JP4876564B2 - Method for forming light-shielding partition using intaglio plate for transfer - Google Patents

Description

The present invention relates to the formation how the color liquid crystal display device is that shielding light bulkhead used like color filters.

  As a method for forming a color filter or the like of a color liquid crystal display device at a low cost, a method for supplying a color filter ink to a color filter substrate by an ink jet method has been proposed. However, since the ink particles ejected by the ink jet device collide with the substrate and spread at the portion, the convexity that acts as a partition around the pixel portion is used to prevent the ink particles from spreading outside the predetermined portion (pixel portion). A method for forming the part has been proposed. In addition, since the peripheral part of each pixel needs to be a black matrix with a light-shielding property, it is preferable that the partition also serves as the black matrix of the color filter, and many techniques for that purpose have been proposed. In the present application, the black matrix including the black stripe is referred to as a black matrix.

  By the way, the components of the color filter ink for inkjet are designed to have a low viscosity so as to be convenient for jetting during inkjet. For this reason, the composition is generally adjusted to have a low solid content and a high solvent content. For example, there are many proposals using a solid content of about 10% to 30%. However, as a result, the amount of ink filled in the pixel portion needs to be supplied 4 to 10 times in order to obtain a predetermined color material layer thickness.

  Here, when the height of the partition wall is low, a phenomenon that ink overflows the partition wall and overflows to adjacent pixels (often called color mixing) occurs. If the height of the partition wall is made higher than the height of the ink-jet ink to be filled, overflow does not occur, but the color material layer height of the color filter and the height of the partition wall are greatly different. This may hinder the formation of the transparent conductive film or cause a problem in the alignment of the liquid crystal. As countermeasures, methods have been proposed in which the height of the partition walls once formed is reduced by polishing or other methods, or an overcoat layer is formed. However, since the number of processes increases, the production cost increases. Therefore, as disclosed in Patent Document 1 and Patent Document 2, a method of preventing overflow by using a partition wall as an ink repellency has been studied.

  The condition of making the black matrix partition ink repellent is required regardless of the method of forming the black matrix in the method of filling the color filter ink by inkjet. In general, the black matrix material is mainly composed of an organic binder and a light shielding material. Therefore, when the ink-jet ink solvent is an organic solvent, the black matrix material is ink-philic to the ink-jet ink. Therefore, it is necessary to make the surface of the partition wall ink repellent.

However, if the side surfaces of the partition walls are also ink-repellent, the thickness of the ink filled in the pixels is thin at the portion in contact with the partition walls, thicker in the vicinity of the center, and is not filled with ink called “white spots”. A place is generated, and the performance as a color filter does not satisfy the specifications. That is, as shown in FIG. 1A, the surface shape when the ink a is filled (the figure immediately after the ink filling) remains after the solvent is volatilized, and the color material of the color filter near the partition wall b. The thickness of the layer c becomes thinner than the center of the pixel (the figure after solvent drying), resulting in uneven color in the pixel. On the other hand, if the upper surface of the partition wall can be made ink-repellent and the side surface can be made ink-philic, as shown in FIG. The uniformity of the thickness of layer c is much improved.
Such a method has been studied. For example, Patent Document 3 discloses a method of making the side surface of the ink-repellent partition wall of the entire surface ink-philic. Further, in Patent Document 4, Patent Document 5, and Patent Document 6, after applying a partition material, a treatment with an ink repellent agent is performed, and then patterning is performed by a photolithography process, and then a recess surrounded by the partition is formed in the parent ink. A method for performing the conversion process is disclosed. Further, in Patent Document 7, an ink-repellent black matrix partition is formed, and a layer of a parent ink material is formed on the side surface of the black matrix and the pixel portion in a subsequent process.
In any case, making the upper surface of the partition wall ink repellent and making the side surface and the bottom surface of the concave portion ink-philic in a separate process is a cause of cost increase.

  On the other hand, as a completely different method of making the upper surface of the partition walls have ink repellency, an ink repellant component is added to the black matrix material for photolithography in advance, and it is applied to the color filter substrate and dried. There is a method of depositing on the surface. This method will be described with reference to FIG.

・ Figure 2 (a)
First, a solution of a black matrix material f added with an ink repellent agent e (a black matrix material solution for photolithography) is applied to a color filter substrate d. Before the solvent evaporates, the ink repellent agent e is uniformly dispersed in the black matrix material. In the drawing, the ink repellent agent e is illustrated in a patch pattern.
・ Figure 2 (b)
When the solvent volatilizes, the ink repellent agent e floats (precipitates) on the upper surface (the surface in contact with air). This phenomenon is prominent in fluororesins and silicone resins that are preferable as the ink repellent agent, and because the ink repellent agent e prefers a surface with low free energy, it floats on the surface in contact with air. is there.
・ Figure 2 (c)
Next, using a black matrix photomask g, exposure h is performed. At the surface portion of the black matrix material irradiated with light, the black matrix material is cured and the lower part of the ink repellent agent is fixed to the black matrix material (the lower part of the deposited ink repellent agent and the upper part of the black matrix material are Connected). And it does not flow out in a developing step and a step in contact with an organic solvent which will be described later.
However, not all ink repellent agents are fixed, but ink repellent agents have been developed that have been devised in terms of composition and structure so that they are fixed. For example, the ink repellent agents disclosed in Patent Document 8, Patent Document 9, and Patent Document 10 are those.
・ Figure 2 (d)
Development is performed with the developer i.
・ Figure 2 (e)
Wash with water and dry. Thereby, a desired pattern of the black matrix material f is obtained.

This method does not require a new process and is the best method for requesting cost reduction. And recently it has been considerably studied. In the present invention, this method is called an ink repellent addition method.
Note that the contact angle with respect to the ink-jet ink required for making the upper surface of the black matrix partition ink repellent varies greatly depending on the height of the partition wall and the amount of ink to be filled, but the ink solid content ratio is about 30%. If it is the limit of ink, it may be about 35 degrees. If a normal ink repellent agent is used, such a contact angle can be obtained to some extent easily.

  However, even in the photolithography method in which an ink repellent agent is added to the above BM material, since the process is complicated and an expensive apparatus is used, still another low cost forming method is required. One of the low-cost methods for producing a black matrix is a method using an intaglio transfer method using a backside exposure method. For example, it is the method described in Patent Document 11. This intaglio transfer method will be described with reference to FIG.

・ Figure 3 (a)
The intaglio used in this intaglio transfer method is one that can be exposed on the backside, and this intaglio plate for intaglio transfer method that can be exposed on the backside is provided on a backside exposure light transmissive substrate k with a back exposure light transmissive release plate. The mold layer 1 and the light-shielding film m having releasability are provided. A portion without the light shielding film m is a desired black matrix pattern.
・ Figure 3 (b)
First, a photosensitive black matrix material n is applied to an intaglio plate for intaglio transfer method.
・ Figure 3 (c)
Next, back exposure h is performed, and the black matrix material n filled in the portion without the light shielding film m is cured.
・ Figure 3 (d)
Next, the black matrix material n on the light shielding film m is removed by developing by spraying the developing solution i or the like.
・ Figure 3 (e)
The color filter substrate d and the intaglio plate j for intaglio transfer method that has completed the process of FIG. 3D are overlapped with a transparent photosensitive solventless adhesive o sandwiched between them, and the color filter substrate d side To the exposure h to cure the adhesive o.
・ Figure 3 (f)
When the color filter substrate d is peeled off, the black matrix material n is transferred to the color filter substrate d side via the photosensitive solvent-free adhesive o.

  The advantage of this method is that an expensive exposure machine necessary for the photolithography method is not required, and there is no variation in the height of the black matrix between the color filter substrates. When a black matrix is formed by this method and used as a black matrix partition for ink jet inking, it is necessary to make the black matrix ink repellent. As the method, as described above, the method such as the method of Patent Document 3 can be used, but the manufacturing cost increases because the process is increased.

  On the other hand, when the method as shown in FIG. 2 is applied using an ink repellent that floats (deposits) on the surface as disclosed in Patent Document 8, Patent Document 9, and Patent Document 10, A problem occurs. That is, in FIG. 3, the ink repellent agent is added to the black matrix material, mixed, and then applied to the transfer plate in the step of FIG. In the next FIG. 3 (b) solvent drying step, the ink repellent agent will be raised on the upper surface.

  If a method using a black matrix formed by a normal photolithography method is used, there is no problem because the ink repellent agent is deposited on the upper surface of the black matrix. However, when the black matrix is formed by the transfer method, in FIG. 3B, the ink repellent agent is deposited on the upper surface and not on the interface with the release layer which is the bottom surface. Therefore, in FIG. 3F, since there is no ink repellent agent on the upper surface of the black matrix, it cannot be used as a partition wall during ink jet inking.

  Therefore, the inventors formed a partition-like ink-repellent color filter black matrix on the color filter substrate by an intaglio transfer method using a method of adding an ink repellent to the black matrix material, Preferably, it was studied that a partition-like black matrix having an ink repellency on the upper surface of the partition wall and an ink-philic side surface was formed on the color filter substrate.

  That is, it is only necessary that the ink repellent agent is segregated at the interface with the intaglio. One possible method is to use a fluororesin on the surface of the transfer intaglio. There is a page of Modiper F / FS series, which is a kind of ink repellent, in the product introduction column of the homepage of Nippon Oil & Fats Co., Ltd. In the section of “Surface orientation of Modiper F / FS series”, acrylic The result of examining the surface orientation of a film prepared by adding Modiper F to a polymer and applying it to a Teflon (registered trademark) plate is described. According to the result, the water repellent (ink repellent) segment of the Modiper F not only migrates (segregates) to the air side, but also migrates (segregates) to the surface in contact with the Teflon (registered trademark) plate. That is, it can be said that the surface of the fluororesin has an action of inducing segregation of the Modifier F to the contact surface. Therefore, if a transfer intaglio with a fluororesin surface layer is prepared and BM is formed by a transfer method, the Modiper F added to the black matrix material should segregate on the upper surface of the black matrix.

Regarding the segregation phenomenon, it is generally described that the fluororesin-based additive has a property of shifting to a surface having a low surface energy as long as it can move in the added resin. Modiper F is a fluorine-based additive, and since the surface energy of Teflon (registered trademark) is low, the reason for segregation is considered to be the same.
However, as a practical matter, the black matrix pattern of the color filter is very fine with a width of 20 μm or less and a thickness of 2 to 4 μm or less. On the other hand, there is a liquid crystal television with a size of 40 inches or more. The filter is formed on a large glass plate having a size of about 2000 mm square by multiple imposition. It is quite difficult to obtain a transfer intaglio with such specifications by surface processing of a fluororesin plate.
JP-A-10-206627 Japanese Patent Laid-Open No. 11-127327 JP 2002-22933 A JP-A-9-203803 Japanese Patent Laid-Open No. 9-230127 Japanese Patent Laid-Open No. 9-230129 JP 2005-173324 A JP 2004-45910 A JP 2004-177948 A JP 2005-60515 A Japanese Patent No. 3323677

  Therefore, the problem to be solved by the present invention is an intaglio used for the intaglio transfer method, which is prepared by a method other than the surface processing of a fluororesin plate, and is filled with a curable material to which an ink repellent material is added. Then, when cured, a low cost intaglio transfer plate is obtained in which the ink repellent material is segregated on the surface of the curable material in contact with the surface of the intaglio plate. More preferably, the upper surface of the partition wall of the ink-repellent black matrix made of the transfer intaglio is ink-repellent, and the side surface of the partition wall or the bottom surface portion surrounded by the partition wall is ink-philic. It is to provide materials and means.

As a result of intensive studies, the inventors of the fluororesin-based additive and silicone resin-based additive have the property of moving to the air surface, not only moving to the fluororesin surface, but also to the silicone resin surface. Even found to move. Further, it has been found that a block copolymer or graft copolymer containing a fluororesin or a silicone resin and imparting curability to the cured surface has a similar movement inducing action.
Furthermore, by using a material that segregates on the surface (α), which is a fluororesin-based additive or silicone resin-based additive used as an ink repellent additive, When the curable material X added with the ink repellent agent (β) having the property of shifting to is placed on the surface and cured, the ink repellent material (β on the surface of the material X corresponding to the surface on which α is deposited on the surface. ) Was segregated. Furthermore, it has been found that whether α is a fluororesin ink repellent or a silicone resin ink repellent induces segregation of the ink repellent β on the surface of the corresponding material X. That is, it was found that the surface on which the fluorine-based additive or the silicone resin-based additive segregated has a segregation-inducing action of the fluororesin-based ink repellent and the silicone resin-based ink repellent.
Any material having the above segregation inducing action has a low surface energy. The surface energy is said to be proportional to the critical surface tension. Therefore, it can be said that a material surface having a low critical surface tension has an effect of inducing the above-mentioned segregation. By applying this, the present invention has been achieved.
That is, the said subject is solved by providing the following materials and means.

(Claim 1)
The invention according to claim 1 is a method for forming a light-shielding partition, wherein the method for forming an ink-repellent light-shielding partition used for forming a color filter by an inkjet method includes at least the following steps. The present invention is provided to solve the above problems.
(1) Add either a fluororesin-based additive or a silicone-resin-based additive that has a property of shifting to a surface with low free energy to the black matrix light-shielding material of the backside exposure curable color filter, or a mixture. Step A for preparing a black matrix material.
(2) Black matrix material
Fill the transfer intaglio with a liquid state to which the ink repellent agent has been added, then contact the intaglio plate for transfer and segregate the ink repellent agent on the surface of the intaglio plate for transfer. Adhere after the transfer material is cured or solidified. The intaglio plate for transfer used in an intaglio transfer method for forming a desired object made of the transfer material on the transferred material side by peeling off the transferred material overlapped via an agent,
At least a portion of the surface layer of the printing plate,
A block copolymer or graft copolymer containing a fluororesin content or a silicone resin content, and comprising a substance capable of imparting photocurability,
Or
The silicone resin additive or fluororesin additive segregates on the surface of the layer made of a liquid curable material to which the silicone resin additive or fluororesin additive is added, and the layer of the curable material becomes Cured by a prescribed heat treatment
And
Intaglio plate for transfer having an action of inducing segregation to the ink repellent agent added to the transfer material in contact with the portion of the surface layer.
B process apply | coated.
(3) C step of curing the black matrix material filled in the recesses of the transfer intaglio to a predetermined thickness by backside exposure.
(4) D step of forming an ink repellent partition pattern for the black matrix of the color filter by removing uncured portions of the black matrix material by washing with a developer.
(5) E process of pressing the transparent substrate for color filter and the intaglio for transfer facing each other with a transparent solvent-free UV curable adhesive sandwiched between the transparent substrate for color filter and the intaglio for transfer .
(6) F step of curing the solvent-free curable adhesive by irradiating UV from the color filter substrate side.
(7) G step of peeling off the color filter substrate and the transfer intaglio and transferring the ink-repellent partition pattern for the black matrix of the color filter to the color filter substrate side through an adhesive.

  According to the present invention, it is possible to form an ink-repellent partition wall by the intaglio transfer method by utilizing the segregation of a certain type of ink repellent agent on the surface of low critical surface tension and devising the structure of the intaglio plate for transfer. It became.

Next, the present invention will be described based on the embodiments shown in FIGS. In addition, the part which a structure overlaps with a prior art example attaches | subjects the same code | symbol, and abbreviate | omits the description.
・ Figure 4 (a)
In this figure, the basic structure of the intaglio plate 1 for transfer is shown, and the portion having no light-shielding layer, which is light-transmitting on the backside, forms a light-shielding barrier with an ink repellent upper surface. It is a part to do. The manufacturing method and materials of the intaglio 1 for transfer will be described later. This transfer intaglio 1 has a light-shielding layer 3 on a glass substrate 2, a back-exposure light transmitting property between the light-shielding layers 3, and a low critical surface tension layer 4 as an ink repellency inducing layer. It is a structure.
・ Figure 4 (b)
A black matrix material 6 (solution) to which a fluororesin-based additive and a silicone resin-based additive (ink-repellent agent) having the property of transferring and segregating to the low critical surface tension layer 4 as the ink repellent agent 5 is added to the intaglio plate 1 for transfer. To fill. A point (a spotted pattern portion) of the black matrix material 6 indicates the ink repellent agent 5. FIG. 4B is immediately after filling, and the ink repellent agent 5 is uniformly distributed throughout the black matrix material 6.
・ Figure 4 (c)
The intaglio plate for transfer 1 having the black matrix material 6 is allowed to stand for a predetermined temperature and time, the solvent is volatilized from the black matrix material 6, and the ink repellent agent 5 in the black matrix material 6 faces the air. And the black matrix material surface in contact with the low critical surface tension layer 4 on the bottom surface of the concave portion of the transfer intaglio 1.
・ Figure 4 (d)
Next, back exposure h is performed, and the black matrix material 6 is cured to a predetermined thickness.
・ Figure 4 (e)
Development with the developer i removes the uncured black matrix material 6. At that time, the ink repellent agent 5 on the surface in contact with the air surface is removed.

・ Figure 5 (f)
Along with the color filter substrate d, the solventless UV curable transparent adhesive 7 is sandwiched and pressed between them. The solventless UV curable transparent adhesive 7 used in this step is a photosensitive solventless visible light transparent adhesive. Examples of the adhesive 7 include a photosensitive solventless color filter adhesive mainly composed of a resin, a dilution monomer, and a photosensitizer, and the resin has an ethylenically unsaturated group and a carboxyl group. Although it is an acryl-type copolymer, a thermosetting component, an additive, etc. are used as needed.
・ Figure 5 (g)
Exposure h is performed from the color filter substrate d side to cure the adhesive 7.
・ Figure 5 (h)
When the transfer intaglio 1 and the color filter substrate d are peeled off, the partition made of the target black matrix material 6 and having an ink repellent upper surface is transferred to the color filter substrate d side.

  Examples of substances having a low critical surface tension other than the fluororesin in the layer 4 include silicone resins including silicone rubber, and actual materials include, for example, those of varnish baking type among those called release silicones (Toshiba Silicone YSR6209, etc.) , And curable silicone rubber (Toshiba Silicone TSE2211, TSE392, TSE3503, TUV6001). There are also acrylic-silicone resins, and actual materials include PER3.0 (Nippon Paint), Saimak US-270, etc. (Toagosei).

  A fluororesin-based additive and a silicone-resin-based additive having the property that the added substance migrates and segregates on the surface in contact with air has the action of reducing the critical surface tension of the segregated portion. So it can be used. From the internally added fluororesin type and the silicone resin type, those having a tendency to shift to a surface having a low free energy, that is, a surface having a low critical surface tension, can be selected and used. Most of the internally added types that are currently used have a strong tendency to migrate to the surface and can be selected and used. For example, examples of the fluororesin-based additive include Modiper F, (manufactured by NOF Corporation), GM-101, etc. (Daikin). Examples of silicone resin-based additives include Modiper FS-710 (Nippon Yushi) and OPTO ER R-065 (Nippon Paint). Among these, those described in JP-A-2004-45910, JP-A-2004-177948, and JP-A-2005-60515 are preferable because they do not bleed.

  A material suitable as a resin to which these fluororesin additives and silicone resin additives are added is a UV curable acrylic resin material. As an actual material, when the final use is to form a partition for a color filter, an acrylic resin-based material used for the color material ink of the color filter is preferable from the viewpoint of impurities. These additives can adjust the strength of the segregation-inducing action by adjusting the addition amount.

  As a material exhibiting ink repellency, a substance having an action of segregating when it comes into contact with a surface having a low critical surface tension and reducing the surface tension of the portion is used. That is, the fluororesin-based additive and the silicone resin-based additive according to claim 1 that have a property of segregating on the air surface can be used. The temperature and time required to contact the plate to induce segregation vary depending on the type of additive, the added material and thickness, and must be determined by experiment. Basically, the added material ( When the thickness is about several μm at a temperature equal to or higher than the softening point of the resin, it takes about 20 minutes. In the case of a solution state, it takes about several minutes.

  Examples of the block copolymer containing a silicone resin include OPTO ER R-065 (Nippon Paint), and examples of the graft polymer include Cymax (Toagosei). Some of them have been imparted with photocurability and are suitable for producing an intaglio using a photolithographic method. Some have imparted heat curability, but a matrix is used to form the intaglio.

The predetermined heat treatment in claim 1 refers to a temperature and time for inducing segregation by contacting the intaglio 1 for transfer.
The silicone resin-based additive and the fluororesin-based additive are the materials described in the description of claim 1. That is, fluororesin-based additives and silicone-resin-based additives that have the property that the added substance migrates and segregates on the surface in contact with air have the effect of reducing the critical surface tension of the segregated portion. Can be used. From the internally added fluororesin type and the silicone resin type, those having a tendency to shift to a surface having a low free energy, that is, a surface having a low critical surface tension, can be selected and used. Most of the internally added types that are currently used have a strong tendency to migrate to the surface and can be selected and used. For example, examples of the fluororesin-based additive include Modiper F, (manufactured by NOF Corporation), GM-101, etc. (Daikin). Examples of silicone resin-based additives include Modiper FS-710 (Nippon Yushi) and OPTO ER R-065 (Nippon Paint). Among these, those described in JP-A-2004-45910, JP-A-2004-177948, and JP-A-2005-60515 are preferable because they do not bleed.

  A material suitable as a resin to which these fluororesin additives and silicone resin additives are added is a UV curable acrylic resin material. As an actual material, when the final use is to form a partition for a color filter, an acrylic resin-based material used for the color material ink of the color filter is preferable from the viewpoint of impurities. These additives can adjust the strength of the segregation-inducing action by adjusting the addition amount.

  As a material exhibiting ink repellency, a substance having an action of segregating when it comes into contact with a surface having a low critical surface tension and reducing the surface tension of the portion is used. That is, the fluororesin-based additive and the silicone resin-based additive according to claim 1 that have a property of segregating on the air surface can be used. The temperature and time required to contact the plate to induce segregation vary depending on the type of additive, the added material and thickness, and must be determined by experiment. Basically, the added material ( When the thickness is about several μm at a temperature equal to or higher than the softening point of the resin, it takes about 20 minutes. In the case of a solution state, it takes about several minutes.

  Examples of the block copolymer containing a silicone resin include OPTO ER R-065 (Nippon Paint), and examples of the graft polymer include Cymax (Toagosei). Some of them have been imparted with photocurability and are suitable for producing an intaglio using a photolithographic method. Some have imparted heat curability, but a matrix is used to form the intaglio.

Being transparent to the backside exposure light means that when a glass substrate for a color filter is used as a transfer intaglio substrate, light having a wavelength that passes through the glass plate is transmitted. It is not necessary to transmit 100%, and it is sufficient that the transmittance is such that the material filled in the recess can be cured to a required thickness. Further, since the thickness of the bottom portion is about several μm, the transmittance of the glass substrate is more dominant. Therefore, even if it is said to be UV light transmissive, short wavelength UV that is not transmitted by the glass substrate is excluded. When a glass plate for a color filter is used as a substrate, an ultrahigh pressure mercury lamp or a metal halide lamp is preferable as a light source used for backside exposure.
The back exposure light shielding property is a light shielding property against light having a wavelength that passes through the glass substrate, and an optical density of at least D = 2.0 is required, and preferably D> 3.0. As an actual material, a material for forming a black matrix of a color filter by a photolithography method can be used. As such a material, for example, an acrylic resin type or a cardo resin type is made photosensitive curable, and a carbon black or oxidized powder is mixed as a light shielding material.
Examples of the black matrix material used in the normal photolithography method include black matrix materials described in Patent Document 6 and Patent Document 7, and can be used in the present invention.

  As the curable resin containing the back-exposed light transmissive silicone resin, the resin described in the description of claim 1 can be used. The silicone resin is transparent and has UV light transmittance. Many silicone resins are mixed with silica powder to reinforce strength deficiencies, but silica powder is transparent and excellent in UV light transmission, so it can be used. The fluororesin is also transparent and can be used because it transmits UV light. Furthermore, since the acrylic resin is also transparent and has UV light transmittance, an acrylic-silicone resin type or an acrylic-fluorine resin type can also be used. Moreover, since the fluororesin-based additive and the silicone resin-based additive are also transparent and have UV light transmission properties, they can be used by adding to an acrylic resin.

A method for manufacturing the transfer intaglio 1 will be described below with reference to FIG.
-Fig. 6 (a) (b)
On the entire surface of the glass substrate 2, there is provided a layer 4 which is transparent to the backside exposure light and whose surface has a low critical surface tension. The layer 4 is formed by applying an acrylic resin-based photosensitive material to which a fluororesin-based or silicone resin-based additive (ink-repellent agent 5) is added, dried, and exposed and cured. Form. As an actual material, it is preferable to use a transparent photosensitive curable acrylic resin material obtained by removing the color material from the color material ink for the color filter because there is little problem of impurity contamination. A dry thickness of about several μm is sufficient.
・ Figure 6 (c)
In order to obtain the light shielding layer 3, first, a photosensitive light shielding material 3a (for example, a black matrix material for photolithography) is applied. When the ink repellency of the lower layer 4 is strong and difficult to apply, an appropriate leveling agent is selected and applied to the light shielding material. As a coating method, a method used when forming a black matrix by a photolithography method, for example, a slit coat is used.
・ Figure 6 (d)
Pattern exposure h is performed using a photomask g whose black matrix portion is a light shielding portion.
・ Figure 6 (e)
Development is performed using a predetermined developer i. At that time, if the light shielding material is peeled off from the lower surface layer, the whole is heat-treated before development to increase the adhesive force.
・ Figure 6 (f)
The intaglio 1 for transfer provided with the light shielding layer 3 and the low coastal surface tension layer 4 is completed by drying and heat treatment. However, when the releasability of the light shielding layer 3 is insufficient, the following steps are performed to improve the releasability of the light shielding material in the light shielding layer 4.

・ Figure 7 (g)
A curable release layer material 8 (for example, a transparent photosensitive curable acrylic resin material obtained by removing the color material from the color material ink for the color filter) is applied to the entire surface of the transfer intaglio 1 and cured. The thickness of the obtained release layer 9 may be about 0.01 to 0.3 μm.
FIG. 7 (h) (i)
A solventless photosensitive adhesive 7 is sandwiched between the glass plate 10 and the transfer intaglio 1 and cured by irradiating UV from the glass plate 10 side. As the adhesive 7, for example, the one described in JP 2000-136354 A is used.
・ Figure 7 (j)
When the glass plate 10 is peeled off from the transfer intaglio 1, the release layer 9 made of the release material 8 on the bottom surface of the recess of the transfer intaglio 1 has a low adhesive force with the lower critical surface tension layer 4. Then, it is peeled off from the interface and transferred to the adhesive 7 side. As a result, the bottom surface becomes the layer 4 having a low critical surface tension. On the other hand, in the portion of the light shielding layer 3, the adhesive force between the light shielding layer 3 and the release layer 9 is higher than the adhesive force at the interface between the release layer 9 and the adhesive 7. Peel from the interface.
Through the above steps, it is possible to only the bottom surface to obtain a transfer intaglio 1 is a lower critical surface tension.

A method for producing the intaglio plate for transfer 1 in which the surface portion having a low critical surface tension is the bottom surface of the recess and the side surface of the recess will be described below with reference to FIG.
・ Figure 8 (a)
The light shielding layer 3 is formed on the glass substrate 2 by a normal photolithography method. The dry thickness of the light shielding layer 3 is the required height of the black matrix partition + the thickness of the low critical surface tension layer 4 at the bottom of the recess.
・ Figure 8 (b)
A curable release material 8 is applied to the entire upper surface so as to cover the glass substrate 2 and the light shielding layer 3, and this is cured to form a release layer 9. The curable release material 8 used for obtaining the release layer 9 may be the one used for the transfer intaglio 1 described above . The thickness of the release layer 9 may be about 0.01 to 0.3 μm. This step is not necessary when the light shielding layer 3 has releasability.
・ Figure 8 (c)
Further, a low critical surface tension is exhibited on the entire upper surface so as to cover the release layer 9 (so as to cover the glass substrate 2 and the light shielding layer 3 when the release layer 9 is not provided) with a back exposure light transmittance. The UV curable material 11 to be applied is applied in layers. As the UV curable material 11, for example, a material obtained by removing a color material component from a color material ink of a color filter and adding an additive (ink repellent agent) having a fluororesin surface mobility is used. it can. After the additive (ink repellent) is added and the solvent is volatilized from the UV curable material 11 coated in layers on the entire upper surface, the fluororesin additive is segregated on the surface by heat treatment at a predetermined temperature and time. Then, the UV curable material 11 whose surface is a surface of low critical surface tension is formed in a layered form on the entire surface.
・ Figure 8 (d)
The glass substrate 2 in the above-described configuration having the UV curable material 11 on the entire upper surface side is exposed to the rear surface h to cure the layer of the UV curable material 11 applied in FIG. Note that not only the bottom surface of the recess but also the side surface of the recess is cured on the glass substrate 2. Thereby, a layer of the UV curable material 11 is formed in the recess. Since the light shielding layer 3 serves as a mask, the layer of the UV curable material 11 corresponding to the light shielding layer 3 is not cured.
・ Figure 8 (e)
The layer of the UV curable material 11 in the uncured portion is removed with a developer by development.
・ Figure 8 (f)
Next, heat treatment is performed to increase the adhesive strength between the layers, and the transfer intaglio 1 is completed.

  When a black matrix partition is formed by the above-described method using the transfer intaglio 1, not only the upper surface of the partition but also the black matrix portion on the side surface of the partition becomes ink repellent.

  Further, as shown in FIG. 9, in the intaglio plate for transfer 1, the surface portion having a low critical surface tension (low critical surface tension layer 4) can be the entire plate surface to which the transfer material faces. When a black matrix partition is formed using this transfer intaglio, not only the top surface of the partition but also the black matrix portion on the side surface of the partition becomes ink repellent.

  In addition, although the formation of the ink-repellent black matrix has been described as an application of the present invention, it is used for forming an ink-repellent surface by the intaglio transfer method even in other applications. be able to.

  (1) A Teflon (registered trademark) plate obtained by adding 3% (solid fraction of resin content) of GM101 manufactured by DAINK and F-200 manufactured by NOF Corporation to the black matrix material for photolithography It was applied to the substrate, dried by solvent, and then cured by exposure. The cured film was peeled off, and the ink repellency of the surface in contact with the Teflon (registered trademark) plate was determined by measuring the contact angle with the ink solvent. The results are shown in Table 1.

From this result, it can be said that the added GM101 and F-200 exist not only on the surface in contact with air but also on the surface in contact with the Teflon (registered trademark) plate.
In general, it is difficult to apply a solvent to a Teflon (registered trademark) plate, but when an ink repellent agent is added to a solution as in this example, the surface tension is lowered to enable application. If it is still difficult to apply, a leveling material is added.

  (2) Instead of a Teflon (registered trademark) plate, an OPTO ER E100 manufactured by Nippon Paint Co., Ltd. (a polymer obtained by imparting photosensitivity to an acrylic-silicone resin block polymerized polymer) was applied to a glass substrate, and an exposed and cured film was obtained. Using. This film was coated with 3% GM101 added to the photolithographic black matrix material used in (1), and the back surface was exposed after volatilizing the solvent in the same manner as in (1). That is, it was backlit from the glass substrate side. The cured film was peeled off, and the contact angle of the ink with respect to the solvent was measured as in (1). The results are shown in Table 2.

From the results in Table 2, it can be said that the cured film of OPTO ER E100 has the same effect as that of a Teflon (registered trademark) plate, that is, the effect that the ink repellent agent added to the black matrix material exists on the contact surface.
When a color filter is formed by filling ink between black matrix partition walls with an ink jet device, the ink repellency required for the partition wall may be 30 degrees as a contact angle with respect to the solvent of the ink. Therefore, by forming a partition wall by the above method, it can be used as a partition wall when a color filter is formed by an inkjet method.

(3) A transfer intaglio for forming black matrix barrier ribs was prepared using the method shown in FIGS. As the bottom release layer 4, the material and method used in (2) were used. As the light shielding layer 3a, a black matrix material for photolithography was used. Further, as the release layer material 8, a photosensitive curable acrylic resin material obtained by removing the color material component from the color material ink of the color filter was used.
Using this plate, partition walls of a black matrix material were formed by the intaglio transfer method shown in FIG. The ink repellent material added to the black matrix material was GM101, and the solid fraction was similarly added at 3%. The contact angle of the formed black matrix partition was 30 degrees. When this was heat-treated at 200 ° C. for 10 minutes, the contact angle of the ink-jet color filter with respect to the solvent of the ink increased to 50 degrees.
Color ink was filled using an ink jet device. Although the prescribed amount was filled, there was no overflow over the partition wall.

It is explanatory drawing which shows the state which filled the ink between the whole surface ink-repellent partition on the conventional color filter board | substrate, and the upper surface ink-repellent partition. It is explanatory drawing which shows formation of the conventional ink repellent partition. It is explanatory drawing which shows the formation method of a black matrix by the conventional intaglio transfer method. It is explanatory drawing which shows an example of the formation method of the light-shielding partition which concerns on this invention. It is explanatory drawing which shows an example of the formation method of the light-shielding partition wall similarly concerning this invention. It is explanatory drawing which shows preparation of the intaglio for transcription | transfer used in this invention. It is explanatory drawing which shows creation of the intaglio for transcription | transfer similarly used in this invention. It is explanatory drawing which shows creation of the intaglio for transcription | transfer similarly used in this invention. It is explanatory drawing which shows creation of the intaglio for transcription | transfer similarly used in this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Transfer intaglio 2 ... Glass substrate 3 ... Light-shielding layer 3a ... Light-shielding material 4 ... Low critical surface tension layer 5 ... Ink repellent agent 6 ... Black matrix material 7 ... Solvent-free UV curing transparent adhesive 8 ... Curing release Layer material 9 ... Release layer 10 ... Glass substrate 11 ... Back side transmitted light Light transmissive UV curable material with low critical surface tension

Claims (1)

A method for forming a light-shielding partition, wherein a method for forming an ink-repellent light-shielding partition used for forming a color filter by an inkjet method includes at least the following steps.
(1) Add either a fluororesin-based additive or a silicone-resin-based additive that has a property of shifting to a surface with low free energy to the black matrix light-shielding material of the backside exposure curable color filter, or a mixture. Step A for preparing a black matrix material.
(2) Black matrix material
Fill the transfer intaglio with a liquid state to which the ink repellent agent has been added, then contact the intaglio plate for transfer and segregate the ink repellent agent on the surface of the intaglio plate for transfer. Adhere after the transfer material is cured or solidified. The intaglio plate for transfer used in an intaglio transfer method for forming a desired object made of the transfer material on the transferred material side by peeling off the transferred material overlapped via an agent,
At least a portion of the surface layer of the printing plate,
A block copolymer or graft copolymer containing a fluororesin content or a silicone resin content, and comprising a substance capable of imparting photocurability,
Or
The silicone resin additive or fluororesin additive segregates on the surface of the layer made of a liquid curable material to which the silicone resin additive or fluororesin additive is added, and the layer of the curable material becomes Cured by a prescribed heat treatment
And
B process applied to the intaglio plate for transfer , which has a segregation inducing action to the ink repellent agent added to the transfer material in contact with the portion of the surface layer .
(3) C step of curing the black matrix material filled in the recesses of the transfer intaglio to a predetermined thickness by backside exposure.
(4) D step of forming an ink repellent partition pattern for the black matrix of the color filter by removing uncured portions of the black matrix material by washing with a developer.
(5) E process of pressing the transparent substrate for color filter and the intaglio for transfer facing each other with a transparent solvent-free UV curable adhesive sandwiched between the transparent substrate for color filter and the intaglio for transfer .
(6) F step of curing the solvent-free curable adhesive by irradiating UV from the color filter substrate side.
(7) G step of peeling off the color filter substrate and the transfer intaglio and transferring the ink-repellent partition pattern for the black matrix of the color filter to the color filter substrate side through an adhesive.

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