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JP6435545B2 - Individual piece manufacturing method - Google Patents
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JP6435545B2 - Individual piece manufacturing method - Google Patents

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JP6435545B2
JP6435545B2 JP2014158089A JP2014158089A JP6435545B2 JP 6435545 B2 JP6435545 B2 JP 6435545B2 JP 2014158089 A JP2014158089 A JP 2014158089A JP 2014158089 A JP2014158089 A JP 2014158089A JP 6435545 B2 JP6435545 B2 JP 6435545B2
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fixing member
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forming
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JP2016035964A (en
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祐太 黒澤
祐太 黒澤
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Lintec Corp
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Description

本発明は、個片体製造方法に関する。   The present invention relates to an individual piece manufacturing method.

半導体ウエハ(以下、ウエハと省略する場合がある)等の板状部材は、例えばSEMI(Semiconductor Equipment and Materials International)規格により、直径が200mmのものは厚みが725μmになるように、直径が300mmのものは厚みが775μmとなるようにと規定されている。このようなウエハは、多数のICやLSI等の電子回路(以下、回路と略称する場合がある)が形成された後、例えば50μm前後にまで研削されて半導体チップ(個片体)となるので、その9割以上が捨てられることになる。   A plate-like member such as a semiconductor wafer (hereinafter sometimes abbreviated as “wafer”) has a diameter of 300 mm so that a thickness of 200 mm is 725 μm, for example, according to SEMI (Semiconductor Equipment and Materials International) standards. The thing is specified to have a thickness of 775 μm. Since such a wafer is formed with a large number of electronic circuits such as ICs and LSIs (hereinafter sometimes abbreviated as circuits), it is ground to, for example, about 50 μm to form semiconductor chips (individual pieces). More than 90% of them will be thrown away.

特許文献1には、半導体基板(板状部材)の両面に不純物を拡散して拡散領域を形成する工程と、上記半導体基板を厚み方向で2分割する工程と、2分割されたそれぞれの半導体基板における拡散領域の反対面を研磨して鏡面化する工程とを備える半導体基板の製造方法が記載されている。そして、2分割されたそれぞれの半導体基板はダイシング工程で個片体とされ、リードフレーム等の被搭載物に搭載される。   Patent Document 1 discloses a step of diffusing impurities on both sides of a semiconductor substrate (plate-like member) to form a diffusion region, a step of dividing the semiconductor substrate into two in the thickness direction, and a semiconductor substrate divided into two. And a step of polishing the opposite surface of the diffusion region to make a mirror surface. Then, each of the two semiconductor substrates divided into two pieces is separated into individual pieces in a dicing process, and is mounted on an object to be mounted such as a lead frame.

特開平1−114044号公報Japanese Patent Laid-Open No. 1-114044

しかしながら、従来の個片体の製造方法で形成された個片体は、被搭載物に搭載する前段で、個々に接着剤が積層されなければならず、個片体を被搭載物に搭載する搭載工程を含めた個片体の製造工程が煩雑になるという課題がある。
また、従来の個片体の製造方法で形成された個片体は、被搭載物に搭載した後、当該個片体を保護するために樹脂や接着剤等の保護部材を積層する場合、個々の個片体に保護部材を積層しなければならず、個片体を被搭載物に搭載する搭載工程を含めた個片体の製造工程が煩雑になるという課題がある。
However, the individual pieces formed by the conventional method of manufacturing the individual pieces must be individually laminated with an adhesive before being mounted on the mounted object, and the individual pieces are mounted on the mounted object. There exists a subject that the manufacturing process of the individual piece including a mounting process becomes complicated.
In addition, the individual pieces formed by the conventional method for manufacturing the individual pieces are individually mounted when a protective member such as a resin or an adhesive is laminated to protect the individual pieces after being mounted on the mounted object. Therefore, there is a problem that the manufacturing process of the individual pieces including the mounting step of mounting the individual pieces on the mounted object becomes complicated.

本発明の目的は、個片体の製造工程を簡素化することができる個片体製造方法を提供することである。   An object of the present invention is to provide an individual piece manufacturing method capable of simplifying the manufacturing process of an individual piece.

上記目的を解決するために、本発明の個片体製造方法は、貫通電極が埋め込まれた板状部材を用意する板状部材用意工程と、前記板状部材の少なくとも一方の面に固定部材を積層する積層工程と、前記固定部材が積層された前記板状部材の側面から当該板状部材の一方または他方の面に沿って切込を形成することで、前記固定部材が積層された面と反対側の面に被搭載部材に当接可能な貫通電極を有する薄切り板状部材を形成する切込形成工程と、前記固定部材と共に前記薄切り板状部材を切断し、一方の面に前記固定部材が積層され反対側の面に前記被搭載部材に当接可能な貫通電極を有する複数の個片体を形成する薄切り板状部材切断工程とを有している。 In order to solve the above-mentioned object, a method for producing a single piece according to the present invention includes a plate-shaped member preparation step of preparing a plate-shaped member in which a through electrode is embedded, and a fixing member on at least one surface of the plate-shaped member. A laminating step for laminating, and a surface on which the fixing member is laminated by forming a cut along one or the other surface of the plate-like member from the side surface of the plate-like member on which the fixing member is laminated; A notch forming step for forming a thin sliced plate-like member having a penetrating electrode capable of contacting the mounted member on the opposite surface, and cutting the thin sliced plate-like member together with the fixed member, and the fixed member on one surface And a thin sliced plate member cutting step of forming a plurality of individual pieces having through electrodes that can be brought into contact with the mounted member on the opposite surface .

また、本発明の個片体製造方法は、貫通電極が埋め込まれた板状部材を用意する板状部材用意工程と、前記板状部材の少なくとも一方の面に、他方の面に貫通することのない溝を形成する溝形成工程と、前記板状部材の少なくとも一方の面に固定部材を積層する積層工程と、前記固定部材が積層された前記板状部材の側面から当該板状部材の一方または他方の面に沿って切込を形成することで、一方の面に前記固定部材が積層され反対側の面に前記被搭載部材に当接可能な貫通電極を有する複数の個片体を形成する切込形成工程と、前記溝に沿って前記固定部材を切断することで、固定部材付きの複数の個片体を形成する固定部材切断工程とを有している。 The individual piece manufacturing method of the present invention includes a plate-shaped member preparing step of preparing a plate-shaped member in which a through electrode is embedded, and at least one surface of the plate-shaped member is penetrated to the other surface. A groove forming step for forming a non-groove, a laminating step for laminating a fixing member on at least one surface of the plate-like member, and one or the other of the plate-like members from the side surface of the plate-like member on which the fixing member is laminated By forming a cut along the other surface, the fixing member is laminated on one surface, and a plurality of individual pieces having through electrodes that can contact the mounted member on the opposite surface are formed. It has the notch formation process and the fixing member cutting process which forms the several piece body with a fixing member by cut | disconnecting the said fixing member along the said groove | channel.

本発明によれば、固定部材付きの複数の個片体を形成することができるため、当該固定部材を接着剤として機能させた場合、個片体を被搭載物に搭載する前段で個々の個片体に接着剤を積層する必要がなくなり、個片体を被搭載物に搭載する搭載工程を含めた個片体の製造工程を簡素化することができる。
また、固定部材付きの複数の個片体を形成することができるため、当該固定部材を保護部材として機能させた場合、個片体を被搭載物に搭載した後、当該個片体を保護するための樹脂や接着剤等の保護部材を個々の個片体に積層する必要がなくなり、個片体を被搭載物に搭載する搭載工程を含めた個片体の製造工程を簡素化することができる。
According to the present invention, since a plurality of individual pieces with a fixing member can be formed, when the fixing member functions as an adhesive, individual pieces are mounted in the previous stage of mounting the individual piece on the mounted object. It is not necessary to laminate an adhesive on the single body, and the manufacturing process of the single body including the mounting process of mounting the single body on the mounted object can be simplified.
In addition, since a plurality of individual pieces with a fixing member can be formed, when the fixing member functions as a protective member, the individual piece is protected after being mounted on the mounted object. It is no longer necessary to laminate protective members such as resin and adhesive for each individual piece, and the manufacturing process of the individual piece including the mounting step of mounting the individual piece on the mounted object can be simplified. it can.

第1実施形態に係る個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method which concerns on 1st Embodiment. 上記実施形態に係る個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method which concerns on the said embodiment. 上記実施形態に係る個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method which concerns on the said embodiment. 第2実施形態に係る個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method which concerns on 2nd Embodiment. 上記実施形態に係る個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method which concerns on the said embodiment. 上記実施形態に係る個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method which concerns on the said embodiment. 変形例の個片体製造方法の工程の説明図。Explanatory drawing of the process of the individual piece manufacturing method of a modification.

(第1実施形態)
各実施形態において基準となる図を挙げることなく、例えば、上、下、左、右、または、前、後といった方向を示した場合は、全て図1(b)を正規の方向(付した番号が適切な向きとなる方向)から観た場合を基準とし、上、下、左、右方向が紙面に平行な方向であり、前が紙面に直交する手前方向、後が紙面に直交する奥方向とする。
(First embodiment)
For example, when a direction such as up, down, left, right, or front and back is shown without giving a reference figure in each embodiment, all of FIG. The direction from the top to the bottom is the direction parallel to the page, the front is the front direction orthogonal to the page, and the back is the back direction orthogonal to the page. And

図1〜図3において、第1実施形態の個片体製造方法は、板状部材としてのウエハWFを用意する板状部材用意工程と、ウエハWFの両面に固定部材10を積層する積層工程と、固定部材10が積層されたウエハWFの側面から当該ウエハWFの一方または他方の面に沿って切込11を形成することで、当該ウエハWFから薄切り板状部材としての薄切りウエハWF1、WF2を形成する切込形成工程と、固定部材10と共に薄切りウエハWF1、WF2を切断し、固定部材10付きの複数の個片体としての半導体チップ(以下、チップと略称する場合がある)CPを形成する薄切り板状部材切断工程とを有している。   1 to 3, the method for manufacturing a single piece according to the first embodiment includes a plate-shaped member preparing step for preparing a wafer WF as a plate-shaped member, and a stacking step for stacking the fixing members 10 on both surfaces of the wafer WF. By forming the notch 11 along one or the other surface of the wafer WF from the side surface of the wafer WF on which the fixing member 10 is laminated, the sliced wafers WF1 and WF2 as the sliced plate-like members are formed from the wafer WF. A notch forming step to be formed, and the sliced wafers WF1 and WF2 are cut together with the fixing member 10 to form semiconductor chips (hereinafter sometimes abbreviated as chips) CP as a plurality of individual pieces with the fixing member 10. A thin-cut plate-like member cutting step.

板状部材用意工程は、図1(a)、(b)に示すように、円盤状のウエハを用意し、その一方の面および他方の面の両面に造形物形成手段としての回路形成手段20によって多数の造形物としての回路CAを形成する(造形物形成工程)。回路CAが形成されたウエハWFの両面には、図1(c)にも示すように、各回路CA間にストリートSTが格子状に形成される。   As shown in FIGS. 1A and 1B, the plate-shaped member preparing step prepares a disk-shaped wafer, and circuit forming means 20 as a modeled object forming means on both one surface and the other surface. A circuit CA as a large number of shaped objects is formed by (a shaped object forming step). On both surfaces of the wafer WF on which the circuit CA is formed, as shown in FIG. 1C, streets ST are formed between the circuits CA in a lattice pattern.

積層工程は、図2(a)に示すように、板状部材用意工程で用意されたウエハWFの両方の面に対し、例えば、樹脂、接着剤、粘着剤、ゴム等によって構成された固定部材10を積層する。固定部材10の積層は、接着や溶着等ウエハWFに対して固定部材10が一時的又は永久的にずれないようにすればよい。   As shown in FIG. 2A, the laminating step is a fixing member made of, for example, resin, adhesive, adhesive, rubber or the like on both surfaces of the wafer WF prepared in the plate-like member preparing step. 10 are stacked. The fixing member 10 may be laminated so that the fixing member 10 is not temporarily or permanently displaced with respect to the wafer WF, such as adhesion or welding.

切込形成工程は、図2(b)に示すように、両方の面に固定部材10が積層されたウエハWFにワイヤソー、レーザ照射装置、ブレード等の切断手段30によって、切込11を形成し、当該ウエハWFを厚み内で2分割して薄切りウエハWF1、WF2を形成する。なお、切断手段30の線径、レーザ幅、ブレード幅を変更することによって薄切りウエハWF1、WF2の厚みを調整することができる。例えば、厚みが775μmのウエハWFに対し、厚みが675μmの線径、レーザ幅、ブレード幅を有する切断手段30を用いれば、それぞれの厚みが50μmの薄切りウエハWF1、WF2を形成することができる。この場合、裏面研削工程が不要となり、個片体の製造工程を短くすることができるが、裏面研削工程で各薄切りウエハWF1、WF2をもっと薄く研削してもよい。   In the notch forming step, as shown in FIG. 2B, the notch 11 is formed on the wafer WF having the fixing member 10 laminated on both surfaces by a cutting means 30 such as a wire saw, a laser irradiation device, and a blade. Then, the wafer WF is divided into two within the thickness to form thinly cut wafers WF1 and WF2. Note that the thickness of the thinly cut wafers WF1 and WF2 can be adjusted by changing the wire diameter, laser width, and blade width of the cutting means 30. For example, if the cutting means 30 having a wire diameter of 675 μm, a laser width, and a blade width is used for a wafer WF having a thickness of 775 μm, thin wafers WF 1 and WF 2 having a thickness of 50 μm can be formed. In this case, the back grinding process is not necessary, and the manufacturing process of the individual pieces can be shortened. However, the thin wafers WF1 and WF2 may be more thinly ground in the back grinding process.

薄切り板状部材切断工程は、図3(a)に示すように、切削ブレード、レーザ照射装置、加圧水等の切断手段BLによって、ストリートSTに沿って固定部材10と共に各薄切りウエハWF1、WF2を切断する。これにより、各薄切りウエハWF1、WF2は、固定部材10付きの複数のチップCPに個片化される。   As shown in FIG. 3A, the sliced plate member cutting process cuts each sliced wafer WF1 and WF2 together with the fixing member 10 along the street ST by a cutting means BL such as a cutting blade, a laser irradiation device, and pressurized water. To do. As a result, the thin wafers WF1 and WF2 are separated into a plurality of chips CP with the fixing member 10.

なお、各チップCPは、チップ搭載工程で接着やボンディング等によってリードフレームや基板等の被搭載部材40に搭載される。すなわち、チップ搭載工程は、図3(b)に示すように、固定部材10付きのチップCPを天地反転し、固定部材10を介して被搭載部材40に載置する。このとき、チップCPの回路CAは、被搭載部材40上の電極50に回路CAの図示しない電極が当接するように配置される。なお、固定部材10が樹脂やゴム等で構成されているものの場合、ヒータ、ヒートパイプの加熱側等の加熱手段で固定部材10を加熱すればよいし、固定部材10が接着剤や粘着剤等で構成されているものの場合、固定部材10付きのチップCPを被搭載部材40に適宜な押圧手段で押圧すればよいし、その他超音波振動等によって被搭載部材40に搭載することができる。すなわち、チップ搭載工程では、固定部材10の性質、材質、組成、構成等に応じて適宜な手段を使用し、当該固定部材10を介してチップCPを被搭載部材40に搭載すればよい。   Each chip CP is mounted on a mounted member 40 such as a lead frame or a substrate by bonding or bonding in a chip mounting process. That is, in the chip mounting step, as shown in FIG. 3B, the chip CP with the fixing member 10 is turned upside down and placed on the mounted member 40 through the fixing member 10. At this time, the circuit CA of the chip CP is arranged such that an electrode (not shown) of the circuit CA is in contact with the electrode 50 on the mounted member 40. In the case where the fixing member 10 is made of resin, rubber, or the like, the fixing member 10 may be heated by a heating means such as a heater or a heat pipe heating side, and the fixing member 10 may be an adhesive, an adhesive, or the like. In this case, the chip CP with the fixing member 10 may be pressed against the mounted member 40 by an appropriate pressing means, or may be mounted on the mounted member 40 by ultrasonic vibration or the like. That is, in the chip mounting process, an appropriate means may be used according to the nature, material, composition, configuration, etc. of the fixing member 10 and the chip CP may be mounted on the mounted member 40 via the fixing member 10.

以上のような第1実施形態によれば、固定部材10付きの複数のチップCPを形成することができるため、当該固定部材10を接着剤として機能させた場合、チップCPを被搭載物40に搭載する前段で個々のチップCPに接着剤を積層する必要がなくなり、チップCPを被搭載物40に搭載する搭載工程を含めたチップCPの製造工程を簡素化することができる。   According to the first embodiment as described above, since a plurality of chips CP with the fixing member 10 can be formed, when the fixing member 10 functions as an adhesive, the chip CP is attached to the mounted object 40. It is not necessary to laminate an adhesive on each chip CP before mounting, and the manufacturing process of the chip CP including the mounting process for mounting the chip CP on the mounted object 40 can be simplified.

(第2実施形態)
図4〜6において、第2実施形態の個片体製造方法は、板状部材としてのウエハWFを用意する板状部材用意工程と、ウエハWFの一方の面および他方の面の両方の面に、反対側の面に貫通することのない溝13を形成する溝形成工程と、ウエハWFの両面に固定部材10を積層する積層工程と、固定部材10が積層されたウエハWFの側面から当該ウエハWFの一方または他方の面に沿って切込11を形成することで、当該ウエハWFから複数の個片体としてのチップCPを形成する切込形成工程と、溝13に沿って固定部材10を切断することで、固定部材10付きの複数のチップCPを形成する固定部材切断工程とを有している。
(Second Embodiment)
4 to 6, the individual piece manufacturing method according to the second embodiment includes a plate-shaped member preparation step of preparing a wafer WF as a plate-shaped member, and both the one surface and the other surface of the wafer WF. A groove forming step of forming a groove 13 that does not penetrate the opposite surface, a stacking step of stacking the fixing member 10 on both surfaces of the wafer WF, and the wafer from the side surface of the wafer WF on which the fixing member 10 is stacked By forming the notch 11 along one or the other surface of the WF, the notch forming step for forming the chips CP as a plurality of individual pieces from the wafer WF, and the fixing member 10 along the groove 13 It has the fixing member cutting process which forms several chip | tip CP with the fixing member 10 by cut | disconnecting.

板状部材用意工程は、図4(a)〜(c)に示すように、円盤状のウエハを用意し、その両面に造形物形成手段としての回路形成手段20によって多数の造形物としての回路CAおよびストリートSTを形成するとともに、貫通電極12を埋め込む。   As shown in FIGS. 4A to 4C, the plate-shaped member preparation step prepares a disk-shaped wafer, and a circuit as a large number of shaped objects by circuit forming means 20 as a shaped article forming means on both surfaces thereof. The CA and street ST are formed, and the through electrode 12 is embedded.

溝形成工程は、図5(a)に示すように、切削ブレード、レーザ照射装置、エッチング等の溝形成手段BLによって、ウエハWFの一方の面のストリートSTに沿って他方の面に貫通することのない溝13を形成する。その後、溝形成手段BLによって、ウエハWF3の他方の面のストリートSTに沿って一方の面および、一方の面から形成された溝13に貫通することのない溝13を形成する。これにより、両面の回路CAの周囲に沿って溝13が形成されたウエハWFが形成される。   In the groove forming step, as shown in FIG. 5A, the other surface is penetrated along the street ST on one surface of the wafer WF by the groove forming means BL such as a cutting blade, a laser irradiation device, and etching. A groove 13 having no gap is formed. Thereafter, the groove forming means BL forms one surface along the street ST of the other surface of the wafer WF3 and the groove 13 that does not penetrate the groove 13 formed from the one surface. Thereby, the wafer WF in which the groove 13 is formed along the periphery of the circuit CA on both sides is formed.

積層工程は、図5(b)に示すように、溝13が形成されたウエハWFの両面に対し、例えば、樹脂、接着剤、粘着剤、ゴム等によって構成された固定部材10を積層する。固定部材10の積層は、第1実施形態と同様にウエハWFに対して固定部材10が一時的又は永久的にずれないようにすればよい。   In the laminating step, as shown in FIG. 5B, the fixing member 10 made of, for example, resin, adhesive, adhesive, rubber or the like is laminated on both surfaces of the wafer WF on which the grooves 13 are formed. The stacking of the fixing member 10 may be performed so that the fixing member 10 does not shift temporarily or permanently with respect to the wafer WF as in the first embodiment.

切込形成工程は、図6(a)に示すように、両方の面に固定部材10が積層されたウエハWFに切断手段30によって切込11を形成し、当該ウエハWFを厚み内で2分割して複数のチップCPを形成する。なお、第1実施形態と同様に、切断手段30の線径、レーザ幅、ブレード幅を変更することによって切断後のチップCPの厚みを調整することができるし、裏面研削工程で各チップCPをもっと薄く研削してもよい。   In the notch forming step, as shown in FIG. 6A, the notch 11 is formed by the cutting means 30 on the wafer WF having the fixing member 10 laminated on both surfaces, and the wafer WF is divided into two within the thickness. Thus, a plurality of chips CP are formed. As in the first embodiment, the thickness of the chip CP after cutting can be adjusted by changing the wire diameter, laser width, and blade width of the cutting means 30, and each chip CP can be adjusted in the back surface grinding step. You may grind thinner.

固定部材切断工程は、図6(b)に示すように、切断手段BLによって、ストリートSTに沿って固定部材10を切断すると、固定部材10付きの複数のチップCPが形成される。   In the fixing member cutting step, as shown in FIG. 6B, when the fixing member 10 is cut along the streets ST by the cutting means BL, a plurality of chips CP with the fixing member 10 are formed.

なお、各チップCPは、チップ搭載工程によって被搭載部材40に搭載される。すなわち、チップ搭載工程は、図6(c)に示すように、固定部材10付きのチップCPにおける切込11によって形成された面に接着剤や樹脂等の接着部材ADを積層する。次いで、接着部材ADを介して固定部材10付きのチップCPを被搭載部材40に載置する。このとき、チップCPの貫通電極12は、被搭載部材40上の電極50に当接するように配置される。なお、チップ搭載工程は、第1実施形態と同様の加熱手段、押圧手段、超音波振動等によって固定部材10付きのチップCPを被搭載部材40に搭載することができる。   Each chip CP is mounted on the mounted member 40 by a chip mounting process. That is, in the chip mounting step, as shown in FIG. 6C, an adhesive member AD such as an adhesive or a resin is laminated on the surface formed by the cuts 11 in the chip CP with the fixing member 10. Next, the chip CP with the fixing member 10 is placed on the mounted member 40 via the adhesive member AD. At this time, the through electrode 12 of the chip CP is disposed so as to contact the electrode 50 on the mounted member 40. In the chip mounting step, the chip CP with the fixing member 10 can be mounted on the mounted member 40 by the same heating means, pressing means, ultrasonic vibration and the like as in the first embodiment.

以上のような第2実施形態によれば、固定部材10付きの複数のチップCPを形成することができるため、当該固定部材10を保護部材として機能させた場合、チップCPを被搭載物40に搭載した後、当該チップCP保護するための樹脂や接着剤等の保護部材を個々のチップCPに積層する必要がなくなり、チップCPを被搭載物に搭載する搭載工程を含めたチップCPの製造工程を簡素化することができる。   According to the second embodiment as described above, a plurality of chips CP with the fixing member 10 can be formed. Therefore, when the fixing member 10 functions as a protection member, the chip CP is attached to the mounted object 40. After mounting, there is no need to stack a protective member such as a resin or adhesive for protecting the chip CP on each chip CP, and the chip CP manufacturing process including the mounting process for mounting the chip CP on the mounted object Can be simplified.

本発明における手段および工程は、それら手段および工程について説明した動作、機能または工程を果たすことのできる限りなんら限定されるものではなく、まして、前記実施形態で示した単なる1実施形態の構成物や工程に全く限定されるものではない。例えば、積層工程は、板状部材の少なくとも一方の面に固定部材を積層可能な工程であれば、出願当初の技術常識に照らし合わせてその範囲内であればなんら限定されることはない(他の手段および工程についての説明は省略する)。   The means and steps in the present invention are not limited in any way as long as the operations, functions, or steps described for these means and steps can be performed. The process is not limited at all. For example, the laminating process is not limited as long as it is within the range in view of the technical common sense at the beginning of the application as long as the fixing member can be laminated on at least one surface of the plate member. The description of the means and process is omitted).

板状部材用意工程において、一方または他方の面のいずれかに回路形成手段20によって多数の回路CAを形成してもよい。この場合、第1実施形態では、積層工程において一方または他方の面のうち、回路CAが形成された面にだけ固定部材10を積層し、切込形成工程でウエハWFを2分割し、固定部材10が積層された側の薄切りウエハのみ薄切り板状部材切断工程およびチップ搭載工程を経て被搭載部材40に搭載される。一方、切込形成工程で形成された回路CAが形成されていない側の薄切りウエハは、再度板状部材用意工程で多数の回路CAが形成され、積層工程において当該回路上に固定部材10が積層された後、薄切り板状部材切断工程およびチップ搭載工程を経て被搭載部材40に搭載される。
板状部材用意工程において、一方または他方の面のいずれかに回路形成手段20によって多数の回路CAを形成した場合、第2実施形態では、溝形成工程および積層工程において一方または他方の面のうち、回路CAが形成された面にだけ溝13を形成して固定部材10を積層し、切込形成工程でウエハWFを2分割し、固定部材10が積層された側のチップCPのみ固定部材切断工程およびチップ搭載工程を経て被搭載部材40に搭載される。一方、切込形成工程で形成された回路CAが形成されていない側のウエハは薄切りウエハとなり、再度板状部材用意工程で多数の回路CAが形成され、積層工程において当該回路上に固定部材10が積層された後、薄切り板状部材切断工程およびチップ搭載工程を経て被搭載部材40に搭載される。
板状部材用意工程において、少なくとも一方の面に予め回路CA及びストリートSTが形成されたウエハWFを用意してもよく、この場合、回路形成手段による造形物形成工程が不要となる。
ウエハWFは、725μm、625μm等どんな厚みでもよいし、300mm、450mm等どんな直径でもよい。
ウエハWFは、シリコン半導体ウエハ、SiC(シリコンカーバイド)ウエハ、サファイアウエハ、化合物半導体ウエハ等が例示できる。化合物半導体ウエハは、例えばGaP(リン化ガリウム)ウエハ、GaA(ヒ化ガリウム)ウエハ、InP(リン化インジウムガリウム)ウエハ、GaN(窒化ガリウム)ウエハ等が挙げられる。
ウエハWFの形状は、円形、D型、楕円形、四角形、その他の多角形等どんな形でもよい。
ウエハWFに形成される回路は、一方の面と他方の面とで大きさやパターンが異なっていてもよい。
ウエハWFには、Vノッチやオリエンテーションフラット等の結晶方位を示す部位があってもよい。
板状部材は、ウエハWF以外に、例えば、回路基板、ベース基板、リードフレーム、ガラス板、鋼板、陶器、木板または樹脂板等、任意の形態の部材や物品等でよく、何ら限定されるものではない。従って、個片体も、それら任意の形態の部材や物品等から切断されたものでよく、何ら限定されるものではない。
造形物は、回路CA以外に、所定の図柄、絵、模様、文字、数字、立体図、凹凸模様またはそれらを組み合わせたもの等、何ら限定されることはなく、造形物形成手段も、それらを形成できるものであれば何ら限定されることはない。
In the plate-like member preparation step, a number of circuits CA may be formed by the circuit forming means 20 on either one or the other surface. In this case, in the first embodiment, the fixing member 10 is stacked only on the surface on which the circuit CA is formed in one or the other surface in the stacking step, and the wafer WF is divided into two in the notch forming step. Only the sliced wafer on the side where 10 is laminated is mounted on the mounted member 40 through the sliced plate member cutting process and the chip mounting process. On the other hand, the thin sliced wafer on the side where the circuit CA is not formed is formed again in the plate-like member preparation process, and the fixing member 10 is laminated on the circuit in the lamination process. Then, it is mounted on the mounted member 40 through a sliced plate member cutting process and a chip mounting process.
In the plate-like member preparation step, when a large number of circuits CA are formed on either one or the other surface by the circuit forming means 20, in the second embodiment, one of the other surfaces in the groove forming step and the laminating step. The groove 13 is formed only on the surface on which the circuit CA is formed, the fixing member 10 is stacked, the wafer WF is divided into two in the incision forming process, and only the chip CP on the side where the fixing member 10 is stacked is cut. It mounts in the to-be-mounted member 40 through a process and a chip | tip mounting process. On the other hand, the wafer on the side where the circuit CA formed in the notch forming process is not formed becomes a thin-cut wafer, and a large number of circuits CA are formed again in the plate member preparing process, and the fixing member 10 is formed on the circuit in the laminating process. Are stacked, and then mounted on the mounted member 40 through a sliced plate member cutting process and a chip mounting process.
In the plate-like member preparation step, a wafer WF in which the circuit CA and the street ST are formed in advance on at least one surface may be prepared. In this case, the formation object forming step by the circuit forming unit is unnecessary.
The wafer WF may have any thickness such as 725 μm and 625 μm, and may have any diameter such as 300 mm and 450 mm.
Examples of the wafer WF include a silicon semiconductor wafer, a SiC (silicon carbide) wafer, a sapphire wafer, and a compound semiconductor wafer. Examples of the compound semiconductor wafer include a GaP (gallium phosphide) wafer, a GaA (gallium arsenide) wafer, an InP (indium gallium phosphide) wafer, and a GaN (gallium nitride) wafer.
The shape of the wafer WF may be any shape such as a circle, a D shape, an ellipse, a rectangle, and other polygons.
The circuit formed on the wafer WF may have a different size and pattern on one surface and the other surface.
The wafer WF may have a portion showing a crystal orientation such as a V notch and an orientation flat.
In addition to the wafer WF, the plate-like member may be any form of member or article, such as a circuit board, a base board, a lead frame, a glass plate, a steel plate, ceramics, a wooden plate, or a resin plate, and is not limited at all. is not. Therefore, the individual piece may be cut from any member or article in any form, and is not limited at all.
The modeled object is not limited to a circuit pattern CA, a predetermined pattern, a picture, a pattern, a character, a number, a three-dimensional diagram, a concavo-convex pattern, or a combination thereof. There is no limitation as long as it can be formed.

積層工程において、図7に示すように、ウエハWF全体に固定部材10を積層してもよい。   In the stacking step, the fixing member 10 may be stacked on the entire wafer WF as shown in FIG.

切込形成工程およびにおいて、切断手段30の線径、レーザ幅、ブレード幅を675μm以外の他の厚みとしてもよく、例えば、厚みが625μmのウエハWFに対し、厚みが565μmの線径、レーザ幅、ブレード幅を有する切断手段を用いれば、それぞれの厚みが30μmの薄切りウエハWF1、WF2やチップCPを形成することができる。
切込形成工程または裏面研削工程後の薄切りウエハWF1、WF2又はチップCPの厚みは、20μm、30μm、60μm、100μm等、どんな厚みでもよい。
切込形成工程において、切断手段30でウエハWFを厚み内で3以上に分割してもよいし、切断手段30を2体以上並べて使用してもよい。
In the notch forming process and the cutting means 30, the wire diameter, laser width, and blade width may be other than 675 μm. For example, for a wafer WF having a thickness of 625 μm, the wire diameter and laser width are 565 μm. If a cutting means having a blade width is used, it is possible to form thin cut wafers WF1, WF2 and chips CP each having a thickness of 30 μm.
The thickness of the thinly cut wafers WF1, WF2 or chip CP after the cut forming process or the back grinding process may be any thickness such as 20 μm, 30 μm, 60 μm, 100 μm, or the like.
In the incision forming step, the cutting means 30 may divide the wafer WF into three or more within the thickness, or two or more cutting means 30 may be used side by side.

薄切り板状部材切断工程において、レーザや等でストリートSTに沿う脆弱な改質層を薄切りウエハに形成し、当該薄切りウエハを引っ張ったり折り曲げたりして固定部材10付きの複数のチップCPを形成してもよい。なお、改質層を形成するにあたり、ウエハWFを脆弱にできる薬品や化学物質等の脆弱化部材を使用してもよい。   In the sliced plate member cutting step, a weakly modified layer along the street ST is formed on the sliced wafer with a laser or the like, and the plurality of chips CP with the fixing members 10 are formed by pulling or bending the sliced wafer. May be. In forming the modified layer, a weakening member such as a chemical or a chemical substance that can weaken the wafer WF may be used.

溝13の深さは任意に決定できる。
溝形成工程の代わりに、レーザ等でストリートSTに沿う脆弱な改質層を形成する改質層形成工程としてもよい。このような改質層形成工程で形成する改質層は、一方の面と他方の面との両面から形成し、相互に接続してもよいし、接続しなくてもよい。
溝形成工程において、切込11と干渉しない深さの溝13すなわち、切込11が横切ることのない深さの溝13を形成し、切込形成工程の後に固定部材10を引っ張ったり、裏面を研削したりして複数のチップCPに分割してもよい。
The depth of the groove 13 can be arbitrarily determined.
Instead of the groove forming step, a modified layer forming step of forming a fragile modified layer along the street ST with a laser or the like may be used. The modified layer formed in such a modified layer forming step is formed from both surfaces of one surface and the other surface and may be connected to each other or may not be connected.
In the groove forming step, a groove 13 having a depth that does not interfere with the notch 11, that is, a groove 13 having a depth that the notch 11 does not cross, is formed, and the fixing member 10 is pulled after the notch forming step, It may be ground or divided into a plurality of chips CP.

固定部材切断工程において、レーザ等でストリートSTに沿う脆弱な改質層を固定部材10に形成し、当該固定部材10を引っ張ったり折り曲げたりして固定部材10付きの複数のチップCPを形成してもよい。   In the fixing member cutting step, a fragile modified layer along the street ST is formed on the fixing member 10 with a laser or the like, and the plurality of chips CP with the fixing member 10 are formed by pulling or bending the fixing member 10. Also good.

10 固定部材
11 切込
13 溝
WF 半導体ウエハ(板状部材)
WF1、WF2 薄切り半導体ウエハ(薄切り板状部材)
CP 半導体チップ(個片体)
10 fixing member 11 notch 13 groove WF semiconductor wafer (plate-like member)
WF1, WF2 Thin sliced semiconductor wafer (thin sliced plate member)
CP semiconductor chip (single piece)

Claims (2)

貫通電極が埋め込まれた板状部材を用意する板状部材用意工程と、
前記板状部材の少なくとも一方の面に固定部材を積層する積層工程と、
前記固定部材が積層された前記板状部材の側面から当該板状部材の一方または他方の面に沿って切込を形成することで、前記固定部材が積層された面と反対側の面に被搭載部材に当接可能な貫通電極を有する薄切り板状部材を形成する切込形成工程と、
前記固定部材と共に前記薄切り板状部材を切断し、一方の面に前記固定部材が積層され反対側の面に前記被搭載部材に当接可能な貫通電極を有する複数の個片体を形成する薄切り板状部材切断工程とを有していることを特徴とする個片体製造方法。
A plate-shaped member preparation step of preparing a plate-shaped member in which the through electrode is embedded ;
A laminating step of laminating a fixing member on at least one surface of the plate-like member;
By forming a notch along one or the other surface of the plate member from the side surface of the plate member on which the fixing member is stacked, the surface opposite to the surface on which the fixing member is stacked is covered. A notch forming step of forming a thin sliced plate-like member having a penetrating electrode capable of contacting the mounting member ;
The sliced plate-like member is cut together with the fixing member, and the sliced member is formed with a plurality of individual pieces each having a through electrode that can be abutted against the mounted member on the opposite surface with the fixing member laminated on one surface. It has a plate-shaped member cutting process, The individual piece manufacturing method characterized by the above-mentioned.
貫通電極が埋め込まれた板状部材を用意する板状部材用意工程と、
前記板状部材の少なくとも一方の面に、他方の面に貫通することのない溝を形成する溝形成工程と、
前記板状部材の少なくとも一方の面に固定部材を積層する積層工程と、
前記固定部材が積層された前記板状部材の側面から当該板状部材の一方または他方の面に沿って切込を形成することで、一方の面に前記固定部材が積層され反対側の面に前記被搭載部材に当接可能な貫通電極を有する複数の個片体を形成する切込形成工程と、
前記溝に沿って前記固定部材を切断することで、固定部材付きの複数の個片体を形成する固定部材切断工程とを有していることを特徴とする個片体製造方法。
A plate-shaped member preparation step of preparing a plate-shaped member in which the through electrode is embedded ;
A groove forming step of forming a groove not penetrating the other surface on at least one surface of the plate-like member;
A laminating step of laminating a fixing member on at least one surface of the plate-like member;
By forming a cut along one or the other surface of the plate member from the side surface of the plate member on which the fixing member is stacked, the fixing member is stacked on one surface and on the opposite surface A notch forming step of forming a plurality of individual pieces having penetrating electrodes capable of coming into contact with the mounted member ;
A method for producing an individual piece, comprising: a fixing member cutting step for forming a plurality of individual pieces with a fixing member by cutting the fixing member along the groove.
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