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JP5359484B2 - Solvent gas processing equipment - Google Patents
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JP5359484B2 - Solvent gas processing equipment - Google Patents

Solvent gas processing equipment Download PDF

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JP5359484B2
JP5359484B2 JP2009096866A JP2009096866A JP5359484B2 JP 5359484 B2 JP5359484 B2 JP 5359484B2 JP 2009096866 A JP2009096866 A JP 2009096866A JP 2009096866 A JP2009096866 A JP 2009096866A JP 5359484 B2 JP5359484 B2 JP 5359484B2
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gas
solvent
solvent gas
processing apparatus
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JP2010249353A (en
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大輔 青木
巧治 清水
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Panasonic Corp
Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a solvent gas treatment device always carrying out accurate and stable evaluation of a treatment capacity of a volatile organic compound, and simplifying a configuration. <P>SOLUTION: The solvent gas treatment device includes a nozzle hole 129 having a port blowing out solvent gas vaporized by a vaporizing tube 121, a blower A 136 supplying dilution gas to be mixed with the solvent gas, a solvent gas generator 100 supplying solvent liquid to the heated vaporizing tube by a pump to carry out heating vaporization and to provide the solvent gas and generating diluted solvent gas by mixing the dilution gas supplied by the blower A 136 with the solvent gas blown out of the nozzle hole, and a solvent gas treatment device body 200 treating treatment reception gas. Evaluation operation of the treatment capacity of the solvent gas of the solvent gas treatment device body by supply of the diluted treatment gas, and treatment operation of the treatment reception gas by supply of the treatment reception gas can be carried out, and the treatment reception gas is supplied to the solvent gas treatment device body by the blower A 136. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

本発明は、揮発性有機化合物(VOC:Volatile Organic Compounds)等の揮発性化合物を含む排気ガス(被処理気体)を浄化処理する溶剤ガス処理装置およびその運転方法並びに溶剤ガス処理装置の処理能力の評価に用いる溶剤ガス発生装置に関するものである。   The present invention relates to a solvent gas processing apparatus for purifying exhaust gas (gas to be processed) containing a volatile compound such as volatile organic compounds (VOC), an operating method thereof, and a processing capacity of the solvent gas processing apparatus. The present invention relates to a solvent gas generator used for evaluation.

近年、生活環境に近接した中小規模事業場や畜産業からの悪臭苦情が増加し、また、苦情の原因となる悪臭の発生源が多様化する傾向がある。中でも、印刷・塗装工場等から排出されるガスに含まれる揮発性有機化合物(溶剤ガス)は悪臭をもたらすだけでなく、浮遊粒子状物質(SPM)や光化学オキシダント等の原因物質でもある。このため、個々の事業所におけるVOC排出削減に向けた対策が求められている。また、平成18年に大気汚染防止法が改正され、大規模施設等における揮発性有機化合物の排出基準値等が設定された。   In recent years, odor complaints from small and medium-sized businesses and livestock industries close to the living environment have increased, and the sources of odor causing complaints tend to diversify. Among them, volatile organic compounds (solvent gases) contained in gases discharged from printing / painting plants and the like not only cause bad odor, but are also causative substances such as suspended particulate matter (SPM) and photochemical oxidants. For this reason, measures for reducing VOC emissions at individual offices are required. In 2006, the Air Pollution Control Law was amended to set emission standards for volatile organic compounds in large-scale facilities.

悪臭の脱臭方法として、可燃性を呈する炭化水素などの一般的に揮発性有機化合物と称されるガスを浄化処理する方法は、分解方式(燃焼、触媒分解など)、除去・分離方式(吸着、冷却凝縮などで、回収方式も含む)、生物脱臭方式に大別される。   As a method for deodorizing bad odors, there are methods for purifying gases generally called volatile organic compounds such as flammable hydrocarbons such as decomposition methods (combustion, catalytic decomposition, etc.), removal / separation methods (adsorption, It is roughly divided into biological deodorization methods such as cooling condensation, including recovery methods).

前記浄化処理方法及びその装置においては、従来から一般的に処理装置の入り口側における発生源からの被処理ガス(被処理気体)中の揮発性有機化合物成分および処理装置の出口側における処理ガス中の揮発性有機化合物成分の濃度を濃度計測器で計測し、浄化処理能力の把握および装置の全体的な制御等をおこなっていた。   In the purification treatment method and apparatus therefor, conventionally, in general, the volatile organic compound component in the gas to be processed (the gas to be processed) from the generation source on the inlet side of the processing apparatus and the processing gas on the outlet side of the processing apparatus The concentration of volatile organic compound components was measured with a concentration meter, and the purification treatment capacity was grasped and the overall control of the apparatus was performed.

前記した処理装置の代表的な例として、下記のものがある。揮発性有機化合物の除去状態を正確に把握するため、排ガス中に含まれる揮発性化合物を除去するとともに再生可能な排ガス処理部の処理機能を監視する排ガス処理監視装置であって、前記排ガス(被処理気体)の流路に沿って前記排ガス処理部に流入する前記揮発性化合物の流入濃度と前記排ガス処理部から排出される前記揮発性化合物の排出濃度とを検出する濃度検出手段と、前記流入濃度及び前記排出濃度に基づいて、前記排ガス処理部の使用時の処理機能の低下状態又は再生時の処理機能の回復状態を検知する状態検知手段とを備えた排ガス処理監視装置、排ガス処理装置としたものである(例えば、特許文献1参照)。   The following are typical examples of the processing apparatus described above. An exhaust gas treatment monitoring apparatus for removing a volatile compound contained in exhaust gas and monitoring a treatment function of a recyclable exhaust gas treatment unit in order to accurately grasp a removal state of a volatile organic compound, Concentration detecting means for detecting an inflow concentration of the volatile compound flowing into the exhaust gas treatment unit along a flow path of the processing gas and an exhaust concentration of the volatile compound discharged from the exhaust gas processing unit, and the inflow An exhaust gas treatment monitoring device, an exhaust gas treatment device comprising state detection means for detecting a reduced state of the treatment function during use of the exhaust gas treatment unit or a recovery state of the treatment function during regeneration based on the concentration and the exhaust concentration; (See, for example, Patent Document 1).

特開2008−302348号公報JP 2008-302348 A

しかしながら、前記した特許文献1に記載されたものは、揮発性有機化合物成分を含む浄化処理すべき排ガス(被処理気体)の一部および浄化処理後の処理気体を分岐、切換えて、各々の気体の揮発性有機化合物成分の濃度をガスセンサにより計測するものである。   However, what is described in Patent Document 1 described above is a method in which a part of the exhaust gas (gas to be treated) containing the volatile organic compound component to be purified and the treated gas after the purification treatment are branched and switched. The concentration of the volatile organic compound component is measured with a gas sensor.

この場合においては、塗装工場や印刷工場、化学工場等の揮発性有機化合物成分含有ガスの発生源から排出される浄化処理すべき排ガス(被処理気体)中の揮発性有機化合物成分の濃度が極めて不安定なものであり、ごく短時間にVOC成分の濃度が常に変動して一定にならず、さらに様々な揮発性有機化合物成分が混入する恐れがある。   In this case, the concentration of the volatile organic compound component in the exhaust gas to be purified (the gas to be treated) discharged from the generation source of the volatile organic compound component-containing gas such as a coating factory, a printing factory, or a chemical factory is extremely high. It is unstable, and the concentration of the VOC component constantly fluctuates in a very short time and does not become constant. Further, various volatile organic compound components may be mixed.

また、揮発性有機化合物成分含有ガスの発生源が停止状態で、揮発性有機化合物成分含有ガスの発生が無いときには、処理装置の処理能力の評価ができない。   In addition, when the generation source of the volatile organic compound component-containing gas is stopped and there is no generation of the volatile organic compound component-containing gas, the processing capability of the processing apparatus cannot be evaluated.

このため、短時間に揮発性有機化合物成分の濃度の変動(バラツキ)により常に正確で安定した溶剤ガス処理装置の処理能力の評価を行うことができない。また、被処理気体の量または被処理気体中の揮発性有機化合物成分の濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができない。   For this reason, it is impossible to always evaluate the processing capability of the solvent gas processing apparatus accurately and stably due to the fluctuation (variation) of the concentration of the volatile organic compound component in a short time. Further, it is not possible to evaluate the processing capability of the solvent gas processing apparatus by arbitrarily changing the amount of the gas to be processed or the concentration of the volatile organic compound component in the gas to be processed to various conditions.

本発明は、前記従来の課題を解決するもので、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができるとともに、構成の簡素化を図った溶剤ガス処理装置を提供することを目的とする。   The present invention solves the above-mentioned conventional problems, and provides a solvent gas processing apparatus that can always evaluate the processing ability of a volatile organic compound accurately and stably and that has a simplified configuration. With the goal.

本発明の溶剤ガス処理装置は、揮発性有機化合物の溶剤液を貯蔵するタンクと、前記タンクから溶剤液を吸引吐出するポンプと、前記ポンプによって供給された溶剤液を溶剤ガスとして加熱気化させる気化管と、前記気化管を加熱する加熱手段と、前記気化管の温度を検出して所定温度に制御する温度調節手段と、前記気化管で気化した溶剤ガスを噴出する噴出口を有するノズル孔と、前記ノズル孔を開閉するニードルを駆動する駆動手段と、前記溶剤ガスと混合する希釈気体を供給するブロアと、前記加熱手段により加熱した気化管にポンプにより溶剤液を供給し加熱気化させて溶剤ガスとするとともに、ニードルを駆動しノズル孔を開にして前記溶剤ガスを噴出させ、前記ノズル孔から噴出した溶剤ガスにブロアにより供給した希釈気体を混合させて希釈溶剤ガスを発生する溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、を備え、溶剤ガス発生装置で発生させた希釈溶剤ガスと揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給を選択可能として、希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、前記被処理気体を、前記ブロアにより溶剤ガス処理装置本体へ供給することを特徴とするものである。   The solvent gas processing apparatus of the present invention includes a tank that stores a solvent liquid of a volatile organic compound, a pump that sucks and discharges the solvent liquid from the tank, and a vaporization that heats and vaporizes the solvent liquid supplied by the pump as a solvent gas. A pipe, heating means for heating the vaporization pipe, temperature adjusting means for detecting the temperature of the vaporization pipe and controlling it to a predetermined temperature, and a nozzle hole having a jet outlet for jetting solvent gas vaporized in the vaporization pipe, A driving means for driving a needle that opens and closes the nozzle hole, a blower for supplying a dilution gas mixed with the solvent gas, a solvent liquid is supplied by a pump to a vaporizing tube heated by the heating means, and the solvent is evaporated by heating. Diluted gas supplied by a blower to the solvent gas ejected from the nozzle hole by driving the needle to open the nozzle hole and ejecting the solvent gas A solvent gas generator for generating a diluted solvent gas by mixing and a solvent gas processing device body for processing a gas to be processed containing a volatile organic compound, and the solvent gas generator volatilizes the diluted solvent gas generated by the solvent gas generator. By selecting the supply of the gas to be processed containing the volatile organic compound to the main body of the solvent gas processing apparatus, by evaluating the solvent gas processing capacity of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas, and by supplying the gas to be processed It is possible to perform the processing operation of the gas to be processed, and supply the gas to be processed to the solvent gas processing apparatus main body by the blower.

本発明の溶剤ガス処理装置によれば、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができるとともに、構成の簡素化を図ることができる。   According to the solvent gas processing apparatus of the present invention, it is possible to always evaluate the processing capability of a volatile organic compound accurately and stably, and to simplify the configuration.

第1の発明は、揮発性有機化合物の溶剤液を貯蔵するタンクと、前記タンクから溶剤液を吸引吐出するポンプと、前記ポンプによって供給された溶剤液を溶剤ガスとして加熱気化させる気化管と、前記気化管を加熱する加熱手段と、前記気化管の温度を検出して所定温度に制御する温度調節手段と、前記気化管で気化した溶剤ガスを噴出する噴出口を有するノズル孔と、前記ノズル孔を開閉するニードルを駆動する駆動手段と、前記溶剤ガスと混合する希釈気体を供給するブロアと、前記加熱手段により加熱した気化管にポンプにより溶剤液を供給し加熱気化させて溶剤ガスとするとともに、ニードルを駆動しノズル孔を開にして前記溶剤ガスを噴出させ、前記ノズル孔から噴出した溶剤ガスにブロアにより供給した希釈気体を混合させて希釈溶剤ガスを発生する溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、を備え、溶剤ガス発生装置で発生させた希釈溶剤ガスと揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給を選択可能として、希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、前記被処理気体を、前記ブロアにより溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス処理装置としたものである。   1st invention, the tank which stores the solvent liquid of a volatile organic compound, the pump which sucks and discharges the solvent liquid from the said tank, the vaporization pipe | tube which heats and vaporizes the solvent liquid supplied by the said pump as solvent gas, Heating means for heating the vaporizing pipe, temperature adjusting means for detecting the temperature of the vaporizing pipe and controlling it to a predetermined temperature, a nozzle hole for jetting solvent gas vaporized in the vaporizing pipe, and the nozzle A driving means for driving a needle for opening and closing the hole, a blower for supplying a dilution gas mixed with the solvent gas, a solvent liquid is supplied by a pump to a vaporizing tube heated by the heating means, and is heated and vaporized to obtain a solvent gas. At the same time, the needle is driven to open the nozzle hole to eject the solvent gas, and the solvent gas ejected from the nozzle hole is mixed with the diluted gas supplied by the blower to dilute the solvent gas. A solvent gas generating device that generates a solvent gas and a solvent gas processing device main body that processes a gas to be processed containing a volatile organic compound, and the diluted solvent gas and the volatile organic compound generated by the solvent gas generating device The gas to be treated can be selected to be supplied to the main body of the solvent gas processing apparatus, the operation of evaluating the solvent gas processing capacity of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas, and the gas to be processed by supplying the gas to be processed The solvent gas processing apparatus is characterized in that the gas to be processed is supplied to the solvent gas processing apparatus main body by the blower.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。また、一つのブロアにより希釈溶剤ガスおよび被処理気体を、溶剤ガス処理装置本体に供給することによって構成の簡素化を図ることができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably. Further, the configuration can be simplified by supplying the diluted solvent gas and the gas to be processed to the solvent gas processing apparatus main body with one blower.

第2の発明は、第1の発明において、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする請求項1に記載の溶剤ガス処理装置としたものである。   According to a second invention, in the first invention, the diluted solvent gas is supplied from the solvent gas generator to perform the evaluation operation of the solvent gas processing capacity of the main body of the solvent gas processing device, and then the above-mentioned gas supply by supplying the gas to be processed The solvent gas processing apparatus according to claim 1, wherein a processing operation of a gas to be processed is performed.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を確実に行って、これに基づいて溶剤ガス処理装置を最適に運転することができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to It is possible to reliably perform the evaluation of the processing capacity and to operate the solvent gas processing apparatus optimally based on the evaluation.

第3の発明は、第1または第2の発明において、溶剤ガスを含まない校正用気体を、ブロアにより溶剤ガス処理装置本体へ供給し、溶剤ガス処理装置本体の校正運転を行うことを可能としたことを特徴とする溶剤ガス処理装置としたものである。   According to a third invention, in the first or second invention, a calibration gas that does not contain a solvent gas can be supplied to the solvent gas processing apparatus main body by a blower, and the solvent gas processing apparatus main body can be calibrated. The solvent gas processing apparatus is characterized by the above.

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。また、必要に応じて適宜実施することができる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy. Moreover, it can implement suitably as needed.

第4の発明は、第3の発明において、校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする溶剤ガス処理装置としたものである。   According to a fourth invention, in the third invention, after the calibration gas is supplied to the solvent gas processing device main body, the solvent gas is supplied from the solvent gas generating device to evaluate the processing capability of the solvent gas processing device main body. The solvent gas processing apparatus is characterized in that it is performed.

これによって、溶剤ガス発生装置から供給した溶剤ガスの溶剤ガス処理装置本体部での処理能力の評価運転をより精度良く行うことができる。   Thereby, the evaluation operation of the processing capacity of the solvent gas supplied from the solvent gas generator in the main part of the solvent gas processing apparatus can be performed with higher accuracy.

以下、本発明の一実施の形態の溶剤ガス処理装置を図1〜図7を参照しながら説明する。図1は、本発明一実施の形態の溶剤ガス処理装置の基本構成図、図2は、溶剤ガス発生装置の溶剤液供給部および気化混合部の基本構成図、図3は、気化混合部のノズル孔閉塞時の構成図、図4(a)、(b)は、溶剤ガス発生装置からの溶剤ガスの供給例を示すグラフ、図5は、溶剤ガス処理装置本体の例を示す基本構成図、図6は、溶剤ガス処理装置本体の他の例を基本構成図、図7は、本発明一実施例の他の溶剤ガス処理装置の基本構成図である。   Hereinafter, a solvent gas processing apparatus according to an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a basic configuration diagram of a solvent gas processing apparatus according to an embodiment of the present invention, FIG. 2 is a basic configuration diagram of a solvent liquid supply unit and a vaporization mixing unit of the solvent gas generation device, and FIG. FIG. 4A and FIG. 4B are graphs showing examples of supplying solvent gas from the solvent gas generator, and FIG. 5 is a basic configuration diagram showing an example of the main body of the solvent gas processing apparatus. FIG. 6 is a basic configuration diagram of another example of the solvent gas processing apparatus main body, and FIG. 7 is a basic configuration diagram of another solvent gas processing apparatus according to an embodiment of the present invention.

先ず本発明の一実施の形態の溶剤ガス処理装置の基本的な構成を説明する。溶剤ガス発生装置100は、主に溶剤液供給部101、気化手段である気化混合部120から構成されている。溶剤液供給部101は、異なる溶剤液を貯留するタンク102、タンク103、タンク104と、複数の溶剤液を所定の割合で混合して貯留するタンク105を備えている。溶剤液としては、トルエン、キシレン、酢酸エチル、酢酸ブチル等の揮発性有機化合物が挙げられる。なお、揮発性有機化合物としてこれに限定するものではない。   First, a basic configuration of a solvent gas processing apparatus according to an embodiment of the present invention will be described. The solvent gas generator 100 is mainly composed of a solvent liquid supply unit 101 and a vaporization mixing unit 120 which is a vaporization means. The solvent liquid supply unit 101 includes a tank 102, a tank 103, and a tank 104 that store different solvent liquids, and a tank 105 that mixes and stores a plurality of solvent liquids at a predetermined ratio. Examples of the solvent liquid include volatile organic compounds such as toluene, xylene, ethyl acetate, and butyl acetate. The volatile organic compound is not limited to this.

また、各々のタンク102、103、104、105に各々の供給管106、107、108、109を接続してある。さらに、各々の供給管106、107、108、109には、各々流量計110、111、112、113および、開閉弁114、115、116、117を配置している。   Also, the supply pipes 106, 107, 108, 109 are connected to the tanks 102, 103, 104, 105, respectively. Furthermore, flow meters 110, 111, 112, 113 and on-off valves 114, 115, 116, 117 are arranged in the supply pipes 106, 107, 108, 109, respectively.

各々の供給管106、107、108、109の他端は、ポンプ(溶剤液供給手段)118に接続してある。ポンプ118の吐出側には、吐出管119が接続され、この吐出管119は気化混合部120の気化管121に接続されている。また、ポンプ118の溶剤液の供給量は、溶剤液供給量制御手段118aによりポンプ118を制御して調節可能な構成としている。   The other end of each supply pipe 106, 107, 108, 109 is connected to a pump (solvent liquid supply means) 118. A discharge pipe 119 is connected to the discharge side of the pump 118, and the discharge pipe 119 is connected to the vaporization pipe 121 of the vaporization mixing unit 120. Further, the supply amount of the solvent liquid of the pump 118 can be adjusted by controlling the pump 118 by the solvent liquid supply amount control means 118a.

気化手段である気化混合部120は、一方端を開放した気化管121、気化管121の外周面には電気ヒータ122(加熱手段)を装着ししている。気化管121の温度は、気化管121の温度を検出し所定温度に制御する温度調節手段122aにより調節されるようになっている。   The vaporizing and mixing unit 120 serving as a vaporizing unit includes a vaporizing tube 121 having one end opened, and an electric heater 122 (heating unit) attached to the outer peripheral surface of the vaporizing tube 121. The temperature of the vaporizing pipe 121 is adjusted by temperature adjusting means 122a that detects the temperature of the vaporizing pipe 121 and controls it to a predetermined temperature.

気化管121の気化通路123には、吐出管119から流入した溶剤液の均一な流れおよび、浸透性を良好にするため気化促進体124を充填してある。この気化促進体124は、例えば細線からなる金属繊維材、連通性のアある金属発砲材等か構成してある。   The vaporization passage 123 of the vaporization pipe 121 is filled with a vaporization promoting body 124 in order to improve the uniform flow and permeability of the solvent liquid flowing in from the discharge pipe 119. The vaporization promoting body 124 is composed of, for example, a metal fiber material made of a thin wire, a metal foam material having connectivity, or the like.

気化管121の下部には、溶剤液の廃液管125を接続し、ここに開閉弁126を設けている。   A waste liquid pipe 125 for solvent liquid is connected to the lower part of the vaporization pipe 121, and an open / close valve 126 is provided here.

気化管121の気化通路123と直交する方向に導出管127が固定され、導出管127の内部は気化通路123と導通している。また、気化管121には、ノズル孔129を形成したノズル体128が固定されている。   The outlet pipe 127 is fixed in a direction orthogonal to the vaporizing passage 123 of the vaporizing pipe 121, and the inside of the outlet pipe 127 is electrically connected to the vaporizing passage 123. Further, a nozzle body 128 having a nozzle hole 129 is fixed to the vaporizing tube 121.

導出管127のノズル体128と対向する側には、電磁ソレノイド130(駆動手段)を設け、この電磁ソレノイド130によって、軸長方向にニードル131が移動するように構成されている。ニードル131の電磁ソレノイド130と対向する側には、テーパ部132、ノズル孔129に挿入可能な直径とした先端部133が形成されている。   An electromagnetic solenoid 130 (driving means) is provided on the side of the lead-out pipe 127 facing the nozzle body 128, and the needle 131 is configured to move in the axial direction by the electromagnetic solenoid 130. On the side of the needle 131 facing the electromagnetic solenoid 130, a tapered portion 132 and a tip portion 133 having a diameter that can be inserted into the nozzle hole 129 are formed.

また、ノズル体128側には、送風筒134の設け、ノズル体128を囲むように複数の小孔135aを形成した整流板135が位置している。送風筒134には、ブロアA136(希釈気体供給手段)の吐出側を接続し、さらに吐出筒137を接続してこの吐出筒137と開閉弁139を配置した希釈溶剤ガス供給ライン138を接続している。   Further, on the nozzle body 128 side, a rectifying plate 135 having a plurality of small holes 135 a formed so as to surround the nozzle body 128 is provided. The blowing cylinder 134 is connected to the discharge side of the blower A 136 (dilution gas supply means), and further connected to a discharge cylinder 137 and a dilution solvent gas supply line 138 in which the discharge cylinder 137 and the opening / closing valve 139 are arranged. Yes.

さらに、ブロアA136による空気(希釈気体)の供給量は、ブロアA136に有するモータの回転数を制御する希釈気体供給量制御手段136aにより調節するように構成している。また、吐出筒137の部分に電気ヒータ140(加熱手段)を設け、希釈溶剤ガスの温度を検出し所定温度に制御する温度調節手段140aにより吐出筒137内を通過する溶剤ガスと空気が混合した希釈溶剤ガスの温度を調節するようになっている。なお、電気ヒータ140を設けたが、希釈溶剤ガスを加熱および冷却する手段を設けてもよい。この場合には希釈溶剤ガスの温度をより幅広く調節することができ、溶剤ガス処理装置本体200での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   Furthermore, the supply amount of air (dilution gas) by the blower A136 is configured to be adjusted by a dilution gas supply amount control means 136a that controls the rotational speed of the motor included in the blower A136. In addition, an electric heater 140 (heating means) is provided in the discharge cylinder 137, and the solvent gas passing through the discharge cylinder 137 and air are mixed by the temperature adjusting means 140a that detects the temperature of the diluted solvent gas and controls it to a predetermined temperature. The temperature of the diluted solvent gas is adjusted. Although the electric heater 140 is provided, a means for heating and cooling the diluted solvent gas may be provided. In this case, the temperature of the diluted solvent gas can be adjusted more widely, and the evaluation conditions for the solvent gas processing capacity in the solvent gas processing apparatus main body 200 can be set more widely.

また、ブロアA136の吸入側には、開閉弁301を設けた被処理気体供給ライン300、および開閉弁401を設けた溶剤ガスを含まない校正気体供給ライン400が接続されている。   Further, to the suction side of the blower A 136, a gas supply line 300 to be processed provided with an opening / closing valve 301 and a calibration gas supply line 400 not including a solvent gas provided with an opening / closing valve 401 are connected.

溶剤ガス処理装置本体200の校正気体、希釈溶剤ガス、被処理気体の入口側には、流量計201および溶剤ガス濃度計202が設けられており、また溶剤ガス処理装置本体200の出口側には、溶剤ガス濃度計203が設けられている。   A flow meter 201 and a solvent gas concentration meter 202 are provided on the inlet side of the calibration gas, the diluted solvent gas, and the gas to be processed of the solvent gas processing apparatus main body 200, and on the outlet side of the solvent gas processing apparatus main body 200. A solvent gas concentration meter 203 is provided.

溶剤ガス処理装置本体200は、本発明においてはその溶剤ガス処理方式を限定するものではないが、例として図5および図6に代表的な装置を示す。図6に示す基本構成は、触媒酸化式の溶剤ガス処理装置本体であって、ハニカム形状の触媒体205、触媒体205に近接配置し、これを加熱する加熱ヒータ206(電機ヒータ等の加熱手段)を備えたものである。この方式は、酸化触媒を用いてより低温で溶剤ガスを分解処理することができる。   Although the solvent gas processing apparatus main body 200 does not limit the solvent gas processing system in the present invention, representative apparatuses are shown in FIGS. 5 and 6 as examples. The basic structure shown in FIG. 6 is a catalytic oxidation type solvent gas processing apparatus main body, which is disposed in the vicinity of the honeycomb-shaped catalyst body 205 and the catalyst body 205 and heats the heater 206 (heating means such as an electric heater). ). This method can decompose the solvent gas at a lower temperature using an oxidation catalyst.

また、図5に示す基本構成は、燃焼蓄熱式の溶剤ガス処理装置本体200であって、バーナ251、バーナ251の燃焼により蓄熱するハニカム形状の蓄熱材252a、252b、流路切替部253、接続部材254a、254bを備えたものである。この方式は、バーナ251の燃焼熱、高温の蓄熱材252a、252bにより、溶剤ガスを分解処理することができる。   Further, the basic configuration shown in FIG. 5 is a combustion heat storage type solvent gas processing apparatus main body 200, which is a burner 251, honeycomb-shaped heat storage materials 252 a and 252 b that store heat by combustion of the burner 251, a flow path switching unit 253, Members 254a and 254b are provided. In this method, the solvent gas can be decomposed by the combustion heat of the burner 251 and the high-temperature heat storage materials 252a and 252b.

次に、前記した溶剤ガス処理装置および溶剤ガス発生装置の基本的な運転動作について説明する。先ず、溶剤ガスを含まない所定量の校正気体を溶剤ガス処理装置本体200に供給する動作を説明する。この動作時においては、溶剤ガス処理装置本体200、流量計201、溶剤ガス濃度計202を運転状態とし、開閉弁139を閉、気化混合部120のポンプ118、電気ヒータ122への通電、運転を停止状態として、ブロアA136を運転して溶剤ガスを含まない所定量の校正気体を校正気体供給ライン400から吸入し、希釈溶剤ガス供給ライン138を介して溶剤ガス処理装置本体200に供給する。   Next, the basic operation of the solvent gas processing device and the solvent gas generator will be described. First, an operation of supplying a predetermined amount of calibration gas not containing solvent gas to the solvent gas processing apparatus main body 200 will be described. During this operation, the solvent gas processing apparatus main body 200, the flow meter 201, and the solvent gas concentration meter 202 are in an operating state, the on-off valve 139 is closed, and the pump 118 and the electric heater 122 of the vaporizing and mixing unit 120 are energized and operated. In the stop state, the blower A 136 is operated to suck a predetermined amount of calibration gas not containing the solvent gas from the calibration gas supply line 400 and supply it to the solvent gas processing apparatus main body 200 via the diluted solvent gas supply line 138.

校正気体は、流量計201、溶剤ガス濃度計202を通って溶剤ガス処理装置本体200に入り、出口側の溶剤ガス濃度計203を通って排出される。   The calibration gas enters the solvent gas processing apparatus main body 200 through the flow meter 201 and the solvent gas concentration meter 202, and is discharged through the solvent gas concentration meter 203 on the outlet side.

この校正気体の供給によって、溶剤ガス濃度計202、203の零点の校正を行うもので、計測精度の向上を図ることができる。また、溶剤ガス処理装置本体200内に滞留する校正気体の供給前における残留溶剤ガスを一旦追い出し出口側の溶剤ガス濃度計203の零点の校正をより確実に行うことがでるものである。また、溶剤ガス処理装置本体200内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置100からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   By supplying the calibration gas, the zero point of the solvent gas concentration meters 202 and 203 is calibrated, and the measurement accuracy can be improved. Further, the residual solvent gas before the supply of the calibration gas staying in the solvent gas processing apparatus main body 200 is once discharged, and the zero point of the solvent gas concentration meter 203 on the outlet side can be calibrated more reliably. Further, once the residual solvent gas in the solvent gas processing apparatus main body 200 is driven out, it is possible to grasp the processing capacity of the diluted solvent gas from the solvent gas generating apparatus 100 with higher accuracy.

溶剤ガスを含まない校正気体を溶剤ガス処理装置本体200に供給する動作を所定時間行い、ブロアA136の運転停止、開閉弁401を閉として校正ステップを終了する。   The operation of supplying the calibration gas not containing the solvent gas to the solvent gas processing apparatus main body 200 is performed for a predetermined time, the operation of the blower A136 is stopped, and the on-off valve 401 is closed to complete the calibration step.

次に、前記校正ステップを終了した後の溶剤ガス発生装置100の運転動作を説明する。先ず、図2に示すように電磁ソレノイド130を非通電状態とし、このとき電磁ソレノイド130に有するコイルバネ(図示なし)によってニードル131はノズル孔129側に押し付けられており、先端部133がノズル孔129内に挿入され、かつテーパ部132がノズル孔129に当たって前記ノズル孔129を閉塞させている。   Next, the operation of the solvent gas generator 100 after the calibration step is completed will be described. First, as shown in FIG. 2, the electromagnetic solenoid 130 is deenergized. At this time, the needle 131 is pressed against the nozzle hole 129 by a coil spring (not shown) included in the electromagnetic solenoid 130, and the distal end portion 133 is in the nozzle hole 129. The taper portion 132 is inserted into the nozzle hole 129 and closes the nozzle hole 129.

この状態において、電気ヒータ(加熱手段)122に通電し、気化管121、気化促進体124を例えば120度C程度に予熱する。このとき導出管127、ノズル体128も気化管121からの伝導熱によってほぼ同温度レベルに予熱される。   In this state, the electric heater (heating means) 122 is energized, and the vaporization pipe 121 and the vaporization promoting body 124 are preheated to about 120 ° C., for example. At this time, the outlet pipe 127 and the nozzle body 128 are also preheated to substantially the same temperature level by the conduction heat from the vaporization pipe 121.

前記した予熱動作の後、ブロアA136を駆動し、溶剤ガスを含まない大気中の空気を、送風筒134内に供給し、整流板135の複数の小孔135aからノズル体128の近傍に噴出させる。(このときは、開閉弁301は閉)。   After the preheating operation described above, the blower A136 is driven, air in the atmosphere not containing solvent gas is supplied into the blower tube 134, and is ejected from the plurality of small holes 135a of the rectifying plate 135 to the vicinity of the nozzle body 128. . (At this time, the on-off valve 301 is closed).

ブロアA136の駆動開始後、図2に示すように電磁ソレノイド130を通電状態とし、このとき電磁ソレノイド130に有するコイルバネ(図示なし)に抗してニードル131を電磁ソレノイド130側に吸引し、ノズル孔129から先端部133を抜くと同時にテーパ部132をノズル孔129から離し、これによってノズル孔129を開く。また開閉弁139を開とする。   After the drive of the blower A136 is started, the electromagnetic solenoid 130 is energized as shown in FIG. 2, and at this time, the needle 131 is attracted to the electromagnetic solenoid 130 side against a coil spring (not shown) included in the electromagnetic solenoid 130, At the same time that the tip 133 is removed from the nozzle 129, the tapered portion 132 is separated from the nozzle hole 129, thereby opening the nozzle hole 129. The on-off valve 139 is opened.

次に、ポンプ118を駆動し、例えば開閉弁114を開、他の開閉弁115、116、117を閉として、タンク102内の溶剤液を、供給管106に吸入し、吐出管119を介して気化管121の気化通路123に所定圧力で供給する。この溶剤液は気化管121および気化促進体124に接触して瞬時に気化し、溶剤ガスとして導出管127内に入りノズル孔129より勢い良く噴出する。   Next, the pump 118 is driven, for example, the on-off valve 114 is opened, the other on-off valves 115, 116, 117 are closed, the solvent liquid in the tank 102 is sucked into the supply pipe 106, and is discharged through the discharge pipe 119. The vaporization passage 123 of the vaporization pipe 121 is supplied at a predetermined pressure. This solvent liquid comes into contact with the vaporizing pipe 121 and the vaporization promoting body 124 and is instantly vaporized, enters the outlet pipe 127 as a solvent gas, and jets out of the nozzle hole 129 vigorously.

ノズル孔129より噴出した溶剤ガスは、整流板135の複数の小孔135aから噴出させた希釈気体である空気と均一に混合し、希釈溶剤ガスとなって吐出筒137、希釈溶剤ガス供給ライン138を介して溶剤ガス処理装置本体200に供給され浄化処理を行う。   The solvent gas ejected from the nozzle hole 129 is uniformly mixed with the air that is the diluted gas ejected from the plurality of small holes 135a of the rectifying plate 135, becomes a diluted solvent gas, becomes the discharge cylinder 137, and the diluted solvent gas supply line 138. And is supplied to the solvent gas processing apparatus main body 200 via the gas to perform purification treatment.

このとき、溶剤ガス処理装置本体200の入口側において、流量計201による希釈溶剤ガスの流量、および溶剤ガス濃度計202よる希釈溶剤ガス中の溶剤ガスの濃度を計測する。   At this time, the flow rate of the diluted solvent gas by the flow meter 201 and the concentration of the solvent gas in the diluted solvent gas by the solvent gas concentration meter 202 are measured on the inlet side of the solvent gas processing apparatus main body 200.

さらに、溶剤ガス処理装置本体200で希釈溶剤ガス中の溶剤ガス成分が浄化処理され排出される。このとき溶剤ガス濃度計203による浄化空気中の溶剤ガスの濃度を計測する。   Further, the solvent gas component in the diluted solvent gas is purified by the solvent gas processing apparatus main body 200 and discharged. At this time, the solvent gas concentration meter 203 measures the concentration of the solvent gas in the purified air.

溶剤ガス発生装置100から溶剤ガス処理装置本体200へ供給された希釈溶剤ガスの量、溶剤ガス濃度等の条件において、溶剤ガス濃度計203により計測した溶剤ガス濃度が所定値以下に浄化処理されていることの確認と、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力の基本的な評価を行うものである。   The solvent gas concentration measured by the solvent gas concentration meter 203 is purified to a predetermined value or less under conditions such as the amount of diluted solvent gas supplied from the solvent gas generating device 100 to the solvent gas processing device main body 200 and the solvent gas concentration. And the basic evaluation of the processing capability of the solvent gas processing apparatus main body 200 is performed from the difference in solvent gas concentration between the solvent gas concentration meter 202 and the solvent gas concentration meter 203.

前記溶剤ガス処理装置本体200の処理能力の基本的な評価を行った後、ポンプ118の駆動を停止、電気ヒータ(加熱手段)122および電磁ソレノイド130を非通電とする。電磁ソレノイド130を非通電とすることによって、ニードル131はノズル孔129側に押し付けられ、先端部133がノズル孔129内に挿入され、かつテーパ部132がノズル孔129に当たって前記ノズル孔129を閉塞し、溶剤ガスの噴出を瞬時に停止させる。   After the basic evaluation of the processing capability of the solvent gas processing apparatus main body 200, the driving of the pump 118 is stopped and the electric heater (heating means) 122 and the electromagnetic solenoid 130 are de-energized. By de-energizing the electromagnetic solenoid 130, the needle 131 is pressed toward the nozzle hole 129, the tip end portion 133 is inserted into the nozzle hole 129, and the tapered portion 132 hits the nozzle hole 129 to close the nozzle hole 129. , Stop the ejection of solvent gas instantly.

前記した動作の後、ブロアA136を所定時間(例えば略30秒)継続駆動し、大気中の空気を送風筒134内に供給し、希釈溶剤ガス供給ライン138に至る流路中を、溶剤ガスを含まない空気に置換する。この後、ブロアA136の駆動を停止し、開閉弁139を閉とする。   After the above-described operation, the blower A 136 is continuously driven for a predetermined time (for example, approximately 30 seconds), air in the atmosphere is supplied into the blower cylinder 134, and the solvent gas is passed through the flow path leading to the diluted solvent gas supply line 138. Replace with free air. Thereafter, the drive of the blower A136 is stopped and the on-off valve 139 is closed.

次に、開閉弁301を開、ブロアA136を駆動し、溶剤ガスの発生源からの溶剤ガスを含む被処理空気(被処理気体)を、被処理気体供給ライン300を介して溶剤ガス処理装置本体200に供給するように切替える。   Next, the on-off valve 301 is opened, the blower A 136 is driven, and the air to be processed (the gas to be processed) containing the solvent gas from the source of the solvent gas is supplied through the gas supply line 300 to the solvent gas processing apparatus main body. Switch to supply to 200.

これにより溶剤ガスを含む被処理空気の浄化処理を開始するものである。このとき、溶剤ガス処理装置本体200の入口側において、流量計201による被処理空気の流量、および溶剤ガス濃度計202よる被処理空気中の溶剤ガスの濃度を計測する。   Thereby, the purification treatment of the air to be treated containing the solvent gas is started. At this time, the flow rate of the air to be processed by the flow meter 201 and the concentration of the solvent gas in the air to be processed by the solvent gas concentration meter 202 are measured on the inlet side of the solvent gas processing apparatus main body 200.

さらに、溶剤ガス処理装置本体200で被処理空気中の溶剤ガス成分が浄化処理され排出される。このとき溶剤ガス濃度計203による浄化空気中の溶剤ガスの濃度を計測する。   Further, the solvent gas component in the air to be treated is purified by the solvent gas processing apparatus main body 200 and discharged. At this time, the solvent gas concentration meter 203 measures the concentration of the solvent gas in the purified air.

溶剤ガスの発生源から溶剤ガス処理装置本体200へ供給された被処理空気の量、溶剤ガス濃度等の条件において、溶剤ガス濃度計203により計測した溶剤ガス濃度が所定値以下に浄化処理されていることの確認と、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力の基本的な確認を行うものである。   The solvent gas concentration measured by the solvent gas concentration meter 203 is purified to a predetermined value or less under conditions such as the amount of air to be treated supplied from the solvent gas generation source to the solvent gas processing apparatus main body 200 and the solvent gas concentration. And a basic confirmation of the processing capacity of the solvent gas processing apparatus main body 200 from the difference in solvent gas concentration between the solvent gas concentration meter 202 and the solvent gas concentration meter 203.

溶剤ガス処理装置の全体的な制御は、操作部、報知部、制御装置(図示なし)によって校正用気体の供給運転、溶剤ガス発生装置100の希釈溶剤ガスの供給運転、被処理気体の供給運転の切り替え制御、および溶剤ガス発生装置100での溶剤液の選択、希釈溶剤ガス中の濃度等の設定、さらに、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力(浄化度等)のデータ処理と記憶、表示、音声等による報知を行うものである。   The overall control of the solvent gas processing apparatus is performed by an operation unit, a notifying unit, and a control device (not shown), a calibration gas supply operation, a solvent gas generator 100 dilution solvent gas supply operation, and a gas to be processed supply operation. Switching control, selection of the solvent liquid in the solvent gas generator 100, setting of the concentration in the diluted solvent gas, and the like, and further the solvent gas from the solvent gas concentration difference between the solvent gas concentration meter 202 and the solvent gas concentration meter 203 Data processing of the processing capability (purification degree or the like) of the processing apparatus main body 200 and notification by storage, display, voice, or the like are performed.

校正用気体の供給による溶剤ガス処理装置本体のゼロ校正運転、溶剤ガス発生装置100で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体200の溶剤ガスの処理能力の評価運転は、溶剤ガス処理装置本体200の運転開始時、運転停止時、メンテナンス時等、適宜行うことができる。   The solvent gas processing apparatus main body zero calibration operation by supplying calibration gas, and the solvent gas processing apparatus 200 evaluation performance of the solvent gas processing apparatus main body 200 by supplying diluted solvent gas generated by the solvent gas generating apparatus 100 are solvent gas. It can be appropriately performed at the start of operation of the processing apparatus main body 200, at the time of operation stop, at the time of maintenance.

次に、溶剤ガス発生装置100から溶剤ガス処理装置本体200へ供給された希釈溶剤ガスの量、溶剤ガス濃度等の条件の設定方法について説明する。   Next, a method for setting conditions such as the amount of diluted solvent gas supplied from the solvent gas generator 100 to the solvent gas processing apparatus main body 200 and the solvent gas concentration will be described.

先ず、複数の溶剤液を選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスの溶剤ガス処理装置本体200へ供給方法を説明する。前記したように基本的動作の説明においては、開閉弁114を開、他の開閉弁115、116、117を閉として、タンク102内の溶剤液を、ポンプ118により供給管106に吸入し、吐出管119を介して気化管121の気化通路123に所定圧力で供給し、タンク102内の溶剤液の溶剤ガスを発生させたが、さらに、タンク102、103、104に各々対応した開閉弁114、115、116のいずれかを開とし、他を閉とすることによって、開としたタンク内の溶剤液をいずれか一つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスの溶剤ガス処理装置本体200へ供給することができる。   First, a method of supplying a plurality of solvent liquids to a solvent gas processing apparatus main body 200 of a diluted solvent gas containing the solvent gas of the selected solvent liquid will be described. As described above, in the description of the basic operation, the on-off valve 114 is opened, the other on-off valves 115, 116, 117 are closed, and the solvent liquid in the tank 102 is sucked into the supply pipe 106 by the pump 118 and discharged. Supplying at a predetermined pressure to the vaporizing passage 123 of the vaporizing pipe 121 via the pipe 119, the solvent gas of the solvent liquid in the tank 102 was generated. Further, the on-off valves 114, respectively corresponding to the tanks 102, 103, 104, 115 or 116 is opened and the other is closed, so that any one of the solvent liquids in the opened tank is selected and vaporized, and the diluted solvent containing the solvent gas of the selected solvent liquid The gas can be supplied to the solvent gas processing apparatus main body 200.

また、タンク102、103、104に各々対応した開閉弁114、115、116のいずれか二つを開とし、他を閉とすることによって、開とした二つのタンク内の溶剤液をいずれか二つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。さらに、同様の手段により、溶剤液をいずれか三つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   Further, by opening any two of the on-off valves 114, 115, and 116 corresponding to the tanks 102, 103, and 104 and closing the other, respectively, the solvent liquid in the two opened tanks is changed to any two. One can be selected and vaporized, and the diluted solvent gas containing the solvent gas of the selected solvent liquid can be supplied to the solvent gas processing apparatus main body 200. Furthermore, by the same means, any three of the solvent liquids can be selected and vaporized, and the diluted solvent gas containing the solvent gas of the selected solvent liquid can be supplied to the solvent gas processing apparatus main body 200.

さらに、開閉弁114、115、116を、閉を含む流量調節弁とすることで、複数の溶剤液の混合割合を任意に選択して気化させ、任意の混合割合の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   Further, the on-off valves 114, 115, and 116 are flow rate control valves including closing, so that a mixing ratio of a plurality of solvent liquids can be arbitrarily selected and vaporized, and a diluted solvent gas containing a solvent gas having an arbitrary mixing ratio is used. Can be supplied to the main body 200 of the solvent gas processing apparatus.

また、複数の溶剤液を予め任意に所定の割合で混合して貯留するタンク105を備えているが、この混合した溶剤液を選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   In addition, a tank 105 for storing a mixture of a plurality of solvent solutions in advance at a predetermined ratio is stored, and the mixed solvent solution is selected and vaporized, and the selected solvent solution is diluted with a solvent gas. The solvent gas can be supplied to the solvent gas processing apparatus main body 200.

また、気化させた溶剤液の溶剤ガスを含む希釈溶剤ガス中の溶剤ガスの濃度は、ブロアA136による希釈気体の供給量および/またはポンプ118による溶剤液の供給量の調節によって設定することがでる。   Further, the concentration of the solvent gas in the diluted solvent gas containing the solvent gas of the vaporized solvent liquid can be set by adjusting the supply amount of the diluted gas by the blower A136 and / or the supply amount of the solvent liquid by the pump 118. .

ブロアA136による希釈気体の供給量を一定とした場合は、ポンプ118による溶剤液の供給量の調節によって設定することがでる。また、ポンプ118による溶剤液の供給量を一定とした場合は、ブロアA136による希釈気体の供給量の調節によって設定することがでる。さらに、ブロアA136による希釈気体の供給量およびポンプ118による溶剤液の供給量の調節によって設定することがでる。このように希釈溶剤ガスの量、希釈溶剤ガス中の溶剤ガス濃度を任意に変化させることができるものである。   When the supply amount of the dilution gas by the blower A136 is constant, it can be set by adjusting the supply amount of the solvent liquid by the pump 118. In addition, when the supply amount of the solvent liquid by the pump 118 is constant, it can be set by adjusting the supply amount of the dilution gas by the blower A136. Further, it can be set by adjusting the supply amount of the dilution gas by the blower A136 and the supply amount of the solvent liquid by the pump 118. Thus, the amount of the diluted solvent gas and the solvent gas concentration in the diluted solvent gas can be arbitrarily changed.

希釈溶剤ガスの量、希釈溶剤ガス中の溶剤ガス濃度は、ブロアA136による希釈気体の供給量、ポンプ118による溶剤液の供給量を変化させる速度を制御することで、任意に設定することができる。さらに、気化させる溶剤液の選択は、開閉弁114、115、116、117の開閉制御によってほぼ瞬時に切り替えることができる。   The amount of the diluted solvent gas and the solvent gas concentration in the diluted solvent gas can be arbitrarily set by controlling the rate at which the diluted gas supply amount by the blower A136 and the solvent liquid supply amount by the pump 118 are changed. . Furthermore, the selection of the solvent liquid to be vaporized can be switched almost instantaneously by opening / closing control of the on-off valves 114, 115, 116, 117.

図4に示す(a)は、希釈溶剤ガス中の溶剤ガス濃度を無段階に増加または減少方向に変化させて、また、(b)は希釈溶剤ガス中の溶剤ガス濃度を段階的に変化させて、溶剤ガス処理装置本体200へ供給する例を示す。   (A) shown in FIG. 4 changes the solvent gas concentration in the diluting solvent gas in a stepless increase or decrease direction, and (b) changes the solvent gas concentration in the diluting solvent gas stepwise. An example of supplying to the solvent gas processing apparatus main body 200 will be shown.

また、溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御するものである。   Further, the supply amount of the solvent liquid to the vaporizing means or the supply amount of the dilution gas is controlled so that the concentration of the solvent gas in the diluted solvent gas mixed with the solvent gas and air is not more than the lower limit of the explosion limit. .

さらに、溶剤ガス濃度計202が溶剤ガスの爆発限界の下限値以上の濃度を検出したときは、溶剤ガスの爆発限界の下限値以下に溶剤液の気化手段への供給量を減少させるか、または溶剤液の気化手段への供給を停止するようにしてもよい。この場合には安全性をより向上させることができる。   Further, when the solvent gas concentration meter 202 detects a concentration not less than the lower limit value of the explosion limit of the solvent gas, the supply amount of the solvent liquid to the vaporization means is decreased below the lower limit value of the explosion limit of the solvent gas, or You may make it stop supply to the vaporization means of a solvent liquid. In this case, safety can be further improved.

また、希釈気体供給量の検出手段(図示なし)を備え、前記希釈気体供給量検出手段が所定値以下の希釈気体の供給量を検出したときは、溶剤液の気化手段への供給を停止させるようにしてもよい。この場合にはブロアA136の停止時等置ける安全性をより向上させることができる。   Further, a dilution gas supply amount detection means (not shown) is provided, and when the dilution gas supply amount detection means detects a supply amount of dilution gas below a predetermined value, supply of the solvent liquid to the vaporization means is stopped. You may do it. In this case, it is possible to further improve the safety that the blower A136 can be placed when the blower A136 is stopped.

なお、ブロアA136による空気(希釈気体)および被処理気体の供給量は、ブロアA136に有するモータの回転数を制御する希釈気体供給量制御手段136aにより調節することができる。また、被処理気体の供給時に吐出筒137の部分に設けた電気ヒータ140に通電し、温度調節手段140aにより吐出筒137内を通過する被処理気体の温度を調節するようにしてもよい。この場合には溶剤ガス処理装置本体200でより安定して浄化処理することができる。   Note that the supply amount of air (dilution gas) and the gas to be processed by the blower A136 can be adjusted by a dilution gas supply amount control means 136a that controls the number of rotations of the motor included in the blower A136. In addition, the electric heater 140 provided in the portion of the discharge cylinder 137 may be energized when the gas to be processed is supplied, and the temperature of the gas to be processed passing through the discharge cylinder 137 may be adjusted by the temperature adjusting unit 140a. In this case, the solvent gas treatment apparatus main body 200 can perform the purification treatment more stably.

図7は、本発明一実施例の他の溶剤ガス処理装置の基本構成図を示す。図1と同一番号は、同一箇所を示し説明を省略する。図1の構成と異なるところは、ブロアA136を溶剤ガス処理装置本体200と溶剤ガス発生装置100との間に設けたもので、この構成においても図1の構成と同様の作用、効果が得られるものである。   FIG. 7 shows a basic configuration diagram of another solvent gas processing apparatus according to an embodiment of the present invention. The same reference numerals as those in FIG. The difference from the configuration of FIG. 1 is that the blower A136 is provided between the solvent gas processing apparatus main body 200 and the solvent gas generator 100, and this configuration can provide the same operations and effects as the configuration of FIG. Is.

各種溶剤ガスの浄化処理を必要とする広範囲の装置の用途にも適用できる。   The present invention can be applied to a wide range of apparatuses that require purification treatment of various solvent gases.

本発明一実施例の溶剤ガス処理装置の基本構成図1 is a basic configuration diagram of a solvent gas processing apparatus according to an embodiment of the present invention. 溶剤ガス発生装置の溶剤液供給部および気化混合部の基本構成図Basic configuration diagram of solvent liquid supply unit and vaporization mixing unit of solvent gas generator 気化混合部のノズル孔閉塞時の構成図Configuration diagram of the vaporization mixing unit when the nozzle hole is closed (a)、(b)溶剤ガス発生装置からの溶剤ガス供給例を示すグラフ(A), (b) The graph which shows the example of solvent gas supply from a solvent gas generator 溶剤ガス処理装置本体の例を示す基本構成図Basic configuration diagram showing an example of a solvent gas treatment device body 溶剤ガス処理装置本体の他の例を基本構成図Basic configuration diagram of another example of the solvent gas treatment device main body 本発明一実施例の他の溶剤ガス処理装置の基本構成図The basic block diagram of the other solvent gas processing apparatus of one Example of this invention

100 溶剤ガス発生装置
101 溶剤液供給部
102 タンク
103 タンク
104 タンク
105 タンク
106 供給管
107 供給管
108 供給管
109 供給管
110 流量計
111 流量計
112 流量計
113 流量計
114 開閉弁
115 開閉弁
116 開閉弁
117 開閉弁
118 ポンプ
118a 溶剤液供給量制御手段
119 吐出管
120 気化混合部(気化手段)
121 気化管(気化手段)
122 電気ヒータ(加熱手段)
122a 温度調節手段
123 気化通路
124 気化促進体
125 廃液管
126 開閉弁
127 導出管
128 ノズル体
129 ノズル孔
130 電磁ソレノイド(駆動手段)
131 ニードル
132 テーパ部
133 先端部
134 送風筒
135 整流板
135a 小孔
136 ブロアA
136a 希釈気体供給量制御手段
137 吐出筒
138 希釈溶剤ガス供給ライン
139 開閉弁
140 電気ヒータ(加熱手段)
140a 温度調節手段
200 溶剤ガス処理装置本体
201 流量計
202 溶剤ガス濃度計
203 溶剤ガス濃度計
204 触媒酸化式溶剤ガス処理装置本体
205 触媒体
206 加熱ヒータ
250 燃焼蓄熱式溶剤ガス処理装置本体
251 バーナ
252a 蓄熱材
252b 蓄熱材
253 流路切替部
254a 接続部材
254b 接続部材
300 被処理気体供給ライン
301 開閉弁
400 校正気体供給ライン
401 開閉弁
DESCRIPTION OF SYMBOLS 100 Solvent gas generator 101 Solvent liquid supply part 102 Tank 103 Tank 104 Tank 105 Tank 106 Supply pipe 107 Supply pipe 108 Supply pipe 109 Supply pipe 110 Flowmeter 111 Flowmeter 112 Flowmeter 113 Flowmeter 114 Open / close valve 115 Open / close valve 116 Open / close Valve 117 Opening / closing valve 118 Pump 118a Solvent liquid supply amount control means 119 Discharge pipe 120 Vaporization mixing section (vaporization means)
121 Vaporizer (vaporizer)
122 Electric heater (heating means)
122a Temperature adjusting means 123 Vaporization passage 124 Vaporization promoting body 125 Waste liquid pipe 126 Opening and closing valve 127 Deriving pipe 128 Nozzle body 129 Nozzle hole 130 Electromagnetic solenoid (drive means)
131 Needle 132 Tapered part 133 Tip part 134 Blower cylinder 135 Current plate 135a Small hole 136 Blower A
136a Diluted gas supply amount control means 137 Discharge cylinder 138 Diluted solvent gas supply line 139 On-off valve 140 Electric heater (heating means)
140a Temperature control means 200 Solvent gas processing device main body 201 Flow meter 202 Solvent gas concentration meter 203 Solvent gas concentration meter 204 Catalytic oxidation type solvent gas processing device main body 205 Catalyst body 206 Heater 250 Combustion heat storage type solvent gas processing device body 251 Burner 252a Thermal storage material 252b Thermal storage material 253 Flow path switching unit 254a Connection member 254b Connection member 300 Processed gas supply line 301 Open / close valve 400 Calibration gas supply line 401 Open / close valve

Claims (4)

揮発性有機化合物の溶剤液を貯蔵するタンクと、前記タンクから溶剤液を吸引吐出するポンプと、前記ポンプによって供給された溶剤液を溶剤ガスとして加熱気化させる気化管と、前記気化管を加熱する加熱手段と、前記気化管の温度を検出して所定温度に制御する温度調節手段と、前記気化管で気化した溶剤ガスを噴出する噴出口を有するノズル孔と、前記ノズル孔を開閉するニードルを駆動する駆動手段と、前記溶剤ガスと混合する希釈気体を供給するブロアと、前記加熱手段により加熱した気化管にポンプにより溶剤液を供給し加熱気化させて溶剤ガスとするとともに、ニードルを駆動しノズル孔を開にして前記溶剤ガスを噴出させ、前記ノズル孔から噴出した溶剤ガスにブロアにより供給した希釈気体を混合させて希釈溶剤ガスを発生する溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、を備え、溶剤ガス発生装置で発生させた希釈溶剤ガスと揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給を選択可能として、希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、前記被処理気体を前記ブロアにより溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス処理装置。 A tank for storing a solvent liquid of a volatile organic compound, a pump for sucking and discharging the solvent liquid from the tank, a vaporization pipe for heating and vaporizing the solvent liquid supplied by the pump as a solvent gas, and heating the vaporization pipe A heating means, temperature adjusting means for detecting the temperature of the vaporizing tube and controlling it to a predetermined temperature, a nozzle hole having a jet port for ejecting the solvent gas vaporized in the vaporizing tube, and a needle for opening and closing the nozzle hole A driving means for driving, a blower for supplying a dilution gas mixed with the solvent gas, a solvent liquid is supplied by a pump to the vaporizing tube heated by the heating means to be heated and vaporized to obtain a solvent gas, and the needle is driven. The nozzle holes are opened to eject the solvent gas, and the solvent gas ejected from the nozzle holes is mixed with the diluted gas supplied by the blower to generate the diluted solvent gas. And a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a gas to be processed containing a diluted solvent gas and a volatile organic compound generated by the solvent gas generator Supply to the solvent gas processing apparatus main body can be selected, and the operation of evaluating the solvent gas processing capacity of the solvent gas processing apparatus main body by supplying the diluted solvent gas and the processing operation of the gas to be processed by supplying the gas to be processed A solvent gas processing apparatus, characterized in that the gas to be processed is supplied to the main body of the solvent gas processing apparatus by the blower. 溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする請求項1に記載の溶剤ガス処理装置。 The diluted gas gas is supplied from the solvent gas generating device and the solvent gas processing apparatus main body is evaluated for the processing capability of the solvent gas, and then the gas to be processed is supplied by supplying the gas to be processed. The solvent gas processing apparatus according to claim 1. 溶剤ガスを含まない校正用気体を、ブロアにより溶剤ガス処理装置本体へ供給し、溶剤ガス処理装置本体の校正運転を行うことを可能としたことを特徴とする請求項1または2に記載の溶剤ガス処理装置。 3. The solvent according to claim 1, wherein a calibration gas not containing a solvent gas is supplied to the solvent gas processing apparatus main body by a blower, and the solvent gas processing apparatus main body can be calibrated. Gas processing device. 校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする請求項3に記載の溶剤ガス処理装置。 4. The method according to claim 3, wherein after the calibration gas is supplied to the solvent gas processing apparatus main body, the solvent gas is supplied from the solvent gas generator to perform an operation for evaluating the processing capacity of the solvent gas processing apparatus main body. Solvent gas processing equipment.
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