JP5562088B2 - Exhaust gas treatment equipment - Google Patents

Description

  The present invention relates to an exhaust gas treatment apparatus.

  Exhaust gas discharged from a furnace that performs heat treatment on semiconductor wafers, etc. contains environmentally hazardous substances such as binder volatiles and flux components, and when such exhaust gas is directly discharged to the external environment, Environmental load increases. Therefore, the exhaust gas is subjected to a treatment for removing environmental load substances before being discharged to the external environment.

  For example, as a device for treating exhaust gas discharged from a reflow furnace, a metal pipe connected to a discharge pipe for discharging fumes containing a flux component generated in the furnace, and a heat insulating material covering the outer periphery of the pipe And an electric heater disposed inside the tube body, and the exhaust gas is heated by the electric heater inside the tube body to decompose or burn an object to be removed in the exhaust gas. Has been proposed (see, for example, Patent Document 1). However, since the treatment apparatus described in Patent Document 1 heats the exhaust gas by directly contacting the exhaust gas with an electric heater, unevenness in the heating of the exhaust gas is likely to occur.

  Further, as a device for treating the exhaust gas discharged from the ceramic firing furnace, a gas supply pipe for supplying the exhaust gas to the inside of the heating chamber is arranged on one end side inside the heating chamber, and on the downstream side of the gas supply pipe, There has been proposed a processing apparatus in which a plurality of heaters are arranged at predetermined intervals, and a staying plate for alternately extending the staying time of the exhaust gas in the heating chamber is arranged alternately with the heaters (see, for example, Patent Document 2). . According to this processing apparatus, since the exhaust gas can be sufficiently heated by the heater, the object to be removed in the exhaust gas can be completely burned. However, this treatment apparatus has a drawback that the retention plate is disposed inside the heating chamber, which leads to an increase in the size of the apparatus, and the exhaust gas flow is slow and the treatment efficiency is low.

JP 2000-252621 A JP 7-12322 A

  On the other hand, in order to improve the heating efficiency and reduce the size of the apparatus, as shown in FIG. 5, in the exhaust gas treatment apparatus, a heater 103 is provided on the outer peripheral side of the chamber 102 for heating the exhaust gas, It is conceivable to heat the exhaust gas flowing inside the chamber 102 by heating. However, in the processing apparatus 101 shown in FIG. 5, the chamber 102 is hollow, and the area where the inner peripheral surface of the heated chamber 102 contacts the exhaust gas is small, so that the heating efficiency is low and the exhaust gas is sufficient. There is a possibility that it cannot be heated to a target temperature at which it can be combusted. Further, in such an exhaust gas treatment apparatus, in order to be able to heat to the target temperature, it is necessary to enlarge the heater 103 or increase the longitudinal dimension of the chamber 102, and as a result, the apparatus Leads to an increase in size.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide an exhaust gas treatment device that has high heating efficiency and treatment efficiency of exhaust gas and can be downsized.

The exhaust gas treatment apparatus of the present invention is an exhaust gas treatment apparatus that heats exhaust gas containing an object to be removed, burns and removes the object to be removed, and introduces the exhaust gas into the interior to remove the object in the exhaust gas. A hollow cylindrical chamber body which is provided outside the chamber and has a heating means for heating the chamber, wherein the chamber introduces the exhaust gas from one end side and discharges the exhaust gas from the other end side. And a plurality of tubes that are arranged in the chamber body along the axial direction of the chamber body and promote heat exchange between the exhaust gas and the heating atmosphere in the chamber body, the tube body And a plurality of first tubes having a first outer diameter and a plurality of second tubes having a smaller diameter than the first outer diameter, wherein the plurality of first tubes are circumferential in the chamber body. Along It is arranged, and the plurality of second tubular body in the outer or inner row of the first tubular member is characterized by being arranged along the circumferential direction of the chamber body.

The exhaust gas treatment apparatus of the present invention can increase the surface area of the portion that contacts the exhaust gas and heats the exhaust gas by disposing a plurality of tubes inside the chamber body. For this reason, heat exchange between the exhaust gas and the heated atmosphere in the chamber body is promoted in a state where the chamber body and the plurality of long objects are heated by the heating means. Therefore, according to the exhaust gas treatment apparatus of the present invention, the exhaust gas can be efficiently heated, the object to be removed in the exhaust gas can be burned efficiently, and a large heating means need not be used. Can be achieved.

In the exhaust gas treatment apparatus of the present invention, it is possible to flow the exhaust gas into the gap and both of the plurality of tubes within between adjacent Ri fit tube, it is possible to further increase the surface area in contact with the exhaust gas and the tube is. Therefore , according to the exhaust gas treatment apparatus of the present invention, heat exchange between the exhaust gas and the heating atmosphere in the chamber body can be further promoted, and the heating efficiency of the exhaust gas can be further improved.

  In the exhaust gas treatment apparatus of the present invention, it is preferable that the heating means is a far infrared heater, and the tube is made of ceramics. Since the ceramic tube functions as a good far-infrared radiator that is easily absorbed by organic components such as a binder contained in the exhaust gas, it promotes thermal decomposition of the organic components in the exhaust gas. Therefore, according to the exhaust gas treatment apparatus of the present invention employing such a configuration, the exhaust gas treatment efficiency can be further improved.

In the exhaust gas treatment apparatus of the present invention, the tube body includes a plurality of first tube bodies having a first outer diameter, and a plurality of second tube bodies having a diameter smaller than the first outer diameter. The first tubes are arranged along the circumferential direction of the chamber body, and the plurality of second tubes are arranged along the circumferential direction of the chamber body outside or inside the row of the first tubes. It is . Therefore , since the government body can be regularly arranged in a well-balanced manner inside the chamber body, uneven heating of the exhaust gas hardly occurs.
In addition, by arranging a plurality of first tube bodies and second tube bodies having different outer diameters along the circumferential direction of the chamber body, a tube body that can be accommodated in the chamber body having a predetermined cross-sectional dimension. The number can be increased, thereby increasing the surface area of the tubular body in contact with the exhaust gas.
Therefore , according to the exhaust gas treatment apparatus of the present invention, heat exchange between the exhaust gas and the heating atmosphere in the chamber body can be further promoted, and the heating efficiency of the exhaust gas can be further improved.
Further, inside the front Symbol chamber body, a support shaft disposed along the axis of the chamber body, and a plurality of partition portion attached to the support shaft at a predetermined interval in the axial direction of the support shaft provided al is, the partition portion is composed of a plurality of partition plates mounted at equal intervals radially with respect to the support shaft, said first tubular member, each adjacent partition plates, and the second tubular body is the same number It is preferable that they are arranged one by one. Thereby, the regular and well-balanced arrangement of the tube bodies inside the chamber body can be stably maintained.

  The exhaust gas treatment apparatus of the present invention has high heating efficiency and treatment efficiency of exhaust gas, and can further reduce the size of the apparatus.

It is a section explanatory view of the exhaust gas treatment device concerning one embodiment of the present invention. It is side surface explanatory drawing by the side of exhaust gas introduction of the exhaust gas processing apparatus shown by FIG. It is the sectional view on the AA line of FIG. 1 is a cross-sectional explanatory view of a model machine of an exhaust gas treatment apparatus according to Embodiment 1. FIG. It is sectional explanatory drawing of the waste gas processing apparatus which heats the waste gas which flows through the inside of a tubular chamber.

  Hereinafter, embodiments of the exhaust gas treatment apparatus of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional explanatory view of an exhaust gas treatment apparatus according to an embodiment of the present invention. Note that in this embodiment, an example of an apparatus for treating exhaust gas containing binder volatiles discharged from a baking furnace for baking a semiconductor wafer having an arrangement of a coating film containing a binder and flux on the surface is described. To do.

As shown in FIG. 1, an exhaust gas treatment apparatus 1 includes a chamber 2 that introduces exhaust gas into the interior and burns binder volatiles that are removal targets in the exhaust gas, and a distant unit as a heating unit that heats the chamber 2. An infrared heater 4 is provided.
In the exhaust gas treatment apparatus 1, a far infrared heater 4 is installed so as to cover the outer periphery of the chamber 2. The far-infrared heater 4 heats the exhaust gas introduced into the chamber 2 to about 700 to 800 ° C. to burn and remove the binder volatiles in the exhaust gas.

The chamber 2 includes a hollow cylindrical chamber body 3 that introduces exhaust gas discharged from the firing furnace from one end side (right end in FIG. 1) and discharges it from the other end side. 3 and a plurality of ceramic tube bodies 5 as long objects arranged along the three axial directions.
In this manner, by arranging the plurality of pipe bodies 5 inside the chamber body 3, the surface area where the exhaust gas and the pipe bodies 5 come into contact with each other is increased. Further, by adopting a tubular body as a long object, exhaust gas flows in both the gaps between the adjacent tubular bodies 5 and in each tubular body 5. Thereby, the surface area which exhaust gas and the pipe body 5 contact can be enlarged more. Therefore, heat exchange between the exhaust gas and the heating atmosphere in the chamber body can be promoted, and the heating efficiency of the exhaust gas can be improved.

  In the present embodiment, a ceramic tube is used as the tube 5. Since the ceramic tube functions as a good far-infrared radiator that is easily absorbed by organic components such as a binder contained in the exhaust gas, it promotes thermal decomposition of the organic components in the exhaust gas. Therefore, according to the exhaust gas treatment apparatus 1, the exhaust gas treatment efficiency can be further improved.

  Flange portions 6 a and 6 b are formed on both axial ends of the chamber body 3. A plurality of bolt holes 9 are formed on the end face of the upstream flange portion 6a (see FIG. 2), and an introduction pipe 21 for introducing exhaust gas discharged from the firing furnace into the chamber body 3 is fixed with bolts. Can be attached. Similarly, a plurality of bolt holes (not shown) are also formed in the end face of the downstream flange portion 6b, and the exhaust pipe 31 that exhausts the processing gas processed by the exhaust gas processing apparatus 1 to the external environment is fixed with bolts. Can be attached.

Inside the chamber body 3, a rod-like support shaft 7a arranged along the axis of the chamber body 3 and a plurality of partitions attached to the support shaft 7a at predetermined intervals in the axial direction of the support shaft 7a. And a portion 7b (see FIGS. 1 to 3). Each partition portion 7b is composed of a plurality of partition plates 7c attached to the support shaft 7a radially at equal intervals. Thus, the movement of the tubular body 5 in the circumferential direction is restricted by the partition plate 7c extending radially from the support shaft 7a.
In the space between the adjacent partition plates 7c, one tubular body 5a (first tubular body) and two tubular bodies 5b (second tubular body) having an outer diameter smaller than that of the tubular body 5a are arranged. It is installed. In the circumferential direction of the chamber body 3, the plurality of tube bodies 5 a are disposed at approximately equal intervals, and the plurality of tube bodies 5 b are disposed at approximately equal intervals. Moreover, the tube body 5b is arrange | positioned outside the row | line | column of the tube body 5a arrange | positioned substantially circularly (refer FIG. 2, FIG. 3).
Thus, since the pipe body 5 is regularly arranged in a well-balanced manner inside the chamber body 3, unevenness is less likely to occur during heating of the exhaust gas.

  Inside the chamber body 3, the plurality of tube bodies 5a and 5b are bound together by a wire 7d. As a result, the plurality of tubes 5a, 5b can be prevented from moving outward in the radial direction of the chamber body 3, and the plurality of tubes 5a, 5b and the support shaft 7a are integrated. It can be easily inserted into the chamber body 3 as an object and disposed. In FIG. 2, reference numeral 8 denotes a stopper with which the front end of the integrated body comes into contact when the integrated body is inserted into the chamber body 3 from one end side (left side in FIG. 1) of the chamber body 3.

  The far-infrared heater 4 is formed integrally with the heat insulating material. Thereby, since the heat can be prevented from being dissipated to the outside of the exhaust gas treatment apparatus 1, the heat supplied by the far infrared heater 4 can be efficiently used for heating the exhaust gas. Therefore, the heating efficiency of the exhaust gas can be improved and the energy consumption required for heating the exhaust gas can be reduced.

In the present invention, the exhaust gas may be various exhaust gases such as exhaust gas discharged from a reflow furnace for performing a solder reflow process on a printed circuit board or the like. In the present invention, since a catalyst is not used in the treatment, exhaust gas containing a substance that cannot be treated with the catalyst can be treated.
In the present invention, a rod may be used as a long object instead of the tubular body 5.

  Next, the effect produced by the exhaust gas treatment apparatus of the present invention will be verified using a model chamber.

Example 1
As shown in FIG. 4, five SUS tubes 15 (outer diameter 9.52 mm) are installed inside the steel pipe 13 (steel pipe 1B, outer diameter 34 mm, inner diameter 25.4 mm). Got.

(Comparative Example 1)
The steel pipe 13 (steel pipe 1B, outer diameter 34 mm, inner diameter 25.4 mm) was used as the model chamber of Comparative Example 1.

(Test Example 1)
The model chamber is heated at a heater set temperature of 1000 ° C. while flowing a room temperature gas (20 ° C.) at a flow rate shown in Table 1 into the model chamber from one end side of the model chamber according to the first embodiment. The gas temperature (outlet temperature) at the gas outlet of the chamber was measured. Next, the gas rising temperature [Δt _A (° C.)] was calculated from the outlet temperature and the temperature of the gas before being introduced into the model chamber. Further, the gas temperature (outlet temperature) at the gas outlet of the model chamber was measured in the same manner as described above except that the model chamber of Comparative Example 1 was used instead of the model chamber of Example 1. Next, the gas rising temperature [Δt _B (° C.)] was calculated from the outlet temperature and the temperature of the gas before being introduced into the model chamber. Δt _A / Δt _B was calculated using Δt _A and Δt _B. These results are shown in Table 1.

From the results shown in Table 1, regardless of whether the gas flow rate is 100 L / min, 150 L / min, or 200 L / min, according to the model chamber of Example 1, the outlet temperature is removed in the exhaust gas. It turns out that it is 700 degreeC or more suitable for burning a target object. Further, Δt _A / Δt _B is 1.7 or more regardless of whether the gas flow rate is 100 L / min, 150 L / min, or 200 L / min, and the heating efficiency of the exhaust gas by the model chamber of Example 1 Compared to the heating efficiency of the exhaust gas by the model chamber of Comparative Example 1, it can be seen that it is improved about twice (1.7 times or more).
Therefore, from these results, the exhaust gas is heated to a temperature sufficient to burn the object to be removed in the exhaust gas by providing a plurality of pipe bodies 5 inside the chamber body 3 as in the exhaust gas processing apparatus 1. It can be seen that heating efficiency can be improved.

(Test Example 2)
The model chamber of Example 1 is connected to the downstream of the reflow furnace, and a heater set temperature of 900 ° C. is supplied while flowing a gas of 66.6 ° C. at a flow rate of 1400 L / min from the one end side of the model chamber to the inside of the model chamber. The model chamber was heated under the conditions, and the gas temperature (outlet temperature) at the gas outlet of the model chamber was measured. Next, the gas rising temperature [Δt (° C.)] was calculated from the outlet temperature and the temperature of the gas before being introduced into the model chamber. These results are shown in Table 2.

  From the results shown in Table 2, it can be seen that, according to the model chamber of Example 1, the outlet temperature is 700 ° C. or higher suitable for burning the removal target in the exhaust gas. Therefore, the exhaust gas can be heated to a temperature sufficient to burn the object to be removed in the exhaust gas by providing a plurality of pipe bodies 5 inside the chamber body 3 as in the exhaust gas processing apparatus 1. Recognize. Further, since Δt is 652.5 ° C. under the heater set temperature of 900 ° C., the model of Example 1 in which a plurality of pipe bodies 5 are provided inside the chamber body 3 as in the exhaust gas treatment apparatus 1. It can be seen that the chamber is excellent in heating efficiency.

The exhaust gas treatment apparatus of the present invention is not limited to the above-described embodiment, and various modifications can be made.
For example, in the above-described embodiment, a ceramic tube is used as the tube disposed inside the chamber, but a tube made of SUS310S or Inconel (trade name) can also be used.
In the above-described embodiment, two types of pipes having different pipe diameters are used. However, three or more types of pipes can be used, or only one type of pipe can be used. .
Furthermore, in the above-described embodiment, the large-diameter first tubular body is disposed on the inner side and the small-diameter second tubular body is disposed on the outer side, but this may be reversed.
Further, the number of tubes and the number of partition plates in each partition can be appropriately selected according to the inner diameter of the chamber, the outer diameter of the tube, and the like, and are not limited to the above-described embodiments.

DESCRIPTION OF SYMBOLS 1 Exhaust gas processing apparatus 2 Chamber 3 Chamber main body 4 Heating means (far infrared heater)
5 Long objects (tubes)
5a Long object (first tube)
5b Long object (second tube)
7a Support shaft 7b Partition 7c Partition plate

Claims (4)

An exhaust gas treatment apparatus that heats exhaust gas containing a removal target and burns and removes the removal target,
A chamber for introducing the exhaust gas into the combustion chamber and burning an object to be removed in the exhaust gas;
A heating means provided outside the chamber and for heating the chamber;
The chamber is
A hollow cylindrical chamber body that introduces the exhaust gas from one end side and discharges it from the other end side;
Inside the chamber main body is arranged along the axial direction of the chamber main body, and has a plurality of tubes that promote heat exchange between the exhaust gas and the heating atmosphere in the chamber main body ,
The tubular body includes a plurality of first tubular bodies having a first outer diameter and a plurality of second tubular bodies having a diameter smaller than the first outer diameter, and the plurality of first tubular bodies are the chamber. An exhaust gas characterized by being disposed along the circumferential direction of the main body and the plurality of second tubes being disposed along the circumferential direction of the chamber body on the outside or inside of the row of the first tubes. Processing equipment. A support shaft disposed along the axial center of the chamber body and a plurality of partition portions attached to the support shaft at predetermined intervals in the axial direction of the support shaft are provided inside the chamber body. Each partition portion is composed of a plurality of partition plates radially attached to the support shaft at equal intervals, and the same number of the first tube bodies and the second tube bodies are arranged between the adjacent partition plates. The exhaust gas treatment apparatus according to claim 1 provided. It said heating means is an exhaust gas processing apparatus according to claim 1 or 2 Ru Oh a far infrared heater. Exhaust gas treatment device according to any one of 3 to the tube body claims 1 Ru ceramic der.

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