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JP4874475B2 - Abrasion resistant member for electronic equipment, method for producing the same, and bearing for electronic equipment using the same - Google Patents
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JP4874475B2 - Abrasion resistant member for electronic equipment, method for producing the same, and bearing for electronic equipment using the same - Google Patents

Abrasion resistant member for electronic equipment, method for producing the same, and bearing for electronic equipment using the same Download PDF

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JP4874475B2
JP4874475B2 JP2001257764A JP2001257764A JP4874475B2 JP 4874475 B2 JP4874475 B2 JP 4874475B2 JP 2001257764 A JP2001257764 A JP 2001257764A JP 2001257764 A JP2001257764 A JP 2001257764A JP 4874475 B2 JP4874475 B2 JP 4874475B2
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silicon nitride
wear
resistant member
electronic equipment
sintered body
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JP2003063872A (en
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悦幸 福田
通泰 小松
実 高尾
幸宏 武浪
公哉 宮下
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Toshiba Corp
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Toshiba Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、各種の電子機器に用いられる耐摩耗性部材とその製造方法、およびそれを用いた電子機器用ベアリングに関する。
【0002】
【従来の技術】
近年、ハードディスクドライブ(HDD)やフロッピーディスクドライブ(FDD)などの磁気記録装置、CD−ROMやDVDなどの光ディスク装置、各種ゲーム装置などの発達には目覚しいものがある。これらの電子機器においては、通常、スピンドルモータなどの回転駆動装置により回転軸を高速回転させ、この回転軸に装着された各種ディスクを機能させている。また、LCDプロジェクタ、OHPなどの投影装置やパソコンなどには、装置内部の熱を取り除くための冷却用ファンが内蔵されており、このような場合にもファンモータのような回転駆動装置が用いられている。
【0003】
従来、上述したような電子機器用回転駆動装置の回転軸を支える軸受部材、特にベアリングボールには、軸受鋼などの金属材料が主として用いられてきた。しかし、軸受鋼などの金属材料は耐摩耗性が不十分であることから、例えば電子機器のように4000rpm以上の高速回転が要求される分野においては、寿命のバラツキが増大することで信頼性のある回転駆動が提供できないというような問題が生じている。
【0004】
このような不具合を解消するために、近年ではベアリングボールに窒化珪素焼結体などのセラミックス材料が用いられるようになってきている(例えば特開2000-314426号公報参照)。窒化珪素焼結体はセラミックス材料の中でも摺動特性に優れ、良好な耐摩耗性を有するものである。従って、高速回転を行う場合においても、機械的に信頼性のある回転駆動を提供することが可能となる。
【0005】
【発明が解決しようとする課題】
しかしながら、窒化珪素製ベアリングボールは金属製ベアリングボールに比べて高価であり、その利用範囲(適用装置)が限定されるというような難点を有している。特に、HDDなどの電子機器においては高速回転化が進められており、金属製ベアリングボールでは剛性不足や耐久性不足に起因する騒音の上昇などが問題となっている。このようなことから、金属製ボールに比べて高剛性の窒化珪素製ベアリングボールの製造コストを低減することで、各種の電子機器への窒化珪素製ベアリングボールの適用を可能にすることが強く求められている。
【0006】
ここで、窒化珪素製ベアリングボールのコスト低減策の一つとして、例えば酸素やFeなどの不純物を比較的多く含む安価な窒化珪素粉末を原料として用いることが考えられる。しかし、不純物量が多い窒化珪素原料などを用いて焼結体を作製すると、酸素やFeなどの不純物に起因して焼結助剤成分が偏析しやすくなってしまう。特に、ベアリングボールのように高密度の焼結体が求められる用途では一般にHIP処理が適用されるため、HIP処理の際に焼結助剤成分の偏析部が成長し、この成長した焼結助剤成分の偏析部に基づいてベアリングボールなどとしての剛性や耐久性が低下してしまうという問題が生じる。
【0007】
さらに、窒化珪素製ベアリングボールは電気的に絶縁物であるため、高速回転を行った際に発生する静電気を、金属材料からなる回転軸やボール受け部などに上手く逃がすことができないといった問題が発生してしまう。ベアリングや周辺部品が必要以上に帯電してしまうと、例えばHDDのように磁気的信号を用いる記録装置では記録媒体に悪影響を与えることになる。その結果として、HDD内の記録内容が失われてしまったり、さらにはHDDなどの電子機器そのものが破壊されてしまうといった現象が起きることが懸念されている。このようなことから、一部の電子機器の回転駆動部においては、必要以上に静電気が蓄積することを防止した窒化珪素製ベアリングボールが求められている。
【0008】
電気抵抗値が10-5Ω・m程度の導電性窒化珪素焼結体は従来から知られており(特公平2-43699号公報など参照)、タービンエンジンのブレードやノズルを放電加工で作製する際の材料などとして利用されている。このような導電性窒化珪素焼結体においては、低電気抵抗を実現するために金属炭化物や金属窒化物などの導電性付与材を多量に添加しており、摺動特性などを低下させる原因になっている。上記公報は導電性窒化珪素焼結体を摺動部材に適用することを何等想定しておらず、放電加工などを利用するために導電性を付与しているにすぎないものである。
【0009】
金属炭化物や金属窒化物などの導電性化合物を含む窒化珪素焼結体に関しては、特公平7-29855号公報、特許第2566580号公報、特開平6-227870号公報などにも記載されている。しかしながら、これらの公報に記載されている技術では、安価で優れた摺動特性と適度な導電性を満足させた窒化珪素焼結体(複合焼結体)は必ずしも得られていない。
【0010】
また、金属炭化物や金属窒化物などの導電性付与材は窒化珪素の焼結を阻害する要因となるため、通常の窒化珪素焼結体に比べて焼結助剤を多目に添加する必要が生じる。このように、焼結助剤を比較的多量に添加すると、焼結助剤成分の偏析が助長され、例えば窒化珪素製ベアリングボールの剛性や耐久性などがより低下しやすくなってしまう。
【0011】
本発明はこのような課題に対処するためになされたもので、ベアリングボールなどに適用した際に安定した高速回転を実現可能にすると共に、製造コストの低減を図った電子機器用耐摩耗性部材、さらに必要以上に静電気が蓄積することを防止した電子機器用耐摩耗性部材を提供することを目的としている。また、そのような電子機器用耐摩耗性部材を用いることによって、冷却装置付きの投影装置やパソコン、また磁気記録装置、光ディスク装置、ゲーム装置などの電子機器の高信頼性化や高性能化などを実現可能とする電子機器用ベアリングを提供することを目的としている。
【0012】
【課題を解決するための手段】
本発明者等は上述した目的を達成するために、電子機器用の窒化珪素焼結体について種々の検討並びに実験を繰り返した結果、電子機器用ベアリングなどの耐摩耗性部材に窒化珪素焼結体を適用する場合には、例えば不純物濃度が比較的高い原料粉末(窒化珪素粉末など)を用いて作製した窒化珪素焼結体、すなわち焼結助剤成分がある程度の大きさおよび量で偏析した窒化珪素焼結体であっても使用可能であることを見出した。
【0013】
これは、電子機器用のベアリングなどでは稼動時に印加される荷重が比較的小さく、耐荷重特性よりも主として高速摺動特性などが求められるためである。このような用途では不純物濃度が比較的高い窒化珪素粉末、すなわち安価な窒化珪素粉末を原料として用い、焼結助剤成分がある程度の大きさおよび量で偏析した窒化珪素焼結体であっても十分に使用することができ、その上で原料コストの削減に基づいて窒化珪素焼結体、ひいてはそれを用いた電子機器用耐摩耗性部材の製造コストを低減することが可能となる。
【0014】
さらに、前述したように不純物濃度が比較的高い窒化珪素粉末を用いて窒化珪素焼結体を作製する際にHIP処理を適用すると、焼結助剤成分の偏析部が成長しやすく、これによりベアリングボールなどの耐摩耗性部材としての剛性や耐久性が低下しやすいが、本発明ではHIP処理条件を制御することによって、そのような窒化珪素焼結体における焼結助剤成分の偏析部の成長を抑制している。これによって、電子機器用耐摩耗性部材に求められる特性を再現性よく満足させた窒化珪素焼結体を得ることが可能となる。
【0015】
本発明はこのような知見に基づいてなされたものである。すなわち、本発明の電子機器用耐摩耗性部材は、窒化珪素100質量部に対して焼結助剤成分を5〜20質量部の範囲で含み、かつ不純物としてFe成分を30〜600ppmの範囲で含有する窒化珪素焼結体を具備し、回転速度が8000rpm以下の回転駆動部に用いられる、直径3mm以下のベアリングボールである電子機器用耐摩耗性部材であって、前記窒化珪素焼結体は前記焼結助剤成分の偏析部を有し、かつ前記偏析部は最大径が10〜150μmの範囲であると共に、前記窒化珪素焼結体中の単位面積1000×1000μm当りに2個以上10個以下の範囲で存在することを特徴としている。
【0017】
本発明の電子機器用耐摩耗性部材においては、窒化珪素焼結体に導電性付与粒子を含有させ、電気抵抗値を1〜106Ω・mの範囲とした窒化珪素焼結体を用いることもできる。このような窒化珪素焼結体を用いる場合において、導電性付与粒子としては例えば4A族元素、5A族元素、6A族元素、7A族元素、珪素、硼素の炭化物および窒化物から選ばれる少なくとも1種が用いられる。
【0018】
本発明の電子機器用耐摩耗性部材は、上記したように直径3mm以下のベアリングボールとして好適に用いられるものである。このような本発明の電子機器用耐摩耗性部材は、例えば冷却装置付きの投影装置やパソコン、またHDDやFDDのような磁気記録装置、CD−ROMやDVDのような光ディスク装置、各種ゲーム装置などの回転駆動部に好適に用いられるものである。
【0019】
発明の電子機器用耐摩耗性部材の製造方法は、上記した本発明の電子機器用耐摩耗性部材を製造する方法であって、不純物として酸素を1〜1.8質量%およびFe成分を30〜700ppmの範囲で含む窒化珪素粉末と、前記窒化珪素粉末100質量部に対して5〜20質量部の焼結助剤粉末とを混合し、この混合物を所望の形状に成形する工程と、前記成形工程により得た成形体を1700〜1850℃の範囲の温度で焼結する一次焼結工程と、前記一次焼結工程により得た一次焼結体を、前記一次焼結工程の焼結温度より200℃以上低い温度でHIP処理する二次焼結工程とを具備し、回転速度が8000rpm以下の回転駆動部に用いられる、直径3mm以下のベアリングボールを製造することを特徴としている。
【0020】
本発明の電子機器用ベアリングは、上記した本発明の電子機器用耐摩耗性部材からなるベアリングボールを具備することを特徴としている。このような電子機器用ベアリングは、上述した冷却装置付きの投影装置やパソコンのファンモータ、あるいは磁気記録装置、光ディスク装置、ゲーム装置などに用いられるスピンドルモータに好適に利用されるものである。
【0021】
【発明の実施の形態】
以下、本発明を実施するための形態について説明する。
本発明の電子機器用耐摩耗性部材は、例えば希土類元素の酸化物やアルカリ土類元素の酸化物などを焼結助剤成分として含み、かつこのような焼結助剤成分の一部が最大径150μm以下の偏析部を形成して存在している窒化珪素焼結体からなるものである。
【0022】
本発明の電子機器用耐摩耗性部材において、窒化珪素焼結体の原料粉末には例えば不純物として酸素を1〜1.8質量%およびFe成分を30〜700ppmの範囲で含む窒化珪素粉末を用いることができる。ここで、Fe成分とはFe元素単体、窒化鉄や酸化鉄のようなFe化合物など、全ての鉄(Fe)を含む成分を示すものとする。このような不純物を比較的多量に含む窒化珪素粉末は、高純度の窒化珪素粉末に比べて安価であるため、ベアリングボールなどの電子機器用耐摩耗性部材(摺動部材)の製造コストの低減に寄与する。焼結助剤粉末や導電性付与材粉末についても同様である。
【0023】
酸素含有量やFe成分の含有量が少ない窒化珪素粉末では、原料コストの削減に基づく窒化珪素焼結体の製造コストの低減効果を十分に得ることができない。ただし、窒化珪素粉末中の酸素量やFe成分量があまり多すぎると、得られる窒化珪素焼結体に研磨(表面加工)を施した際に脱粒が発生しやすく、これにより表面欠陥が発生して圧砕強度などが大きく劣化し、電子機器用であっても耐摩耗性部材としての特性、例えば摺動特性を維持することができなくなる。このようなことから、原料としての窒化珪素粉末中の酸素量は1〜1.8質量%の範囲であることが、またFe成分量は30〜700ppmの範囲であることが好ましい。
【0024】
本発明の電子機器用耐摩耗性部材においては、上述したような窒化珪素原料に基づいて、例えば不純物としてのFe成分を30〜600ppmの範囲で含む窒化珪素焼結体を適用することが好ましい。窒化珪素焼結体中のFe成分量は100〜400ppmの範囲であることがより好ましい。このような窒化珪素焼結体を適用することによって、上述したように電子機器用耐摩耗性部材の製造コストを低減することが可能となる。また、適度な量のFe成分を含有する窒化珪素焼結体は加工性が高く、加工に要するコストを削減することができる。この点からもFe成分を適度に含有する窒化珪素焼結体は、電子機器用耐摩耗性部材の製造コストの低減に寄与するものである。なお、本発明におけるFe成分は窒化珪素原料中に不純物として含まれるものが主となるが、焼結体の製造工程中に混入するFe成分、さらには必要に応じて積極的に添加されたFe成分なども含むものとする。
【0025】
なお、本発明における窒化珪素焼結体のFe成分の含有量は以下のようにして求めた値を指すものとする。まず、窒化珪素焼結体を微細に粉砕して粉状にした後、フッ酸などを加えて加圧容器中で180℃程度に加熱して溶液化する。次いで、硫酸でフッ酸などを洗い落とした後、この溶液に対してICP発光分析を行ってFe成分の含有量を求める。このように、窒化珪素焼結体中のFeの全量をFe成分の含有量とする。
【0026】
焼結助剤としては、一般的な窒化珪素焼結体と同様に、各種の金属化合物を適用することが可能であるが、特に希土類元素(イットリウムを含むランタノイド元素)の酸化物およびアルカリ土類元素の酸化物から選ばれる少なくとも1種を使用することが好ましい。これらの酸化物は窒化珪素焼結体の高密度化に有効に作用する。希土類元素の酸化物としては、イットリウム(Y)、イッテルビウム(Yb)、エルビウム(Er)などの酸化物を使用することが好ましい。これらは粒界相の構成成分となるものである。また、アルカリ土類元素の酸化物としては、マグネシウムやカルシウムの酸化物を用いることが好ましい。なお、焼結助剤としての化合物には、焼結時に酸化物となる希土類元素およびアルカリ土類元素の化合物(炭酸塩など)を用いてもよい。
【0027】
また、上述した希土類元素やアルカリ土類元素の酸化物に加えて、窒化アルミニウムや酸化アルミニウムなどのアルミニウム化合物、さらにチタン、ジルコニウム、ハフニウムなどの酸化物や窒化物を、焼結助剤の一部として用いることも有効である。アルミニウム化合物は窒化珪素結晶粒間の結合力の強化に寄与する。これらの化合物は酸化物や窒化物として添加してもよいし、焼結時に酸化物や窒化物となる化合物を添加してもよい。
【0028】
上述したような焼結助剤は窒化珪素100質量部に対して5〜20質量部の範囲で含有させることが好ましい。焼結助剤量が5質量部未満であると、窒化珪素焼結体を十分に緻密化できないおそれがある。一方、焼結助剤量が20質量部を超えると、粒界相や焼結助剤成分の偏析部の形成量が必要以上に増加し、これにより窒化珪素焼結体の耐摩耗性や強度の低下などを招くおそれがある。上述した焼結助剤のうち、希土類酸化物の含有量は5〜15質量部の範囲とすることが好ましく、またアルカリ土類酸化物の含有量は0.5〜5質量部の範囲とすることが好ましい。さらに、これらに加えて窒化アルミニウムや酸化アルミニウムなどのアルミニウム化合物を1〜7質量部の範囲で含有させることが好ましい。
【0029】
本発明の電子機器用耐摩耗性部材においては、後に詳述するように窒化珪素焼結体中に導電性付与粒子、例えば4A族元素、5A族元素、6A族元素、7A族元素、珪素、硼素の炭化物および窒化物から選ばれる少なくとも1種からなる導電性付与粒子を含有させることができる。このような場合には、導電性付与粒子を窒化珪素焼結体中に15〜40体積%の範囲(導電性付与粒子を含有させた後の窒化珪素焼結体の体積を100体積%として換算)で含有させた窒化珪素焼結体を用いることが好ましい。
【0030】
上述した導電性付与粒子の含有量は窒化珪素焼結体の電気抵抗値が1〜106Ω・mの範囲となるように適宜に調整される。具体的には、導電性付与粒子は15体積%以上40体積%以下の範囲で含有させることが好ましい。導電性付与粒子の含有量が15体積%未満であると、窒化珪素焼結体の電気抵抗値を十分に低下させることができないおそれがある。一方、金属炭化物や金属窒化物の含有量が40体積%を超えると、窒化珪素焼結体の電気抵抗値自体は下がるものの、窒化珪素焼結体本来の特性が低下するおそれがある。
【0031】
本発明の電子機器用耐摩耗性部材を構成する窒化珪素焼結体は、上述したような焼結助剤成分の偏析部を有するものであり、さらに焼結助剤成分の偏析部の最大径を150μm以下に制御したものである。このような焼結助剤成分の偏析部を有する窒化珪素焼結体を使用することが可能な理由は、電子機器用ベアリングなどに使用されるベアリングボールなどの耐摩耗性部材(電子機器用耐摩耗性部材)は稼動時に印加される荷重が比較的小さく、耐荷重特性よりも主として高速摺動特性などが求められるためである。
【0032】
すなわち、上述したような不純物を比較的多量に含む窒化珪素粉末を用いて作製した窒化珪素焼結体においては、酸素やFe成分などの不純物に起因して焼結助剤成分が偏析しやすくなる。特に、導電性付与粒子として金属炭化物などを用いた場合には、導電性付与粒子が窒化珪素の焼結性を阻害する要因として働くため、焼結助剤を通常より多目に添加する。このため、焼結助剤成分はより一層偏析しやすくなる。このような焼結助剤成分の偏析部は窒化珪素焼結体のベアリング特性(繰返し疲労など)や耐荷重特性(圧砕強度など)を低下させる要因になるものの、電子機器用耐摩耗性部材に印加される荷重は例えばガスタービン、自動車部品、工作機械などに用いられる耐摩耗性部材に比べて小さいことから、繰返し疲労特性などが比較的低い窒化珪素焼結体であっても十分に使用することができる。
【0033】
ただし、焼結助剤成分の偏析部の最大径があまり大きすぎると、それを起点とする破壊が生じやすくなるため、本発明の電子機器用耐摩耗性部材に適用する窒化珪素焼結体においては焼結助剤成分の偏析部の大きさを最大径で150μm以下と規定している。焼結助剤成分の偏析部の最大径は100μm以下であることがより好ましい。なお、本発明において、焼結助剤成分の偏析部とは10μm以上の最大径を有する焼結助剤成分の集合体(凝集体)を指すものとする。
【0034】
窒化珪素焼結体の高密度化にはHIP処理が有効であるものの、不純物濃度が比較的高い窒化珪素粉末を用いて窒化珪素焼結体を作製する際にHIP処理を適用すると、HIP処理時に焼結助剤成分の偏析部が成長し、電子機器用であっても耐摩耗性部材の特性低下が避けられない。そこで、本発明においてはHIP処理条件を制御することによって、そのような窒化珪素焼結体における焼結助剤成分の偏析部の成長を抑制している。具体的には、焼結助剤成分の偏析部の最大径を150μm以下としており、これにより電子機器用ベアリングボールなどに求められる摺動特性などを再現性よく満足させることが可能となる。
【0035】
上述したように、本発明の電子機器用耐摩耗性部材を構成する窒化珪素焼結体は、最大径10〜150μmの範囲の焼結助剤成分の偏析部を有するものである。このような焼結助剤成分の偏析部は窒化珪素焼結体中の単位面積1000×1000μm当りに2個以上存在することが好ましい。焼結助剤成分の偏析部の個数が少なすぎると、焼結助剤成分がより大きな偏析部を形成しやすくなるため、偏析部の最大径を150μm以下とする上で、焼結助剤成分の偏析部を単位面積当りに複数個存在させることが好ましい。ただし、焼結助剤成分の偏析部の数があまり多すぎると、窒化珪素焼結体の機械的強度が低下しやすくなるため、偏析部の数は1000×1000μmの単位面積当りに10個以下とすることが好ましい
【0036】
ここで、上述した焼結助剤成分の偏析部の最大径および単位面積(1000×1000μm)当りの個数は、以下のようにして求めるものとする。すなわち、窒化珪素焼結体の断面において、任意の測定箇所(面積:1000×1000μm)を金属顕微鏡(例えば倍率50〜100倍)で観察し、この単位面積(1000×1000μm)相当の観察視野(もしくは拡大写真)中に存在する焼結助剤成分の偏析部の数、すなわち最大径(この場合の最大径とは各偏析部の最大直径を示すものである)が10〜150μmの偏析部の数を測定する。さらに、これら偏析部の最大直径のうち、最も大きい偏析部の最大直径を最大径とする。
【0037】
このように、最大径が150μm以下の焼結助剤成分の偏析部を有する窒化珪素焼結体であれば、電子機器用耐摩耗性部材に十分に適用することができる。そして、このような窒化珪素焼結体からなる耐摩耗性部材を例えばベアリングボールとして使用することによって、例えば高速回転化により騒音の上昇などが問題となっている各種の電子機器の回転駆動部に、高剛性の窒化珪素製ベアリングボールを適用することが可能となる。
【0038】
ところで、窒化珪素自体は本質的に絶縁性材料であり、一般的に窒化珪素焼結体の電気抵抗値は109Ω・m以上である。このような窒化珪素焼結体からなるベアリングボールを電子機器の回転駆動部に用いた場合、高速回転を行った際に発生する静電気が必要以上に蓄積し、例えばHDDのように磁気的信号を用いる装置では記録媒体に悪影響を与えることになる。そこで、本発明の窒化珪素焼結体に導電性付与粒子を含有させ、例えば1〜106Ω・mの範囲の電気抵抗値を付与した窒化珪素焼結体として用いることもできる。
【0039】
窒化珪素焼結体が106Ω・m以下の電気抵抗値を有することによって、例えばHDDのような電子機器に用いた際に、高速回転により生じる静電気を回転軸やボール受け部などの金属材料からなる軸受部材に良好に逃がすことが可能となる。従って、静電気の帯電に伴う不具合を解消することができる。一方、窒化珪素焼結体の電気抵抗値が1Ω・m未満であっても、静電気の放散に関してそれ以上の効果が得られないだけでなく、そのような電気抵抗値を得るためには多量の導電性付与粒子を添加する必要が生じるため、窒化珪素焼結体の破壊靭性値や耐摩耗性などの機械的特性を損なうことになる。窒化珪素焼結体の電気抵抗値は10〜105Ω・mの範囲であることがより好ましい。なお、窒化珪素焼結体の電気抵抗値は基本的には体積固有抵抗値を指すものとする。
【0040】
本発明の電子機器用耐摩耗性部材において、上記した電気抵抗値を得るために窒化珪素焼結体中に含有させる導電性付与粒子は10-5Ω・m以下の電気抵抗値を有することが好ましい。導電性付与粒子の電気抵抗値が10-5Ω・mを超えると、窒化珪素焼結体に所定の電気抵抗値を付与するための配合量が増大するため、窒化珪素焼結体の機械的特性などが低下するおそれがある。
【0041】
このような導電性付与粒子には、窒化珪素焼結体の電気抵抗値を制御することが可能な炭化物、窒化物、硼化物、金属などの種々の材料を使用することができる。それらのうちでも、4A族元素、5A族元素、6A族元素、7A族元素、珪素、硼素の炭化物および窒化物から選ばれる少なくとも1種であることが好ましい。炭化物や窒化物は化学的に安定であり、耐熱性にも優れることから、ベアリングボールなどを摺動させた際に発生する熱による影響を受けにくい。これら導電性付与粒子の存在はEPMAやX線回折などにより分析可能である。
【0042】
導電性付与粒子としては、特にタンタル(Ta)、チタン(Ti)、ニオブ(Nb)、タングステン(W)、珪素(Si)、および硼素(B)から選ばれる少なくとも1種の炭化物もしくは窒化物を用いることが好ましい。本発明の耐摩耗性部材をベアリングボールなどとして使用した場合、窒化珪素焼結体の表面に存在する導電性付与粒子も当然ながら窒化珪素焼結体と共に摺動されることになる。従って、導電性付与粒子に対してもある程度の摺動特性が要求されることから、上述したような摺動特性に優れる炭化物や窒化物を用いることが好ましい。摺動特性の向上に関しては、特に炭化珪素が有効である。また、窒化珪素焼結体の焼結性の低下を抑制するためには、焼結後に窒化チタンとなる酸化チタンを添加することが好ましい。
【0043】
上述した炭化物や窒化物などからなる導電性付与粒子は、平均粒子径が2μm以下の粒子形状を有することが好ましい。さらに、導電性付与粒子は最大径が4μm以下であることが好ましく、より好ましくは2μm以下である。このような炭化物粒子や窒化物粒子を用いることによって、窒化珪素焼結体中に導電性付与粒子を適度に分散させることができる。これに対して、導電性付与材としてウイスカーや繊維を用いると、これらがベアリングボールなどの表面にトゲ状の凸部として存在するおそれが生じる。表面にトゲ状の凸部が存在すると、表面加工時に脱粒の起点となりやすく、また摺動時に相手部材への攻撃性が高まると共に、破壊の起点となるおそれがある。なお、導電性付与粒子の最大径とは粒子個々のサイズであり、窒化珪素焼結体の表面や断面の拡大写真、EPMAのカラーマップを見たとき、導電性付与粒子の最も長い対角線を示すものとする。
【0044】
本発明の電子機器用耐摩耗性部材は、具体的には各種電子機器の回転駆動部において、例えばベアリングの転動体として用いられるものである。特に、本発明の耐摩耗性部材は、電子機器用のベアリングボールに好適である。ベアリングボールの形状は通常真球が一般的であるが、本発明を適用した転動体の形状は必ずしも真球状のボールに限られるものではなく、円柱状や棒状であってもよい。本発明は玉軸受、ころ軸受などの種々のベアリングに適用可能である。なお、本発明の電子機器用耐摩耗性部材はベアリングの転動体などに限らず、例えば半導体製造装置における位置決め治具や搬送治具などの半導体用治工具全般に使用することもできる。特に、導電性付与粒子を配合して電気抵抗値を1〜106Ω・mに制御した窒化珪素焼結体を用いたものは、半導体用治工具全般に使用した際に静電気の帯電を防止できるので好ましい。
【0045】
本発明の電子機器用耐摩耗性部材の製造方法は、特に限定されるものではないが、例えば以下に示すような方法により製造することが好ましい。
まず、窒化珪素粉末、焼結助剤粉末、および必要に応じて導電性付与材粉末をそれぞれ所定量秤量し、これらを均一に混合する。各原料粉末には摺動特性を考慮してウイスカーや繊維ではなく、粒子状粉末を用いることが好ましい。各原料粉末の大きさは特に限定されるものではないが、窒化珪素粉末は平均粒径が0.2〜3μmの範囲が好ましく、焼結助剤粉末は平均粒径が2μm以下であることが好ましい。導電性付与材粉末の平均粒径は2μm以下であることが好ましい。
【0046】
窒化珪素粉末としては、前述したように不純物として酸素を1〜1.8質量%およびFe成分を30〜700ppmの範囲で含む原料粉末を使用することができる。このような不純物を比較的多量に含む窒化珪素粉末は、高純度の窒化珪素粉末に比べて安価であるため、ベアリングボールなどの電子機器用耐摩耗性部材(摺動部材)の製造コストの低減に寄与する。焼結助剤粉末や導電性付与材粉末についても同様である。
【0047】
上述したような原料混合粉末は、必要に応じて造粒した後、所望の形状(例えばボール形状)に成形される。成形方法に関しては、通常の成形方法を適用することができる。例えば、ベアリングボールを作製する場合には、冷間静水圧プレス(CIP)を適用して成形体を作製することが好ましい。このような成形体をまず常圧焼結や雰囲気加圧焼結などにより一次焼結する。一次焼結工程時の焼結温度は1700〜1850℃の範囲とすることが好ましい。一次焼結温度が1700℃未満であると、その後にHIP処理を施しても十分に緻密質な窒化珪素焼結体を得ることができない。また、一次焼結温度を1850℃を超えて設定してもそれ以上の効果が得られないだけでなく、窒化珪素結晶粒や焼結助剤成分の偏析部が粗大粒化して焼結体の機械的強度が低下してしまう。さらに、焼成炉などの消耗も激しくなる。
【0048】
次に、上記一次焼結工程により得た一次焼結体に対してHIP(熱間静水圧プレス)処理(二次焼結工程)を施し、窒化珪素焼結体の高密度化を図る。ただし、一次焼結体中に存在する焼結助剤成分の偏析部はHIP処理により成長しやすいため、HIP処理温度(二次焼結温度)は一次焼結工程の焼結温度より200℃以上低い温度に設定する。すなわち、一次焼結温度をT1(℃)、HIP処理温度(二次焼結温度)をT2(℃)とした場合、T2はT1−200(℃)以下の温度(T2≦T1−200(℃))に設定する。このように、HIP処理温度を一次焼結温度に比べて低目に設定することによって、焼結助剤成分の偏析部の成長を抑制することができる。
【0049】
HIP処理温度(二次焼結温度)T2は、具体的には1300〜1500℃の範囲で設定することが好ましい。HIP処理温度T2が1300℃未満であると、窒化珪素焼結体(二次焼結体)を十分に高密度化できないおそれがある。さらに、HIP処理時の印加圧力は50MPa以下とすることが好ましい。HIP時の圧力が50MPaを超えると、HIP処理温度の場合と同様に、焼結助剤成分の偏析部が成長しやすくなる。HIP処理の効果を有効に得る上で、HIP時の圧力は20〜50MPaの範囲とすることがより好ましい。
【0050】
上述したような条件下で一次焼結工程および二次焼結工程を実施することによって、目的とする窒化珪素焼結体が得られる。さらに、ベアリングボールとして使用する場合には、JIS規格により定めされた表面粗さを得るための表面研磨を行う。この際、不純物を比較的多量に含む窒化珪素焼結体は加工性がよいことから、ボール形状などへの加工に要するコストを削減することができる。
【0051】
本発明の電子機器用耐摩耗性部材は、ベアリングボールなどとして各種の電子機器の回転駆動部に好適に用いられるものである。本発明は特に直径が3mm以下の小さいベアリングボールに対して有効である。上述した焼結助剤成分の偏析部は窒化珪素焼結体の大きさに比例(焼結体サイズが大きくなると相対的に焼結助剤量が増えるために大きな偏析部が形成される確率が高くなる)し、大きな偏析部が存在すると焼結体の圧砕強度などを低下させる要因となるため、本発明の電子機器用耐摩耗性部材は偏析部が影響しにくいと共に、偏析部の最大径を150μm以下に制御しやすい小型のベアリングボール、すなわち直径が3mm以下のベアリングボールとして使用することが好ましい。本発明を適用したベアリングボールの直径は2mm以下であることが望ましい。
【0052】
上述したようなベアリングボールなどの耐摩耗性部材が適用される電子機器としては、例えば冷却装置付きの投影装置やパソコン、またHDDやFDDなどの磁気記録装置、CD−ROMやDVDなどの光ディスク装置、ディスク型の各種ゲーム装置などが挙げられる。光ディスク装置は、光磁気記録装置、相変化型光記録装置、再生専用型光ディスク装置などの種々の装置を含むものである。さらに、これら以外にも回転駆動部を有する電子機器であれば、本発明は種々の電子機器に対して適用可能である。
【0053】
例えば、冷却装置付きの投影装置(LCDプロジェクタやOHPなど)やパソコンなどにおいては、冷却用ファンモータの回転駆動部に本発明の電子機器用耐摩耗性部材がベアリングボールなどとして用いられる。冷却用ファンモータは電圧にもよるが、例えば数100〜3000rpm程度の回転速度で駆動される。このような電子機器の回転駆動部には、絶縁性(電気抵抗値=109Ω・m以上)の窒化珪素焼結体からなるベアリングボールなどを用いることができる。窒化珪素焼結体からなるベアリングボールは高剛性であるため、騒音の抑制や耐久性の向上を図ることができる。
【0054】
また、磁気記録装置、光ディスク装置、ディスク型ゲーム装置などにおいては、媒体駆動用スピンドルモータの回転駆動部に本発明の電子機器用耐摩耗性部材がベアリングボールなどとして用いられる。これらの電子機器において、スピンドルモータは例えば4000rpm以上の回転速度で駆動される。このような電子機器の回転駆動部には、導電性(電気抵抗値=1〜106Ω・m)の窒化珪素焼結体からなるベアリングボールなどが好適に適用される。適度な導電性を有する窒化珪素焼結体からなるベアリングボールは、安定した高速回転を実現した上で、高速回転により生じる静電気を良好に逃がすことができる。これによって、電子機器の静電気による不具合を解消することが可能となる。
【0055】
本発明のベアリングは、上述したような本発明の電子機器用耐摩耗性部材からなる転動体、例えばベアリングボールを有するものである。図1は本発明のベアリングの一実施形態の構成を示す図である。図1に示すベアリング1は、本発明の電子機器用耐摩耗性部材からなる複数のベアリングボール2と、これらベアリングボール2を支持する内輪3および外輪4とを有している。内輪3や外輪4はJIS-G-4805で規定されるSUJ2などの軸受鋼で形成することが好ましく、これにより信頼性のある高速回転を実現することができる。なお、基本構成は通常のベアリングと同様である。
【0056】
このようなベアリング1は、上述したように冷却装置付きの投影装置やパソコンのような電子機器において、冷却用ファンモータの回転駆動部に用いられるものである。また、HDDやFDDなどの磁気記録装置、CD−ROMやDVDなどの光ディスク装置、ディスク型ゲーム装置などの電子機器においては、各種ディスクの回転駆動部に用いられる。具体的には、ディスク状記録媒体を高速回転させるスピンドルモータの回転駆動に使用される。
【0057】
【実施例】
次に、本発明の具体的な実施例とその評価結果について述べる。
【0058】
実施例1〜17、比較例1〜6
まず、不純物として酸素を1〜1.8質量%およびFe成分を30〜700ppmの範囲で含む窒化珪素粉末(平均粒径:0.7μm)を複数用意し、これら窒化珪素粉末100質量部に対して、焼結助剤として酸化イットリウム粉末や酸化アルミニウム粉末など、さらには導電性付与粒子として炭化珪素粉末や窒化チタン粉末などを、表1に示す原料組成に基づいて添加して混合した。
【0059】
次に、上記した各原料混合粉末をCIP成形法により成形し、さらに脱脂した後、まず不活性雰囲気中にて1700〜1850℃の温度で常圧焼結(一次焼結)し、続いてHIP焼結(二次焼結)を行った。一次焼結および二次焼結(HIP)の条件はそれぞれ表1に示す通りである。このようにして窒化珪素焼結体からなる直径2mmのベアリングボールをそれぞれ作製した。各ベアリングボールの表面はJIS規格で認定されたグレード3に相当する表面粗さとなるように研磨した。
【0060】
また、本発明との比較のために、不純物含有量を十分に低減した高純度の窒化珪素粉末(酸素量=0.6質量%以下,Fe成分量=10ppm以下)を用いた窒化珪素焼結体(比較例1)、焼結助剤量を過剰に設定した窒化珪素焼結体(比較例2)、焼結助剤量を過少に設定した窒化珪素焼結体(比較例3)、HIP条件を本発明の範囲外とした窒化珪素焼結体(比較例4)、導電性付与粒子量を過剰に設定した窒化珪素焼結体(比較例5)、およびHIP条件を本発明の範囲外とした窒化珪素焼結体(比較例6)を、それらの条件以外は実施例と同様に設定して作製し、直径2mmのベアリングボールをそれぞれ得た。
【0061】
【表1】

Figure 0004874475
【0062】
上述した実施例1〜17および比較例1〜6による各ベアリングボールについて、電気抵抗値、焼結助剤成分の偏析部の最大径、単位面積1000×1000μm当りに存在する焼結助剤成分の偏析部の数、Fe成分の含有量(ICP発光分析法)を、それぞれ前述した方法にしたがって測定した。これらの測定結果を表2に示す。なお、焼結助剤成分の偏析部の測定は単位面積を任意に3箇所選び、それらの測定値の平均値で示した。
【0063】
【表2】
Figure 0004874475
【0064】
次に、実施例1〜17および比較例1〜6による各ベアリングボールをそれぞれ10個一組としてベアリングを作製した。ボール受け部などの他のベアリング部材には軸受鋼SUJ2材を使用した。これらのベアリングをそれぞれスピンドルモータに組込み、HDD用モータとして使用した。これらのスピンドルモータを回転速度7200rpmおよび10000rpmでそれぞれ1000時間稼動させ、ベアリングの摺動音の変化率、ベアリングボールの耐久性、HDDの静電気による不具合の有無をそれぞれ調査した。これらの評価結果を表3に示す。
【0065】
なお、ベアリングの摺動音の変化率は、10時間稼動後の摺動音N10と1000時間稼動後の摺動音N1000を測定し、[(N1000−N10)/N10]×100(%)に基づいて求めた。ベアリングボールの耐久性は1000時間稼動後のベアリングボール表面を調べ、表面にクラックや剥がれなどが生じていないものを「良好」、表面にクラックや剥がれなどが生じていたものを「不良」とした。
【0066】
【表3】
Figure 0004874475
【0067】
表2および表3から明らかなように、実施例1〜17の各ベアリングボールは、いずれも回転速度が8000rpm以下のHDD用スピンドルモータであれば実用性を満足するものであることが分かる。また、適量の導電性付与粒子を含有する窒化珪素焼結体からなるベアリングボール(実施例4〜17)は1〜106Ω・mの範囲の電気抵抗値を有しており、HDD用スピンドルモータに求められる耐久性を有するだけでなく、静電気による不具合を解消できることが分かる。なお、実施例1〜3と同様にして作製したベアリングをそれぞれファンモータに組込み、パソコン用ファンモータ(回転速度1500rpm)として使用したところ、いずれも良好な摺動特性(耐久性)を有していることが確認された。
【0068】
実施例18、参考例1
実施例1と同様の組成および製造方法によって、直径3mmのベアリングボール(実施例18)と直径3mmのベアリングボール(参考例1)を、それぞれ100個ずつ作製し、これら各ベアリングボールにおける焼結助剤成分の偏析部の最大径を実施例1と同様にして測定した。その結果、実施例18では100個全ての偏析部の最大径が150μm以下であったのに対して、参考例1では100個中23個は偏析部の最大径が150μmを超えていることが確認された。この結果からベアリングボールの直径が3mmを超えると、焼結助剤成分の偏析部の制御が難しくなることが分かる。
【0069】
実施例19、参考例2
実施例14と同様の組成および製造方法によって、直径3mmのベアリングボール(実施例19)と直径3mmのベアリングボール(参考例2)を、それぞれ100個ずつ作製し、これら各ベアリングボールにおける焼結助剤成分の偏析部の最大径を実施例14と同様にして測定した。その結果、実施例19では100個全ての偏析部の最大径が150μm以下であったのに対して、参考例2では100個中8個は偏析部の最大径が150μmを超えていることが確認された。この結果からベアリングボールの直径が3mmを超えると、焼結助剤成分の偏析部の制御が難しくなることが分かる。
【0070】
【発明の効果】
以上説明したように、本発明によれば例えば電子機器用ベアリングなどの高速回転を安定に実現し得る電子機器用耐摩耗性部材を安価に提供することができる。従って、各種電子機器に窒化珪素製の耐摩耗性部材を幅広く適用することが可能となる。また、このような電子機器用耐摩耗性部材からなるベアリングボールを具備するベアリングを使用することによって、各種電子機器の信頼性や性能などを高めることが可能となる。
【図面の簡単な説明】
【図1】 本発明の一実施形態によるベアリングボールの概略構成を一部断面で示す図である。
【符号の説明】
1……ベアリング,2……ベアリングボール,3……内輪,4……外輪[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a wear-resistant member used in various electronic devices, a method for manufacturing the same, and a bearing for electronic devices using the same.
[0002]
[Prior art]
In recent years, there have been remarkable developments in magnetic recording devices such as hard disk drives (HDD) and floppy disk drives (FDD), optical disk devices such as CD-ROM and DVD, and various game devices. In these electronic devices, a rotating shaft is usually rotated at a high speed by a rotary drive device such as a spindle motor, and various disks mounted on the rotating shaft are functioned. In addition, projectors such as LCD projectors and OHPs, personal computers, and the like have built-in cooling fans for removing the heat inside the devices. In such cases, a rotational drive device such as a fan motor is used. ing.
[0003]
Conventionally, metal materials such as bearing steel have been mainly used for bearing members, particularly bearing balls, that support the rotating shaft of the electronic apparatus rotary drive device as described above. However, since metal materials such as bearing steel have insufficient wear resistance, reliability is increased by increasing the variation in life in fields where high-speed rotation of 4000 rpm or more is required, such as electronic equipment. There is a problem that some rotational drive cannot be provided.
[0004]
In order to solve such problems, ceramic materials such as a silicon nitride sintered body have recently been used for bearing balls (see, for example, JP 2000-314426 A). A silicon nitride sintered body is excellent in sliding characteristics among ceramic materials and has good wear resistance. Therefore, even when high-speed rotation is performed, it is possible to provide a mechanically reliable rotational drive.
[0005]
[Problems to be solved by the invention]
However, a silicon nitride bearing ball is more expensive than a metal bearing ball, and has a drawback that its range of use (applicable device) is limited. In particular, electronic devices such as HDDs are being rotated at a high speed, and metal bearing balls have problems such as increased noise due to insufficient rigidity and insufficient durability. For this reason, it is strongly sought to enable the application of silicon nitride bearing balls to various electronic devices by reducing the manufacturing cost of high-stiffness silicon nitride bearing balls compared to metal balls. It has been.
[0006]
Here, as one of the cost reduction measures for a silicon nitride bearing ball, it is conceivable to use an inexpensive silicon nitride powder containing a relatively large amount of impurities such as oxygen and Fe as a raw material. However, when a sintered body is produced using a silicon nitride raw material having a large amount of impurities, the sintering aid component is easily segregated due to impurities such as oxygen and Fe. In particular, in applications where a high-density sintered body such as a bearing ball is required, the HIP treatment is generally applied. Therefore, a segregation portion of the sintering aid component grows during the HIP treatment, and the grown sintering aid is grown. There arises a problem that rigidity and durability as a bearing ball or the like are lowered based on the segregated portion of the agent component.
[0007]
Furthermore, since silicon nitride bearing balls are electrically insulating, there is a problem that static electricity generated during high-speed rotation cannot be released well to a rotating shaft or ball receiving part made of a metal material. Resulting in. If the bearings and peripheral components are charged more than necessary, a recording apparatus using a magnetic signal such as an HDD will adversely affect the recording medium. As a result, there is a concern that the recorded content in the HDD may be lost, or that the electronic device itself such as the HDD may be destroyed. For these reasons, there is a need for a bearing ball made of silicon nitride that prevents the accumulation of static electricity more than necessary in the rotational drive part of some electronic devices.
[0008]
Electric resistance value is 10-FiveConductive silicon nitride sintered bodies of about Ω · m have been known for some time (see Japanese Patent Publication No. 2-43699) and are used as materials for producing turbine engine blades and nozzles by electric discharge machining. ing. In such a conductive silicon nitride sintered body, a large amount of a conductivity-imparting material such as metal carbide or metal nitride is added in order to realize low electrical resistance, which causes the sliding characteristics to deteriorate. It has become. The above publication does not assume any application of the conductive silicon nitride sintered body to the sliding member, and merely provides conductivity in order to use electric discharge machining or the like.
[0009]
Silicon nitride sintered bodies containing conductive compounds such as metal carbides and metal nitrides are also described in Japanese Patent Publication No. 7-29855, Japanese Patent No. 2566580, Japanese Patent Application Laid-Open No. 6-227870, and the like. However, the techniques described in these publications do not necessarily provide a silicon nitride sintered body (composite sintered body) that is inexpensive and has excellent sliding characteristics and suitable electrical conductivity.
[0010]
In addition, since conductivity imparting materials such as metal carbide and metal nitride become a factor that inhibits the sintering of silicon nitride, it is necessary to add a sintering aid more frequently than ordinary silicon nitride sintered bodies. Arise. Thus, when a comparatively large amount of sintering aid is added, segregation of the sintering aid component is promoted, and for example, the rigidity and durability of a silicon nitride bearing ball are more likely to be lowered.
[0011]
The present invention has been made in order to cope with such problems, and is capable of realizing stable high-speed rotation when applied to a bearing ball or the like, and is a wear-resistant member for electronic equipment that can reduce manufacturing costs. It is another object of the present invention to provide a wear-resistant member for electronic equipment that prevents accumulation of static electricity more than necessary. Also, by using such wear-resistant members for electronic devices, high reliability and high performance of electronic devices such as projectors and personal computers with cooling devices, magnetic recording devices, optical disk devices, game devices, etc. It aims at providing the bearing for electronic devices which can implement | achieve.
[0012]
[Means for Solving the Problems]
In order to achieve the above-described object, the present inventors have repeatedly conducted various studies and experiments on a silicon nitride sintered body for electronic equipment. As a result, the silicon nitride sintered body has been used as a wear-resistant member such as a bearing for electronic equipment. Is applied, for example, a silicon nitride sintered body produced using a raw material powder (such as silicon nitride powder) having a relatively high impurity concentration, that is, a nitridation in which the sintering aid component segregates to a certain size and amount. It was found that even a silicon sintered body can be used.
[0013]
This is because a bearing applied to electronic equipment or the like has a relatively small load applied during operation, and mainly requires a high-speed sliding characteristic rather than a load bearing characteristic. In such applications, even a silicon nitride sintered body in which a silicon nitride powder having a relatively high impurity concentration, that is, an inexpensive silicon nitride powder is used as a raw material and the sintering aid component segregates in a certain size and amount. In addition, it is possible to reduce the manufacturing cost of the silicon nitride sintered body, and thus the wear-resistant member for electronic equipment using the same, based on the reduction of the raw material cost.
[0014]
Furthermore, when the silicon nitride sintered body is produced using the silicon nitride powder having a relatively high impurity concentration as described above, the segregation part of the sintering aid component is likely to grow, which makes the bearing Although the rigidity and durability as a wear-resistant member such as a ball are likely to decrease, in the present invention, by controlling the HIP processing conditions, the segregation portion of the sintering aid component in such a silicon nitride sintered body grows. Is suppressed. This makes it possible to obtain a silicon nitride sintered body that satisfies the characteristics required of a wear-resistant member for electronic equipment with good reproducibility.
[0015]
  The present invention has been made based on such findings. That is, the wear-resistant member for electronic equipment of the present invention contains a sintering aid component in a range of 5 to 20 parts by mass with respect to 100 parts by mass of silicon nitride, and an Fe component as an impurity in a range of 30 to 600 ppm. Comprising a silicon nitride sintered body containing,Used for rotational drive units with a rotational speed of 8000 rpm or less,A wear-resistant member for electronic equipment, which is a bearing ball having a diameter of 3 mm or less, wherein the silicon nitride sintered body has a segregation portion of the sintering aid component, and the segregation portion has a maximum diameter of 10 to 150 μm. And in the range of 2 or more and 10 or less per unit area of 1000 × 1000 μm in the silicon nitride sintered body.
[0017]
  In the wear resistant member for electronic equipment of the present invention,NitroConductivity-imparting particles are contained in the silicon carbide sintered body, and the electric resistance value is 1 to 106A silicon nitride sintered body having a range of Ω · m can also be used. In the case of using such a silicon nitride sintered body, as conductivity imparting particlesIs an exampleFor example, at least one selected from a group 4A element, a group 5A element, a group 6A element, a group 7A element, silicon, boron carbide and nitride is used.
[0018]
  The wear-resistant member for electronic equipment of the present invention isAs mentioned aboveIt is suitably used as a bearing ball having a diameter of 3 mm or less. Such a wear-resistant member for electronic equipment of the present invention is, for example,ColdIt is suitably used for a rotation drive unit of a projection device with a rejection device, a personal computer, a magnetic recording device such as HDD or FDD, an optical disk device such as a CD-ROM or DVD, and various game devices.
[0019]
  BookThe manufacturing method of the wear-resistant member for electronic equipment of the invention isA method for producing the wear-resistant member for electronic equipment according to the present invention described above,A silicon nitride powder containing 1 to 1.8% by mass of oxygen as impurities and 30 to 700 ppm of Fe component and 5 to 20 parts by mass of sintering aid powder with respect to 100 parts by mass of the silicon nitride powder are mixed. A step of molding the mixture into a desired shape, a primary sintering step of sintering the molded body obtained by the molding step at a temperature in the range of 1700 to 1850 ° C., and a primary firing obtained by the primary sintering step. A secondary sintering step in which the bonded body is subjected to HIP treatment at a temperature lower by 200 ° C. or more than the sintering temperature of the primary sintering step;Used for rotational drive units with a rotational speed of 8000 rpm or less,It is characterized by producing bearing balls with a diameter of 3mm or less.
[0020]
  The electronic device bearing of the present invention is,UpIt is characterized by comprising a bearing ball made of the wear-resistant member for electronic equipment according to the present invention described above. Such a bearing for an electronic device is suitably used for the above-described projection device with a cooling device, a fan motor of a personal computer, or a spindle motor used in a magnetic recording device, an optical disk device, a game device, or the like.
[0021]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, modes for carrying out the present invention will be described.
The wear-resistant member for electronic equipment according to the present invention includes, for example, a rare earth element oxide or an alkaline earth element oxide as a sintering aid component, and a part of such a sintering aid component is the maximum. It consists of a silicon nitride sintered body that exists by forming a segregation part having a diameter of 150 μm or less.
[0022]
In the wear resistant member for electronic equipment according to the present invention, the raw material powder of the silicon nitride sintered body may be, for example, a silicon nitride powder containing oxygen as an impurity in an amount of 1 to 1.8 mass% and an Fe component in a range of 30 to 700 ppm. it can. Here, the Fe component refers to a component containing all iron (Fe), such as an Fe element simple substance, and an Fe compound such as iron nitride or iron oxide. Since silicon nitride powder containing a relatively large amount of impurities is less expensive than high-purity silicon nitride powder, the manufacturing cost of wear-resistant members (sliding members) for electronic devices such as bearing balls is reduced. Contribute to. The same applies to the sintering aid powder and the conductivity imparting material powder.
[0023]
With silicon nitride powder having a low oxygen content and a low content of Fe component, the effect of reducing the manufacturing cost of the silicon nitride sintered body based on the reduction of raw material costs cannot be obtained sufficiently. However, if the amount of oxygen and the amount of Fe component in the silicon nitride powder is too large, degranulation is likely to occur when the obtained silicon nitride sintered body is polished (surface processing), which causes surface defects. As a result, the crushing strength and the like are greatly deteriorated, and the characteristics as the wear-resistant member, for example, the sliding characteristics cannot be maintained even for the electronic device. For this reason, the oxygen content in the silicon nitride powder as a raw material is preferably in the range of 1 to 1.8% by mass, and the Fe component content is preferably in the range of 30 to 700 ppm.
[0024]
In the wear resistant member for electronic equipment of the present invention, it is preferable to apply a silicon nitride sintered body containing, for example, an Fe component as an impurity in the range of 30 to 600 ppm based on the silicon nitride raw material as described above. The amount of Fe component in the silicon nitride sintered body is more preferably in the range of 100 to 400 ppm. By applying such a silicon nitride sintered body, it is possible to reduce the manufacturing cost of the wear resistant member for electronic equipment as described above. Moreover, the silicon nitride sintered body containing an appropriate amount of Fe component has high workability, and the cost required for processing can be reduced. Also from this point, the silicon nitride sintered body appropriately containing the Fe component contributes to the reduction of the manufacturing cost of the wear resistant member for electronic equipment. In addition, although the Fe component in the present invention is mainly contained as an impurity in the silicon nitride raw material, the Fe component mixed during the manufacturing process of the sintered body, and further, the Fe component actively added as necessary Including ingredients.
[0025]
In addition, the content of the Fe component of the silicon nitride sintered body in the present invention indicates a value obtained as follows. First, after the silicon nitride sintered body is finely pulverized and powdered, hydrofluoric acid or the like is added and heated to about 180 ° C. in a pressure vessel to form a solution. Next, after rinsing off hydrofluoric acid with sulfuric acid, the solution is subjected to ICP emission analysis to determine the content of Fe component. Thus, the total amount of Fe in the silicon nitride sintered body is taken as the content of the Fe component.
[0026]
As a sintering aid, various metal compounds can be applied in the same manner as a general silicon nitride sintered body, and in particular, oxides and alkaline earths of rare earth elements (lanthanoid elements including yttrium). It is preferable to use at least one selected from elemental oxides. These oxides effectively act to increase the density of the silicon nitride sintered body. As the rare earth element oxide, an oxide such as yttrium (Y), ytterbium (Yb), or erbium (Er) is preferably used. These are constituents of the grain boundary phase. Further, it is preferable to use an oxide of magnesium or calcium as the oxide of the alkaline earth element. In addition, you may use the compound (carbonate etc.) of the rare earth element and alkaline-earth element which become an oxide at the time of sintering as a compound as a sintering auxiliary agent.
[0027]
In addition to the oxides of rare earth elements and alkaline earth elements described above, aluminum compounds such as aluminum nitride and aluminum oxide, and oxides and nitrides such as titanium, zirconium, and hafnium are used as part of the sintering aid. It is also effective to use as The aluminum compound contributes to strengthening the bonding force between the silicon nitride crystal grains. These compounds may be added as oxides or nitrides, or compounds that become oxides or nitrides during sintering may be added.
[0028]
The sintering aid as described above is preferably contained in the range of 5 to 20 parts by mass with respect to 100 parts by mass of silicon nitride. If the amount of the sintering aid is less than 5 parts by mass, the silicon nitride sintered body may not be sufficiently densified. On the other hand, if the amount of sintering aid exceeds 20 parts by mass, the amount of segregation part of the grain boundary phase and the sintering aid component increases more than necessary, which results in the wear resistance and strength of the silicon nitride sintered body. There is a risk of lowering. Among the sintering aids described above, the rare earth oxide content is preferably in the range of 5 to 15 parts by mass, and the alkaline earth oxide content is preferably in the range of 0.5 to 5 parts by mass. preferable. Furthermore, in addition to these, it is preferable to contain an aluminum compound such as aluminum nitride or aluminum oxide in the range of 1 to 7 parts by mass.
[0029]
In the wear resistant member for electronic equipment of the present invention, as described later in detail, conductivity imparting particles such as 4A group element, 5A group element, 6A group element, 7A group element, silicon, Conductivity-imparting particles comprising at least one selected from boron carbide and nitride can be contained. In such a case, the conductivity imparting particles are in the range of 15 to 40% by volume in the silicon nitride sintered body (converted assuming that the volume of the silicon nitride sintered body containing the conductivity imparting particles is 100% by volume) It is preferable to use the silicon nitride sintered body contained in (1).
[0030]
The electrical conductivity value of the silicon nitride sintered body is 1 to 10 for the content of the conductivity-imparting particles described above.6It is adjusted appropriately so as to be in the range of Ω · m. Specifically, the conductivity-imparting particles are preferably contained in the range of 15% by volume to 40% by volume. If the content of the conductivity imparting particles is less than 15% by volume, the electrical resistance value of the silicon nitride sintered body may not be sufficiently reduced. On the other hand, if the content of the metal carbide or metal nitride exceeds 40% by volume, the electrical resistance value of the silicon nitride sintered body itself is lowered, but the original characteristics of the silicon nitride sintered body may be deteriorated.
[0031]
The silicon nitride sintered body constituting the wear resistant member for electronic equipment of the present invention has a segregation part of the sintering aid component as described above, and further has a maximum diameter of the segregation part of the sintering aid component. Is controlled to 150 μm or less. The reason why it is possible to use a silicon nitride sintered body having a segregation part of such a sintering aid component is that a wear-resistant member such as a bearing ball used for a bearing for an electronic device (e.g. This is because the wearable member) has a relatively small load applied during operation, and mainly requires a high-speed sliding characteristic rather than a load bearing characteristic.
[0032]
That is, in a silicon nitride sintered body produced using a silicon nitride powder containing a relatively large amount of impurities as described above, the sintering aid component tends to segregate due to impurities such as oxygen and Fe components. . In particular, when a metal carbide or the like is used as the conductivity-imparting particles, the conductivity-imparting particles act as a factor inhibiting the sinterability of silicon nitride, so a sintering aid is added more frequently than usual. For this reason, the sintering aid component is more easily segregated. Such segregation parts of the sintering aid component cause deterioration of bearing characteristics (such as repeated fatigue) and load bearing characteristics (such as crushing strength) of the silicon nitride sintered body, but are not suitable for wear-resistant members for electronic devices. The applied load is small compared to wear-resistant members used in, for example, gas turbines, automobile parts, machine tools, etc., so even a silicon nitride sintered body with relatively low repeated fatigue characteristics can be used sufficiently be able to.
[0033]
However, if the maximum diameter of the segregation part of the sintering aid component is too large, breakage starting from it tends to occur. Therefore, in the silicon nitride sintered body applied to the wear-resistant member for electronic equipment of the present invention, Defines the size of the segregation part of the sintering aid component as a maximum diameter of 150 μm or less. The maximum diameter of the segregation part of the sintering aid component is more preferably 100 μm or less. In the present invention, the segregation part of the sintering aid component refers to an aggregate (aggregate) of the sintering aid component having a maximum diameter of 10 μm or more.
[0034]
Although the HIP process is effective for increasing the density of the silicon nitride sintered body, if the HIP process is applied when producing the silicon nitride sintered body using the silicon nitride powder having a relatively high impurity concentration, the HIP process The segregation part of the sintering aid component grows, and even if it is for electronic equipment, the deterioration of the characteristics of the wear-resistant member is inevitable. Therefore, in the present invention, the growth of the segregation part of the sintering aid component in such a silicon nitride sintered body is suppressed by controlling the HIP processing conditions. Specifically, the maximum diameter of the segregation part of the sintering aid component is set to 150 μm or less, which makes it possible to satisfy the reproducibility of the sliding characteristics required for bearing balls for electronic devices.
[0035]
  As described above, the silicon nitride sintered body constituting the wear-resistant member for electronic equipment of the present invention has a maximum diameter.ButIt has a segregation part of the sintering aid component in the range of 10 to 150 μm. It is preferable that two or more segregation portions of such sintering aid components exist per unit area of 1000 × 1000 μm in the silicon nitride sintered body. If the number of segregation parts of the sintering aid component is too small, the sintering aid component tends to form a larger segregation part, so that the maximum diameter of the segregation part is 150 μm or less. It is preferable that a plurality of segregation parts are present per unit area. However, if the number of segregation parts of the sintering aid component is too large, the mechanical strength of the silicon nitride sintered body tends to decrease, so the number of segregation parts is 10 or less per unit area of 1000 × 1000 μm. Preferably.
[0036]
Here, the maximum diameter and the number per unit area (1000 × 1000 μm) of the segregation part of the sintering aid component described above are obtained as follows. That is, in the cross section of the silicon nitride sintered body, an arbitrary measurement location (area: 1000 × 1000 μm) is observed with a metal microscope (for example, 50 to 100 times magnification), and an observation field corresponding to this unit area (1000 × 1000 μm) ( Or the number of segregation parts of the sintering aid component existing in the enlarged photo), that is, the maximum diameter (the maximum diameter in this case indicates the maximum diameter of each segregation part) of 10 to 150 μm. Measure the number. Further, among the maximum diameters of these segregated portions, the maximum diameter of the largest segregated portion is defined as the maximum diameter.
[0037]
As described above, a silicon nitride sintered body having a segregation portion of a sintering aid component having a maximum diameter of 150 μm or less can be sufficiently applied to a wear-resistant member for electronic equipment. Then, by using such a wear-resistant member made of a silicon nitride sintered body as a bearing ball, for example, in a rotational drive part of various electronic devices in which an increase in noise is a problem due to high-speed rotation, for example. It is possible to apply a high-rigidity silicon nitride bearing ball.
[0038]
By the way, silicon nitride itself is essentially an insulating material, and generally the electric resistance value of a silicon nitride sintered body is 109Ω · m or more. When such a ball bearing made of a silicon nitride sintered body is used for a rotation drive unit of an electronic device, static electricity generated at the time of high-speed rotation accumulates more than necessary, and a magnetic signal such as an HDD is generated. The apparatus used will adversely affect the recording medium. Therefore, the silicon nitride sintered body of the present invention contains conductivity imparting particles, for example, 1 to 106It can also be used as a silicon nitride sintered body provided with an electric resistance value in the range of Ω · m.
[0039]
10 sintered silicon nitride6By having an electrical resistance value of Ω · m or less, when used in an electronic device such as an HDD, the static electricity generated by high-speed rotation is released to a bearing member made of a metal material such as a rotating shaft and a ball receiving portion. It becomes possible. Accordingly, it is possible to eliminate problems associated with electrostatic charging. On the other hand, even if the electrical resistance value of the silicon nitride sintered body is less than 1 Ω · m, not only a further effect is not obtained with respect to the dissipation of static electricity, but in order to obtain such an electrical resistance value, a large amount of Since it is necessary to add conductivity-imparting particles, mechanical properties such as fracture toughness and wear resistance of the silicon nitride sintered body are impaired. The electrical resistance value of the silicon nitride sintered body is 10 to 10FiveA range of Ω · m is more preferable. In addition, the electrical resistance value of the silicon nitride sintered body basically indicates a volume specific resistance value.
[0040]
In the wear-resistant member for electronic equipment of the present invention, the conductivity imparting particles contained in the silicon nitride sintered body in order to obtain the above-described electrical resistance value are 10-FiveIt preferably has an electric resistance value of Ω · m or less. The electrical resistance value of the conductivity-imparting particles is 10-FiveIf it exceeds Ω · m, the compounding amount for imparting a predetermined electric resistance value to the silicon nitride sintered body increases, so that the mechanical properties of the silicon nitride sintered body may be deteriorated.
[0041]
Various materials such as carbides, nitrides, borides, metals, and the like that can control the electrical resistance value of the silicon nitride sintered body can be used for the conductivity-imparting particles. Among these, at least one selected from a group 4A element, a group 5A element, a group 6A element, a group 7A element, silicon, boron carbide and nitride is preferable. Since carbides and nitrides are chemically stable and excellent in heat resistance, they are not easily affected by heat generated when sliding a bearing ball or the like. The presence of these conductivity-imparting particles can be analyzed by EPMA or X-ray diffraction.
[0042]
As the conductivity-imparting particles, at least one carbide or nitride selected from tantalum (Ta), titanium (Ti), niobium (Nb), tungsten (W), silicon (Si), and boron (B) is used. It is preferable to use it. When the wear resistant member of the present invention is used as a bearing ball or the like, the conductivity imparting particles present on the surface of the silicon nitride sintered body are naturally slid together with the silicon nitride sintered body. Therefore, since some degree of sliding characteristics are required for the conductivity-imparting particles, it is preferable to use carbides or nitrides having excellent sliding characteristics as described above. Silicon carbide is particularly effective for improving the sliding characteristics. Moreover, in order to suppress the sinterability fall of a silicon nitride sintered compact, it is preferable to add the titanium oxide used as titanium nitride after sintering.
[0043]
The conductivity-imparting particles made of the above-described carbide or nitride preferably have a particle shape with an average particle size of 2 μm or less. Furthermore, the conductivity imparting particles preferably have a maximum diameter of 4 μm or less, more preferably 2 μm or less. By using such carbide particles or nitride particles, the conductivity imparting particles can be appropriately dispersed in the silicon nitride sintered body. On the other hand, when whiskers or fibers are used as the conductivity-imparting material, they may be present as thorn-shaped convex portions on the surface of a bearing ball or the like. If thorn-shaped convex portions exist on the surface, they tend to become a starting point for grain separation during surface processing, and may increase the attacking property against the mating member during sliding, and may become a starting point for destruction. The maximum diameter of the conductivity-imparting particles is the size of each particle, and shows the longest diagonal line of the conductivity-imparting particles when an enlarged photograph of the surface and cross section of the silicon nitride sintered body and the color map of EPMA are viewed. Shall.
[0044]
Specifically, the wear-resistant member for electronic equipment of the present invention is used, for example, as a rolling element of a bearing in a rotational drive section of various electronic equipment. In particular, the wear resistant member of the present invention is suitable for a bearing ball for electronic equipment. The shape of the bearing ball is generally a true sphere, but the shape of the rolling element to which the present invention is applied is not necessarily limited to a true sphere, and may be a columnar shape or a rod shape. The present invention is applicable to various bearings such as ball bearings and roller bearings. The wear-resistant member for electronic equipment according to the present invention is not limited to a rolling element of a bearing, but can be used for all semiconductor jigs such as a positioning jig and a conveying jig in a semiconductor manufacturing apparatus. In particular, by adding conductivity imparting particles, the electrical resistance value is 1-10.6Those using a silicon nitride sintered body controlled to Ω · m are preferable because they can prevent electrostatic charge when used in general jigs for semiconductors.
[0045]
Although the manufacturing method of the wear-resistant member for electronic devices of this invention is not specifically limited, For example, manufacturing by the method as shown below is preferable.
First, a predetermined amount of each of silicon nitride powder, sintering aid powder, and if necessary, conductivity imparting material powder is weighed and mixed uniformly. In consideration of sliding properties, it is preferable to use particulate powder instead of whiskers or fibers for each raw material powder. The size of each raw material powder is not particularly limited, but the silicon nitride powder preferably has an average particle size in the range of 0.2 to 3 μm, and the sintering aid powder preferably has an average particle size of 2 μm or less. The average particle size of the conductivity imparting material powder is preferably 2 μm or less.
[0046]
As the silicon nitride powder, as described above, a raw material powder containing 1 to 1.8% by mass of oxygen as impurities and 30 to 700 ppm of Fe component can be used. Since silicon nitride powder containing a relatively large amount of impurities is less expensive than high-purity silicon nitride powder, the manufacturing cost of wear-resistant members (sliding members) for electronic devices such as bearing balls is reduced. Contribute to. The same applies to the sintering aid powder and the conductivity imparting material powder.
[0047]
The raw material mixed powder as described above is granulated as necessary, and then formed into a desired shape (for example, a ball shape). As for the molding method, a normal molding method can be applied. For example, when producing a bearing ball, it is preferable to produce a compact by applying a cold isostatic press (CIP). Such a molded body is first primarily sintered by atmospheric pressure sintering or atmospheric pressure sintering. The sintering temperature during the primary sintering step is preferably in the range of 1700-1850 ° C. If the primary sintering temperature is less than 1700 ° C., a sufficiently dense silicon nitride sintered body cannot be obtained even if the HIP treatment is performed thereafter. Moreover, not only the effect is not obtained even if the primary sintering temperature is set to exceed 1850 ° C., but the segregation part of the silicon nitride crystal grains and the sintering aid component becomes coarse and the sintered body becomes Mechanical strength is reduced. In addition, the consumption of the firing furnace and the like becomes severe.
[0048]
Next, HIP (hot isostatic pressing) treatment (secondary sintering step) is performed on the primary sintered body obtained by the primary sintering step to increase the density of the silicon nitride sintered body. However, since the segregation part of the sintering aid component present in the primary sintered body is likely to grow by HIP treatment, the HIP treatment temperature (secondary sintering temperature) is 200 ° C. or higher than the sintering temperature in the primary sintering step. Set to a lower temperature. That is, the primary sintering temperature is T1(° C), HIP treatment temperature (secondary sintering temperature) T2(° C), T2Is T1Temperature below -200 (℃) (T2≦ T1-200 (℃)). Thus, the growth of the segregation part of the sintering aid component can be suppressed by setting the HIP treatment temperature to be lower than the primary sintering temperature.
[0049]
HIP processing temperature (secondary sintering temperature) T2Specifically, it is preferable to set in the range of 1300-1500 ° C. HIP processing temperature T2If the temperature is less than 1300 ° C., the silicon nitride sintered body (secondary sintered body) may not be sufficiently densified. Furthermore, the applied pressure during HIP treatment is preferably 50 MPa or less. When the pressure at the time of HIP exceeds 50 MPa, the segregation part of the sintering aid component tends to grow as in the case of the HIP processing temperature. In order to effectively obtain the effect of the HIP treatment, the pressure during HIP is more preferably in the range of 20 to 50 MPa.
[0050]
By carrying out the primary sintering step and the secondary sintering step under the conditions as described above, the intended silicon nitride sintered body can be obtained. Further, when used as a bearing ball, surface polishing is performed to obtain the surface roughness defined by the JIS standard. At this time, since the silicon nitride sintered body containing a relatively large amount of impurities has good workability, the cost required for processing into a ball shape or the like can be reduced.
[0051]
The wear-resistant member for electronic equipment of the present invention is suitably used as a rotation ball for various electronic equipment as a bearing ball or the like. The present invention is particularly effective for small bearing balls having a diameter of 3 mm or less. The segregation part of the sintering aid component described above is proportional to the size of the silicon nitride sintered body (the larger the size of the sintered body, the larger the amount of sintering aid, the greater the probability that a large segregation part will be formed). If there is a large segregation part, the crushing strength of the sintered body may be reduced. Therefore, the wear resistant member for electronic equipment according to the present invention is not easily affected by the segregation part and the maximum diameter of the segregation part. Is preferably used as a small bearing ball having a diameter of 3 mm or less. The diameter of the bearing ball to which the present invention is applied is preferably 2 mm or less.
[0052]
Electronic devices to which wear-resistant members such as bearing balls as described above are applied include, for example, a projection device with a cooling device, a personal computer, a magnetic recording device such as an HDD or FDD, and an optical disk device such as a CD-ROM or DVD. And various disk-type game devices. The optical disk apparatus includes various apparatuses such as a magneto-optical recording apparatus, a phase change optical recording apparatus, and a reproduction-only optical disk apparatus. Furthermore, the present invention can be applied to various electronic devices as long as they are electronic devices having a rotation drive unit.
[0053]
For example, in a projection device (LCD projector, OHP, etc.) with a cooling device, a personal computer, etc., the wear-resistant member for electronic equipment of the present invention is used as a bearing ball or the like in the rotational drive part of a cooling fan motor. The cooling fan motor is driven at a rotational speed of about several hundred to 3000 rpm, for example, depending on the voltage. The rotation drive part of such an electronic device has an insulating property (electric resistance value = 109A bearing ball made of a silicon nitride sintered body (Ω · m or more) can be used. Since the bearing ball made of the silicon nitride sintered body has high rigidity, noise can be suppressed and durability can be improved.
[0054]
In a magnetic recording device, an optical disc device, a disc-type game device, etc., the wear-resistant member for electronic equipment of the present invention is used as a bearing ball or the like in the rotational drive portion of a medium driving spindle motor. In these electronic devices, the spindle motor is driven at a rotational speed of 4000 rpm or more, for example. The rotation drive part of such an electronic device has conductivity (electric resistance value = 1 to 10).6A bearing ball made of a silicon nitride sintered body of Ω · m) is preferably used. A bearing ball made of a silicon nitride sintered body having appropriate conductivity can achieve a stable high-speed rotation and can well release static electricity generated by the high-speed rotation. This makes it possible to eliminate problems caused by static electricity of the electronic device.
[0055]
The bearing of the present invention has a rolling element, for example, a bearing ball, made of the wear-resistant member for electronic equipment of the present invention as described above. FIG. 1 is a view showing a configuration of an embodiment of a bearing according to the present invention. A bearing 1 shown in FIG. 1 has a plurality of bearing balls 2 made of the wear-resistant member for electronic equipment of the present invention, and an inner ring 3 and an outer ring 4 that support these bearing balls 2. The inner ring 3 and the outer ring 4 are preferably formed of bearing steel such as SUJ2 defined in JIS-G-4805, and thereby, high-speed rotation with reliability can be realized. The basic configuration is the same as that of a normal bearing.
[0056]
As described above, the bearing 1 is used for a rotation drive unit of a cooling fan motor in an electronic apparatus such as a projector with a cooling device or a personal computer. Further, in electronic devices such as magnetic recording devices such as HDD and FDD, optical disk devices such as CD-ROM and DVD, and disk game devices, they are used as rotational drive units for various disks. Specifically, it is used to drive a spindle motor that rotates a disk-shaped recording medium at a high speed.
[0057]
【Example】
Next, specific examples of the present invention and evaluation results thereof will be described.
[0058]
Examples 1-17, Comparative Examples 1-6
First, a plurality of silicon nitride powders (average particle size: 0.7 μm) containing 1 to 1.8% by mass of oxygen as impurities and 30 to 700 ppm of Fe component are prepared, and 100 parts by mass of these silicon nitride powders are sintered. Yttrium oxide powder or aluminum oxide powder as a binder, and silicon carbide powder or titanium nitride powder as conductivity imparting particles were added and mixed based on the raw material composition shown in Table 1.
[0059]
Next, each of the raw material mixed powders described above is formed by the CIP forming method, further degreased, and then first, normal pressure sintering (primary sintering) at a temperature of 1700 to 1850 ° C. in an inert atmosphere, followed by HIP Sintering (secondary sintering) was performed. The conditions of primary sintering and secondary sintering (HIP) are as shown in Table 1, respectively. In this way, bearing balls each having a diameter of 2 mm made of a silicon nitride sintered body were produced. The surface of each bearing ball was polished to have a surface roughness equivalent to Grade 3 certified by JIS standards.
[0060]
In addition, for comparison with the present invention, a silicon nitride sintered body using a high-purity silicon nitride powder (oxygen content = 0.6 mass% or less, Fe component content = 10 ppm or less) with sufficiently reduced impurity content ( Comparative Example 1), silicon nitride sintered body (Comparative Example 2) in which the amount of sintering aid is set excessively, silicon nitride sintered body (Comparative Example 3) in which the amount of sintering aid is set too low, and HIP conditions The silicon nitride sintered body (Comparative Example 4) outside the scope of the present invention, the silicon nitride sintered body (Comparative Example 5) in which the amount of conductivity imparting particles was set excessively, and the HIP conditions were out of the scope of the present invention. A silicon nitride sintered body (Comparative Example 6) was prepared in the same manner as in Examples except for those conditions, and bearing balls each having a diameter of 2 mm were obtained.
[0061]
[Table 1]
Figure 0004874475
[0062]
For each of the bearing balls according to Examples 1 to 17 and Comparative Examples 1 to 6, the electrical resistance value, the maximum diameter of the segregation part of the sintering aid component, and the sintering aid component existing per unit area of 1000 × 1000 μm The number of segregation parts and the content of Fe component (ICP emission analysis method) were measured according to the methods described above. These measurement results are shown in Table 2. In addition, the measurement of the segregation part of the sintering aid component was carried out by arbitrarily selecting three unit areas and showing the average value of the measured values.
[0063]
[Table 2]
Figure 0004874475
[0064]
Next, a bearing was manufactured by setting 10 bearing balls according to Examples 1 to 17 and Comparative Examples 1 to 6 as a set. Bearing steel SUJ2 material was used for other bearing members such as ball receiving parts. Each of these bearings was incorporated into a spindle motor and used as an HDD motor. These spindle motors were operated for 1000 hours at rotational speeds of 7200 rpm and 10000 rpm, respectively, and the rate of change in bearing sliding noise, durability of bearing balls, and the presence or absence of defects due to static electricity in the HDD were investigated. These evaluation results are shown in Table 3.
[0065]
Note that the rate of change in the sliding noise of the bearing is the sliding noise N after 10 hours of operation.TenAnd sliding sound N after 1000 hours of operation1000And measure [(N1000-NTen) / NTen] × 100 (%). The durability of the bearing ball was determined by examining the surface of the bearing ball after 1000 hours of operation. The surface that did not have cracks or peeling on the surface was evaluated as “good” and the surface that had cracks or peeling on the surface was determined as “bad” .
[0066]
[Table 3]
Figure 0004874475
[0067]
As is apparent from Tables 2 and 3, it can be seen that each of the bearing balls of Examples 1 to 17 satisfies the practicality if it is a spindle motor for HDD with a rotational speed of 8000 rpm or less. Moreover, the bearing ball (Examples 4-17) which consists of a silicon nitride sintered compact containing appropriate quantity of electroconductivity provision particle | grains is 1-10.6It has an electric resistance value in the range of Ω · m, and not only has the durability required for HDD spindle motors, but also can eliminate problems caused by static electricity. In addition, when bearings produced in the same manner as in Examples 1 to 3 were respectively incorporated in a fan motor and used as a fan motor for a personal computer (rotation speed 1500 rpm), all had good sliding characteristics (durability). It was confirmed that
[0068]
Example 18, Reference Example 1
100 balls each having a diameter of 3 mm (Example 18) and 3 mm diameter bearing balls (Reference Example 1) were prepared by the same composition and manufacturing method as in Example 1, and sintering aids for each of these bearing balls were produced. The maximum diameter of the segregation part of the agent component was measured in the same manner as in Example 1. As a result, in Example 18, the maximum diameter of all 100 segregation parts was 150 μm or less, whereas in Reference Example 23, 23 of 100 segregation parts had a maximum diameter exceeding 150 μm. confirmed. From this result, it is understood that when the diameter of the bearing ball exceeds 3 mm, it is difficult to control the segregation part of the sintering aid component.
[0069]
Example 19, Reference Example 2
100 balls each having a diameter of 3 mm (Example 19) and 3 mm diameter bearing balls (Reference Example 2) were produced by the same composition and manufacturing method as in Example 14, and sintering aids for each of these bearing balls were produced. The maximum diameter of the segregation part of the agent component was measured in the same manner as in Example 14. As a result, in Example 19, the maximum diameter of all 100 segregation parts was 150 μm or less, whereas in Reference Example 2, 8 out of 100 segregation parts had a maximum diameter exceeding 150 μm. confirmed. From this result, it is understood that when the diameter of the bearing ball exceeds 3 mm, it is difficult to control the segregation part of the sintering aid component.
[0070]
【The invention's effect】
As described above, according to the present invention, it is possible to provide a wear-resistant member for electronic equipment that can stably realize high-speed rotation such as a bearing for electronic equipment at a low cost. Therefore, a wide range of wear-resistant members made of silicon nitride can be applied to various electronic devices. In addition, by using a bearing having a bearing ball made of such a wear-resistant member for electronic equipment, it becomes possible to improve the reliability and performance of various electronic equipment.
[Brief description of the drawings]
FIG. 1 is a partial cross-sectional view showing a schematic configuration of a bearing ball according to an embodiment of the present invention.
[Explanation of symbols]
1 ... Bearing, 2 ... Bearing ball, 3 ... Inner ring, 4 ... Outer ring

Claims (10)

窒化珪素100質量部に対して焼結助剤成分を5〜20質量部の範囲で含み、かつ不純物としてFe成分を30〜600ppmの範囲で含有する窒化珪素焼結体を具備し、回転速度が8000rpm 以下の回転駆動部に用いられる、直径3mm以下のベアリングボールである電子機器用耐摩耗性部材であって、
前記窒化珪素焼結体は前記焼結助剤成分の偏析部を有し、かつ前記偏析部は最大径が10〜150μmの範囲であると共に、前記窒化珪素焼結体中の単位面積1000×1000μm当りに2個以上10個以下の範囲で存在することを特徴とする電子機器用耐摩耗性部材。
A silicon nitride sintered body containing a sintering aid component in a range of 5 to 20 parts by mass with respect to 100 parts by mass of silicon nitride and containing an Fe component as an impurity in a range of 30 to 600 ppm, and having a rotational speed. A wear-resistant member for electronic equipment, which is a bearing ball having a diameter of 3 mm or less , used for a rotational drive unit of 8000 rpm or less ,
The silicon nitride sintered body has a segregation part of the sintering aid component, and the segregation part has a maximum diameter in the range of 10 to 150 μm, and a unit area of 1000 × 1000 μm in the silicon nitride sintered body A wear-resistant member for electronic equipment, characterized by being present in the range of 2 to 10 per contact.
請求項1記載の電子機器用耐摩耗性部材において、
前記焼結助剤成分は希土類元素の酸化物およびアルカリ土類元素の酸化物から選ばれる少なくとも1種を含むことを特徴とする電子機器用耐摩耗性部材。
The wear-resistant member for electronic equipment according to claim 1,
A wear-resistant member for electronic equipment, wherein the sintering aid component contains at least one selected from rare earth element oxides and alkaline earth element oxides.
請求項1または請求項2記載の電子機器用耐摩耗性部材において、
前記窒化珪素焼結体は導電性付与粒子を含有し、かつ電気抵抗値が1〜106Ω・mの範囲であることを特徴とする電子機器用耐摩耗性部材。
In the wear-resistant member for electronic devices according to claim 1 or 2,
The silicon nitride sintered body contains electrical conductivity-imparting particles and has an electric resistance value in the range of 1 to 10 6 Ω · m.
請求項3記載の電子機器用耐摩耗性部材において、
前記導電性付与粒子は、4A族元素、5A族元素、6A族元素、7A族元素、珪素、硼素の炭化物および窒化物から選ばれる少なくとも1種からなることを特徴とする電子機器用耐摩耗性部材。
In the wear-resistant member for electronic devices according to claim 3,
The electrical conductivity imparting particles are composed of at least one selected from a group 4A element, a group 5A element, a group 6A element, a group 7A element, silicon, boron carbide and nitride, and wear resistance for electronic equipment Element.
請求項1ないし請求項3のいずれか1項記載の電子機器用耐摩耗性部材において、
前記偏析部は、前記窒化珪素焼結体中の前記単位面積当りに2個以上6個以下の範囲で存在することを特徴とする電子機器用耐摩耗性部材。
The wear-resistant member for electronic equipment according to any one of claims 1 to 3,
The segregation part is present in the range of 2 or more and 6 or less per unit area in the silicon nitride sintered body.
請求項1ないし請求項5のいずれか1項記載の電子機器用耐摩耗性部材において、
前記ベアリングボールは磁気記録装置、光ディスク装置、ゲーム装置、または電子機器用冷却装置の回転駆動部に用いられることを特徴とする電子機器用耐摩耗性部材。
In the abrasion-resistant member for electronic devices of any one of Claims 1 thru | or 5,
The bearing ball is used for a rotational drive unit of a magnetic recording device, an optical disk device, a game device, or a cooling device for electronic devices, and is a wear resistant member for electronic devices.
請求項1記載の電子機器用耐摩耗性部材を製造する方法であって、
不純物として酸素を1〜1.8質量%およびFe成分を30〜700ppmの範囲で含む窒化珪素粉末と、前記窒化珪素粉末100質量部に対して5〜20質量部の焼結助剤粉末とを混合し、この混合物を所望の形状に成形する工程と、
前記成形工程により得た成形体を1700〜1850℃の範囲の温度で焼結する一次焼結工程と、
前記一次焼結工程により得た一次焼結体を、前記一次焼結工程の焼結温度より200℃以上低い温度でHIP処理する二次焼結工程とを具備し、
回転速度が8000rpm以下の回転駆動部に用いられる、直径3mm以下のベアリングボールを製造することを特徴とする電子機器用耐摩耗性部材の製造方法。
A method of manufacturing the wear-resistant member for electronic equipment according to claim 1,
A silicon nitride powder containing 1 to 1.8% by mass of oxygen as impurities and 30 to 700 ppm of Fe component and 5 to 20 parts by mass of sintering aid powder with respect to 100 parts by mass of the silicon nitride powder are mixed. Molding the mixture into a desired shape;
A primary sintering step of sintering the molded body obtained by the molding step at a temperature in the range of 1700 to 1850 ° C .;
A secondary sintering step of subjecting the primary sintered body obtained by the primary sintering step to HIP treatment at a temperature lower by 200 ° C. or more than the sintering temperature of the primary sintering step;
A method for producing a wear-resistant member for electronic equipment, comprising producing a bearing ball having a diameter of 3 mm or less , which is used for a rotational drive unit having a rotational speed of 8000 rpm or less .
請求項記載の電子機器用耐摩耗性部材の製造方法において、
前記二次焼結工程における前記HIP処理を1300〜1500℃の範囲の温度にて50MPa以下の圧力下で実施することを特徴とする電子機器用耐摩耗性部材の製造方法。
In the manufacturing method of the wear-resistant member for electronic devices according to claim 7 ,
A method for producing a wear-resistant member for electronic equipment, wherein the HIP treatment in the secondary sintering step is performed at a temperature in the range of 1300 to 1500 ° C. under a pressure of 50 MPa or less.
請求項または請求項記載の電子機器用耐摩耗性部材の製造方法において、
前記混合物にさらに導電性付与粒子を添加、混合することを特徴とする電子機器用耐摩耗性部材の製造方法。
In the manufacturing method of the abrasion-resistant member for electronic devices of Claim 7 or Claim 8 ,
A method for producing a wear-resistant member for electronic equipment, wherein conductivity-imparting particles are further added to and mixed with the mixture.
請求項1ないし請求項のいずれか1項記載の電子機器用耐摩耗性部材からなるベアリングボールを具備することを特徴とする電子機器用ベアリング。A bearing for electronic equipment, comprising a bearing ball comprising the wear resistant member for electronic equipment according to any one of claims 1 to 6 .
JP2001257764A 2001-08-28 2001-08-28 Abrasion resistant member for electronic equipment, method for producing the same, and bearing for electronic equipment using the same Expired - Lifetime JP4874475B2 (en)

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JP2006182590A (en) * 2004-12-27 2006-07-13 Yokohama National Univ Conductive silicon nitride material and manufacturing method thereof
JP5088851B2 (en) * 2006-04-28 2012-12-05 東芝マテリアル株式会社 Silicon nitride sintered body for wear-resistant member, method for producing the same, and wear-resistant member using the same
JP5170612B2 (en) * 2006-09-14 2013-03-27 国立大学法人横浜国立大学 Conductive silicon nitride sintered body and manufacturing method thereof
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JP7725462B2 (en) * 2020-05-20 2025-08-19 株式会社東芝 Silicon nitride sintered body, wear-resistant member using the same, and method for manufacturing silicon nitride sintered body
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