸化物が触媒表面を形成することにより、触媒自体が安定に存在できる。
しかし、それらの酸化物には酸素還元触媒能がない。しかし、本発明の製造方法によって
、部分的に窒化しオキシナイトライドを形成することにより、電子状態が連続的に変化し
、ある特定の窒化度で触媒能を持つようになると考えられる。触媒能は、一般的には、原
子数比で遷移金属と酸素と窒素の比が、1±0.1:1±0.1:1±0.1付近が望ま
しい。
The valve metals Ta, Nb, Ti, and Zr are all stable because the oxide does not corrode at high potential in the acidic electrolyte, and these oxides form the catalyst surface, so the catalyst itself is stable. Can exist.
However, these oxides have no oxygen reduction catalytic ability. However, it is considered that the nitriding is partially nitrided to form oxynitride by the production method of the present invention, whereby the electronic state is continuously changed to have catalytic ability at a specific degree of nitriding. In general, the catalytic ability is preferably such that the ratio of transition metal, oxygen, and nitrogen is about 1 ± 0.1: 1 ± 0.1: 1 ± 0.1 in terms of the number of atoms.
本発明の製造方法で得られるTa,Nb,Ti、Zrからなる弁金属の群から選択される少なくと
も一つの金属元素のオキシナイトライド電極触媒は、炭素、酸化タングステンや酸化イリ
ジウムなど導電性酸化物等の電子伝導性粉末である触媒担体上にスパッタリング法により
薄膜を形成して用いることができる。電極触媒担体は、導電性と適度な耐食性を備えてい
れば特に限定されないが、電極触媒担体として十分な電子導電性を持っているチタンなど
の金属板、グラッシーカーボン、カーボンブラック、グラファイト化カーボン、活性炭な
どの導電性カーボン材料を使用することが望ましい。
The oxynitride electrode catalyst of at least one metal element selected from the group of valve metals consisting of Ta, Nb, Ti, and Zr obtained by the production method of the present invention is a conductive oxide such as carbon, tungsten oxide, or iridium oxide. A thin film can be formed by sputtering on a catalyst carrier that is an electron conductive powder such as the like. The electrode catalyst carrier is not particularly limited as long as it has conductivity and moderate corrosion resistance, but a metal plate such as titanium having sufficient electronic conductivity as an electrode catalyst carrier, glassy carbon, carbon black, graphitized carbon, It is desirable to use a conductive carbon material such as activated carbon.
これらの電極触媒担体は、導電性が十分とれるような状況にするために触媒層と接触する
面積が大きく取れる担体が望ましい。燃料電池の場合には、触媒をより細かくして、導電
性がよくとれるようにカーボン粉末とよく混合し、単位体積あたりの触媒量を多くするこ
とが好ましい。
These electrocatalyst carriers are preferably carriers that can take a large area in contact with the catalyst layer in order to obtain a state in which sufficient conductivity is obtained. In the case of a fuel cell, it is preferable to make the catalyst finer and mix well with carbon powder so as to obtain good conductivity, thereby increasing the amount of catalyst per unit volume.
スパッタリングにより製膜する厚さは、実用的には50nm程度以下が好ましい。薄膜の厚み
が50nmよりも大きくなるにつれて触媒層の電気抵抗が大きくなり、触媒自身の電気抵抗に
よるオーム降下によって、電流値が減少してしまい触媒能が低下する。また、厚みが薄く
なるにつれて下地の基材の影響を受け、また触媒の量が少なくなり触媒能が不十分となる
ため、20nm程度以上の厚みとすることが好ましい。
Practically, the thickness formed by sputtering is preferably about 50 nm or less. As the thickness of the thin film becomes larger than 50 nm, the electric resistance of the catalyst layer increases, and the current value decreases due to the ohmic drop due to the electric resistance of the catalyst itself, thereby reducing the catalytic performance. Further, as the thickness is reduced, the substrate is affected by the base material, and the amount of the catalyst is reduced and the catalytic ability becomes insufficient. Therefore, the thickness is preferably about 20 nm or more.
水電解・有機電解では板状の電極を用いることが多く、例えばチタン板基材の上に50nm以
下の厚さで成膜すればよい。燃料電池の電極触媒の場合は、カーボンなどの電子伝導性微
粒子に高分散させて用いることが好ましい。例えば、カーボン粉末からなる基材層を形成
し、その上に厚さ50nm以下に薄くスパッタリングすることにより触媒層を形成する。
In water electrolysis / organic electrolysis, plate-like electrodes are often used. For example, a film having a thickness of 50 nm or less may be formed on a titanium plate substrate. In the case of a fuel cell electrode catalyst, it is preferably used by being highly dispersed in electron conductive fine particles such as carbon. For example, a base material layer made of carbon powder is formed, and a catalyst layer is formed thereon by sputtering thinly to a thickness of 50 nm or less.
また、スパッタリングにより微粉末のオキシナイトライドを作製し、カーボン粉末と一緒
に混合してカーボンペーパーなどに塗布して電極触媒層として用いることができる。この
ときの触媒微粉末の粒径は50nm以下が好ましい。
Further, a fine powder of oxynitride can be produced by sputtering, mixed together with carbon powder, applied to carbon paper or the like and used as an electrode catalyst layer. The particle size of the catalyst powder in this case is preferably 50nm or less.
弁金属のTa,Nb,Zr,又はTiのオキシナイトライドを形成するスパッタリング方法の具体
例としては、Ta,Nb,Zr,又はTiをターゲットとして窒素分圧0.1〜0.5Pa、酸素分圧0.05
〜0.2Pa程度の窒素及び酸素の混合ガス雰囲気で反応性スパッタリングを行う。スパッタ
リングの基材となる触媒担体としては酸性電解質中、酸素雰囲気において安定である電子
伝導性微粒子、例えば、グラッシーカーボンなどを用いることができる。このとき、基材
を200℃以上に加熱することにより、より結晶性の高い電極触媒を得ることが出来、触媒
能の向上も図ることが出来る。
As a specific example of the sputtering method for forming the oxynitride of Ta, Nb, Zr, or Ti of the valve metal, the partial pressure of nitrogen is 0.1 to 0.5 Pa and the partial pressure of oxygen is 0.05 with Ta, Nb, Zr, or Ti as a target.
Reactive sputtering is performed in a mixed gas atmosphere of nitrogen and oxygen of about 0.2 Pa. As the catalyst carrier serving as a sputtering substrate, electron conductive fine particles that are stable in an oxygen atmosphere in an acidic electrolyte, such as glassy carbon, can be used. At this time, by heating the substrate to 200 ° C. or higher, an electrode catalyst having higher crystallinity can be obtained, and the catalytic ability can be improved.
図1に、ZrONに関して、図2に、TaONに関して、スパッタリング時の触媒担体の加熱温度
と酸素還元電流の関係を示す。触媒担体の加熱温度が200℃程度から明確な触媒活性が認
められ、加熱温度が上昇するにつれて触媒活性が大きくなり、600℃を超える加熱温度ま
で高い活性が得られる。実用的に好ましくは、400〜600℃程度である。触媒担体の加熱に
より、このような効果が得られる理由は明確ではないが、加熱により、金属オキシナイト
ライドの結晶性が向上し、酸素分子の吸着が促進され、さらにバンド構造が変化すること
により、吸着酸素種への電子移動反応の活性化エネルギーが減少し、結果として酸素還元
反応が促進されると推察される。
FIG. 1 shows the relationship between ZrON and FIG. 2 shows the relationship between the catalyst support heating temperature and the oxygen reduction current during sputtering for TaON. A clear catalytic activity is observed when the heating temperature of the catalyst carrier is about 200 ° C., and the catalytic activity increases as the heating temperature rises, and a high activity is obtained up to a heating temperature exceeding 600 ° C. Practically, it is preferably about 400 to 600 ° C. The reason why such an effect can be obtained by heating the catalyst carrier is not clear, but the heating improves the crystallinity of the metal oxynitride, promotes the adsorption of oxygen molecules, and further changes the band structure. It is presumed that the activation energy of the electron transfer reaction to the adsorbed oxygen species decreases, and as a result, the oxygen reduction reaction is promoted.
図3に、ZrONに関して、触媒担体の無加熱時の触媒活性のない試料と、触媒担体の500℃
での加熱時の触媒活性のある試料のXRDを示す。触媒担体の無加熱時はアモルファス状態
でXRDにはシャープなピークが確認されていないが、加熱時には結晶性が高くなっている
ことがわかる。
Fig. 3 shows a sample of ZrON having no catalyst activity when the catalyst support is not heated, and the catalyst support at 500 ° C.
2 shows the XRD of a sample with catalytic activity when heated at. When the catalyst support is not heated, it is in an amorphous state and a sharp peak is not confirmed in XRD, but it can be seen that the crystallinity increases when heated.
基材に相当する試験片として、直径5.2mm、長さ 20mmの円柱状グラッシーカーボンを用い
、その底面部にチタンオキシナイトライド薄膜をスパッタリング法により付着させた。ス
パッタ時のアルゴン分圧は1x10-1Pa、窒素分圧は4x10-1 Pa、酸素分圧は1x10-2Pa程度と
した。スパッタターゲットとしてTiを用いた。スパッタ時に基材を500℃で加熱した。水
晶振動式膜厚計を用いて、スパッタ量を計測し、薄膜の厚さがおよそ40nmのTiON電極触媒
を作製した。SEM観察によって、円柱状グラッシーカーボンの底面の表面全体が薄膜で覆
われていた。
As a test piece corresponding to the base material, cylindrical glassy carbon having a diameter of 5.2 mm and a length of 20 mm was used, and a titanium oxynitride thin film was adhered to the bottom surface portion thereof by a sputtering method. The argon partial pressure during sputtering was about 1 × 10 −1 Pa, the nitrogen partial pressure was about 4 × 10 −1 Pa, and the oxygen partial pressure was about 1 × 10 −2 Pa. Ti was used as a sputtering target. The substrate was heated at 500 ° C. during sputtering. The amount of spatter was measured using a quartz vibration type film thickness meter, and a TiON electrode catalyst having a thin film thickness of about 40 nm was produced. By SEM observation, the entire bottom surface of the cylindrical glassy carbon was covered with a thin film.
このようにして作製した電極の触媒能を酸素還元反応に対して評価した。作製した電極を
、0.1mol/dm3硫酸溶液中、30℃、窒素雰囲気及び酸素雰囲気における5mV/sの電位走査速
度で分極し、電流−電位曲線を測定した。参照電極として同濃度の硫酸溶液中での可逆水
素電極を用いた。酸素雰囲気での還元電流と窒素雰囲気での還元電流の差を、酸素還元電
流とし、触媒能を評価した。したがって、両者に差が現れ始める電位が高く、また、差が
より大きい方が触媒能が高いことを示す。
The catalytic ability of the electrode thus produced was evaluated for the oxygen reduction reaction. The prepared electrode was polarized in a 0.1 mol / dm 3 sulfuric acid solution at a potential scanning speed of 5 mV / s in a nitrogen atmosphere and an oxygen atmosphere at 30 ° C., and a current-potential curve was measured. A reversible hydrogen electrode in a sulfuric acid solution with the same concentration was used as a reference electrode. The difference between the reduction current in the oxygen atmosphere and the reduction current in the nitrogen atmosphere was defined as the oxygen reduction current, and the catalytic ability was evaluated. Therefore, the potential at which the difference starts to appear is high, and the larger the difference, the higher the catalytic ability.
図4に、作製したチタンオキシナイトライド薄膜の 電位が0.05Vから1.0Vの間で50mV/sで
走査したときの、温度30℃、窒素雰囲気での電流−電位曲線を示す。電位走査を繰り返し
ても、曲線の形状に変化はなく、硫酸溶液中で安定に存在することがわかった。
FIG. 4 shows a current-potential curve in a nitrogen atmosphere at a temperature of 30 ° C. when the potential of the produced titanium oxynitride thin film was scanned at 50 mV / s between 0.05 V and 1.0 V. It was found that even when the potential scan was repeated, the shape of the curve did not change and existed stably in the sulfuric acid solution.
図5に、窒素雰囲気及び酸素雰囲気での、走査速度を5mV/sと遅くした場合の電位走査に
より得られる電流−電位曲線を示す。酸素雰囲気において、窒素雰囲気と比較して、約0.
5Vから還元電流が観察され、これは酸素還元反応に対して触媒活性があることを示してい
る。
FIG. 5 shows a current-potential curve obtained by potential scanning when the scanning speed is slowed down to 5 mV / s in a nitrogen atmosphere and an oxygen atmosphere. Compared with nitrogen atmosphere in oxygen atmosphere, it is about 0.
A reduction current is observed from 5 V, indicating that it has catalytic activity for the oxygen reduction reaction.
比較例1
基材を加熱しない以外は、実施例1と同じ条件でおよそ40nmのTiON電極触媒を作製した。
Comparative Example 1
A 40 nm TiON electrode catalyst was produced under the same conditions as in Example 1 except that the substrate was not heated.
図6に、基材を500℃で加熱した試料(実施例1)と無加熱で作製した試料(比較例1)
の酸素還元に対する電流−電位曲線を示す。測定条件は前記と同じとした。無加熱の場合
は、還元電流が小さく、触媒活性が低い。それに対して、500℃で加熱した場合は、より
高電位から還元電流が観察される。これは、基材を加熱することにより、酸素還元触媒能
が向上していることを示している。
FIG. 6 shows a sample (Example 1) in which the substrate was heated at 500 ° C. and a sample prepared without heating (Comparative Example 1).
2 shows a current-potential curve with respect to oxygen reduction. The measurement conditions were the same as described above. In the case of no heating, the reduction current is small and the catalytic activity is low. On the other hand, when heated at 500 ° C., a reduction current is observed from a higher potential. This indicates that the oxygen reduction catalytic ability is improved by heating the substrate.
スパッタターゲットとしてZrを用いた他は実施例1と同じ条件で、皮膜の厚さがおよそ40
nmのジルコニウムオキシナイトライド電極触媒を作製した。このようにして作製した電極
の触媒能を酸素還元反応に対して評価した。測定条件は実施例1と同じである。
The film thickness is about 40 under the same conditions as in Example 1 except that Zr is used as the sputtering target.
A zirconium oxynitride electrocatalyst of nm was prepared. The catalytic ability of the electrode thus produced was evaluated for the oxygen reduction reaction. The measurement conditions are the same as in Example 1.
図7に、作製したジルコニウムオキシナイトライド薄膜の、電位が0.05Vから1.0Vの間で5
0mV/sで走査したときの、温度30℃、窒素雰囲気での電流−電位曲線を示す。電位走査を
繰り返しても、曲線の形状に変化はなく、硫酸溶液中で安定に存在することがわかった。
FIG. 7 shows that the prepared zirconium oxynitride thin film has a potential of 0.05 V to 1.0 V and 5
A current-potential curve in a nitrogen atmosphere at a temperature of 30 ° C. when scanned at 0 mV / s is shown. It was found that even when the potential scan was repeated, the shape of the curve did not change and existed stably in the sulfuric acid solution.
図8に、窒素雰囲気及び酸素雰囲気での、走査速度を5mV/sと遅くした場合の電位走査に
より得られる電流−電位曲線を示す。酸素雰囲気において、窒素雰囲気と比較して、約0.
7Vから還元電流が観察され、これは酸素還元反応に対して触媒活性があることを示してい
る。
FIG. 8 shows a current-potential curve obtained by potential scanning when the scanning speed is slowed down to 5 mV / s in a nitrogen atmosphere and an oxygen atmosphere. Compared with nitrogen atmosphere in oxygen atmosphere, it is about 0.
A reduction current is observed from 7V, indicating that it has catalytic activity for the oxygen reduction reaction.
比較例2
基材を加熱しない以外は、実施例2と同じ条件でおよそ40nmのZrON電極触媒を作製した。
Comparative Example 2
A ZrON electrocatalyst of approximately 40 nm was produced under the same conditions as in Example 2 except that the substrate was not heated.
図9に、基材を500℃で加熱した試料(実施例2)と無加熱で作製した試料(比較例2)の
酸素還元に対する電流−電位曲線を示す。測定条件は前記と同じとした。無加熱の場合は
、還元電流が小さく、触媒活性が低い。それに対して、500℃で加熱した場合は、より高
電位から還元電流が観察される。これは、基材を加熱することにより、酸素還元触媒能が
向上していることを示している。
FIG. 9 shows current-potential curves for oxygen reduction of a sample (Example 2) in which the substrate was heated at 500 ° C. and a sample (Comparative Example 2) produced without heating. The measurement conditions were the same as described above. In the case of no heating, the reduction current is small and the catalytic activity is low. On the other hand, when heated at 500 ° C., a reduction current is observed from a higher potential. This indicates that the oxygen reduction catalytic ability is improved by heating the substrate.
スパッタターゲットとしてTaを用いた他は実施例1と同じ条件で、皮膜の厚さがおよそ
40nmのタンタルオキシナイトライド電極触媒を作製した。このようにして作製した電極の
触媒能を酸素還元反応に対して評価した。測定条件は実施例1と同じである。
The thickness of the coating is approximately the same as in Example 1 except that Ta is used as the sputtering target.
A 40 nm tantalum oxynitride electrode catalyst was prepared. The catalytic ability of the electrode thus produced was evaluated for the oxygen reduction reaction. The measurement conditions are the same as in Example 1.
比較例3
基材を加熱しない以外は、実施例3と同じ条件でおよそ40nmのTaON電極触媒を作製した。
Comparative Example 3
A TaON electrode catalyst of approximately 40 nm was produced under the same conditions as in Example 3 except that the substrate was not heated.
図10に、基材を500℃で加熱した試料(実施例3)と無加熱で作製した試料(比較例3)
の酸素還元に対する電流−電位曲線を示す。測定条件は前記と同じとした。無加熱の場合
は、還元電流が小さく、触媒活性が低い。それに対して、500℃で加熱した場合は、より
高電位から還元電流が観察される。これは、基材を加熱することにより、酸素還元触媒能
が向上していることを示している。
FIG. 10 shows a sample in which the substrate was heated at 500 ° C. (Example 3) and a sample prepared without heating (Comparative Example 3).
2 shows a current-potential curve with respect to oxygen reduction. The measurement conditions were the same as described above. In the case of no heating, the reduction current is small and the catalytic activity is low. On the other hand, when heated at 500 ° C., a reduction current is observed from a higher potential. This indicates that the oxygen reduction catalytic ability is improved by heating the substrate.
本発明の電極触媒は、水電解、無機・有機電解、燃料電池などの分野において酸性電解質
に接触して用いられる電気化学システム用の電極触媒として用いられ、スパッタリング法
による薄膜は、安価な材料を用いて電気抵抗の影響を低減できる薄膜を製造できる方法と
して有用である。
Electrode catalysts of the present invention, water electrolysis, inorganic-organic electrolyte is used as an electrode catalyst for electrochemical systems used in contact with an acidic electrolyte in the field, such as fuel cells, a sputtering method
Is a useful method for producing a thin film capable of reducing the influence of electrical resistance using an inexpensive material.
Claims (5)
元電極触媒であって、該電極触媒は、担体材料表面にスパッタリング法により担体材料を
200℃〜600℃に加熱した状態で付着させた厚み20nm〜50nmのTa,Nb,
Ti,Zrからなる弁金属の群から選択される少なくとも一つの遷移金属元素のオキシナ
イトライド薄膜を有することを特徴とする酸素還元電極触媒。
An oxygen reduction electrocatalyst used in an acidic electrolyte at a potential of 0.4 V or higher with respect to the reversible hydrogen electrode potential, the electrocatalyst being coated with a support material on the surface of the support material by sputtering
Ta, Nb, having a thickness of 20 nm to 50 nm deposited in a heated state at 200 ° C. to 600 ° C.
An oxygen reduction electrocatalyst comprising an oxynitride thin film of at least one transition metal element selected from the group of valve metals consisting of Ti and Zr.
ることを特徴とする請求項1記載の酸素還元電極触媒。The oxygen reduction electrocatalyst according to claim 1.
媒。Medium.
の酸素還元電極触媒。Oxygen reduction electrode catalyst.
る弁金属の群から選択される少なくとも一つの遷移金属元素のオキシナイトライドの厚み
20nm〜50nmの薄膜をスパッタリング法により該担体材料表面に付着させることを
特徴とする請求項1ないし4のいずれかに記載の酸素還元電極触媒の製造方法。 Thickness of oxynitride of at least one transition metal element selected from the group of valve metals consisting of Ta, Nb, Ti, and Zr when the electrode catalyst support material is heated to 200 ° C. to 600 ° C.
Method for producing an oxygen reduction electrode catalyst according to any one of claims 1 to 4, <br/> characterized that you adhere to the carrier material surface by sputtering a thin film of 20 nm to 50 nm.
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