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JP4637531B2 - Ceramic member for exhaust gas treatment and exhaust gas treatment device - Google Patents
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JP4637531B2 - Ceramic member for exhaust gas treatment and exhaust gas treatment device - Google Patents

Ceramic member for exhaust gas treatment and exhaust gas treatment device Download PDF

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JP4637531B2
JP4637531B2 JP2004247512A JP2004247512A JP4637531B2 JP 4637531 B2 JP4637531 B2 JP 4637531B2 JP 2004247512 A JP2004247512 A JP 2004247512A JP 2004247512 A JP2004247512 A JP 2004247512A JP 4637531 B2 JP4637531 B2 JP 4637531B2
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exhaust gas
groove
ceramic member
gas treatment
ceramic
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JP2006063893A (en
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学 宮石
義弘 潮
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Kyocera Corp
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Description

本発明は、内燃機関や外燃機関の排気ガス処理装置に関するものであり、特に排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素等を処理するものである。   The present invention relates to an exhaust gas treatment apparatus for an internal combustion engine or an external combustion engine, and in particular, treats suspended particulate matter, nitrogen oxides, hydrocarbons and the like in the exhaust gas.

従来より、ディーゼルエンジン,ガスタービン等の内燃機関や発電機,ボイラ等の外燃機関の燃料として軽油や重油が使用されているが、燃焼時に浮遊粒子物質(以下、SPMともいう),窒素酸化物(以下、NOともいう)および炭化水素(以下、HCともいう)が発生するという問題があった。SPMは発ガン性などの健康被害を及ぼすことが懸念されており、NOは酸性雨や光化学スモッグなどを引き起こす原因になっており、HCも人体への悪影響や動植物への悪影響が報告されている。そのため、SPMとNOxとHCとを無害なものに処理可能な排気ガス処理装置が開発されてきた。この従来の排気ガス処理装置を図2に示す。この図において、12は絶縁部材、13は電極を示し、これら絶縁部材12と電極13とで、排気ガス処理装置11が基本的に構成される。 Conventionally, light oil and heavy oil have been used as fuel for internal combustion engines such as diesel engines and gas turbines, and external combustion engines such as generators and boilers, but suspended particulate matter (hereinafter also referred to as SPM), nitrogen oxidation objects (hereinafter, also referred to as NO X) and hydrocarbon (hereinafter, also referred to as HC) is disadvantageously generated. There are concerns that SPM may cause health damage such as carcinogenicity, NO X causes acid rain and photochemical smog, and HC has been reported to have adverse effects on human bodies and animals and plants. Yes. For this reason, exhaust gas treatment apparatuses that can treat SPM, NOx, and HC harmlessly have been developed. This conventional exhaust gas treatment apparatus is shown in FIG. In this figure, reference numeral 12 denotes an insulating member, and 13 denotes an electrode. The insulating member 12 and the electrode 13 basically constitute an exhaust gas treatment device 11.

絶縁部材12はセラミックシートなどの耐熱性の材料よりなるコルゲート(波付け)シートであり、電極13を所定間隔に保持する機能も有する。電極13はアルミニウム(Al)やステンレス鋼(SUS)などの導体板より成る。   The insulating member 12 is a corrugated sheet made of a heat-resistant material such as a ceramic sheet, and also has a function of holding the electrodes 13 at a predetermined interval. The electrode 13 is made of a conductive plate such as aluminum (Al) or stainless steel (SUS).

以上の絶縁部材12、電極13は複数段積層されて排気ガス処理装置11が構成される。そして、電極13を電源装置14に接続して電極13に高圧の交流電圧を印加することによって、電極13間にプラズマを発生させるとともに、内燃機関や外燃機関の排気ガスを絶縁部材12と電極13の間を通過させる(例えば、下記の特許文献1参照)。   The insulating member 12 and the electrode 13 described above are stacked in a plurality of stages to constitute the exhaust gas processing device 11. Then, by connecting the electrode 13 to the power supply device 14 and applying a high-voltage AC voltage to the electrode 13, plasma is generated between the electrodes 13, and the exhaust gas of the internal combustion engine or the external combustion engine is transferred to the insulating member 12 and the electrode 13 is passed (see, for example, Patent Document 1 below).

このプラズマによって、短時間のうちに、排気ガス中に含まれるNOxが分解され、SPMが酸化され、HCが分解されてCOになり、無害な排気物質となって大気に放出される。
特開2003−336519号公報
In a short time, this plasma decomposes NOx contained in the exhaust gas, oxidizes SPM, decomposes HC to CO 2 , and releases it as harmless exhaust material to the atmosphere.
Japanese Patent Laid-Open No. 2003-336519

しかしながら、従来の構成においては、絶縁部材12を所定のコルゲート状に加工するのが困難であり、絶縁部材12の波面の高さ寸法がばらついたり、絶縁部材12に厚みの薄い箇所が生じてクラック等の破損が生じる場合があった。絶縁部材12の高さ寸法がばらつく、または絶縁部材12がクラック等によって破損してしまうと、電極13間の間隔を所定の間隔に保持することができなくなり、電極13間においてプラズマを安定的に発生させるのが困難となる場合があった。その結果、排気ガス中に含まれるSPMとNOxとHCとを完全に処理することができなくなってしまうという問題点が発生していた。   However, in the conventional configuration, it is difficult to process the insulating member 12 into a predetermined corrugated shape, the height dimension of the wave front of the insulating member 12 varies, or a thin portion occurs in the insulating member 12 and cracks occur. In some cases, damage such as If the height of the insulating member 12 varies, or if the insulating member 12 is damaged by a crack or the like, the interval between the electrodes 13 cannot be maintained at a predetermined interval, and the plasma is stably generated between the electrodes 13. It may be difficult to generate. As a result, there has been a problem that SPM, NOx, and HC contained in the exhaust gas cannot be completely processed.

また、絶縁部材12の加工に要するコストが高く量産に適さないという問題点もあった。   There is also a problem that the cost required for processing the insulating member 12 is high and is not suitable for mass production.

従って、本発明は上記従来の問題点に鑑み完成されたものであり、その目的は、排気ガス中に含まれる浮遊粒子物質,窒素酸化物および炭化水素を無害化することができ、安価で量産に適する排気ガス処理用セラミック部材および排気ガス処理装置を提供することにある。   Accordingly, the present invention has been completed in view of the above-mentioned conventional problems, and its object is to make the suspended particulate matter, nitrogen oxides and hydrocarbons contained in the exhaust gas harmless, and to be inexpensive and mass-produced. It is an object of the present invention to provide an exhaust gas processing ceramic member and an exhaust gas processing apparatus suitable for the above.

本発明は、セラミック基板と、該セラミック基板の上下の主面それぞれの側に配置されて、前記セラミック基板を挟んで対向する、直流パルス電圧または交流電圧印加用の複数の導体板と、を備え、前記セラミック基板の主面に、排気ガスの流路としての断面が四角形状の溝が設けられており、前記溝は、前記セラミック基板の上側主面に形成されたものの中心軸と下側主面に形成されたものの中心軸とが平面視で重ならないようにして互いに平行に設けられていることを特徴とする
The present invention includes a ceramic substrate, and a plurality of conductor plates for applying a DC pulse voltage or an AC voltage, which are arranged on the respective upper and lower main surfaces of the ceramic substrate and face each other with the ceramic substrate interposed therebetween. The main surface of the ceramic substrate is provided with a groove having a quadrangular cross section as an exhaust gas flow path, and the groove is formed on the upper main surface of the ceramic substrate and has a central axis and a lower main groove. It is characterized in that the central axes of those formed on the surface are provided in parallel to each other so as not to overlap in plan view .

また、本発明の排気ガス処理用セラミック部材において、好ましくは、前記溝は、直線状に設けられていることを特徴とする。   In the exhaust gas treatment ceramic member of the present invention, preferably, the groove is provided in a straight line.

また、本発明の排気ガス処理用セラミック部材において、好ましくは、前記溝は、前記セラミック基板に研削加工を施すことによって形成されていることを特徴とする。   In the ceramic member for exhaust gas treatment according to the present invention, preferably, the groove is formed by grinding the ceramic substrate.

本発明はまた、上記排気ガス処理用セラミック部材と、該排気ガス処理用セラミック部材の上下主面にそれぞれ当接するように配置された高圧の直流パルス電圧または高圧の交流電圧印加用の導体板とを具備していることを特徴とする排気ガス処理用装置を併せて提供する。The present invention also provides the ceramic member for exhaust gas treatment, and a conductive plate for applying a high-voltage DC pulse voltage or a high-voltage AC voltage disposed so as to be in contact with the upper and lower main surfaces of the exhaust gas treatment ceramic member, respectively. And an exhaust gas processing apparatus characterized by comprising:


本発明の排気ガス処理用セラミック部材は、セラミック基板の上下主面に排気ガスの流路としての断面が四角形状の溝が形成されていることから、排気ガス処理用セラミック部材の上下主面間の厚み寸法を所定の寸法範囲内にばらつきの少ない状態とすることができるとともに、断面が四角形状の溝であることから、この排気ガス処理用セラミック部材を排気ガス処理装置に組み込んで使用した場合、溝内の全ての部位においてプラズマを均一に発生させることが可能となり、内燃機関や外燃機関の排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素を効率良く処理することができる。また、排気ガス処理用セラミック部材の製造が容易となり、安価で量産に適するものとすることができる。   In the exhaust gas processing ceramic member of the present invention, the upper and lower main surfaces of the ceramic substrate are formed with grooves having a quadrangular cross section as an exhaust gas flow path. The thickness dimension of the exhaust gas can be reduced within a specified range and the cross section is a square-shaped groove. In addition, plasma can be generated uniformly at all sites in the groove, and suspended particulate matter, nitrogen oxides, and hydrocarbons in the exhaust gas of the internal combustion engine and the external combustion engine can be efficiently processed. Further, the production of the exhaust gas treating ceramic member becomes easy, and it can be made inexpensive and suitable for mass production.

本発明の排気ガス処理用セラミック部材において、好ましくは、溝は、セラミック基板の上側主面に形成されたものの中心軸と下側主面に形成されたものの中心軸とが平面視で重ならないようにして互いに平行に設けられていることから、溝内でプラズマがより安定に発生するようになるとともに、溝内に排気ガスが滞留するのを有効に防止することができる。そして、排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素をさらに効率良く処理できる。   In the exhaust gas treating ceramic member of the present invention, preferably, the groove is formed so that the central axis of the groove formed on the upper main surface of the ceramic substrate and the central axis of the lower main surface do not overlap in plan view. Thus, the plasma is more stably generated in the groove, and the exhaust gas can be effectively prevented from staying in the groove. Then, suspended particulate matter, nitrogen oxides and hydrocarbons in the exhaust gas can be treated more efficiently.

さらに、本発明の排気ガス処理用セラミック部材において、好ましくは、溝は、直線状に設けられていることから、流路抵抗が小さく、大量の排気ガスを澱みなく効率的に処理できる。   Furthermore, in the exhaust gas processing ceramic member of the present invention, preferably, since the groove is provided in a straight line shape, the flow resistance is small and a large amount of exhaust gas can be processed efficiently without stagnation.

また、本発明の排気ガス処理用セラミック部材において、好ましくは、溝は、セラミック基板に研削加工を施すことによって形成されていることにより、溝内面が粗面となり、溝内面に排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素が適度に付着し易くなるとともに、プラズマがさらに発生し易くなる。その結果、排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素をさらに良好に処理できる。   In the exhaust gas treating ceramic member of the present invention, preferably, the groove is formed by grinding the ceramic substrate, so that the groove inner surface becomes rough and the groove inner surface floats in the exhaust gas. Particulate matter, nitrogen oxides and hydrocarbons are likely to adhere appropriately and plasma is more likely to be generated. As a result, the suspended particulate matter, nitrogen oxides and hydrocarbons in the exhaust gas can be treated even better.

本発明の排気ガス処理装置は、上記本発明の排気ガス処理用セラミック部材と、排気ガス処理用セラミック部材の上下主面にそれぞれ当接するように配置された高圧の直流パルス電圧または高圧の交流電圧印加用の導体板とを具備していることにより、上記本発明の排気ガス処理用セラミック部材を用いた、排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素を効率良く処理することができ、安価で量産に適するものとなる。   The exhaust gas treatment device of the present invention comprises a high-pressure DC pulse voltage or a high-voltage AC voltage arranged so as to be in contact with the upper and lower main surfaces of the exhaust gas treatment ceramic member of the present invention and the exhaust gas treatment ceramic member, respectively. By providing an application conductor plate, it is possible to efficiently treat suspended particulate matter, nitrogen oxides and hydrocarbons in the exhaust gas using the ceramic member for exhaust gas treatment of the present invention. It is cheap and suitable for mass production.

本発明の排気ガス処理用セラミック部材および排気ガス処理装置について以下に詳細に説明する。図1は本発明の排気ガス処理装置の実施の形態の一例を示す断面図である。この図において、2は排気ガス処理用セラミック部材(以下、セラミック部材ともいう)、3は導体板を示し、これらセラミック部材2と導体板3とで、排気ガス処理装置1が基本的に構成される。   The exhaust gas processing ceramic member and the exhaust gas processing apparatus of the present invention will be described in detail below. FIG. 1 is a sectional view showing an example of an embodiment of an exhaust gas treatment apparatus of the present invention. In this figure, 2 is a ceramic member for exhaust gas treatment (hereinafter also referred to as a ceramic member), 3 is a conductor plate, and the ceramic member 2 and the conductor plate 3 basically constitute an exhaust gas treatment device 1. The

本発明の排気ガス処理用セラミック部材2は、図1に示すように、セラミック基板の上下両主面に排気ガスの流路としての断面が四角形状の溝2aが複数形成されている。   As shown in FIG. 1, the exhaust gas processing ceramic member 2 of the present invention has a plurality of grooves 2a each having a quadrangular cross section as an exhaust gas flow path formed on both upper and lower main surfaces of a ceramic substrate.

また、本発明の排気ガス処理装置1は、図1に示すように、上記本発明の排気ガス処理用セラミック部材2と、排気ガス処理用セラミック部材2の上下主面にそれぞれ当接するように配置された高圧の直流パルス電圧または高圧の交流電圧印加用の導体板3とを具備している。   Further, as shown in FIG. 1, the exhaust gas treatment apparatus 1 of the present invention is disposed so as to abut on the exhaust gas treatment ceramic member 2 of the present invention and the upper and lower main surfaces of the exhaust gas treatment ceramic member 2 respectively. And a conductive plate 3 for applying a high-voltage DC pulse voltage or a high-voltage AC voltage.

本発明のセラミック部材2は、アルミナ(Al)質焼結体,窒化アルミニウム(AlN)質焼結体,窒化珪素(Si)質焼結体等のセラミックスから成る。この構成により、セラミック部材2の絶縁耐力が高いので、セラミック部材2に導体板3同士を確実に絶縁させるとともに一定間隔を隔てて導体板3を保持させることができる。そして、セラミック部材2の上下主面にそれぞれ当接するように配置される導体板3同士の間でプラズマを発生させるが、耐熱性の高いセラミックスから成るセラミック部材2を導体板3同士の間に挟むことによって、セラミック部材2がプラズマ発生時の熱によって変形したり劣化したりするということがなく、セラミック部材2の上下主面に当接する導体板3同士の間隔を一定として、プラズマを安定的に発生させることが可能となる。 The ceramic member 2 of the present invention is made of ceramics such as alumina (Al 2 O 3 ) sintered body, aluminum nitride (AlN) sintered body, silicon nitride (Si 3 N 4 ) sintered body. With this configuration, since the dielectric strength of the ceramic member 2 is high, the conductor plates 3 can be reliably insulated from each other by the ceramic member 2 and the conductor plates 3 can be held at a predetermined interval. Then, plasma is generated between the conductor plates 3 arranged so as to be in contact with the upper and lower main surfaces of the ceramic member 2, respectively, but the ceramic member 2 made of ceramic having high heat resistance is sandwiched between the conductor plates 3. Accordingly, the ceramic member 2 is not deformed or deteriorated by heat at the time of plasma generation, and the interval between the conductive plates 3 contacting the upper and lower main surfaces of the ceramic member 2 is kept constant so that the plasma can be stably generated. Can be generated.

セラミック部材2は、例えば、Al質焼結体から成る場合であれば、Al,酸化珪素(SiO),酸化マグネシウム(MgO),酸化カルシウム(CaO)等の原料粉末に適当な有機バインダ,溶剤,可塑剤,分散剤等を混合添加して泥漿状と成すとともに、これにドクターブレード法やカレンダーロール法を採用することによってセラミックグリーンシート(セラミック生シート)を形成し、しかる後に、このセラミックグリーンシートに適当な打ち抜き加工を施し、このセラミックグリーンシートを複数枚積層し、約1600℃の温度で焼成することによって作製される。 If the ceramic member 2 is made of, for example, an Al 2 O 3 sintered material, the raw material powder such as Al 2 O 3 , silicon oxide (SiO 2 ), magnesium oxide (MgO), calcium oxide (CaO) is used. A suitable organic binder, solvent, plasticizer, dispersant, etc. are mixed and added to form a slurry, and a ceramic green sheet (ceramic raw sheet) is formed by adopting a doctor blade method or a calender roll method. Thereafter, the ceramic green sheet is appropriately punched, and a plurality of ceramic green sheets are laminated and fired at a temperature of about 1600 ° C.

溝2aは、セラミックグリーンシートに打ち抜き加工を施す際に、溝2aとなる打ち抜きを形成することによって設けられる、または、焼成されたセラミック基板に研削加工を施すことによって断面が四角形状に設けられる。   The groove 2a is provided by forming a punch to be the groove 2a when the ceramic green sheet is punched, or is provided with a square cross section by grinding the fired ceramic substrate.

溝2aの断面形状は、長方形,正方形,台形等の四角形状であればよいが、好ましくは、長方形,正方形が溝の上面と下面の幅が同じであり、溝の断面のどの部位でも排気ガスの流量が安定し、確実に処理し易い点でよい。   The cross-sectional shape of the groove 2a may be a rectangular shape such as a rectangle, a square, or a trapezoid. Preferably, the rectangle and the square have the same width on the upper surface and the lower surface of the groove. It is sufficient that the flow rate is stable and easy to process reliably.

このようにセラミック部材2を加工することにより、セラミック部材2の上下主面間の厚み寸法を所定の寸法範囲内にばらつきの少ない状態とすることができるとともに、溝2aの寸法を所定の寸法範囲内にばらつきの少ない状態に加工することができる。   By processing the ceramic member 2 in this manner, the thickness dimension between the upper and lower main surfaces of the ceramic member 2 can be reduced within a predetermined dimension range, and the dimension of the groove 2a can be set within the predetermined dimension range. It can be processed into a state with little variation.

好ましくは、セラミック部材2の絶縁耐力は10kV/mm以上であるのがよい。セラミック部材2の絶縁耐力が10kV/mm未満であると、セラミック部材2の絶縁耐力が小さすぎるため、絶縁破壊し易くなり、溝2a内でプラズマを発生させることができなくなる場合がある。   Preferably, the dielectric strength of the ceramic member 2 is 10 kV / mm or more. If the dielectric strength of the ceramic member 2 is less than 10 kV / mm, since the dielectric strength of the ceramic member 2 is too small, dielectric breakdown is likely to occur, and plasma may not be generated in the groove 2a.

そして、このセラミック部材2を排気ガス処理装置に組み込んで使用することによって、溝2a内の全ての部位においてプラズマを均一に発生させることが可能となり、内燃機関や発電機,ボイラ等の外燃機関の排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素を効率良く処理することができる。また、セラミック部材2の製造が容易となり、安価で量産に適するものとすることができる。   Then, by incorporating this ceramic member 2 into the exhaust gas treatment device and using it, it becomes possible to generate plasma uniformly in all the parts in the groove 2a, and an external combustion engine such as an internal combustion engine, a generator, a boiler or the like. It is possible to efficiently treat suspended particulate matter, nitrogen oxides and hydrocarbons in the exhaust gas. In addition, the ceramic member 2 can be easily manufactured, and can be inexpensive and suitable for mass production.

セラミック部材2において、好ましくは、溝2aは、上側主面に形成されたものの中心軸と下側主面に形成されたものの中心軸とが平面視で重ならないようにして互いに平行に複数設けられているのがよい。この構成により、片側主面の溝2aとそれに隣接する溝2aとの間の誘電体から成る壁部分が反対側主面の溝2aの底面部分に対向することになるので、反対側主面の溝2aのこの底面部分に強い電界がかかることとなり、溝2a内でプラズマがより安定に発生するようになるとともに、溝2aが互いに平行に形成されることによって、それぞれの溝2aの流路抵抗が同程度になるので、溝2a内に排気ガスが滞留するのを有効に防止することができる。そして、排気ガス中のSPM,NOxおよびHCをさらに効率良く処理できる。   In the ceramic member 2, preferably, a plurality of grooves 2a are provided in parallel with each other so that the central axis of the upper main surface and the central axis of the lower main surface do not overlap in plan view. It is good to have. With this configuration, the wall portion made of a dielectric between the groove 2a on one side main surface and the groove 2a adjacent thereto faces the bottom surface portion of the groove 2a on the opposite main surface. A strong electric field is applied to this bottom surface portion of the groove 2a, plasma is generated more stably in the groove 2a, and the grooves 2a are formed in parallel to each other, so that the flow resistance of each groove 2a. Therefore, it is possible to effectively prevent the exhaust gas from staying in the groove 2a. Then, SPM, NOx and HC in the exhaust gas can be processed more efficiently.

上側主面に形成された溝2aの中心軸と下側主面に形成された溝2aの中心軸とは、上側主面に形成された溝2aの中心軸が下側主面に形成された隣接する溝2aの中心軸の中央となるように溝2aが配置されるのが好ましい。また、上側主面に形成される溝2aの幅および中心軸の間隔と下側主面に形成される溝2aの幅および中心軸の間隔とを同じようにするのが好ましい。これにより、上側主面に形成された溝2a内と下側主面に形成された溝2a内とに発生する電界が同一となって、上側主面に形成された溝2a内と下側主面に形成された溝2a内とに発生するプラズマを同一とすることができる。   The central axis of the groove 2a formed on the upper main surface and the central axis of the groove 2a formed on the lower main surface are the central axis of the groove 2a formed on the upper main surface on the lower main surface. The groove 2a is preferably arranged so as to be the center of the central axis of the adjacent groove 2a. Moreover, it is preferable that the width of the groove 2a formed on the upper main surface and the interval between the central axes be the same as the width of the groove 2a formed on the lower main surface and the interval between the central axes. As a result, the electric field generated in the groove 2a formed in the upper main surface and in the groove 2a formed in the lower main surface is the same, and the groove 2a formed in the upper main surface and the lower main surface The plasma generated in the groove 2a formed on the surface can be the same.

さらに好ましくは、溝2aは、上記構成において直線状に設けられているのがよい。これにより、溝2aを流れる排気ガスに作用する抵抗(流路抵抗)が小さくなるので、大量の排気ガスを澱みなく効率的に処理することができる。   More preferably, the groove 2a is provided linearly in the above configuration. As a result, the resistance (flow path resistance) acting on the exhaust gas flowing through the groove 2a is reduced, so that a large amount of exhaust gas can be efficiently processed without stagnation.

また、溝2aは、その断面積がセラミック部材2に供給される排気ガスのガス圧が高い部分よりガス圧の低い部分が大きくなるように設けられているのがよい。溝2aの断面積をこのように調整することにより、ガス圧の高い部分とガス圧の低い部分との溝2aの流路抵抗を調整することができ、排気ガスの流量をセラミック部材2の全面にわたって同じ程度になるように調整することができる。   In addition, the groove 2a is preferably provided so that a portion with a lower gas pressure is larger than a portion with a high cross-sectional area where the gas pressure of the exhaust gas supplied to the ceramic member 2 is high. By adjusting the cross-sectional area of the groove 2a in this way, the flow resistance of the groove 2a between the high gas pressure portion and the low gas pressure portion can be adjusted, and the flow rate of the exhaust gas can be adjusted over the entire surface of the ceramic member 2. Can be adjusted to the same extent.

また好ましくは、セラミック部材2において、溝2aは焼成されたセラミック基板に研削加工を施すことによって形成されているのがよい。この構成により、溝2aの内面が粗面となり、溝2aの内面に排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素が適度に付着し易くなって、溝2a内に滞留する時間が長くなり、溝2a内で確実に処理されやすくなるとともに、粗面の突端からプラズマがさらに発生し易くなる。その結果、排気ガス中のSPM,NOxおよびHCをさらに良好に処理できる。   Preferably, in the ceramic member 2, the groove 2a is formed by grinding a fired ceramic substrate. With this configuration, the inner surface of the groove 2a becomes a rough surface, and suspended particulate matter, nitrogen oxides, and hydrocarbons in the exhaust gas are appropriately attached to the inner surface of the groove 2a, and the residence time in the groove 2a is long. Thus, it is easy to be surely processed in the groove 2a, and plasma is more easily generated from the tip of the rough surface. As a result, the SPM, NOx, and HC in the exhaust gas can be treated even better.

このような溝2aは、研削加工で形成される場合、その表面粗さは、算術平均粗さ(Ra)が1〜10μmとなるのが好ましい。この構成により、溝2a内面に排気ガス中の浮遊粒子物質,窒素酸化物および炭化水素が適度に付着し易くなるとともに、プラズマをさらに発生し易くすることができる。そして、排気ガス中のSPM,NOxおよびHCをさらに確実に処理できる。Ra<1μmであると、溝2aの表面が滑らかになりすぎるため、SPM,NOxおよびHCが付着しにくくなり、処理効率が低下する。また、Ra>10μmであると、溝2aの表面が粗くなりすぎるため、溝2aで発生する放電が不均一となり、排気ガスの処理効率が低下する。溝2aの研削加工は、平面研削盤等によればよい。   When such a groove | channel 2a is formed by grinding process, it is preferable that the surface roughness becomes 1-10 micrometers in arithmetic mean roughness (Ra). With this configuration, suspended particulate matter, nitrogen oxides, and hydrocarbons in the exhaust gas can be appropriately attached to the inner surface of the groove 2a, and plasma can be further easily generated. Further, SPM, NOx and HC in the exhaust gas can be further reliably processed. When Ra <1 μm, the surface of the groove 2a becomes too smooth, so that SPM, NOx and HC are difficult to adhere, and the processing efficiency is lowered. If Ra> 10 μm, the surface of the groove 2a becomes too rough, so that the discharge generated in the groove 2a becomes non-uniform, and the exhaust gas processing efficiency decreases. The groove 2a may be ground using a surface grinder or the like.

また好ましくは、溝2aは、その深さは、0.5〜10mmであるのがよい。この構成により、排気ガスを通風させ易くするとともにプラズマを安定的に発生させ易くし、排気ガスの処理効率を極めて効率のよいものとすることができる。溝2aの深さが0.5mm未満であると、溝2aが浅すぎるため、排気ガスの流量が少なくなり排気ガスの処理量が低下する。また、溝2aの深さが10mmを超えて大きくなると、溝2aが深すぎるため、電極3同士の距離が長くなりプラズマが発生し難くなる。   Preferably, the groove 2a has a depth of 0.5 to 10 mm. With this configuration, the exhaust gas can be easily ventilated and plasma can be generated stably, and the exhaust gas processing efficiency can be made extremely efficient. If the depth of the groove 2a is less than 0.5 mm, since the groove 2a is too shallow, the flow rate of the exhaust gas is reduced and the throughput of the exhaust gas is reduced. On the other hand, if the depth of the groove 2a exceeds 10 mm, the groove 2a is too deep, so that the distance between the electrodes 3 is increased and plasma is hardly generated.

また、溝2aの幅は3mm以上であるのがよい。溝2aの幅が3mm未満であると、溝2aの幅が狭すぎるため、排気ガスの流量が少なくなり排気ガスの処理量が低下する。   The width of the groove 2a is preferably 3 mm or more. If the width of the groove 2a is less than 3 mm, the width of the groove 2a is too narrow, so that the flow rate of the exhaust gas is reduced and the processing amount of the exhaust gas is reduced.

導体板3はAlやSUS等の導体板3から成り、金属のインゴットに圧延加工や打ち抜き加工等の従来周知の金属加工法を施すことによって所定形状に製作される。   The conductive plate 3 is made of a conductive plate 3 such as Al or SUS, and is manufactured in a predetermined shape by applying a conventionally known metal processing method such as rolling or punching to a metal ingot.

また、導体板3の厚さは1〜5mmであるのがよい。導体板3の厚さが1mm未満であると、導体板3の厚さが薄すぎるため、プラズマ発生時に劣化し易い。また、導体板3の厚さが5mmを超えて大きくなると、導体板3の厚さが厚すぎるため、ユニット自体が重くなり扱いにくくなる。   The thickness of the conductor plate 3 is preferably 1 to 5 mm. If the thickness of the conductor plate 3 is less than 1 mm, the thickness of the conductor plate 3 is too thin, so that it is likely to be deteriorated when plasma is generated. On the other hand, if the thickness of the conductor plate 3 exceeds 5 mm, the thickness of the conductor plate 3 is too thick and the unit itself becomes heavy and difficult to handle.

以上の排気ガス処理装置1は、1枚のセラミック部材2の上下主面にそれぞれ導体板3が当接するように配置されたシングル構造のものに限らず、通常は、導体板3が複数枚積層されてそれら導体板3の間にセラミック部材2が挟持された排気ガス処理装置1として構成される。そして、互いに対向する導体板3同士に電圧が印加されるように電源装置4に接続し、導体板3にプラズマを発生させるための高圧の交流電圧または高圧の直流パルス電圧が印加されることによって、導体板3間にプラズマを発生させるとともに、ディーゼルエンジンやガスタービン等の内燃機関、発電機やボイラ等の外燃機関から発生する排気ガスをセラミック部材2と導体板3の間を通過させる。   The above exhaust gas treatment device 1 is not limited to a single structure in which the conductive plate 3 is disposed so that the upper and lower main surfaces of the single ceramic member 2 are in contact with each other, and usually a plurality of conductive plates 3 are laminated. Thus, the exhaust gas processing apparatus 1 is configured in which the ceramic member 2 is sandwiched between the conductor plates 3. And it connects to the power supply device 4 so that a voltage may be applied to the mutually opposing conductor plates 3, and the high AC voltage or the high DC pulse voltage for generating a plasma is applied to the conductor plate 3 by applying. In addition to generating plasma between the conductor plates 3, exhaust gas generated from an internal combustion engine such as a diesel engine or a gas turbine or an external combustion engine such as a generator or a boiler is passed between the ceramic member 2 and the conductor plate 3.

そして、このプラズマによって、短時間のうちに、排気ガス中に含まれるNOxが分解され、SPMが酸化され、HCが分解されてCOになり、生物に無害な排気物質として大気に放出される。 In a short time, NOx contained in the exhaust gas is decomposed by this plasma, SPM is oxidized, HC is decomposed into CO 2 and released into the atmosphere as an innocuous exhaust material to living organisms. .

なお、電源装置4はマルチバイブレータ等の電圧発生装置であり、電圧1000〜10000V、周波数100Hz〜10KHzの高圧の交流電圧または高圧の直流パルス電圧を発生する。ここで電源装置4の発生する波形には特に制限がないが、矩形波が好ましい。つまり電源装置4の波形が矩形波であると、整流した場合に波形がパルス状となり電気集塵作用が効果的に発揮される。また電源装置4の波形が矩形波であると電圧の立ち上がりが急峻であるためプラズマが素早く立つという利点がある。   The power supply device 4 is a voltage generator such as a multivibrator, and generates a high-voltage AC voltage or a high-voltage DC pulse voltage with a voltage of 1000 to 10000 V and a frequency of 100 Hz to 10 KHz. Here, the waveform generated by the power supply device 4 is not particularly limited, but a rectangular wave is preferable. That is, if the waveform of the power supply device 4 is a rectangular wave, the waveform becomes a pulse shape when rectified, and the electrostatic dust collecting action is effectively exhibited. Further, when the waveform of the power supply device 4 is a rectangular wave, there is an advantage that plasma rises quickly because the voltage rises sharply.

なお、本発明は以上の実施の形態の例に限定されるものではなく、本発明の要旨を逸脱しない範囲内で種々の変更を施すことは何等支障ない。例えば、導体板3の代わりに表面にメタライズ層を形成したセラミック基板を用いてもよい。また、溝2aの間の壁部の上面にメタライズ層を形成し、セラミック部材2を導体板3にロウ材等を介して接合してもよい。これにより、溝2aを流れる排気ガスが溝2aから漏出しないようにすることができる。   In addition, this invention is not limited to the example of the above embodiment, It does not have any trouble in making various changes within the range which does not deviate from the summary of this invention. For example, a ceramic substrate having a metallized layer formed on the surface may be used instead of the conductor plate 3. Further, a metallized layer may be formed on the upper surface of the wall portion between the grooves 2a, and the ceramic member 2 may be joined to the conductor plate 3 via a brazing material or the like. Thereby, it is possible to prevent the exhaust gas flowing through the groove 2a from leaking out of the groove 2a.

本発明の排気ガス処理装置の実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the exhaust-gas processing apparatus of this invention. 従来の排気ガス処理装置の例を示す断面図である。It is sectional drawing which shows the example of the conventional exhaust gas processing apparatus.

符号の説明Explanation of symbols

1:排気ガス処理装置
2:排気ガス処理用セラミック部材
2a:溝
3:導体板
1: Exhaust gas treatment device 2: Ceramic member for exhaust gas treatment 2a: Groove 3: Conductor plate

Claims (4)

セラミック基板と、
該セラミック基板の上下の主面それぞれの側に配置されて、前記セラミック基板を挟んで対向する、直流パルス電圧または交流電圧印加用の複数の導体板と、を備え、
前記セラミック基板の主面に、排気ガスの流路としての断面が四角形状の溝が設けられており、
前記溝は、前記セラミック基板の上側主面に形成されたものの中心軸と下側主面に形成されたものの中心軸とが平面視で重ならないようにして互いに平行に設けられていることを特徴とする排気ガス処理用セラミック部材。
A ceramic substrate;
A plurality of conductor plates for DC pulse voltage or AC voltage application, arranged on each of the upper and lower main surfaces of the ceramic substrate and facing each other across the ceramic substrate;
The main surface of the ceramic substrate is provided with a groove having a square cross section as an exhaust gas flow path ,
The groove is provided in parallel to each other so that a central axis of the ceramic substrate formed on the upper main surface and a central axis of the lower main surface do not overlap in plan view. A ceramic member for exhaust gas treatment.
前記溝は、直線状に設けられていることを特徴とする請求項1記載の排気ガス処理用セラミック部材。 2. The ceramic member for exhaust gas treatment according to claim 1 , wherein the groove is provided in a straight line shape. 前記溝は、前記セラミック基板に研削加工を施すことによって形成されていることを特徴とする請求項1または2に記載の排気ガス処理用セラミック部材。 3. The exhaust gas processing ceramic member according to claim 1 , wherein the groove is formed by grinding the ceramic substrate. 4. 請求項1〜3のいずれかに記載の排気ガス処理用セラミック部材と、A ceramic member for exhaust gas treatment according to any one of claims 1 to 3,
該排気ガス処理用セラミック部材の上下主面にそれぞれ当接するように配置された高圧の直流パルス電圧または高圧の交流電圧印加用の導体板とを具備していることを特徴とする排気ガス処理用装置。A high-pressure DC pulse voltage or a high-voltage AC voltage application conductor plate disposed so as to be in contact with the upper and lower main surfaces of the exhaust gas processing ceramic member, respectively. apparatus.
JP2004247512A 2004-08-26 2004-08-26 Ceramic member for exhaust gas treatment and exhaust gas treatment device Expired - Fee Related JP4637531B2 (en)

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