Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP5318615B2 - Electronic component holder and electronic component peeling method - Google Patents
[go: Go Back, main page]

JP5318615B2 - Electronic component holder and electronic component peeling method - Google Patents

Electronic component holder and electronic component peeling method Download PDF

Info

Publication number
JP5318615B2
JP5318615B2 JP2009053328A JP2009053328A JP5318615B2 JP 5318615 B2 JP5318615 B2 JP 5318615B2 JP 2009053328 A JP2009053328 A JP 2009053328A JP 2009053328 A JP2009053328 A JP 2009053328A JP 5318615 B2 JP5318615 B2 JP 5318615B2
Authority
JP
Japan
Prior art keywords
electronic component
film
holding
adhesive
holding film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009053328A
Other languages
Japanese (ja)
Other versions
JP2010212269A (en
Inventor
一 辻葩
清文 田中
則義 細野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Polymer Co Ltd
Original Assignee
Shin Etsu Polymer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Polymer Co Ltd filed Critical Shin Etsu Polymer Co Ltd
Priority to JP2009053328A priority Critical patent/JP5318615B2/en
Publication of JP2010212269A publication Critical patent/JP2010212269A/en
Application granted granted Critical
Publication of JP5318615B2 publication Critical patent/JP5318615B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

本発明は、半導体チップや半導体ウェーハに代表される電子部品を保持、各種加工、搬送、剥離等する際に使用される電子部品保持具及び電子部品の剥離方法に関するものである。   The present invention relates to an electronic component holder and an electronic component peeling method used when holding, variously processing, transporting, peeling, and the like of electronic components typified by semiconductor chips and semiconductor wafers.

従来の電子部品保持具は、図示しないが、中空の保持枠と、この保持枠の中空部を被覆し、半導体チップや半導体ウェーハに代表される電子部品を剥離可能に粘着保持する伸縮可能な粘着保持フィルムとを備え、電子部品の保持、各種加工、搬送、剥離等に使用される(特許文献1参照)。粘着保持フィルムは、フィルム基材の表面にアクリルやシリコーン等のゲルからなる粘着剤が積層されることで形成されている。   A conventional electronic component holder is not shown, but it is a stretchable adhesive that covers a hollow holding frame and a hollow portion of the holding frame so that an electronic component represented by a semiconductor chip or a semiconductor wafer can be peeled and held. It is equipped with a holding film, and is used for holding electronic components, various processing, transporting, peeling, and the like (see Patent Document 1). The pressure-sensitive adhesive holding film is formed by laminating a pressure-sensitive adhesive made of gel such as acrylic or silicone on the surface of a film substrate.

係る電子部品保持具に電子部品を保持させる場合には、粘着保持フィルムの表面に電子部品を押圧して保持させれば良い。これに対し、電子部品保持具から電子部品を剥離して取り外す場合には、粘着保持フィルムの裏面に複数の突き上げピンを下方から圧接して粘着保持フィルムを垂直方向に延伸(エキスパンド)し、粘着保持フィルムの表面から電子部品を部分的に剥離し、その後、粘着保持フィルムの表面から電子部品を吸着コレットにより吸着剥離して取り外せば良い。   When an electronic component is held by such an electronic component holder, the electronic component may be pressed and held on the surface of the adhesive holding film. On the other hand, when peeling and removing the electronic component from the electronic component holder, the adhesive holding film is vertically stretched (expanded) by pressing a plurality of push-up pins on the back surface of the adhesive holding film from below. The electronic component may be partially peeled from the surface of the holding film, and then the electronic component may be removed from the surface of the adhesive holding film by suction peeling with an adsorption collet.

特開2004−327801号公報JP 2004-327801 A

従来の電子部品保持具は、以上のように構成され、フィルム基材に粘着剤が積層されることで粘着保持フィルムが形成されるので、電子部品に粘着剤が残存することがあるという問題がある。また、粘着保持フィルムが垂直方向に延伸されるので、電子部品が比較的大きな半導体チップの場合には大きな問題がないものの、電子部品が50μm以下の薄型の半導体チップの場合には、半導体チップを損傷させるおそれがある。さらに、電子部品が広い面積の半導体ウェーハの場合にも不適切である。   The conventional electronic component holder is configured as described above, and the adhesive holding film is formed by laminating the adhesive on the film base material, so that the adhesive may remain on the electronic component. is there. Also, since the adhesive holding film is stretched in the vertical direction, there is no major problem when the electronic component is a relatively large semiconductor chip, but when the electronic component is a thin semiconductor chip of 50 μm or less, the semiconductor chip is Risk of damage. Furthermore, it is inappropriate when the electronic component is a semiconductor wafer having a large area.

本発明は上記に鑑みなされたもので、電子部品に粘着剤が残存するのを防ぎ、しかも、粘着保持フィルムの延伸に伴い薄い電子部品が破損するおそれのない電子部品保持具及び電子部品の剥離方法を提供することを目的としている。   The present invention has been made in view of the above, and prevents the adhesive from remaining on the electronic component, and further, the electronic component holder and the peeling of the electronic component that do not cause damage to the thin electronic component due to the stretching of the adhesive holding film. It aims to provide a method.

本発明においては上記課題を解決するため、耐熱性を有する中空の保持枠と、この保持枠の中空部を被覆し、薄型の電子部品を剥離可能に保持する伸縮可能な可撓性の粘着保持フィルムとを備え、電子部品を加熱加工した後、粘着保持フィルムを延伸具で水平方向に延伸することにより、粘着保持フィルムから電子部品を剥離するものであって、
保持枠に粘着保持フィルムの周縁部を粘着保持フィルムの熱膨張率を考慮して予め延伸して固定し、
粘着保持フィルムを、自己粘着性のエラストマーに剥離粒子を配合することにより形成し、この剥離粒子の平均粒径を1μm〜エラストマーの厚さの範囲とし、粘着保持フィルムを、電子部品用の保持領域と、この保持領域の周囲と保持枠の内周面との間に形成され、保持枠の周面に予め延伸して固定される余剰領域とに区画形成し、
延伸具を、粘着保持フィルムの保持領域に圧接されて粘着保持フィルムを水平方向に延伸する中空の延伸内枠と、この延伸内枠に粘着保持フィルムの余剰領域を介して嵌合され、粘着保持フィルムの延伸を規制する延伸外枠とから構成し、
粘着保持フィルムに保持させた電子部品を加熱加工した後、粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟み持たせ、粘着保持フィルムの余剰領域を水平方向に延伸拡張し、粘着保持フィルムの保持領域表面を剥離粒子の突出により粗面化して電子部品を剥離するようにしたことを特徴としている。
In order to solve the above-mentioned problems in the present invention, a heat-resistant hollow holding frame and a stretchable flexible adhesive holding that covers the hollow portion of the holding frame and holds a thin electronic component in a peelable manner. A film, and after heat processing the electronic component, by stretching the adhesive holding film in the horizontal direction with a stretching tool, to peel the electronic component from the adhesive holding film,
In consideration of the coefficient of thermal expansion of the adhesive holding film, the peripheral edge of the adhesive holding film is previously stretched and fixed to the holding frame,
An adhesive holding film is formed by blending release particles with a self-adhesive elastomer, the average particle size of the release particles is in the range of 1 μm to the thickness of the elastomer, and the adhesive holding film is used as a holding region for electronic components. And is formed between the periphery of the holding region and the inner peripheral surface of the holding frame, and is partitioned into an extra region that is previously stretched and fixed to the peripheral surface of the holding frame,
A stretching tool is pressed against the holding area of the pressure-sensitive adhesive holding film and fitted into a hollow stretched inner frame that stretches the pressure-sensitive adhesive holding film in the horizontal direction. Consists of a stretching outer frame that regulates stretching of the film,
After heat-processing the electronic component held on the adhesive holding film, the adhesive holding film is sandwiched between the stretching inner frame and the stretching outer frame of the stretching tool, and the surplus area of the adhesive retaining film is stretched and expanded in the horizontal direction. The holding region surface of the holding film is roughened by the protrusion of the release particles, and the electronic component is peeled off .

なお、保持枠は、中空の保持内枠と、この保持内枠に粘着保持フィルムの周縁部を介して着脱自在に嵌合する中空の保持外枠とを含むと良い。  The holding frame preferably includes a hollow holding inner frame and a hollow holding outer frame that is detachably fitted to the holding inner frame via the peripheral edge portion of the adhesive holding film.
また、粘着保持フィルムの裏面を凹凸に形成することができる。Moreover, the back surface of the pressure-sensitive adhesive holding film can be formed uneven.

また、本発明においては上記課題を解決するため、請求項1、2、又は3記載の電子部品保持具の粘着保持フィルムに薄型の電子部品を保持させ、この電子部品を加熱加工した後、粘着保持フィルムを延伸具で水平方向に延伸することにより、粘着保持フィルムから電子部品を剥離する電子部品の剥離方法であって、
粘着保持フィルムに保持させた電子部品を加熱加工した後、粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムの余剰領域を水平方向に延伸拡張し、粘着保持フィルムの保持領域表面を剥離粒子の突出により粗面化して電子部品を剥離することを特徴としている。
Further, in the present invention, in order to solve the above-mentioned problem , a thin electronic component is held on the adhesive holding film of the electronic component holder according to claim 1, 2, or 3, and the electronic component is heated and processed. An electronic component peeling method for peeling an electronic component from an adhesive holding film by stretching the holding film in a horizontal direction with a stretching tool ,
After heat-processing the electronic component held on the adhesive holding film, the adhesive holding film is sandwiched between the stretching inner frame and the stretching outer frame of the stretching tool, and the excess area of the adhesive retaining film is stretched and expanded in the horizontal direction to hold the adhesive. It is characterized by peeling the electronic component by roughening the surface of the holding region of the film by the protruding protruding particles .

ここで、特許請求の範囲における保持枠は、保持内枠と保持外枠とからなるものが好ましいが、単一の枠でも良い。この保持枠は、リング形、矩形の枠、多角形の枠等に形成することができる。また、薄型の電子部品には、少なくとも単数複数の半導体チップや半導体ウェーハ(φ200mm、300mm、450mmタイプ等)が含まれる。   Here, the holding frame in the claims is preferably a holding inner frame and a holding outer frame, but may be a single frame. The holding frame can be formed in a ring shape, a rectangular frame, a polygonal frame, or the like. The thin electronic component includes at least one semiconductor chip and a semiconductor wafer (φ200 mm, 300 mm, 450 mm type, etc.).

粘着保持フィルムの余剰領域は、エンドレスであることが好ましい。また、粘着保持フィルムの延伸は、一軸延伸や二軸延伸を問うものではない。延伸手段は、特に限定されるものではないが、延伸内枠と延伸外枠とからなる延伸具が好ましい。さらに、本発明に係る電子部品保持具は、少なくとも電子部品の保持、各種加工(例えば、常温加工、印刷加工、加熱加工)、検査、搬送、剥離等に使用することができる。加熱加工には、少なくとも積層接着剤の形成やハンダリフローが含まれる。   The surplus area of the adhesive holding film is preferably endless. In addition, the stretching of the adhesive holding film does not ask for uniaxial stretching or biaxial stretching. The stretching means is not particularly limited, but a stretching tool composed of a stretching inner frame and a stretching outer frame is preferable. Furthermore, the electronic component holder according to the present invention can be used for at least holding of an electronic component, various types of processing (for example, room temperature processing, printing processing, heating processing), inspection, conveyance, peeling, and the like. The heat processing includes at least the formation of a laminating adhesive and solder reflow.

本発明によれば、電子部品保持具から電子部品を取り外す場合には、粘着保持フィルムの余剰領域を略水平方向に延伸し、粘着保持フィルムの表面を剥離粒子により粗面化してこの表面から電子部品を部分的に剥離し、その後、粘着保持フィルムの表面から電子部品を完全に剥離して取り外せば良い。   According to the present invention, when removing an electronic component from the electronic component holder, the excess region of the adhesive holding film is stretched in a substantially horizontal direction, and the surface of the adhesive holding film is roughened by the release particles, and the electronic component is removed from the surface. The part may be partially peeled, and then the electronic part may be completely peeled off from the surface of the adhesive holding film.

本発明によれば、粘着剤が積層した粘着保持フィルムを使用するのではなく、自己粘着性の粘着保持フィルムを使用するので、電子部品に粘着剤が残存するのを有効に抑制することができるという効果がある。また、粘着保持フィルムを垂直方向に強く突き上げて延伸するのではなく、粘着保持フィルムを水平方向に延伸するので、電子部品が比較的大きな半導体チップの他、電子部品が50μm以下の小さな薄型の半導体チップの場合でも、半導体チップを損傷させるおそれが少ない。電子部品が広い面積の半導体ウェーハの場合にも、同様に破損するおそれを抑制することができる。
また、粘着保持フィルムの熱膨張率を考慮し、保持枠に粘着保持フィルムの周縁部を予め延伸して固定するので、電子部品保持具に電子部品を保持させて加熱する場合に、加熱に伴い粘着保持フィルムが熱膨張して撓み、粘着保持フィルムを水平方向に延伸するのに支障を来たすことがない。また、延伸具を、粘着保持フィルムに圧接されて粘着保持フィルムを水平方向に延伸する中空の延伸内枠と、この延伸内枠に粘着保持フィルムの余剰領域を介して嵌合され、粘着保持フィルムの延伸を規制する延伸外枠とから形成するので、簡易な構成で粘着保持フィルムを水平方向に延伸することが可能になる。さらに、剥離粒子の平均粒径の上限値が粘着保持フィルムの厚さなので、剥離粒子の突出に伴い、電子部品を粘着することが困難になるのを防止することが可能になる。
According to the present invention, since a self-adhesive pressure-sensitive adhesive holding film is used instead of using a pressure-sensitive adhesive laminated film, it is possible to effectively suppress the pressure-sensitive adhesive from remaining in an electronic component. There is an effect. Also, the adhesive holding film is not horizontally pushed up and stretched, but the adhesive holding film is stretched in the horizontal direction. Therefore, in addition to a relatively large semiconductor chip, the electronic component is a small thin semiconductor having an electronic component of 50 μm or less. Even in the case of a chip, there is little risk of damaging the semiconductor chip. In the case where the electronic component is a semiconductor wafer having a large area, the risk of breakage can be similarly suppressed.
Also, considering the coefficient of thermal expansion of the adhesive holding film, the peripheral edge of the adhesive holding film is stretched and fixed in advance to the holding frame, so when the electronic component holder is held and heated, The pressure-sensitive adhesive holding film is thermally expanded and bent, and there is no problem in stretching the pressure-sensitive adhesive holding film in the horizontal direction. In addition, the stretching tool is fitted into a hollow stretched inner frame that is pressed against the pressure-sensitive adhesive holding film to stretch the pressure-sensitive adhesive holding film in the horizontal direction, and the stretched inner frame is fitted via an excess region of the pressure-sensitive adhesive holding film, Therefore, the adhesive holding film can be stretched in the horizontal direction with a simple configuration. Furthermore, since the upper limit value of the average particle size of the release particles is the thickness of the adhesive holding film, it becomes possible to prevent the electronic component from being difficult to adhere as the release particles protrude.

また、保持枠を、中空の保持内枠と、この保持内枠に粘着保持フィルムの周縁部を介して着脱自在に嵌合する中空の保持外枠とから構成すれば、簡易な構成で粘着保持フィルムを延伸しながら容易に固定したり、あるいは粘着保持フィルムを迅速に取り外すことができる。
また、粘着保持フィルムの裏面を凹凸に形成すれば、粘着保持フィルムの余剰領域から保持領域に延伸力を適切に伝搬して電子部品の剥離性を向上させることができる。
If the holding frame is composed of a hollow holding inner frame and a hollow holding outer frame that is detachably fitted to the holding inner frame via the peripheral edge of the adhesive holding film, the adhesive holding can be performed with a simple configuration. The film can be easily fixed while being stretched, or the adhesive holding film can be quickly removed.
Moreover, if the back surface of the pressure-sensitive adhesive holding film is formed to be uneven, it is possible to appropriately propagate the stretching force from the surplus area of the pressure-sensitive adhesive holding film to the holding area and improve the peelability of the electronic component.

本発明に係る電子部品保持具及び電子部品の剥離方法の実施形態における使用状態を模式的に示す断面説明図である。It is a section explanatory view showing typically the use state in the embodiment of the electronic component holder and electronic component peeling method concerning the present invention. 本発明に係る電子部品保持具の実施形態を模式的に示す断面説明図である。It is a section explanatory view showing typically an embodiment of an electronic component holder concerning the present invention. 本発明に係る電子部品保持具の実施形態における粘着保持フィルムと電子部品とを模式的に示す平面説明図である。It is plane explanatory drawing which shows typically the adhesion holding film and electronic component in embodiment of the electronic component holder which concerns on this invention. 本発明に係る電子部品保持具の実施形態における粘着保持フィルムと他の電子部品とを模式的に示す平面説明図である。It is plane explanatory drawing which shows typically the adhesion holding film and other electronic component in embodiment of the electronic component holder which concerns on this invention. 本発明に係る電子部品保持具及び電子部品の剥離方法の第2の実施形態を模式的に示す断面説明図である。It is a section explanatory view showing typically a 2nd embodiment of an electronic component holder concerning the present invention, and a peeling method of an electronic component. 本発明に係る電子部品保持具及び電子部品の剥離方法の第3の実施形態を模式的に示す部分断面説明図である。It is a fragmentary sectional view showing typically a 3rd embodiment of an electronic component holder concerning the present invention, and a peeling method of an electronic component.

以下、図面を参照して本発明に係る電子部品保持具の好ましい実施形態を説明すると、本実施形態における電子部品保持具は、図1ないし図4に示すように、中空の保持枠1と、この保持枠1の中空部を被覆して薄型の電子部品10を剥離可能に粘着保持する伸縮可能な粘着保持フィルム20とを備え、粘着保持フィルム20を延伸手段である延伸具30により水平方向に必要回数延伸拡張することで、粘着保持フィルム20中の剥離粒子22を利用して粘着保持フィルム20の表面から電子部品10を剥離するようにしている。   Hereinafter, a preferred embodiment of an electronic component holder according to the present invention will be described with reference to the drawings. As shown in FIGS. 1 to 4, the electronic component holder according to the present embodiment includes a hollow holding frame 1, And a stretchable adhesive holding film 20 that covers the hollow portion of the holding frame 1 and holds the thin electronic component 10 in a peelable manner. The adhesive holding film 20 is horizontally stretched by a stretching tool 30 as a stretching means. By extending and expanding the required number of times, the electronic component 10 is peeled from the surface of the adhesive holding film 20 using the release particles 22 in the adhesive holding film 20.

保持枠1は、図1や図2に示すように、耐熱性を有する所定の材料を使用して平面リング形に形成される。この保持枠1の材料は、特に限定されるものではないが、例えばガラス、ステンレス、PPSや液晶ポリマー、フェノールに代表される熱硬化性樹脂等があげられる。   As shown in FIGS. 1 and 2, the holding frame 1 is formed into a planar ring shape using a predetermined material having heat resistance. The material of the holding frame 1 is not particularly limited, and examples thereof include glass, stainless steel, PPS, liquid crystal polymer, and thermosetting resin represented by phenol.

薄型の電子部品10は、図1ないし図4に示すように、特に限定されるものではないが、例えば50μm以下の小さな薄型の半導体チップ11、あるいは薄くバックグラインドされた脆い平面円形の半導体ウェーハ12があげられる。   The thin electronic component 10 is not particularly limited as shown in FIGS. 1 to 4, but is a small thin semiconductor chip 11 of, for example, 50 μm or less, or a brittle planar circular semiconductor wafer 12 thinly ground. Is given.

粘着保持フィルム20は、図1に示すように、自己粘着性のエラストマー21に剥離粒子22を埋没配合させることにより可撓性を有する平面円形の薄膜に成形され、保持枠1に緊張した状態、あるいは予め延伸拡張された状態で固定されており、延伸拡張時(図1の矢印参照)に剥離粒子22が鏡面の表面から部分的に突出することにより粘着した電子部品10の剥離を容易にするよう機能する。   As shown in FIG. 1, the adhesive holding film 20 is formed into a flexible flat circular thin film by embedding the release particles 22 in a self-adhesive elastomer 21 and is in a state of being tensioned to the holding frame 1. Alternatively, it is fixed in a stretched and expanded state in advance, and the peeling particles 22 partially protrude from the mirror surface during stretching and expansion (see the arrow in FIG. 1) to facilitate peeling of the adhered electronic component 10. It works as follows.

係る粘着保持フィルム20は、図1、図3、図4に示すように、中央部が電子部品10用の保持領域23に区画形成され、この保持領域23の周囲と保持枠1の内周面との間が余剰領域24に区画形成されており、この余剰領域24の周縁の周縁部が保持枠1の周面に固定される。粘着保持フィルム20の保持枠1に対する固定方法としては、特に限定されるものではなく、例えば接着剤、両面粘着材、リベットを使用する方法、嵌合する方法、挟持する方法等があげられる。   As shown in FIGS. 1, 3, and 4, the adhesive holding film 20 has a central portion partitioned into a holding region 23 for the electronic component 10, and the periphery of the holding region 23 and the inner peripheral surface of the holding frame 1. Is formed in a surplus area 24, and the peripheral edge portion of the surplus area 24 is fixed to the peripheral surface of the holding frame 1. The method for fixing the adhesive holding film 20 to the holding frame 1 is not particularly limited, and examples thereof include an adhesive, a double-sided adhesive material, a method using rivets, a fitting method, and a sandwiching method.

但し、電子部品保持具がエポキシ樹脂等の積層接着剤(DAF)の形成やハンダリフロー等、200℃を超える温度域の加熱工程で使用される場合には、接着剤や両面粘着材の接着力が低下したり、劣化が懸念されるので、リベットを使用する方法、嵌合する方法、挟持する方法が好ましい。   However, if the electronic component holder is used in a heating process in the temperature range exceeding 200 ° C, such as the formation of laminated adhesive (DAF) such as epoxy resin or solder reflow, the adhesive strength of the adhesive or double-sided adhesive material Therefore, a method of using rivets, a method of fitting, and a method of clamping are preferable.

粘着保持フィルム20のエラストマー21は、製造が容易で安価な熱可塑性エラストマーとゴムとが該当し、熱可塑性エラストマーには、オレフィン系、スチレン系、ウレタン系、ポリエステル系等が含まれ、ゴムには、EPDM、シリコーンゴム、フッ素ゴム組成物、ブチルゴム、ブタジエンゴム、天然ゴム等が含まれる。これらの材料中、電子部品保持具が加熱工程で使用される場合には、エラストマー21として耐熱性に優れるシリコーンゴムやフッ素ゴム組成物の選択が好ましい。   The elastomer 21 of the adhesive holding film 20 includes thermoplastic elastomers and rubbers that are easy to manufacture and inexpensive, and thermoplastic elastomers include olefins, styrenes, urethanes, polyesters, etc. EPDM, silicone rubber, fluorine rubber composition, butyl rubber, butadiene rubber, natural rubber and the like. Among these materials, when the electronic component holder is used in the heating process, it is preferable to select a silicone rubber or a fluororubber composition having excellent heat resistance as the elastomer 21.

シリコーンゴムは硬化反応により付加反応型と縮合反応型とに分類され、この縮合反応型は、有機過酸化物加硫型と、水、酢酸、アミン類、オキシム類等を脱して縮合するタイプとに分類される。付加反応型のシリコーンゴムは、脂肪族不飽和基を有するオルガノポリシロキサンを主成分とし、オルガノハイドロジェンポリシロキサンが架橋剤、白金系化合物からなる触媒、アセチレンアルコール類等からなる反応抑制剤等から調製される。場合により、酸化ケイ素系粉末からなる補強剤、耐熱剤、難燃剤、流動調整剤、接着補助剤等の各種添加剤が配合されて機能が付与される。これらの主成分、架橋剤、触媒、反応抑制剤、各種添加剤の配合比は、自由に選択することができる。また、シリコーンゴムの硬化方法や硬化条件は、特に問うものではない。   Silicone rubber is classified into an addition reaction type and a condensation reaction type by a curing reaction. This condensation reaction type includes an organic peroxide vulcanization type and a type that condenses by removing water, acetic acid, amines, oximes, and the like. are categorized. The addition reaction type silicone rubber is mainly composed of an organopolysiloxane having an aliphatic unsaturated group, and the organohydrogenpolysiloxane is composed of a crosslinking agent, a catalyst comprising a platinum compound, a reaction inhibitor comprising an acetylene alcohol, and the like. Prepared. In some cases, various additives such as a reinforcing agent made of silicon oxide powder, a heat-resistant agent, a flame retardant, a flow control agent, and an adhesion aid are blended to provide a function. The mixing ratio of these main components, crosslinking agent, catalyst, reaction inhibitor, and various additives can be freely selected. Further, the curing method and curing conditions of the silicone rubber are not particularly limited.

フッ素ゴム組成物は、その第一成分のフッ素ゴムとして、様々なタイプが使用可能である。具体的には、フッ化ビニリデン系共重合体、例えばフッ化ビニリデン及び四フッ化エチレンから選択される少なくとも1種と六フッ化プロピレンとの共重合体、フッ化ビニリデン、四フッ化エチレン、五フッ化プロピレン、及び六フッ化プロピレンから選択される少なくとも1種と、これらと共重合体可能な単量体との共重合体(例えば、トリフルオロエチレントリフルオロメチルエーテル等の側鎖にエーテル結合を有するオレフィン類、エチレン、プロピレン、イソブチレン等のオレフィン類、トリフルオロエチレン、モノクロルトリフルオロエチレン等のハロゲン化オレフィン類、パーフルオロブチルエチレン(CCH=CH)、パーフルオロヘキサエチレン(C13CH=CH)、パーフルオロオクチルエチレン(C17CH=CH)等のフッ化アルキル基を有するオレフィン類、パーフルオロパーフルオロビニルエーテル、アルキル‐フルオロビニルエーテル等のハロゲン化エーテル類、エチルビニルエーテル等のエーテル類等)があげられ、これらを1種又は2種以上を組み合わせて使用することができる。 Various types of fluororubber compositions can be used as the first component fluororubber. Specifically, a vinylidene fluoride copolymer, for example, a copolymer of at least one selected from vinylidene fluoride and tetrafluoroethylene and propylene hexafluoride, vinylidene fluoride, tetrafluoroethylene, five Copolymer of at least one selected from propylene fluoride and hexafluoropropylene and a monomer copolymerizable therewith (for example, ether bond to side chain such as trifluoroethylene trifluoromethyl ether) , Olefins such as ethylene, propylene and isobutylene, halogenated olefins such as trifluoroethylene and monochlorotrifluoroethylene, perfluorobutylethylene (C 4 F 9 CH═CH 2 ), perfluorohexaethylene ( C 6 F 13 CH = CH 2 ), perfluorooctyl ethylene les Olefins having (C 9 F 17 CH = CH 2) fluorinated alkyl groups such as perfluoro perfluorovinyl ether, alkyl - halogenated ethers such as fluorovinyl ether, ethers such as ethyl vinyl ether) and the like, These can be used alone or in combination of two or more.

係るフッ素ゴムとして、具体的には、デュポン社製VITONシリーズ、3M社製フローレルシリーズ、ダイキン工業社製ダイエルシリーズ、JSR・旭硝子社製アフラスシリーズ、旭モント社製テクノフロンシリーズ、ダウケミカル社製カルレッツ等を採用することができる。また、信越化学工業社製として、パーフルオロパーフルオロビニルエーテル、アルキル‐フルオロビニルエーテル等のハロゲン化エーテル類にケイ素系化合物を導入し、ヒドロシリル化反応により硬化させるフッ素ゴムとしてSIFELがあるが、これらを採用することも可能である。   Specific examples of such fluororubbers include DuPont's VITON series, 3M's Florel series, Daikin Industries' Daiel series, JSR / Asahi Glass's Afras series, Asahimont's Technoflon series, Dow Chemical Kalrez or the like can be used. In addition, SIFEL is available as a fluororubber made by Shin-Etsu Chemical Co., Ltd. as a fluororubber that is cured by hydrosilylation reaction by introducing silicon compounds into halogenated ethers such as perfluoroperfluorovinyl ether and alkyl-fluorovinyl ether. It is also possible to do.

剥離粒子22は、特に制限されるものではないが、エラストマー21と比較して線膨張係数が低い無機物の粒子、特に電子部品10取り外しの利便性に資するアスペクト比の低い定形・不定形の粒子であることが好ましい。また、剥離粒子22は、ビーズのような独立した粒子の他、凝集性の粒子でも良い。このような剥離粒子22としては、ポリエチレンやアクリル等の高分子系粒子、ガラス粒子、シリカ粒子、セラミック粒子、カーボン粒子、炭酸カルシウム等があげられる。これらの中でも高温の加熱工程で電子部品保持具が使用される場合を考慮すると、無機系粒子が好ましい。   The release particle 22 is not particularly limited, but is an inorganic particle having a low linear expansion coefficient compared to the elastomer 21, particularly a regular / indeterminate particle having a low aspect ratio that contributes to the convenience of removing the electronic component 10. Preferably there is. The release particles 22 may be agglomerated particles in addition to independent particles such as beads. Examples of such release particles 22 include polymer particles such as polyethylene and acrylic, glass particles, silica particles, ceramic particles, carbon particles, and calcium carbonate. Among these, inorganic particles are preferable in consideration of the case where the electronic component holder is used in a high-temperature heating process.

剥離粒子22の粒径、すなわち平均粒径αについてであるが、剥離粒子22の平均粒径αが小さすぎると、粘着保持フィルム20の延伸拡張時に、延伸拡張の応力が電子部品10を剥離するベクトルとして作用しにくくなるので、留意すべきである。例えば、剥離粒子22の一次粒子が0.02μmのシリカの場合、湿式シリカ等、凝集性の強いシリカは、シリコーンゴムに白濁した状態で分散され、可視光線の波長よりも大きな凝集粒子として分散されるが、これをフィルム化すれば、延伸拡張により電子部品10を剥離することができる。   Regarding the particle size of the release particles 22, that is, the average particle size α, if the average particle size α of the release particles 22 is too small, the stretching expansion stress peels the electronic component 10 when the adhesive holding film 20 is stretched and expanded. It should be noted that it becomes difficult to act as a vector. For example, when the primary particles of the release particles 22 are 0.02 μm silica, highly cohesive silica such as wet silica is dispersed in the silicone rubber in a cloudy state and dispersed as aggregated particles larger than the wavelength of visible light. However, if this is formed into a film, the electronic component 10 can be peeled off by stretching.

これに対し、乾式シリカは、シリコーンゴムに透明な状態で分散され、可視光線の波長よりも小さな凝集粒子として分散されるが、これをフィルム化すると、延伸拡張により電子部品10を剥離することができない。これらのことから、剥離粒子22の平均粒径αは、延伸拡張により電子部品10を剥離する場合、可視光線の波長が数μmであるから、少なくとも1μm以上の大きさを必要とする。   On the other hand, dry silica is dispersed in silicone rubber in a transparent state and dispersed as aggregated particles smaller than the wavelength of visible light. However, when this is formed into a film, the electronic component 10 may be peeled off by stretching. Can not. For these reasons, the average particle diameter α of the release particles 22 needs to be at least 1 μm because the wavelength of visible light is several μm when the electronic component 10 is peeled by stretching.

剥離粒子22の平均粒径αの上限値については、粘着保持フィルム20の厚さよりも大きな剥離粒子22が配合されると、剥離粒子22が突出して電子部品10を粘着することができなくなるので、粘着保持フィルム20の厚さが上限値となる。すなわち、剥離粒子22の平均粒径αの下限値が1μmであるから、剥離粒子22の平均粒径αの範囲は、粘着保持フィルム20の無延伸拡張時の厚さをtとすると、1>α>tの数式で表される範囲となる。   About the upper limit of the average particle diameter α of the release particles 22, when the release particles 22 larger than the thickness of the adhesive holding film 20 are blended, the release particles 22 protrude and cannot adhere the electronic component 10. The thickness of the adhesive holding film 20 becomes the upper limit value. That is, since the lower limit of the average particle diameter α of the release particles 22 is 1 μm, the range of the average particle diameter α of the release particles 22 is 1> This is a range represented by a formula of α> t.

粘着保持フィルム20を必要回数延伸拡張する場合、例えば延伸拡張の前に予め延伸拡張して固定しておく場合には、無延伸拡張時の粘着保持フィルム20の厚さよりも剥離粒子22が大きいと、剥離粒子22が突出して電子部品10の粘着に支障を来たすので、粘着保持フィルム20の厚さが上限となる。   In the case where the adhesive holding film 20 is stretched and expanded as many times as necessary, for example, in the case where the film is stretched and expanded in advance before stretching and extended, the release particles 22 are larger than the thickness of the adhesive holding film 20 at the time of non-stretching expansion. Since the peeling particles 22 protrude and interfere with the adhesion of the electronic component 10, the thickness of the adhesive holding film 20 becomes the upper limit.

ここで、粘着保持フィルム20の無延伸拡張時の厚さをtとし、予め粘着保持フィルム20をX倍の面積に延伸拡張しておき、さらに粘着保持フィルム20の面積に延伸拡張して電子部品10を剥離する場合、延伸拡張した粘着保持フィルム20の厚さはt/Xとなる。したがって、係る厚さで剥離粒子22を突出させない場合には、剥離粒子22の平均粒径αの範囲は、1>α>t/Xの数式で表される範囲となる。   Here, the thickness at the time of non-stretching expansion of the adhesive holding film 20 is t, the adhesive holding film 20 is stretched and expanded in advance to an X times area, and further stretched and expanded to the area of the adhesive holding film 20 to be an electronic component. When 10 is peeled off, the thickness of the stretched and expanded adhesive holding film 20 is t / X. Therefore, in the case where the release particles 22 are not protruded with such a thickness, the range of the average particle diameter α of the release particles 22 is a range represented by a formula of 1> α> t / X.

なお、粘着保持フィルム20に当初から1μm以下の剥離粒子22が配合されているマトリックスについては、1μm以上の剥離粒子22を配合することができる。例えば、乾式シリカの混合したシリコーンゴムは、可視光線以下の粒子形状により分散され、拡張による剥離の伝播が生じにくいが、1μm以上の剥離粒子22を配合すれば、拡張による剥離を伝播させることができる。また、湿式シリカは、電子部品保持具が加熱工程で使用される場合、表面が活性で電子部品10と接着して取り外しが困難になるので、使用を控えることが好ましい。   In addition, about the matrix in which 1 micrometer or less exfoliation particle 22 is mix | blended with the adhesion holding film 20 from the beginning, 1 micrometer or more exfoliation particle 22 can be mix | blended. For example, a silicone rubber mixed with dry silica is dispersed with a particle shape of visible light or less and hardly propagates peeling due to expansion. However, if peeling particles 22 of 1 μm or more are blended, peeling due to expansion can be propagated. it can. In addition, when the electronic component holder is used in the heating process, it is preferable to refrain from using wet silica because the surface is active and adheres to the electronic component 10 and is difficult to remove.

剥離粒子22の添加量は、特に制限されるものではないが、添加量が多いと電子部品10の粘着が困難になる。例えば、剥離粒子22の粒径が1〜5μmの場合には、30phr程度まで配合することができ、剥離粒子22の粒径が5〜20μmの場合には、10phr程度まで配合することができる。また、剥離粒子22の粒径が20μmを超える場合には、5phr程度まで配合することができる。いずれにしろ、0.1phr未満の場合には、電子部品10の剥離効果が期待できなくなるので、0.1phr以上が好ましい。   The addition amount of the release particles 22 is not particularly limited, but if the addition amount is large, it is difficult to adhere the electronic component 10. For example, when the particle size of the release particles 22 is 1 to 5 μm, it can be added up to about 30 phr, and when the particle size of the release particles 22 is 5 to 20 μm, it can be added up to about 10 phr. Moreover, when the particle size of the peeling particle 22 exceeds 20 micrometers, it can mix | blend to about 5 phr. In any case, if it is less than 0.1 phr, the peeling effect of the electronic component 10 cannot be expected, so 0.1 phr or more is preferable.

粘着保持フィルム20の粘着力や剥離力は、電子部品10の被粘着面における表面状態により決定すれば良い。また、剥離力の調整は、電子部品10の硬度と粘着保持フィルム20の平滑性とにより調整することができる。   What is necessary is just to determine the adhesive force and peeling force of the adhesive holding | maintenance film 20 with the surface state in the to-be-adhered surface of the electronic component 10. FIG. Further, the peeling force can be adjusted by adjusting the hardness of the electronic component 10 and the smoothness of the adhesive holding film 20.

延伸具30は、図1に示すように、粘着保持フィルム20の裏面の保持領域23に圧接されて粘着保持フィルム20を水平方向に延伸する中空の延伸内枠31と、この延伸内枠31に粘着保持フィルム20の余剰領域24を介して表面側から嵌合され、粘着保持フィルム20の延伸を規制する延伸外枠32とを備えて構成される。これら延伸内枠31と延伸外枠32とは、例えば保持枠1と同様の材料やナイロン樹脂等を使用してそれぞれ平面リング形に形成される。   As shown in FIG. 1, the stretching tool 30 is in contact with the holding region 23 on the back surface of the pressure-sensitive adhesive holding film 20 so as to stretch the pressure-sensitive adhesive holding film 20 in the horizontal direction. A stretched outer frame 32 that is fitted from the surface side through the surplus region 24 of the adhesive holding film 20 and regulates the stretching of the adhesive holding film 20 is configured. The extending inner frame 31 and the extending outer frame 32 are each formed into a planar ring shape using, for example, the same material as that of the holding frame 1 or nylon resin.

上記構成において、電子部品保持具に電子部品10を保持させる場合には、粘着保持フィルム20の表面の保持領域23に電子部品10を押圧して保持させれば良い。これに対し、電子部品保持具から電子部品10を剥離して取り外す場合には、粘着保持フィルム20を延伸具30の延伸内枠31と延伸外枠32とに挟持させ、粘着保持フィルム20の余剰領域24を水平方向に延伸(エキスパンド)拡張し、粘着保持フィルム20の表面の保持領域23を剥離粒子22の突出により粗面化してこの保持領域23から電子部品10を部分的に剥離する。   In the above configuration, when the electronic component 10 is held by the electronic component holder, the electronic component 10 may be pressed and held in the holding region 23 on the surface of the adhesive holding film 20. On the other hand, when peeling and removing the electronic component 10 from the electronic component holder, the adhesive holding film 20 is sandwiched between the stretched inner frame 31 and the stretched outer frame 32 of the stretching tool 30, and the excess of the adhesive retaining film 20 The region 24 is expanded (expanded) in the horizontal direction, and the holding region 23 on the surface of the adhesive holding film 20 is roughened by the protrusion of the release particles 22, and the electronic component 10 is partially peeled from the holding region 23.

この際、粘着保持フィルム20は、剥離の偏りを防止する観点から中心部から同心円に均等に延伸拡張することが好ましい。そしてその後、粘着保持フィルム20の保持領域23から電子部品10を吸着コレットにより吸着剥離して取り外せば、作業を終了することができる。   At this time, the adhesive holding film 20 is preferably stretched and expanded equally from the center to a concentric circle from the viewpoint of preventing uneven peeling. Then, the work can be completed by removing the electronic component 10 from the holding region 23 of the adhesive holding film 20 by suction peeling with a suction collet.

また、電子部品保持具に電子部品10を保持させて加熱工程に投入する場合には、先ず、加熱に伴い粘着保持フィルム20が熱膨張して緩むのを考慮し、粘着保持フィルム20を数式1に示すX倍の面積に予備的に延伸拡張し、保持枠1に固定する。こうして保持枠1に粘着保持フィルム20を固定したら、室温T1℃で粘着保持フィルム20の保持領域23に電子部品10を押圧して保持させ、室温よりも高い温度T2℃の加熱工程で電子部品10に加工を施す。   In addition, when the electronic component 10 is held by the electronic component holder and is put into the heating process, first, the adhesive holding film 20 is thermally expanded and loosened with heating, and the adhesive holding film 20 is expressed by Equation 1. Are expanded and expanded in advance to an X-fold area, and fixed to the holding frame 1. When the adhesive holding film 20 is fixed to the holding frame 1 in this way, the electronic component 10 is pressed and held in the holding region 23 of the adhesive holding film 20 at room temperature T1 ° C., and the electronic component 10 is heated at a temperature T2 ° C. higher than room temperature. Is processed.

X≧{δ×(T2−T1)}…(式1)
δ:粘着保持フィルムの線膨張係数
X ≧ {δ × (T2−T1)} 2 (Formula 1)
δ: Linear expansion coefficient of the adhesive holding film

係る予備的な延伸拡張の方法は、特に制限されるものではないが、例えば保持枠1に粘着保持フィルム20をその熱膨張率を考慮し、専用の治具や延伸装置により予め水平方向に延伸拡張して装着固定する方法等があげられる。   The preliminary stretching / expansion method is not particularly limited. For example, the adhesive retaining film 20 is stretched in the horizontal direction in advance by a dedicated jig or stretching device in consideration of the thermal expansion coefficient of the adhesive retaining film 20 on the retaining frame 1. For example, a method for expanding and fixing it.

電子部品10に加熱処理を施したら、延伸した粘着保持フィルム20を延伸具30の延伸内枠31と延伸外枠32とに挟持させ、粘着保持フィルム20の余剰領域24を水平方向にさらに延伸拡張し、粘着保持フィルム20の保持領域23を剥離粒子22の突出により粗面化してこの保持領域23から電子部品10を部分的に剥離した後、粘着保持フィルム20から電子部品10を吸着コレットにより吸着剥離して取り外せば良い。   When the electronic component 10 is subjected to heat treatment, the stretched adhesive holding film 20 is sandwiched between the stretched inner frame 31 and the stretched outer frame 32 of the stretching tool 30, and the surplus region 24 of the adhesive retaining film 20 is further stretched and expanded in the horizontal direction. Then, after the holding area 23 of the adhesive holding film 20 is roughened by the protrusion of the release particles 22 and the electronic component 10 is partially peeled from the holding area 23, the electronic component 10 is adsorbed from the adhesive holding film 20 by an adsorption collet. Remove and remove.

上記構成によれば、粘着剤が積層した粘着保持フィルム20を使用するのではなく、自己粘着性の粘着保持フィルム20を使用するので、電子部品10に粘着剤が残存するのを有効に抑制防止することができる。また、粘着保持フィルム20を垂直方向に強く突き上げて延伸するのではなく、粘着保持フィルム20を水平方向に延伸するので、電子部品10が比較的大きな半導体チップ11の他、電子部品10が50μm以下の小さな薄型の半導体チップ11の場合でも、半導体チップ11を損傷させるおそれが全くない。電子部品10が広い面積の半導体ウェーハ12の場合にも、同様に破損するおそれを抑制防止することができる。   According to the above configuration, since the self-adhesive pressure-sensitive adhesive holding film 20 is used instead of the pressure-sensitive adhesive laminated film 20, it is possible to effectively prevent and prevent the pressure-sensitive adhesive from remaining in the electronic component 10. can do. Further, the adhesive holding film 20 is not pushed up and stretched in the vertical direction, but is stretched in the horizontal direction, so that the electronic component 10 is 50 μm or less in addition to the relatively large semiconductor chip 11. Even in the case of a small and thin semiconductor chip 11, there is no possibility of damaging the semiconductor chip 11. Similarly, when the electronic component 10 is a semiconductor wafer 12 having a large area, it is possible to suppress and prevent the possibility of breakage.

次に、図5は本発明の第2の実施形態を示すもので、この場合には、保持枠1を、中空の保持内枠2と、この保持内枠2に粘着保持フィルム20の周縁部を介して着脱自在に密嵌する中空の保持外枠3とから形成するようにしている。   Next, FIG. 5 shows a second embodiment of the present invention. In this case, the holding frame 1 includes a hollow holding inner frame 2 and a peripheral portion of the adhesive holding film 20 on the holding inner frame 2. It is made to form from the hollow holding | maintenance outer frame 3 which fits detachably through.

保持内枠2と保持外枠3とは、上記保持枠1と同様の材料を使用してそれぞれ平面リング形に形成される。その他の部分については、上記実施形態と略同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、粘着保持フィルム20をリベット止めするのではなく、保持内枠2と保持外枠3との間に着脱自在に挟持するので、簡易な構成で粘着保持フィルム20を迅速に取り外したり、交換することができる。
The holding inner frame 2 and the holding outer frame 3 are each formed into a planar ring shape using the same material as the holding frame 1. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.
In this embodiment, the same effect as the above embodiment can be expected, and the adhesive holding film 20 is not riveted but is detachably held between the holding inner frame 2 and the holding outer frame 3. The adhesive holding film 20 can be quickly removed or replaced with a simple configuration.

次に、図6は本発明の第3の実施形態を示すもので、この場合には、電子部品10の粘着しない粘着保持フィルム20の裏面25を凹凸に形成し、粘着保持フィルム20の延伸拡張の伝搬性を向上させるようにしている。   Next, FIG. 6 shows a third embodiment of the present invention. In this case, the back surface 25 of the non-adhesive adhesive holding film 20 of the electronic component 10 is formed to be uneven, and the adhesive holding film 20 is stretched and expanded. It is trying to improve the propagating property.

粘着保持フィルム20の裏面25を凹凸に形成する方法としては、特に限定されるものではないが、例えば、エンボス加工やしぼ入りフィルム(きもと社製:商品名マットルミラー)により凹凸を転写加工する方法等が採用される。その他の部分については、上記実施形態と略同様であるので説明を省略する。   The method for forming the back surface 25 of the pressure-sensitive adhesive holding film 20 with irregularities is not particularly limited. For example, a method of transferring the irregularities by embossing or a film containing wrinkles (trade name: Mattle Mirror). Etc. are adopted. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.

本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、粘着保持フィルム20の裏面25を凹凸に形成して摩擦係数を小さくするので、例え粘着保持フィルム20を延伸具30で挟持しても、粘着保持フィルム20の延伸拡張の伝搬性の低下を招くのを防ぐことができる。したがって、粘着保持フィルム20の余剰領域24から保持領域23に延伸拡張を適切に伝搬して電子部品10の剥離性を向上させることができるのは明らかである。また、保持枠1を台座等に配置する際、台座等に粘着保持フィルム20の裏面25が粘着して取り外しに支障を来たすのを有効に防ぐこともできる。   In this embodiment, the same effect as that of the above embodiment can be expected, and the back surface 25 of the adhesive holding film 20 is formed in irregularities to reduce the friction coefficient. For example, the adhesive holding film 20 is sandwiched by the stretching tool 30. Even so, it is possible to prevent a decrease in the propagation property of the stretch expansion of the adhesive holding film 20. Therefore, it is obvious that the stretch expansion can be properly propagated from the surplus area 24 of the adhesive holding film 20 to the holding area 23 to improve the peelability of the electronic component 10. Moreover, when arrange | positioning the holding frame 1 on a base etc., it can also prevent effectively that the back surface 25 of the adhesion holding | maintenance film 20 adheres to a base etc., and obstructs removal.

なお、薄型の電子部品10は、複数の半導体チップ11や半導体ウェーハ12以外の部品でも良い。また、上記実施形態では粘着保持フィルム20を延伸具30により水平方向に延伸したが、他の延伸手段により水平方向に延伸しても良い。   The thin electronic component 10 may be a component other than the plurality of semiconductor chips 11 and the semiconductor wafer 12. Moreover, in the said embodiment, although the adhesion holding film 20 was extended | stretched in the horizontal direction with the extending | stretching tool 30, you may extend | stretch in the horizontal direction with another extending | stretching means.

以下、本発明に係る電子部品保持具及び電子部品の剥離方法の実施例を比較例と共に説明する。   Embodiments of an electronic component holder and an electronic component peeling method according to the present invention will be described below together with comparative examples.

先ず、乾式シリカが充填剤として配合された付加反応型シリコーンゴム(信越化学工業社製:商品名KE−1950)のA、B液の双方に、平均粒径が30μmの剥離粒子であるガラスビーズ(住友スリーエム社製:商品名S60)をそれぞれ2phr添加して混合した。こうしてガラスビーズをそれぞれ添加して混合したら、A、B液を混合して当該混合溶液をプレス機により加圧しながら150℃に加熱し、厚さ30μm、直径400mmのフィルムを平面円形に製造した。   First, glass beads which are exfoliated particles having an average particle size of 30 μm in both the A and B liquids of addition reaction type silicone rubber (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-1950) containing dry silica as a filler. 2 phr (Sumitomo 3M, product name: S60) was added and mixed. When the glass beads were added and mixed in this way, the A and B liquids were mixed and the mixed solution was heated to 150 ° C. while being pressed by a press machine to produce a film having a thickness of 30 μm and a diameter of 400 mm in a flat circular shape.

次いで、フィルムの表面に50μmの厚さを有するPET製の鏡面フィルムを重ねて鏡面を転写し、フィルムの裏面に粗面加工されたPET製フィルムを重ねて粗面を転写した。こうしてフィルムに転写加工を施したら、鏡面フィルムとPET製フィルムをそれぞれ剥離し、フィルムをステンレス製のリングに固定して200℃のオーブンに4時間セットし、二次加硫して粘着保持フィルムを製造した。ステンレス製のリングは、内径38mm、外径50mmの大きさとした。   Next, a mirror surface made of PET having a thickness of 50 μm was superimposed on the surface of the film to transfer the mirror surface, and a roughened PET film was superimposed on the back surface of the film to transfer the rough surface. Once the film has been transferred, the mirror film and the PET film are peeled off, the film is fixed to a stainless steel ring, set in an oven at 200 ° C. for 4 hours, and subjected to secondary vulcanization to form an adhesive holding film. Manufactured. The stainless steel ring had an inner diameter of 38 mm and an outer diameter of 50 mm.

製造した粘着保持フィルムは、半導体チップに200℃、1時間の条件でエポキシ樹脂を積層硬化させる加熱工程、すなわちDAFの形成工程で半導体チップの粘着保持に用いることとした。具体的には、粘着保持フィルムに半導体チップを25℃で粘着保持するとともに、25℃で半導体チップとエポキシ樹脂とを積層し、エポキシ樹脂を200℃、1時間の条件で積層し、その後、粘着保持フィルムから半導体チップを25℃で取り外した。   The produced adhesion-holding film was used for adhesion holding of the semiconductor chip in the heating step of laminating and curing the epoxy resin on the semiconductor chip at 200 ° C. for 1 hour, that is, the DAF formation step. Specifically, the semiconductor chip is adhesively held on the adhesive holding film at 25 ° C., the semiconductor chip and the epoxy resin are laminated at 25 ° C., and the epoxy resin is laminated at 200 ° C. for 1 hour, and then the adhesive is adhered. The semiconductor chip was removed from the holding film at 25 ° C.

なお、シリコーンゴム製の粘着保持フィルムの線膨張率は、測定したところ、25〜200℃の温度範囲で2.85×10−4/℃であった。係る粘着保持フィルムを上記温度環境で使用する場合には、上記した式1から粘着保持フィルムを4.99×10−2(4.99%)伸張して使用する必要がある。したがって、200℃の加熱下で粘着保持フィルムに皺が生じないようにするためには、粘着保持フィルムの面積を4.99%(1.0499倍)の二乗である11%(1.10倍)拡張させる必要がある。 The linear expansion coefficient of the silicone rubber adhesive holding film was measured and found to be 2.85 × 10 −4 / ° C. in the temperature range of 25 to 200 ° C. When using such a pressure-sensitive adhesive film in the above temperature environment, it is necessary to use the pressure-sensitive adhesive film extended from the above-described formula 1 by 4.99 × 10 −2 (4.99%). Therefore, in order to prevent wrinkles from occurring on the adhesive holding film under heating at 200 ° C., the area of the adhesive holding film is 11% (1.10 times) which is the square of 4.99% (1.0499 times). ) It needs to be expanded.

次に、電子部品保持具を製造するため、先ず、ステンレス製の準備リングに粘着保持フィルムをアクリル系の両面テープで粘着固定し、この粘着保持フィルムの裏面中央部に、一辺が50mmの正方形をマジックペンで描き、延伸拡張の目安として観察するようにした。準備リングは、内径325mm、外径350mmの大きさとした。また、粘着保持フィルムは、緊張させたが、延伸拡張を施さなかった。   Next, in order to manufacture an electronic component holder, first, an adhesive holding film is adhesively fixed to a stainless steel preparation ring with an acrylic double-sided tape, and a square with a side of 50 mm is formed at the center of the back surface of the adhesive holding film. I drew it with a magic pen and observed it as a guideline for expansion. The preparation ring had an inner diameter of 325 mm and an outer diameter of 350 mm. Moreover, although the pressure-sensitive adhesive holding film was strained, it was not stretched and expanded.

粘着保持フィルムに正方形を描いたら、保持枠の保持内枠と保持外枠との間に取り外した粘着保持フィルムの周縁部を挟持させてその余剰部をカットし、電子部品保持具を製造した。保持枠の保持内枠は、液晶ポリマー製で、内径227mm、外径237mmの大きさとした。保持外枠は、液晶ポリマー製で、内径247mm、外径237mmの大きさとした。   When a square was drawn on the adhesive holding film, the peripheral part of the adhesive holding film removed between the holding inner frame and the holding outer frame of the holding frame was sandwiched, and the excess part was cut to manufacture an electronic component holder. The holding inner frame of the holding frame is made of a liquid crystal polymer and has an inner diameter of 227 mm and an outer diameter of 237 mm. The holding outer frame is made of a liquid crystal polymer and has an inner diameter of 247 mm and an outer diameter of 237 mm.

粘着保持フィルムに保持内枠のみを圧接して延伸拡張したところ、正方形の一辺が56mmに伸びた。また、保持枠の保持内枠と保持外枠との間に粘着保持フィルムを挟持させて電子部品保持具を製造したところ、正方形の一辺が57mmに伸び、粘着保持フィルムが1.25倍に延伸拡張された。   When only the holding inner frame was pressed against the pressure-sensitive adhesive holding film and expanded, one side of the square extended to 56 mm. In addition, when an electronic component holder was manufactured by sandwiching an adhesive holding film between the holding inner frame and the holding outer frame of the holding frame, one side of the square was extended to 57 mm, and the adhesive holding film was extended 1.25 times. expanded.

次いで、平滑なステージ上に電子部品である半導体チップ10個を配置し、この複数の半導体チップ個上に電子部品保持具を重ねてその粘着保持フィルムの裏面にローラを押圧し、粘着保持フィルムの表面に複数の半導体チップを粘着保持させた。各半導体チップは、厚さ100μm、3×5mmの大きさとした。   Next, 10 semiconductor chips, which are electronic components, are placed on a smooth stage, an electronic component holder is stacked on the plurality of semiconductor chip pieces, and a roller is pressed against the back surface of the adhesive holding film. A plurality of semiconductor chips were adhered and held on the surface. Each semiconductor chip had a thickness of 100 μm and a size of 3 × 5 mm.

粘着保持フィルムに複数の半導体チップを粘着保持させたら、半導体チップにエポキシ樹脂を積層塗布し、200℃の加熱炉に60分セットして室温に戻し、その後、30分放置したところ、半導体チップの温度が室温まで低下した。この状態で、半導体チップを真空ピンセットでピックアップしようと試みたが、取り外すことができなかった。また、粘着保持フィルムに皺も発生せず、複数の半導体チップの配列乱れや重なり等の異常も確認されなかった。   After a plurality of semiconductor chips are adhered and held on the adhesive holding film, an epoxy resin is laminated and applied to the semiconductor chips, set in a heating furnace at 200 ° C. for 60 minutes and then returned to room temperature, and then left for 30 minutes. The temperature dropped to room temperature. In this state, an attempt was made to pick up the semiconductor chip with vacuum tweezers, but it could not be removed. In addition, no wrinkles were generated in the adhesive holding film, and abnormalities such as disordered arrangement and overlapping of the plurality of semiconductor chips were not confirmed.

次いで、電子部品保持具の粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムの余剰領域を水平方向に延伸拡張し、半導体チップの一部を浮き上がらせた。延伸具の延伸内枠は、ナイロン樹脂製で、内径195mm、外径203mmの大きさとした。延伸外枠は、ナイロン樹脂製で、内径203mm、外径210mmの大きさとした。   Next, the adhesive holding film of the electronic component holder was sandwiched between the stretched inner frame and the stretched outer frame of the stretching tool, and the surplus area of the adhesive retaining film was stretched and expanded in the horizontal direction, so that a part of the semiconductor chip was lifted. The stretching inner frame of the stretching tool was made of nylon resin, and had a diameter of 195 mm and a diameter of 203 mm. The stretched outer frame was made of nylon resin, and had an inner diameter of 203 mm and an outer diameter of 210 mm.

粘着保持フィルムに延伸内枠のみを専用ステージを使用して圧接し、延伸拡張したところ、正方形の一辺が63mmに伸びた(面積1.59倍)。この際、粘着保持フィルムの裏面が粗れていたので、延伸外枠に対して摩擦抵抗がなく、粘着保持フィルムを円滑に延伸拡張することができた。粘着保持フィルムが延伸拡張したら、電子部品保持具を所定の場所に移し、粘着保持フィルムから半導体チップを真空ピンセットでピックアップしたところ、安全確実に取り外すことができた。   When only the stretched inner frame was pressed into contact with the adhesive holding film using a dedicated stage and stretched and expanded, one side of the square extended to 63 mm (area 1.59 times). At this time, since the back surface of the adhesive holding film was rough, there was no frictional resistance against the stretched outer frame, and the adhesive holding film could be smoothly stretched and expanded. When the adhesive holding film was stretched and expanded, the electronic component holder was moved to a predetermined location, and when the semiconductor chip was picked up from the adhesive holding film with vacuum tweezers, it could be safely and reliably removed.

付加反応型シリコーンゴムにより、色調が白の粘着保持フィルムを製造し、その後、実施例1と同様にして電子部品保持具を製造し、粘着保持フィルムを15%延伸拡張させた。付加反応型シリコーンゴムは、湿式シリカが25重量%配合された主剤100phr(信越化学工業社製:商品名KE−153U)、硬化剤2.5phr(信越化学工業社製:商品名C−153A)、解媒0.03phr(信越化学工業社製:商品名CatPL2)、及び反応制御剤0.25phr(信越化学工業社製:商品名KE−153A)のゴムを使用した。また、湿式シリカは、1次粒径が0.02μm、2次粒径が8μmのシリカとした。   An adhesion-retaining film having a white color tone was produced from the addition reaction type silicone rubber, and then an electronic component holder was produced in the same manner as in Example 1, and the adhesion-holding film was stretched and expanded by 15%. The addition-reactive silicone rubber is composed of 100 phr of a base compound containing 25% by weight of wet silica (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-153U) and 2.5 phr of a curing agent (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name C-153A). A rubber having a solvent of 0.03 phr (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name CatPL2) and a reaction control agent of 0.25 phr (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-153A) was used. The wet silica was silica having a primary particle size of 0.02 μm and a secondary particle size of 8 μm.

実施例1と同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを粘着保持させ、電子部品保持具の粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムに水平方向に延伸拡張した。粘着保持フィルムに延伸内枠のみを専用ステージを使用して圧接し、延伸拡張したところ、正方形の一辺が60mmに伸びた(面積1.44倍)。この際、粘着保持フィルムの裏面が粗れていたので、延伸外枠に対して摩擦抵抗がなく、粘着保持フィルムを円滑に延伸拡張することができた。   As in Example 1, a plurality of semiconductor chips are adhered and held on the surface of the adhesive holding film of the electronic component holder, and the adhesive holding film of the electronic component holder is sandwiched between the stretching inner frame and the stretching outer frame of the stretching tool, The adhesive holding film was stretched and expanded in the horizontal direction. When only the stretched inner frame was press-contacted to the adhesive holding film using a dedicated stage and stretched and expanded, one side of the square was stretched to 60 mm (area 1.44 times). At this time, since the back surface of the adhesive holding film was rough, there was no frictional resistance against the stretched outer frame, and the adhesive holding film could be smoothly stretched and expanded.

付加反応型シリコーンゴム(信越化学工業社製:商品名KE−1950)のA、B液の双方に、平均粒径が18μmの剥離粒子であるガラスビーズ(住友スリーエム社製:商品名iMK30)をそれぞれ1phr添加して混合し、その後、実施例1と同様にして電子部品保持具を製造した。粘着保持フィルムには延伸拡張を施さなかった。実施例1と同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを仮粘着させ、真空槽にセットして減圧し、粘着保持フィルムの表面に複数の半導体チップを粘着保持させた。   Addition-reactive silicone rubber (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-1950) with glass beads (manufactured by Sumitomo 3M Co., Ltd .: trade name iMK30) that are exfoliated particles having an average particle size of 18 μm in both A and B liquids. 1 phr of each was added and mixed, and then an electronic component holder was manufactured in the same manner as in Example 1. The adhesive holding film was not stretched. Similar to Example 1, a plurality of semiconductor chips were temporarily adhered to the surface of the adhesive holding film of the electronic component holder, set in a vacuum chamber and decompressed, and the plurality of semiconductor chips were adhesively held on the surface of the adhesive holding film. .

実施例1と同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを粘着保持させ、電子部品保持具の粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムに水平方向に延伸拡張した。粘着保持フィルムに延伸内枠のみを専用ステージを使用して圧接し、延伸拡張したところ、正方形の一辺が55mmに伸びた。   As in Example 1, a plurality of semiconductor chips are adhered and held on the surface of the adhesive holding film of the electronic component holder, and the adhesive holding film of the electronic component holder is sandwiched between the stretching inner frame and the stretching outer frame of the stretching tool, The adhesive holding film was stretched and expanded in the horizontal direction. When only the stretched inner frame was press-contacted to the adhesive holding film using a special stage and stretched and expanded, one side of the square was stretched to 55 mm.

その後、電子部品保持具の粘着保持フィルムから延伸具を取り外し、正方形の一辺が60mmに伸びるよう粘着保持フィルムを水平方向に20%延伸拡張したが、半導体チップが剥離しなかった。さらに、粘着保持フィルムを水平方向に30%延伸拡張したところ、粘着していた半導体チップがはじめて浮き上がり、剥離した。   Thereafter, the stretching tool was removed from the adhesive holding film of the electronic component holding tool, and the adhesive holding film was stretched and expanded 20% in the horizontal direction so that one side of the square extended to 60 mm, but the semiconductor chip did not peel off. Furthermore, when the adhesive holding film was stretched and expanded by 30% in the horizontal direction, the adhered semiconductor chip was lifted for the first time and peeled off.

付加反応型シリコーンゴム(信越化学工業社製:商品名KE−1950)のA、B液の双方に、平均粒径が18μmの剥離粒子であるガラスビーズ(住友スリーエム社製:商品名iMK30)をそれぞれ3phr添加して混合し、その後、実施例1と同様にして電子部品保持具を製造した。粘着保持フィルムには延伸拡張を施さなかった。実施例1と同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを仮粘着させ、真空槽にセットして減圧し、粘着保持フィルムの表面に複数の半導体チップを粘着保持させた。   Addition-reactive silicone rubber (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-1950) with glass beads (manufactured by Sumitomo 3M Co., Ltd .: trade name iMK30) that are exfoliated particles having an average particle size of 18 μm in both A and B liquids. 3 phr of each was added and mixed, and then an electronic component holder was manufactured in the same manner as in Example 1. The adhesive holding film was not stretched. Similar to Example 1, a plurality of semiconductor chips were temporarily adhered to the surface of the adhesive holding film of the electronic component holder, set in a vacuum chamber and decompressed, and the plurality of semiconductor chips were adhesively held on the surface of the adhesive holding film. .

実施例1同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを粘着保持させ、電子部品保持具の粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムに水平方向に延伸拡張した。粘着保持フィルムに延伸内枠のみを専用ステージを使用して圧接し、延伸拡張したところ、正方形の一辺が55mmに伸びた。その後、電子部品保持具の粘着保持フィルムから延伸具を取り外し、正方形の一辺が60mmに伸びるよう粘着保持フィルムを水平方向に20%延伸拡張したところ、粘着していた半導体チップがはじめて浮き上がり、剥離した。   As in Example 1, a plurality of semiconductor chips are adhesively held on the surface of the adhesive holding film of the electronic component holder, and the adhesive holding film of the electronic component holder is sandwiched between the extending inner frame and the extending outer frame of the extending tool, The holding film was stretched and expanded in the horizontal direction. When only the stretched inner frame was press-contacted to the adhesive holding film using a special stage and stretched and expanded, one side of the square was stretched to 55 mm. Thereafter, the stretching tool was removed from the adhesive holding film of the electronic component holding tool, and the adhesive holding film was stretched and expanded 20% in the horizontal direction so that one side of the square was extended to 60 mm. As a result, the adhered semiconductor chip was lifted and peeled for the first time. .

付加反応型シリコーンゴム(信越化学工業社製:商品名KE−1950)のA、B液の双方に、平均粒径が18μmの剥離粒子であるガラスビーズ(住友スリーエム社製:商品名iMK30)をそれぞれ5phr添加して混合し、その後、実施例1と同様にして電子部品保持具を製造した。粘着保持フィルムには延伸拡張を施さなかった。実施例1と同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを仮粘着させ、真空槽にセットして減圧し、粘着保持フィルムの表面に複数の半導体チップを粘着保持させた。   Addition-reactive silicone rubber (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-1950) with glass beads (manufactured by Sumitomo 3M Co., Ltd .: trade name iMK30) that are exfoliated particles having an average particle size of 18 μm in both A and B liquids. 5 phr of each was added and mixed, and then an electronic component holder was manufactured in the same manner as in Example 1. The adhesive holding film was not stretched. Similar to Example 1, a plurality of semiconductor chips were temporarily adhered to the surface of the adhesive holding film of the electronic component holder, set in a vacuum chamber and decompressed, and the plurality of semiconductor chips were adhesively held on the surface of the adhesive holding film. .

実施例1同様、電子部品保持具の粘着保持フィルムの表面に複数の半導体チップを粘着保持させ、電子部品保持具の粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムを水平方向に延伸拡張した。粘着保持フィルムに延伸内枠のみを専用ステージを使用して圧接し、10%延伸拡張したところ、正方形の一辺が55mmに伸びた。この際、粘着していた半導体チップが浮き上がり、剥離した。   As in Example 1, a plurality of semiconductor chips are adhesively held on the surface of the adhesive holding film of the electronic component holder, and the adhesive holding film of the electronic component holder is sandwiched between the extending inner frame and the extending outer frame of the extending tool, The holding film was stretched and expanded in the horizontal direction. Only the stretched inner frame was pressed against the adhesive holding film using a dedicated stage and stretched and expanded by 10%. As a result, one side of the square stretched to 55 mm. At this time, the adhered semiconductor chip was lifted and peeled off.

比較例Comparative example

付加反応型シリコーンゴムにより透明の粘着保持フィルムを製造し、その後、実施例1と同様にして電子部品保持具を製造し、粘着保持フィルムを15%延伸拡張させた。付加反応型シリコーンゴムは、乾式シリカが30重量%添加されたシリコーンゴム(信越化学工業社製:商品名KE−1950A)と、乾式シリカが30重量%添加されたシリコーンゴム(信越化学工業社製:商品名KE−1950B)とを1:1で混合したタイプを用いた。また、乾式シリカは、1次粒径が0.02μm、2次粒径が1μm以下のシリカとした。   A transparent adhesive holding film was produced from the addition reaction type silicone rubber, and then an electronic component holder was produced in the same manner as in Example 1, and the adhesive holding film was stretched and expanded by 15%. The addition reaction type silicone rubber includes silicone rubber added by 30% by weight of dry silica (manufactured by Shin-Etsu Chemical Co., Ltd .: trade name KE-1950A) and silicone rubber added by 30% by weight of dry silica (manufactured by Shin-Etsu Chemical Co., Ltd.). : Brand name KE-1950B) mixed at 1: 1. The dry silica was silica having a primary particle size of 0.02 μm and a secondary particle size of 1 μm or less.

実施例1と同様、粘着保持フィルムから半導体チップを真空ピンセットでピックアップしようとしたが、剥離粒子であるシリカ粒子の平均粒径が小さく、しかも、粘着保持フィルムの裏面が粗れていなかったので、粘着保持フィルムの延伸拡張の伝搬性が低下し、半導体チップを安全確実に取り外すことができなかった。   As in Example 1, the semiconductor chip was picked up from the adhesive holding film with vacuum tweezers, but the average particle size of the silica particles as the release particles was small, and the back surface of the adhesive holding film was not rough. The propagation property of the stretch expansion of the adhesive holding film was lowered, and the semiconductor chip could not be removed safely and reliably.

1 保持枠
2 保持内枠
3 保持外枠
10 電子部品
11 半導体チップ
12 半導体ウェーハ
20 粘着保持フィルム
21 エラストマー
22 剥離粒子
23 保持領域
24 余剰領域
25 裏面
30 延伸具(延伸手段)
31 延伸内枠
32 延伸外枠
DESCRIPTION OF SYMBOLS 1 Holding frame 2 Holding inner frame 3 Holding outer frame 10 Electronic component 11 Semiconductor chip 12 Semiconductor wafer 20 Adhesive holding film 21 Elastomer 22 Release particle 23 Holding area 24 Surplus area 25 Back surface 30 Stretching tool (stretching means)
31 Stretched inner frame 32 Stretched outer frame

Claims (4)

耐熱性を有する中空の保持枠と、この保持枠の中空部を被覆し、薄型の電子部品を剥離可能に保持する伸縮可能な可撓性の粘着保持フィルムとを備え、電子部品を加熱加工した後、粘着保持フィルムを延伸具で水平方向に延伸することにより、粘着保持フィルムから電子部品を剥離する電子部品保持具であって、
保持枠に粘着保持フィルムの周縁部を粘着保持フィルムの熱膨張率を考慮して予め延伸して固定し、
粘着保持フィルムを、自己粘着性のエラストマーに剥離粒子を配合することにより形成し、この剥離粒子の平均粒径を1μm〜エラストマーの厚さの範囲とし、粘着保持フィルムを、電子部品用の保持領域と、この保持領域の周囲と保持枠の内周面との間に形成され、保持枠の周面に予め延伸して固定される余剰領域とに区画形成し、
延伸具を、粘着保持フィルムの保持領域に圧接されて粘着保持フィルムを水平方向に延伸する中空の延伸内枠と、この延伸内枠に粘着保持フィルムの余剰領域を介して嵌合され、粘着保持フィルムの延伸を規制する延伸外枠とから構成し、
粘着保持フィルムに保持させた電子部品を加熱加工した後、粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟み持たせ、粘着保持フィルムの余剰領域を水平方向に延伸拡張し、粘着保持フィルムの保持領域表面を剥離粒子の突出により粗面化して電子部品を剥離するようにしたことを特徴とする電子部品保持具。
A heat-resistant hollow holding frame, and a stretchable flexible adhesive holding film that covers the hollow portion of the holding frame and holds a thin electronic component in a peelable manner , and heat-processed the electronic component After that, by stretching the adhesive holding film in the horizontal direction with a stretching tool, an electronic component holding tool for peeling the electronic component from the adhesive holding film,
In consideration of the coefficient of thermal expansion of the adhesive holding film, the peripheral edge of the adhesive holding film is previously stretched and fixed to the holding frame,
An adhesive holding film is formed by blending release particles with a self-adhesive elastomer, the average particle size of the release particles is in the range of 1 μm to the thickness of the elastomer, and the adhesive holding film is used as a holding region for electronic components. And is formed between the periphery of the holding region and the inner peripheral surface of the holding frame, and is partitioned into an extra region that is previously stretched and fixed to the peripheral surface of the holding frame,
A stretching tool is pressed against the holding area of the pressure-sensitive adhesive holding film and fitted into a hollow stretched inner frame that stretches the pressure-sensitive adhesive holding film in the horizontal direction. Consists of a stretching outer frame that regulates stretching of the film,
After heat-processing the electronic component held on the adhesive holding film, the adhesive holding film is sandwiched between the stretching inner frame and the stretching outer frame of the stretching tool, and the surplus area of the adhesive retaining film is stretched and expanded in the horizontal direction. An electronic component holder characterized in that the holding region surface of the holding film is roughened by protruding protruding particles to peel the electronic component.
保持枠は、中空の保持内枠と、この保持内枠に粘着保持フィルムの周縁部を介して着脱自在に嵌合する中空の保持外枠とを含んでなる請求項1記載の電子部品保持具。 The electronic component holder according to claim 1, wherein the holding frame includes a hollow holding inner frame and a hollow holding outer frame that is detachably fitted to the holding inner frame via a peripheral edge portion of the adhesive holding film. . 粘着保持フィルムの裏面を凹凸に形成した請求項1又は2記載の電子部品保持具。 The electronic component holder according to claim 1 or 2, wherein the back surface of the pressure-sensitive adhesive holding film is formed to be uneven . 請求項1、2、又は3記載の電子部品保持具の粘着保持フィルムに薄型の電子部品を保持させ、この電子部品を加熱加工した後、粘着保持フィルムを延伸具で水平方向に延伸することにより、粘着保持フィルムから電子部品を剥離する電子部品の剥離方法であって、
粘着保持フィルムに保持させた電子部品を加熱加工した後、粘着保持フィルムを延伸具の延伸内枠と延伸外枠とに挟持させ、粘着保持フィルムの余剰領域を水平方向に延伸拡張し、粘着保持フィルムの保持領域表面を剥離粒子の突出により粗面化して電子部品を剥離することを特徴とする電子部品の剥離方法。
The adhesive holding film of the electronic component holder according to claim 1, 2 or 3 holds the thin electronic component, heat-processes the electronic component, and then stretches the adhesive holding film in the horizontal direction with a stretching tool. An electronic component peeling method for peeling an electronic component from an adhesive holding film ,
After heat-processing the electronic component held on the adhesive holding film, the adhesive holding film is sandwiched between the stretching inner frame and the stretching outer frame of the stretching tool, and the excess area of the adhesive retaining film is stretched and expanded in the horizontal direction to hold the adhesive. A method for peeling an electronic component, characterized in that the surface of the film holding region is roughened by protruding protruding particles to peel the electronic component.
JP2009053328A 2009-03-06 2009-03-06 Electronic component holder and electronic component peeling method Expired - Fee Related JP5318615B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009053328A JP5318615B2 (en) 2009-03-06 2009-03-06 Electronic component holder and electronic component peeling method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009053328A JP5318615B2 (en) 2009-03-06 2009-03-06 Electronic component holder and electronic component peeling method

Publications (2)

Publication Number Publication Date
JP2010212269A JP2010212269A (en) 2010-09-24
JP5318615B2 true JP5318615B2 (en) 2013-10-16

Family

ID=42972187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009053328A Expired - Fee Related JP5318615B2 (en) 2009-03-06 2009-03-06 Electronic component holder and electronic component peeling method

Country Status (1)

Country Link
JP (1) JP5318615B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012020750A (en) * 2010-07-12 2012-02-02 Sakase Chemical Industry Co Ltd Adhesive holder for fine parts
JP5717502B2 (en) * 2011-03-30 2015-05-13 信越ポリマー株式会社 Semiconductor chip holder and method of using the same
JPWO2024143522A1 (en) * 2022-12-29 2024-07-04

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6198530A (en) * 1984-10-22 1986-05-16 Teijin Ltd Manufacture of film for substrate and functional laminatre
JP2917511B2 (en) * 1990-11-26 1999-07-12 松下電器産業株式会社 Chip feeder
JPH06260517A (en) * 1993-03-09 1994-09-16 Toshiba Corp Die bonding machine
JP3117326B2 (en) * 1993-05-28 2000-12-11 株式会社東芝 Semiconductor chip removal device
JPH09190988A (en) * 1996-01-11 1997-07-22 Toshiba Mechatronics Kk Sheet expanding device
JP2006245351A (en) * 2005-03-04 2006-09-14 Nitta Ind Corp Manufacturing method of semiconductor chip

Also Published As

Publication number Publication date
JP2010212269A (en) 2010-09-24

Similar Documents

Publication Publication Date Title
CN100340625C (en) Pressure sensitive adhesive sheet, method of protecting semiconductor wafer surface and method of processing work
CN1261972C (en) Bonding tape for chip loading, carrier and package, manufacturing, loading and packaging methods
CN1497703A (en) Dicing/die-bonding film, method of fixing chip parts and semiconductor device
CN1637104A (en) Heat-peelable pressure-sensitive adhesive sheet
JP7075893B2 (en) Manufacturing method of double-sided adhesive sheet and semiconductor device
CN1204604C (en) Surface protective binding film for semiconductor wafer and semiconductor wafer processing method using same
CN101077963A (en) Pressure-sensitive adhesive sheet
CN1721490A (en) Silicone Rubber Based Pressure Sensitive Adhesive Sheet
JP6106332B2 (en) Protective film and method for manufacturing semiconductor device using the protective film
JP7664023B2 (en) Sheet for processing workpiece and method for manufacturing processed workpiece
JP2012033737A (en) Method for handling semiconductor wafer
JP5318615B2 (en) Electronic component holder and electronic component peeling method
KR101078252B1 (en) Thermal conductive and release sheet used in bonding anisotropic conductive film
JP5473316B2 (en) Substrate holder and semiconductor wafer processing method
JP2011018769A (en) Size adjustment jig for substrate
JP5398164B2 (en) Semiconductor wafer solder reflow method
JP2022170661A (en) tape
JP6176883B2 (en) Thin plate holding jig
JP5971764B2 (en) Thin plate holding jig
JP6126430B2 (en) Laminate
CN111948902A (en) Dustproof film assembly
JP2001308033A (en) Method for fixing wafer
JP2009170487A (en) Adhesive rubber sheet for substrate transfer jig, and substrate transfer jig
JP2005268483A (en) Method for manufacturing conveying member with cleaning function, and manufacturing apparatus and substrate processing apparatus cleaning method
JP7156755B2 (en) Adhesive substrate and method for separating objects from the adhesive substrate

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120208

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130208

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130219

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130422

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130709

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130710

R150 Certificate of patent or registration of utility model

Ref document number: 5318615

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees