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JP5946252B2 - Purification equipment - Google Patents
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JP5946252B2 - Purification equipment - Google Patents

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JP5946252B2
JP5946252B2 JP2011157661A JP2011157661A JP5946252B2 JP 5946252 B2 JP5946252 B2 JP 5946252B2 JP 2011157661 A JP2011157661 A JP 2011157661A JP 2011157661 A JP2011157661 A JP 2011157661A JP 5946252 B2 JP5946252 B2 JP 5946252B2
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chamber
temperature
condenser
purification
gas
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JP2013022492A (en
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あゆみ 織部
あゆみ 織部
菊地 博
博 菊地
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Ulvac Inc
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Description

本発明は精製装置の技術分野に係り、特に、高純度の物質を得られる精製装置に関する。   The present invention relates to a technical field of a purification apparatus, and more particularly to a purification apparatus capable of obtaining a high-purity substance.

現在では、有機発光ダイオード(OLED:有機EL)は、有機材料の薄膜を積層させて構成しているが、有機薄膜を形成するための有機材料は、化学合成法によって製造されている。
しかし、化学合成の反応は、溶媒中で行われるため、加熱して溶媒を除去しても、化学反応によって得られた有機材料には溶媒が不純物として混入している。
At present, an organic light emitting diode (OLED: organic EL) is formed by laminating thin films of an organic material, and the organic material for forming the organic thin film is manufactured by a chemical synthesis method.
However, since the reaction of chemical synthesis is performed in a solvent, even if the solvent is removed by heating, the solvent is mixed as an impurity in the organic material obtained by the chemical reaction.

また、化学合成の反応は、理論式通りに進行するとは限らず、目的の化学物質以外の化学物質も微量に合成されてしまうという問題がある。
このような有機材料を薄膜にすると、混入している不純物により、発光性能や寿命が低下してしまう。
そのため、化学合成によって得られた有機材料は、一度真空中で精製して用いる必要がある。
Further, the chemical synthesis reaction does not always proceed according to the theoretical formula, and there is a problem that a chemical substance other than the target chemical substance is also synthesized in a very small amount.
When such an organic material is made into a thin film, the light emission performance and the lifetime are deteriorated due to the mixed impurities.
Therefore, the organic material obtained by chemical synthesis needs to be purified and used once in a vacuum.

図3は、その精製に用いる精製装置101を示しており、この精製装置101は、加熱室150を有している。
加熱室150は、細長い形状であり、一端にはガス導入装置123が接続され、接続部分にガス導入装置123からキャリアガスが供給されるように構成されており、他端は真空排気装置170に接続され、真空排気装置170が動作すると、加熱室150内を真空排気できるように構成されている。
FIG. 3 shows a purification apparatus 101 used for the purification, and the purification apparatus 101 has a heating chamber 150.
The heating chamber 150 has an elongated shape, and is configured such that a gas introduction device 123 is connected to one end and a carrier gas is supplied from the gas introduction device 123 to the connection portion, and the other end is connected to the vacuum exhaust device 170. When the evacuation apparatus 170 is connected and operated, the inside of the heating chamber 150 can be evacuated.

加熱室150内には、気化容器115と、凝縮器152と、不純物回収装置159とが、ガス導入装置123に接続された部分の位置から、この順序で配置されている。
加熱室150内を真空排気装置170によって真空排気しながらガス導入装置123によってキャリアガスを導入すると、導入されたキャリアガスは、気化容器115と凝縮器152と不純物回収装置159が配置された位置をその順序で流れ、真空排気される。
In the heating chamber 150, the vaporization container 115, the condenser 152, and the impurity recovery device 159 are arranged in this order from the position of the portion connected to the gas introduction device 123.
When the carrier gas is introduced by the gas introduction device 123 while the inside of the heating chamber 150 is evacuated by the evacuation device 170, the introduced carrier gas moves to the position where the vaporization container 115, the condenser 152, and the impurity recovery device 159 are arranged. It flows in that order and is evacuated.

加熱室150の、気化容器115が位置する部分の外周には、高温加熱装置154が設けられており、凝縮器152が位置する部分と不純物回収装置159が位置する部分の外周には、低温加熱装置155が設けられている。
高温加熱装置154と低温加熱装置155は、それぞれ電源に接続されており、電源から電圧が印加されると、高温加熱装置154は低温加熱装置155よりも高温に昇温する。
A high temperature heating device 154 is provided on the outer periphery of the portion of the heating chamber 150 where the vaporization vessel 115 is located, and low temperature heating is provided on the outer periphery of the portion where the condenser 152 is located and the portion where the impurity recovery device 159 is located. A device 155 is provided.
The high temperature heating device 154 and the low temperature heating device 155 are each connected to a power source, and when a voltage is applied from the power source, the high temperature heating device 154 is heated to a higher temperature than the low temperature heating device 155.

気化容器115の内部には、精製して純度を向上させる精製対象物が配置されており、精製対象物は高温加熱装置154の発熱によって加熱され、気化温度(昇華温度を含む)以上の温度に昇温されて、精製対象物の気体が生成される。
生成された精製対象物の気体は、キャリアガスによって運搬され、凝縮器152が配置された位置に移動する。
Inside the vaporization vessel 115, a purification object that is refined to improve the purity is disposed, and the purification object is heated by the heat generated by the high-temperature heating device 154 to a temperature equal to or higher than the vaporization temperature (including the sublimation temperature). The temperature is raised and a gas to be purified is generated.
The produced gas to be purified is transported by the carrier gas and moves to the position where the condenser 152 is disposed.

凝縮器152は、低温加熱装置155によって、室温よりも高く、精製対象物の昇華温度よりも低い温度に昇温されており、精製対象物の気体は、凝縮器152に接触すると、精製対象物の気体が凝縮器152に析出する。   The condenser 152 is heated to a temperature higher than room temperature and lower than the sublimation temperature of the object to be purified by the low-temperature heating device 155, and when the gas of the object to be purified comes into contact with the condenser 152, Gas is deposited on the condenser 152.

精製対象物に混入している残留溶剤の蒸発温度は、精製対象物が昇華する温度よりも低いが、凝縮器152の温度は、残留溶剤の蒸発温度よりも高温に設定されており、残留溶剤の気体は凝縮器152には凝縮しないようになっている。   The evaporation temperature of the residual solvent mixed in the object to be purified is lower than the temperature at which the object to be purified sublimates, but the temperature of the condenser 152 is set higher than the evaporation temperature of the residual solvent. This gas is not condensed in the condenser 152.

凝縮器152を通過した精製対象物の気体の進行方向には、残留溶剤の蒸発温度よりも低温の不純物回収装置159が配置されており、精製対象物の気体に混入している残留溶剤の気体が接触すると、精製対象物と残留溶剤とが、凝縮器152の内部で凝縮(固体の析出を含む)する。   An impurity recovery device 159 having a temperature lower than the evaporation temperature of the residual solvent is arranged in the traveling direction of the gas of the purification object that has passed through the condenser 152, and the residual solvent gas mixed in the gas of the purification object Contact with each other, the object to be purified and the residual solvent condense inside the condenser 152 (including solid precipitation).

気化容器115内の精製対象物が全部気化され、凝縮器152に精製対象物が析出された後、高温加熱装置154と低温加熱装置155との発熱を終了させ、凝縮器152が所定温度に低下した後、加熱室150の真空排気とキャリアガス供給を停止し、パージガス供給装置158から加熱室150内にパージガスを供給し、大気圧にした後、扉を開け、付着している精製対象物と共に凝縮器152を加熱室150から取り出す。
気化容器115には精製対象物を配置すると共に、加熱室150内に、精製対象物が付着していない凝縮器152を配置し、精製対象物の精製を再開する。
After the purification object in the vaporization vessel 115 is completely vaporized and the purification object is deposited on the condenser 152, the heat generation by the high temperature heating device 154 and the low temperature heating device 155 is terminated, and the condenser 152 is lowered to a predetermined temperature. After that, the evacuation of the heating chamber 150 and the supply of the carrier gas are stopped, the purge gas is supplied from the purge gas supply device 158 into the heating chamber 150, and the pressure is changed to the atmospheric pressure. The condenser 152 is removed from the heating chamber 150.
A purification object is disposed in the vaporization vessel 115, and a condenser 152 to which the purification object is not attached is disposed in the heating chamber 150, and the purification of the purification object is resumed.

特開2003−095992号公報JP 2003-095992 A 特開2005−161251号公報JP-A-2005-161251 特開2007−044592号公報JP 2007-044592 A

しかし、上記精製装置101では、凝縮器152を加熱室から取り出す際の、冷却時間と再加熱時間とが長時間必要で、装置の使用効率が悪い。
また、一回の取り出し作業によって多量の精製対象物が得られるようにするため、加熱室150内に長時間凝縮器152を配置して精製対象物の気体を析出させようとすると、析出した精製対象物のうち、長時間加熱された部分は劣化してしまう。また、多量に析出させると凝縮器152の凝縮部分の温度が変化し純度が下がる。
更に、従来の精製装置101では、精製された精製対象物の純度を向上させることも困難であり、これらの課題を解決する精製装置の実現が望まれている。
However, the purification apparatus 101 requires a long cooling time and reheating time when the condenser 152 is taken out of the heating chamber, and the use efficiency of the apparatus is poor.
In addition, in order to obtain a large amount of a purification object by a single take-out operation, if the condenser 152 is placed in the heating chamber 150 for a long time to deposit the gas of the purification object, the precipitated purification The part heated for a long time among the objects will deteriorate. Moreover, when it precipitates in large quantities, the temperature of the condensation part of the condenser 152 will change, and purity will fall.
Furthermore, in the conventional purification apparatus 101, it is difficult to improve the purity of the purified purification target, and it is desired to realize a purification apparatus that solves these problems.

上記課題を解決するため、本発明は、真空排気可能に構成され、精製対象物が配置される供給室と、前記供給室から前記精製対象物が供給され、真空雰囲気内で前記精製対象物を加熱して前記精製対象物の気体を生成する気化室と、入口側一端が導入バルブを介して前記気化室に接続され、出口側一端が真空排気されながら前記導入バルブが開けられると、前記気化室内で生成された気体である生成気体が内部に導入され、前記生成気体は、前記入口側の一端から、前記出口側の一端に向けて流れるように構成され、並列に配置された複数の細長の凝縮室と、前記凝縮室内に配置され、前記入口側一端と前記出口側一端の間に並んで配置された複数の凝縮器と、前記凝縮室に設けられ、前記入口側一端に近い凝縮器を、遠い凝縮器よりも高温に加熱する加熱装置と、を有し、前記供給室と前記気化室との間には遮断バルブが設けられ、前記供給室と前記気化室の内部雰囲気は、前記遮断バルブが開けられると接続され、閉じられると、分離される精製装置であって、前記供給室には漏斗形状の供給容器が設けられ、前記供給容器の漏斗形状の下部の管状部は前記気化室に挿入され、前記管状部には、周囲にネジ溝が設けられた回転軸が挿入され、前記供給容器に配置された粉体状の前記精製対象物は、前記回転軸の回転によって、前記供給室から前記気化室に前記精製対象物が移動される精製装置である
た、本発明は、前記入口側では、前記精製対象物の気化又は昇華する温度よりも高い温度に加熱される前記凝縮器が複数個配置され、前記出口側では、前記精製対象物が気化又は昇華する温度よりも低い温度に加熱される前記凝縮器が複数個配置され、前記精製対象物が気化又は昇華する温度よりも高い温度の前記凝縮器と、低い温度の前記凝縮器との間には、複数の前記凝縮器が配置された精製装置である。
In order to solve the above-described problems, the present invention is configured to be evacuated and to which a purification target is placed, and the purification target is supplied from the supply chamber, and the purification target is placed in a vacuum atmosphere. When the inlet valve is opened while one end on the inlet side is connected to the vaporizer chamber via an introduction valve and one end on the outlet side is evacuated, the vaporization chamber is heated to generate the gas to be purified. A product gas, which is a gas generated in a room, is introduced into the interior, and the product gas is configured to flow from one end on the inlet side toward one end on the outlet side, and is arranged in parallel. A condensing chamber, a plurality of condensers arranged in the condensing chamber and arranged side by side between the inlet side one end and the outlet side one end, and a condenser provided in the condensing chamber and close to the inlet side one end A higher temperature than the far condenser A heating device for heating, and a shutoff valve is provided between the supply chamber and the vaporization chamber, and the internal atmosphere of the supply chamber and the vaporization chamber is connected when the shutoff valve is opened, A purification device to be separated when closed , wherein the supply chamber is provided with a funnel-shaped supply container, and a funnel-shaped lower tubular portion of the supply container is inserted into the vaporization chamber, The rotary shaft having a screw groove around it is inserted, and the powdery purification object placed in the supply container is rotated from the supply chamber to the vaporization chamber by the rotation of the rotary shaft. It is a purification device to which an object is moved .
Also, the present invention is, in the inlet side, wherein the condenser is heated to a temperature higher than the vaporization or sublimation temperature of the purified target is a plurality of arranged, wherein on the outlet side, the purified target vaporization Alternatively, a plurality of the condensers that are heated to a temperature lower than the sublimation temperature are arranged, and between the condenser having a temperature higher than the temperature at which the purification target is vaporized or sublimated and the condenser having a lower temperature. Is a purification apparatus in which a plurality of the condensers are arranged.

本発明によれば、供給容器内に多量に配置した精製対象物を、複数台の凝縮室を用いて生成することができるので、一台の凝縮室が冷却中でも、他の凝縮室によって精製を行うことができるので、精製対象物の気体の生成を停止させないで済む。
供給室内部を真空雰囲気にすることで精製対象物には水分が付着しないようにすることができる。
また、真空雰囲気中で、精製対象物に水分が付着しない温度に昇温させておくこともできる。
According to the present invention, since a large amount of the purification object arranged in the supply container can be generated using a plurality of condensing chambers, purification can be performed by another condensing chamber even while one condensing chamber is cooled. Therefore, it is not necessary to stop the generation of the gas to be purified.
By making the inside of the supply chamber a vacuum atmosphere, it is possible to prevent moisture from adhering to the purification object.
In addition, the temperature can be raised to a temperature at which moisture does not adhere to the purification target in a vacuum atmosphere.

一方の凝縮室では、精製対象物の析出を終了させ、冷却、取り出し、真空排気、凝縮器の再加熱を行っている間、他方の凝縮室で、精製対象物の析出を行うと、多量の精製対象物を供給容器に配置しても、析出を中断させないで済む。
また、凝縮室に複数個の凝縮器を配置し、凝縮器の温度を細かく設定できるようにすると、得られる精製対象物の純度を高めることができる。
In one condensing chamber, the precipitation of the purification object is terminated, and while the cooling object is cooled, taken out, evacuated, and the condenser is reheated, the purification object is precipitated in the other condensing chamber. Even if the object to be purified is placed in the supply container, the precipitation is not interrupted.
Further, if a plurality of condensers are arranged in the condensing chamber so that the temperature of the condenser can be set finely, the purity of the purification object to be obtained can be increased.

供給容器内の精製対象物は高温に加熱されず、また、気化室には少量の精製対象物しか供給されないので、精製対象物が加熱される時間が短く、また、凝縮室で析出した精製対象物も長時間加熱されないので、精製対象物は劣化しない。   The purification object in the supply container is not heated to a high temperature, and only a small amount of the purification object is supplied to the vaporization chamber, so that the time for which the purification object is heated is short and the purification object deposited in the condensation chamber Since the object is not heated for a long time, the object to be purified does not deteriorate.

本発明の精製装置を説明するための図面BRIEF DESCRIPTION OF THE DRAWINGS FIG. 凝縮器を説明するための図面Drawing for explaining the condenser 従来技術の精製装置を説明するための図面Drawing for explaining a conventional purification apparatus

図1の符号1は、本発明の一例の精製装置を示している。
この精製装置1は、気体生成装置3と凝縮物生成装置5を有しており、気体生成装置3に合成された有機化合物から成る精製対象物16を配置し、精製対象物16の気体を発生させて凝縮物生成装置5に供給すると、凝縮物生成装置5によって気体が固体にされる。
Reference numeral 1 in FIG. 1 represents an example of the purification apparatus of the present invention.
The purification device 1 includes a gas generation device 3 and a condensate generation device 5, and a purification target 16 made of an organic compound synthesized in the gas generation device 3 is arranged to generate a gas of the purification target 16. If it is made to supply to the condensate production | generation apparatus 5, gas will be made into solid by the condensate production | generation apparatus 5. FIG.

凝縮物生成装置5内では、異なる位置に純度が異なって凝縮物が形成されるように構成されており、低純度の凝縮物を除外し、高純度の凝縮物を集めると、気化(本発明では、昇華も含める)させた精製対象物16よりも純度が向上した精製結果物が得られる。   In the condensate production | generation apparatus 5, it is comprised so that a purity may differ in a different position, and when a high purity condensate is collected by excluding a low purity condensate, vaporization (this invention In this case, a purified product having a purity higher than that of the purified object 16 to be sublimated) is obtained.

まず、気体生成装置3を説明すると、気体生成装置3は、多量の精製対象物16が配置される供給室10と、供給室10から精製対象物16が少量ずつ供給される気化室20とを有している。供給室10と気化室20とは、真空槽であり真空排気することができる。供給室10と気化室20との間には遮断バルブ31が設けられており、遮断バルブ31が開けられると内部が接続され、閉じられると、供給室10と気化室20の内部雰囲気は分離されるようになっている。   First, the gas generation device 3 will be described. The gas generation device 3 includes a supply chamber 10 in which a large amount of the purification object 16 is disposed and a vaporization chamber 20 in which the purification object 16 is supplied in small amounts from the supply chamber 10. Have. The supply chamber 10 and the vaporization chamber 20 are vacuum tanks and can be evacuated. A shutoff valve 31 is provided between the supply chamber 10 and the vaporization chamber 20, and the interior is connected when the shutoff valve 31 is opened, and the internal atmosphere of the supply chamber 10 and the vaporization chamber 20 is separated when the shutoff valve 31 is closed. It has become so.

供給室10には漏斗形状の供給容器15が設けられている。
気化室20は供給室10の下方に配置されており、供給容器15の漏斗形状の下端である管状部22は気化室20の内部に挿入されている。
The supply chamber 10 is provided with a funnel-shaped supply container 15.
The vaporization chamber 20 is disposed below the supply chamber 10, and the tubular portion 22, which is the lower end of the funnel shape of the supply container 15, is inserted into the vaporization chamber 20.

気化室20の内部と供給室10の内部は外部とは遮断されており、真空雰囲気にできる状態で、気化室20の内部と供給室10の内部は、供給容器15の漏斗下端部分によって接続されている。   The inside of the vaporizing chamber 20 and the inside of the supply chamber 10 are cut off from the outside, and the inside of the vaporizing chamber 20 and the inside of the supply chamber 10 are connected by a funnel lower end portion of the supply container 15 in a state where a vacuum atmosphere can be formed. ing.

管状部22には、側面に螺旋状のネジ溝14が形成された回転軸13が挿通されている。供給容器15の下部の管状の部分は、回転軸13によって閉塞されており、粉体は漏斗下部の管状の部分を通って落下しない状態である。
この例では、精製対象物16は粉末状の有機化合物であり、回転軸13が挿入された状態で、精製対象物16が供給容器15に配置されている。
A rotating shaft 13 having a spiral thread groove 14 formed on the side surface is inserted into the tubular portion 22. The lower tubular portion of the supply container 15 is closed by the rotating shaft 13, and the powder does not fall through the tubular portion below the funnel.
In this example, the purification object 16 is a powdered organic compound, and the purification object 16 is arranged in the supply container 15 with the rotating shaft 13 inserted.

供給容器15の下部の管状の部分では、回転軸13の側面の溝に粉末の精製対象物16が充填された状態になっており、回転軸13がモータ回転すると、精製対象物16は溝内を通って、管状部22から、気化室20の内部に落下する。   In the lower tubular portion of the supply container 15, the powder purification object 16 is filled in the groove on the side surface of the rotating shaft 13. It passes through the tubular portion 22 and falls into the vaporizing chamber 20.

精製対象物16は、回転軸13の回転量に応じた量だけ落下して、精製対象物16が供給室10から気化室20に落下することで、供給室10から気化室20に精製対象物16が供給される。
気化室20の内部には、容器状の加熱容器21が設けられており、気化室20内に落下する精製対象物16は加熱容器21に供給される。
The purification object 16 drops by an amount corresponding to the rotation amount of the rotary shaft 13, and the purification object 16 falls from the supply chamber 10 to the vaporization chamber 20, whereby the purification object 16 is supplied from the supply chamber 10 to the vaporization chamber 20. 16 is supplied.
A container-like heating container 21 is provided inside the vaporization chamber 20, and the purification target 16 that falls into the vaporization chamber 20 is supplied to the heating container 21.

気化室20内を真空排気すると、加熱容器21内も真空排気されるようになっており、供給容器15内と気化室20内とが真空雰囲気にされた状態で、供給された精製対象物16が、気化室20に設けられた気化用加熱装置24によって加熱されると、加熱容器21の内部で精製対象物16が固体の粉体の状態から気体の状態になり、加熱容器21内に充満する。   When the inside of the vaporizing chamber 20 is evacuated, the inside of the heating vessel 21 is also evacuated, and the purification object 16 supplied is supplied in a state where the inside of the supply vessel 15 and the inside of the vaporizing chamber 20 are in a vacuum atmosphere. However, when heated by the vaporization heating device 24 provided in the vaporization chamber 20, the purification object 16 changes from a solid powder state to a gas state inside the heating container 21, and the heating container 21 is filled. To do.

なお、供給室10に配置された精製対象物16には、不純物が混入しているものとし、気化室20内で生成された気体を生成気体とすると、生成気体は精製対象物の気体に不純物の気体が混入された気体である。   If the purification target 16 disposed in the supply chamber 10 is contaminated with impurities and the gas generated in the vaporization chamber 20 is a generated gas, the generated gas is an impurity in the gas of the purification target. This gas is a mixture of gases.

この例では、供給室10には真空排気装置7が接続されており、その真空排気装置7が動作して供給室10内部は真空排気され、真空雰囲気にされており、供給室10内部の精製対象物16には水分が付着しないようにされている。また、真空雰囲気中で、精製対象物16に水分が付着しない温度に昇温させておくこともできる。   In this example, an evacuation device 7 is connected to the supply chamber 10, and the evacuation device 7 operates to evacuate the interior of the supply chamber 10 to a vacuum atmosphere. Moisture does not adhere to the object 16. Further, the temperature can be raised to a temperature at which moisture does not adhere to the purification object 16 in a vacuum atmosphere.

気化室20の内部は供給室10を介して、真空排気装置7によって真空排気され、また、加熱容器21の内部は、供給容器15を介して真空排気されている。回転軸13の回転により、供給容器15から加熱容器21には、一定の供給速度になるように、少量の精製対象物が継続して供給され、加熱容器21内では、加熱容器21が気化用加熱装置24によって加熱され、継続して精製対象物16の気体が生成されている。   The inside of the vaporizing chamber 20 is evacuated by the vacuum evacuation device 7 through the supply chamber 10, and the inside of the heating vessel 21 is evacuated through the supply vessel 15. By the rotation of the rotating shaft 13, a small amount of the purification object is continuously supplied from the supply container 15 to the heating container 21 so as to reach a constant supply speed. The gas of the purification target 16 is continuously generated by being heated by the heating device 24.

次に、凝縮物生成装置5を説明すると、凝縮物生成装置5は複数の凝縮室50a、50bを有している(ここでは二台)。各凝縮室50a、50bは、細長の筒体53を有しており、筒体53の入口側一端11には、導入バルブ51がそれぞれ設けられている。気化室20内の加熱容器21と各凝縮室50a、50bの導入バルブ51とは、分岐された配管41によって一対多数に接続されており、導入バルブ51を開状態にすると、導入バルブ51を開状態にされた凝縮室50a、50bの筒体53の内部と加熱容器21の内部とが接続される。   Next, the condensate generator 5 will be described. The condensate generator 5 has a plurality of condensing chambers 50a and 50b (two in this case). Each of the condensing chambers 50 a and 50 b has an elongated cylindrical body 53, and an inlet valve 51 is provided at one end 11 on the inlet side of the cylindrical body 53. The heating vessel 21 in the vaporization chamber 20 and the introduction valves 51 of the condensing chambers 50a and 50b are connected to each other by a branched pipe 41. When the introduction valve 51 is opened, the introduction valve 51 is opened. The inside of the cylindrical body 53 of the condensation chambers 50a and 50b brought into the state is connected to the inside of the heating container 21.

各凝縮室50a、50bの筒体53の出口側一端12に、冷却装置56を介して真空排気装置7が接続されている。凝縮室50a、50bは気密に形成されており、導入バルブ51が閉じられた状態で真空排気装置7が動作すると、筒体53の内部は真空排気できるように構成されている。ここでは、各凝縮室50a、50bは真空排気され、筒体53の内部は所定圧力以下の真空雰囲気にされている。
凝縮室50a、50bと供給室10とは、同じ真空排気装置7によって真空排気しても、異なる真空排気装置によって真空排気するようにしてもよい。
The vacuum exhaust device 7 is connected to the outlet side one end 12 of the cylinder 53 of each condensing chamber 50a, 50b via a cooling device 56. The condensation chambers 50a and 50b are formed in an airtight manner, and the inside of the cylinder 53 is configured to be evacuated when the evacuation device 7 is operated with the introduction valve 51 closed. Here, each of the condensing chambers 50a and 50b is evacuated, and the inside of the cylinder 53 is in a vacuum atmosphere at a predetermined pressure or lower.
The condensation chambers 50a and 50b and the supply chamber 10 may be evacuated by the same evacuation device 7 or evacuated by different evacuation devices.

加熱容器21にはキャリアガス供給装置23が接続されており、加熱容器21とキャリアガス供給装置23とを接続する配管26には、供給バルブ25が設けられている。   A carrier gas supply device 23 is connected to the heating container 21, and a supply valve 25 is provided in a pipe 26 that connects the heating container 21 and the carrier gas supply device 23.

各凝縮室50a、50bの導入バルブ51を閉じておき、真空排気装置7によって、各凝縮室50a、50bの筒体53内を真空排気しながら供給バルブ25を開け、加熱容器21とキャリアガス供給装置23とを接続する。   The inlet valve 51 of each condensing chamber 50a, 50b is closed, and the supply valve 25 is opened while the inside of the cylinder 53 of each condensing chamber 50a, 50b is evacuated by the evacuation device 7, and the heating container 21 and carrier gas are supplied. The device 23 is connected.

次に、所望の凝縮室(ここでは50aとする)の導入バルブ51を閉状態から開状態にし、供給室10から気化室20内に精製対象物16を供給すると、気化室20内と凝縮室50aの筒体53内の圧力差により、気化室20で生成された生成気体は、キャリアガスと共に、導入バルブ51が開状態にされた凝縮室50aの筒体53の内部に移動する。   Next, when the introduction valve 51 of the desired condensation chamber (here, 50a) is changed from the closed state to the opened state, and the purification target 16 is supplied from the supply chamber 10 into the vaporization chamber 20, the inside of the vaporization chamber 20 and the condensation chamber are supplied. Due to the pressure difference in the cylinder 53 of 50a, the generated gas generated in the vaporization chamber 20 moves together with the carrier gas into the cylinder 53 of the condensation chamber 50a in which the introduction valve 51 is opened.

この例では、凝縮室50aの筒体53内に導入された生成気体及びキャリアガスは、筒体53内を流れ、冷却装置56を通って真空排気される。
凝縮室50aの筒体53の内部には、生成気体が接触する凝縮器52が、入口側一端11と出口側一端12との間に並んで配置されている。ここでは生成気体及びキャリアガスの流れに沿って、一列に並んで配置されている。
In this example, the generated gas and the carrier gas introduced into the cylinder 53 of the condensing chamber 50 a flow through the cylinder 53 and are evacuated through the cooling device 56.
Inside the cylindrical body 53 of the condensing chamber 50 a, a condenser 52 in contact with the generated gas is arranged side by side between the inlet side one end 11 and the outlet side one end 12. Here, they are arranged in a line along the flow of the product gas and the carrier gas.

筒体53の壁面には、筒体53の長手方向に沿って加熱装置54が設けられており、筒体53の壁と筒体53内に配置された各凝縮器52とは、加熱装置54によって加熱されるようにされている。加熱装置54は、筒体53内の凝縮器52を、導入バルブ51に近い位置の凝縮器52は高温に加熱し、それよりも遠い位置の凝縮器52は近い位置よりも低温に加熱する。   A heating device 54 is provided on the wall surface of the cylindrical body 53 along the longitudinal direction of the cylindrical body 53, and the wall of the cylindrical body 53 and each condenser 52 disposed in the cylindrical body 53 are connected to the heating device 54. It is supposed to be heated by. The heating device 54 heats the condenser 52 in the cylindrical body 53 to a high temperature at the condenser 52 at a position close to the introduction valve 51, and heats the condenser 52 at a position farther than that to a lower temperature than a near position.

従って、筒体53内に長手方向に沿って並んで配置された凝縮器52は、内部を流れる気体の上流側から下流側に向けて温度が低くなっている。
上流側では、複数個の凝縮器52が精製対象物16の気化温度(昇華する固体では昇華する温度)よりも高い温度に加熱されており、下流側では、複数個の凝縮器52が精製対象物16の気化温度よりも低い温度に加熱されている。
Therefore, the condenser 52 arranged side by side in the longitudinal direction in the cylindrical body 53 has a lower temperature from the upstream side to the downstream side of the gas flowing inside.
On the upstream side, the plurality of condensers 52 are heated to a temperature higher than the vaporization temperature of the purification object 16 (sublimation temperature for sublimated solids), and on the downstream side, the plurality of condensers 52 are to be purified. It is heated to a temperature lower than the vaporization temperature of the object 16.

精製対象物16の気化温度よりも高い温度の凝縮器52と、低い温度の凝縮器52の間には、複数の凝縮器52が配置されており、精製対象物16の気化温度よりも高い温度の凝縮器52と、低い温度の凝縮器52が、それぞれ複数個配置されている。   A plurality of condensers 52 are arranged between the condenser 52 having a temperature higher than the vaporization temperature of the purification object 16 and the condenser 52 having a low temperature, and the temperature is higher than the vaporization temperature of the purification object 16. A plurality of condensers 52 and a plurality of low-temperature condensers 52 are arranged.

精製対象物16に混入された不純物には、精製対象物16が気化する温度よりも高い温度で気化する高温不純物と、低い温度で気化する低温不純物とが含まれている。
凝縮室50aの筒体53内に導入された生成気体には、精製対象物16の気体に加え、高温不純物の気体と、低温不純物の気体とが含まれている。
更に、高温不純物と低温不純物は、それぞれ複数の物質で構成されており、物質毎に異なる気化温度又は昇華温度を有している。
The impurities mixed in the purification target object 16 include a high temperature impurity that vaporizes at a temperature higher than the temperature at which the purification target object 16 vaporizes and a low temperature impurity that vaporizes at a low temperature.
The product gas introduced into the cylindrical body 53 of the condensing chamber 50a includes a high-temperature impurity gas and a low-temperature impurity gas in addition to the gas of the purification target 16.
Furthermore, the high temperature impurity and the low temperature impurity are each composed of a plurality of substances, and have different vaporization temperatures or sublimation temperatures for each substance.

気化室20内に導入された生成気体及びキャリアガスは、先ず、入口側の高温の凝縮器52に接触すると、気化する温度が、接触した凝縮器52の温度よりも高い高温の化学物質が凝縮(又は固化)し、その高温不純物の気体が、筒体53内を流れる生成気体から除去又は減少される。   When the product gas and the carrier gas introduced into the vaporization chamber 20 first contact with the high-temperature condenser 52 on the inlet side, the high-temperature chemical substance whose vaporization temperature is higher than the temperature of the condenser 52 in contact is condensed. (Or solidifies), and the high-temperature impurity gas is removed or reduced from the generated gas flowing in the cylinder 53.

各凝縮器52は、図2に示すように、リング形状であり、筒体53内を流れる気体は、各凝縮器52の内側を通過して流れ、内周面に凝縮物が成長するようになっている。
先頭に配置された凝縮器52を最高温度とすると、その凝縮器52の次に配置された二番目の温度の凝縮器52は、二番目に高温であり、先頭の凝縮器52を通過した生成気体が二番目の凝縮器52に接触すると、二番目の温度よりも気化温度が高温の高温不純物の気体が固体又は液体になって凝縮する。
As shown in FIG. 2, each condenser 52 has a ring shape, and the gas flowing in the cylindrical body 53 flows through the inside of each condenser 52 so that the condensate grows on the inner peripheral surface. It has become.
If the condenser 52 arranged at the top is the highest temperature, the condenser 52 of the second temperature arranged next to the condenser 52 is the second highest temperature, and the product that has passed through the condenser 52 at the top is generated. When the gas contacts the second condenser 52, the high-temperature impurity gas having a higher vaporization temperature than the second temperature is condensed into a solid or liquid.

このように、凝縮室50aの筒体53内に導入された生成気体が、精製対象物16の気化温度以上の温度に加熱された凝縮器52に、高温の凝縮器52から低温の凝縮器52に向けて順番に接触すると、各凝縮器52の温度に対応した気化温度の高温不純物が凝縮(本発明では、固体が析出される場合も含む)され、高温不純物が生成気体から除去される。   In this way, the product gas introduced into the cylinder 53 of the condensation chamber 50 a is heated from the high-temperature condenser 52 to the low-temperature condenser 52 by the condenser 52 heated to a temperature equal to or higher than the vaporization temperature of the purification target 16. When the contact is made in order, the high-temperature impurities having a vaporization temperature corresponding to the temperature of each condenser 52 are condensed (including the case where a solid is precipitated in the present invention), and the high-temperature impurities are removed from the product gas.

その後、高温不純物が除去された生成気体が精製対象物16の気化温度よりも低温の凝縮器52に接触すると、精製対象物16が凝縮されて、精製対象物16はその凝縮器52に析出する。   Thereafter, when the product gas from which the high temperature impurities have been removed contacts the condenser 52 having a temperature lower than the vaporization temperature of the purification target object 16, the purification target object 16 is condensed and the purification target object 16 is deposited on the condenser 52. .

精製対象物16の気体は、気化室20に導入された生成気体中に多量に含有されており、精製対象物16の気化温度よりも低温の凝縮器52のうち、先頭の凝縮器52によって凝縮されずに通過した気体の中にも多量に含有されており、精製対象物16の気化温度よりも低温の凝縮器52のうち、先頭の凝縮器52の次に温度が高い凝縮器52でも精製対象物16は凝縮される。   The gas of the purification target 16 is contained in a large amount in the product gas introduced into the vaporization chamber 20, and is condensed by the leading condenser 52 among the condensers 52 having a temperature lower than the vaporization temperature of the purification target 16. A large amount is also contained in the gas that has passed without being purified, and even in the condenser 52 having a temperature lower than the vaporization temperature of the object 16 to be purified, the condenser 52 having the second highest temperature after the leading condenser 52 is also purified. The object 16 is condensed.

更に、その次に温度が高い凝縮器52でも、精製対象物16は凝縮される。このように、精製対象物16の気化温度よりも低温の凝縮器52には、精製対象物16が凝縮されてしまう。   Further, the purification object 16 is condensed in the condenser 52 having the next highest temperature. Thus, the purification object 16 is condensed in the condenser 52 having a temperature lower than the vaporization temperature of the purification object 16.

本実施例では、凝縮器52の温度は、上流側から下流側に向けて配置された順序に低下しており、温度が低い凝縮器52には気化温度が低温の不純物も固化しやすいため、精製対象物16の気化温度よりも低温の凝縮器52では、所定の最低温度よりも低温の凝縮器52では、不純物の含有量が多くなる。
従って、精製対象物16の気化温度よりも低温の凝縮器52では、最低温度以上の温度の凝縮器52の凝縮物が、高純度の精製対象物16であることになる。
In the present embodiment, the temperature of the condenser 52 is lowered in the order arranged from the upstream side toward the downstream side, and impurities having a low vaporization temperature are easily solidified in the condenser 52 having a low temperature. In the condenser 52 having a temperature lower than the vaporization temperature of the object 16 to be purified, the content of impurities increases in the condenser 52 having a temperature lower than a predetermined minimum temperature.
Therefore, in the condenser 52 having a temperature lower than the vaporization temperature of the purification object 16, the condensate of the condenser 52 having a temperature equal to or higher than the minimum temperature is the high-purity purification object 16.

各凝縮器52で凝縮されなかった生成気体とキャリアガスは、筒体53を流れて冷却装置56の内部に進入する。冷却装置56の内部には、室温よりも低温に冷却された冷却装置56が配置されており、冷却装置56と接触した生成気体は凝縮され、キャリアガスが真空排気装置7の内部を通過して真空排気される。   The product gas and the carrier gas that are not condensed in each condenser 52 flow through the cylindrical body 53 and enter the inside of the cooling device 56. A cooling device 56 that is cooled to a temperature lower than room temperature is disposed inside the cooling device 56, the generated gas that has contacted the cooling device 56 is condensed, and the carrier gas passes through the inside of the vacuum exhaust device 7. It is evacuated.

そして、各凝縮器52に導入された生成気体の凝縮物が成長すると、導入バルブ51を閉じ、加熱装置54を停止し、凝縮物を冷却させる。
凝縮物が所定温度以下に冷却されたところで、凝縮室50aの真空排気を停止し、凝縮室50aの筒体53内部にパージガス供給装置58からパージガスを導入し、筒体53を大気圧にして凝縮室50aの筒体53の扉(図示せず)を開け、凝縮物が付着した凝縮器52を取り出す。
When the product gas condensate introduced into each condenser 52 grows, the introduction valve 51 is closed, the heating device 54 is stopped, and the condensate is cooled.
When the condensate is cooled to a predetermined temperature or lower, the evacuation of the condensation chamber 50a is stopped, purge gas is introduced from the purge gas supply device 58 into the cylinder 53 of the condensation chamber 50a, and the cylinder 53 is condensed to atmospheric pressure. The door (not shown) of the cylinder 53 of the chamber 50a is opened, and the condenser 52 to which the condensate is attached is taken out.

取り出した凝縮器52のうち、所定の温度範囲に加熱されていた凝縮器52の付着物の純度が高く、それらを集めると、精製され、純度が向上された精製対象物16から成る精製結果物が得られる。   Of the condenser 52 taken out, the purity of the deposits of the condenser 52 that has been heated to a predetermined temperature range is high. Is obtained.

本実施例では、真空排気された複数の凝縮室50a、50bのうち、一乃至複数の凝縮室50aの導入バルブ51が開けられ、他の一乃至複数の凝縮室50bの導入バルブ51は閉じられて、導入バルブ51が開けられた凝縮室50aに気化室20から生成気体が供給されており、凝縮物が凝縮器52に所定量成長すると、その凝縮室50aの導入バルブ51は閉じられ、凝縮物を冷却する状態に入ると、凝縮物が付着していない凝縮器52が配置された凝縮室50bの導入バルブ51が開けられ、その凝縮室50b内での凝縮物の成長が開始される。   In this embodiment, among the plurality of condensation chambers 50a and 50b evacuated, the introduction valves 51 of one or more condensation chambers 50a are opened, and the introduction valves 51 of the other one or more condensation chambers 50b are closed. When the product gas is supplied from the vaporizing chamber 20 to the condensing chamber 50a in which the introducing valve 51 is opened and a predetermined amount of condensate grows in the condenser 52, the introducing valve 51 in the condensing chamber 50a is closed and condensed. When entering the state of cooling the product, the introduction valve 51 of the condensing chamber 50b in which the condenser 52 to which no condensate is attached is opened, and the growth of the condensate in the condensing chamber 50b is started.

他方、凝縮器52を取り出した凝縮室50aでは、凝縮物が付着していない凝縮器52が所定位置に配置され、扉が閉じられて大気から遮断された後、凝縮室50a内部の真空排気が開始される。   On the other hand, in the condensing chamber 50a from which the condenser 52 has been taken out, the condenser 52 to which no condensate is attached is disposed at a predetermined position, and after the door is closed and shut off from the atmosphere, the vacuum exhaust inside the condensing chamber 50a is removed. Be started.

このように、本発明では、同じ気体生成装置3に複数の凝縮室50a、50bが並列に接続されており、一又は複数台の凝縮室50aでは、導入バルブ51を閉じて冷却、凝縮器52の取り出し、又は、所定圧力への真空排気の途中の状態に置かれており、その間に他の凝縮室50bで、凝縮器52への精製対象物の凝縮を行うことができる。   As described above, in the present invention, the plurality of condensing chambers 50a and 50b are connected in parallel to the same gas generator 3. In one or a plurality of condensing chambers 50a, the introduction valve 51 is closed to cool and condense the condenser 52. Or in the middle of the vacuum evacuation to a predetermined pressure, during which time the condensation object can be condensed in the condenser 52 in the other condensation chamber 50b.

要するに、本発明では、供給容器15に配置された多量の精製対象物16を、一台の気化室20で気化させて生成気体を生成し、複数の凝縮室50a、50bで生成気体を凝縮させる際に、導入バルブ51を開けて凝縮を開始する時刻を異ならせて凝縮物を得ることができるので、冷却時間や真空排気時間中に、凝縮を停止させずに済む。   In short, in the present invention, a large amount of the purification object 16 arranged in the supply container 15 is vaporized in one vaporizing chamber 20 to generate a generated gas, and the generated gas is condensed in a plurality of condensing chambers 50a and 50b. At this time, since the condensate can be obtained by opening the introduction valve 51 at different times to start the condensation, it is not necessary to stop the condensation during the cooling time or the evacuation time.

また、少量の凝縮物が付着した段階で、凝縮を停止し、冷却中に他の凝縮室50bで凝縮を開始することができるので、凝縮物を、多量に付着させることによる温度変化を防ぐことができ、純度の低下を抑えられる。   In addition, when a small amount of condensate adheres, condensation can be stopped and condensation can be started in the other condensing chamber 50b during cooling, thus preventing temperature changes caused by attaching a large amount of condensate. And a decrease in purity can be suppressed.

また、精製対象物16の気化温度よりも低温であって、最低温度以上の温度に加熱された凝縮器52のうち、温度が高い凝縮器52の凝縮物の純度は高く、温度が低い凝縮器52の凝縮物の純度は低い。   Further, among the condensers 52 that are lower than the vaporization temperature of the purification object 16 and heated to a temperature that is equal to or higher than the minimum temperature, the condenser 52 having a high temperature has a high purity and a low temperature. The purity of the 52 condensate is low.

精製対象物16の気化温度よりも高温に加熱された凝縮器52の付着物は、廃棄するが、最低温度よりも低温の凝縮器52の凝縮物については、再度気化させて凝縮室50a、50b内に導入して凝縮させれば、純度が高い凝縮物を得ることができるし、最低温度以上に加熱された凝縮器52であっても、比較的低温で凝縮され、純度の低い凝縮物については、それら低純度の凝縮物でも、気化・凝縮がされていない精製対象物16よりも純度は高いので、それら凝縮物を集め、再度気化させて凝縮室50a、50b内に導入して凝縮させれば、高純度の凝縮物が得やすい。   The deposit on the condenser 52 heated to a temperature higher than the vaporization temperature of the purification object 16 is discarded, but the condensate in the condenser 52 lower than the minimum temperature is vaporized again to condense chambers 50a and 50b. If it is introduced into the inside and condensed, a highly pure condensate can be obtained, and even the condenser 52 heated to a temperature higher than the minimum temperature is condensed at a relatively low temperature, and the condensate having a low purity. However, even these low-purity condensates are higher in purity than the purification target 16 that has not been vaporized / condensed, so these condensates are collected, vaporized again, and introduced into the condensation chambers 50a and 50b for condensation. If so, it is easy to obtain a high-purity condensate.

また、本発明については、一乃至複数台の凝縮室50a、50bで凝縮物を成長させて、供給容器15に配置された精製対象物16が無くなった場合には、凝縮物が得られた凝縮室50a、50bの導入バルブ51を閉じて、その凝縮室50a、50b内の凝縮器52を冷却している間に、供給室10に精製対象物16を配置することができる。   In the present invention, when the condensate is grown in one or a plurality of condensing chambers 50a and 50b and the purification target 16 disposed in the supply container 15 is lost, the condensate obtained is obtained. While the introduction valve 51 of the chambers 50a and 50b is closed and the condenser 52 in the condensation chambers 50a and 50b is cooled, the purification object 16 can be arranged in the supply chamber 10.

ここでは、供給室10と気化室20との間には遮断バルブ31が設けられており、供給容器15の下部を気化室20から抜き出し、供給室10と気化室20との間を遮断バルブ31を閉じて分離し、供給室10と真空排気装置7との間の排気バルブを閉じて供給室10内の真空排気を停止した状態で大気を導入し、供給室10の扉を開けて精製対象物16を供給室10内に配置することが出来る。   Here, a shutoff valve 31 is provided between the supply chamber 10 and the vaporization chamber 20, the lower part of the supply container 15 is extracted from the vaporization chamber 20, and the shutoff valve 31 is provided between the supply chamber 10 and the vaporization chamber 20. Is closed and separated, the exhaust valve between the supply chamber 10 and the vacuum evacuation device 7 is closed, the vacuum exhaust in the supply chamber 10 is stopped, the atmosphere is introduced, and the door of the supply chamber 10 is opened to be purified. The object 16 can be placed in the supply chamber 10.

精製対象物16を配置し、排気バルブを開けて供給室10を真空排気した後、遮断バルブ31を開け、供給容器15の下部を気化室20内に挿入することができる。
このとき、供給室10には、冷却中の凝縮器52の凝縮物とは異なる物質を精製対象物16として配置し、その精製対象物16を気化室20の加熱容器21に供給して異なる物質の気体を生成して、凝縮物が形成されていない凝縮室50a、50bの導入バルブ51を開け、その凝縮室50a、50b内で異なる物質の凝縮物を生成することができる。
After the purification object 16 is arranged and the exhaust valve is opened and the supply chamber 10 is evacuated, the shutoff valve 31 is opened and the lower part of the supply container 15 can be inserted into the vaporization chamber 20.
At this time, in the supply chamber 10, a substance different from the condensate of the condenser 52 being cooled is disposed as the purification target 16, and the purification target 16 is supplied to the heating container 21 of the vaporization chamber 20 to be different. The condensates of different substances can be generated in the condensation chambers 50a and 50b by opening the introduction valve 51 of the condensation chambers 50a and 50b in which no condensate is formed.

なお、上記実施例では、加熱容器21内に導入したキャリアガスによって、生成気体が筒体53内に運搬されたが、気化室20内で生成された生成気体の圧力によって、生成気体を気化室20から筒体53内に移動させることができる。   In the above embodiment, the generated gas is transported into the cylinder 53 by the carrier gas introduced into the heating container 21, but the generated gas is vaporized by the pressure of the generated gas generated in the vaporizing chamber 20. 20 can be moved into the cylinder 53.

10……供給室
11……入口側一端
12……出口側一端
13……回転軸
15……供給容器
16……精製対象物
20……気化室
50a、50b……凝縮室
51……導入バルブ
52……凝縮器
DESCRIPTION OF SYMBOLS 10 ... Supply chamber 11 ... Inlet side one end 12 ... Outlet side one end 13 ... Rotary shaft 15 ... Supply container 16 ... Purification object 20 ... Vaporization chamber 50a, 50b ... Condensing chamber 51 ... Introduction valve 52 …… Condenser

Claims (2)

真空排気可能に構成され、精製対象物が配置される供給室と、
前記供給室から前記精製対象物が供給され、真空雰囲気内で前記精製対象物を加熱して前記精製対象物の気体を生成する気化室と、
入口側一端が導入バルブを介して前記気化室に接続され、出口側一端が真空排気されながら前記導入バルブが開けられると、前記気化室内で生成された気体である生成気体が内部に導入され、前記生成気体は、前記入口側の一端から、前記出口側の一端に向けて流れるように構成され、並列に配置された複数の細長の凝縮室と、
前記凝縮室内に配置され、前記入口側一端と前記出口側一端の間に並んで配置された複数の凝縮器と、
前記凝縮室に設けられ、前記入口側一端に近い凝縮器を、遠い凝縮器よりも高温に加熱する加熱装置と、
を有し、
前記供給室と前記気化室との間には遮断バルブが設けられ、前記供給室と前記気化室の内部雰囲気は、前記遮断バルブが開けられると接続され、閉じられると、分離される精製装置であって、
前記供給室には漏斗形状の供給容器が設けられ、前記供給容器の漏斗形状の下部の管状部は前記気化室に挿入され、
前記管状部には、周囲にネジ溝が設けられた回転軸が挿入され、前記供給容器に配置された粉体状の前記精製対象物は、前記回転軸の回転によって、前記供給室から前記気化室に前記精製対象物が移動される精製装置。
A supply chamber configured to be evacuated and in which a purification object is disposed;
The purification object is supplied from the supply chamber, a vaporization chamber for heating the purification object in a vacuum atmosphere and generating a gas of the purification object;
One end of the inlet side is connected to the vaporization chamber via an introduction valve, and when the introduction valve is opened while the one end of the outlet side is evacuated, a generated gas, which is a gas generated in the vaporization chamber, is introduced inside, The product gas is configured to flow from one end on the inlet side toward one end on the outlet side, and a plurality of elongated condensation chambers arranged in parallel;
A plurality of condensers arranged in the condensation chamber and arranged side by side between the one end on the inlet side and the one end on the outlet side;
A heating device that is provided in the condensation chamber and that heats the condenser close to the one end on the inlet side to a higher temperature than a far condenser;
Have
The shut-off valve is provided between the supply chamber and said vaporization chamber is provided, the internal atmosphere of the vaporizing chamber and the supply chamber is connected to the shut-off valve is opened, when closed, the purification device to be separated There,
The supply chamber is provided with a funnel-shaped supply container, and the funnel-shaped lower tubular portion of the supply container is inserted into the vaporization chamber,
The tubular portion is inserted with a rotating shaft having a thread groove around it, and the powdery purification target disposed in the supply container is vaporized from the supply chamber by the rotation of the rotating shaft. A purification apparatus in which the object to be purified is moved to a chamber .
前記入口側では、前記精製対象物の気化又は昇華する温度よりも高い温度に加熱される前記凝縮器が複数個配置され、
前記出口側では、前記精製対象物が気化又は昇華する温度よりも低い温度に加熱される前記凝縮器が複数個配置され、
前記精製対象物が気化又は昇華する温度よりも高い温度の前記凝縮器と、低い温度の前記凝縮器との間には、複数の前記凝縮器が配置された請求項1記載の精製装置。
On the inlet side, a plurality of the condensers that are heated to a temperature higher than the temperature at which the object to be purified is vaporized or sublimated are arranged,
On the outlet side, a plurality of the condensers that are heated to a temperature lower than the temperature at which the purification object is vaporized or sublimated are arranged,
Wherein the purified object the condenser temperature higher than the vaporization or sublimation temperature, between the said condenser low temperature, a plurality of the condenser disposed claims 1 Symbol placement refiner.
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