JP4535886B2 - Standard gas preparation device and performance inspection device using the same - Google Patents

Description

  The present invention relates to a standard gas preparation device that prepares a standard gas containing a plurality of predetermined gases, and in particular, a chemical substance adsorption system building material, a decomposition system building material, and an air purifier as a measure for reducing indoor chemical contamination. The present invention relates to a standard gas preparation device effective for performing a performance test of a machine and the like and an improvement of a performance inspection device using the same.

<Sick house problem and revised Building Standards Act>
In recent years, health damage caused by indoor chemical pollution has been increasing one after another, and the sick house problem has become a social issue. In order to solve this kind of social problem, the Building Standard Law was revised in July 2003, and measures to reduce chemical contamination in buildings were shown.
<Contamination-reducing building materials, equipment and household items>
With regard to this type of reduction measure, there is an increasing expectation for chemical substance adsorption building materials and chemical substance decomposition building materials from the viewpoint of prevention of sick house. Against this background, product development of various building materials has been actively conducted, and removal / decomposition performance tests for chemical substances of products have been demanded.
In addition, expectations for the chemical substance removal / decomposition function of products (base materials) typified by air purifiers and ozonolysis-utilizing equipment are increasing, and performance tests are also required for this.
Further, among daily necessities, for example, daily anti-pollution products represented by charcoal products have high expectations for the chemical substance removal / decomposition function, and similar performance tests are required.

<Confirmation of chemical removal and decomposition performance>
Test methods relating to chemical removal and decomposition performance of pollution-reducing building materials / equipment and daily necessities have already been presented. For example, for building materials and equipment with reduced pollution, performance testing methods are presented by accredited organizations such as Bettering. As for the air cleaner, a performance test method for the same problem is presented by the Japan Electrical Manufacturers' Association (JEMA). In addition, a test bill that is more rigorous than the test method has already been presented by the Society for Architectural Architectural Engineers of Japan, a study group for indoor air countermeasures consisting of four related ministries and universities, research institutes, etc. The committee is considering.
The presented performance tests are divided into short-term tests that run from one day to several days and long-term tests that run from weeks to months. In particular, in long-term tests, confirmation of long-term effects is required, which is effective in that the durability of the chemical substance removal / decomposition effect of the product is revealed.

<Necessity of standard gas preparation equipment>
Under these circumstances, any test method (short-term test, long-term test) needs to release gaseous pollutants to the test chamber on a regular basis, and this kind of test method is realized. In the apparatus system, a standard gas steady-state generator (standard gas preparation apparatus) using a predetermined gaseous pollutant chemical as a standard gas is indispensable as an element connected to the test chamber.
Thus, the need for a standard gas preparation device has become very large, and it is required to prepare a standard gas according to the test application easily and accurately.

  As a standard gas preparation device in the past, a standard gas with a predetermined concentration for cylinder filling is prepared, and this standard gas is diluted with a constant flow of dilution gas (cylinder filling method), or a commercially available permeation tube And a method using a permeator (registered trademark) using a diffusion tube (permeator method) (for example, Patent Document 1, Non-Patent Document 1).

JP 2003-35635 A (refer to the prior art) Calibration gas preparation device (Permeator manufactured by Gastec Co., Ltd.) [Searched on November 25, 1999], Internet <http://www.gastec.co.jp/seihin/permeater/pd230_top.htm>

However, among the standard gas preparation devices, the former mode (cylinder filling method) requires an expensive dilution device equipped with a flow meter, a pressure reducing valve, etc., and a large amount of dilution gas is used. However, in the case of multi-stage dilution, the process becomes complicated and the reliability of the concentration of the standard gas finally obtained tends to be lowered.
In addition, when there are a plurality of types of standard gases desired by the user, it is necessary to fill the common cylinders with a plurality of types of standard gases at a predetermined concentration in advance. At this time, when filling various standard gases in the common cylinder, a standard gas having a predetermined concentration is prepared in advance and stored in each individual cylinder, and each standard gas in the stored individual cylinder is stored in the common cylinder. Since it is necessary to fill, the process of manufacturing a common cylinder filled with a plurality of types of standard gases becomes complicated, and the manufacturing equipment and manufacturing cost increase accordingly, and the manufactured common cylinder itself is extremely A situation arises in which it must be expensive.

  On the other hand, in the latter mode (permeator method), when the liquid material of the target gas is inserted into the permeation tube and diffusion tube and the permeation tube and diffusion tube are held at a constant temperature, the liquefied gas in the permeation tube Since the amount of osmosis and diffusion and the amount of evaporation and diffusion of the liquid in the diffusion tube are constant, if both tubes are kept at a constant temperature and a dilution gas such as air or nitrogen is sent to it at a constant flow rate, a minute amount A standard gas having a concentration is continuously generated.

However, this permeator system has the following technical problems.
(1) Since the liquid material of the target gas must be inserted into a given tube and the tube must be kept at a constant temperature (for example, 40 ° C.), a large amount of standard gas can be stably generated. Difficult to do.
(2) Since the production efficiency of the standard gas is low, the production cost of the standard gas may increase.
(3) Since the osmotic diffusion amount of the liquefied gas and the evaporation diffusion amount of the liquid cannot be made constant until the temperature in the tube is stabilized, there is a possibility that the time required for generating the standard gas increases.
(4) Changes in the installation environment conditions (temperature, pressure) of the permeator easily affect the generation rate of the standard gas, and it is difficult to maintain the standard gas at a predetermined concentration.

(5) For example, when the chemical solution is a mixture, it may be difficult to use as a standard gas preparation device, and the standard gas desired by the user may not be generated.
As an example, a case where a mixed chemical solution of two substances (A, B) having different specific gravities is used.
Here, assuming a case where the specific gravity of the substance B is smaller than that of the substance A, there is a tendency that a separation phenomenon occurs in which the substance B exists in the upper part and the substance A settles below in the tube. Under such circumstances, in a state where both substances A and B are completely mixed, both substances will be vaporized without any problem. However, if the separation phenomenon of both substances A and B occurs over time, There is a concern that the substance B is generated and the substance A is generated later, and the uniformity of the standard gas is impaired.
Another example is a mixed chemical solution having different boiling points.
Here, assuming that the boiling point of the substance B is smaller than the boiling point of the substance A, there is a concern that the substance B is generated first and then the substance A is generated, and the uniformity of the standard gas is impaired. is there. For example, formaldehyde applies to the above case. That is, for the generation of formaldehyde, a commercially available formalin solution composed of 30 percent of formalin and pure water is used, and there is a possibility that the above-described problem based on the difference in boiling point may occur.

  The present invention has been made to solve the above technical problems, and can arbitrarily combine a plurality of kinds of gases according to the user's request, and a standard gas containing a plurality of kinds of gases can be used. A standard gas preparation device that can be prepared easily and efficiently, and a performance inspection device using the standard gas preparation device are provided.

  That is, as shown in FIG. 1A, the present invention has a reagent container 2 (for example, 2a to 2n) that can store a plurality of liquid reagents, and distributes and supplies an appropriate amount of liquid reagent from each reagent container 2. And a vaporizing chamber 4 to which the liquid reagent dispensed from the reagent dispensing unit 1 is dropped, and a vaporizing chamber 3 for completely vaporizing the liquid reagent dropped to the vaporizing receptacle 4; A dilution chamber 5 that communicates with the vaporization chamber 3 and dilutes the vaporized gas vaporized in the vaporization chamber 3, a dilution gas supply means 6 that supplies an appropriate amount of dilution gas to the dilution chamber 5, and a dilution chamber 5 are connected to the dilution chamber 5. The standard gas discharge means 7 for discharging the standard gas in which the vaporized gas vaporized in the vaporization chamber 3 and the dilution gas in the dilution chamber 5 are mixed is provided.

In such technical means, the present invention presupposes a standard gas preparation device that prepares a standard gas containing a plurality of types of gas components.
Here, the standard gas may be appropriately selected as long as it is determined in advance according to the application. For example, volatile organic compounds (VOC) are mainly targeted. Is included.

  In addition, the reagent distribution means 1 is based on the premise that it has a reagent container 2 (for example, 2a to 2n) that can accommodate a plurality of liquid reagents when preparing a standard gas containing a plurality of gas components, and at least each liquid reagent. It is necessary to have a structure capable of distributing an appropriate amount. At this time, from the viewpoint of preventing the mixture of a plurality of types of liquid reagents, it is preferable to provide the supply paths for the plurality of types of liquid reagents separately, but from the viewpoint of simplifying the configuration of the reagent distribution means 1. In this case, a structure in which a plurality of types of liquid reagent supply paths are partially shared is preferable. However, in a mode in which a part of the supply path of the liquid reagent is shared, from the viewpoint of effectively avoiding the mixture of a plurality of types of liquid reagents, the supply path is changed every time the supply operation of each liquid reagent is completed. It is preferable to add a cleaning mechanism for cleaning.

Furthermore, the vaporization chamber 3 needs to have a vaporization receiver 4 into which the liquid reagent distributed from the reagent distribution means 1 is dropped. The vaporization receiver 4 may be any one that receives a reagent to be vaporized, and typically a vaporization dish is used.
Furthermore, the dilution chamber 5 needs to communicate with the vaporization chamber 3 via the communication port 3a, and is used for diluting the vaporized gas vaporized in the vaporization chamber 3.
Thus, by separately providing the vaporization chamber 3 and the dilution chamber 5, the generation of vaporized gas and the dilution process can be performed efficiently. Therefore, the aspect which makes a vaporization chamber and a dilution chamber one, for example, the aspect which introduce | transduces dilution gas into the thermostat as a vaporization chamber, is excluded.

The dilution chamber 5 is connected to a dilution gas supply means 6 for supplying an appropriate amount of dilution gas. As the dilution gas supply means 6, a dedicated dilution gas may be used, but normal air may be used after being cleaned.
Further, the standard gas discharge means 7 may be appropriately selected as long as the generated standard gas can be completely discharged from the dilution chamber 5.

In such a standard gas preparation device, a typical embodiment of the vaporization chamber 3 is preferably an embodiment including a heater 4a capable of heating the vaporization receiver 4 above the boiling point of each liquid reagent to be distributed. In this embodiment, the liquid reagent dropped on the vaporization receiver 4 can be completely vaporized in the aspect in which the vaporization receiver 4 includes the heater 4a. Further, since the boiling point of each liquid reagent varies, it is preferable that the heater 4a is configured to be capable of variable temperature control.
Furthermore, as a preferable aspect of the vaporization chamber 3, an aspect in which the vaporization receiver 4 that can vibrate in a state including the position where the liquid reagent is dropped is included. According to this aspect, it is possible to promote vaporization of the liquid reagent by using the oscillating vaporization receiver 4.

Moreover, as a typical aspect of the dilution chamber 5, the aspect arrange | positioned so that the vaporization chamber 3 may be mentioned is mentioned. Here, it is sufficient that the dilution chamber 5 and the vaporization chamber 3 communicate with each other, and the dilution chamber 5 and the vaporization chamber 3 may be arranged in parallel and connected via a communication pipe, but from the viewpoint of simplifying the installation space and the communication structure. For example, a mode in which the dilution chamber 5 is disposed so as to surround the vaporization chamber 3 is preferable.
Furthermore, as a preferable aspect of the dilution chamber 5, an aspect in which a forced stirring and mixing means 8 for forcibly stirring and mixing the vaporized gas and the dilution gas is included. According to this aspect, the dilution mixing process in the dilution chamber 5 can be performed uniformly and reliably.

Furthermore, as a preferable aspect of the dilution chamber 5, the aspect provided with the humidity regulator which can adjust the humidity of an internal atmosphere is mentioned. According to this aspect, the humidity condition of the standard gas prepared in the dilution chamber 5 can be adjusted.
And as a preferable aspect of the dilution chamber 5, the aspect provided with the heating means which can heat an internal atmosphere is mentioned. According to this aspect, by appropriately heating the atmosphere in the dilution chamber 5 with fire, the standard gas in the dilution chamber 5 can be discharged in a surely vaporized state, and self-cleaning in the dilution chamber 5 can be performed. It is also possible to do this.
Further, as an aspect that is effective in accurately adjusting the concentration and flow rate of the standard gas, a mode in which the reagent distribution unit 1, the dilution gas supply unit 6, and the standard gas discharge unit 7 are each provided with a flow rate adjustment unit. . According to this aspect, the flow rate and concentration of the distribution liquid reagent, the dilution gas, and the standard gas can be accurately prepared.

Further, the present invention is not limited to the standard gas preparation device, but also targets a performance inspection device using the same.
In this case, according to the present invention, as shown in FIG. 1B, the inspection chamber 12 in which the performance inspection object 15 is accommodated and the standard gas prepared by the standard gas preparation device 10 described above are supplied to the inspection chamber 12. A standard gas supply device 11 for supplying an appropriate amount and a measurement device 13 for capturing and measuring exhaust gas from the inspection chamber 12 supplied with the standard gas are provided.

In such technical means, the performance inspection object 15 includes, for example, a chemical substance adsorption system building material and a decomposition system material expected from the viewpoint of prevention of sick house, as well as an air purifier, an ozone decomposing apparatus, and the like. .
In addition, the standard gas supply device 11 is not limited to a mode in which the standard gas prepared by the standard gas preparation device 10 is directly supplied to the inspection chamber 12, but indirectly after the standard gas is sealed in the gas cylinder. The aspect supplied to is also included.
In the former embodiment, the standard gas supply device 11 includes the standard gas preparation device 10 and may supply the standard gas prepared by the standard gas preparation device 10 directly to the inspection chamber 12. In the latter embodiment, the standard gas supply device 11 has a gas cylinder filled with the standard gas prepared by the standard gas preparation device 10 and supplies the standard gas in the gas cylinder to the inspection chamber 12. Anything is acceptable.
Further, the measuring device 13 includes a device for measuring the concentration, flow rate, temperature, humidity and the like of the exhaust gas component.

According to the standard gas preparation apparatus of the present invention, a plurality of types of liquid reagents are sequentially distributed and supplied into the vaporization chamber, and after the liquid reagent is vaporized by vaporization in the vaporization chamber, the vaporized gas is supplied into the dilution chamber. Since it was guided and diluted with a dilution gas and discharged as a standard gas through the standard gas discharge means, even if the chemical solution is a mixture, it can be easily vaporized by vaporization, and multiple types It is possible to easily and accurately prepare a standard gas containing the gas components.
Further, according to the performance inspection apparatus according to the present invention, a standard gas containing a plurality of types of gas components can be easily and accurately prepared by the standard gas preparation apparatus, and this standard gas can be used for performance inspection. The performance inspection can be realized easily and accurately.

Hereinafter, the present invention will be described in detail based on embodiments shown in the accompanying drawings.
Embodiment 1
FIG. 2 shows Embodiment 1 of a standard gas preparation device to which the present invention is applied.
In the figure, a standard gas preparation device 20 prepares a standard gas containing a plurality of types of gas components made of, for example, volatile organic compounds (VOC), and distributes and supplies a plurality of types of liquid reagents. A distribution supply device 21; a vaporization chamber 22 for vaporizing the liquid reagent distributed and supplied by the distribution supply device 21; a dilution chamber 23 for diluting the vaporized gas vaporized in the vaporization chamber 22 with a dilution gas; A standard gas discharger 24 for discharging a standard gas (a mixed gas of vaporized gas and dilution gas) generated in the dilution chamber 23 is provided.

Here, the gas component contained in the standard gas is appropriately selected according to the application. For example, the standard gas used for measuring indoor air pollutants includes formaldehyde (HCHO), dichloromethane (CH ₂ Cl _2), acetone _{((CH 3)} 2 CO), chloroform (CHCl _3), n-hexane _{(n-C 6 H 14)} , ethanol _{(C 2} H 5 OH), 1,1,1-trichloroethane (1, 1,1-C ₂ H ₃ Cl ₃ ), tetrachloromethane (CCl ₄ ), ethyl acetate (CH ₃ COOC ₂ H ₅ ), methyl ethyl ketone (CH ₃ COC ₂ H ₅ ), 2,4-dimethylpentane (2, _{4- (CH 3) 2 C 5} H 10), benzene _{(C 6} H _6), 1,2- dichloroethane _{(1,2-C 2 H 4 Cl} 2), trichloroethane Roechiren _{(C 2} HCl 3), 1,2- dichloropropane _{(1,2-C 3 H 6 Cl} 2), n- heptane _{(n-C 7 H 16)} , 1- butanol (2- _(CH 3) C ₃ H ₆ OH), toluene _{(C 7 H} 8), methyl isobutyl ketone [2-methyl-4-pentane] _{(2CH 3 CO (1-C} 4 H 9)), n- butanol _(n-C 4 _{H 9} OH), chloro dibromomethane (CHClBr _2), tetrachlorethylene _(C 2 _Cl 4), butyl acetate _{(CH 3 COOC 4 H 9)} , n- octane _{(n-C 8 H 18)} , ethylbenzene _{((C 2 H} 5) C ₆ H _5), p- xylene _{(p-C 8 H 10)} , m- xylene _{(m-C 8 H 10)} , o- xylene _{(o-C 8 H 10)} , styrene _{((C 2 H} 3) C ₆ H ₅ ), n-nonane (n-C ₉ H ₂₀ ), α-pinene (α-C ₉ H ₂₀ ), 1,3,5-trimethylbenzene [mesitylene] (1,3,5- (CH ₃ ) ₃ C ₆ H ₃ ), 1,2,4-trimethylbenzene [pseudocumene] (1,2,4- (CH ₃ ) ₃ C ₆ H ₃ ), p-dichlorobenzene (p-C ₆ H ₄ Cl ₂ ), n-decane (NC ₁₀ H ₂₂ ), 1,2,3-trimethylbenzene (1,2,3- (CH ₃ ) ₃ C ₆ H ₃ ), (+) limonene ((+) C ₁₀ H ₁₆ ), n - undecane _{(n-C 11 H 24)} , n- dodecane _{(n-C 12 H 26)} , nitrogen _{(n 2)} is obtained by appropriately mixing the like.
In particular, in the present embodiment, the standard gas preparation device 20 mainly generates a gas component obtained by vaporizing a liquid reagent. Therefore, among the gas components, an object that vaporizes the liquid reagent is a generation target. To do. In addition, what is necessary is just to make it mix separately the gas component produced | generated with the standard gas preparation apparatus 20 of this Embodiment, and the said gaseous gas component when originally mixing a gaseous gas component.

In the present embodiment, the distribution supply device 21 has a plurality of reagent containers 31 (31a, 31b, 31c...) In which a plurality of types of liquid reagents are accommodated, and between each reagent container 31 and the vaporization chamber 22. Are connected through a supply pipe 32.
Here, the supply pipe 32 includes a main supply pipe 33 connected to the vaporization chamber 22 and branch supply pipes 34 (34a, 34b, 34c...) Branched from the main supply pipe 33 into a plurality of parts and connected to the reagent containers 31. In addition, a switching valve 35 is provided at a connection portion between the main supply pipe 33 and each branch supply pipe 34, and the supply valve path can be switched and selected by the switch valve 35.
Further, a supply pump 36 for supplying the liquid reagent in the supply pipe 32 to the vaporization chamber 22 is disposed in a part of the main supply pipe 33, while each branch supply pipe 34 (34a, 34b, 34c). ..) Are provided with mass flow controllers 37 (37a, 37b, 37c...) For adjusting the supply amount of the liquid reagent.
In this embodiment, since a plurality of liquid reagents pass through the main supply pipe 33, it is preferable to take care not to mix each liquid reagent. For example, the supply pressure by the supply pump 36 is set to be high to some extent so that the supply operation of the liquid reagent is stabilized, and the main supply pipe 33 is cleaned by the cleaning mechanism whenever the supply operation of each liquid reagent is completed as necessary. To do. Here, as a cleaning mechanism, it is possible to appropriately select an air blowing method, a heating method, etc., but when adopting a heating method, for example, VOC is a substance having a vaporization temperature of 50 to 260 ° C., for example. When the main supply pipe 33 is heated at about 300 ° C., most of VOC and SVOC (Semi Volatile Organic Compounds) can be removed.

  Further, in the present embodiment, the vaporization chamber 22 has, for example, a substantially box-shaped space, and a pipe insertion port 22a is opened at a substantially central portion of the upper wall of the vaporization chamber 22, and the pipe insertion port 22a. The main supply pipe 33 is inserted through the main supply pipe 33 so that one end of the main supply pipe 33 protrudes into the vaporization chamber 22.

In the present embodiment, as shown in FIG. 3A, the vaporizing dish 40 is provided with a tray 42 on a support base 41, and the support base 41 corresponds to a position directly below the tray 42, for example, a planar heater. 43 and a temperature sensor 44 for detecting the temperature of the tray 42 are provided, and the temperature controller 45 controls the heating of the heater 43 based on temperature information from the temperature sensor 44.
Here, as the tray 42, a corrosion-resistant material having good thermal conductivity (for example, various ceramics such as stainless steel and glass) is used. The temperature control device 45 variably sets the target temperature of the heater 43 in accordance with the type of liquid reagent to be dropped. The target temperature of the heater 43 is the temperature of the tray 42 heated by the heater 43. Is selected so as to be equal to or higher than the vaporization temperature of the liquid reagent to be dropped.
The configuration of the vaporizing dish 40 may be selected as appropriate, for example, by providing a support base 41 fixedly. However, for example, as shown in FIG. A movable table 46 that reciprocates at high speed may be provided, and a support base 41 may be fixed on the movable table 46 so that the vaporizing dish 40 can vibrate. According to this aspect, vaporization of the liquid reagent can be promoted by using the oscillating vaporizing dish 40.

Further, in the present embodiment, the dilution chamber 23 has a substantially box-shaped space and is disposed so as to surround the vaporization chamber 22, and a pipe insertion port is provided at a substantially central portion of the upper wall of the dilution chamber 23. 23a is established, and the main supply pipe 33 is inserted through the pipe insertion port 23a.
A communication port 48 is formed in a part of the side wall of the vaporization chamber 22 above the location where the vaporization dish 40 is disposed, so that the vaporization chamber 22 and the dilution chamber 23 are connected to each other. It has become.

Furthermore, a dilution gas supply device 60 is connected to a part of the side wall of the dilution chamber 23. The dilution gas supply device 60 has, for example, a dilution gas supply pipe 61 whose one end opens into the air. A purifier 62 is interposed in a part of the dilution gas supply pipe 61 and a supply pump 63 for supplying the dilution gas. Further, a part of the dilution gas supply pipe 61 is provided with a mass flow controller 64 for adjusting the flow rate of the dilution gas. In addition, the aspect which uses the exclusive cylinder filled with exclusive gases, such as hydrocarbon gas, as the dilution gas supply device 60, and supplies the dilution gas from an exclusive cylinder directly may be sufficient.
In the dilution chamber 23, a stirring fan 70 for forcibly stirring and mixing the dilution gas and the vaporized gas is disposed. From the viewpoint of suppressing atmospheric contamination in the dilution chamber 23, only the fan main body of the stirring fan 70 is arranged in the dilution chamber 23, and the drive unit of the fan main body is arranged outside the dilution chamber 23. It is preferable to make it.

Further, a heating device 71 is attached to the dilution chamber 23. The heating device 71 heats the atmosphere in the dilution chamber 23 and keeps the standard gas in the dilution chamber 23 in a vaporized state.
In addition, a pressure reducing pipe 74 is connected to the dilution chamber 23 and a pressure regulator 75 is attached to the pressure reducing pipe 74. The pressure regulator 75 reduces the pressure in the dilution chamber 23 and the vaporizing chamber 22. The vaporization of the liquid reagent is promoted.

  Further, in the present embodiment, the standard gas discharger 24 has a discharge pipe 81 attached to a part of the side wall of the dilution chamber 23, and a discharge pump 82 is disposed in a part of the discharge pipe 81. A mass flow controller 83 for adjusting the discharge flow rate of the discharged gas component is provided.

Next, the operation of the standard gas preparation device according to this embodiment will be described.
In FIG. 2, the distributor / supplier 21 selects the supply pipe 32 path communicating with any of the plurality of reagent containers 31 (31a, 31b, 31c...) By sequentially switching the switching valve 35, and supplies the supply pump 36 and The corresponding mass flow controller 37 (37a, 37b, 37c...) Distributes and sucks a predetermined amount of the predetermined liquid reagent from the corresponding reagent container 31 and supplies it to the vaporizing chamber 22.
At this time, since the inside of the vaporizing chamber 22 is depressurized by the pressure regulator 75 and is in a negative pressure state, the liquid reagent in the main supply pipe 33 is added to the negative pressure in the vaporizing chamber 22 in addition to the supply pressure of the supply pump 36. And is supplied to the vaporizing chamber 22.
In the vaporization chamber 22, the liquid reagent is dropped from the tip of the main supply pipe 33 and is received by the vaporization dish 40. Then, since the vaporizing dish 40 is raised to the vaporizable temperature in the heater 43, the liquid reagent received by the vaporizing dish 40 is instantly vaporized, and the vaporized gas G1 fills the vaporizing chamber 22 and communicates. The dilution chamber 23 is also filled through the port 48.

On the other hand, a predetermined amount of dilution gas G0 is introduced into the dilution chamber 23 from the dilution gas supply device 60.
In this state, the vaporization gas G1 and the dilution gas G0 are mixed in the dilution chamber 23 (including the vaporization chamber 22 in this example), but in this embodiment, the atmosphere in the dilution chamber 23 is agitated. Since it is forcibly stirred and mixed by the fan 70, a mixed gas of a predetermined amount of vaporized gas G1 and a predetermined amount of diluted gas G0 is prepared in a uniform state and at a predetermined concentration in the dilution chamber 23.

Thereafter, the standard gas discharger 24 discharges the mixed gas Gm in the dilution chamber 23 to the standard gas collection unit (not shown) as a standard gas component by the discharge pump 82 and the mass flow controller 83 to the standard gas. Adjust the discharge flow rate of one gas component.
In addition, since the atmosphere in the dilution chamber 23 is heated to a predetermined temperature by the heating device 71, there is no concern that the vaporized gas G1 of the mixed gas Gm in the dilution chamber 23 is liquefied, and the mixed gas Gm is in a vaporized state. Keep. For this reason, in the present embodiment, the mixed gas Gm does not remain in the dilution chamber 23, and the dilution chamber 23 is self-cleaned.

  In this way, each gas component of the standard gas obtained by vaporizing each liquid reagent is generated from the standard gas preparation device 20 described above, and is collected in a standard gas collection unit (not shown).

Embodiment 2
FIG. 4 shows Embodiment 2 of a standard gas preparation device to which the present invention is applied.
In the figure, the basic configuration of the standard gas preparation device 20 is substantially the same as that of the first embodiment, but unlike the first embodiment, the dilution chamber 23 is provided with a humidity controller 79.
In the present embodiment, the dilution chamber 23 is connected to a tank 76 in which pure water 77 is stored via a communication pipe 78, and a humidity controller 79 is provided in the middle of the communication pipe 78, so that the dilution chamber is provided. The humidity of the atmosphere in 23 is adjusted. Components similar to those in the first embodiment are denoted by the same reference numerals as those in the first embodiment, and detailed description thereof is omitted here.

  According to the present embodiment, in addition to having the same effect as in the first embodiment, it is possible to adjust the humidity of the atmosphere in the dilution chamber 23, and the humidity condition of each gas component of the standard gas can be adjusted. Standard gases with different humidity conditions can be easily prepared.

Embodiment 3
FIG. 5 shows an example of a performance inspection apparatus using the standard gas preparation apparatus 20 (Embodiment 3).
In the figure, the performance inspection apparatus includes an inspection chamber 100 in which a performance inspection object 90 is accommodated, and a standard gas supply apparatus 110 that supplies the standard gas prepared by the standard gas preparation apparatus 20 in the inspection chamber 100. And a measuring device 120 that captures and measures the exhaust gas from the inspection chamber 100. In this example, for example, an aspect using an air cleaner expected from the viewpoint of prevention of sick house is clearly shown as the performance inspection object 90, but is not limited to this, and other equipment, chemical substance adsorption system or decomposition System building materials may be used.

  In the present embodiment, the inspection chamber 100 has a substantially box-shaped space, and includes a diffusion fan 101 for uniform diffusion on a part of the inner wall. The inspection chamber 100 is provided with a movable base (not shown) that can move forward and backward. A performance inspection object 90 is placed on the movable base outside the inspection chamber 100 and is movable within the inspection chamber 100. The performance inspection object 90 is accommodated in the inspection chamber 100 as the table moves forward.

The standard gas supply device 110 includes the standard gas preparation device 20 used in the first or second embodiment, and the discharge end side of the discharge pipe 81 of the standard gas discharger 24 is communicated with the inspection chamber 100. It is connected. The diffusion fan 101 in the inspection chamber 100 is disposed near the opening end of the discharge pipe 81.
In this example, the standard gas supply device 110 directly supplies the gas components generated by the standard gas preparation device 20 sequentially into the inspection chamber 100 as a standard gas collection unit. The gas component generated by the apparatus 20 may be once collected in a standard gas collecting unit (not shown) different from the inspection chamber 100 and then supplied to the inspection chamber 100.

Further, the measuring apparatus 120 connects a measurement pipe 121 to the inspection chamber 100. A sampling sampler 122 (for example, a carbon-based collection pipe) is detachably attached to the measurement pipe 121 and a constant flow pump 123 is provided. In addition, a gas meter 124 for monitoring is provided in a part of the measurement pipe 121, and a flow meter 125 for measuring the flow rate of the sample gas in the measurement pipe 121 is provided.
Here, as a standard gas collection and analysis method by the measuring device 120, a solid collection-heat desorption-gas chromatograph mass spectrometry (GC / MS) method or a photoacoustic method is used.
In the former method, for example, a predetermined collection flow rate and sampling time are determined, a sample gas (sample air in the inspection chamber 100) is collected by the sampler 122 to obtain an analysis sample, and the collected analysis sample is heated. It introduces into GC / MS using the introduction device and performs qualitative and quantitative analysis.
On the other hand, in the latter method, the sample gas is introduced into the gas meter 124 and the change with time of the sample gas concentration in the inspection chamber 100 is monitored.

Next, the operation of the performance inspection apparatus according to the present embodiment will be described.
First, the inner wall of the inspection chamber 100, the diffusion fan 101, the air cleaner 90 that is a performance inspection object, and the like are cleaned.
Next, after setting the air cleaner 90 in the inspection chamber 100, the inside of the inspection chamber 100 is awakened for several hours, and the VOC concentration of the outside air in the inspection chamber 100 and the temperature and humidity in the inspection chamber 100 are adjusted.
In this state, after measuring the VOC initial concentration in the inspection chamber 100, each gas component of the standard gas is sequentially introduced into the inspection chamber 100 while being diffused by the diffusion fan 101.
Thereafter, the sample gas is monitored by the gas meter 124, and after confirming that the steady concentration has been reached, the concentration in the inspection chamber 100 is stabilized.
Thereafter, the VOC concentration of the sample gas during the non-operating period of the air cleaner 90 is measured, and further, the air cleaner 90 is operated under a predetermined condition, and the VOC concentration of the sample gas during the operating period of the air cleaner 90 is measured. .
The performance of the air cleaner 90 can be evaluated by observing the change state of the VOC concentration of the sample gas.

Embodiment 4
FIG. 6 shows another example (Embodiment 4) of a performance inspection apparatus using the standard gas preparation apparatus 20.
In the figure, the performance inspection apparatus includes an inspection chamber 100, a standard gas supply apparatus 110, and a measurement apparatus 120, as in the second embodiment, but the standard gas supply apparatus 110 is the same as that of the second embodiment. It is a different aspect.
In the figure, a standard gas supply device 110 has a gas cylinder 130 in which each gas component of the standard gas prepared in the standard gas preparation device 20 used in the first embodiment or the second embodiment is enclosed. The gas cylinder 130 and the inspection chamber 100 are connected by a connection pipe 131, and a mass flow controller 132 is disposed in the connection pipe 131 so that a certain amount of gas component is supplied into the inspection chamber 100 from the gas cylinder 130. It is a thing. Note that the gas cylinder 130 is not necessarily singular and may be plural.
Therefore, also in the present embodiment, it becomes possible to fill the inspection chamber 100 with a predetermined standard gas, and the performance of the performance inspection object 90 accommodated in the inspection chamber 100 is substantially the same as in the third embodiment. Can be evaluated.

(A) is explanatory drawing which shows the outline | summary of the standard gas preparation apparatus based on this invention, (b) is explanatory drawing which shows the outline | summary of the performance inspection apparatus based on this invention. It is explanatory drawing which shows Embodiment 1 of the standard gas preparation apparatus which concerns on this invention. (A) (b) is explanatory drawing which shows the typical aspect of the vaporization dish used in Embodiment 1. FIG. It is explanatory drawing which shows Embodiment 2 of the standard gas preparation apparatus which concerns on this invention. It is explanatory drawing which shows Embodiment 3 of the performance inspection apparatus which concerns on this invention. It is explanatory drawing which shows Embodiment 4 of the performance inspection apparatus which concerns on this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Reagent distribution means, 2 (2a-2n) ... Reagent container, 3 ... Vaporization chamber, 3a ... Communication port, 4 ... Vaporization receiver, 4a ... Heater, 5 ... Dilution chamber, 6 ... Dilution gas supply means, 7 ... Standard Gas discharge means 8 ... Forced stirring and mixing means 10 ... Standard gas preparation device 11 ... Standard gas supply device 12 ... Inspection chamber 13 ... Measurement device 15 ... Performance inspection object

Claims (11)

Reagent distribution means that has a reagent container that can store a plurality of liquid reagents, and distributes and supplies an appropriate amount of liquid reagent from each reagent container;
A vaporization chamber in which the liquid reagent distributed from the reagent distribution means is dropped, and a vaporization chamber for completely vaporizing the liquid reagent dropped in the vaporization receiver;
A dilution chamber that communicates with the vaporization chamber and dilutes the vaporized gas vaporized in the vaporization chamber;
Dilution gas supply means for supplying an appropriate amount of dilution gas to the dilution chamber;
A standard gas discharge means connected to the dilution chamber and discharging a standard gas in which the vaporized gas vaporized in the vaporization chamber and the dilution gas in the dilution chamber are mixed;
A standard gas preparation device comprising: The standard gas preparation device according to claim 1, wherein
The vaporization chamber is provided with a heater that can heat the vaporization receiver above the boiling point of each liquid reagent to be distributed. The standard gas preparation device according to claim 1, wherein
A standard gas preparation device, wherein the vaporization chamber includes a vaporization receiver that can vibrate in a state including a position where a liquid reagent is dropped. The standard gas preparation device according to claim 1, wherein
The standard gas preparation apparatus, wherein the dilution chamber is disposed so as to surround the vaporization chamber. The standard gas preparation device according to claim 1, wherein
The dilution chamber is provided with a forced stirring and mixing means for forcibly stirring and mixing the vaporized gas and the diluted gas. The standard gas preparation device according to claim 1, wherein
A standard gas preparation apparatus, wherein the dilution chamber includes a humidity controller capable of adjusting the humidity of the internal atmosphere. The standard gas preparation device according to claim 1, wherein
A standard gas preparation apparatus, wherein the dilution chamber includes a heating means capable of heating an internal atmosphere. The standard gas preparation device according to claim 1, wherein
A standard gas preparation device, wherein the reagent distribution means, the dilution gas supply means, and the standard gas discharge means each include a flow rate adjustment means. An inspection chamber for accommodating performance inspection objects;
A standard gas supply device for supplying an appropriate amount of the standard gas prepared by the standard gas preparation device according to claim 1 to an inspection chamber;
A performance inspection apparatus comprising: a measurement device that captures and measures exhaust gas from an inspection chamber to which a standard gas is supplied. The performance inspection apparatus according to claim 9, wherein
The standard gas supply device includes a standard gas preparation device and supplies the standard gas prepared by the standard gas preparation device directly to the inspection chamber. The performance inspection apparatus according to claim 9, wherein
The standard gas supply device has a gas cylinder filled with the standard gas prepared by the standard gas preparation device, and supplies the standard gas in the gas cylinder to the inspection chamber.

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