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JP5486181B2 - Continuous metal purification method - Google Patents
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JP5486181B2 - Continuous metal purification method - Google Patents

Continuous metal purification method Download PDF

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JP5486181B2
JP5486181B2 JP2008311165A JP2008311165A JP5486181B2 JP 5486181 B2 JP5486181 B2 JP 5486181B2 JP 2008311165 A JP2008311165 A JP 2008311165A JP 2008311165 A JP2008311165 A JP 2008311165A JP 5486181 B2 JP5486181 B2 JP 5486181B2
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primary crystal
semi
aggregate
crystal aggregate
solid slurry
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JP2010132985A (en
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千修 棗
斉 石田
誠 森下
健二 徳田
光宏 阿部
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Kobe Steel Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description

本発明は、例えばアルミニウム(以下、「Al」と称す)スクラップのような共晶系不純物を含む金属スクラップから不純物元素を高率で除去した金属精製体を高い回収率で得られる金属の連続精製方法に関するものである。   The present invention is a continuous metal refining process in which a metal refined body obtained by removing impurity elements from metal scrap containing eutectic impurities such as aluminum (hereinafter referred to as “Al”) scrap at a high rate can be obtained at a high recovery rate. It is about the method.

近年、クラッド材などの生産量が増加し、それに伴う屑の量が増加している。しかし、クラッド材は、例えば組成の異なる数種類のAl合金を重ねて作成するため、上記屑から製品への単純なリサイクルは困難である。したがって、上記屑(Alスクラップ)を精製し、不純物元素が取り除かれた再利用可能なAl材を作成する技術が望まれる。   In recent years, the production amount of clad materials and the like has increased, and the amount of scrap accompanying therewith has increased. However, since the clad material is made by stacking several kinds of Al alloys having different compositions, for example, it is difficult to simply recycle the scraps into the products. Therefore, a technique for refining the scrap (Al scrap) and creating a reusable Al material from which impurity elements are removed is desired.

上記要望に応える技術として、いくつかの方法が提案されている。   Several techniques have been proposed as a technique that meets the above-mentioned demand.

例えば、特許文献1には、鋳型内のAl溶湯を所定液面位に保持しつつ、鋳型下部に下降できるように配設され、冷却された受台に精製Alを凝固成長させる方法において、溶湯内で板状体を上下に作動させ、この板状体を凝固成長したAlの上部界面に押圧して、表面の結晶Alを破壊し、この結晶Al間に存在する溶融Alを溶湯中に押し出し、前記凝固成長したAlを連続的に鋳塊として得るAlの連続精製方法が開示されている。   For example, Patent Document 1 discloses a method in which purified Al is solidified and grown on a cradle that is arranged so that it can be lowered to the lower part of the mold while maintaining the Al molten metal in the mold at a predetermined liquid level. The plate-like body is operated up and down inside, and the plate-like body is pressed against the upper interface of the solidified and grown Al to destroy the crystalline Al on the surface, and the molten Al existing between the crystalline Al is extruded into the molten metal. A method for continuously refining Al in which the solidified and grown Al is continuously obtained as an ingot is disclosed.

また、特許文献2には、精製しようとする金属溶湯を冷却して初晶粒子を発生させ、初晶粒子を含む固相率0.3未満の金属溶湯を得る工程と、この初晶粒子を含む固相率0.3未満の金属溶湯を成形型に供給し、成形型内で冷却しながら、初晶粒子と濃化溶湯が混在する所定の断面形状の固相率0.3〜0.7の成形体を連続的に製造する工程と、得られた成形体に圧力を加えて初晶粒子塊と濃化溶湯とに分離して回収する工程、を含む金属の精製方法とこの方法を実現するユニットを備えた金属の精製装置が開示されている。
特開昭63−42336号公報 特許第3490808号公報
Patent Document 2 discloses a step of cooling a molten metal to be purified to generate primary crystal particles, and obtaining a molten metal having a solid phase ratio of less than 0.3 including the primary crystal particles; The molten metal having a solid phase ratio of less than 0.3 is supplied to the mold, and while cooling in the mold, the solid phase ratio of a predetermined cross-sectional shape in which the primary crystal particles and the concentrated molten metal are mixed is 0.3 to 0.00. And a method for purifying a metal comprising a step of continuously producing a molded body of No. 7 and a step of applying pressure to the obtained molded body to separate and recover the primary crystal particle lump and the concentrated molten metal. A metal refining device with a unit to be realized is disclosed.
JP 63-42336 A Japanese Patent No. 3490808

しかしながら、上記特許文献1、2に開示された技術には、以下のような問題点が存在する。   However, the techniques disclosed in Patent Documents 1 and 2 have the following problems.

すなわち、特許文献1に記載のAlの連続精製方法は、不純物元素が高率で除去されることが期待される高い圧力で押圧した場合、精製された金属が上部からの圧力により崩壊する可能性があり、結果として純度の高い精製金属が得られない。   That is, the method for continuously purifying Al described in Patent Document 1 may cause the refined metal to collapse due to pressure from above when pressed at a high pressure at which impurity elements are expected to be removed at a high rate. As a result, a purified metal with high purity cannot be obtained.

また、特許文献2に記載の金属の精製方法は、連続的に精製する方法ではあるが、流動性のない半固化成形体に圧力を加えて固液分離するため、分離効率が低い。すなわち、不純物元素の除去率が低くなる。また、この方法では、精製物の重量が精製しようとする金属溶湯(原料)のほぼ50%までしか得られない。   Moreover, although the metal purification method described in Patent Document 2 is a continuous purification method, the separation efficiency is low because solid-liquid separation is performed by applying pressure to a semi-solidified product having no fluidity. That is, the impurity element removal rate is lowered. Also, with this method, the weight of the purified product can be obtained only up to about 50% of the molten metal (raw material) to be purified.

以上のような問題点を克服できる金属の連続精製方法が、これまでに存在しなかった。   There has never been a continuous metal purification method that can overcome the above problems.

本発明の目的は、共晶系不純物を含む金属スクラップから不純物元素を高率で除去した金属精製体を高い回収率で得られる金属の連続精製方法を提供することにある。   An object of the present invention is to provide a continuous metal purification method capable of obtaining a metal refined body obtained by removing impurity elements at a high rate from metal scrap containing eutectic impurities at a high recovery rate.

この目的を達成するために、本発明の請求項1に記載の発明は、
共晶系不純物を含む金属スクラップ溶湯を液相線以下でかつ固相線以上の温度まで冷却させて初晶を発生させ、この初晶を含む半凝固スラリーを生成する工程と、昇降可能な押し固め板と下降可能な受台とを備えた連続圧搾用容器に所定液面位となるように前記半凝固スラリーを供給し、この供給された半凝固スラリーの液面位より上方から押し固め板を下降させて、初晶の集積体と濃化液相とを形成し、この初晶の集積体に前記押し固め板により所定圧力を付与し、圧搾された初晶の集積体と残りの液相部分とに分離し、この圧搾された初晶の集積体(「前の圧搾された初晶の集積体」と称す)を前記連続圧搾用容器の下方へ前記受台とともに降下させる工程と、前記残りの液相部分に前記初晶を含む半凝固スラリーを前記所定液面位まで補充し、この半凝固スラリーが補充された残りの液相部分の液面位より上方から前記押し固め板を再び下降させて、前の圧搾された初晶の集積体の上に新たな初晶の集積体と濃化液相とを形成し、この新たに形成された初晶の集積体に前記押し固め板により所定圧力を付与し、新たな圧搾された初晶の集積体と残りの液相部分とに分離し、この新たな圧搾された初晶の集積体と前の圧搾された初晶の集積体(これらの圧搾された初晶の集積体をまとめて、改めて「前の圧搾された初晶の集積体」と称す)を前記連続圧搾用容器の下方へ前記受台とともに降下させる一連の手順を連続して繰り返し、圧搾された初晶の集積体が積層した金属精製体を回収する工程と、を備えたことを特徴とする金属の連続精製方法である。
In order to achieve this object, the invention according to claim 1 of the present invention provides:
A process for generating a semi-solid slurry containing a primary crystal by cooling a molten metal scrap containing eutectic impurities to a temperature below the liquidus and above the solidus, and a push capable of moving up and down The semi-solid slurry is supplied to a continuous squeeze container provided with a compaction plate and a descendable cradle so as to reach a predetermined liquid level, and the compaction plate is pressed from above the liquid level of the supplied semi-solid slurry. The primary crystal aggregate and the concentrated liquid phase are formed, and a predetermined pressure is applied to the primary crystal aggregate by the compaction plate, and the primary crystal aggregate and the remaining liquid are pressed. Separating the squeezed primary crystal aggregate (referred to as "previous squeezed primary crystal aggregate") with the cradle below the continuous squeeze container, The semi-solid slurry containing the primary crystals in the remaining liquid phase part up to the predetermined liquid level Fill the semi-solid slurry and replenish the compaction plate again from above the liquid level of the remaining liquid phase part to refill the new primary crystal on the previous compressed primary crystal aggregate. And forming a concentrated liquid phase, applying a predetermined pressure to the newly formed primary crystal aggregate by the compaction plate, and newly pressing the primary crystal aggregate and the remaining liquid. This new squeezed primary crystal aggregate and the previous squeezed primary crystal aggregate (these squeezed primary crystal aggregates together, A series of steps of lowering the primary crystal aggregate) together with the cradle to the lower side of the container for continuous pressing, and recovering the metal refined body in which the compressed primary crystal aggregates are laminated. A process for continuously purifying metal, comprising the step of:

請求項2に記載の発明は、請求項1に記載の発明において、前記半凝固スラリーの固相率は0.3未満である。   According to a second aspect of the present invention, in the first aspect of the present invention, the semisolid slurry has a solid phase ratio of less than 0.3.

請求項3に記載の発明は、請求項1に記載の発明において、前記押し固め板により初晶の集積体に付与する所定圧力は、3〜10MPaであり、かつ、前記圧力の保持時間は、3〜5分である。   The invention according to claim 3 is the invention according to claim 1, wherein the predetermined pressure applied to the primary crystal aggregate by the compaction plate is 3 to 10 MPa, and the holding time of the pressure is 3 to 5 minutes.

請求項4に記載の発明は、請求項1に記載の発明において、前記連続圧搾用容器の下方には、冷却手段を備えたが設置されている。 According to a fourth aspect of the present invention, in the first aspect of the present invention, a pipe having a cooling means is installed below the continuous pressing container.

本発明に係る金属の連続精製方法によれば、連続圧搾用容器の上部から新鮮な初晶を含む半凝固スラリーを順次補充しながら、圧搾を繰り返すとともに連続圧搾用容器の下方へ圧搾された初晶の集積体が積層した金属精製体を連続して降下させていくため、共晶系不純物を含む金属スクラップから不純物元素を高率で除去した金属精製体が高い回収率で得られる。このような半凝固スラリーを用いて、連続して圧搾を繰り返す金属の精製方法を採用することで、バッチ式の金属の精製方法に比べて、上記金属スクラップから不純物元素を高率で除去した金属精製体の回収率が高くなる。   According to the method for continuously purifying metal according to the present invention, the repetitive squeezing is performed while the semi-solid slurry containing fresh primary crystals is sequentially replenished from the upper part of the continuous squeezing container and the first squeezed downward of the continuous squeezing container. Since the refined metal body in which the crystal agglomerates are stacked is continuously lowered, a refined metal body in which the impurity elements are removed at a high rate from the metal scrap containing the eutectic impurities can be obtained at a high recovery rate. By using such semi-solid slurry, a metal refining method that repeatedly squeezes continuously, a metal that removes impurity elements from the above metal scrap at a higher rate than a batch-type metal refining method. The recovery rate of the purified product is increased.

以下、本発明について、実施形態を例示しつつ、詳細に説明する。   Hereinafter, the present invention will be described in detail while illustrating embodiments.

(本発明に係る金属の連続精製方法の構成)
本発明に係る金属の連続精製方法は、
共晶系不純物を含む金属スクラップ溶湯を液相線以下でかつ固相線以上の温度まで冷却させて初晶を発生させ、この初晶を含む半凝固スラリーを生成する工程と、昇降可能な押し固め板と下降可能な受台とを備えた連続圧搾用容器に所定液面位となるように前記半凝固スラリーを供給し、この供給された半凝固スラリーの液面位より上方から押し固め板を下降させて、初晶の集積体と濃化液相とを形成し、この初晶の集積体に前記押し固め板により所定圧力を付与し、圧搾された初晶の集積体と残りの液相部分とに分離し、この圧搾された初晶の集積体(「前の圧搾された初晶の集積体」と称す)を前記連続圧搾用容器の下方へ前記受台とともに降下させる工程と、前記残りの液相部分に前記初晶を含む半凝固スラリーを前記所定液面位まで補充し、この半凝固スラリーが補充された残りの液相部分の液面位より上方から前記押し固め板を再び下降させて、前の圧搾された初晶の集積体の上に新たな初晶の集積体と濃化液相とを形成し、この新たに形成された初晶の集積体に前記押し固め板により所定圧力を付与し、新たな圧搾された初晶の集積体と残りの液相部分とに分離し、この新たな圧搾された初晶の集積体と前の圧搾された初晶の集積体(これらの圧搾された初晶の集積体をまとめて、改めて「前の圧搾された初晶の集積体」と称す)を前記連続圧搾用容器の下方へ前記受台とともに降下させる一連の手順を連続して繰り返し、圧搾された初晶の集積体が積層した金属精製体を回収する工程と、を備えたことを特徴とする。
(Configuration of the continuous metal purification method according to the present invention)
The method for continuously purifying metals according to the present invention includes:
A process for generating a semi-solid slurry containing a primary crystal by cooling a molten metal scrap containing eutectic impurities to a temperature below the liquidus and above the solidus, and a push capable of moving up and down The semi-solid slurry is supplied to a continuous squeeze container provided with a compaction plate and a descendable cradle so as to reach a predetermined liquid level, and the compaction plate is pressed from above the liquid level of the supplied semi-solid slurry. The primary crystal aggregate and the concentrated liquid phase are formed, and a predetermined pressure is applied to the primary crystal aggregate by the compaction plate, and the primary crystal aggregate and the remaining liquid are pressed. Separating the squeezed primary crystal aggregate (referred to as "previous squeezed primary crystal aggregate") with the cradle below the continuous squeeze container, The semi-solid slurry containing the primary crystals in the remaining liquid phase part up to the predetermined liquid level Fill the semi-solid slurry and replenish the compaction plate again from above the liquid level of the remaining liquid phase part to refill the new primary crystal on the previous compressed primary crystal aggregate. And forming a concentrated liquid phase, applying a predetermined pressure to the newly formed primary crystal aggregate by the compaction plate, and newly pressing the primary crystal aggregate and the remaining liquid. This new squeezed primary crystal aggregate and the previous squeezed primary crystal aggregate (these squeezed primary crystal aggregates together, A series of steps of lowering the primary crystal aggregate) together with the cradle to the lower side of the container for continuous pressing, and recovering the metal refined body in which the compressed primary crystal aggregates are laminated. And a step of performing.

以下に、本発明に係る金属の連続精製方法の基本原理について説明する。図1は同精製方法に用いる金属の連続精製装置の模式図、図2は同基本原理を時系列的に説明するための模式図である。   Below, the fundamental principle of the continuous purification method of the metal which concerns on this invention is demonstrated. FIG. 1 is a schematic diagram of a continuous metal purification apparatus used in the purification method, and FIG. 2 is a schematic diagram for explaining the basic principle in time series.

図1、図2において、1は半凝固スラリー生成部、2はヒーター、3は初晶、4は初晶3を含む半凝固スラリー、10は連続圧搾用容器としての内径130mm、高さ500mmの円筒型の黒鉛製鋳型、11は黒鉛製鋳型10の下部に設けられた高い熱伝導率からなるとしての銅、12は銅11の周囲に設けられた冷却手段、13は半凝固スラリー生成部1と黒鉛製鋳型10を接続させる連結、14は連結13の途中に設けられた液面位調整用シャッター、15は黒鉛製鋳型10の下側に設けられた下降可能な外径130mmの鉄製の受台、16は黒鉛製鋳型10の上側に設けられた昇降可能な外径120mmの鉄製の押し固め板である。 1 and 2, 1 is a semi-solid slurry generating section, 2 is a heater, 3 is a primary crystal, 4 is a semi-solid slurry containing primary crystal 3, and 10 is an inner diameter of 130 mm and a height of 500 mm as a container for continuous pressing. cylindrical graphite mold 11 copper tube as a tube made of a high thermal conductivity provided on the lower portion of the graphite mold 10, 12 is cooling means provided around the copper pipe 11, 13 is semi-solidified slurry A connecting pipe for connecting the generator 1 and the graphite mold 10, 14 is a liquid level adjusting shutter provided in the middle of the connecting pipe 13, and 15 is a descendable outer diameter provided on the lower side of the graphite mold 10. A 130 mm iron cradle 16 is an iron compaction plate having an outer diameter of 120 mm, which can be moved up and down, provided on the upper side of the graphite mold 10.

図1において、半凝固スラリー生成部1に入れられた共晶系不純物を含む金属スクラップ{例えば、Al−1.6wt%Si−0.1wt%Feの成分からなる合金(Alスクラップ)}溶湯を液相線以下でかつ固相線以上の温度まで冷却させて初晶3を発生させる。これにより、初晶3を含む半凝固スラリー4が完成する。この初晶3を含む半凝固スラリー4は、液面位調整用シャッター14を開けることにより、連結13を通して黒鉛製鋳型10に供給される。 In FIG. 1, a metal scrap containing eutectic impurities (for example, an alloy composed of Al-1.6 wt% Si-0.1 wt% Fe (Al scrap)) in a semi-solid slurry generating section 1 is melted. The primary crystal 3 is generated by cooling to a temperature below the liquidus and above the solidus. Thereby, the semi-solidified slurry 4 containing the primary crystal 3 is completed. The semi-solid slurry 4 containing the primary crystal 3 is supplied to the graphite mold 10 through the connecting pipe 13 by opening the liquid level adjusting shutter 14.

図2(a)は、受台15により下側が封止された黒鉛製鋳型10に、図1に示す連結13を通して上記初晶3を含む半凝固スラリー4が所定液面位Aとなるように供給された状態を示す。これにより、初晶3を含む半凝固スラリー4の高さはhとなる。 FIG. 2A shows that the semi-solid slurry 4 containing the primary crystal 3 reaches a predetermined liquid level A through the connecting tube 13 shown in FIG. The state supplied to is shown. Accordingly, the height of the semi-solidified slurry 4 comprising primary crystal 3 becomes h 0.

図2(b)は、供給された半凝固スラリー4の液面位Aより上方から押し固め板16を下降させて、初晶3の集積体と濃化液相とを形成し、この初晶3の集積体に押し固め板16により所定圧力を付与し(1回目の圧搾)、高さhの圧搾された初晶3の集積体20aと高さhr1の残りの液相部分21aとに分離した状態を示す。 FIG. 2B shows that the compaction plate 16 is lowered from above the liquid level A of the supplied semi-solid slurry 4 to form an aggregate of the primary crystal 3 and a concentrated liquid phase. the compacted plate 16 pushes the third integrated body by applying a predetermined pressure (first pressing), the remaining liquid phase portion 21a of the stack 20a and the height h r1 primary crystal 3 squeezed height h 1 Shows the separated state.

図2(c)は、高さhの圧搾された初晶3の集積体20aが黒鉛製鋳型10の下方へ受台15とともに降下された状態を示す。これにより、残りの液相部分21aの液面位は当初の所定液面位Aより下に下がり、新鮮な半凝固スラリー4を受け入れ可能な空間Bが発生する。 FIG. 2 (c) shows a state where the pressed primary crystal 3 aggregate 20 a having a height h 1 is lowered together with the cradle 15 below the graphite mold 10. Thereby, the liquid level of the remaining liquid phase portion 21a is lowered below the initial predetermined liquid level A, and a space B that can receive fresh semi-solid slurry 4 is generated.

図2(d)は、再び液面位調整用シャッター14を開け、連結13を通して半凝固スラリー生成部1から残りの液相部分21aに新鮮な半凝固スラリー4を所定液面位Aに達するまで補充した状態を示す。これにより、再び図2(a)に示す初晶3を含む半凝固スラリー4(高さh)に近いものが得られる。 In FIG. 2D, the liquid level adjustment shutter 14 is opened again, and the fresh semi-solid slurry 4 reaches the predetermined liquid level A from the semi-solid slurry generation unit 1 to the remaining liquid phase portion 21 a through the connecting pipe 13. The state replenished until is shown. Thus, to obtain what again close to 2 semi-solidified slurry containing primary crystals 3 shown in (a) 4 (height h 0).

図2(e)は、図2(d)に示す半凝固スラリー4が補充された残りの液相部分21aの液面位(所定液面位A)より上方から押し固め板16を再び下降させて、圧搾された初晶の集積体20aの上に新たな初晶3の集積体と濃化液相とを形成し、この新たに形成された初晶3の集積体に押し固め板16により所定圧力を付与し(2回目の圧搾)、高さh2の圧搾された初晶3の集積体20bと高さhr2の残りの液相部分21bとに分離した状態を示す。図1に示すように、本実施形態の金属の連続精製装置においては、黒鉛製鋳型10の下部に冷却手段12が周囲に設けられた銅11が設置されているため、圧搾された初晶の集積体20aと新たに形成された初晶3の集積体の凝固を速め、圧搾時に高い所定圧力を加えることが可能になる。したがって、例えば、2回目の圧搾時の所定圧力を1回目の圧搾時の所定圧力に比べて、さらに高くした場合にも、圧搾された初晶の集積体(金属精製体)が崩壊することがない。これにより、圧搾された初晶3の集積体20b内から外に濃化液相をより多く排除することができるようになるため、不純物元素を高率で除去した金属精製体をより高い回収率で得られるようになる。 FIG. 2 (e) shows that the pressing plate 16 is lowered again from above the liquid level (predetermined liquid level A) of the remaining liquid phase portion 21a supplemented with the semi-solid slurry 4 shown in FIG. 2 (d). Then, a new primary crystal 3 aggregate and a concentrated liquid phase are formed on the compressed primary crystal aggregate 20a, and the newly formed primary crystal 3 aggregate is pressed by the compaction plate 16. A state is shown in which a predetermined pressure is applied (second pressing) and the aggregated body 20b of the primary crystal 3 having a height h 2 and the remaining liquid phase portion 21b having a height h r2 are separated. As shown in FIG. 1, in the metal continuous refining apparatus of this embodiment, a copper tube 11 having a cooling means 12 provided in the lower part of a graphite mold 10 is installed, so that the pressed primary crystal It is possible to accelerate the solidification of the aggregate 20a and the newly formed aggregate of the primary crystal 3 and to apply a high predetermined pressure during pressing. Therefore, for example, even when the predetermined pressure at the second pressing is higher than the predetermined pressure at the first pressing, the compressed primary crystal aggregate (metal refined body) may collapse. Absent. As a result, more concentrated liquid phase can be removed from the compressed primary crystal 3 accumulated body 20b to the outside, so that the metal purified body from which the impurity elements are removed at a high rate has a higher recovery rate. It will be obtained at.

図2(f)は、高さhの圧搾された初晶3の集積体20aと高さh2の圧搾された初晶3の集積体20bが黒鉛製鋳型10の下方へ受台15とともにさらに降下された状態を示す。これにより、残りの液相部分21bの液面位は当初の所定液面位Aより下に下がり、新鮮な半凝固スラリー4を受け入れ可能な空間Cが再び発生する。 FIG. 2 (f) stack 20b of the stack 20a and the primary crystal 3 squeezed height h 2 of the primary crystal 3 squeezed height h 1 together with cradle 15 below the graphite mold 10 Furthermore, it shows the lowered state. As a result, the liquid level of the remaining liquid phase portion 21b falls below the initial predetermined liquid level A, and a space C in which fresh semi-solid slurry 4 can be received is generated again.

次に、上記のような空間Cが発生したことを利用して、上述の図2(d)で説明したと同様に、再び液面位調整用シャッター14を開け、連結13を通して半凝固スラリー生成部1から残りの液相部分21bに新鮮な半凝固スラリー4を所定液面位Aに達するまで補充する。以降、上述の図2(e)、図2(f)と同様の工程を経ることにより、図1に示すような高さh3の圧搾された初晶3の集積体20cが得られる。以上により、最終的に不純物元素が高率で除去された3層(高さh+h2+h3)に積層した金属精製体を高い回収率で得られる(図1参照)。 Next, by utilizing the generation of the space C as described above, the liquid level adjustment shutter 14 is opened again and the semi-solid slurry is passed through the connecting pipe 13 in the same manner as described with reference to FIG. A fresh semi-solid slurry 4 is replenished from the generator 1 to the remaining liquid phase portion 21b until a predetermined liquid level A is reached. Thereafter, the integrated body 20c of the pressed primary crystal 3 having a height h 3 as shown in FIG. 1 is obtained through the same steps as those shown in FIGS. 2 (e) and 2 (f). As a result, a metal refined body laminated in three layers (height h 1 + h 2 + h 3 ) from which the impurity element is finally removed at a high rate can be obtained at a high recovery rate (see FIG. 1).

なお、本実施形態においては、最終的に不純物元素が高率で除去された3層(高さh+h2+h3)に積層した金属精製体を回収する例について説明したが、必ずしもこれに限定されるものではなく、所望の回収率が得られるまで上記図2(d)〜図2(f)と同様の工程を連続して繰り返せばよい。 In the present embodiment, the example in which the metal refined body stacked in the three layers (height h 1 + h 2 + h 3 ) from which the impurity element is finally removed at a high rate has been described has been described. The process is not limited, and the same steps as in FIGS. 2D to 2F may be repeated continuously until a desired recovery rate is obtained.

このような半凝固スラリーを用いて、連続して圧搾を繰り返す金属の精製方法を採用することで、バッチ式の金属の精製方法に比べて、上記金属スクラップから不純物元素を高率で除去した金属精製体の回収率が高くなる。   By using such semi-solid slurry, a metal refining method that repeatedly squeezes continuously, a metal that removes impurity elements from the above metal scrap at a higher rate than a batch-type metal refining method. The recovery rate of the purified product is increased.

また、初晶3を含む半凝固スラリー4の固相率を0.3未満にすることで、半凝固スラリー生成部1から連結13を通して黒鉛製鋳型10により効率的に供給することができる。その結果、圧搾時に初晶3の集積体内から外に濃化液相をより多く排除することができるようになるため、不純物元素をより高率で除去した金属精製体を高い回収率で得られるようになる。 Further, by setting the solid phase ratio of the semi-solid slurry 4 containing the primary crystal 3 to less than 0.3, the graphite mold 10 can be efficiently supplied from the semi-solid slurry generation section 1 through the connecting pipe 13. As a result, more concentrated liquid phase can be excluded from the accumulated body of the primary crystal 3 during pressing, so that a metal refined body from which impurity elements have been removed at a higher rate can be obtained with a higher recovery rate. It becomes like this.

また、本実施形態においては、2回目の圧搾時の所定圧力を1回目の圧搾時の所定圧力に比べて高くする例について説明したが、必ずしもこれに限定されるものではなく、例えば、圧搾時毎の付与圧力をすべて同じにしたり、変化させたり、さまざまな圧力の加え方が可能である。この圧搾時の所定圧力値は、初晶3の集積体から濃化液相を十分に除去させる点から3MPa以上がより好ましい。ただし、10MPaを超えても除去率は、それほど増加しないため、圧搾される初晶の集積体の強度の点から10MPa以下がより好ましい。また、圧搾時の所定圧力を長く保持することで、低い圧力でも初晶3の集積体から濃化液相を十分に除去させることができる。その効果と生産性を考慮に入れると、前記圧力の保持時間は、3〜5分がより好ましい。   Moreover, in this embodiment, although the example which makes the predetermined pressure at the time of the 2nd pressing high compared with the predetermined pressure at the time of the 1st pressing was demonstrated, it is not necessarily limited to this, For example, at the time of pressing It is possible to make the applied pressures all the same, change them, or apply various pressures. The predetermined pressure value at the time of pressing is more preferably 3 MPa or more from the viewpoint of sufficiently removing the concentrated liquid phase from the aggregate of the primary crystal 3. However, since the removal rate does not increase so much even if it exceeds 10 MPa, 10 MPa or less is more preferable from the viewpoint of the strength of the primary crystal aggregate to be pressed. Further, by maintaining the predetermined pressure at the time of pressing for a long time, the concentrated liquid phase can be sufficiently removed from the aggregate of the primary crystal 3 even at a low pressure. Taking the effect and productivity into consideration, the holding time of the pressure is more preferably 3 to 5 minutes.

また、本実施形態においては、黒鉛製鋳型10の下部に冷却手段12が周囲に設けられた銅11が設置された例について説明したが、必ずしもこれに限定されるものではない。金属精製体に望む不純物元素の除去率と回収率を考慮に入れて適宜設置すればよい。 In the present embodiment, the example in which the copper tube 11 provided with the cooling means 12 around the graphite mold 10 is described. However, the present invention is not necessarily limited thereto. What is necessary is just to install suitably considering the removal rate and recovery rate of the impurity element desired for a refined metal body.

以下、本発明の金属の連続精製方法の一実施例について説明する。   Hereinafter, an example of the continuous metal purification method of the present invention will be described.

本実施例においては、上述の図1、図2に示す構成を採用して、確認実験を行なった。したがって、同一構成要素には同一番号を付与して説明する。   In this example, a confirmation experiment was performed by adopting the configuration shown in FIGS. Therefore, the same constituent elements will be described with the same numbers.

本実施例においては、共晶系不純物を含む金属スクラップ溶湯として、Al−1.6wt%Si−0.1wt%Feの成分からなる合金(Alスクラップ)}を用いた。この溶湯を640℃まで冷却することでAlスクラップ溶湯内に初晶3を発生させ、初晶3を含む固相率0.3未満の半凝固スラリー4を完成させた。   In this example, an alloy (Al scrap) composed of Al-1.6 wt% Si-0.1 wt% Fe was used as the molten metal scrap containing eutectic impurities. By cooling this molten metal to 640 ° C., primary crystal 3 was generated in the Al scrap molten metal, and semisolid slurry 4 containing primary crystal 3 and having a solid phase ratio of less than 0.3 was completed.

また、押し固め板16には、圧搾された初晶3の集積体から残りの液相部分が効率良く分離されるように、直径5mmの通湯孔(図示せず)が32個設けられている。また、押し固め板16の昇降ストロークは150mmである。   The pressing plate 16 is provided with 32 hot water holes (not shown) having a diameter of 5 mm so as to efficiently separate the remaining liquid phase portion from the pressed primary crystal 3 aggregate. Yes. Moreover, the raising / lowering stroke of the compaction board 16 is 150 mm.

圧搾条件は、下記のように定めた。
付与圧力 保持時間
1回目: 4.0MPa 3分
2回目: 6.5MPa 3分
3回目: 8.0MPa 3分
The pressing conditions were determined as follows.
Applied pressure Holding time 1st time: 4.0 MPa 3 minutes 2nd time: 6.5 MPa 3 minutes 3rd time: 8.0 MPa 3 minutes

以上の条件に基づき、図2の模式図に示すような一連の工程を適用し、高さhの圧搾された初晶3の集積体20a、高さh2の圧搾された初晶3の集積体20bと高さh3の圧搾された初晶3の集積体20cからなる3層に積層した金属精製体を得た。 Based on the above conditions, by applying a series of steps as shown in the schematic diagram of FIG. 2, the primary crystal 3 squeezed height h 1 stack 20a, the primary crystal 3 squeezed height h 2 to obtain a metal refining formed by laminating three layers of an integrated body 20b and the height h 3 of the squeezed primary crystals 3 of the stack 20c.

上記圧搾された初晶3の集積体20a、20b、20cの組成を分析した結果、下記表1に示すように、不純物元素(Si、Fe)の除去率が極めて高かった。

Figure 0005486181
As a result of analyzing the composition of the pressed primary crystal 3 aggregates 20a, 20b, and 20c, as shown in Table 1 below, the removal rate of impurity elements (Si, Fe) was extremely high.
Figure 0005486181

また、3層に積層した金属精製体の回収率を調べた結果、86%と極めて高い回収率を達成した(上記表1参照)。回収率の定義は、下記式(1)に従う。
「回収率に関して」
回収率=(圧搾された初晶3の集積体20a、20b、20cの合計体積)/(図2(a)に示す直径130mm×高さhの半凝固スラリー4の体積)×100 … (1)
Moreover, as a result of examining the recovery rate of the metal refined body laminated in three layers, an extremely high recovery rate of 86% was achieved (see Table 1 above). The definition of the recovery rate follows the following formula (1).
“Recovery rate”
Recovery rate = (Total volume of pressed primary crystal 3 aggregates 20a, 20b, 20c) / (Volume of semi-solid slurry 4 having diameter 130 mm × height h 0 shown in FIG. 2A) × 100 ( 1)

なお、本実施例においては、共晶系不純物を含む金属スクラップ溶湯として、Al−1.6%Si−0.1%Feの成分からなる合金(Alスクラップ)の例について説明したが、必ずしもこれに限定されるものではなく、さまざまな共晶系不純物を含む金属スクラップを用いることが可能である。   In the present embodiment, an example of an alloy (Al scrap) made of a component of Al-1.6% Si-0.1% Fe has been described as a metal scrap molten metal containing eutectic impurities. However, it is possible to use metal scrap containing various eutectic impurities.

また、本実施例においては、Alスクラップを例に、液相線以下でかつ固相線以上の温度として640℃まで冷却させて初晶を発生させ、この初晶を含む半凝固スラリーを生成したもの用いて説明したが、必ずしもこれに限定されるものではなく、さまざまな共晶系不純物を含む金属スクラップ溶湯を液相線以下でかつ固相線以上の温度まで冷却させて初晶を発生させ、この初晶を含む半凝固スラリーを生成させて用いることが可能である。   Further, in this example, by taking Al scrap as an example, a primary solid was generated by cooling to 640 ° C. as a temperature below the liquidus and above the solidus, and a semi-solid slurry containing this primary was generated. However, the present invention is not necessarily limited to this, and a metal scrap melt containing various eutectic impurities is cooled to a temperature below the liquidus and above the solidus to generate primary crystals. A semi-solid slurry containing this primary crystal can be generated and used.

また、本実施例においては、圧搾時毎に付与圧力を段階的に高めた例について説明したが、必ずしもこれに限定されるものではなく、例えば、圧搾時毎の付与圧力をすべて同じにしたり、変化させたり、さまざまな圧力の加え方が可能である。   Moreover, in the present embodiment, the example in which the application pressure is increased stepwise for each squeezing has been described, but it is not necessarily limited to this, for example, all the application pressures for each squeezing may be the same, It is possible to change and apply various pressures.

本発明の一実施形態の金属の連続精製方法に用いる金属の連続精製装置の模式図である。It is a schematic diagram of the continuous purification apparatus of the metal used for the continuous purification method of the metal of one Embodiment of this invention. 同精製方法の基本原理を時系列的に説明するための模式図である。It is a schematic diagram for demonstrating the basic principle of the purification method in time series.

符号の説明Explanation of symbols

1 半凝固スラリー生成部
2 ヒーター
3 初晶
4 半凝固スラリー
10 黒鉛製鋳型
11 銅
12 冷却手段
13 連結
14 液面位調整用シャッター
15 受台
16 押し固め板
20a、20b、20c 圧搾された初晶3の集積体
21a、21b、21c 残りの液相部分
A 所定液面位
B、C 半凝固スラリー4を受け入れ可能な空間
DESCRIPTION OF SYMBOLS 1 Semi-solidified slurry production | generation part 2 Heater 3 Primary crystal 4 Semi-solidified slurry 10 Graphite mold 11 Copper pipe 12 Cooling means 13 Connection pipe 14 Liquid level adjustment shutter 15 Receptacle 16 Compaction board 20a, 20b, 20c Accumulated bodies 21a, 21b, 21c of primary crystal 3 Remaining liquid phase part A Predetermined liquid level B, C Space that can receive semi-solid slurry 4

Claims (4)

共晶系不純物を含む金属スクラップ溶湯を液相線以下でかつ固相線以上の温度まで冷却させて初晶を発生させ、この初晶を含む半凝固スラリーを生成する工程と、昇降可能な押し固め板と下降可能な受台とを備えた連続圧搾用容器に所定液面位となるように前記半凝固スラリーを供給し、この供給された半凝固スラリーの液面位より上方から押し固め板を下降させて、初晶の集積体と濃化液相とを形成し、この初晶の集積体に前記押し固め板により所定圧力を付与し、圧搾された初晶の集積体と残りの液相部分とに分離し、この圧搾された初晶の集積体(「前の圧搾された初晶の集積体」と称す)を前記連続圧搾用容器の下方へ前記受台とともに降下させる工程と、前記残りの液相部分に前記初晶を含む半凝固スラリーを前記所定液面位まで補充し、この半凝固スラリーが補充された残りの液相部分の液面位より上方から前記押し固め板を再び下降させて、前の圧搾された初晶の集積体の上に新たな初晶の集積体と濃化液相とを形成し、この新たに形成された初晶の集積体に前記押し固め板により所定圧力を付与し、新たな圧搾された初晶の集積体と残りの液相部分とに分離し、この新たな圧搾された初晶の集積体と前の圧搾された初晶の集積体(これらの圧搾された初晶の集積体をまとめて、改めて「前の圧搾された初晶の集積体」と称す)を前記連続圧搾用容器の下方へ前記受台とともに降下させる一連の手順を連続して繰り返し、圧搾された初晶の集積体が積層した金属精製体を回収する工程と、を備えたことを特徴とする金属の連続精製方法。   A process for generating a semi-solid slurry containing a primary crystal by cooling a molten metal scrap containing eutectic impurities to a temperature below the liquidus and above the solidus, and a push capable of moving up and down The semi-solid slurry is supplied to a continuous squeeze container provided with a compaction plate and a descendable cradle so as to reach a predetermined liquid level, and the compaction plate is pressed from above the liquid level of the supplied semi-solid slurry. The primary crystal aggregate and the concentrated liquid phase are formed, and a predetermined pressure is applied to the primary crystal aggregate by the compaction plate, and the primary crystal aggregate and the remaining liquid are pressed. Separating the squeezed primary crystal aggregate (referred to as "previous squeezed primary crystal aggregate") with the cradle below the continuous squeeze container, The semi-solid slurry containing the primary crystals in the remaining liquid phase part up to the predetermined liquid level Fill the semi-solid slurry and replenish the compaction plate again from above the liquid level of the remaining liquid phase part to refill the new primary crystal on the previous compressed primary crystal aggregate. And forming a concentrated liquid phase, applying a predetermined pressure to the newly formed primary crystal aggregate by the compaction plate, and newly pressing the primary crystal aggregate and the remaining liquid. This new squeezed primary crystal aggregate and the previous squeezed primary crystal aggregate (these squeezed primary crystal aggregates together, A series of steps of lowering the primary crystal aggregate) together with the cradle to the lower side of the container for continuous pressing, and recovering the metal refined body in which the compressed primary crystal aggregates are laminated. A process for continuously purifying metal, comprising the step of: 前記半凝固スラリーの固相率は0.3未満である請求項1に記載の金属の連続精製方法。   The method for continuously purifying metal according to claim 1, wherein the semi-solid slurry has a solid phase ratio of less than 0.3. 前記押し固め板により初晶の集積体に付与する所定圧力は、3〜10MPaであり、かつ、前記圧力の保持時間は、3〜5分である請求項1に記載の金属の連続精製方法。   The method for continuously purifying metal according to claim 1, wherein the predetermined pressure applied to the primary crystal aggregate by the compaction plate is 3 to 10 MPa, and the holding time of the pressure is 3 to 5 minutes. 前記連続圧搾用容器の下方には、冷却手段を備えたが設置された請求項1に記載の金属の連続精製方法。 The method for continuously purifying metal according to claim 1, wherein a pipe having a cooling means is installed below the continuous pressing container.
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