JP4535841B2 - 圧電薄膜共振子及びこれを用いたフィルタ - Google Patents
圧電薄膜共振子及びこれを用いたフィルタ Download PDFInfo
- Publication number
- JP4535841B2 JP4535841B2 JP2004313727A JP2004313727A JP4535841B2 JP 4535841 B2 JP4535841 B2 JP 4535841B2 JP 2004313727 A JP2004313727 A JP 2004313727A JP 2004313727 A JP2004313727 A JP 2004313727A JP 4535841 B2 JP4535841 B2 JP 4535841B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- piezoelectric
- piezoelectric thin
- outer peripheral
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02149—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02118—Means for compensation or elimination of undesirable effects of lateral leakage between adjacent resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/132—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials characterized by a particular shape
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/174—Membranes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/0421—Modification of the thickness of an element
- H03H2003/0428—Modification of the thickness of an element of an electrode
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Description
この種の圧電薄膜共振器は一般にFBAR(Film Bulk Acoustic Resonator)として知られており、例えば特許文献1〜3に記載されている。
20 下部電極
30 圧電膜
40 上部電極
50 空隙(又は音響多層膜)
60 共振部
70、80 非共振部
90 付加膜
Claims (13)
- 基板と、該基板上に形成された下部電極と、該下部電極及び前記基板上に形成された圧電膜と、該圧電膜を挟んで前記下部電極に対向する部分を有するように前記圧電膜上に形成された上部電極とを有し、前記対向する部分における前記圧電膜の外周部のうち、前記上部電極の引き出し部と重なる部分以外の外周部の全てが、前記上部電極と前記下部電極とが対向して形成された領域の外周部と略一致し、前記圧電膜がポアソン比1/3以下の材料で形成され、前記下部電極は前記領域の下に形成された空隙に露出し、前記対向する部分における圧電膜の外周部の少なくとも一部は前記空隙上に位置し、前記下部電極と前記圧電膜とが前記空隙に露出する面積は、前記領域を形成する下部電極の前記空隙に露出する面積より広く、前記上部電極の引き出し部上の、前記対向する部分に近接する領域全てに付加膜を設け、前記上部電極のうち、前記引き出し部以外の部分の外周部は、前記圧電膜の外周部と略一致することを特徴とする圧電薄膜共振子。
- 前記圧電膜の外周部の25%以上が、前記領域の外周部と略一致していることを特徴とする請求項1記載の圧電薄膜共振子。
- 前記圧電膜の外周部の50%以上が、前記領域の外周部と略一致していることを特徴とする請求項1記載の圧電薄膜共振子。
- 前記領域は楕円形状を有することを特徴とする請求項1から3のいずれか一項記載の圧電薄膜共振子。
- 前記領域は不規則な多角形であり、該多角形を形成する少なくとも2辺は平行でないことを特徴とする請求項1から3のいずれか一項記載の圧電薄膜共振子。
- 前記圧電膜はAlNを主成分としていることを特徴とする請求項1から5のいずれか一項記載の圧電薄膜共振子。
- 前記付加膜は金属膜であることを特徴とする請求項1から6のいずれか一項記載の圧電薄膜共振子。
- 前記付加膜は、アルミニウムを主成分とする単層膜又は多層膜であることを特徴とする請求項1から7のいずれか一項記載の圧電薄膜共振子。
- 前記付加膜と前記対向する部分の外周部との最短距離が、当該対向する部分の厚さの2倍以下であることを特徴とする請求項1から8のいずれか一項記載の圧電薄膜共振子。
- 前記付加膜と前記対向する部分の外周部との最短距離が3μm以下であることを特徴とする請求項1から8のいずれか一項記載の圧電薄膜共振子。
- 前記圧電膜の外周部はパターニングで形成されたエッジを含むことを特徴とする請求項1から10のいずれか一項記載の圧電薄膜共振子。
- 前記領域は、厚み縦振動モードの共振子を形成していることを特徴とする請求項1から11のいずれか一項記載の圧電薄膜共振子。
- 請求項1から12のいずれか一項に記載の前記圧電薄膜共振子を少なくとも1つ含むフィルタ。
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004313727A JP4535841B2 (ja) | 2004-10-28 | 2004-10-28 | 圧電薄膜共振子及びこれを用いたフィルタ |
| KR1020050095651A KR100753705B1 (ko) | 2004-10-28 | 2005-10-11 | 압전 박막 공진자 및 이를 이용한 필터 |
| EP10170336A EP2259425A1 (en) | 2004-10-28 | 2005-10-26 | Piezoelectric thin-film resonator and filter using the same |
| EP05256649A EP1653612A3 (en) | 2004-10-28 | 2005-10-26 | Piezoelectric thin-film resonator and filter using the same |
| US11/259,347 US7884527B2 (en) | 2004-10-28 | 2005-10-27 | Piezoelectric thin-film resonator and filter using the same |
| CNB2005101170072A CN100505531C (zh) | 2004-10-28 | 2005-10-28 | 压电薄膜谐振器及使用该压电薄膜谐振器的滤波器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004313727A JP4535841B2 (ja) | 2004-10-28 | 2004-10-28 | 圧電薄膜共振子及びこれを用いたフィルタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006128993A JP2006128993A (ja) | 2006-05-18 |
| JP4535841B2 true JP4535841B2 (ja) | 2010-09-01 |
Family
ID=35655698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004313727A Expired - Lifetime JP4535841B2 (ja) | 2004-10-28 | 2004-10-28 | 圧電薄膜共振子及びこれを用いたフィルタ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7884527B2 (ja) |
| EP (2) | EP1653612A3 (ja) |
| JP (1) | JP4535841B2 (ja) |
| KR (1) | KR100753705B1 (ja) |
| CN (1) | CN100505531C (ja) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005073175A (ja) * | 2003-08-27 | 2005-03-17 | Fujitsu Media Device Kk | 圧電薄膜共振子及びその製造方法 |
| JP4719623B2 (ja) * | 2006-05-31 | 2011-07-06 | 太陽誘電株式会社 | フィルタ |
| JP5027534B2 (ja) * | 2006-07-07 | 2012-09-19 | 日本碍子株式会社 | 圧電薄膜デバイス |
| JP4968900B2 (ja) | 2006-10-17 | 2012-07-04 | 太陽誘電株式会社 | ラダー型フィルタの製造方法 |
| JP4838093B2 (ja) | 2006-10-25 | 2011-12-14 | 太陽誘電株式会社 | 圧電薄膜共振器およびフィルタ |
| JP2008182543A (ja) * | 2007-01-25 | 2008-08-07 | Ube Ind Ltd | 薄膜圧電共振器とそれを用いた薄膜圧電フィルタ |
| JP5080858B2 (ja) * | 2007-05-17 | 2012-11-21 | 太陽誘電株式会社 | 圧電薄膜共振器およびフィルタ |
| WO2009011022A1 (ja) | 2007-07-13 | 2009-01-22 | Fujitsu Limited | 圧電薄膜共振素子及びこれを用いた回路部品 |
| JP5563739B2 (ja) * | 2008-02-20 | 2014-07-30 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタ、デュープレクサ、通信モジュール、および通信装置 |
| JP5147932B2 (ja) | 2008-03-04 | 2013-02-20 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタ、通信モジュール、および通信装置 |
| JP5226409B2 (ja) * | 2008-07-17 | 2013-07-03 | 太陽誘電株式会社 | 共振デバイス、通信モジュール、通信装置、共振デバイスの製造方法 |
| US8242664B2 (en) * | 2008-12-26 | 2012-08-14 | Nihon Dempa Kogyo Co., Ltd. | Elastic wave device and electronic component |
| JP4944145B2 (ja) | 2009-03-19 | 2012-05-30 | 太陽誘電株式会社 | 圧電薄膜共振子、フィルタ、通信モジュール、通信装置 |
| JP5319491B2 (ja) | 2009-10-22 | 2013-10-16 | 太陽誘電株式会社 | 圧電薄膜共振子 |
| JP5792554B2 (ja) * | 2011-08-09 | 2015-10-14 | 太陽誘電株式会社 | 弾性波デバイス |
| KR101856060B1 (ko) * | 2011-12-01 | 2018-05-10 | 삼성전자주식회사 | 체적 음향 공진기 |
| US20130280557A1 (en) * | 2012-04-24 | 2013-10-24 | Electronics And Telecommunications Research Institute | Ultrasonic rechargeable battery module and ultrasonic rechargeable battery apparatus of polyhedral structure including the same |
| JP6336712B2 (ja) * | 2013-01-28 | 2018-06-06 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびデュプレクサ |
| JP5591977B2 (ja) * | 2013-04-30 | 2014-09-17 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタ、デュープレクサ、通信モジュール、および通信装置 |
| JP6325798B2 (ja) | 2013-11-11 | 2018-05-16 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびデュプレクサ |
| JP6333540B2 (ja) * | 2013-11-11 | 2018-05-30 | 太陽誘電株式会社 | 圧電薄膜共振子、フィルタ、及び分波器 |
| JP6325799B2 (ja) | 2013-11-11 | 2018-05-16 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびデュプレクサ |
| JP6368298B2 (ja) * | 2015-12-14 | 2018-08-01 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびデュプレクサ |
| JP6668201B2 (ja) | 2016-08-31 | 2020-03-18 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびマルチプレクサ。 |
| US10256788B2 (en) * | 2017-03-31 | 2019-04-09 | Avago Technologies International Sales Pte. Limited | Acoustic resonator including extended cavity |
| JP7259872B2 (ja) * | 2019-01-31 | 2023-04-18 | 株式会社村田製作所 | 弾性波装置 |
| CN111106812A (zh) * | 2019-12-30 | 2020-05-05 | 武汉大学 | 一种高性能薄膜体声波谐振器及其制备方法 |
| CN113098426A (zh) * | 2021-03-15 | 2021-07-09 | 武汉大学 | 高频低损耗滤波器、谐振器及制备方法 |
| CN114301411B (zh) * | 2021-09-23 | 2023-02-17 | 武汉敏声新技术有限公司 | 一种体声波谐振器和体声波滤波器 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3382381A (en) * | 1965-05-27 | 1968-05-07 | Piezo Technology Inc | Tab plateback |
| JPS60149215A (ja) * | 1983-12-29 | 1985-08-06 | Nec Corp | 圧電薄膜複合振動子 |
| JP2644855B2 (ja) | 1988-10-24 | 1997-08-25 | 株式会社日立製作所 | 弾性波フィルタ、及びそれを用いたアンテナ分波器 |
| US5504388A (en) * | 1993-03-12 | 1996-04-02 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive element having electrode film(s) with specified surface roughness |
| KR970013677A (ko) * | 1995-08-17 | 1997-03-29 | 빈센트 비. 인그라시아 | 밀봉된 캐비티를 가진 박막 압전 공진기와 그 조립방법 |
| WO1999037023A1 (en) * | 1998-01-16 | 1999-07-22 | Mitsubishi Denki Kabushiki Kaisha | Thin film pietoelectric element |
| JP4326151B2 (ja) | 1998-05-08 | 2009-09-02 | アバゴ・テクノロジーズ・ワイヤレス・アイピー(シンガポール)プライベート・リミテッド | 薄膜圧電振動子 |
| US6150703A (en) * | 1998-06-29 | 2000-11-21 | Trw Inc. | Lateral mode suppression in semiconductor bulk acoustic resonator (SBAR) devices using tapered electrodes, and electrodes edge damping materials |
| JP2000165187A (ja) | 1998-11-30 | 2000-06-16 | Kyocera Corp | 圧電共振子 |
| US6215375B1 (en) * | 1999-03-30 | 2001-04-10 | Agilent Technologies, Inc. | Bulk acoustic wave resonator with improved lateral mode suppression |
| FI107660B (fi) * | 1999-07-19 | 2001-09-14 | Nokia Mobile Phones Ltd | Resonaattorirakenne |
| US6441539B1 (en) * | 1999-11-11 | 2002-08-27 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator |
| US7296329B1 (en) * | 2000-02-04 | 2007-11-20 | Agere Systems Inc. | Method of isolation for acoustic resonator device |
| US6424237B1 (en) * | 2000-12-21 | 2002-07-23 | Agilent Technologies, Inc. | Bulk acoustic resonator perimeter reflection system |
| US6469597B2 (en) * | 2001-03-05 | 2002-10-22 | Agilent Technologies, Inc. | Method of mass loading of thin film bulk acoustic resonators (FBAR) for creating resonators of different frequencies and apparatus embodying the method |
| JP2005236337A (ja) * | 2001-05-11 | 2005-09-02 | Ube Ind Ltd | 薄膜音響共振器及びその製造方法 |
| JP4441843B2 (ja) | 2001-06-15 | 2010-03-31 | 宇部興産株式会社 | 薄膜音響共振器 |
| TWI242883B (en) * | 2001-06-28 | 2005-11-01 | Winbond Electronics Corp | Manufacturing process of high-frequency thin-film bulk acoustic wave filter and apparatus thereof |
| JP3939939B2 (ja) * | 2001-07-17 | 2007-07-04 | 富士通株式会社 | 圧電薄膜共振素子の製造方法 |
| JP3944372B2 (ja) * | 2001-09-21 | 2007-07-11 | 株式会社東芝 | 圧電薄膜振動子及びこれを用いた周波数可変共振器 |
| JP4055885B2 (ja) * | 2001-10-29 | 2008-03-05 | Tdk株式会社 | 圧電薄膜振動素子、及びこれを用いたフィルタ |
| JP3969224B2 (ja) * | 2002-01-08 | 2007-09-05 | 株式会社村田製作所 | 圧電共振子及びそれを用いた圧電フィルタ・デュプレクサ・通信装置 |
| US20040021529A1 (en) * | 2002-07-30 | 2004-02-05 | Bradley Paul D. | Resonator with protective layer |
| US7005946B2 (en) | 2002-08-06 | 2006-02-28 | The Charles Stark Draper Laboratory, Inc. | MEMS piezoelectric longitudinal mode resonator |
| US20040027030A1 (en) * | 2002-08-08 | 2004-02-12 | Li-Peng Wang | Manufacturing film bulk acoustic resonator filters |
| JP3986400B2 (ja) * | 2002-09-09 | 2007-10-03 | 富士通メディアデバイス株式会社 | フィルタ、フィルタ装置及びその製造方法 |
| JP4128836B2 (ja) * | 2002-09-27 | 2008-07-30 | Tdk株式会社 | 薄膜圧電共振子、それを用いたフィルタ及びデュプレクサ |
| JP2005033379A (ja) * | 2003-07-09 | 2005-02-03 | Tdk Corp | 薄膜バルク波振動子およびその製造方法 |
| JP2005094735A (ja) * | 2003-08-12 | 2005-04-07 | Murata Mfg Co Ltd | 電子部品およびその製造方法 |
| US7242270B2 (en) * | 2003-10-30 | 2007-07-10 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Decoupled stacked bulk acoustic resonator-based band-pass filter |
| EP1533896B1 (en) * | 2003-11-20 | 2011-11-02 | Panasonic Corporation | Piezoelectric element, composite piezoelectric element, and filter, duplexer and communication equipment using the same |
-
2004
- 2004-10-28 JP JP2004313727A patent/JP4535841B2/ja not_active Expired - Lifetime
-
2005
- 2005-10-11 KR KR1020050095651A patent/KR100753705B1/ko not_active Expired - Lifetime
- 2005-10-26 EP EP05256649A patent/EP1653612A3/en not_active Ceased
- 2005-10-26 EP EP10170336A patent/EP2259425A1/en not_active Ceased
- 2005-10-27 US US11/259,347 patent/US7884527B2/en not_active Expired - Lifetime
- 2005-10-28 CN CNB2005101170072A patent/CN100505531C/zh not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006128993A (ja) | 2006-05-18 |
| CN100505531C (zh) | 2009-06-24 |
| US20060091764A1 (en) | 2006-05-04 |
| KR100753705B1 (ko) | 2007-08-30 |
| CN1767380A (zh) | 2006-05-03 |
| EP1653612A3 (en) | 2007-06-27 |
| US7884527B2 (en) | 2011-02-08 |
| EP2259425A1 (en) | 2010-12-08 |
| EP1653612A2 (en) | 2006-05-03 |
| KR20060052188A (ko) | 2006-05-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4535841B2 (ja) | 圧電薄膜共振子及びこれを用いたフィルタ | |
| US11699988B2 (en) | Resonator and method for manufacturing the same | |
| KR102642910B1 (ko) | 음향 공진기 및 그 제조 방법 | |
| CN101953072B (zh) | 兰姆波谐振器 | |
| CN101796727B (zh) | 弹性边界波装置 | |
| CN101278479B (zh) | 薄膜体声波(baw)谐振器或相关改进 | |
| CN100474766C (zh) | 压电薄膜谐振器以及使用其的滤波器 | |
| KR101242314B1 (ko) | 압전 박막 공진 소자 및 이를 이용한 회로 부품 | |
| CN111010138A (zh) | 高q值体声波谐振器 | |
| JP2002374144A (ja) | 薄膜圧電共振器 | |
| JP4541147B2 (ja) | バルク弾性波フィルタにおける通過帯域リップルを抑制する手段を有するバルク弾性波共振器 | |
| JP4324182B2 (ja) | 薄膜バルク音響共振器および表面音響波共振器が集積された集積フィルタおよびその製造方法 | |
| CN111010116B (zh) | 带有高度渐变的凸起结构的体声波谐振器、滤波器和电子设备 | |
| CN113922781B (zh) | 一种体声波谐振器以及通信器件 | |
| JPWO2009139108A1 (ja) | 弾性境界波装置 | |
| Zou et al. | Transverse mode suppression in the AlN lamb wave resonators by “piston mode” | |
| JP2008182543A (ja) | 薄膜圧電共振器とそれを用いた薄膜圧電フィルタ | |
| CN110417375B (zh) | 一种体声波谐振器 | |
| CN114584102A (zh) | 射频谐振器及滤波器 | |
| CN100576735C (zh) | 滤波器的噪声抑制方法 | |
| JP5040172B2 (ja) | 薄膜圧電共振器と薄膜圧電フィルタ | |
| CN222441678U (zh) | 横向激励体声波谐振器及滤波器 | |
| JP2008172638A (ja) | 薄膜圧電共振器 | |
| JP4802714B2 (ja) | バルク音波共振器 | |
| JP2004235886A (ja) | 圧電薄膜素子 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060817 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090717 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090728 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090901 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091020 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091120 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20091124 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100105 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100330 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20100414 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20100428 |
|
| TRDD | Decision of grant or rejection written | ||
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20100430 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100608 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100615 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130625 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4535841 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130625 Year of fee payment: 3 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130625 Year of fee payment: 3 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |