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JP4744246B2 - Semiconductor mounting method - Google Patents
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JP4744246B2 - Semiconductor mounting method - Google Patents

Semiconductor mounting method Download PDF

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Publication number
JP4744246B2
JP4744246B2 JP2005255782A JP2005255782A JP4744246B2 JP 4744246 B2 JP4744246 B2 JP 4744246B2 JP 2005255782 A JP2005255782 A JP 2005255782A JP 2005255782 A JP2005255782 A JP 2005255782A JP 4744246 B2 JP4744246 B2 JP 4744246B2
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Prior art keywords
conductor pattern
electrode pad
electrode pads
electrode
semiconductor chip
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JP2007073566A (en
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友明 黒石
大道 光明寺
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07251Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps

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  • Wire Bonding (AREA)

Description

本発明は、半導体チップをプリント配線基板上に実装した半導体装置半導体実装方法に関するものである。 The present invention relates to a semiconductor packaging method of a semiconductor device mounting a semiconductor chip on a printed wiring board.

近年、電子部品として半導体パッケージに代えてベアチップを実装するベアチップ実装が利用され、実装面積の大幅縮小が実現されている。(特許文献1)などには図8(a)(b)に示すように、プリント配線基板1から突出した導体パターン2に対して、半導体チップ3の裏面に形成された電極パッド4を熱圧着で接合している。5はプリント配線基板1における前記第1,第2の半導体チップ3a,3bの実装位置に形成された孔である。   In recent years, bare chip mounting, in which a bare chip is mounted instead of a semiconductor package as an electronic component, has been used, and the mounting area has been greatly reduced. As shown in FIGS. 8A and 8B, the electrode pad 4 formed on the back surface of the semiconductor chip 3 is thermocompression-bonded to the conductor pattern 2 protruding from the printed wiring board 1, as shown in FIGS. It is joined with. Reference numeral 5 denotes a hole formed at the mounting position of the first and second semiconductor chips 3a and 3b on the printed wiring board 1.

また、実装密度を向上させるために図9に示すように、プリント配線基板1から突出した導体パターン2を、第1の半導体チップ3aの裏面に形成された電極パッド4aと、第2の半導体チップ3bの裏面に形成された電極パッド4bで挟持して、熱圧着で接合することも行われている。
特開昭64−77135号公報
In order to improve the mounting density, as shown in FIG. 9, the conductor pattern 2 protruding from the printed wiring board 1 is provided with an electrode pad 4a formed on the back surface of the first semiconductor chip 3a and a second semiconductor chip. It is also carried out by being sandwiched between electrode pads 4b formed on the back surface of 3b and bonded by thermocompression bonding.
Japanese Unexamined Patent Publication No. 64-77135

このように従来では、半導体チップの電極パッドと導体パターンとを熱圧着させて接合しているため、導体パターンには電極パッドと同じ材質のメッキを施すことが必要である。具体的には、一般的に電極パッドがAuであるため、導体パターンにAuメッキを施す必要があり、材料価格を安価にできない。   Thus, conventionally, since the electrode pad of the semiconductor chip and the conductor pattern are bonded by thermocompression bonding, the conductor pattern must be plated with the same material as the electrode pad. Specifically, since the electrode pad is generally Au, it is necessary to apply Au plating to the conductor pattern, and the material price cannot be reduced.

本発明は実装密度を高くするために、図9のように、第1の半導体チップの裏面に形成された電極パッドと第2の半導体チップの裏面に形成された電極パッドとで、プリント配線基板から突出した導体パターンを挟んで実装した場合に、従来よりもコストの低減を期待できる半導体実装方法を提供することを目的とする。 In order to increase the mounting density according to the present invention, as shown in FIG. 9, an electrode pad formed on the back surface of the first semiconductor chip and an electrode pad formed on the back surface of the second semiconductor chip, when implementing across the conductive pattern protruding from, and to provide a semiconductor body implementation method can be expected to reduce the cost than before.

本発明の半導体実装方法は、第1の半導体チップの裏面に形成された金の電極パッドと第2の半導体チップの裏面に形成された金の電極パッドとで、プリント配線基板から突出した導体パターンを挟んで実装するに際し、前記両電極パッドの表面に紫外線を照射して活性化した後、前記両電極パッドの間に、材質が金よりも硬い異種材料で幅が前記両電極パッドの幅よりも狭く、表面が金でメッキされていない導体パターンを挟んで、前記導体パターンの一方の面に前記両電極パッドの内の一方の前記電極パッドの先端が当接し、前記導体パターンの他方の面に前記両電極パッドの内の他方の前記電極パッドの先端が当接した状態で、前記両電極パッドで前記導体パターンを圧着することによって、前記一方の電極パッドと前記他方の電極パッドが、押し付けられた前記導体パターンによって加圧変形して、前記導体パターンからはみ出した前記一方の電極パッドの先端と前記他方の電極パッドの先端同士が当接して前記導体パターンを包み込む状態で接合させることを特徴とする。 The semiconductor mounting method of the present invention includes a conductive pattern protruding from a printed wiring board with a gold electrode pad formed on the back surface of the first semiconductor chip and a gold electrode pad formed on the back surface of the second semiconductor chip. When mounting the electrode pad, after activating the surface of both electrode pads by irradiating with ultraviolet rays, the width between the electrode pads is different from the width of the electrode pads. The tip of one of the electrode pads is in contact with one surface of the conductor pattern, and the other surface of the conductor pattern is sandwiched between conductor patterns that are not narrow and plated with gold. When the tip of the other electrode pad of the two electrode pads is in contact with the conductor pattern, the one electrode pad and the other electrode pad are bonded by pressing the conductor pattern with the two electrode pads. Are pressed and deformed by the pressed conductor pattern, and the tip of the one electrode pad protruding from the conductor pattern and the tip of the other electrode pad are in contact with each other to wrap around the conductor pattern. It is characterized by making it.

本発明によれば、第1の半導体チップの裏面に形成された電極パッドと第2の半導体チップの裏面に形成された電極パッドとが当接して接合され、両電極パッドによってプリント配線基板の導体パターンが挟持された電気接続を得ることができる。   According to the present invention, the electrode pad formed on the back surface of the first semiconductor chip and the electrode pad formed on the back surface of the second semiconductor chip are brought into contact with each other, and the conductor of the printed wiring board is joined by both electrode pads. An electrical connection in which the pattern is sandwiched can be obtained.

以下、本発明の半導体実装方法を具体的な実施の形態に基づいて説明する。
なお、従来例を示す図8,図9と同様の作用をなすものには同一の符号を付けて説明する。
Hereinafter, a semiconductor mounting method of the present invention will be described based on specific embodiments.
In addition, the same code | symbol is attached | subjected and demonstrated to what has the effect | action similar to FIG. 8, FIG. 9 which shows a prior art example.

(実施の形態1)
図1(a)〜(d)は本発明の半導体実装方法の工程を示し、図2と図3は仕上がり状態の半導体装置の拡大断面図と平面図を示している。
(Embodiment 1)
1A to 1D show the steps of the semiconductor mounting method of the present invention, and FIGS. 2 and 3 show an enlarged cross-sectional view and a plan view of the finished semiconductor device.

図1(a)では、第1の半導体チップ3aの裏面に形成された電極パッド4aと、第2の半導体チップ3bの裏面に形成された電極パッド4bとに対して、紫外線UVを照射することで、電極パッド4a,4bの表面を活性化する。ここでは、電極パッド4a,4bの材質は何れもAuであった。   In FIG. 1A, ultraviolet rays UV are irradiated to the electrode pad 4a formed on the back surface of the first semiconductor chip 3a and the electrode pad 4b formed on the back surface of the second semiconductor chip 3b. Thus, the surfaces of the electrode pads 4a and 4b are activated. Here, the material of the electrode pads 4a and 4b was Au.

図1(b)では、プリント配線基板1から突出した導体パターン2を中央にして、第1の半導体チップ3aの電極パッド4aと第2の半導体チップ3bの電極パッド4bとで挟む。導体パターン2の材質はAuよりも硬いものが使用されている。具体的には、導体パターン2はCuなど、Auより硬い材料でできている。   In FIG. 1B, the conductor pattern 2 protruding from the printed wiring board 1 is centered and sandwiched between the electrode pad 4a of the first semiconductor chip 3a and the electrode pad 4b of the second semiconductor chip 3b. The conductor pattern 2 is made of a material harder than Au. Specifically, the conductor pattern 2 is made of a material harder than Au, such as Cu.

図1(c)では、第1,第2の半導体チップ3a,3bの背面にツール(図示せず)を押し当てて、熱と矢印F1,F2の力を与える。このとき、半導体チップ3a、3bの電極パッドはそれぞれ、図1(d)のように導体パターン2の両側6で、第1の半導体チップ3aの電極パッド4aと第2の半導体チップ3b,の電極パッド4bとが接触して機械的に十分な強度になるまで、加圧、加熱され、機械的な接合と電気的な接合を同時に実現する。   In FIG.1 (c), a tool (not shown) is pressed on the back surface of the 1st, 2nd semiconductor chip 3a, 3b, and a heat | fever and the force of arrow F1, F2 are given. At this time, the electrode pads of the semiconductor chips 3a and 3b are on both sides 6 of the conductor pattern 2 as shown in FIG. 1D, and the electrodes of the electrode pads 4a and the second semiconductor chips 3b of the first semiconductor chip 3a. Pressing and heating are performed until the pad 4b comes into contact with the pad 4b and has sufficient mechanical strength, so that mechanical bonding and electrical bonding are realized simultaneously.

なお、両面が露出した導体パターンの幅を“a”、高さ(厚さ)を“c”とすると、電極パッド4a,4bの幅“b”は“a+2c”、電極パッド4a,4bの高さdは“2c”以上が望ましい。また、間に挟まれる配線基板の両面が露出した導体パターンはCuなど、Auより硬い材料でできており、圧着時の荷重による導体パターン2の変形は、半導体チップの電極パッド4a,4bの変形より小さい。   When the width of the conductor pattern with both surfaces exposed is “a” and the height (thickness) is “c”, the width “b” of the electrode pads 4a and 4b is “a + 2c” and the height of the electrode pads 4a and 4b. The length d is preferably “2c” or more. Also, the conductive pattern with both surfaces of the wiring board sandwiched between them is made of a material harder than Au, such as Cu, and the deformation of the conductive pattern 2 due to the load at the time of crimping is the deformation of the electrode pads 4a and 4b of the semiconductor chip. Smaller than.

この構成によれば、導体パターン2が電極パッド4a,4bによって挟持されると共に、電極パッド4a,4bの同士が接触して接合されるため、導体パターン2に対しAuメッキなどの処理をなくしても、良好な接合状態が得られる。さらに、電極パッド4a,4bによって導体パターン2を包み込んでいるため、従来に比べて導体パターンの厚み分だけ薄くできる。   According to this configuration, the conductor pattern 2 is sandwiched between the electrode pads 4a and 4b, and the electrode pads 4a and 4b are brought into contact with each other, so that the conductor pattern 2 is not subjected to processing such as Au plating. Also, a good bonding state can be obtained. Furthermore, since the conductor pattern 2 is wrapped by the electrode pads 4a and 4b, it can be made thinner by the thickness of the conductor pattern than in the prior art.

(実施の形態2)
図4(a)(b)は本発明の(実施の形態2)を示す。
上記の(実施の形態1)では、電極パッド4a,4bは導体パターン2よりも幅が広く構成されていたが、この実施の形態では電極パッド4a,4bは導体パターン2と幅がほぼ同じで、導体パターン2における前記第1,第2の半導体チップ3a,3bの実装個所にだけ両側から切り欠き部7を形成して括れ部8を形成して、前記の加圧、加熱によって電極パッド4a,4bが前記括れ部8の両側において接触して接合される点だけが異なっている。
(Embodiment 2)
4A and 4B show (Embodiment 2) of the present invention.
In the above (Embodiment 1), the electrode pads 4a and 4b are configured to be wider than the conductor pattern 2, but in this embodiment, the electrode pads 4a and 4b are substantially the same in width as the conductor pattern 2. The notch 7 is formed from both sides to form the constricted portion 8 only at the mounting positions of the first and second semiconductor chips 3a and 3b in the conductor pattern 2, and the electrode pad 4a is formed by the pressurization and heating. , 4b are different only in that they are brought into contact with each other on both sides of the constricted portion 8.

(実施の形態3)
図5は本発明の(実施の形態3)を示す。
図4の電極パッド4a,4bは導体パターン2と幅がほぼ同じであったが、この図5では電極パッド4a,4bの幅が導体パターン2の幅よりも大きい点だけが(実施の形態2)とは異なっている。
(Embodiment 3)
FIG. 5 shows (Embodiment 3) of the present invention.
The electrode pads 4a and 4b in FIG. 4 have almost the same width as the conductor pattern 2, but in FIG. 5, only the width of the electrode pads 4a and 4b is larger than the width of the conductor pattern 2 (Embodiment 2). ) Is different.

(実施の形態4)
図6は本発明の(実施の形態4)を示す。
上記の(実施の形態1)では、電極パッド4a,4bは導体パターン2よりも幅が広く構成されていたが、この実施の形態では電極パッド4a,4bは導体パターン2と幅がほぼ同じで、導体パターン2における前記第1,第2の半導体チップ3a,3bの実装個所にだけ孔9を形成して、前記の加圧、加熱によって電極パッド4a,4bが前記孔9の内側において接触して接合される点だけが異なっている。
(Embodiment 4)
FIG. 6 shows (Embodiment 4) of the present invention.
In the above (Embodiment 1), the electrode pads 4a and 4b are configured to be wider than the conductor pattern 2, but in this embodiment, the electrode pads 4a and 4b are substantially the same in width as the conductor pattern 2. A hole 9 is formed only at the mounting position of the first and second semiconductor chips 3a and 3b in the conductor pattern 2, and the electrode pads 4a and 4b come into contact with the inside of the hole 9 by the pressurization and heating. The only difference is that they are joined together.

(実施の形態5)
図7は本発明の(実施の形態5)を示す。
図6の電極パッド4a,4bは導体パターン2と幅がほぼ同じであったが、この図7では電極パッド4a,4bの幅が導体パターン2の幅よりも大きい点だけが(実施の形態4)とは異なっている。
(Embodiment 5)
FIG. 7 shows (Embodiment 5) of the present invention.
The electrode pads 4a and 4b in FIG. 6 have substantially the same width as the conductor pattern 2, but in FIG. 7, only the width of the electrode pads 4a and 4b is larger than the width of the conductor pattern 2 (Embodiment 4). ) Is different.

このように構成することによって、前記の加圧、加熱によって電極パッド4a,4bが前記孔9の内側だけでなく、導体パターン2の両側からはみ出した6aの部位でも接触して接合される。   With this configuration, the electrode pads 4a and 4b are brought into contact and bonded not only inside the hole 9 but also at the portion 6a protruding from both sides of the conductor pattern 2 by the pressurization and heating.

なお、上記の図4と図5では導体パターン2の括れ部8は導電パターン2の両側から切り欠いて形成したが、片側から切り欠いて括れ部を形成しても同様である。   4 and 5, the constricted portion 8 of the conductor pattern 2 is cut out from both sides of the conductive pattern 2. However, the constricted portion may be formed by cutting out from one side.

本発明の半導体装置構造は、薄型半導体チップを積層して実装するとき、薄型かつ安価に実装することができ、低背化する事が容易であるので、半導体を積層実装するパッケージなどに適用できる。   The semiconductor device structure of the present invention can be mounted thinly and inexpensively when thin semiconductor chips are stacked and mounted, and can easily be reduced in height, and thus can be applied to a package in which semiconductors are stacked and mounted. .

本発明の半導体実装方法の工程図Process drawing of semiconductor mounting method of the present invention 完成した半導体装置のA−A拡大断面図AA enlarged sectional view of a completed semiconductor device 図2の平面図Plan view of FIG. 本発明の(実施の形態2)の半導体装置の平面図とB−B拡大断面図Plan view and BB enlarged sectional view of a semiconductor device according to (Embodiment 2) of the present invention 本発明の(実施の形態3)の半導体装置の平面図とC−C拡大断面図The top view and CC expanded sectional view of the semiconductor device of (Embodiment 3) of this invention 本発明の(実施の形態4)の半導体装置の平面図とD−D拡大断面図The top view and DD expanded sectional view of the semiconductor device of (Embodiment 4) of this invention 本発明の(実施の形態5)の半導体装置の平面図とE−E拡大断面図The top view and EE expanded sectional view of the semiconductor device of (Embodiment 5) of this invention 従来の半導体装置の平面図とその拡大断面図A plan view of a conventional semiconductor device and an enlarged sectional view thereof 別の従来例の拡大断面図Expanded sectional view of another conventional example

符号の説明Explanation of symbols

1 プリント配線基板
2 導体パターン
3a,3b 第1,第2の半導体チップ
4a,4b 電極パッド
5 プリント配線基板1における半導体チップの実装位置に形成された孔
7 切り欠き部
8 括れ部
9 導体パターンの孔
DESCRIPTION OF SYMBOLS 1 Printed wiring board 2 Conductor pattern 3a, 3b 1st, 2nd semiconductor chip 4a, 4b Electrode pad 5 Hole 7 formed in the mounting position of the semiconductor chip in the printed wiring board 1 Notch part 8 Narrow part 9 Conductor pattern Hole

Claims (3)

第1の半導体チップの裏面に形成された金の電極パッドと第2の半導体チップの裏面に形成された金の電極パッドとで、プリント配線基板から突出した導体パターンを挟んで実装するに際し、
前記両電極パッドの表面に紫外線を照射して活性化した後、
前記両電極パッドの間に、材質が金よりも硬い異種材料で幅が前記両電極パッドの幅よりも狭く、表面が金でメッキされていない導体パターンを挟んで、前記導体パターンの一方の面に前記両電極パッドの内の一方の前記電極パッドの先端が当接し、前記導体パターンの他方の面に前記両電極パッドの内の他方の前記電極パッドの先端が当接した状態で、前記両電極パッドで前記導体パターンを圧着することによって、前記一方の電極パッドと前記他方の電極パッドが、押し付けられた前記導体パターンによって加圧変形して、前記導体パターンからはみ出した前記一方の電極パッドの先端と前記他方の電極パッドの先端同士が当接して前記導体パターンを包み込む状態で接合させる
半導体実装方法。
When mounting with the gold electrode pad formed on the back surface of the first semiconductor chip and the gold electrode pad formed on the back surface of the second semiconductor chip sandwiching the conductor pattern protruding from the printed wiring board,
After activating by irradiating the surface of both electrode pads with ultraviolet rays ,
Between the two electrode pads, smaller than the material width in rigid different materials than gold of both electrode pad width, across the conductor pattern surface is not plated with gold, one surface of the conductor pattern In the state where the tip of one of the electrode pads is in contact with the other electrode pad, and the tip of the other electrode pad of the two electrode pads is in contact with the other surface of the conductor pattern. By crimping the conductor pattern with an electrode pad, the one electrode pad and the other electrode pad are pressed and deformed by the pressed conductor pattern, and the one electrode pad protrudes from the conductor pattern. The semiconductor mounting method , wherein the tip and the tip of the other electrode pad are in contact with each other and wrap around the conductor pattern .
前記導体パターンにおける第1,第2の半導体チップの接合個所前記電極パッドの幅よりも狭くなる括れ部を形成して、前記括れ部において両電極パッド同士を接合する
請求項1記載の半導体実装方法。
The first in the conductive pattern, to form a narrower constricted portion than the width of the electrode pads on the bonding point of the second semiconductor chip, a semiconductor according to claim 1 Symbol placement joining both electrode pads to each other in said constricted portion Implementation method.
前記導体パターンにおける第1,第2の半導体チップの接合個所に孔を形成して、前記孔において前記両電極パッド同士を接合する
請求項1記載の半導体実装方法。
First, by forming a hole in the junction point of the second semiconductor chip, a semiconductor packaging method of claim 1 Symbol placement joining the two electrode pads to each other in the hole in the conductor pattern.
JP2005255782A 2005-09-05 2005-09-05 Semiconductor mounting method Expired - Fee Related JP4744246B2 (en)

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