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JP4871582B2 - Substrate processing equipment - Google Patents
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JP4871582B2 - Substrate processing equipment - Google Patents

Substrate processing equipment Download PDF

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Publication number
JP4871582B2
JP4871582B2 JP2005357672A JP2005357672A JP4871582B2 JP 4871582 B2 JP4871582 B2 JP 4871582B2 JP 2005357672 A JP2005357672 A JP 2005357672A JP 2005357672 A JP2005357672 A JP 2005357672A JP 4871582 B2 JP4871582 B2 JP 4871582B2
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Prior art keywords
chamber
substrate
drive
base member
drive shaft
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JP2007165452A5 (en
JP2007165452A (en
Inventor
治道 廣瀬
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to JP2005357672A priority Critical patent/JP4871582B2/en
Priority to TW095143192A priority patent/TWI405701B/en
Priority to KR1020060126177A priority patent/KR101372975B1/en
Priority to CN200610165985A priority patent/CN100582886C/en
Publication of JP2007165452A publication Critical patent/JP2007165452A/en
Publication of JP2007165452A5 publication Critical patent/JP2007165452A5/ja
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202Mechanical details, e.g. rollers or belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/067Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3216Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)

Description

この発明は基板を所定の角度で傾斜させて搬送しながら処理する基板の処理装置に関する。   The present invention relates to a substrate processing apparatus that processes a substrate while being inclined at a predetermined angle.

液晶表示装置に用いられるガラス製の基板には回路パターンが形成される。基板に回路パターンを形成するにはリソグラフィープロセスが採用される。リソグラフィープロセスは周知のように上記基板にレジストを塗布し、このレジストに回路パターンが形成されたマスクを介して光を照射する。   A circuit pattern is formed on a glass substrate used in the liquid crystal display device. A lithographic process is employed to form a circuit pattern on the substrate. In a lithography process, as is well known, a resist is applied to the substrate, and light is irradiated through a mask having a circuit pattern formed on the resist.

つぎに、レジストの光が照射されない部分或いは光が照射された部分を除去し、基板のレジストが除去された部分をエッチングする。そして、エッチング後にレジストを除去するという一連の工程を複数回繰り返すことで、上記基板に回路パターンを形成する。   Next, the portion of the resist not irradiated with light or the portion irradiated with light is removed, and the portion of the substrate where the resist is removed is etched. A circuit pattern is formed on the substrate by repeating a series of steps of removing the resist after etching a plurality of times.

このようなリソグラフィープロセスにおいては、上記基板に現像液、エッチング液或いはエッチング後にレジストを除去する剥離液などの処理液によって基板を処理する工程、さらにリンス液によって洗浄する工程、洗浄後に基板に付着残留したリンス液を除去する乾燥工程が必要となる。   In such a lithography process, the substrate is treated with a processing solution such as a developing solution, an etching solution or a stripping solution for removing the resist after etching, a step of washing with a rinsing solution, and a residue remaining on the substrate after washing. The drying process which removes the rinse solution which was done is needed.

従来、基板に対して上述した一連の処理を行う場合、上記基板は軸線を水平にして配置された搬送ローラによってほぼ水平な状態でそれぞれの処理を行なう処理チャンバに順次搬送し、各処理チャンバで基板を処理液によって処理したり、処理後に圧縮気体を噴射して乾燥処理するようにしている。   Conventionally, when the above-described series of processing is performed on a substrate, the substrate is sequentially transported to processing chambers in which the processing is performed in a substantially horizontal state by transport rollers arranged with the axis line horizontal, and in each processing chamber. The substrate is processed with a processing liquid, or after the processing, a compressed gas is injected to dry the substrate.

ところで、最近では液晶表示装置に用いられるガラス製の基板が大型化及び薄型化する傾向にある。そのため、基板を水平搬送すると、搬送ローラ間における基板の撓みが大きくなるため、各処理チャンバでの処理が基板の板面全体にわたって均一に行えなくなるということが生じる。   Recently, glass substrates used in liquid crystal display devices tend to be larger and thinner. For this reason, when the substrate is horizontally transported, the bending of the substrate between the transport rollers becomes large, so that processing in each processing chamber cannot be performed uniformly over the entire plate surface of the substrate.

さらに、基板が大型化すると、その基板を搬送する搬送ローラが設けられた搬送軸が長尺化する。しかも、基板が大型化することで、基板上に供給される処理液が増大し、基板上の処理液の量に応じて上記搬送軸に加わる荷重が大きくなるから、それらのことによって搬送軸の撓みが増大する。そのため、基板は搬送軸が撓むことによっても撓みが生じ、均一な処理が行えなくなるということがある。   Furthermore, when the substrate is enlarged, the transport shaft provided with the transport roller for transporting the substrate becomes longer. In addition, since the substrate is increased in size, the processing liquid supplied onto the substrate is increased, and the load applied to the transport shaft is increased according to the amount of the processing liquid on the substrate. Deflection increases. Therefore, the substrate may be bent even when the transport shaft is bent, and uniform processing may not be performed.

そこで、処理液によって基板を処理する際、上記基板が処理液の重量によって撓むのを防止するため、基板を所定の傾斜角度、たとえば75度の角度で傾斜させて搬送するということが考えられている。基板を傾斜させて搬送すれば、処理液は基板の板面に溜まらず、上方から下方へ円滑に流れるから、処理液の重量によって基板が撓むのを防止することができる。   In order to prevent the substrate from being bent by the weight of the processing liquid when processing the substrate with the processing liquid, it may be considered that the substrate is transported with a predetermined inclination angle, for example, an angle of 75 degrees. ing. If the substrate is conveyed while being inclined, the processing liquid does not accumulate on the plate surface of the substrate and flows smoothly from the upper side to the lower side, so that the substrate can be prevented from being bent by the weight of the processing liquid.

ところで、基板を所定の角度で傾斜させて搬送しながら処理する処理装置の場合、基板は傾斜方向の下側の面が支持ローラによって支持され、下端が駆動ローラによって支持される。駆動ローラは駆動軸に取付けられ、その駆動軸は駆動源によって回転駆動される。上記処理装置には、複数の上記支持ローラと上記駆動ローラが上記基板の搬送方向に沿って所定間隔で配置される。それによって、上記基板は上記支持ローラによって支持されながら、上記駆動ローラによって駆動されることになる。したがって、処理装置には、この処理装置に設けられる複数の駆動ローラの数に応じた駆動軸が設けられることになる。   By the way, in the case of a processing apparatus that processes a substrate while being inclined at a predetermined angle, the lower surface of the substrate is supported by a support roller and the lower end is supported by a drive roller. The drive roller is attached to a drive shaft, and the drive shaft is rotationally driven by a drive source. In the processing apparatus, a plurality of the supporting rollers and the driving roller are arranged at a predetermined interval along the transport direction of the substrate. As a result, the substrate is driven by the drive roller while being supported by the support roller. Therefore, the processing apparatus is provided with drive shafts corresponding to the number of the plurality of drive rollers provided in the processing apparatus.

従来、上述した構成の処理装置を組み立てる場合、複数の駆動軸を処理装置に1本ずつ組み込むということが行なわれていた。つまり、処理装置のチャンバには、この処理装置に設けられる駆動軸の数に応じた取付け部が形成されている。そして、各取付け部に軸受を設け、この軸受に上記駆動軸を回転可能に支持して取付けると同時に、それぞれの駆動軸が互いに平行かつ基板の傾斜角度に対応する角度に傾斜するよう位置決めするということが行なわれていた。   Conventionally, when assembling the processing apparatus having the above-described configuration, a plurality of drive shafts are incorporated into the processing apparatus one by one. That is, an attachment portion corresponding to the number of drive shafts provided in the processing apparatus is formed in the chamber of the processing apparatus. A bearing is provided at each mounting portion, and the drive shaft is rotatably supported and attached to the bearing, and at the same time, the respective drive shafts are positioned so as to be inclined at an angle parallel to each other and corresponding to the inclination angle of the substrate. Things were going on.

しかしながら、チャンバに対して複数の駆動軸を位置決めしながら取付けるという作業は非常に多くの手間が掛かるということがあるばかりか、駆動軸はチャンバの上下方向の下部に設けられるため、作業者は低い体勢で作業を行なわなければならないために作業性が悪く、作業者に掛かる負担が大きくなるということもある。   However, the work of positioning and mounting a plurality of drive shafts with respect to the chamber is not only very troublesome, but because the drive shaft is provided at the lower part in the vertical direction of the chamber, the number of workers is low. Since work must be performed in a posture, workability may be poor, and the burden on the worker may increase.

この発明は、チャンバに対して駆動軸の取付け作業を容易に、しかも精度よく組み付けることができるようにした基板の処理装置を提供することにある。   SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate processing apparatus capable of easily and accurately assembling a drive shaft with respect to a chamber.

この発明は、基板を所定の角度で傾斜させて搬送しながら処理する基板の処理装置において
チャンバと、
このチャンバに設けられ、前記所定の角度と同じ角度で傾斜し、かつ前記基板の搬送方向に沿って複数設けられた搬送軸であって、それぞれの軸方向には上記基板の傾斜方向の下側の面を支持する回転可能な複数の支持ローラを有する搬送軸と、
上記基板の搬送方向に沿って所定間隔で設けられ前記所定の角度で傾斜した上記基板の下端を支持する複数の駆動ローラと、
上記駆動ローラを回転駆動して上記支持ローラに支持された上記基板を所定方向に搬送する駆動機構を具備し、
上記駆動機構は、
前記基板の搬送方向に沿って長尺で上記チャンバの外面に形成された取付け面に取付けられるベース部材と
このベース部材に、このベース部材の長手方向に沿って前記搬送軸の配置間隔と同じ間隔で形成された複数の取付け孔と
この取付け孔にそれぞれ挿入され、前記ベース部材にねじで取付け固定される外部外筒体と、
各外部外筒体に回転可能に支持され上記チャンバ内に突出した先端に上記駆動ローラが着脱可能に設けられる複数の駆動軸と、
この駆動軸の上記チャンバの外部に位置する後端に設けられ駆動源からの動力を上記駆動軸に伝達してこの駆動軸を回転させる動力伝達部材とを具備し
前記チャンバの前記取付け面には、前記ベース部材に形成された前記取付け孔と対応する間隔で挿通孔が形成され、
前記ベース部材は、前記搬送軸が前記挿通孔を挿通する状態で前記チャンバの取付け面に取付け固定されてなり
上記ベース部材は、上記駆動軸が予め組み付けられた状態で上記チャンバの前記取付け面に取付けられることを特徴とする基板の処理装置にある。
The present invention, in the substrate processing apparatus for processing while conveying by inclining the substrate at a predetermined angle,
A chamber;
A plurality of transfer shafts provided in the chamber , inclined at the same angle as the predetermined angle, and provided along the transfer direction of the substrate, each of which is below the inclination direction of the substrate A transport shaft having a plurality of rotatable support rollers for supporting the surface of
A plurality of drive rollers for supporting the lower end of the substrate which is inclined at a predetermined angle is provided at predetermined intervals along the conveying direction of the substrate,
A drive mechanism for rotating the drive roller to convey the substrate supported by the support roller in a predetermined direction;
The drive mechanism is
A base member attached to an attachment surface formed on the outer surface of the chamber which is long along the transport direction of the substrate ;
A plurality of mounting holes formed in the base member at the same interval as the arrangement interval of the transport shaft along the longitudinal direction of the base member ,
External outer cylinders that are inserted into the mounting holes and fixed to the base member with screws ,
A plurality of drive shafts that are rotatably supported by the respective outer outer cylinders, and the drive rollers are detachably provided at the tips protruding into the chamber;
A power transmission member that is provided at a rear end of the drive shaft located outside the chamber and transmits power from a drive source to the drive shaft to rotate the drive shaft;
Insertion holes are formed in the mounting surface of the chamber at intervals corresponding to the mounting holes formed in the base member,
The base member is mounted and fixed to the mounting surface of the chamber in a state where the transport shaft is inserted through the insertion hole .
The base member may be mounted on the mounting surface of the chamber in a state where the drive shaft is assembled in advance.

上記駆動軸の上記チャンバ内に突出した先端部分はこのチャンバに上記外部外筒体と連通して支持された内部外筒体に挿通支持されていて、上記各外筒体にはこれら外筒体の内部を通して上記チャンバ内に流出する気体を供給する気体供給管が接続されていることが好ましい。 A tip portion of the drive shaft that protrudes into the chamber is inserted into and supported by an internal cylinder supported in communication with the external cylinder in the chamber, and the external cylinders are provided in the external cylinders. It is preferable that a gas supply pipe for supplying a gas flowing out into the chamber through the inside of the chamber is connected.

上記駆動ローラは、上記駆動軸の先端に着脱可能に取付けられる盤状体と、この盤状体の盤面に着脱可能に取付けられる取付けリングと、この取付けリングの外周面に着脱可能に設けられ上記基板の下端を受ける弾性リングとによって構成されていることが好ましい。   The drive roller is detachably attached to the tip of the drive shaft, a mounting ring that is detachably attached to the surface of the disk, and a detachably provided on the outer peripheral surface of the mounting ring. It is preferable that it is comprised by the elastic ring which receives the lower end of a board | substrate.

この発明によれば、駆動ローラを回転駆動する駆動機構を構成する複数の駆動軸をベース部材に取付け、このベース部材をチャンバに取付けるようにした。そのため、複数の駆動軸を所定の精度で予めベース部材に取付けておけば、このベース部材を介して複数の駆動軸を一度にチャンバに取付けることができるから、複数の駆動軸を1本ずつチャンバに取付けるという手間の掛かる作業をせずにすむ。   According to the present invention, the plurality of drive shafts constituting the drive mechanism for rotationally driving the drive roller are attached to the base member, and the base member is attached to the chamber. Therefore, if a plurality of drive shafts are attached to the base member in advance with a predetermined accuracy, a plurality of drive shafts can be attached to the chamber at once through the base member. This eliminates the time-consuming work of attaching to the camera.

以下、この発明の一実施の形態を図面を参照して説明する。
図1はこの発明の処理装置の概略的構成を示す斜視図であって、この処理装置は装置本体1を有する。この装置本体1は分割された複数の処理ユニット、この実施の形態では第1乃至第5の処理ユニット1A〜1Eを分解可能に一列に連結してなる。
An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a perspective view showing a schematic configuration of a processing apparatus according to the present invention. The processing apparatus has an apparatus body 1. The apparatus main body 1 is formed by connecting a plurality of divided processing units, in this embodiment, first to fifth processing units 1A to 1E in a row so as to be disassembled.

各処理ユニット1A〜1Eは架台2を有する。この架台2の前面には箱型状の処理部3が所定の角度で傾斜して保持されている。上記架台2と処理部3の上面には上部搬送部4が設けられている。上記架台2の下端の幅方向両端には板状の一対の脚体5(一方のみ図示)が分解可能に設けられる。この脚体5によって上記架台2の下面側に空間部6が形成される。   Each processing unit 1 </ b> A to 1 </ b> E has a gantry 2. A box-shaped processing unit 3 is held on the front surface of the gantry 2 at a predetermined angle. On the upper surface of the gantry 2 and the processing unit 3, an upper transport unit 4 is provided. A pair of plate-like legs 5 (only one is shown) are provided at both ends in the width direction of the lower end of the gantry 2 so as to be disassembled. The leg 5 forms a space 6 on the lower surface side of the gantry 2.

上記空間部6には、上記処理部3で後述するように行なわれる基板Wの処理に用いられる薬液やリンス液などの処理液を供給するタンクやポンプ或いは処理液の供給を制御するための制御装置などの機器7をフレーム8に載置した機器部9が収納されるようになっている。つまり、各処理ユニット1A〜1Eは架台2を脚体5で支持して処理部3の下方に空間部6を形成することで、上下方向に位置する処理部3、上部搬送部4及び機器部9の3つの部分に分割されている。   Control for controlling supply of a processing liquid such as a tank or a pump for supplying a processing liquid such as a chemical liquid or a rinsing liquid used for processing the substrate W performed in the processing section 3 as will be described later. A device unit 9 in which a device 7 such as a device is mounted on a frame 8 is accommodated. That is, the processing units 1A to 1E support the gantry 2 with the legs 5 and form the space 6 below the processing unit 3, so that the processing unit 3, the upper transport unit 4 and the equipment unit positioned in the vertical direction. It is divided into 9 parts.

上記構成の処理装置は、複数の処理ユニット1A〜1Eに分割可能であるばかりか、各処理ユニットは処理部3、上部搬送部4及び機器部9に分割可能である。そのため、処理装置が大型化した場合であっても、運搬時などには複数の処理ユニット1A〜1Eに分解するだけでなく、さらに各処理ユニット1A〜1Eを処理部3、上部搬送部4及び機器部9に分割して取り扱うことができる。   The processing apparatus having the above configuration can be divided into a plurality of processing units 1 </ b> A to 1 </ b> E, and each processing unit can be divided into a processing unit 3, an upper transport unit 4, and a device unit 9. Therefore, even when the processing apparatus is increased in size, it is not only disassembled into a plurality of processing units 1A to 1E during transportation, but each processing unit 1A to 1E is further divided into the processing unit 3, the upper transport unit 4 and The device unit 9 can be divided and handled.

つまり、処理装置の装置本体1は長さ寸法だけでなく、高さ寸法も小さくして取り扱えるから、トラックの荷台に積んだときに、制限高さをオーバすることなく、運搬することが可能である。   That is, the apparatus main body 1 of the processing apparatus can be handled not only in the length dimension but also in the height dimension, so that it can be transported without exceeding the limit height when loaded on the truck bed. is there.

上記処理部3は図1に示すように前面に蓋体11が開閉可能に設けられたチャンバ12を有する。このチャンバ12は上記架台2に所定の角度である、たとえば垂直線に対して75度の角度で傾斜して保持されていて、幅方向の両側面には75度の角度で傾斜して搬送される基板Wが通過するスリット13(図1に一箇所だけ図示)が形成されている。 As shown in FIG. 1, the processing unit 3 has a chamber 12 provided with a lid 11 on the front surface so as to be opened and closed. The chamber 12 is held at a predetermined angle, for example, at an angle of 75 degrees with respect to the vertical line on the gantry 2 and is conveyed at an angle of 75 degrees on both side surfaces in the width direction. The slit 13 ( only one place is shown in FIG. 1) through which the substrate W is passed is formed.

上記チャンバ12の内部には、図2に示すように傾斜搬送手段を構成する複数の搬送軸15(1つのみ図示)がチャンバ12の幅方向に所定間隔で設けられている。この搬送軸15には、複数の支持ローラ14が軸方向に所定間隔で回転可能に設けられている。Inside the chamber 12 , as shown in FIG. 2, a plurality of transfer shafts 15 (only one is shown) constituting the inclined transfer means are provided at predetermined intervals in the width direction of the chamber 12 . A plurality of support rollers 14 are provided on the transport shaft 15 so as to be rotatable at predetermined intervals in the axial direction.

上記搬送軸15は、軸線が上記スリット13と同じ角度で傾斜するよう、下端が下部ブラケット15aに支持され、上端が上部ブラケット15bに支持されている。各ブラケット15a,15bは一端が上記チャンバ12に固定され、他端に上記搬送軸15の下端部と上端部が支持されている。   The transport shaft 15 has a lower end supported by the lower bracket 15 a and an upper end supported by the upper bracket 15 b so that the axis is inclined at the same angle as the slit 13. One end of each bracket 15a, 15b is fixed to the chamber 12, and the lower end and upper end of the transport shaft 15 are supported at the other end.

上記チャンバ12内には上記スリット13から基板Wが図1に鎖線で示す第1の姿勢変換部16によって水平状態から75度の角度に変換されて搬入される。チャンバ12内に搬入された基板Wは上記搬送軸15に設けられた支持ローラ14によって非デバイス面である背面が支持される。この基板Wの下端は駆動ローラ17によって支持される。この駆動ローラ17は駆動機構18によって回転駆動さるようになっている。それによって、駆動ローラ17に下端が支持され背面が上記支持ローラ14に支持された上記基板Wは上記駆動ローラ17の回転方向に搬送される。   A substrate W is transferred from the slit 13 into the chamber 12 by being converted from a horizontal state to an angle of 75 degrees by a first posture changing unit 16 indicated by a chain line in FIG. The back surface, which is a non-device surface, is supported on the substrate W carried into the chamber 12 by the support roller 14 provided on the transport shaft 15. The lower end of the substrate W is supported by the driving roller 17. The drive roller 17 is rotationally driven by a drive mechanism 18. As a result, the substrate W having the lower end supported by the drive roller 17 and the back surface supported by the support roller 14 is conveyed in the rotational direction of the drive roller 17.

なお、各処理ユニット1A〜1Eの処理部3内には、図2に示すように基板Wを処理する、たとえば処理液を基板Wに噴射するシャワーユニットなどの処理手段20が設けられている。 In the processing units 3 of the processing units 1 </ b> A to 1 </ b> E, processing means 20 such as a shower unit for processing the substrate W as shown in FIG.

各処理ユニット1A〜1Eを順次通過して処理された基板Wは75度の傾斜した状態で搬出される。最終段の処理ユニット1Eから搬出された基板Wは、図1に鎖線で示す第2の姿勢変換部19で傾斜状態から水平状態に姿勢が変換されて次工程に受け渡される。   The substrate W processed by sequentially passing through each of the processing units 1A to 1E is carried out in an inclined state of 75 degrees. The substrate W carried out from the final stage processing unit 1E is changed in posture from the inclined state to the horizontal state by the second posture converting unit 19 shown by a chain line in FIG.

上記駆動機構18は、図3と図4に示すように上記基板Wの搬送方向に沿って長尺なベース部材21を有する。このベース部材21にはその長手方向に対して所定間隔、つまり上記搬送軸15と同じ間隔で複数の第1の取付け孔22が穿設されている。この実施の形態では1つの処理部3に10本の搬送軸15が設けられているとすると、その処理部3のチャンバ12には2つのベース部材21が一列に並んで設けられ、各ベース部材21にはそれぞれ5つの第1の取付け孔22が形成されている。   As shown in FIGS. 3 and 4, the drive mechanism 18 includes a base member 21 that is long along the transport direction of the substrate W. A plurality of first mounting holes 22 are formed in the base member 21 at a predetermined interval in the longitudinal direction, that is, at the same interval as the conveying shaft 15. In this embodiment, if ten processing shafts 15 are provided in one processing unit 3, two base members 21 are provided in a line in the chamber 12 of the processing unit 3, and each base member Five first attachment holes 22 are formed in each 21.

図3に示すように、上記第1の取付け孔22には軸方向両端部内に一対の軸受23が設けられた外部外筒体24の先端部が挿入されている。この外部外筒体24の先端部には鍔25が設けられている。この鍔25は上記ベース部材21に形成された図示しない第2の取付け孔にねじ26によって取付け固定されている。   As shown in FIG. 3, the first mounting hole 22 is inserted with a distal end portion of an outer outer cylindrical body 24 in which a pair of bearings 23 are provided in both axial end portions. A flange 25 is provided at the distal end of the external outer cylinder 24. The collar 25 is fixedly attached to a second mounting hole (not shown) formed in the base member 21 by a screw 26.

上記外部外筒体24には駆動軸27が挿通されている。駆動軸27は上記一対の軸受23によって後端部側が回転可能に支持されている。この駆動軸27の上記外部外筒体24から突出した後端部には動力伝達部材としての第1の歯車28が嵌着固定されている。   A drive shaft 27 is inserted through the external outer cylinder 24. The drive shaft 27 is rotatably supported by the pair of bearings 23 on the rear end side. A first gear 28 as a power transmission member is fitted and fixed to the rear end portion of the drive shaft 27 protruding from the outer outer cylinder 24.

上記ベース部材21には図4に示すように第3の取付け孔29が形成されていて、その第3の取付け孔29を介して上記チャンバ12の下端部外面の取付け面12aに図示しないねじによって取付け固定される。   As shown in FIG. 4, the base member 21 has a third mounting hole 29, and a screw (not shown) is attached to the mounting surface 12 a on the outer surface of the lower end of the chamber 12 through the third mounting hole 29. Installation fixed.

上記取付け面12aには上記ベース部材21に形成された第1の取付け孔22と対応する間隔で挿通孔31が形成されている。各挿通孔31には上記取付け面12aにベース部材21を取付ける前に内部外筒体32が挿通支持されている。この内部外筒体32は後端に上記挿通孔31よりも大径な鍔33が設けられている。この鍔33の一側面には上記取付け面12aとの間に介在するOリングからなるパッキング34が設けられ、他側面には径方向に沿う通気溝35が形成されている。   Insertion holes 31 are formed in the attachment surface 12 a at intervals corresponding to the first attachment holes 22 formed in the base member 21. An inner and outer cylindrical body 32 is inserted and supported in each insertion hole 31 before the base member 21 is attached to the mounting surface 12a. The inner outer cylinder 32 is provided with a flange 33 having a diameter larger than that of the insertion hole 31 at the rear end. A packing 34 made of an O-ring interposed between the flange 33 and the mounting surface 12a is provided on one side surface, and a ventilation groove 35 is formed along the radial direction on the other side surface.

そして、上記ベース部材21は、上記内部外筒体32が各挿通孔31に挿入支持された状態で、上記駆動軸27の先端部を上記内部外筒体32に挿入しながら、上記取付け面12aに取付け固定される。それによって、上記内部外筒体32はその鍔33の他側面が外部外筒体24の先端面に押圧されて軸方向に移動不能に保持される。   The base member 21 is attached to the mounting surface 12a while the distal end portion of the drive shaft 27 is inserted into the inner outer cylinder 32 in a state where the inner outer cylinder 32 is inserted and supported in the insertion holes 31. Fixed to the mounting. Accordingly, the other side surface of the flange 33 of the inner outer cylindrical body 32 is pressed against the front end surface of the outer outer cylindrical body 24 so as to be immovable in the axial direction.

さらに、駆動軸27の上記内部外筒体32に挿入支持される先端部側には、上記内部外筒体32の内径寸法よりもわずかに小径な複数の大径部36が形成されている。それによって、上記内部外筒体32は上記大径部36によって径方向にがたつくことなく保持される。   Further, a plurality of large-diameter portions 36 that are slightly smaller in diameter than the inner-diameter dimension of the inner-outer cylinder 32 are formed on the distal end side of the drive shaft 27 that is inserted and supported by the inner-outer cylinder 32. Thereby, the inner and outer cylindrical bodies 32 are held by the large diameter portion 36 without shaking in the radial direction.

上記駆動軸27のチャンバ12内に突出した先端部にはブッシュ37を介して上記駆動ローラ17が装着されている。この駆動ローラ17は図3と図5に示すように盤状体42を有する。この盤状体42には反割りのボス部41が設けられているとともに、径方向周辺部に周方向に沿って長い4つの通孔43が90度間隔で形成されている。通孔43の長手方向中途部には大径部43aが形成されている。   The driving roller 17 is mounted on the tip of the driving shaft 27 protruding into the chamber 12 via a bush 37. The drive roller 17 has a disk-like body 42 as shown in FIGS. The plate-like body 42 is provided with a boss portion 41 that is split, and four long through holes 43 are formed at intervals of 90 degrees in the circumferential direction in the radial direction. A large diameter portion 43 a is formed in the midway portion of the through hole 43 in the longitudinal direction.

そして、上記盤状体42は、上記ボス部41を上記駆動軸27の先端部に装着し、その反割りのボス部41に半円形状の固定部材44をねじ44aで固定することで、上記駆動軸27に着脱可能に取付け固定されている。   And the said board-shaped body 42 attaches the said boss | hub part 41 to the front-end | tip part of the said drive shaft 27, and fixes the semicircular fixing member 44 to the opposite boss | hub part 41 with the screw 44a, The above-mentioned The drive shaft 27 is detachably mounted and fixed.

上記盤状体42の盤面には取付けリング45が上記通孔43の大径部43aから挿通されたねじ46によって着脱可能に取付け固定されている。上記取付けリング45の外周面には超高分子量ポリエチレンやEPDM(ゴム材の一種)などの弾性材料によって形成された弾性リング47が着脱可能に装着されている。そして、上記弾性リング47によって図3に示すように基板Wの下端が支持されるようになっている。   An attachment ring 45 is detachably attached and fixed to the surface of the plate-like body 42 by a screw 46 inserted from the large diameter portion 43 a of the through hole 43. An elastic ring 47 formed of an elastic material such as ultra high molecular weight polyethylene or EPDM (a kind of rubber material) is detachably mounted on the outer peripheral surface of the mounting ring 45. The elastic ring 47 supports the lower end of the substrate W as shown in FIG.

なお、ねじ46の頭部の外形寸法は、上記通孔43の大径部43aより小さく、大径部43a以外の部分より大きくなっている。したがって、取付けリング45に取付けられたねじ46は上記通孔43の大径部43aだけから挿脱することができる。   The external dimensions of the head portion of the screw 46 are smaller than the large diameter portion 43a of the through hole 43 and larger than the portion other than the large diameter portion 43a. Accordingly, the screw 46 attached to the attachment ring 45 can be inserted / removed only from the large diameter portion 43 a of the through hole 43.

図3と図4に示すように、上記駆動軸27の上記外部外筒体24から突出した後端に嵌着された第1の歯車28には第2の歯車51が噛合している。複数の第1の歯車28に噛合した複数の第2の歯車51は取付け軸52に所定間隔で取付けられている。この取付け軸52は回転可能に支持されていて、中途部には従動プーリ53が嵌着されている。   As shown in FIGS. 3 and 4, the second gear 51 is engaged with the first gear 28 fitted to the rear end of the drive shaft 27 protruding from the outer outer cylinder 24. The plurality of second gears 51 meshed with the plurality of first gears 28 are attached to the attachment shaft 52 at predetermined intervals. The mounting shaft 52 is rotatably supported, and a driven pulley 53 is fitted in the middle portion.

上記従動プーリ53と駆動源54の出力軸55に設けられた駆動プーリ56とにはベルト57が張設されている。それによって、上記駆動源54が作動して上記出力軸55が回転すれば、その回転が上記取付け軸52を介して上記駆動軸27に伝達されるから、この駆動軸27の先端に設けられた駆動ローラ17が回転する。駆動ローラ17が回転すれば、この駆動ローラ17の弾性リング47によって下端が支持された基板Wが上記駆動ローラ17の回転方向に搬送されることになる。   A belt 57 is stretched between the driven pulley 53 and a drive pulley 56 provided on the output shaft 55 of the drive source 54. Accordingly, when the drive source 54 is operated and the output shaft 55 is rotated, the rotation is transmitted to the drive shaft 27 via the mounting shaft 52, so that the drive shaft 27 is provided at the tip of the drive shaft 27. The drive roller 17 rotates. When the driving roller 17 rotates, the substrate W whose lower end is supported by the elastic ring 47 of the driving roller 17 is conveyed in the rotation direction of the driving roller 17.

図3に示すように、上記ベース部材21には第1の取付け孔22と対応する部位の下端面に、この第1の取付け孔22に連通する給気孔58が穿設されている。この給気孔58には上記第1の取付け孔22内に清浄な空気や窒素などの気体を供給する気体供給管59が接続されている。   As shown in FIG. 3, an air supply hole 58 communicating with the first mounting hole 22 is formed in the base member 21 at a lower end surface of a portion corresponding to the first mounting hole 22. A gas supply pipe 59 is connected to the air supply hole 58 to supply a gas such as clean air or nitrogen into the first mounting hole 22.

上記気体供給管59から第1の取付け孔22内に供給された気体は、図3に矢印で示すように内部外筒体32の鍔33に形成された通気溝35から内部外筒体32の内部と外部外筒体24の内部とに流入する。   The gas supplied from the gas supply pipe 59 into the first mounting hole 22 passes through the ventilation groove 35 formed in the flange 33 of the inner outer cylinder 32 as shown by the arrow in FIG. It flows into the inside and the inside of the outer outer cylinder 24.

内部外筒体32に流入した気体はその先端開口から流出する。それによって、チャンバ12内の処理液を含む雰囲気が内部外筒体32を通じてチャンバ12の外部に流出するのを防止するようになっている。外部外筒体24に流入した気体はその後端開口から流出する。それによって、駆動軸27を支持した一対の軸受23から塵埃が生じても、その塵埃が内部外筒体2を通ってチャンバ12内に流入するのを阻止するようになっている。   The gas that has flowed into the inner outer cylinder 32 flows out of the opening at the tip. Thereby, the atmosphere containing the processing liquid in the chamber 12 is prevented from flowing out of the chamber 12 through the inner outer cylinder 32. The gas flowing into the external outer cylinder 24 flows out from the rear end opening. Thus, even if dust is generated from the pair of bearings 23 that support the drive shaft 27, the dust is prevented from flowing into the chamber 12 through the inner outer cylinder 2.

このような構成の処理装置において、チャンバ12に駆動機構18を組み付ける場合には、まず、ベース部材21に複数の外部外筒体24を取付け固定する。ついで、各外部外筒体24には後端に第1の歯車28が嵌着された駆動軸27を挿入し、その後端部側を上記外部外筒体24内に設けられた一対の軸受23によって回転可能に支持する。   In the processing apparatus having such a configuration, when the drive mechanism 18 is assembled to the chamber 12, first, the plurality of external outer cylinders 24 are attached and fixed to the base member 21. Next, a drive shaft 27 having a first gear 28 fitted to the rear end is inserted into each outer outer cylinder 24, and a pair of bearings 23 provided in the outer outer cylinder 24 on the rear end side. It is supported in a rotatable manner.

外部外筒体24に駆動軸27を挿通支持したならば、チャンバ12の下端部外面の取付け面12aに形成された挿通孔31に内部外筒体32を挿通支持する。ついで、駆動軸27が保持された上記ベース部材21を上記取付け面12aに取付け固定する。このとき、駆動軸27の後端に設けられた第1の歯車28を、取付け軸52に設けられた第2の歯車51に噛合させる。   If the drive shaft 27 is inserted and supported in the outer outer cylinder 24, the inner outer cylinder 32 is inserted and supported in the insertion hole 31 formed in the mounting surface 12 a on the outer surface of the lower end portion of the chamber 12. Next, the base member 21 holding the drive shaft 27 is attached and fixed to the attachment surface 12a. At this time, the first gear 28 provided at the rear end of the drive shaft 27 is engaged with the second gear 51 provided on the mounting shaft 52.

上記ベース部材21を上記取付け面12aに取付け固定するとき、上記内部外筒体32内に駆動軸27を挿入するとともに、上記挿通孔31に挿通支持された上記内部外筒体32の鍔33をベース部材21に形成された第1の取付け孔22内に嵌め込む。それによって、駆動軸27は先端部が上記内部外筒体32の先端面から突出し、内部外筒体32は後端の鍔33が外部外筒体24の先端面によって押圧保持される。   When the base member 21 is attached and fixed to the mounting surface 12a, the drive shaft 27 is inserted into the inner outer cylinder 32 and the flange 33 of the inner outer cylinder 32 inserted and supported in the insertion hole 31 is inserted. The base member 21 is fitted into the first mounting hole 22. As a result, the front end portion of the drive shaft 27 protrudes from the front end surface of the inner outer cylinder body 32, and the inner outer cylinder body 32 is pressed and held by the front end surface of the outer outer cylinder body 24 with the collar 33 at the rear end.

ベース部材21をチャンバ12の取付け面12aに取付け固定したならば、駆動軸27の内部外筒体32から突出した先端部に駆動ローラ17を取付け固定する。また、ベース部材21の給気孔58に気体供給管59を接続する。それによって、チャンバ12に駆動機構18を組み付けることができる。   If the base member 21 is attached and fixed to the attachment surface 12 a of the chamber 12, the drive roller 17 is attached and fixed to the tip portion of the drive shaft 27 that protrudes from the internal outer cylinder 32. Further, the gas supply pipe 59 is connected to the air supply hole 58 of the base member 21. Thereby, the drive mechanism 18 can be assembled to the chamber 12.

上記ベース部材21には複数の駆動軸27を予め組み付けておき、このベース部材21をチャンバ12の取付け面12aに取付け固定することで、上記複数の駆動軸27をチャンバ12に一度に組み付けることができる。   A plurality of drive shafts 27 are assembled to the base member 21 in advance, and the base member 21 is attached and fixed to the attachment surface 12a of the chamber 12 so that the plurality of drive shafts 27 can be assembled to the chamber 12 at a time. it can.

そのため、複数の駆動軸27を1本ずつチャンバ12に組み付ける場合に比べ、駆動軸27の組み付け作業を容易かつ迅速に行なうことが可能となる。しかも、ベース部材21に複数の駆動軸27を取付けるため、互いの駆動軸27の軸線の平行度や取付け角度を精度よく確実に設定することが比較的容易に行なえる。そのため、複数の駆動軸27をチャンバ12に対して精度よく組み付けることができる。   Therefore, as compared with the case where a plurality of drive shafts 27 are assembled to the chamber 12 one by one, the assembly operation of the drive shaft 27 can be performed easily and quickly. In addition, since the plurality of drive shafts 27 are attached to the base member 21, it is relatively easy to accurately and reliably set the parallelism and the attachment angle of the axes of the drive shafts 27 to each other. Therefore, the plurality of drive shafts 27 can be assembled to the chamber 12 with high accuracy.

駆動ローラ17は盤状体42、この盤状体42に着脱可能に取付けられた取付けリング45、この取付けリング45に着脱可能に取付けられた弾性材料によって作られた弾性リング47から構成されている。 Drive roller 17 is composed of a disk-shaped body 42, a mounting ring 45 which is detachably attached to the disk-shaped body 42, the elastic ring 47 made of an elastic material which is detachably attached to the mounting ring 45 .

チャンバ12内を搬送される基板Wの下端は上記弾性リング47によって支持される。そのため、上記弾性リング47によって基板Wの下端が破損するのを防止することができる反面、長期の使用によって上記弾性リング47が磨耗することが避けられない。   The lower end of the substrate W transported in the chamber 12 is supported by the elastic ring 47. For this reason, it is possible to prevent the lower end of the substrate W from being damaged by the elastic ring 47, but it is inevitable that the elastic ring 47 is worn by long-term use.

弾性リング47が磨耗したならば、弾性リング47が設けられた取付けリング45を盤状体42に固定したねじ46を緩め、取付けリング45を周方向に回転させてねじ46を通孔43の大径部43aに位置させる。そして、ねじ46を大径部43aに通すことで、取付けリング45をねじ46とともに盤状体42から取外すことができる。   If the elastic ring 47 is worn out, the screw 46 that fixes the mounting ring 45 provided with the elastic ring 47 to the disk-like body 42 is loosened, and the mounting ring 45 is rotated in the circumferential direction to increase the size of the through hole 43 of the screw 46. It is located in the diameter part 43a. And the attachment ring 45 can be removed from the disk-shaped body 42 with the screw 46 by letting the screw 46 pass through the large diameter part 43a.

取付けリング45を盤状体42から取外せば、取付けリング45に保持された上記弾性リング47を容易に交換することができる。すなわち、駆動ローラ17を盤状体42、取付けリング45及びこの取付けリング45に取付けられる弾性リング47に分割したことで、この弾性リング47が使用によって磨耗したならば、容易に交換することが可能となる。   If the attachment ring 45 is removed from the plate-like body 42, the elastic ring 47 held by the attachment ring 45 can be easily replaced. That is, the drive roller 17 is divided into the plate-like body 42, the attachment ring 45, and the elastic ring 47 attached to the attachment ring 45, so that if the elastic ring 47 is worn out by use, it can be easily replaced. It becomes.

しかも、取付けリング45からねじ46を外すことなく、この取付けリング45を盤状体42から取外すことができるから、その取外し作業を容易に行なうことができるばかりか、取付け作業も容易に行なうことができる。   Moreover, since the attachment ring 45 can be removed from the plate-like body 42 without removing the screw 46 from the attachment ring 45, the removal operation can be easily performed, and the attachment operation can be easily performed. it can.

上記通孔43は周方向に長く形成され、中途部にねじ46が挿脱可能な大径部43aが形成されている。そのため、盤状体42に取付けリング45を固定する際、ねじ46を通孔43の駆動ローラ17の回転方向と反対側の端部に位置させておけば、使用中にねじ46が緩むことがあっても、取付けリング45が盤状体42の回転方向と逆方向に回転してねじ46が通孔43の大径部43aに対応する位置にくることがない。したがって、ねじ46が取付けリング46から外れない限りは、その取付けリング45が盤状体42から外れることもない。   The through-hole 43 is formed long in the circumferential direction, and a large-diameter portion 43a into which the screw 46 can be inserted and removed is formed in the middle portion. Therefore, when the mounting ring 45 is fixed to the disk-shaped body 42, if the screw 46 is positioned at the end of the through hole 43 opposite to the rotation direction of the driving roller 17, the screw 46 may be loosened during use. Even if it exists, the attachment ring 45 rotates in the direction opposite to the rotation direction of the disk-shaped body 42, and the screw 46 does not come to a position corresponding to the large diameter portion 43 a of the through hole 43. Therefore, as long as the screw 46 is not detached from the attachment ring 46, the attachment ring 45 is not detached from the plate-like body 42.

駆動軸27は、チャンバ12の外部に位置する外部外筒体24と、チャンバ12の内部に位置する内部外筒体32とに挿通支持されている。そして、外部外筒体24の先端と内部外筒体32の後端との接続部分からこれら外筒体24,32内に気体を供給し、その気体を内部外筒体32の先端開口と、外部外筒体24の後端開口から流出させるようにしている。   The drive shaft 27 is inserted into and supported by an outer outer cylinder 24 positioned outside the chamber 12 and an inner outer cylinder 32 positioned inside the chamber 12. And gas is supplied into these outer cylinders 24 and 32 from the connection part of the front-end | tip of the outer outer cylinder 24, and the rear end of the inner outer cylinder 32, and the gas is made into the front-end | tip opening of the inner outer cylinder 32, and The external outer cylinder 24 is caused to flow out from the rear end opening.

そのため、チャンバ12内のミスト状の処理液を含む雰囲気が内部外筒体32内に流入してチャンバ12の外部に流出するのを防止することができるばかりか、外部外筒体24に設けられた軸受23から塵埃が生じても、その塵埃が内部外筒体32を通ってチャンバ12内に流入するのを防止することができる。   Therefore, it is possible not only to prevent the atmosphere containing the mist-like processing liquid in the chamber 12 from flowing into the inner outer cylinder 32 and out of the chamber 12 but also being provided in the outer outer cylinder 24. Even if dust is generated from the bearing 23, it can be prevented that the dust flows into the chamber 12 through the inner outer cylinder 32.

上記一実施の形態では外筒体を外部外筒体と内部外筒体とに分割し、これらの外筒体内に駆動軸を挿通支持するようにしたが、外筒体は2つに分割せず、外部外筒体と内部外筒体とが一体となった構造であってもよい。   In the above embodiment, the outer cylinder is divided into an outer outer cylinder and an inner outer cylinder, and the drive shaft is inserted and supported in these outer cylinders. However, the outer cylinder is divided into two parts. Alternatively, a structure in which the outer outer cylinder and the inner outer cylinder are integrated may be employed.

この発明の一実施の形態の処理装置の概略的構成を示す斜視図。The perspective view which shows schematic structure of the processing apparatus of one embodiment of this invention. 上記処理装置のチャンバの断面図。Sectional drawing of the chamber of the said processing apparatus. チャンバの下端部に設けられた駆動機構を示す拡大図。The enlarged view which shows the drive mechanism provided in the lower end part of the chamber. ベース部材に駆動軸を組み付けた斜視図。The perspective view which assembled | attached the drive shaft to the base member. 駆動ローラの分解斜視図。The exploded perspective view of a drive roller.

符号の説明Explanation of symbols

12…チャンバ、14…支持ローラ、17…駆動ローラ(傾斜搬送手段)、18…駆動機構、21…ベース部材、27…駆動軸、28…第1の歯車(動力伝達部材)、54…駆動源。   DESCRIPTION OF SYMBOLS 12 ... Chamber, 14 ... Support roller, 17 ... Drive roller (tilt conveyance means), 18 ... Drive mechanism, 21 ... Base member, 27 ... Drive shaft, 28 ... First gear (power transmission member), 54 ... Drive source .

Claims (3)

基板を所定の角度で傾斜させて搬送しながら処理する基板の処理装置において
チャンバと、
このチャンバに設けられ、前記所定の角度と同じ角度で傾斜し、かつ前記基板の搬送方向に沿って複数設けられた搬送軸であって、それぞれの軸方向には上記基板の傾斜方向の下側の面を支持する回転可能な複数の支持ローラを有する搬送軸と、
上記基板の搬送方向に沿って所定間隔で設けられ前記所定の角度で傾斜した上記基板の下端を支持する複数の駆動ローラと、
上記駆動ローラを回転駆動して上記支持ローラに支持された上記基板を所定方向に搬送する駆動機構を具備し、
上記駆動機構は、
前記基板の搬送方向に沿って長尺で上記チャンバの外面に形成された取付け面に取付けられるベース部材と
このベース部材に、このベース部材の長手方向に沿って前記搬送軸の配置間隔と同じ間隔で形成された複数の取付け孔と
この取付け孔にそれぞれ挿入され、前記ベース部材にねじで取付け固定される外部外筒体と、
各外部外筒体に回転可能に支持され上記チャンバ内に突出した先端に上記駆動ローラが着脱可能に設けられる複数の駆動軸と、
この駆動軸の上記チャンバの外部に位置する後端に設けられ駆動源からの動力を上記駆動軸に伝達してこの駆動軸を回転させる動力伝達部材とを具備し
前記チャンバの前記取付け面には、前記ベース部材に形成された前記取付け孔と対応する間隔で挿通孔が形成され、
前記ベース部材は、前記搬送軸が前記挿通孔を挿通する状態で前記チャンバの取付け面に取付け固定されてなり
上記ベース部材は、上記駆動軸が予め組み付けられた状態で上記チャンバの前記取付け面に取付けられることを特徴とする基板の処理装置。
In the substrate processing apparatus for processing while conveying by inclining the substrate at a predetermined angle,
A chamber;
A plurality of transfer shafts provided in the chamber , inclined at the same angle as the predetermined angle, and provided along the transfer direction of the substrate, each of which is below the inclination direction of the substrate A transport shaft having a plurality of rotatable support rollers for supporting the surface of
A plurality of drive rollers for supporting the lower end of the substrate which is inclined at a predetermined angle is provided at predetermined intervals along the conveying direction of the substrate,
A drive mechanism for rotating the drive roller to convey the substrate supported by the support roller in a predetermined direction;
The drive mechanism is
A base member attached to an attachment surface formed on the outer surface of the chamber which is long along the transport direction of the substrate ;
A plurality of mounting holes formed in the base member at the same interval as the arrangement interval of the transport shaft along the longitudinal direction of the base member ,
External outer cylinders that are inserted into the mounting holes and fixed to the base member with screws ,
A plurality of drive shafts that are rotatably supported by the respective outer outer cylinders, and the drive rollers are detachably provided at the tips protruding into the chamber;
A power transmission member that is provided at a rear end of the drive shaft located outside the chamber and transmits power from a drive source to the drive shaft to rotate the drive shaft;
Insertion holes are formed in the mounting surface of the chamber at intervals corresponding to the mounting holes formed in the base member,
The base member is mounted and fixed to the mounting surface of the chamber in a state where the transport shaft is inserted through the insertion hole .
The substrate processing apparatus , wherein the base member is attached to the attachment surface of the chamber in a state where the drive shaft is assembled in advance.
上記駆動軸の上記チャンバ内に突出した先端部分はこのチャンバに上記外部外筒体と連通して支持された内部外筒体に挿通支持されていて、上記各外筒体にはこれら外筒体の内部を通して上記チャンバ内に流出する気体を供給する気体供給管が接続されていることを特徴とする請求項1記載の基板の処理装置。  A tip portion of the drive shaft that protrudes into the chamber is inserted into and supported by an internal cylinder supported in communication with the external cylinder in the chamber, and the external cylinders are provided in the external cylinders. 2. The substrate processing apparatus according to claim 1, wherein a gas supply pipe for supplying a gas flowing out into the chamber through the inside of the chamber is connected. 上記駆動ローラは、上記駆動軸の先端に着脱可能に取付けられる盤状体と、この盤状体の盤面に着脱可能に取付けられる取付けリングと、この取付けリングの外周面に着脱可能に設けられ上記基板の下端を受ける弾性リングとによって構成されていることを特徴とする請求項1記載の基板の処理装置。  The drive roller is detachably attached to the tip of the drive shaft, a mounting ring that is detachably attached to the surface of the disk, and a detachably provided on the outer peripheral surface of the mounting ring. The substrate processing apparatus according to claim 1, comprising: an elastic ring that receives a lower end of the substrate.
JP2005357672A 2005-12-12 2005-12-12 Substrate processing equipment Expired - Fee Related JP4871582B2 (en)

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KR1020060126177A KR101372975B1 (en) 2005-12-12 2006-12-12 Apparatus for treating substrates
CN200610165985A CN100582886C (en) 2005-12-12 2006-12-12 Substrate processing equipment

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