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JP5748890B2 - Metal manufacturing method - Google Patents
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JP5748890B2 - Metal manufacturing method - Google Patents

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JP5748890B2
JP5748890B2 JP2014151794A JP2014151794A JP5748890B2 JP 5748890 B2 JP5748890 B2 JP 5748890B2 JP 2014151794 A JP2014151794 A JP 2014151794A JP 2014151794 A JP2014151794 A JP 2014151794A JP 5748890 B2 JP5748890 B2 JP 5748890B2
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additive
concentration
thiourea
electrolytic
tank
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JP2014205922A (en
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文生 橋内
文生 橋内
崇 塩地
崇 塩地
上野 明
明 上野
邦男 渡辺
邦男 渡辺
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Pan Pacific Copper Co Ltd
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Description

本発明は、金属の製造方法に関し、さらに詳しくは、電解精製中の電解液中の添加剤濃度の安定化を図ると共に操業の適切な管理を行うことが可能な金属の製造方法に関する。   The present invention relates to a method for producing a metal, and more particularly to a method for producing a metal capable of stabilizing the additive concentration in an electrolytic solution during electrolytic purification and performing appropriate management of operation.

金属を製造する一つの方法として電解精製があるが、例えば、銅の電解精製を行う場合には、一般的に、電解液中に添加剤が添加される。添加剤は、陰極板における銅の析出状態改善等のために用いられる。例えば、有機物系の添加剤としては、ニカワ、ゼラチン、リグニン(パルプ廃液)などのように保護コロイドを形成するような添加剤と、チオ尿素やアロインのような官能基を有する有機物などが共用される。一般に、析出の際の活性化分極は添加剤によって増加し、分極を大きくすることで均一電着性が向上するので、析出金属は緻密で表面が均一なものを得ることができる。このような添加剤は、電解を続けると次第に消耗していくので時々添加してやる必要がある。これまでは、添加剤は通常1日使用分を溶解槽に投入し、約50℃に保温溶解して操業中の電解液内に添加しており、添加剤の添加、溶解、送液はバッチ運転で行われていた。   One method for producing a metal is electrolytic purification. For example, when performing electrolytic purification of copper, an additive is generally added to the electrolytic solution. The additive is used for improving the deposited state of copper in the cathode plate. For example, organic additives such as glue, gelatin, and lignin (pulp waste liquor) that form protective colloids and organic substances that have functional groups such as thiourea and aloin are commonly used. The In general, the activation polarization at the time of deposition is increased by the additive, and the uniform electrodeposition is improved by increasing the polarization, so that the deposited metal can be dense and have a uniform surface. Since such additives are gradually consumed as electrolysis continues, it is necessary to add them from time to time. Until now, additives are usually put into the dissolution tank for daily use, dissolved at about 50 ° C while keeping warm, and added to the electrolyte during operation. It was done by driving.

電解精製によって電気銅を生産する場合、例えば、チオ尿素は、電気銅表面に付着することによってその効果を発揮するが、チオ尿素に含まれる硫黄分(S分)は電気銅の品質上問題となるため、添加剤の濃度管理は重要な生産ファクターとなっている。また、添加剤を溶解する際に添加剤溶液の温度を上げることで添加剤が分解され、効果が低減してしまうことが知られている。そのため、電気銅の生産効率を上げるために予め分解量を考慮して最適な添加剤濃度となるように調整して操業を行っていた。また、ニカワやゼラチンはタンパク質を主成分としており、酸性・高温の電解液中では分解が進みやすいので同様に予め分解量を考慮して添加量が調整されていた。   When electrolytic copper is produced by electrolytic purification, for example, thiourea exerts its effect by adhering to the surface of electrolytic copper, but the sulfur content (S content) contained in thiourea is a problem in the quality of electrolytic copper. Therefore, additive concentration control is an important production factor. Further, it is known that when the additive is dissolved, the additive is decomposed by raising the temperature of the additive solution, and the effect is reduced. For this reason, in order to increase the production efficiency of electrolytic copper, the operation was performed by adjusting the amount of the additive in advance so as to obtain an optimal additive concentration. In addition, glue and gelatin have protein as a main component, and are easily decomposed in an acidic / high-temperature electrolytic solution. Similarly, the amount of addition was adjusted in advance in consideration of the amount of decomposition.

電解液中の添加剤の濃度を測定する方法については、例えば、特許文献1に記載されている。特許文献1はニカワ濃度測定方法を開示しており、電解液試料液を電解セル内で定電流によって電解して電解セルのカソード電位変化率を求め、このカソード電位変化率を予め設定した検量線と比較することによりニカワ濃度を測定し、電解液中のニカワ濃度を迅速に測定できるようにしている。   About the method of measuring the density | concentration of the additive in electrolyte solution, it describes in patent document 1, for example. Patent Document 1 discloses a method for measuring a glue concentration. An electrolytic solution is electrolyzed with a constant current in an electrolytic cell to obtain a cathode potential change rate of the electrolytic cell, and a calibration curve in which the cathode potential change rate is set in advance. In this way, the concentration of glue is measured so that the concentration of glue in the electrolyte can be measured quickly.

特開平10−158881号公報Japanese Patent Laid-Open No. 10-158881

しかし、予め分解量を考慮して電解液に対する添加剤の添加量を多くすると、電解液中の添加剤濃度が上昇し、電圧上昇による電気銅生産時の電力原単位を悪化させるという問題があった。また、添加剤がチオ尿素の場合には、電解液への添加量が増加すると電気銅中のS(硫黄)品位の上昇を招き、製品にならなくなってしまう。そのため、添加剤の分解量を最小限に抑えて操業を行うためには、従来のバッチ運転ではなく、添加剤を連続的に少量ずつ溶解槽に投入して溶解させ、その添加剤溶液を電解液中に連続的に送液する方法が好ましい。   However, if the amount of additive added to the electrolytic solution is increased in consideration of the amount of decomposition in advance, the concentration of the additive in the electrolytic solution increases, and there is a problem that the power consumption during the production of electrolytic copper due to voltage increase is deteriorated. It was. Further, when the additive is thiourea, an increase in the amount added to the electrolytic solution causes an increase in the quality of S (sulfur) in the electrolytic copper, and the product cannot be produced. Therefore, in order to operate with the decomposition amount of the additive minimized, it is not a conventional batch operation, but the additive is continuously poured into the dissolution tank little by little, and the additive solution is electrolyzed. A method in which liquid is continuously fed into the liquid is preferable.

このように、操業中の電解液中の添加剤濃度は製造される金属の品位に大きく影響することから添加剤の濃度管理を適切に行う必要があるが、操業中の電解液の温度の変化や陰極板と陽極板のショートの発生等があった場合には添加剤の分解・消費が促進されて添加剤濃度が大きく変化する。従って、電解液中の添加剤濃度が大きく変化したような場合には、操業中の電解液の温度上昇や陰極板と陽極板のショートの発生等の異常があることが容易に推察される。   In this way, the additive concentration in the electrolyte during operation greatly affects the quality of the metal produced, so it is necessary to appropriately control the concentration of the additive, but the temperature change of the electrolyte during operation When there is a short circuit between the cathode plate and the anode plate, decomposition and consumption of the additive are promoted and the additive concentration changes greatly. Accordingly, when the concentration of the additive in the electrolytic solution changes greatly, it is easily guessed that there is an abnormality such as a rise in the temperature of the electrolytic solution during operation or the occurrence of a short circuit between the cathode plate and the anode plate.

そこで、本発明は、かかる問題点に鑑みなされたもので、操業中の電解槽へ供給するための補充用の電解液に添加する添加剤溶液の添加剤の濃度を適宜調整することにより操業中の電解液中の添加剤濃度の安定化を図ると共に添加剤濃度の大幅な変化があった場合には操業の異常と判断することにより異常箇所の迅速な発見を促して操業の適切な管理を行うことが可能な金属の製造方法を提供することを目的とする。   Therefore, the present invention has been made in view of such problems, and is in operation by appropriately adjusting the concentration of the additive solution in the additive solution to be added to the replenishing electrolytic solution to be supplied to the operating electrolytic cell. In addition to stabilizing the additive concentration in the electrolyte solution, if there is a significant change in the additive concentration, it is judged that the operation is abnormal, thereby promptly finding the abnormal part and appropriately managing the operation. An object of the present invention is to provide a metal production method that can be performed.

上記課題を解決するために請求項1に記載の発明は、電解精製によって金属を製造する方法であって、添加剤が添加された補充用の電解液を電解槽内へ連続的に供給する供給口付近の電解液と、電解槽から抜き出された排液槽内の電解液についてそれぞれ所定時間ごとにサンプリングを行って添加剤の濃度の測定を行い、排液槽内の電解液中の添加剤の濃度が所定の設定値を下回る場合には添加剤を溶解するための溶解槽へ添加剤を供給するフィーダ装置の動作を早くして添加剤の供給量を増やし、供給口付近の電解液中の添加剤の濃度が所定の設定値を上回る場合にはフィーダ装置の動作を遅くして添加剤の供給量を減らし、排液槽内の電解液中の添加剤の濃度及び供給口付近の電解液中の添加剤の濃度が所定の設定値の範囲内である場合にはフィーダ装置からの添加剤の供給量をそのまま維持することにより、電解槽から排液槽へ回収された電解液中の添加剤の濃度が所定の濃度を下回わることなく、且つ、供給口付近における電解液中の添加剤の濃度が所定の濃度の範囲内となるように必要な量の添加剤を連続的に切り出して添加剤溶液の濃度を調整することによって前記添加剤の分解を抑制しつつ前記電解槽へ供給する前の補充用の前記電解液に添加する添加剤の量を調整することを特徴とする金属の製造方法を提供する。 In order to solve the above-mentioned problem, the invention according to claim 1 is a method for producing a metal by electrolytic refining, wherein the replenishing electrolytic solution to which the additive is added is continuously supplied into the electrolytic cell. Sampling the electrolyte solution in the vicinity of the mouth and the electrolyte solution in the drain tank extracted from the electrolyte tank at predetermined intervals to measure the concentration of the additive, and adding the electrolyte solution in the drain tank When the concentration of the agent is lower than the predetermined set value, the feeder device that supplies the additive to the dissolution tank for dissolving the additive is accelerated to increase the supply amount of the additive, and the electrolyte near the supply port If the concentration of the additive exceeds the predetermined set value, the feeder device operation is slowed down to reduce the supply amount of the additive, and the concentration of the additive in the electrolyte in the drainage tank and the vicinity of the supply port When the concentration of the additive in the electrolyte is within the set range It is by maintaining the supply of the additive from the feeder device, without concentration of the additive in the electrolytic solution recovered to the drainage tank from the electrolytic tank Waru falls below a predetermined concentration, and a supply port Suppress the decomposition of the additive by adjusting the concentration of the additive solution by continuously cutting out the required amount of the additive so that the concentration of the additive in the electrolyte in the vicinity is within the predetermined concentration range However, the present invention provides a method for producing a metal, characterized in that the amount of additive added to the electrolyte solution for replenishment before being supplied to the electrolytic cell is adjusted.

上記課題を解決するために請求項2に記載の本発明は、請求項1に記載の金属の製造方法において、供給口付近における電解液中の添加剤の濃度と、排液槽へ回収された電解液中の添加剤濃度との差が所定の範囲内となるように監視し、該添加剤の濃度の差が所定の範囲を逸脱した場合には操業の異常と判断することを特徴とする。 In order to solve the above-mentioned problem, the present invention according to claim 2 is the method for producing a metal according to claim 1, wherein the concentration of the additive in the electrolyte solution in the vicinity of the supply port and the drainage tank are recovered. Monitoring is performed so that the difference between the concentration of the additive in the electrolytic solution is within a predetermined range, and if the difference in the concentration of the additive deviates from the predetermined range, it is determined that the operation is abnormal. .

上記課題を解決するために請求項3に記載の本発明は、請求項1に記載の金属の製造方法において、添加剤がチオ尿素であり、電解槽から排液槽へ回収された電解液中のチオ尿素の濃度が2.0ppmを下回わらないように、供給口付近における電解液中のチオ尿素の濃度が2.5〜5.0ppmの範囲内となるように電解槽へ供給する前の補充用の電解液に添加するチオ尿素の量を調整することを特徴とする。 In order to solve the above problems, the present invention according to claim 3 is the method for producing a metal according to claim 1, wherein the additive is thiourea and the electrolyte is recovered from the electrolytic cell to the drainage cell. Before supplying to the electrolytic cell so that the concentration of thiourea in the electrolyte solution in the vicinity of the supply port is in the range of 2.5 to 5.0 ppm so that the concentration of thiourea in the electrolyte does not fall below 2.0 ppm The amount of thiourea added to the replenishing electrolyte solution is adjusted.

上記課題を解決するために請求項4に記載の本発明は、請求項2に記載の金属の製造方法において、添加剤がチオ尿素であり、供給口付近における電解液中のチオ尿素の濃度と排液槽へ回収された電解液中のチオ尿素の濃度との差が0.5〜3.0ppmとなるように監視し、該添加剤の濃度の差がその範囲を逸脱した場合には操業の異常と判断することを特徴とする。 In order to solve the above problem, the present invention according to claim 4 is the method for producing a metal according to claim 2, wherein the additive is thiourea, and the concentration of thiourea in the electrolyte solution near the supply port the difference between the concentration of thiourea drainage electrolytic solution recovered to the tank monitor so that 0.5~3.0Ppm, operation in the case where the difference between the concentration of the additive was departing from its scope It is characterized that it is judged as abnormal.

上記課題を解決するために請求項5に記載の本発明は、請求項3又は4に記載の金属の製造方法において、電解槽から排液槽へ回収された電解液中のチオ尿素の濃度が2.0ppmに近くなるように電解槽へ供給する前の補充用の電解液に添加するチオ尿素の量を調整することを特徴とする。   In order to solve the above problem, the present invention according to claim 5 is the method for producing a metal according to claim 3 or 4, wherein the concentration of thiourea in the electrolyte recovered from the electrolytic cell to the drainage cell is The amount of thiourea added to the replenishing electrolyte before being supplied to the electrolytic cell is adjusted so as to be close to 2.0 ppm.

本発明に係る金属の製造方法によれば、電解槽から排液槽へ回収された電解液中の添加剤の濃度が所定の濃度を下回わらないように、添加剤が添加された補充用の電解液を電解槽内へ連続的に供給する供給口付近における電解液中の添加剤の濃度が所定の濃度の範囲内となるように電解槽へ供給する前の補充用の電解液に添加する添加剤の量を調整することしたので電解精製中の電解液中に必要な量だけの添加剤を添加することができ、添加剤濃度の安定化を図ることができるという効果がある。 According to the method for producing a metal according to the present invention, for supplementation in which an additive is added so that the concentration of the additive in the electrolytic solution recovered from the electrolytic bath to the drainage bath does not fall below a predetermined concentration. Add to the electrolyte for replenishment before supplying to the electrolytic cell so that the concentration of the additive in the electrolytic solution in the vicinity of the supply port that continuously supplies the electrolytic solution to the electrolytic cell is within the specified concentration range it and was therefore to adjust the amount of additive can be added only additive amount necessary in the electrolytic solution in the electrolytic refining, there is an effect that it is possible to stabilize the additive concentration.

また、供給口付近における電解液中の添加剤の濃度と、排液槽へ回収された電解液中の添加剤濃度との差が所定の範囲内となるように監視し、添加剤の濃度の差が所定の範囲を逸脱した場合には操業の異常と判断することとしたので、電解液の温度上昇や陰極板と陽極板のショートの発生等の異常箇所の迅速な発見を促して操業の適切な管理を行うことができるという効果がある。 Also, monitor the difference between the concentration of the additive in the electrolyte near the supply port and the concentration of the additive in the electrolyte recovered in the drain tank to be within a predetermined range. When the difference deviates from the specified range, it was determined that the operation was abnormal.Therefore, the prompt detection of abnormal points such as a rise in electrolyte temperature and the occurrence of a short between the cathode and anode plates was promoted. There is an effect that appropriate management can be performed.

本発明に係る金属の製造方法を実施するための装置の一実施形態のブロック図である。It is a block diagram of one Embodiment of the apparatus for enforcing the manufacturing method of the metal which concerns on this invention. フィーダ装置を示す正面図である。It is a front view which shows a feeder apparatus. フィーダ装置のスクリューの詳細を示す正面図である。It is a front view which shows the detail of the screw of a feeder apparatus. フィーダ装置のホッパ部の詳細を示す正面図である。It is a front view which shows the detail of the hopper part of a feeder apparatus. 投入シュートの動きを示す説明図である。It is explanatory drawing which shows the motion of a throwing chute. ホッパの構成を示す側面断面図である。It is side surface sectional drawing which shows the structure of a hopper. 本発明に係る金属の製造方法の一実施形態を示すフローチャートである。It is a flowchart which shows one Embodiment of the manufacturing method of the metal which concerns on this invention. 操業の異常を判断するステップを示すフローチャートである。It is a flowchart which shows the step which judges abnormality of operation. チオ尿素の添加量を最小限にするステップを示すフローチャートである。It is a flowchart which shows the step which minimizes the addition amount of thiourea.

初めに、本発明に係る金属の製造方法を実施するための金属の製造装置について説明した後、本発明に係る金属の製造方法の好ましい一実施形態について詳細に説明する。図1は本発明に係る金属の製造方法を実施するための装置の一実施形態のブロック図である。   First, after describing a metal production apparatus for carrying out the metal production method according to the present invention, a preferred embodiment of the metal production method according to the present invention will be described in detail. FIG. 1 is a block diagram of an embodiment of an apparatus for carrying out a metal manufacturing method according to the present invention.

[金属の製造装置の構成]
電解精製によって各種の金属が生産されるが、本実施形態では電解精製によって銅を製造する場合を例にして説明する。初めに、図1に示す銅の製造装置である電解精製装置1は、概略として、電解液10が満たされた電解槽11と、電解槽11から電解液10を定量的に回収する排液槽12と、補充用の新たな電解液10を電解槽11に定量的に供給する供給タンク13と、添加剤の一つである塩酸140を貯留する塩酸槽14と、供給タンク13に供給するための電解液10を貯留する電解液供給槽15を備えると共に、さらに、添加剤溶解装置2及び添加剤溶液供給装置3を備えて構成されている。また、排液槽12へ回収された電解液10を供給タンク13へ移送する配管16aの途中にはポンプ17aが配設され、塩酸槽14に貯えられた塩酸140を供給タンク13に移送する配管16bの途中にはポンプ17bが配設され、電解液供給槽15に貯えられた新鮮な電解液10を供給タンク13に移送する配管16cの途中にはポンプ17cが配設され、供給タンク13内に貯えられた添加剤が添加された電解液10を電解槽11に移送する配管16dにはポンプ17dが配設されている。
[Configuration of metal manufacturing equipment]
Various metals are produced by electrolytic purification. In the present embodiment, a case where copper is produced by electrolytic purification will be described as an example. First, an electrolytic purification apparatus 1 which is a copper manufacturing apparatus shown in FIG. 1 is roughly an electrolytic tank 11 filled with an electrolytic solution 10 and a drainage tank for quantitatively recovering the electrolytic solution 10 from the electrolytic tank 11. 12, a supply tank 13 for quantitatively supplying a new electrolyte solution 10 for replenishment to the electrolytic tank 11, a hydrochloric acid tank 14 for storing hydrochloric acid 140 as one of the additives, and a supply tank 13 The electrolytic solution supply tank 15 for storing the electrolytic solution 10 is provided, and the additive dissolving device 2 and the additive solution supply device 3 are further provided. In addition, a pump 17a is provided in the middle of a pipe 16a for transferring the electrolytic solution 10 collected in the drain tank 12 to the supply tank 13, and a pipe for transferring the hydrochloric acid 140 stored in the hydrochloric acid tank 14 to the supply tank 13. A pump 17b is provided in the middle of 16b, and a pump 17c is provided in the middle of the pipe 16c for transferring the fresh electrolyte 10 stored in the electrolyte supply tank 15 to the supply tank 13. A pump 17d is disposed in the pipe 16d for transferring the electrolytic solution 10 to which the additive stored in the tank is added to the electrolytic cell 11.

電解槽11には、陽極となる粗銅を鋳込んで形成した複数枚のアノード(図示せず)と、電着面に銅を電着させて電気銅を成長させるための複数枚の陰極板5とが所定間隔で交互に浸漬されて配置されている。また、電解槽11には、電解液10が供給タンク13を介して供給されるようになっている。電解液10は電解槽11の長手方向における一方側の端部の下方側に設けられた供給口(図示せず)から供給され、反対側の端部の上方側から回収される。尚、陰極板5は、パーマネントカソード法(PC法)によって電解精製を行う揚合には、ステンレス板が用いられる。そして、添加剤溶解装置2によって電解精製において使用する添加剤の連続的な溶解が行われ、添加剤溶解装置2によって溶解された添加剤溶液200は添加剤溶液供給装置3によって供給タンク13内に貯えられた電解液10中へ連続的に供給される。   In the electrolytic cell 11, a plurality of anodes (not shown) formed by casting crude copper serving as an anode, and a plurality of cathode plates 5 for growing copper by electrodepositing copper on the electrodeposition surface. Are alternately immersed at a predetermined interval. In addition, the electrolytic solution 10 is supplied to the electrolytic cell 11 via a supply tank 13. The electrolytic solution 10 is supplied from a supply port (not shown) provided on the lower side of one end portion in the longitudinal direction of the electrolytic cell 11 and is collected from the upper side of the opposite end portion. As the cathode plate 5, a stainless steel plate is used for electrolysis purification by the permanent cathode method (PC method). The additive dissolving device 2 continuously dissolves the additive used in the electrolytic purification, and the additive solution 200 dissolved by the additive dissolving device 2 is put into the supply tank 13 by the additive solution supplying device 3. It is continuously supplied into the stored electrolyte 10.

[添加剤溶解装置の構成]
添加剤溶解装置2は、添加剤を溶解するための溶解槽23と、添加剤を連続的に溶解槽23に投入するための添加剤供給装置である第一のフィーダ装置22aを備えた第一の溶解装置20aと、他の添加剤を連続的に溶解槽23に投入するための添加剤供給装置である第二のフィーダ装置22bを備えた第二の溶解装置20bと、溶解槽23に溶媒を供給するためにバルブ50a及び配管50bによって構成された溶媒供給装置50と、溶解槽23内に貯えられた添加剤溶液200の液面の高さの変化を測定する液面レベル計測装置27と、溶解槽23内の添加剤溶液200の温度を測定する電子温度計28を備えて構成されている。第一のフィーダ装置22a及び第二のフィーダ装置22b並びに溶媒供給装置50は制御装置30によってその動作が制御されるようになっていると共に、溶解槽23において調整した添加剤溶液200を供給タンク13へ移送する配管24に設けられたポンプ25を備えている。図1において配管16a,16b,24は、それぞれ連結された状態で供給タンク13に至るようになっているが、これに限らず、それぞれ独立して別々に供給タンク13に至るようにしてもよい。尚、本実施形態における溶媒は水である。
[Configuration of additive dissolution apparatus]
The additive dissolution apparatus 2 includes a dissolution tank 23 for dissolving the additive and a first feeder device 22a that is an additive supply apparatus for continuously adding the additive to the dissolution tank 23. Dissolution apparatus 20a, a second dissolution apparatus 20b including a second feeder apparatus 22b which is an additive supply apparatus for continuously adding other additives to the dissolution tank 23, and a solvent in the dissolution tank 23. A solvent supply device 50 constituted by a valve 50a and a pipe 50b, a liquid level measuring device 27 for measuring a change in height of the liquid level of the additive solution 200 stored in the dissolution tank 23, The electronic thermometer 28 for measuring the temperature of the additive solution 200 in the dissolution tank 23 is provided. The operations of the first feeder device 22a, the second feeder device 22b, and the solvent supply device 50 are controlled by the control device 30, and the additive tank 200 adjusted in the dissolution tank 23 is supplied to the supply tank 13. A pump 25 is provided in a pipe 24 for transporting to the pipe. In FIG. 1, the pipes 16 a, 16 b, and 24 reach the supply tank 13 in a connected state. However, the pipes 16 a, 16 b, and 24 are not limited to this, and may separately reach the supply tank 13 independently. . In addition, the solvent in this embodiment is water.

本実施形態では、添加剤としてチオ尿素60aとニカワ60bの2種類を使用すると共に、それらの添加剤を一つの溶解槽23において溶解混合することから添加剤溶解装置2は、第一の溶解装置20aと第二の溶解装置20bの2系統が設けられている。このように、添加剤供給装置2は電解液10中に添加する添加剤の種類に応じて必要な数だけ設ける構成とすることも、或いは、複数の添加剤を予め所定の割合で混合したものを用いることで1つだけ設ける構成とすることもできる。   In the present embodiment, two types of additives, thiourea 60a and glue 60b, are used as additives, and these additives are dissolved and mixed in one dissolution tank 23. Therefore, the additive dissolution apparatus 2 is the first dissolution apparatus. Two systems, 20a and a second dissolving device 20b, are provided. As described above, the additive supply device 2 may be provided in a necessary number according to the type of additive to be added to the electrolytic solution 10 or a mixture of a plurality of additives in a predetermined ratio in advance. It can also be set as the structure which provides only one by using.

溶解槽23の上面は、上面板23bによって開閉可能に密閉されており、上面板23bには軸流ファン23cが取り付けられている。軸流ファン23cによって溶解槽23内の空間部の空気を外部に排気することで溶解槽23の内部で発生した蒸気を外部に排出すると共に、溶解槽23内部の圧力を後述する投入シュート220a,220bを介して連通された第一のフィーダ装置22a及び第二のフィーダ装置22b内の圧力よりも相対的に低くなるようにしている。このように形成することにより、溶解槽23内で発生した蒸気が第一のフィーダ装置22a及び第二のフィーダ装置22b内へ至ることによって添加剤を吸湿させ固化或いは劣化することが防止される。特に、チオ尿素60aは吸湿性が高いので、このように構成することで固化を防止してスムーズに溶解を行うことが可能となる。   The upper surface of the dissolution tank 23 is hermetically sealed by an upper surface plate 23b, and an axial fan 23c is attached to the upper surface plate 23b. By exhausting the air in the space in the dissolution tank 23 to the outside by the axial fan 23c, the steam generated inside the dissolution tank 23 is discharged to the outside, and the pressure inside the dissolution tank 23 is set to a charging chute 220a, which will be described later. The pressure is relatively lower than the pressure in the first feeder device 22a and the second feeder device 22b communicated through 220b. By forming in this way, it is prevented that the vapor | steam generate | occur | produced in the melting tank 23 reaches the 1st feeder apparatus 22a and the 2nd feeder apparatus 22b, and moisture is absorbed and solidified or deteriorated. In particular, since the thiourea 60a has high hygroscopicity, such a configuration makes it possible to prevent solidification and dissolve smoothly.

また、溶解槽23の周囲には、蒸気を通すための配管23aが配設されており、溶解槽23に貯えられた添加剤溶液200を熱交換によって所定の温度、例えば50℃、に保温することができるようになっている。尚、配管23aには温水を流通させて熱交換することによって添加剤溶液を保温する構成としてもよいし、冷水を流通させることで添加剤溶液200を冷却することも可能である。   In addition, a pipe 23a for passing steam is disposed around the dissolution tank 23, and the additive solution 200 stored in the dissolution tank 23 is kept at a predetermined temperature, for example, 50 ° C. by heat exchange. Be able to. In addition, it is good also as a structure which heat-reserves an additive solution by distribute | circulating warm water through the piping 23a, and it is also possible to cool the additive solution 200 by distribute | circulating cold water.

[添加剤供給装置の構成]
添加剤を溶解槽23に供給する第一のフィーダ装置22a及び第二のフィーダ装置22bは、例えば、株式会社クボタ製「CE−W」型「2軸スクリュー式カセットウェイングフィーダ」を用いて構成することができる。ここで、第一のフィーダ装置22aと第二のフィーダ装置22bはほぼ同じ構成を備えているので、以下、第一のフィーダ装置22aに基づいてその構成を説明する。第一のフィーダ装置22aは、ロスインフィーダとも呼ばれ、概略として図2に示すように、基台221と、基台221に設置された駆動部222と、駆動部222により内蔵の後述するスクリューが回転駆動されるスクリュー機構223と、スクリュー機構223の上部に配設されて添加剤をスクリュー機構223に供給するホッパ部224と、スクリュー機構223の端部側に送り出された添加剤を排出する排出筒235を備えると共に、排出された添加剤の量を計測するロードセル26aを備えて構成されている。そして、排出筒235には、溶解槽23への添加剤供給路となる投入シュート220aが連結されている。
[Configuration of additive supply device]
The 1st feeder apparatus 22a and the 2nd feeder apparatus 22b which supply an additive to the dissolution tank 23 are comprised using "CE-W" type | mold "biaxial screw type cassette weighting feeder" by Kubota Corporation, for example. can do. Here, since the 1st feeder apparatus 22a and the 2nd feeder apparatus 22b are provided with the substantially same structure, the structure is demonstrated below based on the 1st feeder apparatus 22a. The first feeder device 22a is also referred to as a loss infeeder. As schematically shown in FIG. 2, the base 221; a drive unit 222 installed on the base 221; The screw mechanism 223 that is rotationally driven, the hopper portion 224 that is disposed above the screw mechanism 223 and supplies the additive to the screw mechanism 223, and the additive that has been fed to the end of the screw mechanism 223 is discharged. A discharge cylinder 235 and a load cell 26a for measuring the amount of the discharged additive are provided. The discharge tube 235 is connected to a charging chute 220 a that serves as an additive supply path to the dissolution tank 23.

図3はスクリュー機構223のスクリューの詳細を示す図である。図3に示すように、スクリュー機構223は、外周に螺旋状のスクリュー羽根226が設けられたスクリュー225a,225bを備え、これらが平行配設された状態で駆動部222により回転可能にしてケースに収納められている。スクリュー225a,225bのスクリュー羽根226は、互いに接触しないようにして僅かな隙間をもって設置されている。これにより、必要な量の添加剤が連続的に切り出されて溶解槽23内に供給される。   FIG. 3 is a diagram showing details of the screw of the screw mechanism 223. As shown in FIG. 3, the screw mechanism 223 includes screws 225a and 225b having spiral screw blades 226 provided on the outer periphery thereof, and these can be rotated by the driving unit 222 in a state where they are arranged in parallel. It is stored. The screw blades 226 of the screws 225a and 225b are installed with a slight gap so as not to contact each other. As a result, a necessary amount of additive is continuously cut out and supplied into the dissolution tank 23.

図4はホッパ部224の詳細を示す分解図である。図4に示すように、ホッパ部224は、スクリュー機構223の上部に設置されると共に添加剤をスクリュー機構223に供給する供給口を下部に有する椀状の供給ホッパ227と、供給ホッパ227内に軸227a,227bによって軸支された状態で配設されると共に駆動部222によって回転駆動されることにより添加剤の固化を防止するために撹拌するアジテータ228と、供給ホッパ227の上面に設置されるガスケット229と、ガスケット229の上面に設置されるクランプ230と、クランプ230の上面に設置される計量ホッパ231と、計量ホッパ231の上面に設置されるガスケット232と、ガスケット232の上面に設置されるクランプ233と、クランプ233の上面に設置される蓋234とを備えて構成されている。添加剤、特にチオ尿素60aは吸湿性が高く固化しやすいので塊化しないようにアジテータ228によって撹拌が行われる。   FIG. 4 is an exploded view showing details of the hopper 224. As shown in FIG. 4, the hopper portion 224 is installed in the upper portion of the screw mechanism 223 and has a bowl-shaped supply hopper 227 having a supply port for supplying an additive to the screw mechanism 223 at the lower portion, and the supply hopper 227. The agitator 228 is disposed in a state where it is supported by the shafts 227a and 227b, and is agitated to prevent the additive from solidifying by being driven to rotate by the driving unit 222, and the upper surface of the supply hopper 227. Gasket 229, clamp 230 installed on the upper surface of gasket 229, weighing hopper 231 installed on the upper surface of clamp 230, gasket 232 installed on the upper surface of weighing hopper 231, and installed on the upper surface of gasket 232 It comprises a clamp 233 and a lid 234 installed on the upper surface of the clamp 233. There. The additive, particularly thiourea 60a, is highly hygroscopic and easily solidified, so that it is stirred by the agitator 228 so as not to clump.

添加剤を溶解槽に案内する投入シュート220aは、途中から斜めに傾斜した傾斜部を備えて形成されると共に、投入シュート220aの排出筒235側の所定箇所には溶媒供給装置50の配管50bから枝分かれした配管50cが連結されて溶媒導入部50dを構成している。投入シュート220aを介して添加剤を溶解槽23へ投入する際に、溶解槽23へ供給する溶媒である水の一部を溶媒導入部50dから供給することによって添加剤を溶解させながら溶解槽23へ投入することができるようになっている。これにより、添加剤が投入シュート220aの内壁に付着した状態となることなくスムーズ且つ確実な添加剤の溶解が行われる。   The charging chute 220a that guides the additive to the dissolution tank is formed with an inclined portion that is slanted from the middle, and from a pipe 50b of the solvent supply device 50 to a predetermined location on the discharge cylinder 235 side of the charging chute 220a. Branched pipes 50c are connected to form a solvent introduction part 50d. When the additive is introduced into the dissolution tank 23 via the introduction chute 220a, the dissolution tank 23 is dissolved while the additive is dissolved by supplying a part of water as a solvent to be supplied to the dissolution tank 23 from the solvent introduction part 50d. Can be thrown into. Thus, the additive is smoothly and reliably dissolved without the additive being attached to the inner wall of the charging chute 220a.

また、投入シュート220aは、図5に示すように、水平方向へ回動可能とされており、溶解槽23とは別に予備の溶解槽29を設けておくことにより2つの溶解槽23,29を適宜変更して使用することができるようになっている。2つの溶解槽23,29を設けることで溶解槽23のメンテナンスや残渣清掃等を行う際に他方の溶解槽29を使用することで操業を停止することなく連続操業が可能となる。尚、本実施形態では溶解槽の設置数を2つとしたがこれに限らず3槽以上設けてもよい。また、本実施形態においては投入シュート220aの回動は手動で行うようになっているが、電動等によって自動で回動するように構成することもできる。   Further, as shown in FIG. 5, the charging chute 220 a can be rotated in the horizontal direction, and by providing a spare dissolution tank 29 separately from the dissolution tank 23, the two dissolution tanks 23 and 29 can be provided. It can be changed and used as appropriate. By providing the two dissolution tanks 23 and 29, when performing the maintenance of the dissolution tank 23, residue cleaning, or the like, continuous operation is possible without stopping the operation by using the other dissolution tank 29. In the present embodiment, the number of dissolution tanks is two, but the number is not limited to this, and three or more tanks may be provided. Further, in this embodiment, the throwing chute 220a is manually rotated, but it may be configured to automatically rotate by electric means or the like.

ロードセル26aは、供給ホッパ227から蓋234に至る10個の部材及びホッパ部224に収容された添加剤の重量の計測を行う。すなわち、供給ホッパ227から蓋234に至る10個の部材の総重量Whを予め計測しておき、この重量Whに対して添加剤の貯留に伴う全重量Wtを計測すれば、(Wt−Wh=Wn)の演算によりホッパ部224内の添加剤の重量Wnを測定することができる。   The load cell 26a measures the weight of 10 members from the supply hopper 227 to the lid 234 and the additive contained in the hopper unit 224. That is, if the total weight Wh of 10 members from the supply hopper 227 to the lid 234 is measured in advance and the total weight Wt associated with the storage of the additive is measured with respect to this weight Wh, (Wt−Wh = By calculating Wn), the weight Wn of the additive in the hopper 224 can be measured.

さらに、第一の溶解装置20a及び第二の溶解装置20bは、それぞれ第一のフィーダ装置22a及び第二のフィーダ装置22bから切り出されて減少した添加剤を補充するための添加剤を貯えておくホッパ21a,21bを備えている。ホッパ21a,21bは、図6に示すように、添加剤を収容する本体211aと、本体211aの内部に設けられた解砕機211bと、解砕機211bを駆動するモータ211dと、添加剤を第一のフィーダ装置22aへ移送するスクリューコンベア211cを備えている。添加剤であるチオ尿素60aは、吸湿性が高く固まりやすいので、第一のフィーダ装置22aへ移送する前に塊化した添加剤を解砕機211bによって粉砕してからスクリューコンベア211cよって移送するようになっている。尚、ホッパ21a,21bへの添加剤の投入は上部に設けられた上面蓋211eを開いて図示しないフレキシブルコンテナに収容された添加剤を開口部から投入することによって行われる。   Further, the first dissolving device 20a and the second dissolving device 20b store additives for replenishing the additive that has been cut out from the first feeder device 22a and the second feeder device 22b, respectively. Hoppers 21a and 21b are provided. As shown in FIG. 6, the hoppers 21 a and 21 b include a main body 211 a that stores the additive, a crusher 211 b that is provided inside the main body 211 a, a motor 211 d that drives the crusher 211 b, and a first additive. The screw conveyor 211c is provided to be transferred to the feeder device 22a. Since the additive thiourea 60a is highly hygroscopic and easily hardened, the agglomerated additive is pulverized by the crusher 211b before being transferred to the first feeder device 22a and then transferred by the screw conveyor 211c. It has become. The addition of the additive to the hoppers 21a and 21b is performed by opening the upper surface cover 211e provided at the upper portion and introducing the additive contained in a flexible container (not shown) from the opening.

[添加剤溶液供給装置の構成]
添加剤溶液供給装置3は、添加剤溶解装置2によって溶解した添加剤溶液200を供給タンク13を介して電解液10中へ連続的に供給する装置であり、添加剤溶液200を溶解槽23から供給タンク13へ移送するポンプ25と、ポンプ25を制御する制御装置30によって構成される。尚、制御装置30は、第一のフィーダ装置22a及び第二のフィーダ装置22bの制御及び塩酸140を供給タンク13へ移送するポンプ17bの制御も行う。制御装置30は、少なくとも中央処理装置と記憶装置(いずれも図示せず)を備えており、予め記憶装置に記憶させたプログラムに基づいて制御装置30へ送られてくる各種の計測データや測定データを使用して中央処理装置で処理することで各種の制御を実行する。
[Configuration of additive solution supply apparatus]
The additive solution supply device 3 is a device that continuously supplies the additive solution 200 dissolved by the additive dissolving device 2 into the electrolytic solution 10 through the supply tank 13. The additive solution 200 is supplied from the dissolution tank 23. The pump 25 is transferred to the supply tank 13, and the control device 30 controls the pump 25. The control device 30 also controls the first feeder device 22 a and the second feeder device 22 b and the pump 17 b that transfers the hydrochloric acid 140 to the supply tank 13. The control device 30 includes at least a central processing unit and a storage device (both not shown), and various measurement data and measurement data sent to the control device 30 based on a program stored in the storage device in advance. Various controls are executed by processing in the central processing unit using.

供給タンク13からの電解槽11内への電解液10の供給は、供給タンク13に貯えられた電解液10を一定の流量で電解槽11内へ連続供給することによって行われるが、供給タンク13には、電解液供給槽15に貯留された新たな電解液10と、電解槽10から一定の流量で抜き取られて排液槽12に回収された電解液10と、溶解槽23において溶解された添加剤溶液200と、塩酸槽14に貯留された塩酸140とがそれぞれ混合されて供給用の電解液10として貯留されている。このように、排液槽12に回収された電解液10は循環使用される。そして、制御装置30は、溶解槽23で調整された添加剤溶液200を供給タンク13内に所定の流量で移送するようにポンプ25を制御する。尚、本実施形態では、供給タンク13から電解槽11に供給される電解液10の流量と電解槽11から排液槽12に回収される電解液10の流量はほぼ同じになるように制御装置30によって制御している。   The supply of the electrolytic solution 10 from the supply tank 13 into the electrolytic cell 11 is performed by continuously supplying the electrolytic solution 10 stored in the supply tank 13 into the electrolytic cell 11 at a constant flow rate. The new electrolytic solution 10 stored in the electrolytic solution supply tank 15, the electrolytic solution 10 extracted from the electrolytic tank 10 at a constant flow rate and collected in the drainage tank 12, and dissolved in the dissolution tank 23. The additive solution 200 and the hydrochloric acid 140 stored in the hydrochloric acid tank 14 are mixed and stored as the electrolyte solution 10 for supply. Thus, the electrolytic solution 10 collected in the drainage tank 12 is circulated and used. Then, the control device 30 controls the pump 25 so as to transfer the additive solution 200 adjusted in the dissolution tank 23 into the supply tank 13 at a predetermined flow rate. In the present embodiment, the control device is configured so that the flow rate of the electrolytic solution 10 supplied from the supply tank 13 to the electrolytic cell 11 and the flow rate of the electrolytic solution 10 collected from the electrolytic cell 11 to the drainage tank 12 are substantially the same. 30 is controlled.

[本発明に係る金属の製造方法]
次に、本発明に係る金属の製造方法の好ましい一実施形態について上述した電解精製装置1の動作と共に説明する。
電解精製による銅の製造において、これまでの操業経験から電解槽11より回収した排液槽12の電解液10中のチオ尿素60aの濃度が2.0ppmを下回ると電着異常現象が発生することを確認すると共に、電解液10中のチオ尿素60aの濃度が高まると電気銅中のイオウ(S)濃度が高くなって製品として問題となるが、供給タンク13から電解槽11へ電解液10を供給する供給口付近における電解液10中のチオ尿素60aの濃度が5.0ppmよりも高くならなければ電気銅中のイオウ(S)濃度は問題とならないことを確認している。また、チオ尿素60aは、電解精製中に消費されて減少することから排液槽12の電解液10中のチオ尿素60aの濃度が2.0ppmを下回らないようにするためには操業中の電解液10中のチオ尿素60aの濃度は少なくとも2.0ppm以上であることが必要となる。そこで、添加剤のうち電解液10中のチオ尿素60aの濃度を一つの指標として、排液槽12の電解液10中のチオ尿素60aの濃度が所定の設定値、本実施形態では2.0ppmを下回わらないように、また、チオ尿素60aが有効に消費されることを考慮して供給タンク13から電解槽11へ電解液10を供給する供給口付近における電解液10中のチオ尿素60aの濃度が2.5〜5.0ppmの範囲となるように添加剤溶液供給装置3によって溶解槽23から供給タンク13への添加剤溶液200の供給を行えば適正な電気銅を得ることができると考えられる。尚、チオ尿素60aの使用量を抑制しつつその効果を有効に発揮させるためには排液槽12の電解液10中のチオ尿素60aの濃度をできるだけ2.0ppmに近くなるように濃度調整することが好ましい。
[Production Method of Metal According to the Present Invention]
Next, a preferred embodiment of the metal production method according to the present invention will be described together with the operation of the electrolytic purification apparatus 1 described above.
In the production of copper by electrolytic refining, an abnormal electrodeposition phenomenon occurs when the concentration of thiourea 60a in the electrolyte 10 of the drainage tank 12 recovered from the electrolytic tank 11 is less than 2.0 ppm based on the experience of operation so far. When the concentration of the thiourea 60a in the electrolytic solution 10 is increased, the concentration of sulfur (S) in the electrolytic copper is increased, which causes a problem as a product. However, the electrolytic solution 10 is transferred from the supply tank 13 to the electrolytic cell 11. It has been confirmed that the sulfur (S) concentration in the electrolytic copper is not a problem unless the concentration of thiourea 60a in the electrolytic solution 10 near the supply port to be supplied is higher than 5.0 ppm. In addition, since thiourea 60a is consumed and reduced during electrolytic purification, in order to prevent the concentration of thiourea 60a in the electrolytic solution 10 of the drainage tank 12 from falling below 2.0 ppm, electrolysis during operation is performed. The concentration of thiourea 60a in the liquid 10 needs to be at least 2.0 ppm. Therefore, the concentration of thiourea 60a in the electrolyte solution 10 of the additive is one index, and the concentration of the thiourea 60a in the electrolyte solution 10 of the drainage tank 12 is a predetermined set value, which is 2.0 ppm in this embodiment. The thiourea 60a in the electrolytic solution 10 in the vicinity of the supply port for supplying the electrolytic solution 10 from the supply tank 13 to the electrolytic cell 11 is taken into consideration so that the thiourea 60a is effectively consumed. If the additive solution 200 is supplied from the dissolution tank 23 to the supply tank 13 by the additive solution supply device 3 so that the concentration of the additive becomes 2.5 to 5.0 ppm, appropriate electrolytic copper can be obtained. it is conceivable that. In order to effectively exhibit the effect while suppressing the amount of thiourea 60a used, the concentration of thiourea 60a in the electrolytic solution 10 in the drainage tank 12 is adjusted to be as close to 2.0 ppm as possible. It is preferable.

そこで、電解液10を供給タンク13から電解槽11内へ供給する供給口付近の電解液10と、電解槽11から抜き出された排液槽12内の電解液10についてそれぞれ所定時間ごとにサンプリングして電解液10中のチオ尿素60aの濃度の測定を行い、その測定データに基づいて制御装置30が第一の溶解装置20aの第一のフィーダ装置22aの動作を制御することにより添加剤溶液200中のチオ尿素60aの濃度の調整を行うこと可能となる。尚、電解液10中のチオ尿素60aの濃度測定は、所定時間ごとに自動的に行い、その測定データを制御装置30に入力するように構成することも、作業者が所定の時間ごとに濃度の測定を行い、その測定データを制御装置30に入力するように構成することもできる。ここで、「供給口付近の電解液」は、本実施形態では電解槽11の長手方向における一方側の端部の下方側に供給口が設けられているのでその上部の液面の電解液10である。   Therefore, the electrolytic solution 10 in the vicinity of the supply port for supplying the electrolytic solution 10 from the supply tank 13 into the electrolytic cell 11 and the electrolytic solution 10 in the drainage tank 12 extracted from the electrolytic cell 11 are sampled at predetermined intervals. Then, the concentration of thiourea 60a in the electrolytic solution 10 is measured, and the control device 30 controls the operation of the first feeder device 22a of the first dissolving device 20a based on the measurement data, thereby adding the additive solution. The concentration of thiourea 60a in 200 can be adjusted. Note that the concentration measurement of the thiourea 60a in the electrolytic solution 10 is automatically performed every predetermined time, and the measurement data can be input to the control device 30. Alternatively, the operator can measure the concentration every predetermined time. The measurement data may be measured and the measurement data may be input to the control device 30. Here, in the present embodiment, the “electrolyte solution near the supply port” is provided with a supply port on the lower side of one end in the longitudinal direction of the electrolytic cell 11. It is.

すなわち、排液槽12からサンプリングした電解液10中のチオ尿素60aの濃度が設定値である2.0ppmを下回るような場合には、制御装置30が第一のフィーダ装置22aのスクリュー機構223の動作速度を早くして排液槽12の電解液中のチオ尿素60aの濃度が2.0ppmを下回らないように溶解槽23へ供給するチオ尿素60aの供給量を増やす。また、供給口付近でサンプリングした電解液10中のチオ尿素60aの濃度が設定値の上限である5.0ppmを上回るような場合には、制御装置30が第一のフィーダ装置22aのスクリュー機構223の動作速度を遅くして供給口付近の電解液10中のチオ尿素60aの濃度が上限である5.0ppmを上回ることなく2.5〜5.0ppmの範囲内となるように溶解槽23へ供給するチオ尿素60aの供給量を減らす。尚、チオ尿素60aの濃度が条件の範囲内である場合には制御装置30は第一のフィーダ装置22aからの供給量をそのまま維持する。チオ尿素60aの溶解槽23への供給量は第一のフィーダ装置22aに設けられたロードセル26aによって計測され、その計測データは制御装置30に送られる。一方、添加するチオ尿素60aの量に対する必要な水は溶媒供給装置50のバルブ50aの開閉を制御装置30によって制御することによって行われ、図示しない流量計により水の供給量が計測されて、その計測データは制御装置30に送られる。従って、それらの計測データから必要なチオ尿素60aの量を算出することができる。一方、溶解槽23内の液面高さの変化が液面レベル測定器27によって計測されており、溶解槽23内の添加剤溶液200の液面が所定の液面高さ以下になった場合には制御装置30が添加剤溶解装置2を動作させて添加剤溶液200の作成を行い、溶解槽23内の添加剤溶液200の液面が所定の液面高さ以上になった場合には制御装置30は添加剤溶解装置2の動作を停止する。   That is, when the concentration of the thiourea 60a in the electrolytic solution 10 sampled from the drainage tank 12 is lower than the set value of 2.0 ppm, the control device 30 controls the screw mechanism 223 of the first feeder device 22a. By increasing the operation speed, the supply amount of thiourea 60a supplied to the dissolution tank 23 is increased so that the concentration of thiourea 60a in the electrolyte in the drainage tank 12 does not fall below 2.0 ppm. Further, when the concentration of thiourea 60a in the electrolytic solution 10 sampled near the supply port exceeds 5.0 ppm which is the upper limit of the set value, the control device 30 causes the screw mechanism 223 of the first feeder device 22a. To the dissolution tank 23 so that the concentration of thiourea 60a in the electrolyte 10 near the supply port is within the range of 2.5 to 5.0 ppm without exceeding the upper limit of 5.0 ppm. The supply amount of thiourea 60a to be supplied is reduced. When the concentration of thiourea 60a is within the range of the conditions, the control device 30 maintains the supply amount from the first feeder device 22a as it is. The supply amount of the thiourea 60 a to the dissolution tank 23 is measured by a load cell 26 a provided in the first feeder device 22 a, and the measurement data is sent to the control device 30. On the other hand, the necessary water for the amount of thiourea 60a to be added is controlled by controlling the opening and closing of the valve 50a of the solvent supply device 50 by the control device 30, and the amount of water supply is measured by a flow meter (not shown). The measurement data is sent to the control device 30. Therefore, the necessary amount of thiourea 60a can be calculated from the measurement data. On the other hand, when the change in the liquid level in the dissolution tank 23 is measured by the liquid level measuring device 27, and the liquid level of the additive solution 200 in the dissolution tank 23 is below a predetermined liquid level. In the case where the control device 30 operates the additive dissolving device 2 to create the additive solution 200, and the liquid level of the additive solution 200 in the dissolving tank 23 becomes equal to or higher than a predetermined liquid level. The control device 30 stops the operation of the additive dissolving device 2.

次に、上述した添加剤の濃度調整について銅の製造方法のフローと共に詳細に説明する。
電解精製装置1の電解槽11には電解液10が満たされており、陽極となるアノード(図示せず)と陰極板5が複数交互に配置されている。そして、供給タンク13には、陰極板5における銅の析出状態改善等のためのチオ尿素60a、ニカワ60b、塩酸140等の添加剤が添加された状態の電解液10が貯えられている。チオ尿素60aとニカワ60bは溶解槽23内で溶解され、添加剤溶液200はポンプ25によって供給タンク13に移送される。陰極板5は図示しない搬入・搬出システムによって所定の数が所定の間隔をもって連続的に電解槽11内に搬入される。そして、アノードと陰極板5の間に所定の直流電圧を印加することによって銅の電解精製が行われ、陰極板5の表面に電気銅が電着する。電気銅が陰極板5の表面に所定の厚みに電着されると、陰極板5は上記搬入・搬出システムによって電解槽11から搬出され、所定の場所へ移送される。その後、新たな陰極板5が搬入システムによって電解槽11に搬入され、再び上述した電解精製処理が実施される。
Next, the concentration adjustment of the additive described above will be described in detail together with the flow of the copper manufacturing method.
The electrolytic bath 11 of the electrolytic purification apparatus 1 is filled with an electrolytic solution 10, and a plurality of anodes (not shown) serving as anodes and cathode plates 5 are alternately arranged. The supply tank 13 stores the electrolyte 10 in a state where additives such as thiourea 60a, glue 60b, and hydrochloric acid 140 for improving the copper deposition state in the cathode plate 5 are added. The thiourea 60a and glue 60b are dissolved in the dissolution tank 23, and the additive solution 200 is transferred to the supply tank 13 by the pump 25. A predetermined number of cathode plates 5 are successively carried into the electrolytic cell 11 at a predetermined interval by a carry-in / carry-out system (not shown). Then, by applying a predetermined DC voltage between the anode and the cathode plate 5, copper is subjected to electrolytic purification, and electrolytic copper is electrodeposited on the surface of the cathode plate 5. When electrolytic copper is electrodeposited on the surface of the cathode plate 5 to a predetermined thickness, the cathode plate 5 is unloaded from the electrolytic cell 11 by the loading / unloading system and transferred to a predetermined location. Thereafter, a new cathode plate 5 is carried into the electrolytic cell 11 by the carry-in system, and the above-described electrolytic purification process is performed again.

図7は本発明に係る金属の製造方法の一実施形態のフローチャートである。図7に示す各ステップは、制御装置30からの指令によって実行される。まず、添加剤であるチオ尿素60aを第一のフィーダ装置22aのホッパ部224に所定量投入すると共に、他の添加剤であるニカワ60bを第二のフィーダ装置22bのホッパ部224に所定量投入する(ステップS1)。添加剤がそれぞれの計量ホッパ231内に貯留された段階でロードセル26a,26bによってそれぞれの計量ホッパ231内の添加剤(チオ尿素60a及びニカワ60b)の計量(計量ホッパ231の重量を含む)が行われ(ステップS2)、その計測値Sは制御装置30に送られる。尚、以下の説明においてはチオ尿素60aを投入する第一のフィーダ装置22aについて説明するが、その動作はニカワ60bを投入する第二のフィーダ装置22bも略同様である。 FIG. 7 is a flowchart of an embodiment of the method for producing a metal according to the present invention. Each step shown in FIG. 7 is executed by a command from the control device 30. First, a predetermined amount of thiourea 60a as an additive is charged into the hopper portion 224 of the first feeder device 22a and a predetermined amount of glue 60b as another additive is charged into the hopper portion 224 of the second feeder device 22b. (Step S1). When the additive is stored in each weighing hopper 231, the weighing (including the weight of the weighing hopper 231) of the additives (thiourea 60 a and glue 60 b) in each weighing hopper 231 is performed by the load cells 26 a and 26 b. We (step S2), and the measured value S 0 is sent to the controller 30. In the following description, the first feeder device 22a for introducing the thiourea 60a will be described, but the operation thereof is substantially the same as that for the second feeder device 22b for introducing the glue 60b.

次いで、制御装置30は、第一のフィーダ装置22aのホッパ部224内に設けられたスクリュー機構223を作動させて所定の流量により添加剤であるチオ尿素60aを投入シュート220aに供給する(ステップS3)。そして、制御装置30は、供給後のチオ尿素60aの重量を計測すると共に、その計測値Sと先の計測値Sとを比較することにより投入シュート220aに供給したチオ尿素60aの重量を算出する。一方、制御装置30は、溶媒供給装置50のバルブ50aを開いて溶解槽23内に溶媒である水の供給を開始する(ステップS4)。このとき、溶媒供給装置50の配管50bから枝分かれした配管50cを介して一部の水が溶媒導入部50dへ導入され、チオ尿素60aを投入シュート220a内において水で溶解しながら溶解槽23への供給が行われる(ステップS5)。そして、制御装置30は、ポンプ25を動作させることにより溶解槽23内で作成・調整された添加剤溶液200を供給タンク13へ移送する(ステップS6)。一方、チオ尿素60a及びニカワ60bを含む添加剤溶液200とは別に、塩酸槽14から添加剤である塩酸140が供給タンク13へ供給される。供給タンク13には、電解液供給槽15から供給された新鮮な電解液10及び電解槽11から排液槽12に連続的に回収された電解液10が貯えられており、排液槽12へ回収された電解液10は循環使用される。このようにして所定量の添加剤が添加された供給タンク13内の電解液10は、ポンプ17dを介して電解槽11内へ連続的に供給される。 Next, the control device 30 operates the screw mechanism 223 provided in the hopper portion 224 of the first feeder device 22a to supply the additive thiourea 60a to the charging chute 220a at a predetermined flow rate (step S3). ). Then, the control unit 30 is adapted to measure the weight of thiourea 60a after supply, the weight of thiourea 60a supplied to the chute 220a by comparing the measured values S 1 and the previous measured value S 0 calculate. On the other hand, the control device 30 opens the valve 50a of the solvent supply device 50 and starts supplying water as a solvent into the dissolution tank 23 (step S4). At this time, a part of the water is introduced into the solvent introduction part 50d through the pipe 50c branched from the pipe 50b of the solvent supply device 50, and the thiourea 60a is dissolved in the charging chute 220a while being dissolved in water. Supply is performed (step S5). And the control apparatus 30 transfers the additive solution 200 created and adjusted in the dissolution tank 23 by operating the pump 25 to the supply tank 13 (step S6). On the other hand, separately from the additive solution 200 containing the thiourea 60a and the glue 60b, hydrochloric acid 140 as an additive is supplied from the hydrochloric acid tank 14 to the supply tank 13. The supply tank 13 stores the fresh electrolyte 10 supplied from the electrolyte supply tank 15 and the electrolyte 10 continuously collected from the electrolyte tank 11 to the drain tank 12. The collected electrolytic solution 10 is recycled. Thus, the electrolytic solution 10 in the supply tank 13 to which the predetermined amount of additive is added is continuously supplied into the electrolytic cell 11 through the pump 17d.

電解槽11から抜き出された排液槽12内の電解液10と、供給タンク13から電解槽11内へ供給する電解液10の供給口付近の電解液10をそれぞれ所定時間ごとにサンプリングし(ステップS7,11)、電解液中のチオ尿素60aの濃度の測定を行う。そして、それぞれ測定されたチオ尿素60aの濃度と設定値(2.0ppm、5.0ppm)と対比を行い(ステップS8、12)、その結果に基づいて制御装置30は第一の溶解装置20aの第一のフィーダ装置22aの動作を制御することにより添加剤槽23へ供給するチオ尿素60aの量を適宜調整する。具体的には、排液槽12からサンプリングした電解液10中のチオ尿素60aの濃度が設定値である2.0ppmを下回るような場合には、制御装置30は、第一のフィーダ装置22aのスクリュー機構223の速度を早くして溶解槽23へのチオ尿素60aの供給量を増やし(ステップS9)、チオ尿素60aの濃度が設定値である2.0ppmを下回らない場合には、制御装置30は、第一のフィーダ装置22aのスクリュー機構223の速度を変更せずに溶解槽23へのチオ尿素60aの供給量を維持する(ステップS10)。一方、制御装置30は、供給口付近でサンプリング(ステップS11)した電解液10中のチオ尿素60aの濃度と設定値(2.5〜5.0ppm)と比較を行い(ステップS12)、測定値が設定値の上限である5.0ppmを上回る場合には、第一のフィーダ装置22aのスクリュー機構223の速度を遅くして溶解槽23へのチオ尿素60aの供給量を減らし(ステップS13)、チオ尿素60aの濃度が設定値である2.5〜5.0ppmの範囲内である場合には第一のフィーダ装置22aのスクリュー機構223の回転速度はそのまま維持してチオ尿素60aの供給及び溶解を継続する(ステップS10)。尚、チオ尿素60aは正常な操業おいてもアノード中の不純物や、電解液10の塩素濃度の変化によって分解されるため、排液槽12からサンプリングした電解液10中のチオ尿素60aの濃度が2.0ppmを下回わらなければ、供給口付近でサンプリングした電解液10中のチオ尿素60aの濃度が2.5ppmを下回ることは起こりにくいことを経験的に見出しており、供給口付近のチオ尿素60aの濃度が5.0ppmを上回るか否かを監視すればよい(ステップS12)。一方、図7のフローチャートにおいて、排液槽12の電解液10中のチオ尿素60aの濃度が2.0ppmを下回り、供給口付近の電解液10中のチオ尿素60aの濃度が5.0ppmを上回ることが発生する場合には、後述するように操業異常と判断されることになる(図8参照)。   The electrolytic solution 10 in the drainage tank 12 extracted from the electrolytic cell 11 and the electrolytic solution 10 in the vicinity of the supply port of the electrolytic solution 10 supplied from the supply tank 13 into the electrolytic cell 11 are sampled every predetermined time ( Steps S7 and 11), the concentration of thiourea 60a in the electrolyte is measured. Then, the measured concentration of thiourea 60a is compared with the set values (2.0 ppm, 5.0 ppm) (steps S8, S12), and based on the result, the control device 30 determines the first dissolving device 20a. By controlling the operation of the first feeder device 22a, the amount of thiourea 60a supplied to the additive tank 23 is appropriately adjusted. Specifically, when the concentration of thiourea 60a in the electrolytic solution 10 sampled from the drainage tank 12 is lower than the set value of 2.0 ppm, the control device 30 controls the first feeder device 22a. When the speed of the screw mechanism 223 is increased to increase the supply amount of the thiourea 60a to the dissolution tank 23 (step S9), and the concentration of the thiourea 60a does not fall below the set value of 2.0 ppm, the control device 30 Maintains the supply amount of the thiourea 60a to the dissolution tank 23 without changing the speed of the screw mechanism 223 of the first feeder device 22a (step S10). On the other hand, the control device 30 compares the concentration of thiourea 60a in the electrolytic solution 10 sampled near the supply port (step S11) with the set value (2.5 to 5.0 ppm) (step S12), and the measured value. When the value exceeds 5.0 ppm which is the upper limit of the set value, the speed of the screw mechanism 223 of the first feeder device 22a is decreased to reduce the supply amount of the thiourea 60a to the dissolution tank 23 (step S13), When the concentration of thiourea 60a is in the range of 2.5 to 5.0 ppm which is a set value, the rotational speed of the screw mechanism 223 of the first feeder device 22a is maintained as it is, and the thiourea 60a is supplied and dissolved. (Step S10). In addition, since the thiourea 60a is decomposed by impurities in the anode and a change in the chlorine concentration of the electrolytic solution 10 even under normal operation, the concentration of the thiourea 60a in the electrolytic solution 10 sampled from the drainage tank 12 is reduced. If it is not less than 2.0 ppm, it has been found empirically that the concentration of thiourea 60a in the electrolyte 10 sampled in the vicinity of the supply port is less than 2.5 ppm. What is necessary is just to monitor whether the density | concentration of the urea 60a exceeds 5.0 ppm (step S12). On the other hand, in the flowchart of FIG. 7, the concentration of thiourea 60a in the electrolytic solution 10 in the drainage tank 12 is less than 2.0 ppm, and the concentration of thiourea 60a in the electrolytic solution 10 near the supply port exceeds 5.0 ppm. If this occurs, it is determined that the operation is abnormal as described later (see FIG. 8).

また、上述したように、これまでの操業経験から電解槽11より回収した排液槽12の電解液10中のチオ尿素60aの濃度が2.0ppmを下回ると電着異常現象が発生することを確認しているが、これは、電解槽11より回収した排液槽12の電解液10中のチオ尿素60aの濃度が2.0ppmを下回らなければ電着異常現象は発生しないことを意味するのであるから、電解槽11より回収した排液槽12の電解液10中のチオ尿素60aの濃度ができるだけ2.0ppmに近い状態に維持することでチオ尿素60aの使用量を最小限に減らすことができる。そこで、図9に示すように、図7におけるステップS1〜S7の工程の後、排液槽12の電解液10中のチオ尿素60aの濃度の測定を行い(ステップS8)、その結果、チオ尿素60aの濃度が2.0ppmよりも高い場合には、溶解槽23へ供給するチオ尿素60aの供給量を減らし(ステップS31)、2.0ppmとなった場合には、チオ尿素60aの供給量を維持する(ステップS32)ことで、チオ尿素60aの使用量を最小限に減らすことが可能となる。   In addition, as described above, when the concentration of thiourea 60a in the electrolyte 10 of the drainage tank 12 recovered from the electrolytic tank 11 is less than 2.0 ppm from the experience of operation so far, an abnormal electrodeposition phenomenon occurs. Although it has been confirmed, this means that the electrodeposition abnormality phenomenon does not occur unless the concentration of thiourea 60a in the electrolyte 10 of the drainage tank 12 collected from the electrolyte tank 11 is less than 2.0 ppm. Therefore, the amount of thiourea 60a used can be reduced to a minimum by maintaining the concentration of thiourea 60a in the electrolyte 10 of the drainage tank 12 collected from the electrolytic tank 11 as close to 2.0 ppm as possible. it can. Therefore, as shown in FIG. 9, after the steps S1 to S7 in FIG. 7, the concentration of the thiourea 60a in the electrolyte 10 of the drainage tank 12 is measured (step S8), and as a result, the thiourea is measured. When the concentration of 60a is higher than 2.0 ppm, the supply amount of thiourea 60a supplied to the dissolution tank 23 is reduced (step S31), and when the concentration becomes 2.0 ppm, the supply amount of thiourea 60a is decreased. By maintaining (step S32), the amount of thiourea 60a used can be reduced to a minimum.

チオ尿素60aの溶解槽23への供給量は、第一のフィーダ装置22aに設けられたロードセル26aによって計測され、その計測データは制御装置30に送られる。一方、添加するチオ尿素60aの量に対する必要な水の供給は制御装置30が溶媒供給装置50のバルブ50aの開閉を制御することによって行われる。具体的には、溶媒供給装置50に設けられた図示しない流量計によって測定される。尚、添加剤の濃度制御は供給する溶媒の量を加減することによっても行うことができる。   The supply amount of the thiourea 60a to the dissolution tank 23 is measured by a load cell 26a provided in the first feeder device 22a, and the measurement data is sent to the control device 30. On the other hand, the necessary water is supplied to the amount of thiourea 60a to be added by the control device 30 controlling the opening and closing of the valve 50a of the solvent supply device 50. Specifically, it is measured by a flow meter (not shown) provided in the solvent supply device 50. The concentration control of the additive can also be performed by adjusting the amount of solvent supplied.

上述のように、制御装置30は、第一のフィーダ装置22aの駆動部222の回転速度を適宜制御しながらスクリュー機構223のスクリュー225a,225bを回転させ、ホッパ部224からのチオ尿素60a排出筒235から投入シュート220aを介して溶解槽23へ供給する。このとき、供給ホッパ227内のアジテータ228によってチオ尿素60aは撹拌されているので供給ホッパ227内での固化が防止される。また、投入シュート220aの上方に設けられた溶媒導入部50dへ配管50cを介して溶解槽23へ供給される溶媒である水の一部が送られ、チオ尿素60aを溶解させながら溶解槽23内へ投入される。このようにチオ尿素60aを素早く水で溶解することで吸湿による固化によって溶解が阻害されることを防止する。また、溶解槽23の配管23aへ蒸気を流通させることによって添加剤溶液の温度を約50℃に保持する。また、第一のフィーダ装置22a及び第二のフィーダ装置22bから切り出されて減少した添加剤は別途貯えられたホッパ21a,21bから順次補充される。そして、ホッパ21a,21bは解砕機211bを備えているのでチオ尿素60aのように吸湿性が高く固まりやすい添加剤であっても適宜粉砕することによりスムーズに供給することができる。   As described above, the control device 30 rotates the screws 225a and 225b of the screw mechanism 223 while appropriately controlling the rotation speed of the drive unit 222 of the first feeder device 22a, and the thiourea 60a discharge cylinder from the hopper unit 224. 235 is supplied to the dissolution tank 23 through the charging chute 220a. At this time, since the thiourea 60a is stirred by the agitator 228 in the supply hopper 227, solidification in the supply hopper 227 is prevented. Further, a part of water as a solvent supplied to the dissolution tank 23 is sent to the solvent introduction part 50d provided above the charging chute 220a via the pipe 50c, and the inside of the dissolution tank 23 is dissolved while dissolving the thiourea 60a. It is thrown into. Thus, by dissolving thiourea 60a with water quickly, dissolution is prevented from being inhibited by solidification due to moisture absorption. Further, the temperature of the additive solution is maintained at about 50 ° C. by circulating the steam through the pipe 23 a of the dissolution tank 23. Moreover, the additive cut out and reduced from the first feeder device 22a and the second feeder device 22b is sequentially replenished from the separately stored hoppers 21a and 21b. And since the hoppers 21a and 21b are equipped with the crusher 211b, even the additive which has high hygroscopicity and is easy to harden like the thiourea 60a can be smoothly supplied by appropriately crushing.

一方、供給口付近における電解液10中のチオ尿素60aの濃度と排液槽12へ回収された電解液10中のチオ尿素60aの濃度との差dを監視することで操業が正常に行われているか否かの判断が行われる。すなわち、図8に示すように、排液槽12からサンプリング(ステップS7)した電解液10中のチオ尿素60aの濃度の測定値(ステップS21)と、供給口付近でサンプリング(ステップS11)した電解液10中のチオ尿素60aの濃度の測定値(ステップS22)との差dを求める(ステップS23)。発明者らは、電解液の温度上昇や陰極版5とアノードとのショートの発生等の異常がある場合には添加剤であるチオ尿素60aが大きく変化することを経験的に見出しており、上記差dが0.5〜3.0ppmの範囲内であれば操業が正常に行われていると判断し(ステップS24)、差dが0.5〜3.0ppmの範囲外であれば操業が正常に行われておらず異常と判断する(ステップS23)。これにより、電解液10の温度上昇や陰極板5とアノードとのショートの発生等の異常箇所の迅速な発見を促して操業の適切な管理を行うことができる。ここで、チオ尿素60aの濃度差dが3.0ppmを超える場合とは、電解液の温度上昇によってチオ尿素60aの分解量が増加した場合や電流効率の増加でチオ尿素60aが急激に減少する場合などで起こりやすく、また濃度差dが0.5ppmを下回る場合とは、電解精製時の電流効率の低下による電着量の低下によりチオ尿素60aの消費量が低下しているか、電解液の温度が通常時より下がり、チオ尿素60aの温度劣化が抑制されている場合などで発生すると考えられる。 On the other hand, the operation is normally performed by monitoring the difference d between the concentration of thiourea 60a in the electrolytic solution 10 near the supply port and the concentration of thiourea 60a in the electrolytic solution 10 collected in the drainage tank 12. A determination is made whether or not. That is, as shown in FIG. 8, the measured value (step S21) of the concentration of thiourea 60a in the electrolytic solution 10 sampled from the drainage tank 12 (step S7) and the electrolysis sampled near the supply port (step S11). A difference d from the measured value of the concentration of thiourea 60a in the liquid 10 (step S22) is obtained (step S23). The inventors have empirically found that the thiourea 60a as an additive greatly changes when there is an abnormality such as a rise in the temperature of the electrolyte or the occurrence of a short circuit between the cathode plate 5 and the anode. If the difference d is in the range of 0.5 to 3.0 ppm, it is determined that the operation is normally performed (step S24). If the difference d is out of the range of 0.5 to 3.0 ppm, the operation is performed. It is determined that the process is not performed normally and is abnormal (step S23). Accordingly, it is possible to promptly find an abnormal part such as a rise in temperature of the electrolytic solution 10 or occurrence of a short circuit between the cathode plate 5 and the anode, thereby appropriately managing the operation. Here, the case where the concentration difference d of the thiourea 60a exceeds 3.0 ppm means that the thiourea 60a sharply decreases when the decomposition amount of the thiourea 60a increases due to the temperature rise of the electrolyte or when the current efficiency increases. When the concentration difference d is less than 0.5 ppm, the consumption of thiourea 60a is reduced due to a decrease in the amount of electrodeposition due to a decrease in current efficiency during electrolytic purification, This is considered to occur when the temperature is lower than normal and temperature degradation of the thiourea 60a is suppressed.

以上のように、本発明の好ましい実施形態について詳述したが、本発明は係る特定の実施形態に限定されるものではなく、特許請求の範囲に記載された本発明の要旨の範囲内において、種々の変形・変更が可能であることはいうまでもない。   As described above, the preferred embodiment of the present invention has been described in detail. However, the present invention is not limited to the specific embodiment, and within the scope of the gist of the present invention described in the claims, Needless to say, various modifications and changes are possible.

1 電解精製装置
2 添加剤溶解装置
3 添加剤溶液供給装置
5 陰極板
10 電解液
11 電解槽
12 排液槽
13 供給タンク
14 塩酸槽
15 電解液供給槽
20a 第一の溶解装置
20b 第二の溶解装置
22a 第一のフィーダ装置
22b 第二のフィーダ装置
23 溶解槽
24 配管
25 ポンプ
26a,26b ロードセル
27 液面レベル測定器
28 電子温度計
30 制御装置
1 溶媒供給装置
DESCRIPTION OF SYMBOLS 1 Electrolytic refining apparatus 2 Additive dissolution apparatus 3 Additive solution supply apparatus 5 Cathode plate 10 Electrolytic solution 11 Electrolytic tank 12 Drainage tank 13 Supply tank 14 Hydrochloric acid tank 15 Electrolytic solution supply tank 20a First dissolution apparatus 20b Second dissolution Device 22a First feeder device 22b Second feeder device 23 Dissolution tank 24 Pipe 25 Pump 26a, 26b Load cell 27 Liquid level meter 28 Electronic thermometer 30 Control device 1 Solvent supply device

Claims (5)

電解精製によって金属を製造する方法であって、
添加剤が添加された補充用の電解液を電解槽内へ連続的に供給する供給口付近の電解液と、前記電解槽から抜き出された排液槽内の電解液についてそれぞれ所定時間ごとにサンプリングを行って添加剤の濃度の測定を行い、
前記排液槽内の電解液中の添加剤の濃度が所定の設定値を下回る場合には前記添加剤を溶解するための溶解槽へ前記添加剤を供給するフィーダ装置の動作を早くして前記添加剤の供給量を増やし、前記供給口付近の電解液中の添加剤の濃度が所定の設定値を上回る場合には前記フィーダ装置の動作を遅くして前記添加剤の供給量を減らし、前記排液槽内の電解液中の添加剤の濃度及び前記供給口付近の電解液中の添加剤の濃度が所定の設定値の範囲内である場合には前記フィーダ装置からの前記添加剤の供給量をそのまま維持することにより、
前記電解槽から前記排液槽へ回収された電解液中の添加剤の濃度が所定の濃度を下回わることなく、且つ、前記供給口付近における電解液中の添加剤の濃度が所定の濃度の範囲内となるように必要な量の添加剤を連続的に切り出して添加剤溶液の濃度を調整することによって前記添加剤の分解を抑制しつつ前記電解槽へ供給する前の補充用の前記電解液に添加する添加剤の量を調整することを特徴とする金属の製造方法。
A method of producing a metal by electrolytic purification,
The electrolyte solution in the vicinity of the supply port for continuously supplying the electrolyte solution for replenishment with the additive added to the electrolytic cell, and the electrolyte solution in the drainage tank drawn out from the electrolytic cell, respectively, every predetermined time Sampling to measure the additive concentration,
When the concentration of the additive in the electrolytic solution in the drainage tank is lower than a predetermined set value, the operation of the feeder device that supplies the additive to the dissolution tank for dissolving the additive is accelerated. Increase the supply amount of the additive, if the concentration of the additive in the electrolyte near the supply port exceeds a predetermined set value, the operation of the feeder device is slowed to reduce the supply amount of the additive, Supply of the additive from the feeder device when the concentration of the additive in the electrolyte in the drainage tank and the concentration of the additive in the electrolyte near the supply port are within a predetermined set value range By maintaining the quantity as it is,
The concentration of the additive in the electrolytic solution recovered from the electrolytic bath to the drainage bath does not fall below a predetermined concentration, and the concentration of the additive in the electrolytic solution near the supply port is a predetermined concentration. The replenishment before supplying to the electrolytic cell while suppressing decomposition of the additive by adjusting the concentration of the additive solution by continuously cutting out the necessary amount of additive so as to be in the range of A method for producing a metal, comprising adjusting an amount of an additive added to an electrolytic solution.
請求項1に記載の金属の製造方法において、
前記供給口付近における電解液中の添加剤の濃度と、前記排液槽へ回収された電解液中の添加剤濃度との差が所定の範囲内となるように監視し、該添加剤の濃度の差が前記所定の範囲を逸脱した場合には操業の異常と判断することを特徴とする金属の製造方法。
In the manufacturing method of the metal of Claim 1,
The concentration of the additive in the electrolyte near the supply port and the concentration of the additive in the electrolyte recovered in the drain tank are monitored so that the difference is within a predetermined range. A metal manufacturing method characterized by determining that the operation is abnormal when the difference between the values deviates from the predetermined range.
請求項1に記載の金属の製造方法において、
前記添加剤がチオ尿素であり、
前記電解槽から排液槽へ回収された電解液中のチオ尿素の濃度が2.0ppmを下回わらないように、前記供給口付近における電解液中のチオ尿素の濃度が2.5〜5.0ppmの範囲内となるように前記電解槽へ供給する前の補充用の前記電解液に添加するチオ尿素の量を調整することを特徴とする金属の製造方法。
In the manufacturing method of the metal of Claim 1,
The additive is thiourea;
The concentration of thiourea in the electrolyte solution in the vicinity of the supply port is 2.5-5 so that the concentration of thiourea in the electrolyte solution recovered from the electrolytic cell to the drainage cell does not fall below 2.0 ppm. A method for producing a metal, characterized in that the amount of thiourea added to the replenishing electrolytic solution before being supplied to the electrolytic cell is adjusted to be within a range of 0.0 ppm.
請求項2に記載の金属の製造方法において、
前記添加剤がチオ尿素であり、
前記供給口付近における電解液中のチオ尿素の濃度と前記排液槽へ回収された電解液中のチオ尿素の濃度との差が0.5〜3.0ppmとなるように監視し、該添加剤の濃度の差がその範囲を逸脱した場合には操業の異常と判断することを特徴とする金属の製造方法。
In the manufacturing method of the metal of Claim 2,
The additive is thiourea;
Monitor the difference between the concentration of thiourea in the electrolyte near the supply port and the concentration of thiourea in the electrolyte recovered in the drain tank to be 0.5 to 3.0 ppm, and add method for producing a metal, characterized in that to determine the abnormality of the operation if the difference between the concentration of the agent falls outside its scope.
請求項3又は4に記載の金属の製造方法において、
前記電解槽から排液槽へ回収された電解液中のチオ尿素の濃度が2.0ppmに近くなるように前記電解槽へ供給する前の補充用の前記電解液に添加するチオ尿素の量を調整することを特徴とする金属の製造方法。
In the manufacturing method of the metal of Claim 3 or 4,
The amount of thiourea added to the electrolyte for replenishment before being supplied to the electrolytic cell so that the concentration of thiourea in the electrolytic solution recovered from the electrolytic cell to the drained tank is close to 2.0 ppm. A method for producing a metal, characterized by adjusting.
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