JP4876237B2 - 複数のルツボを利用した有機発光素子薄膜製作のための線形蒸発源 - Google Patents
複数のルツボを利用した有機発光素子薄膜製作のための線形蒸発源 Download PDFInfo
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- JP4876237B2 JP4876237B2 JP2007111466A JP2007111466A JP4876237B2 JP 4876237 B2 JP4876237 B2 JP 4876237B2 JP 2007111466 A JP2007111466 A JP 2007111466A JP 2007111466 A JP2007111466 A JP 2007111466A JP 4876237 B2 JP4876237 B2 JP 4876237B2
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- crucible
- housing
- thin film
- evaporation source
- organic light
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Description
12 係止部
50 有機物質
60 ハウジング
70 ルツボ固定部
72 係止支持台
80 熱線
Claims (7)
- 長い筒状ないし箱状に形成されるハウジングと、
上面は開放されており、内部に蒸着用物質を入れるものであり、前記ハウジングに一列に挿入される複数のルツボと、
前記ルツボを加熱する加熱装置と、を備える有機発光素子薄膜製作のための線形蒸発源において、
各ルツボの開口の高さが各々異なり、前記ルツボで蒸発された前記蒸着用物質が前記異なる高さのルツボの開口から広がるように構成され、前記高さは、前記ハウジングの中央から外側へゆくほど高くなる、有機発光素子薄膜製作のための線形蒸発源。 - 前記ルツボは、その高さ寸法がいずれも同じであり、前記ハウジング内で一列に配置され、前記ハウジングの中央から外側へ行くほど前記ルツボが前記ハウジングに挿入される深さが浅くなる請求項1に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記ルツボは、その高さ寸法がいずれも異なり、前記ハウジング内で一列に配置され、前記ハウジングの中央から外側へ行くほど高さ寸法が大きくなる前記ルツボが挿入され、前記ルツボの挿入深さがいずれも同じである請求項1に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記ルツボは、その高さ寸法がいずれも同じであり、前記ハウジング内で一列に配置され、前記ルツボが挿入される深さがいずれも同じく、前記ハウジングの中央から外側へ行くほど高さ寸法が大きくなる高さ調節部が前記ルツボ上に形成される請求項1に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記ハウジングの上面は開放されており、前記ハウジングの上面を覆うように設けられ、前記ハウジングに挿入される前記ルツボの上部が貫通されるように複数の孔があけられており、前記孔には係止支持台が形成されたルツボ固定部をさらに備え、前記ルツボの外壁には前記係止支持台に係止する係止部が形成されて、前記ルツボ固定部の係止支持台により前記ルツボが前記ハウジングに固定される請求項1ないし4のうちいずれか1項に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記加熱装置は熱線を利用するものであり、前記ルツボの下部で所定高さ部位を加熱できるように、前記熱線がルツボ外壁の周囲に形成された請求項1ないし5のうちいずれか1項に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記所定高さ部位は、前記ルツボ内部に置かれる有機物質の高さより高い請求項6に記載の有機発光素子薄膜製作のための線形蒸発源。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2006-0046222 | 2006-05-23 | ||
| KR1020060046222A KR100784953B1 (ko) | 2006-05-23 | 2006-05-23 | 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007314873A JP2007314873A (ja) | 2007-12-06 |
| JP4876237B2 true JP4876237B2 (ja) | 2012-02-15 |
Family
ID=38748342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007111466A Active JP4876237B2 (ja) | 2006-05-23 | 2007-04-20 | 複数のルツボを利用した有機発光素子薄膜製作のための線形蒸発源 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20070272156A1 (ja) |
| JP (1) | JP4876237B2 (ja) |
| KR (1) | KR100784953B1 (ja) |
| CN (1) | CN101078104A (ja) |
| TW (1) | TWI364125B (ja) |
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| WO2009134041A2 (en) * | 2008-04-29 | 2009-11-05 | Sunic System. Ltd. | Evaporator and vacuum deposition apparatus having the same |
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| JP5400653B2 (ja) * | 2010-02-16 | 2014-01-29 | 株式会社日立ハイテクノロジーズ | 真空蒸着装置 |
| JP2011176148A (ja) * | 2010-02-24 | 2011-09-08 | Nitto Denko Corp | 太陽電池モジュールの製造方法およびそれを用いて得られた太陽電池モジュール |
| CN102212784A (zh) * | 2010-04-12 | 2011-10-12 | 无锡尚德太阳能电力有限公司 | 沉积蒸发源 |
| KR101730498B1 (ko) * | 2010-10-22 | 2017-04-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
| EP2447393A1 (en) * | 2010-10-27 | 2012-05-02 | Applied Materials, Inc. | Evaporation system and method |
| JP5715802B2 (ja) * | 2010-11-19 | 2015-05-13 | 株式会社半導体エネルギー研究所 | 成膜装置 |
| JP6049355B2 (ja) * | 2012-08-29 | 2016-12-21 | キヤノントッキ株式会社 | 蒸発源 |
| CN104769151B (zh) * | 2012-11-14 | 2017-02-22 | 株式会社神户制钢所 | 成膜装置 |
| CN103898450B (zh) * | 2012-12-25 | 2017-06-13 | 北京创昱科技有限公司 | 一种铜铟镓硒共蒸发线性源装置及其使用方法 |
| KR102227546B1 (ko) * | 2014-01-20 | 2021-03-15 | 주식회사 선익시스템 | 대용량 증발원 및 이를 포함하는 증착장치 |
| CN105102087A (zh) * | 2014-03-01 | 2015-11-25 | Hzo股份有限公司 | 优化通过材料沉积设备的前驱材料的蒸发的船形器皿 |
| CN104178734B (zh) * | 2014-07-21 | 2016-06-15 | 京东方科技集团股份有限公司 | 蒸发镀膜装置 |
| JP6291696B2 (ja) * | 2014-07-28 | 2018-03-14 | 株式会社Joled | 蒸着装置および蒸発源 |
| KR101932943B1 (ko) * | 2014-12-05 | 2018-12-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 재료 증착 시스템 및 재료 증착 시스템에서 재료를 증착하기 위한 방법 |
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| KR102921715B1 (ko) * | 2020-06-29 | 2026-02-04 | 삼성디스플레이 주식회사 | 도가니 및 도가니를 이용한 증착 물질을 증착하는 방법 |
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-
2006
- 2006-05-23 KR KR1020060046222A patent/KR100784953B1/ko active Active
-
2007
- 2007-04-20 JP JP2007111466A patent/JP4876237B2/ja active Active
- 2007-05-14 US US11/803,297 patent/US20070272156A1/en not_active Abandoned
- 2007-05-16 CN CN200710103720.0A patent/CN101078104A/zh active Pending
- 2007-05-17 TW TW096117672A patent/TWI364125B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| KR100784953B1 (ko) | 2007-12-11 |
| KR20070113410A (ko) | 2007-11-29 |
| TWI364125B (en) | 2012-05-11 |
| CN101078104A (zh) | 2007-11-28 |
| US20070272156A1 (en) | 2007-11-29 |
| TW200744242A (en) | 2007-12-01 |
| JP2007314873A (ja) | 2007-12-06 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |