Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP6346066B2 - Cutting tool and manufacturing method - Google Patents
[go: Go Back, main page]

JP6346066B2 - Cutting tool and manufacturing method - Google Patents

Cutting tool and manufacturing method Download PDF

Info

Publication number
JP6346066B2
JP6346066B2 JP2014220403A JP2014220403A JP6346066B2 JP 6346066 B2 JP6346066 B2 JP 6346066B2 JP 2014220403 A JP2014220403 A JP 2014220403A JP 2014220403 A JP2014220403 A JP 2014220403A JP 6346066 B2 JP6346066 B2 JP 6346066B2
Authority
JP
Japan
Prior art keywords
layer
particles
cutting tool
coating layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014220403A
Other languages
Japanese (ja)
Other versions
JP2016087699A (en
Inventor
孝 渡邊
孝 渡邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2014220403A priority Critical patent/JP6346066B2/en
Publication of JP2016087699A publication Critical patent/JP2016087699A/en
Application granted granted Critical
Publication of JP6346066B2 publication Critical patent/JP6346066B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Ceramic Products (AREA)

Description

本発明は切削工具に関し、特に耐欠損性に優れた被覆層を有する切削工具、および切削加工物の製造方法に関する。   The present invention relates to a cutting tool, and more particularly, to a cutting tool having a coating layer excellent in fracture resistance and a method for manufacturing a cut product.

金属やプリント基板等の切削加工に広く用いられている切削工具は、超硬合金やサーメット、セラミックス等の基体の表面に、単層または多層で構成された被覆層が形成された切削工具が知られている。この被覆層としては、TiC(炭化チタン)層、TiN(窒化チタン)層、TiCN(炭窒化チタン)層およびAl(酸化アルミニウム)層等が積層された化学蒸着(CVD)膜が多用されている。 Cutting tools widely used for cutting of metals, printed circuit boards, etc. are known in which a single layer or a multilayer coating layer is formed on the surface of a substrate such as cemented carbide, cermet or ceramic. It has been. As this coating layer, a chemical vapor deposition (CVD) film in which a TiC (titanium carbide) layer, a TiN (titanium nitride) layer, a TiCN (titanium carbonitride) layer, an Al 2 O 3 (aluminum oxide) layer, etc. are laminated is often used. Has been.

例えば、特許文献1では、超硬合金基体の表面に、TiCN層、Al層、TiCN層の順に被覆した切削用インサートが開示されている。特許文献2には、窒化珪素基体の表面に硬質被覆層を被覆し、硬質被覆層の1層目が、結晶粒子径1〜30nmの粒状晶を含む柱状粒子からなる窒化チタン層である構成が開示されている。 For example, Patent Document 1 discloses a cutting insert in which a surface of a cemented carbide substrate is coated with a TiCN layer, an Al 2 O 3 layer, and a TiCN layer in this order. Patent Document 2 has a configuration in which the surface of a silicon nitride substrate is coated with a hard coating layer, and the first layer of the hard coating layer is a titanium nitride layer made of columnar particles including granular crystals having a crystal particle diameter of 1 to 30 nm. It is disclosed.

また、特許文献3では、電解研磨処理によって、焼肌面に存在する硬質相の平均粒径を、内部に存在する硬質相の平均粒径よりも小さくして、焼肌面の平滑性を高めた超硬合金が開示されている。   Moreover, in patent document 3, the average particle diameter of the hard phase which exists in a skin surface by electropolishing is made smaller than the average particle diameter of the hard phase which exists inside, and the smoothness of a skin surface is improved. A cemented carbide is disclosed.

特開2003−213455号公報JP 2003-213455 A 特開10−015707号公報JP 10-015707 A 特開2000−265236号公報JP 2000-265236 A

しかしながら、上記特許文献1に記載されたTiCN(TiN)層とAl層とを繰り返し積層した被覆層の構成や、特許文献2のように窒化珪素質焼結体からなる基体の直上に成膜するTiN層の結晶形態を、基体に隣接する部分に粒状粒子と柱状粒子とを混在させた構成でも、被覆層の密着性が不十分な場合があり、また、切削中にAl層にクラックが発生して被覆層がチッピングする場合があった。特許文献3のように、焼肌面における硬質相の平均粒径を小さくした超硬合金でも、焼肌面の平滑性は向上するものの、基体と被覆層との密着性をさらに高めることが求められていた。 However, the structure of the coating layer in which the TiCN (TiN) layer and the Al 2 O 3 layer described in Patent Document 1 are repeatedly laminated, or a substrate made of a silicon nitride-based sintered body as in Patent Document 2 are provided. Even when the crystal form of the TiN layer to be formed is a structure in which granular particles and columnar particles are mixed in a portion adjacent to the substrate, the adhesion of the coating layer may be insufficient, and Al 2 O during cutting may be insufficient. In some cases, cracks occurred in the three layers and the coating layer chipped. Even if the cemented carbide with the average particle size of the hard phase on the burned skin surface is reduced as in Patent Document 3, the smoothness of the burned skin surface is improved, but it is required to further improve the adhesion between the substrate and the coating layer. It was done.

本発明の切削工具は、窒化珪素粒子を主体として含有する窒化珪素質焼結体からなる基体と、該基体の表面に被覆された被覆層とを備える切削工具であって、
前記基体の表面に垂直な断面において、
前記窒化珪素粒子は、前記基体の最表面に存在して前記被覆層と接する表面粒子と、前記被覆層とは接しない内部粒子とからなり、前記表面粒子の前記基体の表面に平行な平均粒子幅w1と、前記内部粒子の前記基体の表面に平行な平均粒子幅w2との比(w1/w2)が0.2〜0.6であり、前記表面粒子の前記平均粒子幅w1と平均粒子長さL1との比(L1/w1)が0.1〜0.6であるとともに、前記被覆層を構成する粒子のうち、前記基体と接触する第1被覆層を構成する粒子の前記基体の表面に平行な平均粒子幅d1と、前記表面粒子の平均粒子幅w1との比(w1/d1)が0.8〜2.1である。
The cutting tool of the present invention is a cutting tool comprising a base composed of a silicon nitride sintered body mainly containing silicon nitride particles, and a coating layer coated on the surface of the base,
In a cross section perpendicular to the surface of the substrate,
The silicon nitride particles are composed of surface particles that are present on the outermost surface of the substrate and are in contact with the coating layer, and internal particles that are not in contact with the coating layer, and are average particles parallel to the surface of the substrate. The ratio (w1 / w2) of the width w1 to the average particle width w2 of the internal particles parallel to the surface of the substrate is 0.2 to 0.6, and the average particle width w1 and average particles of the surface particles The ratio of the length L1 (L1 / w1) is 0.1 to 0.6, and among the particles constituting the coating layer, the particles constituting the first coating layer in contact with the substrate are The ratio (w1 / d1) of the average particle width d1 parallel to the surface to the average particle width w1 of the surface particles is 0.8 to 2.1.

本発明の切削加工物の製造方法は、被削材を回転させる工程と、回転している前記被切削物に前記切削工具の前記切刃を接触させる工程と、前記切削工具を前記被削材から離す工程とを備えたものである。   The manufacturing method of the cut workpiece of the present invention includes a step of rotating a workpiece, a step of bringing the cutting blade of the cutting tool into contact with the rotating workpiece, and the cutting tool as the workpiece. And a step of separating from.

本発明の切削工具は、基体が窒化珪素質焼結体からなり、その最表面の被覆層と接する表面粒子の平均粒子幅w1が、内部粒子の平均粒子幅w2に対する比(w1/w2)で0.2〜0.6と小さい。また、表面粒子の平均粒子幅w1と平均粒子長さL1との比(L1/w1)が0.1〜0.6と幅広である。さらに、被覆層のうち、前記基体と接触する第1被覆層の平均粒子幅d1と、前記表面粒子の平均粒子幅w1との比(w1/d1)が0.8〜2.1と近似している。そのため、基体と被覆層との密着性がよく、かつ被覆層が受けた衝撃を基体側に分散して伝達することができ、基体の耐衝撃性が高い。   In the cutting tool of the present invention, the base is made of a silicon nitride sintered body, and the average particle width w1 of the surface particles in contact with the outermost coating layer is a ratio (w1 / w2) to the average particle width w2 of the internal particles. As small as 0.2 to 0.6. Moreover, the ratio (L1 / w1) of the average particle width w1 of the surface particles to the average particle length L1 is as wide as 0.1 to 0.6. Further, the ratio (w1 / d1) of the average particle width d1 of the first coating layer in contact with the substrate to the average particle width w1 of the surface particles in the coating layer is approximately 0.8 to 2.1. ing. Therefore, the adhesion between the substrate and the coating layer is good, and the impact received by the coating layer can be dispersed and transmitted to the substrate side, and the substrate has high impact resistance.

本発明の一実施形態に係る切削工具の被覆層を含む研磨断面についての走査型電子顕微鏡写真である。It is a scanning electron micrograph about the grinding | polishing cross section containing the coating layer of the cutting tool which concerns on one Embodiment of this invention. 本発明の一実施態様における切削加工物の製造方法を説明するための図であり、図2A、図2B、図2Cは、本製造方法のいずれかの工程を示す概略図である。It is a figure for demonstrating the manufacturing method of the cut workpiece in one embodiment of this invention, FIG. 2A, FIG. 2B, and FIG. 2C are schematic which shows the process in any one of this manufacturing method.

切削工具の好適例である切削インサート1は、図1に示すように、窒化珪素粒子を主体として含有する窒化珪素質焼結体からなる基体2と、基体2の表面に被覆された被覆層3とを備えている。   As shown in FIG. 1, a cutting insert 1 which is a preferred example of a cutting tool includes a base 2 made of a silicon nitride sintered body mainly containing silicon nitride particles, and a coating layer 3 coated on the surface of the base 2. And.

ここで、本発明において、窒化珪素粒子を主体として含有するとは、基体2の10μm以上×10μm以上の任意領域において、領域の面積に対して窒化珪素粒子が50面積%以上の割合で存在することを指す。また、窒化珪素粒子は、基体2の最表面に存在して被覆層3と接する表面粒子4と、被覆層3とは接しない内部粒子5とからなる。   Here, in the present invention, containing silicon nitride particles as a main component means that silicon nitride particles are present at a ratio of 50 area% or more with respect to the area of the region in an arbitrary region of 10 μm or more × 10 μm or more of the substrate 2. Point to. The silicon nitride particles are composed of surface particles 4 which are present on the outermost surface of the substrate 2 and are in contact with the coating layer 3, and internal particles 5 which are not in contact with the coating layer 3.

一方、被覆層3は、単層または複数層からなり、基体2と接触する第1層7には、表面粒子5と接触する第1被覆層が存在する。   On the other hand, the coating layer 3 is composed of a single layer or a plurality of layers, and the first coating layer in contact with the surface particles 5 is present in the first layer 7 in contact with the substrate 2.

本実施態様においては、表面粒子4の基体2の表面に平行な平均粒子幅w1と、内部粒子5の基体2の表面に平行な平均粒子幅w2との比(w1/w2)が0.2〜0.6であるとともに、表面粒子4の平均粒子幅w1と平均粒子長さL1との比(L1/w1)が0.1〜0.6である。また、第1層7の第1被覆層の平均粒子幅d1と、表面粒子の平均粒子幅w1との比(w1/d1)が0.8〜2.1である。   In this embodiment, the ratio (w1 / w2) of the average particle width w1 of the surface particles 4 parallel to the surface of the substrate 2 to the average particle width w2 of the inner particles 5 parallel to the surface of the substrate 2 is 0.2. The ratio (L1 / w1) of the average particle width w1 and the average particle length L1 of the surface particles 4 is 0.1 to 0.6. The ratio (w1 / d1) of the average particle width d1 of the first coating layer of the first layer 7 to the average particle width w1 of the surface particles is 0.8 to 2.1.

これによって、基体2と被覆層3との密着性がよく、かつ被覆層3が受けた衝撃を基体2側に分散して伝達することができ、基体2の耐衝撃性が高い。すなわち、基体2の表面粒子と被覆層3の第1被覆層の平均粒径が近似するので、切削熱の影響で温度が上下する場合でも、両者間の収縮差が小さくて密着性が高い。また、表面粒子4の比(L1/w1)が0.1〜0.6と幅広なので、被覆層3が受けた衝撃を基体側に分散して伝達することができ、耐欠損性が向上する。   Accordingly, the adhesion between the base 2 and the coating layer 3 is good, and the impact received by the coating layer 3 can be distributed and transmitted to the base 2 side, and the impact resistance of the base 2 is high. That is, since the average particle diameters of the surface particles of the substrate 2 and the first coating layer of the coating layer 3 are approximate, even when the temperature rises and falls due to the influence of cutting heat, the shrinkage difference between the two is small and the adhesion is high. Moreover, since the ratio (L1 / w1) of the surface particles 4 is as wide as 0.1 to 0.6, the impact received by the coating layer 3 can be dispersed and transmitted to the substrate side, and the fracture resistance is improved. .

本発明において、表面粒子4および内部粒子5の平均粒子幅w1、w2は、基体2の表面に垂直な断面の研磨面において、基体2の表面に平行な直線を引いて、この直線長さを、直線を横切る粒界の数で割った値を算出することによって測定する。なお、粒界の数は5個以上となる範囲で測定する。また、表面粒子4の平均粒子幅を測定のための直線は、
測定される表面粒子5の最表面位置、すなわち、被覆層3との接触する位置において測定する。内部粒子5の平均粒子幅を測定のための直線は、表面粒子5の長さL1よりも深い任意の位置3箇所について測定し、その平均値を取る。図1に、w1、w2、L1、d1を測定するための直線をそれぞれ点線で示している。なお、断面の研磨面とは、表面粒子4、内部粒子5および被覆層3を構成する粒子が観察できる程度の滑らかさであればよく、走査型電子顕微鏡にて確認すればよいが、切削インサート1の研磨面において、研磨粉が粒子間の粒界を埋めて粒界が判別できない場合には、電子線後方散乱回折法(EBSD)にて各粒子の配向性を確認し、配向性が異なる境界では、2つ粒子が存在するとみなして、粒子の平均粒径を側製する。
In the present invention, the average particle widths w1 and w2 of the surface particles 4 and the inner particles 5 are obtained by drawing a straight line parallel to the surface of the substrate 2 on a polished surface having a cross section perpendicular to the surface of the substrate 2. Measured by calculating the value divided by the number of grain boundaries crossing the straight line. The number of grain boundaries is measured in a range of 5 or more. The straight line for measuring the average particle width of the surface particles 4 is
It is measured at the outermost surface position of the surface particle 5 to be measured, that is, at the position where it comes into contact with the coating layer 3. The straight line for measuring the average particle width of the internal particles 5 is measured at three arbitrary positions deeper than the length L1 of the surface particles 5, and the average value is taken. In FIG. 1, straight lines for measuring w1, w2, L1, and d1 are indicated by dotted lines, respectively. The polished surface of the cross section may be smooth enough to observe the particles constituting the surface particles 4, the inner particles 5, and the coating layer 3, and may be confirmed with a scanning electron microscope. When the polishing powder fills the grain boundary between the particles and the grain boundary cannot be discriminated on the polished surface of 1, the orientation of each particle is confirmed by electron beam backscatter diffraction (EBSD), and the orientation is different. At the boundary, it is assumed that there are two particles, and the average particle size of the particles is produced on the side.

図1の研磨面において、内部粒子5の平均アスペクト比が1.5以上である。これによって、基体2の靭性が高く、切削インサート1の耐欠損性が向上する。内部粒子5の平均アスペクト比の望ましい範囲は、1.7〜3.0である。なお、本発明において、内部粒子5の平均アスペクト比とは、上記研磨面において、内部粒子5の最長長さである長径と、長径に垂直な方向における最長長さである短径との比(長径/短径)の平均値である。本実施態様において、内部粒子5の長径の平均である平均長径は0.5〜3.0μmである。これによって、切削インサート1の耐欠損性を高めることができる。内部粒子5の平均長径の望ましい範囲は、1.5〜2.0μmである。   In the polished surface of FIG. 1, the average aspect ratio of the internal particles 5 is 1.5 or more. Thereby, the toughness of the base body 2 is high, and the chipping resistance of the cutting insert 1 is improved. A desirable range of the average aspect ratio of the inner particles 5 is 1.7 to 3.0. In the present invention, the average aspect ratio of the inner particles 5 is the ratio of the major axis that is the longest length of the inner particles 5 to the minor axis that is the longest length in the direction perpendicular to the major axis on the polished surface ( (Major axis / minor axis). In this embodiment, the average major axis, which is the average of the major axes of the inner particles 5, is 0.5 to 3.0 μm. Thereby, the chipping resistance of the cutting insert 1 can be improved. A desirable range of the average major axis of the inner particles 5 is 1.5 to 2.0 μm.

一方、被覆層3は、基体2側から、平均粒子幅が0.1〜0.4μmのTiNにて構成される第1層7と、平均粒子幅が0.01〜1.5μmのAlにて構成される第2層8と、平均粒子幅が0.01〜0.1μmで第1層7の平均粒子幅よりも小さい平均粒子幅のTiNにて構成される第3層9と、平均粒子幅が0.01〜1.5μmのAlにて構成される第4層10と、平均粒子幅が0.01〜0.7μmにて構成されるTiC1−x(0≦x≦1)、特にx=1のTiCからなる第5層11とが、この順で積層されている。平均粒子幅の望ましい範囲は、第1層7が0.2〜0.3μm、第2層8が0.4〜1.0μm、第3層9が0.01〜0.05μm、第4層10が0.3〜1.0μm、第5層11が0.2〜0.5μmである。 On the other hand, the coating layer 3 includes a first layer 7 made of TiN having an average particle width of 0.1 to 0.4 μm and Al 2 having an average particle width of 0.01 to 1.5 μm from the substrate 2 side. The second layer 8 composed of O 3 and the third layer 9 composed of TiN having an average particle width of 0.01 to 0.1 μm and an average particle width smaller than the average particle width of the first layer 7. A fourth layer 10 composed of Al 2 O 3 having an average particle width of 0.01 to 1.5 μm and TiC x N 1− composed of an average particle width of 0.01 to 0.7 μm. The fifth layer 11 made of TiC with x (0 ≦ x ≦ 1), particularly x = 1, is laminated in this order. Desirable ranges of the average particle width are as follows: the first layer 7 is 0.2 to 0.3 μm, the second layer 8 is 0.4 to 1.0 μm, the third layer 9 is 0.01 to 0.05 μm, and the fourth layer. 10 is 0.3 to 1.0 μm, and the fifth layer 11 is 0.2 to 0.5 μm.

基体2を構成する窒化珪素質焼結体は窒化珪素粒子が針状粒子からなるために、基体2の表面には比較的大きな凹凸が形成される。しかしながら、切削インサート1では、寸法精度を高めるために、基体2の表面を研磨加工する場合がある。このような場合には、基体2の表面は凹凸が小さくなって平滑性が高まるが、被覆層3との密着性が低下する。そのために、本実施態様では、基体2の表面粒子の性状を改良するとともに、基体2の直上には、基体2の表面粒子6と粒径が近似する第1層7を形成する。   Since the silicon nitride sintered body constituting the substrate 2 is made of needle-like particles, relatively large irregularities are formed on the surface of the substrate 2. However, in the cutting insert 1, the surface of the base body 2 may be polished in order to increase the dimensional accuracy. In such a case, the unevenness of the surface of the substrate 2 is reduced and the smoothness is improved, but the adhesion with the coating layer 3 is lowered. For this purpose, in this embodiment, the properties of the surface particles of the substrate 2 are improved, and the first layer 7 having a particle size close to that of the surface particles 6 of the substrate 2 is formed immediately above the substrate 2.

本実施態様では、第1層7はTiN層からなる。これによって、被覆層3の密着性が高い。次に、被覆層3の耐摩耗性を向上させるために、第1層7の表面にAlからなる第2層8を形成する。そして、第2層8の表面に、第1層7の平均粒子幅よりも小さい0.01〜0.1μmの平均粒子幅にて構成されるTiNからなる第3層9を形成する。この第3層9は、後述する第4層10にかかる衝撃を緩和して、第4層10および第2層8のAl層にクラックが発生することを抑制する。さらに、第3層9の表面には、被覆層3の耐摩耗性を向上させるためにAlからなる第4層10を積層する。第4層10の表面には、被覆層3の色彩を変えて切削インサート1の使用状態をわかりやすくするため、および被削材の溶着を抑制するために、第5層11を設ける。 In the present embodiment, the first layer 7 is composed of a TiN layer. Thereby, the adhesiveness of the coating layer 3 is high. Next, in order to improve the wear resistance of the coating layer 3, a second layer 8 made of Al 2 O 3 is formed on the surface of the first layer 7. Then, a third layer 9 made of TiN having an average particle width of 0.01 to 0.1 μm smaller than the average particle width of the first layer 7 is formed on the surface of the second layer 8. The third layer 9 relieves an impact applied to a fourth layer 10 to be described later, and suppresses occurrence of cracks in the Al 2 O 3 layers of the fourth layer 10 and the second layer 8. Further, a fourth layer 10 made of Al 2 O 3 is laminated on the surface of the third layer 9 in order to improve the wear resistance of the coating layer 3. A fifth layer 11 is provided on the surface of the fourth layer 10 in order to change the color of the coating layer 3 so that the usage state of the cutting insert 1 can be easily understood, and to suppress welding of the work material.

上記被覆層3の構成によって、基体2と被覆層3との付着力が高くて耐欠損性の高い被覆層3となり、切削インサート1の耐摩耗性と耐欠損性が向上する。第1層7はアスペクト比が2〜10の柱状粒子からなるとともに、第3層9はアスペクト比が1.5以下の粒状粒子からなる。   With the configuration of the coating layer 3, the coating layer 3 having high adhesion between the base 2 and the coating layer 3 and high fracture resistance is obtained, and the wear resistance and fracture resistance of the cutting insert 1 are improved. The first layer 7 is made of columnar particles having an aspect ratio of 2 to 10, and the third layer 9 is made of granular particles having an aspect ratio of 1.5 or less.

本実施態様では、第1層7、第2層8、第3層9、第4層10および第5層11を構成する粒子の特定の結晶面への配向性を電子線後方散乱回折法(EBSD)にて測定することができるが、組織化係数は0.8〜1.2となり、特定の結晶面への配向はなく、無配向である。これによって、被覆層3の耐欠損性が高まる。   In this embodiment, the orientation of the particles constituting the first layer 7, the second layer 8, the third layer 9, the fourth layer 10 and the fifth layer 11 to a specific crystal plane is determined by an electron beam backscatter diffraction method ( EBSD), but the organization coefficient is 0.8 to 1.2, there is no orientation to a specific crystal plane, and there is no orientation. Thereby, the fracture resistance of the coating layer 3 is increased.

さらに、本実施態様では、第1層7を構成するTiNの平均粒子幅d1と、第3層9を構成するTiNの平均粒子幅d3との比(d3/d1)が0.05〜0.7である。これによって、基体2と被覆層3との密着性を高めることができるとともに被覆層3の耐チッピング性を高めることができる。   Furthermore, in this embodiment, the ratio (d3 / d1) between the average particle width d1 of TiN constituting the first layer 7 and the average particle width d3 of TiN constituting the third layer 9 is 0.05 to 0.00. 7. As a result, the adhesion between the substrate 2 and the coating layer 3 can be enhanced, and the chipping resistance of the coating layer 3 can be enhanced.

(製造方法)
上述した切削インサートの製造方法の一実施形態について説明する。出発原料として、平均粒径0.2〜0.8μmの窒化珪素(Si)粉末と、平均粒径1.0〜1.7μmの希土類元素(Re)化合物(水酸化ランタン(La(OH))、酸化イットリウム(Y)、酸化イッテリビウム(Yb)、酸化エルビウム(Er)、酸化セリウム(Ce)のいずれか)粉末と、平均粒径0.2〜0.8μmの酸化アルミニウム(Al)粉末と、平均粒径1.8〜4.0μmの水酸化マグネシウム(Mg(OH))粉末とを混合し、プレス成形、鋳込成形、押出成形、冷間静水圧プレス成形等の公知の成形方法によって所定の工具形状に成形する。
(Production method)
One embodiment of the manufacturing method of the cutting insert mentioned above is described. As starting materials, silicon nitride (Si 3 N 4 ) powder having an average particle size of 0.2 to 0.8 μm and rare earth element (Re) compound (lanthanum hydroxide (La ( OH) 2 ), yttrium oxide (Y 2 O 3 ), ytterbium oxide (Yb 2 O 3 ), erbium oxide (Er 2 O 3 ), cerium oxide (Ce 2 O 3 )) powder and average particle diameter A 0.2 to 0.8 μm aluminum oxide (Al 2 O 3 ) powder and a magnesium hydroxide (Mg (OH) 2 ) powder having an average particle size of 1.8 to 4.0 μm are mixed, and press-molded and cast. A predetermined tool shape is formed by a known forming method such as insert molding, extrusion molding, or cold isostatic pressing.

この成形体を脱脂した後、焼成鉢内にセットする際、Si粉末、Si粉末、SiO粉末の少なくとも1種とMg(OH)粉末との混合粉末を用いてセットして蓋をし、これをカーボン製の円筒内に置いた状態で焼成炉内に載置する。そして、焼成炉内を窒素1気圧(101kPa)に置換して、1200℃まで昇温速度5〜15℃/分で昇温し、その後、1840〜1880℃まで1〜5℃/分で昇温し、その後、1900〜1950℃、窒素5〜10気圧(505kPa〜1013kPa)雰囲気で1〜4時間保持して炉冷する。そして、所望によって、1500〜1700℃、2〜5時間、170〜220MPaの条件で熱間静水圧焼成(HIP処理)を施して窒化珪素質焼結体を得る。そして、所望によって焼結体の表面に対して厚み研削加工(両頭加工と外周加工)を施すとともに、切刃部にホーニング加工を施す。 When this molded body is degreased and then set in a baking pot, it is set using a mixed powder of at least one of Si 3 N 4 powder, Si powder, and SiO 2 powder and Mg (OH) 2 powder, and the lid This is placed in a firing furnace in a state of being placed in a carbon cylinder. Then, the inside of the firing furnace is replaced with 1 atm (101 kPa) of nitrogen, the temperature is increased to 1200 ° C. at a rate of temperature increase of 5 to 15 ° C./min, and then the temperature is increased to 1840 to 1880 ° C. at 1 to 5 ° C./min. Thereafter, the furnace is cooled for 1 to 4 hours in an atmosphere of 1900 to 1950 ° C. and 5 to 10 atmospheres of nitrogen (505 kPa to 1013 kPa). And if desired, hot isostatic pressing (HIP treatment) is performed under conditions of 1500 to 1700 ° C., 2 to 5 hours, and 170 to 220 MPa to obtain a silicon nitride sintered body. Then, if desired, thickness grinding processing (double-head processing and peripheral processing) is performed on the surface of the sintered body, and honing processing is performed on the cutting edge portion.

そして、その表面に化学気相蒸着(CVD)法によって被覆層を成膜する。成膜する際には、加工された基体を成膜チャンバ内にセットして、水素(H)ガスを10kPa〜100kPaの圧力で導入して、第1層の成膜温度よりも20〜50℃高い温度まで昇温する。この工程によって、基体の表面に存在する窒化珪素粒子の分解を促進して、窒化珪素粒子の形状を所定の範囲に変化させることができる。 Then, a coating layer is formed on the surface by chemical vapor deposition (CVD). When forming a film, the processed substrate is set in a film formation chamber, and hydrogen (H 2 ) gas is introduced at a pressure of 10 kPa to 100 kPa, so that the film formation temperature is 20 to 50 higher than the film formation temperature of the first layer. Raise the temperature to a higher temperature. By this step, decomposition of the silicon nitride particles present on the surface of the substrate can be promoted, and the shape of the silicon nitride particles can be changed within a predetermined range.

次に、反応ガス組成として塩化チタン(TiCl)ガスを1〜5体積%、窒素(N)ガスを10〜60体積%、残りが水素(H)ガスからなる混合ガスを調整して反応チャンバ内に導入し、成膜温度を上記工程の温度から970〜1050℃の成膜温度まで降温しながら、10kPa〜20kPaの条件で第1層(TiN層)を成膜する。このとき、第1層の成膜温度およびガス圧を調整することによって、基体と第1層との界面付近における各元素の拡散割合を制御することができる。なお、TiN粒子が柱状となるか粒状となるかは、成膜温度および混合ガスの圧力を変化させることによって調整可能である。 Next, as a reaction gas composition, a mixed gas composed of titanium chloride (TiCl 4 ) gas of 1 to 5% by volume, nitrogen (N 2 ) gas of 10 to 60% by volume, and the remainder of hydrogen (H 2 ) gas is adjusted. The first layer (TiN layer) is formed under the condition of 10 kPa to 20 kPa while being introduced into the reaction chamber and the film formation temperature is lowered from the temperature of the above process to the film formation temperature of 970 to 1050 ° C. At this time, the diffusion ratio of each element in the vicinity of the interface between the substrate and the first layer can be controlled by adjusting the film formation temperature and the gas pressure of the first layer. Whether the TiN particles are columnar or granular can be adjusted by changing the film forming temperature and the pressure of the mixed gas.

次に、第2層(Al層)を成膜する。Al層の成膜方法としては、塩化アルミニウム(AlCl)ガスを3〜20体積%、塩化水素(HCl)ガスを0.5〜10体積%、二酸化炭素(CO)ガスを0.01〜20体積%、残りが水素(H)ガスからなる混合ガスを用い、960〜1100℃、5〜25kPaとすることが望ましく、
この条件によれば基本的にκ−Alが生成するが、α−Alが生成する場合もある。
Next, a second layer (Al 2 O 3 layer) is formed. As a method for forming the Al 2 O 3 layer, 3 to 20% by volume of aluminum chloride (AlCl 3 ) gas, 0.5 to 10% by volume of hydrogen chloride (HCl) gas, and 0 of carbon dioxide (CO 2 ) gas are used. It is desirable to use a mixed gas composed of 0.01 to 20% by volume and the remainder consisting of hydrogen (H 2 ) gas, 960 to 1100 ° C., 5 to 25 kPa,
Under these conditions, κ-Al 2 O 3 is basically produced, but α-Al 2 O 3 may be produced in some cases.

さらに、反応ガス組成として塩化チタン(TiCl)ガスを1〜10体積%、窒素(N)ガスを10〜60体積%、残りが水素(H)ガスからなる混合ガスを調整して反応チャンバ内に導入し、成膜温度を900〜950℃、10〜50kPaの条件で第3層(TiN層)を成膜する。 Further, the reaction gas composition is adjusted by adjusting a mixed gas composed of 1 to 10% by volume of titanium chloride (TiCl 4 ) gas, 10 to 60% by volume of nitrogen (N 2 ) gas, and the remaining hydrogen (H 2 ) gas. It introduce | transduces in a chamber and forms a 3rd layer (TiN layer) on the conditions whose film-forming temperature is 900-950 degreeC and 10-50 kPa.

そして、引き続き、第4層(Al層)を成膜する。Al層の成膜方法としては、塩化アルミニウム(AlCl)ガスを3〜20体積%、塩化水素(HCl)ガスを0.5〜10体積%、二酸化炭素(CO)ガスを0.01〜20.0体積%、残りが水素(H)ガスからなる混合ガスを用い、950〜1100℃、5〜25kPaとすることが望ましく、この条件によってもκ−Alが生成するが、α−Alが生成する場合もある。 Subsequently, a fourth layer (Al 2 O 3 layer) is formed. As a method for forming the Al 2 O 3 layer, 3 to 20% by volume of aluminum chloride (AlCl 3 ) gas, 0.5 to 10% by volume of hydrogen chloride (HCl) gas, and 0 of carbon dioxide (CO 2 ) gas are used. It is desirable to use a mixed gas composed of 0.01 to 20.0% by volume and the remainder consisting of hydrogen (H 2 ) gas, and 950 to 1100 ° C. and 5 to 25 kPa. Under these conditions, κ-Al 2 O 3 is generated. However, α-Al 2 O 3 may be generated.

その後、最表面に、例えば、反応ガス組成として、体積%で塩化チタン(TiCl)ガスを0.1〜10体積%、二酸化炭素(CO)ガスを0.01〜10体積%、残りが水素(H)ガスからなる混合ガスを調整して反応チャンバ内に導入し、成膜温度を780〜1100℃、5〜25kPaの条件にてTiCからなる第5層を成膜し、窒化珪素質焼結体の表面に被覆層を成膜した切削インサートを得る。 Thereafter, on the outermost surface, for example, as a reaction gas composition, titanium chloride (TiCl 4 ) gas is 0.1 to 10% by volume, carbon dioxide (CO 2 ) gas is 0.01 to 10% by volume, and the remainder is volume%. A mixed gas composed of hydrogen (H 2 ) gas is adjusted and introduced into the reaction chamber, and a fifth layer composed of TiC is formed under the conditions of a film formation temperature of 780 to 1100 ° C. and 5 to 25 kPa, and silicon nitride A cutting insert having a coating layer formed on the surface of the sintered material is obtained.

そして、所望により、形成した被覆層3表面の少なくとも切刃部を研磨加工する。この研磨加工により、切刃部が平滑に加工され、被削材の溶着を抑制して、さらに耐欠損性に優れた工具となる。   Then, if desired, at least the cutting edge portion on the surface of the formed coating layer 3 is polished. By this polishing process, the cutting edge portion is processed smoothly, the welding of the work material is suppressed, and the tool is further excellent in fracture resistance.

(切削加工物の製造方法)
本実施態様における切削加工物の製造方法について、図2を参照しつつ詳細に説明する。図2Aは、ホルダ42のインサートポケット46に切削インサート1を装着した切削工具41を被削材50に向かってY方向に近づける工程を示す図である。図2Bは、切削工具41を被削材50に接触させる工程を示す図である。図2Cは、切削工具41を被削材50からZ方向に離す工程を示す図である。
(Manufacturing method of cut product)
The manufacturing method of the cut workpiece in this embodiment is demonstrated in detail, referring FIG. FIG. 2A is a diagram illustrating a process of bringing the cutting tool 41 having the cutting insert 1 mounted in the insert pocket 46 of the holder 42 closer to the work material 50 in the Y direction. FIG. 2B is a diagram illustrating a process of bringing the cutting tool 41 into contact with the work material 50. FIG. 2C is a diagram illustrating a process of separating the cutting tool 41 from the work material 50 in the Z direction.

本実施態様における切削加工物の製造方法は、以下の(i)〜(iV)の工程を備える。(i)準備された被削材50の上方に切削工具41を配置する工程(図2A)。
(ii)被削材を、回転軸Oを中心に矢印r方向に回転させ、切削工具41を被削材50に近づける工程(図2A)。本工程は、例えば、切削工具41を取り付けた工作機械のテーブル上に被削材50を固定し、被削材50を回転させた状態で、切削工具41を被削材50に近づけることによって行うことができる。なお、本工程では、被削材50と切削工具41とが相対的に近づけばよく、例えば、切削工具41を固定して被削材50を切削工具41に近づけてもよい。
The manufacturing method of the cut workpiece in this embodiment includes the following steps (i) to (iV). (I) The process of arrange | positioning the cutting tool 41 above the prepared workpiece 50 (FIG. 2A).
(Ii) A step of rotating the work material in the direction of the arrow r about the rotation axis O to bring the cutting tool 41 closer to the work material 50 (FIG. 2A). This step is performed, for example, by fixing the work material 50 on a table of a machine tool to which the cutting tool 41 is attached and bringing the cutting tool 41 closer to the work material 50 in a state where the work material 50 is rotated. be able to. In this step, the work material 50 and the cutting tool 41 may be relatively close to each other. For example, the work material 50 may be brought close to the cutting tool 41 by fixing the cutting tool 41.

(iii)切削工具41をさらに被削材50に近づけることによって、切削工具41の切刃
2を、回転している被削材50の表面の所定の位置に接触させて、被削材50を切削加工する工程(図2B)。
(iii) By bringing the cutting tool 41 closer to the work material 50, the cutting edge 2 of the cutting tool 41 is brought into contact with a predetermined position on the surface of the rotating work material 50, so that the work material 50 is moved. Step of cutting (FIG. 2B).

(iv)切削工具41を被削材50の貫通孔51から離す工程(図2C)。本工程においても、上記(ii)工程と同様に、被削材50と切削工具41とは相対的に離隔すればよく、例えば、切削工具41を固定して、被削材50を切削工具41から離してもよい。   (Iv) A step of separating the cutting tool 41 from the through hole 51 of the work material 50 (FIG. 2C). Also in this step, similarly to the step (ii), the work material 50 and the cutting tool 41 may be relatively separated from each other. For example, the cutting tool 41 is fixed and the work material 50 is removed from the cutting tool 41. May be separated from

以上の工程によって、優れた切削性能を発揮することができる。なお、切削加工を繰り
返し行う場合には、被削材50の回転を保持した状態で、被削材50の異なる箇所に切削工具41の切刃2を接触させる工程を繰り返せばよい。
Through the above steps, excellent cutting performance can be exhibited. In the case of repeatedly performing the cutting process, the step of bringing the cutting blade 2 of the cutting tool 41 into contact with a different part of the work material 50 while keeping the rotation of the work material 50 may be repeated.

出発原料として、平均粒径1.2μmのRe元素化合物として水酸化ランタン(La(OH))粉末を1.76質量%と、平均粒径0.7μmの酸化アルミニウム(Al)粉末を0.4質量%と、平均粒径2.5μmの水酸化マグネシウム(Mg(OH))粉末を0.72質量%と、残部が平均粒径0.3μmの窒化珪素(Si)粉末との割合で調合し、バインダと溶剤とを添加した後、ミルにて72時間、粉砕、混合した。その後、乾燥して溶剤を除去して造粒粉末を作製し、この造粒粉末を98MPaの圧力でSNGN120412の切削工具形状にプレス成形した。 As starting materials, 1.76% by mass of lanthanum hydroxide (La (OH) 2 ) powder as an Re element compound having an average particle size of 1.2 μm and aluminum oxide (Al 2 O 3 ) powder having an average particle size of 0.7 μm 0.4 mass%, 0.72 mass% of magnesium hydroxide (Mg (OH) 2 ) powder having an average particle diameter of 2.5 μm, and the balance of silicon nitride (Si 3 N 4 having an average particle diameter of 0.3 μm) ) After mixing with a powder and adding a binder and a solvent, the mixture was pulverized and mixed in a mill for 72 hours. Thereafter, the solvent was removed by drying to prepare a granulated powder, and this granulated powder was press-molded into a cutting tool shape of SNGN120212 at a pressure of 98 MPa.

脱脂後、この成形体を焼成鉢内にセットする際、Si粉末とSi粉末とMg(OH)粉末との混合粉末を敷き粉として成形体の周囲に充填した状態で成形体を載置して蓋をし、これをカーボン製の円筒内に置いた状態で焼成炉内に載置した。そして、焼成炉内を窒素101kPa(1気圧)に置換して、1200℃まで昇温速度10℃/分で昇温し、その後、1860℃まで2℃/分で昇温した。その後、1920℃、窒素909kPa(9気圧)雰囲気で2時間保持し炉冷した。その後、1600℃、2時間、196MPaの条件で熱間静水圧焼成(HIP)し、さらにこの焼結体の表面を0.3mm厚み研削加工(両頭加工と外周加工)して窒化珪素質焼結体を得た。窒化珪素質焼結体の断面について走査電子顕微鏡(SEM)を用いて5000倍で組織観察を行い、画像解析にて窒化珪素粒子の平均粒径を測定したところ、0.6μmであった。 After degreasing, when this molded body is set in a baking pot, the molded body is filled with a mixed powder of Si 3 N 4 powder, Si powder and Mg (OH) 2 powder as a spread powder around the molded body. It was placed and covered, and placed in a firing furnace in a state where it was placed in a carbon cylinder. Then, the inside of the firing furnace was replaced with 101 kPa (1 atm) of nitrogen, the temperature was increased to 1200 ° C. at a rate of temperature increase of 10 ° C./min, and then the temperature was increased to 1860 ° C. at 2 ° C./min. Thereafter, the furnace was cooled for 2 hours in an atmosphere of 1920 ° C. and nitrogen at 909 kPa (9 atm). Thereafter, hot isostatic pressing (HIP) is performed at 1600 ° C. for 2 hours and 196 MPa, and the surface of the sintered body is further subjected to 0.3 mm thickness grinding (double-head processing and peripheral processing) to sinter silicon nitride. Got the body. The cross-section of the silicon nitride sintered body was observed for a structure at a magnification of 5000 using a scanning electron microscope (SEM), and the average particle diameter of the silicon nitride particles was measured by image analysis. The result was 0.6 μm.

次に、その表面に化学気相蒸着(CVD)法によって被覆層を成膜した。成膜条件は表1、3に示す前処理条件を施した後、表1の条件で各層を成膜した。なお、試料No.1の被覆層の成膜条件は、第1層のTiN層は、表1のTiN2の混合ガス組成を用いて、成膜温度が1010℃、ガス圧が15kPaで成膜し、第2層のAl層は、表1のAl1混合ガス組成を用いて、成膜温度が1005℃、ガス圧が9kPaで成膜し、第3層のTiN層は、表1のTiN1の混合ガス組成を用いて、成膜温度が920℃、ガス圧が30kPaで成膜し、第4層のAl層は、表1のAl2の混合ガス組成を用いて、成膜温度が1005℃、ガス圧が9kPaで成膜し、第5層のTiC層は、表1のTiCの混合ガス組成を用いて、成膜温度が1010℃、ガス圧が15kPaで成膜した。試料No.2〜17については、第1層のTiN層を表1のTiN2で、第2層のAl層を表1のAl1で、第3層のTiN層を表1のTiN1で、第4層のAl層を表1のAl2で、第5層を表1のTiC、TiCNまたはTiN2のいずれかの条件を用いて成膜した。そして、被覆層3の表面をすくい面側から30秒間ブラシ加工して試料No.1〜17の切削工具を作製した。 Next, a coating layer was formed on the surface by chemical vapor deposition (CVD). The film formation conditions were the pretreatment conditions shown in Tables 1 and 3, and then each layer was formed under the conditions shown in Table 1. Sample No. The film formation conditions of the first coating layer are as follows: the first TiN layer is formed using the mixed gas composition of TiN2 in Table 1 at a film formation temperature of 1010 ° C. and a gas pressure of 15 kPa. The Al 2 O 3 layer was formed using the Al 2 O 3 1 mixed gas composition shown in Table 1 at a film forming temperature of 1005 ° C. and a gas pressure of 9 kPa, and the third TiN layer was TiN 1 of Table 1. Using the mixed gas composition, the film formation temperature is 920 ° C. and the gas pressure is 30 kPa, and the Al 2 O 3 layer of the fourth layer uses the mixed gas composition of Al 2 O 3 2 in Table 1. The film was formed at a film formation temperature of 1005 ° C. and a gas pressure of 9 kPa. The fifth TiC layer was formed at a film formation temperature of 1010 ° C. and a gas pressure of 15 kPa using the TiC mixed gas composition shown in Table 1. Filmed. Sample No. For 2-17, a TiN layer of the first layer in TiN2 in Table 1, the the Al 2 O 3 layer of the second layer with Al 2 O 3 1 of Table 1, TIN1 in Table 1 a TiN layer of the third layer in the the Al 2 O 3 layer of the fourth layer in the Al 2 O 3 2 of Table 1, and the fifth layer is deposited using any of the conditions listed in Table 1 of TiC, TiCN or TIN2. Then, the surface of the coating layer 3 was brushed for 30 seconds from the rake face side, and sample No. 1 to 17 cutting tools were produced.

そして、走査電子顕微鏡(SEM)およびEBSD分析を用いて、基体の表面粒子と内部粒子について平均粒子幅を測定した。また、表面粒子については平均粒子長さを測定し、内部粒子についてはアスペクト比を測定した。結果は表2に示した。さらに、被覆層の各層について、各層を構成する粒子の形態、厚み、平均粒子幅を測定した。さらに、柱状粒子については、アスペクト比を測定した。結果は表3に示した。   And the average particle width was measured about the surface particle | grains and internal particle | grains of a base | substrate using the scanning electron microscope (SEM) and EBSD analysis. Moreover, the average particle length was measured for the surface particles, and the aspect ratio was measured for the internal particles. The results are shown in Table 2. Furthermore, for each layer of the coating layer, the form, thickness, and average particle width of the particles constituting each layer were measured. Further, the aspect ratio of the columnar particles was measured. The results are shown in Table 3.

さらに、この切削工具を用いて下記の条件により、断続切削試験を行い、耐欠損性を評価した。
被切削材:FCD−450 スリーブ材
切削速度:500m/分
送り量:0.5mm/rev
切り込み量:2.0mm
切削条件:湿式切削
評価項目:10分加工後、切刃のフランク摩耗量とチッピング状態をデジタルスコープにて観察した。結果は表3に示した。
Furthermore, using this cutting tool, an intermittent cutting test was performed under the following conditions to evaluate fracture resistance.
Workpiece material: FCD-450 Sleeve material Cutting speed: 500 m / min Feed amount: 0.5 mm / rev
Cutting depth: 2.0mm
Cutting conditions: Wet cutting evaluation items: After machining for 10 minutes, the flank wear amount and chipping state of the cutting blade were observed with a digital scope. The results are shown in Table 3.

w1/w2比が0.6よりも大きい試料No.15では、被覆層が剥離した。また、w1/w2比が0.2よりも小さい試料No.16では、被覆層にチッピングが発生した。さらに、L1/w1比が0.6を越える試料No.14では、切刃に欠損が発生した。また、w1/d1比が2.1を超える試料No.17では、被覆層が剥離した。   Sample No. with a w1 / w2 ratio greater than 0.6. In 15, the coating layer was peeled off. In addition, the sample No. w / w2 ratio is smaller than 0.2. In No. 16, chipping occurred in the coating layer. Further, sample No. 1 with an L1 / w1 ratio exceeding 0.6 was obtained. In No. 14, the cutting edge was damaged. Sample No. with a w1 / d1 ratio exceeding 2.1 was obtained. In 17, the coating layer peeled off.

これに対して、本発明に従う被覆層の構成からなる試料No.1〜13では、被覆層のチッピングや剥離がなく、逃げ面摩耗量も小さいものであった。中でも、内部粒子の平均アスペクト比が1.5以上である試料No.1〜3、5〜13では、摩耗量が小さかった
。また、被覆層が、基体側から、TiNからなる第1層と、Alからなる第2層と、TiNからなる第3層と、Alからなる第4層と、TiCからなる第5層とからなる試料No.1〜3、5、7〜13では、摩耗量が小さくなる傾向にあった。さらに、第1層はアスペクト比が2〜10の柱状粒子からなるとともに、第3層はアスペクト比が1.5以下の粒状粒子からなる試料No.1〜5、9、13では、摩耗量が小さくなる傾向にあった。また、第1層の厚みが0.7〜1.3μm、第2層の厚みが0.5〜1.2μm、第3層の厚みが0.1〜0.3μm、第4層の厚みが0.5〜1.2μm、第5層の厚みが0.1〜0.5μmである試料No.1、2、3、5、8、13では、摩耗量が小さくなる傾向にあった。さらに、第1層を構成するTiNの平均粒子幅d1と、第3層を構成するTiNの平均粒子幅d3との比(d3/d1)が0.05〜0.7である試料No.1〜11では、摩耗量が小さくなる傾向にあった。
On the other hand, sample No. having a coating layer structure according to the present invention. In Nos. 1 to 13, there was no chipping or peeling of the coating layer, and the flank wear amount was small. Among them, Sample No. with an average aspect ratio of internal particles of 1.5 or more. In 1-3, 5-13, the amount of wear was small. Further, the coating layer is, from the substrate side, a first layer of TiN, a second layer of Al 2 O 3, a third layer consisting of TiN, and a fourth layer of Al 2 O 3, from TiC Sample No. consisting of the fifth layer. In 1-3, 5, and 7-13, there was a tendency for the amount of wear to become small. Further, the first layer is made of columnar particles having an aspect ratio of 2 to 10, and the third layer is made of Sample No. 2 made of granular particles having an aspect ratio of 1.5 or less. In 1 to 5, 9, and 13, the wear amount tended to be small. The thickness of the first layer is 0.7 to 1.3 μm, the thickness of the second layer is 0.5 to 1.2 μm, the thickness of the third layer is 0.1 to 0.3 μm, and the thickness of the fourth layer is Sample No. 5 having a thickness of 0.5 to 1.2 μm and a fifth layer having a thickness of 0.1 to 0.5 μm. In 1, 2, 3, 5, 8, and 13, the amount of wear tended to be small. Furthermore, the sample No. 1 in which the ratio (d3 / d1) of the average particle width d1 of TiN constituting the first layer to the average particle width d3 of TiN constituting the third layer is 0.05 to 0.7. 1 to 11 tended to reduce the wear amount.

1 切削インサート
2 基体
3 被覆層
4 表面粒子
5 内部粒子
7 第1層(TiN層)
8 第2層(Al層)
9 第3層(TiN層)
10 第4層(Al層)
11 第5層(TiC1−x層)
DESCRIPTION OF SYMBOLS 1 Cutting insert 2 Base | substrate 3 Coating layer 4 Surface particle 5 Internal particle 7 1st layer (TiN layer)
8 Second layer (Al 2 O 3 layer)
9 Third layer (TiN layer)
10 Fourth layer (Al 2 O 3 layer)
11 Fifth layer (TiC x N 1-x layer)

Claims (8)

窒化珪素粒子を主体として含有する窒化珪素質焼結体からなる基体と、該基体の表面に被覆された被覆層とを備える切削工具であって、
前記基体の表面に垂直な断面において、
前記窒化珪素粒子は、前記基体の最表面に存在して前記被覆層と接する表面粒子と、前記被覆層とは接しない内部粒子とからなり、前記表面粒子の前記基体の表面に平行な平均粒子幅w1と、前記内部粒子の前記基体の表面に平行な平均粒子幅w2との比(w1/w2)が0.2〜0.6であり、前記表面粒子の前記平均粒子幅w1と平均粒子長さL1との比(L1/w1)が0.1〜0.6であるとともに、前記被覆層を構成する粒子のうち、前記基体と接触する第1被覆層の前記基体の表面に平行な平均粒子幅d1と、前記表面粒子の平均粒子幅w1との比(w1/d1)が0.8〜2.1である切削工具。
A cutting tool comprising a base composed of a silicon nitride sintered body mainly containing silicon nitride particles, and a coating layer coated on the surface of the base,
In a cross section perpendicular to the surface of the substrate,
The silicon nitride particles are composed of surface particles that are present on the outermost surface of the substrate and are in contact with the coating layer, and internal particles that are not in contact with the coating layer, and are average particles parallel to the surface of the substrate. The ratio (w1 / w2) of the width w1 to the average particle width w2 of the internal particles parallel to the surface of the substrate is 0.2 to 0.6, and the average particle width w1 and average particles of the surface particles The ratio (L1 / w1) to the length L1 is 0.1 to 0.6, and among the particles constituting the coating layer, the first coating layer in contact with the substrate is parallel to the surface of the substrate. The cutting tool whose ratio (w1 / d1) of the average particle width d1 and the average particle width w1 of the said surface particle is 0.8-2.1.
前記基体の表面に垂直な断面において、前記内部粒子の平均アスペクト比が1.5以上である請求項1記載の切削工具。 In vertical cross section on the surface of the substrate, cutting tool according to claim 1, wherein the average aspect ratio of the inner particle is 1.5 or more. 前記被覆層は複数層からなり、前記基体の前記第1被覆層を含む第1層がTiN層からなる請求項1または2記載の切削工具。   The cutting tool according to claim 1 or 2, wherein the coating layer includes a plurality of layers, and the first layer including the first coating layer of the base includes a TiN layer. 前記被覆層は、前記基体側から、TiNからなる前記第1層と、Al2O3からなる第2層と、TiNからなる第3層と、Al2O3からなる第4層と、TiCからなる第5層とからなる請求項3記載の切削工具。   The coating layer includes, from the substrate side, the first layer made of TiN, the second layer made of Al 2 O 3, the third layer made of TiN, the fourth layer made of Al 2 O 3, and the fifth layer made of TiC. The cutting tool according to claim 3, comprising: 前記第1層はアスペクト比が2〜10の柱状粒子からなるとともに、前記第3層はアスペクト比が1.5以下の粒状粒子からなる請求項4記載の切削工具。   The cutting tool according to claim 4, wherein the first layer is made of columnar particles having an aspect ratio of 2 to 10, and the third layer is made of granular particles having an aspect ratio of 1.5 or less. 前記第1層の厚みが0.7〜1.3μm、前記第2層の厚みが0.5〜1.2μm、前記第3層の厚みが0.1〜0.3μm、前記第4層の厚みが0.5〜1.2μm、前記第5層の厚みが0.1〜0.5μmである請求項4または5記載の切削工具。   The thickness of the first layer is 0.7 to 1.3 μm, the thickness of the second layer is 0.5 to 1.2 μm, the thickness of the third layer is 0.1 to 0.3 μm, The cutting tool according to claim 4 or 5, wherein the thickness is 0.5 to 1.2 µm, and the thickness of the fifth layer is 0.1 to 0.5 µm. 前記第1層を構成するTiNの平均粒子幅d1と、前記第3層を構成するTiNの平均粒子幅d3との比(d3/d1)が0.05〜0.7である請求項4乃至6のいずれか記載の切削工具。   The ratio (d3 / d1) between the average particle width d1 of TiN constituting the first layer and the average particle width d3 of TiN constituting the third layer is 0.05 to 0.7. 6. The cutting tool according to any one of 6. 被削材を回転させる工程と、回転している前記被切削物に請求項1乃至7のいずれか記
載の切削工具の前記切刃を接触させる工程と、前記切削工具を前記被削材から離す工程とを備えた切削加工物の製造方法。
A step of rotating the workpiece, a step of bringing the cutting blade of the cutting tool according to any one of claims 1 to 7 into contact with the rotating workpiece, and separating the cutting tool from the workpiece. A method of manufacturing a cut product including a process.
JP2014220403A 2014-10-29 2014-10-29 Cutting tool and manufacturing method Active JP6346066B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014220403A JP6346066B2 (en) 2014-10-29 2014-10-29 Cutting tool and manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014220403A JP6346066B2 (en) 2014-10-29 2014-10-29 Cutting tool and manufacturing method

Publications (2)

Publication Number Publication Date
JP2016087699A JP2016087699A (en) 2016-05-23
JP6346066B2 true JP6346066B2 (en) 2018-06-20

Family

ID=56015953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014220403A Active JP6346066B2 (en) 2014-10-29 2014-10-29 Cutting tool and manufacturing method

Country Status (1)

Country Link
JP (1) JP6346066B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115551818A (en) * 2020-05-07 2022-12-30 Agc株式会社 Method for producing ceramic sintered body and ceramic sintered body

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08112705A (en) * 1994-10-17 1996-05-07 Nissan Motor Co Ltd Cutting tool made of silicon nitride sintered material and manufacturing method thereof
JP4190257B2 (en) * 2001-11-16 2008-12-03 日本特殊陶業株式会社 Silicon nitride tool
JP5527949B2 (en) * 2008-06-26 2014-06-25 京セラ株式会社 Silicon nitride sintered body
EP2703103B1 (en) * 2011-04-28 2016-10-05 Kyocera Corporation Cutting tool
JP5969364B2 (en) * 2012-11-27 2016-08-17 住友電気工業株式会社 WC-based cemented carbide and cutting tool

Also Published As

Publication number Publication date
JP2016087699A (en) 2016-05-23

Similar Documents

Publication Publication Date Title
JP5527415B2 (en) Coated tool
EP1867754A1 (en) Cutting tool made of surface-coated cubic boron nitride-based ultra-high-pressure sintered material
JP5890594B2 (en) Coated tool
JP5902865B2 (en) Coated tool
JP5295325B2 (en) Surface coated cutting tool
JP5153968B2 (en) Cutting tools
CN106856658A (en) Surface-coated cutting tool
JP6419220B2 (en) Coated tool
JP2012196726A (en) Cutting tools
US10370758B2 (en) Coated tool
WO2013042790A1 (en) Surface-coated cutting tool
JP6677876B2 (en) Surface coated cutting tool with excellent welding chipping and peeling resistance
JP2010253594A (en) Surface coating tool
JP6039481B2 (en) Surface covering member
JP2007229821A (en) Surface coated cutting tool
JP2022015073A (en) Coated cutting tool
JP7170965B2 (en) Cemented Carbide and Coated Cemented Carbide
JP5861982B2 (en) Surface coated cutting tool whose hard coating layer exhibits excellent peeling resistance in high-speed intermittent cutting
JP6346066B2 (en) Cutting tool and manufacturing method
JP5898051B2 (en) Coated tool
JP3087503B2 (en) Manufacturing method of surface-coated tungsten carbide based cemented carbide cutting tools with excellent wear and fracture resistance
JP3087504B2 (en) Manufacturing method of surface-coated tungsten carbide based cemented carbide cutting tools with excellent wear and fracture resistance
EP3195960B1 (en) Coated tool
JPH068009A (en) Cutting tool made of surface coating tungsten carbide group super hard alloy excellent in chipping resistance property
JP4569862B2 (en) Surface coated cermet cutting tool with excellent chipping resistance with hard coating layer

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170424

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20180223

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180227

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180409

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180424

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180524

R150 Certificate of patent or registration of utility model

Ref document number: 6346066

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150