JP6512426B2 - Substrate processing equipment - Google Patents

Description

  The present invention relates to a substrate processing apparatus for processing a substrate. Substrates to be processed include, for example, semiconductor wafers, substrates for liquid crystal displays, substrates for plasma displays, substrates for FED (Field Emission Display), substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, photomasks Substrates, ceramic substrates, substrates for solar cells, and the like.

  Patent Document 1 discloses a single-wafer substrate processing apparatus that processes substrates such as semiconductor wafers one by one. The substrate processing apparatus includes a processing liquid nozzle for discharging a processing liquid supplied to a substrate, and an open / close valve for controlling supply and stop of supply of the processing liquid to the processing liquid nozzle A liquid valve) and a flow control valve for changing the flow rate of the processing liquid supplied to the processing liquid nozzle. The flow control valve is a motorized valve including a motor for moving a needle that changes the opening of the flow control valve.

JP, 2010-123709, A

In the substrate processing apparatus, an on-off valve and a flow rate adjustment valve are provided. More moving parts not only increase costs and require more space, but also increase the possibility of particles contaminating the substrate.
In the substrate processing apparatus, it is conceivable to omit the on-off valve and cause the flow rate adjustment valve to execute the supply and stop of the supply of the treatment liquid and the adjustment of the flow rate. However, in this case, when the supply of the processing liquid to the processing liquid nozzle is stopped, the conical valve body (needle) rubs against the conical valve seat, and therefore the particles of the valve body and the valve seat are generated. It will

  Therefore, one object of the present invention is to execute the supply and stop of the treatment liquid to the treatment liquid nozzle and the adjustment of the flow rate of the treatment liquid supplied to the treatment liquid nozzle with one valve while reducing particles. An object of the present invention is to provide a substrate processing apparatus capable of

The invention according to claim 1 for achieving the above object is directed to a processing liquid nozzle for discharging a processing liquid supplied to a substrate, a supply and stop of the processing liquid to the processing liquid nozzle, and the processing liquid nozzle. A motor-operated valve for adjusting the flow rate of the supplied processing liquid, and a control device for controlling the motor-operated valve, wherein the motor-operated valve has an inlet through which the processing liquid flows, and a processing which has flowed into the inlet An outlet for discharging liquid, an opening disposed between the inlet and the outlet, a flow path extending from the inlet to the outlet through the opening, and an annular valve surrounding the opening A body provided with a seat, a closed position in contact with the valve seat and blocking the flow of treatment liquid from the inlet to the outlet, away from the valve seat, the flow through the opening Between an open position where the processing solution flows from the inlet to the outlet The valve body is moved between the valve body movable with respect to the main body, the closed position and the open position, and any from the closed position to the open position according to a command from the control device An electric actuator for positioning the valve body at a position, the valve body being spaced apart from the cone portion inserted into the opening and surrounding the pyramid portion, and facing the valve seat An annular portion, wherein the pyramidal portion includes a conical outer peripheral surface which is not in contact with the main body at any position from the closed position to the open position; and the annular portion includes the annular portion; pressed perpendicularly to the valve seat in position, saw including an annular tip away from the valve seat at a position other than the closed position, the edge of the opening and the valve seat is disposed on the same plane, It is a substrate processing apparatus.
According to the second aspect of the present invention, the process liquid nozzle for discharging the process liquid supplied to the substrate, the supply and stop of the supply of the process liquid to the process liquid nozzle, and the flow rate of the process liquid supplied to the process liquid nozzle And a controller for controlling the motor-operated valve, wherein the motor-operated valve has an inlet through which the treatment liquid flows, and an outlet through which the treatment liquid flowing into the inlet is discharged. An opening disposed between the inlet and the outlet, a flow path extending from the inlet to the outlet through the opening, and an annular valve seat surrounding the opening A main body, a closed position in contact with the valve seat and blocking the flow of treatment liquid from the inlet to the outlet, away from the valve seat, processing from the inlet to the outlet through the opening Movable relative to the body between an open position where the fluid flows And the valve body is moved between the closed position and the open position, and the valve body is positioned at an arbitrary position from the closed position to the open position according to a command from the control device. The valve body includes a pyramidal part inserted into the opening and an annular part which surrounds the pyramidal part at an interval and faces the valve seat, The pyramidal portion includes a conical outer peripheral surface which is not in contact with the main body at any position from the closed position to the open position, and the annular portion is perpendicular to the valve seat in the closed position. And the annular tip which is released from the valve seat at a position other than the closed position, the maximum value of the outer diameter of the conical portion being smaller than the diameter of the opening, the edge of the opening being the closed end The valve body is positioned at any position from the position to the open position. Even when you are, it is located around the cone portion, which is a substrate processing apparatus.

According to these inventions, an annular portion facing to the cone portion that is inserted into the opening and the valve seat is provided in the valve body. The electric actuator moves the valve body between the closed position and the open position in response to a command from the control device. When the electric actuator moves the valve body, the pyramidal portion and the annular portion move.
The movement of the cone portion continuously changes the flow passage area of the opening (the area of the portion not occupied by the cone portion). The flow rate of the processing liquid supplied to the processing liquid nozzle is automatically adjusted by the electric actuator. In addition, when the electric actuator positions the valve body in the closed position, the annular portion contacts the valve seat, and when the electric actuator positions the valve body in a position other than the closed position, the annular portion separates from the valve seat. The supply of the processing liquid to the processing liquid nozzle and the supply stop of the processing liquid are automatically switched by the electric actuator. Therefore, the supply and the stop of the supply of the treatment liquid to the treatment liquid nozzle and the adjustment of the flow rate of the treatment liquid supplied to the treatment liquid nozzle can be performed by one valve (electric valve).

  The outer peripheral surface of the pyramidal portion is not in contact with the main body at any position from the closed position to the open position. Therefore, due to the movement of the valve body, the cone portion does not rub against the main body, and particles are not generated. Also, the annular tip of the annulus is vertically pressed against the valve seat in the closed position. Therefore, particles are less likely to be generated as compared to the case where a conical valve body is pressed against a conical or cylindrical valve seat. Therefore, particles generated in the flow path can be reduced, and the cleanliness of the processing liquid supplied to the substrate can be increased.

The invention according to claim 3 is the substrate processing apparatus according to claim 1 or 2 , wherein the valve seat and the annular tip are both flat.
According to the invention, the flat annular tip is pressed vertically against the flat valve seat. This brings the valve seat and the annular tip into surface contact. Therefore, compared with the case where the valve body and the valve seat are in line contact, the flow of the processing liquid can be more reliably shut off. Furthermore, since the flat surfaces are pressed vertically, particles are less likely to be generated as compared with the case where a conical valve body is pressed against a conical or cylindrical valve seat. Thereby, particles generated in the flow path can be reduced.

The invention according to claim 4 is the substrate processing apparatus according to any one of claims 1 to 3 , wherein an inner diameter of the annular tip portion is larger than a diameter of the opening.
If the contact area of the valve body and the valve seat is too small, sufficient sealing can not be ensured. On the other hand, if the contact area of the valve body and the valve seat is too large, a large pressure is required to close the valve. Therefore, it is preferable that the contact area of the valve body and the valve seat be as small as possible within the range in which sufficient sealing performance can be secured. According to the present invention, since the inner diameter of the annular tip is larger than the diameter of the opening, the contact area of the valve seat and the annular tip can be reduced as compared with the case where the inner diameter of the annular tip is smaller than the diameter of the opening. Therefore, particles can be reduced while more reliably blocking the flow of the treatment liquid.

According to a fifth aspect of the present invention, the substrate processing apparatus further includes a flow meter for detecting the flow rate of the processing liquid passing through the motorized valve, and the control device further includes the valve body located in the closed position. The distance in the radial direction (direction perpendicular to the center line of the cone) from the edge of the opening to the cone is the axial direction (direction along the center of the cone) from the annular part to the valve seat When moving to a target position corresponding to a target value of the flow rate of the processing liquid passing through the motor-operated valve via an intermediate position equal to the distance The first constant velocity control is performed to move the valve body at a constant moving speed from the second position to the intermediate position, and the valve element is moved based on the detection value of the flow meter from the intermediate position to the target position performs feedback control to claim 1-4 The substrate processing apparatus according to any one of the above.

A representative example of feedback control is PID control that performs proportional operation, integral operation, and differential operation. The feedback control is not limited to PID control, and may be proportional control that performs proportional operation or PI control that performs proportional operation and integral operation.
According to the present invention, when the valve body is disposed at a position other than the closed position, the treatment liquid flowing into the inflow port has the clearance between the annular portion and the valve seat, the rim of the pyramid portion and the opening, Pass through the gaps between the At a position closer to the closed position than the intermediate position, the flow passage area between the annular portion and the valve seat is determined by the flow passage area of the opening (the flow passage area defined by the pyramid portion and the edge of the opening) Because it is also small, it regulates the flow rate of the processing liquid passing through the motorized valve. On the other hand, at the position closer to the open position than the intermediate position, the flow passage area of the opening is smaller than the flow passage area between the annular portion and the valve seat, so the flow rate of the processing liquid passing through the motorized valve is limited Do.

  The control device performs first constant velocity control to move the valve body at a constant moving speed from the closed position to the intermediate position. And a control device performs feedback control which moves a valve element based on a detection value of a flow meter from an intermediate position to a target position. That is, since the target position is in the range where the flow passage area of the opening regulates the flow rate of the treatment liquid, the control device is in the range where the flow passage area between the annular portion and the valve seat limits the flow rate of the treatment liquid. Move the valve body out quickly. Therefore, compared with the case where feedback control is performed from the beginning, the time until the measured value of flow rate stabilizes can be shortened.

According to a sixth aspect of the present invention, the substrate processing apparatus further includes a flow meter for detecting the flow rate of the processing liquid passing through the motorized valve, and the control device is configured to extend from the edge of the opening to the cone portion. When moving the valve body positioned closer to the open position than an intermediate position where the radial distance is equal to the axial distance from the annular portion to the valve seat, to the closed position via the intermediate position: From the position on the open position side to the intermediate position rather than the intermediate position, a second constant velocity control is performed to move the valve body at a constant moving speed, and at least a part from the intermediate position to the closed position The substrate processing apparatus according to any one of claims 1 to 5 , wherein deceleration control is performed to move the valve body at a moving speed lower than the moving speed of the valve body in the second constant speed control. .

  According to the present invention, the control device performs the second constant velocity control for moving the valve body at a constant moving speed from the initial position (the position closer to the open position than the intermediate position) to the intermediate position. Then, the control device performs deceleration control to move the valve body at a moving speed lower than the moving speed of the valve body in the second constant speed control at least at a part from the intermediate position to the closed position. Thus, the moving speed immediately before the valve body contacts the valve seat is reduced, so that the impact when the valve body contacts the valve seat can be reduced, and particles generated by the contact between the valve body and the valve seat can be further reduced. It can be reduced.

It is the schematic diagram which looked at the inside of the processing unit with which the substrate processing apparatus concerning one Embodiment of this invention was equipped horizontally. It is a sectional view for explaining the 1st valve. It is an enlarged view of the valve body with which the 1st valve was equipped. It is a graph which shows the relation between the position of a valve element, and the channel area of the 1st valve. It is a sectional view of the 1st valve which shows the state where a valve body is located in a closed position. It is sectional drawing of the 1st valve which shows the state which the valve body has been located in the middle position. It is sectional drawing of the 1st valve which shows the state which the valve body is located in the open position. It is a graph which shows the time change of the position of the disc when a control device opens the 1st valve. It is a graph which shows the time change of the position of the disc when a control device closes the 1st valve.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic view of the inside of a processing unit 2 provided in a substrate processing apparatus 1 according to an embodiment of the present invention.
The substrate processing apparatus 1 is a sheet-fed apparatus which processes disk-like substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 includes a plurality of processing units 2 that process a substrate W with a processing liquid, a transfer robot (not shown) that transfers the substrate W to the processing unit 2, and a control device 3 that controls the substrate processing apparatus 1. including.

The processing unit 2 directs the processing liquid toward the substrate W held by the spin chuck 4 and the spin chuck 4 rotated about a vertical rotation axis A1 passing through the central portion of the substrate W while holding the substrate W horizontally. And the processing liquid nozzle 11 to be discharged.
The spin chuck 4 includes a disk-shaped spin base 6 held in a horizontal posture, a plurality of chuck pins 5 for holding the substrate W in a horizontal posture above the spin base 6, and a central portion of the spin base 6 It includes a spin shaft 7 extending downward, and a spin motor 8 for rotating the spin base 6 and the chuck pin 5 around the rotation axis A1 by rotating the spin shaft 7. The spin chuck 4 is not limited to a clamping type chuck that brings the plurality of chuck pins 5 into contact with the peripheral end face of the substrate W, but adsorbs the back surface (bottom surface) of the substrate W which is a non-device forming surface to the top surface of the spin base 6 It may be a vacuum type chuck which holds the substrate W horizontally by the above.

  The substrate processing apparatus 1 includes a processing liquid pipe 12 for guiding the processing liquid to the processing liquid nozzle 11, a first pipe 13 for guiding the first chemical liquid to the processing liquid pipe 12, and a second pipe for guiding the second chemical liquid to the processing liquid pipe 12. 16 and a third pipe 19 which leads pure water (deionized water) to the processing liquid pipe 12. The substrate processing apparatus 1 further includes a first valve 14 interposed in the first pipe 13, a first flow meter 15 for detecting the flow rate of the liquid passing through the first valve 14, and a second pipe 16. Through the second valve 17, the second flow meter 18 for detecting the flow rate of the liquid passing through the second valve 17, the third valve 20 installed in the third pipe 19, and the third valve 20 And a third flow meter 21 for detecting the flow rate of the liquid.

  The first valve 14, the second valve 17, and the third valve 20 are all electrically operated valves. The control device 3 opens and closes each of the valves 14, 17 and 20. The control device 3 further changes the flow rate of the liquid passing through each valve 14, 17, 20 by controlling the opening degree of each valve 14, 17, 20. The detection values of the first flow meter 15, the second flow meter 18, and the third flow meter 21 are input to the control device 3. The control device 3 obtains a measurement value of the flow rate based on the detection value of each flow meter 15, 16, 21. The control device 3 changes the opening degree of each valve 14, 17, 20 based on the detection value of each flow meter 15, 16, 21 to obtain the measured value of the flow (measured flow value) as the target value of the flow Make it close to or match the target flow rate value).

  An example of the first chemical solution is ammonia water. An example of the second chemical solution is hydrogen peroxide water. When each of the valves 14, 17 and 20 is opened, the ammonia water of the flow rate corresponding to the opening degree of the first valve 14, the hydrogen peroxide solution of the flow rate corresponding to the opening degree of the second valve 17, and the third valve 20 The pure water of the flow rate corresponding to the opening degree of is supplied to the processing liquid pipe 12. Thereby, SC-1 which is a mixed solution of ammonia water, hydrogen peroxide solution, and water is generated in the processing liquid pipe 12 and discharged from the processing liquid nozzle 11. Further, when the first valve 14 and the second valve 17 are closed and the third valve 20 is opened, pure water is supplied to the treatment liquid pipe 12 and discharged from the treatment liquid nozzle 11.

When processing the substrate W, the control device 3 rotates the substrate W by controlling the spin chuck 4. In this state, the control device 3 causes the processing liquid nozzle 11 to discharge SC-1 toward the top surface of the rotating substrate W. Thereby, SC-1 which is an example of a chemical | medical solution is supplied to the whole upper surface of the board | substrate W (chemical | medical solution supply process).
After stopping the discharge of SC-1 from the processing liquid nozzle 11, the control device 3 causes the processing liquid nozzle 11 to discharge the pure water, which is an example of the rinse liquid, toward the rotating substrate W. Thus, pure water is supplied to the entire upper surface of the substrate W, and SC-1 adhering to the substrate W is washed away (rinsing liquid supply process).

The control device 3 causes the spin chuck 4 to rotate the substrate W at high speed after stopping the discharge of the pure water from the processing liquid nozzle 11. Thereby, the pure water adhering to the substrate W is shaken off around the substrate W by the centrifugal force. Therefore, pure water is removed from the substrate W, and the substrate W is dried (drying step).
FIG. 2 is a cross-sectional view for explaining the first valve 14 which is an example of the motor-operated valve. Hereinafter, the first valve 14 will be described. Although the description of the second valve 17 and the third valve 20 is omitted, the second valve 17 and the third valve 20 both have the same configuration as the first valve 14.

  As shown in FIG. 2, the first valve 14 includes a main body 25 in which a flow passage 30 for introducing a treatment liquid is formed, and a valve body 31 for opening and closing the flow passage 30. The first valve 14 further includes an electric motor 23 generating power for moving the valve body 31 in the axial direction X1 (direction along the center line of the pyramid portion 33), and a straight line connecting the valve body 31 to rotate the electric motor 23. It includes a motion conversion mechanism 22 for converting into motion, and a rotation angle sensor 24 for detecting the rotation angle of the electric motor 23. The portion (wetted portion) in contact with the treatment liquid in the first valve 14 is made of a synthetic resin (for example, a fluorine resin) having resistance to a chemical solution. The inner surface 30 c of the flow path 30 and the outer surface of the valve body 31 are included in the liquid contact portion.

  The electric motor 23 which is an example of the electric actuator is controlled by the control device 3. Although not shown, the motion conversion mechanism 22 includes, for example, an external thread extending in the axial direction X1 and an internal thread surrounding the external thread. When the electric motor 23 rotates, the valve body 31 moves in the axial direction X1 by an amount of movement corresponding to the rotation angle of the electric motor 23. The control device 3 controls the electric motor 23 based on the detection value of the rotation angle sensor 24 so that the valve can be located at any position from the closed position (position shown in FIG. 5) to the open position (position shown in FIG. Position body 31 The control device 3 further changes the moving speed of the valve body 31 to an arbitrary speed by controlling the rotational speed of the electric motor 23.

  As shown in FIG. 2, the main body 25 has an inlet 26 through which the process liquid filtered by the filter flows, an outlet 29 through which the process liquid flowing into the inlet 26 is discharged, an inlet 26 and an outlet 29. And a flow passage 30 extending from the inlet 26 to the outlet 29 through the opening 27 and an annular valve seat 28 concentrically surrounding the opening 27. The flow path 30 includes an upstream portion 30 a extending downstream from the inlet 26 and a downstream portion 30 b extending upstream from the outlet 29. The upstream portion 30 a and the downstream portion 30 b intersect inside the main body 25. The opening 27 is formed in the inner surface 30 c of the flow passage 30. The first pipe 13 includes an upstream pipe 13 a connected to the inlet 26 and a downstream pipe 13 b connected to the outlet 29.

  As shown in FIG. 2, the valve body 31 includes a disc portion 32, a cone portion 33 and an annular portion 34. The disk portion 32, the cone portion 33, and the annular portion 34 are, for example, integral. The valve body 31 has a closed position (the position shown in FIG. 5) in which the annular portion 34 contacts the valve seat 28 and blocks the flow of the processing liquid from the inlet 26 to the outlet 29. And is movable relative to the main body 25 between an open position (the position shown in FIG. 7) in which the processing liquid flows from the inlet 26 to the outlet 29 through the opening 27. The flow of the processing liquid from the inlet 26 to the outlet 29 is shut off by the contact between the annular portion 34 and the valve seat 28. The flow rate of the treatment liquid flowing from the inlet 26 to the outlet 29 is continuously adjusted by the cone portion 33.

As shown in FIG. 2, the disc portion 32 is disposed in a recess provided in the main body 25. The end face 32 a of the disc portion 32 is disposed in the flow path 30. The annular portion 34 extends from the end face 32 a of the disc portion 32 toward the valve seat 28. The pyramidal portion 33 extends from the end face 32 a of the disc portion 32 toward the opening 27.
As shown in FIG. 3, the conical portion 33 includes a conical outer circumferential surface 33 a whose outer diameter continuously decreases with distance from the disc portion 32. The outer peripheral surface 33a of the pyramidal portion 33 is tapered toward the downstream. The outer peripheral surface 33a of the pyramidal portion 33 is inclined at a constant inclination angle with respect to the axial direction X1. The tip of the pyramidal portion 33 is farther from the disc portion 32 in the axial direction X1 than the annular portion 34. The tip of the pyramidal portion 33 is disposed downstream of the valve seat 28. The inner surface of the downstream portion 30 b of the flow passage 30 has a cylindrical shape that concentrically surrounds the pyramidal portion 33. The edge 27a of the opening 27 corresponds to the upstream end of the inner surface of the downstream portion 30b. The pyramidal portion 33 is inserted into the opening 27.

  As shown in FIG. 3, the annular portion 34 includes an annular tip 34 a facing the valve seat 28 in the axial direction X1. The annular tip portion 34a is, for example, a flat surface disposed on a plane orthogonal to the axial direction X1. Similarly, the valve seat 28 is, for example, a flat surface disposed on a plane orthogonal to the axial direction X1. The annular tip 34 a and the valve seat 28 face in parallel. The inner circumferential surface of the annular portion 34 concentrically surrounds the outer circumferential surface 33a of the conical portion 33 at intervals in the radial direction Y1 (direction orthogonal to the axial direction X1). The end face 32 a of the disc portion 32, the outer circumferential surface 33 a of the conical portion 33 and the inner circumferential surface of the annular portion 34 form an annular groove 35 surrounding the conical portion 33.

  As shown in FIG. 3, the inner diameter of the annular tip 34 a is larger than, for example, the diameter of the opening 27. The maximum diameter of the conical portion 33 (the outer diameter of the base of the conical portion 33) is smaller than, for example, the diameter of the opening 27. Accordingly, the outer diameter D1 of the conical portion 33 at the same position as the annular tip 34a in the axial direction X1 is smaller than the diameter of the opening 27. The width of the annular tip portion 34a (the length in the radial direction Y1 from the inner edge of the annular tip portion 34a to the outer edge of the annular tip portion 34a) is, for example, the height of the annular portion 34 (the end face 32a of the disc portion 32 to the annular tip) Smaller than the length in the axial direction X1 up to the portion 34a. One half of the difference between the inner diameter of the annular tip 34a and the diameter of the opening 27 (the distance Y1 from the edge 27a of the opening 27 to the inner end of the annular tip 34a) is, for example, the height of the annular part 34 Less than the width of the annular tip 34a.

  As shown in FIG. 2, when the valve body 31 is disposed in the closed position, the entire circumference of the annular tip portion 34a is pressed against the entire circumference of the valve seat 28, and the annular portion 34 is elastically deformed. Since there is a space between the annular portion 34 and the conical portion 33 and the annular portion 34 is separated from the conical portion 33, elastic deformation of the annular portion 34 is unlikely to be inhibited by the conical portion 33. The annular tip portion 34a is in close contact with the valve seat 28 by elastic deformation and in surface contact with the valve seat 28. Thereby, the gap between the valve body 31 and the valve seat 28 is sealed. On the other hand, when the valve body 31 is disposed at a position other than the closed position, the annular tip portion 34a is separated from the valve seat 28, and the treatment liquid flowing into the inflow port 26 is the inner surface 30c of the flow path 30 and the valve body 31. Flow to the outlet 29 through between the outer surface of the

  As shown in FIGS. 5 to 7, a part of the pyramidal portion 33 is disposed in the opening 27 at any position from the closed position to the open position. The outer peripheral surface 33a of the pyramidal portion 33 is not in contact with the main body 25 at any position from the closed position to the open position. When the valve body 31 moves to the open position side, the area in which the conical portion 33 occupies the opening 27 continuously increases. When the valve body 31 moves to the closed position side, the area in which the pyramid portion 33 occupies the opening 27 is continuously reduced. As a result, the flow passage area of the opening 27 (the area of the portion not occupied by the pyramidal portion 33) changes, and the flow rate of the processing liquid passing through the first valve 14 is changed.

  As shown in FIG. 3, the distance in the axial direction X1 (axial direction distance Da) from the annular tip 34a to the valve seat 28 increases as the valve body 31 approaches the open position. Similarly, the distance in the radial direction Y1 (radial distance Dr) from the edge 27a of the opening 27 to the outer peripheral surface 33a of the pyramidal portion 33 increases as the valve body 31 approaches the open position. The rate of change of the axial distance Da is larger than the rate of change of the radial distance Dr.

The positions at which the radial distance Dr and the axial distance Da are equal are intermediate positions between the closed position and the open position. In the intermediate position, the flow passage area between the annular portion 34 and the valve seat 28 (axial distance Da × peripheral length of the annular portion 34) and the flow passage area of the opening 27 (a portion not occupied by the pyramid portion 33) Area roughly agree with the
When the valve body 31 is disposed at a position other than the closed position, the processing solution that has flowed into the inflow port 26 has a gap between the annular portion 34 and the valve seat 28, an edge 27 a of the pyramid portion 33 and the opening 27. Pass through the gap between and. The flow rate of the processing liquid passing through the first valve 14 is limited by either the flow passage area between the annular portion 34 and the valve seat 28 or the flow passage area of the opening 27.

  As shown in FIG. 4, the flow passage area between the annular portion 34 and the valve seat 28 is smaller than the flow passage area of the opening 27 at a position closer to the closed position than the intermediate position. Limit the flow rate of the processing solution passing through. On the other hand, at a position closer to the open position than the intermediate position, the flow passage area of the opening 27 is smaller than the flow passage area between the annular portion 34 and the valve seat 28, so processing passing through the first valve 14 Limit the flow rate of the solution.

FIG. 8 shows a temporal change of the position of the valve body 31 when the control device 3 opens the first valve 14. FIG. 9 shows a temporal change of the position of the valve body 31 when the control device 3 closes the first valve 14.
In FIG. 8, the solid line is an example, the dashed-dotted line is a comparative example 1, and the two-dotted line is a comparative example 2. The target position in FIG. 8 is a position corresponding to the target value of the flow rate of the processing liquid passing through the first valve 14. That is, when the valve body 31 is disposed at the target position, the flow rate of the processing liquid passing through the first valve 14 matches the target value of the flow rate. Below, the case where a target position is a position by the side of an open position rather than a middle position is explained.

As shown in FIG. 8, the control device 3 performs the first constant velocity control to move the valve body 31 at a constant moving speed from the closed position to the intermediate position. And control device 3 performs PID control which moves valve element 31 based on a detection value of the 1st flow meter 15 from an intermediate position to a target position.
In order to enhance the quick responsiveness of the first valve 14, the controller 3 moves the valve body 31 at, for example, the maximum speed in the first constant velocity control. Also, the PID constant is set, for example, so that overshoot does not occur. That is, the PID constant is set so that the position of the valve body 31 does not exceed the target position and the measured value of the flow does not exceed the target value of the flow.

  The alternate long and short dash line (comparative example 1) in FIG. 8 indicates the temporal change of the position of the valve body 31 when performing the constant velocity control until the measured value of the flow rate exceeds the target value of the flow rate ing. The two-dot chain line (comparative example 2) in FIG. 8 indicates the temporal change of the position of the valve body 31 from the beginning, that is, when the PID control is performed from the closed position to the target position. In Comparative Example 1 and Comparative Example 2, overshoot occurs, and the time until the position of the valve body 31 stabilizes is longer than in the example. Therefore, the example is faster in response and stability than the comparative example 1 and the comparative example 2.

  On the other hand, as shown in FIG. 9, the control device 3 performs the second constant velocity control to move the valve body 31 at a constant moving speed from the initial position (the position closer to the open position than the intermediate position) to the intermediate position. I do. Then, the control device 3 moves at a speed smaller than the moving speed of the valve body 31 in the second constant-speed control until at least a part from the intermediate position to the closed position (in particular, the position immediately before the closed position A deceleration control is performed to move the valve body 31 at a speed. The control device 3 presses the valve body 31 against the valve seat 28 after the valve body 31 reaches the closed position.

  In order to enhance the quick responsiveness of the first valve 14, the controller 3 moves the valve body 31 at the maximum speed, for example, in the second constant velocity control. Moreover, in order to reduce the impact when the valve body 31 contacts the valve seat 28, the control device 3 moves the valve body 31 at a lower moving speed in the deceleration control than in the second constant velocity control. Thereby, particles generated by the contact between the valve body 31 and the valve seat 28 are reduced. If the moving speed of the valve body 31 is small, the deceleration control may be constant speed control or feedback control such as PID control.

  As described above, in the present embodiment, the valve body 31 is provided with the annular portion 34 for opening and closing the first valve 14 and the cone portion 33 for adjusting the flow rate of the processing liquid passing through the first valve 14. The electric motor 23 moves the valve body 31 between the closed position and the open position according to a command from the control device 3. When the electric motor 23 moves the valve body 31, the conical portion 33 and the annular portion 34 move together.

  By the movement of the pyramidal portion 33, the flow passage area of the opening 27 (the area of the portion not occupied by the pyramidal portion 33) changes continuously. The flow rate of the processing liquid supplied to the processing liquid nozzle 11 is automatically adjusted by the electric motor 23. In addition, when the electric motor 23 positions the valve body 31 in the closed position, the annular portion 34 contacts the valve seat 28, and when the electric motor 23 positions the valve body 31 other than the closed position, the annular portion 34 Leave the valve seat 28. The supply and the stop of the supply of the treatment liquid to the treatment liquid nozzle 11 are automatically switched by the electric motor 23. Therefore, the supply and the stop of the supply of the treatment liquid to the treatment liquid nozzle 11 and the adjustment of the flow rate of the treatment liquid supplied to the treatment liquid nozzle 11 can be performed by one valve (first valve 14).

  The outer peripheral surface 33a of the pyramidal portion 33 is not in contact with the main body 25 at any position from the closed position to the open position. Therefore, the movement of the valve body 31 causes the conical portion 33 to be rubbed against the main body 25 so that particles are not generated. Also, the annular leading end 34 a of the annular portion 34 is vertically pressed against the valve seat 28 in the closed position. Therefore, particles are less likely to be generated as compared to the case where a conical valve body is pressed against a conical or cylindrical valve seat. Therefore, particles generated in the flow path 30 can be reduced, and the cleanliness of the processing liquid supplied to the substrate W can be enhanced.

  Also, in the present embodiment, the flat annular tip 34 a is pressed vertically against the flat valve seat 28. As a result, the valve seat 28 and the annular tip 34a come into surface contact. Therefore, compared with the case where the valve body 31 and the valve seat 28 are in line contact, the flow of the processing liquid can be more reliably shut off. Furthermore, since the flat surfaces are pressed vertically, particles are less likely to be generated as compared with the case where a conical valve body is pressed against a conical or cylindrical valve seat. Thereby, particles generated in the flow path 30 can be reduced.

  If the contact area of the valve body 31 and the valve seat 28 is too small, sufficient sealing can not be ensured. On the other hand, when the contact area of the valve body 31 and the valve seat 28 is too large, a large pressure is required to close the valve. Therefore, it is preferable that the contact area of the valve body 31 and the valve seat 28 be as small as possible within the range where sufficient sealing performance can be secured. In the present embodiment, since the inner diameter of the annular tip 34a is larger than the diameter of the opening 27, the contact between the valve seat 28 and the annular tip 34a is greater than when the inner diameter of the annular tip 34a is smaller than the diameter of the opening 27. The area can be reduced. Therefore, particles can be reduced while more reliably blocking the flow of the treatment liquid.

  Further, in the present embodiment, when the valve body 31 is disposed at a position other than the closed position, the processing liquid that has flowed into the inflow port 26 is a gap between the annular portion 34 and the valve seat 28 and the cone portion 33. And the gap between the edge 27 a of the opening 27. Since the flow passage area between the annular portion 34 and the valve seat 28 is smaller than the flow passage area of the opening 27 at a position closer to the closed position than the intermediate position, the flow rate of the processing liquid passing through the first valve 14 Be rate-limited. On the other hand, at a position closer to the open position than the intermediate position, the flow passage area of the opening 27 is smaller than the flow passage area between the annular portion 34 and the valve seat 28, so processing passing through the first valve 14 Limit the flow rate of the solution.

  The control device 3 performs the first constant velocity control to move the valve body 31 at a constant moving speed from the closed position to the intermediate position. And control device 3 performs feedback control which moves valve element 31 based on a detection value of the 1st flow meter 15 from an intermediate position to a target position. That is, since the target position is in the range where the flow passage area of the opening 27 determines the flow rate of the treatment liquid, the controller 3 controls the flow passage area between the annular portion 34 and the valve seat 28 to the flow rate of the treatment liquid. The valve body 31 is quickly moved out of the rate-limiting range. Therefore, compared with the case where feedback control is performed from the beginning, the time until the measured value of flow rate stabilizes can be shortened.

  Further, in the present embodiment, the control device 3 performs the second constant velocity control of moving the valve body 31 at a constant moving speed from the initial position (the position closer to the open position than the intermediate position) to the intermediate position. Then, the control device 3 performs deceleration control to move the valve body 31 at a moving speed lower than the moving speed of the valve body 31 in the second constant speed control in all or part of the intermediate position to the closed position. As described above, since the moving speed immediately before the valve body 31 contacts the valve seat 28 decreases, the impact when the valve body 31 contacts the valve seat 28 can be reduced, and the contact between the valve body 31 and the valve seat 28 It is possible to further reduce the particles generated due to

Although the description of the embodiment of the present invention has been described above, the present invention is not limited to the contents of the above-described embodiment, and various modifications are possible within the scope of the present invention.
For example, although the said embodiment demonstrated the case where the flow path 30 had a L-shaped cross section, the cross-sectional shape of the flow path 30 is not restricted to an L-shape.
Although the valve seat 28 is described as being integral with the main body 25 in the above embodiment, the valve seat 28 may be a separate component from the other parts forming the flow path 30.

In the above embodiment, when the electric motor 23 rotates, the valve body 31 performs linear motion without rotating around its center line. However, in the motion conversion mechanism 22, the valve body 31 performs rotation around its center line. The power of the electric motor 23 may be transmitted to the valve body 31 so as to linearly move while rotating.
Although the cone part 33 has a conical shape in the embodiment, the cone part 33 may have a pyramidal shape. In any case where the conical portion 33 is conical or pyramidal, the tip of the conical portion 33 may not be a point, but may be a plane orthogonal to the axial direction X1 of the conical portion 33 or a curved surface It may be.

Although in the above embodiment, the valve seat 28 and the annular tip 34a are both flat annular surfaces, at least one of the valve seat 28 and the annular tip 34a has an annular cross section with an arc-like cross section. It may be a curved surface.
In the embodiment described above, the inner diameter of the annular tip 34a is larger than the diameter of the opening 27, but the inner diameter of the annular tip 34a may be equal to or less than the diameter of the opening 27.

Although the case where feedback control is PID control was explained in the above-mentioned embodiment, feedback control may be not only PID control but proportional control which performs proportional operation, and PI control which performs proportional operation and integral operation It may be
Although the case where SC-1 which is an example of a medical fluid and pure water which is an example of a rinse liquid are discharged from the same nozzle (processing liquid nozzle 11) was explained by the above-mentioned embodiment, a medical fluid and a rinse liquid are It may be discharged from separate nozzles. The chemical solution may be a liquid other than SC-1. The rinse solution may be a liquid other than pure water.

Although the substrate processing apparatus 1 is an apparatus for processing a disk-shaped substrate W in the embodiment, the substrate processing apparatus 1 may be an apparatus for processing a polygonal substrate W.
Although the said embodiment demonstrated the case where the substrate processing apparatus 1 was a single-wafer apparatus, the substrate processing apparatus 1 may be a batch apparatus which processes several board | substrates W collectively.
When the substrate processing apparatus 1 is a batch type, the substrate processing apparatus 1 moves up and down while holding a plurality of substrates W and a plurality of substrates in the processing tank by storing the processing liquid in the processing tank. A lifter for immersing W, a treatment liquid nozzle for discharging the treatment liquid in the treatment tank, supply and stop of the treatment liquid to the treatment liquid nozzle, and adjustment of the flow rate of the treatment liquid supplied to the treatment liquid nozzle And an electric valve.

  Two or more of all the configurations described above may be combined. Similarly, two or more of all the aforementioned steps may be combined.

1: Substrate processing apparatus 3: Controller 4: Spin chuck 11: Treatment liquid nozzle 12: Treatment liquid piping 13: First piping 14: First valve 15: First flow meter 22: Motion conversion mechanism 23: Electric motor 24: Rotational angle sensor 25: Body 26: Inlet 27: Opening 27a: Edge of opening 28: Valve seat 29: Outlet 30: Channel 31: Valve body 32: Disc portion 33: Conical portion 33a: Outer peripheral surface 34: Annular portion 34a: Annular tip 35: Annular groove W: Substrate X1: axial direction Y1: radial direction

Claims (6)

A processing liquid nozzle for discharging a processing liquid supplied to a substrate; an electric valve for supplying and stopping supply of the processing liquid to the processing liquid nozzle; and adjusting a flow rate of the processing liquid supplied to the processing liquid nozzle; A controller for controlling the motorized valve;
The motorized valve is
From the inlet through which the processing liquid flows, an outlet through which the processing liquid flowing into the inlet is discharged, an opening disposed between the inlet and the outlet, and the opening through the opening A body provided with a flow passage extending to the outlet and an annular valve seat surrounding the opening;
A closed position in contact with the valve seat and blocking the flow of the treatment liquid from the inlet to the outlet, away from the valve seat, and flowing the treatment liquid from the inlet to the outlet through the opening An open position, a valve body movable relative to the body;
An electric actuator that moves the valve body between the closed position and the open position, and positions the valve body at an arbitrary position from the closed position to the open position according to a command from the control device; Including
The valve body includes a pyramidal portion inserted into the opening, and an annular portion which is spaced apart and surrounds the pyramidal portion and faces the valve seat.
The conical portion includes a conical outer peripheral surface which is not in contact with the main body at any position from the closed position to the open position,
The annular portion is pressed perpendicularly to the valve seat in the closed position, seen including an annular tip away from the valve seat at a position other than the closed position,
The substrate processing apparatus, wherein the valve seat and the edge of the opening are arranged on the same plane .   A processing liquid nozzle for discharging a processing liquid supplied to a substrate; an electric valve for supplying and stopping supply of the processing liquid to the processing liquid nozzle; and adjusting a flow rate of the processing liquid supplied to the processing liquid nozzle; A controller for controlling the motorized valve;
  The motorized valve is
  From the inlet through which the processing liquid flows, an outlet through which the processing liquid flowing into the inlet is discharged, an opening disposed between the inlet and the outlet, and the opening through the opening A body provided with a flow passage extending to the outlet and an annular valve seat surrounding the opening;
  A closed position in contact with the valve seat and blocking the flow of the treatment liquid from the inlet to the outlet, away from the valve seat, and flowing the treatment liquid from the inlet to the outlet through the opening An open position, a valve body movable relative to the body;
  An electric actuator that moves the valve body between the closed position and the open position, and positions the valve body at an arbitrary position from the closed position to the open position according to a command from the control device; Including
  The valve body includes a pyramidal portion inserted into the opening, and an annular portion which is spaced apart and surrounds the pyramidal portion and faces the valve seat.
  The conical portion includes a conical outer peripheral surface which is not in contact with the main body at any position from the closed position to the open position,
  The annulus includes an annulus tip which is urged vertically against the valve seat in the closed position and away from the valve seat in a position other than the closed position;
  The maximum value of the outer diameter of the pyramidal portion is smaller than the diameter of the opening,
  The substrate processing apparatus, wherein an edge of the opening is located around the pyramidal portion, regardless of where the valve body is located from the closed position to the open position. The valve seat and the annular tip are both flat, the substrate processing apparatus according to claim 1 or 2. The substrate processing apparatus according to any one of claims 1 to 3 , wherein an inner diameter of the annular tip portion is larger than a diameter of the opening. The substrate processing apparatus further includes a flow meter that detects the flow rate of the processing liquid passing through the motorized valve.
The control device sets the valve body located at the closed position at an intermediate position where the radial distance from the edge of the opening to the conical portion is equal to the axial distance from the annular portion to the valve seat When moving from the closed position to the target position corresponding to the target value of the flow rate of the processing liquid passing through the electric valve, the position from the closed position to the intermediate position is The first constant-speed control for moving the valve body at a constant moving speed is performed, and the feedback control for moving the valve body is performed based on the detection value of the flow meter from the intermediate position to the target position. the substrate processing apparatus according to any one of claims 1-4. The substrate processing apparatus further includes a flow meter that detects the flow rate of the processing liquid passing through the motorized valve.
The control device may be configured such that the valve body is positioned closer to the open position than an intermediate position in which a radial distance from an edge of the opening to the conical portion is equal to an axial distance from the annular portion to the valve seat The second constant velocity control for moving the valve at a constant moving speed from the position closer to the open position than the intermediate position to the intermediate position when moving the valve to the closed position via the intermediate position The deceleration control is performed to move the valve at a moving speed lower than the moving speed of the valve in the second constant speed control at least in part from the intermediate position to the closed position. The substrate processing apparatus as described in any one of 1-5 .

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