JP6189998B2 - 分光用の回折格子構造体 - Google Patents
分光用の回折格子構造体 Download PDFInfo
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- JP6189998B2 JP6189998B2 JP2016099401A JP2016099401A JP6189998B2 JP 6189998 B2 JP6189998 B2 JP 6189998B2 JP 2016099401 A JP2016099401 A JP 2016099401A JP 2016099401 A JP2016099401 A JP 2016099401A JP 6189998 B2 JP6189998 B2 JP 6189998B2
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- Prior art keywords
- diffraction grating
- diffraction
- order
- transmission
- light
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- Expired - Fee Related
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- 238000004611 spectroscopical analysis Methods 0.000 title 1
- 230000005540 biological transmission Effects 0.000 claims description 160
- 239000000758 substrate Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 8
- 230000008878 coupling Effects 0.000 claims description 6
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 description 37
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 32
- 208000032369 Primary transmission Diseases 0.000 description 18
- 239000000463 material Substances 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 239000010453 quartz Substances 0.000 description 6
- 208000032370 Secondary transmission Diseases 0.000 description 5
- 230000010287 polarization Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1833—Diffraction gratings comprising birefringent materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
- H10F77/48—Back surface reflectors [BSR]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Photovoltaic Devices (AREA)
- Spectrometry And Color Measurement (AREA)
- Optical Filters (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
Description
Claims (5)
- 光の波長を設定するステップと、
1次透過回折光角度に基づいて、回折格子構造体の回折格子の周期を決定するステップと、
0次透過への、各モードについての振幅寄与を決定するステップと、
別モードの振幅寄与に等しい0次モードの振幅寄与に基づいてフィルファクタを特定するステップと、
前記0次透過の回折効率に基づいて前記回折格子の高さを決定するステップと、
前記回折格子が、交互に並び且つ長方形の断面を有するリッジ部及び溝を含み、且つ、0次透過における回折効率が最小となるように、前記回折格子の、周期、フィルファクタ、及び高さに基づいて前記回折格子をエッチングするステップと、
前記回折格子を基板に結合させるステップであって、前記回折格子の幅が、1次透過回折光角度で進む光が前記基板の上面から該基板の下面まで進み且つ該基板の上面へ反射して戻るのに必要とされる水平距離の二倍よりも小さい、ステップと
を含む、回折格子構造体を生産する方法。 - s偏光についての有効屈折率とp偏光についての有効屈折率との差を解析することを更に含む、請求項1に記載の方法。
- s偏光及びp偏光についての回折効率を解析することを更に含む、請求項1に記載の方法。
- 前記回折格子の周期がp=1.81λ〜1.87λであり、前記フィルファクタがr=0.29〜0.39であり、前記回折格子の高さがh=1.25λ〜1.35λである、請求項1に記載の方法。
- 前記回折格子の周期がp=1.81λ〜1.87λであり、前記フィルファクタがr=0.20〜0.30であり、前記回折格子の高さがh=1.30λ〜1.40λである、請求項1に記載の方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/638,334 US8675279B2 (en) | 2009-12-15 | 2009-12-15 | Grating structure for dividing light |
| US12/638,334 | 2009-12-15 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010279843A Division JP5940763B2 (ja) | 2009-12-15 | 2010-12-15 | 分光用の回折格子構造体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016153919A JP2016153919A (ja) | 2016-08-25 |
| JP6189998B2 true JP6189998B2 (ja) | 2017-08-30 |
Family
ID=44141553
Family Applications (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010279843A Expired - Fee Related JP5940763B2 (ja) | 2009-12-15 | 2010-12-15 | 分光用の回折格子構造体 |
| JP2015046256A Withdrawn JP2015135514A (ja) | 2009-12-15 | 2015-03-09 | 分光用の回折格子構造体 |
| JP2016099401A Expired - Fee Related JP6189998B2 (ja) | 2009-12-15 | 2016-05-18 | 分光用の回折格子構造体 |
| JP2017018383A Withdrawn JP2017138597A (ja) | 2009-12-15 | 2017-02-03 | 分光用の回折格子構造体 |
| JP2018220460A Active JP6791935B2 (ja) | 2009-12-15 | 2018-11-26 | 分光用の回折格子構造体 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010279843A Expired - Fee Related JP5940763B2 (ja) | 2009-12-15 | 2010-12-15 | 分光用の回折格子構造体 |
| JP2015046256A Withdrawn JP2015135514A (ja) | 2009-12-15 | 2015-03-09 | 分光用の回折格子構造体 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017018383A Withdrawn JP2017138597A (ja) | 2009-12-15 | 2017-02-03 | 分光用の回折格子構造体 |
| JP2018220460A Active JP6791935B2 (ja) | 2009-12-15 | 2018-11-26 | 分光用の回折格子構造体 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8675279B2 (ja) |
| JP (5) | JP5940763B2 (ja) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140211314A1 (en) * | 2006-02-22 | 2014-07-31 | Optoplex Corporation | Efficiency of a deep grating |
| US8072684B2 (en) * | 2010-01-25 | 2011-12-06 | Toyota Motor Engineering & Manufacturing North America, Inc. | Optical device using laterally-shiftable diffraction gratings |
| FI125270B (en) * | 2012-09-20 | 2015-08-14 | Teknologian Tutkimuskeskus Vtt Oy | Optical device with diffractive grating |
| BE1021974B1 (fr) * | 2013-09-03 | 2016-02-01 | Agc Glass Europe | Feuille de verre texturee a motifs rectilignes |
| FR3023977B1 (fr) * | 2014-07-16 | 2017-11-24 | Thales Sa | Module photovoltaique comprenant une optique de concentration avec des motifs sub-longueurs d'onde et generateur solaire pour satellite comprenant ledit module |
| JPWO2016185602A1 (ja) * | 2015-05-21 | 2018-03-08 | ナルックス株式会社 | 回折光学素子 |
| US10468448B2 (en) * | 2017-11-30 | 2019-11-05 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor image sensor and method for forming the same |
| CN108649091A (zh) * | 2018-04-25 | 2018-10-12 | 榆林学院 | 一种太阳能电池光伏组件 |
| JP7266275B2 (ja) * | 2018-10-04 | 2023-04-28 | 国立研究開発法人理化学研究所 | 石英製の格子構造体および回折格子の製造方法 |
| US10775158B2 (en) * | 2018-11-15 | 2020-09-15 | Applied Materials, Inc. | System and method for detecting etch depth of angled surface relief gratings |
| WO2020218784A1 (ko) * | 2019-04-25 | 2020-10-29 | 주식회사 엘지화학 | 회절 도광판 및 회절 도광판의 제조 방법 |
| KR102375853B1 (ko) * | 2019-04-25 | 2022-03-17 | 주식회사 엘지화학 | 회절 도광판 및 회절 도광판의 제조 방법 |
| JP7161623B2 (ja) * | 2019-07-26 | 2022-10-26 | 富士フイルム株式会社 | バックライトユニットおよび液晶表示装置 |
| JP7345954B2 (ja) | 2019-08-14 | 2023-09-19 | エルジー・ケム・リミテッド | 回折導光板および回折導光板の製造方法 |
| TWI792337B (zh) * | 2021-06-03 | 2023-02-11 | 占暉光學股份有限公司 | 具蝕刻成型偏振微小結構之光學透鏡裝置及其方法 |
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-
2009
- 2009-12-15 US US12/638,334 patent/US8675279B2/en not_active Expired - Fee Related
-
2010
- 2010-12-15 JP JP2010279843A patent/JP5940763B2/ja not_active Expired - Fee Related
-
2014
- 2014-01-31 US US14/169,656 patent/US9500785B2/en not_active Expired - Fee Related
-
2015
- 2015-03-09 JP JP2015046256A patent/JP2015135514A/ja not_active Withdrawn
-
2016
- 2016-05-18 JP JP2016099401A patent/JP6189998B2/ja not_active Expired - Fee Related
-
2017
- 2017-02-03 JP JP2017018383A patent/JP2017138597A/ja not_active Withdrawn
-
2018
- 2018-11-26 JP JP2018220460A patent/JP6791935B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20110139234A1 (en) | 2011-06-16 |
| JP2019113836A (ja) | 2019-07-11 |
| JP2015135514A (ja) | 2015-07-27 |
| JP2016153919A (ja) | 2016-08-25 |
| US20140144506A1 (en) | 2014-05-29 |
| JP6791935B2 (ja) | 2020-11-25 |
| JP2011128619A (ja) | 2011-06-30 |
| JP2017138597A (ja) | 2017-08-10 |
| JP5940763B2 (ja) | 2016-06-29 |
| US8675279B2 (en) | 2014-03-18 |
| US9500785B2 (en) | 2016-11-22 |
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