Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP5439066B2 - Method and apparatus for chamfering hard brittle plate - Google Patents
[go: Go Back, main page]

JP5439066B2 - Method and apparatus for chamfering hard brittle plate - Google Patents

Method and apparatus for chamfering hard brittle plate Download PDF

Info

Publication number
JP5439066B2
JP5439066B2 JP2009160044A JP2009160044A JP5439066B2 JP 5439066 B2 JP5439066 B2 JP 5439066B2 JP 2009160044 A JP2009160044 A JP 2009160044A JP 2009160044 A JP2009160044 A JP 2009160044A JP 5439066 B2 JP5439066 B2 JP 5439066B2
Authority
JP
Japan
Prior art keywords
grindstone
disc
hard brittle
diameter
chamfering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009160044A
Other languages
Japanese (ja)
Other versions
JP2011011323A (en
Inventor
喜彦 山中
智久 大野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nakamura Tome Precision Industry Co Ltd
Original Assignee
Nakamura Tome Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nakamura Tome Precision Industry Co Ltd filed Critical Nakamura Tome Precision Industry Co Ltd
Priority to JP2009160044A priority Critical patent/JP5439066B2/en
Priority to CN201010216940.6A priority patent/CN102059612B/en
Priority to KR1020100063850A priority patent/KR101712668B1/en
Publication of JP2011011323A publication Critical patent/JP2011011323A/en
Application granted granted Critical
Publication of JP5439066B2 publication Critical patent/JP5439066B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/04Headstocks; Working-spindles; Features relating thereto
    • B24B41/047Grinding heads for working on plane surfaces
    • B24B41/0475Grinding heads for working on plane surfaces equipped with oscillating abrasive blocks, e.g. mounted on a rotating head
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Description

この発明は、ディスプレイパネルのガラス基板その他の硬質脆性板の面取加工方法及び装置に関するものである。   The present invention relates to a method and apparatus for chamfering a glass substrate of a display panel and other hard brittle plates.

ディスプレイパネルのガラス基板は、割断によって所定寸法に切断されるが、割断面(割断により形成される板厚方向の面)とパネルの表裏面とが交わる部分に鋭い稜線(エッジ)が形成される。この稜線は、鋭利な刃物となって当該パネルを取り扱う作業者に危害を与えるおそれがある。また、当該稜線には往々にして小さな欠け(チッピング)や水平クラックと呼ばれる小さなひび割れ(以下、「チッピング」と総称する。)が存在しており、このチッピングを起点にして大きな欠けや割れが発生したり、これによって生じたカレットと呼ばれるガラス片が基板表面に付着して、不良品となることが往々にして生ずる。そこで回転砥石をこの稜線に沿って走行させて、当該稜線を斜めに削り取る面取加工が行われる。   The glass substrate of the display panel is cut to a predetermined size by cleaving, but a sharp ridge line (edge) is formed at a portion where the cut surface (surface in the plate thickness direction formed by cleaving) and the front and back surfaces of the panel intersect. . This ridgeline may become a sharp blade and may cause harm to an operator who handles the panel. In addition, there are often small cracks (chipping) and small cracks called horizontal cracks (hereinafter collectively referred to as “chipping”) on the ridgeline, and large chippings and cracks are generated starting from this chipping. In many cases, a glass piece called a cullet is attached to the substrate surface, resulting in a defective product. Therefore, a chamfering process is performed in which the rotating grindstone is run along the ridgeline and the ridgeline is cut off obliquely.

面取加工に用いる砥石の形状やその回転軸の方向等については、種々のものが提案されている。近年多く用いられている砥石ユニットとして、面取しようとする稜線と平行な砥石軸に複数の円板状の砥石を、その軸方向に間隔を開けて固定し、この複数の円板砥石を同時回転させながらガラス基板の稜線と平行に相対移動させるという方法がある。この面取加工方法では、図1に示すように、ガラス基板2の割断面22の外側上下に砥石軸5u、5dを配置し、各砥石軸に取付けた複数枚の円板砥石1(1a〜1d)を互いに間隔を開けて、かつ上下の砥石軸5u、5dに取付けた円板砥石1a〜1d相互が相手側の円板砥石1の間に入り込むように配置して、上下の円板砥石1の外周面で割断面22の上下の稜線7(7u、7d)を同時に面取加工する。   Various shapes have been proposed for the shape of the grindstone used for chamfering, the direction of its rotation axis, and the like. As a grindstone unit that is widely used in recent years, a plurality of disc-shaped grindstones are fixed to a grindstone shaft parallel to the ridge line to be chamfered at intervals in the axial direction, and the plurality of disc grindstones are simultaneously attached. There is a method of relatively moving in parallel with the ridgeline of the glass substrate while rotating. In this chamfering method, as shown in FIG. 1, a plurality of disc grindstones 1 (1a to 1a) are arranged with grindstone shafts 5u and 5d arranged on the upper and lower sides of the cut section 22 of the glass substrate 2 and attached to each grindstone shaft. 1d) is arranged so that the disc wheels 1a to 1d attached to the upper and lower grindstone shafts 5u and 5d enter each other between the mating disc grindstones 1 and the upper and lower disc grindstones. The upper and lower ridgelines 7 (7u, 7d) of the split section 22 are simultaneously chamfered on one outer peripheral surface.

従来、この面取加工の際に円板砥石1で斜めに削られた面(面取面)9(9u、9d)とガラス基板の板面(表裏面)8u、8dとの夾角(面取角)は40〜45度程度であり、円板砥石1の回転方向は、図6に矢印Bで示すように、円板砥石1の周面11が面取面9を板面8側から割断面22側へと摺擦する方向であった。   Conventionally, a chamfer angle (chamfering) between the surfaces (chamfered surfaces) 9 (9u, 9d) and the plate surfaces (front and back surfaces) 8u, 8d of the glass substrate which are cut obliquely by the disc grindstone 1 during this chamfering process. The angle is about 40 to 45 degrees, and the rotating direction of the disc grindstone 1 is such that the peripheral surface 11 of the disc grindstone 1 divides the chamfered surface 9 from the plate surface 8 side as indicated by an arrow B in FIG. The direction slid toward the cross section 22 side.

従来の面取加工において、円板砥石の周面11が面取面9を板面8側から割断面22側へと抜ける(摺擦する)方向に砥石を回転させているのは、砥石の抜け側にチッピングが多く発生するためである。すなわち、ディスプレイパネルのガラス基板の板面には、回路パターンが設けられており、この回路パターンが設けられている側にチッピングが発生するのを可及的に防止するためである。   In the conventional chamfering process, the grindstone is rotated in such a direction that the peripheral surface 11 of the disc grindstone is pulled out (slid) from the chamfered surface 9 to the split section 22 side. This is because a lot of chipping occurs on the slipping side. That is, a circuit pattern is provided on the plate surface of the glass substrate of the display panel, and chipping is prevented as much as possible from occurring on the side where the circuit pattern is provided.

また、加工に用いる複数の円板砥石は、その刃先(外周部)の関係を図7に誇張して示すように、各円板砥石1の相対移動方向前方の外周縁に、その相対移動によってガラス基板を切り込む円錐状の切込面11aを形成し、その相対移動方向後方をスパークアウトを行わせるための円筒面11bとしており、複数の円板砥石の相対移動方向前方のもの(先にガラス基板に当接するもの)を後方のものより小径とし、かつ前後の円板砥石の径差を後方の円板砥石間ほど小さくするという構造が採用されている。   Further, the plurality of disc grindstones used for the processing are shown in FIG. 7 by exaggerating the relationship between their cutting edges (outer peripheral portions), by the relative movement of the disc grindstones 1 on the outer peripheral edge in the relative movement direction. A conical cut surface 11a for cutting the glass substrate is formed, and the rear of the relative movement direction is a cylindrical surface 11b for sparking out, and a plurality of disc grindstones in front of the relative movement direction (first glass A structure is adopted in which the diameter of the one that contacts the substrate is smaller than that of the rear one, and the difference in diameter between the front and rear disc grindstones is made smaller between the rear disc grindstones.

特開2006−82147号公報JP 2006-82147 A 特開2006−26845号公報JP 2006-26845 A

電子機器の小型化及び軽量化に伴ってディスプレイパネルのガラス基板の厚さが薄くなり(薄肉化)、生産性の向上の要請からガラス基板に対する回転砥石の相対移動速度(送り速度)の高速化が要求され、この薄肉化と高速化に伴って増加傾向となる不良品の発生を防止する必要が生じている。すなわち、砥石の送り速度を高速化すると、チッピングが発生しやすくなり、また、ガラス基板の薄肉化に伴って、面取加工の際に発生したチッピングが後工程で大きな割れや欠けになる可能性が増大する傾向となるので、これを防止して製品の歩留まりを向上する必要が生じている。   As electronic devices become smaller and lighter, the glass substrate of the display panel becomes thinner (thinner), and the relative movement speed (feed speed) of the rotating grindstone with respect to the glass substrate is increased due to the demand for improved productivity. Therefore, it is necessary to prevent the generation of defective products that tend to increase with the reduction in thickness and speed. In other words, chipping is likely to occur when the grinding stone feed rate is increased, and the chipping that occurs during chamfering may become large cracks or chips in the subsequent process as the glass substrate becomes thinner. Therefore, there is a need to prevent this and improve the yield of products.

この発明は、このような問題を解決するためになされたもので、チッピングの発生を可及的に抑えながら、より高速でガラス基板の面取加工を行うことが可能な技術手段を得ることを課題としている。   The present invention has been made to solve such a problem, and is to obtain technical means capable of chamfering a glass substrate at a higher speed while suppressing the occurrence of chipping as much as possible. It is an issue.

この発明の面取加工方法は、ディスプレイパネルのガラス基板その他の硬質脆性板2の割断面22と板面8とが交わる部分に形成された鋭い稜線7を、当該稜線と平行な砥石軸5回りに回転する複数枚の円板砥石1を稜線7と平行に送りながら、当該稜線を円板砥石1の周面11で斜めに削り取る面取加工方法に関するものである。   The chamfering method according to the present invention includes a sharp ridge line 7 formed at a portion where the split surface 22 of the glass substrate of the display panel or other hard brittle plate 2 and the plate surface 8 intersect with each other around the grindstone axis 5 parallel to the ridge line. The present invention relates to a chamfering method in which a plurality of disc grindstones 1 rotating in parallel are fed in parallel with the ridgeline 7 and the ridgelines are cut off obliquely by the peripheral surface 11 of the disc grindstone 1.

この発明の面取加工方法では、稜線7を削り取ることによって形成される斜めの面取面9と板面8との夾角(面取角)θを35度〜15度の範囲の角度とし、円板砥石1の回転方向を従来とは逆の方向、すなわち回転砥石の周面11が面取面9を割断面22側から板面8側へ摺擦する方向の回転とすることにより、上記課題を解決している。   In the chamfering method of the present invention, the depression angle (chamfering angle) θ between the oblique chamfered surface 9 and the plate surface 8 formed by scraping the ridge line 7 is set to an angle in the range of 35 degrees to 15 degrees, The rotation direction of the plate grindstone 1 is the direction opposite to that of the prior art, that is, the rotation in the direction in which the peripheral surface 11 of the rotary grindstone rubs the chamfered surface 9 from the split section 22 side to the plate surface 8 side. Has solved.

すなわち、この発明に係る硬質脆性板の面取加工方法は、硬質脆性板2の板面8(8u、8d)と割断面22とが交わる稜線7を、この稜線と平行な砥石軸5(5u、5d)回りに回転しかつ当該稜線と平行に相対送り移動する複数の円板砥石1(1a〜1d)の短円錐状ないし短円筒状の周面11(11a、11b)で研削して、当該稜線7を斜めに削り取る硬質脆性板の面取加工方法において、板面8と斜めに削り取られる面(面取面)9との夾角を35〜15度の角度に設定すると共に、円板砥石1の周面11が当該稜線7ないし面取面9をその割断面22側から板面8側へと摺擦する方向に、円板砥石1を回転させることを特徴とするものである。   That is, the chamfering method of the hard brittle plate according to the present invention is such that the ridge line 7 where the plate surface 8 (8u, 8d) of the hard brittle plate 2 and the split section 22 intersect is indicated by the grindstone shaft 5 (5u) parallel to the ridge line. 5d) Grinding with a short conical or short cylindrical peripheral surface 11 (11a, 11b) of a plurality of disc grindstones 1 (1a to 1d) that rotate around and move in parallel with the ridge line, In the chamfering method of the hard brittle plate that cuts the ridge line 7 diagonally, the depression angle between the plate surface 8 and the surface (chamfered surface) 9 cut off diagonally is set to an angle of 35 to 15 degrees, and the disc grindstone The disc grindstone 1 is rotated in a direction in which the peripheral surface 11 of the first surface rubs the ridgeline 7 or the chamfered surface 9 from the fractured surface 22 side to the plate surface 8 side.

1本の砥石軸5に3個以上の円板砥石1a〜1dを間隔を開けて配置する上記の面取加工方法における当該3個以上の円板砥石1a〜1dの径について、削り取られる稜線7ないし面取面9を最初に摺接する円板砥石1aの径を2番目に摺擦する円板砥石1bの径より小径にすると共に、最後に摺擦する円板砥石1dの径と最後の1つ前に摺擦する円板砥石1cの径とを同径として面取加工を行うことにより、特に板厚の薄い硬質脆性板の面取加工において、より滑らかな面取面を得ることができる。   The ridgeline 7 to be scraped off with respect to the diameter of the three or more disc grindstones 1a to 1d in the above-described chamfering method in which three or more disc grindstones 1a to 1d are arranged at intervals on one grindstone shaft 5. In addition, the diameter of the disc grindstone 1a that first slidably contacts the chamfered surface 9 is made smaller than the diameter of the disc grindstone 1b that rubs second, and the diameter of the disc grindstone 1d that rubs last and the last 1 By performing chamfering with the same diameter as that of the disc grindstone 1c that is rubbed forward, a smoother chamfered surface can be obtained particularly in chamfering of a hard brittle plate having a thin plate thickness. .

この発明の面取加工方法を実施するのに適した面取加工装置は、硬質脆性板の下面を載置した状態で支持するテーブル3と、このテーブルの幅方向両側に配置された砥石ユニット4と、当該砥石ユニットをテーブル3に対して当該テーブルの面内で前記幅方向Xと直交する方向Yに相対移動させる送り装置とを備え、前記砥石ユニット4は、面取りしようとする硬質脆性板の稜線7と平行な上下の砥石軸5回りに回転する複数の円板砥石1を備え、硬質脆性板2の板面8と割断面22とが交わる前記稜線7を、前記円板砥石1の短円錐状ないし短円筒状の周面11で研削する硬質脆性板の面取装置において、前記砥石軸5を正逆方向に回転駆動する砥石モータ6(6u、6d)と、前記上下の砥石軸5の間隔を設定する昇降マウント14とを備え、前記上下の砥石1の一方がこの昇降マウント14を介して砥石台12に装着されており、前記砥石ユニット4は、それぞれの砥石軸5回りに回転する3個以上の前記円板砥石1を備え、当該3個以上の円板砥石1は、前記相対送り移動により削り取られる面を最初に摺接する初段の円板砥石1aの径が第2段の円板砥石1bの径より小径とされると共に、最後に摺擦する最後段の円板砥石1dの径と最後の1つ前の段の円板砥石1cの径とが同径とされていることを特徴とする、硬質脆性板の面取加工装置である。 A chamfering apparatus suitable for carrying out the chamfering method of the present invention includes a table 3 that supports the bottom surface of a hard brittle plate placed thereon, and a grindstone unit 4 disposed on both sides of the table in the width direction. And a feed device for moving the grindstone unit relative to the table 3 in the direction Y orthogonal to the width direction X within the surface of the table, and the grindstone unit 4 is a hard brittle plate to be chamfered. A plurality of disc grindstones 1 rotating around the upper and lower grindstone axes 5 parallel to the ridgeline 7 are provided, and the ridgeline 7 where the plate surface 8 of the hard brittle plate 2 intersects the split section 22 is defined as a short of the disc grindstone 1. In a chamfering device for a hard brittle plate that is ground with a conical or short cylindrical peripheral surface 11, a grindstone motor 6 (6u, 6d) that rotationally drives the grindstone shaft 5 in forward and reverse directions, and the upper and lower grindstone shafts 5 Elevating mount 14 for setting the interval of For example, the one of the upper and lower grinding wheel 1 is mounted on the wheel head 12 through the lifting mount 14, the grinding wheel unit 4, the disc grindstone 1 or 3 which rotates each of the wheel spindle 5 around the The three or more disk grindstones 1 have a diameter of the first-stage disk grindstone 1a that first comes into sliding contact with the surface scraped by the relative feed movement smaller than the diameter of the second-stage disk grindstone 1b. And the diameter of the last disc grindstone 1d to be rubbed last is the same as the diameter of the last disc grindstone 1c of the last step . Chamfering device.

上記構造の面取加工装置を用いることにより、従来方法での面取加工と、この発明の方法による面取加工とを同一の装置で行うことが可能である。   By using the chamfering apparatus having the above structure, the chamfering process by the conventional method and the chamfering process by the method of the present invention can be performed by the same apparatus.

面取加工の対象となる硬質脆性板2の板厚が薄くなるに伴い、その割断面側の削り代cを小さくせざるを得ず、そのため必然的に面取面9と板面8との夾角θが小さくなり、従来40〜45度であったものが35度以下、例えば30度ないし20度の角度となる。   As the plate thickness of the hard brittle plate 2 to be chamfered becomes thinner, the cutting allowance c on the split cross section side has to be reduced. Therefore, the chamfered surface 9 and the plate surface 8 are inevitably reduced. The depression angle θ becomes small, and the angle which is 40 to 45 degrees in the past is 35 degrees or less, for example, an angle of 30 degrees to 20 degrees.

面取面9を回転砥石1が摺擦することに伴うチッピングの発生は、切屑を本体から切り離す方向に砥粒が摺擦する砥石周面11の抜け側で発生しやすい。従って、砥石周面11を硬質脆性板の割断面22側から板面8側へと摺擦する方向に円板砥石1を回転するこの発明の方法では、チッピングの発生を嫌う板面8側にチッピングが多く発生するように考えられるが、この部分の夾角θが小さくなったことによるチッピングの抑制効果が大きく働いて、板面8側のチッピングの発生が抑えられる。   The occurrence of chipping associated with the chamfered surface 9 being rubbed by the rotating grindstone 1 is likely to occur on the removal side of the grindstone peripheral surface 11 where the abrasive particles rub in the direction of separating the chips from the main body. Therefore, in the method of the present invention in which the disc grindstone 1 is rotated in the direction in which the grindstone peripheral surface 11 is rubbed from the split cross section 22 side of the hard brittle plate toward the plate surface 8 side, It can be considered that a lot of chipping occurs, but the effect of suppressing the chipping due to the decrease in the depression angle θ of this part works greatly, and the occurrence of chipping on the plate surface 8 side is suppressed.

一方、割断面22側は、砥石周面11の入り側となるので、従来方法と比べて当該割断面におけるチッピングの発生も減少する。すなわち、この発明の方法によれば、板面8側と面取面9側のチッピングが共に抑制されて、後工程でチッピングに起因する欠損により、不良品の発生を低減できる。また、割断面22側と板面8側のチッピングが共に抑制されることから、硬質脆性板に対する円板砥石1の送り速度を高速化することができ、加工速度の向上を図ることができる。   On the other hand, since the split section 22 side is the entrance side of the grindstone peripheral surface 11, the occurrence of chipping in the split section is reduced as compared with the conventional method. That is, according to the method of the present invention, chipping on both the plate surface 8 side and the chamfered surface 9 side is suppressed, and the occurrence of defective products can be reduced due to chipping caused by chipping in the subsequent process. Further, since both chipping on the split section 22 side and the plate surface 8 side are suppressed, the feed speed of the disc grindstone 1 to the hard brittle plate can be increased, and the processing speed can be improved.

また、硬質脆性板2の薄肉化と面取面9と板面8との間の夾角θが小さくなることに伴って、研削加工時の加工反力による硬質脆性板2の撓みが増加する。この撓みは、面取面9が円板砥石1から逃げる方向の撓みとなるので、砥石車の径差によって所望の切込み深さを得ようとしても、硬質脆性板2の撓みが大きくなった分だけ切込み深さが小さくなる。このことは、前後に隣接する円板砥石の径差を0としても硬質脆性板の撓みによって削り残った分だけ後続の円板砥石に切込みが残ることを意味する。   Further, as the hard brittle plate 2 is thinned and the included angle θ between the chamfered surface 9 and the plate surface 8 is reduced, the bending of the hard brittle plate 2 due to the processing reaction force during grinding increases. Since this bend is a bend in the direction in which the chamfered surface 9 escapes from the disc grindstone 1, even if an attempt is made to obtain a desired cutting depth due to the diameter difference of the grinding wheel, the bend of the hard brittle plate 2 is increased. Only the cutting depth becomes smaller. This means that even if the difference between the diameters of the adjacent disc whetstones is set to 0, the remaining disc whetstone remains cut by the amount left by the bending of the hard brittle plate.

すなわち、1本の砥石軸に3枚以上の円板砥石を装着して、この発明の方法で面取加工を行うとき、切込量の小さい最後の砥石、場合によっては最後の砥石と最後から2番目の砥石とをその前方の砥石と同径とすることにより、適切な量の切込みが与えられて、十分なスパークアウトが行われ、滑らかな面取面を得ることができる。   That is, when three or more disc grindstones are mounted on one grindstone shaft and chamfering is performed by the method of the present invention, the last grindstone with a small depth of cut, and in some cases the last grindstone and the last grindstone By making the second grindstone the same diameter as the grindstone in front of it, an appropriate amount of incision is given, sufficient sparking is performed, and a smooth chamfered surface can be obtained.

この発明の面取加工方法を示す斜視図The perspective view which shows the chamfering method of this invention この発明の面取加工方法における硬質脆性板の縁と円板砥石の関係を示す説明図Explanatory drawing which shows the relationship between the edge of a hard brittle board, and a disc grindstone in the chamfering method of this invention 1本の砥石軸に4枚の円板砥石を装着したときの各円板砥石の周縁形状の一例を模式的に示す図The figure which shows typically an example of the peripheral shape of each disc grindstone when four disc grindstones are mounted | worn with one grindstone axis | shaft. 同他の周縁形状の例を模式的に示す図The figure which shows the example of the other periphery shape typically この発明の面取装置の要部の斜視図The perspective view of the principal part of the chamfering apparatus of this invention 従来の面取加工方法における硬質脆性板の縁と円板砥石の関係を示す説明図Explanatory drawing which shows the relationship between the edge of a hard brittle board in a conventional chamfering method, and a disc grindstone 1本の砥石軸に4枚の円板砥石を装着したときの各円板砥石の従来の周縁形状の一例を模式的に示す図The figure which shows typically an example of the conventional peripheral shape of each disc grindstone when four disc grindstones are mounted on one grindstone shaft. 面取角を30度としたときのチッピングの発生状況を示す図The figure which shows the generation situation of chipping when a chamfering angle is 30 degrees 面取角を20度としたときのチッピングの発生状況を示す図The figure which shows the generation situation of chipping when a chamfering angle is 20 degrees

以下、図面を参照して、この発明を更に説明する。図1及び図2は、この発明の面取加工方法を示した図で、図1は斜視図、図2は面取加工部分を砥石1の送り方向から見た図である。図の例は、1本の砥石軸に4枚の円板砥石を設けた例を示しており、図3は4枚の円板砥石の外周部の形状を模式的に示す部分断面図、図4は同他の形状を模式的に示す部分断面図である。図5は、この発明の面取装置の要部の斜視図である。   The present invention will be further described below with reference to the drawings. 1 and 2 are views showing a chamfering method according to the present invention. FIG. 1 is a perspective view, and FIG. 2 is a view of a chamfered portion as viewed from a feeding direction of a grindstone 1. The example in the figure shows an example in which four disc grindstones are provided on one grindstone shaft, and FIG. 3 is a partial cross-sectional view schematically showing the shape of the outer periphery of the four disc grindstones. 4 is a partial cross-sectional view schematically showing the other shape. FIG. 5 is a perspective view of a main part of the chamfering apparatus of the present invention.

図1、2において、加工対象となるガラス基板2は、互いに平行な対向側辺21を備えている。ガラス基板2は、テーブル3に真空吸着などにより固定されており、対向する両側辺21は、当該テーブルから張り出した状態となっている。   1 and 2, a glass substrate 2 to be processed includes opposing side edges 21 that are parallel to each other. The glass substrate 2 is fixed to the table 3 by vacuum suction or the like, and the opposite side sides 21 are in a state of protruding from the table.

砥石ユニット4は、ガラス基板の側辺21と平行な方向の上下の砥石軸5u、5dと、それぞれの砥石軸に固定された各4枚の円板砥石1a〜1dとで構成されている。各砥石軸5u、5dは、基端を砥石モータ6u、6dの軸に固定して支持されている。砥石モータ6u、6dは、正逆転可能である。この発明の方法で面取加工を行うときは、砥石モータ6u、6dは、逆転、すなわち、砥石軸5u、5dを、各円板砥石の周面11がガラス基板2の稜線7部分を割断面22側から板面8側へと摺擦する方向(図2の矢印A方向)に回転する。このとき切削液(通常は純水)は、図2に示すように、砥石ユニット4の反ガラス基板側に設けた切削液ノズル19から割断面22に向けて噴射される。   The grindstone unit 4 is composed of upper and lower grindstone shafts 5u and 5d in a direction parallel to the side 21 of the glass substrate, and four disc grindstones 1a to 1d fixed to the respective grindstone shafts. Each grindstone shaft 5u, 5d is supported with its base end fixed to the shaft of the grindstone motor 6u, 6d. The grindstone motors 6u and 6d can be rotated forward and backward. When chamfering is performed by the method of the present invention, the grindstone motors 6u, 6d are reversed, that is, the grindstone shafts 5u, 5d, and the peripheral surface 11 of each disc grindstone splits the ridge line 7 portion of the glass substrate 2. It rotates in the direction of rubbing from the 22 side to the plate surface 8 side (the direction of arrow A in FIG. 2). At this time, as shown in FIG. 2, the cutting fluid (usually pure water) is sprayed from the cutting fluid nozzle 19 provided on the side opposite to the glass substrate of the grindstone unit 4 toward the split surface 22.

上下の砥石モータの一方6d、砥石台12の定位置に装着され、他方6u、砥石台12に昇降モータ13で昇降位置決め可能に設けた昇降マウント14に装着されている。砥石台12は、テーブル3の幅方向(図1の矢印X方向)両側に設けた図示しないコラムに幅方向及び上下方向(硬質脆性板2の厚さ方向)に移動位置決め自在に装着されている。 One of the upper and lower grinding wheel motors 6d is mounted at a fixed position of the grinding wheel base 12, and the other 6u is mounted on a lifting mount 14 provided on the grinding wheel base 12 so that the lifting motor 13 can be moved up and down. The grinding wheel base 12 is mounted on columns (not shown) provided on both sides of the table 3 in the width direction (arrow X direction in FIG. 1) so as to be movable and positionable in the width direction and the vertical direction (thickness direction of the hard brittle plate 2). .

ガラス基板2の上下の稜線を同じ面取角θかつ面取量cで面取りするときは、上下の砥石軸5u、5dの間隔がガラス基板の厚さに対応する間隔になるように昇降マウント14の位置を調整し、上下の砥石軸5u、5dの中間高さがガラス基板の厚さ中心となる高さに砥石台12の高さを設定し、送り方向最後段の円板砥石1dの周面が所定の面取面9を削成する位置に、砥石台12の幅方向位置を設定する。厚さが同じガラス基板に対しては、昇降マウント14の位置設定により、面取角θが変化する。すなわち、上下の砥石軸5u、5dを接近させると面取角θは大きくなり、離隔させると面取角θは小さくなる。 When chamfering the upper and lower ridge lines of the glass substrate 2 with the same chamfering angle θ and the chamfering amount c, the elevating mount 14 is arranged so that the distance between the upper and lower grindstone shafts 5u and 5d corresponds to the thickness of the glass substrate. The height of the grinding wheel base 12 is set to a height at which the intermediate height between the upper and lower grinding wheel shafts 5u, 5d is the thickness center of the glass substrate, and the circumference of the disk grinding wheel 1d at the last stage in the feed direction is set. The position in the width direction of the grindstone base 12 is set at a position where the surface cuts the predetermined chamfered surface 9. For glass substrates having the same thickness, the chamfering angle θ varies depending on the position setting of the lift mount 14. That is, the chamfering angle θ increases when the upper and lower grindstone shafts 5u, 5d are brought closer, and the chamfering angle θ decreases when they are separated from each other.

ガラス基板の縁の上下の稜線を異なる面取角θで面取加工するときは、砥石台12をガラス基板の縁21と平行な軸回りに揺動位置決め可能とするか、砥石軸5u、5dの一方をガラス基板の幅方向に位置調整可能に砥石台12に装着する。   When chamfering the upper and lower ridge lines of the edge of the glass substrate with different chamfering angles θ, the grindstone base 12 can be rocked and positioned around an axis parallel to the edge 21 of the glass substrate, or the grindstone shafts 5u, 5d. One of these is mounted on the grindstone base 12 so that the position of the glass substrate can be adjusted in the width direction.

ガラス基板2を固定しているテーブル3は、砥石ユニット4、4に対して稜線7と平行な図1の矢印Y方向に送り移動され、この送り移動に伴う研削加工において、円板砥石1aが初段の円板砥石となり、円板砥石1dが最後段の円板砥石となる。   The table 3 fixing the glass substrate 2 is fed and moved in the direction of the arrow Y in FIG. 1 parallel to the ridge line 7 with respect to the grindstone units 4 and 4, and in the grinding process accompanying this feed movement, the disc grindstone 1a is moved. The first-stage disc grindstone is used, and the disc-whetstone 1d is the last-stage disc grindstone.

各円板砥石1a〜1dの各ガラス基板の進入側となる外周前縁には、切込用の円錐面11aが設けられている。この円錐面は、頂角が90度の円錐面で、その切込寸法(実際の切込量はこれより小さい)Lは、例えば図3の例では、初段が0.3mm、第2段〜最後段が0.2mmとしている。また図4の例では、初段が0.2mm、第2段〜最後段が0.1mmとしている。 A conical surface 11a for cutting is provided on the outer peripheral front edge of each disk grindstone 1a to 1d on the entrance side of each glass substrate. This conical surface is a conical surface with an apex angle of 90 degrees, and the incision dimension (actual incision amount is smaller than this) L is 0.3 mm in the first stage, for example, in the example of FIG. The last stage is 0.2 mm. In the example of FIG. 4, the first stage is 0.2 mm, and the second to last stages are 0.1 mm.

両側の砥石ユニット4を上述のように設定して砥石軸5u、5dを回転し、ガラス基板の縁21が一方の端部23から他方の端部24へと砥石ユニット4を通過するようにテーブル3を送ることにより、ガラス基板2の両側の縁の上下の稜線7u、7dが同時に面取加工される。   Tables are set so that the grindstone units 4 on both sides are set as described above and the grindstone shafts 5u and 5d are rotated so that the edge 21 of the glass substrate passes through the grindstone unit 4 from one end 23 to the other end 24. 3 is sent, the upper and lower ridgelines 7u and 7d on both sides of the glass substrate 2 are simultaneously chamfered.

図8及び図9は、面取加工しようとする稜線と平行な軸回りに回転する1枚の円板砥石を用いて、切込深さを100ミクロン及び200ミクロンとした場合の、面取角が30度と20度の場合について、砥石の相対送り速度と面取加工を行ったときに発生した最大のチッピングの寸法との関係を試験した結果を示す図である。図において、A〜Eは砥石の種類を示し、A〜Eの文字に続く100及び200は、切込み深さを示す。図に示すように、面取角が20度のものは、面取角が30度のものに比べて1個の異常点pを除き、発生したチッピングの寸法が小さくなっている。また、この試験結果により、送り速度の低い側と送り速度が40m/minを超える高速送り領域とでチッピングの寸法が小さくなっており、面取角が小さくなる板厚の薄い硬質脆性板の面取加工において、この発明の方法によりチッピングの発生の少ない高速での面取加工を行うことができることが判る。   8 and 9 show chamfer angles when a cutting depth is set to 100 microns and 200 microns using a single disc grindstone rotating around an axis parallel to the ridge line to be chamfered. It is a figure which shows the result of having tested the relationship between the relative feed rate of a grindstone, and the dimension of the largest chipping generate | occur | produced when chamfering was performed about the case of 30 degrees and 20 degrees. In the figure, A to E indicate the types of grindstones, and 100 and 200 following the letters A to E indicate the depth of cut. As shown in the figure, when the chamfering angle is 20 degrees, the size of the generated chipping is smaller than that of the chamfering angle is 30 degrees except for one abnormal point p. Also, as a result of this test, the surface of the hard brittle plate with a thin plate thickness, in which the chipping dimension is small on the low feed rate side and the high feed region where the feed rate exceeds 40 m / min, the chamfer angle is reduced. In the chamfering process, it can be seen that the chamfering process can be performed at a high speed with less occurrence of chipping by the method of the present invention.

1(1a〜1d) 円板砥石
2 硬質脆性板
3 テーブル
4 砥石ユニット
5(5u、5d) 砥石軸
6(6u、6d) 砥石モータ
7 稜線
8(8u、8d) 板面
9 面取面
11(11a、11b) 円板砥石の周面
12 砥石台
13 昇降モータ
14 昇降マウント
22 割断面
θ 夾角
X 幅方向
Y 送り方向
DESCRIPTION OF SYMBOLS 1 (1a-1d) Disc grindstone 2 Hard brittle board 3 Table 4 Grinding wheel unit 5 (5u, 5d) Grinding wheel axis | shaft 6 (6u, 6d) Grinding wheel motor 7 Edge line 8 (8u, 8d) Plate surface 9 Chamfering surface 11 ( 11a, 11b) Peripheral surface of disc grinding wheel 12 Grinding wheel base 13 Lifting motor 14 Lifting mount 22 Split section θ Depression angle X Width direction Y Feed direction

Claims (2)

硬質脆性板の板面と割断面とが交わる稜線を、この稜線と平行な砥石軸回りに回転しかつ当該稜線と平行に相対送り移動する円板砥石の短円錐状ないし短円筒状の周面で研削して、斜めに削り取る硬質脆性板の面取加工方法において、
前記砥石軸のそれぞれに3個以上の前記円板砥石を間隔を開けて配置すると共に、前記相対送り移動により削り取られる面を最初に摺接する初段の円板砥石の径を第2段の円板砥石の径より小径とし、かつ、最後に摺擦する最後段の円板砥石の径と最後の1つ前の段の円板砥石の径とを同径とし、
前記板面と前記斜めに削り取られる面との夾角を35〜15度の角度に設定すると共に、円板砥石の前記周面が当該削り取られる面をその割断面側から板面側へと摺擦する方向に前記円板砥石を回転させることを特徴とする、硬質脆性板の面取加工方法。
A short conical or short cylindrical peripheral surface of a disc grindstone that rotates around a grindstone axis parallel to the ridgeline and moves relative to and parallel to the ridgeline where the plate surface of the hard brittle plate intersects with the split section. In the chamfering method of a hard brittle plate that is ground with
Three or more disc grindstones are arranged at intervals on each of the grindstone shafts, and the diameter of the first disc grindstone that first slidably contacts the surface scraped by the relative feed movement is set to the second disc. The diameter of the wheel grindstone is smaller than the diameter of the grindstone, and the diameter of the last disk grindstone to be rubbed last is the same as the diameter of the disk grindstone of the last previous stage,
The depression angle between the plate surface and the obliquely scraped surface is set at an angle of 35 to 15 degrees, and the surface of the peripheral surface of the disc grindstone is rubbed from the split cross section side to the plate surface side. A chamfering method for a hard brittle plate, characterized in that the disc grindstone is rotated in a direction to be cut.
硬質脆性板の下面を載置した状態で支持するテーブルと、このテーブルの幅方向両側に配置された砥石ユニットと、当該砥石ユニットを前記テーブルに対して当該テーブルの面内で前記幅方向と直交する方向に相対移動させる送り装置とを備え、前記砥石ユニットは、面取りしようとする硬質脆性板の稜線と平行な上下の砥石軸回りに回転する複数の円板砥石を備え、硬質脆性板の板面と割断面とが交わる稜線を、前記円板砥石の短円錐状ないし短円筒状の周面で研削する硬質脆性板の面取装置において、
前記砥石軸を正逆方向に回転駆動する砥石モータと、前記上下の砥石軸の間隔を設定する昇降マウントとを備え、前記上下の砥石の一方がこの昇降マウントを介して砥石台に装着されており、前記砥石ユニットは、それぞれの砥石軸回りに回転する3個以上の前記円板砥石を備え、当該3個以上の円板砥石は、前記相対送り移動により削り取られる面を最初に摺接する初段の円板砥石の径が第2段の円板砥石の径より小径とされると共に、最後に摺擦する最後段の円板砥石の径と最後の1つ前の段の円板砥石の径とが同径とされている、硬質脆性板の面取加工装置。
A table that supports the lower surface of the hard brittle plate placed thereon, a grindstone unit disposed on both sides of the table in the width direction, and the grindstone unit orthogonal to the width direction in the plane of the table with respect to the table The grindstone unit includes a plurality of disc grindstones that rotate about upper and lower grindstone axes parallel to the ridgeline of the hard brittle plate to be chamfered, and a plate of the hard brittle plate. In a chamfering device for a hard brittle plate that grinds a ridge line where a surface and a split section intersect with a short conical or short cylindrical peripheral surface of the disc grindstone,
A grindstone motor that rotates the grindstone shaft in forward and reverse directions; and a lift mount that sets a distance between the upper and lower grindstone shafts. One of the upper and lower grindstones is attached to the grindstone table via the lift mount. And the grindstone unit includes three or more disc grindstones that rotate around respective grindstone axes, and the three or more disc grindstones are first contacted with a surface scraped off by the relative feed movement first. The diameter of the disk whetstone is smaller than the diameter of the second stage disk whetstone, the diameter of the last disk whetstone to be rubbed last and the diameter of the disk whetstone of the last previous stage Is a chamfering machine for hard brittle plates.
JP2009160044A 2009-07-06 2009-07-06 Method and apparatus for chamfering hard brittle plate Expired - Fee Related JP5439066B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009160044A JP5439066B2 (en) 2009-07-06 2009-07-06 Method and apparatus for chamfering hard brittle plate
CN201010216940.6A CN102059612B (en) 2009-07-06 2010-06-24 The chamfer processing method of hard brittle plate and chamfer processing method and device
KR1020100063850A KR101712668B1 (en) 2009-07-06 2010-07-02 Method and apparatus for chamfering hard brittle plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009160044A JP5439066B2 (en) 2009-07-06 2009-07-06 Method and apparatus for chamfering hard brittle plate

Publications (2)

Publication Number Publication Date
JP2011011323A JP2011011323A (en) 2011-01-20
JP5439066B2 true JP5439066B2 (en) 2014-03-12

Family

ID=43590681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009160044A Expired - Fee Related JP5439066B2 (en) 2009-07-06 2009-07-06 Method and apparatus for chamfering hard brittle plate

Country Status (3)

Country Link
JP (1) JP5439066B2 (en)
KR (1) KR101712668B1 (en)
CN (1) CN102059612B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101452250B1 (en) * 2013-05-28 2014-10-22 코닝정밀소재 주식회사 Method and appratus of symmetrically chamfering a substrate
CN105437015B (en) * 2015-12-19 2017-08-25 重庆天和玻璃有限公司 Glass edge polishing device
CN106736977A (en) * 2017-01-20 2017-05-31 京东方科技集团股份有限公司 Grinding mechanism and milling apparatus
TW201843008A (en) * 2017-04-27 2018-12-16 美商康寧公司 Edge processing of glass for light coupling
CN107775483A (en) * 2017-11-29 2018-03-09 重庆市国宇钢化玻璃有限公司 Glass edge polishing device
CN108032168A (en) * 2017-11-30 2018-05-15 重庆丰胜天家具有限公司 Marble chamfer angle technique
CN108032169A (en) * 2017-11-30 2018-05-15 重庆丰胜天家具有限公司 Transmission equipment for stone material
CN108673270B (en) * 2018-07-03 2023-08-08 黄山市皖金铝业科技有限公司 Aluminum alloy door and window subassembly burring device with fixed function
KR102728003B1 (en) * 2019-11-14 2024-11-12 삼성디스플레이 주식회사 Foldable glass substrate, and foldable display device including the thereof
CN111823091A (en) * 2020-06-01 2020-10-27 南京冠石科技股份有限公司 Angle-controllable liquid crystal display grinding system
CN114211315A (en) * 2021-12-14 2022-03-22 上海汉虹精密机械有限公司 High-speed constant-force floating quartz crucible chamfering grinding wheel device
CN114734333A (en) * 2022-05-05 2022-07-12 北京天科合达半导体股份有限公司 Chamfering method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798450A (en) * 1993-09-28 1995-04-11 Tekunisuko:Kk Chamfering machine for liquid crystal plate
US5816897A (en) * 1996-09-16 1998-10-06 Corning Incorporated Method and apparatus for edge finishing glass
JP3011129B2 (en) * 1997-03-31 2000-02-21 日本電気株式会社 Glass substrate edge polishing machine and edge polishing method
JP2000052213A (en) * 1998-07-31 2000-02-22 Casio Comput Co Ltd Hard board chamfering device
US6325704B1 (en) * 1999-06-14 2001-12-04 Corning Incorporated Method for finishing edges of glass sheets
JP4302336B2 (en) * 2001-05-23 2009-07-22 インターナショナル・ビジネス・マシーンズ・コーポレーション Grinding apparatus and grinding method
JP2006026845A (en) 2004-07-20 2006-02-02 Nakamura Tome Precision Ind Co Ltd Adjustment method for tool position of chamfering machine
JP2006082147A (en) 2004-09-14 2006-03-30 Nakamura Tome Precision Ind Co Ltd Side working device of hard brittle substrate
JP4313285B2 (en) * 2004-11-17 2009-08-12 中村留精密工業株式会社 Edge processing device for plate workpiece
JP4969197B2 (en) * 2006-10-11 2012-07-04 中村留精密工業株式会社 Side processing equipment for plate material

Also Published As

Publication number Publication date
JP2011011323A (en) 2011-01-20
CN102059612A (en) 2011-05-18
KR20110004295A (en) 2011-01-13
KR101712668B1 (en) 2017-03-06
CN102059612B (en) 2016-03-16

Similar Documents

Publication Publication Date Title
JP5439066B2 (en) Method and apparatus for chamfering hard brittle plate
KR101228959B1 (en) Method for chamfering brittle material substrate
JP5817722B2 (en) Glass substrate and method for manufacturing glass substrate
JP4913517B2 (en) Wafer grinding method
KR20150050576A (en) Glass sheets and methods of shaping glass sheets
HK1044752B (en) Cutter wheel for brittle material substrate and a scriber provided therewith
JP2015006697A (en) Processing device and processing method of plate-like object
JP2014054713A (en) Method of processing wafer
KR101677732B1 (en) Scribing wheel and method for manufacturing the same
JP3459058B2 (en) Wafer chamfering method
JP5370913B2 (en) Glass substrate end surface polishing apparatus and end surface polishing method thereof
JP4883352B2 (en) Method and apparatus for chamfering plate-like body
JP5623249B2 (en) Wafer chamfering method
JP2006261680A (en) Method for material removal treatment of a semiconductor substrate
KR20150026770A (en) Method of dividing semiconductor wafer
JP2021122073A (en) Wafer and wafer thinning method and wafer thinning equipment
JP6608604B2 (en) Chamfered substrate and method for manufacturing liquid crystal display device
TWI491470B (en) A chamfering method for a hard brittle plate, and a chamfering apparatus
CN114656135B (en) Engraving wheel and engraving method
JP4313285B2 (en) Edge processing device for plate workpiece
JP5944581B2 (en) Semiconductor wafer grinding apparatus, semiconductor wafer manufacturing method, and semiconductor wafer grinding method
KR20160144014A (en) Substrate polishing apparatus and method of using the same
JP2008307641A (en) Chamfering device, polishing member, and chamfering method
JP2013095649A (en) Method for producing brittle material substrate from mother brittle material substrate
JP2009279679A (en) Beveling member, beveling device, beveling method, glass disc material, glass substrate for magnetic recording medium, and magnetic recording medium

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120626

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130830

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130903

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131024

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20131203

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20131216

R150 Certificate of patent or registration of utility model

Ref document number: 5439066

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees