JP5489744B2

JP5489744B2 - Method for manufacturing adsorption member

Info

Publication number: JP5489744B2
Application number: JP2010012650A
Authority: JP
Inventors: 万平田中; 悠司川瀬
Original assignee: Kyocera Corp
Current assignee: Kyocera Corp
Priority date: 2010-01-23
Filing date: 2010-01-23
Publication date: 2014-05-14
Anticipated expiration: 2030-01-23
Also published as: JP2011151277A

Description

本発明は、吸着用部材の製造方法に関する。
The present invention relates to the production how the adsorbing member.

従来、半導体ウェハを固定する治具として、緻密質セラミックスの凹部に複数の載置部（吸着部）が形成された真空吸着装置がある（例えば、特許文献１参照）。これらの吸着部は、例えば、セラミックスとガラスとからなる多孔質体から形成されている。このような吸着部にウェハを固定して研磨を行うと、ウェハを載せる吸着面に研磨屑が堆積する。そして、ウェハを多数研磨するなどして、吸着面に堆積する研磨屑が多くなると、（１）ウェハの吸着力が弱くなる、（２）ウェハの吸着時に、ウェハが吸着面に垂直な方向に変形して、その平坦度を高精度に維持して研磨できなくなるといった不具合が生じる。よって、吸着面に堆積する研磨屑が多くなると、吸着面の研磨を行って、研磨屑が目詰まりした部分を除去し、新たに露出した面を吸着面として使用するといった方法が採られる。 Conventionally, as a jig for fixing a semiconductor wafer, there is a vacuum suction device in which a plurality of placement portions (suction portions) are formed in a concave portion of a dense ceramic (for example, see Patent Document 1). These adsorption parts are formed from the porous body which consists of ceramics and glass, for example. When polishing is performed with the wafer fixed to such a suction portion, polishing scraps accumulate on the suction surface on which the wafer is placed. When a large number of polishing debris accumulates on the suction surface, such as by polishing a large number of wafers, (1) the suction force of the wafer becomes weak. (2) When the wafer is suctioned, the wafer is in a direction perpendicular to the suction surface. The deformation causes a problem that the flatness is maintained with high accuracy and polishing cannot be performed. Therefore, when polishing scraps accumulated on the suction surface increase, the suction surface is polished to remove the clogged portion of the polishing scraps, and the newly exposed surface is used as the suction surface.

特開２００８−２１１０９７号公報JP 2008-211097 A

しかし、従来の真空吸着装置では、吸着面を研磨すると、その露出した面においてセラミック粒子が脱粒しやすいという問題があった。 However, the conventional vacuum suction device has a problem that when the suction surface is polished, the ceramic particles are likely to fall off on the exposed surface.

例えば特許文献１に記載の真空吸着装置は、凹型容器形状の支持部に、セラミック粉末とガラス粉末と、水またはアルコール等の溶剤とを含む流動性に富むスラリーを充填、および乾燥して製造される。このようなスラリー中では、ガラス粒子がスラリーの上部に偏析しやすい。また、このようなスラリーを加熱して乾燥すると、さらに多くのガラスがスラリーの上部に偏析する。従って、特許文献１に記載の真空吸着装置では、吸着部におけるガラスが吸着面とその近傍に偏析している。 For example, the vacuum suction device described in Patent Document 1 is manufactured by filling a concave container-shaped support portion with a slurry having high fluidity including ceramic powder, glass powder, and a solvent such as water or alcohol, and drying. The In such a slurry, glass particles are likely to segregate at the top of the slurry. Moreover, when such a slurry is heated and dried, more glass is segregated on the upper part of the slurry. Therefore, in the vacuum suction device described in Patent Document 1, the glass in the suction part is segregated on the suction surface and in the vicinity thereof.

このように吸着面にガラスが多く偏析していると、吸着用部材を研磨して上記研磨屑が目詰まりした部分を除去した場合、ガラスの含有量が少ない面が露出する。ガラスの少ない面では、個々のセラミック粒子がガラスによって結合されにくくなっているため、セラミック粒子が脱粒しやすい。 In this way, when a large amount of glass is segregated on the adsorption surface, when the adsorbing member is polished to remove the portion clogged with the polishing debris, a surface with a small glass content is exposed. On the surface with a small amount of glass, the individual ceramic particles are difficult to be bonded by the glass, so that the ceramic particles are easy to fall off.

従って、吸着部からセラミック粒子が脱粒しにくい吸着用部材の製造方法が求められている。
Thus, ceramic particles from the adsorption part is manufactured how shedding difficult attracting member is required.

本発明の一態様による吸着用部材の製造方法は、対象物が吸着される吸着面を有する吸着部と、該吸着部の周囲に設けられた支持部とを有する吸着用部材の製造方法であって、前記支持部として、凹部を有するセラミック焼結体を準備する工程と、前記凹部にガラス粒子、セラミックス粒子、および水を含む原料を充填する工程と、前記原料を振動させながら加圧することにより成形体を形成する成形工程と、前記成形体を加熱することにより、前記ガラス粒子を溶融させて前記セラミックス粒子を該溶融したガラスにより結合させる熱処理工程と、を有する。 A method for manufacturing a member for suction according to an aspect of the present invention is a method for manufacturing a member for suction having an adsorption part having an adsorption surface on which an object is adsorbed and a support part provided around the adsorption part. A step of preparing a ceramic sintered body having a recess as the support, a step of filling the recess with a raw material containing glass particles, ceramic particles, and water, and pressurizing while vibrating the raw material. A forming step of forming a formed body; and a heat treatment step of heating the formed body to melt the glass particles and bond the ceramic particles with the molten glass.

本発明の一態様による吸着用部材の製造方法は、セラミック粒子の脱粒しにくい吸着用部材を製造することができる。 The method for manufacturing an adsorbing member according to one embodiment of the present invention can manufacture an adsorbing member in which ceramic particles are less likely to be granulated.

本発明の第１の実施形態に係る吸着用部材を示す斜視図である。It is a perspective view which shows the member for adsorption | suction which concerns on the 1st Embodiment of this invention. （ａ）は、図１の吸着用部材を示す上面図、（ｂ）は、（ａ）のＡ１−Ａ１線における断面図である。(A) is a top view which shows the member for adsorption | suction of FIG. 1, (b) is sectional drawing in the A1-A1 line | wire of (a). 図１の吸着用部材に対象物を吸着させた状態を示す断面図である。It is sectional drawing which shows the state which made the adsorption | suction member of FIG. 1 adsorb | suck a target object. 図１の吸着用部材の吸着部の断面を拡大して模式的に表した拡大断面図である。FIG. 2 is an enlarged cross-sectional view schematically showing an enlarged cross section of an adsorption portion of the adsorption member in FIG. 1. 図２（ｂ）のＤ部の拡大図である。FIG. 3 is an enlarged view of a portion D in FIG. 本発明の第２の実施形態に係る吸着用部材を示す斜視図である。It is a perspective view which shows the member for adsorption | suction which concerns on the 2nd Embodiment of this invention. （ａ）は、図６の吸着用部材を示す上面図、（ｂ）は、（ａ）のＡ２−Ａ２線における断面図である。(A) is a top view which shows the member for adsorption | suction of FIG. 6, (b) is sectional drawing in the A2-A2 line of (a). （ａ）、（ｂ）は、図６の吸着用部材に対象物を吸着させた状態を示す断面図である。(A), (b) is sectional drawing which shows the state which made the adsorption | suction member of FIG. 6 adsorb | suck a target object. （ａ）〜（ｅ）は、図１の吸着用部材の製造方法を模式的に示した図である。(A)-(e) is the figure which showed typically the manufacturing method of the member for adsorption | suction of FIG.

以下、図１−９を参照して、本発明の実施の形態について詳細に説明する。
（第１の実施形態）
吸着用部材は、対象物を吸着する際に用いられる。図１乃至図３に示すように、吸着用部材１ａは、対象物Ｗが吸着される吸着面２を有する吸着部３と、吸着部３の周囲に設けられた支持部５とを有する。また、図４に示すように、吸着部３は、複数のセラミック粒子１１と、セラミック粒子１１同士を結合するガラス１２とを含む。ここで、吸着部３の深さ方向Ｚにおけるガラス１２の濃度の変化率は１４％以内である。本実施の形態による吸着用部材１ａは、吸着部３の深さ方向におけるガラス１２の濃度の変化率が小さいため、吸着部３の吸着面２を吸着部３の深さ方向に研磨した場合でも、露出した面において、セラミック粒子１１がガラス１２によって強固に結合されている。従って、セラミック粒子１１が脱粒しにくい。 Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS.
(First embodiment)
The adsorbing member is used when adsorbing an object. As shown in FIGS. 1 to 3, the adsorbing member 1 a includes an adsorbing part 3 having an adsorbing surface 2 on which an object W is adsorbed, and a support part 5 provided around the adsorbing part 3. Moreover, as shown in FIG. 4, the adsorption | suction part 3 contains the several ceramic particle | grains 11 and the glass 12 which couple | bonds the ceramic particle | grains 11 mutually. Here, the rate of change of the concentration of the glass 12 in the depth direction Z of the suction portion 3 is within 14%. The suction member 1a according to the present embodiment has a small change rate of the concentration of the glass 12 in the depth direction of the suction portion 3, so that even when the suction surface 2 of the suction portion 3 is polished in the depth direction of the suction portion 3. The ceramic particles 11 are firmly bonded by the glass 12 on the exposed surface. Therefore, the ceramic particles 11 are not easily shed.

吸着部３は、多孔質セラミックスからなり、複数の連通孔（図４において１３で示される）を含む。このとき、吸着部３の気孔率は、２５−５０体積％の範囲内であることが好ましい。また、吸着部３の平均気孔径は、２０−１００μmの範囲内であることが好ましい。 The adsorption part 3 is made of porous ceramics and includes a plurality of communication holes (indicated by 13 in FIG. 4). At this time, it is preferable that the porosity of the adsorption | suction part 3 exists in the range of 25-50 volume%. Moreover, it is preferable that the average pore diameter of the adsorption | suction part 3 exists in the range of 20-100 micrometers.

上記ガラス１２の濃度の変化率が１４％以内であるとき、後述するように、吸着部３と支持部５との間にガラス層（図５）を形成した場合は、このガラス層の近傍を除いた部分において、ガラス濃度の変化率が１４％以内であることをいう。ガラス層の近傍とは、吸着部３を構成する多孔質セラミックッスとガラス層との境界から、上記深さ方向に垂直な方向における該境界からの距離が３ｍｍ以下の位置までをいう。なお、ガラス濃度の変化率は、１０％以内であることがより好ましく、６％以内であることがさらに好ましい。 When the rate of change in the concentration of the glass 12 is within 14%, as will be described later, when a glass layer (FIG. 5) is formed between the adsorption part 3 and the support part 5, the vicinity of this glass layer is In the excluded portion, the rate of change in glass concentration is within 14%. The vicinity of the glass layer refers to the distance from the boundary between the porous ceramic soot constituting the adsorbing portion 3 and the glass layer to a position where the distance from the boundary in the direction perpendicular to the depth direction is 3 mm or less. The change rate of the glass concentration is more preferably within 10%, and further preferably within 6%.

吸着部３の深さ方向のガラス濃度の変化率の測定方法について説明する。吸着面２の略中央部を吸着面２に垂直な方向に切断し、さらに切断面をダイヤモンド砥石でソフトに研磨する。この研磨面にＣ（カーボン）またはＡｕ（金）を蒸着し、ＥＤＳ（エネルギー分散型Ｘ線分析装置）を用いて各元素を検出する。測定装置としては、例えば日本電子製のＪＥＤ−２３００を用いることができる。ＥＤＳの測定条件は、例えば、倍率１００倍、加速電圧２５ｋＶ、照射電流１ｎＡ、照射有効時間６０秒、デッドタイム１０％である。なお、これらの測定条件は適宜変更できる。 A method for measuring the rate of change in the glass concentration in the depth direction of the adsorption unit 3 will be described. A substantially central portion of the suction surface 2 is cut in a direction perpendicular to the suction surface 2, and the cut surface is softly polished with a diamond grindstone. C (carbon) or Au (gold) is deposited on the polished surface, and each element is detected using an EDS (energy dispersive X-ray analyzer). As the measuring device, for example, JED-2300 manufactured by JEOL Ltd. can be used. The measurement conditions of EDS are, for example, a magnification of 100, an acceleration voltage of 25 kV, an irradiation current of 1 nA, an irradiation effective time of 60 seconds, and a dead time of 10%. These measurement conditions can be changed as appropriate.

例えば、セラミック粒子がアルミナを主成分とし、ガラスがＳｉを多く含む組成の場合のＥＤＳ測定方法について例説する。ＥＤＳにより上記測定条件でＳｉを測定すると、１．７３９ｋｅＶ付近にＳｉのピークが現れる。このＳｉのピークのカウント値を、吸着部３の上記研磨面について測定する。測定位置は、吸着面２の直下、および吸着面２から深さ方向に例えば２ｍｍずつ等間隔の位置とする。ただし、ガラス層を形成した場合は、ＥＤＳを用いてガラス層の近傍を除く箇所を測定する。ＥＤＳによる各位置のＳｉのカウント値の平均値Ａｖｅ、最大値Ｍａｘ、最小値Ｍｉｎを求める。ガラス濃度の変化率は、（Ｍａｘ−Ａｖｅ）×１００（％）、（Ａｖｅ−Ｍｉｎ）×１００（％）の値をそれぞれ計算し、両者のうち大きい方の値（％）とする。 For example, an EDS measurement method in the case where the ceramic particles are mainly composed of alumina and the glass has a high Si content will be described. When Si is measured by EDS under the above measurement conditions, a Si peak appears in the vicinity of 1.739 keV. The count value of the Si peak is measured for the polished surface of the suction portion 3. The measurement positions are set at equal intervals, for example, by 2 mm from the suction surface 2 and in the depth direction from the suction surface 2. However, when a glass layer is formed, the part except the vicinity of a glass layer is measured using EDS. An average value Ave, a maximum value Max, and a minimum value Min of Si count values at each position by EDS are obtained. The change rate of the glass concentration is calculated by calculating (Max-Ave) × 100 (%) and (Ave-Min) × 100 (%), respectively, and taking the larger value (%) of the two.

なお、ガラス濃度の変化率を測定するとき、吸着面２の略中央部を吸着面２に垂直な方向に切断して測定しているが、このガラス濃度は、吸着面２からの深さが同じ位置にある、深さ方向に垂直な面全体において同じであると考えられる。 In addition, when measuring the change rate of the glass concentration, it is measured by cutting a substantially central portion of the adsorption surface 2 in a direction perpendicular to the adsorption surface 2. It is considered to be the same in the entire plane perpendicular to the depth direction at the same position.

セラミック粒子３の材質は、アルミナ、または炭化珪素のいずれかを主成分とすることが好ましい。 The material of the ceramic particles 3 is preferably mainly composed of either alumina or silicon carbide.

ガラスは、硼珪酸ガラスなどを用いることができる。ガラス１２の融点は、セラミック粒子の融点よりも８００℃以上低いことが好ましい。例えば、ガラス１２の融点は、７００−１１００℃であることが好ましい。 As the glass, borosilicate glass or the like can be used. The melting point of the glass 12 is preferably 800 ° C. or lower than the melting point of the ceramic particles. For example, the melting point of the glass 12 is preferably 700-1100 ° C.

支持部５は、アルミナなどの緻密質セラミックスからなる。支持部５は、吸着部３の吸着面２に対向する表面、すなわち吸着部３の下面を支持している。吸着部３に含まれるセラミック粒子１１と支持部５の材質は同じであること、特に、支持部５は、アルミナを主成分とするセラミックスからなることが好ましい。支持部５の気孔率は０．１％以下が好ましい。 The support portion 5 is made of a dense ceramic such as alumina. The support unit 5 supports the surface of the suction unit 3 that faces the suction surface 2, that is, the lower surface of the suction unit 3. It is preferable that the ceramic particles 11 included in the adsorption part 3 and the support part 5 are made of the same material. In particular, the support part 5 is preferably made of ceramics mainly composed of alumina. The porosity of the support portion 5 is preferably 0.1% or less.

支持部５は、複数の吸引孔６を有する。吸引孔６の開口は、吸着部３の下面に対向する表面に設けられる。よって、吸引孔６から空気を吸引すると、吸着部３の内部の空気が吸引されて、吸着部３の吸着面２に載置された対象物Ｗが、吸着面２に吸着される。 The support part 5 has a plurality of suction holes 6. The opening of the suction hole 6 is provided on the surface facing the lower surface of the suction part 3. Therefore, when air is sucked from the suction hole 6, the air inside the suction unit 3 is sucked, and the object W placed on the suction surface 2 of the suction unit 3 is sucked to the suction surface 2.

さらに、支持部５の下方には、吸着用部材１ａを支持し、固定するための固定ベース（不図示）が備えられる。支持部５と固定ベース（不図示）とは、例えば、等間隔に設置された取り付け穴７にボルト等を介して連結、固定される。 Furthermore, a fixing base (not shown) for supporting and fixing the adsorption member 1a is provided below the support portion 5. The support portion 5 and the fixed base (not shown) are connected and fixed to, for example, bolts or the like in mounting holes 7 that are installed at equal intervals.

吸着用部材１ａは、吸着部３のガラス１２の含有量が３−１４質量％であることが好ましい。このような吸着用部材１ａは、セラミック粒子１１の脱粒をさらに抑制することができる。ガラス１２の含有量が３質量％以上であると、セラミック粒子１１同士の結合力を十分に高めることができる。一方、ガラス１２の含有量が１４質量％以下であると、セラミック粒子１１を結合しているガラス１２の剥離を抑制することができ、結果として、セラミック粒子１１の脱粒を抑制することができる。すなわち、ガラス１２の含有量が多すぎると、ガラス１２の厚みが増して、ガラス１２が剥離しやすくなり、ガラス１２とともにセラミック粒子１１が脱粒しやすくなるが、ガラス１２の含有量が１４質量％以下であると、これを抑制することができる。 In the adsorbing member 1a, the content of the glass 12 in the adsorbing portion 3 is preferably 3-14% by mass. Such an adsorbing member 1 a can further suppress the degranulation of the ceramic particles 11. When the content of the glass 12 is 3% by mass or more, the bonding force between the ceramic particles 11 can be sufficiently increased. On the other hand, when the content of the glass 12 is 14% by mass or less, peeling of the glass 12 bonding the ceramic particles 11 can be suppressed, and as a result, degranulation of the ceramic particles 11 can be suppressed. That is, when the content of the glass 12 is too large, the thickness of the glass 12 is increased, the glass 12 is easily peeled off, and the ceramic particles 11 are easily separated with the glass 12, but the content of the glass 12 is 14% by mass. This can be suppressed as follows.

吸着用部材１ａは、セラミック粒子１１の粒径の標準偏差σが５０μｍ以下であることが好ましい。これによって、セラミック粒子１１の脱粒を特に抑制することができる。この理由は、セラミック粒子１１の粒径の標準偏差σが５０μｍ以下であると、セラミック粒子１１の粒径ばらつきが小さいので、ガラス１２によるセラミック粒子１１同士の結合力のばらつきが小さくなるためである。 The adsorbing member 1a preferably has a standard deviation σ of the particle size of the ceramic particles 11 of 50 μm or less. Thereby, it is possible to particularly suppress the degranulation of the ceramic particles 11. This is because, when the standard deviation σ of the particle size of the ceramic particles 11 is 50 μm or less, the particle size variation of the ceramic particles 11 is small, so that the variation of the bonding force between the ceramic particles 11 due to the glass 12 is small. .

標準偏差σは、吸着部３を平面研磨し、顕微鏡などを用いて研磨面に観察されるセラミック粒子１１の大きさを多数測定して求めることができる。この場合、研磨面の観察とともに、Ｘ線マイクロアナライザー等を用いた研磨面の組成分析を行うとよい。このように組成分析を行うと、セラミック粒子１１とガラス１２とを判別することがより容易となる。すなわち、ガラス１２がセラミック粒子１１の周囲に存在するなどして、観察だけではセラミック粒子１１とガラス１２との判別が困難な場合にも、組成分析を行うと判別が容易となり、セラミック粒子１１の標準偏差σをより容易に求めることができる。なお、標準偏差σは、後述の原料におけるセラミック粉末のみの粒径分布から予め測定しても同じ値が得られる。 The standard deviation σ can be obtained by planarly polishing the adsorption portion 3 and measuring a number of sizes of the ceramic particles 11 observed on the polished surface using a microscope or the like. In this case, the composition analysis of the polished surface using an X-ray microanalyzer or the like is preferably performed along with the observation of the polished surface. When composition analysis is performed in this manner, it becomes easier to distinguish between the ceramic particles 11 and the glass 12. That is, even when it is difficult to discriminate between the ceramic particles 11 and the glass 12 only by observation due to the presence of the glass 12 around the ceramic particles 11, it becomes easy to discriminate the ceramic particles 11 by performing composition analysis. The standard deviation σ can be determined more easily. Note that the standard deviation σ can be the same value even if it is measured in advance from the particle size distribution of only ceramic powder in the raw material described later.

また、図５に示すように、吸着用部材１ａは、吸着部３と支持部５との間にガラス層９が形成されていることが好ましい。この吸着用部材１ａは、吸着部３と支持部５とがガラス層９を介して強固に密着しているので、吸着部３と支持部５との接合強度を高めることができる。 Further, as shown in FIG. 5, the adsorbing member 1 a preferably has a glass layer 9 formed between the adsorbing portion 3 and the support portion 5. In this adsorbing member 1 a, the adsorbing part 3 and the support part 5 are firmly adhered via the glass layer 9, so that the bonding strength between the adsorbing part 3 and the support part 5 can be increased.

ここで、支持部５と吸着部３の間の隙間が大きいと、真空引きしたときに、この隙間から気体が多量に吸い込まれて対象物Ｗを真空吸着する力が低下する。また、吸着部３に堆積した研磨屑を、支持部５から吸着部３に向けて高圧の水を流して洗浄するいわゆる逆洗浄を行うと、支持部５が吸着部３から剥離してしまう場合もあった。つまり、支持部５と吸着部３の間の隙間は、あまり大きすぎてはいけない。そこで、吸着部３と支持部５の隙間を、例えば平均で５μｍ以下、さらに好ましくは２μｍ以下等の所定の距離以下にする必要がある。 Here, if the gap between the support portion 5 and the suction portion 3 is large, a large amount of gas is sucked from the gap when vacuuming is performed, and the force for vacuum suction of the object W is reduced. In addition, when the so-called reverse cleaning is performed in which the polishing debris accumulated on the adsorption unit 3 is washed by flowing high-pressure water from the support unit 5 toward the adsorption unit 3, the support unit 5 is separated from the adsorption unit 3. There was also. That is, the gap between the support portion 5 and the suction portion 3 should not be too large. Therefore, the gap between the suction portion 3 and the support portion 5 needs to be less than a predetermined distance such as 5 μm or less, more preferably 2 μm or less on average.

吸着部３と支持部５の隙間は、音波探傷試験により次のように評価する。 The gap between the suction portion 3 and the support portion 5 is evaluated as follows by a sound wave inspection test.

まず、吸着部３が接合されていない支持部５を準備する。そして、支持部５の裏面（支持部５が吸着部３と接合されるべき面に対向する面）側から超音波を照射する。すると、支持部３の凹部底面と外界との境界で超音波が反射し、反射強度が得られる。この反射強度を超音波の入射強度で割った値を、基準反射強度比Ｓ０（−）とする。 First, the support part 5 to which the adsorption | suction part 3 is not joined is prepared. Then, ultrasonic waves are irradiated from the back surface side of the support portion 5 (the surface facing the surface where the support portion 5 is to be bonded to the suction portion 3). Then, the ultrasonic wave is reflected at the boundary between the bottom surface of the concave portion of the support portion 3 and the outside world, and the reflection intensity is obtained. A value obtained by dividing the reflection intensity by the incident intensity of the ultrasonic wave is defined as a reference reflection intensity ratio S0 (−).

次に、支持部５と吸着部３が接合された吸着用部材１ａを準備する。そして、この吸着用部材１ａの支持部５の裏面側から超音波を照射して反射した強度を入射強度で割った値すなわち反射強度比Ｓ１（−）を測定する。この反射強度比Ｓ１を基準反射強度比Ｓ０で割った値、すなわちＳ１／Ｓ０を求める。Ｓ１／Ｓ０の値が小さければ、支持部５と吸着部３の隙間が小さく、Ｓ１／Ｓ０の値が大きければ支持部５と吸着部３の隙間が小さい。 Next, a suction member 1a in which the support portion 5 and the suction portion 3 are joined is prepared. And the value which divided the intensity | strength reflected and irradiated with the ultrasonic wave from the back surface side of this support part 5 of this adsorption | suction member 1a, ie, reflection intensity ratio S1 (-), is measured. A value obtained by dividing the reflection intensity ratio S1 by the reference reflection intensity ratio S0, that is, S1 / S0 is obtained. If the value of S1 / S0 is small, the gap between the support part 5 and the suction part 3 is small, and if the value of S1 / S0 is large, the gap between the support part 5 and the suction part 3 is small.

例えば、Ｓ１／Ｓ０が２／３以下の場合を「隙間の間隔が許容範囲内」とし、Ｓ１／Ｓ０が２／３を越えた場合を「隙間の間隔が許容範囲外」とする。なお、測定に用いる超音波の周波数は、例えば５００ＭＨｚ、プローブ距離（超音波の発信端と測定対象物との距離）は、例えば２０ｍｍとする。 For example, the case where S1 / S0 is 2/3 or less is set as “gap interval is within the allowable range”, and the case where S1 / S0 exceeds 2/3 is set “gap interval is outside the allowable range”. In addition, the frequency of the ultrasonic wave used for the measurement is, for example, 500 MHz, and the probe distance (distance between the transmission end of the ultrasonic wave and the measurement object) is, for example, 20 mm.

吸着部３と支持部５の接合強度が高いかどうかは、例えば次のようにして判定することができる。吸引孔６から吸着部３に加圧した水を供給し、吸着部３の吸着面２から水を放出させる。水圧は、０．１〜１ＭＰａ程度とする。このように水圧をかけると、吸着部３が支持部５から分離しようとする応力がはたらく。吸着部３と支持部５の接合強度が高ければ、この応力がかかった場合でも、吸着部３と支持部５との間に亀裂が入ったり、吸着部３が支持部５から剥離したりしない。従って、所定の水圧で吸引孔６から吸着部３に水を供給したときに、吸着部３と支持部５との接合部に変化が起きなければ、吸着部３と支持部５の接合強度が十分に高いと判断することができる。吸着部３に供給する水の水圧は、適宜設定することが可能である。 Whether or not the bonding strength between the suction portion 3 and the support portion 5 is high can be determined as follows, for example. Pressurized water is supplied from the suction hole 6 to the adsorption unit 3, and water is released from the adsorption surface 2 of the adsorption unit 3. The water pressure is about 0.1 to 1 MPa. When the water pressure is applied in this way, the stress that the adsorbing part 3 tries to separate from the support part 5 works. If the bonding strength between the suction part 3 and the support part 5 is high, even if this stress is applied, there is no crack between the suction part 3 and the support part 5, and the suction part 3 does not peel from the support part 5. . Therefore, when water is supplied from the suction hole 6 to the suction portion 3 at a predetermined water pressure, if the joint portion between the suction portion 3 and the support portion 5 does not change, the joint strength between the suction portion 3 and the support portion 5 is increased. It can be judged that it is sufficiently high. The water pressure of the water supplied to the adsorption unit 3 can be set as appropriate.

（第２の実施形態）
次に、本発明の他の実施形態に係る吸着用部材について説明する。ここで、第１の実施形態に係る吸着用部材と同じ構成については説明を省略し、異なる構成について説明する。 (Second Embodiment)
Next, an adsorbing member according to another embodiment of the present invention will be described. Here, description is abbreviate | omitted about the same structure as the member for adsorption | suction which concerns on 1st Embodiment, and a different structure is demonstrated.

図６，図７に示すように、本実施の形態による吸着用部材１ｂは、複数の吸着部３ａ，３ｂと吸着部３ａ，３ｂを隔離する隔離部１４とを有する。ここで、吸着部３ａおよび吸着部３ｂの吸着面には、それぞれ２ａ，２ｂの符号を付している。隔離部１４は、サイズの異なる対象物を、同じ吸着用部材を用いて吸着するために設けたものである。 As shown in FIGS. 6 and 7, the adsorbing member 1 b according to the present embodiment includes a plurality of adsorbing parts 3 a and 3 b and an isolating part 14 that isolates the adsorbing parts 3 a and 3 b. Here, the suction surfaces of the suction part 3a and the suction part 3b are denoted by reference numerals 2a and 2b, respectively. The isolation | separation part 14 is provided in order to adsorb | suck the target object from which size differs using the same member for adsorption | suction.

なお、支持部５および隔離部１４の下端部は一体的に形成されていてもよい。この場合、隔離部１４は、下端部が緻密質セラミックスからなり、その下端部と支持部５が一体的に形成されていることが好ましい。 In addition, the lower end part of the support part 5 and the isolation | separation part 14 may be formed integrally. In this case, it is preferable that the lower end part of the isolation part 14 is made of a dense ceramic, and the lower end part and the support part 5 are integrally formed.

吸引孔６は、吸着部３ａの下方に設けられた吸引孔６ａと、吸着部３ｂの下方に設けられた吸引孔６ｂとを有する。これにより、いずれの吸引孔６ａ、６ｂを介して吸着部３ａ，３ｂ内部の空気を吸引するかを適宜選択することにより、サイズの異なる対象物を適宜吸着することが可能となる。より具体的には、図８（ａ）に示すように、対象物Ｗ１を吸着部に載置した際、平面視したときに、対象物Ｗ１の外周部が吸着面２ｂの外周部と略同一、若しくは吸着面２ｂの外周部からわずかに内側にある場合には、全ての吸引孔６ａ、６ｂから空気を吸引する。また、図８（ｂ）に示すように、平面視したときに、対象物Ｗ２の外周部が隔離部１４と略同一、若しくは隔離部１４の内側にある場合には、吸引孔６ａのみから空気を吸引する。 The suction hole 6 has a suction hole 6a provided below the suction part 3a and a suction hole 6b provided below the suction part 3b. Thereby, it becomes possible to appropriately adsorb objects having different sizes by appropriately selecting which of the suction holes 6a and 6b is used to suck the air inside the suction portions 3a and 3b. More specifically, as shown in FIG. 8A, when the object W1 is placed on the suction portion, the outer periphery of the object W1 is substantially the same as the outer periphery of the suction surface 2b when viewed in plan. Or, when it is slightly inside from the outer periphery of the suction surface 2b, air is sucked from all the suction holes 6a, 6b. Further, as shown in FIG. 8B, when the outer peripheral portion of the object W2 is substantially the same as the inside of the separating portion 14 or inside the separating portion 14 when viewed in a plan view, air is introduced from only the suction hole 6a. Aspirate.

本実施の形態による吸着用部材１ｂにおいても、吸着部３ａ，３ｂの深さ方向Ｚにおけるガラス１２の濃度の変化率は１４％以内であれば、吸着部３ａ，３ｂの吸着面２ａ，２ｂを吸着部３ａ，３ｂの深さ方向に研磨した場合でも、露出した面において、セラミック粒子１１がガラス１２によって強固に結合されているため、セラミック粒子１１が脱粒しにくくなる。 Also in the suction member 1b according to the present embodiment, if the rate of change of the concentration of the glass 12 in the depth direction Z of the suction portions 3a and 3b is within 14%, the suction surfaces 2a and 2b of the suction portions 3a and 3b are used. Even when the adsorbing portions 3a and 3b are polished in the depth direction, the ceramic particles 11 are not easily shattered because the ceramic particles 11 are firmly bonded by the glass 12 on the exposed surfaces.

次に、本発明の一実施形態に係る吸着用部材の製造方法について説明する。ここでは、第１の実施形態による吸着用部材１ａを用いて説明する。 Next, the manufacturing method of the member for adsorption | suction which concerns on one Embodiment of this invention is demonstrated. Here, description will be made using the adsorption member 1a according to the first embodiment.

本発明の一実施形態による吸着用部材の製造方法は、支持部５として、凹部１５を有するセラミック焼結体を準備する工程と、凹部１５にガラス粒子およびセラミック粒子を含む原料１６を充填する工程と、原料１６を振動させながら加圧することにより成形体１７を形成する成形工程と、成形体１７を加熱することにより、ガラス粒子を溶融させてセラミックス粒子１１をガラス１２により結合させる熱処理工程と、を有する。この製造方法によれば、吸着部３の深さ方向のガラス１２の濃度の変化率が小さくなるので、セラミック粒子１１の脱粒を抑制できる吸着用部材１ａを製造することができる。さらには、吸着部３と支持部５との隙間が小さい吸着用部材１ａを製造することができる。 The method for manufacturing an adsorbing member according to an embodiment of the present invention includes a step of preparing a ceramic sintered body having a recess 15 as the support portion 5, and a step of filling the recess 15 with a raw material 16 containing glass particles and ceramic particles. A molding step of forming the molded body 17 by pressurizing the raw material 16 while vibrating, a heat treatment step of melting the glass particles and bonding the ceramic particles 11 with the glass 12 by heating the molded body 17; Have According to this manufacturing method, since the rate of change in the concentration of the glass 12 in the depth direction of the adsorbing portion 3 is reduced, the adsorbing member 1a that can suppress the degranulation of the ceramic particles 11 can be manufactured. Furthermore, it is possible to manufacture the suction member 1a having a small gap between the suction part 3 and the support part 5.

以下に、具体的に説明する。 This will be specifically described below.

まず、図９（ａ）に示すように、緻密質のセラミック焼結体からなる支持部５を準備する。支持部５には、予め吸引孔６が設けられている。吸引孔６の開口は、凹部１５の底面に設けられている。なお、図９（ｂ）以降の図では、吸引孔６の符号を省略する。 First, as shown in FIG. 9A, a support portion 5 made of a dense ceramic sintered body is prepared. The support portion 5 is provided with a suction hole 6 in advance. The opening of the suction hole 6 is provided on the bottom surface of the recess 15. In addition, the code | symbol of the suction hole 6 is abbreviate | omitted in the figure after FIG.9 (b).

次に、図９（ｂ）に示すように、凹部１５に原料１６を充填する。この原料は、平均粒径５０−２５０μmのアルミナ粒子からなるセラミック粉末、ガラス粉末、および水を混合すすることにより作られる。アルミナ粉末とガラス粉末の割合は、アルミナ粉末が８６−９７質量％、ガラス粉末が３−１４質量％である。ガラス粉末は、平均粒径が４−４０μm、融点が７００−１０００℃である。水は、セラミック粉末とガラス粉末の合計１００質量部に対して、５−１０質量部である。原料は、固形粒子の集合物であり、その安息角は、概ね２５−４５°である。すなわち、原料１６はスラリーほど流動性の高いものではない。 Next, as shown in FIG. 9B, the raw material 16 is filled in the recess 15. This raw material is made by mixing ceramic powder composed of alumina particles having an average particle diameter of 50 to 250 μm, glass powder, and water. The ratio of the alumina powder to the glass powder is 86-97 mass% for the alumina powder and 3-14 mass% for the glass powder. The glass powder has an average particle size of 4-40 μm and a melting point of 700-1000 ° C. Water is 5-10 mass parts with respect to a total of 100 mass parts of ceramic powder and glass powder. The raw material is an aggregate of solid particles, and the angle of repose is approximately 25-45 °. That is, the raw material 16 is not as fluid as the slurry.

さらに、図９（ｃ）に示すように、原料１６を加圧、圧縮する。加圧時の圧力は、０．０４５−０．２５Ｍｐａである。ここで、原料１６が漏れないようにするために、金型などの成形用治具１８が取り付けられていてもよい。また、加圧中、原料１６に振動が与えられる。この加圧および振動は、金型１９を用いて原料１６を上方から押し付け、加圧するとともに、金型１９の上方から１軸振動する振動体２０を金型１９に密着させて押し付け、その状態で、加圧・圧縮方向に振動機を振動させることにより得られる。ここで、振動の振幅は、０．５〜５ｍｍである。振動中は、原料１６中の水が、セラミック粉末とガラス粉末の配列を促進する役割を果たすことから、振動が、原料１６中の凹部１５内にあるセラミック粒子とガラス粉末に均一に伝わる。このため、振動を与えない場合に比べて低い圧力で、密度の高い成形体１７を作製することができる。 Further, as shown in FIG. 9C, the raw material 16 is pressurized and compressed. The pressure at the time of pressurization is 0.045-0.25 Mpa. Here, in order to prevent the raw material 16 from leaking, a molding jig 18 such as a mold may be attached. Moreover, vibration is given to the raw material 16 during pressurization. This pressurization and vibration are performed by pressing and pressing the raw material 16 from above using the mold 19, and pressing the vibrating body 20 that vibrates uniaxially from above the mold 19 in close contact with the mold 19. It can be obtained by vibrating the vibrator in the pressurizing / compressing direction. Here, the amplitude of vibration is 0.5 to 5 mm. During vibration, the water in the raw material 16 plays a role of promoting the arrangement of the ceramic powder and the glass powder, so that the vibration is uniformly transmitted to the ceramic particles and the glass powder in the recess 15 in the raw material 16. For this reason, the compact 17 having a high density can be produced at a lower pressure than when no vibration is applied.

なお、振動体２０の振動数は１００〜２５０Ｈｚであることが好ましい。この範囲の振動数に設定することによって、低い圧力で加圧した場合でも成形体１７の密度を高めることができるので、セラミック粒子とガラスの結合力が向上する。その結果、セラミック粒子の脱粒をさらに抑制できる吸着用部材１ａを製造することができる。 Note that the vibration frequency of the vibrating body 20 is preferably 100 to 250 Hz. By setting the frequency within this range, the density of the molded body 17 can be increased even when pressurized at a low pressure, so that the bonding force between the ceramic particles and the glass is improved. As a result, it is possible to manufacture the adsorbing member 1a that can further suppress the detachment of the ceramic particles.

また、振動を与えることによって、凹部１５の底面近くにある原料１６に圧力が良好に伝わるだけでなく、凹部１５の側面近くにある原料１６にも圧力が良好に伝わる。よって、凹部１５内にある原料１６全体が均一に加圧され、得られる成形体１７の密度ばらつきを小さくすることができる。 In addition, by applying vibration, not only the pressure is favorably transmitted to the raw material 16 near the bottom surface of the concave portion 15 but also the pressure is favorably transmitted to the raw material 16 near the side surface of the concave portion 15. Therefore, the entire raw material 16 in the recess 15 is uniformly pressed, and the density variation of the obtained molded body 17 can be reduced.

また、上述のように、固形粒子の集合体である原料１６を用いるとともに、加圧する際にこの原料１６を振動させることにより、充填後から加圧終了までの間に、原料１６中でガラス粉末が偏析することを抑制することができる。よって、成形体１７中のガラスの濃度は、成形体全体に渡って均一となる。 In addition, as described above, the raw material 16 which is an aggregate of solid particles is used, and the raw material 16 is vibrated when being pressurized, so that the glass powder is contained in the raw material 16 after filling up to the end of pressurization. Can be prevented from segregating. Therefore, the concentration of glass in the molded body 17 is uniform over the entire molded body.

成形体１７の上部は、支持部５の上面から若干はみ出ていてもよい。はみ出た部分は、後述する熱処理後にさらに研磨して除去できる。 The upper portion of the molded body 17 may slightly protrude from the upper surface of the support portion 5. The protruding portion can be further polished and removed after the heat treatment described later.

次に、成形体１７を加熱（熱処理）する。これにより、成形体１７中の水分が蒸発し、原料１６中のセラミック粒子がガラスによって結合される。ここで、熱処理温度は、ガラスが溶融する温度、好ましくは９００−１２００℃である。この熱処理温度は、ガラスの融点によって適宜設定される。セラミック粒子は、この熱処理によって焼結せず、粒成長することもないため、熱処理しても、得られる熱処理体の体積が熱処理前後で実質的に変化しない。熱処理後は、図９（ｄ）に示すように成形体１７は吸着部３となる。 Next, the molded body 17 is heated (heat treatment). Thereby, the water | moisture content in the molded object 17 evaporates, and the ceramic particle | grains in the raw material 16 are couple | bonded with glass. Here, the heat treatment temperature is a temperature at which the glass melts, preferably 900 to 1200 ° C. This heat treatment temperature is appropriately set depending on the melting point of the glass. Since the ceramic particles are not sintered and do not grow by this heat treatment, the volume of the obtained heat-treated body is not substantially changed before and after the heat treatment. After the heat treatment, the molded body 17 becomes the adsorption part 3 as shown in FIG.

なお、図５に示すように、吸着部３と支持部５との間にガラス層９を形成する場合は、支持部５の凹部１５に原料１６を充填する前に、凹部１５の底面および側面にガラスペーストを塗布するとよい。この場合の塗布厚みは、４０−２００μｍが好ましい。ガラスペーストに含まれるガラス粉末の融点は、原料１６中に含まれるガラス粉末と同じまたは略同じであることが好ましい。 In addition, as shown in FIG. 5, when forming the glass layer 9 between the adsorption | suction part 3 and the support part 5, before filling the raw material 16 into the recessed part 15 of the support part 5, the bottom face and side surface of the recessed part 15 are shown. It is recommended to apply a glass paste to. In this case, the coating thickness is preferably 40 to 200 μm. The melting point of the glass powder contained in the glass paste is preferably the same or substantially the same as the glass powder contained in the raw material 16.

また、凹部１５に塗布されたガラスペーストに含まれるガラス粉末は、成形後の熱処理によって溶融し、原料１６中のセラミック粒子と結合する。ガラスペーストに含まれるガラス粉末と、原料中に含まれるガラス粉末は、互いに溶融し合うため、凹部１５と原料の界面に存在するセラミック粒子がガラスによって強固に結合される。なお、熱処理中に、ガラスが成形体内を大きく移動することはほとんどないため、ガラスの濃度は、熱処理後も均一である。 Further, the glass powder contained in the glass paste applied to the recess 15 is melted by the heat treatment after molding and is combined with the ceramic particles in the raw material 16. Since the glass powder contained in the glass paste and the glass powder contained in the raw material are melted together, the ceramic particles present at the interface between the recess 15 and the raw material are firmly bonded by the glass. In addition, since glass hardly moves in a molded body during heat treatment, the concentration of glass is uniform after heat treatment.

上述したように成形体１７の密度ばらつきが殆どなく、熱処理しても体積が実質的に変化しない（成形体１７が実質的に収縮しない）ため、凹部１５と吸着部３との隙間が小さく、両者が強固に密着した構造の吸着用部材１ａを作製することができる。また、ガラスの濃度が熱処理体全体に渡って均一である。 As described above, there is almost no density variation of the molded body 17, and the volume does not change substantially even after heat treatment (the molded body 17 does not substantially contract), so the gap between the recess 15 and the adsorbing portion 3 is small, The adsorbing member 1a having a structure in which both are firmly adhered can be produced. Further, the concentration of the glass is uniform throughout the heat treatment body.

熱処理後、図９（ｅ）に示すように、吸着面が、所定の平面度となるように、研磨加工する。研磨の際に用いる砥石２１は、例えばダイヤモンド砥石でダイヤモンドの粒径の番手は、例えば＃２３０（粒径６８μm）である。研磨しろは、０．５−２ｍｍ程度である。研磨後、支持部５の上面と吸着部３の上面は面一になる。 After the heat treatment, as shown in FIG. 9E, polishing is performed so that the suction surface has a predetermined flatness. The grindstone 21 used for polishing is, for example, a diamond grindstone, and the diamond particle size is, for example, # 230 (particle size 68 μm). The polishing margin is about 0.5-2 mm. After polishing, the upper surface of the support portion 5 and the upper surface of the suction portion 3 are flush with each other.

なお、吸着部３の形状は円板状に限らず、必要に応じて種々の形状にすることができる。また、隔離部１４を形成した形状でも製造可能である。これは、最初に支持部５を準備する段階で、隔壁部１４を設けた支持部５を準備し、隔壁部１４で仕切られた複数の凹部のそれぞれに原料１６を充填すればよい。その後の工程は、上述の製造方法と同じである。 In addition, the shape of the adsorption | suction part 3 is not restricted to disk shape, It can be made into various shapes as needed. Further, it can be manufactured in a shape in which the isolation portion 14 is formed. This can be done by preparing the support part 5 provided with the partition wall part 14 at the stage of preparing the support part 5 first, and filling the raw material 16 in each of the plurality of recesses partitioned by the partition wall part 14. Subsequent steps are the same as those in the above manufacturing method.

また、上述の吸着用部材１ａ，１ｂを用いた真空吸着装置は、上述した吸着用部材１ａ、１ｂを固定ベース（不図示）に固定すると共に、吸引孔６に繋がる排気管（不図示）と、この排気管（不図示）に繋がる真空ポンプ（不図示）を備えている。真空ポンプにより排気管を介して吸引孔６内を吸引すると、吸着部３の連通孔から気体が排気され、対象物Ｗが吸着面２に真空吸着される。真空吸着を開放する場合は、排気管内の圧力が対象物Ｗの上面側と同じ圧力になるように、排気管内に空気を導入して真空吸着力を解放すれば良い。 Further, the vacuum suction device using the above-described suction members 1a and 1b fixes the above-described suction members 1a and 1b to a fixed base (not shown) and an exhaust pipe (not shown) connected to the suction hole 6. And a vacuum pump (not shown) connected to the exhaust pipe (not shown). When the inside of the suction hole 6 is sucked by the vacuum pump through the exhaust pipe, the gas is exhausted from the communication hole of the suction part 3 and the object W is vacuum-sucked on the suction surface 2. When releasing the vacuum suction, air may be introduced into the exhaust pipe to release the vacuum suction force so that the pressure in the exhaust pipe becomes the same pressure as the upper surface side of the object W.

（実施例１）
次のようにして、吸着用部材１ａを作製した。 Example 1
The adsorbing member 1a was produced as follows.

致密質のセラミック焼結体からなる支持部５を複数準備した。支持部５の凹部１５の径は３００ｍｍ、深さ１０ｍｍとした。凹部１５の底面には吸引孔６を形成した。ここで、凹部１５の底面と側面に、シリカを主成分とするガラスペーストを塗布したものと、しないものとをそれぞれ複数準備した。ガラスペーストを塗布したものの塗布厚みは８０μｍである。ガラスペーストに含まれるガラス粉末の融点は、８５０℃である。 A plurality of support portions 5 made of a dense ceramic sintered body were prepared. The diameter of the concave portion 15 of the support portion 5 was 300 mm and the depth was 10 mm. A suction hole 6 was formed in the bottom surface of the recess 15. Here, the thing which applied the glass paste which has a silica as a main component to the bottom face and side surface of the recessed part 15 and the thing which does not prepare each were prepared. The coating thickness of what applied the glass paste is 80 micrometers. The melting point of the glass powder contained in the glass paste is 850 ° C.

凹部１５に原料１６を充填した。この原料１６は次のようにして作製した。平均粒径１５０μｍ、最大粒径２５０μｍのアルミナ粒子からなるセラミック粉末と、シリカを主成分とするガラス粉末と、水とを混合した。アルミナ粉末とガラス粉末の割合は、ガラス粉末の含有量を表１に示したガラスの含有量（質量％）とし、残部をアルミナ粉末の含有量とした。ガラス粉末は、平均粒径が４μｍ、軟化点が８９０℃である。水は、セラミック粉末とガラス粉末の合計１００質量部に対して、表１に示す質量部とした。原料の安息角は、２８〜３８°であった。 The recess 15 was filled with the raw material 16. This raw material 16 was produced as follows. A ceramic powder composed of alumina particles having an average particle diameter of 150 μm and a maximum particle diameter of 250 μm, a glass powder mainly composed of silica, and water were mixed. The ratio of the alumina powder and the glass powder was set such that the glass powder content was the glass content (% by mass) shown in Table 1, and the remainder was the alumina powder content. The glass powder has an average particle size of 4 μm and a softening point of 890 ° C. Water was a mass part shown in Table 1 with respect to a total of 100 parts by mass of the ceramic powder and the glass powder. The angle of repose of the raw material was 28 to 38 °.

なお、原料１６を充填する前に予めアルミナ粉末の粒径の分布を測定し、その標準偏差σを求めた。 In addition, before filling the raw material 16, the particle size distribution of the alumina powder was measured in advance, and the standard deviation σ was obtained.

次に、充填した原料１６を振動しながら加圧し、凹部１５内で原料１６を成形した。具体的には、充填した原料１６に金型１９を押し当てながら０．１ＭＰａの圧力で原料１６を加圧、圧縮し、同時に金型１９を振動させる方法によって成形した。振動方向は、凹部１５の底面に対して垂直な一軸方向とした。振動数は表１に示す通りである。一軸方向の振幅は1ｍｍとした。 Next, the filled raw material 16 was pressurized while being vibrated, and the raw material 16 was molded in the recess 15. Specifically, the raw material 16 was pressed and compressed at a pressure of 0.1 MPa while pressing the mold 19 against the filled raw material 16, and at the same time, the mold 19 was vibrated. The vibration direction was a uniaxial direction perpendicular to the bottom surface of the recess 15. The frequency is as shown in Table 1. The amplitude in the uniaxial direction was 1 mm.

成形後、１１００℃で２時間、熱処理した。 After molding, heat treatment was performed at 1100 ° C. for 2 hours.

熱処理後、得られた吸着面を平坦に研磨加工し、吸着用部材１ａを作製した。研磨の際に用いた砥石は、ダイヤモンド砥石であり、ダイヤモンドの粒径の番手は、＃２３０（６８μ、）である。研磨しろは、１−２ｍｍである。研磨により、支持部５の上面と吸着部３の上面は面一にした。 After the heat treatment, the obtained suction surface was polished flat to produce a suction member 1a. The grindstone used for polishing is a diamond grindstone, and the particle size of the diamond is # 230 (68μ). The polishing margin is 1-2 mm. By polishing, the upper surface of the support portion 5 and the upper surface of the suction portion 3 were flush with each other.

得られた吸着用部材１を用いて評価を行った。また、セラミック粒子１１の粒径の標準偏差は、原料を作製する前にセラミック粉末の粒径分布を求めた。 Evaluation was performed using the obtained member 1 for adsorption. Moreover, the standard deviation of the particle size of the ceramic particle 11 calculated | required the particle size distribution of the ceramic powder before producing a raw material.

セラミック粒子が脱粒しているかどうかは、光学顕微鏡によって吸着面２を観察することにより判断した。光学顕微鏡で観察した視野の面積は、概ね５ｃｍ^２とした。セラミック粒子１１の最大粒径は２５０μｍであるので、この最大粒径よりも大きな径である、３００μｍ以上の凹みが吸着面２に観察された場合、セラミック粒子１１が脱粒したと判断した。脱粒したセラミック粒子の個数を表１に示した。 Whether or not the ceramic particles are crushed was determined by observing the adsorption surface 2 with an optical microscope. The area of the visual field observed with an optical microscope was approximately 5 cm ² . Since the maximum particle size of the ceramic particles 11 is 250 μm, it was determined that the ceramic particles 11 had been shed when a dent of 300 μm or more, which is larger than the maximum particle size, was observed on the adsorption surface 2. Table 1 shows the number of ceramic particles degranulated.

直径３０５ｍｍ、厚み４００μｍのシリコンウェハを、作製した吸着用部材１ａの吸着面２に載せ、真空吸着するかどうか調べた結果、何ら問題なく吸着できた。 A silicon wafer having a diameter of 305 mm and a thickness of 400 μm was placed on the suction surface 2 of the produced suction member 1a and examined as to whether it was vacuum-sucked. As a result, it could be sucked without any problem.

得られた吸着用部材１ａを用いてさらに次の評価を行った。 The following evaluation was further performed using the obtained adsorbing member 1a.

吸着部３と支持部５の隙間の有無は、次のように評価した。 The presence / absence of a gap between the suction part 3 and the support part 5 was evaluated as follows.

まず、支持部５を準備した。そして、Ｓ１／Ｓ０の値を測定した。Ｓ１／Ｓ０が、２／３以下の場合を「隙間の間隔が許容範囲内」、２／３を越えた場を「隙間の間隔が許容範囲外」、と判別した。測定に用いる超音波の周波数は５００ＭＨｚ、プローブ距離は２０ｍｍとした。 First, the support part 5 was prepared. And the value of S1 / S0 was measured. When S1 / S0 was 2/3 or less, it was determined that “the gap interval was within the allowable range”, and the case where it exceeded 2/3 was “the gap interval was outside the allowable range”. The frequency of the ultrasonic wave used for measurement was 500 MHz, and the probe distance was 20 mm.

ガラス濃度の変化率は次のようにして求めた。吸着面２の略中央部を吸着面２に垂直な方向に切断し、さらに切断面をダイヤモンド砥石でソフトに研磨した。この研磨面にＣ（カーボン）を蒸着し、ＥＤＳを用いて各元素を検出した。測定装置としては、日本電子製のＪＥＤ−２３００を用いた。ＥＤＳの測定条件としては倍率１００倍、加速電圧２５ｋＶ、照射電流１ｎＡ、照射有効時間６０秒、デッドタイム１０％とした。ＥＤＳにより、１．７３９ｋｅＶ付近のＳｉのピークのカウント値を、吸着部３の研磨面について測定した。測定位置は、吸着面２の直下、および吸着面２から深さ方向に例えば２ｍｍずつ等間隔の位置とした。ただし、ガラス層９を形成した場合は、ガラス層９の近傍を除く箇所についてＥＤＳにより測定した。ＥＤＳによる各位置のＳｉのカウント値の平均値Ａｖｅ、最大値Ｍａｘ、最小値Ｍｉｎを求めた。ガラス濃度の変化率は、（Ｍａｘ−Ａｖｅ）×１００（％）、（Ａｖｅ−Ｍｉｎ）×１００（％）の値をそれぞれ計算し、両者のうち大きい方の値（％）とした。 The rate of change in glass concentration was determined as follows. A substantially central portion of the suction surface 2 was cut in a direction perpendicular to the suction surface 2, and the cut surface was softly polished with a diamond grindstone. C (carbon) was vapor-deposited on this polished surface, and each element was detected using EDS. As a measuring apparatus, JED-2300 manufactured by JEOL Ltd. was used. The measurement conditions for EDS were 100 times magnification, acceleration voltage 25 kV, irradiation current 1 nA, irradiation effective time 60 seconds, and dead time 10%. The count value of the Si peak in the vicinity of 1.739 keV was measured on the polished surface of the suction portion 3 by EDS. The measurement positions were set at equal intervals, for example, by 2 mm immediately below the suction surface 2 and in the depth direction from the suction surface 2. However, when the glass layer 9 was formed, it measured by EDS about the places except the vicinity of the glass layer 9. The average value Ave, the maximum value Max, and the minimum value Min of the Si count values at each position by EDS were obtained. The change rate of the glass concentration was calculated by calculating the values of (Max-Ave) × 100 (%) and (Ave-Min) × 100 (%), respectively, and taking the larger value (%) of both.

上記の条件で作製、評価した吸着用部材１ａは、吸着部３と支持部５の隙間が小さいと判別された。また、セラミック粒子１１の単位面積当たりの脱粒した粒子の個数は、ゼロまたは少なかった。ガラス濃度の変化率は１４％以内であった。 The suction member 1a produced and evaluated under the above conditions was determined to have a small gap between the suction portion 3 and the support portion 5. Further, the number of particles crushed per unit area of the ceramic particles 11 was zero or small. The change rate of the glass concentration was within 14%.

さらに、吸引孔６側から０．２ＭＰａで水圧をかけて、吸着部３を通して吸着面２から水を放出した。その後、吸着部３が支持部５から剥離していないかを、試料を加工して調べた。 Furthermore, water was discharged from the suction surface 2 through the suction portion 3 by applying water pressure at 0.2 MPa from the suction hole 6 side. Then, the sample was processed and investigated whether the adsorption | suction part 3 was peeled from the support part 5. FIG.

表１には示していないが、試料Ｎｏ．１−１０，１１−１４，１６−１８はガラス層９を形成した試料である。試料Ｎｏ．１０，１５はガラス層を形成しなかった試料である。 Although not shown in Table 1, sample no. Reference numerals 1-10, 11-14, and 16-18 are samples in which the glass layer 9 is formed. Sample No. 10 and 15 are samples in which a glass layer was not formed.

表１より明らかなように、本発明の試料Ｎｏ．１−１８は、脱粒した粒子数がゼロまたは非常に少なかった。また、隙間の間隔は許容範囲内であった。具体的には、Ｓ０／Ｓ１の値は、０．４以下であった。また、ガラス濃度の変化率が１０％以下の試料Ｎｏ．１−１４は、脱粒した粒子数がゼロまたは１個／ｃｍ^２となり、特に脱粒しにくいことがわかった。 As is clear from Table 1, the sample No. 1-18 had zero or very few shed particles. Further, the gap interval was within an allowable range. Specifically, the value of S0 / S1 was 0.4 or less. In addition, sample No. whose glass concentration change rate is 10% or less. In 1-14, the number of shed particles was zero or 1 / cm ² , and it was found that degranulation was particularly difficult.

（実施例２）
実施例１と同じ吸着用部材１ａを作製し、水圧を１．５ＭＰａと大きくして評価した。その結果、試料Ｎｏ．１０，１５は、吸着部３と支持部５の間（吸着面２側）に極微細な亀裂が観察されたが、吸着用部材として使用するには問題のないことがわかった。それ以外の試料は、吸着部３が剥離せず、吸着部３と支持部５の間に亀裂が入ることもなかった。 (Example 2)
The same adsorbing member 1a as in Example 1 was produced and evaluated by increasing the water pressure to 1.5 MPa. As a result, sample no. Nos. 10 and 15 were observed to have a very fine crack between the adsorbing part 3 and the support part 5 (at the adsorbing surface 2 side). In other samples, the adsorbing part 3 was not peeled off, and no cracks were formed between the adsorbing part 3 and the support part 5.

（比較例）
比較例として、次のようにして吸着用部材を作製し、実施例と同じように評価できる項目を評価した。 (Comparative example)
As a comparative example, an adsorbing member was produced as follows, and items that could be evaluated in the same manner as in the examples were evaluated.

支持部の凹部の底面と側面に、実施例で用いたガラスと同じガラスペーストを塗布した。１０００℃に加熱して、ガラスペーストを溶融させ、ガラス層を凹部に形成させた。 The same glass paste as the glass used in the example was applied to the bottom and side surfaces of the concave portion of the support portion. The glass paste was melted by heating to 1000 ° C., and a glass layer was formed in the recess.

その後、支持部の凹部内にスラリーを流し込んだ。スラリーの組成は、アルミナセラミック粉末９０質量％、実施例で用いたガラス粉末１０質量％を含む粉末１００質量部に対して、水を１２０質量部または１６０質量部添加し、混合したものである。スラリーを８０℃で乾燥させ、支持部の凹部に成形体を形成した。その後は、実施例と同様に、熱処理、研磨し、吸着用部材を作製した。表１において、＊を付けた試料Ｎｏ．１９，２０は、上記の製造方法により製造したものである。水の添加量は、試料Ｎｏ．１９が１２０質量部、試料Ｎｏ．２０が１６０質量部である。 Thereafter, the slurry was poured into the concave portion of the support portion. The composition of the slurry is obtained by adding 120 parts by mass or 160 parts by mass of water to 100 parts by mass of powder containing 90% by mass of alumina ceramic powder and 10% by mass of the glass powder used in the examples, and mixing them. The slurry was dried at 80 ° C. to form a molded body in the concave portion of the support portion. Thereafter, in the same manner as in the example, heat treatment and polishing were performed to prepare an adsorbing member. In Table 1, sample No. 19 and 20 are manufactured by the above manufacturing method. The amount of water added was the sample No. 19 is 120 parts by mass, sample no. 20 is 160 parts by mass.

得られた吸着用部材を実施例と同様に評価した結果、吸着部と支持部との間に大きな隙間が観察された。すなわち、吸着部が支持部から剥離していた。この原因は乾燥、熱処理の過程で吸着部が収縮したためと考えられる。特に、吸着部の径方向の収縮率が大きかったため、吸着部の上面の外周部と、支持部との間に特に大きな隙間が観察された。また、表に示すようにセラミック粒子が多数脱粒していた。また、Ｓ１／Ｓ０の値は、試料Ｎｏ．１９は０．９、試料Ｎｏ．２０は０．９５と大きかった。これらの結果から、比較例の吸着用部材は、真空吸着用部材として使用できないことがわかった。 As a result of evaluating the obtained adsorbing member in the same manner as in the example, a large gap was observed between the adsorbing portion and the supporting portion. That is, the adsorption part was peeled off from the support part. This is considered to be because the adsorbing portion contracted during the drying and heat treatment. In particular, since the shrinkage rate in the radial direction of the suction portion was large, a particularly large gap was observed between the outer peripheral portion of the upper surface of the suction portion and the support portion. Further, as shown in the table, many ceramic particles were shed. In addition, the value of S1 / S0 indicates the sample No. 19 is 0.9, sample no. 20 was as large as 0.95. From these results, it was found that the suction member of the comparative example cannot be used as a vacuum suction member.

１：吸着用部材
２，２ａ，２ｂ：吸着面
３，３ａ，３ｂ：吸着部
５：支持部
６ａ，６ｂ：吸引孔
７：取り付け穴
９：ガラス層
１１：セラミック粒子
１２：ガラス
１３：気孔
１４：隔離部
１５：凹部
１６：原料
１７：成形体
１８：成形用治具
１９：金型
２０：振動体
２１：砥石
Ｗ，Ｗ１，Ｗ２：対象物 1: Adsorption member 2, 2a, 2b: Adsorption surface 3, 3a, 3b: Adsorption part 5: Support part 6a, 6b: Suction hole 7: Mounting hole 9: Glass layer 11: Ceramic particles 12: Glass 13: Pore 14 : Isolation part 15: Recess 16: Raw material 17: Molded body 18: Molding jig 19: Mold 20: Vibrating body 21: Grinding stone W, W1, W2: Object

Claims

A method for producing a suction member having a suction part having a suction surface on which an object is sucked, and a support part provided around the suction part,
As the support portion, a preparation step of preparing a ceramic sintered body having a recess,
A raw material filling step of filling the concave portion with a raw material containing glass particles, ceramic particles, and water;
A molding step of forming a molded body by applying pressure while vibrating the raw material;
A heat treatment step of melting the glass particles by bonding the ceramic particles by heating the molded body; and
The manufacturing method of the member for adsorption | suction which has.

2. The method for manufacturing a suction member according to claim 1 , wherein in the molding step, the vibration frequency is 100 to 250 Hz.

In the said raw material filling process, water is 5-10 mass parts with respect to a total of 100 mass parts of ceramic powder and glass powder, The manufacturing method of the member for adsorption | suction of Claim 1 or Claim 2 .

After the preparation step and before the raw material filling step, the manufacturing method of adsorption waist member as claimed in any one of claims 3 having a coating step of coating a glass paste into the recess.

5. The method for manufacturing a suction member according to claim 1, wherein, in the molding step, the pressure of the pressurization is 0.045 to 0.25 Mpa.

In the preparation step, preparing the support portion to which the forming jig having a through hole connected to the recess is attached,
The method for manufacturing an adsorption member according to any one of claims 1 to 5, wherein, in the raw material filling step, the raw material is filled in the concave portion of the support portion to which the forming jig is attached.

In the raw material filling step, the raw material is filled so that a part of the concave portion protrudes from the upper surface of the support,
In the molding step, a molded body partially protruding from the upper surface of the support is formed,
In the heat treatment step, by heating the molded body, an adsorption part partially protruding from the upper surface of the support is formed,
After the heat treatment step, a part of the adsorption part that protrudes from the upper surface of the support is removed.
The manufacturing method of the member for adsorption | suction of Claim 6 which has a removal process to remove.