JP5518446B2 - 機能性液体を含む保持マトリクスの製造方法 - Google Patents
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00126—Static structures not provided for in groups B81C1/00031 - B81C1/00119
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/88—Passivation; Containers; Encapsulations
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Micromachines (AREA)
- Hybrid Cells (AREA)
Description
106 層
110 壁
112 頂点
120 キャビティ
125 多孔性材料
130 液体
132 滴
134 液体
136 液体
145 液体
150 密閉層
152 材料
206 ビーズ
209 液体
406 ゾルゲル材料
506 材料
Claims (11)
- (a)支持体(100)に堆積された少なくとも1つの所定の層に形成された1つ又はそれ以上のキャビティ(120)に多孔性材料(125)を形成する段階であって、前記層に形成された1つ又はそれ以上の壁が、それらの間で前記キャビティ(120)を分離する段階と、
(b)少なくとも1つの液体(130)を用いて少なくとも1つの前記キャビティを充填する段階であって、前記液体が、前記多孔性材料内に捕えられる段階と、
(c)前記キャビティ(120)が密閉されることができる密閉層(150)を形成する段階と、
を備え、
前記密閉層が、前記多孔性材料(125)の表面を覆う、多孔性の保持材料(125)内に捕えられた少なくとも1つの液体(130)で充填された1つ又はそれ以上の密閉されたキャビティ(120)が備えられた装置を製造する方法。 - 前記多孔性材料(125)及び前記キャビティ(120)の壁(110)が同一の層で形成される、請求項1に記載の方法。
- 前記段階(a)が、
ゾルゲル材料などの少なくとも1つ所定の材料の層を堆積する段階であって、前記所定の材料が、ゲルに変態されるのに適し、感光性である段階と、
前記所定の材料の層の第2の部分が光放射から保護される一方で前記所定の材料の層の第1の部分を前記光放射に露出する段階であって、前記第1の部分又は前記第2の部分が、前記キャビティの前記壁を形成する段階と、
前記壁間の前記所定の材料の層の特定の部分に気孔を形成する段階と、
を備える、請求項2に記載の方法。 - 前記キャビティの製造後において、前記段階(a)における前記多孔性材料(125)の形成が、
懸濁液中にビーズなどの粒子を含む液体を少なくとも1つの前記キャビティ(120)に堆積する段階と、
粒子のクラスター、特にビーズのクラスターを形成するために、前記液体を除去する段階と、
を備える、請求項1に記載の方法。 - 前記キャビティの製造後において、前記段階(a)における前記多孔性材料(125)の形成が、
凝固されることを目的とする液体による前記ビーズのクラスターの浸透の段階と、
前記液体の凝固の段階と、
前記粒子の除去の段階と、
をさらに備える、請求項4に記載の方法。 - 前記キャビティの形成後において、前記段階(a)における前記多孔性材料の形成が、
少なくとも1つの前記キャビティ(120)内に、液体がゲルに変態されることができる少なくとも1つの所定の材料と少なくとも1つの溶剤との混合物を堆積する段階と、
前記所定の材料をゲルに変態するために前記混合物を処理する段階と、
前記溶剤を除去する段階と、
を備える、請求項1に記載の方法。 - 前記密閉層(150)が、前記多孔性材料(125)の気孔に浸透される材料で形成される、請求項1から6の何れか一項に記載の方法。
- 前記密閉層(150)が、前記多孔性材料(125)に拡散された重合可能な液体(145)の重合によって形成される、請求項1から7の何れか一項に記載の方法。
- 前記密閉層(150)が、1から500ミリバールの圧力下、又は、一次真空下で形成される、請求項1から6の何れか一項に記載の方法。
- 前記密閉層(150)が、ポリパラキシレン、ポリ(1,3,5−トリビニルトリメチルシクロトリシロキサン)、又は、可視光領域において透過性の少なくとも1つの接着剤、又は、紫外線下において重合可能な少なくとも1つのインクに基づく、請求項1から6の何れか一項に記載の方法。
- 前記多孔性材料(125)が、エアロゲルであり、又は、ポロゲン材料を用いて形成される、請求項1から10の何れか一項に記載の方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0858058A FR2938834B1 (fr) | 2008-11-27 | 2008-11-27 | Procede de realisation d'une matrice de retention et comprenant un liquide fonctionnel |
| FR0858058 | 2008-11-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010128504A JP2010128504A (ja) | 2010-06-10 |
| JP5518446B2 true JP5518446B2 (ja) | 2014-06-11 |
Family
ID=40940391
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009269098A Expired - Fee Related JP5518446B2 (ja) | 2008-11-27 | 2009-11-26 | 機能性液体を含む保持マトリクスの製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8192672B2 (ja) |
| EP (1) | EP2192081B1 (ja) |
| JP (1) | JP5518446B2 (ja) |
| FR (1) | FR2938834B1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2938834B1 (fr) * | 2008-11-27 | 2011-03-04 | Commissariat Energie Atomique | Procede de realisation d'une matrice de retention et comprenant un liquide fonctionnel |
| US8218254B2 (en) * | 2010-08-23 | 2012-07-10 | Gyrus Acmi, Inc. | Solid imaging objective and assembly technique for small scale sensor applications |
| JP5783714B2 (ja) * | 2010-12-17 | 2015-09-24 | キヤノン株式会社 | 光学素子の製造方法 |
| CN105008932B (zh) * | 2013-02-28 | 2017-07-14 | 株式会社理光 | 流体装置和其制造方法、以及流体装置制造用的热转印介质 |
| EP3073765B1 (en) * | 2015-03-25 | 2022-08-17 | Sonion Nederland B.V. | A receiver-in-canal assembly comprising a diaphragm and a cable connection |
| KR102123723B1 (ko) * | 2017-07-06 | 2020-06-26 | 주식회사 엘지화학 | 플렉서블 오프셋 인쇄판 및 이의 제조방법 |
| KR20200124292A (ko) * | 2018-03-01 | 2020-11-02 | 바스프 에스이 | 다공성 재료로 만들어진 바디를 제조하기 위한 몰드 |
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| US5571463A (en) * | 1996-02-09 | 1996-11-05 | Xerox Corporation | Method of fabricating a microporous surface blotter roll |
| ATE208828T1 (de) | 1998-03-06 | 2001-11-15 | Novozymes As | Ein screeningverfahren, basierend auf fluoreszenzpolarisation |
| JP2002348680A (ja) * | 2001-05-22 | 2002-12-04 | Sharp Corp | 金属膜パターンおよびその製造方法 |
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| GB2432966A (en) * | 2005-11-25 | 2007-06-06 | Seiko Epson Corp | Dye-sensitised electrochemical cell |
| TWI326374B (en) * | 2006-01-25 | 2010-06-21 | Ind Tech Res Inst | Manufacturing method of a display panel and sealing layer material thereof |
| US8426846B2 (en) * | 2006-03-30 | 2013-04-23 | Konica Minolta Holdings, Inc. | Organic electroluminescent element, method of manufacturing organic electroluminescent element, lighting device, and display device |
| EP3093898B1 (en) * | 2006-03-30 | 2017-12-13 | Konica Minolta Holdings, Inc. | Organic electroluminescence device and lighting device |
| US7615481B2 (en) * | 2006-11-17 | 2009-11-10 | Ricoh Company, Ltd. | Method of manufacturing multilevel interconnect structure and multilevel interconnect structure |
| FR2934061B1 (fr) * | 2008-07-15 | 2010-10-15 | Commissariat Energie Atomique | Couche d'alignement de cristaux liquides deposee et frottee avant realisation des microstructures |
| FR2938834B1 (fr) * | 2008-11-27 | 2011-03-04 | Commissariat Energie Atomique | Procede de realisation d'une matrice de retention et comprenant un liquide fonctionnel |
-
2008
- 2008-11-27 FR FR0858058A patent/FR2938834B1/fr not_active Expired - Fee Related
-
2009
- 2009-11-19 US US12/622,399 patent/US8192672B2/en not_active Expired - Fee Related
- 2009-11-23 EP EP09176781.4A patent/EP2192081B1/fr not_active Not-in-force
- 2009-11-26 JP JP2009269098A patent/JP5518446B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010128504A (ja) | 2010-06-10 |
| US8192672B2 (en) | 2012-06-05 |
| EP2192081A1 (fr) | 2010-06-02 |
| EP2192081B1 (fr) | 2013-10-16 |
| FR2938834B1 (fr) | 2011-03-04 |
| US20100133727A1 (en) | 2010-06-03 |
| FR2938834A1 (fr) | 2010-05-28 |
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