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JP4576151B2 - Ceramic composition and ceramic wiring board - Google Patents
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JP4576151B2 - Ceramic composition and ceramic wiring board - Google Patents

Ceramic composition and ceramic wiring board Download PDF

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JP4576151B2
JP4576151B2 JP2004130029A JP2004130029A JP4576151B2 JP 4576151 B2 JP4576151 B2 JP 4576151B2 JP 2004130029 A JP2004130029 A JP 2004130029A JP 2004130029 A JP2004130029 A JP 2004130029A JP 4576151 B2 JP4576151 B2 JP 4576151B2
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JP2005306703A (en
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伯央 片岡
敬三 川村
明俊 和川
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Taiyo Yuden Co Ltd
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Description

本発明は、SrSiOを主結晶として含有するセラミックス組成物、及び該セラミック組成物を利用したセラミック配線基板に関する。 The present invention is a ceramic composition containing Sr 2 SiO 4 as a main crystal, and a ceramics wiring board using the ceramics composition.

電子部品の高集積技術の向上に伴い、配線基板のマザーボードへの実装密度の増大化が進んでいる。しかし、接続密度の増加に伴い、接続部にかかる負荷も増加傾向にある。   Along with the improvement of highly integrated technology of electronic components, the mounting density of wiring boards on a mother board is increasing. However, as the connection density increases, the load applied to the connection portion also tends to increase.

接続部位にかかる負荷としては主に熱応力による負荷であるが、この熱応力は接続対象物の線膨張係数に差があることから発生し、その差が大きいものほど強い負荷が接続部位に加わる。また、この熱応力は基板の大きさと共に加わる負荷も増加するため、接合の信頼性を向上させるためにも配線基板とマザーボードとの線膨張係数の差は少ない方が好ましい。   The load applied to the connection site is mainly due to thermal stress, but this thermal stress occurs due to the difference in the coefficient of linear expansion of the connection object. The larger the difference, the stronger the load applied to the connection site. . In addition, since the thermal stress increases with the size of the substrate, the difference in the linear expansion coefficient between the wiring substrate and the mother board is preferably small in order to improve the bonding reliability.

従来汎用的に使用されている配線基板の線膨張係数は7.0×10−6/K以下程度であるのに対し、マザーボードの線膨張係数は14.0×10−6/K程度であり、その差は大きく、マザーボードと配線基板との接合の信頼性を向上させるためにも、従来汎用的に利用されている配線基板よりも高い線膨張係数を持った配線基板が必要である。 The linear expansion coefficient of the wiring board that has been conventionally used for general purposes is about 7.0 × 10 −6 / K or less, whereas the linear expansion coefficient of the motherboard is about 14.0 × 10 −6 / K. The difference is large, and a wiring board having a higher linear expansion coefficient than that of a wiring board conventionally used for general purposes is required in order to improve the reliability of bonding between the mother board and the wiring board.

また、現在では、情報の大容量化、情報通信の高速化に伴い、高周波信号を損失なく伝送することが求められており、高周波領域での誘電損失の低い配線基板が求められている。高周波信号を損失なく伝送する上で、配線層を形成する導体として、銅や銀などの低抵抗金属を使用することが要求されているが、これらの低抵抗金属を導体材料として用いるために、基板材料は低温での焼成が可能であることが必要であり、また基板自体の誘電損失も低く抑えることも必要である。   At present, as information capacity increases and information communication speeds up, it is required to transmit high-frequency signals without loss, and a wiring board with low dielectric loss in the high-frequency region is required. In order to transmit a high-frequency signal without loss, it is required to use a low-resistance metal such as copper or silver as a conductor for forming a wiring layer, but in order to use these low-resistance metals as a conductor material, The substrate material must be able to be fired at a low temperature, and the dielectric loss of the substrate itself must be kept low.

これらの要求に対応するため、線膨張係数が高い組成物、誘電損失の低い組成物が種々検討されている。   In order to meet these requirements, various compositions having a high coefficient of linear expansion and compositions having a low dielectric loss have been studied.

例えば、下記特許文献1では、SiOが17〜45質量%、Alが2〜19質量%、Bが0.4〜9質量%、SrOが46〜63質量%含有するガラス材料から、Srシリケート結晶を析出させた結晶化ガラスからなるガラス組成物で、前記組成物は低温焼結が可能で高周波領域でも誘電損失の低い組成物であり、前記組成物を利用することで、優れた誘電特性を有する配線基板が得られることが開示されている。 For example, in the following Patent Document 1, SiO 2 is contained in an amount of 17 to 45% by mass, Al 2 O 3 is contained in an amount of 2 to 19% by mass, B 2 O 3 is contained in an amount of 0.4 to 9% by mass, and SrO is contained in an amount of 46 to 63% by mass. A glass composition comprising a crystallized glass in which Sr silicate crystals are precipitated from a glass material, the composition being a composition that can be sintered at a low temperature and has a low dielectric loss even in a high frequency region, and uses the composition Thus, it is disclosed that a wiring board having excellent dielectric properties can be obtained.

また、下記特許文献2では、SiO2 とMgOとCaOとを含み、熱処理することにより、メルウィナイト、モンティセライト、及びカルシウム珪酸塩のうちの少なくとも1種の結晶相が析出した結晶化ガラス組成物であり、前記組成物を利用することで線膨張係数の高い配線基板が得られることについて開示されている。 Further, in Patent Document 2 below, a crystallized glass composition containing SiO 2 , MgO and CaO, and by heat treatment, at least one crystal phase of merwinite, montericite, and calcium silicate is precipitated. It is disclosed that a wiring board having a high linear expansion coefficient can be obtained by using the composition.

更に、下記特許文献3では、ディオプサイド結晶相とコージェライト結晶相を含有し、残部がガラス相及び/又は他のセラミックス結晶相からなるとともに、開気孔率が1%以下であることを特徴とする組成物で、前記組成物を利用することで、線膨張係数が2.5〜9.0×10−6/K以上であり、かつ、60GHzでの誘電損失が20×10−4以下の特性をもった配線基板が得られることが開示されている。
特開2003−252678号公報 特開2000−185966号公報 特開2002−167270号公報
Furthermore, in the following Patent Document 3, a diopside crystal phase and a cordierite crystal phase are contained, the balance is made of a glass phase and / or other ceramic crystal phase, and the open porosity is 1% or less. By using the composition, the linear expansion coefficient is 2.5 to 9.0 × 10 −6 / K or more, and the dielectric loss at 60 GHz is 20 × 10 −4 or less. It is disclosed that a wiring board having the above characteristics can be obtained.
JP 2003-252678 A JP 2000-185966 A JP 2002-167270 A

しかしながら、一般に珪酸塩結晶では、線膨張係数や誘電損失と結晶構造の関係が深く、また、それらは概ね相反の関係にあって、高線膨張係数と低誘電損失という物性を両立させることは困難であった。珪酸塩以外で誘電率が15以下と低く、低温焼結が容易な結晶は稀である。上記特許文献1〜3の組成物においても、線膨張係数が高く、誘電損失が低い、という物性を満足できる領域で両立させるに至ってはいない。   However, in general, silicate crystals have a deep relationship between the linear expansion coefficient and dielectric loss and the crystal structure, and they are generally in a reciprocal relationship, making it difficult to achieve both the high linear expansion coefficient and the low dielectric loss. Met. Other than silicates, crystals with a low dielectric constant of 15 or less and easy to sinter at low temperatures are rare. Even in the compositions of Patent Documents 1 to 3, the physical properties of high linear expansion coefficient and low dielectric loss have not been achieved in a region where the physical properties can be satisfied.

また、上記特許文献1〜3の技術は、結晶性ガラス粉末を原料としているため、原料コストが高くなり、原料の取り扱い性が悪いという問題点もあった。更には、結晶化ガラスは、結晶化速度が速いため、結晶化度の制御が困難であるという問題点があった。   Moreover, since the technique of the said patent documents 1-3 uses crystalline glass powder as a raw material, there also existed a problem that raw material cost became high and the handleability of a raw material was bad. Furthermore, crystallized glass has a problem that it is difficult to control the degree of crystallinity because of its high crystallization speed.

したがって、本発明の目的は、低温焼成が可能で、高線膨張係数であり、かつ低誘電損失である基板材料であって、高周波伝送が可能で、マザーボードとの接合の信頼性の高い配線基板を得ることのできるセラミックス組成物及びそれを用いたセラミックス配線基板を提供することにある。   Therefore, an object of the present invention is a substrate material that can be fired at a low temperature, has a high linear expansion coefficient, and has a low dielectric loss, can be used for high-frequency transmission, and has high reliability in bonding with a motherboard. It is an object of the present invention to provide a ceramic composition and a ceramic wiring board using the ceramic composition.

上記目的を達成するため、本発明のセラミックス配線基板用セラミックス組成物の第1は、酸化物換算で、SiO18〜28質量部、SrO72〜82質量部からなる、ガラスでないセラミックス粉末からなる主成分(A)と、ホウ素の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるホウ素成分(B)とからなり、前記主成分(A)100質量部に対し酸化物換算で、前記ホウ素成分(B)を1〜3質量部含む原料を焼成することにより得られ、主結晶としてSrSiO結晶を含有することを特徴とする。
本発明のセラミックス配線基板用セラミックス組成物の第2は、酸化物換算で、SiO18〜28質量部、SrO72〜82質量部からなる、ガラスでないセラミックス粉末からなる主成分(A)と、ホウ素の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるホウ素成分(B)と、アルカリ金属の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるアルカリ金属成分(C)とからなり、前記主成分(A)100質量部に対し酸化物換算で、前記ホウ素成分(B)を0.5〜3質量部、前記アルカリ金属成分(C)を0.1〜1質量部含む原料を焼成することにより得られ、主結晶としてSrSiO結晶を含有することを特徴とする。
本発明のセラミックス配線基板用セラミックス組成物の第3は、酸化物換算で、SiO18〜28質量部、SrO72〜82質量部からなる、ガラスでないセラミックス粉末からなる主成分(A)と、ホウ素の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるホウ素成分(B)と、アルカリ金属の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるアルカリ金属成分(C)と、コバルト、銀及びアルミナの酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなる副成分(D)とからなり、前記主成分(A)100質量部に対し酸化物換算で、前記ホウ素成分(B)を0.5〜3質量部、前記アルカリ金属成分(C)を0.1〜1質量部、前記副成分(D)として、コバルト成分を0.1〜5質量部、銀成分を0.1〜1.0質量部、アルミナ成分を0.1〜0.5質量部の少なくとも1つを含む原料を焼成することにより得られ、主結晶としてSrSiO結晶を含有することを特徴とする。
In order to achieve the above object, the first ceramic composition for a ceramic wiring board according to the present invention is mainly composed of ceramic powder that is not glass and comprises 18 to 28 parts by mass of SiO 2 and 72 to 82 parts by mass of SrO in terms of oxide. The component (A) and the boron component (B) comprising at least one powder selected from boron oxide, carbonate, acetate, nitrate, fluoride, and a single metal , the main component (A) 100 It is obtained by firing a raw material containing 1 to 3 parts by mass of the boron component (B) in terms of oxide with respect to parts by mass, and contains Sr 2 SiO 4 crystals as main crystals.
The second of the ceramic composition for a ceramic wiring board of the present invention is a main component (A) composed of ceramic powder that is not glass, composed of 18 to 28 parts by mass of SiO 2 and 72 to 82 parts by mass of SrO , in terms of oxide , and boron. Boron component (B) composed of one or more kinds of powders selected from oxides, carbonates, acetates, nitrates, fluorides and single metals , and alkali metal oxides, carbonates, acetates, nitrates, fluorides And an alkali metal component (C) composed of one or more powders selected from a single metal , and the boron component (B) is 0.5 to 100 parts by mass in terms of oxide with respect to 100 parts by mass of the main component (A). It is obtained by firing 3 parts by mass of a raw material containing 0.1 to 1 part by mass of the alkali metal component (C), and contains Sr 2 SiO 4 crystals as main crystals.
Third ceramic wiring substrate for ceramic compositions of the present invention, in terms of oxide, SiO 2 18 to 28 parts by weight, consists SrO72~82 parts by mass mainly consisting of ceramic powder is not glass (A), boron Boron component (B) composed of one or more kinds of powders selected from oxides, carbonates, acetates, nitrates, fluorides and single metals , and alkali metal oxides, carbonates, acetates, nitrates, fluorides And an alkali metal component (C) composed of one or more powders selected from elemental metals, and one or more elements selected from oxides, carbonates, acetates, nitrates, fluorides and elemental metals of cobalt, silver and alumina. becomes because the auxiliary component composed of powder (D), in terms of oxide with respect to the main component (a) 100 parts by mass of the 0.5 to 3 parts by mass of boron component (B), the alkali metal component (C 0.1 to 1 part by mass, 0.1 to 5 parts by mass of the cobalt component, 0.1 to 1.0 part by mass of the silver component, and 0.1 to 0. It is obtained by firing a raw material containing at least one of 5 parts by mass and contains Sr 2 SiO 4 crystals as main crystals.

また、本発明のセラミックス配線基板は、上記セラミックス配線基板用セラミックス組成物で構成されたセラミックス層と、前記セラミックス層に積層された、導電性部材で形成された配線層を備えていることを特徴とする。 The ceramic wiring board of the present invention includes a ceramic layer made of the ceramic composition for a ceramic wiring board, and a wiring layer formed of a conductive member laminated on the ceramic layer. And

本発明のセラミックス組成物は、上記組成からなるSrSiO結晶を主結晶とした組成物であり、粒界相を除けば副結晶の含有量は極めて少ない組成物である。SrSiO結晶は、線膨張係数が高く、誘電損失が低い物性を備えた結晶であるため、SrSiO結晶を主結晶とした組成物とすることでSrSiOの結晶特性が強い組成物とすることができる。また、前記組成物はホウ素成分を含有しているため、焼成時に液相が形成され、焼成温度の低温化を図ることができる。よって、前記組成物を利用したセラミックス配線基板は、高周波領域における誘電特性の優れた、マザーボードとの接合の信頼性の高いセラミックス配線基板とすることができる。 The ceramic composition of the present invention is a composition having Sr 2 SiO 4 crystals having the above composition as the main crystal, and is a composition having a very small content of sub-crystals except for the grain boundary phase. Since the Sr 2 SiO 4 crystal is a crystal having a physical property with a high coefficient of linear expansion and a low dielectric loss, the crystal characteristics of the Sr 2 SiO 4 can be obtained by using a composition having the Sr 2 SiO 4 crystal as a main crystal. A strong composition can be obtained. Moreover, since the said composition contains a boron component, a liquid phase is formed at the time of baking and the firing temperature can be lowered. Therefore, the ceramic wiring board using the composition can be a ceramic wiring board having excellent dielectric characteristics in a high frequency region and high reliability in bonding to the mother board.

本発明のセラミックス配線基板用セラミックス組成物及びセラミックス配線基板のセラミックス層は、線膨張係数が9.5×10−6/K以上であり、かつ、誘電損失が15×10−4以下であることが好ましい。前記物性を備えたセラミックス組成物を基板材料として用いることにより、高周波領域における誘電特性、及びマザーボードとの接合の信頼性がより優れたセラミックス配線基板とすることができる。 The ceramic composition for a ceramic wiring board of the present invention and the ceramic layer of the ceramic wiring board have a linear expansion coefficient of 9.5 × 10 −6 / K or more and a dielectric loss of 15 × 10 −4 or less. Is preferred. By using the ceramic composition having the above physical properties as a substrate material, it is possible to obtain a ceramic wiring substrate having more excellent dielectric characteristics in a high frequency region and reliability of bonding with a mother board.

本発明のセラミックス配線基板用セラミックス組成物及びセラミックス配線基板は、900〜1000℃で焼結されたものであることが好ましい。上記温度で焼結が可能なセラミックス配線基板は、導電性部材として、銀、銅等の低抵抗金属を用いることが可能である。よって、より高周波領域での伝送が可能なセラミックス配線基板を得ることができる。 The ceramic composition for a ceramic wiring board and the ceramic wiring board of the present invention are preferably sintered at 900 to 1000 ° C. The ceramic wiring board that can be sintered at the above temperature can use a low-resistance metal such as silver or copper as the conductive member. Therefore, a ceramic wiring board capable of transmission in a higher frequency region can be obtained.

本発明のセラミックス配線基板用セラミックス組成物は低温焼結が可能な、高線膨張係数で、低誘電損失であるセラミックス組成物である。したがって、この組成物を利用したセラミックス配線基板は、高周波伝送に優れ、マザーボードとの接合の信頼性の高いセラミックス配線基板となる。 The ceramic composition for a ceramic wiring board of the present invention is a ceramic composition that can be sintered at a low temperature and has a high linear expansion coefficient and low dielectric loss. Therefore, the ceramic wiring board using this composition is excellent in high-frequency transmission, and becomes a ceramic wiring board with high reliability of bonding to the mother board.

本発明のセラミックス組成物の主成分(A)ガラスでない酸化物、炭酸塩等のセラミックス粉末を用いることができ、特に酸化物が好ましく用いられる。 Main component of the ceramic composition of the present invention (A) is an oxide not glass, it is possible to use a ceramic powder such as carbonates, in particular oxide is preferably used.

セラミックス組成物の主成分(A)は、酸化物換算で、SiO、及びSrOの配合割合、SiO18〜28質量部、SrO72〜82質量部となるように調整される。 Main component of the ceramic composition (A), in terms of oxide, the mixing ratio of SiO 2, and SrO is, SiO 2 18 to 28 parts by weight, is adjusted to be SrO72~82 parts by mass.

SiOが18質量部以下でSrOが82質量部以上であるとSrSiO結晶が多くなり誘電損失が上昇してしまい、SiOが28質量部以上でSrOが72質量部以下であるとSrSiO結晶が多くなり線膨張係数が低下してしまう。 When SiO 2 is 18 parts by mass or less and SrO is 82 parts by mass or more, Sr 3 SiO 5 crystals increase and dielectric loss increases, and SiO 2 is 28 parts by mass or more and SrO is 72 parts by mass or less. The SrSiO 3 crystal increases and the linear expansion coefficient decreases.

また、他の成分として、ホウ素成分、アルカリ金属成分、コバルト成分、銀成分、アルミナ成分を用いる。これらの材料としては、酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物、単体金属が用いられ、あるいは前記割合になるような組成のガラスなどを併用してもよいが、好ましくは酸化物が用いられる。
すなわち、本発明のセラミックス組成物の第1は、主成分(A)と、ホウ素成分(B)とからなる。
また、本発明のセラミック組成物の第2は主成分(A)と、ホウ素成分(B)と、アルカリ金属成分(C)とからなる。
また、本発明のセラミック組成物の第3は、主成分(A)と、ホウ素成分(B)と、アルカリ金属成分(C)と、コバルト成分、銀成分及びアルミナ成分から選ばれる副成分(D)とからなる。
Moreover, a boron component, an alkali metal component, a cobalt component, a silver component, and an alumina component are used as other components. As these materials, oxides, carbonates, acetates, nitrates, fluorides, simple metals may be used, or glass having a composition having the above ratio may be used in combination. Used.
That is, the 1st of the ceramic composition of this invention consists of a main component (A) and a boron component (B).
Moreover, the 2nd of the ceramic composition of this invention consists of a main component (A), a boron component (B), and an alkali metal component (C).
The third ceramic composition of the present invention is a subcomponent (D) selected from a main component (A), a boron component (B), an alkali metal component (C), a cobalt component, a silver component and an alumina component. ).

本発明のセラミックス組成物において、ホウ素成分は、焼成温度を下げるために必須である。主成分とホウ素成分とからなるセラミック組成物の場合は、SiO 、SrOからなる主成分100質量部に対して、酸化物換算で1〜3質量部となるように添加される。また、ホウ素成分の他に、アルカリ金属成分、コバルト成分、銀成分、アルミナ成分を含む場合は、上記SiO、SrOからなる主成分100質量部に対して、酸化物換算で0.5〜3質量部となるように添加される。 In the ceramic composition of the present invention, the boron component, Ru essential der to reduce the firing temperature. In the case of a ceramic composition composed of a main component and a boron component, it is added so as to be 1 to 3 parts by mass in terms of oxide with respect to 100 parts by mass of the main component composed of SiO 2 and SrO. Moreover, when an alkali metal component, a cobalt component, a silver component, and an alumina component are included in addition to the boron component , 0.5 to 3 in terms of oxide with respect to 100 parts by mass of the main component composed of SiO 2 and SrO. It adds so that it may become a mass part.

ホウ素成分が0.5質量部より少ないと、1000℃以下で焼成することが困難となり、3質量部より多いと、焼成時に融着が起こり焼結体の形状が安定しにくくなると共に、グリーンシート等の成形時におけるバインダーの結着性が低下して、作業性が悪くなる。   When the boron component is less than 0.5 parts by mass, it is difficult to fire at 1000 ° C. or less, and when it is more than 3 parts by mass, fusion occurs during firing and the shape of the sintered body becomes difficult to stabilize, and the green sheet The binding property of the binder at the time of molding or the like is lowered and workability is deteriorated.

上記成分のうち、アルカリ金属成分、コバルト成分、銀成分、アルミナ成分は、必ずしも必要なものではないが、焼成温度の低温化、緻密化を効果的に図り、低温焼成効果を高めるために、添加するのが好ましい成分である。   Among the above components, the alkali metal component, cobalt component, silver component, and alumina component are not necessarily required, but they are added to effectively reduce the temperature and densify the firing temperature and enhance the low-temperature firing effect. It is a preferred component.

このうち、アルカリ金属成分としては、例えばLi、Na、Kなどが用いられ、特にLiが好ましい。アルカリ金属成分は、前記主成分100質量部に対して、酸化物換算で0.1〜1質量部添加することが好ましく、0.1質量部未満では、その添加効果が乏しく、1質量部を超えると、焼成時に融着が起こり、焼結体の形状が安定しにくくなると共に、絶縁性が劣化しやすくなる。   Among these, as an alkali metal component, Li, Na, K etc. are used, for example, and Li is especially preferable. The alkali metal component is preferably added in an amount of 0.1 to 1 part by mass in terms of oxide, with respect to 100 parts by mass of the main component. If it exceeds, fusion occurs at the time of firing, the shape of the sintered body becomes difficult to stabilize, and the insulating properties are likely to deteriorate.

コバルト成分は、前記主成分100質量部に対して、酸化物換算で0.1〜5質量部添加することが好ましく、0.1質量部未満では、その添加効果が乏しく、5質量部を超えると、誘電損失が大きくなる。   The cobalt component is preferably added in an amount of 0.1 to 5 parts by mass in terms of oxide with respect to 100 parts by mass of the main component. If the amount is less than 0.1 parts by mass, the addition effect is poor and exceeds 5 parts by mass. As a result, the dielectric loss increases.

銀成分は、前記主成分100質量部に対して、酸化物換算で0.1〜1.0質量部添加することが好ましく、0.1質量部未満では、その添加効果が乏しく、1.0質量部を超えると、誘電損失が大きくなる。   The silver component is preferably added in an amount of 0.1 to 1.0 part by mass in terms of oxide with respect to 100 parts by mass of the main component. When it exceeds the mass part, the dielectric loss increases.

アルミナ成分は、前記主成分100質量部に対して、酸化物換算で0.1〜0.5質量部添加することが好ましく、0.1質量部未満では、その添加効果が乏しく、0.5重
量部を超えると、誘電損失が大きくなる。
The alumina component is preferably added in an amount of 0.1 to 0.5 parts by mass in terms of oxide with respect to 100 parts by mass of the main component. When it exceeds the weight part, the dielectric loss increases.

本発明のセラミックス組成物は、上記のような組成となるように配合された原料をZrOボールなどを用いて、水などの湿式下で混合し、必要に応じて結合剤、可塑剤、溶剤等を添加し、所定形状に成形して、焼成することによって本発明のSrSiOを主結晶としたセラミックス組成物を製造することができる。なお、好ましくは上記セラミックス原料のうち、主原料は予め仮焼してから用いる。 The ceramic composition of the present invention is prepared by mixing raw materials blended so as to have the above composition under wet conditions such as water using ZrO 2 balls and the like, and if necessary, a binder, a plasticizer, and a solvent. And the like, formed into a predetermined shape, and fired, a ceramic composition having Sr 2 SiO 4 of the present invention as a main crystal can be produced. Preferably, among the ceramic raw materials, the main raw material is pre-calcined before use.

上記結合剤としては、例えばポリビニルブチラール樹脂、メタアクリル酸樹脂等が用いられ、可塑剤としては、例えばフタル酸ジブチル、フタル酸ジオクチル等が用いられ、溶剤としては、例えばトルエン、メチルエチルケトン等を使用することができる。   Examples of the binder include polyvinyl butyral resin and methacrylic acid resin. Examples of the plasticizer include dibutyl phthalate and dioctyl phthalate. Examples of the solvent include toluene and methyl ethyl ketone. be able to.

成形は、公知のプレス法を用いてブロック体にしたり、公知のドクターブレード法でグリーンシート化し、更に圧着して積層体にしたり、ペースト状にして厚膜印刷技術を用いて多層体にしたりできる。配線基板を形成するには、グリーンシートに成形するのが、多層化が容易でよい。   Molding can be made into a block body using a known press method, formed into a green sheet by a known doctor blade method, further pressed into a laminated body, or formed into a multilayer body using a thick film printing technique in a paste form . In order to form a wiring board, forming into a green sheet is easy to make multilayer.

配線基板を形成するには、まず、上記セラミックス原料、又はその仮焼粉末を含む原料粉末を公知のドクターブレード法を用いてグリーンシート化する。グリーンシート上には導電ペーストを用いてスクリーン印刷法により配線層を印刷形成する。このグリーンシートを圧着して積層体を形成する。この積層体を脱バインダー化した後、1000℃以下、好ましくは850〜950℃で低温焼成して、目的とする低温焼成配線基板を得る。なお、配線にAgを用いる場合は大気雰囲気下、Cuを用いる場合は還元雰囲気下で焼成する。   In order to form a wiring board, first, the ceramic raw material or the raw material powder containing the calcined powder is formed into a green sheet by using a known doctor blade method. A wiring layer is printed on the green sheet by screen printing using a conductive paste. This green sheet is pressure-bonded to form a laminate. After delaminating this laminate, it is fired at a low temperature of 1000 ° C. or lower, preferably 850 to 950 ° C., to obtain the intended low-temperature fired wiring board. When Ag is used for the wiring, firing is performed in an air atmosphere, and when Cu is used, firing is performed in a reducing atmosphere.

本発明によれば、上記組成比からなるセラミックス組成物とすることで、SrSiO結晶を主結晶として含有するセラミックス組成物とすることができる。また、前記組成物は、副結晶の生成量の極めて少ない組成物であるため、高線膨張係数で、低誘電損失である物性を備えたセラミックス組成物とすることができ、前記組成物を利用することで線膨張係数が高く、誘電損失の低いセラミックス配線基板を得ることができる。 According to the present invention, by a ceramic composition having the above composition ratio, it can be a ceramic composition containing a Sr 2 SiO 4 crystal as the predominant crystal. In addition, since the composition is a composition with a very small amount of sub-crystals, it can be a ceramic composition having a high linear expansion coefficient and low dielectric loss. By doing so, a ceramic wiring board having a high coefficient of linear expansion and a low dielectric loss can be obtained.

本発明のセラミックス配線基板は、例えば、多層配線基板や半導体パッケージに利用することができる。基板の線膨張係数がマザーボードにより近いため、大型化した際も十分接合の信頼性を保つことができ、なおかつ、高周波伝送が可能な電子部品を提供することができる。   The ceramic wiring board of the present invention can be used for, for example, a multilayer wiring board or a semiconductor package. Since the linear expansion coefficient of the substrate is closer to that of the mother board, it is possible to provide an electronic component that can sufficiently maintain the reliability of bonding even when it is increased in size and can perform high-frequency transmission.

〔実施例1〕
SiO、SrCO、Al、B、LiCO、Co粉末を表1に示す割合で秤量し、15時間湿式混合後、120℃で20時間乾燥し、乾燥した粉体を大気中700℃で2時間仮焼きした。
[Example 1]
SiO 2 , SrCO 3 , Al 2 O 3 , B 2 O 3 , Li 2 CO 3 , Co 2 O 3 powder are weighed in the proportions shown in Table 1, and after 15 hours wet mixing, dried at 120 ° C. for 20 hours, The dried powder was calcined at 700 ° C. for 2 hours in the air.

この仮焼物にPVA系バインダーを適量添加し、造粒、プレス成型後、大気中500℃で脱バインダー処理し成型体を得た。   An appropriate amount of a PVA binder was added to the calcined product, and after granulation and press molding, a binder was removed at 500 ° C. in the atmosphere to obtain a molded body.

上記成型体を大気中で900〜1000℃で2時間焼成し、表2に示す試料番号1〜30の焼結体を得た。   The molded body was fired in the atmosphere at 900 to 1000 ° C. for 2 hours to obtain sintered bodies of sample numbers 1 to 30 shown in Table 2.

この焼結体を用いて、アルキメデス法による相対密度、JIS R1627に準ずる共振周波数(10〜15GH)における誘電率、誘電損失、JISR 1618に準ずる30℃〜400℃の温度範囲における平均線膨張係数を測定した。 Using this sintered body, relative density by Archimedes method, dielectric constant at resonance frequency (10-15GH Z ) according to JIS R1627, dielectric loss, average linear expansion coefficient in a temperature range of 30 ° C. to 400 ° C. according to JIS R 1618 Was measured.

また、誘電損失は(周波数)×(1/誘電損失)=(一定)と仮定し、10GHzでの値に換算した。この結果も表2に併せて示す。





























The dielectric loss was converted to a value at 10 GHz assuming that (frequency) × (1 / dielectric loss) = (constant). This result is also shown in Table 2.





























その結果、本発明の範囲に入るセラミックス組成物(*のマークがついていないもの)は、いずれも1000℃以下で焼結し、線膨張係数が9.5×10 −6 以上であり、かつ、誘電損失が15×10 −4 以下の物性が得られた。 As a result, the ceramic compositions (not marked with *) that fall within the scope of the present invention are all sintered at 1000 ° C. or lower, have a linear expansion coefficient of 9.5 × 10 −6 or more, and A physical property having a dielectric loss of 15 × 10 −4 or less was obtained.

これに対して本発明の範囲を外れたセラミックス組成物(*のマークがついているもの)は、焼結しなかったり、線膨張係数が低かったり、誘電損失が大きすぎたりする問題が生じることがわかる。   On the other hand, a ceramic composition (marked with an asterisk (*)) that is out of the scope of the present invention may not sinter, has a low linear expansion coefficient, or has a problem that the dielectric loss is too large. Recognize.

また、上記結果に基づいて、セラミックス組成物中の各元素の配合割合を検討すると下記の通りである。   Further, based on the above results, the mixing ratio of each element in the ceramic composition is examined as follows.

SiOは、28質量%より多いと、SrSiO結晶の生成が多くなり、線膨張係数が低下する(No.30参照)。また、18質量%より少ないと、SrSiO結晶の生成が多くなり、誘電損失が大きくなる(No.26参照)。 When SiO 2 is more than 28% by mass, the production of SrSiO 3 crystals increases and the linear expansion coefficient decreases (see No. 30). On the other hand, when the content is less than 18% by mass, the generation of Sr 3 SiO 5 crystals increases and the dielectric loss increases (see No. 26).

が0.5質量部に満たないと、1000℃で緻密な焼結体が得られない(No.1参照)。 If B 2 O 3 is less than 0.5 parts by mass, a dense sintered body cannot be obtained at 1000 ° C. (see No. 1).

は3.0質量部より多いと、焼成時に融着が起こり、焼結体の形状が安定しない(No.6参照)
LiOは1.0質量部より多いと、焼成時に融着が起こり、焼結体の形状が安定しない(No.11参照)。
When B 2 O 3 is more than 3.0 parts by mass, fusion occurs during firing, and the shape of the sintered body is not stable (see No. 6).
When Li 2 O is more than 1.0 part by weight, it occurs fused during firing, is not stable shape of the sintered body (see No.11).

Coは5質量部より多いと、誘電損失が大きくなる(No.18参照)。 When Co 2 O 3 is more than 5 parts by mass, the dielectric loss increases (see No. 18).

AgOは1.0質量部より多いと、誘電損失が大きくなる(No.22参照)。 When Ag 2 O is more than 1.0 part by mass, dielectric loss increases (see No. 22).

Alは0.5質量部より多いと、誘電損失が大きくなる(No.13参照)。 When Al 2 O 3 is more than 0.5 parts by mass, dielectric loss increases (see No. 13).

なお、Co、AgO、Alは添加しなくても1000℃で焼結するが、添加により焼結する温度が低下する効果があるため、上記の範囲内で添加するのが好ましいことがわかる。 Note that Co 2 O 3 , Ag 2 O, and Al 2 O 3 are sintered at 1000 ° C. even if not added, but they are added within the above range because there is an effect that the sintering temperature is lowered by the addition. It can be seen that this is preferable.

〔実施例2〕
SiO、SrCO、粉末を表3に示す割合で秤量し、15時間湿式混合後、120℃で20時間乾燥したのち大気中で1100℃で2時間仮焼した。
[Example 2]
SiO 2 , SrCO 3 , and powder were weighed in the proportions shown in Table 3, wet mixed for 15 hours, dried at 120 ° C. for 20 hours, and then calcined in air at 1100 ° C. for 2 hours.

この仮焼物にAl、B、LiCO、Co粉末を表3に示す割合で秤量、混合後、120℃で20時間乾燥した。 To this calcined product, Al 2 O 3 , B 2 O 3 , Li 2 CO 3 and Co 2 O 3 powders were weighed and mixed in the proportions shown in Table 3 and then dried at 120 ° C. for 20 hours.

この粉体にPVA系バインダーを適量添加し、造粒、プレス成型後、大気中500℃で脱バインダー処理し成型体を得た。上記成型体を大気中で900〜1000℃で2時間焼成し、表2に示す試料番号31〜37の焼結体を得た。この焼成体を実施例1と同様の測定をおこない、測定結果を表4に併せて示す。




















An appropriate amount of a PVA binder was added to this powder, and after granulation and press molding, a binder was removed at 500 ° C. in the atmosphere to obtain a molded body. The molded body was fired at 900 to 1000 ° C. for 2 hours in the air to obtain sintered bodies of sample numbers 31 to 37 shown in Table 2. This fired body was measured in the same manner as in Example 1, and the measurement results are also shown in Table 4.






















いずれの組成物も1000℃以下で焼結し、線膨張係数が9.5×10−6以上であり、かつ、誘電損失が15×10−4以下の組成物が得られた。 All the compositions were sintered at 1000 ° C. or less, and a composition having a linear expansion coefficient of 9.5 × 10 −6 or more and a dielectric loss of 15 × 10 −4 or less was obtained.

以上の結果より、本発明の範囲に入るセラミックス組成物であれば、主成分を副成分と混合してから仮焼するプロセス、もしくは主成分を予め仮焼きしてから副成分を添加するプロセスのどちらを用いても同様の物性が得られることがわかる。   From the above results, if the ceramic composition falls within the scope of the present invention, the process of calcining after mixing the main component with the subcomponent, or the process of adding the subcomponent after precalcining the main component in advance. It can be seen that the same physical properties can be obtained by using either of them.

本願発明のセラミック組成物は、高周波伝送が可能で、マザーボードとの接合の信頼性の高いセラミックス配線基板を提供することができる。 Ceramics composition of the present invention can be a high frequency transmission, it is possible to provide a high ceramic wiring board reliable bonding between the mother board.

Claims (7)

酸化物換算で、SiO18〜28質量部、SrO72〜82質量部からなる、ガラスでないセラミックス粉末からなる主成分(A)と、ホウ素の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるホウ素成分(B)とからなり、
前記主成分(A)100質量部に対し酸化物換算で、前記ホウ素成分(B)を1〜3質量部含む原料を焼成することにより得られ
主結晶としてSrSiO結晶を含有することを特徴とするセラミックス配線基板用セラミックス組成物。
In terms of oxides, the main component (A) composed of ceramic powder that is not glass, consisting of 18 to 28 parts by mass of SiO 2 and 72 to 82 parts by mass of SrO, and boron oxide, carbonate, acetate, nitrate, fluoride, and A boron component (B) composed of one or more powders selected from single metals ,
Obtained by firing a raw material containing 1-3 parts by mass of the boron component (B) in terms of oxide with respect to 100 parts by mass of the main component (A),
A ceramic composition for a ceramic wiring board, comprising a Sr 2 SiO 4 crystal as a main crystal.
酸化物換算で、SiO18〜28質量部、SrO72〜82質量部からなる、ガラスでないセラミックス粉末からなる主成分(A)と、ホウ素の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるホウ素成分(B)と、アルカリ金属の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるアルカリ金属成分(C)とからなり、
前記主成分(A)100質量部に対し酸化物換算で、前記ホウ素成分(B)を0.5〜3質量部、前記アルカリ金属成分(C)を0.1〜1質量部含む原料を焼成することにより得られ
主結晶としてSrSiO結晶を含有することを特徴とするセラミックス配線基板用セラミックス組成物。
In terms of oxides, the main component (A) composed of ceramic powder that is not glass, consisting of 18 to 28 parts by mass of SiO 2 and 72 to 82 parts by mass of SrO, and boron oxide, carbonate, acetate, nitrate, fluoride, and Boron component (B) composed of one or more powders selected from simple metals and alkali metals composed of one or more powders selected from alkali metal oxides, carbonates, acetates, nitrates, fluorides and simple metals. Consisting of component (C),
A raw material containing 0.5 to 3 parts by mass of the boron component (B) and 0.1 to 1 part by mass of the alkali metal component (C) in terms of oxide with respect to 100 parts by mass of the main component (A) is fired. Is obtained by
A ceramic composition for a ceramic wiring board, comprising a Sr 2 SiO 4 crystal as a main crystal.
酸化物換算で、SiO18〜28質量部、SrO72〜82質量部からなる、ガラスでないセラミックス粉末からなる主成分(A)と、ホウ素の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるホウ素成分(B)と、アルカリ金属の酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなるアルカリ金属成分(C)と、コバルト、銀及びアルミナの酸化物、炭酸塩、酢酸塩、硝酸塩、弗化物及び単体金属から選ばれる1種以上の粉末からなる副成分(D)とからなり、
前記主成分(A)100質量部に対し酸化物換算で、前記ホウ素成分(B)を0.5〜3質量部、前記アルカリ金属成分(C)を0.1〜1質量部、前記副成分(D)として、コバルト成分を0.1〜5質量部、銀成分を0.1〜1.0質量部、アルミナ成分を0.1〜0.5質量部の少なくとも1つを含む原料を焼成することにより得られ
主結晶としてSrSiO結晶を含有することを特徴とするセラミックス配線基板用セラミックス組成物。
In terms of oxides, the main component (A) composed of ceramic powder that is not glass, consisting of 18 to 28 parts by mass of SiO 2 and 72 to 82 parts by mass of SrO, and boron oxide, carbonate, acetate, nitrate, fluoride, and Boron component (B) composed of one or more powders selected from simple metals and alkali metals composed of one or more powders selected from alkali metal oxides, carbonates, acetates, nitrates, fluorides and simple metals. Component (C), and an auxiliary component (D) consisting of one or more powders selected from oxides of cobalt, silver and alumina, carbonates, acetates, nitrates, fluorides and elemental metals ,
The boron component (B) is 0.5 to 3 parts by mass, the alkali metal component (C) is 0.1 to 1 part by mass, and the subcomponent is 100 parts by mass of the main component (A). As (D), the raw material containing 0.1-5 mass parts of a cobalt component, 0.1-1.0 mass part of a silver component, and 0.1-0.5 mass part of an alumina component is baked. Is obtained by
A ceramic composition for a ceramic wiring board, comprising a Sr 2 SiO 4 crystal as a main crystal.
線膨張係数が9.5×10−6/K以上であり、かつ、誘電損失が15×10−4以下である請求項1〜3のいずれか一つに記載のセラミックス配線基板用セラミックス組成物。 The ceramic composition for a ceramic wiring board according to any one of claims 1 to 3, wherein the coefficient of linear expansion is 9.5 x 10-6 / K or more and the dielectric loss is 15 x 10-4 or less. . 900〜1000℃で焼結された請求項1〜4のいずれか一つに記載のセラミックス配線基板用セラミックス組成物。   The ceramic composition for a ceramic wiring board according to any one of claims 1 to 4, which is sintered at 900 to 1000 ° C. 請求項1〜5のいずれかに記載のセラミックス配線基板用セラミックス組成物で構成されたセラミックス層と、
前記セラミックス層に積層された、導電性部材で形成された配線層を備えていることを特徴とするセラミックス配線基板。
A ceramic layer composed of the ceramic composition for a ceramic wiring board according to any one of claims 1 to 5 ;
A ceramic wiring board comprising a wiring layer formed of a conductive member and laminated on the ceramic layer.
前記セラミックス層を利用して形成された部品領域を更に具備する請求項に記載のセラミックス配線基板。 The ceramic wiring board according to claim 6 , further comprising a component region formed using the ceramic layer.
JP2004130029A 2004-04-26 2004-04-26 Ceramic composition and ceramic wiring board Expired - Fee Related JP4576151B2 (en)

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JPH0674167B2 (en) * 1985-11-30 1994-09-21 株式会社村田製作所 Porcelain composition for low temperature firing
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