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JP4787083B2 - Semiconductor light emitting device - Google Patents
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JP4787083B2 - Semiconductor light emitting device - Google Patents

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JP4787083B2
JP4787083B2 JP2006171184A JP2006171184A JP4787083B2 JP 4787083 B2 JP4787083 B2 JP 4787083B2 JP 2006171184 A JP2006171184 A JP 2006171184A JP 2006171184 A JP2006171184 A JP 2006171184A JP 4787083 B2 JP4787083 B2 JP 4787083B2
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semiconductor
semiconductor layer
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JP2008004672A (en
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幾夫 末宗
達志 赤崎
和典 田中
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Hokkaido University NUC
Hamamatsu Photonics KK
NTT Inc
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Nippon Telegraph and Telephone Corp
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Description

本発明は、半導体発光素子に関するものである。   The present invention relates to a semiconductor light emitting device.

従来の半導体発光素子として発光ダイオードやレーザダイオードが挙げられる。これらの半導体発光素子では、互いに接合されたp型半導体層およびn型半導体層を挟んで一対の電極が設けられており、この一対の電極の間に順バイアス電圧が印加されると、p型半導体層とn型半導体層とのpn接合部の近傍に活性領域が形成され、この活性領域において電子と正孔との対消滅(再結合)によって光が生成される。   Examples of conventional semiconductor light emitting devices include light emitting diodes and laser diodes. In these semiconductor light emitting devices, a pair of electrodes are provided with a p-type semiconductor layer and an n-type semiconductor layer bonded to each other, and when a forward bias voltage is applied between the pair of electrodes, An active region is formed in the vicinity of the pn junction between the semiconductor layer and the n-type semiconductor layer, and light is generated in this active region by annihilation (recombination) of electrons and holes.

また、従来より格段に処理速度の速い量子情報処理や安全性の高い量子情報通信に用いるために、レーザ光をパラメトリック下方変換して光子対を生成する方法等,量子もつれ合い(互いに区別することのできない)光子対を生成する技術が開発されてきている(非特許文献1を参照)。
P. G. Kwiat, K. Mattle, H. Weinfurter, A. Zeilinger, A. V.Sergienko, and Y. Shih: "New high-intensity source ofpolarization-entangled photon pairs," Physical Review Letters, Vol.75,No.24 (1995) pp.4337-4341.
In addition, for use in quantum information processing and quantum information communication that is significantly faster than conventional methods, quantum entanglement (a method of generating photon pairs by parametric down-conversion of laser light, etc.) Techniques for generating photon pairs have not been developed (see Non-Patent Document 1).
PG Kwiat, K. Mattle, H. Weinfurter, A. Zeilinger, AVSergienko, and Y. Shih: "New high-intensity source ofpolarization-entangled photon pairs," Physical Review Letters, Vol. 75, No. 24 (1995) pp .4337-4341.

しかし、レーザ光をパラメトリック下方変換する方法では、(a) 光子対を発生するタイミングを制御することができない、(b) 一度にただ一つの光子対だけを生成することができず必ずある確率で複数の光子対が生成されてしまう、(c) 光子対を生成する速度が遅い、という課題があった。本発明は、上記問題点を解消する為になされたものであり、量子情報処理や量子情報通信に用いるのに好適な半導体発光素子を提供することを目的とする。   However, in the method of down-converting laser light parametrically, (a) the timing of generating photon pairs cannot be controlled, and (b) only one photon pair cannot be generated at a certain time. There were problems that a plurality of photon pairs were generated, and (c) the speed of generating photon pairs was slow. The present invention has been made to solve the above problems, and an object of the present invention is to provide a semiconductor light emitting element suitable for use in quantum information processing and quantum information communication.

本発明に係る半導体発光素子は、第1導電型の半導体基板と、半導体基板の一方の主面上に設けられた第1導電型の第1半導体層と、第1半導体層上に設けられた第2導電型の第2半導体層と、第2半導体層上に設けられた超伝導の第1電極と、半導体基板の他方の主面上に設けられた第2電極と、第1半導体層と第2半導体層との間に設けられた半導体量子ドット領域と、を備えることを特徴とする。さらに、本発明に係る半導体発光素子は、再結合時間より短い幅を持つパルス電流を第1電極と第2電極との間に注入して、半導体量子ドット領域において、第1電極から注入される電子クーパー対と第1半導体層から注入される2個の正孔とを同時に再結合させるか、或いは、第1電極から注入される正孔クーパー対と第1半導体層から注入される2個の電子とを同時に再結合させることを特徴とする。ここで、第1導電型および第2導電型のうち、一方はp型であり、他方はn型である。また、半導体基板,第1半導体層,第2半導体層および半導体量子ドット領域それぞれは、化合物半導体からなるのが好適である。 A semiconductor light emitting device according to the present invention is provided on a first conductive type semiconductor substrate, a first conductive type first semiconductor layer provided on one main surface of the semiconductor substrate, and a first semiconductor layer. A second conductive type second semiconductor layer; a superconducting first electrode provided on the second semiconductor layer; a second electrode provided on the other main surface of the semiconductor substrate; And a semiconductor quantum dot region provided between the second semiconductor layer. Furthermore, the semiconductor light emitting device according to the present invention is injected from the first electrode in the semiconductor quantum dot region by injecting a pulse current having a width shorter than the recombination time between the first electrode and the second electrode. The electron cooper pair and the two holes injected from the first semiconductor layer are simultaneously recombined, or the hole cooper pair injected from the first electrode and the two holes injected from the first semiconductor layer It is characterized by recombining electrons simultaneously. Here, one of the first conductivity type and the second conductivity type is p-type, and the other is n-type. In addition, each of the semiconductor substrate, the first semiconductor layer, the second semiconductor layer, and the semiconductor quantum dot region is preferably made of a compound semiconductor.

この半導体発光素子では、第1導電型の半導体基板の一方の主面上に、順に、第1導電型の第1半導体層、第2導電型の第2半導体層および超伝導の第1電極が設けられている。また、第1導電型の半導体基板の他方の主面上に第2電極が設けられている。また、第1半導体層と第2半導体層との間に半導体量子ドット領域設けられている。このような構成を有する半導体発光素子において、第1電極と第2電極との間に順バイアス電圧が印加されると、第1半導体層と第2半導体層とのpn接合部には、超伝導の第1電極から電子クーパー対が注入されるとともに、第1半導体層から正孔が注入され、これら電子クーパー対と正孔とが同時に再結合して、2つの互いに区別できない光子が同時に生成される。或いは、第1半導体層と第2半導体層とのpn接合部には、超伝導の第1電極から正孔クーパー対が注入されるとともに、第1半導体層から電子が注入され、これら正孔クーパー対と電子とが同時に再結合して、2つの互いに区別できない光子が同時に生成される。   In this semiconductor light emitting device, a first conductive type first semiconductor layer, a second conductive type second semiconductor layer, and a superconductive first electrode are sequentially formed on one main surface of a first conductive type semiconductor substrate. Is provided. A second electrode is provided on the other main surface of the first conductivity type semiconductor substrate. A semiconductor quantum dot region is provided between the first semiconductor layer and the second semiconductor layer. In the semiconductor light emitting device having such a configuration, when a forward bias voltage is applied between the first electrode and the second electrode, the pn junction between the first semiconductor layer and the second semiconductor layer has superconductivity. An electron cooper pair is injected from the first electrode of the first electrode and holes are injected from the first semiconductor layer, and the electron cooper pair and the hole are recombined simultaneously to generate two photons that cannot be distinguished from each other at the same time. The Alternatively, a hole cooper pair is injected from the superconducting first electrode and electrons are injected from the first semiconductor layer into the pn junction between the first semiconductor layer and the second semiconductor layer. The pair and electron recombine simultaneously, producing two simultaneously indistinguishable photons.

本発明に係る半導体発光素子は、量子もつれ合い(互いに区別することのできない)光子対を生成することができ、量子情報処理や量子情報通信において好適に用いられる。   The semiconductor light emitting device according to the present invention can generate quantum entangled (indistinguishable) photon pairs and is preferably used in quantum information processing and quantum information communication.

以下、添付図面を参照して、本発明を実施するための最良の形態を詳細に説明する。なお、図面の説明において同一の要素には同一の符号を付し、重複する説明を省略する。   The best mode for carrying out the present invention will be described below in detail with reference to the accompanying drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted.

図1は、本実施形態に係る半導体発光素子1の断面図である。この図に示されるように、本実施形態に係る半導体発光素子1は、第1導電型の半導体基板11と、半導体基板11の一方の主面上に設けられた第1導電型の第1半導体層12と、第1半導体層12上に設けられた第2導電型の第2半導体層14と、第2半導体層14上に設けられた超伝導の第1電極15と、半導体基板11の他方の主面上に設けられた第2電極16と、を備える。さらに、この半導体発光素子1は、第1半導体層12と第2半導体層14との間に設けられた半導体量子ドット領域13を備える。ここで、第1導電型および第2導電型のうち、一方はp型であり、他方はn型である。また、半導体基板11,第1半導体層12,第2半導体層14および半導体量子ドット領域13それぞれは、化合物半導体からなるのが好適である。   FIG. 1 is a cross-sectional view of a semiconductor light emitting device 1 according to this embodiment. As shown in this figure, the semiconductor light emitting device 1 according to this embodiment includes a first conductive type semiconductor substrate 11 and a first conductive type first semiconductor provided on one main surface of the semiconductor substrate 11. Layer 12, second conductive type second semiconductor layer 14 provided on first semiconductor layer 12, superconducting first electrode 15 provided on second semiconductor layer 14, and the other of semiconductor substrate 11 And a second electrode 16 provided on the main surface. Further, the semiconductor light emitting device 1 includes a semiconductor quantum dot region 13 provided between the first semiconductor layer 12 and the second semiconductor layer 14. Here, one of the first conductivity type and the second conductivity type is p-type, and the other is n-type. Further, each of the semiconductor substrate 11, the first semiconductor layer 12, the second semiconductor layer 14, and the semiconductor quantum dot region 13 is preferably made of a compound semiconductor.

例えば、半導体基板11はp型GaAsからなり、第1半導体層12はp型AlGaAsからなり、半導体量子ドット領域13はGaSbからなり、第2半導体層14はn型GaAsからなる。このような構成を有する半導体発光素子1を製造する方法として、例えばMOCVD,MBE,MOMBE等の広範な技術が適宜に採用される。   For example, the semiconductor substrate 11 is made of p-type GaAs, the first semiconductor layer 12 is made of p-type AlGaAs, the semiconductor quantum dot region 13 is made of GaSb, and the second semiconductor layer 14 is made of n-type GaAs. As a method for manufacturing the semiconductor light emitting device 1 having such a configuration, for example, a wide range of techniques such as MOCVD, MBE, and MOMBE are appropriately employed.

このような半導体発光素子1において、超伝導の第1電極15と第2電極16との間に順バイアス電圧が印加されると、正孔がp型AlGaAs半導体層12からGaSb半導体量子ドット領域13に注入されるとともに、電子クーパー対が超伝導の電極15からn型GaAs半導体層14を経てGaSb半導体量子ドット領域13に注入されて、これら電子クーパー対と2個の正孔とが同時に再結合して、2つの互いに区別できない光子が同時に生成される。   In such a semiconductor light emitting device 1, when a forward bias voltage is applied between the superconducting first electrode 15 and the second electrode 16, holes are transferred from the p-type AlGaAs semiconductor layer 12 to the GaSb semiconductor quantum dot region 13. Are injected into the GaSb semiconductor quantum dot region 13 from the superconducting electrode 15 through the n-type GaAs semiconductor layer 14, and the electron Cooper pair and two holes are recombined simultaneously. Thus, two indistinguishable photons are generated simultaneously.

半導体量子ドット領域13における一つの量子準位に注入される正孔の数は、フェルミ粒子に対するパウリの排他律により、2個までに制限される。一方、ボーズ粒子であるクーパー対には、そのような個数についての制限はない。したがって、発生する光子の数は、半導体量子ドット領域13の量子準位に注入された正孔の数で決まり、2個となる。半導体量子ドット領域13の量子準位に注入された2つの正孔は、互いに等しいエネルギを有し、区別不可能な状態にある。電子クーパー対は、2つの電子が結合した状態であり、互いに区別できない状態であることから、2つの正孔と同時に再結合する。この再結合により、2つの互いに区別できない光子が同時に発生する。   The number of holes injected into one quantum level in the semiconductor quantum dot region 13 is limited to two due to Pauli's exclusion rule for Fermi particles. On the other hand, there is no limit on the number of Cooper pairs that are Bose particles. Therefore, the number of generated photons is determined by the number of holes injected into the quantum level of the semiconductor quantum dot region 13 and is two. The two holes injected into the quantum level of the semiconductor quantum dot region 13 have the same energy and are indistinguishable. The electron cooper pair is a state in which two electrons are combined and is indistinguishable from each other, and therefore recombines simultaneously with two holes. This recombination generates two indistinguishable photons simultaneously.

半導体量子ドット領域13の量子準位は複数存在するが、再結合時間より短い幅を持つパルス電流を電極15,16の間に注入すれば、上の準位の正孔から消滅していき、最後に再結合する基底準位の正孔対を用いれば、一度にただ一つの光子対を生成することができる。発生した光子は、電極15および電極16それぞれに設けられた開口から外に取り出される。光子対の生成速度は、パルス電流の繰り返し時間で決まり、再結合時間程度の短時間で繰り返すことができる。   There are a plurality of quantum levels in the semiconductor quantum dot region 13, but if a pulse current having a width shorter than the recombination time is injected between the electrodes 15 and 16, the holes disappear from the upper level holes, Using the ground level hole pair that recombines last, only one photon pair can be generated at a time. The generated photons are taken out from the openings provided in the electrodes 15 and 16 respectively. The generation rate of the photon pair is determined by the repetition time of the pulse current, and can be repeated in a short time such as the recombination time.

この場合、n型GaAs半導体層14の厚さは、GaSb半導体量子ドット領域13にクーパー対を注入するための輸送効率で決定され、実測結果から100nm程度である。p型AlGaAs半導体層12のAl組成は、電子クーパー対がこの層に進入するのを防ぐことから決定され、15%程度が必要である。電極15および電極16それぞれに設けられる開口は、単一の量子ドットからの発光を取り出す条件から決定され、量子ドットの表面密度が1μm平方に1個程度の場合には直径1μm程度が必要である。また、再結合時間は通常1ns程度であり、パルス電流の繰り返しとそれに伴う光子対生成速度とは1GHz程度まで可能である。   In this case, the thickness of the n-type GaAs semiconductor layer 14 is determined by the transport efficiency for injecting the Cooper pair into the GaSb semiconductor quantum dot region 13 and is about 100 nm from the measurement result. The Al composition of the p-type AlGaAs semiconductor layer 12 is determined from preventing the electron cooper pair from entering this layer, and needs to be about 15%. The openings provided in each of the electrode 15 and the electrode 16 are determined based on conditions for extracting light emitted from a single quantum dot. When the surface density of the quantum dots is about 1 in 1 μm square, a diameter of about 1 μm is required. . The recombination time is usually about 1 ns, and the repetition of the pulse current and the accompanying photon pair generation rate can be up to about 1 GHz.

或いは、半導体基板11はp型GaAsからなり、第1半導体層12はp型AlGaAsからなり、半導体量子ドット領域13はZnTeからなり、第2半導体層14はn型ZnSeからなるものであってもよい。この場合には、超伝導の第1電極15と第2電極16との間に順バイアス電圧が印加されると、正孔がp型AlGaAs半導体層12からZnTe半導体量子ドット領域13に注入されるとともに、電子クーパー対が超伝導の電極15からn型ZnSe半導体層14を経てZnTe半導体量子ドット領域13に注入されて、これら電子クーパー対と2個の正孔とが同時に再結合して、2つの互いに区別できない光子が同時に生成される。   Alternatively, the semiconductor substrate 11 is made of p-type GaAs, the first semiconductor layer 12 is made of p-type AlGaAs, the semiconductor quantum dot region 13 is made of ZnTe, and the second semiconductor layer 14 is made of n-type ZnSe. Good. In this case, when a forward bias voltage is applied between the superconducting first electrode 15 and the second electrode 16, holes are injected from the p-type AlGaAs semiconductor layer 12 into the ZnTe semiconductor quantum dot region 13. At the same time, an electron Cooper pair is injected from the superconducting electrode 15 into the ZnTe semiconductor quantum dot region 13 through the n-type ZnSe semiconductor layer 14, and the electron Cooper pair and two holes are simultaneously recombined. Two indistinguishable photons are generated simultaneously.

これまでに説明した実施形態では半導体基板11はp型半導体からなるものとしたが、半導体基板11はn型半導体からなるものであってもよい。後者の場合、例えば、半導体基板11はn型GaAsからなり、第1半導体層12はn型AlGaAsからなり、半導体量子ドット領域13はInPからなり、第2半導体層14はp型GaAsからなる。この場合には、超伝導の第1電極15と第2電極16との間に順バイアス電圧が印加されると、正孔クーパー対が超伝導の電極15からp型GaAs半導体層14を経てInP半導体量子ドット領域13に注入されるとともに、電子がn型AlGaAs半導体層12からInP半導体量子ドット領域13に注入されて、これら正孔クーパー対と2個の電子とが同時に再結合して、2つの互いに区別できない光子が同時に生成される。   In the embodiment described so far, the semiconductor substrate 11 is made of a p-type semiconductor, but the semiconductor substrate 11 may be made of an n-type semiconductor. In the latter case, for example, the semiconductor substrate 11 is made of n-type GaAs, the first semiconductor layer 12 is made of n-type AlGaAs, the semiconductor quantum dot region 13 is made of InP, and the second semiconductor layer 14 is made of p-type GaAs. In this case, when a forward bias voltage is applied between the superconducting first electrode 15 and the second electrode 16, the hole cooper pair is transferred from the superconducting electrode 15 through the p-type GaAs semiconductor layer 14 to InP. While being injected into the semiconductor quantum dot region 13, electrons are injected from the n-type AlGaAs semiconductor layer 12 into the InP semiconductor quantum dot region 13, and these hole cooper pairs and two electrons are simultaneously recombined to form 2 Two indistinguishable photons are generated simultaneously.

その他、半導体基板11,第1半導体層12,半導体量子ドット領域13および第2半導体層14それぞれの組成については多種の態様があり得る。   In addition, the semiconductor substrate 11, the first semiconductor layer 12, the semiconductor quantum dot region 13, and the second semiconductor layer 14 may have various modes.

以上のように、本実施形態に係る半導体発光素子は、半導体p-n接合をベースとしつつ、一方の電極に超伝導体を用い、その超伝導体の電極からクーパー対を半導体に注入するとともに、人造原子とも言われる半導体量子ドットの量子準位を使って、伝導帯または価電子帯の各量子準位に2つの電子または2つの正孔を分布させて、一度にただ一対だけの量子もつれ合い光子対を生成することができる。したがって、この半導体発光素子は、処理速度の速い量子情報処理や安全性の高い量子情報通信において好適に用いられ得る。   As described above, the semiconductor light emitting device according to the present embodiment is based on a semiconductor pn junction, uses a superconductor for one electrode, and injects a Cooper pair from the superconductor electrode into the semiconductor. Using quantum levels of semiconductor quantum dots, also called artificial atoms, two electrons or two holes are distributed in each quantum level of the conduction band or valence band, and only one pair of entanglements at a time Photon pairs can be generated. Therefore, this semiconductor light emitting device can be suitably used in quantum information processing with high processing speed and quantum information communication with high safety.

本実施形態に係る半導体発光素子1の断面図である。It is sectional drawing of the semiconductor light-emitting device 1 which concerns on this embodiment.

符号の説明Explanation of symbols

1…半導体発光素子、11…第1導電型の半導体基板、12…第1導電型の第1半導体層、13…半導体量子ドット領域、14…第2導電型の第2半導体層、15…超伝導の第1電極、16…第2電極。
DESCRIPTION OF SYMBOLS 1 ... Semiconductor light-emitting device, 11 ... 1st conductivity type semiconductor substrate, 12 ... 1st conductivity type 1st semiconductor layer, 13 ... Semiconductor quantum dot area | region, 14 ... 2nd conductivity type 2nd semiconductor layer, 15 ... Super Conductive first electrode, 16 ... second electrode.

Claims (1)

第1導電型の半導体基板と、
前記半導体基板の一方の主面上に設けられた第1導電型の第1半導体層と、
前記第1半導体層上に設けられた第2導電型の第2半導体層と、
前記第2半導体層上に設けられた超伝導の第1電極と、
前記半導体基板の他方の主面上に設けられた第2電極と、
前記第1半導体層と前記第2半導体層との間に設けられた半導体量子ドット領域と、
を備え、
再結合時間より短い幅を持つパルス電流を前記第1電極と前記第2電極との間に注入して、前記半導体量子ドット領域において、前記第1電極から注入される電子クーパー対と前記第1半導体層から注入される2個の正孔とを同時に再結合させるか、或いは、前記第1電極から注入される正孔クーパー対と前記第1半導体層から注入される2個の電子とを同時に再結合させる、
ことを特徴とする半導体発光素子。
A first conductivity type semiconductor substrate;
A first semiconductor layer of a first conductivity type provided on one main surface of the semiconductor substrate;
A second semiconductor layer of a second conductivity type provided on the first semiconductor layer;
A superconducting first electrode provided on the second semiconductor layer;
A second electrode provided on the other main surface of the semiconductor substrate;
A semiconductor quantum dot region provided between the first semiconductor layer and the second semiconductor layer;
Bei to give a,
A pulse current having a width shorter than the recombination time is injected between the first electrode and the second electrode, and in the semiconductor quantum dot region, the electron cooper pair injected from the first electrode and the first electrode Two holes injected from the semiconductor layer are simultaneously recombined, or a hole cooper pair injected from the first electrode and two electrons injected from the first semiconductor layer are simultaneously combined. Recombine,
A semiconductor light emitting element characterized by the above.
JP2006171184A 2006-06-21 2006-06-21 Semiconductor light emitting device Expired - Fee Related JP4787083B2 (en)

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