JP4831482B2 - Method for measuring carrier mobility of individuals - Google Patents
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- 238000000034 method Methods 0.000 title claims description 31
- 230000003287 optical effect Effects 0.000 claims description 42
- 239000007787 solid Substances 0.000 claims description 31
- 230000008878 coupling Effects 0.000 claims description 22
- 238000010168 coupling process Methods 0.000 claims description 22
- 238000005859 coupling reaction Methods 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 20
- 230000008859 change Effects 0.000 claims description 18
- 239000000523 sample Substances 0.000 claims description 13
- 238000004611 spectroscopical analysis Methods 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 claims description 9
- 230000010355 oscillation Effects 0.000 claims description 6
- 230000009466 transformation Effects 0.000 claims description 3
- 230000001131 transforming effect Effects 0.000 claims 1
- 238000001228 spectrum Methods 0.000 description 19
- 239000004065 semiconductor Substances 0.000 description 17
- 238000010586 diagram Methods 0.000 description 7
- 239000002086 nanomaterial Substances 0.000 description 7
- 238000001069 Raman spectroscopy Methods 0.000 description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000000691 measurement method Methods 0.000 description 5
- 238000013016 damping Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000005355 Hall effect Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000014509 gene expression Effects 0.000 description 3
- 238000001237 Raman spectrum Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 239000004054 semiconductor nanocrystal Substances 0.000 description 1
- 239000003362 semiconductor superlattice Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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Description
本発明は、固体のキャリア移動度測定方法に関するものである。より詳しくは、本発明は、固体のレーザーパルス励起により生じたプラズモンライクな縦波光学(LO)フォノン−プラズモン結合モードの振動による固体の屈折率変化を実時間領域で測定し、その振動の減衰時定数から固体の移動度を直接決定する方法に関するもので、特に半導体などの材料からなるナノ構造デバイスの電気的特性評価法として応用できるものである。 The present invention relates to a method for measuring solid carrier mobility. More specifically, the present invention measures the change in the refractive index of a solid caused by vibration of a plasmon-like longitudinal wave optical (LO) phonon-plasmon coupled mode generated by laser pulse excitation of the solid, and attenuates the vibration. The present invention relates to a method for directly determining the mobility of a solid from a time constant, and is particularly applicable as a method for evaluating electrical characteristics of a nanostructure device made of a material such as a semiconductor.
近年、デバイスの極微細化が進み、ナノメートルサイズのデバイスが実現しつつある。ここで電子の平均自由行程(電子が散乱されるまでに進む平均距離;Siでは10〜50nm程度)がデバイスサイズ以下になると、電子が格子振動や格子欠陥に散乱されない領域(すなわちバリスティック伝導領域)になる。この領域が実現できれば、電界効果トランジスタ(FET)等のデバイス中で、電子はソースからドレインまで散乱されることなく進み、スイッチング速度が劇的に速いトランジスタが実現できる。 In recent years, the miniaturization of devices has progressed, and nanometer-sized devices are being realized. Here, when the average free path of electrons (average distance traveled until electrons are scattered; about 10 to 50 nm for Si) becomes smaller than the device size, the region where electrons are not scattered by lattice vibration or lattice defects (that is, ballistic conduction region) )become. If this region can be realized, in a device such as a field effect transistor (FET), electrons proceed without being scattered from the source to the drain, and a transistor with a dramatically high switching speed can be realized.
現在、バリスティック伝導に関する研究は、ほとんどが電子線リソグラフィー等の微細加工技術に依存したデバイスサイズを小さくする手法を取っている。一方、デバイスサイズを小さくする代わりに、電子の平均自由行程を長くする手法もある。例えば極低温にしてフォノン散乱の影響を無くすか、あるいは分子線エピタキシー(MBE)等の技術を駆使して高純度で欠陥の少ない結晶を生成することである。 Currently, most researches on ballistic conduction take a method of reducing the device size depending on microfabrication techniques such as electron beam lithography. On the other hand, there is also a method of increasing the mean free path of electrons instead of decreasing the device size. For example, the effect of phonon scattering can be eliminated by making the temperature extremely low, or a crystal having high purity and few defects can be produced by using a technique such as molecular beam epitaxy (MBE).
しかし、デバイスを室温で使用するためには前者の極低温という選択は難しく、また後者の結晶性についても、欠陥密度をゼロにすることはほとんど不可能である。このような理由で、微細加工技術によるデバイスサイズのナノ構造化が進んできた訳である。 However, in order to use the device at room temperature, it is difficult to select the former extremely low temperature, and it is almost impossible to make the defect density zero even for the latter crystallinity. For this reason, nano-structuring of device size has been advanced by microfabrication technology.
以上のような背景の中で重要になるのが、半導体、金属などのナノ構造における移動度の評価である。通常、半導体の移動度測定は、ホール効果を利用することが一般的である(例えば、非特許文献1など)。このホール効果は、1879年にE. H. Hallによって発見された現象であり、半導体や金属に電流が流れている時、電流に直角に磁場を印加すると両者に直角な方向に起電力が生じるというものである。このホール効果の実験では、生じた起電力と印加した磁場と電流密度との関係からホール係数が求まり、このホール係数から移動度を導き出すことができる。しかし、ナノ構造体については、ナノメートル(10−9m)オーダーの空間分解能でのホール測定は困難であると考えられる。 What is important in the above background is the evaluation of mobility in nanostructures such as semiconductors and metals. In general, the mobility measurement of a semiconductor generally uses the Hall effect (for example, Non-Patent Document 1). This Hall effect is a phenomenon discovered by EH Hall in 1879. When a current flows through a semiconductor or metal, an electromotive force is generated in a direction perpendicular to both when a magnetic field is applied perpendicular to the current. is there. In the Hall effect experiment, the Hall coefficient is obtained from the relationship between the generated electromotive force, the applied magnetic field, and the current density, and the mobility can be derived from the Hall coefficient. However, for nanostructures, it is considered difficult to measure holes with a spatial resolution on the order of nanometers (10 −9 m).
そのような背景で近年、レーザーを用いたラマン散乱を利用した光学的手法によっても、半導体の移動度を求めることができることが分かってきた(例えば、非特許文献2、3など)。空間分解能約1μmを達成できる顕微ラマン分光(例えば、非特許文献4など)や、空間分解能1μm以下を達成できる近接場ラマン分光(例えば、非特許文献5など)を利用すれば、ナノ構造体において非常に局所的な(ナノ構造体1個または数個の)キャリア移動度を評価できる可能性を持っている。 Against this background, it has recently been found that the mobility of a semiconductor can also be obtained by an optical method using Raman scattering using a laser (for example, Non-Patent Documents 2 and 3). By using microscopic Raman spectroscopy (for example, Non-Patent Document 4) that can achieve a spatial resolution of about 1 μm and near-field Raman spectroscopy (for example, Non-Patent Document 5) that can achieve a spatial resolution of 1 μm or less, It has the potential to evaluate very local carrier mobility (one or several nanostructures).
このラマン散乱を用いた方法では、まず、極性のある半導体(SiCなど)中に特有である、縦波光学(LO)フォノン(以下、LOフォノンとも称する)とプラズモン(電子の集団振動)とが結合して生じたLOフォノン−プラズモン結合モードの上の分枝(L+)と下の分枝(L−)のうち、プラズモンライクな分枝(L+又はL−)に相当するスペクトルを、カーブフィッティングすることによって、プラズモンの減衰定数γを求める。
ここで、プラズモンライクなモードとは、図1に示すように、結合モードの上の分枝(L+)と下の分枝(L−)のうち、裸の(フォノンと結合していない)プラズモンの周波数を示す直線Eに近い状態(図1中で、AやBの領域)を指す。CやDの領域は結合モードの減衰がフォノンの緩和に支配される「フォノンライク」な領域である。
In this method using Raman scattering, first, there are longitudinal wave optical (LO) phonons (hereinafter also referred to as LO phonons) and plasmons (collective vibrations of electrons), which are peculiar in polar semiconductors (such as SiC). The spectrum corresponding to the plasmon-like branch (L + or L − ) of the upper branch (L + ) and the lower branch (L − ) of the combined LO phonon-plasmon coupled mode is A plasmon damping constant γ is obtained by curve fitting.
Here, as shown in FIG. 1, the plasmon-like mode is a bare (not coupled to a phonon) of the upper branch (L + ) and the lower branch (L − ) of the coupled mode. This indicates a state close to a straight line E indicating the frequency of plasmons (A and B regions in FIG. 1). Regions C and D are “phonon-like” regions where the coupling mode attenuation is governed by phonon relaxation.
また、カーブフィッティングでは、一般に非対称的なスペクトル波形になるLOフォノン−プラズモン結合モードを対象とするため、下記のような特殊な関数を用いる(例えば、前記非特許文献2、3など)。 In curve fitting, since the LO phonon-plasmon coupled mode, which generally has an asymmetric spectral waveform, is targeted, the following special function is used (for example, Non-Patent Documents 2 and 3).
ここで、Γはフォノンの減衰定数、γはプラズモンの減衰定数、ωT,ωL,ωPはそれぞれTOフォノン周波数、LOフォノン周波数、プラズマ周波数、eは電子電荷、Nは電子密度、m*は電子の有効質量、ε∞は高周波数極限の誘電率、ε0は真空の誘電率である。このようにして求められたプラズモンの減衰定数γを次式に代入することによって、移動度が計算される。 Here, Γ is a phonon attenuation constant, γ is a plasmon attenuation constant, ω T , ω L , and ω P are a TO phonon frequency, a LO phonon frequency, and a plasma frequency, respectively, e is an electron charge, N is an electron density, and m *. Is the effective mass of electrons, ε ∞ is the dielectric constant at the high frequency limit, and ε 0 is the dielectric constant of the vacuum. The mobility is calculated by substituting the plasmon attenuation constant γ thus obtained into the following equation.
このラマンを用いた方法では、測定試料に電極を付けたり、磁場を印加したりせずに、非接触に光学的手法で移動度を求めることができるので、極性がある半導体については有効であると思われる。
しかし、上記の方法は、ラマンスペクトルという周波数領域の測定手法で得られたスペクトルをかなり大がかりな数式群(式(7)〜式(11))でフィットし、元々時間領域の定数であるプラズモンの緩和時間τの逆数に相当する減衰定数γ=1/τを求めるので、非常に複雑なスペクトルのカーブフィットを必要とし、データ処理に時間がかかるという問題点があった。また、上記の方法は、静的な状態のキャリア移動度を測定しているが、動的な状態、すなわち、例えば光励起によって生じたキャリアが励起された表面から試料の深さ方向に伝導していく状態のキャリア移動度を感度良く測定することが望まれていた。 However, the above method fits the spectrum obtained by the Raman spectrum frequency domain measurement method with a fairly large group of mathematical expressions (Expression ( 7 ) to Expression ( 11 )), and the plasmon constant which is originally a constant in the time domain. Since the attenuation constant γ = 1 / τ corresponding to the reciprocal of the relaxation time τ is obtained, a very complicated curve fitting of the spectrum is required, and there is a problem that the data processing takes time. In the above method, the carrier mobility in a static state is measured. However, in a dynamic state, for example, carriers generated by photoexcitation are conducted from the excited surface in the depth direction of the sample. It has been desired to measure the carrier mobility in various states with high sensitivity.
本発明は、以上の通りの事情に鑑みてなされたものであり、動的な状態のキャリア移動度を短時間で且つ正確に測定することができる固体のキャリア移動度測定方法を提供することを課題としている。 The present invention has been made in view of the circumstances as described above, and provides a solid carrier mobility measurement method capable of accurately measuring carrier mobility in a dynamic state in a short time. It is an issue.
本発明の固体のキャリア移動度測定方法は、上記の課題を解決するために、以下のことを特徴としている。 The solid carrier mobility measuring method of the present invention is characterized by the following in order to solve the above problems.
第1に、フォノンとプラズモンが結合する測定対象である固体に対し、ポンプ−プローブ分光法を用いて、反射率変化又は透過率変化におけるプラズモンライクな縦波光学フォ
ノン−プラズモン結合モードによる実時間振動構造を測定し、その測定データに対し、下記式(1)を用いて時間領域データのフィッティングを行うことにより、プラズモンライクな縦波光学フォノン−プラズモン結合モードの緩和時間τを求め、求めた緩和時間τの値を下記式(2)に代入することにより固体のキャリア移動度μを求めること。
First, with respect to solid phonon and plasmon are measured binding, pumps - using a probe spectroscopy plasmon-like longitudinal optical phonons in reflectance change or transmittance changes - real-time vibration by plasmon coupling mode The structure is measured, and the time domain data is fitted to the measured data using the following formula ( 1 ) to obtain the relaxation time τ of the plasmon-like longitudinal wave optical phonon-plasmon coupled mode, and the obtained relaxation The solid carrier mobility μ is obtained by substituting the value of time τ into the following equation (2).
(上記式中、tは時間、AL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードによる振動の振幅、τ(=τL+)は縦波光学フォノン−プラズモ
ン結合モードのプラズモンライクモードの緩和時間、ΩL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードの振動数、φL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードの振動の初期位相、Bは縦波光学フォノンによる振動の振幅、τLOは縦波光学フォノンの緩和時間、ΩLOは縦波光学フォノンの振動数、φLOは縦波光学フォノンの振動の初期位相、Cは縦波光学フォノン−プラズモン結合モードのフォノンライクモードによる振動の振幅、τL−は縦波光学フォノン−プラズモン結合モードのフォノンライクモードの緩和時間、ΩL−は縦波光学フォノン−プラズモン結合モードのフォノンライクモードの振動数、φL−は縦波光学フォノン−プラズモン結合モードのフォノンライクモードの振動の初期位相、eは電子の電荷、m*は電子の有効質量である)
(In the above equation, t is time , A L + is the amplitude of vibration due to the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, and τ (= τ L + ) is relaxation of the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode. Time, Ω L + is the frequency of the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, φ L + is the initial phase of the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, and B is the vibration due to the longitudinal wave optical phonon. Τ LO is the longitudinal wave optical phonon relaxation time, Ω LO is the longitudinal wave optical phonon frequency, φ LO is the initial phase of the longitudinal wave optical phonon vibration, and C is the longitudinal wave optical phonon-plasmon coupled mode phonon. The amplitude of vibration by the like mode, τ L- is the phonon-like mode of the longitudinal wave optical phonon-plasmon coupled mode. Relaxation time, Ω L− is the frequency of the phonon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, φ L− is the initial phase of the phonon-like mode oscillation in the longitudinal wave optical phonon-plasmon coupled mode, and e is the charge of the electron. , M * is the effective mass of electrons)
第2に、フォノンとプラズモンが結合する測定対象である固体に対し、ポンプ−プローブ分光法を用いて、反射率変化又は透過率変化におけるプラズモンライクな縦波光学フォノン−プラズモン結合モードによる実時間振動構造を測定し、その測定データに対し、下記式(3)を用いてウェーブレット変換を行うことにより、プラズモンライクな縦波光学フォノン−プラズモン結合モードの緩和時間τを求め、求めた緩和時間τの値を下記式(2)に代入することにより固体のキャリア移動度μを求めること。 Second , real-time oscillations in a plasmon-like longitudinal-wave optical phonon-plasmon coupled mode in a change in reflectance or transmittance using a pump-probe spectroscopy for a solid that is a measurement object in which phonons and plasmons are combined. The structure is measured, and the measurement data is subjected to wavelet transform using the following formula ( 3 ) to obtain the relaxation time τ of the plasmon-like longitudinal wave optical phonon-plasmon coupled mode. Obtain the solid carrier mobility μ by substituting the value into the following formula (2).
(上記式中、Ψ(x)はマザーウェーブレットと称される、波束を表す関数、xは入力信号で時間の関数、bはこの波束の時間遅延を表す変数、aはこの波束の時間軸に対する伸縮度、tは時間、f(t)は被変換関数である) (In the above equation, Ψ (x) is a function that represents a wave packet called a mother wavelet, x is a function of time in the input signal, b is a variable that represents a time delay of the wave packet, and a is a time axis of the wave packet. Degree of elasticity, t is time, f (t) is the transformed function)
第3に、上記第2の発明において、ウェーブレット変換のマザーウェーブレットとして下記式(5)で示す、ガウス関数を変形したGaborのマザーウェーブレットを用いること。 Third , in the second invention, a Gabor mother wavelet obtained by modifying a Gaussian function expressed by the following equation (5) is used as a mother wavelet for wavelet transformation.
(上記式中、σはガウス関数の半値全幅、xは入力信号で時間の関数である)
を用いること。
(In the above formula, σ is the full width at half maximum of the Gaussian function, x is the input signal and a function of time)
Use.
第4に、フォノンとプラズモンが結合している測定対象である固体に対し、ポンプ−プローブ分光法を用いて、反射率変化又は透過率変化におけるプラズモンライクな縦波光学フォノン−プラズモン結合モードによる実時間振動構造を測定し、その測定データに対し、下記式(5)を用いて短時間フーリエ変換を行うことにより、プラズモンライクな縦波光学フォノン−プラズモン結合モードの緩和時間τを求め、求めた緩和時間τの値を下記式(2)に代入することにより固体のキャリア移動度μを求めること。 Fourth , by using pump-probe spectroscopy for a solid, which is a measurement target in which phonons and plasmons are combined, an actual measurement using a plasmon-like longitudinal wave optical phonon-plasmon coupled mode in reflectance change or transmittance change is performed. The time vibration structure was measured, and the measurement data was subjected to short-time Fourier transform using the following equation ( 5 ) to obtain the relaxation time τ of the plasmon-like longitudinal wave optical phonon-plasmon coupled mode. By substituting the value of the relaxation time τ into the following formula (2), the carrier mobility μ of the solid is obtained.
(上記式中、Ψ(x)は窓関数、xは入力信号で時間の関数、bは時間遅延、ωは周波数、tは時間、f(t)は被変換関数である) (In the above formula, Ψ (x) is a window function, x is an input signal and a function of time, b is a time delay, ω is a frequency, t is time, and f (t) is a transformed function)
第5に、上記第4の発明において、短時間フーリエ変換の窓関数としてガウス関数を用い、下記式(6)により短時間フーリエ変換を行うこと。 Fifth , in the fourth invention, a Gaussian function is used as a window function for the short-time Fourier transform, and the short-time Fourier transform is performed by the following equation ( 6 ).
(上記式中、σはガウス関数の半値全幅である) (In the above formula, σ is the full width at half maximum of the Gaussian function)
本発明によれば、プラズモンライクなLOフォノン−プラズモン結合モードの実時間振動波形を測定することにより、緩和時間を直接求め、それによって固体のキャリア移動度を求めるようにしたので、動的な状態のキャリア移動度を短時間で且つ正確に測定することができる固体のキャリア移動度測定方法を提供することが可能となる。 According to the present invention, since the real time oscillation waveform of the plasmon-like LO phonon-plasmon coupled mode is measured, the relaxation time is directly obtained, thereby obtaining the carrier mobility of the solid. Thus, it is possible to provide a solid carrier mobility measuring method capable of accurately measuring the carrier mobility in a short time.
本発明は、特に半導体などの固体材料からなるナノ構造デバイスの電気的特性評価法として応用することができる。固体、特にナノ構造の固体中の動的な状態あるいは過程は、例えば、半導体ナノ構造を用いたキャリアによる超高速スイッチを開発する際に起きている現象であり、半導体ナノデバイスの電気的特性評価には移動度の測定が必須であり、これからの超高速デバイスの開発に非常に有用になると期待される。本発明によれば、様々な条件(温度や欠陥密度など)下におけるキャリア移動度の評価を行うことができ、HEMT(High Electron Mobility Transistor)などの高速電子移動によるテラヘルツ(1012Hz)電子デバイスの開発へ利用、超高速データ通信や超省電力機器の実現など、大容量データ送受信や省エネルギー問題に寄与することができる。 The present invention can be applied as a method for evaluating electrical characteristics of a nanostructure device made of a solid material such as a semiconductor. The dynamic state or process in solids, especially nanostructured solids, is a phenomenon that occurs, for example, when developing ultrafast switches with carriers using semiconductor nanostructures, and the electrical characterization of semiconductor nanodevices Therefore, mobility measurement is essential, and it is expected to be very useful for the development of ultra high-speed devices in the future. According to the present invention, carrier mobility can be evaluated under various conditions (temperature, defect density, etc.), and a terahertz (10 12 Hz) electronic device using high-speed electron transfer such as HEMT (High Electron Mobility Transistor). It can contribute to the transmission / reception of large-capacity data and energy saving problems such as the development of high-speed data communication and the realization of ultra-power-saving equipment.
以下、本発明の実施の形態について詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail.
本発明では、従来法のように周波数領域でプラズモンライクなLOフォノン−プラズモン結合モードの減衰定数γを求めるのではなく、時間領域で直接的にプラズモンライクなLOフォノン−プラズモン結合モードの緩和時間τを求めるという全く新しい発想で、極性半導体バルク結晶や薄膜、および半導体などを含む固体のナノ構造体などにおける移動度を測定するものである。 In the present invention, instead of obtaining the plasmon-like LO phonon-plasmon coupled mode damping constant γ in the frequency domain as in the conventional method, the plasmon-like LO phonon-plasmon coupled mode relaxation time τ directly in the time domain. This is a novel concept for measuring the mobility of polar semiconductor bulk crystals, thin films, and solid nanostructures including semiconductors.
本発明において、プラズモンライクなLOフォノン−プラズモン結合モードの緩和時間τを求めるには、ポンプ−プローブ分光法と呼ばれる一般的な時間分解測定法(例えば、時間分解反射率変化測定法や時間分解透過率変化測定法:特開2002-214137号公報などを参照)を用いて、反射率(あるいは透過率)変化においてプラズモンライクなLOフォノン−プラズモン結合モードによる実時間振動構造を測定することにより行う。
In the present invention, in order to obtain the relaxation time τ of the plasmon-like LO phonon-plasmon coupled mode, a general time-resolved measurement method called pump-probe spectroscopy (for example, time-resolved reflectance change measurement method or time-resolved transmission) is used. This is performed by measuring a real-time vibration structure by a plasmon-like LO phonon-plasmon coupled mode in reflectance (or transmittance) change using a rate change measurement method (see Japanese Patent Application Laid-Open No. 2002-214137).
すなわち、極性物質(GaAs、InP、SiCなど)において、積極的にプラズモンとLOフォノンの結合を利用する手法である。この場合は、ラマン散乱の場合と同じように、LOフォノン−プラズモン結合モードに相当する実時間信号を取得することになる。ここで注意すべき点は、LOフォノン−プラズモン結合モードにもフォノンライクモード(モードの減衰時間はフォノンの減衰時間で決まる)とプラズモンライクモード(モードの減衰時間はプラズモンの減衰時間で決まる)が存在するので、プラズモンライクなモードを観測することにより、その減衰時間を求めれば、近似的にプラズモンの減衰時間と見なすことができる(τ=τL+)。ここで、プラズモンライクなモードとは、ラマンの場合と同様に図1に示すように、結合モードの上の分枝(L+)と下の文枝(L−)のうち、裸の(フォノンと結合していない)プラズモンの周波数を示す直線Eに近い状態を指す。すなわち、図1中で、AやBの領域を指す。CやDの領域は結合モードの減衰がフォノンの緩和に支配される「フォノンライク」な領域である。
That is , in a polar substance (GaAs, InP, SiC, etc.), this is a technique that positively utilizes the coupling between plasmons and LO phonons. In this case, as in the case of Raman scattering, a real-time signal corresponding to the LO phonon-plasmon coupled mode is acquired. It should be noted that the LO phonon-plasmon coupled mode also has a phonon-like mode (mode decay time is determined by phonon decay time) and plasmon-like mode (mode decay time is determined by plasmon decay time). Therefore, if the decay time is obtained by observing a plasmon-like mode, it can be approximately regarded as the decay time of plasmon (τ = τ L + ). Here, the plasmon-like mode is a bare (phonon and phonon) of the upper branch (L + ) and the lower branch (L − ) of the coupled mode as shown in FIG. This indicates a state close to a straight line E indicating the frequency of plasmons (not coupled). That is, it refers to the area A or B in FIG. Regions C and D are “phonon-like” regions where the coupling mode attenuation is governed by phonon relaxation.
プラズモンライクなLOフォノン−プラズモン結合モードの信号は、同時に観測されるLOフォノンの信号(このLOフォノンは主に表面近傍の空乏層に存在している)に重畳することになり、単純な減衰振動の式ではフィットできない場合がある。
Plasmon like LO phonon - signal plasmon coupling mode, will be superimposed on the LO phonons signal observed at the same time (this LO phonon is mainly present in the depletion layer near the surface), a simple damped oscillation It may not be possible to fit with the formula.
そこで、解決手段として下記の3つの手法をとる。まず、単純な減衰振動の式を、観測されうる全てのモードについて加算した次式、 Therefore, the following three methods are taken as solution means. First, the following equation, which adds a simple damped oscillation equation for all observable modes:
で時間領域の振動波形をフィットすることである。ここで、第一項のAL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモード(例えばn型GaAsにおいてN>1×1018cm−3では、図1中AのL+に相当)による振動の振幅、τ(=τL+)はL+モードの緩和時間、ΩL+はL+モードの振動数、φL+はL+モードの振動の初期位相、第二項のBはLOフォノンによる振動の振幅、τLOはLOフォノンの緩和時間、ΩLOはLOフォノンの振動数、φLOはLOフォノンの振動の初期位相である。また、第三項のCはLOフォノン−プラズモン結合モードのフォノンライクモード(例えばn型GaAsにおいてN>1×1018cm−3では、図1中DのL−に相当)による振動の振幅、τL−はL−モードの緩和時間、ΩL−はL−モードの振動数、φL−はL−モードの振動の初期位相である。 To fit the time domain vibration waveform. Here, A L + in the first term is based on a plasmon-like mode of the longitudinal wave optical phonon-plasmon coupling mode (for example, in N-type GaAs, N> 1 × 10 18 cm −3 corresponds to L + of A in FIG. 1). The amplitude of vibration, τ (= τ L + ) is the relaxation time of the L + mode, Ω L + is the frequency of the L + mode, φ L + is the initial phase of the vibration of the L + mode, and B in the second term is vibration due to LO phonon , LO is the LO phonon relaxation time, Ω LO is the LO phonon frequency, and φ LO is the initial phase of the LO phonon vibration. C in the third term is the amplitude of vibration due to the phonon-like mode of the LO phonon-plasmon coupled mode (for example, N> 1 × 10 18 cm −3 in n-type GaAs corresponds to L − in FIG. 1), τ L− is the relaxation time of the L − mode, Ω L− is the frequency of the L − mode, and φ L− is the initial phase of the vibration of the L − mode.
もし、上記式(1)で振動波形を上手くフィットできない場合は、次にウェーブレット変換と呼ばれる独特な手法を用いる(「ウェーブレットビギナーズガイド」榊原進著(東京電機大学出版局,1995年)及び特開2003-296301号公報などを参照)。これは、数学的には確立されて来ている手法であるが、物理・計測分野ではほとんど利用されていない手法である。具体的には、ある被変換関数f(t)に対して、次式 If the above equation ( 1 ) does not fit the vibration waveform well, then a unique method called wavelet transform is used (“Wavelet Beginners Guide” Susumu Sugawara (Tokyo Denki University Press, 1995) and JP (See 2003-296301). This is a method that has been established mathematically, but is rarely used in the fields of physics and measurement. Specifically, for a given function f (t),
で定義される。ここで、Ψ(x)はマザーウェーブレット(xは入力信号で時間の関数)と呼ばれ、波束を表す関数である。bはこの波束の時間遅延を表す変数、aはこの波束の時間軸に対する伸縮度、すなわち波束の包絡線の時間幅を表す変数である。変換後の信号強度は、[b,1/a]平面すなわち[時間,周波数]平面で二次元の等高線図になる。このような変換を施すことにより、同じ時間軸に別々の周波数で埋もれていた信号成分を別々に取り出すことができる。マザーウェーブレットの関数型としては、例えばガウス関数などがある。これによって、LOフォノンとは周波数の異なるプラズモンライクなLOフォノン−プラズモン結合モードの信号の時間変化を得ることができる。このようにして得られたプラズモンライクモードの緩和時間τは、ウェーブレット信号上でプラズモンライクモードのピーク周波数を見つけ、この周波数成分の時間遅延方向の緩和時間を指数関数e−t/τを用いてフィットし求めることができる。 Defined by Here, Ψ (x) is called a mother wavelet (x is a function of time with an input signal), and is a function representing a wave packet. b is a variable representing the time delay of the wave packet, and a is a variable representing the degree of stretch of the wave packet with respect to the time axis, that is, the time width of the envelope of the wave packet. The signal intensity after conversion becomes a two-dimensional contour map in the [b, 1 / a] plane, that is, the [time, frequency] plane. By performing such conversion, signal components buried at different frequencies on the same time axis can be extracted separately. Examples of the function type of the mother wavelet include a Gaussian function. Thereby, it is possible to obtain a time change of a signal in a plasmon-like LO phonon-plasmon coupled mode having a frequency different from that of the LO phonon. The relaxation time τ of the plasmon-like mode obtained in this way is obtained by finding the peak frequency of the plasmon-like mode on the wavelet signal and using the exponential function e −t / τ to determine the relaxation time of this frequency component in the time delay direction. Fit and ask.
また一方、ウェーブレット変換を用いず、ある窓関数Ψ(x)を用いた短時間フーリエ変換(「ウェーブレットビギナーズガイド」榊原進著(東京電機大学出版局,1995年)などを参照)を使って、プラズモンライクモードの緩和時間τの取得も可能である。この場合、次式 On the other hand, without using the wavelet transform, using a short-time Fourier transform using a window function Ψ (x) (see “Wavelet Beginners Guide” Susumu Sugawara (Tokyo Denki University Press, 1995) etc.) It is also possible to acquire the relaxation time τ of the plasmon-like mode. In this case,
で表される変換を被変換関数f(t)に対して行い、様々な時間遅延bに対する短時間フーリエスペクトルを得る。このスペクトルは遅延時間と共に減衰していくので、プラズモンライクモードの緩和時間τがその減衰から求まる。なお、上記式中、ωは周波数である。 Is applied to the function f (t) to be converted to obtain short-time Fourier spectra for various time delays b. Since this spectrum attenuates with the delay time, the relaxation time τ of the plasmon-like mode is obtained from the attenuation. In the above formula, ω is a frequency.
以上のようにして得られた緩和時間τを、前記式(12)ではなく、より一般的な下記式(2)(「半導体の物理」培風館,西沢潤一編,御子柴宣夫著,1995年などを参照) The relaxation time τ obtained as described above is not the above formula ( 12 ) but the following general formula (2) ("Semiconductor Physics" Baifukan, edited by Junichi Nishizawa, Norio Mikoshiba, 1995) reference)
に代入して移動度μを直接求めることができる。 The mobility μ can be directly obtained by substituting into.
このように、周波数領域の分光法では、非常に複雑なデータフィットを要した移動度の導出が、本発明によれば、時間領域で直接プラズモンライクなLOフォノン−プラズモン結合モードの緩和時間τを求めることにより、非常に簡潔に行うことができるわけである。 As described above, in the frequency domain spectroscopy, the derivation of the mobility requiring a very complicated data fit is obtained. According to the present invention, the relaxation time τ of the plasmon-like LO phonon-plasmon coupled mode is obtained directly in the time domain. This can be done very simply.
次に、本発明を実施例によりさらに詳細に説明する。
<実施例>
図2は、本発明による固体のキャリア移動度測定方法の原理を示したものである。フェムト秒パルスレーザーを光源としたポンプ−プローブ分光法による時間分解反射率(透過率)測定装置Aにおいて測定された試料の信号の種類によって、2種類のデータ処理(図2のB、C)が考えられる。測定装置Aには反射型、透過型などがある。
Next, the present invention will be described in more detail with reference to examples.
<Example>
FIG. 2 shows the principle of the solid carrier mobility measuring method according to the present invention. Two types of data processing (B and C in FIG. 2) are performed depending on the type of signal of the sample measured in the time-resolved reflectance (transmittance) measuring apparatus A by pump-probe spectroscopy using a femtosecond pulse laser as a light source. Conceivable. The measuring apparatus A includes a reflection type and a transmission type.
まず第1は、図2のBに示すように、時間分解反射率(透過率)の信号が単純な減衰調和振動ではないが、プラズモンライクなLOフォノン−プラズモン結合モードとLOフォノンなど複数の減衰調和振動の和(上記式(1))で良く再現できる場合である。この場合、得られたプラズモンライクなLOフォノン−プラズモン結合モード(L+)の緩和時間τをこのフィッティングで求めることができる。求めた緩和時間τは直ちに上記式(2)に代入され、移動度μが求められる。 First of all, as shown in B of FIG. 2, but is not a simple damping harmonic signal time-resolved reflectivity (transmittance), the plasmon-like LO phonon - a plurality of damping such as plasmon coupling mode and LO phonons This is a case where it can be well reproduced by the sum of harmonic vibrations (the above formula (1)). In this case, the relaxation time τ of the obtained plasmon-like LO phonon-plasmon coupled mode (L + ) can be obtained by this fitting. The obtained relaxation time τ is immediately substituted into the above equation (2), and the mobility μ is obtained.
第2は、図2のCのように非常に複雑な振動構造で、上記式(1)でデータをフィットできない場合である。この場合は、ウェーブレット変換(上記式(3))もしくは短時間フーリエ変換(上記式(4))を用いることになる。 The second is a very complex vibration structure as in C of FIG. 2, a case that can not fit the data by the above formula (1). In this case, wavelet transform (the above formula ( 3 )) or short-time Fourier transform (the above formula ( 4 )) is used.
図3は、非常に複雑な振動構造であり上記式(1)でデータをフィットできない場合で、ウェーブレット変換(上記式(3))を用いてプラズモンライクなLOフォノン−プラズモン結合モード(L+)の緩和時間を求めた実施例の解析結果を示す図である。図3(A)は、図2のCを拡大したもので時間領域での振動波形を表す図である。この時間波形をウェーブレット変換する訳であるが、ここでマザーウェーブレットとしてガウス関数を変形したGaborのマザーウェーブレット: FIG. 3 shows a very complicated vibration structure in which data cannot be fitted by the above equation (1), and a plasmon-like LO phonon-plasmon coupling mode (L + ) using the wavelet transform (the above equation ( 3 )). It is a figure which shows the analysis result of the Example which calculated | required relaxation time. FIG. 3A is an enlarged view of C in FIG. 2 and shows a vibration waveform in the time domain. This time waveform is wavelet transformed, but here Gabor's mother wavelet with a modified Gaussian function as the mother wavelet:
を用いることでMeyerのマザーウェーブレットなど他のマザーウェーブレットを用いる場合よりもずっと滑らかな[時間, 周波数]平面でのスペクトルを得ることができ、従って、より明確にLOフォノン−プラズモン結合モードとLOフォノンを区別できる。ただし、式(4)でσはガウス関数の半値全幅(Full width at half maximum = FWHM)である。このGaborのマザーウェーブレットを用いて変換した信号の時間−周波数プロットが図3(B)である。図3(B)のウェーブレット変換スペクトルでは、約26THz付近にピークを持つプラズモンライクなLOフォノン−プラズモン結合モード(L+)と約7THz付近にピークを持つLOフォノンとが時間−周波数領域で非常に良く分離観測されていることが分かる。このような分離は、図3(A)のような実時間領域では大変難しい。図3(B)から直ちにプラズモンライクなLOフォノン−プラズモン結合モード(L+)の緩和時間τがおおよそ0.2ps(ピコ秒)であることが分かる。より正確にτを求めるためには、図3(B)でプラズモンライクなLOフォノン−プラズモン結合モード(L+)のピーク周波数位置の強度の時間変化を抽出すればよい。その結果を図3(C)に示す。図3(C)はウェーブレット変換スペクトル上で、プラズモンライクモード(L+)のピーク強度を遅延時間(b)に対してプロットした図である。 Provides a much smoother spectrum in the [time, frequency] plane than with other mother wavelets, such as Meyer's mother wavelet, and therefore more clearly LO phonon-plasmon coupled modes and LO phonons. Can be distinguished. In Equation ( 4 ), σ is the full width at half maximum (FWHM) of the Gaussian function. FIG. 3B is a time-frequency plot of a signal converted using the Gabor mother wavelet. In the wavelet transform spectrum of FIG. 3B, the plasmon-like LO phonon-plasmon coupled mode (L + ) having a peak near about 26 THz and the LO phonon having a peak near about 7 THz are very much in the time-frequency domain. It can be seen that they are well separated. Such separation is very difficult in the real-time region as shown in FIG. It can be seen from FIG. 3B that the relaxation time τ of the plasmon-like LO phonon-plasmon coupled mode (L + ) is approximately 0.2 ps (picoseconds). In order to obtain τ more accurately, it is only necessary to extract the time change of the intensity at the peak frequency position in the plasmon-like LO phonon-plasmon coupled mode (L + ) in FIG. The result is shown in FIG. FIG. 3C is a diagram in which the peak intensity of the plasmon-like mode (L + ) is plotted against the delay time (b) on the wavelet transform spectrum.
これから直ちにプラズモンライクなLOフォノン−プラズモン結合モード(L+)の緩和時間τが約0.2ps(ピコ秒)であることが分かる。従って、上記式(2)から移動度μが約5250cm2/Vsと求まる。ただし、ここで電子の電荷e=1.60219×10−19C、電子の有効質量m*=0.067m(m=9.10956×10−31kg)を用いた。 From this, it is immediately understood that the relaxation time τ of the plasmon-like LO phonon-plasmon coupled mode (L + ) is about 0.2 ps (picosecond). Therefore, the mobility μ is determined to be about 5250 cm 2 / Vs from the above formula (2). However, here, an electron charge e = 1.60219 × 10 −19 C and an effective mass of electron m * = 0.067 m (m = 9.110956 × 10 −31 kg) were used.
図4は、非常に複雑な振動構造であり上記式(1)でデータをフィットできない場合(図2のCもしくは図3(A)の場合)で、短時間フーリエ変換(上記式(4))を用いてプラズモンライクなLOフォノン−プラズモン結合モード(L+)の緩和時間を求めた実施例の解析結果を示す図である。 FIG. 4 shows a very complicated vibration structure, and when the data cannot be fitted by the above formula ( 1 ) (in the case of C in FIG. 2 or FIG. 3A), the short-time Fourier transform (the above formula ( 4 )). It is a figure which shows the analysis result of the Example which calculated | required the relaxation time of plasmon-like LO phonon-plasmon coupling mode (L <+> ) using.
短時間フーリエ変換(上記式(4))における窓関数はガウス関数とした。何故なら矩形関数など他の窓関数を用いる場合よりもずっと滑らかな短時間スペクトルを得ることができ、従って、より明確に縦波光学(LO)フォノン−プラズモン結合モードとLOフォノンを区別できるからである。すなわち、短時間フーリエ変換(上記式(4))で窓関数をガウス関数にすると、次式 The window function in the short-time Fourier transform (the above formula ( 4 )) was a Gaussian function. This is because a much smoother short-time spectrum can be obtained than when using other window functions such as a rectangular function, and therefore, the longitudinal wave optical (LO) phonon-plasmon coupling mode and LO phonon can be more clearly distinguished. is there. That is, when the window function is changed to a Gaussian function by the short-time Fourier transform (the above formula ( 4 )),
となる。ただしここで、σはガウス関数の半値全幅(Full width at half maximum = FWHM)である。図4(A)には図2のDの時間領域振動波形データに短時間フーリエ変換を施した0.036ps毎のスペクトルを示した。約26THz付近にピークを持つプラズモンライクなLOフォノン−プラズモン結合モード(L+)と約7THz付近にピークを持つLOフォノンとが周波数領域で非常に良く分離観測されていることが分かる。このような分離は、図3(A)のような実時間領域では大変難しい。図4(B)にはプラズモンライクなLOフォノン−プラズモン結合モード(L+)のピーク周波数位置の強度の時間変化を遅延時間bに対してプロットした。これから直ちにプラズモンライクなLOフォノン−プラズモン結合モード(L+)の緩和時間τが約0.2ps(ピコ秒)であることが分かる。従って、上記式(2)から移動度μが約5250cm2/Vsと求まる。ただし、ここで電子の電荷e=1.60219×10−19C、電子の有効質量m*=0.067m(m=9.10956×10−31kg)を用いた。 It becomes. Where σ is the full width at half maximum of the Gaussian function (Full width at half maximum = FWHM). FIG. 4A shows a spectrum every 0.036 ps obtained by performing a short-time Fourier transform on the time-domain vibration waveform data of D of FIG. It can be seen that the plasmon-like LO phonon-plasmon coupled mode (L + ) having a peak in the vicinity of about 26 THz and the LO phonon having a peak in the vicinity of about 7 THz are very well separated and observed in the frequency domain. Such separation is very difficult in the real-time region as shown in FIG. In FIG. 4B, the time change of the intensity at the peak frequency position in the plasmon-like LO phonon-plasmon coupled mode (L + ) is plotted with respect to the delay time b. From this, it is immediately understood that the relaxation time τ of the plasmon-like LO phonon-plasmon coupled mode (L + ) is about 0.2 ps (picosecond). Therefore, the mobility μ is determined to be about 5250 cm 2 / Vs from the above formula (2). However, here, an electron charge e = 1.60219 × 10 −19 C and an effective mass of electron m * = 0.067 m (m = 9.110956 × 10 −31 kg) were used.
最後に図5は、実際の試料n型GaAs単結晶で測定されたプラズモンライクなLOフォノン−プラズモン結合モード(L+)での実施例の測定結果である。時間領域振動の解析には短時間フーリエ変換(上記式(5))を用いた。図5(A)は、時間分解反射率変化測定で実際に得られた信号を示す。図5(B)は(A)の時間領域振動波形を短時間フーリエ変換したスペクトルを示す図であり、スペクトル毎の遅延時間bの間隔は可変(0.05〜1.0ps)である。図5(C)は、短時間フーリエ変換したスペクトル図5(B)上で、プラズモンライクモード(L+)のピーク強度を遅延時間(b)に対してプロットした図である。図5(C)のプラズモンライクなLOフォノン−プラズモン結合モード(L+)の強度時間依存性から、L+モードの緩和時間τがおおよそ0.2ps(ピコ秒)であることが分かる。従って、上記式(2)から移動度μが約5250cm2/Vsと求まる。ただし、ここで電子の電荷e=1.60219×10−19C、電子の有効質量m*=0.067m(m=9.10956×10−31kg)を用いた。得られた移動度μの値は、室温においてホール測定で得られている実験値μ=8800cm2/Vsにほぼ近い値である。 Finally, FIG. 5 shows the measurement results of the example in the plasmon-like LO phonon-plasmon coupling mode (L + ) measured with an actual sample n-type GaAs single crystal. A short-time Fourier transform (the above formula (5)) was used for the analysis of the time domain vibration. FIG. 5A shows a signal actually obtained by the time-resolved reflectance change measurement. FIG. 5B is a diagram showing a spectrum obtained by subjecting the time domain vibration waveform of FIG. 5A to a short-time Fourier transform, and the interval of the delay time b for each spectrum is variable (0.05 to 1.0 ps). FIG. 5C is a diagram in which the peak intensity of the plasmon-like mode (L + ) is plotted against the delay time (b) on the spectrum diagram 5B subjected to the short-time Fourier transform. From the intensity time dependence of the plasmon-like LO phonon-plasmon coupled mode (L + ) in FIG. 5C, it can be seen that the relaxation time τ of the L + mode is approximately 0.2 ps (picoseconds). Therefore, the mobility μ is determined to be about 5250 cm 2 / Vs from the above formula (2). However, here, an electron charge e = 1.60219 × 10 −19 C and an effective mass of electron m * = 0.067 m (m = 9.110956 × 10 −31 kg) were used. The obtained value of the mobility μ is a value substantially close to the experimental value μ = 8800 cm 2 / Vs obtained by the Hall measurement at room temperature.
以上図2〜図5記載の実施例の結果は、プラズモンライクなLOフォノン−プラズモン結合モードとしてL+に限定したものではなく、プラズモンライクなLOフォノン−プラズモン結合モードとしてL−モードを観測しても同様な結果が得られる。このように、本発明によって、これまで周波数領域で得られたラマンスペクトルを複雑な数式でフィットして求めていた半導体の移動度μが、実時間領域で簡単に求めることが可能であると示された。 Or 2-5 results of Example described the plasmon-like LO phonon - not for limiting the L + as plasmon coupling mode, the plasmon-like LO phonon - as plasmon coupling mode L - mode observed in the Gives similar results. Thus, according to the present invention, it has been shown that the semiconductor mobility μ, which has been obtained by fitting the Raman spectrum obtained in the frequency domain so far with a complicated mathematical formula, can be easily obtained in the real time domain. It was done.
また、本発明の測定対象の固体試料としては、図5の測定結果を得た実施例にあるような半導体単結晶に限るものではなく、金属単結晶や薄膜、半導体超格子や半導体量子井戸構造、金属・半導体ナノ結晶(量子ドットなど)及びナノワイヤーなどプラズモンを有する全ての固体とすることができ、本発明はこれらの電気的特性(移動度)の評価法として有効である。 Further, the solid sample to be measured of the present invention is not limited to the semiconductor single crystal as in the embodiment where the measurement results of FIG. 5 are obtained, but is a metal single crystal, a thin film, a semiconductor superlattice, or a semiconductor quantum well structure. All solids having plasmons such as metal / semiconductor nanocrystals (such as quantum dots) and nanowires can be used, and the present invention is effective as a method for evaluating these electrical characteristics (mobility).
Claims (5)
(上記式中、tは時間、AL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードによる振動の振幅、τ(=τL+)は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードの緩和時間、ΩL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードの振動数、φL+は縦波光学フォノン−プラズモン結合モードのプラズモンライクモードの振動の初期位相、Bは縦波光学フォノンによる振動の振幅、τLOは縦波光学フォノンの緩和時間、ΩLOは縦波光学フォノンの振動数、φLOは縦波光学フォノンの振動の初期位相、Cは縦波光学フォノン−プラズモン結合モードのフォノンライクモードによる振動の振幅、τL−は縦波光学フォノン−プラズモン結合モードのフォノンライクモードの緩和時間、ΩL−は縦波光学フォノン−プラズモン結合モードのフォノンライクモードの振動数、φL−は縦波光学フォノン−プラズモン結合モードのフォノンライクモードの振動の初期位相、eは電子の電荷、m*は電子の有効質量である) Using pump-probe spectroscopy, we measure the real-time vibration structure of the plasmon-like longitudinal-wave optical phonon-plasmon coupling mode in the reflectance change or transmittance change for the solid that is the object of measurement where phonon and plasmon are combined. Then, the relaxation time τ of the plasmon-like longitudinal wave optical phonon-plasmon coupling mode is obtained by fitting the time domain data using the following formula ( 1 ) to the measured data, and the value of the obtained relaxation time τ The solid carrier mobility μ is obtained by substituting into the following formula (2).
(In the above equation, t is time, A L + is the amplitude of vibration due to the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, and τ (= τ L + ) is relaxation of the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode. Time, Ω L + is the frequency of the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, φ L + is the initial phase of the plasmon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, and B is the vibration due to the longitudinal wave optical phonon. Τ LO is the longitudinal wave optical phonon relaxation time, Ω LO is the longitudinal wave optical phonon frequency, φ LO is the initial phase of the longitudinal wave optical phonon vibration, and C is the longitudinal wave optical phonon-plasmon coupled mode phonon. The amplitude of vibration by the like mode, τ L- is the phonon-like mode of the longitudinal wave optical phonon-plasmon coupled mode. Relaxation time, Ω L− is the frequency of the phonon-like mode in the longitudinal wave optical phonon-plasmon coupled mode, φ L− is the initial phase of the phonon-like mode oscillation in the longitudinal wave optical phonon-plasmon coupled mode, and e is the charge of the electron. , M * is the effective mass of electrons)
(上記式中、Ψ(x)はマザーウェーブレットと称される、波束を表す関数、xは入力信号で時間の関数、bはこの波束の時間遅延を表す変数、aはこの波束の時間軸に対する伸縮度、tは時間、f(t)は被変換関数である) Using pump-probe spectroscopy, we measure the real-time vibration structure of the plasmon-like longitudinal-wave optical phonon-plasmon coupling mode in the reflectance change or transmittance change for the solid that is the object of measurement where phonon and plasmon are combined. The measurement data is subjected to wavelet transform using the following equation ( 3 ) to obtain the relaxation time τ of the plasmon-like longitudinal wave optical phonon-plasmon coupling mode, and the value of the obtained relaxation time τ is expressed by the following equation: A solid carrier mobility measuring method, wherein the solid carrier mobility μ is obtained by substituting in (2).
(In the above equation, Ψ (x) is a function that represents a wave packet called a mother wavelet, x is a function of time in the input signal, b is a variable that represents a time delay of the wave packet, and a is a time axis of the wave packet. Degree of elasticity, t is time, f (t) is the transformed function)
(上記式中、Ψ(x)は窓関数、xは入力信号で時間の関数、bは時間遅延、ωは周波数、tは時間、f(t)は被変換関数である) Using pump-probe spectroscopy, we measure the real-time vibration structure of the plasmon-like longitudinal-wave optical phonon-plasmon coupling mode in the reflectance change or transmittance change for the solid that is the object of measurement where phonon and plasmon are combined. The measurement data is subjected to short-time Fourier transform using the following formula ( 5 ) to obtain the relaxation time τ of the longitudinal optical phonon-plasmon coupled mode, and the value of the obtained relaxation time τ is expressed by the following formula ( A solid carrier mobility measuring method, wherein the solid carrier mobility μ is obtained by substituting in 2).
(In the above formula, Ψ (x) is a window function, x is an input signal and a function of time, b is a time delay, ω is a frequency, t is time, and f (t) is a transformed function)
5. The solid carrier mobility measuring method according to claim 4, wherein a Gaussian function is used as a window function of the short-time Fourier transform, and the short-time Fourier transform is performed by the following formula (6).
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