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JP4956151B2 - Light emitting element - Google Patents
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JP4956151B2 - Light emitting element - Google Patents

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JP4956151B2
JP4956151B2 JP2006312698A JP2006312698A JP4956151B2 JP 4956151 B2 JP4956151 B2 JP 4956151B2 JP 2006312698 A JP2006312698 A JP 2006312698A JP 2006312698 A JP2006312698 A JP 2006312698A JP 4956151 B2 JP4956151 B2 JP 4956151B2
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明 坪山
洋平 岩▲崎▼
和則 上野
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Description

本発明は、有機化合物を用いた発光素子に関するものである。   The present invention relates to a light emitting element using an organic compound.

有機EL素子は、陽電極と陰電極に電圧を印加し、電極からキャリア(ホールと電子)を有機層に高効率で注入するプロセスが高効率発光に重要である。そのため、高い性能をもつキャリア注入材料が望まれている。   In the organic EL element, a process of applying a voltage to the positive electrode and the negative electrode and injecting carriers (holes and electrons) from the electrode to the organic layer with high efficiency is important for high efficiency light emission. Therefore, a carrier injection material having high performance is desired.

電子注入材料としては、アルミリチウム合金(AlLi)、マグネシウム銀合金(AgMg)及びフッ化リチウムなど還元性の高い金属を含む無機化合物が利用されている。しかしながらこれらの化合物は、反応性が高く空気中に不安定で取り扱いにくく、さらに、有機EL素子の発光の安定性が悪いなどの問題があった。   As the electron injection material, an inorganic compound containing a highly reducible metal such as an aluminum lithium alloy (AlLi), a magnesium silver alloy (AgMg), or lithium fluoride is used. However, these compounds have high reactivity, are unstable in the air, are difficult to handle, and have problems such as poor light emission stability of the organic EL element.

ホール注入材料の代表例としては、銅フタロシアニン(非特許文献)があげられる。銅フタロシアニンは、ホール注入性を改善するが、可視光領域に吸収があり発光層からのEL発光を吸収してしまう問題がある。また、銅フタロシアニンは、Cuイオンに局在化したラジカルを有する。銅フタロシアニンの酸化する性質は主に配位子であるフタロシアニンの性質が支配しており、Cuイオンのラジカルは酸化する性質を支配してはいない。 A typical example of the hole injection material is copper phthalocyanine (Non-Patent Document 1 ). Copper phthalocyanine improves hole injectability, but has a problem of absorption in the visible light region and absorption of EL light emission from the light emitting layer. Copper phthalocyanine has a radical localized to Cu ions. The property of copper phthalocyanine that oxidizes is mainly governed by the property of phthalocyanine, which is a ligand, and the radical of Cu ions does not dominate the property of oxidation.

最近、非特許文献に特定の構造のニッケル錯体を有機トランジスターの活性層に用いる研究が発表された。このニッケル錯体は、配位子にラジカルを持つため電気化学的に活性であり、酸化還元が容易に行われる。真空蒸着によって作成した膜をトランジスターに用いることで、良い性能のトランジスターを得ている。しかしながら、トランジスター内でのキャリア輸送性に関する記載はあるが、本発明のような有機LEDへの応用例は記載が無い。 Recently, Non-Patent Document 2 published a study using a nickel complex having a specific structure for an active layer of an organic transistor. Since this nickel complex has a radical in the ligand, it is electrochemically active and oxidation / reduction is easily performed. A transistor with good performance is obtained by using a film formed by vacuum deposition for a transistor. However, although there is a description regarding carrier transportability in the transistor, there is no description about an application example to the organic LED as in the present invention.

Coordination Chemistry Reviews, 171, 161−174 (1998)Coordination Chemistry Reviews, 171, 161-174 (1998) Journal of American Chemical Society (ASAP DOI No. 10.1021/ja052663s)Journal of American Chemical Society (ASAP DOI No. 10.1021 / ja052663s)

本発明は、高発光効率を実現できるキャリア注入材料を提供し、高発光効率の発光素子を提供することを目的とする。   An object of the present invention is to provide a carrier injection material capable of realizing high luminous efficiency, and to provide a light emitting element with high luminous efficiency.

即ち、本発明の発光素子は、2つの電極間に発光層と発光層以外の層を有する発光素子において、前記発光層以外の層は下記一般式(2)または(6)のいずれかで示される金属配位化合物を有し、前記発光層以外の層は前記2つの電極のいずれか一方と接することを特徴とする。

Figure 0004956151
[Mは、NiまたはPtである。
Rは水素原子である。
nは2である。
式(2)および(6)において、配位子中のCH基の水素原子はtert−ブチル基に置換されてもよい。
・はラジカルを表す。] That is, the light-emitting element of the present invention is a light-emitting element having a light-emitting layer and a layer other than the light-emitting layer between two electrodes, and the layer other than the light-emitting layer is represented by either of the following general formulas (2) or (6). have a metal coordination compound, a layer other than the light emitting layer is characterized by contacting the either one of the two electrodes.
Figure 0004956151
[M is Ni or Pt.
R is a hydrogen atom.
n is 2.
In the formulas (2) and (6), the hydrogen atom of the CH group in the ligand may be substituted with a tert-butyl group.
-Represents a radical. ]

本発明の金属配位化合物は、高発光効率・高安定性・低コストであり、有機EL素子のキャリア注入層に有用である。そのため、本発明の発光素子は、高発光効率を示す。   The metal coordination compound of the present invention has high luminous efficiency, high stability, and low cost, and is useful for a carrier injection layer of an organic EL device. Therefore, the light-emitting element of the present invention exhibits high light emission efficiency.

以下、本発明について詳細に説明する。   Hereinafter, the present invention will be described in detail.

まず、本発明で用いる金属配位化合物の特徴を、以下に示すニッケル金属配位化合物(8)を例にとって説明する。   First, the characteristics of the metal coordination compound used in the present invention will be described using the nickel metal coordination compound (8) shown below as an example.

Figure 0004956151
Figure 0004956151

この配位化合物のニッケルイオンは形式電荷が2価(Ni(II))で、2つのマイナス一価の2座配位子により錯体全体で中和されている。Ni(II)は、通常平面4配位構造を取り、この錯体も平面構造を持っている。   The nickel ion of this coordination compound has a formal charge of divalent (Ni (II)) and is neutralized in the whole complex by two minus monovalent bidentate ligands. Ni (II) usually has a planar four-coordinate structure, and this complex also has a planar structure.

特徴的なのは、配位子がラジカルをもっていることであり、この配位子中のラジカルの存在のために、(a)バンドギャップが非常に狭く(1.01eV)、(b)電気化学的に活性で酸化還元が容易に行われる。化学構造式(8)中のラジカルは、種々の共鳴構造が存在するため、配位子全体に非局在化している。その共鳴構造は以下の構造式で表される。   What is characteristic is that the ligand has a radical, and due to the presence of the radical in this ligand, (a) the band gap is very narrow (1.01 eV), (b) electrochemically. It is active and easily oxidized and reduced. The radical in the chemical structural formula (8) is delocalized throughout the ligand because of various resonance structures. The resonance structure is represented by the following structural formula.

Figure 0004956151
Figure 0004956151

この式から理解されるように、化学構造式(8)中の配位子は、形式的にマイナス1価で一つのラジカルを持っており、そのラジカルとマイナス1価の電荷は、配位子に非局在化している。   As understood from this formula, the ligand in the chemical structural formula (8) is formally minus monovalent and has one radical, and the radical and minus monovalent charge are Is delocalized.

さらに、金属配位化合物の構造式も幾つかの共鳴構造を有し、その中の一部を以下に示す。   Furthermore, the structural formula of the metal coordination compound also has several resonance structures, some of which are shown below.

Figure 0004956151
Figure 0004956151

上記式中、一番左の構造式は、上のラジカルを含む配位子の共鳴構造式の代表例を書いたものである。   In the above formula, the leftmost structural formula is a representative example of the resonance structural formula of the ligand containing the above radical.

従って、後述する一般式(1)乃至(7)に示す化学構造式は、共鳴構造の一つを便宜的に示したものである。   Therefore, the chemical structural formulas shown in the general formulas (1) to (7) described later show one of the resonance structures for convenience.

本発明の金属配位化合物の電子状態の詳細に関しては、Journal of American Chemical Society,125,10997−11005(2003)に記載がある。Ni、Pd、Ptなどの金属配位化合物は合わせて2つのラジカルを持つが、互いにスピンが反平行であり基底状態は一重項である。そのため、これらの化合物は反磁性である。   The details of the electronic state of the metal coordination compound of the present invention are described in Journal of American Chemical Society, 125, 10997-11005 (2003). Metal coordination compounds such as Ni, Pd, and Pt have two radicals in total, but their spins are antiparallel to each other, and the ground state is singlet. Therefore, these compounds are diamagnetic.

Ni、Pd,Pt、Cuは2つの2座配位子が平面的に配位するが、一方、Co、Rh、Irは3つの2座配位子がオクタヘドラル型で配位する。Co、Rh、Irの場合は、ラジカルが配位子上に3つ(奇数)であるため常磁性である。   In Ni, Pd, Pt, and Cu, two bidentate ligands are coordinated in a plane, whereas in Co, Rh, and Ir, three bidentate ligands are coordinated in an octahedral form. Co, Rh, and Ir are paramagnetic because there are three (odd) radicals on the ligand.

上記のように配位子上に非局在化されたラジカルにより、酸化・還元の両方とも活性であるため、電子注入層・ホール注入層両方に使うことができる。酸化還元は以下のような化学反応式で表される。   Since the radical delocalized on the ligand as described above is active in both oxidation and reduction, it can be used for both the electron injection layer and the hole injection layer. Oxidation reduction is represented by the following chemical reaction formula.

Figure 0004956151
Figure 0004956151

また、これらの層には、本発明の金属配位化合物を単独で用いるか、または、ホールまたは電子輸送能力のある有機材料や金属錯体材料とブレンドして用いることもできる。ブレンドして用いる場合には、電極からホールまたは電子を受け取りやすいだけでなく、本発明の金属配位化合物がブレンドした他の化合物を酸化・還元し、その他の化合物の酸化還元種がホールや電子の電極からの注入を促進する場合もある。   In these layers, the metal coordination compound of the present invention may be used alone, or may be used by blending with an organic material or metal complex material having a hole or electron transport capability. When blended, it is easy not only to receive holes or electrons from the electrode, but also oxidizes / reduces other compounds blended with the metal coordination compound of the present invention, and the redox species of the other compounds become holes or electrons. In some cases, injection from the electrodes may be promoted.

また、本発明の金属配位化合物は、ホール・電子ともに注入を促進できるため、陰極側と陽極側両方に同じ化合物を配置してホール・電子の注入効率を向上することができる。   Further, since the metal coordination compound of the present invention can promote the injection of both holes and electrons, the same compound can be arranged on both the cathode side and the anode side to improve the hole / electron injection efficiency.

また、発光素子に応用する場合、発光層中で発光した光を他の構成材料が吸収すると発光効率の低下を招く原因となる。この金属配位化合物を用いる場合、バンドギャップが非常に小さいために、吸収スペクトルピークが790nm(12660cm-1)にあり赤外領域にあるため、可視光発光する有機EL素子の発光を強く吸収することは無い。参考までに、代表的なホール注入材料である銅フタロシアニンは、波長が600nm付近に強い吸収をもち、赤色発光を吸収して効率低下を招くと言う問題があった。EL発光の吸収を最小に抑えるために、銅フタロシアニンの膜を非常に薄い膜にしたとしても、発光層内の多重反射によりEL発光はキャリア輸送層の吸収の影響を受けて発光効率の低下を招く。従って、本発明者らは、本発明の金属配位化合物の特徴である強い酸化還元性と弱い可視光領域で吸収を考慮して、本発明の金属配位化合物がキャリア注入材料に適していると考え本発明に至ったのである。 Further, when applied to a light emitting element, if other constituent materials absorb the light emitted in the light emitting layer, it may cause a decrease in light emission efficiency. When this metal coordination compound is used, since the band gap is very small, the absorption spectrum peak is at 790 nm (12660 cm −1 ) and is in the infrared region, and thus the light emission of the organic EL element that emits visible light is strongly absorbed. There is nothing. For reference, copper phthalocyanine, which is a typical hole injection material, has a problem that the wavelength has a strong absorption near 600 nm, and absorbs red light emission, resulting in a decrease in efficiency. Even if the copper phthalocyanine film is made very thin in order to minimize the absorption of EL emission, the EL emission is affected by the absorption of the carrier transport layer due to the multiple reflection in the emission layer, and the emission efficiency decreases. Invite. Therefore, the present inventors consider that the metal coordination compound of the present invention is suitable for a carrier injection material in consideration of the strong redox property and absorption in the weak visible light region, which are the characteristics of the metal coordination compound of the present invention. This led to the present invention.

本発明に用いる金属配位化合は、非イオン性金属配位化合物でもよく、反磁性でもよい。また、ラジカルを有する配位子を複数有していてもよい。   The metal coordination compound used in the present invention may be a nonionic metal coordination compound or diamagnetic. Moreover, you may have multiple ligands which have a radical.

本発明で用いる金属配位化合物として、例えば、下記一般式(1)で示される部分構造式を有する金属配位化合物等が挙げられる。そして、好ましくは下記一般式(2)乃至(6)のいずれかで示される金属配位化合物、より好ましくは下記一般式(7)で示される金属配位化合物である。   Examples of the metal coordination compound used in the present invention include a metal coordination compound having a partial structural formula represented by the following general formula (1). And it is preferably a metal coordination compound represented by any one of the following general formulas (2) to (6), more preferably a metal coordination compound represented by the following general formula (7).

Figure 0004956151
Figure 0004956151

[Mは遷移金属であり、XとYは、N、OまたはS原子であり、nは2または3である。また、・はラジカルを表す。] [M is a transition metal, X and Y are N, O or S atoms, and n is 2 or 3. Moreover,-represents a radical. ]

Figure 0004956151
Figure 0004956151

[Mは、Ni、Pd、Pt、Cu、Co、Rh、またはIrである。 [M is Ni, Pd, Pt, Cu, Co, Rh, or Ir.

Rは、水素、分岐状または直鎖状のアルキル基または芳香環基である。   R is hydrogen, a branched or straight chain alkyl group or an aromatic ring group.

nは、MがNi、Pd、Pt、Cuの場合2で、Co、Rh、Irの場合3である。   n is 2 when M is Ni, Pd, Pt, or Cu, and 3 when Co, Rh, or Ir.

配位子中のCH基の水素原子は置換されてもよい。該置換基は、重水素、アミノ基、ニトロ基、トリメチルシリル基、ハロゲン原子、または置換基を有しても良いフェニル基、フルオレニル基、または直鎖状、分岐状の炭素数が5以下のアルキル基またはアルコキシル基(該アルキル基またはアルコキシル基の水素原子はハロゲン原子に置き換えられても良い)から選ばれる。]   The hydrogen atom of the CH group in the ligand may be substituted. The substituent is deuterium, amino group, nitro group, trimethylsilyl group, halogen atom, or optionally substituted phenyl group, fluorenyl group, or linear or branched alkyl having 5 or less carbon atoms. Group or alkoxyl group (the hydrogen atom of the alkyl group or alkoxyl group may be replaced by a halogen atom). ]

Figure 0004956151
Figure 0004956151

本発明で用いる金属配位化合物の具体例を下表に示す(表1においてn=2である)が、これらに限定されるわけではない。尚、表中の配位子を以下に示す。   Specific examples of the metal coordination compound used in the present invention are shown in the following table (in Table 1, n = 2), but are not limited thereto. In addition, the ligand in a table | surface is shown below.

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

本発明の有機EL素子の構成の一例を図1に示す。図1(a)には、発光層603の上下にホール注入層605と電子注入層602を配置した有機LEDを示した。各注入層602,605は、必要に応じて配置すればよく、どちらか一方をなくしてもかまわない。図1(b)、(c)では、発光層603以外に、ホール輸送層604と電子輸送層608を付加したデバイス構成を示した。各層の構成や材料・膜厚は、素子の効率や安定性など素子の特性を決定するものであり、慎重に設計する必要がある。   An example of the configuration of the organic EL device of the present invention is shown in FIG. FIG. 1A shows an organic LED in which a hole injection layer 605 and an electron injection layer 602 are arranged above and below the light emitting layer 603. Each of the injection layers 602 and 605 may be disposed as necessary, and either one may be omitted. FIGS. 1B and 1C show a device configuration in which a hole transport layer 604 and an electron transport layer 608 are added in addition to the light emitting layer 603. The configuration, material, and film thickness of each layer determine element characteristics such as element efficiency and stability, and must be carefully designed.

本発明の発光素子は、発光層603以外の層、好ましくは電極601,606に接している層、即ちホール注入層605、電子注入層602のいずれかまたは両方が、上記金属配位化合物を含有する。   In the light-emitting element of the present invention, a layer other than the light-emitting layer 603, preferably a layer in contact with the electrodes 601 and 606, that is, one or both of the hole injection layer 605 and the electron injection layer 602 contains the metal coordination compound. To do.

以下に、本実施例に用いる有機化合物の構造式と略称を示す。   The structural formulas and abbreviations of the organic compounds used in this example are shown below.

Figure 0004956151
Figure 0004956151

<実施例1、比較例1>
本実施例は、本発明の金属配位化合物をホール注入層に用いる例である。
<Example 1, comparative example 1>
In this example, the metal coordination compound of the present invention is used for a hole injection layer.

[例示化合物1001の合成]   [Synthesis of Exemplary Compound 1001]

Figure 0004956151
Figure 0004956151

例示化合物1001の合成は、Journal of American Chemical Society,88,5201−5209(1966)に従った。すなわち、30mlに5gの塩化ニッケル・6水和物と30mlのアンモニア水の混合溶液に、o−フェニレンジアミン3gの500ml水溶液を加え、マグネチックスターラーを用い9時間攪拌した。深青色の沈殿物をろ過により分取し、アセトンと水でよく洗浄した。再結晶法による精製後、昇華精製法により精製した。   The synthesis | combination of exemplary compound 1001 followed Journal of American Chemical Society, 88, 5201-5209 (1966). That is, a 500 ml aqueous solution of 3 g of o-phenylenediamine was added to a mixed solution of 5 g of nickel chloride hexahydrate and 30 ml of aqueous ammonia in 30 ml, and stirred for 9 hours using a magnetic stirrer. The deep blue precipitate was collected by filtration and washed well with acetone and water. After purification by recrystallization method, purification was performed by sublimation purification method.

[素子の製造]
図1(c)に示す有機層が5層の素子を製造した。ガラス基板(基板607)上に、100nmのITO(陽電極606)をパターニングして、対向する電極面積が3mm2になるようにした。そのITO基板上に、以下の有機層と電極層を10-4Paの真空チャンバー内で抵抗加熱による真空蒸着し、連続製膜した。
[Manufacture of elements]
A device having five organic layers as shown in FIG. On the glass substrate (substrate 607), 100 nm of ITO (positive electrode 606) was patterned so that the opposing electrode area was 3 mm 2 . On the ITO substrate, the following organic layer and electrode layer were vacuum-deposited by resistance heating in a vacuum chamber of 10 −4 Pa to form a continuous film.

ホール注入層605(5nm):例示化合物1001
ホール輸送層604(40nm):化合物FL01
発光層603(40nm):CBP:Ir(ppy)3(重量比10重量%)
電子輸送層608(50nm):BPhen
電子注入層602(1nm):KF
金属電極(陰電極601)(100nm):Al
Hole injection layer 605 (5 nm): exemplary compound 1001
Hole transport layer 604 (40 nm): Compound FL01
Light emitting layer 603 (40 nm): CBP: Ir (ppy) 3 (weight ratio 10% by weight)
Electron transport layer 608 (50 nm): BPhen
Electron injection layer 602 (1 nm): KF
Metal electrode (cathode 601) (100 nm): Al

比較例1として、上記構成でホール注入層605が無い他は同じ構成の素子を作成して、例示化合物1001による電流特性の改善効果を見た。   As Comparative Example 1, an element having the same configuration as that described above except that the hole injection layer 605 was not provided was created, and the effect of improving the current characteristics by the exemplified compound 1001 was observed.

陽電極606をプラス、陰電極601をマイナスにしてDC電圧を印加して素子特性を評価した。発光強度は、トプコン社製、スペクトル測定機SR1及びBM7で測定した。電圧印加時の電流値は、ヒューレッドパッカード社製の4140Bd測定した。測定結果を表4に示す。   The device characteristics were evaluated by applying a DC voltage with the positive electrode 606 as positive and the negative electrode 601 as negative. The emission intensity was measured with a spectrum measuring machine SR1 and BM7 manufactured by Topcon Corporation. The current value at the time of voltage application was measured by 4140Bd manufactured by Hured Packard. Table 4 shows the measurement results.

ホール注入材料として例示化合物番号1001を用いた実施例1の場合、比較例1の素子と比べて、5Vの電圧を印加した時に、電流密度が2.1倍改善され、パワー効率が1.8倍改善された。例示化合物番号1001は、ホール注入材料として高い性能を持つことが示され、ホール注入性が改善され、発光効率向上することが分かった。また、この素子を1000cd/m2の明るさで通電しつづけた時に、安定した発光を確認した。 In the case of Example 1 using Exemplified Compound No. 1001 as the hole injection material, the current density was improved by 2.1 times when the voltage of 5 V was applied as compared with the device of Comparative Example 1, and the power efficiency was 1.8. Improved twice. Illustrative compound number 1001 was shown to have high performance as a hole injection material, and it was found that the hole injection property was improved and the light emission efficiency was improved. Further, stable light emission was confirmed when the device was energized with a brightness of 1000 cd / m 2 .

<実施例2乃至4>
ホール注入層605を、表4に示す化合物層(実施例2は共蒸着層)とした以外は、実施例1と同様にして素子を作成した。
<Examples 2 to 4>
A device was prepared in the same manner as in Example 1 except that the hole injection layer 605 was a compound layer shown in Table 4 (Example 2 was a co-deposition layer).

実施例1と同じように素子の測定を行ったところ、表4に示す様に、比較例1に比べて高い電流密度・高いパワー効率が得られた。   When the element was measured in the same manner as in Example 1, as shown in Table 4, a higher current density and higher power efficiency were obtained than in Comparative Example 1.

尚、例示化合物の合成に関しては、Journal of American Chemical Society,88,5201−5209(1966)の合成法に従った。例示化合物2001と3001の化合物の反応式を以下に示す。   In addition, regarding the synthesis | combination of exemplary compound, the synthesis method of Journal of American Chemical Society, 88, 5201-5209 (1966) was followed. A reaction formula of the compounds of exemplary compounds 2001 and 3001 is shown below.

Figure 0004956151
Figure 0004956151

Figure 0004956151
Figure 0004956151

<実施例5、6>
本実施例は、本発明の金属配位化合物を電子注入層に用いる例である。
<Examples 5 and 6>
In this example, the metal coordination compound of the present invention is used for an electron injection layer.

ホール注入層605を設けず、電子注入層602を表5に示す化合物層とした以外は、実施例1と同様にして素子を作成した。   A device was produced in the same manner as in Example 1 except that the hole injection layer 605 was not provided and the electron injection layer 602 was changed to the compound layer shown in Table 5.

比較として前述の比較例1と、本実施例の素子の特性を検討した。その結果を表5に示した。実施例1と同じように素子の測定を行ったところ、比較例1に比べて高い電流密度・高いパワー効率が得られ、例示化合物1001と1005が電子注入層に有用であることが明らかになった。また、500cd/m2の輝度を発光させて発光の安定性の実験を行った所、安定な発光が得られていることを確認した。 For comparison, the characteristics of the device of Comparative Example 1 and the device of this example were examined. The results are shown in Table 5. When the element was measured in the same manner as in Example 1, it was found that higher current density and higher power efficiency were obtained than in Comparative Example 1, and that exemplary compounds 1001 and 1005 were useful for the electron injection layer. It was. In addition, an experiment for stability of light emission was performed by emitting light with a luminance of 500 cd / m 2 , and it was confirmed that stable light emission was obtained.

<実施例7>
本実施例では、例示化合物1001とBphenの共蒸着膜を電子注入層602に用いた以外は、実施例1と同様にして素子を作成した。
<Example 7>
In this example, a device was fabricated in the same manner as in Example 1 except that the co-deposited film of the exemplary compound 1001 and Bphen was used for the electron injection layer 602.

比較例1と比較することにより、本実施例の素子の効果を検討した。その結果を表5に示した。実施例1と同じように素子の測定を行ったところ、比較例1に比べて高い電流密度・高いパワー効率が得られ、例示化合物1001の共蒸着膜が電子注入層に有用であることが明らかになった。また、500cd/m2の輝度を発光させて発光の安定性の実験を行った所、安定な発光が得られていることを確認した。 By comparing with Comparative Example 1, the effect of the element of this example was examined. The results are shown in Table 5. When the device was measured in the same manner as in Example 1, it was found that a higher current density and higher power efficiency were obtained than in Comparative Example 1, and that the co-deposited film of Example Compound 1001 was useful for the electron injection layer. Became. In addition, an experiment for stability of light emission was performed by emitting light with a luminance of 500 cd / m 2 , and it was confirmed that stable light emission was obtained.

Figure 0004956151
Figure 0004956151

<実施例8>
ホール注入層として、例示化合物1017の層をスピンコーティングで形成する以外は、実施例1と同様にして素子を作成した。
<Example 8>
A device was prepared in the same manner as in Example 1 except that the layer of the exemplified compound 1017 was formed by spin coating as the hole injection layer.

すなわち、クロロベンゼンと例示化合物1017の0.2%溶液を作成し、それをスピンコーターで塗布してホール注入層605を形成した。ホール輸送層604からは、実施例1と同様真空蒸着法により順次層を形成して素子を作成した。   That is, a 0.2% solution of chlorobenzene and Exemplified Compound 1017 was prepared and applied with a spin coater to form the hole injection layer 605. From the hole transport layer 604, elements were formed by sequentially forming layers by the vacuum evaporation method as in Example 1.

実施例1と同じように素子の測定を行い、比較例1と比較することにより、本実施例の素子の効果を検討した。その結果を表6示した。   The effect of the device of this example was examined by measuring the device in the same manner as in Example 1 and comparing it with Comparative Example 1. The results are shown in Table 6.

良好なホール注入特性が得られ例示化合物1017は、ホール注入層に用いる材料として有用なことが明らかになった。   Good hole injection characteristics were obtained, and it was revealed that the exemplified compound 1017 is useful as a material used for the hole injection layer.

Figure 0004956151
Figure 0004956151

<実施例9、比較例2>
図1(a)の素子を製造した。
<Example 9, Comparative Example 2>
The element shown in FIG. 1A was manufactured.

実施例1と同じITO基板上に、バイエル社製のPEDOT(有機EL用)を40nmの膜厚に1000rpm(20秒)の条件でスピンコーターで塗布した。それを120℃の真空チャンバーで1時間乾燥し、ホール注入層605を形成した。   On the same ITO substrate as in Example 1, PEDOT (for organic EL) manufactured by Bayer was applied to a film thickness of 40 nm with a spin coater under the condition of 1000 rpm (20 seconds). It was dried in a vacuum chamber at 120 ° C. for 1 hour to form a hole injection layer 605.

その上に、以下の溶液を用いて、窒素雰囲気下で2000rpm、20秒間でスピンコートすることで、120nmの膜厚の有機膜(発光層603)を形成した。製膜後、ホール注入層605の製膜時と同じ条件で乾燥した。   On top of that, an organic film (light-emitting layer 603) having a thickness of 120 nm was formed by spin coating using the following solution under a nitrogen atmosphere at 2000 rpm for 20 seconds. After film formation, the film was dried under the same conditions as those for forming the hole injection layer 605.

[溶液]
脱水クロロベンゼン:6g
PVK(平均分子量9600):92mg
Ir(C4−ppy)3:8mg
[solution]
Dehydrated chlorobenzene: 6g
PVK (average molecular weight 9600): 92 mg
Ir (C 4 -ppy) 3: 8mg

次に、以下の有機層と電極層を実施例1と同条件で真空蒸着し、連続製膜した。   Next, the following organic layer and electrode layer were vacuum-deposited under the same conditions as in Example 1 to form a continuous film.

電子注入層602(5nm):例示化合物1001
金属電極(陰電極601)(100nm):Al
比較例2として、例示化合物1001に替えて、AlLi合金を用いた素子を作成した。
Electron injection layer 602 (5 nm): exemplary compound 1001
Metal electrode (cathode 601) (100 nm): Al
As Comparative Example 2, an element using an AlLi alloy was created instead of the exemplified compound 1001.

実施例1と同様に評価した結果を表7に示す。比較例2に比べて高い電流密度・高いパワー効率が得られ、例示化合物1001が電子注入層に有用であることが明らかになった。また、500cd/m2の輝度を発光させて発光の安定性の実験を行った所、安定な発光が得られていることを確認した。 The results evaluated in the same manner as Example 1 are shown in Table 7. High current density and high power efficiency were obtained as compared with Comparative Example 2, and it was revealed that the exemplary compound 1001 is useful for the electron injection layer. In addition, an experiment for stability of light emission was performed by emitting light with a luminance of 500 cd / m 2 , and it was confirmed that stable light emission was obtained.

Figure 0004956151
Figure 0004956151

<実施例10>
電子注入層602に例示化合物1001を用いた以外は、実施例1と同様にして素子を作成した。
<Example 10>
A device was prepared in the same manner as in Example 1 except that the exemplified compound 1001 was used for the electron injection layer 602.

実施例1と同様に評価した結果を表8に示す。実施例10の素子は、比較例1の素子と比べて、電流密度・パワー効率がともに改善された。例示化合物番号1001を、ホール・電子層に両方に用いることで高い性能を持つことがしめされた。また、この素子を1000cd/m2の明るさで通電しつづけた時に、安定した発光を確認した。 The results evaluated in the same manner as Example 1 are shown in Table 8. The device of Example 10 was improved in both current density and power efficiency as compared with the device of Comparative Example 1. It has been shown that by using Exemplified Compound No. 1001 for both the hole and electron layers, it has high performance. Further, stable light emission was confirmed when the device was energized with a brightness of 1000 cd / m 2 .

Figure 0004956151
Figure 0004956151

本発明の発光素子の一例を示す図である。It is a figure which shows an example of the light emitting element of this invention.

Claims (3)

2つの電極間に発光層と発光層以外の層とを有する発光素子において、前記発光層以外の層は下記一般式(2)または(6)のいずれかで示される金属配位化合物を有し、前記発光層以外の層は前記2つの電極のいずれか一方と接することを特徴とする有機発光素子。
Figure 0004956151
[Mは、NiまたはPtである。
Rは水素原子である。
nは2である。
式(2)および(6)において、配位子中のCH基の水素原子はtert−ブチル基に置換されてもよい。
・はラジカルを表す。]
In the light-emitting element having a layer other than the light-emitting layer and the light-emitting layer between the two electrodes, a layer other than the emission layer have a metal coordination compound represented by any of the following general formula (2) or (6) A layer other than the light emitting layer is in contact with one of the two electrodes .
Figure 0004956151
[M is Ni or Pt.
R is a hydrogen atom.
n is 2.
In the formulas (2) and (6), the hydrogen atom of the CH group in the ligand may be substituted with a tert-butyl group.
-Represents a radical. ]
前記金属配位化合物が、下記一般式(7)で示される金属配位化合物であること特徴と
する請求項に記載の発光素子。
Figure 0004956151
The light emitting device according to claim 1 , wherein the metal coordination compound is a metal coordination compound represented by the following general formula (7).
Figure 0004956151
前記金属配位化合物が下記構造式で示されることを特徴とする請求項1または2に記載の有機化発光素子。The organic light-emitting device according to claim 1, wherein the metal coordination compound is represented by the following structural formula.
Figure 0004956151
Figure 0004956151
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