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JP4782393B2 - Method for producing sialic acid derivative and sialic acid derivative - Google Patents
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JP4782393B2 - Method for producing sialic acid derivative and sialic acid derivative - Google Patents

Method for producing sialic acid derivative and sialic acid derivative Download PDF

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JP4782393B2
JP4782393B2 JP2004214739A JP2004214739A JP4782393B2 JP 4782393 B2 JP4782393 B2 JP 4782393B2 JP 2004214739 A JP2004214739 A JP 2004214739A JP 2004214739 A JP2004214739 A JP 2004214739A JP 4782393 B2 JP4782393 B2 JP 4782393B2
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康宏 梶原
洋明 朝井
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Otsuka Chemical Co Ltd
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本発明は、シアル酸誘導体の製造方法およびシアル酸誘導体に関する。   The present invention relates to a method for producing a sialic acid derivative and a sialic acid derivative.

糖が鎖状に連なった分子である糖鎖は生体内で重要な働きを持ち、細胞間の認識や相互作用に関わっている。特に糖鎖末端にシアル酸という特異な構造の糖残基を有するシアリル糖鎖は、インフルエンザウイルスのレセプターであり、また血管内皮細胞で炎症が起きた際に発現するセレクチンというレクチン(糖結合性タンパク質)によって特異的に認識される。さらに赤血球造血因子であるエリスロポエチン(EPO)という糖タンパク質は、その糖鎖からシアル酸が除去されると急速に代謝される。   A sugar chain, a molecule in which sugars are linked in a chain, has an important function in vivo, and is involved in recognition and interaction between cells. In particular, sialyl sugar chains having a sugar residue with a specific structure called sialic acid at the end of the sugar chain are receptors for influenza virus, and a lectin (sugar-binding protein) expressed when inflammation occurs in vascular endothelial cells. ) Is specifically recognized. Furthermore, a glycoprotein called erythropoietin (EPO), which is an erythropoietic factor, is rapidly metabolized when sialic acid is removed from the sugar chain.

糖鎖の生合成は、糖転移酵素によって糖供与体である糖ヌクレオチドから糖受容体に対し糖転移反応が繰り返されることで行われる。糖ヌクレオチドとは単糖を、リン酸を有するヌクレオチドでエネルギー的に活性化したもので、そのヌクレオチドが脱離基として作用することで糖転移反応が起こる。また、糖転移酵素は糖供与体、糖受容体を厳密に認識し立体選択的、位置特異的に糖受容体へ糖残基を転移させる。シアル酸の場合、生体内で用いられている糖ヌクレオチドは哺乳類では主にシチジン−5’−モノリン酸−シアル酸(CMP−シアル酸)である。   The biosynthesis of sugar chains is performed by repeating a sugar transfer reaction from a sugar nucleotide, which is a sugar donor, to a sugar acceptor by a glycosyltransferase. A sugar nucleotide is a monosaccharide that is energetically activated with a nucleotide having a phosphate, and a sugar transfer reaction occurs when the nucleotide acts as a leaving group. In addition, glycosyltransferases recognize sugar donors and sugar acceptors strictly and transfer sugar residues to sugar acceptors in a stereoselective and position-specific manner. In the case of sialic acid, the sugar nucleotide used in vivo is mainly cytidine-5'-monophosphate-sialic acid (CMP-sialic acid) in mammals.

このようにCMP−シアル酸は、糖鎖にシアル酸を酵素的に結合させるために必要不可欠な化合物であり、大量に合成することができる化学的合成方法を開発することは極めて有用である。
従来、CMP−シアル酸の製造方法としては下記のような方法が報告されている。その方法は、まず2位のみフリーな水酸基を有するシアル酸に、リン酸化したシチジン誘導体を縮合した後に、3価のリン酸を5価に酸化するものである。また、この方法では縮合の際に用いるシチジン誘導体としてはアミダイト法が最も良い方法として利用されている(例えば、特許文献1参照)。
国際公開番号 WO95/25115号
Thus, CMP-sialic acid is an indispensable compound for enzymatically binding sialic acid to a sugar chain, and it is extremely useful to develop a chemical synthesis method that can be synthesized in large quantities.
Conventionally, the following method has been reported as a method for producing CMP-sialic acid. In this method, a phosphorylated cytidine derivative is first condensed with sialic acid having a free hydroxyl group only at the 2-position, and then trivalent phosphoric acid is oxidized to pentavalent. In this method, the amidite method is used as the best method for the cytidine derivative used in the condensation (see, for example, Patent Document 1).
International Publication Number WO95 / 25115

この特許文献1では、リン酸化したシチジン誘導体の調製に多くの工程数が必要であった。そのため、工程数がより少なく、簡便なシアル酸誘導体の製造方法が望まれている。
本発明の課題は、シアル酸誘導体のより工業的生産に適した製造方法および新規なシアル酸誘導体を提供することにある。
In Patent Document 1, a large number of steps are required for the preparation of phosphorylated cytidine derivatives. Therefore, a simple method for producing a sialic acid derivative with fewer steps is desired.
An object of the present invention is to provide a production method suitable for industrial production of a sialic acid derivative and a novel sialic acid derivative.

本発明は以下のシアル酸誘導体の製造方法および新規なシアル酸誘導体に係る。
1.式(4)で示される化合物を酸化することを特徴とする式(3)で示される化合物の製造方法。
The present invention relates to the following method for producing a sialic acid derivative and a novel sialic acid derivative.
1. A method for producing a compound represented by formula (3), comprising oxidizing a compound represented by formula (4).

Figure 0004782393
(式中、Rは、アルキル基、アリル基、ベンジル基、ベンゾイル基、トリチル基、トシル基、ピバロイル基を示す。Rは、アシル基、シリル基、アリル基、ベンジル基、トリチル基、アセタール基を示す。Rは、アルキル基、アリル基、ベンジル基、トリチル基を示す。)
Figure 0004782393
(Wherein R 1 represents an alkyl group, an allyl group, a benzyl group, a benzoyl group, a trityl group, a tosyl group or a pivaloyl group. R 2 represents an acyl group, a silyl group, an allyl group, a benzyl group, a trityl group, Represents an acetal group, and R 3 represents an alkyl group, an allyl group, a benzyl group, or a trityl group.)

Figure 0004782393
(式中、R、RおよびRは上記と同じ。)
Figure 0004782393
(Wherein R 1 , R 2 and R 3 are the same as above)

2.式(3)で示される化合物を還元することを特徴とする式(2)で示される化合物の製造方法。 2. A method for producing a compound represented by formula (2), wherein the compound represented by formula (3) is reduced.

Figure 0004782393
(式中、Rは、アシル基、シリル基、アリル基、ベンジル基、トリチル基、アセタール基を示す。X、Yは、同一又は異なるカチオンを示す。)
Figure 0004782393
(In the formula, R 2 represents an acyl group, a silyl group, an allyl group, a benzyl group, a trityl group, or an acetal group. X + and Y + represent the same or different cations.)

3.式(4)で示される化合物を酸化し、式(3)で示される化合物を製造し、次いで、還元することを特徴とする式(2)で示される化合物の製造方法。
4.式(2)で示される化合物とシチジンを反応させることを特徴とする式(1)で示されるシアル酸誘導体の製造方法。
3. A method for producing a compound represented by formula (2), comprising oxidizing a compound represented by formula (4) to produce a compound represented by formula (3) and then reducing the compound.
4). A method for producing a sialic acid derivative represented by formula (1), comprising reacting a compound represented by formula (2) with cytidine.

Figure 0004782393
Figure 0004782393

5.式(3)で示される化合物を還元し、式(2)で示される化合物を製造し、次いで、シチジンを反応させることを特徴とする式(1)で示されるシアル酸誘導体の製造方法。
6.式(4)で示される化合物を酸化し、式(3)で示される化合物を製造し、次いで、還元し、式(2)で示される化合物を製造し、次いで、シチジンを反応させることを特徴とする式(1)で示されるシアル酸誘導体の製造方法。
7.式(3)で示される化合物。
8.式(2)で示される化合物。
5. A method for producing a sialic acid derivative represented by formula (1), comprising reducing a compound represented by formula (3) to produce a compound represented by formula (2) and then reacting cytidine.
6). A compound represented by the formula (4) is oxidized to produce a compound represented by the formula (3) and then reduced to produce a compound represented by the formula (2), and then cytidine is reacted. A method for producing a sialic acid derivative represented by the formula (1):
7). Compound represented by formula (3).
8). A compound represented by formula (2).

本発明によれば、シチジンを無保護で利用でき、大幅な工程数が削減できる、より工業的生産に適した簡便なシアル酸誘導体の製造方法を提供することができる。   According to the present invention, it is possible to provide a simple method for producing a sialic acid derivative suitable for industrial production, in which cytidine can be used without protection and the number of steps can be greatly reduced.

本発明は、シアル酸誘導体の製造方法および新規なシアル酸誘導体を提供する。
本発明のシアル酸誘導体の製造方法において、出発原料は、シアル酸である。シアル酸は、合成したものでも、市販されているものでも良い。
The present invention provides a method for producing a sialic acid derivative and a novel sialic acid derivative.
In the method for producing a sialic acid derivative of the present invention, the starting material is sialic acid. Sialic acid may be synthesized or commercially available.

まず、シアル酸のカルボキシル基と2位以外の水酸基を保護する。カルボキシル基の保護基Rは、塩基処理により脱離されるものであれば良く、アルキル基、アリル基、ベンジル基、ベンゾイル基、トリチル基、トシル基、ピバロイル基を示す。アルキル基としては、例えばメチル、エチル、ブチル等のアルキル基、ベンジル基としては、例えばベンジル基、シリルベンジル基、p−アセトキシベンジル基等のベンジル基を例示することができる。この中でも、特にアリル基、ベンジル基が良い。
水酸基の保護基Rは、カルボキシル基と同様、塩基処理により脱離されるもので、先に利用したカルボン酸の保護基と脱保護反応時に反応性に差があるものであれば良く、アシル基、シリル基、アリル基、ベンジル基、トリチル基、アセタール基を示す。アシル基としては、例えば、アセチル、モノクロロアセチル、ベンゾイル、ピバロイル、レブノイル等の非置換または置換のアシル基、シリル基としては、例えばトリメチルシリル、t−ブチルジメチルシリル、t−ブチルジフェニルシリル、トリエチルシリル等のシリル基、ベンジル基としては、例えばベンジル基、シリルベンジル基、p−アセトキシベンジル基等のベンジル基、アセタール基としては、例えば2個の水酸基を保護するベンジリデン基等の環状アセタール基を例示することができる。好ましくは、アシル基が良い。より好ましくは、アセチル基が良い。
リン酸の保護基Rは、アルキル基、アリル基、ベンジル基、トリチル基を示す。アルキル基、ベンジル基としては、上記Rと同じ基を例示することができる。
First, the carboxyl group of sialic acid and the hydroxyl groups other than the 2-position are protected. The carboxyl-protecting group R 1 may be any group that can be removed by base treatment, and represents an alkyl group, an allyl group, a benzyl group, a benzoyl group, a trityl group, a tosyl group, or a pivaloyl group. Examples of the alkyl group include alkyl groups such as methyl, ethyl, and butyl. Examples of the benzyl group include benzyl groups such as benzyl, silylbenzyl, and p-acetoxybenzyl. Among these, an allyl group and a benzyl group are particularly preferable.
The protective group R 2 for the hydroxyl group can be removed by base treatment like the carboxyl group, as long as it has a difference in reactivity during the deprotection reaction with the previously used protective group for the carboxylic acid. , A silyl group, an allyl group, a benzyl group, a trityl group, and an acetal group. Examples of the acyl group include unsubstituted or substituted acyl groups such as acetyl, monochloroacetyl, benzoyl, pivaloyl, and levonoyl. Examples of the silyl group include trimethylsilyl, t-butyldimethylsilyl, t-butyldiphenylsilyl, and triethylsilyl. Examples of the silyl group and benzyl group include benzyl groups such as benzyl group, silylbenzyl group, and p-acetoxybenzyl group, and examples of the acetal group include cyclic acetal groups such as a benzylidene group that protects two hydroxyl groups. be able to. An acyl group is preferable. More preferably, an acetyl group is good.
The protecting group R 3 for phosphoric acid represents an alkyl group, an allyl group, a benzyl group, or a trityl group. Examples of the alkyl group and benzyl group include the same groups as those described above for R 1 .

カルボキシル基および水酸基への保護基の導入は、公知の方法により行うことができる。例えば、長谷川らの方法(Hasegawa,A.;Ishida,H.;Kiso,M.J.Carbohydrate Chem.1993,12(3),371−376)やProtecting groups in Organic chemistry,John Wiley & Sons INC., New York 1991,ISBN 0−471−62301−6等によって、保護基を導入することができる。
得られる化合物5は、式(5)で示すことができる。
Introduction of a protecting group to a carboxyl group and a hydroxyl group can be performed by a known method. For example, the method of Hasegawa et al. (Hasegawa, A .; Ishida, H .; Kiso, MJ Carbohydrate Chem. 1993, 12 (3), 371-376) or Protecting groups in Organic Chemistry, John & S & W. , New York 1991, ISBN 0-471-62301-6, etc., can introduce a protecting group.
The resulting compound 5 can be represented by formula (5).

Figure 0004782393
(式中、RおよびRは上記と同じ。)
具体的に1例を示せば下記のように、シアル酸を炭酸セシウム塩にした後、ベンジルブロマイドあるいはベンジルジアゾメタンを用いてベンジルエステル化し、続いて無水酢酸、触媒量の60%過塩素酸を用いて4,7,8,9位の水酸基をアセチル化し化合物5aを得ることができる。エステル化反応は通常0℃〜100℃の温度範囲で、1〜24時間程度で行うのが好ましい。アセチル化等の水酸基の保護反応は通常0℃〜100℃の温度範囲で、1〜24時間程度で行うのが好ましい。
Figure 0004782393
(In the formula, R 1 and R 2 are the same as above.)
Specifically, as shown below, sialic acid is converted to a cesium carbonate salt, then benzyl esterified with benzyl bromide or benzyldiazomethane, followed by acetic anhydride and a catalytic amount of 60% perchloric acid. Thus, the hydroxyl group at the 4, 7, 8, 9-position can be acetylated to obtain the compound 5a. The esterification reaction is usually preferably carried out in the temperature range of 0 ° C to 100 ° C for about 1 to 24 hours. The hydroxyl group protecting reaction such as acetylation is usually preferably carried out in the temperature range of 0 ° C. to 100 ° C. for about 1 to 24 hours.

Figure 0004782393
Figure 0004782393

次に、得られた化合物5の2位の水酸基を、保護されたリン酸と反応させる。このリン酸化反応は、アセトニトリル、ジクロロメタン、テトラヒドロフラン、ジエチルエーテル、ベンゼン、ジメチルホルムアミド等の有機溶媒、好ましくは、極性有機溶媒中で、低温、好ましくは−40℃〜25℃の温度範囲で、酸触媒の存在下行われる。反応は通常1〜10時間程度で行うのが好ましい。例えば、酸触媒を加えるときは低温、好ましくは−40℃〜−10℃とし、徐々に昇温しながら反応を進行させる。反応は通常1〜6時間程度で行うのが好ましい。ここで使用できる酸触媒は、有機酸が好ましく、例えば、1H−テトラゾール、DLカンファースルホン酸、ピリジウム−p−トルエンスルフォネート、p−トルエンスルホニル酸(トシル酸)等を用いることができる。好ましくは1H−テトラゾールが良い。
得られる化合物4は、式(4)で示すことができる。
Next, the hydroxyl group at the 2-position of the obtained compound 5 is reacted with protected phosphoric acid. This phosphorylation reaction is carried out in an organic solvent such as acetonitrile, dichloromethane, tetrahydrofuran, diethyl ether, benzene, dimethylformamide, preferably a polar organic solvent at a low temperature, preferably in the temperature range of −40 ° C. to 25 ° C. Done in the presence of The reaction is usually preferably performed in about 1 to 10 hours. For example, when the acid catalyst is added, the reaction is allowed to proceed at a low temperature, preferably −40 ° C. to −10 ° C., while gradually raising the temperature. The reaction is preferably carried out usually for about 1 to 6 hours. The acid catalyst that can be used here is preferably an organic acid, and for example, 1H-tetrazole, DL camphorsulfonic acid, pyridium-p-toluenesulfonate, p-toluenesulfonyl acid (tosylic acid), and the like can be used. 1H-tetrazole is preferable.
The resulting compound 4 can be represented by formula (4).

Figure 0004782393
(式中、R、RおよびRは上記と同じ。)
Figure 0004782393
(Wherein R 1 , R 2 and R 3 are the same as above)

具体的に1例を示せば下記のように、化合物5aの2位の水酸基に対し、ジベンジルN,N−ジエチルフォスフォロアミダイトと1H−テトラゾールを用いてリン酸化し化合物4aを得ることができる。   Specifically, as shown below, the hydroxyl group at the 2-position of compound 5a can be phosphorylated using dibenzyl N, N-diethyl phosphoramidite and 1H-tetrazole to obtain compound 4a.

Figure 0004782393
Figure 0004782393

続いて、得られた化合物4の3価のリン酸を酸化する。この酸化反応は、アセトニトリル、ジクロロメタン、テトラヒドロフラン、ジエチルエーテル、ベンゼン、ジメチルホルムアミド等の有機溶媒、好ましくは、極性有機溶媒中で、低温、好ましくは−40℃〜25℃の温度範囲で、酸化剤の存在下行われる。ここで使用できる酸化剤は、過酸化水素、m−クロロ過安息香酸、t−ブチルヒドロキシパーオキシド、ヨウ素/ピリジン等を用いることができる。好ましくは、t−ブチルヒドロキシパーオキシドが良い。
得られる化合物3は、式(3)で示すことができる。
Subsequently, trivalent phosphoric acid of the obtained compound 4 is oxidized. This oxidation reaction is carried out in an organic solvent such as acetonitrile, dichloromethane, tetrahydrofuran, diethyl ether, benzene, dimethylformamide, preferably a polar organic solvent at a low temperature, preferably in the temperature range of −40 ° C. to 25 ° C. Done in the presence. Examples of the oxidizing agent that can be used here include hydrogen peroxide, m-chloroperbenzoic acid, t-butylhydroxyperoxide, iodine / pyridine and the like. T-butylhydroxyperoxide is preferable.
The resulting compound 3 can be represented by formula (3).

Figure 0004782393
、RおよびRは上記と同じである。
Figure 0004782393
R 1 , R 2 and R 3 are the same as above.

具体的に1例を示せば下記のように、化合物4aを、t−ブチルヒドロキシパーオキシドを用いて3価のリン酸を酸化し5価のリン酸の化合物3aを得ることができる。   Specifically, as an example, the compound 4a can be oxidized with trivalent phosphoric acid using t-butylhydroxyperoxide to obtain the compound 3a of pentavalent phosphoric acid.

Figure 0004782393
Figure 0004782393

そして、得られた化合物3のリン酸とカルボン酸の保護基を脱保護を行う。この脱保護反応は、2−プロパノール、酢酸エチル等の有機溶媒中、0℃〜100℃の温度範囲で、還元が行われる。反応は通常1〜6時間程度で行うのが好ましい。ここで使用できる還元方法としては、パラジウム/カーボン等を触媒とする水添反応等の接触還元があり、化合物2のその他の官能基を還元しない方法であれば一般的な還元方法を使用することができる。
得られる化合物2は、式(2)で示すことができる。
And the protective group of phosphoric acid and carboxylic acid of the obtained compound 3 is deprotected. In this deprotection reaction, reduction is performed in an organic solvent such as 2-propanol and ethyl acetate in a temperature range of 0 ° C to 100 ° C. The reaction is preferably carried out usually for about 1 to 6 hours. As a reduction method that can be used here, there is catalytic reduction such as hydrogenation reaction using palladium / carbon as a catalyst, and a general reduction method should be used as long as it does not reduce other functional groups of compound 2. Can do.
The resulting compound 2 can be represented by formula (2).

Figure 0004782393
(式中、Rは上記と同じである。X、Yは、同一又は異なるカチオンを示す。)
Figure 0004782393
(In the formula, R 2 is the same as above. X + and Y + represent the same or different cations.)

およびYとしては、例えば、リチウムイオン、ナトリウムイオン、カリウムイオン等のアルカリ金属イオン、カルシウムイオン等のアルカリ土類金属イオン、銅イオン、銀イオン、金イオン、マグネシウムイオン、アルミニウムイオン等の金属イオン、アンモニア、メチルアミン、エチルアミン、ブチルアミン等のアルキルアミンのアンモニウムイオン、アニリン等のアンモニウムイオン等を挙げることができる。アンモニウムイオンの場合は、ジメチルアミンやジエチルアミン等の2級のアンモニウムイオンやトリメチルアミン、トリエチルアミン、トリブチルアミン等の3級のアンモニウムイオンやテトラメチルアミン、テトラエチルアミン等の4級のアンモニウムイオンでもよい。カチオン性のイオンであれば金属、鉱物、アミン類の種別やイオンの価数に関係なくどのようなカチオン性イオンでもよい。 X + and Y + include, for example, alkali metal ions such as lithium ions, sodium ions and potassium ions, alkaline earth metal ions such as calcium ions, copper ions, silver ions, gold ions, magnesium ions and aluminum ions. Examples thereof include metal ions, ammonium ions of alkylamines such as ammonia, methylamine, ethylamine and butylamine, and ammonium ions such as aniline. In the case of ammonium ions, secondary ammonium ions such as dimethylamine and diethylamine, tertiary ammonium ions such as trimethylamine, triethylamine and tributylamine, and quaternary ammonium ions such as tetramethylamine and tetraethylamine may be used. As long as it is a cationic ion, any cationic ion may be used regardless of the type of metal, mineral, amine, and the valence of the ion.

具体的には、化合物3aを接触還元してリン酸とカルボン酸のベンジル基を脱保護して化合物2aへ変換することができる。また、化合物2は化合物5の2位水酸基をリン酸トリス(トリアゾリド)やリン酸トリスイミダゾリドでリン酸化後、水添反応等の触媒還元により脱ベンジルエステル化をおこない調製することもできる。   Specifically, the compound 3a can be catalytically reduced to deprotect the benzyl group of phosphoric acid and carboxylic acid and converted to the compound 2a. Compound 2 can also be prepared by phosphorylating the 2-position hydroxyl group of Compound 5 with phosphoric acid tris (triazolide) or phosphoric acid trihydrate, followed by debenzylation esterification by catalytic reduction such as hydrogenation reaction.

Figure 0004782393
Figure 0004782393

最後に、化合物2は、この合成ルートの鍵反応となるシチジンとの縮合反応を行う。この縮合反応は、アセトニトリル、ジクロロメタン、テトラヒドロフラン、ジエチルエーテル、ベンゼン、ジメチルホルムアミド等の有機溶媒、好ましくは、極性有機溶媒中、0℃〜100℃の温度範囲で、縮合剤の存在下行われる。反応は通常10分〜6時間程度で行うのが好ましい。ここで使用できる縮合剤としては、例えば、PyBop、HATU、HBTU、ジイソプロピルカルボジイミド等と、HOBtを組合せて行うことができる。好ましくはHOBt、ジイソプロピルカルボジイミド(DIPCI)が良い。縮合反応の後、続いて保護基の脱保護を行う。この脱保護反応は、塩基化合物の存在下行われる。ここで使用できる塩基化合物としては、好ましくは、水酸化ナトリウム水溶液が良い。   Finally, compound 2 undergoes a condensation reaction with cytidine which is the key reaction of this synthetic route. This condensation reaction is carried out in the presence of a condensing agent in an organic solvent such as acetonitrile, dichloromethane, tetrahydrofuran, diethyl ether, benzene and dimethylformamide, preferably in a polar organic solvent at a temperature range of 0 ° C to 100 ° C. The reaction is preferably carried out usually for about 10 minutes to 6 hours. Examples of the condensing agent that can be used here include PyBop, HATU, HBTU, diisopropylcarbodiimide, and the like, and HOBt. HOBt and diisopropylcarbodiimide (DIPCI) are preferable. Following the condensation reaction, the protecting group is subsequently deprotected. This deprotection reaction is performed in the presence of a base compound. The base compound that can be used here is preferably a sodium hydroxide aqueous solution.

具体的には、反応条件としては前述のように反応にはヒドロキシベンゾトリアゾール(HOBt)を用いて無水物を形成させそしてシチジンの5’位のアルコールを効率よく攻撃させるために1〜10等量のシチジンを加え0℃〜60℃、好ましくは室温で反応を行った。化合物2aとシチジンの存在化、HOBtとジイソプロピルカルボジイミド(DIPCI)を加えた。詳細に反応の状況を追跡するために、31P−NMRでも反応を追跡する。 Specifically, as mentioned above, the reaction conditions are 1-10 equivalents in order to form an anhydride using hydroxybenzotriazole (HOBt) and efficiently attack the alcohol at the 5 ′ position of cytidine as described above. Of cytidine was added, and the reaction was carried out at 0 to 60 ° C., preferably at room temperature. Presence of compound 2a and cytidine, HOBt and diisopropylcarbodiimide (DIPCI) were added. In order to follow the reaction status in detail, the reaction is also followed by 31 P-NMR.

すると反応開始直後に原料の−3.2ppmのシグナル(a)以外に−2.5ppmに新しいシグナルが観測されはじめた。そして一時間後にはそのシグナル(b)が最も強くなった。そして反応をさらに追跡すると続いて目的のCMP−シアル酸のアセチル誘導体のシグナル(c)が−4.2ppmに観測されはじめた。目的のピーク強度が最も高くなる時間(31PのNMR比約50%)(3時間から4時間)で反応を止め、続いてシアル酸のアセチル基を脱保護するために水酸化ナトリウム水溶液を加えた。そして室温で15時間放置した後凍結乾燥し、HPLC(monoQ)で精製し、目的物であるCMP−シアル酸1を得た。また、脱アセチル化後に観測された−0.7ppmのシグナル(d)はシアル酸の2位リン酸体である。また反応直後に出現するシグナルは、原料でも目的物でもなく、単離することもできないため、原料が活性化された無水物のシグナルではないかと考えている。得られた化合物は標品のCMP−シアル酸のNMRシグナルと良い一致をした。また、合成したCMP−シアル酸を用いてシアル酸転移酵素反応を行い、活性があることを確認した。 Then, immediately after the start of the reaction, a new signal began to be observed at −2.5 ppm in addition to the raw material −3.2 ppm signal (a). And the signal (b) became strongest after one hour. When the reaction was further traced, the signal (c) of the target acetyl derivative of CMP-sialic acid began to be observed at -4.2 ppm. The reaction was stopped at the time when the target peak intensity was highest ( 31 P NMR ratio: about 50%) (3 to 4 hours), and then an aqueous sodium hydroxide solution was added to deprotect the acetyl group of sialic acid. It was. Then, after leaving at room temperature for 15 hours, it was freeze-dried and purified by HPLC (monoQ) to obtain CMP-sialic acid 1 as a target product. Further, the signal (d) of −0.7 ppm observed after deacetylation is the 2-position phosphate of sialic acid. Further, since the signal appearing immediately after the reaction is neither a raw material nor a target product and cannot be isolated, it is considered that the signal is an anhydride signal in which the raw material is activated. The obtained compound was in good agreement with the standard CMP-sialic acid NMR signal. Moreover, sialyltransferase reaction was performed using the synthesized CMP-sialic acid, and it was confirmed that there was activity.

Figure 0004782393
Figure 0004782393

しかしこの場合カルボン酸とリン酸の無水物を介さずに、HOBtが直接リン酸を活性化しCMP−シアル酸を与えている可能性が残っている。そこでカルボン酸をメチルエステルで保護したシアル酸の2位リン酸誘導体を用いて同じ縮合を行ってみることにした。しかしこの場合では無水物だと思われるシグナルもCMP−シアル酸も結果的に得られなかった。   However, in this case, there remains a possibility that HOBt directly activates phosphoric acid to give CMP-sialic acid without using carboxylic acid and phosphoric anhydride. Therefore, it was decided to carry out the same condensation using a 2-position phosphoric acid derivative of sialic acid in which the carboxylic acid was protected with a methyl ester. However, in this case, neither a signal that was considered to be an anhydride nor CMP-sialic acid was obtained as a result.

このことから、シチジンが直接リン酸と結合を形成することはなく、カルボン酸とリン酸の無水物を形成した後にシチジンが攻撃することが分かった。以上の結果から、CMP−シアル酸の新規合成法を検討したことでこれまでに推定してきた隣接するカルボン酸とリン酸は相互作用、つまりカルボン酸リン酸無水物を形成し、そして酸性条件では水酸基はリンに攻撃することが確認できた。   This indicates that cytidine does not form a bond directly with phosphoric acid, but cytidine attacks after forming a carboxylic acid and phosphoric acid anhydride. From the above results, the adjacent synthesis of carboxylic acid and phosphoric acid, which has been estimated so far by studying a novel synthesis method of CMP-sialic acid, forms an interaction, that is, carboxylic acid phosphoric anhydride. It was confirmed that the hydroxyl group attacks phosphorus.

シアル酸のリン酸誘導体とシチジンの縮合を行うことで、これまでとは全く異なるCMP−シアル酸の合成法を確立することができた。またカルボン酸を保護した原料を用いるとCMP−シアル酸は生成しないことからも、これはシアル酸のカルボン酸と2位のリン酸が結合し無水物を形成するということの証明にもなった。また、このことからもやはりCMP−シアル酸分子内でもこの無水物が形成されることを強く示唆している。   By condensing a sialic acid phosphoric acid derivative with cytidine, a completely different CMP-sialic acid synthesis method could be established. In addition, since CMP-sialic acid is not generated when a carboxylic acid-protected raw material is used, this proved that the carboxylic acid of sialic acid and phosphoric acid at the 2-position bind to form an anhydride. . This also strongly suggests that this anhydride is also formed in the CMP-sialic acid molecule.

以下、本発明を実施例に基づいて具体的に説明するが何らこれらに限定されるものではない。   EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, it is not limited to these at all.

合成例1
Benzyl5−acetamido−4,7,8,9−tetra−O−acetyl−3,5−dideoxy−β−D−glycero−D−galacto−2−nonulopyranosonate (5)の合成
5−acetamido−3,5−dideoxy−β−D−glycero−D−galacto−2−nonulopyranosonate(526mg、1.7mmol)をメタノール−水=9:1(12ml)に溶かし、炭酸セシウム(305mg、0.85mmol)を加え、pH=7以下にした。減圧濃縮した後、ジメチルホルムアミドで3度共沸し、真空デシケータで乾燥させた。残渣をジメチルホルムアミド(6.0ml)に溶かし、アルゴン気流下室温でベンジルブロマイド(245μl、20.4mmol)を加え、一晩撹拌した。原料消失を確認後、飽和食塩水、続いて飽和炭酸水素ナトリウム水溶液で抽出後、硫酸マグネシウム(無水)を加えた。濃縮後、残渣をシリカゲルカラム(酢酸エチル:メタノール=3:2)で精製してベンジルエステル誘導体(収量680mg、収率99%)を得た。
続いて得られた化合物(100.2mg、251μmol)を無水酢酸(450μl)に溶かし、−20℃、アルゴン気流下で無水酢酸:過塩素酸=450:1(450μl)を加え、20℃で2時間攪拌した。反応終了を確認後、酢酸エチルで抽出し、飽和重層水で洗浄した。有機層を無水硫酸マグネシウムを用いて乾燥させ、ろ過後減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(酢酸エチル:ヘキサン=5:1)で精製して化合物(5)(収量84.5mg、収率60%)を得た。
Synthesis example 1
Synthesis of Benzyl5-acetamido-4,7,8,9-tetra-O-acetyl-3,5-dideoxy-β-D-glycero-D-galacto-2-nonulopyranononate (5) 5-acetamido-3,5- Dioxyxy-β-D-glycero-D-galacto-2-nonulopyranononate (526 mg, 1.7 mmol) was dissolved in methanol-water = 9: 1 (12 ml), cesium carbonate (305 mg, 0.85 mmol) was added, pH = 7 or less. After concentration under reduced pressure, the residue was azeotroped with dimethylformamide three times and dried with a vacuum desiccator. The residue was dissolved in dimethylformamide (6.0 ml), benzyl bromide (245 μl, 20.4 mmol) was added at room temperature under an argon stream, and the mixture was stirred overnight. After confirming disappearance of the raw materials, magnesium sulfate (anhydrous) was added after extraction with a saturated saline solution and then with a saturated aqueous sodium hydrogen carbonate solution. After concentration, the residue was purified by a silica gel column (ethyl acetate: methanol = 3: 2) to obtain a benzyl ester derivative (yield 680 mg, yield 99%).
Subsequently, the obtained compound (100.2 mg, 251 μmol) was dissolved in acetic anhydride (450 μl), acetic anhydride: perchloric acid = 450: 1 (450 μl) was added at −20 ° C. under an argon stream, and 2 at 20 ° C. Stir for hours. After confirming the completion of the reaction, the mixture was extracted with ethyl acetate and washed with saturated multistory water. The organic layer was dried over anhydrous magnesium sulfate, filtered and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (ethyl acetate: hexane = 5: 1) to obtain compound (5) (yield 84.5 mg, yield 60%).

H−NMR(400MHz,CDCl
δ 7.40−7.30(m,5H,CH Ph),6.09(d,1H,JNH,5=10.5Hz,NH),5.39(dd,1H,J7,6=2.2Hz,J7,8=4.3Hz,H−7),5.31−5.13(m,5H,H−4,H−8,CH Ph),4.54(dd,1H,J9a,8=2.5Hz,Jgem=12.4Hz,H−9a),4.26(dd,1H,J6,5=10.6Hz,J6,7=2.2Hz,NH),4.15(ddd,1H,J5,4=J5,6=J5,NH=10.0Hz,H−5),4.01(dd,1H,J9b,8=8.2,Jgem=12.3Hz,H−9b),2.30−2.20(m,2H,H−3ax,H−3eq),2.13,2.07,1.99,1.97,1.89(5s,15H,Ac×5)
1 H-NMR (400 MHz, CDCl 3 )
δ 7.40-7.30 (m, 5H, CH 2 Ph ), 6.09 (d, 1H, J NH, 5 = 10.5 Hz, NH), 5.39 (dd, 1H, J 7 , 6 = 2.2 Hz, J 7,8 = 4.3 Hz, H-7), 5.31-5.13 (m, 5H, H-4, H-8, CH 2 Ph), 4.54 (dd, 1H, J 9a, 8 = 2.5 Hz, J gem = 12.4 Hz, H-9a), 4.26 (dd, 1H, J 6,5 = 10.6 Hz, J 6,7 = 2.2 Hz, NH ), 4.15 (ddd, 1H, J 5,4 = J 5,6 = J 5, NH = 10.0 Hz, H-5), 4.01 (dd, 1H, J 9b, 8 = 8.2 , J gem = 12.3Hz, H- 9b), 2.30-2.20 (m, 2H, H-3 ax, H-3 eq), 2.13,2.07,1.99,1. 97, 1.89 (5s, 15H, Ac × 5

合成例2
Benzyl5−acetamido−4,7,8,9−tetra−O−acetyl−2−O−(dibenzylphosphityl)−3,5−dideoxy−β−D−glycero−D−galacto−2−nonulopyranosonate (4)の合成
化合物(5)(570mg、1.0mmol)をアセトニトリル(11ml)に溶解し、−20℃、アルゴン気流下でN,N−diethyldibenzylphosphoroamidite(900ml、2.6mmol)と1H−tetrazole(210mg、3.0mmol)を加え、30分撹拌した。原料消失を確認後、飽和食塩水、続いて飽和炭酸水素ナトリウム水溶液で抽出後、硫酸マグネシウム(無水)を加えた。濃縮後、残渣をシリカゲルカラム(酢酸エチル:ヘキサン=2:1)で精製して化合物(4)(収量615mg、収率76%)を得た。
Synthesis example 2
Synthesis of Benzyl5-acetamido-4,7,8,9-tetra-O-acetyl-2-O- (dibenzylphosphityl) -3,5-dioxy-β-D-glycero-D-galacto-2-nonulopyranonate (4) Compound (5) (570 mg, 1.0 mmol) was dissolved in acetonitrile (11 ml), and N, N-diethyldiphenylphosphoramide (900 ml, 2.6 mmol) and 1H-tetrazole (210 mg, 3.0 mmol) were added at −20 ° C. under an argon stream. ) Was added and stirred for 30 minutes. After confirming disappearance of the raw materials, magnesium sulfate (anhydrous) was added after extraction with a saturated saline solution and then with a saturated aqueous sodium hydrogen carbonate solution. After concentration, the residue was purified by a silica gel column (ethyl acetate: hexane = 2: 1) to obtain compound (4) (yield 615 mg, yield 76%).

H−NMR(400MHz,CDCl
δ 7.51−7.28(m,15H,CHPh×3),5.6−5.1(m,5H,H−7,H−8,CH Ph×3),4.94−4.83(m,4H,H−4,CH Ph×3),4.55(dd,1H,J8,9a=2.5Hz,J9a,9b=12.4Hz,H−9a),4.38(d,1H,J5,NH=10.4Hz,NH),4.19(dd,1H,J8,9b=6.8Hz,J9a,9b=12.4Hz,H−9b),4.03(ddd,1H,J4,5=J5,6=10.7Hz,H−5),3.75(dd,1H,J5,6=10.7Hz,J6,7=1.9Hz,H−6),2.42(dd,1H,J3eq,3ax=13.0Hz,J3eq,4=4.9Hz,H−3eq),2.10,2.09,2.02,2.00,1.82(5s,15H,Ac×5),2.05−2.02(m,1H,H−3ax)
31P−NMR
δ −138(s)
1 H-NMR (400 MHz, CDCl 3 )
δ 7.51-7.28 (m, 15H, CH 2 Ph × 3), 5.6-5.1 (m, 5H, H-7, H-8, CH 2 Ph × 3), 4.94 -4.83 (m, 4H, H- 4, CH 2 Ph × 3), 4.55 (dd, 1H, J 8,9a = 2.5Hz, J 9a, 9b = 12.4Hz, H-9a) 4.38 (d, 1H, J5 , NH = 10.4 Hz, NH), 4.19 (dd, 1H, J8 , 9b = 6.8 Hz, J9a, 9b = 12.4 Hz, H-9b ), 4.03 (ddd, 1H, J 4,5 = J 5,6 = 10.7 Hz, H-5), 3.75 (dd, 1H, J 5,6 = 10.7 Hz, J 6,7 = 1.9 Hz, H-6), 2.42 (dd, 1H, J 3 eq, 3ax = 13.0 Hz, J 3 eq, 4 = 4.9 Hz, H-3 eq), 2.10, 2.09, 2 .02, 2.00, 1.82 ( s, 15H, Ac × 5), 2.05-2.02 (m, 1H, H-3ax)
31 P-NMR
δ-138 (s)

実施例1
Benzyl5−acetamido−4,7,8,9−tetra−O−acetyl−2−O−(dibenzylphosphoryl)−3,5−dideoxy−β−D−glycero−D−galacto−2−nonulopyranosonate(3)の合成
化合物(4)(800mg、0.99mmol)をアセトニトリル(11.2ml)に溶かし、−20℃、アルゴン気流下でt−ブチルヒドロキシパーオキシド(Aldrich製)3.1mlを加えて撹拌した。30分後、硫化ジメチル(2.2ml、30mmol)を加え、濃縮した。残渣をシリカゲルカラム(酢酸エチル:ヘキサン=5:1)で精製して化合物(3)(収量740mg、収率90%)を得た。
Example 1
Synthesis of Benzyl5-acetamido-4,7,8,9-tetra-O-acetyl-2-O- (dibenzylphosphoryl) -3,5-deoxy-β-D-glycero-D-galacto-2-nonopyranononate (3) Compound (4) (800 mg, 0.99 mmol) was dissolved in acetonitrile (11.2 ml), and 3.1 ml of t-butylhydroxyperoxide (manufactured by Aldrich) was added and stirred at −20 ° C. under an argon stream. After 30 minutes, dimethyl sulfide (2.2 ml, 30 mmol) was added and concentrated. The residue was purified by silica gel column (ethyl acetate: hexane = 5: 1) to obtain compound (3) (yield 740 mg, yield 90%).

H−NMR(400MHz,CDCl
δ 7.36−7.26(m,15H,CH Ph×3),5.35−5.29(m,3H,CH Ph×3),5.12−4.89(m,7H,H−7,H−8,H−4,NHCH Ph×3),4.56(dd,1H,J8,9a=2.5Hz,J9a,9b=12.4Hz,4.29(dd,1H,J8,9b=7.4Hz,H−9b),4.16−4.11(m,2H,H−5,H−6),2.59(dd,1H,J3eq,3ax=13.6Hz,J3eq,3ax=4.8Hz,H−3eq),2.11,2.02,1.99,1.97,1.86(5s,15H,Ac×5),2.06−2.00(m,1H,H−3ax)
1 H-NMR (400 MHz, CDCl 3 )
δ 7.36-7.26 (m, 15H, CH 2 Ph × 3), 5.35-5.29 (m, 3H, CH 2 Ph × 3), 5.12-4.89 (m, 7H , H-7, H-8, H-4, NH 2 CH 2 Ph × 3), 4.56 (dd, 1H, J 8 , 9a = 2.5 Hz, J 9a, 9b = 12.4 Hz, 4.29 (Dd, 1H, J 8,9b = 7.4 Hz, H-9b), 4.16-4.11 (m, 2H, H-5, H-6), 2.59 (dd, 1H, J 3eq , 3ax = 13.6Hz, J 3eq, 3ax = 4.8Hz, H-3eq), 2.11,2.02,1.99,1.97,1.86 (5s, 15H, Ac × 5), 2.06-2.00 (m, 1H, H-3ax)

実施例2
5−acetamido−4,7,8,9−tetra−O−acetyl−3,5−dideoxy−β−D−glycero−D−galacto−2−nonulopyranosonate2−Phosphate(2)の合成
化合物(3)(150mg,0.15mmol)を2−プロパノールに溶かし、n−ブチルアミン(140μl、0.45mmol)を加えた。アルゴン気流下でパラジウム/チャコール(15mg)を加え、その後水素気流下で3時間反応させた。パラジウムを活性炭ろ過し、濃縮した。残渣をシリカゲルカラム(酢酸エチル:メタノール:水=10:5:1)で精製して化合物(2)(収量87mg、収率70%)を得た。
Example 2
Synthesis of 5-acetamido-4,7,8,9-tetra-O-acetyl-3,5-dioxy-β-D-glycero-D-galacto-2-nonopyranonosonate 2-phosphate (2) Compound (3) (150 mg , 0.15 mmol) was dissolved in 2-propanol and n-butylamine (140 μl, 0.45 mmol) was added. Palladium / charcoal (15 mg) was added under an argon stream, and then reacted for 3 hours under a hydrogen stream. The palladium was filtered through activated carbon and concentrated. The residue was purified by a silica gel column (ethyl acetate: methanol: water = 10: 5: 1) to obtain compound (2) (yield 87 mg, 70%).

H−NMR(400MHz,DO)
δ 5.39(dd,1H,J6,7=2.0Hz,J7,8=5.7Hz,H−7),5.30−5.22(m,2H,H−4,H−8),4.48(dd,1H,J8,9a=2.7Hz,J9a,9b=12.5Hz,H−9a),4.37(dd,1H,J5,6=10.6Hz,J6,7=2.0Hz,H−6),4.28(dd,1H,J8,9b=5.7Hz,J9a,9b=12.5Hz,H−9b),3.86(ddd,1H,J5,4=J5,6=10.6Hz,H−5),2.57(dd,1H,J3eq,3ax=13.30Hz,J3eq,4=5.1Hz,H−3eq),2.11,2.06,2.02,1.97,1.85(5s,15H,Ac×5),2.04−2.01(m,1H,H−3ax)
31P−NMR
δ −4.47(s)
1 H-NMR (400 MHz, D 2 O)
δ 5.39 (dd, 1H, J 6,7 = 2.0 Hz, J 7,8 = 5.7 Hz, H-7), 5.30-5.22 (m, 2H, H-4, H- 8), 4.48 (dd, 1H, J 8 , 9a = 2.7 Hz, J 9a, 9b = 12.5 Hz, H-9a), 4.37 (dd, 1H, J 5 , 6 = 10.6 Hz) , J 6,7 = 2.0 Hz, H-6), 4.28 (dd, 1H, J 8 , 9b = 5.7 Hz, J 9a, 9b = 12.5 Hz, H-9b), 3.86 ( ddd, 1H, J 5,4 = J 5,6 = 10.6Hz, H-5), 2.57 (dd, 1H, J 3eq, 3ax = 13.30Hz, J 3eq, 4 = 5.1Hz, H -3 eq), 2.11, 2.06, 2.02, 1.97, 1.85 (5s, 15H, Ac × 5), 2.04-2.01 (m, 1H, H-3ax)
31 P-NMR
δ −4.47 (s)

実施例3
Cytidine−5'−yl 5−acetamido−3,5−dideoxy−D−glycero−β−D−galacto−2−nonulopyranosid−2''−yl Phosphate (CMP−NeuAc)(1)の合成
化合物(2)(25mg、30μmol)とシチジン(72.5mg、300μmol)の混合物を、蒸留したN,N−ジメチルホルムアミド(DMF)でそれぞれ5回共沸し、デシケーターで一晩乾燥させた。混合物を蒸留したDMF(350μl)に溶かし、室温、アルゴン気流下でヒドロキシベンゾトリアゾール(8.1mg、60μmol)とジイソプロピルカルボジイミド(9.2μl、60μmol)を加えて撹拌した。4.5時間後、0.2N水酸化ナトリウム水溶液(6.0ml、1.2mmol)を加えた。15時間後、凍結乾燥した。残渣をゲルろ過カラムで精製し、化合物(1)を得た。
Example 3
Synthesis of Cytidine-5′-yl 5-acetamido-3,5-dioxyxy-D-glycero-β-D-galacto-2-nonopyranosid-2 ″ -yl Phosphate (CMP-NeuAc) (1) Compound (2) A mixture of (25 mg, 30 μmol) and cytidine (72.5 mg, 300 μmol) was azeotroped with distilled N, N-dimethylformamide (DMF) 5 times each and dried in a desiccator overnight. The mixture was dissolved in distilled DMF (350 μl), and hydroxybenzotriazole (8.1 mg, 60 μmol) and diisopropylcarbodiimide (9.2 μl, 60 μmol) were added and stirred at room temperature under a stream of argon. After 4.5 hours, 0.2N aqueous sodium hydroxide (6.0 ml, 1.2 mmol) was added. After 15 hours, it was lyophilized. The residue was purified with a gel filtration column to obtain compound (1).

H−NMR(400MHz,DO)
δ 7.92(d,1H,J5,6=7.6Hz,H−6),6.07(d,1H,J6,5=7.6Hz,H−5),5.93(d,1H,J1’,2’=4.5Hz,H−1'),4.29−4.18(m,5H,H'−2,H−3’,H−4’,H−5’a,H−5'b),4.09(d,1H,J7”,8”=9.7Hz,H−7”),4.02(ddd,1H,J4”,3”eq=4.7Hz,J4”,3”ax=11.4Hz,J4,5=10.5Hz,H−4”),3.90(dd,1H,J5”,4”=J5”,6”=10.5Hz,H−5”),3.87(ddd,1H,J8”,7”=9.7Hz,J8”,9”a=6.6Hz,J8”,9”b=2.4Hz,H−8”),3.82(dd,1H,J9”b,9”a=11.7Hz,J9b”,8”=2.4Hz,H−9”b),3.57(dd,1H,J9”a,9”b=11.7Hz,J9”a,8”=6.6Hz,H−9”a),3.38(d,1H,J7”,8”=9.7Hz,H−7),2.44(dd,1H,J3”eq,4”=4.7Hz,Jgem=13.4Hz,H−3”eq),2.00(s,3H,Ac),1.60(ddd,1H,J3”ax,4”=11.4Hz,Jgem=13.4Hz,J3”ax,P=5.6Hz,H−3”ax)
31P−NMR(400MHz、DO)
δ −4.46
1 H-NMR (400 MHz, D 2 O)
δ 7.92 (d, 1H, J 5,6 = 7.6 Hz, H-6), 6.07 (d, 1H, J 6,5 = 7.6 Hz, H-5), 5.93 (d , 1H, J 1 ', 2' = 4.5Hz, H-1 '), 4.29-4.18 (m, 5H, H'-2, H-3', H-4 ', H-5) 'a, H-5'b), 4.09 (d, 1H, J 7 ", 8" = 9.7Hz, H-7 "), 4.02 (ddd, 1H, J 4", 3 "eq = 4.7 Hz, J 4 ", 3" ax = 11.4 Hz, J 4 , 5 = 10.5 Hz, H-4 "), 3.90 (dd, 1H, J 5", 4 " = J 5" , 6 " = 10.5Hz, H-5"), 3.87 (ddd, 1H, J 8 ", 7" = 9.7Hz, J 8 ", 9" a = 6.6Hz, J 8 ", 9 "b = 2.4Hz, H-8 "), 3.82 (dd, 1H, J 9 "b, 9" a = 11.7Hz, J 9b ", "= 2.4Hz, H-9" b), 3.57 (dd, 1H, J 9 "a, 9" b = 11.7Hz, J 9 "a, 8" = 6.6Hz, H-9 " a), 3.38 (d, 1H, J 7 ″, 8 ″ = 9.7 Hz, H−7), 2.44 (dd, 1H, J 3 ″ eq, 4 ″ = 4.7 Hz, J gem = 13.4 Hz, H-3 ″ eq), 2.00 (s, 3H, Ac), 1.60 (ddd, 1H, J 3 ″ ax, 4 ″ = 11.4 Hz, J gem = 13.4 Hz, J 3 "ax, P = 5.6Hz, H-3" ax)
31 P-NMR (400 MHz, D 2 O)
δ -4.46

Claims (8)

式(4)で示される化合物を酸化することを特徴とする式(3)で示される化合物の製造方法。
Figure 0004782393
(式中、Rは、アリル基、ベンジル基、又は、トリチル基を示す。Rは、アシル基又はシリル基を示す。Rは、アリル基、ベンジル基、又は、トリチル基を示す。)
Figure 0004782393
(式中、R、RおよびRは上記と同じ。)
A method for producing a compound represented by formula (3), comprising oxidizing a compound represented by formula (4).
Figure 0004782393
(In the formula, R 1 represents an allyl group, a benzyl group, or a trityl group. R 2 represents an acyl group or a silyl group. R 3 represents an allyl group, a benzyl group, or a trityl group. )
Figure 0004782393
(Wherein R 1 , R 2 and R 3 are the same as above)
式(3)で示される化合物を還元することを特徴とする式(2)で示される化合物の製造方法。
Figure 0004782393
(式中、Rは、アリル基、ベンジル基、又は、トリチル基を示す。Rは、アシル基又はシリル基を示す。Rは、アリル基、ベンジル基、又は、トリチル基を示す。)
Figure 0004782393
(式中、Rは上記と同じ。X、Yは、同一又は異なるカチオンを示す。)
A method for producing a compound represented by formula (2), wherein the compound represented by formula (3) is reduced.
Figure 0004782393
(In the formula, R 1 represents an allyl group, a benzyl group, or a trityl group. R 2 represents an acyl group or a silyl group. R 3 represents an allyl group, a benzyl group, or a trityl group. )
Figure 0004782393
(In the formula, R 2 is the same as above. X + and Y + represent the same or different cations.)
式(4)で示される化合物を酸化し、式(3)で示される化合物を製造し、次いで、還元することを特徴とする式(2)で示される化合物の製造方法。
Figure 0004782393
(式中、Rは、アリル基、ベンジル基、又は、トリチル基を示す。Rは、アシル基又はシリル基を示す。Rは、アリル基、ベンジル基、又は、トリチル基を示す。)
Figure 0004782393
(式中、R、RおよびRは上記と同じ。)
Figure 0004782393
(式中、Rは上記と同じ。X、Yは、同一又は異なるカチオンを示す。)
A method for producing a compound represented by formula (2), comprising oxidizing a compound represented by formula (4) to produce a compound represented by formula (3) and then reducing the compound.
Figure 0004782393
(In the formula, R 1 represents an allyl group, a benzyl group, or a trityl group. R 2 represents an acyl group or a silyl group. R 3 represents an allyl group, a benzyl group, or a trityl group. )
Figure 0004782393
(Wherein R 1 , R 2 and R 3 are the same as above)
Figure 0004782393
(In the formula, R 2 is the same as above. X + and Y + represent the same or different cations.)
式(2)で示される化合物とシチジンを反応させることを特徴とする式(1)で示されるシアル酸誘導体の製造方法。
Figure 0004782393
(式中、Rは、アシル基又はシリル基を示す。X、Yは、同一又は異なるカチオンを示す。)
Figure 0004782393
A method for producing a sialic acid derivative represented by formula (1), comprising reacting a compound represented by formula (2) with cytidine.
Figure 0004782393
(In the formula, R 2 represents an acyl group or a silyl group. X + and Y + represent the same or different cations.)
Figure 0004782393
式(3)で示される化合物を還元し、式(2)で示される化合物を製造し、次いで、シチジンを反応させることを特徴とする式(1)で示されるシアル酸誘導体の製造方法。
Figure 0004782393
(式中、Rは、アリル基、ベンジル基、又は、トリチル基を示す。Rは、アシル基又はシリル基を示す。Rは、アリル基、ベンジル基、又は、トリチル基を示す。)
Figure 0004782393
(式中、Rは上記と同じ。X、Yは、同一又は異なるカチオンを示す。)
Figure 0004782393
A method for producing a sialic acid derivative represented by formula (1), comprising reducing a compound represented by formula (3) to produce a compound represented by formula (2) and then reacting cytidine.
Figure 0004782393
(In the formula, R 1 represents an allyl group, a benzyl group, or a trityl group. R 2 represents an acyl group or a silyl group. R 3 represents an allyl group, a benzyl group, or a trityl group. )
Figure 0004782393
(In the formula, R 2 is the same as above. X + and Y + represent the same or different cations.)
Figure 0004782393
式(4)で示される化合物を酸化し、式(3)で示される化合物を製造し、次いで、還元し、式(2)で示される化合物を製造し、次いで、シチジンを反応させることを特徴とする式(1)で示されるシアル酸誘導体の製造方法。
Figure 0004782393
(式中、Rは、アリル基、ベンジル基、又は、トリチル基を示す。Rは、アシル基又はシリル基を示す。Rは、アリル基、ベンジル基、又は、トリチル基を示す。)
Figure 0004782393
(式中、R、RおよびRは上記と同じ。)
Figure 0004782393
(式中、Rは上記と同じ。X、Yは、同一又は異なるカチオンを示す。)
Figure 0004782393
A compound represented by the formula (4) is oxidized to produce a compound represented by the formula (3) and then reduced to produce a compound represented by the formula (2), and then cytidine is reacted. A method for producing a sialic acid derivative represented by the formula (1):
Figure 0004782393
(In the formula, R 1 represents an allyl group, a benzyl group, or a trityl group. R 2 represents an acyl group or a silyl group. R 3 represents an allyl group, a benzyl group, or a trityl group. )
Figure 0004782393
(Wherein R 1 , R 2 and R 3 are the same as above)
Figure 0004782393
(In the formula, R 2 is the same as above. X + and Y + represent the same or different cations.)
Figure 0004782393
式(3)で示される化合物。
Figure 0004782393
(式中、Rは、アリル基、ベンジル基、又は、トリチル基を示す。Rは、アシル基又はシリル基を示す。Rは、アリル基、ベンジル基、又は、トリチル基を示す。)
Compound represented by formula (3).
Figure 0004782393
(In the formula, R 1 represents an allyl group, a benzyl group, or a trityl group. R 2 represents an acyl group or a silyl group. R 3 represents an allyl group, a benzyl group, or a trityl group. )
式(2)で示される化合物。
Figure 0004782393
(式中、Rは、アシル基又はシリル基を示す。X、Yは、同一又は異なるカチオンを示す。)
A compound represented by formula (2).
Figure 0004782393
(In the formula, R 2 represents an acyl group or a silyl group. X + and Y + represent the same or different cations.)
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