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JP4543544B2 - Flip chip mounting substrate and manufacturing method thereof - Google Patents
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JP4543544B2 - Flip chip mounting substrate and manufacturing method thereof - Google Patents

Flip chip mounting substrate and manufacturing method thereof Download PDF

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Publication number
JP4543544B2
JP4543544B2 JP2000368154A JP2000368154A JP4543544B2 JP 4543544 B2 JP4543544 B2 JP 4543544B2 JP 2000368154 A JP2000368154 A JP 2000368154A JP 2000368154 A JP2000368154 A JP 2000368154A JP 4543544 B2 JP4543544 B2 JP 4543544B2
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Prior art keywords
punching
conductive material
bump
flip chip
punched
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JP2002170899A (en
Inventor
輝代隆 塚田
輝正 二の丸
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Ibiden Co Ltd
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Ibiden Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

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  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
  • Wire Bonding (AREA)

Description

【0001】
【技術分野】
本発明は,フリップチップを実装するためのフリップチップ実装用基板及びその製造方法に関する。
【0002】
【従来技術】
フリップチップは,回路上に端子を有するチップであり,実装時には,裏返して,端子を下に向け,フリップチップ実装用基板上の端子部に半田接合される。
図7に示すごとく,フリップチップ実装用基板91は,端子部92の上に半田バンプ93が予め接合されており,加熱溶融によりフリップチップ94の端子941と接合する。端子部92の周囲は,ソルダーレジスト膜95により被覆されている。
【0003】
【解決しようとする課題】
フリップチップ実装においては,電気的接続信頼性の確保のため,フリップチップの端子部に対する接合強度が重要である。たとえば,図8に示すごとく,フリップチップ94が,フリップチップ実装用基板91に対して傾斜してしまう。
また,図9に示すごとく,半田バンプ93の大きさにバラツキがあると,フリップチップ94とフリップチップ実装用基板91と間の電気接続信頼性が得られない。
【0004】
本発明はかかる従来の問題点に鑑み,フリップチップとの電気的接続信頼性に優れた接合部を有するフリップチップ実装用基板及びその製造方法を提供しようとするものである。
【0005】
【課題の解決手段】
請求項1の発明は,フリップチップを実装するための複数の端子部を有するフリップチップ実装用基板において,
上記端子部は,導電材を打抜いて形成されてなるとともに絶縁基板に埋め込まれ且つ一端を上記絶縁基板の裏面に露出している打抜き導電材と,該打抜き導電材の他端に接合され且つ上記絶縁基板表面に露出しているバンプとからなり,
上記バンプは,上記導電材と積層されたバンプ形成材を打抜いて上記打抜き導電材とともに形成された打抜きバンプであることを特徴とするフリップチップ実装用基板である。
【0006】
本発明において最も注目すべきことは,フリップチップ実装用の端子部を,打抜き技術により形成した,打抜き導電材と打抜きバンプとから構成している点にある。
導電材及びバンプ形成材を打抜くと,これらの打抜き片は絶縁基板に埋め込まれる。その埋め込み量は,パンチなどの埋め込み装置により容易に制御することできる。このため,均一量で均一高さのバンプを形成することができる。したがって,かかるバンプにフリップチップを接合すると,フリップチップをフリップチップ実装用基板に対して平行に実装することができ,接合強度が向上する。また,それゆえ,フリップチップとの電気導通を確実に行うことができる。
【0007】
また,打抜き導電材は,絶縁基板に埋め込まれていることから,絶縁基板の上下間の導通を行う導電ビアの役目を果たす。このため,打抜きバンプにフリップチップを接合すると,打抜き導電材を通じて,電気信号を絶縁基板の内部や実装反対側面へ容易に導通させることができる。
【0008】
請求項2の発明のように,上記打抜き導電材は,フリップチップ実装時の加熱温度では溶融しない材料であり,かつ上記打抜きバンプは,フリップチップ実装時の加熱温度で溶融する材料であることが好ましい。これにより,フリップチップを更に平行に接合することができる。
【0009】
上記打抜きバンプは,半田,導電性接着材などの低融点材料からなることが好ましい。導電性接着材は,樹脂に金属粒子を添加したものである。
上記打抜き導電材は,銅,ニッケル,銀,錫、鉛,これら導電性金属粉末をポリイミドなどの高耐熱性樹脂に分散した複合材などの高融点材料からなることが好ましい。
【0010】
打抜きバンプの先端部は,絶縁基板表面に露出している。たとえば,打抜きバンプは,絶縁基板の穴の中にその一部を露出させて埋め込まれている。打抜きバンプの先端部は,実装前には,穴開口部よりも内部に位置していてもよいが,実装時には加熱溶融によって開口部よりも高くなる必要がある。
実装前における,打抜きバンプの先端部の絶縁基板からの突出高さAは,−0.010〜+0.08mmであることが好ましい(図3参照)。突出高さが−0.010mmよりも低い場合には,実装時の加熱溶融によって,打抜きバンプの先端部が穴開口部よりも高くならないおそれがある。この場合,フリップチップと打抜きバンプとの接合面積が小さくなり,接合強度が低下するおそれがある。突出高さが+0.08mmを超える場合には,バンプの機械的強度が低下して,バンプが傾いたり,倒れたりするおそれがある。
【0011】
請求項3の発明は,フリップチップを実装するための複数の端子部を有するフリップチップ実装用基板の製造方法において,
絶縁基板の上に,導電材及びバンプ形成材を積層する工程と,
互いに積層された上記導電材及び上記バンプ形成材をパンチにより一度に打抜いて,打抜き導電材及び打抜きバンプを得るとともにこれらを互いに接合した状態で上記絶縁基板の端子部形成部分に一度に埋め込むとともに、上記打抜き導電材の一端を上記絶縁基材の裏面に露出させ且つ上記打抜きバンプを上記絶縁基板表面に露出させる工程とを含むことを特徴とするフリップチップ実装用基板の製造方法である。
【0012】
本製造方法においては,フリップチップ実装用の端子部を,パンチによる打抜き技術により形成している。
絶縁基板の上に導電材およびバンプ形成材を積層し,その上からパンチにより所定箇所を局所的に打抜く。すると,導電材及びバンプ形成材から打抜き導電材及び打抜きバンプが形成される。また,これにともない,打抜き導電材及び打抜きバンプがその下に位置する絶縁基板に埋め込まれ,打抜きバンプの先端部は,絶縁基板に露出させる。
ここで,導電材及びバンプ形成材の打抜きはパンチにより行っている。このため,パンチの移動量を制御することにより,打抜き導電材及び打抜きバンプの埋め込み量を正確に制御することができる。
【0013】
このため,均一量で均一高さのバンプを形成することができる。したがって,形成されたバンプは,フリップチップを平行に実装することができ,接合強度が向上し,電気導通を確実に行うことができる。
また,打抜き導電材は,絶縁基板に埋め込むため,導通ビアの役目を果たす。したがって,上記パンチによる埋め込みにより,バンプと導通ビアの双方を形成することができる。
【0014】
請求項4の発明のように,上記導電材及びバンプ形成材は,端子部の数に対応した複数のパンチにより打抜くことが好ましい。これにより,複数の端子部を別々に形成した場合に比べて,容易にバンプを形成することができる。
【0015】
請求項5の発明のように,上記複数のパンチは,上記絶縁基板のバンプ形成部分に対する打ち込み量が同一になるように制御されていることが好ましい。これにより,打抜き導電材及び打抜きバンプの埋め込み量を同じにすることができる。ゆえに,打抜きバンプの高さを均一にすることができる。
【0016】
請求項6の発明のように,上記複数のパンチの打抜き面は,互いに同一の形状を有することが好ましい。これにより,同一形状の打抜きバンプを形成することができる。
【0017】
上記バンプ形成材は,厚みが均一な導電性シートであることが好ましい。これにより,バンプ形成材のどの部分を打抜いても同じ厚みの打抜きバンプを得ることができる。このため,バンプの突出高さを均一にすることができる。
【0018】
上記導電性シートとしては,銅箔,ハンダ箔,金属粉末が樹脂の中に分散した導電性接着材などを用いることができる。
このうち,導電性シートは,半田,導電性接着材が好ましい。これらは,低融点材料であるため,フリップチップ実装を低温で行うことができる。
【0019】
上記導電材は,厚みが均一な導電性シートであることが好ましい。これにより,導電材のどの部分を打抜いても同じ厚みの打抜き導電材を得ることができ,打抜き導電材に接合された打抜きバンプの突出高さを均一にすることができる。
【0020】
【発明の実施の形態】
実施形態例1
本発明の実施形態に係るフリップチップ実装用基板について,図1〜図4を用いて説明する。
本例のフリップチップ実装用基板5は,図1,図2に示すごとく,フリップチップ6を実装するための複数の端子部3を有する。
端子部3は,導電材を打抜いて形成されているとともに絶縁基板7に埋め込まれた打抜き導電材2と,バンプ形成材を打抜いて形成された打抜きバンプ1とからなる。打抜きバンプ1は,打抜き導電材2の端部に接合され且つ絶縁基板7表面に露出している。
【0021】
フリップチップ実装用の端子部3は,フリップチップの裏面に対応する位置に,ピッチ0.250mm間隔で格子状に形成されている。
打抜き導電材2は銅からなり,打抜きバンプ1は半田からなる。
絶縁基板7の表面には,導体層8が設けられている。
【0022】
打抜きバンプ1及び打抜き導電材2は,絶縁基板7の打抜き穴70の中に埋め込まれている。
図3(a)に示すごとく,打抜きバンプ1だけでなく打抜き導電材2も打抜き穴70の開口部71から突出していてもよい。この場合,フリップチップ6実装時に,打抜きバンプ1が溶融して,突出している打抜き導電材2の先端部分の周囲を覆う帽子状バンプ12が形成される。この場合のフリップチップ実装前のバンプ突出高さAは最大0.080mmであることが好ましい。0.080mmを超える場合にはバンプの機械的強度が低下して,バンプが傾いたり,倒れたりするおそれがある。
【0023】
また,図3(b)に示すごとく,打抜きバンプ1の高さだけ打抜き穴70の開口部71から突出していてもよい。この場合には,フリップチップ6実装時に,絶縁基板7上にバンプ材だけからなる扁平球状バンプ13が形成される。
【0024】
また,図3(c)に示すごとく,打抜きバンプ1が絶縁基板7に露出した状態で打抜き穴70の中に入り込んでいても良い。この場合,フリップチップ実装の溶融によって,台形バンプ14となりその先端が打抜き穴70の開口部71から突出する必要がある。突出しない場合には,台形バンプ14がフリップチップ6と接合しないおそれがあるからである。この場合のフリップチップ実装前のバンプ突出高さAは最小−0.010mmであることが好ましい。−0.010mmよりも低い場合には,フリップチップ実装の溶融によって,台形バンプ14となりその先端が打抜き穴70の開口部71から突出しないおそれがある。
【0025】
次に,本例のフリップチップ実装用基板の製造方法について説明する。
絶縁基板の表面に導体回路を形成した後に,図4(a)に示すごとく,絶縁基板7の上に,バンプ形成材11及び導電材21を順に積層して,積層体77を得る。絶縁基板7は,厚み0.040mmのガラスエポキシ基板である。バンプ形成材11は,厚み0.020mmの半田箔である。導電材21は,厚み0.035mmの銅箔である。
バンプ形成材11と導電材21は,あらかじめ箔を圧延時に接合して供給される。
【0026】
次に,図4(b)に示すごとく,積層体70をダイ42の上に載置する。ダイ42には,積層体70の絶縁基板7の側を対面させる。ダイ42には,絶縁基板7の端子部形成部分に対応する位置に,打抜き用パンチ41の上下の動きをガイドするためのガイド穴43があいている。積層体70の上には,端子形成部分に対応する位置に,打抜き用パンチ41を配置する。打抜き用パンチ41の打抜き面411の直径は,0.09mmでありダイ42の穴径は0.100mmである。
複数の打抜き用パンチ41は,埋め込み量が同一になるように制御されている。パンチの高さの制御は、平面研削盤で複数のパンチを同時に加工して、平面を出し均一化してつくる。
【0027】
次に,図4(c)に示すごとく,導電材21及びバンプ形成材11を複数の打抜きパンチ41により打抜いて,打抜き穴20,10を形成するとともに打抜き導電材2及び打抜きバンプ1を得る。また,これらの押圧力により絶縁基板7に打抜き穴70を形成するとともにその中にこれらを埋め込み,打抜きバンプ1を絶縁基板7表面から露出させる。打抜きパンチ41の数,配置は,端子部の数,位置に対応している。これにより,絶縁基板7に,打抜き導電材2が埋め込まれ,打抜き導電材2の先端には打抜きバンプ1が接合された端子部3が形成される。
以上により,フリップチップ実装用基板5が得られる。
【0028】
本例においては,打抜き導電材2及び打抜きバンプ1の埋め込み量は,打抜き用パンチ41により制御している。このため,均一量で均一高さの打抜きバンプ1を形成することができる。したがって,かかる打抜きバンプ1にフリップチップ6を接合すると,フリップチップ6をフリップチップ実装用基板5に対して平行に実装することができ,接合強度が向上する。また,それゆえ,フリップチップとの電気導通を確実に行うことができる。
【0029】
また,打抜き導電材2は,絶縁基板7に埋め込まれていることから,絶縁基板7の上下間の導通を行う導電ビアの役目を果たす。このため,打抜きバンプ1にフリップチップ6を接合すると,打抜き導電材2を通じて,電気信号を絶縁基板7の内部や実装反対側面へ容易に導通させることができる。
【0030】
実施形態例2
本例は,図5に示すごとく,打抜き導電材11を絶縁基板7に埋め込む際に,打抜き用パンチ41だけでなく,戻し用パンチ44も用いている点が,実施形態例1と異なる。
図5(a)に示すごとく,打抜き前では,打抜き用パンチ41は,ダイ42のガイド穴43の中に配置させる。打抜き用パンチ41による打ち抜きの際には,戻し用パンチ44は,打抜かれた打抜き導電材11及び打抜き絶縁材31を受ける。続いて,図5(c)に示すごとく,打抜き用パンチ41及び戻し用パンチ44を上方に戻し,打抜き導電材11を絶縁基板7の打抜き穴70内に戻し入れる。以上により,絶縁基板7に打抜き導電材2を埋め込みその先端に打抜きバンプ1を露出させた端子部3が形成される。
本例においても,実施形態例1と同様の効果が得られる。
【0031】
実施形態例3
本例は,図6に示すごとく,導電材21とバンプ形成材11の積層順序が実施形態例1と逆である。
図6(a)に示すごとく,絶縁基板7の上に導電材21を,更にその上にバンプ形成材11を積層する。この状態で,これらをダイ42の上に載置し,打抜き用パンチ41を配置する。
【0032】
次に,図6(b)に示すごとく,打抜き用パンチ41により,バンプ形成材11及び導電材21を打抜いて,打抜きバンプ1及び打抜き導電材2を絶縁基板7に埋めこむ。打抜きバンプ1の先端は,絶縁基板7から露出させる。
本例においても,実施形態例1と同様の効果を得ることができる。
【0033】
【発明の効果】
本発明によれば,フリップチップとの電気的接続信頼性に優れた接合部を有するフリップチップ実装用基板及びその製造方法を提供することができる。
【図面の簡単な説明】
【図1】実施形態例1における,フリップチップ実装用基板の断面図。
【図2】実施形態例1における,フリップチップ実装用基板の端子部の部分拡大断面図。
【図3】実施形態例1における,打抜きバンプの突出高さの説明図(a)〜(c)。
【図4】実施形態例1における,フリップチップ実装用基板の製造方法の説明図(a)〜(c)。
【図5】実施形態例2における,フリップチップ実装用基板の製造方法の説明図(a)〜(c)。
【図6】実施形態例3における,フリップチップ実装用基板の製造方法の説明図(a)〜(b)。
【図7】従来例のフリップチップ実装用基板の断面図。
【図8】従来例における,フリップチップ実装用基板に対してフリップチップが傾斜して接合された状態を示す説明図。
【図9】従来例における,バンプ量が異なる場合の問題点を示す説明図。
【符号の説明】
1...打抜きバンプ,
10,20,70...打抜き穴,
11...バンプ形成材,
2...打抜き導電材,
21...導電材,
3...端子部,
41...打抜き用パンチ,
42...ダイ,
43...ガイド穴,
44...戻し用パンチ,
5...フリップチップ実装用基板,
6...フリップチップ,
7...絶縁基板,
[0001]
【Technical field】
The present invention relates to a flip chip mounting substrate for mounting a flip chip and a manufacturing method thereof.
[0002]
[Prior art]
The flip chip is a chip having a terminal on a circuit. At the time of mounting, the flip chip is turned over, and the terminal is directed downward, and soldered to a terminal portion on the flip chip mounting substrate.
As shown in FIG. 7, the flip-chip mounting substrate 91 has solder bumps 93 bonded in advance on the terminal portions 92, and is bonded to the terminals 941 of the flip chip 94 by heating and melting. The periphery of the terminal portion 92 is covered with a solder resist film 95.
[0003]
[Problems to be solved]
In flip chip mounting, the bonding strength to the terminal part of the flip chip is important to ensure electrical connection reliability. For example, as shown in FIG. 8, the flip chip 94 is inclined with respect to the flip chip mounting substrate 91.
Further, as shown in FIG. 9, if the size of the solder bump 93 varies, the electrical connection reliability between the flip chip 94 and the flip chip mounting substrate 91 cannot be obtained.
[0004]
In view of the conventional problems, the present invention intends to provide a flip chip mounting substrate having a joint portion excellent in electrical connection reliability with a flip chip and a method for manufacturing the same.
[0005]
[Means for solving problems]
The invention of claim 1 is a flip chip mounting substrate having a plurality of terminal portions for mounting a flip chip.
The terminal portion is formed by punching a conductive material, and is embedded in an insulating substrate and has one end exposed on the back surface of the insulating substrate , joined to the other end of the punched conductive material, and It consists of bumps exposed on the surface of the insulating substrate.
The bump is a flip-chip mounting substrate, wherein the bump is a bump formed by punching a bump forming material laminated with the conductive material together with the punched conductive material .
[0006]
The most notable point in the present invention is that the flip chip mounting terminal portion is composed of a punched conductive material and a stamped bump formed by a stamping technique.
When the conductive material and the bump forming material are punched, these punched pieces are embedded in the insulating substrate. The amount of embedding can be easily controlled by an embedding device such as a punch. For this reason, it is possible to form bumps having a uniform amount and a uniform height. Therefore, when a flip chip is bonded to such a bump, the flip chip can be mounted in parallel to the flip chip mounting substrate, and the bonding strength is improved. Therefore, electrical conduction with the flip chip can be reliably performed.
[0007]
Further, since the punching conductive material is embedded in the insulating substrate, it serves as a conductive via for conducting conduction between the upper and lower sides of the insulating substrate. For this reason, when a flip chip is joined to the punched bump, the electrical signal can be easily conducted to the inside of the insulating substrate or the side opposite to the mounting through the punched conductive material.
[0008]
According to a second aspect of the present invention, the punching conductive material is a material that does not melt at a heating temperature at the time of flip chip mounting, and the punching bump is a material that melts at a heating temperature at the time of flip chip mounting. preferable. Thereby, the flip chip can be further joined in parallel.
[0009]
The punched bump is preferably made of a low melting point material such as solder or a conductive adhesive. The conductive adhesive is obtained by adding metal particles to a resin.
The punched conductive material is preferably made of a high melting point material such as copper, nickel, silver, tin, lead, or a composite material in which these conductive metal powders are dispersed in a high heat resistant resin such as polyimide.
[0010]
The tip of the punched bump is exposed on the surface of the insulating substrate. For example, the punching bump is embedded in the hole of the insulating substrate with a part thereof exposed. The front end of the punched bump may be positioned inside the hole opening before mounting, but it must be higher than the opening by heating and melting during mounting.
It is preferable that the protrusion height A from the insulating substrate at the tip of the punched bump before mounting is −0.010 to +0.08 mm (see FIG. 3). When the protruding height is lower than −0.010 mm, the tip of the punched bump may not be higher than the hole opening due to heat melting during mounting. In this case, the bonding area between the flip chip and the punching bump is reduced, and the bonding strength may be reduced. When the protruding height exceeds +0.08 mm, the mechanical strength of the bump is lowered, and the bump may be tilted or fall down.
[0011]
The invention of claim 3 is a method of manufacturing a flip chip mounting substrate having a plurality of terminal portions for mounting a flip chip.
Laminating a conductive material and a bump forming material on an insulating substrate;
The conductive material and the bump forming material stacked on each other are punched at a time by punching to obtain a punched conductive material and a stamped bump, and at the same time embedded in a terminal portion forming portion of the insulating substrate in a state where they are joined together. And a step of exposing one end of the punched conductive material to the back surface of the insulating base material and exposing the punched bump to the surface of the insulating substrate.
[0012]
In this manufacturing method, the terminal part for flip chip mounting is formed by a punching technique.
A conductive material and a bump forming material are stacked on an insulating substrate, and a predetermined portion is punched locally from there by punching. Then, a punched conductive material and a stamped bump are formed from the conductive material and the bump forming material. In accordance with this, the punching conductive material and the punching bump are embedded in the insulating substrate located below, and the tip of the punching bump is exposed to the insulating substrate.
Here, the punching of the conductive material and the bump forming material is performed by punching. For this reason, by controlling the movement amount of the punch, the embedding amount of the punching conductive material and the punching bump can be accurately controlled.
[0013]
For this reason, it is possible to form bumps having a uniform amount and a uniform height. Therefore, the formed bumps can be mounted in parallel with the flip chip, the bonding strength is improved, and electrical conduction can be reliably performed.
Further, since the punched conductive material is embedded in the insulating substrate, it serves as a conductive via. Therefore, both the bump and the conductive via can be formed by embedding with the punch.
[0014]
Preferably, the conductive material and the bump forming material are punched by a plurality of punches corresponding to the number of terminal portions. As a result, it is possible to form bumps more easily than when a plurality of terminal portions are formed separately.
[0015]
According to a fifth aspect of the present invention, it is preferable that the plurality of punches are controlled so that the amount of driving with respect to the bump forming portion of the insulating substrate is the same. Thereby, the embedding amount of the punching conductive material and the punching bump can be made the same. Therefore, the height of the punched bump can be made uniform.
[0016]
Preferably, the punching surfaces of the plurality of punches have the same shape as each other. Thereby, punch bumps having the same shape can be formed.
[0017]
The bump forming material is preferably a conductive sheet having a uniform thickness. As a result, a stamped bump having the same thickness can be obtained regardless of which part of the bump forming material is punched. For this reason, the bump protrusion height can be made uniform.
[0018]
As the conductive sheet, a copper foil, a solder foil, a conductive adhesive in which metal powder is dispersed in a resin, or the like can be used.
Of these, the conductive sheet is preferably solder or a conductive adhesive. Since these are low melting point materials, flip chip mounting can be performed at a low temperature.
[0019]
The conductive material is preferably a conductive sheet having a uniform thickness. As a result, a punched conductive material having the same thickness can be obtained regardless of which part of the conductive material is punched, and the protruding heights of the punched bumps joined to the punched conductive material can be made uniform.
[0020]
DETAILED DESCRIPTION OF THE INVENTION
Embodiment 1
A flip chip mounting substrate according to an embodiment of the present invention will be described with reference to FIGS.
As shown in FIGS. 1 and 2, the flip chip mounting substrate 5 of this example has a plurality of terminal portions 3 for mounting the flip chip 6.
The terminal portion 3 is formed by punching a conductive material and being formed by punching a conductive material 2 embedded in an insulating substrate 7 and punching bumps 1 formed by punching a bump forming material. The punching bump 1 is bonded to the end of the punching conductive material 2 and exposed on the surface of the insulating substrate 7.
[0021]
The terminal portions 3 for flip chip mounting are formed in a lattice pattern at a pitch of 0.250 mm at positions corresponding to the back surface of the flip chip.
The punching conductive material 2 is made of copper, and the punching bump 1 is made of solder.
A conductor layer 8 is provided on the surface of the insulating substrate 7.
[0022]
The punching bump 1 and the punching conductive material 2 are embedded in the punching hole 70 of the insulating substrate 7.
As shown in FIG. 3A, not only the punching bump 1 but also the punching conductive material 2 may protrude from the opening 71 of the punching hole 70. In this case, when the flip chip 6 is mounted, the punching bump 1 is melted to form a hat-like bump 12 covering the periphery of the protruding tip portion of the punching conductive material 2. In this case, the bump protrusion height A before flip-chip mounting is preferably 0.080 mm at the maximum. If it exceeds 0.080 mm, the mechanical strength of the bumps is lowered, and the bumps may be inclined or fall down.
[0023]
Further, as shown in FIG. 3B, it may protrude from the opening 71 of the punching hole 70 by the height of the punching bump 1. In this case, when the flip chip 6 is mounted, the flat spherical bump 13 made of only the bump material is formed on the insulating substrate 7.
[0024]
Further, as shown in FIG. 3C, the punching bump 1 may enter the punching hole 70 in a state where it is exposed to the insulating substrate 7. In this case, the tip of the bump 14 must be projected from the opening 71 of the punching hole 70 by melting the flip chip mounting. This is because the trapezoidal bump 14 may not be joined to the flip chip 6 if it does not protrude. In this case, the bump protrusion height A before flip-chip mounting is preferably a minimum of −0.010 mm. If it is lower than −0.010 mm, there is a possibility that the tip of the bump 14 will not protrude from the opening 71 of the punching hole 70 due to melting of the flip chip mounting.
[0025]
Next, a method for manufacturing the flip chip mounting substrate of this example will be described.
After forming the conductor circuit on the surface of the insulating substrate, as shown in FIG. 4A, the bump forming material 11 and the conductive material 21 are sequentially stacked on the insulating substrate 7 to obtain a stacked body 77. The insulating substrate 7 is a glass epoxy substrate having a thickness of 0.040 mm. The bump forming material 11 is a solder foil having a thickness of 0.020 mm. The conductive material 21 is a copper foil having a thickness of 0.035 mm.
The bump forming material 11 and the conductive material 21 are supplied by previously joining the foil during rolling.
[0026]
Next, as shown in FIG. 4B, the stacked body 70 is placed on the die 42. The die 42 faces the insulating substrate 7 side of the laminate 70. The die 42 has a guide hole 43 for guiding the vertical movement of the punching punch 41 at a position corresponding to the terminal portion forming portion of the insulating substrate 7. On the laminated body 70, the punching punch 41 is disposed at a position corresponding to the terminal forming portion. The diameter of the punching surface 411 of the punch 41 for punching is 0.09 mm, and the hole diameter of the die 42 is 0.100 mm.
The plurality of punches 41 for punching are controlled so as to have the same embedding amount. The punch height is controlled by processing a plurality of punches simultaneously with a surface grinder to produce a flat surface and make it uniform.
[0027]
Next, as shown in FIG. 4C, the conductive material 21 and the bump forming material 11 are punched by a plurality of punching punches 41 to form punched holes 20 and 10, and the punched conductive material 2 and the punched bump 1 are obtained. . Further, a punching hole 70 is formed in the insulating substrate 7 by these pressing forces, and these are embedded in the punching hole 70 to expose the punching bump 1 from the surface of the insulating substrate 7. The number and arrangement of the punching punches 41 correspond to the number and positions of the terminal portions. As a result, the punching conductive material 2 is embedded in the insulating substrate 7, and the terminal portion 3 to which the punching bump 1 is bonded is formed at the tip of the punching conductive material 2.
Thus, the flip chip mounting substrate 5 is obtained.
[0028]
In this example, the embedding amounts of the punching conductive material 2 and the punching bumps 1 are controlled by the punching punch 41. For this reason, it is possible to form the punching bump 1 having a uniform amount and a uniform height. Accordingly, when the flip chip 6 is bonded to the punched bump 1, the flip chip 6 can be mounted in parallel to the flip chip mounting substrate 5, and the bonding strength is improved. Therefore, electrical conduction with the flip chip can be reliably performed.
[0029]
Further, since the punched conductive material 2 is embedded in the insulating substrate 7, it serves as a conductive via that conducts electricity between the upper and lower sides of the insulating substrate 7. For this reason, when the flip chip 6 is joined to the punching bump 1, the electrical signal can be easily conducted to the inside of the insulating substrate 7 and the side opposite to the mounting through the punching conductive material 2.
[0030]
Embodiment 2
As shown in FIG. 5, this example is different from the first embodiment in that not only the punching punch 41 but also the return punch 44 is used when the punching conductive material 11 is embedded in the insulating substrate 7.
As shown in FIG. 5A, the punching punch 41 is disposed in the guide hole 43 of the die 42 before punching. At the time of punching by the punching punch 41, the return punch 44 receives the punched conductive material 11 and the punching insulating material 31. Subsequently, as shown in FIG. 5C, the punching punch 41 and the return punch 44 are returned upward, and the punching conductive material 11 is returned into the punching hole 70 of the insulating substrate 7. Thus, the terminal portion 3 is formed in which the punching conductive material 2 is embedded in the insulating substrate 7 and the punching bump 1 is exposed at the tip thereof.
Also in this example, the same effects as those of the first embodiment can be obtained.
[0031]
Embodiment 3
In this example, as shown in FIG. 6, the stacking order of the conductive material 21 and the bump forming material 11 is opposite to that of the first embodiment.
As shown in FIG. 6A, the conductive material 21 is laminated on the insulating substrate 7, and the bump forming material 11 is further laminated thereon. In this state, these are placed on the die 42 and the punching punch 41 is disposed.
[0032]
Next, as shown in FIG. 6B, the bump forming material 11 and the conductive material 21 are punched by the punching punch 41, and the punched bump 1 and the punched conductive material 2 are embedded in the insulating substrate 7. The tip of the punched bump 1 is exposed from the insulating substrate 7.
Also in this example, the same effects as those of the first embodiment can be obtained.
[0033]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, the board | substrate for flip chip mounting which has a junction part excellent in the electrical connection reliability with a flip chip, and its manufacturing method can be provided.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a flip chip mounting substrate in Embodiment 1;
2 is a partial enlarged cross-sectional view of a terminal portion of a flip chip mounting substrate in Embodiment 1. FIG.
FIGS. 3A to 3C are explanatory views (a) to (c) of protrusion heights of punched bumps in Embodiment 1. FIG.
4A to 4C are explanatory views (a) to (c) of a method for manufacturing a flip chip mounting substrate in Embodiment 1. FIG.
5A to 5C are explanatory views (a) to (c) of a manufacturing method of a flip chip mounting substrate in Embodiment 2. FIG.
6A to 6B are explanatory views (a) to (b) of a manufacturing method of a flip chip mounting substrate in Embodiment 3. FIG.
FIG. 7 is a cross-sectional view of a conventional flip chip mounting substrate.
FIG. 8 is an explanatory diagram showing a state in which a flip chip is inclined and bonded to a flip chip mounting substrate in a conventional example.
FIG. 9 is an explanatory diagram showing problems when bump amounts are different in the conventional example.
[Explanation of symbols]
1. . . Punching bumps,
10, 20, 70. . . Punching holes,
11. . . Bump forming material,
2. . . Punched conductive material,
21. . . Conductive material,
3. . . Terminal part,
41. . . Punch for punching,
42. . . Die,
43. . . Guide holes,
44. . . Return punch,
5). . . Flip chip mounting substrate,
6). . . Flip chip,
7). . . Insulating substrate,

Claims (6)

フリップチップを実装するための複数の端子部を有するフリップチップ実装用基板において,
上記端子部は,導電材を打抜いて形成されてなるとともに絶縁基板に埋め込まれ且つ一端を上記絶縁基板の裏面に露出している打抜き導電材と,該打抜き導電材の他端に接合され且つ上記絶縁基板表面に露出しているバンプとからなり,
上記バンプは,上記導電材と積層されたバンプ形成材を打抜いて上記打抜き導電材とともに形成された打抜きバンプであることを特徴とするフリップチップ実装用基板。
In a flip chip mounting substrate having a plurality of terminal portions for mounting a flip chip,
The terminal portion is formed by punching a conductive material, and is embedded in an insulating substrate and has one end exposed on the back surface of the insulating substrate , joined to the other end of the punched conductive material, and It consists of bumps exposed on the surface of the insulating substrate,
The flip-chip mounting substrate according to claim 1, wherein the bumps are punched bumps formed by punching a bump forming material laminated with the conductive material together with the punched conductive material .
請求項1において,上記打抜き導電材は,フリップチップ実装時の加熱温度では溶融しない材料であり,かつ上記打抜きバンプは,フリップチップ実装時の加熱温度で溶融する材料であることを特徴とするフリップチップ実装用基板。  2. The flip according to claim 1, wherein the punching conductive material is a material that does not melt at a heating temperature at the time of flip chip mounting, and the punching bump is a material that melts at a heating temperature at the time of flip chip mounting. Chip mounting substrate. フリップチップを実装するための複数の端子部を有するフリップチップ実装用基板の製造方法において,
絶縁基板の上に,導電材及びバンプ形成材を積層する工程と,
互いに積層された上記導電材及び上記バンプ形成材をパンチにより一度に打抜いて,打抜き導電材及び打抜きバンプを得るとともにこれらを互いに接合した状態で上記絶縁基板の端子部形成部分に一度に埋め込むとともに、上記打抜き導電材の一端を上記絶縁基材の裏面に露出させ且つ上記打抜きバンプを上記絶縁基板表面に露出させる工程とを含むことを特徴とするフリップチップ実装用基板の製造方法。
In a method of manufacturing a flip chip mounting substrate having a plurality of terminal portions for mounting a flip chip,
A step of laminating a conductive material and a bump forming material on an insulating substrate;
The conductive material and the bump forming material stacked on each other are punched at a time by punching to obtain a punched conductive material and a stamped bump, and at the same time embedded in a terminal portion forming portion of the insulating substrate in a state where they are joined together. And a step of exposing one end of the punched conductive material to the back surface of the insulating base and exposing the punched bump to the surface of the insulating substrate.
請求項3において,上記導電材及びバンプ形成材は,端子部の数に対応した複数のパンチにより打抜くことを特徴とするフリップチップ実装用基板の製造方法。  4. The method for manufacturing a flip-chip mounting substrate according to claim 3, wherein the conductive material and the bump forming material are punched by a plurality of punches corresponding to the number of terminal portions. 請求項4において,上記複数のパンチは,上記絶縁基板のバンプ形成部分に対する打ち込み量が同一になるように制御されていることを特徴とするフリップチップ実装用基板の製造方法。  5. The method of manufacturing a flip-chip mounting substrate according to claim 4, wherein the plurality of punches are controlled so that the amount of implantation with respect to the bump forming portion of the insulating substrate is the same. 請求項4または5において,上記複数のパンチの打抜き面は,互いに同一の形状を有することを特徴とするフリップチップ実装用基板の製造方法。  6. The method for manufacturing a flip chip mounting substrate according to claim 4, wherein the punching surfaces of the plurality of punches have the same shape.
JP2000368154A 2000-12-04 2000-12-04 Flip chip mounting substrate and manufacturing method thereof Expired - Fee Related JP4543544B2 (en)

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