JP5199810B2 - Massage equipment - Google Patents

Description

  The present invention relates to a massage device.

  Conventionally, there exists patent document 1 etc. as this kind of massage apparatus, and it is utilized for the to-be-treated body, especially the massage with respect to a leg.

  This massage device is provided with a plurality of kneading balls that rotate in conjunction with the driving mechanism, and performs acupressure massage and sandwich massage on a treatment object arbitrarily or simultaneously with the kneading balls.

And the finger pressure and pinching force by the kneading balls are adjusted by supporting the kneading balls with an elastic supporting member having elasticity.
JP 2001-314463 A

  However, only the elastic support member has a problem that only a slight adjustment can be made to the load applied to the kneading balls, and a stable massage cannot be performed with a constant load.

  Furthermore, since only a slight adjustment can be performed, there is a problem in that it cannot be sufficiently reduced when an excessive load is applied, and there is a risk of causing pain in the treatment object.

  Therefore, the present invention has been invented in view of the above problems, can be reduced even when a load exceeding a predetermined value is applied, prevents pain caused by an excessive load, and massages with a constant load. It was made into the subject to provide the massage device to perform.

Massaging apparatus 1 according to the present invention in order to solve the above problems, has a treatment block 2 having projecting the eccentric plate 4 the facilities療子5 you treatment is eccentrically rotated in the eccentric plate 4, adjacent two One of treatment block 2, in the arrangement for holding the treatment site 20 away against the treatment element 5 of one another, are paired, the pair with the consuming load exceeds a predetermined value in the treatment block 2 forming the treatment block adjusting means for reducing the 2 was displaced load below a predetermined value, provided on the eccentric plate 4 of at least one of the treatment blocks 2 of the treatment block 2 forming the pair, said adjusting means, massaging of the eccentric plate 4 The eccentric plate 4 is moved and displaced in a direction opposite to the side where the child 5 is provided .

With such a configuration, when a load exceeding a predetermined value is imposed, retreats the treatment block 2 from the treatment site 20, it can reduce the load exceeds a predetermined value,該荷heavy Ru can be adjusted to a predetermined value or less.

In addition, the massage device 1 according to the present invention includes a treatment block 2 provided with a treatment element 5 which is eccentrically rotated by the eccentric plate 4 and protrudes from the eccentric plate 4, and two adjacent treatment blocks 2 are mutually connected. The treatment element 5 is connected to and separated from the treatment body 20 to form a pair. When a load exceeding a predetermined value is applied to the treatment block 2 forming the pair, the treatment block 2 is displaced to a predetermined value. adjusting means for reducing the load below, provided on the eccentric plate 4 of at least one of the treatment blocks 2 of the treatment block 2 forming the said pair, said adjusting means, is opened between the treatment block 2 a pair, The eccentric plate 4 is moved and displaced in the direction opposite to the side where the treatment element 5 is provided . With such a configuration, when a load exceeding a predetermined value is applied, the treatment block 2 slides along the direction X in which the treatment blocks 2 that make a pair are arranged, and retreats from the treatment body 20. open between the treatment block 2 forming the pair, and can reduce the load exceeds a predetermined value, Ru can be adjusted該荷heavy below a predetermined value.

In addition, the massage device 1 according to the present invention includes a treatment block 2 provided with a treatment element 5 which is eccentrically rotated by the eccentric plate 4 and protrudes from the eccentric plate 4, and two adjacent treatment blocks 2 are mutually connected. The treatment element 5 is connected to and separated from the treatment body 20 to form a pair. When a load exceeding a predetermined value is applied to the treatment block 2 forming the pair, the treatment block 2 is displaced to a predetermined value. The adjusting means for reducing the load is provided on the eccentric plate 4 of at least one treatment block 2 of the paired treatment blocks 2, and the direction in which the paired treatment blocks 2 are arranged is a row direction X. It said adjusting means, and a rotary shaft 9 in the direction perpendicular to and row direction X parallel to the plane of rotation of the eccentric plate 4 rotates the eccentric plate 4 about the axis of the rotary shaft 9, pairs Dearuko those displacing opening between the forming treatment block 2 The features. With such a configuration, when a load exceeding a predetermined value is applied, the treatment block 2 rotates around the axis of the rotation shaft 9 and opens between the pair of treatment blocks 2, and can reduce the load exceeds the value, Ru can be adjusted該荷heavy below a predetermined value.

In addition, the massage device 1 according to the present invention includes a treatment block 2 provided with a treatment element 5 which is eccentrically rotated by the eccentric plate 4 and protrudes from the eccentric plate 4, and two adjacent treatment blocks 2 are mutually connected. The treatment element 5 is connected to and separated from the treatment body 20 to form a pair. When a load exceeding a predetermined value is applied to the treatment block 2 forming the pair, the treatment block 2 is displaced to a predetermined value. The adjusting means for reducing the load is provided on the eccentric plate 4 of at least one treatment block 2 of the paired treatment blocks 2, and the direction in which the paired treatment blocks 2 are arranged is a row direction X. The adjusting means has a rotation shaft 9 in a direction orthogonal to the rotation surface of the eccentric plate 4, and rotates the eccentric plate 4 about the axis of the rotation shaft 9 , so that the space between the paired treatment blocks 2 is between. It is one that is open displacement of the rotary shaft 9, facilities Characterized by providing outward from the ends of the direction Y side and perpendicular to the column direction X parallel to the plane of rotation of the eccentric plate 4 of the block 2. With such a configuration, when a load exceeding a predetermined value is applied, the treatment block 2 is rotated around the axis of the rotation shaft 9 located outward, and the pair of treatment blocks 2 are formed. open between, and can reduce the load exceeds a predetermined value, Ru can be adjusted該荷heavy below a predetermined value.

  By providing the control means for displacing the treatment block 2 by actively operating the adjustment means, the control means can actively operate the adjustment means, and can control the applied load. Can be massaged.

  As described above, by reducing the load applied by the adjusting means to a predetermined value or less, the applied load is adjusted to be constant, the pressure applied by the treatment element, which is the reaction force of the load, becomes constant, and pain is caused by excessive load. And a comfortable massage device that performs massage with a stable compression force.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  As shown in FIGS. 1 and 2, the massage device 1 is provided on the eccentric plate 4 at a position eccentric with respect to the rotational center of the eccentric plate 4 and the eccentric plate 4 that is placed on the adjusting table 3 and rotated. A plurality of treatment blocks 2 including treatment elements 5 are provided. The treatment element 5 has a cylindrical shape in which one end is in contact with the eccentric plate 4 and the other end protrudes in a substantially hemispherical shape.

  The two adjacent treatment blocks 2 rotate the eccentric plate 4 in the opposite directions and contact and separate the treatment elements 5 located symmetrically in plan view so as to sandwich the treatment object 20 located therebetween. A massage is performed.

  Therefore, it is possible to simultaneously perform massage massage by the heel movement by the rotating treatment element 5, pinching massage by pinching the pair of treatment elements 5, and acupressure massage by the protruding end face on the treatment object 20. . In addition, since the treatment element 5 is arranged eccentrically, the compression force is effectively applied to the treatment object 20, for example, the lower limbs, and a massage with a sufficient compression force can be performed.

In addition, the two pairs of treatment blocks 2 form a row in which the eccentric plates 4 are arranged in a substantially straight line. And the said row | line | column is arrange | positioned in the row direction Y which is parallel to the rotation surface of the eccentric board 4 and orthogonal to the column direction X which comprises a row | line | column, and the two of the treatment elements 5 differ in each row | line | column, and are located in a line. Therefore, it is the massage apparatus 1 which massages widely by different massage operation | movement.

  In addition, as shown in FIG. 2, one of the adjustment bases 3 of the pair of treatment blocks 2 is slid away from the other adjustment base 3 to open the pair of treatment blocks 2. An adjusting means for widening the distance (hereinafter referred to as a treatment distance) is provided, and the load is a reaction force of the compression force applied to the treatment element 5 of the treatment block 2 paired by the adjustment means. Yes.

  As shown in FIG. 2A, the adjusting means includes an elastic body 7, for example, an urging spring on one side of the adjusting table 3, and an end on the side opposite to the other adjusting table 3 paired along the column direction X. The adjustment base 3 is urged toward the other adjustment base 3.

  When the load applied to the treatment element 5 becomes a load exceeding the predetermined value (the urging force of the urging spring) (hereinafter referred to as excess load), the adjusting table 3 is opposed to the urging of the urging spring. It slides in the direction which leaves | separates from the other adjustment stand 3 which becomes, and it will be in the state of FIG.2 (b), a treatment distance is extended, and the excess load applied to the treatment element 5 is reduced.

  Further, when the applied load becomes smaller than the urging force of the urging spring, the adjustment table 3 slides toward the other adjustment table 3 that makes a pair by the urging force of the urging spring, and the space between the treatment elements 5 is reduced. It is the structure which adjusts to the load of.

  Therefore, even if the position and shape of the treatment body 20 are different, the treatment distance changes according to the treatment body 20 without the user adjusting the treatment distance, and the overload is reduced, and the applied load is reduced. Because it is adjusted to a certain level, massage can be performed with an optimal pressure that does not cause pain due to overload.

  Moreover, as shown in FIG. 3, when the elastic body 7 is attached to both of the pair of adjustment bases 3 along the row direction X and an overload is applied, both of the adjustment stands 3 slide in the row direction X, You may open between the treatment blocks 2 and reduce an overload.

  Further, as shown in FIG. 4A, when the elastic body 7 is provided on the surface opposite to the surface on which the eccentric plate 4 of the adjustment base 3 is placed (hereinafter referred to as the back surface) and an excess load is applied, FIG. As shown in (b), the adjustment base 3 may be moved backward to reduce the overload by reducing the pressing force of the treatment element 5 against the body 20 to be treated. Note that both of the paired treatment blocks 2 may be retracted to the back side.

  Further, as shown in FIG. 5A, when a slide guide 8 that tilts and guides the adjustment table 3 is provided on the back surface of the adjustment table 3 and an excessive load is applied, the back surface side as shown in FIG. And slide in the row direction X, the paired treatment blocks 2 may be inclined and opened to reduce the excess load.

  Further, the adjusting means may rotate the adjusting table 3 instead of sliding it. For example, as shown in FIG. 6A, another example is provided in which an elastic body 7 having a rotating shaft 9 in the row direction Y, for example, a constant load spring, is provided at substantially the center of the back surface of each adjusting table 3. And when an overload is applied, against the bias of the elastic body 7, as shown in FIG. 6 (b), the adjustment base 3 rotates to open between the treatment blocks 2 and widen the treatment distance, Reduce overload.

  Further, the treatment axis may be extended by providing the rotary shaft 9 between the pair of adjustment bases 3 and rotating the adjustment base 3. For example, as shown in FIG. 7, the elastic body 7 is attached to the back surface of one adjusting table 3, and the treatment block 2 to which the elastic body 7 is attached is rotated to widen the treatment distance. Further, as shown in FIG. 8, a double torsion spring is used for the elastic body 7, the internal space of the coil portion of the elastic body 7 is fitted to the rotating shaft 9, and both ends protruding from the coil portion are respectively attached to the adjusting table 3. The treatment block 2 may be rotated to widen the treatment distance.

  Further, as shown in FIG. 9, the rotating shaft 9 of the adjusting means is orthogonal to the rotating surface of the eccentric plate 4, and the adjusting table 3 is rotated in parallel with the rotating surface of the eccentric plate 4 to form a pair of treatment blocks. 2 may be opened to increase the treatment distance. However, the rotating shaft 9 is located outside the end of the treatment block 2 on the row direction Y side.

  For example, as shown in FIG. 10A, three pairs of treatment blocks 2 are arranged in three in the row direction Y, and the adjustment base 3 of the treatment blocks 2 arranged in the row direction Y is configured integrally. The means rotates the adjustment base 3 in parallel with the rotation surface of the eccentric plate 4 to widen the treatment distance.

  The adjusting means is composed of a rotary shaft 9 provided perpendicular to the eccentric plate 4 and outward from the end of the treatment block 2, and an elastic body 7 fitted and supported on the rotary shaft 9. The elastic body 7 is a double torsion spring in which, for example, the coil portion is held by the rotary shaft 9 and the protruding end portions are respectively attached to the end portions on the same side in the row direction Y of the adjusting table 3.

Then, when excess load is applied, as shown in FIG. 10 (b), the adjustment table 3 rotates in the plane of rotation of the eccentric plate 4 is intended to extend the facilities 療距 away. Of course, the adjusting table 3 may be provided with adjusting means individually without being integrated as described above.

  Moreover, it becomes the massage apparatus 1 which performs more complicated massage by arrange | positioning the treatment block 2 which makes a pair in three rows, and is preferable.

  Of course, the adjusting means may not only combine a plurality of methods, but may also be provided with a stopper and allow the stopper to allow the adjustment table 3 to move when an overload is applied. It is.

In addition, the adjustment base 3 does not move and the eccentric plate 4 is missed. As shown in FIG. 11, the eccentric means 4 moves from the adjustment base 3 so that the eccentric plate 4 moves when the treatment element 5 is overloaded. There may also spread the facilities 療距 away moving from the adjustment table 3.

Moreover, you may provide the control means which operates an adjustment means actively. For example, as shown in FIG. 12A, instead of the elastic body 7 of FIG. 2, a worm gear driven by the motor 10 is used as the adjusting means, and control means for controlling the driving of the motor 10 (not particularly shown, for example, a computer, for example) ) Is provided in the massage apparatus 1. The worm gear is driven by the motor 10 along the row direction X and is extended in parallel to the row direction X. The worm gear is provided on the outer periphery of the adjustment shaft 11. The worm wheel 13 to be screwed together. Then, by the control means drives the motor 10, as shown in FIG. 12 (b), the open treatment block 2 along the column direction X, to expand the facilities 療距 away, to adjust the load to a predetermined value Is.

  Further, as shown in FIG. 13, the adjusting means may be provided in each of the treatment blocks 2 that make a pair. In addition, a worm 12 in which the direction of the screw thread in the center of the treatment block 2 paired with one adjustment shaft 11 is reversed is provided, and as shown in FIG. 14, one adjustment shaft 11 and a motor It is good also as what opens both the treatment blocks 2 which make a pair with 10 simultaneously.

  Further, the adjusting means is composed of a shape memory spring made of a shape memory material and a temperature adjusting means for adjusting the temperature of the shape memory spring, for example, a heater, and the control means operates the temperature adjusting means to operate the shape memory spring. The adjusting means may be operated by changing the temperature to reduce the applied load.

  Therefore, by actively controlling the operation of the adjusting means, it is preferable that the massage apparatus 1 can adjust the strength of massage to the user's preference.

It is a top view of the massage device of the present invention. It is explanatory drawing of an adjustment means same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which displaces both the treatment blocks which a pair of adjustment means same as the above, (a) each provided the adjustment means, (b) provided the adjustment means between both Is. It is explanatory drawing of the other example which the adjustment means same as the above displaces a treatment block to the back side, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which provided the slide guide in the adjustment means same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which provided the rotation type adjustment means in each of the treatment block which makes a pair same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which provides a rotating shaft between the treatment blocks which make a pair same as the above, and rotates one side, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which both turn same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example in which the adjustment means same as the above rotates a treatment block in parallel with a rotating surface. It is explanatory drawing of the specific example same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which made the structure from which an eccentric board moves from an adjustment stand to the adjustment means same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which provided the control means same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which each provided the motor and the adjustment axis | shaft in both of the adjustment bases which make a pair same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement. It is explanatory drawing of the other example which moved a pair of treatment block at once with the one motor and adjustment shaft same as the above, (a) is before operation | movement of an adjustment means, (b) is after operation | movement.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Massage apparatus 2 Treatment block 3 Adjustment stand 4 Eccentric plate 5 Treatment element 7 Elastic body 10 Motor 11 Adjustment shaft 12 Worm 13 Warm wheel 20 To-be-treated body

Claims (5)

Has a treatment block with projecting the eccentric plate facilities療子you treatment are eccentrically rotated in an eccentric plate, adjacent two treatment blocks sandwich the treatment site body contact or away from each other treatment applicator arrangement in, and in pairs,
Adjusting means for reducing the load to a predetermined value or less by displacing the treatment block and consuming load exceeds a predetermined value in the treatment blocks forming the pair, the eccentricity of at least one of the treatment blocks of the treatment blocks forming the pair On the board ,
A massaging apparatus characterized in that the adjusting means moves and moves the eccentric plate in a direction opposite to the side of the eccentric plate on which the treatment element is provided . It has a treatment block provided with a treatment element that is eccentrically rotated by the eccentric plate and protrudes from the eccentric plate, and two adjacent treatment blocks are arranged so as to hold the treatment object by contacting and separating each other treatment element, Paired,
When a load exceeding a predetermined value is applied to the pair of treatment blocks, an adjusting means for displacing the treatment block to reduce the load to a predetermined value or less is provided. The eccentricity of at least one treatment block of the pair of treatment blocks On the board,
It said adjusting means, is opened between the treatment block paired, features and to luma Ssaji device that move to the side in which a treatment element of the eccentric plate in the opposite direction is intended to displace. It has a treatment block provided with a treatment element that is eccentrically rotated by the eccentric plate and protrudes from the eccentric plate, and two adjacent treatment blocks are arranged so as to hold the treatment object by contacting and separating each other treatment element, Paired,
When a load exceeding a predetermined value is applied to the pair of treatment blocks, an adjusting means for displacing the treatment block to reduce the load to a predetermined value or less is provided. The eccentricity of at least one treatment block of the pair of treatment blocks On the board,
The direction in which the paired treatment blocks are arranged is a row direction,
The adjusting means has a rotation shaft in a direction parallel to the rotation surface of the eccentric plate and perpendicular to the row direction, and rotates the eccentric plate around the rotation shaft to form a pair of treatment blocks. features and to luma Ssaji device that is intended to open displace. It has a treatment block provided with a treatment element that is eccentrically rotated by the eccentric plate and protrudes from the eccentric plate, and two adjacent treatment blocks are arranged so as to hold the treatment object by contacting and separating each other treatment element, Paired,
When a load exceeding a predetermined value is applied to the pair of treatment blocks, an adjusting means for displacing the treatment block to reduce the load to a predetermined value or less is provided. The eccentricity of at least one treatment block of the pair On the board,
The direction in which the paired treatment blocks are arranged is a row direction,
The adjusting means has a rotation shaft in a direction perpendicular to the rotation surface of the eccentric plate, and rotates the eccentric plate around the rotation shaft to open and displace between the pair of treatment blocks. There,
Said rotary shaft, wherein the to luma Ssaji device that is provided outside the end portion of the direction perpendicular to and a column direction parallel to the plane of rotation of the eccentric plate of the treatment block. Massage equipment according to any one of claims 1 to 4, characterized in that a control means for displacing the treatment blocks actively operates the adjusting means.

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