Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP4556901B2 - Gold alloy solder ball manufacturing method - Google Patents
[go: Go Back, main page]

JP4556901B2 - Gold alloy solder ball manufacturing method - Google Patents

Gold alloy solder ball manufacturing method Download PDF

Info

Publication number
JP4556901B2
JP4556901B2 JP2006097230A JP2006097230A JP4556901B2 JP 4556901 B2 JP4556901 B2 JP 4556901B2 JP 2006097230 A JP2006097230 A JP 2006097230A JP 2006097230 A JP2006097230 A JP 2006097230A JP 4556901 B2 JP4556901 B2 JP 4556901B2
Authority
JP
Japan
Prior art keywords
alloy solder
gold alloy
paste
solder ball
alumina substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006097230A
Other languages
Japanese (ja)
Other versions
JP2007268565A (en
Inventor
雅之 石川
正好 小日向
昭史 三島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP2006097230A priority Critical patent/JP4556901B2/en
Publication of JP2007268565A publication Critical patent/JP2007268565A/en
Application granted granted Critical
Publication of JP4556901B2 publication Critical patent/JP4556901B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Description

この発明は、金合金はんだボールをその形状及び寸法のバラツキが少なくかつ大量に製造する方法に関するものである。   The present invention relates to a method for manufacturing gold alloy solder balls in a large amount with little variation in shape and size.

一般に、GaAs光素子、GaAs高周波素子、熱伝素子などの半導体素子と基板との接合にPb−Sn合金はんだボールが使用されている。このPb−Sn合金はんだボールは、図2(a)に示されるように、表面に形状の均一な窪み2を形成したシリコン製基板1の表面に、図2(b)に示されるように、Pb−Sn合金はんだペースト3を充填したのちリフロー処理することにより製造されている。リフロー処理することにより図2(c)に示されるようにPb−Sn合金はんだペースト3に含まれるPb−Sn合金はんだ粉末は窪み2の中で溶融し凝集して球状のPb−Sn合金はんだボール4となる。その後、Pb−Sn合金はんだボールに付着しているフラックスは通常の洗浄法により除去してPb−Sn合金はんだボールが製造される(特許文献1参照)。   In general, Pb—Sn alloy solder balls are used for bonding a semiconductor element such as a GaAs optical element, a GaAs high frequency element, and a heat transfer element to a substrate. As shown in FIG. 2B, the Pb—Sn alloy solder ball is formed on the surface of the silicon substrate 1 in which the recesses 2 having a uniform shape are formed on the surface, as shown in FIG. The Pb—Sn alloy solder paste 3 is filled and then reflowed. As shown in FIG. 2 (c), the Pb—Sn alloy solder powder contained in the Pb—Sn alloy solder paste 3 melts and aggregates in the recesses 2 to form spherical Pb—Sn alloy solder balls. 4. Thereafter, the flux adhering to the Pb—Sn alloy solder ball is removed by a normal cleaning method to produce a Pb—Sn alloy solder ball (see Patent Document 1).

近年、Pb−Sn合金はんだは有害物質であるPbを主成分とするためにその使用が制限され、その使用が禁止されようとしている。そのために鉛フリーはんだが主に使用される傾向にあり、GaAs光素子、GaAs高周波素子、熱伝素子などの半導体素子と基板との接合にはAu−Sn合金はんだボールまたはAu−GeはんだボールなどのAu合金はんだボールが使用されようになってきた。前記Au−Sn合金はんだボールはSn:15〜25質量%を含有し、残部がAuおよび不可避不純物からなる組成を有することが知られており、またAu−GeはんだボールはGe:5〜15質量%を含有し、残部がAuおよび不可避不純物からなる組成を有することも知られている。
特開平9−150290号公報
In recent years, the use of Pb—Sn alloy solder is restricted because Pb, which is a harmful substance, is the main component, and its use is about to be prohibited. For this reason, lead-free solder tends to be mainly used. For bonding a semiconductor element such as a GaAs optical element, a GaAs high frequency element, and a heat transfer element to a substrate, an Au—Sn alloy solder ball or an Au—Ge solder ball is used. Au alloy solder balls have been used. The Au—Sn alloy solder ball contains Sn: 15 to 25% by mass, and the remainder is known to have a composition consisting of Au and inevitable impurities. The Au—Ge solder ball has Ge: 5 to 15 mass. It is also known that the composition has a composition composed of Au and inevitable impurities.
Japanese Patent Laid-Open No. 9-150290

しかし、前記従来の表面に形状の均一な窪みを形成したシリコン製基板を用い、前記金合金はんだペーストを前記窪みに充填した後リフロー処理すると、溶融した金合金はんだは窪みの中央に大きな金合金ハンダボールが生成するものの、さらに大きな金合金ハンダボールの周囲に微細な金合金はんだボールが窪みの壁面に付着して生成し、そのために均一な寸法の金合金ハンダボールが得られない。また、シリコン製基板に表面が平滑でかつ均一な形状の窪みを形成しようとするとコストがかかるなどの欠点があった。   However, when a silicon substrate having a uniform recess formed on the conventional surface is used and the gold alloy solder paste is filled in the recess and then reflowed, the molten gold alloy solder is a large gold alloy in the center of the recess. Although a solder ball is generated, a fine gold alloy solder ball is formed around a larger gold alloy solder ball by adhering to the wall surface of the recess, and therefore a gold alloy solder ball having a uniform size cannot be obtained. In addition, there is a disadvantage in that it is expensive to form a recess having a smooth surface and a uniform shape on a silicon substrate.

そこで、本発明者らは、低コストでかつ均一な形状の金合金ハンダボールを大量に得るべく研究を行った。その結果、
(イ)Sn:15〜25質量%を含有し、残部がAuおよび不可避不純物からなる組成を有する金合金はんだ並びにGe:5〜15質量%を含有し、残部がAuおよび不可避不純物からなる組成を有する金合金はんだを溶融して得られた溶融金合金はんだは、Auを多く含むために表面張力が大きく、球状ボールになりやすいこと、
(ロ)前記溶融金合金はんだは、シリコン製基板よりもアルミナ製基板に乗せる方が均一な形状の球形になりやすく、アルミナ製平板の上に乗せるだけで均一な形状になること、
(ハ)前記アルミナ製基板の表面が滑らかであるほど溶融金合金はんだに対する濡れ性が低くなることから、表面粗さ:0.05μm以下の表面滑らかなアルミナ製基板であることが好ましいこと、などの知見を得たのである。
Therefore, the present inventors have studied to obtain a large amount of gold alloy solder balls having a uniform shape at a low cost. as a result,
(B) A gold alloy solder containing Sn: 15 to 25% by mass, the balance being composed of Au and inevitable impurities, and Ge: 5 to 15% by mass, and the balance being composed of Au and inevitable impurities The molten gold alloy solder obtained by melting the gold alloy solder having a large amount of Au, so that the surface tension is large, and it is easy to become a spherical ball,
(B) The molten gold alloy solder is more easily formed into a spherical shape having a uniform shape when placed on an alumina substrate than a silicon substrate, and is simply formed on an alumina flat plate;
(C) The smoother the surface of the alumina substrate, the lower the wettability with respect to the molten gold alloy solder. Therefore, it is preferable that the surface of the alumina substrate is 0.05 μm or less. This knowledge was obtained.

この発明は、かかる知見にもとづいてなされたものであって、
(1)表面粗さ:0.05μm以下の表面平滑な平板からなるアルミナ製基板の上に、厚さ方向に貫通した貫通孔を有する平板からなる被覆板を載置し、前記貫通孔に金合金はんだペーストを充填したのち前記貫通孔を有する被覆板を除去してアルミナ製基板上に金合金ペーストを残留させ、次いで前記アルミナ製基板上に残留した金合金ペーストをリフロー処理する金合金ハンダボールの製造方法、に特徴を有するものである。
This invention was made based on such knowledge,
(1) Surface roughness: A coated plate made of a flat plate having a through hole penetrating in the thickness direction is placed on an alumina substrate made of a flat surface having a surface smoothness of 0.05 μm or less, and gold is placed in the through hole. A gold alloy solder ball that is filled with an alloy solder paste, removes the cover plate having the through-holes, leaves the gold alloy paste on the alumina substrate, and then reflows the gold alloy paste remaining on the alumina substrate. The manufacturing method is characterized.

この発明の金合金ハンダボールの製造方法を図1に基づいて具体的に説明する。先ず、表面粗さ:0.05μm以下の表面平滑な平板からなるアルミナ製基板5を用意する。この表面滑らかなアルミナ製基板5の上に、図1(a)に示されるように、厚さ方向に貫通した貫通孔6を有する平板からなる被覆板7を載置し、この被覆板7の貫通孔6に図1(b)に示されるように一般に知られているAu合金はんだペースト8を充填したのち、図1(c)に示されるように前記貫通孔6を有する被覆板7を除去してアルミナ製基板5の上に金合金ペースト8を残留させ、次いでアルミナ製基板上に残留した金合金ペースト8をリフロー処理すると、図1(d)に示されるように表面平滑なアルミナ製基板の上に形状が均一な球形の金合金ハンダボール9が形成される。   A method for producing a gold alloy solder ball according to the present invention will be specifically described with reference to FIG. First, an alumina substrate 5 made of a flat plate having a surface roughness of 0.05 μm or less is prepared. As shown in FIG. 1A, a covering plate 7 made of a flat plate having a through hole 6 penetrating in the thickness direction is placed on the smooth substrate 5 made of alumina. After filling the through hole 6 with a generally known Au alloy solder paste 8 as shown in FIG. 1 (b), the covering plate 7 having the through hole 6 is removed as shown in FIG. 1 (c). Then, when the gold alloy paste 8 is left on the alumina substrate 5 and then the gold alloy paste 8 remaining on the alumina substrate is reflowed, the surface smooth alumina substrate as shown in FIG. A spherical gold alloy solder ball 9 having a uniform shape is formed thereon.

前記被覆板の貫通孔6に金合金はんだペーストを充填する方法は、アルミナ製基板5の上に載置された貫通孔6を有する被覆板7の上から金合金はんだペーストを印刷することにより前記貫通孔に金合金はんだペーストを充填することが一層効率的に充填することができる。したがって、この発明は、
(2)前記アルミナ製基板の上に載置された貫通孔を有する被覆板の上から金合金はんだペーストを印刷することにより前記貫通孔に金合金はんだペーストを充填する前記(1)記載の金合金ハンダボールの製造方法、に特徴を有するものである。
In the method of filling the through hole 6 of the covering plate with the gold alloy solder paste, the gold alloy solder paste is printed from above the covering plate 7 having the through hole 6 mounted on the alumina substrate 5. Filling the through hole with the gold alloy solder paste can be more efficiently filled. Therefore, the present invention
(2) The gold according to (1), wherein the gold alloy solder paste is filled into the through hole by printing the gold alloy solder paste from the cover plate having the through hole placed on the alumina substrate. It has the characteristics in the manufacturing method of an alloy solder ball.

この発明の金合金ハンダボールの製造方法で使用するAu合金はんだペーストは、アトマイズして得られたAu合金はんだ粉末と市販のロジン、活性剤、溶剤および増粘剤からなるフラックスと5〜15質量%を混合して作製されたもの、またはアトマイズして得られたAu合金はんだ粉末とノンハロゲンフラックスとを混合して得られた三菱マテリアル株式会社製のAu合金はんだペーストを使用することができる。   The Au alloy solder paste used in the method for producing a gold alloy solder ball according to the present invention includes an Au alloy solder powder obtained by atomization, a flux composed of a commercially available rosin, an activator, a solvent and a thickener, and 5 to 15 mass. %, Or an Au alloy solder paste manufactured by Mitsubishi Materials Corporation obtained by mixing an Au alloy solder powder obtained by atomization and a non-halogen flux.

この発明の金合金ハンダボールの製造方法で使用するアルミナ製基板の表面の粗さを0.05μm以下と規定した理由は、アルミナ製基板の表面粗さが小さいほど製造した金合金ハンダボールの粒径のバラツキが小さくなるので好ましいが、アルミナ製基板の表面粗さが0.05μmを越えると、大きな金合金ハンダボールの周囲に微細な金合金はんだボールが生成するようになり、製造した金合金ハンダボールの形状及び寸法にバラツキが生じるなどして好ましくないからである。ここで言う「表面粗さ」はJISB0601により規定されているRa(算術平均高さ)を示し、カットオフ値λc:0.25、評価長さLn:1.25mmにて算出したRa(μm)である。   The reason why the surface roughness of the alumina substrate used in the method for manufacturing a gold alloy solder ball of the present invention is specified to be 0.05 μm or less is that the smaller the surface roughness of the alumina substrate, the smaller the grain size of the gold alloy solder ball manufactured. This is preferable because the variation in diameter is small, but when the surface roughness of the alumina substrate exceeds 0.05 μm, fine gold alloy solder balls are generated around the large gold alloy solder balls, and the manufactured gold alloy This is because the shape and dimensions of the solder balls are not preferable. “Surface roughness” as used herein indicates Ra (arithmetic average height) defined by JISB0601, and Ra (μm) calculated with a cutoff value λc: 0.25 and an evaluation length Ln: 1.25 mm. It is.

この発明の方法によると、従来の方法と比べて金合金はんだボールを形状が均一で寸法にバラツキがなく製造することができ、さらにこの発明の方法は基板として平板を使用するところから製造コスト低く抑えることができる。   According to the method of the present invention, the gold alloy solder balls can be manufactured with a uniform shape and no variation in dimensions as compared with the conventional method. Furthermore, the method of the present invention uses a flat plate as a substrate, so that the manufacturing cost is low. Can be suppressed.

実施例1
表1に示される表面粗さの異なる平板からなるアルミナ製基板を用意した。さらに直径:1mmの貫通孔を有し、厚さ:0.05mmを有する平板からなるSUS304ステンレス鋼製被覆板を用意した。さらに、Sn:20質量%を含有し、残部がAuおよび不可避不純物からなる組成を有するAu−Sn合金はんだ粉末にノンハロゲンフラックスを混合した三菱マテリアル株式会社製のAu−Sn合金はんだペーストを用意した。
Example 1
Alumina substrates made of flat plates with different surface roughness shown in Table 1 were prepared. Furthermore, a SUS304 stainless steel covering plate having a through hole with a diameter of 1 mm and a thickness of 0.05 mm was prepared. Furthermore, an Au—Sn alloy solder paste manufactured by Mitsubishi Materials Corporation, in which a non-halogen flux was mixed with Au—Sn alloy solder powder containing Sn: 20% by mass and the balance consisting of Au and inevitable impurities, was prepared.

前記直径:1mmの貫通孔を有し厚さ:0.05mmを有するSUS304ステンレス鋼製被覆板を表1に示される表面粗さの異なるアルミナ製基板の上に載置し、前記ステンレス鋼製被覆板の上から先に用意した三菱マテリアル株式会社製の金合金はんだペーストを印刷することにより貫通孔に前記金合金はんだペーストを充填し、SUS304ステンレス鋼製被覆板を外した後、昇温速度:4℃/minで加熱したのち温度:150℃に60秒保持し、さらに昇温速度:4℃/minで加熱したのち温度:320℃に30秒保持の条件のリフロー処理を施し、その後洗浄し乾燥することにより本発明法1〜5および比較法1を実施し、Au−Sn合金はんだボールをそれぞれ1000個づつ作製した。本発明法1〜5および比較法1によりそれぞれ作製した1000個のAu−Sn合金はんだボールの内の30個をそれぞれ任意に取り出して、それぞれ30個のAu−Sn合金はんだボールの最大径の平均値Xおよび最小径の平均値Yを測定し、その差(X−Y)をAu−Sn合金はんだボールの形状バラツキとして求め、その結果を表1に示した。   The SUS304 stainless steel coating plate having a through hole with a diameter of 1 mm and a thickness of 0.05 mm was placed on an alumina substrate having different surface roughness shown in Table 1, and the stainless steel coating was applied. The gold alloy solder paste manufactured by Mitsubishi Materials Co., Ltd., which was prepared in advance from the top of the plate, was filled in the through hole, and the SUS304 stainless steel covering plate was removed. After heating at 4 ° C / min, temperature: held at 150 ° C for 60 seconds, further heating rate: heated at 4 ° C / min, temperature: maintained at 320 ° C for 30 seconds, and then washed. By drying, the present invention methods 1 to 5 and comparative method 1 were carried out, and 1000 Au-Sn alloy solder balls were produced. Thirty of the 1,000 Au—Sn alloy solder balls respectively produced by the present invention methods 1 to 5 and comparative method 1 are arbitrarily taken out, and the average of the maximum diameters of the 30 Au—Sn alloy solder balls respectively. The value X and the average value Y of the minimum diameters were measured, and the difference (X−Y) was determined as the shape variation of the Au—Sn alloy solder balls. The results are shown in Table 1.

従来例1
表面に形状の均一な1000個の窪みを形成したシリコン製基板を用意し、この窪みに実施例1で用意したAu−Sn合金はんだペーストを充填したのち実施例1と同じ条件でリフロー処理を施し、その後洗浄し乾燥することにより従来法1を実施し、それによって1000個のAu−Sn合金はんだボールを製造した。従来法1で製造した1000個のAu−Sn合金はんだボールの内の30個を任意に取り出して、Au−Sn合金はんだボールの最大径の平均値Xおよび最小径の平均値Yを測定し、その平均値の差(X−Y)を金合金はんだボールの形状のバラツキとして求め、その結果を表1に示した。
Conventional Example 1
A silicon substrate having 1000 depressions with a uniform shape formed on the surface was prepared, and the Au-Sn alloy solder paste prepared in Example 1 was filled in the depressions, and then reflow treatment was performed under the same conditions as in Example 1. Then, the conventional method 1 was carried out by washing and drying, thereby producing 1000 Au—Sn alloy solder balls. 30 of the 1000 Au—Sn alloy solder balls manufactured by the conventional method 1 are arbitrarily taken out, and the average value X of the maximum diameter and the average value Y of the minimum diameter of the Au—Sn alloy solder balls are measured. The difference (XY) of the average values was determined as the variation in the shape of the gold alloy solder balls, and the results are shown in Table 1.

Figure 0004556901
Figure 0004556901

実施例2
Ge:12質量%を含有し、残部がAuおよび不可避不純物からなる組成を有するAu−Ge合金はんだ粉末にノンハロゲンフラックスを混合した三菱マテリアル株式会社製のAu−Ge合金はんだペーストを用意し、このAu−Ge合金はんだペーストを用いて実施例1と同様にしてアルミナ製基板の上に載置したステンレス鋼製被覆板の貫通孔に前記金合金はんだペーストを充填し、SUS304ステンレス鋼製被覆板を外した後、昇温速度:4℃/minで加熱したのち温度:250℃に60秒保持し、さらに昇温速度:4℃/minで加熱したのち温度:380℃に30秒保持の条件のリフロー処理を施し、その後洗浄し乾燥することにより本発明法6〜10および比較法2を実施し、Au−Ge合金はんだボールをそれぞれ1000個づつ作製した。本発明法6〜10および比較法2によりそれぞれ作製した1000個のAu−Ge合金はんだボールの内の30個をそれぞれ任意に取り出して、それぞれ30個のAu−Ge合金はんだボールの最大径の平均値Xおよび最小径の平均値Yを測定し、その差(X−Y)をAu−Ge合金はんだボールの形状バラツキとして求め、その結果を表2に示した。
Example 2
An Au—Ge alloy solder paste manufactured by Mitsubishi Materials Co., Ltd. prepared by mixing non-halogen flux with an Au—Ge alloy solder powder having a composition containing Ge: 12% by mass and the balance consisting of Au and inevitable impurities is prepared. The gold alloy solder paste was filled in the through hole of the stainless steel coating plate placed on the alumina substrate in the same manner as in Example 1 using the -Ge alloy solder paste, and the SUS304 stainless steel coating plate was removed. Then, after heating at a heating rate of 4 ° C./min, the temperature is maintained at 250 ° C. for 60 seconds, and after heating at a heating rate of 4 ° C./min, the temperature is maintained at 380 ° C. for 30 seconds. The present invention methods 6 to 10 and comparative method 2 are carried out by performing the treatment, and then washing and drying, and each of the Au—Ge alloy solder balls is 100 Pieces at a time to prepare. Thirty of the 1,000 Au—Ge alloy solder balls respectively produced according to the present invention methods 6 to 10 and comparative method 2 are arbitrarily taken out, and the average of the maximum diameters of the 30 Au—Ge alloy solder balls, respectively. The value X and the average value Y of the minimum diameters were measured, and the difference (X−Y) was determined as the shape variation of the Au—Ge alloy solder balls. The results are shown in Table 2.

従来例2
表面に形状の均一な1000個の窪みを形成したシリコン製基板を用意し、この窪みに実施例2で用意したAu−Ge合金はんだペーストを充填したのち実施例2と同じ条件でリフロー処理を施し、その後洗浄し乾燥することにより従来法2を実施し、それによって1000個のAu−Ge合金はんだボールを製造した。従来法2で製造した1000個のAu−Ge合金はんだボールの内の30個を任意に取り出して、Au−Ge合金はんだボールの最大径の平均値Xおよび最小径の平均値Yを測定し、その平均値の差(X−Y)を金合金はんだボールの形状のバラツキとして求め、その結果を表2に示した。
Conventional example 2
A silicon substrate having 1000 depressions with a uniform shape formed on the surface was prepared, and the Au-Ge alloy solder paste prepared in Example 2 was filled in the depressions, and then reflow treatment was performed under the same conditions as in Example 2. Thereafter, the conventional method 2 was carried out by washing and drying, thereby producing 1000 Au—Ge alloy solder balls. 30 of the 1000 Au—Ge alloy solder balls manufactured by the conventional method 2 are arbitrarily taken out, and the average value X of the maximum diameter and the average value Y of the minimum diameter of the Au—Ge alloy solder balls are measured. The difference (XY) of the average values was determined as the variation in the shape of the gold alloy solder balls, and the results are shown in Table 2.

Figure 0004556901
Figure 0004556901

表1〜2に示される結果から、本発明法1〜10により得られた金合金はんだボールは、従来法1〜2および比較法1〜2により得られた金合金はんだボールに比べて形状のバラツキが小さいところから、一層球形に近い金合金はんだボールが得られることが分かる。 From the results shown in Tables 1 and 2, the gold alloy solder balls obtained by the present invention methods 1 to 10 are shaped as compared with the gold alloy solder balls obtained by the conventional methods 1 and 2 and the comparison methods 1 and 2. From the fact that the variation is small, it can be seen that a gold alloy solder ball having a more spherical shape can be obtained.

この発明のAu合金はんだボールの製造方法を説明するための断面説明図である。It is sectional explanatory drawing for demonstrating the manufacturing method of Au alloy solder ball of this invention. 従来のAu合金はんだボールの製造方法を説明するための断面説明図である。It is sectional explanatory drawing for demonstrating the manufacturing method of the conventional Au alloy solder ball.

符号の説明Explanation of symbols

1:シリコン製基板、2:窪み、3:Pb−Sn合金はんだペースト、4:Pb−Sn合金はんだボール、5:アルミナ製基板、6:貫通孔、7:被覆板、8:Au合金はんだペースト、9:金合金はんだボール
1: Silicon substrate, 2: Depression, 3: Pb—Sn alloy solder paste, 4: Pb—Sn alloy solder ball, 5: Alumina substrate, 6: Through hole, 7: Cover plate, 8: Au alloy solder paste , 9: Gold alloy solder balls

Claims (4)

表面粗さ:0.05μm以下の表面平滑な平板からなるアルミナ製基板の上に、厚さ方向に貫通した貫通孔を有する平板からなる被覆板を載置し、前記貫通孔に金合金はんだペーストを充填したのち前記貫通孔を有する被覆板を除去してアルミナ製基板上に金合金ペーストを残留させ、次いで前記アルミナ製基板上に残留した金合金ペーストをリフロー処理することを特徴とする金合金ハンダボールの製造方法。 Surface roughness: A coated plate made of a flat plate having a through hole penetrating in the thickness direction is placed on an alumina substrate made of a flat plate having a smooth surface of 0.05 μm or less, and a gold alloy solder paste is placed in the through hole. The gold alloy paste is removed by removing the covering plate having the through holes and leaving the gold alloy paste on the alumina substrate, and then reflowing the gold alloy paste remaining on the alumina substrate. Solder ball manufacturing method. 前記アルミナ製基板の上に載置された貫通孔を有する被覆板の上から金合金はんだペーストを印刷することにより前記貫通孔に金合金はんだペーストを充填することを特徴とする請求項1記載の金合金ハンダボールの製造方法。 2. The gold alloy solder paste is filled in the through hole by printing a gold alloy solder paste on a cover plate having a through hole placed on the alumina substrate. Manufacturing method of gold alloy solder balls. 前記金合金はんだペーストは、Sn:15〜25質量%を含有し、残部がAuおよび不可避不純物からなることを特徴とする請求項1または2記載の金合金ハンダボールの製造方法。 3. The method for manufacturing a gold alloy solder ball according to claim 1, wherein the gold alloy solder paste contains Sn: 15 to 25 mass%, and the balance is made of Au and inevitable impurities. 前記金合金はんだペーストは、Ge:5〜15質量%を含有し、残部がAuおよび不可避不純物からなることを特徴とする請求項1または2記載の金合金ハンダボールの製造方法。 3. The method for manufacturing a gold alloy solder ball according to claim 1, wherein the gold alloy solder paste contains 5 to 15 mass% of Ge, and the balance is made of Au and inevitable impurities.
JP2006097230A 2006-03-31 2006-03-31 Gold alloy solder ball manufacturing method Expired - Fee Related JP4556901B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006097230A JP4556901B2 (en) 2006-03-31 2006-03-31 Gold alloy solder ball manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006097230A JP4556901B2 (en) 2006-03-31 2006-03-31 Gold alloy solder ball manufacturing method

Publications (2)

Publication Number Publication Date
JP2007268565A JP2007268565A (en) 2007-10-18
JP4556901B2 true JP4556901B2 (en) 2010-10-06

Family

ID=38671903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006097230A Expired - Fee Related JP4556901B2 (en) 2006-03-31 2006-03-31 Gold alloy solder ball manufacturing method

Country Status (1)

Country Link
JP (1) JP4556901B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100924818B1 (en) * 2007-11-13 2009-11-03 성균관대학교산학협력단 Solder Ball Manufacturing Method
JP2016112588A (en) * 2014-12-15 2016-06-23 住友金属鉱山株式会社 Au-Sn-BASED SOLDER ALLOY WHERE SURFACE CONDITION IS CONTROLLED AND SEALED OR BONDED ELECTRONIC COMPONENT USING THE SAME

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2560865B2 (en) * 1989-11-14 1996-12-04 三菱マテリアル株式会社 Gold alloy solder paste for semiconductor devices
JPH04262895A (en) * 1991-02-15 1992-09-18 Tanaka Kikinzoku Kogyo Kk Manufacture of metallic ultra fine ball
JP2917595B2 (en) * 1991-07-19 1999-07-12 松下電器産業株式会社 Metal ball forming method
JP3891346B2 (en) * 2002-01-07 2007-03-14 千住金属工業株式会社 Fine copper ball and method for producing fine copper ball

Also Published As

Publication number Publication date
JP2007268565A (en) 2007-10-18

Similar Documents

Publication Publication Date Title
JP4892340B2 (en) Solder composition and bump forming method using the same
JP2015220396A (en) Method for forming solder bumps and solder paste for solder ball fixing
JP2013110402A (en) Reflow film, method for forming solder bump, method for forming solder join, and semiconductor device
JP2013110403A (en) Reflow film, method for forming solder bump, method for forming solder join, and semiconductor device
JP2011147982A (en) Solder, electronic component, and method for manufacturing the electronic component
JP2022506217A (en) Mixed alloy solder paste, its manufacturing method, and soldering method
JPH1133776A (en) Solder material and electronic component using the same
JP4556901B2 (en) Gold alloy solder ball manufacturing method
JP6222415B1 (en) flux
JP5998875B2 (en) Solder bump manufacturing method
JP6263885B2 (en) Solder bump manufacturing method
CN101197296B (en) Flux-free bump reflow process
JP6004254B2 (en) Solder alloy powder for paste, paste and solder bump using the same
JP2009088431A (en) Bump forming paste and bump structure
JP2010062256A (en) Method of manufacturing semiconductor chip with bump
JP6511773B2 (en) Au-Sn alloy solder paste, method of manufacturing Au-Sn alloy solder paste, method of manufacturing Au-Sn alloy solder layer
JP2018206953A (en) Solder bump forming method and solder paste
JP2013004929A (en) Forming method of solder bump and paste for forming base
JP5003551B2 (en) Pb-Sn solder alloy powder for paste and Pb-Sn solder alloy ball
JP5652689B2 (en) Manufacturing method of electronic component bonded structure and electronic component bonded structure obtained by the manufacturing method
JPWO2019117041A1 (en) Solder paste, joint structure and method for manufacturing the joint structure
JP6111584B2 (en) Solder bump manufacturing method
JP6767665B1 (en) How to form a bump electrode substrate
JP2018098373A (en) Solder bump forming method
JP2010109022A (en) Method of forming solder bump

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080321

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100621

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100629

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100712

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130730

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees