JP4545010B2

JP4545010B2 - Vapor deposition equipment

Info

Publication number: JP4545010B2
Application number: JP2005041445A
Authority: JP
Inventors: 鉄也井上; 博之大工; 祐司松本
Original assignee: Hitachi Zosen Corp
Current assignee: Kanadevia Corp
Priority date: 2005-02-18
Filing date: 2005-02-18
Publication date: 2010-09-15
Anticipated expiration: 2025-02-18
Also published as: JP2006225725A

Description

本発明は、被蒸着部材に蒸発させた材料を蒸着させる装置に関し、例えば有機ＥＬディスプレイなどの画像表示部を製造するための蒸着装置などにも適用可能な技術に関するものである。 The present invention relates to an apparatus for depositing evaporated material on a member to be deposited, and relates to a technique applicable to, for example, a deposition apparatus for manufacturing an image display unit such as an organic EL display.

従来の蒸着装置として、例えば特許文献１が開示されている。
この蒸着装置は、減圧された成膜チャンバ内に、有機金属を貯蔵する坩堝と、坩堝内の蒸発室からガラス基板の蒸着面近傍へ蒸発した有機金属（以下、蒸発材料という）を移送する移送管を備え、移送管のうち蒸着面に相対する部分（平行となっている部分）である放出部に、蒸発材料を放出する複数の放出口が形成されている。 For example, Patent Document 1 is disclosed as a conventional vapor deposition apparatus.
This vapor deposition apparatus transfers a crucible for storing an organic metal into a decompressed film forming chamber and an organic metal (hereinafter referred to as an evaporation material) evaporated from the evaporation chamber in the crucible to the vicinity of the vapor deposition surface of the glass substrate. A plurality of discharge ports for discharging the evaporation material are formed in a discharge portion which is a portion (parallel portion) facing the vapor deposition surface of the transfer tube.

この構成により、ガラス基板の蒸着面と放出口とを間隔を小さくしても、蒸着面への蒸着の均一性を保つことができる。
特開２００２−２４９８６８号公報 With this configuration, even when the distance between the vapor deposition surface of the glass substrate and the discharge port is reduced, the uniformity of vapor deposition on the vapor deposition surface can be maintained.
JP 2002-249868 A

しかし、上記した従来の蒸着装置は、放出口から放出される蒸発材料の指向性について何ら考慮されていないため、ガラス基板の膜厚分布を均一とする点が不明瞭であり、指向性が強かった場合、ガラス基板の膜厚分布を均一とするために、ガラス基板と放出口との間隔を大きくしなければならず、そうすると成膜チャンバの容積が大きくなり、減圧するための時間を要するばかりか、ガラス基板以外への表面にも多くの蒸発物質が付着することになる。すなわち、有機金属の利用効率が低下し、これは所定の膜厚を得るまでに長い時間を要することになる。整理すると、膜厚分布の均一性を向上させる代わりに、蒸着させるための準備時間（減圧時間）、材料利用効率および成膜速度を犠牲にすることになる。 However, since the conventional vapor deposition apparatus described above does not consider any directivity of the evaporation material discharged from the discharge port, it is unclear that the film thickness distribution of the glass substrate is uniform, and the directivity is strong. In this case, in order to make the film thickness distribution of the glass substrate uniform, the distance between the glass substrate and the discharge port must be increased, and as a result, the volume of the film forming chamber increases and time is required for decompression. Or many evaporating substances will adhere also to the surface other than a glass substrate. That is, the utilization efficiency of the organic metal is lowered, and this takes a long time to obtain a predetermined film thickness. In summary, instead of improving the uniformity of the film thickness distribution, preparation time (decompression time) for vapor deposition, material utilization efficiency, and film formation speed are sacrificed.

そこで、本発明は、被蒸着部材へ放出される蒸発材料の指向性を弱めることにより、被蒸着部材に形成される膜厚を略均一にし得る蒸着装置を提供することを目的としたものである。 Therefore, the present invention has an object of providing a vapor deposition apparatus capable of making the film thickness formed on the vapor deposition member substantially uniform by weakening the directivity of the evaporation material released to the vapor deposition member. .

前記した目的を達成するために、本発明の請求項１に記載の発明は、蒸着材料を加熱して蒸発材料を得るための蒸発源と、前記蒸発源で得られた蒸発材料を移送する蒸発材料誘導路と、減圧された蒸着用容器内に設けられ前記蒸発材料誘導路から流入する蒸発材料を被蒸着部材へ放出する放出用部材とを備えた蒸着装置であって、前記蒸発材料誘導路および前記放出用部材に蒸発材料を保温するための加熱手段が配置され、前記放出用部材の上面に前記被蒸着部材へ蒸発材料を放出するためのノズル部材が突設されるとともに、前記ノズル部材の先端側に蒸発材料を拡散するための絞り部材が設けられており、前記ノズル部材の口径φＤと前記絞り部材の口径φＤ´とが
φＤ´／φＤ≦０．８
の関係を満たしていることを特徴としたものである。 In order to achieve the above-mentioned object, an invention according to claim 1 of the present invention is an evaporation source for heating an evaporation material to obtain an evaporation material, and an evaporation for transferring the evaporation material obtained by the evaporation source. A vapor deposition apparatus comprising: a material guiding path; and a discharge member that is provided in a decompressed vapor deposition container and discharges the evaporated material flowing from the evaporation material guiding path to a deposition target member, wherein the evaporation material guiding path And a heating means for keeping the evaporating material warm on the discharging member, and a nozzle member for discharging the evaporating material to the deposition target member is provided on the upper surface of the discharging member, and the nozzle member A throttle member for diffusing the evaporation material is provided on the tip side of the nozzle member, and a diameter φD of the nozzle member and a diameter φD ′ of the throttle member are
φD ′ / φD ≦ 0.8
It is characterized by satisfying the relationship.

また、請求項２に記載の発明は、請求項１に記載の発明であって、絞り部材はノズル部材に対して着脱自在に設けられており、蒸着材料や被蒸着部材に対する蒸着量等を変更する際、口径φＤ´が上式の条件を満たす絞り部材に取り替えることを特徴としたものである。 Further, the invention according to claim 2 is the invention according to claim 1, wherein the aperture member is provided detachably with respect to the nozzle member, and the vapor deposition material, the vapor deposition amount for the vapor deposition member, etc. are changed. In this case, the aperture diameter φD ′ is replaced with a diaphragm member that satisfies the above formula.

また、請求項３に記載の発明は、請求項１または請求項２に記載の発明であって、放出用部材は、蒸発材料を拡散させる拡散空間を有することを特徴としたものである。
また、請求項４に記載の発明は、請求項１に記載の発明であって、蒸発源を複数備えるとともに前記各蒸発源ごとに放出用部材を備え、前記各放出用部材の上面には所定間隔おきに複数の放出孔が形成されており、前記各放出孔に前記各放出用部材へ蒸発材料を放出するための複数のノズル部材が着脱自在に設けられるとともに、前記各ノズル部材の先端側に蒸発材料を拡散するための複数の絞り部材が着脱自在に設けられていることを特徴としたものである。 The invention described in claim 3 is the invention described in claim 1 or 2, wherein the discharge member has a diffusion space for diffusing the evaporation material.
The invention according to claim 4 is the invention according to claim 1, wherein a plurality of evaporation sources are provided, a discharge member is provided for each of the evaporation sources, and a predetermined surface is provided on an upper surface of each of the discharge members. A plurality of discharge holes are formed at intervals, and a plurality of nozzle members for discharging the evaporation material to each of the discharge members is detachably provided in each of the discharge holes, and the front end side of each of the nozzle members Further, a plurality of throttle members for diffusing the evaporation material are detachably provided.

また、請求項５に記載の発明は、請求項４に記載の発明であって、使用しないノズル部材の先端側に着脱自在な蓋部材を設けることを特徴としたものである。 The invention described in claim 5 is the invention described in claim 4, characterized in that a detachable lid member is provided on the tip side of a nozzle member that is not used.

本発明の蒸着装置は、ノズル部材の口径φＤと絞り部材の口径φＤ´とが、φＤ´／φＤ≦０．８の関係を満たすことにより、絞り部材から放出される蒸発材料の指向性が弱まることとなるため、蒸発材料は絞り部材から拡がりをもって放出され、被蒸着部材の蒸着面に均一に蒸着可能となり、したがって被蒸着部材の膜厚分布の均一性を向上させることができる。 In the vapor deposition apparatus of the present invention, the directivity of the evaporation material discharged from the throttle member is weakened when the aperture φD of the nozzle member and the aperture φD ′ of the aperture member satisfy the relationship of φD ′ / φD ≦ 0.8. Therefore, the evaporation material is expelled from the diaphragm member in a spread manner, and can be uniformly deposited on the deposition surface of the deposition target member. Therefore, the uniformity of the film thickness distribution of the deposition target member can be improved.

［実施の形態］
以下、本発明の実施の形態に係る蒸着装置を、図１〜図４に基づき説明する。
本実施の形態においては、有機ＥＬディスプレイの表示部を製造する場合、すなわち有機材料をガラス基板の表面に蒸着させる場合で、且つ異なる２種類の蒸着材料（有機材料である）を蒸着させる場合について説明する。なお、異なる蒸着材料のうち、主成分である材料を第１蒸着材料（ホストともいう）と称するとともに、微量材料を第２蒸着材料（ドーパントともいう）と称し、さらに各蒸着材料を加熱して蒸発させたものを第１および第２蒸発材料と称して説明を行う。 [Embodiment]
Hereinafter, the vapor deposition apparatus which concerns on embodiment of this invention is demonstrated based on FIGS.
In this embodiment, when manufacturing a display unit of an organic EL display, that is, when an organic material is vapor-deposited on the surface of a glass substrate, and when two different kinds of vapor deposition materials (which are organic materials) are vapor-deposited. explain. Of the different vapor deposition materials, the main component material is referred to as a first vapor deposition material (also referred to as a host), the trace material is referred to as a second vapor deposition material (also referred to as a dopant), and each vapor deposition material is further heated. The evaporated material will be referred to as first and second evaporation materials.

この蒸着装置は、図１に示すように、ガラス基板（被蒸着部材）１が、その蒸着面が下方となるように水平方向で挿入されるとともに保持具２により保持される蒸着用容器（蒸着室ともいう）３と、この蒸着用容器３内の下部で且つ互いに上下に配置されて第１および第２蒸着材料Ａ，Ｂが蒸発されてなる第１および第２蒸発材料Ａ´，Ｂ´を放出させる第１および第２放出用容器（放出用部材の一例）４，５と、上記蒸着用容器３の外部に配置されて互いに種類が異なる第１および第２蒸着材料Ａ´，Ｂ´を加熱して蒸発させる２個の第１および第２蒸発用容器（蒸発源、蒸発室ともいう）６，７と、これら各蒸発用容器６，７で蒸発された第１および第２蒸着材料Ａ´，Ｂ´を蒸着用容器３内に配置された各放出用容器４，５に導く第１および第２蒸発材料誘導管（蒸発材料誘導路の一例で、放出用容器も蒸発材料誘導路の一部を構成するものである）８，９と、第１放出用容器４の上方および側方を覆うように設けられシースヒータ１７（後述する）とともに第１放出用容器４を保温する第１保温カバー１０と、第２放出用容器５の下方および側方を覆うように設けられシースヒータ１７（後述する）とともに第２放出用容器５を保温する第２保温カバー１１と、第１放出用容器４と第２放出用容器５との間で相手の分解温度以上の熱が伝わることを防止する水冷式の冷却板１２と、第１保温カバー１０の上方に設けられ第１および第２放出用容器４，５からガラス基板１へ放出される第１および第２蒸発材料Ａ´，Ｂ´の飛翔経路を遮断または開放するシャッター１３と、ガラス基板１の直ぐ傍の位置に配置されて蒸発材料が付着した膜厚を検出する水晶振動子型の膜厚検出用センサ１４とから構成されている。 In this vapor deposition apparatus, as shown in FIG. 1, a glass substrate (vapor deposition member) 1 is inserted in a horizontal direction so that its vapor deposition surface is downward, and is held by a holder 2 (vapor deposition). 3) and the first and second evaporation materials A ′ and B ′ formed by evaporating the first and second evaporation materials A and B, which are disposed in the lower part of the evaporation container 3 and above and below each other. First and second discharge containers (an example of a discharge member) 4 and 5 for discharging the gas, and first and second vapor deposition materials A ′ and B ′ that are arranged outside the vapor deposition container 3 and have different types. First and second evaporation containers (also referred to as evaporation sources and evaporation chambers) 6, 7 that evaporate by heating, and first and second evaporation materials evaporated in the evaporation containers 6, 7. First and second A ′ and B ′ are led to the respective discharge containers 4 and 5 arranged in the vapor deposition container 3. The second evaporating material guide pipe (an example of the evaporating material guiding path, the discharge container also constitutes a part of the evaporating material guiding path) 8, 9 and the upper side and the side of the first discharging container 4 A sheath heater 17 (described later) and a first heat retaining cover 10 that retains the temperature of the first discharge container 4 and a sheath heater 17 (described later) provided to cover the lower side and the side of the second discharge container 5. ) And a water-cooling type that prevents heat above the other decomposition temperature from being transmitted between the second heat-recovering cover 11 that heats the second discharge container 5 and the first discharge container 4 and the second discharge container 5. Of the first and second evaporation materials A ′ and B ′ that are provided above the cooling plate 12 and the first heat retaining cover 10 and are discharged from the first and second discharge containers 4 and 5 to the glass substrate 1. Shutter 13 that shuts off or opens, and glass And a quartz oscillator type film thickness detection sensor 14 for detecting the thickness of the evaporation material is disposed at a position immediately beside the plate 1 is attached.

上記第１蒸発材料誘導管８は第１蒸発用容器６内で蒸発された第１蒸発材料Ａ´を第１放出用容器４に導くためのもので、また第２蒸発材料誘導管９は第２蒸発用容器７内で蒸発された第２蒸発材料Ｂ´を第２放出用容器５に導くためのものであり、さらにそれぞれの途中には、蒸発材料の移送量すなわち放出量の調節および開閉を行い得る流量制御弁（放出量調節手段の一例で、例えば開度の調節機能を有する開閉弁でもよい）１５，１６が設けられている。 The first evaporating material guiding tube 8 is for guiding the first evaporating material A ′ evaporated in the first evaporating vessel 6 to the first discharging vessel 4, and the second evaporating material guiding tube 9 is the first evaporating material guiding tube 9. 2 for guiding the second evaporating material B ′ evaporated in the evaporating container 7 to the second emissive container 5, and in the middle of each, adjusting and opening / closing the transfer amount of the evaporating material, that is, the releasing amount The flow control valves (an example of the discharge amount adjusting means, which may be an opening / closing valve having an opening adjusting function, for example) 15 and 16 are provided.

また、図２に示すように、各放出用容器４，５および各蒸発材料誘導管８，９の表面の略全体に亘って、保温のための加熱手段（保温手段ともいえる）として例えばシースヒータ１７が配置されており、各蒸発材料をそれぞれ最適な温度に保持（維持）するように考慮されている（なお、図２には、放出用容器４，５に設けた場合についてだけ図示している）。 Further, as shown in FIG. 2, for example, a sheath heater 17 is used as a heating means (also referred to as a heat holding means) for keeping the temperature substantially over the entire surfaces of the discharge containers 4 and 5 and the evaporation material guide pipes 8 and 9. Are arranged so as to keep (maintain) each evaporating material at an optimum temperature (note that FIG. 2 shows only the case where they are provided in the discharge containers 4 and 5. ).

なお、上記各蒸発用容器６，７内には、図示しないが、蒸着材料を収納する材料収納容器がそれぞれ配置されるとともに、これら各材料収納容器を加熱して蒸着材料を蒸発させるための加熱手段（例えば、電熱ヒータが用いられる）が配置され、さらに個別に容器内の空気を排出可能（真空可能）にされている。 Although not shown, each of the evaporation containers 6 and 7 is provided with a material storage container for storing a vapor deposition material, and heating for evaporating the vapor deposition material by heating each of the material storage containers. Means (for example, an electric heater is used) are arranged, and the air in the container can be discharged individually (vacuumable).

次に、上記各放出用容器４，５について説明する。
これら各放出用容器４，５は所定厚さで且つ平面視が矩形状（勿論、円形、多角形などであってもよい）にされるとともに内部にそれぞれ拡散空間（バッファ空間ともいい、蒸発材料の濃度の均一化を図り得る）４ａ，５ａを有する箱形状の容器にされている。 Next, the discharge containers 4 and 5 will be described.
Each of these discharge containers 4 and 5 has a predetermined thickness and a rectangular shape in plan view (of course, it may be circular or polygonal), and each has a diffusion space (also referred to as a buffer space, evaporating material). In a box-like container having 4a and 5a.

そして、第１蒸発材料Ａ´を放出する第１放出用容器４が上方に配置されるとともに、第２蒸発材料Ｂ´を放出する第２放出用容器５が下方に配置されている。
また、第１放出用容器４および第２放出用容器５の上面には、放出孔４ｂ，５ｂが所定間隔おきに例えば縦横に複数列でもって複数個形成され、その放出孔４ｂ，５ｂの上部には取付ネジ２０により着脱自在な口径φＤの放出ノズル（ノズル部材）２１，２２が取り付けられており、放出ノズル２１，２２の先端側（上部）には着脱自在なオリフィス部材（絞り部材）２３，２４が設けられている。このオリフィス部材２３，２４はキャップ状に形成されており、その上部に放出ノズル２１，２２からの蒸発材料が通過する口径φＤ´のオリフィス２３ａ，２４ａが形成されている。なお、このオリフィス部材２３，２４の内側面および放出ノズル２１，２２の上方外側面にネジ山が形成されているため、オリフィス部材２３，２４は、周方向に回転させることにより、着脱可能となっている。 A first discharge container 4 that discharges the first evaporating material A ′ is disposed above, and a second discharge container 5 that discharges the second evaporating material B ′ is disposed below.
A plurality of discharge holes 4b and 5b are formed in a plurality of rows, for example, vertically and horizontally at predetermined intervals on the upper surfaces of the first discharge container 4 and the second discharge container 5, and the upper portions of the discharge holes 4b and 5b. The discharge nozzles (nozzle members) 21 and 22 having a diameter φD that can be attached and detached by attachment screws 20 are attached to the distal ends (upper portions) of the discharge nozzles 21 and 22. , 24 are provided. The orifice members 23 and 24 are formed in a cap shape, and orifices 23a and 24a having a diameter φD ′ through which the evaporation material from the discharge nozzles 21 and 22 passes are formed. Since threads are formed on the inner side surfaces of the orifice members 23 and 24 and the upper outer side surfaces of the discharge nozzles 21 and 22, the orifice members 23 and 24 can be attached and detached by rotating in the circumferential direction. ing.

詳しく説明すれば、図３に示すように、第２放出用容器５の表面に形成される各放出孔５ｂの上方に位置する部分の第１放出用容器４に貫通穴４ｃが形成され、この貫通孔４ｃを介して各放出孔５ｂの上部に背丈の長い放出ノズル２２が突設されているとともに、第１放出用容器４の表面における貫通孔４ｃの近傍に形成される各放出孔４ｂの上部に背丈の短い放出ノズル２１が突設されている。なお、放出ノズル２１および放出ノズル２２の背丈は、ガラス基板１と各ノズル２１，２２の開口部との間隔を等しくするため、各ノズル２１，２２の開口部の高さ位置が同一となるよう形成されている。 More specifically, as shown in FIG. 3, a through hole 4 c is formed in the first discharge container 4 at a portion located above each discharge hole 5 b formed on the surface of the second discharge container 5. A long discharge nozzle 22 projects from the top of each discharge hole 5b via the through hole 4c, and each discharge hole 4b formed near the through hole 4c on the surface of the first discharge container 4 A discharge nozzle 21 having a short height is provided at the top. The heights of the discharge nozzle 21 and the discharge nozzle 22 are set such that the height positions of the openings of the nozzles 21 and 22 are the same in order to equalize the distance between the glass substrate 1 and the openings of the nozzles 21 and 22. Is formed.

ここで、上記オリフィス２３ａの口径φＤ´の設定方法について説明する。
まず、蒸着材料Ａ，Ｂであるホール輸送性材料α−ＮＰＤを蒸着する際の各放出用容器４，５および各放出ノズル２１，２２内における各蒸発材料Ａ´、Ｂ´の平均自由行程σは、α−ＮＰＤの擬似的球体の直径ｄを１０×１０^−８（Å）、排気量１０００Ｌ／ｓおよびガス放出量などから試算した各放出用容器４，５内の真空度（蒸気圧）Ｐを０．１３（Ｐａ）、各放出用容器４，５の最大加熱温度３５０（℃）（すなわちＴ＝６２３．１５（Ｋ））、係数をＡとすると、
σ∝Ａ・Ｔ／ｄ２Ｐ・・・（ｂ）
より、σ≒１４ｍｍとなる。なお、各放出用容器４，５における拡散空間４ａ，５ａの厚さ（以下、放出用容器４，５の厚さという）は、各放出用容器４，５内における蒸発材料Ａ´、Ｂ´を容器の内壁に衝突させることを考慮して、各蒸発材料Ａ´、Ｂ´の平均自由行程以下である１０ｍｍとして製作する。 Here, a method for setting the diameter φD ′ of the orifice 23a will be described.
First, evaporation material A, the evaporation material A'in a is hole-transporting material alpha-NPD each release container 4, 5 and the discharge nozzle 21, 22 at the time of depositing the B, as the average free path of B' σ is the degree of vacuum (vapor pressure) in each of the discharge containers 4 and 5 calculated from the diameter d of the pseudo sphere of α-NPD from 10 × 10 ⁻⁸ (Å), the displacement of 1000 L / s and the amount of gas released. ) When P is 0.13 (Pa), the maximum heating temperature 350 (° C.) of each discharge container 4 and 5 (that is, T = 623.15 (K)), and the coefficient is A,
σ∝A · T / d2P (b)
Therefore, σ≈14 mm. The thicknesses of the diffusion spaces 4a and 5a in the discharge containers 4 and 5 (hereinafter referred to as the thickness of the discharge containers 4 and 5) are the evaporation materials A ′ and B ′ in the discharge containers 4 and 5, respectively. the considering that make collision with the inner wall of the vessel, the evaporation material A', fabricated as 10mm average or less free line enough for B'.

次に、ガラス基板１に対する蒸着作業を行う前に厚さ１０ｍｍの各放出用容器４，５を使用して蒸着材料Ａ、Ｂを蒸発させ、その時の放出ノズル２１，２２の口径φＤとｃｏｓ^ｎθ則のｎ値との関係を示すグラフＭ（図４の実線）を作成するとともに、口径φＤが６．５ｍｍの放出ノズル２１，２２に設けられたオリフィス部材２３，２４の口径φＤ´とｃｏｓ^ｎθ則のｎ値との関係を示すグラフＮ（図４の一点鎖線）を作成する（図４参照）。なお、上記グラフＭは、放出ノズル２１，２２の口径φＤの大きさ変化させて、それら口径φＤごとの蒸発材料の放出量を計測することにより作成され、上記グラフＮは、所定の口径φＤの放出ノズル２１，２２に設けられたオリフィス部材２３，２４の口径φＤ´の大きさを変化させて、それら口径φＤ´ごとの蒸発材料の放出量を計測することにより作成される。また、上記各グラフにおいては、各放出ノズル２１，２２の鉛直方向からの角度を立体角αとすると、ｃｏｓ^ｎθ則のｎ値が最適な範囲である４〜６のとき、ガラス基板１の蒸着面に均一に蒸着させる立体角αで蒸発材料を放出することができ、またｃｏｓ^ｎθ則のｎ値が小さくなるにつれて立体角αは大きくなり、ｃｏｓ^ｎθ則のｎ値が大きくなるにつれて立体角αは小さくなる、すなわちｃｏｓ^ｎθ則のｎ値が大きいほど指向性が強くなり（狭まり）、ｎ値が小さいほど指向性が弱くなる（拡がる）。 Next, before performing the vapor deposition operation on the glass substrate 1, the vapor deposition materials A and B are evaporated using the discharge containers 4 and 5 having a thickness of 10 mm, and the diameters φD and cos ⁿ of the discharge nozzles 21 and 22 at that time are evaporated. A graph M (solid line in FIG. 4) showing the relationship with the n value of the θ-law is created, and the diameters φD ′ and cos of the orifice members 23 and 24 provided in the discharge nozzles 21 and 22 having the diameter φD of 6.5 mm. A graph N (one-dot chain line in FIG. 4) showing the relationship with the n value of the ⁿ θ rule is created (see FIG. 4). Note that the graph M is created by changing the size of the diameter φD of the discharge nozzles 21 and 22 and measuring the discharge amount of the evaporation material for each of the diameters φD, and the graph N has a predetermined diameter φD. It is created by changing the size of the diameter φD ′ of the orifice members 23, 24 provided in the discharge nozzles 21, 22 and measuring the discharge amount of the evaporation material for each of the diameters φD ′. Moreover, in each said graph, when the angle from the perpendicular direction of each discharge | emission nozzle 21 and 22 is made into the solid angle (alpha), when the n value of cosn ⁽ theta) rule is 4-6 which is the optimal range, The evaporation material can be released at a solid angle α uniformly deposited on the vapor deposition surface, and the solid angle α increases as the n value of the cos ⁿ θ rule decreases, and as the n value of the cos ⁿ θ rule increases. The solid angle α becomes smaller, that is, the larger the n value of the cos ⁿ θ rule, the stronger the directivity (narrows), and the smaller the n value, the weaker the directivity (expands).

ここで、各放出ノズル２１，２２に設けられたオリフィス部材２３，２４から放出される各蒸発材料Ａ´、Ｂ´の指向性を弱めるためには、すなわちガラス基板１における膜厚の均一性を維持させるためには、ｃｏｓ^ｎθ則のｎ値が６以下（ｎ≦６）となることが望まれ、図４のグラフにより、このオリフィス部材２３，２４が上記条件を満たすには、オリフィス部材２３，２４の口径φＤ´を５．２ｍｍ程度にすればよいことがわかる。 Here, in order to weaken the directivity of the evaporation materials A ′ and B ′ discharged from the orifice members 23 and 24 provided in the discharge nozzles 21 and 22, in other words, the film thickness uniformity in the glass substrate 1 is reduced. In order to maintain this, it is desired that the n value of the cos ⁿ θ rule is 6 or less (n ≦ 6). According to the graph of FIG. It can be seen that the diameters φD ′ of 23 and 24 should be about 5.2 mm.

このように、オリフィス部材２３，２４の口径φＤ´（５．２ｍｍ）を放出ノズル２１，２２の口径φＤ（６．５ｍｍ）の１０％以上且つ８０％以下の大きさとすることにより、すなわち放出ノズル２１，２２の口径φＤとオリフィス部材２３，２４の口径φＤ´とが、
０．１≦φＤ´／φＤ≦０．８・・・（ａ）
の関係を満たすことにより、ｎ値が６以下のｃｏｓ^ｎθ則による蒸発材料Ａ´、Ｂ´の放出が行われ、オリフィス部材２３，２４から放出される各蒸発材料Ａ´、Ｂ´の指向性が弱まることとなるため、各蒸発材料Ａ´、Ｂ´はオリフィス部材２３，２４から拡がりをもって放出され、被蒸着部材の蒸着面に均一に蒸着可能となり、したがってガラス基板１の膜厚分布の均一性を向上させることができる。 In this way, by setting the diameter φD ′ (5.2 mm) of the orifice members 23 and 24 to be not less than 10% and not more than 80% of the diameter φD (6.5 mm) of the discharge nozzles 21 and 22, that is, the discharge nozzle. The diameter φD of 21 and 22 and the diameter φD ′ of the orifice members 23 and 24 are
0.1 ≦ φD ′ / φD ≦ 0.8 (a)
By satisfying the above relationship, the evaporation materials A ′ and B ′ are discharged by the cos ⁿ θ law with an n value of 6 or less, and the evaporation materials A ′ and B ′ emitted from the orifice members 23 and 24 are directed. Therefore, the evaporation materials A ′ and B ′ are discharged from the orifice members 23 and 24 in a spread manner, and can be uniformly deposited on the deposition surface of the deposition target member. Uniformity can be improved.

また、ガラス基板１の膜厚分布の均一性が向上されることにより、ガラス基板１と各放出用容器４，５との間隔を小さくすることができるため、材料収率を向上させることができ、また蒸着用容器３のサイズを小型化することができるため、蒸着用容器３内を減圧する時間を短縮することができる。 Further, since the uniformity of the film thickness distribution of the glass substrate 1 can be improved, the distance between the glass substrate 1 and each of the discharge containers 4 and 5 can be reduced, so that the material yield can be improved. Moreover, since the size of the vapor deposition container 3 can be reduced, the time for depressurizing the inside of the vapor deposition container 3 can be shortened.

また、各蒸発材料Ａ´、Ｂ´はオリフィス部材２３，２４から拡がりをもって放出されることとなるため、ガラス基板１の蒸着面が広い場合でも、各放出ノズル２１同士の間隔および各放出ノズル２２同士の間隔を比較的広くすることができ、したがって各放出ノズル２１，２２の数を減らすことができる。このとき、使用しない放出ノズル２１，２２には、図５に示すように、着脱自在な蓋部材２５を設けて蒸発材料Ａ´，Ｂ´がガラス基板１に放出されないようにする。 Further, since each of the evaporation materials A ′ and B ′ is discharged from the orifice members 23 and 24 with a spread, even when the vapor deposition surface of the glass substrate 1 is wide, the intervals between the discharge nozzles 21 and the discharge nozzles 22. The distance between them can be made relatively wide, and therefore the number of each discharge nozzle 21, 22 can be reduced. At this time, as shown in FIG. 5, the discharge nozzles 21 and 22 that are not used are provided with a detachable lid member 25 so that the evaporation materials A ′ and B ′ are not discharged to the glass substrate 1.

具体例として、従来、３７０ｍｍ×４７０ｍｍサイズのガラス基板１に対して蒸着を行う際、各放出用容器にはそれぞれ口径φＤが６．５ｍｍの１３個の放出ノズルが設けられ、またガラス基板と各放出用容器との間隔が３００ｍｍとされていたが、本発明では、各放出用容器４，５にそれぞれ口径φＤが６．５ｍｍの５本〜８本の放出ノズル２１，２２を設けるとともに口径φＤ´が５．２ｍｍのオリフィス部材２３，２４を設け、またガラス基板１と各放出用容器４，５との間隔を１５０ｍｍ〜２００ｍｍとすればよくなり、従来と変わらぬ膜厚均一性（±３％以内）を維持することができ、材料収率においては２０％以上を得ることができた。 As a specific example, conventionally, when performing vapor deposition on a glass substrate 1 having a size of 370 mm × 470 mm, each discharge container is provided with 13 discharge nozzles each having a diameter φD of 6.5 mm. In the present invention, the discharge containers 4 and 5 are provided with 5 to 8 discharge nozzles 21 and 22 each having a diameter φD of 6.5 mm and the diameter φD. It is only necessary to provide orifice members 23 and 24 having a thickness of 5.2 mm, and the distance between the glass substrate 1 and each of the discharge containers 4 and 5 to be 150 mm to 200 mm. %), And a material yield of 20% or more could be obtained.

また、オリフィス部材２３，２４は放出ノズル２１，２２に対して着脱自在とされており、蒸着材料Ａ，Ｂ、ガラス基板１に対する蒸着量、および放出用容器４，５の加熱温度や真空度等を変更する際、口径φＤ´が上記（ａ）式の条件を満たすオリフィス部材２３，２４に取り替えることのみ、もしくはオリフィス部材２３，２４に取り替えるとともに蓋部材２５を用いてレイアウトを変更することで対応することができるため、上述した変更に対してスムーズに対応することができ、したがって作業時間を大幅に短縮することができる。 The orifice members 23 and 24 are detachable from the discharge nozzles 21 and 22, and the vapor deposition materials A and B, the vapor deposition amount on the glass substrate 1, the heating temperature and the degree of vacuum of the discharge containers 4 and 5, etc. Is changed by replacing the orifice members 23 and 24 with the diameter φD ′ satisfying the condition of the above formula (a), or by replacing the orifice members 23 and 24 and changing the layout using the lid member 25. Therefore, it is possible to smoothly cope with the above-described change, and therefore, the working time can be greatly shortened.

なお、上記実施の形態においては、図４におけるオリフィス部材２３，２４の口径φＤ´とｃｏｓ^ｎθ則のｎ値との関係を示すグラフの特性は、放出ノズル２１，２２の口径φＤの大きさを変えても同じであったため、いずれの口径φＤの放出ノズル２１，２２を使用しても、上記（ａ）式の関係は成立する。 In the above embodiment, the characteristic of the graph showing the relationship between the diameter φD ′ of the orifice members 23 and 24 in FIG. 4 and the n value of the cos ⁿ θ rule is the size of the diameter φD of the discharge nozzles 21 and 22. Therefore, even if the discharge nozzles 21 and 22 having any diameter φD are used, the relationship of the above formula (a) is established.

また、上記実施の形態においては、各放出用容器４，５の表面に設けられる放出孔４ｂ，５ｂを、縦横に、すなわち二次元的に配置したが、例えば一列（一次元的）に配置してもよい。 In the above embodiment, the discharge holes 4b and 5b provided on the surfaces of the discharge containers 4 and 5 are arranged vertically and horizontally, that is, two-dimensionally. For example, they are arranged in one row (one-dimensionally). May be.

また、上記実施の形態においては、第１および第２蒸発用容器６，７を蒸着用容器３の外方に配置したが、これら蒸発用容器６，７を、蒸発材料誘導管８，９を含めて蒸着用容器３内に配置してもよい。 In the above-described embodiment, the first and second evaporation containers 6 and 7 are arranged outside the evaporation container 3, but the evaporation containers 6 and 7 are connected to the evaporation material guide tubes 8 and 9, respectively. You may arrange | position in the container 3 for vapor deposition.

本発明の実施の形態に係る蒸着装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the vapor deposition apparatus which concerns on embodiment of this invention. 同蒸着装置における要部斜視図である。It is a principal part perspective view in the vapor deposition apparatus. 図２のＣ−Ｃ断面図である。It is CC sectional drawing of FIG. 同放出ノズルの口径およびオリフィス部材の口径とｃｏｓ^ｎθ則のｎ値との関係を示す図である。It is a figure which shows the relationship between the aperture of the discharge nozzle, the aperture of the orifice member, and the n value of the cos ⁿ θ rule. 同使用しない放出ノズルに蓋部材を設けた蒸着装置の断面図である。It is sectional drawing of the vapor deposition apparatus which provided the cover member in the discharge nozzle which is not used.

Explanation of symbols

１ガラス基板
３蒸着用容器
４第１放出用容器
４ａ拡散空間
４ｂ放出孔
５第２放出用容器
５ａ拡散空間
５ｂ放出孔
５ｃ放出ノズル
５ｄ放出量検出孔
６第１蒸発用容器
７第２蒸発用容器
８第１蒸発材料誘導管
９第２蒸発材料誘導管
１７シースヒータ DESCRIPTION OF SYMBOLS 1 Glass substrate 3 Deposition container 4 1st discharge container 4a Diffusion space 4b Release hole 5 2nd discharge container 5a Diffusion space 5b Release hole 5c Release nozzle 5d Release amount detection hole 6 1st evaporation container 7 2nd evaporation Container 8 First evaporating material guide tube 9 Second evaporating material guide tube
17 sheath heater

Claims

An evaporation source for heating the vapor deposition material to obtain the evaporation material, an evaporation material guiding path for transferring the evaporation material obtained by the evaporation source, and a vacuum evaporation container provided in the decompressed deposition container from the evaporation material guiding path A vapor deposition apparatus comprising: a discharge member that discharges the inflowing evaporation material to the vapor deposition member;
A heating means for keeping the evaporation material in the evaporation material guiding path and the discharge member is disposed,
A nozzle member for discharging the evaporation material to the deposition target member is provided on the upper surface of the discharge member, and a throttle member for diffusing the evaporation material is provided on the tip side of the nozzle member, The diameter φD of the nozzle member and the diameter φD ′ of the throttle member are
φD ′ / φD ≦ 0.8
The vapor deposition apparatus characterized by satisfying the above relationship.

The aperture member is detachably attached to the nozzle member, and the aperture diameter φD ′ is replaced with an aperture member satisfying the above formula when changing the deposition material or the deposition amount on the deposition target member. The vapor deposition apparatus according to claim 1.

The vapor deposition apparatus according to claim 1, wherein the discharge member has a diffusion space for diffusing the evaporation material.

A plurality of evaporation sources and a discharge member for each evaporation source are provided, and a plurality of discharge holes are formed at predetermined intervals on the upper surface of each discharge member. A plurality of nozzle members for releasing the evaporation material to the member are detachably provided, and a plurality of throttle members for diffusing the evaporation material are detachably provided on the tip side of each nozzle member. The vapor deposition apparatus according to claim 1.

The vapor deposition apparatus according to claim 4, wherein a detachable lid member is provided on a tip end side of a nozzle member that is not used.